JP2011035423A5 - - Google Patents

Download PDF

Info

Publication number
JP2011035423A5
JP2011035423A5 JP2010252668A JP2010252668A JP2011035423A5 JP 2011035423 A5 JP2011035423 A5 JP 2011035423A5 JP 2010252668 A JP2010252668 A JP 2010252668A JP 2010252668 A JP2010252668 A JP 2010252668A JP 2011035423 A5 JP2011035423 A5 JP 2011035423A5
Authority
JP
Japan
Prior art keywords
barrier member
liquid
substrate
space
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010252668A
Other languages
English (en)
Japanese (ja)
Other versions
JP5345996B2 (ja
JP2011035423A (ja
Filing date
Publication date
Priority claimed from US11/404,108 external-priority patent/US7701551B2/en
Application filed filed Critical
Publication of JP2011035423A publication Critical patent/JP2011035423A/ja
Publication of JP2011035423A5 publication Critical patent/JP2011035423A5/ja
Application granted granted Critical
Publication of JP5345996B2 publication Critical patent/JP5345996B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010252668A 2006-04-14 2010-11-11 リソグラフィ装置およびデバイス製造方法 Active JP5345996B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/404,108 US7701551B2 (en) 2006-04-14 2006-04-14 Lithographic apparatus and device manufacturing method
US11/404,108 2006-04-14

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2007098988A Division JP4939283B2 (ja) 2006-04-14 2007-04-05 リソグラフィ装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011035423A JP2011035423A (ja) 2011-02-17
JP2011035423A5 true JP2011035423A5 (https=) 2011-03-31
JP5345996B2 JP5345996B2 (ja) 2013-11-20

Family

ID=38605150

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007098988A Active JP4939283B2 (ja) 2006-04-14 2007-04-05 リソグラフィ装置およびデバイス製造方法
JP2010252668A Active JP5345996B2 (ja) 2006-04-14 2010-11-11 リソグラフィ装置およびデバイス製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2007098988A Active JP4939283B2 (ja) 2006-04-14 2007-04-05 リソグラフィ装置およびデバイス製造方法

Country Status (2)

Country Link
US (2) US7701551B2 (https=)
JP (2) JP4939283B2 (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7367345B1 (en) * 2002-09-30 2008-05-06 Lam Research Corporation Apparatus and method for providing a confined liquid for immersion lithography
US9477158B2 (en) 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5029870B2 (ja) * 2006-11-13 2012-09-19 株式会社ニコン 露光方法及び装置、液浸部材、露光装置のメンテナンス方法、並びにデバイス製造方法
US9632425B2 (en) * 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
NL1036715A1 (nl) 2008-04-16 2009-10-19 Asml Netherlands Bv Lithographic apparatus.
EP2136250A1 (en) * 2008-06-18 2009-12-23 ASML Netherlands B.V. Lithographic apparatus and method
SG159467A1 (en) * 2008-09-02 2010-03-30 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method
NL2003333A (en) * 2008-10-23 2010-04-26 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
JP2010205914A (ja) * 2009-03-03 2010-09-16 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
JP5016705B2 (ja) * 2009-06-09 2012-09-05 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造
NL2004808A (en) * 2009-06-30 2011-01-12 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
US20110134400A1 (en) * 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
KR20120113238A (ko) * 2010-01-08 2012-10-12 가부시키가이샤 니콘 액침 부재, 노광 장치, 노광 방법, 및 디바이스 제조 방법
NL2005951A (en) * 2010-02-02 2011-08-03 Asml Netherlands Bv Lithographic apparatus and a device manufacturing method.
NL2009472A (en) * 2011-10-24 2013-04-25 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
EP4323841A1 (en) * 2021-04-15 2024-02-21 ASML Netherlands B.V. A fluid handling system, method and lithographic apparatus

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
DD221563A1 (de) * 1983-09-14 1985-04-24 Mikroelektronik Zt Forsch Tech Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
FR2829331B1 (fr) * 2001-09-04 2004-09-10 St Microelectronics Sa Procede de securisation d'une quantite secrete
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR100585476B1 (ko) 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
US7948604B2 (en) 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
KR101181688B1 (ko) * 2003-03-25 2012-09-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
WO2004092830A2 (en) 2003-04-11 2004-10-28 Nikon Corporation Liquid jet and recovery system for immersion lithography
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
JP3862678B2 (ja) * 2003-06-27 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411653B2 (en) * 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7528929B2 (en) * 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4954444B2 (ja) * 2003-12-26 2012-06-13 株式会社ニコン 流路形成部材、露光装置及びデバイス製造方法
EP3376523A1 (en) * 2004-01-05 2018-09-19 Nikon Corporation Exposure apparatus, exposure method, and device producing method
KR101851511B1 (ko) 2004-03-25 2018-04-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7091502B2 (en) 2004-05-12 2006-08-15 Taiwan Semiconductor Manufacturing, Co., Ltd. Apparatus and method for immersion lithography
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101700547B1 (ko) 2004-09-17 2017-01-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP4400390B2 (ja) * 2004-09-22 2010-01-20 株式会社ニコン 露光装置及びデバイス製造方法
US7251013B2 (en) * 2004-11-12 2007-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4622595B2 (ja) * 2005-03-11 2011-02-02 株式会社ニコン 露光装置及びデバイス製造方法
US7411654B2 (en) * 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7474379B2 (en) * 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1962328B1 (en) 2005-11-14 2013-01-16 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
US7804577B2 (en) * 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US20090122282A1 (en) 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
JP2010135794A (ja) 2008-12-04 2010-06-17 Nikon Corp 露光装置、露光方法、及びデバイス製造方法

Similar Documents

Publication Publication Date Title
JP2011035423A5 (https=)
SG159467A1 (en) Fluid handling structure, lithographic apparatus and device manufacturing method
JP2015015503A5 (https=)
SG157327A1 (en) Substrate table, lithographic apparatus and device manufacturing method
UA107071C2 (en) Silk screen printing and magnetic orientation
CL2009001453S1 (es) Recipiente de coccion, formado por un cuerpo tronco conico invertido abierto por arriba con borde perimetral inferior redondeado y superficie inferior con perforaciones circulares, con borde superior tronco conico invertido con perforaciones rectangulares en el manto rematado por un reborde escalonado.
SG141385A1 (en) Lithographic apparatus and device manufacturing method
TW200744761A (en) Coating method, coating device and manufacturing method and manufacturing device for components of a display
TW200610587A (en) Method for dispensing a fluid on a substrate
JP2008072139A5 (https=)
JP2010520436A5 (https=)
HK1205279A1 (zh) 液浸构件及曝光装置
TW200741978A (en) Stressor integration and method thereof
SE0601448L (sv) Sprinkleranordning
MY175777A (en) Surfing device and method
CA2916167A1 (en) Reduction of scale build-up in an evaporative cooling apparatus
MY166746A (en) Apparatus and methods for impinging fluids on substrates
SG161182A1 (en) Integrated circuit system employing an elevated drain
TW200739770A (en) System, apparatus, and method for advanced solder bumping
JP2011091307A5 (https=)
JP2009147171A5 (https=)
WO2009065704A3 (de) Bedienvorrichtung für ein hausgerät
WO2011090852A3 (en) Through silicon via lithographic alignment and registration
TW200702947A (en) Liquid immersion lithography system having a tilted showerhead relative to a substrate
WO2013127608A3 (en) Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography