JP2011099918A - Colored photosensitive resin composition, coating film, pattern and display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a colored photosensitive resin composition having a higher resolution than conventional ones. <P>SOLUTION: The colored photosensitive resin composition includes a resin, a polymerizable compound, a photoinitiator, a compound having three or more sulfanyl groups, an antioxidant, a colorant, and a solvent, wherein the resin is a copolymer comprising: a structural unit derived from at least one monomer selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides; and a structural unit derived from a monomer having a carbon-carbon double bond and an epoxy structure. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a colored photosensitive resin composition, a coating film and a pattern obtained from the composition, and a display device including the coating film and / or pattern.

  In the manufacture of the organic EL display device, in order to prevent the pixels of the organic material from coming into contact with each other, first, a partition is formed, and the pixel of the organic material is formed between the partitions. This partition is generally formed by a photolithography method (photolithography) using a photosensitive resin composition. Specifically, the photosensitive resin composition is applied onto a substrate using a coating apparatus, and after removing volatile components by means of heating or the like, it is exposed through a mask. In the case of the positive type, development is performed by removing the exposed portion with a developer such as an alkaline aqueous solution, and the resulting pattern is heat-treated to form partition walls. Next, an organic material that emits light of three colors of red, green, and blue is formed between the partition walls by an evaporation method or an inkjet method, so that a pixel of the organic EL display device is formed. In the field, there is a constant demand for improving the resolution of the photosensitive resin composition.

  As a negative photosensitive resin composition, what contains resin, a polymeric compound, a photoinitiator, and a solvent is known. For example, in Example of Patent Document 1, a photosensitive resin composition comprising a resin, a polymerizable compound, a photopolymerization initiator, a polymerization initiation assistant, an antioxidant and a solvent is disclosed, and as a part of the polymerization initiation assistant. Multifunctional thiols are used. Patent Document 1 discloses manufacturing a spacer between the color filter substrate and the array substrate using the photosensitive resin composition, but does not disclose any manufacturing of the partition wall. Further, Patent Document 1 does not disclose the use of a colorant in the composition.

JP 2008-181087 A

  The objective of this invention is providing the colored photosensitive resin composition which shows the resolution higher than a conventional product (for example, photosensitive resin composition of patent document 1).

  The colored photosensitive resin composition of the present invention that has achieved the above object includes a resin, a polymerizable compound, a photopolymerization initiator, a compound having three or more sulfanyl groups, an antioxidant, a colorant, and a solvent. A structural unit derived from at least one monomer selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride; a carbon-carbon double bond (ie, an olefinic double bond) And a structural unit derived from a monomer having an epoxy structure.

  The content of the colorant is preferably 3 to 10 parts by mass with respect to 100 parts by mass of the solid content of the colored photosensitive resin composition. It is preferable that the colorant contains at least one selected from the group consisting of a yellow pigment and a green pigment. Among the colored photosensitive compositions of the present invention, those having a light transmittance of a pattern formed using the colored photosensitive resin composition of 0.1% or more and 30% or less per 3 μm film thickness at a wavelength of 400 nm. preferable.

  The monomer having a carbon-carbon double bond and an epoxy structure is preferably at least one selected from the group consisting of a compound represented by formula (b1) and a compound represented by formula (b2). Hereinafter, the “compound represented by the formula (b1)” may be abbreviated as “monomer (b1)”. Similarly, compounds represented by other chemical formulas may be abbreviated.

In Formula (b1) and Formula (b2), R ¹ represents a hydrogen atom or a C _1-4 saturated aliphatic hydrocarbon group, and the hydrogen atom of the saturated aliphatic hydrocarbon group is substituted with —OH. Also good.
L ¹ represents a single bond or a divalent C _1-6 saturated aliphatic hydrocarbon group, and —CH ₂ — of the divalent saturated aliphatic hydrocarbon group represents —O—, —S— or —NR. ² - may be substituted with, said R ² represents a hydrogen atom or a C _1-10 saturated aliphatic hydrocarbon group.

R ¹ and L ¹ in formula (b1) may be the same as or different from R ¹ and L ¹ in formula (b2), respectively. Similarly, symbols common to other formulas in the present specification may be the same or different from each other. Further, “a divalent saturated aliphatic hydrocarbon group in which —CH ₂ — is substituted with —O—” or the like means “apparently, —CH ₂ — of a divalent saturated aliphatic hydrocarbon group is — A group obtained by, for example, synthesizing a divalent saturated aliphatic hydrocarbon group and then substituting —CH ₂ — with —O— or the like. Is not meant. Expressions such as “saturated aliphatic hydrocarbon group in which a hydrogen atom is substituted with —OH” have the same meaning.

  The photopolymerization initiator is preferably a biimidazole compound.

  The present invention also provides a coating film and a pattern formed using the colored photosensitive resin composition. The pattern of the present invention is preferably used as a partition wall of a pixel of an organic EL display device. The present invention also provides an organic EL display device and a liquid crystal display device including at least one selected from the group consisting of the coating film and the pattern.

  According to the colored photosensitive resin composition of the present invention, a pattern can be obtained with higher resolution.

  The composition of the present invention comprises a resin (A), a polymerizable compound (B), a photopolymerization initiator (C), a compound (E) having three or more sulfanyl groups (hereinafter referred to as “trifunctional or higher thiol (E ) "), An antioxidant (F), a colorant (G), and a solvent (J), and if necessary, a polymerization initiation assistant (D) and other additives (H). It may be. As long as there is no notice in particular, said each component may be used individually by 1 type, and may use 2 or more types together.

Trifunctional or higher thiol (E) improves the sensitivity of the composition to light. The antioxidant (F) captures radicals generated from the photopolymerization initiator (C), thereby preventing excessive curing in the non-exposed portion and contributing to improvement in resolution. The colorant (G) prevents excessive curing in the non-exposed area by suppressing the transmission of light into the composition and contributes to the improvement of the resolution. By using a combination of tri- or higher functional thiol (E), antioxidant (F) and colorant (G) having such an action, the composition of the present invention can achieve excellent resolution.
Hereinafter, each component contained in the composition of this invention is demonstrated in order.

<Resin (A)>
The resin (A) comprises a structural unit derived from at least one monomer (a) selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride; a carbon-carbon double bond and an epoxy structure And a structural unit derived from the monomer (b). A monomer (a) and a monomer (b) may be used individually by 1 type, respectively, and may use 2 or more types together, respectively.

As the monomer (a), for example,
(Meth) acrylic acid, crotonic acid, cinnamic acid, o-, m-, p-vinylbenzoic acid, succinic acid mono [2- (meth) acryloyloxyethyl], phthalic acid mono [2- (meth) acryloyloxyethyl) ], Ω-carboxypolycaprolactone mono (meth) acrylate, 5-carboxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-carboxy-5-ethylbicyclo [2.2.1] hept Unsaturation such as 2-ene, 5-carboxy-6-methylbicyclo [2.2.1] hept-2-ene, 5-carboxy-6-ethylbicyclo [2.2.1] hept-2-ene Monocarboxylic acids;
Maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyl Unsaturated dicarboxylic acids such as tetrahydrophthalic acid, 1,4-cyclohexene dicarboxylic acid, methyl-5-norbornene-2,3-dicarboxylic acid;
Maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6- Unsaturated dicarboxylic acid anhydrides such as tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo [2.2.1] hept-2-ene anhydride (hymic acid anhydride);
Etc.

  In the present specification, “(meth) acrylic acid” represents at least one selected from the group consisting of acrylic acid and methacrylic acid. Notations such as “(meth) acryloyl” and “(meth) acrylate” have the same meaning.

  From the viewpoints of copolymerization reactivity and alkali solubility, the monomer (a) is preferably at least one selected from the group consisting of (meth) acrylic acid and maleic anhydride, more preferably methacrylic acid. .

The epoxy structure in monomer (b) is
(1) a structure having a monocyclic oxirane ring (hereinafter abbreviated as “aliphatic epoxy structure”), and (2) a structure in which an aliphatic hydrocarbon ring and an oxirane ring are condensed (hereinafter referred to as “alicyclic epoxy structure”). For short)
Can be classified. Furthermore, the alicyclic epoxy structure
(2-1) The aliphatic hydrocarbon ring is monocyclic (hereinafter referred to as “aliphatic monocyclic epoxy structure”), and (2-2) the aliphatic hydrocarbon ring is polycyclic. (Hereinafter abbreviated as “aliphatic polycyclic epoxy structure”)
Can be classified. Among these, an alicyclic epoxy structure is preferable, and an aliphatic polycyclic epoxy structure is more preferable.

Examples of the monomer (b) having an aliphatic epoxy structure include glycidyl (meth) acrylate, β-methylglycidyl (meth) acrylate, β-ethylglycidyl (meth) acrylate, glycidyl vinyl ether, and JP-A-7-248625. Examples include compounds represented by the formula (b3) described in the publication {in the formula (b3), R ^{3 to} R ⁵ each independently represent a hydrogen atom or a C _1-10 alkyl group. m1 represents an integer of 1 to 5. }.

  Examples of the monomer (b3) having an aliphatic epoxy structure include o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzyl glycidyl ether, α -Methyl-m-vinylbenzylglycidyl ether, α-methyl-p-vinylbenzylglycidyl ether, 2,3-bis (glycidyloxymethyl) styrene, 2,4-bis (glycidyloxymethyl) styrene, 2,5-bis (Glycidyloxymethyl) styrene, 2,6-bis (glycidyloxymethyl) styrene, 2,3,4-tris (glycidyloxymethyl) styrene, 2,3,5-tris (glycidyloxymethyl) styrene, 2,3 , 6-Tris (glycidyloxymethyl) Ren, 3,4,5-tris (glycidyloxy) styrene, and 2,4,6-tris (glycidyloxy-methyl) styrene and the like.

  Examples of the monomer (b) having an aliphatic monocyclic epoxy structure include 1,2-epoxy-4-vinylcyclohexane (for example, Celoxide 2000; manufactured by Daicel Chemical Industries, Ltd.), 2,3-epoxy. Cyclohexylmethyl (meth) acrylate, 3,4-epoxycyclohexylmethyl methacrylate (for example, Cyclomer A400; manufactured by Daicel Chemical Industries, Ltd.), 3,4-epoxycyclohexylmethyl methacrylate (for example, Cyclomer M100; Daicel Chemical Industry ( Etc.).

  The monomer (b) having an aliphatic polycyclic epoxy structure may have a carbon-carbon double bond in a polycyclic aliphatic hydrocarbon group, and in a side chain bonded to the ring. You may have. Examples of the polycycle include a norbornane ring and a tricyclodecane ring. Among these, a tricyclodecane ring is preferable.

  Examples of the monomer (b) having an aliphatic polycyclic epoxy structure include epoxy norbornyl (meth) acrylate {for example, 3,4-epoxynorbornyl (meth) acrylate}, represented by the formula (b1). And a compound represented by the formula (b2).

In Formula (b1) and Formula (b2), R ¹ represents a hydrogen atom or a C _1-4 saturated aliphatic hydrocarbon group, and the hydrogen atom of the saturated aliphatic hydrocarbon group is substituted with —OH. Also good. L ¹ represents a single bond or a divalent C _1-6 saturated aliphatic hydrocarbon group, and —CH ₂ — of the divalent saturated aliphatic hydrocarbon group represents —O—, —S— or —NR. ² - may be substituted with, said R ² represents a hydrogen atom or a C _1-10 saturated aliphatic hydrocarbon group.

Examples of the saturated aliphatic hydrocarbon group which may be substituted with the hydroxy group of R ¹ include, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, sec-butyl group, tert-butyl group, hydroxymethyl Group, 1-hydroxyethyl group, 2-hydroxyethyl group, 1-hydroxypropyl group, 2-hydroxypropyl group, 3-hydroxypropyl group, 1-hydroxy-1-methylethyl group, 2-hydroxy-1-methylethyl Group, 1-hydroxybutyl group, 2-hydroxybutyl group, 3-hydroxybutyl group, 4-hydroxybutyl group and the like. R ¹ is preferably a hydrogen atom, a methyl group, a hydroxymethyl group, a 1-hydroxyethyl group, or a 2-hydroxyethyl group, and more preferably a hydrogen atom or a methyl group.

Examples of the divalent saturated aliphatic hydrocarbon group optionally substituted by L ¹ —O— or the like include a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,2-diyl group, Butane-1,4-diyl group, butane-1,3-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, methyleneoxy group (—CH ₂ —O—), ethyleneoxy Group {— (CH ₂ ) ₂ —O—}, propanediyloxy group {— (CH ₂ ) ₃ —O— etc.}, methylenesulfanediyl group (—CH ₂ —S—), ethylenesulfanediyl group { — (CH ₂ ) ₂ —S—}, propanediylsulfanediyl group {— (CH ₂ ) ₃ —S— etc.}, methyleneimino group (—CH ₂ —NH—), ethyleneimino group {— (CH ₂ ) ₂ -NH-}, pro Panjii Louis amino group {- (CH _{2) 3} NH- and the like} and the like. L ¹ is preferably a single bond, a methylene group, an ethylene group, a methyleneoxy group, an ethyleneoxy group, an ethylenesulfanediyl group, or an ethyleneimino group, and more preferably a single bond or an ethyleneoxy group.

  As the monomer (b1) and the monomer (b2), one type may be used alone, or two or more types may be used in combination. Further, a mixture of the monomer (b1) and the monomer (b2) may be used. When these mixtures are used, the molar ratio of monomer (b1): monomer (b2) is preferably 5:95 to 95: 5, more preferably 10:90 to 90:10, still more preferably 20:80 to 80:20.

  A preferred monomer (b1) is represented by any one of formulas (b1-1) to (b1-15). Among these, monomer (b1-1), monomer (b1-3), monomer (b1-5), monomer (b1-7), monomer (b1-9), and Monomer (b1-11) to monomer (b1-15) are more preferred, and monomer (b1-1), monomer (b1-7), monomer (b1-9), and monomer The monomer (b1-15) is more preferable.

  A preferred monomer (b2) is represented by any one of formulas (b2-1) to (b2-15). Among these, monomer (b2-1), monomer (b2-3), monomer (b2-5), monomer (b2-7), monomer (b2-9), and Monomer (b2-11) to monomer (b2-15) are more preferred, and monomer (b2-1), monomer (b2-7), monomer (b2-9), and monomer The monomer (b2-15) is more preferable.

  The resin (A) may contain a structural unit derived from the monomer (c) different from the monomer (a) and the monomer (b). A monomer (c) may be used individually by 1 type, and may use 2 or more types together.

Examples of the monomer (c) include carboxylic acid esters having a carbon-carbon double bond, amides having a carbon-carbon double bond, and a polymerizable unsaturated bond (carbon-carbon double bond in the side chain). Aromatic compounds having a bond or triple bond), substituted vinyl compounds, N-substituted maleimides, dienes, polycyclic unsaturated compounds, and the like. For more information;
Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, isobornyl ( Meth) acrylate, tricyclo [5.2.1.0 ^2,6 ] decan-8-yl (meth) acrylate (sometimes referred to by the common name “dicyclopentanyl (meth) acrylate” in the art) 4-tricyclo [5.2.1.0 ^2,6 ] decen-8-yl (meth) acrylate, 5-tricyclo [5.2.1.0 ^2,6 ] decen-8-yl (meth) acrylate , Phenyl (meth) acrylate, aminoethyl (meth) acrylate, diethyl maleate, fumaric acid Ethyl, unsaturated carboxylic acid esters such as itaconic acid diethyl;
Carboxylic acid vinyl esters such as vinyl acetate or vinyl propionate;
Amides having a carbon-carbon double bond such as dimethyl (meth) acrylamide and isopropyl (meth) acrylamide;
An aromatic compound having a polymerizable unsaturated bond in the side chain, such as styrene, α-methylstyrene, vinyltoluene, p-methoxystyrene;
Vinyl cyanide compounds such as acrylonitrile, methacrylonitrile or α-chloro (meth) acrylonitrile;
Halogenated vinyl compounds such as chloroethylene, dichloroethylene, trichloroethylene, fluoroethylene, difluoroethylene, trifluoroethylene, tetrafluoroethylene;
N-substituted maleimides such as N-methylmaleimide, N-ethylmaleimide, N-butylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-phenylmaleimide;
Dienes such as 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene;
Bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2.2.1] hept-2-ene, 5- Hydroxybicyclo [2.2.1] hept-2-ene, 5-hydroxymethylbicyclo [2.2.1] hept-2-ene, 5- (2′-hydroxyethyl) bicyclo [2.2.1] Hept-2-ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxybicyclo [2.2.1] hept-2-ene, 5,6-dihydroxybicyclo [2.2 .1] Hept-2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept-2-ene, 5,6-di (2′-hydroxyethyl) bicyclo [2.2. 1] hept-2-ene, 5,6-dimethoxybicyclo [2.2 1] hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-methylbicyclo [2.2.1] hept-2-ene, 5 -Hydroxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-hydroxymethyl-5-methylbicyclo [2.2.1] hept-2-ene, 5-cyclohexyloxycarbonylbicyclo [2] 2.1] hept-2-ene, 5-phenoxycarbonylbicyclo [2.2.1] hept-2-ene, 5,6-di (cyclohexyloxycarbonyl) bicyclo [2.2.1] hept-2 -Polycyclic unsaturated compounds such as ene;
Etc. Among these, benzyl acrylate, styrene, N-cyclohexylmaleimide, N-benzylmaleimide, N-phenylmaleimide, and bicyclo [2.2.1] hept-2-ene are preferable.

  Examples of the monomer (c) include a monomer having an oxetane structure and a monomer having a tetrahydrofuran structure.

  Examples of the monomer having an oxetane structure include 3- (meth) acryloxymethyl oxetane, 3-methyl-3- (meth) acryloxymethyl oxetane, 3-ethyl-3- (meth) acryloxymethyl oxetane, 3-methyl-3- [1- (meth) acryloxy] methyl oxetane, 3-ethyl-3- [1- (meth) acryloxy] methyl oxetane, 3-methyl-3- [1- (meth) acryloxy] ethyl oxetane 3-ethyl-3- [1- (meth) acryloxy] ethyl oxetane, 2-phenyl-3- (meth) acryloxymethyl oxetane, 2-trifluoromethyl-3- (meth) acryloxymethyl oxetane, 2- Pentafluoroethyl-3- (meth) acryloxymethyloxetane, 3-methyl-3- (meth) acrylo Cyethyl oxetane, 3-methyl-3- (meth) acryloxyethyl oxetane, 2-phenyl-3- (meth) acryloxyethyl oxetane, 2-trifluoromethyl-3- (meth) acryloxyethyl oxetane or 2- Examples include pentafluoroethyl-3- (meth) acryloxyethyl oxetane and 3- (meth) acryloxyoxetane. Among these, 3-ethyl-3- (meth) acryloxymethyl oxetane is preferable.

  Examples of the monomer having a tetrahydrofuran structure include tetrahydrofurfuryl (meth) acrylate, tetrahydrofurylmethoxyethyl (meth) acrylate, tetrahydrofurylmethoxypropyl (meth) acrylate, and the like.

  When the resin (A) is a copolymer of the monomer (a) and the monomer (b), the structural unit derived from the monomer (a) among all the structural units of the copolymer is: It is preferably 2 to 98 mol% (more preferably 5 to 60 mol%, still more preferably 10 to 50 mol%), and the structural unit derived from the monomer (b) is preferably 2 to 98 mol% ( More preferably, it is 40-95 mol%, More preferably, it is 50-90 mol%. If it is this range, there exists a tendency for the storage stability and developability of a composition, the residual film rate of a cured coating film or a pattern, and solvent resistance to become favorable.

  When the resin (A) is a copolymer of the monomer (a), the monomer (b), and the monomer (c), the monomer (a) in all the structural units of the copolymer The derived structural unit is 2 to 97 mol%, the structural unit derived from the monomer (b) is 2 to 97 mol%, and the structural unit derived from the monomer (c) is 1 to 96 mol%. It is preferable that If it is this range, there exists a tendency for storage stability, heat resistance, and mechanical strength to become favorable. More preferably, among all structural units of the copolymer of monomer (a), monomer (b) and monomer (c), the structural unit derived from monomer (a) is 10 to 50 mol. %, The structural unit derived from the monomer (b) is 20 to 80 mol%, and the structural unit derived from the monomer (c) is 10 to 70 mol%. If it is this range, there exists a tendency for developability, a residual film rate, and solvent resistance to also become favorable.

  Resin (A) is, for example, a method described in the document “Experimental Methods for Polymer Synthesis” (Takayuki Otsu, published by Kagaku Dojin Co., Ltd., First Edition, First Edition, issued March 1, 1972) and the document Can be produced by polymerizing monomers with reference to the literature cited in the above. More specifically, a predetermined amount of the monomer (a) and the monomer (b), and optionally the monomer (c), a polymerization initiator, and a solvent are charged into a reaction vessel, and in the absence of nitrogen-substituted oxygen. The copolymer can be produced by stirring, heating and keeping warm. What is necessary is just to adjust suitably the preparation method and reaction temperature of this copolymerization, considering the production equipment, the calorific value by superposition | polymerization, etc.

  For the obtained copolymer, the solution after the reaction may be used as it is. In particular, if the solvent (J) described later is used as a polymerization solvent, it can be used as it is in the composition without removing the solvent from the copolymer solution after polymerization, and the production process can be simplified. Further, the copolymer solution may be concentrated or diluted. Further, a copolymer taken out as a solid (powder) by a method such as reprecipitation may be used.

  The resin (A) may further have a structural unit (d) having a carbon-carbon double bond in the side chain. The structural unit (d) preferably has a 1-alkyl-1-ethenecarbonyl group, more preferably a (meth) acryloyl group at the end, as represented by the formula (d1) or the formula (d2).

In formula (d1) and formula (d2), R ⁶ and R ⁷ each independently represents a hydrogen atom or a C _1-6 alkyl group (preferably a hydrogen atom or a methyl group). In addition, * mark in a formula (d1) and a formula (d2) represents the coupling | bonding position in a structural unit (d1) and a structural unit (d2), respectively. The same applies to other chemical formulas.

The structural unit (d) having a carbon-carbon double bond in the side chain is obtained by copolymerizing the monomer (a) and the monomer (b), and optionally the monomer (c). A carboxy group or a carbonyloxycarbonyl group (carboxylic acid anhydride structure) derived from (a) is subjected to a carbon-carbon double bond and a cyclic ether structure in the same manner as in, for example, the method described in JP-A-2005-189574. It can be formed by adding a compound having the same (hereinafter abbreviated as “cyclic ether addition compound”). Examples of the cyclic ether addition compound include a monomer (b) having an epoxy structure as represented by the formula (b4) or the formula (b5), or a monomer (c) having an oxetane structure or a tetrahydrofuran structure. [In formula (b4) or formula (b5), R ⁷ is as defined above. ].

  Specifically, the structural unit (d) having a carbon-carbon double bond in the side chain can be formed as follows. Monomer (a), monomer (b), and optionally monomer (c), after copolymerizing the atmosphere in the reaction vessel from nitrogen to air, the monomer used for copolymerization 5-80 mol% of the cyclic ether addition compound is added to the amount of (a). Next, 0.001 to 5% by mass of a reaction catalyst (for example, trisdimethylaminomethylphenol) and 0.001 to 5% with respect to the total amount of the monomer (a) and the cyclic ether addition compound used in the copolymer A mass% polymerization inhibitor (for example, hydroquinone) is added and reacted at 60 to 130 ° C. for 1 to 10 hours. As in the case of copolymerization, in this addition reaction, the charging method and the reaction temperature may be appropriately adjusted in consideration of the production equipment, the amount of heat generated by the addition reaction, and the like.

  In this addition reaction, the amount of the cyclic ether addition compound is preferably 10 to 75 mol%, more preferably 15 to 70 mol%, based on the amount of the monomer (a) used for copolymerization. Within this range, the balance of storage stability, developability, solvent resistance, heat resistance, mechanical strength and sensitivity tends to be good.

  As the copolymer containing the structural unit (d) having a carbon-carbon double bond in the side chain, the solution after the reaction may be used as it is, or it may be concentrated or diluted. Further, a copolymer taken out as a solid (powder) by a method such as reprecipitation may be used.

  The acid value of the resin (A) is preferably 50 to 150 (mgKOH / g), more preferably 60 to 135 (mgKOH / g), and still more preferably 70 to 135 (mgKOH / g). If it is this range, the solubility with respect to a developing solution will improve, and it will become easy to melt | dissolve an unexposed part. Here, the acid value is a value measured as the amount (mg) of potassium hydroxide necessary to neutralize 1 g of the acrylic acid polymer, and is usually determined by titration using an aqueous potassium hydroxide solution. it can.

  The weight average molecular weight of the resin (A) is preferably 2,000 to 100,000 (more preferably 2,000 to 50,000, still more preferably 3,000 to 30,000). If it is this range, the applicability | paintability of a composition will be favorable and there exists a tendency for a high developing speed to be obtained, maintaining the residual film rate at the time of image development. The weight average molecular weight is determined by gel permeation chromatography using polystyrene as a standard.

  The molecular weight distribution {namely, weight average molecular weight (Mw) / number average molecular weight (Mn)} of the resin (A) is preferably 1.1 to 6.0 (more preferably 1.2 to 4.0). Within this range, the developability tends to be excellent.

  The content of the resin (A) in the composition is preferably 5 to 90% by mass (more preferably 10 to 70% by mass) with respect to the solid content of the composition. If it is this range, the solubility to a developing solution will be enough and it will become difficult to generate | occur | produce a development residue on the board | substrate of a non-exposed part (non-pixel part). Further, during development, the exposed portion (pixel portion) is not easily reduced in film thickness, and the remaining film ratio tends to increase. In the present specification and claims, the “solid content of the composition” means “the total of each component of the composition excluding the solvent”. This solid content can be measured by known means such as gas chromatography or liquid chromatography.

<Polymerizable compound (B)>
The polymerizable compound (B) is a compound that is polymerized by an active radical or an acid generated from the photopolymerization initiator (C) by light irradiation, and examples thereof include a compound having a polymerizable carbon-carbon unsaturated bond. . The polymerizable compound (B) is preferably a polymerizable compound having three or more carbon-carbon unsaturated bonds (hereinafter referred to as “trifunctional or higher functional polymerizable compound”).

  Examples of the trifunctional or higher functional polymerizable compound include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate, and ethoxylated trimethylolpropane tri. (Meth) acrylate, propoxylated trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tripentaerythritol tetra (meth) acrylate , Tripentaerythritol penta (meth) acrylate, tripentaerythritol hexa (meth) acrylate, tripentaerythritol hepta (meta Acrylate, tripentaerythritol octa (meth) acrylate, reaction product of pentaerythritol tri (meth) acrylate and acid anhydride, reaction product of dipentaerythritol penta (meth) acrylate and acid anhydride, tripentaerythritol hepta (meta ) Reaction product of acrylate and acid anhydride, caprolactone-modified trimethylolpropane tri (meth) acrylate, caprolactone-modified pentaerythritol tri (meth) acrylate, caprolactone-modified tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate, caprolactone Modified pentaerythritol tetra (meth) acrylate, caprolactone modified dipentaerythritol penta (meth) acrylate, caprolactone modified dipentaerythritol Ruhexa (meth) acrylate, caprolactone-modified tripentaerythritol tetra (meth) acrylate, caprolactone-modified tripentaerythritol penta (meth) acrylate, caprolactone-modified tripentaerythritol hexa (meth) acrylate, caprolactone-modified tripentaerythritol hepta (meth) acrylate, Caprolactone-modified tripentaerythritol octa (meth) acrylate, reaction product of caprolactone-modified pentaerythritol tri (meth) acrylate and acid anhydride, reaction product of caprolactone-modified dipentaerythritol penta (meth) acrylate and acid anhydride, caprolactone modification Examples include a reaction product of tripentaerythritol hepta (meth) acrylate and an acid anhydride.

  Among these, pentaerythritol tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, and dipentaerythritol hexa (meth) acrylate are preferable. Pentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate are more preferable, and dipentaerythritol hexaacrylate is more preferable.

  The content of the polymerizable compound (B) is preferably 20 to 70 parts by mass (more preferably 25 to 60 parts by mass, further preferably 30 to 50 parts by mass) with respect to 100 parts by mass of the solid content of the composition. is there. If it is this range, hardening will fully occur, the film thickness will be prevented from decreasing before and after development, and it will be difficult for the pattern to be undercut, and the pattern will tend to have good adhesion. Moreover, if it is this range, there exists a tendency for the sensitivity of a composition and the intensity | strength of a coating film and a pattern, smoothness, heat resistance, and chemical resistance to become favorable.

<Photopolymerization initiator (C)>
The photopolymerization initiator (C) is a compound that initiates polymerization by generating an active radical, an acid, or the like by light irradiation, and a known photopolymerization initiator can be used.

  Examples of the photopolymerization initiator (C) include biimidazole compounds, acetophenone compounds, triazine compounds, acylphosphine oxide compounds, oxime compounds, benzoin compounds, and benzophenone compounds. Among these, a biimidazole compound, an acetophenone compound, an oxime compound, and a triazine compound are preferable, and a biimidazole compound excellent in sensitivity is more preferable.

  Examples of the biimidazole compound include 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole and 2,2′-bis (2,3-dichlorophenyl) -4,4. ', 5,5'-tetraphenylbiimidazole (see, for example, JP-A-6-75372 and JP-A-6-75373), 2,2'-bis (2-chlorophenyl) -4,4' , 5,5′-tetra (alkoxyphenyl) biimidazole, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetra (dialkoxyphenyl) biimidazole, 2,2′- Bis (2-chlorophenyl) -4,4 ′, 5,5′-tetra (trialkoxyphenyl) biimidazole (for example, Japanese Patent Publication No. 48-38403, Japanese Patent Application Laid-Open No. 62-174204) And an imidazole compound in which the phenyl group at the 4,4 ′, 5,5 ′ position is substituted with an alkoxycarbonyl group (—COOR) (for example, see JP-A-7-10913). .

  Among these, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole {particularly 2,2′-bis (2-chlorophenyl) -4,4 ′, 5 , 5′-tetraphenyl-1,2′-biimidazole}, 2,2′-bis (2,3-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′- Bis (2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole is preferred.

  Examples of the acetophenone compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 2-hydroxy-1- [4- (2-hydroxyethoxy) phenyl] -2- Methylpropan-1-one, 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] -phenyl} -2-methyl-propan-1-one, 1-hydroxy Cyclohexyl phenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2 -(2-methylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2 (3-methylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (4-methylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-ethylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-propylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-butylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2,3-dimethylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2,4-Dimethylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-chlorobenzyl) 2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-bromobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-chlorobenzyl) 2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (4-chlorobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-bromobenzyl) 2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (4-bromobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-methoxybenzyl) 2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-methoxybenzyl) -2-dimethylamino-1- (4- Morpholinophenyl) -butanone, 2- (4-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-methyl-4-methoxybenzyl) -2-dimethylamino-1 -(4-morpholinophenyl) -butanone, 2- (2-methyl-4-bromobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-bromo-4-methoxybenzyl) ) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, oligomers of 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propan-1-one, and the like. .

  As triazine compounds, 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxystyryl)- 1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis ( Trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methyl) Phenyl) etheni ] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine.

  Examples of the acylphosphine oxide compound include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, and the like.

  Examples of the oxime compound include O-acyloxime compounds, and specific examples thereof include 1- (4-phenylsulfanylphenyl) -butane-1,2-dione 2-oxime-O-benzoate, 1- ( 4-phenylsulfanylphenyl) -octane-1,2-dione 2-oxime-O-benzoate, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone 1- O-acetate, 1- [9-ethyl-6- (2-methyl-4- (3,3-dimethyl-2,4-dioxacyclopentanylmethyloxy) benzoyl) -9H-carbazol-3-yl] And ethanone 1-O-acetate.

  Examples of the benzoin compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and the like.

  Examples of the benzophenone compound include benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4′-methyldiphenyl sulfide, 3,3 ′, 4,4′-tetra (tert-butylperoxycarbonyl). ) Benzophenone, 2,4,6-trimethylbenzophenone and the like.

  Furthermore, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene compound, etc. are used as the photopolymerization initiator (C). May be.

  Further, as the photopolymerization initiator (C), a polymerization initiator having a group capable of causing chain transfer as described in JP-T-2002-544205 may be used. In addition, the polymerization initiator which has the group which can raise | generate a chain transfer can also be used for the copolymerization of resin (A), and can be integrated as a structural unit of resin (A).

  Examples of the polymerization initiator having a group capable of causing chain transfer include polymerization initiators represented by formulas (C1) to (C6).

  The content of the photopolymerization initiator (C) is preferably 0.1 to 20 parts by mass (more preferably 0.5 to 15 parts by mass, further preferably 100 parts by mass of the solid content of the composition). Is 1-10 parts by mass). If it is this range, a composition will become highly sensitive with respect to light, and there exists a tendency for the intensity | strength and smoothness of the coating film and pattern which were formed using this composition to become favorable.

<Polymerization initiation aid (D)>
The composition of the present invention may contain a polymerization initiation assistant (D) as necessary. The polymerization initiation assistant (D) is usually used in combination with the photopolymerization initiator (C), and is used to accelerate the polymerization initiated by the photopolymerization initiator (C).

  When the polymerization initiation assistant (D) is used, the content thereof is preferably 0.01 to 50 parts by mass (more preferably, relative to 100 parts by mass of the resin (A) and the polymerizable compound (B). 0.1 to 40 parts by mass). If the polymerization initiation aid (D) in this range is used, the sensitivity of the resulting composition to light is further increased, and the productivity of a coating film or pattern formed using this composition tends to be improved.

  Examples of the polymerization initiation aid (D) include amine compounds, thioxanthone compounds, and carboxylic acid compounds.

  Examples of amine compounds include aliphatic amines such as triethanolamine, methyldiethanolamine, and triisopropanolamine; methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4-dimethylamino 2-ethylhexyl benzoate, 2-dimethylaminoethyl benzoate, N, N-dimethylparatoluidine, 4,4′-bis (dimethylamino) benzophenone (common name: Michler's ketone), 4,4′-bis (diethylamino) benzophenone, etc. And aromatic amines. Moreover, as an amine compound, you may use commercial items, such as brand name "EAB-F" (Hodogaya Chemical Co., Ltd. product).

  Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, and the like.

  Carboxylic acid compounds include (phenylthio) acetic acid, (methylphenylthio) acetic acid, (ethylphenylthio) acetic acid, (methylethylphenylthio) acetic acid, (dimethylphenylthio) acetic acid, (methoxyphenylthio) acetic acid, (dimethoxyphenyl) Aromatic heteroacetic acids such as thio) acetic acid, (chlorophenylthio) acetic acid, (dichlorophenylthio) acetic acid, N-phenylglycine, phenoxyacetic acid, (naphthylthio) acetic acid, N-naphthylglycine, and naphthoxyacetic acid.

  As the polymerization initiation assistant (D), a compound represented by the formula (D1) may be used.

In formula (D1), W ¹ represents a C _6-12 aromatic ring, and the hydrogen atom of the aromatic ring may be substituted with a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, etc.). L ² represents an oxygen atom (—O—) or a sulfur atom (—S—). R ¹⁰ represents a linear, branched or cyclic C _1-6 aliphatic hydrocarbon group. R ¹¹ represents a linear, branched or cyclic C _1-12 aliphatic hydrocarbon group, or a C _6-12 aromatic hydrocarbon group, and the aliphatic hydrocarbon group and the aromatic carbon group The hydrogen atom of the hydrogen group may be substituted with a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, etc.).

Examples of the aromatic ring of W ¹ include benzene ring, methylbenzene ring, dimethylbenzene ring, ethylbenzene ring, propylbenzene ring, butylbenzene ring, pentylbenzene ring, hexylbenzene ring, cyclohexylbenzene ring, naphthalene ring, and phenylbenzene ring. Can be mentioned. Examples of the halogenated aromatic ring for W ¹ include a chlorobenzene ring, a dichlorobenzene ring, a bromobenzene ring, a dibromobenzene ring, a chlorophenylbenzene ring, a bromophenylbenzene ring, a chloronaphthalene ring, and a bromonaphthalene ring. W ¹ is preferably a benzene ring (phenylene group) or a naphthalene ring (naphthylene group).

As the aliphatic hydrocarbon group for R ¹⁰ , a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a 2-butyl group, a 2-methylpropyl group, a tert-butyl group, a pentyl group, a 2-pentyl group, Examples thereof include 2-methylbutyl group, 3-methylbutyl group, 1,1-dimethylpropyl group, 1,2-dimethylpropyl group, 2,2-dimethylpropyl group, hexyl group, cyclopentyl group, cyclohexyl group and the like. R ¹⁰ is preferably a methyl group.

As the aliphatic hydrocarbon group for R ¹¹ , in addition to the groups listed for R ¹⁰ , heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, cycloheptyl group, methylcyclohexyl group, hexylcyclohexyl group , Norbornyl group, adamantyl group and the like. Examples of the halogenated aliphatic hydrocarbon group for R ¹¹ include a trifluoromethyl group, a 1-chlorobutyl group, a 2-chlorobutyl group, a 3-chlorobutyl group, a 1-bromohexyl group, and a 2-bromododecyl group. Examples of the aromatic hydrocarbon group represented by R ¹¹ include a phenyl group, a methylphenyl group, a dimethylphenyl group, an ethylphenyl group, a propylphenyl group, a butylphenyl group, a pentylphenyl group, a hexylphenyl group, a cyclohexylphenyl group, and a naphthyl group. And biphenylyl group. Examples of the halogenated aromatic hydrocarbon group for R ¹¹ include chlorophenyl group, dichlorophenyl group, bromophenyl group, dibromophenyl group, chlorophenylphenyl group, bromophenylphenyl group, chloronaphthyl group, and bromonaphthyl group. R ¹¹ is preferably a phenyl group, a biphenylyl group, or a naphthyl group.

  Examples of the polymerization initiation assistant (D1) include 2-benzoylmethylene-3-methylnaphtho [2,1-d] thiazoline, 2-benzoylmethylene-3-methylnaphtho [1,2-d] thiazoline, 2-benzoylmethylene. -3-methylnaphtho [2,3-d] thiazoline, 2- (2-naphthoylmethylene) -3-methylbenzothiazoline, 2- (1-naphthoylmethylene) -3-methylbenzothiazoline, 2- (2- Naphthoylmethylene) -3-methyl-5-phenylbenzothiazoline, 2- (1-naphthoylmethylene) -3-methyl-5-phenylbenzothiazoline, 2- (2-naphthoylmethylene) -3-methyl-5 -Fluorobenzothiazoline, 2- (1-naphthoylmethylene) -3-methyl-5-fluorobenzothiazoline, 2- (2-naphtho Ylmethylene) -3-methyl-5-chlorobenzothiazoline, 2- (1-naphthoylmethylene) -3-methyl-5-chlorobenzothiazoline, 2- (2-naphthoylmethylene) -3-methyl-5-bromo Benzothiazoline, 2- (1-naphthoylmethylene) -3-methyl-5-bromobenzothiazoline, 2- (4-phenylbenzoylmethylene) -3-methylbenzothiazoline, 2- (4-phenylbenzoylmethylene) -3 -Methyl-5-phenylbenzothiazoline, 2- (2-naphthoylmethylene) -3-methylnaphtho [2,1-d] thiazoline, 2- (2-naphthoylmethylene) -3-methylnaphtho [1,2-d ] Thiazoline, 2- (4-phenylbenzoylmethylene) -3-methylnaphtho [2,1-d] thiazoline, 2- (4-phenyl) Nylbenzoylmethylene) -3-methylnaphtho [1,2-d] thiazoline, 2- (p-fluorobenzoylmethylene) -3-methylnaphtho [2,1-d] thiazoline, 2- (p-fluorobenzoylmethylene) -3 -Methylnaphtho [1,2-d] thiazoline, 2-benzoylmethylene-3-methylnaphtho [2,1-d] oxazoline, 2-benzoylmethylene-3-methylnaphtho [1,2-d] oxazoline, 2-benzoylmethylene- 3-methylnaphtho [2,3-d] oxazoline, 2- (2-naphthoylmethylene) -3-methylbenzoxazoline, 2- (1-naphthoylmethylene) -3-methylbenzoxazoline, 2- (2-naphtho Ylmethylene) -3-methyl-5-phenylbenzoxazoline, 2- (1-naphthoylmethylene) -3-methyl-5-phenylbenzoxazoline, 2- (2-naphthoylmethylene) -3-methyl-5-fluorobenzoxazoline, 2- (1-naphthoylmethylene) -3-methyl-5-fluorobenzoxazoline 2- (2-naphthoylmethylene) -3-methyl-5-chlorobenzoxazoline, 2- (1-naphthoylmethylene) -3-methyl-5-chlorobenzoxazoline, 2- (2-naphthoylmethylene) -3-methyl-5-bromobenzoxazoline, 2- (1-naphthoylmethylene) -3-methyl-5-bromobenzoxazoline, 2- (4-phenylbenzoylmethylene) -3-methylbenzoxazoline, 2- ( 4-phenylbenzoylmethylene) -3-methyl-5-phenylbenzoxazoline, 2- (2-naphthoyl) Methylene) -3-methylnaphtho [2,1-d] oxazoline, 2- (2-naphthoylmethylene) -3-methylnaphtho [1,2-d] oxazoline, 2- (4-phenylbenzoylmethylene) -3-methylnaphtho [2,1-d] oxazoline, 2- (4-phenylbenzoylmethylene) -3-methylnaphtho [1,2-d] oxazoline, 2- (p-fluorobenzoylmethylene) -3-methylnaphtho [2,1-d Oxazoline, 2- (p-fluorobenzoylmethylene) -3-methylnaphtho [1,2-d] oxazoline, and the like.

  Among those described above, 2- (2-naphthoylmethylene) -3-methylbenzothiazoline represented by the formula (D1-1), 2-benzoylmethylene-3-methylnaphtho represented by the formula (D1-2) [ 1,2-d] thiazoline and 2- (4-phenylbenzoylmethylene) -3-methylnaphtho [1,2-d] thiazoline represented by the formula (D1-3) are preferable.

  The composition containing the polymerization initiation assistant (D1) becomes highly sensitive and tends to improve the productivity of the coating film and the pattern. Since the polymerization initiation assistant (D1) is discolored by the action of light or heat, the visible light transmittance of the coating film or pattern can be improved by using it.

  The content of the polymerization initiation assistant (D1) is preferably 50% by mass or more (more preferably 60% by mass or more, and further preferably 65% by mass or more) with respect to the content of the polymerization initiation assistant (D). Preferably it is 100 mass% or less. When the polymerization initiation aid (D1) is used in an amount within this range, the visible light transmittance of the coating film is increased.

  Moreover, you may use the compound represented by a formula (D2) or a formula (D3) as a polymerization initiator (D).

In formula (D2) or formula (D3), W ² and W ³ each independently represent a C _6-12 aromatic ring or a heterocyclic ring, and the hydrogen atom of the aromatic ring and the heterocyclic ring is substituted with a halogen atom May be. L ³ and L ⁴ each independently represents an oxygen atom or a sulfur atom (preferably an oxygen atom). R ¹² and R ¹³ each independently represents a linear, branched or cyclic C _1-12 aliphatic hydrocarbon group, or a C _6-12 aromatic hydrocarbon group, The hydrogen atom of the hydrogen group and the aromatic hydrocarbon group may be substituted with a halogen atom, a hydroxy group or a C _1-6 alkoxy group.

Examples of the aromatic ring and heterocyclic ring of W ² and W ³ include a benzene ring, a furan ring, a thiophene ring, a pyrrole ring, an imidazole ring, a pyridine ring, a pyrimidine ring, and a pyrazine ring, and combinations thereof (for example, naphthalene ring, Benzofuran ring, benzimidazole ring, etc.). Examples of halogenated aromatic rings for W ² and W ³ include chlorobenzene ring, dichlorobenzene ring, bromobenzene ring, dibromobenzene ring, phenylbenzene ring, chlorophenylbenzene ring, bromophenylbenzene ring, chloronaphthalene ring, bromonaphthalene ring, and the like. Can be mentioned. W ² and W ³ are each independently preferably a benzene ring or a naphthalene ring.

Examples of the aliphatic hydrocarbon group, halogenated aliphatic hydrocarbon group, aromatic hydrocarbon group, and halogenated aromatic hydrocarbon group for R ¹² and R ¹³ include those listed for R ¹¹ . Examples of the aliphatic hydrocarbon group substituted with the hydroxy group of R ¹² or R ¹³ include a hydroxymethyl group, a hydroxyethyl group, a hydroxypropyl group, and a hydroxybutyl group. Examples of the aromatic hydrocarbon group substituted with the hydroxy group of R ¹² or R ¹³ include a hydroxyphenyl group and a hydroxynaphthyl group. Examples of the aliphatic hydrocarbon group substituted by the alkoxy group of R ¹² or R ¹³ include methoxymethyl group, methoxyethyl group, methoxypropyl group, methoxybutyl group, butoxymethyl group, ethoxyethyl group, ethoxypropyl group, propoxybutyl Groups and the like. Examples of the aromatic hydrocarbon group substituted with the alkoxy group of R ¹² or R ¹³ include a methoxyphenyl group and an ethoxynaphthyl group. R ¹² and R ¹³ are each independently preferably a methyl group, an ethyl group, a propyl group, an isopropyl group or a butyl group.

As the polymerization initiation assistant (D2) or (D3), for example,
Dialkoxynaphthalenes such as dimethoxynaphthalene, diethoxynaphthalene, dipropoxynaphthalene, diisopropoxynaphthalene, dibutoxynaphthalene;
Dimethoxyanthracene, diethoxyanthracene, dipropoxyanthracene, diisopropoxyanthracene, dibutoxyanthracene, dipentaoxyanthracene, dihexaoxyanthracene, methoxyethoxyanthracene, methoxypropoxyanthracene, methoxyisopropoxyanthracene, methoxybutoxyanthracene, ethoxypropoxyanthracene Dialkoxyanthracenes such as ethoxyisopropoxyanthracene, ethoxybutoxyanthracene, propoxyisopropoxyanthracene, propoxybutoxyanthracene, isopropoxybutoxyanthracene;
Dialkoxytetracenes such as dimethoxytetracene, diethoxytetracene, dipropoxytetracene, diisopropoxytetracene, dibutoxytetracene;
Etc.

<Trifunctional or higher thiol (E)>
Examples of the tri- or more functional thiol (E) include carboxylic acids having a sulfanyl group (for example, sulfanyl acetic acid, sulfanyl propanoic acid, sulfanyl butanoic acid, etc.) and polyhydroxy compounds (for example, trimethylolpropane, pentaerythritol, dipentaerythritol, And esters with tris (hydroxyethyl) isocyanurate, etc.}. Specifically, trimethylolpropane tris (2-sulfanyl acetate), trimethylolpropane tris (3-sulfanylpropionate), trimethylolpropane tris (3-sulfanylbutanoate); pentaerythritol tetrakis (2-sulfanyl acetate), Pentaerythritol tetrakis (3-sulfanylpropionate), pentaerythritol tetrakis (3-sulfanylbutanoate); dipentaerythritol hexakis (2-sulfanyl acetate), dipentaerythritol hexakis (3-sulfanylpropionate), Dipentaerythritol hexakis (3-sulfanylbutanoate); tris (2-sulfanylacetoxyethyl) isocyanurate, tris (3-sulfa Le propanoyloxy ethyl) isocyanurate, tris (3-sulfanyl butanoyloxy ethyl) isocyanurate; and the like.

  The tri- or higher functional thiol (E) is preferably pentaerythritol tetrakis (3-sulfanylpropionate), pentaerythritol tetrakis (3-sulfanylbutanoate), dipentaerythritol hexakis (3-sulfanylpropionate) and At least one selected from the group consisting of dipentaerythritol hexakis (3-sulfanylbutanoate), more preferably pentaerythritol tetrakis (3-sulfanylpropionate).

  The trifunctional or higher functional thiol (E) is 0.5 to 100 parts by mass, more preferably 1 to 90 parts by mass with respect to 100 parts by mass of the photopolymerization initiator (C). If trifunctional or higher functional thiol (E) is used in an amount within this range, the sensitivity tends to be high and the developability tends to be good. Trifunctional or higher thiol (E) is preferably used in combination with a biimidazole compound which is a photopolymerization initiator (C). If this combination is used, the sensitivity tends to increase.

<Antioxidant (F)>
Examples of the antioxidant (F) include 2-tert-butyl-6- (3-tert-butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate, 2- [1- (2- Hydroxy-3,5-di-tert-pentylphenyl) ethyl] -4,6-di-tert-pentylphenyl acrylate, 6- [3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propoxy ] -2,4,8,10-tetra-tert-butyldibenz [d, f] [1,3,2] dioxaphosphine, 3,9-bis [2- {3- (3-tert-butyl) -4-hydroxy-5-methylphenyl) propionyloxy} -1,1-dimethylethyl] -2,4,8,10-tetraoxaspiro [5.5] undecane, 2,2′-methyl Renbis (6-tert-butyl-4-methylphenol), 4,4′-butylidenebis (6-tert-butyl-3-methylphenol), 4,4′-thiobis (2-tert-butyl-5-methylphenol) ), 2,2′-thiobis (6-tert-butyl-4-methylphenol), dilauryl 3,3′-thiodipropionate, dimyristyl 3,3′-thiodipropionate, distearyl 3,3′- Thiodipropionate, pentaerythrityltetrakis (3-laurylthiopropionate), 1,3,5-tris (3,5-di-tert-butyl-4-hydroxybenzyl) -1,3,5-triazine -2,4,6 (1H, 3H, 5H) -trione, 3,3 ', 3 ", 5,5', 5" -hexa-tert-butyl-a, a ', a "-(mesitichi -2,4,6-triyl) tri-p-cresol, pentaerythritol tetrakis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate], 2,6-di-tert-butyl Examples of these antioxidants (F) include commercially available products such as 1,3,5-tris (3,5-di-tert-butyl-4-hydroxy). Benzyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione is commercially available from Ciba Japan under the trade name “IRGANOX3114”.

  The content of the antioxidant (F) is preferably 0.01 to 3 parts by mass (more preferably 0.05 to 2 parts by mass, and still more preferably 0.1 to 100 parts by mass of the solid content of the composition. To 1 part by mass). If content of antioxidant exists in the said range, there exists a tendency for the resolution of a composition, and the heat resistance and chemical resistance of a coating film and a pattern to become favorable.

<Colorant (G)>
Examples of the colorant (G) include dyes and pigments. Although both dyes and pigments are substances used for coloring, in the present specification and claims, those that dissolve in a solvent are defined as dyes, and those that do not dissolve in a solvent are defined as pigments. Any of dyes and pigments may be used alone or in combination of two or more. A combination of a dye and a pigment may be used as the colorant (G).

Specific examples of the pigment include compounds classified as pigments according to a color index (published by The Society of Dyers and Colorists). Specifically, for example,
C. I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139, Yellow pigments such as 147, 148, 150, 153, 154, 166, 173, 194, 214;
C. I. Green pigments such as CI Pigment Green 7, 36, 58;
C. I. Orange pigments such as CI Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73;
C. I. Red pigments such as CI Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265;
C. I. Blue pigments such as CI Pigment Blue 15, 15: 3, 15: 4, 15: 6, 60;
C. I. Violet color pigments such as CI Pigment Violet 1, 19, 23, 29, 32, 36, 38;
C. I. Brown pigments such as CI Pigment Brown 23 and 25;
C. I. Black pigments such as CI Pigment Black 1 and 7;
Etc. In the present specification, “CI Pigment Yellow” or the like is described only for the first pigment, and only the number is described for the same described pigment. The same applies to dyes.

  Among the pigments, a yellow pigment, a green pigment, a red pigment, a blue pigment, and a violet color pigment are preferable, and a yellow pigment and a green pigment are more preferable. Examples of yellow pigments include C.I. I. Pigment Yellow 138, 139 and 150 are preferable. I. Pigment Yellow 150 is more preferable. Examples of green pigments include C.I. I. Pigment Green 7, 36 and 58 are preferable. I. Pigment Green 36 is more preferable. Examples of red pigments include C.I. I. Pigment Red 177, 209, 242 and 254 are preferable. Examples of blue pigments include C.I. I. Pigment Blue 15: 3 and 15: 6 are preferable. Examples of violet color pigments include C.I. I. Pigment Violet 23 is preferable.

  If necessary, the pigment is rosin-treated; surface treatment using a pigment derivative or pigment dispersant into which an acidic group or basic group has been introduced; graft treatment to the pigment surface with a polymer compound; sulfuric acid atomization method Or the like; cleaning treatment with an organic solvent or water for removing impurities; removal treatment of ionic impurities by an ion exchange method or the like;

  Pigments with a uniform particle size are preferred. Moreover, when using a pigment, it is preferable to disperse | distribute a pigment uniformly in a solution using a pigment dispersant. A pigment dispersant may be used individually by 1 type, and may use 2 or more types together. When a pigment dispersant is used, the amount used is preferably 0.05 parts by mass or more and 1 part by mass or less (more preferably 0.5 parts by mass or less) per 1 part by mass of the pigment. If the pigment dispersant is used in an amount within this range, a uniformly dispersed pigment dispersion tends to be obtained.

  A surfactant can be used as the pigment dispersant. Surfactants can be electrically classified into cationic, anionic, nonionic, and amphoteric, and compounds can be classified into ester, amine, acrylic, silicone, fluorine, and the like. These surfactants may be appropriately selected and used depending on the pigment and the like. Examples of the surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyethylene glycol diesters, sorbitan fatty acid esters, fatty acid-modified polyesters, tertiary amine-modified polyurethanes, and polyethyleneimines. It is done. Commercially available surfactants such as KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (registered trademark) (manufactured by Kyoeisha Chemical Co., Ltd.), Ftop (registered trademark) (Mitsubishi Materials Electronics Chemical Co., Ltd.) )), Megafuck (registered trademark) (manufactured by DIC Corporation), Florard (registered trademark) (manufactured by Sumitomo 3M Corporation), Asahi Guard (registered trademark) (manufactured by Asahi Glass Company), Surflon (registered trademark) (Manufactured by AGC Seimi Chemical Co., Ltd.), Solsperse (registered trademark) (manufactured by Geneca Corporation), EFKA (manufactured by CIBA), Ajisper (registered trademark) (manufactured by Ajinomoto Fine Techno Co., Ltd.), Disperbyk (manufactured by Big Chemie) ) Etc. can also be used.

  As the dye, known dyes such as oil-soluble dyes, acid dyes, amine salts of acid dyes, sulfonamides of acid dyes, and the like can be used. Examples of the dye include compounds classified as dyes in the color index (published by The Society of Dyers and Colorists) (for example, CI solvent dyes, CI acid dyes, CI direct dyes, C.I. dyes). I. Modern dyes, etc.) and dyes described in dyeing notes (color dyeing company).

C. I. As a solvent dye, for example,
C. I. Solvent Yellow 4, 14, 15, 23, 24, 38, 62, 63, 68, 82, 94, 98, 99, 162;
C. I. Solvent red 45, 49, 125, 130;
C. I. Solvent Orange 2, 7, 11, 15, 26, 56;
C. I. Solvent Blue 35, 37, 59, 67;
C. I. Solvent Green 1, 3, 4, 5, 7, 28, 29, 32, 33, 34, 35;
Etc.

C. I. Examples of acid dyes include C.I. I. Acid Yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251;
C. I. Acid Red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 182, 183, 198, 206, 211, 215, 216, 217, 227, 228, 249, 252, 257, 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 195, 308, 312, 315, 316, 339, 341, 345, 346, 349, 382, 383, 394, 401, 412, 417, 418, 422, 426;
C. I. Acid Orange 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, 173;
C. I. Acid Blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103, 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324: 1, 335, 340;
C. I. Acid Violet 6B, 7, 9, 17, 19;
C. I. Acid Green 1, 3, 5, 9, 16, 25, 27, 50, 58, 63, 65, 80, 104, 105, 106, 109;
Etc.

C. I. Examples of the direct dye include C.I. I. Direct Yellow 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 136, 138, 141;
C. I. Direct Red 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211, 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, 250;
C. I. Direct Orange 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, 107;
C. I. Direct Blue 57, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113, 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189, 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248, 250, 251, 252, 256, 257, 259, 260, 268, 274, 275, 293;
C. I. Direct violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104;
C. I. Direct Green 25, 27, 31, 32, 34, 37, 63, 65, 66, 67, 68, 69, 72, 77, 79, 82;
Etc.

C. I. Examples of modern dyes include C.I. I. Modern yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65;
C. I. Modern Red 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 30, 32, 33, 36, 37, 38, 39, 41 43, 45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90, 94, 95;
C. I. Modern orange 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, 48;
C. I. Modern Blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43 44, 48, 49, 53, 61, 74, 77, 83, 84;
C. I. Modern violet 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58;
C. I. Modern Green 1, 3, 4, 5, 10, 15, 19, 26, 29, 33, 34, 35, 41, 43, 53;
Etc.

  As the dye, for example, an amine salt of an acidic dye having a group represented by any one of formulas (1) to (7), and a sulfone of an acidic dye having a group represented by formula (8) or formula (9) Amide derivatives can be used. Further, the sulfonamide derivative of an acid dye may have a group represented by the formula (10) in addition to the group represented by the formula (8) or the formula (9). Examples of the acid dye include azo dyes, anthraquinone dyes, triphenylmethane dyes, xanthene dyes, and phthalocyanine dyes.

^{_{- (SO 3 -) (C}} n H 2n + 1 N + H 3) (1)
− (SO ₃ ⁻ ) {(C _n H _{2n + 1} ) ₂ N ⁺ H ₂ } (2)
^{_{- (SO 3 -) {(}} C n H 2n + 1) 3 N + H} (3)
− (SO ₃ ⁻ ) {(C _n H _{2n + 1} ) ₄ N ⁺ } (4)
^{_{- (SO 3 -) (C}} o H 2o + 1 OC p H 2p N + H 3) (5)
^{_{- (SO 3 -) {(}} C n H 2n + 1) (PhCH 2) 2 N + H} (6)
^{_{- (SO 3 -) {(}} C n H 2n + 1) Py +} (7)
—SO ₂ NH (C _n H _{2n + 1} ) (8)
—SO ₂ NH (C _o H _{2o + 1} OC _p H _2p ) (9)
-SO ₃ M (10)

In formulas (1) to (10), n represents an integer of 1 or more and 20 or less. o and p each independently represent an integer of 1 or more and 10 or less. Ph represents a phenyl group. Py ⁺ is a group represented by the formula (11). M represents a hydrogen atom or a monovalent cation.

In formula (11), q represents 0 or 1, and q being 0 means that no methyl group is present. * Mark in the formula (11) represents a binding position of Py ^+, Py ⁺ binds to the C _n H _{2n + 1} carbon atom in the formula (7) in the coupling position.

n is preferably an integer of 1 or more and 10 or less (more preferably 8 or less). o and p are each independently preferably an integer of 1 or more and 8 or less (more preferably 6 or less). q is preferably 1. Examples of the monovalent cation of M include lithium ion, sodium ion, potassium ion, quaternary ammonium ion {eg (C ₂ H ₅ ) ₃ HN ⁺ }, and preferably sodium ion.

  The number of groups represented by any one of formula (1) to formula (7) contained in the amine salt of the acid dye is preferably 1 or more and 20 or less (more preferably 10 or less, more preferably 8 or less). is there. The number of groups represented by the formula (8) or the formula (9) contained in the sulfonamide derivative of the acid dye is preferably 1 or more and 8 or less (more preferably 6 or less, more preferably 5 or less). Furthermore, the sulfonamide derivative of an acid dye may have a group represented by the formula (10), preferably 8 or less, more preferably 6 or less, and still more preferably 5 or less.

  Examples of the azo dye having a sulfonamide structure include a dye represented by the formula (G1).

In the formula (G1), R ¹⁴ represents a C _2-20 alkyl group, a C _2-12 alkyl group substituted with a cyclohexyl group, a cyclohexyl group substituted with a C _1-4 alkyl group, C _{2− 12} alkoxy C _2-12 alkyl group substituted with a group, C _1-20 alkyl substituted phenyl, C _1-20 alkyl group substituted with a phenyl group, alkylcarbonyl of formula (12) Represents an oxyalkyl group or an alkyloxycarbonylalkyl group represented by formula (13) {in formula (12) and formula (13), R ¹⁹ represents a C _2-12 alkyl group, and L ⁴ represents C _{2- 12} represents an alkanediyl group. }.
^{-L 4 -O-CO-R 19} (12)
—L ⁴ —CO—O—R ¹⁹ (13)

In formula (G1), R ^{15 to} R ¹⁷ each independently represents a hydrogen atom, a methyl group, a hydroxy group, a carbamoyl group, or a cyano group. R ¹⁸ represents a C _1-4 alkyl group.

As the C _2-20 alkyl group for R ¹⁴ , ethyl group, propyl group, isopropyl group, hexyl group, nonyl group, decyl group, dodecyl group, 2-ethylhexyl group, 1,3-dimethylbutyl group, 1-methylbutyl group 1,5-dimethylhexyl group, 1,1,3,3-tetramethylbutyl group and the like. Examples of the C _2-12 alkyl group substituted by the cyclohexyl group of R ¹⁴ include a cyclohexylethyl group, a 3-cyclohexylpropyl group, and an 8-cyclohexyloctyl group. _{Examples of the} cyclohexyl group substituted by the C _1-4 alkyl group of R ¹⁴ include 2-ethylcyclohexyl group, 2-propylcyclohexyl group, and 2-butylcyclohexyl group. The C _2-12 alkyl group substituted with a C _2-12 alkoxy group R ^14, 3-ethoxypropyl, 3-propoxypropyl group, 4-propoxy-butyl group, 3-methyl-hexyloxy ethyl group and 3- And (2-ethylhexyloxy) propyl group. _{Examples of} the phenyl group substituted with the C _1-20 alkyl group of R ¹⁴ include an o-isopropylphenyl group. _{Examples of} the C _1-20 alkyl group substituted with the phenyl group of R ¹⁴ include a DL-1-phenylethyl group, a benzyl group, and a 3-phenylbutyl group.

As the C _2-12 alkyl group for R ¹⁹ , an ethyl group, a propyl group, a hexyl group, a nonyl group, a decyl group, a dodecyl group, a 2-ethylhexyl group, a 1,3-dimethylbutyl group, a 1-methylbutyl group, 1, Examples include 5-dimethylhexyl group and 1,1,3,3-tetramethylbutyl group. _Examples of the C _2-12 alkanediyl group of L ⁴ include an ethylene group and a hexanediyl group.

Examples of the C _1-4 alkyl group for R ¹⁸ include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, an isobutyl group, and a tert-butyl group.

R ¹⁴ is preferably a C _2-10 alkyl group, more preferably a 2-ethylhexyl group. R ¹⁵ is preferably a methyl group. R ¹⁶ is preferably a cyano group. R ¹⁷ is preferably a hydroxy group. R ¹⁸ is preferably a methyl group, an ethyl group, a propyl group or a butyl group, more preferably a butyl group. Among the dyes (G1), a dye represented by the formula (G1-1) is preferable.

  Examples of the azo dye having a sulfonamide structure include dyes represented by the formula (G2), the formula (G3), or the formula (G4).

  Examples of the anthraquinone dye having a sulfonamide structure include a dye represented by the formula (G5).

  Examples of the triphenylmethane dye having a sulfonamide structure include a dye represented by the formula (G6).

  Examples of the xanthene dye having a sulfonamide structure include a dye represented by the formula (G7).

  Examples of the phthalocyanine dye having a sulfonamide structure include a dye represented by the formula (G8).

In formula (G8), R ^{20 to} R ²³ each independently represents a hydrogen atom, —SO ₂ NH (CH ₂ ) ₃ OCH (CH ₃ ) ₂ group or a sulfo group (—SO ₃ H). However, at least two of R ^{20 to} R ²³ are —SO ₂ NH (CH ₂ ) ₃ OCH (CH ₃ ) ₂ groups.

  The content of the colorant (G) is preferably 3 to 10 parts by mass (more preferably 3 to 9 parts by mass, further preferably 3.5 to 8 parts by mass) with respect to 100 parts by mass of the solid content of the composition. It is.

  In order to achieve excellent heat resistance and light resistance, the content of the pigment in the colorant (G) is preferably 2% by mass to 100% by mass, more preferably 5% by mass to 100% by mass, Preferably they are 10 mass% or more and 100 mass% or less.

The partition wall of the pixel of the organic EL display device preferably has a light transmittance of 30% or less at a wavelength of 400 nm. The light transmittance is as follows. First, a colored photosensitive resin composition is applied to a glass substrate, baked at 90 ° C. for 2 minutes on a hot plate, and an ultrahigh pressure mercury lamp through a photomask for forming a 100 μm line and space pattern. UV light having an exposure amount of 100 mJ / cm ² was passed through an optical filter (LU0400; manufactured by Asahi Spectrometer Co., Ltd.) and exposed to light, and an aqueous solution of tetramethylammonium hydroxide at 23 ° C. (tetramethylammonium hydroxide in 100 parts of an aqueous solution). 2.38 parts) for 60 seconds, developed, washed with water, baked on a hot plate at 235 ° C. for 11 minutes to form a pattern with a thickness of 3 μm, and then obtained by measuring the spectrum of this pattern. It is done. The composition of the present invention capable of forming a pattern having a light transmittance of 400 nm at a wavelength of 0.1% or more (preferably 1% or more, more preferably 5% or more) per 3 μm film thickness is 30% or less. It is suitable for. In order to achieve such transmittance, the colorant (G) is preferably at least one selected from the group consisting of a yellow pigment and a green pigment, more preferably C.I. I. Pigment yellow 150 and C.I. I. At least one selected from the group consisting of CI Pigment Green 36. Since the yellow pigment and the green pigment have an absorption region in the vicinity of 400 nm, if these are used, the transmittance of light at 400 nm can be easily reduced to 30% or less.

<Other additives (H)>
The composition of this invention may contain the other additive (H) as needed. Examples of the other additive (H) include a filler, a polymer compound surfactant other than the resin (A), an adhesion promoter, an ultraviolet absorber, a light stabilizer, and a chain transfer agent.

Examples of the filler include glass, silica, and alumina.
Examples of the polymer compound include thermoplastic resins such as curable resins such as epoxy resins and maleimide resins, polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, polyester, and polyurethane.

  Examples of the surfactant include at least one selected from the group consisting of a silicone surfactant, a fluorine surfactant, and a silicone surfactant having a fluorine atom. Preferably, the amount of the surfactant and 100 parts by mass of the photosensitive resin composition excluding the surfactant is preferably 0.0025 to 0.0250 parts by mass, more preferably 0.0025 to 0.0200 parts by mass, and even more preferably. Is 0.005 to 0.0100 parts by mass. By containing the surfactant in this range, the flatness of the coating film can be improved, and bumping at the time of solvent drying can be prevented.

  Examples of the silicone surfactant include surfactants having a siloxane bond. Specifically, DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, 29SHPA, SH30PA, SH8400 (trade names: manufactured by Toray Dow Corning Co., Ltd.), KP321, KP322, KP323, KP324, KP326, KP340, KP341 (Shinetsu) Chemical Industries, Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446, TSF4452, TSF4460 (made by Momentive Performance Materials Japan GK), and the like.

  Examples of the fluorosurfactant include surfactants having a fluorocarbon chain. Specifically, Florinart (registered trademark) FC430, FC431 (manufactured by Sumitomo 3M Co., Ltd.), MegaFac (registered trademark) F142D, F171, F172, F173, F177, F183, R183 (DIC) ), EFTOP (registered trademark) EF301, EF303, EF351, EF352, EF352 (manufactured by Shin-Akita Kasei), Surflon (registered trademark) S381, S382, SC101, SC105 (AGC Seimi) Chemical Co., Ltd.), E5844 (Daikin Fine Chemical Laboratory Co., Ltd.), BM-1000, BM-1100 (both trade names: manufactured by BM Chemie), and the like.

  Examples of the silicone-based surfactant having a fluorine atom include surfactants having a siloxane bond and a fluorocarbon chain. Specifically, Megafac (registered trademark) R08, BL20, F475, F477, F443 (manufactured by DIC Corporation) and the like can be mentioned.

  Examples of the adhesion promoter include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, and N- (2-amino). Ethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidyloxyxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyl Examples include trimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, and 3-sulfanylpropyltrimethoxysilane.

  Examples of the ultraviolet absorber include 2- (2-hydroxy-5-tert-butylphenyl) -2H-benzotriazole, octyl-3- [3-tert-butyl-4-hydroxy-5- (5-chloro-). 2H-benzotriazol-2-yl) phenyl] propionate, 2- [4-[(2-hydroxy-3-dodecyloxypropyl) oxy] -2-hydroxyphenyl] -4,6-bis (2,4-dimethyl) Phenyl) -1,3,5-triazine, 2- [4-[(2-hydroxy-3- (2′-ethyl) hexyl) oxy] -2-hydroxyphenyl] -4,6-bis (2,4 -Dimethylphenyl) -1,3,5-triazine, 2,4-bis (2-hydroxy-4-butyloxyphenyl) -6- (2,4-bis-butyloxyphenyl) 1,3,5-triazine, 2- (2-hydroxy-4- [1-octyloxycarbonylethoxy] phenyl) -4,6-bis (4-phenylphenyl) -1,3,5-triazine, 2- (2H-benzotriazol-2-yl) -4,6-bis (1-methyl-1-phenylethyl) phenol, 2- (2H-benzotriazol-2-yl) -6- (1-methyl-1- Phenylethyl) -4- (1,1,3,3-tetramethylbutyl) phenol, 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzotriazole, alkoxybenzophenone, etc. Can be mentioned.

  Examples of the light stabilizer include a polymer composed of succinic acid and (4-hydroxy-2,2,6,6-tetramethylpiperidin-1-yl) ethanol; N, N ′, N ″, N ′ ″ Tetrakis (4,6-bis (butyl- (N-methyl-2,2,6,6-tetramethylpiperidin-4-yl) amino) triazin-2-yl) -4,7-diazadecane-1,10 A diamine; a reaction product of decandioic acid, bis (2,2,6,6-tetramethyl-1- (octyloxy) -4-piperidinyl) ester and 1,1-dimethylethyl hydroperoxide; bis ( 1,2,2,6,6-pentamethyl-4-piperidinyl)-[[3,5-bis (1,1-dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate; 2,4-bis [ N-Bu Til-N- (1-cyclohexyloxy-2,2,6,6-tetramethylpiperidin-4-yl) amino] -6- (2-hydroxyethylamine) -1,3,5-triazine; bis (1, 2,2,6,6-pentamethyl-4-piperidinyl) sebacate; methyl (1,2,2,6,6-pentamethyl-4-piperidinyl) sebacate and the like.

  Examples of the chain transfer agent include dodecanethiol and 2,4-diphenyl-4-methyl-1-pentene.

<Solvent (J)>
As the solvent (J), those which uniformly dissolve or disperse each component such as the resin (A) and do not react with each component are suitable. From the viewpoints of coating properties and drying properties, an organic solvent having a boiling point of 100 ° C to 200 ° C is preferable. As the solvent (J), for example, the following can be used.

Ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether and ethylene glycol monobutyl ether;
Alkylene glycol alkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxypentyl acetate ;

Propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether;
Propylene glycol dialkyl ethers such as propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol ethyl methyl ether, propylene glycol dipropyl ether, propylene glycol propyl methyl ether, propylene glycol ethyl propyl ether;
Propylene glycol alkyl ether propionates such as propylene glycol methyl ether propionate, propylene glycol ethyl ether propionate, propylene glycol propyl ether propionate, propylene glycol butyl ether propionate.

Butanediol monoalkyl ethers such as methoxybutyl alcohol, ethoxybutyl alcohol, propoxybutyl alcohol, butoxybutyl alcohol;
Butanediol monoalkyl ether acetates such as methoxybutyl acetate, ethoxybutyl acetate, propoxybutyl acetate, butoxybutyl acetate;
Butanediol monoalkyl ether propionates such as methoxybutyl propionate, ethoxybutyl propionate, propoxybutyl propionate, butoxybutyl propionate.

Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol butyl methyl ether, diethylene glycol methyl ethyl ether;
Dipropylene glycol dialkyl ethers such as dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, and dipropylene glycol methyl ethyl ether.

Aromatic hydrocarbons such as benzene, toluene, xylene, mesitylene;
Ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone and cyclohexanone;

  Methyl acetate, ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, methyl hydroxyacetate, hydroxyethyl acetate, hydroxy Butyl acetate, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, methyl 3-hydroxypropionate, ethyl 3-hydroxypropionate, propyl 3-hydroxypropionate, butyl 3-hydroxypropionate, 2-hydroxy-3-methylbutane Methyl acetate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate, methyl ethoxy acetate, ethyl ethoxy acetate, propyl ethoxy acetate, butyl ethoxy acetate, methyl propoxyacetate, propoxy Ethyl acetate, propyl propoxyacetate, butyl propoxyacetate, methyl butoxyacetate, ethyl butoxyacetate, propyl butoxyacetate, butyl butoxyacetate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, Butyl methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, propyl 2-ethoxypropionate, butyl 2-ethoxypropionate, methyl 2-butoxypropionate, ethyl 2-butoxypropionate, 2-butoxy Propyl propionate, butyl 2-butoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, 3- Methyl toxipropionate, ethyl 3-ethoxypropionate, propyl 3-ethoxypropionate, butyl 3-ethoxypropionate, methyl 3-propoxypropionate, ethyl 3-propoxypropionate, propyl 3-propoxypropionate, 3-propoxy Esters such as butyl propionate, methyl 3-butoxypropionate, ethyl 3-butoxypropionate, propyl 3-butoxypropionate, and butyl 3-butoxypropionate.

Cyclic ethers such as tetrahydrofuran and pyran;
Cyclic esters such as γ-butyrolactone.

  Among the above solvents, alkylene glycol alkyl ether acetates (more preferably propylene glycol monomethyl ether acetate), ketones (more preferably cyclohexanone), butanediol monoalkyl ether acetates (more preferably methoxybutyl acetate), butanediol mono Alkyl ethers, diethylene glycol dialkyl ethers (more preferably diethylene glycol ethyl methyl ether, diethylene glycol butyl methyl ether), dipropylene glycol dialkyl ethers (more preferably dipropylene glycol dimethyl ether), esters (more preferably 3-ethoxypropionic acid) Ethyl, methyl 3-methoxypropionate) are preferred.

  The content of the solvent (J) is preferably 50% by mass or more (more preferably 60% by mass or more), preferably 95% by mass or less (more preferably 90% by mass or less) with respect to the composition.

<Pattern and paint film>
A pattern is preferably formed from the composition of the present invention by a photolithographic method. If the composition of the present invention is used in a photolithographic method, a fine pattern can be formed with high resolution. In the photolithographic method, a pattern is usually formed through steps of application of a photosensitive resin composition, solvent removal, heating before exposure (pre-baking), exposure, development, and heating after development (post-baking).

  A pattern can be formed from the composition of the present invention by a method other than the photolithography method. For example, the pattern can also be formed by applying the composition of the present invention in a pattern using, for example, an inkjet device and then photopolymerizing. Moreover, after apply | coating the composition of this invention to a base | substrate (for example, the board | substrate with which the resin layer was formed, etc.) by well-known methods, such as a spin coat method, a coating film can also be formed by photopolymerizing.

  The pattern and coating film of the present invention are useful as, for example, a color pattern of a color filter of a display device (preferably a liquid crystal display device or an organic EL display device), a photo spacer, a protrusion for controlling liquid crystal alignment. In particular, the pattern of the present invention is suitable as a partition wall of a pixel of an organic EL display device, for example, a partition wall for depositing a cathode material or a light emitting material to form a film, or a partition wall for forming a light emitting material by an ink jet method. .

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited by the following examples, and appropriate modifications are made within a range that can meet the above and the following purposes. Of course, it is possible to implement them, and they are all included in the technical scope of the present invention.
In the following, “%” and “parts” in the component amounts are “% by mass” and “parts by mass” unless otherwise specified.

1. Synthesis of Resin (A) Into a 1 L flask equipped with a reflux condenser, a dropping funnel and a stirrer, nitrogen was allowed to flow at 0.02 L / min to form a nitrogen atmosphere, and 140 parts of diethylene glycol ethyl methyl ether was added and stirred at 70 ° C. Until heated. Then 40 parts of methacrylic acid; and a mixture of monomer (b1-1) and monomer (b2-1) {monomer (b1-1) in the mixture: molar ratio of monomer (b2-1) = 50: 50} A solution having 360 parts dissolved in 190 parts of diethylene glycol ethyl methyl ether was prepared, and this solution was dropped into a flask kept at 70 ° C. over 4 hours using a dropping pump.

  On the other hand, a solution prepared by dissolving 30 parts of a polymerization initiator 2,2′-azobis (2,4-dimethylvaleronitrile) in 240 parts of diethylene glycol ethyl methyl ether was placed in a flask over another 5 hours using another dropping pump. It was dripped. After completion of the dropwise addition of the polymerization initiator solution, the mixture was kept at 70 ° C. for 4 hours, and then cooled to room temperature, and a copolymer {resin (A1)} having a solid content of 42.3% and an acid value of 60 mg-KOH / g Solution was obtained. The weight average molecular weight (Mw) of the obtained resin (A1) was 8000, and the molecular weight distribution (Mw / Mn) was 1.91.

The weight average molecular weight (Mw) and number average molecular weight (Mn) of the obtained resin (A1) were measured by gel permeation chromatography under the following conditions.
Apparatus: K2479 (manufactured by Shimadzu Corporation)
Column: SHIMADZU Shim-pack GPC-80M
Column temperature: 40 ° C
Solvent: THF (tetrahydrofuran)
Flow rate: 1.0 mL / min
Detector: RI
Standard: Polystyrene

2. Preparation of Composition (1) Preparation of Composition 1 First, 4.3 parts of “CI Pigment Green 36”, 1.9 parts of “CI Pigment Yellow 150” and 1.7 parts of an acrylic pigment dispersant. Was mixed with 13 parts of propylene glycol monomethyl ether acetate, and the pigment was sufficiently dispersed using a bead mill to prepare a pigment dispersion. Next, this pigment dispersion, 101.2 parts of resin (A1) solution {42.8 parts of resin (A1)}, 42.8 parts of dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.), 2 , 2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole (B-CIM; manufactured by Hodogaya Chemical Co., Ltd.) 3.4 parts, -(2-naphthoylmethylene) -3-methylbenzothiazoline 0.4 part, pentaerythritol tetrakis (3-sulfanylpropionate) (PEMP; manufactured by SC Organic Chemical Co., Ltd.), IRGANOX 3114 (Ciba 0.2 part by Japan), 0.04 part by polyether-modified silicone oil (Toray Dow Corning SH8400), which is a silicone surfactant, and solvent Were mixed to obtain a composition 1. The solvent is such that the mass ratio of diethylene glycol ethyl methyl ether, diethylene glycol butyl methyl ether, propylene glycol monomethyl ether acetate, and dipropylene glycol dimethyl ether is 40: 30: 17: 13, and the solid content of composition 1 is 33%. Mixed.

(2) Preparation of compositions 2 and 3 and composition H1 In the same manner as in composition 1, compositions 2 and 3 and comparative composition H1 containing no colorant were prepared. The components of Compositions 1 to 3 and Composition H1 are shown in Table 1.

3. Evaluation A pattern was formed from each composition as follows, and the resolution and transmittance were evaluated.

(1) Pattern formation A 5 cm × 5 cm glass substrate was washed with a neutral detergent, water and 2-propanol in this order, and then dried. On this substrate, the composition was applied by spin coating so that the film thickness of the resist film after post-baking was 3.0 μm. Next, the degree of reduced pressure was reduced to 1.0 Torr (about 1.3 × 10 ² Pa) with a reduced-pressure dryer (VCD Microtech Co., Ltd.) to form a coating film. This coating film was prebaked for 2 minutes at 90 ° C. in a hot plate. The distance between the substrate and the quartz glass photomask was set to 10 μm, and the exposure amount (405 nm) was 100 mJ / cm ^{2 in} an air atmosphere using an exposure machine (TME-150RSK; manufactured by Topcon Corporation, light source: ultrahigh pressure mercury lamp). Standard), the pre-baked coating film was exposed. In this exposure, the emitted light from the ultra-high pressure mercury lamp was irradiated through an optical filter (LU0400; manufactured by Asahi Spectroscopic Co., Ltd.). A photomask for forming a line and space pattern having a line width of 10 μm or 100 μm was used. After exposure, the film was immersed in a 23 ° C aqueous tetramethylammonium hydroxide solution (containing 2.38 parts of tetramethylammonium hydroxide in 100 parts of an aqueous solution) for 60 seconds, washed with water, and then 235 ° C on a hot plate. Was post-baked for 11 minutes to form a line and space pattern. It was 3 micrometers when the film thickness of the obtained pattern was measured using the film thickness measuring apparatus (DEKTAK3; Nippon Vacuum Technology Co., Ltd. product).

(2) Resolution Evaluation The line and space pattern formed using the mask having a line width of 10 μm as described above is observed with a scanning electron microscope (S-4000; manufactured by Hitachi, Ltd.), and 10 μm is resolved. The case where it is doing is evaluated as good (◯), and the case where 10 μm is not resolved is evaluated as bad (×). The results are shown in Table 2.

(3) Transmittance evaluation In the line part of the line and space pattern formed using the mask of line | wire width of 100 micrometers, the transmittance | permeability was measured using the colorimeter (OSP-SP-200; Olympus Corporation | KK). The results are shown in Table 2 as “Transmittance (%)”.

  Compositions 1 to 3 containing trifunctional or higher thiol (E), antioxidant (F) and colorant (G) can resolve 10 μm, whereas composition H1 does not contain colorant (G). Could not resolve 10 μm.

  The composition of the present invention containing a tri- or higher functional thiol (E), an antioxidant (F) and a colorant (G) can form a pattern with good resolution. If the composition of the present invention exhibiting good resolution is used, a high-quality display device can be produced with a high yield. Especially the composition of this invention is useful in order to manufacture the partition of the pixel of an organic electroluminescence display.

Claims (11)

  A resin, a polymerizable compound, a photopolymerization initiator, a compound having three or more sulfanyl groups, an antioxidant, a colorant, and a solvent, wherein the resin comprises an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride. A copolymer comprising: a structural unit derived from at least one monomer selected from the group; and a structural unit derived from a monomer having a carbon-carbon double bond and an epoxy structure. A colored photosensitive resin composition.   The colored photosensitive resin composition according to claim 1, wherein the content of the colorant is 3 to 10 parts by mass with respect to 100 parts by mass of the solid content of the colored photosensitive resin composition.   The colored photosensitive resin composition according to claim 1 or 2, wherein the colorant contains at least one selected from the group consisting of a yellow pigment and a green pigment.   The light transmittance of the pattern formed using the colored photosensitive resin composition is 0.1% or more and 30% or less per 3 μm thickness at a wavelength of 400 nm. Resin composition. The monomer having a carbon-carbon double bond and an epoxy structure is at least one selected from the group consisting of a compound represented by the formula (b1) and a compound represented by the formula (b2). 4. The colored photosensitive resin composition according to any one of 4 above.
[In Formula (b1) and Formula (b2), R ¹ represents a hydrogen atom or a C _1-4 saturated aliphatic hydrocarbon group, and the hydrogen atom of the saturated aliphatic hydrocarbon group is substituted with —OH. May be.
L ¹ represents a single bond or a divalent C _1-6 saturated aliphatic hydrocarbon group, and —CH ₂ — of the divalent saturated aliphatic hydrocarbon group represents —O—, —S— or —NR. ² - may be substituted with, said R ² represents a hydrogen atom or a C _1-10 saturated aliphatic hydrocarbon group.
R ¹ and L ¹ in formula (b1) may be the same as or different from R ¹ and L ^{1 in} formula (b2), respectively. ]   The colored photosensitive resin composition according to any one of claims 1 to 5, wherein the photopolymerization initiator is a biimidazole compound.   The coating film formed using the colored photosensitive resin composition in any one of Claims 1-6.   The pattern formed using the colored photosensitive resin composition in any one of Claims 1-6.   Use of the pattern according to claim 8 as a partition wall of a pixel of an organic EL display device.   An organic EL display device comprising at least one selected from the group consisting of the coating film according to claim 7 and the pattern according to claim 8.   A liquid crystal display device comprising at least one selected from the group consisting of the coating film according to claim 7 and the pattern according to claim 8.