JP2011106017A5 - - Google Patents

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Publication number
JP2011106017A5
JP2011106017A5 JP2009265227A JP2009265227A JP2011106017A5 JP 2011106017 A5 JP2011106017 A5 JP 2011106017A5 JP 2009265227 A JP2009265227 A JP 2009265227A JP 2009265227 A JP2009265227 A JP 2009265227A JP 2011106017 A5 JP2011106017 A5 JP 2011106017A5
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JP
Japan
Prior art keywords
deposition
mask
pressing
target substrate
substrate
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Pending
Application number
JP2009265227A
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English (en)
Japanese (ja)
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JP2011106017A (ja
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Publication date
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Priority to JP2009265227A priority Critical patent/JP2011106017A/ja
Priority claimed from JP2009265227A external-priority patent/JP2011106017A/ja
Publication of JP2011106017A publication Critical patent/JP2011106017A/ja
Publication of JP2011106017A5 publication Critical patent/JP2011106017A5/ja
Pending legal-status Critical Current

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JP2009265227A 2009-11-20 2009-11-20 押圧装置およびそれを備えた成膜装置、および成膜方法 Pending JP2011106017A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009265227A JP2011106017A (ja) 2009-11-20 2009-11-20 押圧装置およびそれを備えた成膜装置、および成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009265227A JP2011106017A (ja) 2009-11-20 2009-11-20 押圧装置およびそれを備えた成膜装置、および成膜方法

Publications (2)

Publication Number Publication Date
JP2011106017A JP2011106017A (ja) 2011-06-02
JP2011106017A5 true JP2011106017A5 (zh) 2013-01-10

Family

ID=44229819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009265227A Pending JP2011106017A (ja) 2009-11-20 2009-11-20 押圧装置およびそれを備えた成膜装置、および成膜方法

Country Status (1)

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JP (1) JP2011106017A (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103668053A (zh) * 2012-09-07 2014-03-26 昆山允升吉光电科技有限公司 一种掩模框架及其对应的掩模组件
CN103668051A (zh) * 2012-09-07 2014-03-26 昆山允升吉光电科技有限公司 一种掩模框架及其对应的蒸镀用掩模组件
JP6108544B2 (ja) * 2013-06-17 2017-04-05 新東エスプレシジョン株式会社 マスク製造装置
KR102218644B1 (ko) * 2013-12-19 2021-02-23 삼성디스플레이 주식회사 증착 장치
JP6876520B2 (ja) * 2016-06-24 2021-05-26 キヤノントッキ株式会社 基板の挟持方法、基板の挟持装置、成膜方法、成膜装置、及び電子デバイスの製造方法、基板載置方法、アライメント方法、基板載置装置
JP6843533B2 (ja) * 2016-07-01 2021-03-17 キヤノントッキ株式会社 成膜装置及び成膜装置の制御方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005281746A (ja) * 2004-03-29 2005-10-13 Seiko Epson Corp 蒸着装置、蒸着方法、電気光学装置、および電子機器
JP4971723B2 (ja) * 2006-08-29 2012-07-11 キヤノン株式会社 有機発光表示装置の製造方法

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