JP2010247019A - Solvent gas producer, solvent gas treatment apparatus using the same, and operation method therefor - Google Patents

Solvent gas producer, solvent gas treatment apparatus using the same, and operation method therefor Download PDF

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JP2010247019A
JP2010247019A JP2009096864A JP2009096864A JP2010247019A JP 2010247019 A JP2010247019 A JP 2010247019A JP 2009096864 A JP2009096864 A JP 2009096864A JP 2009096864 A JP2009096864 A JP 2009096864A JP 2010247019 A JP2010247019 A JP 2010247019A
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JP5267294B2 (en
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Daisuke Aoki
大輔 青木
Koji Shimizu
巧治 清水
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Panasonic Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a solvent gas producer achieving the stable gasification of a solvent solution of a volatile organic compound and enhanced in safety. <P>SOLUTION: The solvent gas producer includes a gasification pipe 121 for heating and gasifying the solvent solution supplied by a pump 118, a heating means 122 for heating the gasification pipe, a temperature regulating means 122a for detecting the temperature of the gasification pipe to control the same to a predetermined temperature, a nozzle orifice 129 having an ejection opening for ejecting a solvent gas, a drive means 130 for driving a needle 131 of opening and closing the jet opening of the nozzle orifice, and a diluting gas supply means 136 for supplying diluting gas which must be mixed with the solvent gas. The solvent solution supplied to the gasification pipe, which is heated by the heating means, by the pump is heated and gasified to produce the solvent gas, the nozzle orifice is opened to eject the solvent gas and the diluting gas is mixed with the solvent gas ejected from a nozzle to supply the solvent gas to a solvent gas treatment apparatus as a diluted solvent gas. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、揮発性有機化合物(VOC:Volatile Organic Compounds)等の揮発性化合物を含む溶剤ガス発生装置と、これを用いた排気ガス(被処理気体)を浄化処理する溶剤ガス処理装置およびその運転方法に関するものである。   The present invention relates to a solvent gas generation device containing a volatile compound such as a volatile organic compound (VOC), a solvent gas treatment device for purifying an exhaust gas (treated gas) using the same, and an operation thereof It is about the method.

この種溶剤ガス発生装置代表的な例として、下記のものがある。溶剤液を溶剤供給ポンプ及び溶剤液供給配管を介して、噴霧ノズルに供給する。噴霧ノズルは、熱源ボックス内に溶剤液を噴霧する。噴霧された溶剤液は、熱源ボックス内の熱風によって気化される。熱風によって気化しきれなかった溶剤液は、噴霧方向に設けたプレートヒータに付着するとともに、底面に設けたプレートヒータに落下して付着する。プレートヒータは、付着した溶剤液を加熱して気化する。また、溶剤供給配管は、その内部の溶剤を加熱する溶剤供給用ヒータを備えている(例えば、特許文献1参照)。   The following are typical examples of this kind of solvent gas generator. The solvent liquid is supplied to the spray nozzle through a solvent supply pump and a solvent liquid supply pipe. The spray nozzle sprays the solvent liquid into the heat source box. The sprayed solvent liquid is vaporized by hot air in the heat source box. The solvent liquid that could not be vaporized by the hot air adheres to the plate heater provided in the spraying direction, and falls and adheres to the plate heater provided on the bottom surface. The plate heater heats and vaporizes the attached solvent liquid. Further, the solvent supply pipe is provided with a solvent supply heater for heating the solvent therein (see, for example, Patent Document 1).

近年、生活環境に近接した中小規模事業場や畜産業からの悪臭苦情が増加し、また、苦情の原因となる悪臭の発生源が多様化する傾向がある。中でも、印刷・塗装工場等から排出されるガスに含まれる揮発性有機化合物(溶剤ガス)は悪臭をもたらすだけでなく、浮遊粒子状物質(SPM)や光化学オキシダント等の原因物質でもある。このため、個々の事業所における揮発性化合物排出削減に向けた対策が求められている。また、平成18年に大気汚染防止法が改正され、大規模施設等における揮発性化合物排出基準値等が設定された。   In recent years, odor complaints from small and medium-sized businesses and livestock industries close to the living environment have increased, and the sources of odor causing complaints tend to diversify. Among them, volatile organic compounds (solvent gases) contained in gases discharged from printing / painting plants and the like not only cause bad odor, but are also causative substances such as suspended particulate matter (SPM) and photochemical oxidants. For this reason, countermeasures for reducing volatile compound emissions at individual offices are required. In 2006, the Air Pollution Control Law was amended to set volatile compound emission standards for large-scale facilities.

悪臭の脱臭方法として、可燃性を呈する炭化水素などの一般的に揮発性化合物と称されるガスを浄化処理する方法は、分解方式(燃焼、触媒分解など)、除去・分離方式(吸着、冷却凝縮などで、回収方式も含む)、生物脱臭方式に大別される。   As a method for deodorizing bad odors, purification methods for gases generally called volatile compounds such as flammable hydrocarbons include decomposition methods (combustion, catalytic decomposition, etc.), removal and separation methods (adsorption, cooling). It can be roughly classified into biological deodorization methods such as condensation and recovery methods).

前記浄化処理方法、その装置においては、従来から一般的に処理装置の入り口側における発生源からの被処理ガス(被処理気体)中の揮発性化合物成分および処理装置の出口側における処理ガス中の揮発性化合物成分の濃度を濃度計測器で計測し、浄化処理能力の把握および装置の全体的な制御等をおこなっていた。   In the purification treatment method and the apparatus thereof, conventionally, the volatile compound component in the gas to be processed (the gas to be processed) from the generation source on the inlet side of the processing apparatus and the gas in the processing gas on the outlet side of the processing apparatus have been generally used. The concentration of the volatile compound component was measured with a concentration measuring device to grasp the purification treatment capacity and to perform overall control of the apparatus.

前記した処理装置の代表的な例として、下記のものがある。揮発性化合物の除去状態を正確に把握するため、排ガス中に含まれる揮発性化合物を除去するとともに再生可能な排ガス処理部の処理機能を監視する排ガス処理監視装置であって、前記排ガス(被処理気体)の流路に沿って前記排ガス処理部に流入する前記揮発性化合物の流入濃度と前記排ガス処理部から排出される前記揮発性化合物の排出濃度とを検出する濃度検出手段と、前記流入濃度及び前記排出濃度に基づいて、前記排ガス処理部の使用時の処理機能の低下状態又は再生時の処理機能の回復状態を検知する状態検知手段とを備えた排ガス処理監視装置、排ガス処理装置としたものである(例えば、特許文献2参照)。   The following are typical examples of the processing apparatus described above. An exhaust gas treatment monitoring device for removing a volatile compound contained in exhaust gas and monitoring a treatment function of a recyclable exhaust gas treatment unit in order to accurately grasp a removal state of a volatile compound, Concentration detecting means for detecting an inflow concentration of the volatile compound flowing into the exhaust gas treatment unit along a gas flow path and an exhaust concentration of the volatile compound discharged from the exhaust gas treatment unit, and the inflow concentration And an exhaust gas treatment monitoring apparatus and an exhaust gas treatment device provided with a state detection means for detecting a deterioration state of the treatment function during use of the exhaust gas treatment unit or a recovery state of the treatment function during regeneration based on the exhaust concentration. (For example, refer to Patent Document 2).

特開平11−221908号公報JP-A-11-221908 特開2008−302348号公報JP 2008-302348 A

しかしながら、前記した特許文献1に記載されたものは、熱源ボックス内に溶剤液を噴霧するとともに、噴霧した溶剤液を高温の熱風および噴霧方向に設けたプレートヒータ、底面に設けたプレートヒータに付着した溶剤液を加熱して気化させるため、プレートヒータの温度変動、付着した溶剤液の気化遅れ等によって、プレートヒータ面での気化速度の変動を生じやすく、溶剤ガスの発生量が脈動し、さらに、噴霧した溶剤液が供給した熱風によって気化しないまま熱源ボックス外に吐出する場合もあり、溶剤液の安定した気化が課題となる。   However, the one described in Patent Document 1 sprays the solvent liquid in the heat source box and adheres the sprayed solvent liquid to the plate heater provided in the hot air and the spraying direction, and the plate heater provided on the bottom surface. Since the solvent liquid is heated and vaporized, the temperature fluctuation of the plate heater, the vaporization delay of the adhering solvent liquid, etc. are likely to cause fluctuations in the vaporization speed on the plate heater surface, and the amount of solvent gas generated pulsates. In some cases, the sprayed solvent liquid is discharged out of the heat source box without being vaporized by the supplied hot air, and stable vaporization of the solvent liquid becomes a problem.

また、前記した特許文献2に記載されたものは、揮発性有機化合物成分を含む浄化処理すべき排ガス(被処理気体)の一部および浄化処理後の処理気体を分岐、切換えて、各々の気体の揮発性有機化合物成分の濃度をガスセンサにより計測するものである。   Moreover, what was described in above-mentioned patent document 2 branches and switches a part of waste gas (to-be-processed gas) which should contain the purification process containing a volatile organic compound component, and the process gas after purification process, and each gas The concentration of the volatile organic compound component is measured with a gas sensor.

この場合においては、塗装工場や印刷工場、化学工場等の揮発性有機化合物成分含有ガスの発生源から排出される浄化処理すべき排ガス(被処理気体)中の揮発性有機化合物成分の濃度が極めて不安定なものであり、ごく短時間に揮発性有機化合物成分の濃度が常に変動して一定にならず、さらに様々な揮発性有機化合物成分が混入する恐れがある。   In this case, the concentration of the volatile organic compound component in the exhaust gas to be purified (the gas to be treated) discharged from the generation source of the volatile organic compound component-containing gas such as a coating factory, a printing factory, or a chemical factory is extremely high. It is unstable, and the concentration of the volatile organic compound component always fluctuates in a very short time and does not become constant, and various volatile organic compound components may be mixed.

また、揮発性有機化合物成分含有ガスの発生源が停止状態で、揮発性有機化合物成分含有ガスの発生が無いときには、処理装置の処理能力の評価ができない。   In addition, when the generation source of the volatile organic compound component-containing gas is stopped and there is no generation of the volatile organic compound component-containing gas, the processing capability of the processing apparatus cannot be evaluated.

このため、短時間に揮発性有機化合物成分の濃度の変動(バラツキ)により常に正確で安定した溶剤ガス処理装置の処理能力の評価を行うことができない。また、被処理気体の量または被処理気体中の揮発性有機化合物成分の濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができない。   For this reason, it is impossible to always evaluate the processing capability of the solvent gas processing apparatus accurately and stably due to the fluctuation (variation) of the concentration of the volatile organic compound component in a short time. Further, it is not possible to evaluate the processing capability of the solvent gas processing apparatus by arbitrarily changing the amount of the gas to be processed or the concentration of the volatile organic compound component in the gas to be processed to various conditions.

本発明は、前記従来の課題を解決するもので、溶剤ガス処理装置の処理能力の評価用として、揮発性有機化合物の溶剤液の安定した気化と、安全性の向上を図った溶剤ガス発生装置を提供することを目的とする。また、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる溶剤ガス処理装置、溶剤ガス処理装置の運転方法を提供することを目的とする。   SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems, and for the purpose of evaluating the processing capacity of a solvent gas processing device, a solvent gas generator that is capable of stable vaporization of a solvent solution of a volatile organic compound and an improvement in safety. The purpose is to provide. It is another object of the present invention to provide a solvent gas processing apparatus and a method for operating the solvent gas processing apparatus that can always accurately and stably evaluate the processing capacity of volatile organic compounds.

本発明の溶剤ガス発生装置は、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置の処理能力の評価運転用として揮発性有機化合物の溶剤液を加熱気化させた溶剤ガスを供給する溶剤ガス発生装置であって、揮発性有機化合物の溶剤液を貯蔵するタンクと、前記タンクから溶剤液を吸引吐出するポンプと、前記ポンプによって供給された溶剤液を溶剤ガスとして加熱気化させる気化管と、前記気化管を加熱する加熱手段と、前記気化管の温度を検出して所定温度に制御する温度調節手段と、前記気化管で気化した溶剤ガスを噴出する噴出口を有するノズル孔と、前記ノズル孔を開閉するニードルを駆動する駆動手段と、前記溶剤ガスと混合する希釈気体を供給する希釈気体供給手段と、を備え、前記加熱手段により加熱した気化管にポンプにより溶剤液を供給し加熱気化させて溶剤ガスとするとともに、ニードルを駆動しノズル孔を開にして前記溶剤ガスを噴出させ、前記ノズル孔から噴出した溶剤ガスに希釈気体を混合させて希釈溶剤ガスとし、前記希釈溶剤ガスを溶剤ガス処理装置へ供給することを特徴とするものである。   The solvent gas generator of the present invention supplies a solvent gas obtained by heating and evaporating a solvent liquid of a volatile organic compound for an operation for evaluating the processing capability of the solvent gas processing apparatus for processing a gas to be processed containing a volatile organic compound. A solvent gas generator, a tank for storing a solvent liquid of a volatile organic compound, a pump for sucking and discharging the solvent liquid from the tank, and a vaporization pipe for heating and vaporizing the solvent liquid supplied by the pump as a solvent gas Heating means for heating the vaporization pipe, temperature adjusting means for detecting the temperature of the vaporization pipe and controlling it to a predetermined temperature, a nozzle hole having a jet outlet for jetting the solvent gas vaporized in the vaporization pipe, Vaporization heated by the heating means, comprising driving means for driving a needle for opening and closing the nozzle hole, and dilution gas supply means for supplying a dilution gas mixed with the solvent gas The solvent liquid is supplied to the pump by a pump and vaporized into a solvent gas, and the needle is driven to open the nozzle hole to eject the solvent gas, and the diluent gas is mixed into the solvent gas ejected from the nozzle hole. A diluted solvent gas is used, and the diluted solvent gas is supplied to a solvent gas processing apparatus.

本発明の溶剤ガス処理装置は、前記溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への供給ラインと、前記溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能としたしたものである。   The solvent gas processing apparatus of the present invention includes the solvent gas generator, a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a solvent gas processing apparatus main body for the gas to be processed containing a volatile organic compound. A supply line to the solvent gas processing device main body of the diluted solvent gas generated by the solvent gas generator, and the diluted gas generated by the gas to be processed and the solvent gas generator The supply to the solvent gas processing apparatus main body can be selected, the evaluation operation of the solvent gas processing capacity of the solvent gas processing apparatus main body by the supply of the diluted solvent gas generated by the solvent gas generator, and the supply of the gas to be processed This makes it possible to perform a processing operation of the gas to be processed.

また、本発明の溶剤ガス処理装置の運転方法は、前記溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の(溶剤ガスの)処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うことを特徴とするものである。   The operation method of the solvent gas processing apparatus of the present invention includes the solvent gas generator, a solvent gas processing apparatus body for processing a gas to be processed containing a volatile organic compound, and a gas to be processed containing a volatile organic compound. A supply line to the main body of the solvent gas processing apparatus and a supply line to the main body of the solvent gas processing apparatus of the diluted solvent gas generated by the solvent gas generation apparatus, and the generated gas to be processed and the solvent gas generation apparatus It is possible to select supply of diluted solvent gas to the solvent gas processing apparatus main body, evaluation operation of the processing capacity (of solvent gas) of the solvent gas processing apparatus main body by supplying diluted solvent gas generated by the solvent gas generating apparatus, It is possible to perform a processing operation of the gas to be processed by supplying a processing gas, and supply a dilute solvent gas from a solvent gas generator to process the solvent gas of the solvent gas processing apparatus body After evaluation operation, it is characterized in that performing the processing operation of the gas to be treated by the supply of the gas to be treated.

本発明の本発明の溶剤ガス発生装置によれば、揮発性有機化合物の溶剤液の安定した気化と、安全性の向上を図ることができる。また、本発明の溶剤ガス処理装置、溶剤ガス処理装置の運転方法によれば、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。   According to the solvent gas generator of the present invention, it is possible to stably vaporize the solvent liquid of the volatile organic compound and improve safety. Moreover, according to the operation method of the solvent gas processing apparatus and the solvent gas processing apparatus of the present invention, it is possible to always evaluate the processing capability of the volatile organic compound accurately and stably.

第1の発明は、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置の処理能力の評価運転用として揮発性有機化合物の溶剤液を加熱気化させた溶剤ガスを供給する溶剤ガス発生装置であって、揮発性有機化合物の溶剤液を貯蔵するタンクと、前記タンクから溶剤液を吸引吐出するポンプと、前記ポンプによって供給された溶剤液を溶剤ガスとして加熱気化させる気化管と、前記気化管を加熱する加熱手段と、前記気化管の温度を検出して所定温度に制御する温度調節手段と、前記気化管で気化した溶剤ガスを噴出する噴出口を有するノズル孔と、前記ノズル孔を開閉するニードルを駆動する駆動手段と、前記溶剤ガスと混合する希釈気体を供給する希釈気体供給手段と、を備え、前記加熱手段により加熱した気化管にポンプにより溶剤液を供給し加熱気化させて溶剤ガスとするとともに、ニードルを駆動しノズル孔を開にして前記溶剤ガスを噴出させ、前記ノズル孔から噴出した溶剤ガスに希釈気体を混合させて希釈溶剤ガスとし、前記希釈溶剤ガスを溶剤ガス処理装置へ供給することを特徴とする溶剤ガス発生装置としたものである。   The first aspect of the present invention is the generation of a solvent gas for supplying a solvent gas obtained by heating and vaporizing a solvent liquid of a volatile organic compound as an operation for evaluating the processing capacity of a solvent gas processing apparatus for processing a gas to be processed containing a volatile organic compound. A tank for storing a solvent liquid of a volatile organic compound, a pump for sucking and discharging the solvent liquid from the tank, a vaporizing tube for heating and vaporizing the solvent liquid supplied by the pump as a solvent gas, Heating means for heating the vaporizing pipe, temperature adjusting means for detecting the temperature of the vaporizing pipe and controlling it to a predetermined temperature, a nozzle hole having a jet outlet for jetting the solvent gas vaporized in the vaporizing pipe, and the nozzle hole Drive means for driving a needle for opening and closing the gas, and dilution gas supply means for supplying a dilution gas mixed with the solvent gas, and a pump is attached to the vaporization tube heated by the heating means. The solvent liquid is supplied and vaporized by heating to form a solvent gas, and the needle is driven to open the nozzle hole, the solvent gas is ejected, and the diluent gas is mixed with the solvent gas ejected from the nozzle hole to dilute the solvent gas. The solvent gas generator is characterized in that the diluted solvent gas is supplied to a solvent gas processing device.

これによって、ポンプによって供給された溶剤液を加熱気化させる気化管には、溶剤液のみを供給し、空気は供給しないので、気化管自体の小型化と電気ヒータ等による予熱時間が短縮され短時間で溶剤ガスを気化させることができるとともに、空気の存在しない状態で加熱気化させて溶剤ガスとすることによって引火等の恐れが無く安全である。また、溶剤液を加熱気化させた溶剤ガスをノズル孔から噴射させた後、希釈気体を供給して混合するので、溶剤ガスと希釈気体を均一に混合することができる。さらに、ノズル孔を開閉して溶剤ガスの噴出の有無を瞬時に制御することができる。したがって、溶剤ガス処理装置の処理能力の評価用として、揮発性有機化合物の溶剤液の安定した気化と、安全性の向上を図った溶剤ガス発生装置とすることができる。   As a result, only the solvent liquid is supplied to the vaporizing pipe for heating and vaporizing the solvent liquid supplied by the pump, and no air is supplied. Therefore, the preheating time by the miniaturization of the vaporizing pipe itself and the electric heater is shortened and the time is shortened. In addition to being able to vaporize the solvent gas, heating and vaporizing in the absence of air to form the solvent gas is safe without the risk of ignition. Further, since the solvent gas obtained by heating and evaporating the solvent liquid is sprayed from the nozzle hole and then the dilution gas is supplied and mixed, the solvent gas and the dilution gas can be mixed uniformly. Furthermore, it is possible to instantaneously control whether or not the solvent gas is ejected by opening and closing the nozzle hole. Therefore, it can be set as the solvent gas generator which aimed at the stable vaporization of the solvent liquid of a volatile organic compound, and the improvement of safety | security for evaluation of the processing capacity of a solvent gas processing apparatus.

第2の発明は、第1の発明において、ポンプのよる溶剤液の気化管への供給量および/または希釈気体の供給手段による希釈気体の供給量を制御して前記希釈溶剤ガス中の溶剤ガスの濃度を調節可能とし、前記希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス発生装置としたものである。   According to a second invention, in the first invention, the solvent gas in the diluted solvent gas is controlled by controlling the supply amount of the solvent liquid to the vaporization tube by the pump and / or the supply amount of the dilution gas by the dilution gas supply means. The solvent gas generating device is characterized in that the concentration of gas can be adjusted and the diluted solvent gas is supplied to the main body of the solvent gas processing device.

これによって、溶剤ガス濃度を任意に様々な条件に変化させた希釈溶剤ガスを溶剤ガス処理装置へ供給することができる。   As a result, the diluted solvent gas whose solvent gas concentration is arbitrarily changed under various conditions can be supplied to the solvent gas processing apparatus.

第3の発明は、第1または第2の発明において、複数の種類の溶剤液の内、いずれか一つの溶剤液を選択して気化手段に供給し溶剤ガスを発生させる溶剤ガス発生装置としたものである。   A third invention is the solvent gas generator according to the first or second invention, wherein one of a plurality of types of solvent liquid is selected and supplied to the vaporizing means to generate a solvent gas. Is.

これによって、複数の種類の溶剤液の溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with solvent gases of a plurality of types of solvent liquids, and to set a wider range of evaluation conditions for the solvent gas processing capacity of the solvent gas processing apparatus main body. be able to.

第4の発明は、第1または第2の発明において、複数の種類の溶剤液を同時に気化手段に供給し、前記複数の種類の溶剤液の混合した混合溶剤ガスを発生させる溶剤ガス発生装置としたものである。   According to a fourth invention, in the first or second invention, a solvent gas generator for supplying a plurality of types of solvent liquids simultaneously to the vaporizing means and generating a mixed solvent gas in which the plurality of types of solvent liquids are mixed; It is a thing.

これによって、複数の種類の溶剤液の混合した混合溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with a mixed solvent gas in which a plurality of types of solvent liquids are mixed. Can be set widely.

第5の発明は、第4の発明において、複数の種類の溶剤液の各々の溶剤ガスの成分割合を調節可能にしたことを特徴とする溶剤ガス発生装置としたものである。   According to a fifth aspect of the present invention, in the fourth aspect of the invention, the solvent gas generating device is characterized in that the component ratio of each of the plurality of types of solvent liquids can be adjusted.

これによって、複数の種類の溶剤液の様々な成分割合の溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with solvent gases of various component ratios of a plurality of types of solvent liquids, and the evaluation conditions of the processing capacity of the solvent gas in the solvent gas processing apparatus main body Can be set more widely.

第6の発明は、第1〜5のいずれかの発明において、希釈溶剤ガス中の溶剤ガスの濃度を所定時間内において変化させて希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス発生装置としたものである。   A sixth invention is characterized in that, in any one of the first to fifth inventions, the concentration of the solvent gas in the diluted solvent gas is changed within a predetermined time, and the diluted solvent gas is supplied to the main body of the solvent gas processing apparatus. This is a solvent gas generator.

これによって、所定時間内における溶剤ガスの濃度の変化による溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   This makes it possible to evaluate the processing capacity of the solvent gas processing apparatus main body due to a change in the concentration of the solvent gas within a predetermined time, and to set a wider range of evaluation conditions for the solvent gas processing capacity in the solvent gas processing apparatus main body. be able to.

第7の発明は、第1〜6のいずれかの発明において、溶剤ガスと空気を混合した希釈溶剤ガス中の溶剤ガスの濃度を爆発限界の下限値以下となるように溶剤液の気化手段への供給量または希釈気体の供給量を制御することを特徴とする溶剤ガス発生装置としたものである。   A seventh invention is directed to the solvent liquid vaporization means in any one of the first to sixth inventions, so that the concentration of the solvent gas in the diluted solvent gas obtained by mixing the solvent gas and air is not more than the lower limit of the explosion limit. The solvent gas generation device is characterized in that the supply amount of dilute gas or the supply amount of dilution gas is controlled.

これによって、常に安全な状態に維持して希釈溶剤ガスを溶剤ガス処理装置本体へ供給することができる。   Accordingly, the diluted solvent gas can be supplied to the solvent gas processing apparatus main body while always maintaining a safe state.

第8の発明は、第1〜7のいずれかの発明において、希釈溶剤ガスの温度を検出して所定温度に制御する温度調節手段を備えたことを特徴とする溶剤ガス発生装置としたものである。   An eighth invention is a solvent gas generator characterized in that in any one of the first to seventh inventions, temperature adjusting means for detecting the temperature of the diluted solvent gas and controlling it to a predetermined temperature is provided. is there.

これによって、溶剤ガス処理装置本体での溶剤ガスの温度変化における処理能力の評価を行うことができき、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body in response to temperature changes, and it is possible to set a wider range of conditions for evaluating the solvent gas processing capacity of the solvent gas processing apparatus main body. .

第9の発明は、前記溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能としたことを特徴とする溶剤ガス処理装置としたものである。   According to a ninth aspect of the present invention, the solvent gas generator, a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a solvent liquid by heating and vaporizing a solvent liquid of the volatile organic compound to form a solvent gas, A solvent gas generator for generating a diluted solvent gas mixed with the solvent gas and a diluent gas; a gas supply line for supplying a gas to be processed containing a volatile organic compound to a solvent gas processor body; and a solvent gas generator. A dilution solvent gas supply line for supplying the diluted solvent gas generated in step 1 to the solvent gas processing apparatus main body, and supplying the gas to be processed and the diluted solvent gas generated in the solvent gas generation apparatus to the solvent gas processing apparatus main body The operation of evaluating the solvent gas processing capacity of the main body of the solvent gas processing apparatus by supplying the diluted solvent gas generated by the solvent gas generating apparatus and the above-mentioned processing by supplying the gas to be processed It was possible to perform processing operation of the gas is obtained by the solvent gas treatment apparatus according to claim.

これによって、短時間での溶剤ガス濃度の変動(バラツキ)が無く、さらに、希釈溶剤ガスの量または希釈溶剤ガス中の溶剤ガス濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができる。したがって、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。   As a result, there is no fluctuation (variation) in the solvent gas concentration in a short time, and furthermore, the amount of the diluted solvent gas or the solvent gas concentration in the diluted solvent gas is arbitrarily changed to various conditions to An evaluation of the processing capacity can be performed. Therefore, it is possible to always evaluate the processing ability of the volatile organic compound accurately and stably.

第10の発明は、第9の発明において、溶剤ガスを含まない校正気体の供給ラインを備え、校正用気体の供給による溶剤ガス処理装置本体のゼロ校正運転を行うことを可能としたことを特徴とする溶剤ガス処理装置としたものである。   According to a tenth aspect, in the ninth aspect, a calibration gas supply line not including a solvent gas is provided, and the zero calibration operation of the main body of the solvent gas processing apparatus by supplying the calibration gas can be performed. The solvent gas treatment device is as follows.

これによって、校正気体の供給によって、溶剤ガス濃度計の計測精度の向上を図ることができる。また、溶剤ガス処理装置本体内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   Thereby, the measurement accuracy of the solvent gas concentration meter can be improved by supplying the calibration gas. Further, once the residual solvent gas in the main body of the solvent gas processing apparatus is driven out, it is possible to grasp the processing capacity by the diluted solvent gas from the solvent gas generating apparatus with higher accuracy.

第11の発明は、前記溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うことを特徴とする溶剤ガス処理装置の運転方法としたものである。   In an eleventh aspect of the invention, the solvent gas generator, a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a solvent liquid by heating and evaporating a solvent liquid of the volatile organic compound, A solvent gas generator for generating a diluted solvent gas mixed with the solvent gas and a diluent gas; a gas supply line for supplying a gas to be processed containing a volatile organic compound to a solvent gas processor body; and a solvent gas generator. A dilution solvent gas supply line for supplying the diluted solvent gas generated in step 1 to the solvent gas processing apparatus main body, and supplying the gas to be processed and the diluted solvent gas generated in the solvent gas generation apparatus to the solvent gas processing apparatus main body The operation of evaluating the solvent gas processing capacity of the main body of the solvent gas processing apparatus by supplying the diluted solvent gas generated by the solvent gas generating apparatus, and the above-mentioned target by supplying the gas to be processed It is possible to perform a processing operation of a physical gas, and after supplying a diluted solvent gas from a solvent gas generator and performing an evaluation operation of the solvent gas processing capacity of the main body of the solvent gas processing device, supplying a gas to be processed The method for operating the solvent gas processing apparatus is characterized in that the processing operation of the gas to be processed is performed.

これによって、短時間での溶剤ガス濃度の変動(バラツキ)が無く、さらに、希釈溶剤ガスの量または希釈溶剤ガス中の溶剤ガス濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができる。したがって、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。   As a result, there is no fluctuation (variation) in the solvent gas concentration in a short time, and furthermore, the amount of the diluted solvent gas or the solvent gas concentration in the diluted solvent gas is arbitrarily changed to various conditions to An evaluation of the processing capacity can be performed. Therefore, it is possible to always evaluate the processing ability of the volatile organic compound accurately and stably.

第12の発明は、第11の発明において、溶剤ガスを含まない校正気体の供給ラインを備え、校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能とするとともに、校正用気体を溶剤ガス処理装置本体へ供給した後、溶剤ガス発生装置から溶剤ガスを供給して溶剤ガス処理装置本体部の処理能力の評価運転を行うことを特徴とする溶剤ガス処理装置の運転方法としたものである。   In a twelfth aspect of the invention according to the eleventh aspect, a calibration gas supply line not including a solvent gas is provided, and the calibration operation of the solvent gas processing apparatus main body can be performed by supplying a calibration gas. An operation method for a solvent gas processing apparatus, comprising: supplying gas to a solvent gas processing apparatus main body; then supplying solvent gas from the solvent gas generating apparatus to perform an evaluation operation of the processing capacity of the solvent gas processing apparatus main body; and It is a thing.

これによって、校正気体の供給によって、溶剤ガス濃度計の計測精度の向上を図ることができる。また、溶剤ガス処理装置本体内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   Thereby, the measurement accuracy of the solvent gas concentration meter can be improved by supplying the calibration gas. Further, once the residual solvent gas in the main body of the solvent gas processing apparatus is driven out, it is possible to grasp the processing capacity by the diluted solvent gas from the solvent gas generating apparatus with higher accuracy.

以下、本発明の一実施の形態の溶剤ガス処理装置を図1〜図6を参照しながら説明する。図1は、本発明の一実施の形態の溶剤ガス処理装置の基本構成図、図2は、溶剤ガス発生装置の溶剤液供給部および気化混合部の基本構成図、図3は、気化混合部のノズル孔閉塞時の構成図、図4(a)、(b)は、溶剤ガス発生装置からの溶剤ガスの供給例を示すグラフ、図5は、溶剤ガス処理装置本体の例を示す基本構成図、図6は、溶剤ガス処理装置本体の他の例を基本構成図である。   Hereinafter, a solvent gas processing apparatus according to an embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a basic configuration diagram of a solvent gas processing apparatus according to an embodiment of the present invention, FIG. 2 is a basic configuration diagram of a solvent liquid supply unit and a vaporization mixing unit, and FIG. 3 is a vaporization mixing unit. FIG. 4A and FIG. 4B are graphs showing examples of supply of solvent gas from the solvent gas generator, and FIG. 5 is a basic configuration showing an example of the solvent gas processing apparatus main body. FIG. 6 and FIG. 6 are basic configuration diagrams of another example of the solvent gas processing apparatus main body.

先ず本発明の一実施の形態の溶剤ガス発生装置100および溶剤ガス処理装置の基本的な構成を説明する。溶剤ガス発生装置100は、主に溶剤液供給部101、気化混合部120から構成されている。溶剤液供給部101は、異なる溶剤液を貯留するタンク102、タンク103、タンク104と、複数の溶剤液を所定の割合で混合して貯留するタンク105を備えている。溶剤液としては、トルエン、キシレン、酢酸エチル、酢酸ブチル等の揮発性有機化合物が挙げられる。なお、揮発性有機化合物としてこれに限定するものではない。   First, the basic configuration of the solvent gas generator 100 and the solvent gas processing apparatus according to an embodiment of the present invention will be described. The solvent gas generator 100 mainly includes a solvent liquid supply unit 101 and a vaporization mixing unit 120. The solvent liquid supply unit 101 includes a tank 102, a tank 103, and a tank 104 that store different solvent liquids, and a tank 105 that mixes and stores a plurality of solvent liquids at a predetermined ratio. Examples of the solvent liquid include volatile organic compounds such as toluene, xylene, ethyl acetate, and butyl acetate. The volatile organic compound is not limited to this.

また、各々のタンク102、103、104、105に各々の供給管106、107、108、109を接続してある。さらに、各々の供給管106、107、108、109には、各々流量計110、111、112、113および、開閉弁114、115、116、117を配置している。   Also, the supply pipes 106, 107, 108, 109 are connected to the tanks 102, 103, 104, 105, respectively. Furthermore, flow meters 110, 111, 112, 113 and on-off valves 114, 115, 116, 117 are arranged in the supply pipes 106, 107, 108, 109, respectively.

各々の供給管106、107、108、109の他端は、ポンプ(溶剤液供給手段)118に接続してある。ポンプ118の吐出側には、吐出管119が接続され、この吐出管119は気化混合部120の気化管121に接続されている。また、ポンプ118の溶剤液の供給量は、溶剤液供給量制御手段118aによりポンプ118を制御して調節可能な構成としている。   The other end of each supply pipe 106, 107, 108, 109 is connected to a pump (solvent liquid supply means) 118. A discharge pipe 119 is connected to the discharge side of the pump 118, and the discharge pipe 119 is connected to the vaporization pipe 121 of the vaporization mixing unit 120. Further, the supply amount of the solvent liquid of the pump 118 can be adjusted by controlling the pump 118 by the solvent liquid supply amount control means 118a.

気化手段である気化混合部120は、一方端を開放した気化管121、気化管121の外周面には電気ヒータ122(加熱手段)を装着ししている。気化管121の温度は、気化管121の温度を検出し所定温度に制御する温度調節手段122aにより調節されるようになっている。   The vaporizing and mixing unit 120 serving as a vaporizing unit includes a vaporizing tube 121 having one end opened, and an electric heater 122 (heating unit) attached to the outer peripheral surface of the vaporizing tube 121. The temperature of the vaporizing pipe 121 is adjusted by temperature adjusting means 122a that detects the temperature of the vaporizing pipe 121 and controls it to a predetermined temperature.

気化管121の気化通路123には、吐出管119から流入した溶剤液の均一な流れおよび、浸透性を良好にするため気化促進体124を充填してある。この気化促進体124は、例えば細線からなる金属繊維材、連通性のアある金属発砲材等か構成してある。   The vaporization passage 123 of the vaporization pipe 121 is filled with a vaporization promoting body 124 in order to improve the uniform flow and permeability of the solvent liquid flowing in from the discharge pipe 119. The vaporization promoting body 124 is composed of, for example, a metal fiber material made of a thin wire, a metal foam material having connectivity, or the like.

気化管121の下部には、溶剤液の廃液管125を接続し、ここに開閉弁126を設けている。   A waste liquid pipe 125 for solvent liquid is connected to the lower part of the vaporization pipe 121, and an open / close valve 126 is provided here.

気化管121の気化通路123と直交する方向に導出管127が固定され、導出管127の内部は気化通路123と導通している。また、気化管121には、ノズル孔129を形成したノズル体128が固定されている。   The outlet pipe 127 is fixed in a direction orthogonal to the vaporizing passage 123 of the vaporizing pipe 121, and the inside of the outlet pipe 127 is electrically connected to the vaporizing passage 123. Further, a nozzle body 128 having a nozzle hole 129 is fixed to the vaporizing tube 121.

導出管127のノズル体128と対向する側には、電磁ソレノイド130(駆動手段)を設け、この電磁ソレノイド130によって、軸長方向にニードル131が移動するように構成されている。ニードル131の電磁ソレノイド130と対向する側には、テーパ部132、ノズル孔129に挿入可能な直径とした先端部133が形成されている。   An electromagnetic solenoid 130 (driving means) is provided on the side of the lead-out pipe 127 facing the nozzle body 128, and the needle 131 is configured to move in the axial direction by the electromagnetic solenoid 130. On the side of the needle 131 facing the electromagnetic solenoid 130, a tapered portion 132 and a tip portion 133 having a diameter that can be inserted into the nozzle hole 129 are formed.

また、ノズル体128側には、送風筒134の設け、ノズル体128を囲むように複数の小孔135aを形成した整流板135が位置している。送風筒134には、ブロアA136(希釈気体供給手段)の吐出側を接続し、さらに吐出筒137を接続してこの吐出筒137と開閉弁139を配置した希釈溶剤ガス供給ライン138を接続している。   Further, on the nozzle body 128 side, a rectifying plate 135 having a plurality of small holes 135 a formed so as to surround the nozzle body 128 is provided. The blowing cylinder 134 is connected to the discharge side of the blower A 136 (dilution gas supply means), and further connected to a discharge cylinder 137 and a dilution solvent gas supply line 138 in which the discharge cylinder 137 and the opening / closing valve 139 are arranged. Yes.

さらに、ブロアA136による空気(希釈気体)の供給量は、ブロアA136に有するモータの回転数を制御する希釈気体供給量制御手段136aにより調節するように構成している。また、吐出筒137の部分に電気ヒータ140(加熱手段)を設け、希釈溶剤ガスの温度を検出し所定温度に制御する温度調節手段140aにより吐出筒137内を通過する溶剤ガスと空気が混合した希釈溶剤ガスの温度を調節するようになっている。なお、電気ヒータ140を設けたが、希釈溶剤ガスを加熱および冷却する手段を設けてもよい。この場合には希釈溶剤ガスの温度をより幅広く調節することができ、溶剤ガス処理装置本体200での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   Furthermore, the supply amount of air (dilution gas) by the blower A136 is configured to be adjusted by a dilution gas supply amount control means 136a that controls the rotational speed of the motor included in the blower A136. In addition, an electric heater 140 (heating means) is provided in the discharge cylinder 137, and the solvent gas passing through the discharge cylinder 137 and air are mixed by the temperature adjusting means 140a that detects the temperature of the diluted solvent gas and controls it to a predetermined temperature. The temperature of the diluted solvent gas is adjusted. Although the electric heater 140 is provided, a means for heating and cooling the diluted solvent gas may be provided. In this case, the temperature of the diluted solvent gas can be adjusted more widely, and the evaluation conditions for the solvent gas processing capacity in the solvent gas processing apparatus main body 200 can be set more widely.

溶剤ガス処理装置本体200の校正気体、希釈溶剤ガス、被処理気体の入口側には、流量計201および溶剤ガス濃度計202が設けられており、また溶剤ガス処理装置本体200の出口側には、溶剤ガス濃度計203が設けられている。   A flow meter 201 and a solvent gas concentration meter 202 are provided on the inlet side of the calibration gas, the diluted solvent gas, and the gas to be processed of the solvent gas processing apparatus main body 200, and on the outlet side of the solvent gas processing apparatus main body 200. A solvent gas concentration meter 203 is provided.

溶剤ガス処理装置本体200は、本発明においてはその溶剤ガス処理方式を限定するものではないが、例として図5および図6に代表的な装置を示す。図6に示す基本構成は、触媒酸化式の溶剤ガス処理装置本体であって、ハニカム形状の触媒体205、触媒体205に近接配置し、これを加熱する電気ヒータ206(加熱手段)を備えたものである。この方式は、酸化触媒を用いてより低温で溶剤ガスを分解処理することができる。   Although the solvent gas processing apparatus main body 200 does not limit the solvent gas processing system in the present invention, representative apparatuses are shown in FIGS. 5 and 6 as examples. The basic structure shown in FIG. 6 is a catalytic oxidation type solvent gas processing apparatus main body, which is provided with a honeycomb-shaped catalyst body 205 and an electric heater 206 (heating means) that is disposed close to and heats the catalyst body 205. Is. This method can decompose the solvent gas at a lower temperature using an oxidation catalyst.

また、図5に示す基本構成は、燃焼蓄熱式の溶剤ガス処理装置本体であって、バーナ251、バーナ251の燃焼により蓄熱するハニカム形状の蓄熱材252a、252b、流路切替部253、接続部材254a、254bを備えたものである。この方式は、バーナ251の燃焼熱、高温の蓄熱材252a、252bにより、溶剤ガスを分解処理することができる。   Further, the basic configuration shown in FIG. 5 is a combustion heat storage type solvent gas processing apparatus main body, which is a burner 251, honeycomb-shaped heat storage materials 252 a and 252 b that store heat by combustion of the burner 251, a flow path switching unit 253, and a connection member. 254a and 254b are provided. In this method, the solvent gas can be decomposed by the combustion heat of the burner 251 and the high-temperature heat storage materials 252a and 252b.

図1において溶剤ガス処理装置本体200の入口側には、開閉弁302を配置した被処理気体供給ライン300が接続され、ブロアB301によって浄化処理すべき被処理気体、校正気体を溶剤ガス処理装置本体200に供給する。   In FIG. 1, a gas supply line 300 to be processed in which an on-off valve 302 is disposed is connected to the inlet side of the solvent gas processing apparatus main body 200, and the gas to be processed and the calibration gas to be purified by the blower B301 are supplied to the solvent gas processing apparatus main body. 200.

また、ブロアB301の吸入側の被処理気体供給ライン300に開閉弁401を配置した校正気体供給ライン400を接続している。   Further, a calibration gas supply line 400 in which an on-off valve 401 is arranged is connected to the gas supply line 300 to be processed on the suction side of the blower B301.

次に、前記した溶剤ガス処理装置および溶剤ガス発生装置の基本的な運転動作について説明する。先ず、溶剤ガスを含まない所定量の校正気体を溶剤ガス処理装置本体200に供給する動作を説明する。この動作時においては、溶剤ガス処理装置本体200、流量計201、溶剤ガス濃度計202を運転状態とし、開閉弁139、302を閉、気化混合部120の運転を停止状態として、ブロアB301を運転して溶剤ガスを含まない所定量の校正気体を溶剤ガス処理装置本体200に供給する。   Next, the basic operation of the solvent gas processing device and the solvent gas generator will be described. First, an operation of supplying a predetermined amount of calibration gas not containing solvent gas to the solvent gas processing apparatus main body 200 will be described. During this operation, the solvent gas processing device main body 200, the flow meter 201, and the solvent gas concentration meter 202 are in an operating state, the on-off valves 139 and 302 are closed, and the operation of the vaporizing and mixing unit 120 is stopped, and the blower B301 is operated. Then, a predetermined amount of calibration gas not containing the solvent gas is supplied to the solvent gas processing apparatus main body 200.

校正気体は、被処理気体供給ライン300、流量計201、溶剤ガス濃度計202を通って溶剤ガス処理装置本体200に入り、出口側の溶剤ガス濃度計203を通って排出される。   The calibration gas enters the solvent gas processing apparatus main body 200 through the gas supply line 300 to be processed, the flow meter 201, and the solvent gas concentration meter 202, and is discharged through the solvent gas concentration meter 203 on the outlet side.

この校正気体の供給によって、溶剤ガス濃度計202、203の零点の校正を行うもので、計測精度の向上を図ることができる。また、溶剤ガス処理装置本体200内に滞留する校正気体の供給前における残留溶剤ガスを一旦追い出し出口側の溶剤ガス濃度計203の零点の校正をより確実に行うことがでるものである。また、溶剤ガス処理装置本体200内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置100からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   By supplying the calibration gas, the zero point of the solvent gas concentration meters 202 and 203 is calibrated, and the measurement accuracy can be improved. Further, the residual solvent gas before the supply of the calibration gas staying in the solvent gas processing apparatus main body 200 is once discharged, and the zero point of the solvent gas concentration meter 203 on the outlet side can be calibrated more reliably. Further, once the residual solvent gas in the solvent gas processing apparatus main body 200 is driven out, it is possible to grasp the processing capacity of the diluted solvent gas from the solvent gas generating apparatus 100 with higher accuracy.

溶剤ガスを含まない校正気体を溶剤ガス処理装置本体200に供給する動作を所定時間行い、ブロアB301の運転停止、開閉弁302を閉として校正ステップを終了する。   The operation of supplying the calibration gas not containing the solvent gas to the solvent gas processing apparatus main body 200 is performed for a predetermined time, the operation of the blower B301 is stopped, and the on-off valve 302 is closed to complete the calibration step.

次に、前記校正ステップを終了した後の溶剤ガス発生装置100の運転動作を説明する。   Next, the operation of the solvent gas generator 100 after the calibration step is completed will be described.

先ず、図3に示すように電磁ソレノイド130を非通電状態とし、このとき電磁ソレノイド130に有するコイルバネ(図示なし)によってニードル131はノズル孔129側に押し付けられており、先端部133がノズル孔129内に挿入され、かつテーパ部132がノズル孔129に当たって前記ノズル孔129を閉塞させている。   First, as shown in FIG. 3, the electromagnetic solenoid 130 is deenergized. At this time, the needle 131 is pressed against the nozzle hole 129 by a coil spring (not shown) included in the electromagnetic solenoid 130, and the distal end portion 133 is in the nozzle hole 129. The taper portion 132 is inserted into the nozzle hole 129 and closes the nozzle hole 129.

この状態において、電気ヒータ(加熱手段)122に通電し、気化管121、気化通路123を例えば120度C程度に予熱する。このとき導出管127、ノズル体128も気化管121からの伝導熱によってほぼ同温度レベルに予熱される。   In this state, the electric heater (heating means) 122 is energized, and the vaporizing pipe 121 and the vaporizing passage 123 are preheated to about 120 ° C., for example. At this time, the outlet pipe 127 and the nozzle body 128 are also preheated to substantially the same temperature level by the conduction heat from the vaporization pipe 121.

前記した予熱動作の後、ブロアA136を駆動し、溶剤ガスを含まない大気中の空気を、送風筒134内に供給し、整流板135の複数の小孔135aからノズル体128の近傍に噴出させる。   After the preheating operation described above, the blower A136 is driven, air in the atmosphere not containing solvent gas is supplied into the blower tube 134, and is ejected from the plurality of small holes 135a of the rectifying plate 135 to the vicinity of the nozzle body 128. .

ブロアA136の駆動開始後、図4に示すように電磁ソレノイド130を通電状態とし、このとき電磁ソレノイド130に有するコイルバネ(図示なし)に抗してニードル131を電磁ソレノイド130側に吸引し、ノズル孔129から先端部133を抜くと同時にテーパ部132をノズル孔129から離し、これによってノズル孔129を開く。また開閉弁139を開とする。   After the drive of the blower A136 is started, the electromagnetic solenoid 130 is energized as shown in FIG. 4, and at this time, the needle 131 is attracted to the electromagnetic solenoid 130 side against the coil spring (not shown) of the electromagnetic solenoid 130, and the nozzle hole At the same time that the tip 133 is removed from the nozzle 129, the tapered portion 132 is separated from the nozzle hole 129, thereby opening the nozzle hole 129. The on-off valve 139 is opened.

次に、ポンプ118を駆動し、例えば開閉弁114を開、他の開閉弁115、116、117を閉として、タンク102内の溶剤液を、供給管106に吸入し、吐出管119を介して気化管121の気化通路123に所定圧力で供給する。この溶剤液は気化管121および気化促進体124に接触して瞬時に気化し、溶剤ガスとして導出管127内に入りノズル孔129より勢い良く噴出する。   Next, the pump 118 is driven, for example, the on-off valve 114 is opened, the other on-off valves 115, 116, 117 are closed, the solvent liquid in the tank 102 is sucked into the supply pipe 106, and is discharged through the discharge pipe 119. The vaporization passage 123 of the vaporization pipe 121 is supplied at a predetermined pressure. This solvent liquid comes into contact with the vaporizing pipe 121 and the vaporization promoting body 124 and is instantly vaporized, enters the outlet pipe 127 as a solvent gas, and jets out of the nozzle hole 129 vigorously.

ノズル孔129より噴出した溶剤ガスは、整流板135の複数の小孔135aから噴出させた希釈気体である空気と均一に混合し、希釈溶剤ガスとなって吐出筒137、希釈溶剤ガス供給ライン138を介して溶剤ガス処理装置本体200に供給され浄化処理を行う。   The solvent gas ejected from the nozzle hole 129 is uniformly mixed with the air that is the diluted gas ejected from the plurality of small holes 135a of the rectifying plate 135, becomes a diluted solvent gas, becomes the discharge cylinder 137, and the diluted solvent gas supply line 138. And is supplied to the solvent gas processing apparatus main body 200 via the gas to perform purification treatment.

このとき、溶剤ガス処理装置本体200の入口側において、流量計201による希釈溶剤ガスの流量、および溶剤ガス濃度計202よる希釈溶剤ガス中の溶剤ガスの濃度を計測する。さらに、溶剤ガス処理装置本体200で希釈溶剤ガス中の溶剤ガス成分が浄化処理され浄化空気排出ラインから排出される。このとき溶剤ガス濃度計203による浄化空気中の溶剤ガスの濃度を計測する。   At this time, the flow rate of the diluted solvent gas by the flow meter 201 and the concentration of the solvent gas in the diluted solvent gas by the solvent gas concentration meter 202 are measured on the inlet side of the solvent gas processing apparatus main body 200. Further, the solvent gas component in the diluted solvent gas is purified by the solvent gas processing apparatus main body 200 and discharged from the purified air discharge line. At this time, the solvent gas concentration meter 203 measures the concentration of the solvent gas in the purified air.

溶剤ガス発生装置100から溶剤ガス処理装置本体200へ供給された希釈溶剤ガスの量、溶剤ガス濃度等の条件において、溶剤ガス濃度計203により計測した溶剤ガス濃度が所定値以下に浄化処理されていることの確認と、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力の基本的な評価を行うものである。   The solvent gas concentration measured by the solvent gas concentration meter 203 is purified to a predetermined value or less under conditions such as the amount of diluted solvent gas supplied from the solvent gas generating device 100 to the solvent gas processing device main body 200 and the solvent gas concentration. And the basic evaluation of the processing capability of the solvent gas processing apparatus main body 200 is performed from the difference in solvent gas concentration between the solvent gas concentration meter 202 and the solvent gas concentration meter 203.

前記溶剤ガス処理装置本体200の処理能力の基本的な評価を行った後、ポンプ118の駆動を停止、電気ヒータ(加熱手段)122および電磁ソレノイド130を非通電とする。電磁ソレノイド130を非通電とすることによって、ニードル131はノズル孔129側に押し付けられ、先端部133がノズル孔129内に挿入され、かつテーパ部132がノズル孔129に当たって前記ノズル孔129を閉塞し、溶剤ガスの噴出を瞬時に停止させる。   After the basic evaluation of the processing capability of the solvent gas processing apparatus main body 200, the driving of the pump 118 is stopped and the electric heater (heating means) 122 and the electromagnetic solenoid 130 are de-energized. By de-energizing the electromagnetic solenoid 130, the needle 131 is pressed toward the nozzle hole 129, the tip end portion 133 is inserted into the nozzle hole 129, and the tapered portion 132 hits the nozzle hole 129 to close the nozzle hole 129. , Stop the ejection of solvent gas instantly.

前記した動作の後、ブロアA136を所定時間(例えば略30秒)継続駆動し、大気中の空気を送風筒134内に供給し、希釈溶剤ガス供給ライン138に至る流路中を、溶剤ガスを含まない空気に置換する。この後、ブロアA136の駆動を停止し、開閉弁139を閉とする。   After the above-described operation, the blower A 136 is continuously driven for a predetermined time (for example, approximately 30 seconds), air in the atmosphere is supplied into the blower cylinder 134, and the solvent gas is passed through the flow path leading to the diluted solvent gas supply line 138. Replace with free air. Thereafter, the drive of the blower A136 is stopped and the on-off valve 139 is closed.

次に、開閉弁302を開、ブロアB301を駆動し、溶剤ガスの発生源からの溶剤ガスを含む被処理空気(被処理気体)を、被処理気体供給ライン300を介して溶剤ガス処理装置本体200に供給するように切替える。これにより溶剤ガスを含む被処理空気の浄化処理を開始するものである。このとき、溶剤ガス処理装置本体200の入口側において、流量計201による被処理空気の流量、および溶剤ガス濃度計202よる被処理空気中の溶剤ガスの濃度を計測する。   Next, the on-off valve 302 is opened, the blower B301 is driven, and the air to be processed (the gas to be processed) containing the solvent gas from the source of the solvent gas is supplied through the gas supply line 300 to the solvent gas processing apparatus main body. Switch to supply to 200. Thereby, the purification treatment of the air to be treated containing the solvent gas is started. At this time, the flow rate of the air to be processed by the flow meter 201 and the concentration of the solvent gas in the air to be processed by the solvent gas concentration meter 202 are measured on the inlet side of the solvent gas processing apparatus main body 200.

さらに、溶剤ガス処理装置本体200で被処理空気中の溶剤ガス成分が浄化処理され浄化空気排出ラインから排出される。このとき溶剤ガス濃度計203による浄化空気中の溶剤ガスの濃度を計測する。   Further, the solvent gas component in the air to be treated is purified by the solvent gas processing apparatus main body 200 and discharged from the purified air discharge line. At this time, the solvent gas concentration meter 203 measures the concentration of the solvent gas in the purified air.

溶剤ガスの発生源から溶剤ガス処理装置本体200へ供給された被処理空気の量、溶剤ガス濃度等の条件において、溶剤ガス濃度計203により計測した溶剤ガス濃度が所定値以下に浄化処理されていることの確認と、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力の基本的な確認を行うものである。   The solvent gas concentration measured by the solvent gas concentration meter 203 is purified to a predetermined value or less under conditions such as the amount of air to be treated supplied from the solvent gas generation source to the solvent gas processing apparatus main body 200 and the solvent gas concentration. And a basic confirmation of the processing capacity of the solvent gas processing apparatus main body 200 from the difference in solvent gas concentration between the solvent gas concentration meter 202 and the solvent gas concentration meter 203.

溶剤ガス処理装置の全体的な制御は、操作部、報知部、制御装置(図示なし)によって校正用気体の供給運転、溶剤ガス発生装置100の希釈溶剤ガスの供給運転、被処理気体の供給運転の切り替え制御、および溶剤ガス発生装置100での溶剤液の選択、希釈溶剤ガス中の濃度等の設定、さらに、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力(浄化度等)のデータ処理と記憶、表示、音声等による報知を行うものである。   The overall control of the solvent gas processing apparatus is performed by an operation unit, a notifying unit, and a control device (not shown), a calibration gas supply operation, a solvent gas generator 100 dilution solvent gas supply operation, and a gas to be processed supply operation. Switching control, selection of the solvent liquid in the solvent gas generator 100, setting of the concentration in the diluted solvent gas, and the like, and further the solvent gas from the solvent gas concentration difference between the solvent gas concentration meter 202 and the solvent gas concentration meter 203 Data processing of the processing capability (purification degree or the like) of the processing apparatus main body 200 and notification by storage, display, voice, or the like are performed.

校正用気体の供給による溶剤ガス処理装置本体のゼロ校正運転、溶剤ガス発生装置100で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体200の溶剤ガスの処理能力の評価運転は、溶剤ガス処理装置本体200の運転開始時、運転停止時、メンテナンス時等、適宜行うことができる。   The solvent gas processing apparatus main body zero calibration operation by supplying calibration gas, and the solvent gas processing apparatus 200 evaluation performance of the solvent gas processing apparatus main body 200 by supplying diluted solvent gas generated by the solvent gas generating apparatus 100 are solvent gas. It can be appropriately performed at the start of operation of the processing apparatus main body 200, at the time of operation stop, at the time of maintenance, or the like.

次に、溶剤ガス発生装置100から溶剤ガス処理装置本体200へ供給された希釈溶剤ガスの量、溶剤ガス濃度等の条件の設定方法について説明する。   Next, a method for setting conditions such as the amount of diluted solvent gas supplied from the solvent gas generator 100 to the solvent gas processing apparatus main body 200 and the solvent gas concentration will be described.

先ず、複数の溶剤液を選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスの溶剤ガス処理装置本体200へ供給方法を説明する。前記したように基本的動作の説明においては、開閉弁114を開、他の開閉弁115、116、117を閉として、タンク102内の溶剤液を、ポンプ118により供給管106に吸入し、吐出管119を介して気化管121の気化通路123に所定圧力で供給し、タンク102内の溶剤液の溶剤ガスを発生させたが、さらに、タンク102、103、104に各々対応した開閉弁114、115、116のいずれかを開とし、他を閉とすることによって、開としたタンク内の溶剤液をいずれか一つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスの溶剤ガス処理装置本体200へ供給することができる。   First, a method of supplying a plurality of solvent liquids to a solvent gas processing apparatus main body 200 of a diluted solvent gas containing the solvent gas of the selected solvent liquid will be described. As described above, in the description of the basic operation, the on-off valve 114 is opened, the other on-off valves 115, 116, 117 are closed, and the solvent liquid in the tank 102 is sucked into the supply pipe 106 by the pump 118 and discharged. Supplying at a predetermined pressure to the vaporizing passage 123 of the vaporizing pipe 121 via the pipe 119, the solvent gas of the solvent liquid in the tank 102 was generated. Further, the on-off valves 114, respectively corresponding to the tanks 102, 103, 104, 115 or 116 is opened and the other is closed, so that any one of the solvent liquids in the opened tank is selected and vaporized, and the diluted solvent containing the solvent gas of the selected solvent liquid The gas can be supplied to the solvent gas processing apparatus main body 200.

また、タンク102、103、104に各々対応した開閉弁114、115、116のいずれか二つを開とし、他を閉とすることによって、開とした二つのタンク内の溶剤液をいずれか二つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。さらに、同様の手段により、溶剤液をいずれか三つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   Further, by opening any two of the on-off valves 114, 115, and 116 corresponding to the tanks 102, 103, and 104 and closing the other, respectively, the solvent liquid in the two opened tanks is changed to any two. One can be selected and vaporized, and the diluted solvent gas containing the solvent gas of the selected solvent liquid can be supplied to the solvent gas processing apparatus main body 200. Furthermore, by the same means, any three of the solvent liquids can be selected and vaporized, and the diluted solvent gas containing the solvent gas of the selected solvent liquid can be supplied to the solvent gas processing apparatus main body 200.

さらに、開閉弁114、115、116を、閉を含む流量調節弁とすることで、複数の溶剤液の混合割合を任意に選択して気化させ、任意の混合割合の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   Further, the on-off valves 114, 115, and 116 are flow rate control valves including closing, so that a mixing ratio of a plurality of solvent liquids can be arbitrarily selected and vaporized, and a diluted solvent gas containing a solvent gas having an arbitrary mixing ratio is used. Can be supplied to the main body 200 of the solvent gas processing apparatus.

また、複数の溶剤液を予め任意に所定の割合で混合して貯留するタンク105を備えているが、この混合した溶剤液を選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   In addition, a tank 105 for storing a mixture of a plurality of solvent solutions in advance at a predetermined ratio is stored, and the mixed solvent solution is selected and vaporized, and the selected solvent solution is diluted with a solvent gas. The solvent gas can be supplied to the solvent gas processing apparatus main body 200.

また、気化させた溶剤液の溶剤ガスを含む希釈溶剤ガス中の溶剤ガスの濃度は、ブロアA136による希釈気体の供給量および/またはポンプ118による溶剤液の供給量の調節によって設定することがでる。   Further, the concentration of the solvent gas in the diluted solvent gas containing the solvent gas of the vaporized solvent liquid can be set by adjusting the supply amount of the diluted gas by the blower A136 and / or the supply amount of the solvent liquid by the pump 118. .

ブロアA136による希釈気体の供給量を一定とした場合は、ポンプ118による溶剤液の供給量の調節によって設定することがでる。また、ポンプ118による溶剤液の供給量を一定とした場合は、ブロアA136による希釈気体の供給量の調節によって設定することがでる。さらに、ブロアA136による希釈気体の供給量およびポンプ118による溶剤液の供給量の調節によって設定することがでる。このように希釈溶剤ガスの量、希釈溶剤ガス中の溶剤ガス濃度を任意に変化させることができるものである。   When the supply amount of the dilution gas by the blower A136 is constant, it can be set by adjusting the supply amount of the solvent liquid by the pump 118. In addition, when the supply amount of the solvent liquid by the pump 118 is constant, it can be set by adjusting the supply amount of the dilution gas by the blower A136. Further, it can be set by adjusting the supply amount of the dilution gas by the blower A136 and the supply amount of the solvent liquid by the pump 118. Thus, the amount of the diluted solvent gas and the solvent gas concentration in the diluted solvent gas can be arbitrarily changed.

希釈溶剤ガスの量、希釈溶剤ガス中の溶剤ガス濃度は、ブロアA136による希釈気体の供給量、ポンプ118による溶剤液の供給量を変化させる速度を制御することで、任意に設定することができる。さらに、気化させる溶剤液の選択は、開閉弁114、115、116、117の開閉制御によってほぼ瞬時に切り替えることができる。   The amount of the diluted solvent gas and the solvent gas concentration in the diluted solvent gas can be arbitrarily set by controlling the rate at which the diluted gas supply amount by the blower A136 and the solvent liquid supply amount by the pump 118 are changed. . Furthermore, the selection of the solvent liquid to be vaporized can be switched almost instantaneously by opening / closing control of the on-off valves 114, 115, 116, 117.

図4に示す(a)は、希釈溶剤ガス中の溶剤ガス濃度を無段階に増加または減少方向に変化させて、また、(b)は希釈溶剤ガス中の溶剤ガス濃度を段階的に変化させて、溶剤ガス処理装置本体200へ供給する例を示す。   (A) shown in FIG. 4 changes the solvent gas concentration in the diluting solvent gas in a stepless increase or decrease direction, and (b) changes the solvent gas concentration in the diluting solvent gas stepwise. An example of supplying to the solvent gas processing apparatus main body 200 will be shown.

また、溶剤ガスと空気を混合した希釈溶剤ガス中の溶剤ガスの濃度を爆発限界の下限値以下となるように溶剤液の気化手段への供給量または希釈気体の供給量を制御するものである。   Further, the supply amount of the solvent liquid to the vaporizing means or the supply amount of the dilution gas is controlled so that the concentration of the solvent gas in the diluted solvent gas mixed with the solvent gas and air is not more than the lower limit of the explosion limit. .

さらに、溶剤ガス濃度計202が溶剤ガスの爆発限界の下限値以上の濃度を検出したときは、溶剤ガスの爆発限界の下限値以下に溶剤液の気化手段への供給量を減少させるか、または溶剤液の気化手段への供給を停止するようにしてもよい。この場合には安全性をより向上させることができる。   Further, when the solvent gas concentration meter 202 detects a concentration not less than the lower limit value of the explosion limit of the solvent gas, the supply amount of the solvent liquid to the vaporization means is decreased below the lower limit value of the explosion limit of the solvent gas, or You may make it stop supply to the vaporization means of a solvent liquid. In this case, safety can be further improved.

また、希釈気体供給量の検出手段(図示なし)を備え、前記希釈気体供給量検出手段が所定値以下の希釈気体の供給量を検出したときは、溶剤液の気化手段への供給を停止させるようにしてもよい。この場合にはブロアA136の停止時等置ける安全性をより向上させることができる。   Further, a dilution gas supply amount detection means (not shown) is provided, and when the dilution gas supply amount detection means detects a supply amount of dilution gas below a predetermined value, supply of the solvent liquid to the vaporization means is stopped. You may do it. In this case, it is possible to further improve the safety that the blower A136 can be placed when the blower A136 is stopped.

なお、図2、図3に示す構成の溶剤ガス発生装置において、特にポンプ(溶剤液供給手段)118は、各溶剤液のタンクごとに設けてもよい。   In the solvent gas generator configured as shown in FIGS. 2 and 3, in particular, a pump (solvent liquid supply means) 118 may be provided for each tank of each solvent liquid.

各種溶剤ガスの浄化処理を必要とする広範囲の装置の用途にも適用できる。   The present invention can be applied to a wide range of apparatuses that require purification treatment of various solvent gases.

本発明一実施例の溶剤ガス処理装置の基本構成図1 is a basic configuration diagram of a solvent gas processing apparatus according to an embodiment of the present invention. 溶剤ガス発生装置の溶剤液供給部および気化混合部の基本構成図Basic configuration diagram of solvent liquid supply unit and vaporization mixing unit of solvent gas generator 気化混合部のノズル孔閉塞時の構成図Configuration diagram of the vaporization mixing unit when the nozzle hole is closed (a)、(b)溶剤ガス発生装置からの溶剤ガス供給例を示すグラフ(A), (b) The graph which shows the example of solvent gas supply from a solvent gas generator 溶剤ガス処理装置本体の例を示す基本構成図Basic configuration diagram showing an example of a solvent gas treatment device body 溶剤ガス処理装置本体の他の例を基本構成図Basic configuration diagram of another example of the solvent gas treatment device main body

100 溶剤ガス発生装置
101 溶剤液供給部
102 タンク
103 タンク
104 タンク
105 タンク
106 供給管
107 供給管
108 供給管
109 供給管
110 流量計
111 流量計
112 流量計
113 流量計
114 開閉弁
115 開閉弁
116 開閉弁
117 開閉弁
118 ポンプ(溶剤液供給手段)
118a 溶剤液供給量制御手段
119 吐出管
120 気化混合部(気化手段)
121 気化管(気化手段)
122 電気ヒータ(加熱手段)
122a 温度調節手段
123 気化通路
124 気化促進体
125 廃液管
126 開閉弁
127 導出管
128 ノズル体
129 ノズル孔
130 電磁ソレノイド(駆動手段)
131 ニードル
132 テーパ部
133 先端部
134 送風筒
135 整流板
135a 小孔
136 ブロアA(希釈気体供給手段)
136a 希釈気体供給量制御手段
137 吐出筒
138 希釈溶剤ガス供給ライン
139 開閉弁
140 電気ヒータ(加熱手段)
140a 温度調節手段
200 溶剤ガス処理装置本体
201 流量計
202 溶剤ガス濃度計
203 溶剤ガス濃度計
204 触媒酸化式溶剤ガス処理装置本体
205 触媒体
206 電気ヒータ(加熱手段)
250 燃焼蓄熱式溶剤ガス処理装置本体
251 バーナ
252a 蓄熱材
252b 蓄熱材
253 流路切替部
254a 接続部材
254b 接続部材
300 被処理気体供給ライン
301 ブロアB
302 開閉弁
400 校正気体供給ライン
401 開閉弁
DESCRIPTION OF SYMBOLS 100 Solvent gas generator 101 Solvent liquid supply part 102 Tank 103 Tank 104 Tank 105 Tank 106 Supply pipe 107 Supply pipe 108 Supply pipe 109 Supply pipe 110 Flowmeter 111 Flowmeter 112 Flowmeter 113 Flowmeter 114 Open / close valve 115 Open / close valve 116 Open / close Valve 117 On-off valve 118 Pump (solvent liquid supply means)
118a Solvent liquid supply control means 119 Discharge pipe 120 Vapor mixing section (vaporization means)
121 Vaporizer (vaporizer)
122 Electric heater (heating means)
122a Temperature adjusting means 123 Vaporization passage 124 Vaporization promoting body 125 Waste liquid pipe 126 Opening and closing valve 127 Deriving pipe 128 Nozzle body 129 Nozzle hole 130 Electromagnetic solenoid (drive means)
131 Needle 132 Tapered part 133 Tip part 134 Blower cylinder 135 Current plate 135a Small hole 136 Blower A (dilution gas supply means)
136a Diluted gas supply amount control means 137 Discharge cylinder 138 Diluted solvent gas supply line 139 On-off valve 140 Electric heater (heating means)
140a Temperature control means 200 Solvent gas processing apparatus main body 201 Flow meter 202 Solvent gas concentration meter 203 Solvent gas concentration meter 204 Catalytic oxidation type solvent gas processing apparatus main body 205 Catalyst body 206 Electric heater (heating means)
250 Combustion heat storage type solvent gas processing device main body 251 Burner 252a Heat storage material 252b Heat storage material 253 Flow path switching unit 254a Connection member 254b Connection member 300 Processed gas supply line 301 Blower B
302 On-off valve 400 Calibration gas supply line 401 On-off valve

Claims (12)

揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置の処理能力の評価運転用として揮発性有機化合物の溶剤液を加熱気化させた溶剤ガスを供給する溶剤ガス発生装置であって、揮発性有機化合物の溶剤液を貯蔵するタンクと、前記タンクから溶剤液を吸引吐出するポンプと、前記ポンプによって供給された溶剤液を溶剤ガスとして加熱気化させる気化管と、前記気化管を加熱する加熱手段と、前記気化管の温度を検出して所定温度に制御する温度調節手段と、前記気化管で気化した溶剤ガスを噴出する噴出口を有するノズル孔と、前記ノズル孔を開閉するニードルを駆動する駆動手段と、前記溶剤ガスと混合する希釈気体を供給する希釈気体供給手段と、を備え、前記加熱手段により加熱した気化管にポンプにより溶剤液を供給し加熱気化させて溶剤ガスとするとともに、ニードルを駆動しノズル孔を開にして前記溶剤ガスを噴出させ、前記ノズル孔から噴出した溶剤ガスに希釈気体を混合させて希釈溶剤ガスとし、前記希釈溶剤ガスを溶剤ガス処理装置へ供給することを特徴とする溶剤ガス発生装置。 A solvent gas generator for supplying a solvent gas obtained by heating and vaporizing a solvent solution of a volatile organic compound for use in an operation for evaluating a processing capacity of a solvent gas processing apparatus for processing a gas to be treated containing a volatile organic compound. A tank for storing the solvent liquid of the organic compound, a pump for sucking and discharging the solvent liquid from the tank, a vaporization tube for heating and vaporizing the solvent liquid supplied by the pump as a solvent gas, and heating for heating the vaporization pipe Means, temperature adjusting means for detecting the temperature of the vaporizing tube and controlling it to a predetermined temperature, a nozzle hole having a jet port for ejecting the solvent gas vaporized in the vaporizing tube, and a needle for opening and closing the nozzle hole is driven And a diluent gas supply means for supplying a diluent gas to be mixed with the solvent gas, and the solvent liquid is supplied to the vaporization tube heated by the heating means by a pump. The solvent gas is heated to vaporize, the needle is driven to open the nozzle hole, and the solvent gas is ejected. The solvent gas ejected from the nozzle hole is mixed with a diluent gas to obtain a diluted solvent gas. A solvent gas generator characterized by supplying gas to a solvent gas processing device. ポンプよる溶剤液の気化管への供給量および/または希釈気体の供給手段による希釈気体の供給量を制御して前記希釈溶剤ガス中の溶剤ガスの濃度を調節可能とし、前記希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする請求項1に記載の溶剤ガス発生装置。 The concentration of the solvent gas in the dilution solvent gas can be adjusted by controlling the supply amount of the solvent liquid to the vaporization pipe by the pump and / or the supply amount of the dilution gas by the supply means of the dilution gas, The solvent gas generator according to claim 1, wherein the solvent gas generator is supplied to a gas processing apparatus main body. 複数の種類の溶剤液の内、いずれか一つの溶剤液を選択して気化管に供給し溶剤ガスを発生させることを特徴とする請求項1または2に記載の溶剤ガス発生装置。 3. The solvent gas generator according to claim 1 or 2, wherein any one of a plurality of types of solvent liquid is selected and supplied to a vaporizing tube to generate a solvent gas. 複数の種類の溶剤液を同時に気化管に供給し、前記複数の種類の溶剤液の混合した混合溶剤ガスを発生させることを特徴とする請求項1または2に記載の溶剤ガス発生装置。 The solvent gas generator according to claim 1 or 2, wherein a plurality of types of solvent liquids are simultaneously supplied to a vaporizing tube to generate a mixed solvent gas in which the plurality of types of solvent liquids are mixed. 複数の種類の溶剤液の各々の溶剤ガスの成分割合を調節可能にしたことを特徴とする請求項4に記載の溶剤ガス発生装置。 5. The solvent gas generator according to claim 4, wherein a component ratio of each solvent gas of the plurality of types of solvent liquids is adjustable. 希釈溶剤ガス中の溶剤ガスの濃度を所定時間内において変化させて希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする請求項1〜5のいずれか1項に記載の溶剤ガス発生装置。 6. The solvent gas generation according to claim 1, wherein the concentration of the solvent gas in the diluted solvent gas is changed within a predetermined time and the diluted solvent gas is supplied to the main body of the solvent gas processing apparatus. apparatus. 溶剤ガスと空気を混合した希釈溶剤ガス中の溶剤ガスの濃度を爆発限界の下限値以下となるように溶剤液の気化管への供給量または希釈気体の供給量を制御することを特徴とする請求項1〜6のいずれか1項に記載の溶剤ガス発生装置。 The supply amount of the solvent liquid to the vaporization pipe or the supply amount of the dilution gas is controlled so that the concentration of the solvent gas in the diluted solvent gas mixed with the solvent gas and air is not more than the lower limit of the explosion limit. The solvent gas generator of any one of Claims 1-6. 希釈溶剤ガスの温度を検出して所定温度に制御する温度調節手段を備えたことを特徴とする請求項1〜7のいずれか1項に記載の溶剤ガス発生装置。 The solvent gas generator according to any one of claims 1 to 7, further comprising temperature adjusting means for detecting the temperature of the diluted solvent gas and controlling the temperature to a predetermined temperature. 請求項1〜8のいずれかに記載の溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への供給ラインと、前記溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能としたことを特徴とする溶剤ガス処理装置。 The solvent gas generator according to any one of claims 1 to 8, a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a solvent gas processing apparatus for a gas to be processed containing a volatile organic compound A diluted solvent gas generated by the gas to be treated and the solvent gas generator, comprising: a supply line to the main body; and a supply line to the solvent gas processing apparatus body of the diluted solvent gas generated by the solvent gas generator Supply to the main body of the solvent gas processing apparatus can be selected, and the operation of evaluating the solvent gas processing capacity of the main body of the solvent gas processing apparatus by supplying the diluted solvent gas generated by the solvent gas generating apparatus and the supply of the gas to be processed A solvent gas processing apparatus characterized in that a processing operation of the gas to be processed can be performed. 溶剤ガスを含まない校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能としたことを特徴とする請求項9に記載の溶剤ガス処理装置。 10. The solvent gas processing apparatus according to claim 9, wherein the solvent gas processing apparatus main body can be calibrated by supplying a calibration gas that does not contain a solvent gas. 請求項1〜8のいずれかに記載の溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うことを特徴とする溶剤ガス処理装置の運転方法。 The solvent gas generator according to any one of claims 1 to 8, a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a solvent gas processing apparatus for a gas to be processed containing a volatile organic compound A supply line to the main body, and a supply line to the solvent gas processing apparatus main body of the diluted solvent gas generated by the solvent gas generator, and the diluted gas generated by the gas to be processed and the solvent gas generator The supply to the solvent gas processing apparatus main body can be selected, the operation for evaluating the processing capacity of the solvent gas processing apparatus main body by supplying the diluted solvent gas generated by the solvent gas generating apparatus, and the gas to be processed by supplying the gas to be processed Gas gas to be treated, after supplying a diluted solvent gas from the solvent gas generator and evaluating the solvent gas processing capacity of the solvent gas processor main body. How the operation of the solvent gas treatment apparatus, which comprises carrying out the processing operation of the gas to be treated by the supply. 溶剤ガスを含まない校正気体の供給ラインを備え、校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能とするとともに、校正用気体を溶剤ガス処理装置本体へ供給した後、溶剤ガス発生装置から溶剤ガスを供給して溶剤ガス処理装置本体部の処理能力の評価運転を行うことを特徴とする請求項11に記載の溶剤ガス処理装置の運転方法。 It is equipped with a calibration gas supply line that does not contain solvent gas, and it is possible to perform calibration operation of the solvent gas processing apparatus main body by supplying calibration gas, and after supplying the calibration gas to the solvent gas processing apparatus main body, 12. The method for operating a solvent gas processing apparatus according to claim 11, wherein the solvent gas is supplied from the solvent gas generating apparatus and the operation for evaluating the processing capacity of the main body of the solvent gas processing apparatus is performed.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010247018A (en) * 2009-04-13 2010-11-04 Panasonic Corp Solvent gas treating apparatus, method of operating the same and solvent gas generator

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05228361A (en) * 1991-08-27 1993-09-07 Stec Kk Device for vaporizing and supplying liquid material
JPH11221908A (en) * 1998-02-06 1999-08-17 Dainippon Printing Co Ltd Solvent vaporizing apparatus
JP2001133366A (en) * 1999-11-08 2001-05-18 Stec Inc Reference gas generator
JP2002328073A (en) * 2001-03-27 2002-11-15 Gerstel Systemtechnik Gmbh & Co Kg Method and apparatus for manufacturing gas mixture and method for calibrating gas analyzing apparatus
JP2004202343A (en) * 2002-12-25 2004-07-22 Dainippon Printing Co Ltd Gas generator
JP2006194694A (en) * 2005-01-12 2006-07-27 Atsuo Nozaki Standard gas preparing apparatus and capacity inspection device using it
JP2008302348A (en) * 2007-06-11 2008-12-18 Ooden:Kk Exhaust gas treatment monitor/monitoring method, exhaust gas treating device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05228361A (en) * 1991-08-27 1993-09-07 Stec Kk Device for vaporizing and supplying liquid material
JPH11221908A (en) * 1998-02-06 1999-08-17 Dainippon Printing Co Ltd Solvent vaporizing apparatus
JP2001133366A (en) * 1999-11-08 2001-05-18 Stec Inc Reference gas generator
JP2002328073A (en) * 2001-03-27 2002-11-15 Gerstel Systemtechnik Gmbh & Co Kg Method and apparatus for manufacturing gas mixture and method for calibrating gas analyzing apparatus
JP2004202343A (en) * 2002-12-25 2004-07-22 Dainippon Printing Co Ltd Gas generator
JP2006194694A (en) * 2005-01-12 2006-07-27 Atsuo Nozaki Standard gas preparing apparatus and capacity inspection device using it
JP2008302348A (en) * 2007-06-11 2008-12-18 Ooden:Kk Exhaust gas treatment monitor/monitoring method, exhaust gas treating device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010247018A (en) * 2009-04-13 2010-11-04 Panasonic Corp Solvent gas treating apparatus, method of operating the same and solvent gas generator

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