JP2010274245A - Washing apparatus, drying apparatus, and washing system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a washing apparatus, a drying apparatus, and a washing system which an efficiently suppress washing unevenness and drying unevenness even having compact configurations. <P>SOLUTION: When a valve V1 is opened after apertures 11 and 12 are shut with a shutter 13, hot water supplied from a liquid supply source WP is continuously sprayed to a component W (herein, an object to be washed) fixed in a chuck 20 through fine holes 31e and 31f as well as fine holes 31g and 31h. Alternatively, a valve V2 is periodically opened or closed to intermittently spray air supplied from an air pressure source AP through fine holes 31i and 31j as well as fine holes 31k and 31m. Consequently, the surface of the component W is washed in a state that air and hot water are mixed, so that a high washing effect can be obtained. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a cleaning device, a drying device, and a cleaning system suitable for cleaning processed parts and the like.

  When a part is machined using a lathe or the like, foreign matters such as swarf and cutting oil adhere to the processed part. Therefore, a process for washing the part is usually required before assembly. On the other hand, Patent Document 1 discloses an apparatus for cleaning a workpiece by spraying air and a cleaning liquid from a nozzle.

JP 2008-253960 A

  However, according to the apparatus of Patent Document 1, in order to blow air and cleaning liquid from the fixed nozzle against the outer periphery of the rotating work, the air and the cleaning liquid do not exactly hit the radial direction of the work and rotate. Depending on the direction, there may be partial cleaning unevenness. Similarly, in the drying of the workpiece, air is blown from the fixed nozzle to the outer periphery of the rotating workpiece, so that the air does not strictly hit the workpiece in the radial direction, and uneven drying occurs partially depending on the rotation direction. There is a fear. In addition, since the workpiece is rotated, a relatively large apparatus is required, and the cleaning liquid is likely to be scattered from the rotating workpiece by centrifugal force, so that the chamber needs to be securely sealed.

  The present invention has been made in view of the above points, and an object thereof is to provide a cleaning device, a drying device, and a cleaning system that can effectively suppress cleaning unevenness and drying unevenness while having a compact configuration.

The cleaning device according to claim 1 comprises:
An annular main body having an inner diameter capable of arranging the cleaning object inside;
A plurality of liquid passages that are arranged side by side in the circumferential direction on the inner periphery of the main body and are connected to an external liquid supply source;
A plurality of gas passages arranged in the circumferential direction on the inner periphery of the main body portion and connected to an external gas supply source,
Liquid is ejected from the opening of the liquid passage at least inward in the direction orthogonal to the axis of the main body in a state where the cleaning object is disposed inside the main body (including the case of relative movement), and the gas Gas is ejected from the opening of the passage.

  According to the present invention, the plurality of liquid passages connected to the external liquid supply source are arranged in the circumferential direction on the inner circumference of the main body, and the circumferential direction is opened on the inner circumference of the main body. Therefore, the entire outer periphery of the cleaning object can be effectively cleaned without rotating the cleaning object. In addition, the liquid that bounces off the outer periphery of the cleaning object hits the inner periphery of the main body at the opposite position, thereby suppressing splashing to the outside, and the liquid rebounding on the inner periphery of the main body is A merit that the cleaning effect is increased by hitting the object again can be expected. Note that “at least inward in the direction perpendicular to the axis of the main body” may have a component that goes inward in the direction perpendicular to the axis of the main body, and is not necessarily perpendicular to the axis.

  The cleaning apparatus according to claim 2, wherein liquid is ejected from the opening of the liquid passage and gas is ejected from the opening of the gas passage in a direction inclined with respect to the axis of the main body. To do. Thereby, the cleaning object can be cleaned more effectively.

In the cleaning device according to claim 3, two sets of the liquid passages are provided, and the ejection direction of the liquid ejected from one set of liquid passages is the ejection direction of the liquid ejected from the other set of liquid passages. Is different,
Two sets of the gas passages are provided, and the ejection direction of the gas ejected from one set of gas passages is different from the ejection direction of the gas ejected from the other set of gas passages. Thereby, the cleaning object can be more effectively cleaned.

  According to a fourth aspect of the present invention, in the main body portion, the liquid passage is disposed on the outer side in the axial direction with respect to the gas passage. Thereby, the cleaning object can be cleaned more effectively.

  6. The cleaning apparatus according to claim 5, wherein the ejection of the liquid is continuous and the ejection of the gas is intermittent. Thereby, the cleaning object can be cleaned more effectively.

The drying device according to claim 6 is:
An annular main body having an inner diameter through which dry matter can pass;
A plurality of first gas passages that are arranged side by side in the circumferential direction on the inner periphery of the main body and are connected to an external gas supply source;
A second gas passage that continuously opens in the circumferential direction on the inner circumference of the main body and is connected to an external gas supply source,
The ejection direction of the gas ejected from the first gas passage is different from the ejection direction of the gas ejected from the second gas passage,
The gas ejected from the first gas passage and the gas ejected from the second gas passage are blown toward the dry matter while passing the dry substance inside the main body. Features.

  According to the present invention, the gas ejected from the first gas passage and the gas ejected from the second gas passage are blown toward the dry matter while passing the inside of the main body portion through the dry matter. By forming a continuous air curtain inside the main body portion with the gas ejected from the second gas passage, the liquid and foreign matter blown off from the surface of the dry matter by the gas ejected from the first gas passage It can be captured effectively and scattering to the outside can be suppressed.

  The drying apparatus according to claim 7, wherein a jet direction of the gas ejected from the second gas passage is a direction orthogonal to an axis of the main body portion, and the gas ejected from the first gas passage is The ejection direction is inclined with respect to the axis of the main body. Thereby, since turbulent flow is generated by the mixing of the gas, even when the dried product has a complicated shape, the gas can penetrate into the details and can be dried more effectively.

  The drying device according to claim 8 is configured such that when the gas is ejected, the dried product and the drying device repeatedly move relative to each other, and the dried product moves relative to the drying device upward in the gravity direction. The speed is characterized by being slower than the speed of relative movement downward in the direction of gravity. Thereby, drying can be performed more effectively while suppressing scattering of liquid or the like.

  A cleaning system according to a ninth aspect includes the cleaning apparatus according to the first to fifth aspects and the drying apparatus according to any one of the sixth to eighth aspects.

  According to the present invention, it is possible to provide a cleaning device, a drying device, and a cleaning system that can effectively suppress cleaning unevenness and drying unevenness with a compact configuration.

It is a figure which shows the washing | cleaning system of this Embodiment. It is a figure which shows the washing | cleaning system of this Embodiment. It is a figure which shows the washing | cleaning system of this Embodiment. It is a figure which shows the washing | cleaning system of this Embodiment. 2 is a perspective view of a chuck 20. FIG. 6A is a top view of the central annular portion 31 of the cleaning device 30 (viewed in the direction of arrow VIA in FIG. 6B), and FIG. 6B is a cross-sectional view of the cleaning device 30. FIG. However, only a part of the pores on the inner periphery are drawn. 7A is a top view of the drying device 40, and FIG. 7B is a cross-sectional view of the drying device 40 of FIG. 7A taken along the line VIIB-VIIB and viewed in the direction of the arrow. .

  The invention will now be described with reference to the brief description of the drawings. 1-4 is a figure which shows the washing | cleaning system concerning this Embodiment. In the figure, a housing-like chamber 10 has openings 11 and 12 at the top, and a shutter 13 (FIG. 3) for shielding the openings 11 and 12.

  A base 14 is fixed to the bottom surface of the chamber 10. A tank 16 supported below the opening 11 by a support plate 15 attached to the base 14 has a casing shape with an open top, and stores hot water LQ as a cleaning liquid therein. A drain hole 16a with a stopper is formed at the bottom of the tank 16, and the hot water LQ can be extracted from the drain hole 16a by removing the stopper.

  Further, the base portion 14 supports the chuck 20 via the support base 17. A cleaning device 30 is fixed to the chamber 10 coaxially with the chuck 20 above, and a drying device 40 is fixed to the chamber 10 coaxially with the cleaning device 30 above and below the opening 12. Yes. In addition, you may seal between the washing | cleaning apparatus 30 and the drying apparatus 40 by providing a cylindrical shielding curtain.

  FIG. 5 is a perspective view of the chuck 20. In FIG. 5, the chuck 20 includes a disk-shaped main body 21 attached to the support base 17 (FIGS. 1 to 4) and eight fan-shaped columnar claw portions 22 attached around the axis of the main body 21. By supplying compressed air from an air pressure source (not shown) to the main body 20, each claw portion 22 can approach or separate from the axis of the main body 21, and a component W (described later) (see FIGS. 1 to 4). ) Can be held and fixed. As such a chuck, for example, the one described in JP 2007-15038 A can be suitably used.

  FIG. 6A is a top view of the central annular portion 31 of the cleaning device 30, and FIG. 6B is a cross-sectional view of the cleaning device 30. The cleaning device 30 includes a central annular portion 31 and outer annular portions 32 and 32 constituting a main body, and these are annular shapes having the same inner diameter and outer diameter. The central annular portion 31 has an upper surface inner circumferential groove 31a and an upper surface outer circumferential groove 31b on its upper surface, and has a lower surface inner circumferential groove 31c and a lower surface outer circumferential groove 31d on its lower surface. The inner circumferential grooves 31a and 31c are shallower than the outer circumferential grooves 31b and 31d.

  From the bottom surface of the upper surface inner circumferential groove 31a to the inner circumference of the central annular portion 31, it is inclined toward the axis and at an angle of about 60 degrees (that is, downward) with respect to it, and two sets of pores 31e of φ0.8 mm , 31f extend side by side and open at the inner periphery of the central annular portion 31. The pores 31e are arranged radially at equal intervals of 10 degrees in the circumferential direction, and the pores 31f are arranged radially between the adjacent pores 31e, 31e. It is shifted inward in the axial direction. On the other hand, from the bottom surface of the lower surface inner circumferential groove 31c to the inner periphery of the central annular portion 31, it is inclined toward the axis and at an angle of about 120 degrees (that is, upward) with respect to two sets of φ0.8 mm. The holes 31 g and 31 h extend side by side and open at the inner periphery of the central annular portion 31. The pores 31g are radially arranged at equal intervals of 10 degrees in the circumferential direction, and the pores 31h are radially arranged between the adjacent pores 31g and 31g. Are shifted inward in the axial direction (that is, arranged in two rows in a zigzag manner in the circumferential direction). The extension lines of the pores 31e and 31f and the pores 31g and 31h intersect each other at an angle of about 60 degrees on the axis of the central annular portion 31.

  Further, from the side surface of the upper outer circumferential groove 31b to the inner circumference of the central annular portion 31, it is inclined toward the axis and at an angle of about 60 degrees (that is, downward) with respect to the two sets of φ0.8 mm. The holes 31 i and 31 j extend side by side and open at the inner periphery of the central annular portion 31. The pores 31i are radially arranged at equal intervals of 10 degrees in the circumferential direction, and the pores 31j are radially arranged between the adjacent pores 31i, 31i. It is shifted inward in the axial direction. On the other hand, from the side surface of the lower outer circumferential groove 31d to the inner circumference of the central annular portion 31, it is inclined toward the axis and at an angle of about 120 degrees (that is, upward), and two sets of φ0.8 mm The holes 31k and 31m extend side by side and open at the inner periphery of the central annular portion 31. The pores 31k are arranged radially at equal intervals of 10 degrees in the circumferential direction, and the pores 31m are arranged radially between the adjacent pores 31k, 31k. Are shifted inward in the axial direction (that is, arranged in two rows in a zigzag manner in the circumferential direction). The extended lines of the pores 31i, 31j and the pores 31k, 31m intersect each other at an angle of about 60 degrees on the axis of the central annular portion 31. In the present embodiment, with respect to the axial direction of the center annular portion 31, the pores 31e and 31f that are liquid passages and the pores 31g and 31h, the pores 31i and 31j that are gas passages and the pores 31k, Although 31 m is open, this relationship may be reversed.

  The central annular portion 31 has through holes 31n and 31p extending from the outer periphery in the direction orthogonal to the axis. The through hole 31n communicates with the upper outer circumferential groove 31b, and supplies pressurized air from an external air pressure source (which may be factory air as a gas supply source) AP through a pipe and a valve V1. The through hole 31p communicates with the lower outer circumferential groove 31d and supplies pressurized air from an external air pressure source AP via a pipe and a valve V1.

  The outer annular portions 32 and 32 used in close contact with both sides in the axial direction of the central annular portion 31 have through holes 32a and 32a extending in the axial direction, respectively. The through hole 32a of the upper outer annular portion 32 communicates with the upper surface inner circumferential groove 31a, and supplies hot water stored in an external liquid supply source WP (including a pump and a tank, for example) via a pipe and a valve V2. It is like that. Further, the through hole 32a of the lower outer annular portion 32 communicates with the lower surface inner circumferential groove 31c and supplies hot water stored in an external liquid supply source WP via a pipe and a valve V2. A gasket or O-ring as a sealing means may be interposed between the central annular portion 31 and the outer annular portions 32 and 32.

  7A is a top view of the drying device 40, and FIG. 7B is a cross-sectional view of the drying device 40 of FIG. 7A taken along the line VIIB-VIIB and viewed in the direction of the arrow. . The drying device 40 includes an upper annular portion 41 and a lower annular portion 42 that constitute a main body, and these are annular shapes having the same inner diameter and outer diameter, and are attached so as to be in close contact with each other. The upper annular portion 41 has eight bag holes 41a formed at equal intervals in the circumferential direction on the lower surface thereof. Each bag hole 41a is formed with a through hole 41b extending from the outer periphery in a direction orthogonal to the axial direction. The through hole 41b is connected to an external air pressure source (as a gas supply source) through a pipe and a valve V3. Pressurized air from the AP is supplied.

  In addition, from the side surface of each bag hole 41a toward the inner circumference of the upper annular portion 41, it is inclined toward the axis and at an angle of about 60 degrees (that is, downward) with respect to the pore 41c of φ0.8 mm. Extends radially and opens at the inner periphery of the upper annular portion 41.

  On the other hand, on the upper surface of the lower annular portion 42, a step portion 42a including a plane whose inner peripheral side is shifted (lowered) by one step is formed in parallel to the upper surface and continuously in the circumferential direction. When the lower surface of the upper annular portion 41 and the upper surface of the lower annular portion 42 are brought into close contact with each other, a circumferential groove 43 continuous in the circumferential direction is formed by the step portion 42a and the lower surface of the upper annular portion 41, and the bag hole 41a. The open end of each is open to the circumferential groove 43. Therefore, the air supplied from the through-hole 41b is ejected at an inclination of about 60 degrees with respect to the axis to the inside of the drying device 40 through the pore 41c that is the first gas passage, while the second gas An air curtain is formed by being continuously ejected in the circumferential direction toward the inner side in the direction orthogonal to the axis via a circumferential groove 43 serving as a passage.

  Next, operation | movement of the washing | cleaning system of this Embodiment is demonstrated with reference to FIGS. Here, it is assumed that the transport device 50 is used. The conveyance apparatus 50 has a pair of claw portions 51 and 51 that can approach / separate, and is movable up and down and left and right in FIGS.

  In the initial state, the valves V1, V2, V3 are in the closed position. First, the shutter 13 is retracted, and the openings 11 and 12 of the chamber 10 are opened. Next, the cylindrical (but not limited to) cylindrical part W that has been machined is gripped by the claw portions 51 and 51 of the transport device 50 and transported to above the opening 11, and further lowered through the opening 11. As shown in FIG. 1, it is immersed in the cleaning liquid LQ in the tank 16, and the transfer device 50 is moved up and down to wash away foreign substances adhering to the surface (particularly the lower part). In addition, it is desirable that the up-and-down operation of the transfer device 50 is about 3 to 10 times and the number of times can be changed.

  Thereafter, the conveying device 50 is lifted together with the parts W, moved above the opening 12, and further lowered through the inside of the opening 12, the drying device 40 and the cleaning device 30, as shown in FIG. 2, as shown in FIG. 2. Is opened and the parts W are delivered to the chuck 20, and then the conveying device 50 is retracted to the outside of the opening 12. Here, as shown in FIG. 3, when the valve V <b> 1 is opened after the openings 11 and 12 are shielded by the shutter 13, the pores 31 e and the parts W (here, the cleaning object) fixed to the chuck 20. Hot water supplied from the liquid supply source WP is continuously ejected through 31f and the pores 31g and 31h. Further, by periodically opening and closing the valve V2, air supplied from the air pressure source AP is intermittently injected through the pores 31i and 31j and the pores 31k and 31m. Thereby, since the surface of the component W is cleaned in a state where air and hot water are mixed, a high cleaning effect can be obtained. However, the air may be continuously ejected.

  In particular, in the present embodiment, the air and hot water sprayed onto the part W intersect with each other at about 60 degrees with respect to the axis of the cleaning device 30, so that even if the surface of the part W has a complicated shape with irregularities. , You can clean up to the details. The hot water bounced off against the outer periphery of the part W hits the inner periphery of the central annular portion 31 or the outer annular portions 32, 32 located at the opposite positions, thereby suppressing scattering to the outside and the central annular portion 31. Or the liquid which bounced off in the inner periphery of the outer side annular parts 32 and 32 hits the component W again, and the merit that a cleaning effect is increased can also be expected.

  After the cleaning process for a predetermined time, the valves V1 and V2 are closed, the shutter 13 is opened, the transfer device 50 is made to enter the chamber 10 through the opening 12, and the parts W are opened by the opened claws 51 and 51. After gripping, it is released from the chuck 20. Thereafter, the conveying device 50 is raised together with the part W with water droplets, and the valve V3 is opened.

  When the part W approaches the position of the drying device 40, the ascending speed of the conveying device 50 is reduced, and thereafter, the part W (here, dry matter) is moved up and down inside the drying device 40 as shown in FIG. At this time, it is preferable to reciprocate until the lower surface of the upper surface of the component W exceeds the position of the circumferential groove 43. In addition, it is preferable that the speed at which the part W moves upward relative to the drying device 40 is slower than the speed at which the part W moves downward. As a result, the air jetted downward from the pores 41c of the drying apparatus 40 at an inclination of about 60 degrees with respect to the axis blows away water droplets adhering from the component W during cleaning. On the other hand, the air continuously blown in the circumferential direction through the circumferential groove 43 in the circumferential direction forms a so-called air curtain. Since the limit is set, there is no particular problem even if the shutter 13 is left open. In addition, it is desirable that the up-and-down operation of the transfer device 50 is about 3 to 10 times and the number of times can be changed.

  After the drying process, the valve V3 is closed, the conveying device 50 is lifted together with the component W through the opening 12, and the component W is conveyed to the next step. Thus, the cleaning / drying process in the cleaning system of the present embodiment is completed.

  The present invention is not limited to the above embodiment. The cleaning liquid is not limited to hot water, and for example, a hydrocarbon-based cleaning liquid described in JP-A-2004-107499 can be used. Also, the form of the conveying device is not limited to the above, and any apparatus can be used as long as it can convey parts while holding the parts. Or you may use the chuck | zipper 20 as a structure which can move up and down instead of a conveying apparatus.

DESCRIPTION OF SYMBOLS 10 Chamber 11 Opening 12 Opening 13 Shutter 14 Base 15 Support plate 16 Tank 17 Support base 20 Chuck 21 Main body 22 Claw part 30 Cleaning device 31 Central annular part 31a Upper surface inner circumferential groove 31b Upper surface outer circumferential groove 31c Lower surface inner circumferential groove 31d Lower surface outside Circumferential groove 31e Pore 31f Pore 31g Pore 31h Pore 31i Pore 31j Pore 31k Pore 31m Pore 31n Passing hole 31p Passing hole 32 Outer annular part 32a Passing hole 40 Drying device 41 Upper annular part 41a Bag hole 41b Through hole 41c Pore 42 Lower annular part 42a Step part 43 Circumferential groove 50 Conveying device 51 Claw part AP Air pressure source LQ Hot water V1 Valve V2 Valve V3 Valve W Parts WP Liquid supply source

Claims (9)

An annular main body having an inner diameter capable of arranging the cleaning object inside;
A plurality of liquid passages that are arranged side by side in the circumferential direction on the inner periphery of the main body and are connected to an external liquid supply source;
A plurality of gas passages that are aligned and opened in the circumferential direction on the inner periphery of the main body and connected to an external gas supply source,
In a state where the cleaning object is arranged inside the main body, liquid is ejected from the opening of the liquid passage and gas is ejected from the opening of the gas passage at least inward in the direction orthogonal to the axis of the main body. A cleaning device.   The cleaning apparatus according to claim 1, wherein liquid is ejected from the opening of the liquid passage and gas is ejected from the opening of the gas passage in a direction inclined with respect to the axis of the main body. Two sets of the liquid passages are provided, and the ejection direction of the liquid ejected from one set of liquid passages is different from the ejection direction of the liquid ejected from the other set of liquid passages,
The gas passages are provided in two sets, and the jet direction of the gas jetted from one set of gas passages is different from the jet direction of the gas jetted from the other set of gas passages. The cleaning apparatus according to 1 or 2.   The cleaning apparatus according to claim 3, wherein in the main body portion, the liquid passage is disposed on the outer side in the axial direction with respect to the gas passage.   The cleaning apparatus according to claim 1, wherein the ejection of the liquid is continuous and the ejection of the gas is intermittent. An annular main body having an inner diameter through which dry matter can pass;
A plurality of first gas passages that are arranged side by side in the circumferential direction on the inner periphery of the main body and are connected to an external gas supply source;
A second gas passage that continuously opens in the circumferential direction on the inner circumference of the main body and is connected to an external gas supply source,
The ejection direction of the gas ejected from the first gas passage is different from the ejection direction of the gas ejected from the second gas passage,
The gas ejected from the first gas passage and the gas ejected from the second gas passage are blown toward the dry matter while passing the dry substance inside the main body. Feature drying equipment.   The ejection direction of the gas ejected from the second gas passage is a direction orthogonal to the axis of the main body, and the ejection direction of the gas ejected from the first gas passage is the axis of the main body. The drying device according to claim 6, wherein the drying device is inclined with respect to the device.   When the gas is ejected, the dried product and the drying device repeatedly move relative to each other, and the speed at which the dried product moves relative to the drying device upward in the direction of gravity moves relatively downward in the direction of gravity. The drying apparatus according to claim 6 or 7, wherein the drying apparatus is slower than the speed.   A cleaning system comprising the cleaning device according to claim 1 and the drying device according to any one of claims 6 to 8.

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