JP2011034075A5 - - Google Patents

Description

Furthermore, the method of manufacturing the electrophotographic photosensitive member of the present invention, formation and washing the cylindrical substrate for an electrophotographic photosensitive member, a sensitive optical layer on the cleaned the cylindrical base body by the method of washing described above And a step of performing .

After the deposition layer having a desired film thickness is formed, the supply of high-frequency power is stopped, the raw material gas introduction valve 509 is closed, the inflow of the raw material gas into the reaction vessel 501 is stopped, and the inside of the reaction vessel is once evacuated to high vacuum. Evacuate to finish the formation of the deposited layer. By repeating the above operation, a deposited layer is formed and an amorphous silicon photoreceptor is completed.
When an electrophotographic photosensitive member is produced using the cylindrical substrate 101 with a stain, and image output is performed using the electrophotographic photosensitive member, image unevenness may occur. In particular, amorphous silicon down feeling light body made by CVD method, compared to other electrophotographic photoreceptor, since the stain of the cylindrical substrate 101 is likely to cause defects in the deposited layer, image unevenness tends to occur. Accordingly, the present invention is particularly effective in the cleaning of the cylindrical substrate for amorphous silicon down feeling light body.

Claims (6)

After cleaning the cylindrical substrate for an electrophotographic photosensitive member with a cleaning agent, a first nozzle for spraying a rinsing liquid on the outer peripheral surface of the cylindrical substrate and a second nozzle for spraying a rinsing liquid on the inner peripheral surface In the rinsing cleaning method, the cylindrical substrate is raised relative to the nozzle, the rinsing liquid is sprayed on the outer peripheral surface of the cylindrical base, and the cleaning agent is washed away by spraying the rinsing liquid on the inner peripheral surface. ,
A cylindrical substrate for an electrophotographic photosensitive member, wherein a rinse liquid is sprayed from the first nozzle, and the cleaning agent on the upper end surface of the cylindrical substrate is washed away to the inner peripheral side of the cylindrical substrate. Rinse cleaning method. The rinsing liquid is sprayed from the first nozzle, and the rinsing liquid sprayed from the first nozzle is sprayed on the outer peripheral surface of the cylindrical substrate, and then the rinsing liquid is sprayed from the second nozzle. cylindrical substrate method rinse for electrophotographic photosensitive member according to 請 Motomeko 1 that. The second position the injected rinsing liquid that per jetted on the cylindrical substrate from the nozzle, cylindrical for electrophotographic photosensitive member according to 請 Motomeko 2 Ru der within 10mm from the upper end of the cylindrical body Method for rinsing a substrate. It said electrophotographic photosensitive member, an amorphous silicon down feeling cylindrical substrate method rinse of the electrophotographic photosensitive member for according to any one of the optical body Der Ru請 Motomeko 1-3. Forming a step of cleaning the cylindrical substrate for an electrophotographic photosensitive member by the method of rinsing according to any one of claims 1 to 3 and a sensitive optical layer on the cleaned the cylindrical base body A process for producing an electrophotographic photosensitive member, comprising: 6. The method for producing an electrophotographic photosensitive member according to claim 5, wherein the step of forming the photosensitive layer is a step of forming a photosensitive layer of amorphous silicon.