JP2011039128A5 - - Google Patents
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- Publication number
- JP2011039128A5 JP2011039128A5 JP2009184075A JP2009184075A JP2011039128A5 JP 2011039128 A5 JP2011039128 A5 JP 2011039128A5 JP 2009184075 A JP2009184075 A JP 2009184075A JP 2009184075 A JP2009184075 A JP 2009184075A JP 2011039128 A5 JP2011039128 A5 JP 2011039128A5
- Authority
- JP
- Japan
- Prior art keywords
- mass
- photoresist composition
- resin
- chemically amplified
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000203 mixture Substances 0.000 claims 14
- 229920002120 photoresistant polymer Polymers 0.000 claims 7
- 239000002253 acid Substances 0.000 claims 6
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- 150000001875 compounds Chemical class 0.000 claims 3
- 229920001296 polysiloxane Polymers 0.000 claims 3
- 239000004094 surface-active agent Substances 0.000 claims 3
- 230000003321 amplification Effects 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 238000003199 nucleic acid amplification method Methods 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 150000007514 bases Chemical class 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009184075A JP5571334B2 (ja) | 2009-08-07 | 2009-08-07 | レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009184075A JP5571334B2 (ja) | 2009-08-07 | 2009-08-07 | レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011039128A JP2011039128A (ja) | 2011-02-24 |
| JP2011039128A5 true JP2011039128A5 (enrdf_load_stackoverflow) | 2012-08-09 |
| JP5571334B2 JP5571334B2 (ja) | 2014-08-13 |
Family
ID=43766987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009184075A Active JP5571334B2 (ja) | 2009-08-07 | 2009-08-07 | レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5571334B2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5729312B2 (ja) * | 2011-01-19 | 2015-06-03 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料及びパターン形成方法 |
| TWI619733B (zh) * | 2012-09-15 | 2018-04-01 | Rohm And Haas Electronic Materials Llc | 包含多種酸產生劑化合物之光阻劑 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3393915B2 (ja) * | 1994-03-04 | 2003-04-07 | 住友化学工業株式会社 | 化学増幅型レジスト組成物 |
| JP4099656B2 (ja) * | 2001-12-27 | 2008-06-11 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP2005152736A (ja) * | 2003-11-25 | 2005-06-16 | Mitsui Chemicals Inc | 配線基板の塗布方法 |
| JP2005158907A (ja) * | 2003-11-25 | 2005-06-16 | Mitsui Chemicals Inc | 配線板の製造方法 |
| JP2007057651A (ja) * | 2005-08-23 | 2007-03-08 | Sumitomo Chemical Co Ltd | 着色感光性樹脂組成物 |
| JP4717612B2 (ja) * | 2005-11-28 | 2011-07-06 | 東京応化工業株式会社 | スプレー塗布用ホトレジスト組成物および積層体 |
| JP2009098155A (ja) * | 2006-02-08 | 2009-05-07 | Mitsubishi Gas Chem Co Inc | 感放射線性組成物 |
| WO2008099869A1 (ja) * | 2007-02-15 | 2008-08-21 | Central Glass Company, Limited | 光酸発生剤用化合物及びそれを用いたレジスト組成物、パターン形成方法 |
| JP5012122B2 (ja) * | 2007-03-22 | 2012-08-29 | 住友化学株式会社 | 化学増幅型レジスト組成物 |
| JP5446118B2 (ja) * | 2007-04-23 | 2014-03-19 | 三菱瓦斯化学株式会社 | 感放射線性組成物 |
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2009
- 2009-08-07 JP JP2009184075A patent/JP5571334B2/ja active Active