JP2011074416A - Apparatus for displacement plating process of belt-shaped material, and method for displacement plating process - Google Patents

Apparatus for displacement plating process of belt-shaped material, and method for displacement plating process Download PDF

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JP2011074416A
JP2011074416A JP2009224531A JP2009224531A JP2011074416A JP 2011074416 A JP2011074416 A JP 2011074416A JP 2009224531 A JP2009224531 A JP 2009224531A JP 2009224531 A JP2009224531 A JP 2009224531A JP 2011074416 A JP2011074416 A JP 2011074416A
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plating
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Tetsuyuki Tsuchida
徹勇起 土田
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for displacement plating process of a belt-shaped material, which can adequately uniformize components of a plating solution in the vicinity of the material to be treated and is effective in preventing the deformation of a flying lead, when continuously plating the belt-shaped material to be treated by using a reel-to-reel technique, and to provide a method for displacement plating process. <P>SOLUTION: The apparatus for displacement plating process, which displacement-plates the surface of the material to be treated 103 while transporting the belt-shaped material to be treated with the reel-to-reel system, includes: a material transportation means for transporting the material to be treated with the reel-to-reel system; and a current-generating plate transportation means which makes the surfaces of the belt-shaped current-generating plates 110 and 111 oppose to the surfaces to be plated of the material to be treated so as not to come in contact with each other and transports the current-generating plates toward the direction opposite to the transportation direction of the material to be treated. The displacement plating treatment method includes plating the material to be treated while agitating the plating solution by a relative motion between the material to be treated and the current-generating plate. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、リールトゥリール工法により、帯状の被処理物に対して連続的に置換めっき処理を行うために有効な帯状被処理物の置換めっき処理装置、及び置換めっき処理方法に関する。   The present invention relates to a displacement plating apparatus and a displacement plating treatment method for a strip-shaped workpiece effective for continuously performing displacement plating treatment on a strip-shaped workpiece by a reel-to-reel method.

従来のプリント配線基板について、銅箔付きポリイミドフィルムを張り合わせた構成のフレキシブル配線基板が提案され、銅箔の薄さから微細配線を形成することが可能となり、同様に高配線密度化、薄膜化、小型化を図ることができる。更に、前記フレキシブル配線基板は帯状のフィルムからなるため、リールトゥリール工法による連続薬液処理が可能となり従来の枚葉処理とは異なり、生産効率の向上も可能となる。   For a conventional printed wiring board, a flexible wiring board having a structure in which a polyimide film with copper foil is laminated is proposed, and it becomes possible to form fine wiring from the thinness of the copper foil. Miniaturization can be achieved. Furthermore, since the flexible wiring board is made of a belt-like film, continuous chemical liquid processing by a reel-to-reel method is possible, and production efficiency can be improved unlike conventional single wafer processing.

前記フレキシブル配線基板としては、例えば銅箔のエッチングにより多数のリードを形成してなるテープBGA基板が挙げられる。テープBGA基板は主に、はんだボールを搭載するBGAパッドと金バンプを介して半導体チップと接合を行うためのフライングリードを有するが、このようなフレキシブル配線基板には、例えば実装前の最終表面処理となる置換めっき工程において、前記配線基板上の金属からなるBGAパッドやフライングリード上にスズや銀、金、はんだなどの置換めっきが施される。   An example of the flexible wiring board is a tape BGA board in which a large number of leads are formed by etching a copper foil. The tape BGA substrate mainly has a BGA pad on which a solder ball is mounted and a flying lead for bonding to a semiconductor chip via a gold bump. Such a flexible wiring substrate has, for example, a final surface treatment before mounting. In the replacement plating step, replacement plating of tin, silver, gold, solder, or the like is performed on the BGA pad or flying lead made of metal on the wiring board.

前記置換めっき時において、被処理物近傍での液中成分の均一化や、液中の異物を除去し良好なめっき皮膜を得ることを目的として、一般的に、循環ポンプによる液撹拌、フィルタリングが行われる。   At the time of the displacement plating, in order to obtain a good plating film by making the components in the liquid uniform in the vicinity of the object to be processed and removing foreign substances in the liquid, generally, liquid agitation and filtering by a circulation pump are performed. Done.

しかし、被処理物の種類によって撹拌が制限されることがある。例えば、前記被処理物が、狭ピッチかつ細配線のフライングリードを有するフレキシブル配線基板などの絶縁基板に回路がサポートされていない部位を有する基板の場合、循環ポンプによる被処理物への直接的な液あたりが生じるとフライングリードが変形するという問題が発生する。
よって、フライングリードの変形を回避するため、被処理物から十分離れた位置かつ微弱な撹拌のもとでめっき処理が行われているのが現状である。
However, stirring may be limited depending on the type of the object to be processed. For example, in the case where the object to be processed is a substrate having a part where a circuit is not supported on an insulating substrate such as a flexible wiring substrate having a narrow pitch and fine wiring flying leads, the object to be processed by a circulation pump is directly applied to the object to be processed. When liquid contact occurs, the problem that the flying lead is deformed occurs.
Therefore, in order to avoid deformation of the flying lead, the plating process is currently performed at a position sufficiently away from the workpiece and under weak agitation.

ところが、置換めっきでは、撹拌がもし不十分であると、実装工程で問題となるフライングリードの素材過剰浸食が発生する。これは、置換めっきにおいては、素材の浸食は反応後の拡散効果に支配されるが、めっき液を加熱すると対流による液流が発生してデバイスホール中でのみ対流による撹拌効果が起きるため、フライングリードと他のパターン部分との撹拌効果の差異が極めて大きくなり、フライングリードが選択的に溶解腐食されるためである。
よって、置換めっき液の撹拌においては、前記フライングリードの素材過剰浸食を抑制するために、前記フレキシブル配線基板におけるデバイスホール中のフライングリードと他のパターン部分とで均等な薬液処理が必要となる。
However, in displacement plating, if stirring is insufficient, flying lead material excessive erosion, which is a problem in the mounting process, occurs. In displacement plating, material erosion is governed by the diffusion effect after the reaction, but when the plating solution is heated, a liquid flow due to convection is generated and a stirring effect due to convection occurs only in the device hole. This is because the difference in the stirring effect between the lead and other pattern portions becomes extremely large, and the flying lead is selectively dissolved and corroded.
Therefore, in the agitation of the displacement plating solution, in order to suppress the material erosion of the flying lead, it is necessary to perform an equivalent chemical treatment between the flying lead in the device hole and the other pattern portion in the flexible wiring board.

これに対し、例えば特許文献1において、薬液をノズルによってフープ材に吹き付けることで均一な薬液処理を達成できるとの報告がある。特許文献1におけるノズル処理は、フライングリードなどの絶縁基板に回路がサポートされていない部位を有する基板においては、前記フライングリードの配線折れを引き起こすため、汎用性があるとは言えない。   On the other hand, for example, in Patent Document 1, there is a report that a uniform chemical treatment can be achieved by spraying a chemical on a hoop material with a nozzle. The nozzle processing in Patent Document 1 cannot be said to be versatile because it causes wiring breakage of the flying lead on a substrate having a portion where a circuit is not supported on an insulating substrate such as a flying lead.

以上のことから、置換めっき処理槽内において、適当な液撹拌条件下で帯状の被処理物近傍でのめっき液成分の均一化を図りつつ、前記撹拌条件下でフライングリードの変形を抑える必要がある。   From the above, in the displacement plating tank, it is necessary to suppress the deformation of the flying lead under the stirring conditions while achieving uniform plating solution components in the vicinity of the strip-shaped workpiece under appropriate liquid stirring conditions. is there.

特開平6-17290号公報Japanese Unexamined Patent Publication No. 6-17290

本発明は前記従来の技術の問題点に鑑み発明されたものであり、帯状の被処理物をリールトゥリール工法を利用して連続めっきを行う場合に、帯状の被処理物近傍におけるめっき液の成分を良好に均一化することができ、しかもフライングリードの変形を防止できることに有効な、帯状被処理物の置換めっき処理装置および置換めっき処理方法を提供することを目的とする。   The present invention has been invented in view of the problems of the prior art, and in the case of continuously plating a strip-shaped workpiece using a reel-to-reel method, the plating solution in the vicinity of the strip-shaped workpiece is treated. It is an object of the present invention to provide a replacement plating apparatus and a replacement plating method for a strip-shaped workpiece, which can effectively homogenize components and prevent deformation of a flying lead.

前記課題を解決するための請求項1の発明は、帯状の被処理物をリールトゥリール方式により搬送しつつ、該被処理物の面上にめっき槽内で置換めっき処理を行う置換めっき処理装置であって、
該被処理物をリールトゥリール方式で搬送する被処理物搬送手段、
帯状の起流板の面を、少なくとも該めっき槽内では該被処理物の被めっき面と対向させるが、接触させず、且つ、該被処理物が搬送される向きとは反対向きに搬送する起流板搬送手段、
を具備することを特徴とする帯状被処理物の置換めっき処理装置である。
The invention of claim 1 for solving the above problem is a displacement plating apparatus for carrying out displacement plating treatment on the surface of the object to be treated in a plating tank while transporting the band-like object to be treated by a reel-to-reel method. Because
A workpiece transport means for transporting the workpiece in a reel-to-reel method;
The surface of the belt-like current plate is opposed to the surface to be processed of the object to be processed at least in the plating tank, but is not brought into contact and is conveyed in a direction opposite to the direction in which the object to be processed is conveyed. Current plate conveying means,
It is the substitution plating processing apparatus of the strip | belt-shaped to-be-processed object characterized by comprising.

また請求項2の発明は、前記帯状の被処理物と前記帯状の起流板との間隔は、少なくとも前記めっき槽内を前記搬送されるときは、該搬送による該被処理物と該起流板との相対運動によってめっき液が撹拌されうる間隔であること、
を特徴とする請求項1に記載の帯状被処理物の置換めっき処理装置である。
According to a second aspect of the present invention, the distance between the band-shaped object to be processed and the band-shaped current plate is such that the object to be processed and the current generated by the conveyance are at least when conveyed in the plating tank. The interval at which the plating solution can be stirred by relative movement with the plate,
The displacement plating apparatus for a strip-like object to be processed according to claim 1.

また請求項3の発明は、前記帯状の起流板は2つあり、少なくとも前記めっき槽内を前記搬送されるときは、片方の起流板の面は前記帯状の被処理物の片側の面と対向し、他方の起流板の面は該帯状の被処理物の他方の面と対向するように配してあること、
を特徴とする請求項1又は2のいずれかに記載の帯状被処理物の置換めっき処理装置である。
In the invention of claim 3, there are two belt-shaped current plates, and at least the surface of one current plate is a surface on one side of the belt-shaped workpiece when transported in the plating tank. The surface of the other current plate is arranged so as to face the other surface of the strip-shaped workpiece,
A displacement plating apparatus for a strip-like workpiece according to claim 1 or 2.

また請求項4の発明は、帯状の被処理物をリールトゥリール方式により搬送しつつ、該被処理物の面上にめっき槽内で置換めっき処理を行う置換めっき処理方法であって、
該被処理物はリールトゥリール方式で搬送させ、
又、帯状の起流板の面を、少なくとも該めっき槽内では該被処理物の被めっき面と対向させるが、接触させず、且つ、該被処理物が搬送される向きとは反対向きに搬送させ、
該被処理物と該起流板との該めっき槽内における相対運動によって、帯状の被処理物近傍のめっき液を撹拌させながら該めっき処理を行うこと、
を具備することを特徴とする帯状被処理物の置換めっき処理方法である。
The invention of claim 4 is a displacement plating treatment method for carrying out displacement plating treatment in a plating tank on the surface of the treatment object while transporting the belt-like treatment object by a reel-to-reel method,
The object to be processed is conveyed by a reel-to-reel method,
Further, the surface of the belt-shaped current plate is opposed to the surface to be processed of the object to be processed at least in the plating tank, but is not in contact with the direction in which the object to be processed is conveyed. Carry
Performing the plating process while stirring the plating solution in the vicinity of the strip-shaped object by relative movement of the object to be processed and the current plate in the plating tank;
It is the substitution plating processing method of the strip | belt-shaped to-be-processed object characterized by comprising.

本発明によると、帯状の被処理物の被めっき面の付近においてめっき液の循環を良好にすることを容易に実現でき、置換めっきの下地素材の過剰浸食を防止することにつながる。また、循環ポンプによる被処理物に対する直接的な液あたりを起流板が制御するため、フライングリードの変形も予防できる。   According to the present invention, it is possible to easily achieve good circulation of the plating solution in the vicinity of the surface to be plated of the strip-shaped workpiece, and it is possible to prevent excessive erosion of the base material for displacement plating. In addition, since the current plate controls direct liquid contact with the object to be processed by the circulation pump, deformation of the flying lead can be prevented.

従来のめっき装置の一例の構成を模式的に示す構成図。The block diagram which shows typically the structure of an example of the conventional plating apparatus. 本発明の置換めっき処理装置に係る一実施例の構成を模式的に示す説明図。BRIEF DESCRIPTION OF THE DRAWINGS Explanatory drawing which shows typically the structure of one Example which concerns on the displacement plating processing apparatus of this invention. 本発明に関わる帯状被処理物の構成を模式的に示す説明図。Explanatory drawing which shows typically the structure of the strip-shaped to-be-processed object in connection with this invention.

図1は従来のめっき装置の一部を参照用に示したものである。図は、リールトゥリール工法における薬液処理装置の中でも、オーバーフロー構造を有した一例で、水洗槽106、めっき槽107の処理エリアを示したものであり、巻き出しリール101と巻き取りリール102を具備し、被めっきフレキシブル配線基板103を処理槽に対して、平行に搬送するリールトゥリール方式によるめっき装置である。搬送には、空中ロール104と液中ロール105を用いる。   FIG. 1 shows a part of a conventional plating apparatus for reference. The figure shows an example of an overflow structure among chemical treatment apparatuses in the reel-to-reel method, and shows the treatment area of the washing tank 106 and the plating tank 107, and includes a take-up reel 101 and a take-up reel 102. The plating apparatus is a reel-to-reel system that conveys the flexible wiring substrate 103 to be plated in parallel to the processing tank. The air roll 104 and the liquid roll 105 are used for conveyance.

図2は、本発明に係る置換めっき処理装置の概念図であり、例えば、それぞれ帯状の起流板用エンドレス搬送ロール108、109を配備してあり、被めっきフレキシブル配線基板103の両側に起流板A110、起流板B111を配置したものである。被処理物と起流板との相対的な位置関係は、被処理物の被めっき面と起流板の面とが対向するように、且つ、被処理物と起流板との間にめっき液が十分に存在しうる程度の間隔をおいて配置することが好ましい。これは被処理物と起流板との相対運動により、両者の間に存在するめっき液を良く撹拌させる効果が高まり易い為である。
処理槽内での被めっきフレキシブル配線基板103と起流板110、111の搬送については、例えば段つき液中ロール112を使用してよい。処理槽内では液循環ポンプによる液撹拌を行う。
FIG. 2 is a conceptual diagram of a displacement plating apparatus according to the present invention. For example, strip-shaped current-carrying plate endless transfer rolls 108 and 109 are provided, and current flow is generated on both sides of the flexible wiring board 103 to be plated. The plate A110 and the current plate B111 are arranged. The relative positional relationship between the object to be processed and the current plate is such that the surface to be plated of the object to be processed and the surface of the current plate are opposed to each other, and plating is performed between the object to be processed and the current plate. It is preferable to arrange them at intervals such that the liquid can be sufficiently present. This is because the effect of sufficiently stirring the plating solution existing between the two tends to increase due to the relative movement between the workpiece and the current plate.
For conveying the to-be-plated flexible wiring board 103 and the current plates 110 and 111 in the processing tank, for example, a stepped submerged roll 112 may be used. In the treatment tank, liquid agitation is performed by a liquid circulation pump.

この例では、起流板を2つ使用しているが、もし被めっき面が片面だけであれば、起流板は最低1つだけ使用する形態でも良いが、その場合の起流板は被めっき面の側に配置する。被めっき面の側に配置する理由は、被処理物と起流板との相対運動により良く撹拌された(両者の間に存在する)めっき液が被めっき面に直ちに供給され易い為である。   In this example, two current plates are used. However, if there is only one surface to be plated, at least one current plate may be used. Place on the side of the plating surface. The reason why it is arranged on the side of the surface to be plated is that the plating solution that is well agitated by the relative movement between the object to be processed and the current plate (present between the two) is easily supplied to the surface to be plated.

図3は、本発明で使用したポリイミドからなるベースフィルム201上に形成したフライングリード203とBGAパッド204を有する被めっきフレキシブル配線基板103である。
尚、起流板の材料は一般にフレキシブル基材が好ましい。図の例ではポリエチレン製の樹脂フィルムを用いた。起流板の大きさは一般に被めっき処理物の幅よりも同等か狭いものが好ましい。図の例では被処理物とおよそ同程度の幅の物を使用した。また、起流板としては繰り返し使用できる物である方が経済的であることから、一般にエンドレスの物である方がより好ましい。
FIG. 3 shows a to-be-plated flexible wiring board 103 having flying leads 203 and BGA pads 204 formed on a base film 201 made of polyimide used in the present invention.
In general, the material of the current plate is preferably a flexible substrate. In the illustrated example, a polyethylene resin film was used. In general, the size of the current plate is preferably equal to or narrower than the width of the object to be plated. In the example of the figure, an object having a width approximately the same as the object to be processed was used. Moreover, since it is more economical for the current plate to be reusable, it is generally more preferable to use an endless one.

本発明におけるリールトゥリール方式により、帯状の被処理物上に置換めっき処理を行う装置において、めっき析出安定性、また被処理物近傍での液撹拌の均一化を評価するためフライングリードの銅素材の過剰浸食の有無、更に、循環ポンプによる被処理物に対する直接的な液あたりを起流板が制御可能か否かを評価するため、フライングリードの変形の有無について確認を行った。   In order to evaluate plating deposition stability and uniformity of liquid agitation in the vicinity of a workpiece in a device for performing displacement plating treatment on a strip-shaped workpiece by the reel-to-reel method in the present invention, a copper material of a flying lead In order to evaluate the presence or absence of excessive erosion and whether or not the current plate can control the direct liquid contact with the object to be processed by the circulation pump, the presence or absence of deformation of the flying lead was checked.

被めっきフレキシブル配線基板には、ポリイミドテープ(厚さ:38μm)に銅箔(厚さ:8μm)を接着した3層材によって作製したものを使用した。本実施例で使用した被めっきフレキシブル配線基板の詳細は図3のとおりである。尚、フライングリードの線幅、ピッチはそれぞれ35μmのものを使用した。   The flexible wiring board to be plated was made of a three-layer material in which a copper foil (thickness: 8 μm) was bonded to a polyimide tape (thickness: 38 μm). The details of the plated flexible wiring board used in this example are as shown in FIG. The flying leads had a line width and a pitch of 35 μm.

まず、本発明にかかる帯状の被処理物上に置換めっき処理を行うための装置において、めっき槽107内を純スズめっき液で満たし、循環ポンプによる液撹拌を開始した。   First, in the apparatus for performing displacement plating on the strip-shaped workpiece according to the present invention, the inside of the plating tank 107 was filled with pure tin plating solution, and liquid stirring by a circulation pump was started.

次に、処理温度が70℃になった後、2つの起流板A110、起流板B111が同方向かつフレキシブル配線基板103が搬送される向きとは反対向きに1.0m/minにて搬送を開始し、続けてフレキシブル配線基板103の搬送速度を0.3m/mimとし搬送を開始した。   Next, after the processing temperature reaches 70 ° C., the two wake plates A110 and B111 are transported at 1.0 m / min in the same direction and opposite to the direction in which the flexible wiring board 103 is transported. Then, the conveyance speed of the flexible wiring board 103 was set to 0.3 m / mim, and conveyance was started.

まず、本発明にかかる置換めっき装置を用いたときのめっき析出安定性を評価した。評価方法は、図3中の500μm径のBGAパッド204のめっき厚を測定し(n=10)、めっき厚のばらつきを算出することで評価した。   First, plating deposition stability was evaluated when the displacement plating apparatus according to the present invention was used. The evaluation method was evaluated by measuring the plating thickness of the 500 μm-diameter BGA pad 204 in FIG. 3 (n = 10) and calculating the variation of the plating thickness.

前記評価の結果は、平均膜厚1.03μm、標準偏差0.05μmであり、ばらつきの小さい良好なスズめっき皮膜を得ることができた。   As a result of the evaluation, the average film thickness was 1.03 μm, the standard deviation was 0.05 μm, and a good tin plating film with small variations could be obtained.

次にフライングリードの銅素材浸食の程度を評価により、起流板搬送による被処理物近傍での液成分均一化の可否を検証した。
比較の為に、図1に係る従来のめっき処理装置を用いた時の銅素材浸食の程度についても評価を行った。
Next, by evaluating the degree of copper material erosion of the flying lead, it was verified whether or not the liquid component was uniform in the vicinity of the object to be processed by conveying the current plate.
For comparison, the degree of copper material erosion when using the conventional plating apparatus according to FIG. 1 was also evaluated.

前記試験の結果、従来のめっき装置ではフライングリードの銅素材浸食が確認されたが、本発明にかかる置換めっき装置においては、フライングリードの銅素材浸食は確認されなかった。これより、従来のめっき装置と比較して、本発明にかかるめっき装置においては、起流板の搬送により被処理物近傍での均一な液撹拌が可能であることを確認した。   As a result of the test, the copper material erosion of the flying lead was confirmed in the conventional plating apparatus, but the copper material erosion of the flying lead was not confirmed in the displacement plating apparatus according to the present invention. From this, compared with the conventional plating apparatus, in the plating apparatus concerning this invention, it confirmed that the uniform liquid stirring in the to-be-processed object vicinity was possible by conveyance of a current plate.

更に、循環ポンプによる被処理物に対する直接的な液あたりを起流板が制御可能か否かを評価するため、被処理物のめっき処理後のフライングリードの変形の有無を確認した。   Further, in order to evaluate whether or not the current plate can control the direct liquid contact with the object to be processed by the circulation pump, the presence or absence of deformation of the flying lead after the plating of the object to be processed was confirmed.

前記試験の結果、本発明にかかるめっき装置においては、フライングリードの変形は確認されなかった。一方、図1に示した従来のめっき装置を同じ液循環量にて同等の試験を行った結果、フライングリードの変形が射止められた。   As a result of the test, no deformation of the flying lead was confirmed in the plating apparatus according to the present invention. On the other hand, as a result of performing the same test on the conventional plating apparatus shown in FIG. 1 at the same liquid circulation rate, the deformation of the flying lead was shot.

101・・・巻き出しリール
102・・・巻き取りリール
103・・・被めっきフレキシブル配線基板
104・・・空中ロール
105・・・液中ロール
106・・・水洗槽
107・・・めっき槽
108・・・起流板用搬送ロールA
109・・・起流板用搬送ロールB
110・・・起流板A
111・・・起流板B
112・・・段つき液中ロール
201・・・ベースフィルム
202・・・デバイスホール
203・・・フライングリード
204・・・BGAパッド
205・・・スプロケット穴
DESCRIPTION OF SYMBOLS 101 ... Unwinding reel 102 ... Take-up reel 103 ... Plated flexible wiring board 104 ... In-air roll 105 ... Submerged roll 106 ... Washing tank 107 ... Plating tank 108- ..Conveying roll A for current plate
109 ... Conveying roll B for current plate
110 ... Current plate A
111 ... Current plate B
112 ... Stepped submerged roll 201 ... Base film 202 ... Device hole 203 ... Flying lead 204 ... BGA pad 205 ... Sprocket hole

Claims (4)

帯状の被処理物をリールトゥリール方式により搬送しつつ、該被処理物の面上にめっき槽内で置換めっき処理を行う置換めっき処理装置であって、
該被処理物をリールトゥリール方式で搬送する被処理物搬送手段、
帯状の起流板の面を、少なくとも該めっき槽内では該被処理物の被めっき面と対向させるが、接触させず、且つ、該被処理物が搬送される向きとは反対向きに搬送する起流板搬送手段、
を具備することを特徴とする帯状被処理物の置換めっき処理装置。
A substitution plating apparatus for carrying out substitution plating treatment in a plating tank on the surface of the workpiece while transporting a strip-like workpiece by a reel-to-reel method,
An object conveying means for conveying the object to be processed by a reel-to-reel method;
The surface of the belt-shaped current plate is opposed to the surface to be processed of the object to be processed at least in the plating tank, but is not brought into contact and is conveyed in the direction opposite to the direction in which the object to be processed is conveyed. Current plate conveying means,
A displacement plating apparatus for a strip-like object to be processed.
前記帯状の被処理物と前記帯状の起流板との間隔は、少なくとも前記めっき槽内を前記搬送されるときは、該搬送による該被処理物と該起流板との相対運動によってめっき液が撹拌されうる間隔であること、
を特徴とする請求項1に記載の帯状被処理物の置換めっき処理装置。
The distance between the strip-shaped object to be processed and the belt-shaped current plate is such that at least when transported in the plating tank, the plating solution is caused by relative movement between the object to be processed and the current plate by the transport. Is an interval that can be stirred,
The displacement plating apparatus for a strip-like object to be processed according to claim 1.
前記帯状の起流板は2つあり、少なくとも前記めっき槽内を前記搬送されるときは、片方の起流板の面は前記帯状の被処理物の片側の面と対向し、他方の起流板の面は該帯状の被処理物の他方の面と対向するように配してあること、
を特徴とする請求項1又は2のいずれかに記載の帯状被処理物の置換めっき処理装置。
There are two belt-shaped current plates, and at least when the sheet is transported in the plating tank, the surface of one current plate is opposed to the surface of one side of the belt-shaped object, and the other current flow The surface of the plate is arranged so as to face the other surface of the strip-shaped workpiece,
The displacement plating apparatus for a strip-like object to be processed according to claim 1 or 2.
帯状の被処理物をリールトゥリール方式により搬送しつつ、該被処理物の面上にめっき槽内で置換めっき処理を行う置換めっき処理方法であって、
該被処理物はリールトゥリール方式で搬送させ、
又、帯状の起流板の面を、少なくとも該めっき槽内では該被処理物の被めっき面と対向させるが、接触させず、且つ、該被処理物が搬送される向きとは反対向きに搬送させ、
該被処理物と該起流板との該めっき槽内における相対運動によって、帯状の被処理物近傍のめっき液を撹拌させながら該めっき処理を行うこと、
を具備することを特徴とする帯状被処理物の置換めっき処理方法。
A substitution plating method for carrying out substitution plating treatment in a plating tank on the surface of the workpiece while transporting a strip-like workpiece by a reel-to-reel method,
The object to be processed is conveyed by a reel-to-reel method,
Further, the surface of the belt-shaped current plate is opposed to the surface to be processed of the object to be processed at least in the plating tank, but is not in contact with the direction in which the object to be processed is conveyed. Carry
Performing the plating process while stirring the plating solution in the vicinity of the strip-shaped object by relative movement of the object to be processed and the current plate in the plating tank;
A replacement plating method for a strip-like object to be processed.
JP2009224531A 2009-09-29 2009-09-29 Apparatus for displacement plating process of belt-shaped material, and method for displacement plating process Pending JP2011074416A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009224531A JP2011074416A (en) 2009-09-29 2009-09-29 Apparatus for displacement plating process of belt-shaped material, and method for displacement plating process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009224531A JP2011074416A (en) 2009-09-29 2009-09-29 Apparatus for displacement plating process of belt-shaped material, and method for displacement plating process

Publications (1)

Publication Number Publication Date
JP2011074416A true JP2011074416A (en) 2011-04-14

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ID=44018702

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Country Status (1)

Country Link
JP (1) JP2011074416A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102790002A (en) * 2012-07-27 2012-11-21 京东方科技集团股份有限公司 Flexible substrate treatment device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102790002A (en) * 2012-07-27 2012-11-21 京东方科技集团股份有限公司 Flexible substrate treatment device
US10315233B2 (en) 2012-07-27 2019-06-11 Boe Technology Group Co., Ltd. Flexible substrate treatment device

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