JP2010270823A - Purge valve and substrate storing container - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a purge valve configured so that mounting operation can be further easily or rapidly performed by imparting bidirectionality to the valve, and the number of gas supply ports or the like can be also increased as needed, and a substrate storing container. <P>SOLUTION: The purge valve includes a valve case 21 fitted to a through-hole 4 of a bottom plate 3 of a container body; a hollowed internal pressure regulating valve element 39 reciprocatingly inserted to the valve case 21 through a coil spring 27 to open and close the valve case 21; an external pressure regulating valve element 44 reciprocatingly inserted to the internal pressure regulating valve element 39 through a coil spring 41 to open and close the internal pressure regulating valve element 39; and a gas filtering filter 48 interposed between the valve case 21 and the internal pressure regulating valve element 39 and external pressure regulating valve element 44. When gas is distributed from one end toward the other end of the valve case 21, the external pressure regulating valve element 44 is moved backward to open the closed internal pressure regulating valve element 39, and when the gas is distributed from the other end toward one end of the valve case 21, the internal pressure regulating valve element 39 is moved backward to open the closed valve case 21. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a purge valve and a substrate storage container used for storing, storing, transporting, transporting, and the like, a substrate made of a semiconductor wafer or a mask glass.

  In recent years, the wiring pitch of semiconductor components has been narrowed and miniaturized, and in view of such trends, substrate storage containers for storing semiconductor wafers are required to have a high degree of sealing performance and automation of handling. Yes. In view of such a demand, a type of substrate storage container with a check valve used for gas purge has been developed (see Patent Documents 1, 2, and 3).

  Although not shown, the substrate storage container with a check valve includes a container main body for aligning and storing a plurality of semiconductor wafers, and a lid for opening and closing the opening of the container main body. Each is equipped with a check valve. Each check valve is configured to include a cylindrical valve case and a valve body that is supported by the valve case so as to reciprocate via a spring and has an annular seal surface. The valve case is divided into a cylindrical case that is exposed to the outside of the container body and a holding cylinder that is detachably screwed into the cylindrical case and is positioned in the container body.

JP 2004-146676 A JP 2004-179449 A JP 2002-521189 A

  The conventional substrate storage container is configured as described above, and the valve body is simply elastically supported by the valve case of the check valve. Therefore, both the check valve for gas supply and the check valve for gas exhaust are provided. As a result, there is a problem that the work of attaching a plurality of check valves to the peripheral wall of the container body is very complicated and complicated, and the work cannot be simplified or speeded up.

  Conventionally, in processes where gas can be slowly supplied, such as gas purging during storage in a stocker, the gas supply port and gas exhaust port are allocated and operated at a ratio of 1: 1. In the process of supplying air, there are cases where it is desired to increase the number of gas supply ports. However, when the specifications of the check valve for gas supply and the check valve for gas exhaust are different, since each check valve is a dedicated product, there is a possibility that the number of gas supply ports cannot be increased rapidly.

  The present invention has been made in view of the above, and it is possible to simplify and speed up the mounting work by imparting bidirectionality to the valve, and to quickly increase the number of gas supply ports as necessary. It is an object of the present invention to provide a purge valve and a substrate storage container that can be used.

In the present invention, in order to solve the above-described problem, one end of a hollow valve case is opened, and at least the air permeability is imparted to the other end of the valve case, and gas is circulated between both ends of the valve case. And controlling the flow of this gas,
A hollow internal pressure adjusting valve body that is inserted and supported in the valve case so as to reciprocate and opens and closes the valve case, and an external pressure adjusting valve body that is inserted and supported so as to be able to reciprocate in the internal pressure adjusting valve body and open and close the internal pressure adjusting valve body And a gas filter interposed between the other end of the valve case and the internal pressure regulating valve body and the external pressure regulating valve body,
When gas flows from one end of the valve case toward the other end, the external pressure regulating valve body is moved forward to open the space between the closed internal pressure regulating valve body and one end from the other end of the valve case. When the gas flows in the partial direction, the internal pressure adjusting valve body is moved forward to open the space between the closed valve case.

  The valve case is divided into a cylindrical case that houses the internal pressure adjusting valve body and the external pressure adjusting valve body, and at least a hollow holding case that houses the filter and is detachably fitted to the cylindrical case. One end of the cylindrical case is formed in a substantially funnel shape, and the inner surface is a guide inclined surface that seals tightly against the internal pressure regulating valve body, and the inner pressure is near the boundary between the one end and the remaining part in the cylindrical case. A support portion for supporting the regulating valve body can be formed.

Further, a contact cap having elasticity can be exchangeably attached to the cylindrical case of the valve case, and a circulation port can be provided in the contact cap.
Further, a hollow nozzle tower can be formed to protrude from the holding case of the valve case, and a gas ejection hole can be provided in the nozzle tower.
In addition, the nozzle hole can be formed so as to gradually widen from the inside of the nozzle tower toward the outside.

  Also, the internal pressure adjusting valve body is formed into a cylindrical shape, and a seal member that is in close contact with the guide inclined surface of the cylindrical case is attached to the peripheral surface on one end side, and the other end side of the internal pressure adjusting valve body is substantially funnel-shaped. The inner surface of the outer pressure adjusting valve body is formed into a substantially columnar shape, and a seal member in close contact with the guide supporting inclined surface of the inner pressure adjusting valve body can be attached to the peripheral surface.

In the present invention, in order to solve the above problems, the opening of the container main body for storing the substrate is opened and closed by a lid,
A through hole is provided in one of the container body and the lid, and the purge valve according to any one of claims 1 to 4 is attached to the through hole to replace the gas in the container body.

A through hole is provided in the bottom plate of the container body, and a purge valve can be fitted into the through hole via a spacer ring and a loosening prevention ring so that one end of the valve case of the purge valve faces the outside of the container body.
Further, a positioning part for positioning the holding case of the valve case can be formed on the spacer ring.

In addition, a partition shielding plate that forms a chamber region for gas isolation between the inner surface of the rear surface of the container body and a rear surface of the container body is attached to the partition shielding plate. And a purge valve can be communicated with the chamber region.
Furthermore, it is possible to attach a filter that isolates the inside of the partition shielding plate and the ejection port to the partition shielding plate, and this filter allows the gas accumulated at a predetermined pressure to be ejected from the ejection port to the outside.

  Here, it is possible to insert the internal pressure adjusting valve body into the valve case in the claims through various spring members, and insert the external pressure adjusting valve body into the internal pressure adjusting valve body through various spring members. it can. The other end of the valve case may be open as long as it has air permeability, or may be a closed surface having a required number of holes. The gas includes at least an inert gas such as dry air, nitrogen gas, and argon gas. The seal member includes at least an elastic O-ring and a gasket. The purge valve according to the present invention can be used not only in semiconductor-related fields but also in fields such as chemistry, measurement analysis, pharmaceuticals, and biotechnology.

  The purge valve can be used in the vertical direction, front-rear direction, left-right direction, and oblique direction as necessary. When the purge valve is attached to the substrate storage container, the purge valve can be attached to the through-hole of the container body, or the through-hole can be provided in the lid body and attached to the through-hole. Further, the substrate corresponds to at least one semiconductor wafer, a liquid crystal substrate, a glass substrate, a mask glass, and the like. The substrate storage container may be a top open box type, a front open box type, or a bottom open box type. The container body of the substrate storage container is not particularly required to be transparent, opaque or translucent.

  According to the present invention, when a purge valve having a divided structure is attached to the openings of various cases, housings, pipes, containers, etc., an internal pressure adjusting valve body and an external pressure adjusting valve body are combined with the cylindrical case of the valve case. Store and fix the filter in the holding case of the valve case, insert the holding case into the opening from one direction, and fit the cylindrical case of the valve case into the exposed part of the holding case exposed in the other direction from the opening If combined, a purge valve can be attached to the opening.

  Next, when gas is supplied from the one end side of the valve case toward the other end side of the air permeability, the external pressure adjustment valve body moves forward from the internal pressure adjustment valve body due to the pressure of the gas, The flow path between the internal pressure adjusting valve element and the external pressure adjusting valve element is opened. By opening the flow path, gas flows from the one end side of the valve case toward the other end of the valve case via the purge valve flow path.

  On the other hand, when gas is supplied from the other end side of the valve case toward the one end, the internal pressure regulating valve body moves forward from the inner surface of the valve case due to the pressure of the gas, The flow path between the regulating valve body is opened. By opening this flow path, gas flows from the other end side of the valve case to the one end side of the valve case via the purge valve flow path.

  According to the present invention, it is possible to simplify and speed up the mounting work by imparting bidirectionality to the valve, and it is possible to increase the number of gas supply ports and the like quickly as necessary. is there.

  Further, if the valve case is divided into a cylindrical case that stores the internal pressure adjusting valve body and the external pressure adjusting valve body, and at least a hollow holding case that stores the filter and is detachably fitted to the cylindrical case, The internal pressure adjusting valve element, the external pressure adjusting valve element, or the filter can be easily replaced if necessary.

  Also, if one end of the cylindrical case is formed in a substantially funnel shape and its inner surface is a guide inclined surface that seals closely against the inner pressure adjusting valve body, the inner pressure adjusting valve body is guided by the guide inclined surface and In close contact with each other, a good sealing state can be obtained. Further, if a support portion for supporting the internal pressure adjusting valve body is formed near the boundary between the one end side and the remaining portion in the cylindrical case, it is possible to prevent the internal pressure adjusting valve body from falling off from the valve case with a simple configuration. it can.

Moreover, if a hollow nozzle tower is protruded from the holding case and a gas ejection hole is provided in this nozzle tower, gas can be effectively injected toward various articles such as electronic parts, electrical parts, and products. It is possible to prevent contamination and oxidation of articles.
In addition, the internal pressure adjusting valve body is formed in a cylindrical shape, and a seal member that is in close contact with the guide inclined surface of the cylindrical case is attached to the peripheral surface on one end side, or the external pressure adjusting valve body is formed in a substantially columnar shape. If a seal member that is in close contact with the guide support slope of the internal pressure adjusting valve element is attached to the peripheral surface, it is possible to prevent gas leakage from the valve case due to the close contact of the seal member.

  In addition, a through hole is provided in the bottom plate of the container body, a purge valve is fitted into the through hole via a spacer ring and a loosening prevention ring, and one end of the valve case of the purge valve is directed to the outside of the container body. It is possible to correct a processing error associated with the drawing taper when the container body is removed from the mold, and to prevent the valve case from dropping from the through hole of the substrate storage container.

  Furthermore, a partition shielding plate that forms a chamber region for gas isolation between the inner surface of the rear surface of the container body and a rear surface of the container body is attached to the partition shielding plate. If the purge valve is formed and communicated with the chamber region, gas can be effectively injected toward the substrate housed in the container body, and contamination and oxidation of the substrate can be prevented.

1 is an exploded perspective view schematically showing an embodiment of a purge valve and a substrate storage container according to the present invention. It is a section top view showing typically an embodiment of a substrate storage container concerning the present invention. It is a top view showing typically an embodiment of a substrate storage container concerning the present invention. It is a front view showing typically an embodiment of a substrate storage container concerning the present invention. It is a bottom view showing typically an embodiment of a substrate storage container concerning the present invention. It is a section explanatory view showing typically an embodiment of a purge valve and a substrate storage container concerning the present invention. It is a section explanatory view showing typically the supply state of the purge valve in the embodiment of the purge valve and substrate storage container concerning the present invention. It is a section explanatory view showing typically the exhaust state of the purge valve in the embodiment of the purge valve and substrate storage container concerning the present invention. It is a sectional side view showing typically a 2nd embodiment of a purge valve and a substrate storage container concerning the present invention. It is a front view showing typically a 2nd embodiment of a purge valve and a substrate storage container concerning the present invention. It is a bottom view showing typically a 2nd embodiment of a purge valve and a substrate storage container concerning the present invention. It is a perspective explanatory view showing typically the holding case in the second embodiment of the purge valve and the substrate storage container according to the present invention. It is a front view which shows typically the holding | maintenance case in 2nd Embodiment of the purge valve and substrate storage container which concern on this invention. It is XIV-XIV sectional view explanatory drawing of FIG. It is a top view which shows typically the holding case in 2nd Embodiment of the purge valve and substrate storage container which concern on this invention. It is a bottom view which shows typically the holding case in 2nd Embodiment of the purge valve and substrate storage container which concern on this invention. It is a section explanatory view showing typically a 3rd embodiment of a purge valve and a substrate storage container concerning the present invention. It is explanatory drawing which shows typically the division shielding board in 3rd Embodiment of the purge valve and substrate storage container which concern on this invention. It is explanatory drawing which shows typically the other partition shielding board in 3rd Embodiment of the purge valve and substrate storage container which concern on this invention. It is a section explanatory view showing typically a 4th embodiment of a purge valve and a substrate storage container concerning the present invention.

  Hereinafter, an embodiment of the present invention will be described with reference to the drawings. As shown in FIGS. 1 to 8, a substrate storage container in the present embodiment includes a container body 1 that stores a plurality of semiconductor wafers W, and And a lid 10 that opens and closes the front surface of the container body 1. The container body 1 has a plurality of through holes 4, and a bi-directional purge valve 20 for supplying and exhausting gas is fitted into each through hole 4. The air in the container body 1 is replaced with an inert gas such as nitrogen gas to prevent surface oxidation of the semiconductor wafer W and the like.

  As shown in FIG. 2, the semiconductor wafer W is made of, for example, a φ300 mm silicon wafer having a thickness of 775 μm, and a notch for alignment and identification (not shown) is cut out in a semicircular plane on the peripheral edge. Twenty-five pieces are aligned and stored in the main body 1.

  The container body 1 and the lid body 10 are each injection-molded with a molding material containing a predetermined resin. Examples of the predetermined resin in the molding material include polycarbonate, polyether ether ketone, polyether imide, and cyclic olefin resin, which are excellent in mechanical properties and heat resistance. Carbon, carbon fiber, metal fiber, carbon nanotube, conductive polymer, antistatic agent, flame retardant or the like is selectively added to the molding material as necessary.

  As shown in FIGS. 2 to 5, the container body 1 is formed in an opaque front open box type in which a plurality of semiconductor wafers W are aligned and stored in the vertical direction, and the open oblong front is directed horizontally. In this state, the semiconductor wafer is positioned and mounted on a semiconductor processing device or a gas replacement device, or is washed with a cleaning liquid in a cleaning tank. A pair of left and right support pieces 2 for horizontally supporting the semiconductor wafer W are provided on both sides inside the container body 1, that is, on the inner surfaces of both side walls, and the pair of support pieces 2 are arranged at a predetermined pitch in the vertical direction. Is done.

  The bottom plate 3 of the container body 1 is provided with holes 4 that are not overlapped with the projected region of the stored semiconductor wafer W, for example, near the four corners on both the front and rear sides. The purge valves 20 that communicate between the inside and the outside of the container body 1 are detachably fitted via O-rings 32, respectively. A bottom plate 5 is screwed horizontally to the bottom plate 3 from below through fastening screws. A substrate storage container, specifically a container main body, is provided on the bottom plate 3 or both sides of the front portion and the rear center of the bottom plate 5. A positioning tool 6 for positioning 1 is screwed through a fastening screw or a boss.

  As shown in FIG. 5, the plurality of positioning tools 6 are formed such that the positioning tool 6 </ b> A on one front side is formed into a hollow truncated cone shape and is positioned in the X direction (left-right width direction) by the positioning pins of the semiconductor processing device or the gas replacement device. It is uniquely positioned in the Y direction (depth direction) and the Z direction (height direction), and the positioning tool 6B on the other side of the front part is formed in a V-shaped cross section so that it can be used as a positioning pin for a semiconductor processing device or a gas replacement device. A function to secure the degree of freedom in the lateral direction with respect to the horizontal direction and to perform the positioning in the Y direction together with the positioning tool 6A to contribute to the parallelism of the front when the substrate storage container is mounted on the semiconductor processing apparatus or the gas replacement apparatus. To do. Further, the positioning tool 6C at the center of the rear part is formed in a flat surface, and is positioned in the height direction in contact with the positioning pin.

  On the top plate of the container main body 1, a top flange for transporting gripped by a factory ceiling transport mechanism is screwed horizontally via a fastening screw. In addition, a transparent viewing window is selectively formed on the back wall 7 of the container body 1, and the inside of the container body 1 is visually observed and grasped from the outside by this viewing window. On the surfaces of the both side walls of the container body 1, in addition to reinforcement and deformation prevention, there are provided grip portions capable of interfering with fingers and the like. Further, a rim flange 8 projecting outward is formed on the peripheral edge of the front surface of the container body 1, and a detachable lid body 10 is fitted into the rim flange 8 by a lid body opening / closing device via a gasket. The

  As shown in FIG. 2, the lid 10 includes a horizontally long casing 11 that fits in the front of the container body 1, a surface plate 12 that covers the open surface (front) of the casing 11, and these casings. A locking mechanism 14 interposed between the body 11 and the surface plate 12 is provided. The casing 11 of the lid 10 is basically formed in a shallow dish with a substantially dish-shaped cross section, and a front retainer 13 that elastically holds the semiconductor wafer W is detachably attached to the center of the back surface. Is done.

  The locking mechanism 14 is not particularly limited. For example, a pair of left and right rotating plates that are rotated by the operation pins of the lid opening / closing device that penetrates the operation port of the surface plate 12, and the rotation of each rotating plate. A plurality of slide plates that slide in the vertical direction, and a plurality of locking claws that protrude from the housing 11 as the slide plates slide and engage with the locking holes of the rim flange 8 are configured.

  The plurality of purge valves 20 can be used for air supply or exhaust, but preferably a pair of left and right purge valves 20 located in the rear of the container body 1 are used for air supply. A pair of left and right purge valves 20 located in front of the front side is used for exhaust. Each purge valve 20 has an opening at its lower end that is one end of a hollow valve case 21, and at least air permeability is provided at the upper end that is the other end of this valve case 21. It is a valve that circulates gas (see arrows in the figure) made of air, inert gas, or the like between the sections and controls the gas flow.

  As shown in FIGS. 1 and 6 to 8, the purge valve 20 includes a split valve case 21 fitted into the through hole 4 of the bottom plate 3 of the container body 1, and a coil spring having an enlarged diameter in the valve case 21. A hollow internal pressure adjusting valve body 39 that is inserted and supported so as to be able to reciprocate through 27, and that opens and closes the valve case 21, and is inserted and supported so as to be able to reciprocate through a coil spring 41 having a reduced diameter in the internal pressure adjusting valve body 39. An external pressure adjusting valve body 44 for opening and closing the adjusting valve body 39, and a filter holder 46 interposed between the upper end portion of the valve case 21 and the internal pressure adjusting valve body 39 and the external pressure adjusting valve body 44 are provided. A filter 48 for gas filtration is held on the tool 46.

  The valve case 21, the internal pressure adjustment valve body 39, the external pressure adjustment valve body 44, and the filter holder 46 of the purge valve 20 are not particularly limited. For example, the purge case 20 is molded from the same molding material as the container body 1 and the lid body 10. Is done.

  As shown in FIGS. 1 and 6 to 8, the valve case 21 accommodates the combined internal pressure adjusting valve body 39 and external pressure adjusting valve body 44 and is exposed to the outside of the container body 1. A holding case 29 that houses the filter holder 46 and is detachably screwed into the cylindrical case 22 from the inside of the container main body 1. The cylindrical case 22 and the holding case 29 can be easily visually recognized. From the viewpoint of making it different from each other, it is configured to be different from each other, and is fitted into the through hole 4 of the container body 1 from the inside and outside through a spacer ring 35 and a loosening prevention ring 37.

  The cylindrical case 22 is basically formed in a cylindrical shape, and its lower end side is expanded in a substantially funnel shape in the radially outward direction, and the linearly inclined inner surface on the lower end side is an internal pressure adjusting valve element 39. The guide inclined surface 23 seals closely.

  The inner peripheral surface of the cylindrical case 22 is formed with a screw 24 that is threadedly engaged with the holding case 29 in the upper end side circumferential direction, and in the radial inner direction near the boundary between the upper end side and the lower end side. A protruding flat ring-shaped support portion 25 is formed, and a flat ring-shaped holding protrusion 26 is formed on the flat upper surface of the support portion 25, and an internal pressure adjusting valve element 39 is a coil spring on the holding protrusion 26. Positioning and holding are performed via the lower end portion of 27. A plurality of minute projections 28 that are engaged with and come into contact with the loosening prevention ring 37 are formed on the upper end surface of the cylindrical case 22 at intervals.

  The holding case 29 is basically formed in a cylindrical shape, and a screw groove 30 that engages with the screw 24 of the cylindrical case 22 is formed in the circumferential direction at the lower portion of the outer peripheral surface. A lattice-shaped partition rib 31 that is in contact with the filter 48 is erected on the part, and is detachably fitted into the through hole 4 of the container body 1 through an airtight O-ring 32. In the circumferential direction of the inner peripheral surface of the holding case 29, a plurality of locking holes 33 for the filter holder 46 are formed and arranged at intervals.

  The spacer ring 35 is formed in a ring that fits into the holding case 29, and when the purge valve 20 is fitted into the through hole 4 of the container body 1, the peripheral edge of the through hole 4 and the upper end of the holding case 29 with the flange 34. The container main body 1 is selectively interposed between the parts and functions so as to correct a dimensional error associated with the demolding taper when the molded container main body 1 is removed from the mold. On the upper surface of the spacer ring 35, a low columnar positioning portion 36 is formed to project, and the positioning portion 36 functions to position the holding case 29.

  The loosening prevention ring 37 is formed in a ring that fits into the holding case 29, and when the purge valve 20 is fitted into the through hole 4 of the container body 1, the peripheral portion of the through hole 4 and the cylindrical case 22 of the valve case 21. Between the container main body 1 and the outside. The loosening prevention ring 37 has a plurality of projections and depressions 38 formed on the lower surface, and the plurality of projections and depressions 38 are engaged and contacted with the microprotrusions 28 of the cylindrical case 22 facing each other. It functions to prevent the cylindrical case 22 from loosening and falling off.

  As shown in FIGS. 1 and 6 to 8, the internal pressure adjusting valve body 39 is basically formed in a cylindrical shape having a diameter smaller than that of the holding case 29, and a notch is formed on the peripheral surface on the lower end side. An airtight O-ring 40 that is recessed in the circumferential direction and elastically contacts the guide inclined surface 23 of the cylindrical case 22 is fitted in the notch, and a gas flow path is formed between the inner surface of the valve case 21. Form. The upper end side of the internal pressure adjusting valve body 39 is formed to expand in a substantially funnel shape in the radially outward direction so as to be close to the inner surface of the holding case 29 with a slight gap, and is locked to the upper end portion of the coil spring 27, The inner surface is an external pressure adjusting valve body 44 and a guide support slope 42 for the coil spring 41.

  In the vicinity of the boundary between the upper end side and the lower end portion of the inner surface of the internal pressure regulating valve body 39, a stepped portion 43 that interferes with the upper end portion of the coil spring 41 is formed to project inward in the radial direction. The coil spring 27 is fitted to the internal pressure adjusting valve body 39 from the outside and is supported by the support portion 25 of the cylindrical case 22 to urge the internal pressure adjusting valve body 39 upward.

  As shown in the figure, the external pressure adjusting valve body 44 is basically formed in a substantially cylindrical shape that is slightly shorter than the internal pressure adjusting valve body 39, and a flange is formed projecting radially outward at its lower end. The lower end portion of the coil spring 41 is supported by the flange, and a gas flow path is formed between the inner surface of the internal pressure regulating valve body 39. A cutout is formed in the circumferential surface on the upper end portion side of the external pressure adjusting valve body 44 in the circumferential direction, and an airtight O-ring 45 that elastically contacts the guide support slope 42 of the internal pressure adjusting valve body 39 is fitted into the cutout. Worn. The coil spring 41 is fitted to the internal pressure adjusting valve body 39 from the inside and is interposed between the stepped portion 43 and the flange of the external pressure adjusting valve body 44 to elastically bias the external pressure adjusting valve body 44 downward.

  As shown in the figure, the filter holder 46 is formed into a short breathable cylindrical shape or ring, and a lattice-shaped partition rib 47 is installed in the opening thereof, and a filter 48 is placed on the partition rib 47. The filter 48 is detachably fitted in the holding case 29 and functions to sandwich the filter 48 with the partition rib 31. A plurality of locking claws 49 are formed on the outer peripheral surface of the filter holder 46 at intervals in the circumferential direction, and the locking claws 49 are locked in the locking holes 33 of the holding case 29 to hold the filter. It functions to position and fix the tool 46.

  The filter 48 is formed into a thin disk using a material such as high-purity alumina or polytetrafluoroethylene, for example, and removes particles in the gas flowing through the filter holder 46 to contaminate the semiconductor wafer W or the like. To prevent.

  In the above configuration, when the purge valve 20 is fitted into the through hole 4 of the container body 1, first, the internal pressure adjusting valve body 39 and the external pressure adjusting valve body 44 are connected to the cylindrical case 22 of the valve case 21 with the coil springs 27 and 41. The filter holder 46 having the filter 48 is stored in the holding case 29 of the valve case 21 and positioned and fixed, and the spacer ring 35 is fitted to the holding case 29.

  When the spacer ring 35 is thus fitted to the holding case 29, the holding case 29 is fitted downward into the through hole 4 of the container body 1 together with the spacer ring 35 from the inside of the container body 1 via the O-ring 32 to position the holding case 29. Thereafter, the cylindrical case 22 of the valve case 21 is fitted and screwed together with the loosening prevention ring 37 to the lower end portion of the holding case 29 exposed from the through hole 4 so that the cylindrical case 22 and the loosening prevention ring 37 are mutually connected. The purge valve 20 can be firmly fitted into the through-hole 4 of the container body 1 if the cylindrical case 22 is prevented from loosening by being pressed against it.

  For the internal pressure adjusting valve body 39 and the external pressure adjusting valve body 44, the upper and lower sides of the internal pressure adjusting valve body 39 and the external pressure adjusting valve body 44 are inverted by 180 °, and the internal pressure adjusting valve body 39 is positioned inside the external pressure adjusting valve body 44. In this state, the valve case 21 can be stored. In this case, the guide inclined surface 23 that seals the space between the external pressure adjusting valve body 44 and the holding case 29 may be formed. Further, the external pressure adjusting valve body 44 may be supported by the coil spring 27 in the cylindrical case 22, and the internal pressure adjusting valve body 39 may be supported by the filter holder 46 fitted to the holding case 29.

  Next, a case where the air in the container body 1 is replaced with an inert gas or the like using the bidirectional purge valve 20 will be described. The purge valve 20 before the replacement has an internal pressure on the guide inclined surface 23 of the cylindrical case 22. Since the O-ring 40 of the adjustment valve body 39 is tightly sealed and the O-ring 45 of the external pressure adjustment valve body 44 is tightly sealed to the guide support inclined surface 42 of the internal pressure adjustment valve body 39, gas is introduced into and out of the container body 1. Will not leak due to errors (see FIG. 6).

  Next, when the inert gas is supplied from the outside into the container body 1, the external pressure adjusting valve body 44 rises while compressing the coil spring 41 due to the supply pressure of the inert gas, and the O-ring 45 is moved up. The internal pressure regulating valve body 39 is separated from the guide support slope 42, and the flow path between the internal pressure regulating valve body 39 and the external pressure regulating valve body 44 is opened. By opening this flow path, the inert gas is supplied into the container body 1 from the outside via the flow path of the purge valve 20 (see FIG. 7).

  When the supply of the inert gas is stopped, the external pressure adjustment valve body 44 is lowered by the restoring action of the coil spring 41 and the O-ring 45 is brought into close contact with the guide support slope 42 of the internal pressure adjustment valve body 39. The O-ring 45 of the valve body 44 is appropriately brought into close contact while being guided by the tapered guide support inclined surface 42 to ensure a good sealing state.

  Next, when the inert gas is supplied, the pressure in the container main body 1 increases, and when the air in the container main body 1 is exhausted to the outside, the internal pressure adjusting valve body 39 causes the coil spring 27 to be released by the air pressure. While being compressed, the O-ring 40 is separated from the guide inclined surface 23 of the cylindrical case 22, and the flow path between the valve case 21 and the internal pressure adjusting valve body 39 is opened. By opening this channel, air is exhausted from the inside of the container body 1 to the outside of the container body 1 via the channel of the purge valve 20 (see FIG. 8).

  When the pressure in the container main body 1 decreases, the internal pressure adjusting valve body 39 rises due to the restoring action of the coil spring 27 to bring the O-ring 40 into close contact with the guide inclined surface 23 of the cylindrical case 22. The O-ring 40 of the body 39 is appropriately brought into close contact while being guided by the tapered guide inclined surface 23 to ensure a good sealing state.

  According to the above configuration, since the bidirectional purge valve 20 that can be used for gas supply and gas exhaust is used, both the check valve for gas supply and the check valve for gas exhaust are provided. There is no need to pay attention to the mounting position of the purge valve 20 separately. Therefore, the work of attaching the plurality of purge valves 20 to the container body 1 becomes extremely easy, and the work can be simplified and speeded up.

  Further, the specifications for gas supply and gas exhaust are not different, and a dedicated valve can be omitted, so that the number of gas supply ports can be increased rapidly. Furthermore, since the cylindrical case 22 and the holding case 29 of the valve case 21 have different appearances, it can be easily grasped visually, and the cylindrical case 22 can be mistakenly attached to the holding case 29. Therefore, prevention of mounting mistakes and easy parts management can be greatly expected.

  Next, FIGS. 9 to 16 show a second embodiment of the present invention. In this case, the holding cases 29 of a plurality of barge valves 20 used for gas supply are each provided with a partition rib 31. An elongated nozzle tower 51 that extends upward from below in the container body 1 is integrally formed on the upper surface thereof, and each nozzle tower 51 is formed in a hollow shape so that its peripheral wall is not in front of the container body 1. A plurality of ejection holes 52 for injecting the active gas are arranged.

  In each holding case 29, a fitting groove 50 is cut out in the circumferential direction near the center of the outer peripheral surface, and an airtight O-ring 32 is fitted into the fitting groove 50. Each nozzle tower 51 is formed in a slightly tapered hollow truncated cone shape, and a plurality of semiconductor wafers W and a plurality of ejection holes 52 for injecting inert gas therebetween are arranged at regular intervals in the vertical direction of the peripheral wall. It functions to guide the inert gas from below to above.

Each ejection hole 52 is formed to expand in a substantially funnel shape so as to gradually expand from the inside of the nozzle tower 51 toward the outside from the viewpoint of diffusing and jetting an inert gas over a wide range. Inert gas is efficiently sprayed on both sides.
The filter holder 46 is formed in a ring and directly supports the filter 48 in the opening thereof or indirectly through the partition rib 47 and is detachably fitted in the holding case 29. Combined. The other parts are substantially the same as those in the above embodiment, and thus description thereof is omitted.

  In the present embodiment, the same effect as the above-described embodiment can be expected, and the inert gas is not simply supplied into the container main body 1, but both the front and back surfaces of the semiconductor wafer W accommodated in the container main body 1, etc. Since the inert gas is directly injected toward the surface, it is obvious that the surface oxidation of the semiconductor wafer W can be greatly prevented.

  Next, FIG. 17 to FIG. 19 show a third embodiment of the present invention. In this case, between the inner rear side of the container body 1 and the inner surface of the back wall 7 of the container body 1. A partition shielding plate 54 for partitioning and forming a gas isolating chamber region 53 in a sealed state is provided, and each partition shielding plate 54 is provided with a necessary number of ejection ports 55 for ejecting gas to the semiconductor wafer W, and chambers are formed. A purge valve 20 for supplying air is communicated with the region 53.

  The partition shielding plate 54 is formed in a substantially dish-shaped cross section extending in the vertical direction of the container body 1 and is directly fixed to the inner surface of the back wall 7 of the container body 1 by a method such as thermal welding or ultrasonic welding, or the container body 1. It is detachably attached to the inner surface of the rear wall 7 through a seal member, an engagement hole, an engagement claw, and the like. On the opposing wall of the partition shielding plate 54 facing the semiconductor wafer W, horizontally long jet holes 55 are perforated in the vertical direction, or vertically long jet holes 55 corresponding to the height of the plurality of semiconductor wafers W are formed. Perforated.

  A breathing filter 56 made of polypropylene or the like that separates the inside of the partition shielding plate 54 from the jet outlet 55 is selectively attached to the inner surface of the partition shielding plate 54, and the breathing filter 56 is accumulated at a constant pressure. The gas functions to be ejected uniformly from the inside of the partition shielding plate 54 to the outside through the ejection port 55. The ejection port 55 is formed in a substantially funnel shape so as to gradually expand from the inside of the partition shielding plate 54 to the outside as necessary, and an inert gas is efficiently injected onto both the front and back surfaces of the semiconductor wafer W. To do. The other parts are substantially the same as those in the above embodiment, and thus description thereof is omitted.

  In this embodiment, the same effect as the above embodiment can be expected, and an inert gas is directly injected between a plurality of semiconductor wafers W accommodated in the container body 1 and both the front and back surfaces of the semiconductor wafer W. Therefore, prevention of surface oxidation of the semiconductor wafer W can be greatly expected.

  Next, FIG. 20 shows a fourth embodiment of the present invention. In this case, a contact cap 57 having a substantially U-shaped cross section is replaceably attached to the lower end portion of the cylindrical case 22, and this contact cap is attached. In the center of the flat portion 57, a circulation port 58 that is in pressure contact with and communicates with the gas supply port or the gas exhaust port is rounded.

  The contact cap 57 is formed into an elastic flat ring shape by a thermoplastic elastomer having a higher elasticity than the cylindrical case 22, and an outer shape and a distribution port 58 are formed according to the nozzle shape of the port. Such a contact cap 57 is detachably screwed to the outer peripheral surface of the lower end of the cylindrical case 22 so as to be adjustable in height, or is press-fitted using frictional engagement, whereby a gas supply port or a gas exhaust port. The port communicates with the cylindrical case 22. The other parts are substantially the same as those in the above embodiment, and thus description thereof is omitted.

  In this embodiment, the same effect as that of the above embodiment can be expected, and only the contact cap 57 corresponding to the nozzle shape of the port needs to be attached to the lower end portion of the cylindrical case 22. There is no need to replace the purge valve 20 itself. Moreover, since the height of the contact cap 57 can be adjusted easily, the contact property with the nozzle of a port can be improved. Furthermore, even if the contact cap 57 is damaged, it is only necessary to replace the contact cap 57, so that a reduction in the number of parts can be expected.

  In the above embodiment, the through holes 4 are drilled near the four corners of the bottom plate 3 of the container body 1 and the purge valve 20 is fitted to each through hole 4. The purge valve 20 may be fitted in the through hole 4 by drilling the hole 4, or the through hole 4 is drilled in the top plate, the back wall 7, and the side wall of the container body 1, and the purge valve 20 is fitted in the through hole 4. May be combined. Alternatively, the screw 24 may be formed on the outer peripheral surface of the cylindrical case 22, and the screw groove 30 to be screwed with the screw 24 of the cylindrical case 22 may be formed on the inner peripheral surface of the holding case 29.

  Further, the cylindrical case 22 and the holding case 29 of the valve case 21 may be coupled not by screw coupling but by engagement between a locking hook and a locking hook, frictional resistance, or the like. Further, in the above embodiment, the cylindrical positioning portion 36 is formed to protrude from the upper surface of the spacer ring 35, but the positioning portion 36 may be formed to be recessed in the spacer ring 35. Further, an elongated nozzle tower 51 can be formed on the upper surface of the holding case 29 of the barge valve used for gas exhaust.

  Further, the nozzle tower 51 can be formed in a hollow cylindrical shape or a conical shape, or a part of the nozzle tower 51 can be bent. Further, the ejection holes 52 of the nozzle tower 51 may be long holes, elliptical holes, slit holes formed in a necessary number in the long axis direction of the nozzle tower 51, innumerable minute holes made of a sintered alloy or a porous material, and the like. It can also be.

DESCRIPTION OF SYMBOLS 1 Container body 3 Bottom plate 4 Through-hole 7 Back wall 10 Lid 20 Purge valve 21 Valve case 22 Cylindrical case 23 Guide inclined surface 25 Support part 27 Coil spring 29 Holding case 27 Coil spring 32 O ring 35 Spacer ring 37 Loose prevention ring 39 Internal pressure adjustment Valve body 40 O-ring (seal member)
41 Coil spring 42 Guide support slope 44 External pressure adjusting valve body 45 O-ring (seal member)
46 Filter holder 48 Filter 51 Nozzle tower 52 Ejection hole 53 Chamber region 54 Partition shielding plate 55 Ejection port 57 Contact cap 58 Flow port W Semiconductor wafer (substrate)

Claims (7)

This is a purge valve that opens one end of a hollow valve case, imparts at least air permeability to the other end of the valve case, allows gas to flow between both ends of the valve case, and controls the flow of this gas. And
A hollow internal pressure adjusting valve body that is inserted and supported in the valve case so as to reciprocate and opens and closes the valve case, and an external pressure adjusting valve body that is inserted and supported so as to be able to reciprocate in the internal pressure adjusting valve body and open and close the internal pressure adjusting valve body And a gas filter interposed between the other end of the valve case and the internal pressure regulating valve body and the external pressure regulating valve body,
When gas flows from one end of the valve case toward the other end, the external pressure regulating valve body is moved forward to open the space between the closed internal pressure regulating valve body and one end from the other end of the valve case. A purge valve characterized in that when the gas flows in a partial direction, the internal pressure adjusting valve element is moved forward to open the closed valve case.   The valve case is divided into a cylindrical case that houses the internal pressure adjusting valve body and the external pressure adjusting valve body, and at least a hollow holding case that houses the filter and is detachably fitted to the cylindrical case. One end side of the tube is formed in a substantially funnel shape, and the inner surface thereof is a guide inclined surface that seals tightly against the internal pressure adjusting valve body, and the internal pressure adjusting valve is located near the boundary between the one end side and the remaining portion in the cylindrical case. The purge valve according to claim 1, wherein a support portion for supporting the body is formed.   3. The purge valve according to claim 2, wherein a hollow nozzle tower is formed to protrude from a holding case of the valve case, and a gas ejection hole is provided in the nozzle tower.   The internal pressure adjusting valve body is formed in a cylindrical shape, and a seal member that is in close contact with the guide inclined surface of the cylindrical case is attached to the peripheral surface on one end side, and the other end side of the internal pressure adjusting valve body is formed in a substantially funnel shape. The inner surface of the valve is formed as a guide support slope, the external pressure adjustment valve body is formed in a substantially column shape, and a seal member that is in close contact with the guide support slope of the internal pressure adjustment valve body is attached to the peripheral surface. Purge valve.   5. A substrate storage container that opens and closes an opening of a container main body for storing a substrate by a lid, and a through hole is provided in one of the container main body and the lid, and the through hole is provided in any one of claims 1 to 4. A substrate storage container, wherein a purge valve is attached to replace the gas in the container body.   6. A substrate according to claim 5, wherein a through hole is provided in a bottom plate of the container main body, a purge valve is fitted into the through hole via a spacer ring and a loosening prevention ring, and one end portion of the valve case of the purge valve faces the outside of the container main body. Storage container.   A partition shielding plate that forms a chamber region for gas isolation between the inner surface of the back surface of the container body is attached to the rear side of the container body, and a jet port for ejecting gas toward the substrate is formed on the partition shielding plate. The substrate storage container according to claim 6, wherein a purge valve is communicated with the chamber region.

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