JP2011115676A - Substrate washing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate washing apparatus capable of achieving high-speed washing of the lateral side of a substrate used for display. <P>SOLUTION: The substrate washing apparatus includes a presser 11 that presses a part of washing cloth 12 against the substrate 1, and a moving means 3 that relatively moves the presser 11 and the substrate 1. The presser 11 is arranged to be parallel to the substrate 1 and includes: a pressing surface 15 whose width in a relative movement direction of the presser 11 and the substrate 1 is 5 mm or more; slopes 16 each connected to both end edges of the pressing surface 15, wherein the angle of the slope 16 to the pressing surface 15 is selected from a range of 15 to 25 degrees; and a regulation projection 22 that is connected with an end edge of the slope 16, and projects toward the substrate 1 to an extent not to exceed the pressing surface 15. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a substrate cleaning apparatus for cleaning a surface to be cleaned of various substrates such as a glass substrate used for a liquid crystal display, a plasma display, an organic EL (light-emitting) display and the like.

  Conventionally, in the display manufacturing process described above, there are processes of electrically connecting various components such as a driver IC to the electrodes formed on the side edges of the glass substrate and physically fixing them. Specifically, a tape-like anisotropic conductive film (ACF) is attached to the side edge of the glass substrate on which the electrodes are arranged, and various components are attached via the anisotropic conductive film. A process is performed.

  Here, the process of attaching various parts to the side edge of the glass substrate is the second half of the manufacturing process of the display, and the side edge of the glass substrate is contaminated by the first half of the process, etc. There is. Therefore, it is necessary to clean the side edge of the glass substrate before attaching the anisotropic conductive film to the side edge of the glass substrate.

  In order to industrially clean the dirt adhering to the surface of the side edge of the glass substrate, a cleaning cloth is arranged on both sides of the side edge of the glass substrate, and the cleaning cloth is sandwiched between two pressing elements with a predetermined force. The cleaning method is employed in which the pressing element is relatively moved along the side edge portion together with the cleaning cloth to be wiped off.

  By the way, in order to improve the productivity of the display, it is necessary to shorten the cleaning operation. In order to realize this, it is conceivable to increase the relative movement speed between the glass substrate and the presser. However, if the speed is increased, the cleaning cloth slips sideways with respect to the presser, and the subsequent cleaning is appropriate. The problem of being unable to do so occurred.

  Therefore, the applicant of the present application has previously filed an invention relating to the shape of a presser that can be stably cleaned even if the moving speed of the presser is increased and the cleaning speed is increased (see Patent Document 1).

  Specifically, by forming a protrusion that extends in a direction perpendicular to the direction of movement of the presser on the surface of the presser that contacts the cleaning cloth, the pressing element that can prevent the cleaning cloth from shifting even if the cleaning speed is increased. Has proposed.

JP 2009-43859 A

  However, since the display tends to become larger or the productivity of the display needs to be further improved, the speed at which the side edges of the substrate including the glass substrate are cleaned to maintain the productivity of the display. Need to be further improved. Furthermore, as the display becomes larger, the area of the side edge that needs to be cleaned also increases. Therefore, in order to wipe off the dirt on the entire side edge by a single movement, it is necessary to bring the cleaning cloth into contact with the surface of the side edge as wide as possible. However, if the contact area between the cleaning cloth and the side edge portion is large, the possibility that the cleaning cloth is displaced from the presser increases.

  In view of the above-mentioned problems, the inventors of the present application have found a condition that can satisfy both the cleaning speed and the contact area, which are in a trade-off relationship, as a result of diligent experiments and research. The present invention has been made on the basis of the above knowledge, and an object of the present invention is to provide a substrate cleaning apparatus capable of cleaning a side edge portion of a substrate used in a large display at high speed.

  In order to achieve the above object, a substrate cleaning apparatus according to the present invention includes a pressing element that presses a part of a long belt-shaped cleaning cloth disposed on a surface to be cleaned of a substrate, and the pressing element. The substrate cleaning apparatus includes a moving unit that moves the cleaning cloth relative to the substrate by moving the cleaning cloth relative to the substrate, and a cleaning cloth supply unit that supplies a portion of the new cleaning cloth to the presser. The pressing element is a surface that presses the cleaning cloth against the substrate, and is a flat surface that is arranged in parallel with the surface to be cleaned, and the pressing surface that has a width in the relative movement direction of the pressing element and the substrate of 5 mm or more. And a pressing portion having a surface thereof, and an inclination that is connected to both end edges of the pressing surface in the relative movement direction, and is arranged so as to gradually move away from the substrate along the relative movement direction. An angled portion having a surface on the surface, wherein an angle of a line connecting one end portion to the other end portion in the relative movement direction of the inclined surface with respect to the pressing surface is selected from a range of 15 degrees or more and 25 degrees or less. Two inclined portions having an inclined surface and an end edge of the inclined portion opposite to the pressing portion, projecting toward the substrate with a length not exceeding the pressing surface, and against the pressing element of the cleaning cloth The cleaning cloth supply means arranges the cleaning cloth so as to straddle the entire relative movement direction of the pressing surface according to the width of the cleaning cloth, and the cleaning cloth supply means The cleaning cloth supply means applies a predetermined tension in the length direction of the cleaning cloth and causes the cleaning cloth to follow the shape formed by the pressing portion and the inclined portion.

  According to this configuration, since the cleaning cloth is disposed along the protrusion formed by the pressing portion and the inclined portion, the contact area between the cleaning cloth and the substrate is relatively large, and the relative movement speed of the presser with respect to the substrate Even when the speed is relatively fast, the cleaning cloth is locked to the protrusion with a predetermined tension, and the cleaning cloth can be prevented from shifting in the relative movement direction. Moreover, even if the cleaning cloth is displaced to some extent, the cleaning cloth is restricted by the restricting protrusion, and thus it is possible to prevent the cleaning cloth from being largely displaced from the pressing surface. Moreover, since the width | variety of the relative movement direction in which a cleaning cloth contacts a board | substrate is long, even when a cleaning part is long, it becomes possible to wipe off dirt at once. Therefore, even when the substrate is large and the portion that needs to be cleaned is long, it is possible to sufficiently remove the dirt with a single cleaning.

  Also, even if the cleaning cloth deviates to some extent from the pressing surface, it is possible to reverse the cleaning cloth displacement by releasing the pressure on the substrate and supplying a new portion of the cleaning cloth to the presser after the cleaning is completed. It becomes possible.

  Therefore, even when the cleaning is repeated for a plurality of substrates, the substrate can be efficiently cleaned, and the cleaning efficiency of the substrate can be improved.

  Moreover, it is preferable that the inclined surface which the said inclination part has is a curved surface which bulges outside from the said pressing part.

  According to this configuration, the inclined surface can be smoothly connected from the pressing surface, and the possibility of damaging the substrate by the connection portion between the pressing surface and the inclined surface can be reduced. Moreover, even if the cleaning cloth is displaced with respect to the pressing element, it is possible to easily return the cleaning cloth to the original position by releasing the pressing of the cleaning cloth by the pressing element on the substrate (the pressing surface of the cleaning cloth). Centering function).

  Moreover, it is preferable that the height of the inclined surface in the pressing direction in which the pressing element presses the cleaning cloth against the substrate is a height selected from a range of 0.5 mm or more and 1 mm or less.

  According to this, even when the cleaning cloth is displaced, a part of the cleaning cloth is filled in the portion surrounded by the substrate, the inclined portion, and the restricting projection, and the cleaning cloth can be prevented from further shifting.

  The substrate cleaning apparatus may include the two pressing elements disposed so as to sandwich the substrate, and the moving means may integrally move the two pressing elements relative to each other along the substrate. Absent.

  According to this configuration, the surface to be cleaned on both the front and back sides of the substrate can be cleaned at the same time, and it is not necessary to support one surface of the substrate in order to resist the pressing force from the pressing element. The equipment configuration can be made compact.

  According to the substrate cleaning apparatus of the present invention, the cleaning cloth can be pressed against the substrate in a long width in the relative movement direction, and the displacement of the cleaning cloth with respect to the pressing element can be suppressed. Even if the cleaning speed is increased without increasing the pressing force of the child, it is possible to remove the dirt adhering to the large surface to be cleaned by one cleaning.

It is a side view which shows the whole schematic structure of a board | substrate cleaning apparatus. It is a perspective view which shows the structure of the pressing element vicinity of a board | substrate cleaning apparatus. It is a perspective view which shows a pressing element, (a) is a figure desired from upper direction, (b) is a figure desired from the downward direction. It is a figure which shows a pressing element, (a) is a front view, (b) is a side view. It is a front view which shows the other aspect of a presser. It is a figure which shows the state which attached the cleaning cloth to the pressing element, (a) is a front view, (b) is a side view shown notched. It is a front view which shows the presser vicinity of the board | substrate cleaning apparatus in a washing | cleaning state.

  Embodiments of a substrate cleaning apparatus according to the present invention will be described below with reference to the drawings. In the case of the present embodiment, the substrate to be cleaned by the substrate cleaning apparatus is a substrate that constitutes the liquid crystal display panel, and after wiring and driving circuits are formed on the surface of the substrate and a color filter or the like is laminated, It is a substrate. The portion to be cleaned of the substrate is a side edge portion of the substrate, where only the wiring is provided on the surface to be cleaned, and the anisotropic conductive film is attached after cleaning. The side edge has a plurality of wirings extending in a direction perpendicular to the side edge, and the wiring has a very thin thickness of about 0.7 mm to 1 mm. However, the wiring is slightly uneven. ing. Also, damaging the wiring by cleaning is a matter to be avoided.

FIG. 1 is a side view showing a substrate cleaning apparatus.
FIG. 2 is a perspective view showing the vicinity of the pressing member while cleaning the substrate.

  As shown in the figure, the substrate cleaning apparatus 30 includes a presser 11 that presses a part of a long belt-like cleaning cloth 12 disposed on the surface to be cleaned of the substrate 1 against the substrate 1, and the presser 11 on the substrate. And a moving means 3 for moving the cleaning cloth 12 relative to the substrate 1 by moving the cleaning cloth 12 relative to the substrate 1. The substrate cleaning apparatus 30 includes the substrate holding unit 8 and the cleaning cloth supply unit 13.

  The moving means 3 is a device that moves the presser 11 relative to the substrate 1. In the case of the present embodiment, the moving means 3 is a device that can move the substrate 1 linearly in the x-axis direction with respect to the presser 11 to be fixed. The moving means 3 is capable of moving the substrate 1 at high speed via the substrate holding part 8, and the relative moving speed can be set from a range of 40 mm / s or more and 250 mm / s or less. It has become. The distance that the substrate holding unit 8 can be moved is a distance that can clean all sides of a 32-inch liquid crystal display. Specifically, a distance of 600 mm or more can be moved at a set relative moving speed. It is possible. The upper limit of the distance is a distance at which all the long sides of the 57-inch liquid crystal display can be cleaned. Specifically, a distance of 1300 mm or less can be moved at a set relative movement speed.

  In the present invention, as is apparent from the term “relatively moving”, the moving means 3 not only fixes the pressing member 11 and moves the substrate 1 but also fixes the pressing member 11 and presses the pressing member. 11 may be moved, or the substrate 1 may be moved and the presser 11 may be moved.

Further, in the case of the present embodiment, the moving means 3 is incorporated in the moving table 9.
The moving table 9 is a device for determining the position of the substrate 1 with respect to the presser 11, and includes a substrate holding unit 8, a moving unit 3, and a second moving unit 7.

  The substrate holding unit 8 is a device that holds the substrate 1 in a mounted state and can rotate the mounted substrate 1 around the Z axis (θ direction).

  The second moving unit 7 is a device that can move the substrate holding unit 8 and the moving unit 3 in the Y direction, and the y axis of the substrate 1 with respect to the presser 11 via the substrate holding unit 8 and the moving unit 3. It is a device capable of positioning in a direction.

  3A and 3B are perspective views showing the pressing element, in which FIG. 3A is a view of the pressing element viewed from above, and FIG. 3B is a view of the pressing element viewed from below.

4A and 4B are diagrams showing the pressing element, where FIG. 4A is a front view and FIG. 4B is a side view.
As shown in these drawings, the pressing element 11 is a member that performs a cleaning operation by moving relative to the substrate 1 while pressing the cleaning cloth 12 against the surface of the substrate 1 and has a pressing surface 15 on the surface. A portion 25, an inclined portion 26 having an inclined surface 16 on the surface, and a regulation protrusion 22 are provided.

  The pressing portion 25 is a portion that presses the cleaning cloth 12 against the substrate 1. The pressing surface 15 provided on the surface of the pressing portion 25 is a surface that comes into contact with the portion of the cleaning cloth 12 that is pressed against the substrate 1 and is a plane that is arranged in parallel with the surface of the substrate 1. Moreover, it is preferable that the width W (refer FIG. 4A) in the relative movement direction (x-axis direction) of the pressing element 11 of the pressing surface 15 and the board | substrate 1 is 5 mm or more. When the width W of the pressing surface 15 is less than 5 mm, the width in which the cleaning cloth 12 contacts the substrate 1 is less than 5 mm, and the substrate 1 is large, for example, the length of the portion requiring cleaning of the substrate 1 is 650 mm or more. The forward cleaning (one way) is not enough to remove the dirt, and the part of the new cleaning cloth 12 that has not been cleaned yet is supplied between the pressing surface 15 and the substrate and cleaned again by, for example, the backward movement (one way). This is because the dirt needs to be removed by reciprocating cleaning.

  The inclined portion 26 is a portion for suppressing a shift in the relative movement direction of the cleaning cloth with respect to the pressing element 11. The inclined surfaces 16 provided on the surface of the inclined portion 26 are respectively connected to both end edges of the pressing surface 15 in the relative movement direction, and gradually move away from the substrate 1 as moving away from the edge toward the outside along the relative movement direction. Are arranged as follows. The inclination angle α (see FIG. 4A), which is the angle of the line connecting the one end to the other end in the relative movement direction of the inclined surface 16 with respect to the pressing surface 15, is selected from a range of 15 degrees or more and 25 degrees or less. It is preferred that When the inclination angle α is less than 15 degrees, the effect of suppressing the displacement of the cleaning cloth 12 by the inclined portion 26 becomes poor. Moreover, when the inclination angle α is larger than 25 degrees, the cleaning cloth 12 is separated from the boundary between the pressing surface 15 and the inclined surface 16, and the effect of suppressing the displacement becomes poor.

  The restricting protrusion 22 is a member that comes into contact with the end of the cleaning cloth 12 in the width direction and restricts the cleaning cloth 12 from deviating from the presser 11, and an end edge of the inclined portion 26 opposite to the pressing portion 25. And protrudes toward the substrate 1 to the extent that it does not exceed the pressing surface 15, and restricts the displacement of the cleaning cloth 12 relative to the pressing element 11 in the direction of relative movement. Moreover, the internal method of the control protrusion 22 should just be the length comparable as the width | variety of the cleaning cloth 12 used.

  Further, the height H (see FIG. 4A) of the inclined portion 26 in the pressing direction, which is the direction in which the pressing element 11 presses the cleaning cloth 12 against the substrate 1, is selected from a range of 0.5 mm or more and 1 mm or less. It is preferable. The height H may be selected from a range of 3 to 5 times the thickness of the cleaning cloth 12. For example, when the thickness of the cleaning cloth 12 is 0.2 to 0.3 mm, the height H may be selected from a range of 0.6 mm to 1.5 mm. The length of the pressing surface 15 in the y-axis direction is set to be larger than the width dimension of the surface to be cleaned in the direction (y-axis direction) orthogonal to the longitudinal direction of the side edge of the substrate 1.

  As described above, by setting the height of the inclined surface 16 in the pressing direction, when the cleaning cloth 12 is slightly shifted, one end of the cleaning cloth 12 in the width direction is the substrate 1, the inclined part 26, and the regulating protrusion. It is considered that it is possible to fill the space surrounded by 22 and suppress further deviation. Accordingly, the displacement in the width direction of the cleaning cloth 12 is perpendicular to the thickness direction of the cleaning cloth 12 (the cleaning cloth 12) while the displacement in the relative movement direction of the cleaning cloth 12 is along the gentle inclination angle α from the pressing surface 15. It is possible to hold with a compressive force in the width direction).

  The inclined surface 16 of the inclined portion 26 provided in the pressing element 11 is not limited to a flat surface, and may be a curved surface that bulges outward from the pressing portion 25 as shown in FIG. Even when the inclined surface 16 is a curved surface, the inclination angle α is an angle with respect to the pressing surface 15 of a line connecting one end portion of the inclined surface 16 to the other end portion.

  Thus, when the inclined surface 16 is a curved surface, the pressing surface 15 and the inclined surface 16 can be smoothly connected, and the pressing surface is moved when the pressing element 11 is moved relative to the substrate 1 for cleaning. It is possible to reduce the possibility of damaging the surface of the substrate 1 at the corners formed by 15 and the inclined surface 16. Even when the cleaning cloth 12 is displaced with respect to the presser 11, when the pressing of the presser 11 to the substrate 1 is released, the cleaning cloth 12 can be easily moved to the original position by the tension applied to the cleaning cloth 12. It becomes possible to return to.

  The presser 11 is preferably made of a material such as polyacetal (POM) that has excellent chemical resistance and excellent sliding properties.

  In the case of the present embodiment, the substrate cleaning apparatus 30 includes the cleaning mechanism unit 4 having the presser 11. The cleaning mechanism unit 4 is a mechanism unit having a function of pressing a part of the long belt-like cleaning cloth 12 arranged on the surface to be cleaned of the substrate 1 against the substrate 1 by the pressing element 11, A cleaning cloth supply means 13, a pressing means (not shown), and a cleaning agent supply means (not shown) are provided.

  The cleaning cloth 12 is a cloth for wiping off dirt adhering to the surface of the substrate 1. In the case of the present embodiment, the cleaning cloth 12 has a long belt shape and has a slight stretchability. Specifically, for example, the width is about 10 mm, the thickness is about 0.2 mm to 0.3 mm, and the tape is supplied while being wound around a reel.

  The cleaning cloth supply means 13 is a device that supplies a portion of the new cleaning cloth 12 that has not been used for cleaning to the pressing surface 15 of the pressing element 11, and as shown in FIG. The cleaning cloth 12 is arranged so as to straddle the entire relative movement direction of the pressing surface 15 of the pressing element 11 by the width (x direction), and a predetermined tension is applied in the length direction of the cleaning cloth 12 to press the pressing part 25 of the pressing element 11. And the cleaning cloth 12 in a shape formed by the inclined portion 26.

  In the case of the present embodiment, the cleaning cloth supply means 13 includes a supply reel 27, a guide roller 14, and a collection reel 17.

  The supply reel 27 is provided with a disk-shaped member around which the long belt-like cleaning cloth 12 is wound. The supply reel 27 supplies a part of the new cleaning cloth 12 for a predetermined length as needed, and supplies the cleaning cloth 12 for a predetermined length. After that, a function of being in a fixed state is provided so that the cleaning cloth 12 is not supplied any more.

  The collection reel 17 includes a disk-shaped member around which the long belt-like cleaning cloth 12 is wound. The collection reel 17 collects a portion of the cleaning cloth 12 after the cleaning as long as necessary, and the cleaning cloth 12 has a predetermined length. After the recovery, a function of being in a fixed state is provided so that the cleaning cloth 12 is not recovered any more.

  The cleaning cloth 12 is pitch-fed for each cleaning operation by the supply reel 27 and the recovery reel 17, and a new portion of the cleaning cloth 12 is intermittently supplied.

  The guide roller 14 is a member that guides the cleaning cloth 12 so as to pass through a predetermined path. Further, the guide roller 14 moves in a direction orthogonal to the rotation axis of the guide roller 14 (for example, in the z-axis direction), thereby cleaning. A function of applying a predetermined tension to the cloth 12 is provided. The tension applied to the cleaning cloth 12 is about 0.5 to 1.8N.

  The cleaning cloth supply means 13 arranges the cleaning cloth 12 in the following path with respect to the presser 11 so that the cleaning cloth 12 is in a shape formed by the pressing portion 25 and the inclined portion 26. That is, as shown in FIG. 6B, the cleaning cloth 12 is arranged in parallel with the pressing surface 15 in a contact state, and is maintained in a state where the parallelism is maintained from one end of the pressing surface 15 (or slightly upward (z direction). ) In a state of being directed to) and extending in the y direction. On the other hand, from the other end of the pressing surface 15, it is arranged to rise vertically upward (z direction) and further rise in an oblique direction toward the z direction and toward the y direction.

  As described above, the cleaning cloth 12 is arranged with respect to the presser 11 by the cleaning cloth supply means 13, and a predetermined tension is generated in the length direction of the cleaning cloth 12, so that the cleaning cloth has both flexibility and elasticity. If it is the cloth 12, it becomes possible to make the washing | cleaning cloth 12 follow the shape of the pressing part 25 and the inclination part 26. FIG.

  The pressing means (not shown) is a device that presses a part of the cleaning cloth 12 arranged on the surface to be cleaned of the substrate 1 against the substrate 1 through the pressing element 11. In the case of the present embodiment, the substrate cleaning apparatus 30 includes a pair of pressing elements 11 and generates a pressing force with the pressing elements 11 sandwiching the substrate 1. A chuck mechanism (not shown) is employed as a device for generating this pressing force. A chuck mechanism (not shown) drives both pressing elements 11 disposed so that the pressing surfaces 15 face each other, and the pressing elements 11 clean the surfaces to be cleaned on both the upper and lower sides of the side edge of the substrate 1. It is comprised so that the cloth 12 may be pressed. The chucking force of both pressing elements 11 is preferably about 4 to 9N. Note that the presser 11 and the chuck mechanism (not shown) are elastically supported in the vertical direction so as to absorb the positional deviation from the height position of the substrate 1.

  The pressing means according to the present invention includes not only the chuck mechanism but also one pressing element 11 and a support member that supports the substrate 1 against the pressing force applied to the substrate 1 via the pressing element 11. It does not matter even if it is equipped with.

  The cleaning agent supply means (not shown) is a device that supplies a liquid cleaning agent to the cleaning cloth 12. In the case of the present embodiment, the cleaning agent supply means discharges a volatile cleaning agent such as ethanol or isopropyl alcohol toward the cleaning cloth 12 from the discharge port 18 provided in the presser 11. It is a device which supplies. The cleaning agent supply means has a predetermined amount to the discharge port 18 through a pipe connected to the pressing element 11 and a flow path provided in the pressing element 11 before the cleaning cloth 12 is pitch-fed by the cleaning cloth supply means 13. It is equipped with a function to pump the cleaning agent one by one.

  Further, the cleaning agent supply means includes a detection sensor 19 (see FIG. 1). The detection sensor 19 is a sensor that detects a change in color tone of the cleaning cloth 12 that changes when the cleaning cloth 12 contains a cleaning agent, and can confirm that a required amount of the cleaning agent has been properly discharged onto the cleaning cloth 12. It is configured.

  The cleaning agent supply means is not an invention specific matter essential to the present invention. When the substrate cleaning apparatus 30 adopts a dry cleaning method, the substrate cleaning apparatus 30 does not need to include the cleaning agent supply means.

  Next, a cleaning process of the substrate cleaning apparatus 30 having the above configuration will be described. The surface to be cleaned exists on both the front and back surfaces of the side edge portion of the substrate 1.

  First, the substrate 1 is carried into the substrate cleaning device 30 by the substrate carrying means, and the carried substrate 1 is placed on the substrate holding portion 8 of the moving table 9 (carrying-in process).

  Then, the second moving means 7 determines the position in the y-axis direction, and the substrate holder 8 determines the position in the z-axis direction and the angle in the θ direction. Further, the moving means 3 positions the side edge of the substrate 1 so that one end of the surface to be cleaned is positioned between the pressing elements 11 (positioning step).

  In parallel with the carrying-in process and the positioning process, the cleaning agent is supplied to the cleaning cloth 12 from the discharge port 18 by the cleaning agent supply means, and a necessary amount of cleaning agent is included in the new cleaning cloth 12. In addition, it is confirmed that the cleaning cloth 12 contains the cleaning agent sufficiently by detecting the bleeding (color change) of the cleaning agent included in the cleaning cloth 12 by the detection sensor 19.

  Next, a predetermined amount of the cleaning cloth 12 is supplied by the cleaning cloth supply means 13, and a portion including the cleaning agent is supplied between the pressing surface 15 of the presser 11 and the surface to be cleaned of the substrate 1.

  Next, the pair of pressing elements 11 is pressed in the direction of the substrate 1 by pressing means (not shown). In this state, as shown in FIG. 7, the cleaning cloth 12 is in a state of straddling the pressing portion 25 in the width direction (x-axis direction). Further, the pressing element 11 sandwiches the side edge portion of the substrate 1 through the cleaning cloth 12, and the cleaning cloth 12 is pressed against the surface to be cleaned of the substrate 1 by the pressing portion 25 of the pressing element 11. (Pressing process).

  Next, in a state where the cleaning cloth 12 is pressed against the surface to be cleaned of the substrate 1 by the presser 11, the moving means 3 is operated to move the presser 11 and the substrate 1 relatively. In the case of the present embodiment, the moving means 3 moves the substrate 1 with respect to the fixed pressing element 11. The movement is performed from one end portion positioned in the positioning step until the presser 11 reaches the other end portion. Thereby, the surface to be cleaned of the substrate 1 is cleaned (cleaning step).

  Thereafter, the pressing means releases the pressing by the pressing element 11 and separates the substrate 1 from the pressing element 11 by the moving table 9 (separation step).

Next, the board | substrate 1 is carried out toward the ACF sticking apparatus which is a subsequent process (unloading process).
On the other hand, the carrying-in process is performed together with the carrying-out process, and the subsequent processes are repeated.

  According to the above embodiment, since the width W of the pressing surface 15 in the relative movement direction is 5 mm or more, the width of the cleaning cloth 12 pressed against the pressing surface 15 is also 5 mm or more. In this case, even if the length of the surface to be cleaned of the substrate 1 in the relative movement direction is 650 mm or more, the surface of the surface to be cleaned can be removed by one relative movement (that is, forward movement). It has been confirmed that dirt can be removed by one relative movement until the length of the surface to be cleaned is 1300 mm.

  Moreover, since the protrusion part extended in the direction orthogonal to a relative movement direction is formed by the pressing part 25 and the inclination part 26, and the washing | cleaning cloth 12 is arrange | positioned so that the said protrusion may be straddled, the presser 11 of At the time of relative movement with respect to the substrate 1, the cleaning cloth 12 is locked by the protrusions. Therefore, it is not necessary to apply a large tension exceeding 1.8 N to the cleaning cloth 12 to suppress the displacement of the cleaning cloth 12 with respect to the presser 11. Thereby, the cleaning liquid can be sufficiently contained in the cleaning cloth 12. Further, even if the relative movement speed of the presser 11 and the substrate 1 is increased to a speed of 200 mm / s or more, the cleaning cloth 12 is not easily displaced with respect to the presser 11, and the surface to be cleaned of the substrate 1 can be stably cleaned. it can.

From the above, the cleaning tact time in the substrate cleaning apparatus 30 can be shortened.
In addition, this invention is not limited to the said embodiment. For example, another embodiment realized by arbitrarily combining the components described in this specification may be the present invention. The present invention also includes modifications obtained by making various modifications conceivable by those skilled in the art without departing from the gist of the present invention, that is, the meaning described in the claims. included. In addition, terms such as “parallel” and “plane” are used to allow an error that does not depart from the spirit of the present invention.

  The substrate cleaning apparatus according to the present invention can be applied to a process of cleaning an edge of a glass substrate for a display on which a drive circuit or the like is formed. In particular, cleaning of a large display glass having a size of 32 inches or more, or Suitable for high-speed cleaning of display substrates.

DESCRIPTION OF SYMBOLS 1 Substrate 3 Moving means 4 Cleaning mechanism part 7 Second moving means 8 Substrate holding part 9 Moving table 11 Presser 12 Cleaning cloth 13 Cleaning cloth supply means 14 Guide roller 15 Pressing surface 16 Inclined surface 17 Recovery reel 18 Ejection port 19 Detection sensor 22 Restriction protrusion 25 Pressing part 26 Inclining part 27 Supply reel 30 Substrate cleaning device

Claims (4)

A pressing element that presses a part of a long belt-shaped cleaning cloth disposed on the surface to be cleaned of the substrate against the substrate, and the cleaning cloth is moved relative to the substrate by moving the pressing element relative to the substrate. A substrate cleaning apparatus comprising a moving means for relatively moving and a cleaning cloth supply means for supplying a portion of a new cleaning cloth to the pressing element,
The pressing element is
A pressing portion having a pressing surface on the surface, the pressing surface being a surface that presses the cleaning cloth against the substrate, the surface being parallel to the surface to be cleaned, and having a width in the relative movement direction of the pressing element and the substrate of 5 mm or more; ,
Inclined portions that are respectively connected to both end edges of the pressing surface in the relative movement direction and have inclined surfaces on the surface that are arranged so as to gradually move away from the substrate along the relative movement direction. The two inclined surfaces having inclined surfaces having an angle selected from a range of 15 degrees or more and 25 degrees or less with respect to the pressing surface of a line connecting one end portion to the other end portion in the relative movement direction of the inclined surface. And
Two restrictions that are connected to the edge of the inclined part opposite to the pressing part, project toward the substrate with a length not exceeding the pressing surface, and restrict the displacement of the cleaning cloth relative to the pressing element. And having a protrusion
The cleaning cloth supply means includes
The cleaning cloth is arranged so as to straddle the entire relative movement direction of the pressing surface depending on the width of the cleaning cloth, and a predetermined tension is applied in the length direction of the cleaning cloth to clean the shape formed by the pressing portion and the inclined portion. A substrate cleaning apparatus which is a cleaning cloth supply means for keeping the cloth along. The substrate cleaning apparatus according to claim 1, wherein the inclined surface of the inclined portion is a curved surface that bulges outward from the pressing portion. The substrate cleaning apparatus according to claim 1, wherein a height of the inclined surface in a pressing direction in which the pressing element presses the cleaning cloth against the substrate is a length selected from a range of 0.5 mm or more and 1 mm or less. . The substrate cleaning apparatus
Including the two pressing elements disposed so as to sandwich the substrate,
The moving means is
The substrate cleaning apparatus according to claim 1, wherein the two pressing elements are relatively moved integrally along the substrate.

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