JP2010247018A - Solvent gas treating apparatus, method of operating the same and solvent gas generator - Google Patents

Solvent gas treating apparatus, method of operating the same and solvent gas generator Download PDF

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JP2010247018A
JP2010247018A JP2009096863A JP2009096863A JP2010247018A JP 2010247018 A JP2010247018 A JP 2010247018A JP 2009096863 A JP2009096863 A JP 2009096863A JP 2009096863 A JP2009096863 A JP 2009096863A JP 2010247018 A JP2010247018 A JP 2010247018A
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gas
solvent
solvent gas
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processing apparatus
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JP5168217B2 (en
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Daisuke Aoki
大輔 青木
Koji Shimizu
巧治 清水
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Panasonic Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a solvent gas treating apparatus capable of always evaluating the capacity of treating volatile organic compounds accurately and stably, a method of operating the apparatus and a solvent gas generator. <P>SOLUTION: The solvent gas treating apparatus includes a solvent gas treating apparatus body 200 treating a target gas, a solvent gas generator 100 evaporating a solvent liquid by heating to form a solvent gas and generating a diluted solvent gas formed by mixing the solvent gas with a diluting gas, a target gas supplying line supplying a target gas to the solvent gas treating apparatus body and a diluted solvent gas supplying line supplying the diluted solvent gas generated in the solvent gas generator to the solvent gas treating apparatus body. The target gas and the diluted solvent gas generated in the solvent gas generator can be supplied selectively to the solvent gas treating apparatus body, and an operation for evaluating the capacity of the solvent gas treating apparatus body of treating the solvent gas by supplying the diluted solvent gas generated in the solvent gas generator and an operation for treating the target gas by supplying the target gas can thus be carried out. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、揮発性有機化合物(VOC:Volatile Organic Compounds)等の揮発性化合物を含む排気ガス(被処理気体)を浄化処理する溶剤ガス処理装置およびその運転方法並びに溶剤ガス処理装置の処理能力の評価に用いる溶剤ガス発生装置に関するものである。   The present invention relates to a solvent gas processing apparatus for purifying exhaust gas (gas to be processed) containing a volatile compound such as volatile organic compounds (VOC), an operating method thereof, and a processing capacity of the solvent gas processing apparatus. The present invention relates to a solvent gas generator used for evaluation.

近年、生活環境に近接した中小規模事業場や畜産業からの悪臭苦情が増加し、また、苦情の原因となる悪臭の発生源が多様化する傾向がある。中でも、印刷・塗装工場等から排出されるガスに含まれる揮発性有機化合物(溶剤ガス)は悪臭をもたらすだけでなく、浮遊粒子状物質(SPM)や光化学オキシダント等の原因物質でもある。このため、個々の事業所におけるVOC排出削減に向けた対策が求められている。また、平成18年に大気汚染防止法が改正され、大規模施設等における揮発性有機化合物の排出基準値等が設定された。   In recent years, odor complaints from small and medium-sized businesses and livestock industries close to the living environment have increased, and the sources of odor causing complaints tend to diversify. Among them, volatile organic compounds (solvent gases) contained in gases discharged from printing / painting plants and the like not only cause bad odor, but are also causative substances such as suspended particulate matter (SPM) and photochemical oxidants. For this reason, measures for reducing VOC emissions at individual offices are required. In 2006, the Air Pollution Control Law was amended to set emission standards for volatile organic compounds in large-scale facilities.

悪臭の脱臭方法として、可燃性を呈する炭化水素などの一般的に揮発性有機化合物と称されるガスを浄化処理する方法は、分解方式(燃焼、触媒分解など)、除去・分離方式(吸着、冷却凝縮などで、回収方式も含む)、生物脱臭方式に大別される。   As a method for deodorizing bad odors, there are methods for purifying gases generally called volatile organic compounds such as flammable hydrocarbons such as decomposition methods (combustion, catalytic decomposition, etc.), removal / separation methods (adsorption, It is roughly divided into biological deodorization methods such as cooling condensation, including recovery methods).

前記浄化処理方法、その装置においては、従来から一般的に処理装置の入り口側における発生源からの被処理ガス(被処理気体)中の揮発性有機化合物成分および処理装置の出口側における処理ガス中の揮発性有機化合物成分の濃度を濃度計測器で計測し、浄化処理能力の把握および装置の全体的な制御等をおこなっていた。   In the purification treatment method and its apparatus, conventionally, the volatile organic compound component in the gas to be processed (the gas to be processed) from the generation source on the inlet side of the processing apparatus and the processing gas on the outlet side of the processing apparatus are conventionally used. The concentration of volatile organic compound components was measured with a concentration meter, and the purification treatment capacity was grasped and the overall control of the apparatus was performed.

前記した処理装置の代表的な例として、下記のものがある。揮発性有機化合物の除去状態を正確に把握するため、排ガス中に含まれる揮発性化合物を除去するとともに再生可能な排ガス処理部の処理機能を監視する排ガス処理監視装置であって、前記排ガス(被処理気体)の流路に沿って前記排ガス処理部に流入する前記揮発性化合物の流入濃度と前記排ガス処理部から排出される前記揮発性化合物の排出濃度とを検出する濃度検出手段と、前記流入濃度及び前記排出濃度に基づいて、前記排ガス処理部の使用時の処理機能の低下状態又は再生時の処理機能の回復状態を検知する状態検知手段とを備えた排ガス処理監視装置、排ガス処理装置としたものである(例えば、特許文献1参照)。   The following are typical examples of the processing apparatus described above. An exhaust gas treatment monitoring apparatus for removing a volatile compound contained in exhaust gas and monitoring a treatment function of a recyclable exhaust gas treatment unit in order to accurately grasp a removal state of a volatile organic compound, Concentration detecting means for detecting an inflow concentration of the volatile compound flowing into the exhaust gas treatment unit along a flow path of the processing gas and an exhaust concentration of the volatile compound discharged from the exhaust gas processing unit, and the inflow An exhaust gas treatment monitoring device, an exhaust gas treatment device comprising state detection means for detecting a reduced state of the treatment function during use of the exhaust gas treatment unit or a recovery state of the treatment function during regeneration based on the concentration and the exhaust concentration; (See, for example, Patent Document 1).

特開2008−302348号公報JP 2008-302348 A

しかしながら、前記した特許文献1に記載されたものは、揮発性有機化合物成分を含む浄化処理すべき排ガス(被処理気体)の一部および浄化処理後の処理気体を分岐、切換えて、各々の気体の揮発性有機化合物成分の濃度をガスセンサにより計測するものである。   However, what is described in Patent Document 1 described above is a method in which a part of the exhaust gas (gas to be treated) containing the volatile organic compound component to be purified and the treated gas after the purification treatment are branched and switched. The concentration of the volatile organic compound component is measured with a gas sensor.

この場合においては、塗装工場や印刷工場、化学工場等の揮発性有機化合物成分含有ガスの発生源から排出される浄化処理すべき排ガス(被処理気体)中の揮発性有機化合物成分の濃度が極めて不安定なものであり、ごく短時間に揮発性有機化合物成分の濃度が常に変動して一定にならず、さらに様々な揮発性有機化合物成分が混入する恐れがある。   In this case, the concentration of the volatile organic compound component in the exhaust gas to be purified (the gas to be treated) discharged from the generation source of the volatile organic compound component-containing gas such as a coating factory, a printing factory, or a chemical factory is extremely high. It is unstable, and the concentration of the volatile organic compound component always fluctuates in a very short time and does not become constant, and various volatile organic compound components may be mixed.

また、揮発性有機化合物成分含有ガスの発生源が停止状態で、揮発性有機化合物成分含有ガスの発生が無いときには、処理装置の処理能力の評価ができない。   In addition, when the generation source of the volatile organic compound component-containing gas is stopped and there is no generation of the volatile organic compound component-containing gas, the processing capability of the processing apparatus cannot be evaluated.

このため、短時間に揮発性有機化合物成分の濃度の変動(バラツキ)により常に正確で安定した溶剤ガス処理装置の処理能力の評価を行うことができない。また、被処理気体の量または被処理気体中の揮発性有機化合物成分の濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができない。   For this reason, it is impossible to always evaluate the processing capability of the solvent gas processing apparatus accurately and stably due to the fluctuation (variation) of the concentration of the volatile organic compound component in a short time. Further, it is not possible to evaluate the processing capability of the solvent gas processing apparatus by arbitrarily changing the amount of the gas to be processed or the concentration of the volatile organic compound component in the gas to be processed to various conditions.

本発明は、前記従来の課題を解決するもので、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる溶剤ガス処理装置、溶剤ガス処理装置の運転方法を提供することを目的とする。また、前記溶剤ガス処理装置の処理能力の評価用として、溶剤ガス濃度を調節可能とした希釈溶剤ガスを前記溶剤ガス処理装置へ供給することができる溶剤ガス発生装置を提供することを目的とする。   The present invention solves the above-described conventional problems, and provides a solvent gas processing apparatus and a method for operating the solvent gas processing apparatus that can always accurately and stably evaluate the processing capacity of volatile organic compounds. Objective. Another object of the present invention is to provide a solvent gas generator capable of supplying a diluted solvent gas whose concentration of solvent gas can be adjusted to the solvent gas processing device for evaluating the processing capacity of the solvent gas processing device. .

本発明の溶剤ガス処理装置は、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能としたものである。   The solvent gas processing apparatus of the present invention includes a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, a solvent liquid by heating and vaporizing a solvent liquid of the volatile organic compound, and the solvent gas and A solvent gas generator that generates a diluted solvent gas mixed with a dilution gas, a gas supply line to be supplied to a solvent gas processing apparatus body of a gas to be processed containing a volatile organic compound, and a solvent gas generator. A diluted solvent gas supply line for supplying the diluted solvent gas to the main body of the solvent gas processing apparatus, and the supply of the diluted solvent gas generated by the gas to be processed and the solvent gas generating apparatus to the main body of the solvent gas processing apparatus can be selected. The operation of evaluating the solvent gas processing capacity of the main body of the solvent gas processing device by supplying the diluted solvent gas generated by the solvent gas generating device, and the processing of the gas to be processed by supplying the gas to be processed In which it made it possible to perform the operation.

また、本発明の溶剤ガス処理装置の運転方法は、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うものである。   In addition, the operation method of the solvent gas processing apparatus of the present invention includes a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a solvent liquid by heating and vaporizing a solvent liquid of the volatile organic compound to obtain a solvent gas. A solvent gas generator for generating a diluted solvent gas mixed with the solvent gas and a diluent gas, a gas supply line for supplying a gas to be processed containing a volatile organic compound to the solvent gas processor body, and a solvent gas generator A diluted solvent gas supply line for supplying the diluted solvent gas generated by the apparatus to the solvent gas processing apparatus main body, and supplying the diluted gas generated by the gas to be processed and the solvent gas generating apparatus to the solvent gas processing apparatus main body. An operation for evaluating the processing capacity of the main body of the solvent gas processing apparatus by supplying the diluted solvent gas generated by the solvent gas generating apparatus, and the gas to be processed by supplying the gas to be processed It is possible to perform the processing operation of the above, and after supplying the diluted solvent gas from the solvent gas generator and performing the evaluation operation of the processing capacity of the solvent gas of the solvent gas processing device body, the supply of the gas to be processed The processing operation of the gas to be processed is performed.

さらに、本発明の溶剤ガス発生装置は、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体の処理能力の評価運転用として溶剤ガスを供給する溶剤ガス発生装置であって、揮発性有機化合物の溶剤液の溶剤液供給手段と、前記溶剤液供給手段により供給した溶剤液を加熱気化させて溶剤ガスを発生させる気化手段と、前記気化手段への溶剤液の供給量を制御して溶剤ガスの発生量を調節する溶剤液供給量制御手段と、前記溶剤ガスに混合する希釈気体を供給する希釈気体供給手段と、前記希釈気体の供給量を調節する希釈気体供給量制御手段と、を備え、前記溶剤ガスと希釈気体を混合して希釈溶剤ガスとするとともに、前記溶剤液の気化手段への供給量および/または希釈気体の供給量を制御して前記希釈溶剤ガス中の溶剤ガス濃度を調節可能とするとともに、前記希釈溶剤ガスを溶剤ガス処理装置本体へ供給するものである。   Furthermore, the solvent gas generator of the present invention is a solvent gas generator that supplies a solvent gas for the evaluation operation of the processing capacity of the main body of the solvent gas processing apparatus for processing a gas to be processed containing a volatile organic compound, Controlling the amount of solvent liquid supplied to the vaporizing means, the solvent liquid supplying means for the solvent liquid of the organic organic compound, the vaporizing means for heating and vaporizing the solvent liquid supplied by the solvent liquid supplying means, and generating the solvent gas. A solvent liquid supply amount control means for adjusting the amount of solvent gas generated, a dilution gas supply means for supplying a dilution gas mixed with the solvent gas, and a dilution gas supply amount control means for adjusting the supply amount of the dilution gas. The solvent gas and the dilution gas are mixed to form a dilution solvent gas, and the supply amount of the solvent liquid to the vaporizing means and / or the supply amount of the dilution gas are controlled to dissolve the solution in the dilution solvent gas. With the adjustable gas concentration, the diluted solvent gas and supplies the solvent gas treatment apparatus.

本発明の溶剤ガス処理装置、溶剤ガス処理装置の運転方法によれば、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。また、本発明の本発明の溶剤ガス発生装置によれば、前記溶剤ガス処理装置の処理能力の評価用として、溶剤ガス濃度を調節可能とした希釈溶剤ガスを前記溶剤ガス処理装置へ供給することができる。   According to the operation method of the solvent gas processing apparatus and the solvent gas processing apparatus of the present invention, it is possible to always evaluate the processing capability of the volatile organic compound accurately and stably. Further, according to the solvent gas generator of the present invention of the present invention, for the purpose of evaluating the processing capacity of the solvent gas processing device, a diluted solvent gas whose solvent gas concentration can be adjusted is supplied to the solvent gas processing device. Can do.

本発明一実施例の溶剤ガス処理装置の基本構成図1 is a basic configuration diagram of a solvent gas processing apparatus according to an embodiment of the present invention. 溶剤ガス発生装置の溶剤液供給部および気化混合部の基本構成図Basic configuration diagram of solvent liquid supply unit and vaporization mixing unit of solvent gas generator 気化混合部のノズル孔閉塞時の構成図Configuration diagram of the vaporization mixing unit when the nozzle hole is closed (a)、(b)溶剤ガス発生装置からの溶剤ガス供給例を示すグラフ(A), (b) The graph which shows the example of solvent gas supply from a solvent gas generator 溶剤ガス処理装置本体の例を示す基本構成図Basic configuration diagram showing an example of a solvent gas treatment device body 溶剤ガス処理装置本体の他の例を基本構成図Basic configuration diagram of another example of the solvent gas treatment device main body

第1の発明は、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能としたことを特徴とする溶剤ガス処理装置としたものである。   The first invention includes a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, a solvent liquid by heating and vaporizing a solvent liquid of the volatile organic compound, and the solvent gas and the dilution gas. Solvent gas generator for generating mixed diluted solvent gas, supply gas supply line to the main body of the solvent gas processing apparatus containing the volatile organic compound, and diluted solvent gas generated by the solvent gas generator A dilute solvent gas supply line to the main body of the solvent gas processing apparatus, and the supply of the dilute solvent gas generated by the gas to be processed and the solvent gas generating apparatus to the main body of the solvent gas processing apparatus can be selected. An evaluation operation of the solvent gas processing capacity of the main body of the solvent gas processing device by supplying the diluted solvent gas generated by the generator and a processing operation of the gas to be processed by supplying the gas to be processed are performed. It is obtained by the solvent gas treatment apparatus being characterized in that it possible to.

これによって、短時間での溶剤ガス濃度の変動(バラツキ)が無く、さらに、希釈溶剤ガスの量または希釈溶剤ガス中の溶剤ガス濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができる。したがって、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。   As a result, there is no fluctuation (variation) in the solvent gas concentration in a short time, and furthermore, the amount of the diluted solvent gas or the solvent gas concentration in the diluted solvent gas is arbitrarily changed to various conditions to An evaluation of the processing capacity can be performed. Therefore, it is possible to always evaluate the processing ability of the volatile organic compound accurately and stably.

第2の発明は、第1の発明において、溶剤ガスを含まない校正気体の供給ラインを備え、校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能としたことを特徴とする溶剤ガス処理装置としたものである。   A second invention is characterized in that, in the first invention, a calibration gas supply line not containing a solvent gas is provided, and the calibration operation of the solvent gas processing apparatus main body by supplying a calibration gas can be performed. This is a solvent gas processing apparatus.

これによって、校正気体の供給によって、溶剤ガス濃度計の計測精度の向上を図ることができる。また、溶剤ガス処理装置本体内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   Thereby, the measurement accuracy of the solvent gas concentration meter can be improved by supplying the calibration gas. Further, once the residual solvent gas in the main body of the solvent gas processing apparatus is driven out, it is possible to grasp the processing capacity by the diluted solvent gas from the solvent gas generating apparatus with higher accuracy.

第3の発明は揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うことを特徴とする溶剤ガス処理装置の運転方法としたものである。   According to a third aspect of the present invention, there is provided a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, a solvent liquid of the volatile organic compound is heated and vaporized to obtain a solvent gas, and the solvent gas and the dilution gas are mixed A solvent gas generator for generating the diluted solvent gas, a gas supply line for the gas to be processed containing the volatile organic compound to the main body of the solvent gas processing device, and a diluted solvent gas generated by the solvent gas generator. A diluted solvent gas supply line to the solvent gas processing device main body, the supply of the diluted gas generated by the gas to be processed and the solvent gas generating device to the solvent gas processing device main body can be selected, and the solvent gas generation Performing an operation for evaluating the processing capability of the solvent gas of the main body of the solvent gas processing apparatus by supplying the diluted solvent gas generated by the apparatus, and a processing operation for the gas to be processed by supplying the gas to be processed In addition, after supplying the diluted solvent gas from the solvent gas generator and performing an operation for evaluating the solvent gas processing capacity of the main body of the solvent gas processing apparatus, the process gas is processed by supplying the gas to be processed. The operation method of the solvent gas processing apparatus is characterized by being performed.

これによって、短時間での溶剤ガス濃度の変動(バラツキ)が無く、さらに、希釈溶剤ガスの量または希釈溶剤ガス中の溶剤ガス濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができる。したがって、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。   As a result, there is no fluctuation (variation) in the solvent gas concentration in a short time, and furthermore, the amount of the diluted solvent gas or the solvent gas concentration in the diluted solvent gas is arbitrarily changed to various conditions to An evaluation of the processing capacity can be performed. Therefore, it is possible to always evaluate the processing ability of the volatile organic compound accurately and stably.

第4の発明は、第3の発明において、溶剤ガスを含まない校正気体の供給ラインを備え、校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能とするとともに、校正用気体を溶剤ガス処理装置本体へ供給した後、溶剤ガス発生装置から溶剤ガスを供給して溶剤ガス処理装置本体部の処理能力の評価運転を行うことを特徴とする溶剤ガス処理装置の運転方法としたものである。   According to a fourth invention, in the third invention, a calibration gas supply line that does not contain a solvent gas is provided, and the calibration operation of the solvent gas processing apparatus main body by the supply of the calibration gas can be performed. An operation method for a solvent gas processing apparatus, comprising: supplying gas to a solvent gas processing apparatus main body; then supplying solvent gas from the solvent gas generating apparatus to perform an evaluation operation of the processing capacity of the solvent gas processing apparatus main body; and It is what.

これによって、校正気体の供給によって、溶剤ガス濃度計の計測精度の向上を図ることができる。また、溶剤ガス処理装置本体内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   Thereby, the measurement accuracy of the solvent gas concentration meter can be improved by supplying the calibration gas. Further, once the residual solvent gas in the main body of the solvent gas processing apparatus is driven out, it is possible to grasp the processing capacity by the diluted solvent gas from the solvent gas generating apparatus with higher accuracy.

第5の発明は、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体の処理能力の評価運転用として溶剤ガスを供給する溶剤ガス発生装置であって、揮発性有機化合物の溶剤液の溶剤液供給手段と、前記溶剤液供給手段により供給した溶剤液を加熱気化させて溶剤ガスを発生させる気化手段と、前記気化手段への溶剤液の供給量を制御して溶剤ガスの発生量を調節する溶剤液供給量制御手段と、前記溶剤ガスに混合する希釈気体を供給する希釈気体供給手段と、前記希釈気体の供給量を調節する希釈気体供給量制御手段とを備え、前記溶剤ガスと希釈気体を混合して希釈溶剤ガスとするとともに、前記溶剤液の気化手段への供給量および/または希釈気体の供給量を制御して前記希釈溶剤ガス中の溶剤ガス濃度を調節可能とするとともに、前記希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス発生装置としたものである。   5th invention is a solvent gas generator which supplies solvent gas for the evaluation operation of the processing capability of the solvent gas processing apparatus main body which processes the to-be-processed gas containing a volatile organic compound, Comprising: Solvent of a volatile organic compound Solvent liquid supply means, vaporization means for heating and vaporizing the solvent liquid supplied by the solvent liquid supply means, and generating a solvent gas by controlling the supply amount of the solvent liquid to the vaporization means A solvent liquid supply amount control means for adjusting the amount, a dilution gas supply means for supplying a dilution gas to be mixed with the solvent gas, and a dilution gas supply amount control means for adjusting the supply amount of the dilution gas. Gas and dilution gas can be mixed to form diluted solvent gas, and the concentration of the solvent gas in the diluted solvent gas can be adjusted by controlling the supply amount of the solvent liquid to the vaporizing means and / or the supply amount of the dilution gas. You Together it is obtained by the solvent gas generator and supplying the diluting solvent gas into the solvent gas processing apparatus main body.

これによって、溶剤ガス濃度を任意に様々な条件に変化させた希釈溶剤ガスを溶剤ガス処理装置へ供給することができる。   As a result, the diluted solvent gas whose solvent gas concentration is arbitrarily changed under various conditions can be supplied to the solvent gas processing apparatus.

第6の発明は、第5の発明において、複数の種類の溶剤液の内、いずれか一つの溶剤液を選択して気化手段に供給し溶剤ガスを発生させる溶剤ガス発生装置としたものである。   A sixth invention is the solvent gas generator according to the fifth invention, wherein a solvent gas is generated by selecting any one of a plurality of types of solvent liquids and supplying it to the vaporizing means. .

これによって、複数の種類の溶剤液の溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with solvent gases of a plurality of types of solvent liquids, and to set a wider range of evaluation conditions for the solvent gas processing capacity of the solvent gas processing apparatus main body. be able to.

第7の発明は、第5の発明において、複数の種類の溶剤液を同時に気化手段に供給し、前記複数の種類の溶剤液の混合した混合溶剤ガスを発生させる溶剤ガス発生装置としたものである。   A seventh invention is a solvent gas generator according to the fifth invention, wherein a plurality of types of solvent liquids are simultaneously supplied to the vaporizing means to generate a mixed solvent gas in which the plurality of types of solvent liquids are mixed. is there.

これによって、複数の種類の溶剤液の混合した混合溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with a mixed solvent gas in which a plurality of types of solvent liquids are mixed. Can be set widely.

第8の発明は、第7の発明において、複数の種類の溶剤液の各々の溶剤ガスの成分割合を調節可能にしたことを特徴とする溶剤ガス発生装置としたものである。   According to an eighth aspect of the present invention, there is provided a solvent gas generator according to the seventh aspect, wherein the component ratio of the solvent gas in each of the plurality of types of solvent liquids can be adjusted.

これによって、複数の種類の溶剤液の様々な成分割合の溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with solvent gases of various component ratios of a plurality of types of solvent liquids, and the evaluation conditions of the processing capacity of the solvent gas in the solvent gas processing apparatus main body Can be set more widely.

第9の発明は、第5〜8のいずれかの発明において、希釈溶剤ガス中の溶剤ガスの濃度を所定時間内において変化させて希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス発生装置としたものである。   According to a ninth invention, in any one of the fifth to eighth inventions, the concentration of the solvent gas in the diluted solvent gas is changed within a predetermined time, and the diluted solvent gas is supplied to the main body of the solvent gas processing apparatus. This is a solvent gas generator.

これによって、所定時間内における溶剤ガスの濃度の変化による溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   This makes it possible to evaluate the processing capacity of the solvent gas processing apparatus main body due to a change in the concentration of the solvent gas within a predetermined time, and to set a wider range of evaluation conditions for the solvent gas processing capacity in the solvent gas processing apparatus main body. be able to.

第10の発明は、第5〜9のいずれかの発明において、溶剤ガスと空気を混合した希釈溶剤ガス中の溶剤ガスの濃度を爆発限界の下限値以下となるように溶剤液の気化手段への供給量または希釈気体の供給量を制御することを特徴とする溶剤ガス発生装置としたものである。   According to a tenth invention, in any one of the fifth to ninth inventions, the solvent liquid is vaporized so that the concentration of the solvent gas in the diluted solvent gas obtained by mixing the solvent gas and air is not more than the lower limit of the explosion limit. The solvent gas generation device is characterized in that the supply amount of dilute gas or the supply amount of dilution gas is controlled.

これによって、常に安全な状態に維持して希釈溶剤ガスを溶剤ガス処理装置本体へ供給することができる。   Accordingly, the diluted solvent gas can be supplied to the solvent gas processing apparatus main body while always maintaining a safe state.

第11の発明は、第5〜10のいずれかの発明において、希釈溶剤ガスの温度を検出する温度検出手段を備え、前記温度検出手段により希釈溶剤ガスの温度を調節する温度調節手段を備えたことを特徴とする溶剤ガス発生装置。   In an eleventh aspect of the invention according to any one of the fifth to tenth aspects of the present invention, the apparatus includes temperature detecting means for detecting the temperature of the diluted solvent gas, and further includes temperature adjusting means for adjusting the temperature of the diluted solvent gas by the temperature detecting means. A solvent gas generator.

これによって、溶剤ガス処理装置本体での溶剤ガスの温度変化における処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   This makes it possible to evaluate the processing capacity of the solvent gas processing apparatus main body with respect to the temperature change of the solvent gas, and to set a wider range of evaluation conditions for the solvent gas processing capacity of the solvent gas processing apparatus main body.

以下、本発明の一実施例の溶剤ガス処理装置を図1〜図6を参照しながら説明する。図1は、本発明一実施例の溶剤ガス処理装置の基本構成図、図2は、溶剤ガス発生装置の溶剤液供給部および気化混合部の基本構成図、図3は、気化混合部のノズル孔閉塞時の構成図、図4(a)、(b)は、溶剤ガス発生装置からの溶剤ガスの供給例を示すグラフ、図5は、溶剤ガス処理装置本体の例を示す基本構成図、図6は、溶剤ガス処理装置本体の他の例を基本構成図である。   Hereinafter, a solvent gas processing apparatus according to an embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a basic configuration diagram of a solvent gas processing apparatus according to an embodiment of the present invention, FIG. 2 is a basic configuration diagram of a solvent liquid supply unit and a vaporization mixing unit of a solvent gas generation device, and FIG. 3 is a nozzle of a vaporization mixing unit FIG. 4A and FIG. 4B are graphs showing examples of supply of solvent gas from the solvent gas generator, and FIG. 5 is a basic configuration diagram showing an example of a solvent gas processing apparatus main body. FIG. 6 is a basic configuration diagram of another example of the solvent gas processing apparatus main body.

先ず本発明の一実施例の溶剤ガス処理装置の基本的な構成を説明する。溶剤ガス発生装置100は、主に溶剤液供給部101、気化手段である気化混合部120、ブロア136等から構成されている。溶剤液供給部101は、異なる溶剤液を貯留するタンク102、タンク103、タンク104と、複数の溶剤液を所定の割合で混合して貯留するタンク105を備えている。溶剤液としては、トルエン、キシレン、酢酸エチル、酢酸ブチル等の揮発性有機化合物が挙げられる。なお、揮発性有機化合物としてこれに限定するものではない。   First, a basic configuration of a solvent gas processing apparatus according to an embodiment of the present invention will be described. The solvent gas generator 100 is mainly composed of a solvent liquid supply unit 101, a vaporizing and mixing unit 120 as vaporizing means, a blower 136, and the like. The solvent liquid supply unit 101 includes a tank 102, a tank 103, and a tank 104 that store different solvent liquids, and a tank 105 that mixes and stores a plurality of solvent liquids at a predetermined ratio. Examples of the solvent liquid include volatile organic compounds such as toluene, xylene, ethyl acetate, and butyl acetate. The volatile organic compound is not limited to this.

また、各々のタンク102、103、104、105に各々の供給管106、107、108、109を接続してある。さらに、各々の供給管106、107、108、109には、各々流量計110、111、112、113および、開閉弁114、115、116、117を配置している。   Also, the supply pipes 106, 107, 108, 109 are connected to the tanks 102, 103, 104, 105, respectively. Furthermore, flow meters 110, 111, 112, 113 and on-off valves 114, 115, 116, 117 are arranged in the supply pipes 106, 107, 108, 109, respectively.

各々の供給管106、107、108、109の他端は、ポンプ(溶剤液供給手段)118に接続してある。ポンプ118の吐出側には、吐出管119が接続され、この吐出管119は気化混合部120に接続されている。また、ポンプ118の溶剤液の供給量は、溶剤液供給量制御手段118aによりポンプ118を制御して調節可能な構成としている。   The other end of each supply pipe 106, 107, 108, 109 is connected to a pump (solvent liquid supply means) 118. A discharge pipe 119 is connected to the discharge side of the pump 118, and the discharge pipe 119 is connected to the vaporization mixing unit 120. Further, the supply amount of the solvent liquid of the pump 118 can be adjusted by controlling the pump 118 by the solvent liquid supply amount control means 118a.

気化混合部120は、一方端を開放した気化管121、気化管121の外周面にはヒータ122を装着ししている。ヒータ122への通電は温度検出手段140aにより所定温度範囲になるように制御されるようになっている。   The vaporizing and mixing unit 120 has a vaporization pipe 121 having one end opened, and a heater 122 attached to the outer peripheral surface of the vaporization pipe 121. Energization of the heater 122 is controlled by the temperature detection means 140a so that it is within a predetermined temperature range.

気化管121の気化通路123には、吐出管119から流入した溶剤液の均一な流れおよび、浸透性を良好にするため気化促進体124を充填してある。この気化促進体124は、例えば細線からなる金属繊維材、連通性のアある金属発砲材等か構成してある。気化管121の下部には、溶剤液の廃液管125を接続し、ここに開閉弁126を設けている。   The vaporization passage 123 of the vaporization pipe 121 is filled with a vaporization promoting body 124 in order to improve the uniform flow and permeability of the solvent liquid flowing in from the discharge pipe 119. The vaporization promoting body 124 is composed of, for example, a metal fiber material made of a thin wire, a metal foam material having connectivity, or the like. A waste liquid pipe 125 for solvent liquid is connected to the lower part of the vaporization pipe 121, and an open / close valve 126 is provided here.

気化管121の気化通路123と直交する方向に導出管127が固定され、導出管127の内部は気化通路123と導通している。また、気化管121には、ノズル孔129を形成したノズル体128が固定されている。   The outlet pipe 127 is fixed in a direction orthogonal to the vaporizing passage 123 of the vaporizing pipe 121, and the inside of the outlet pipe 127 is electrically connected to the vaporizing passage 123. Further, a nozzle body 128 having a nozzle hole 129 is fixed to the vaporizing tube 121.

導出管127のノズル体128と対向する側には、電磁ソレノイド130を設け、この電磁ソレノイド130によって、軸長方向にニードル131が移動するように構成されている。ニードル131の電磁ソレノイド130と対向する側には、テーパ部132、ノズル孔129に挿入可能な直径とした先端部133が形成されている。   An electromagnetic solenoid 130 is provided on the side of the outlet tube 127 facing the nozzle body 128, and the needle 131 is configured to move in the axial direction by the electromagnetic solenoid 130. On the side of the needle 131 facing the electromagnetic solenoid 130, a tapered portion 132 and a tip portion 133 having a diameter that can be inserted into the nozzle hole 129 are formed.

また、ノズル体128側には、送風筒134の設け、ノズル体128を囲むように複数の小孔135aを形成した整流板135が位置している。送風筒134には、ブロア136(希釈気体供給手段)の吐出側を接続し、さらに吐出筒137を接続してこの吐出筒137と開閉弁139を配置した溶剤ガス供給ライン138を接続している。   Further, on the nozzle body 128 side, a rectifying plate 135 having a plurality of small holes 135 a formed so as to surround the nozzle body 128 is provided. The blower tube 134 is connected to the discharge side of the blower 136 (dilution gas supply means), and further connected to the discharge tube 137 and to the solvent gas supply line 138 in which the discharge tube 137 and the on-off valve 139 are arranged. .

さらに、ブロア136による空気(希釈気体)の供給量は、ブロア136に有するモータの回転数を制御する希釈気体供給量制御手段136aにより調節するように構成している。また、吐出筒137の部分にヒータ(温度調節手段)140を設け、これを温度検出手段(温度調節手段)140aにより吐出筒137内を通過する溶剤ガスと空気が混合した希釈溶剤ガスの温度を調節するようになっている。なお、ヒータ140を設けたが、希釈溶剤ガスを加熱および冷却する手段を設けてもよい。この場合には希釈溶剤ガスの温度をより幅広く調節することができ、溶剤ガス処理装置本体200での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   Further, the supply amount of air (dilution gas) from the blower 136 is adjusted by a dilution gas supply amount control means 136 a that controls the number of revolutions of the motor included in the blower 136. In addition, a heater (temperature adjusting means) 140 is provided in the portion of the discharge cylinder 137, and this is used to adjust the temperature of the diluted solvent gas in which the solvent gas passing through the discharge cylinder 137 and air are mixed by the temperature detecting means (temperature adjusting means) 140a. It comes to adjust. Although the heater 140 is provided, a means for heating and cooling the diluted solvent gas may be provided. In this case, the temperature of the diluted solvent gas can be adjusted more widely, and the evaluation conditions for the solvent gas processing capacity in the solvent gas processing apparatus main body 200 can be set more widely.

溶剤ガス処理装置本体200の校正気体、希釈溶剤ガス、被処理気体の入口側には、流量計201および溶剤ガス濃度計202が設けられており、また溶剤ガス処理装置本体200の出口側には、溶剤ガス濃度計203が設けられている。   A flow meter 201 and a solvent gas concentration meter 202 are provided on the inlet side of the calibration gas, the diluted solvent gas, and the gas to be processed of the solvent gas processing apparatus main body 200, and on the outlet side of the solvent gas processing apparatus main body 200. A solvent gas concentration meter 203 is provided.

溶剤ガス処理装置本体200は、本発明においてはその溶剤ガス処理方式を限定するものではないが、例として図5および図6に代表的な装置を示す。図6に示す基本構成は、触媒酸化式の溶剤ガス処理装置本体であって、ハニカム形状の触媒体205、触媒体205に近接配置し、これを加熱する加熱ヒータ206を備えたものである。この方式は、酸化触媒を用いてより低温で溶剤ガスを分解処理することができる。   Although the solvent gas processing apparatus main body 200 does not limit the solvent gas processing system in the present invention, representative apparatuses are shown in FIGS. 5 and 6 as examples. The basic structure shown in FIG. 6 is a catalytic oxidation type solvent gas processing apparatus main body, which is provided with a honeycomb-shaped catalyst body 205 and a heater 206 which is disposed in the vicinity of the catalyst body 205 and heats it. This method can decompose the solvent gas at a lower temperature using an oxidation catalyst.

また、図5に示す基本構成は、燃焼蓄熱式の溶剤ガス処理装置本体であって、バーナ251、バーナ251の燃焼により蓄熱するハニカム形状の蓄熱材252a、252b、流路切替部253、接続部材254a、254bを備えたものである。この方式は、バーナ251の燃焼熱、高温の蓄熱材252a、252bにより、溶剤ガスを分解処理することができる。   Further, the basic configuration shown in FIG. 5 is a combustion heat storage type solvent gas processing apparatus main body, which is a burner 251, honeycomb-shaped heat storage materials 252 a and 252 b that store heat by combustion of the burner 251, a flow path switching unit 253, and a connection member. 254a and 254b are provided. In this method, the solvent gas can be decomposed by the combustion heat of the burner 251 and the high-temperature heat storage materials 252a and 252b.

溶剤ガス処理装置本体200の入口側には、開閉弁302を配置した被処理気体供給ライン300が接続され、ブロア301によって浄化処理すべき被処理気体、校正気体を溶剤ガス処理装置本体200に供給する。   A gas supply line 300 to be processed having an open / close valve 302 is connected to the inlet side of the solvent gas processing apparatus main body 200, and a gas to be processed and a calibration gas to be purified by the blower 301 are supplied to the solvent gas processing apparatus main body 200. To do.

また、ブロア301の吸入側の被処理気体供給ライン300に開閉弁302を配置した校正気体供給ライン400を接続している。   Further, a calibration gas supply line 400 in which an on-off valve 302 is arranged is connected to the gas supply line 300 to be processed on the suction side of the blower 301.

次に、前記した溶剤ガス処理装置および溶剤ガス発生装置の基本的な運転動作について説明する。先ず、溶剤ガスを含まない所定量の校正気体を溶剤ガス処理装置本体200に供給する動作を説明する。この動作時においては、溶剤ガス処理装置本体200、流量計201、溶剤ガス濃度計202を運転状態とし、開閉弁139、302を閉、気化混合部120の運転を停止状態として、ブロア301を運転して溶剤ガスを含まない所定量の校正気体を溶剤ガス処理装置本体200に供給する。   Next, the basic operation of the solvent gas processing device and the solvent gas generator will be described. First, an operation of supplying a predetermined amount of calibration gas not containing solvent gas to the solvent gas processing apparatus main body 200 will be described. During this operation, the solvent gas processing apparatus main body 200, the flow meter 201, and the solvent gas concentration meter 202 are in an operating state, the on-off valves 139 and 302 are closed, and the operation of the vaporizing and mixing unit 120 is stopped, and the blower 301 is operated. Then, a predetermined amount of calibration gas not containing the solvent gas is supplied to the solvent gas processing apparatus main body 200.

校正気体は、被処理気体供給ライン300、流量計201、溶剤ガス濃度計202を通って溶剤ガス処理装置本体200に入り、出口側の溶剤ガス濃度計203を通って排出される。   The calibration gas enters the solvent gas processing apparatus main body 200 through the gas supply line 300 to be processed, the flow meter 201, and the solvent gas concentration meter 202, and is discharged through the solvent gas concentration meter 203 on the outlet side.

この校正気体の供給によって、溶剤ガス濃度計202、203の零点の校正を行うもので、計測精度の向上を図ることができる。また、溶剤ガス処理装置本体200内に滞留する校正気体の供給前における残留溶剤ガスを一旦追い出し出口側の溶剤ガス濃度計203の零点の校正をより確実に行うことがでるものである。また、溶剤ガス処理装置本体200内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置100からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   By supplying the calibration gas, the zero point of the solvent gas concentration meters 202 and 203 is calibrated, and the measurement accuracy can be improved. Further, the residual solvent gas before the supply of the calibration gas staying in the solvent gas processing apparatus main body 200 is once discharged, and the zero point of the solvent gas concentration meter 203 on the outlet side can be calibrated more reliably. Further, once the residual solvent gas in the solvent gas processing apparatus main body 200 is driven out, it is possible to grasp the processing capacity of the diluted solvent gas from the solvent gas generating apparatus 100 with higher accuracy.

溶剤ガスを含まない校正気体を溶剤ガス処理装置本体200に供給する動作を所定時間行い、ブロア301の運転停止、開閉弁302を閉として校正ステップを終了する。   The operation of supplying the calibration gas not containing the solvent gas to the solvent gas processing apparatus main body 200 is performed for a predetermined time, the operation of the blower 301 is stopped, the on-off valve 302 is closed, and the calibration step is completed.

次に、前記校正ステップを終了した後の溶剤ガス発生装置100の運転動作を説明する。   Next, the operation of the solvent gas generator 100 after the calibration step is completed will be described.

先ず、図3に示すように電磁ソレノイド130を非通電状態とし、このとき電磁ソレノイド130に有するコイルバネ(図示なし)によってニードル131はノズル孔129側に押し付けられており、先端部133がノズル孔129内に挿入され、かつテーパ部132がノズル孔129に当たって前記ノズル孔129を閉塞させている。   First, as shown in FIG. 3, the electromagnetic solenoid 130 is deenergized. At this time, the needle 131 is pressed against the nozzle hole 129 by a coil spring (not shown) included in the electromagnetic solenoid 130, and the distal end portion 133 is in the nozzle hole 129. The taper portion 132 is inserted into the nozzle hole 129 and closes the nozzle hole 129.

この状態において、ヒータ(加熱手段)122に通電し、気化管121、気化促進体124を例えば120度C程度に予熱する。このとき導出管127、ノズル体128も気化管121からの伝導熱によってほぼ同温度レベルに予熱される。なお、気化管121にサーミスタ等の温度検出手段(図示なし)によって、所定温度に制御されているものである。   In this state, the heater (heating means) 122 is energized to preheat the vaporization pipe 121 and the vaporization promoting body 124 to, for example, about 120 degrees C. At this time, the outlet pipe 127 and the nozzle body 128 are also preheated to substantially the same temperature level by the conduction heat from the vaporization pipe 121. The vaporization pipe 121 is controlled to a predetermined temperature by temperature detection means (not shown) such as a thermistor.

前記した予熱動作の後、ブロア136を駆動し、溶剤ガスを含まない大気中の空気を、送風筒134内に供給し、整流板135の複数の小孔135aからノズル体128の近傍に噴出させる。   After the preheating operation described above, the blower 136 is driven, air in the atmosphere that does not contain solvent gas is supplied into the blower cylinder 134, and is ejected from the plurality of small holes 135a of the rectifying plate 135 to the vicinity of the nozzle body 128. .

ブロア136の駆動開始後、図4に示すように電磁ソレノイド130を通電状態とし、このとき電磁ソレノイド130に有するコイルバネ(図示なし)に抗してニードル131を電磁ソレノイド130側に吸引し、ノズル孔129から先端部133を抜くと同時にテーパ部132をノズル孔129から離し、これによってノズル孔129を開く。また開閉弁139を開とする。   After the drive of the blower 136 is started, the electromagnetic solenoid 130 is energized as shown in FIG. 4, and at this time, the needle 131 is attracted to the electromagnetic solenoid 130 side against the coil spring (not shown) of the electromagnetic solenoid 130, and the nozzle hole At the same time that the tip 133 is removed from the nozzle 129, the tapered portion 132 is separated from the nozzle hole 129, thereby opening the nozzle hole 129. The on-off valve 139 is opened.

次に、ポンプ118を駆動し、例えば開閉弁114を開、他の開閉弁115、116、117を閉として、タンク102内の溶剤液を、供給管106に吸入し、吐出管119を介して気化管121の気化通路123に所定圧力で供給する。この溶剤液は気化管121および気化促進体124に接触して瞬時に気化し、溶剤ガスとして導出管127内に入りノズル孔129より勢い良く噴出する。   Next, the pump 118 is driven, for example, the on-off valve 114 is opened, the other on-off valves 115, 116, 117 are closed, the solvent liquid in the tank 102 is sucked into the supply pipe 106, and is discharged through the discharge pipe 119. The vaporization passage 123 of the vaporization pipe 121 is supplied at a predetermined pressure. This solvent liquid comes into contact with the vaporizing pipe 121 and the vaporization promoting body 124 and is instantly vaporized, enters the outlet pipe 127 as a solvent gas, and jets out of the nozzle hole 129 vigorously.

ノズル孔129より噴出した溶剤ガスは、整流板135の複数の小孔135aから噴出させた希釈気体である空気と均一に混合し、希釈溶剤ガスとなって吐出筒137、溶剤ガス供給ライン138を介して溶剤ガス処理装置本体200に供給され浄化処理を行う。   The solvent gas ejected from the nozzle hole 129 is uniformly mixed with the air, which is the diluted gas ejected from the plurality of small holes 135a of the rectifying plate 135, and becomes a diluted solvent gas, which is discharged through the discharge cylinder 137 and the solvent gas supply line 138. Then, it is supplied to the solvent gas processing apparatus main body 200 through the purification process.

このとき、溶剤ガス処理装置本体200の入口側において、流量計201による希釈溶剤ガスの流量、および溶剤ガス濃度計202よる希釈溶剤ガス中の溶剤ガスの濃度を計測する。   At this time, the flow rate of the diluted solvent gas by the flow meter 201 and the concentration of the solvent gas in the diluted solvent gas by the solvent gas concentration meter 202 are measured on the inlet side of the solvent gas processing apparatus main body 200.

さらに、溶剤ガス処理装置本体200で希釈溶剤ガス中の溶剤ガス成分が浄化処理され排出される。このとき溶剤ガス濃度計203による浄化空気中の溶剤ガスの濃度を計測する。   Further, the solvent gas component in the diluted solvent gas is purified by the solvent gas processing apparatus main body 200 and discharged. At this time, the solvent gas concentration meter 203 measures the concentration of the solvent gas in the purified air.

溶剤ガス発生装置100から溶剤ガス処理装置本体200へ供給された希釈溶剤ガスの量、溶剤ガス濃度等の条件において、溶剤ガス濃度計203により計測した溶剤ガス濃度が所定値以下に浄化処理されていることの確認と、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力の基本的な評価を行うものである。   The solvent gas concentration measured by the solvent gas concentration meter 203 is purified to a predetermined value or less under conditions such as the amount of diluted solvent gas supplied from the solvent gas generating device 100 to the solvent gas processing device main body 200 and the solvent gas concentration. And the basic evaluation of the processing capability of the solvent gas processing apparatus main body 200 is performed from the difference in solvent gas concentration between the solvent gas concentration meter 202 and the solvent gas concentration meter 203.

前記溶剤ガス処理装置本体200の処理能力の基本的な評価を行った後、ポンプ118の駆動を停止、ヒータ(加熱手段)122および電磁ソレノイド130を非通電とする。電磁ソレノイド130を非通電とすることによって、ニードル131はノズル孔129側に押し付けられ、先端部133がノズル孔129内に挿入され、かつテーパ部132がノズル孔129に当たって前記ノズル孔129を閉塞し、溶剤ガスの噴出を瞬時に停止させる。   After the basic evaluation of the processing capability of the solvent gas processing apparatus main body 200, the driving of the pump 118 is stopped, and the heater (heating means) 122 and the electromagnetic solenoid 130 are deenergized. By de-energizing the electromagnetic solenoid 130, the needle 131 is pressed toward the nozzle hole 129, the tip end portion 133 is inserted into the nozzle hole 129, and the tapered portion 132 hits the nozzle hole 129 to close the nozzle hole 129. , Stop the ejection of solvent gas instantly.

前記した動作の後、ブロア136を所定時間(例えば略30秒)継続駆動し、大気中の空気を送風筒134内に供給し、溶剤ガス供給ライン138に至る流路中を、溶剤ガスを含まない空気に置換する。この後、ブロア136の駆動を停止し、開閉弁139を閉とする。   After the above-described operation, the blower 136 is continuously driven for a predetermined time (for example, approximately 30 seconds), air in the atmosphere is supplied into the blowing cylinder 134, and the solvent gas is contained in the flow path leading to the solvent gas supply line 138. Replace with no air. Thereafter, the drive of the blower 136 is stopped and the on-off valve 139 is closed.

次に、開閉弁302を開、ブロア301を駆動し、溶剤ガスの発生源からの溶剤ガスを含む被処理空気(被処理気体)を、被処理気体供給ライン300を介して溶剤ガス処理装置本体200に供給するように切替える。これにより溶剤ガスを含む被処理空気の浄化処理を開始するものである。このとき、溶剤ガス処理装置本体200の入口側において、流量計201による被処理空気の流量、および溶剤ガス濃度計202よる被処理空気中の溶剤ガスの濃度を計測する。   Next, the on-off valve 302 is opened, the blower 301 is driven, and the air to be processed (the gas to be processed) containing the solvent gas from the source of the solvent gas is supplied through the gas supply line 300 to the solvent gas processing apparatus main body. Switch to supply to 200. Thereby, the purification treatment of the air to be treated containing the solvent gas is started. At this time, the flow rate of the air to be processed by the flow meter 201 and the concentration of the solvent gas in the air to be processed by the solvent gas concentration meter 202 are measured on the inlet side of the solvent gas processing apparatus main body 200.

さらに、溶剤ガス処理装置本体200で被処理空気中の溶剤ガス成分が浄化処理され浄化空気排出ラインから排出される。このとき溶剤ガス濃度計203による浄化空気中の溶剤ガスの濃度を計測する。   Further, the solvent gas component in the air to be treated is purified by the solvent gas processing apparatus main body 200 and discharged from the purified air discharge line. At this time, the solvent gas concentration meter 203 measures the concentration of the solvent gas in the purified air.

溶剤ガスの発生源から溶剤ガス処理装置本体200へ供給された被処理空気の量、溶剤ガス濃度等の条件において、溶剤ガス濃度計203により計測した溶剤ガス濃度が所定値以下に浄化処理されていることの確認と、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力の基本的な確認を行うものである。   The solvent gas concentration measured by the solvent gas concentration meter 203 is purified to a predetermined value or less under conditions such as the amount of air to be treated supplied from the solvent gas generation source to the solvent gas processing apparatus main body 200 and the solvent gas concentration. And a basic confirmation of the processing capacity of the solvent gas processing apparatus main body 200 from the difference in solvent gas concentration between the solvent gas concentration meter 202 and the solvent gas concentration meter 203.

溶剤ガス処理装置の全体的な制御は、操作部、報知部、制御装置(図示なし)によって校正用気体の供給運転、溶剤ガス発生装置100の希釈溶剤ガスの供給運転、被処理気体の供給運転の切り替え制御、および溶剤ガス発生装置100での溶剤液の選択、希釈溶剤ガス中の濃度等の設定、さらに、溶剤ガス濃度計202と溶剤ガス濃度計203の各々の溶剤ガス濃度差から溶剤ガス処理装置本体200の処理能力(浄化度等)のデータ処理と記憶、表示、音声等による報知を行うものである。   The overall control of the solvent gas processing apparatus is performed by an operation unit, a notifying unit, and a control device (not shown), a calibration gas supply operation, a solvent gas generator 100 dilution solvent gas supply operation, and a gas to be processed supply operation. Switching control, selection of the solvent liquid in the solvent gas generator 100, setting of the concentration in the diluted solvent gas, and the like, and further the solvent gas from the solvent gas concentration difference between the solvent gas concentration meter 202 and the solvent gas concentration meter 203 Data processing of the processing capability (purification degree or the like) of the processing apparatus main body 200 and notification by storage, display, voice, or the like are performed.

校正用気体の供給による溶剤ガス処理装置本体のゼロ校正運転、溶剤ガス発生装置100で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体200の溶剤ガスの処理能力の評価運転は、溶剤ガス処理装置本体200の運転開始時、運転停止時、メンテナンス時等、適宜行うことができる。   The solvent gas processing apparatus main body zero calibration operation by supplying calibration gas, and the solvent gas processing apparatus 200 evaluation performance of the solvent gas processing apparatus main body 200 by supplying diluted solvent gas generated by the solvent gas generating apparatus 100 are solvent gas. It can be appropriately performed at the start of operation of the processing apparatus main body 200, at the time of operation stop, at the time of maintenance, or the like.

次に、溶剤ガス発生装置100から溶剤ガス処理装置本体200へ供給された希釈溶剤ガスの量、溶剤ガス濃度等の条件の設定方法について説明する。   Next, a method for setting conditions such as the amount of diluted solvent gas supplied from the solvent gas generator 100 to the solvent gas processing apparatus main body 200 and the solvent gas concentration will be described.

先ず、複数の溶剤液を選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスの溶剤ガス処理装置本体200へ供給方法を説明する。前記したように基本的動作の説明においては、開閉弁114を開、他の開閉弁115、116、117を閉として、タンク102内の溶剤液を、ポンプ118により供給管106に吸入し、吐出管119を介して気化管121の気化通路123に所定圧力で供給し、タンク102内の溶剤液の溶剤ガスを発生させたが、さらに、タンク102、103、104に各々対応した開閉弁114、115、116のいずれかを開とし、他を閉とすることによって、開としたタンク内の溶剤液をいずれか一つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスの溶剤ガス処理装置本体200へ供給することができる。   First, a method of supplying a plurality of solvent liquids to a solvent gas processing apparatus main body 200 of a diluted solvent gas containing the solvent gas of the selected solvent liquid will be described. As described above, in the description of the basic operation, the on-off valve 114 is opened, the other on-off valves 115, 116, 117 are closed, and the solvent liquid in the tank 102 is sucked into the supply pipe 106 by the pump 118 and discharged. Supplying at a predetermined pressure to the vaporizing passage 123 of the vaporizing pipe 121 via the pipe 119, the solvent gas of the solvent liquid in the tank 102 was generated. Further, the on-off valves 114, respectively corresponding to the tanks 102, 103, 104, 115 or 116 is opened and the other is closed, so that any one of the solvent liquids in the opened tank is selected and vaporized, and the diluted solvent containing the solvent gas of the selected solvent liquid The gas can be supplied to the solvent gas processing apparatus main body 200.

また、タンク102、103、104に各々対応した開閉弁114、115、116のいずれか二つを開とし、他を閉とすることによって、開とした二つのタンク内の溶剤液をいずれか二つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。さらに、同様の手段により、溶剤液をいずれか三つを選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   Further, by opening any two of the on-off valves 114, 115, and 116 corresponding to the tanks 102, 103, and 104 and closing the other, respectively, the solvent liquid in the two opened tanks is changed to any two. One can be selected and vaporized, and the diluted solvent gas containing the solvent gas of the selected solvent liquid can be supplied to the solvent gas processing apparatus main body 200. Furthermore, by the same means, any three of the solvent liquids can be selected and vaporized, and the diluted solvent gas containing the solvent gas of the selected solvent liquid can be supplied to the solvent gas processing apparatus main body 200.

さらに、開閉弁114、115、116を、閉を含む流量調節弁とすることで、複数の溶剤液の混合割合を任意に選択して気化させ、任意の混合割合の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   Further, the on-off valves 114, 115, and 116 are flow rate control valves including closing, so that a mixing ratio of a plurality of solvent liquids can be arbitrarily selected and vaporized, and a diluted solvent gas containing a solvent gas having an arbitrary mixing ratio is used. Can be supplied to the main body 200 of the solvent gas processing apparatus.

また、複数の溶剤液を予め任意に所定の割合で混合して貯留するタンク105を備えているが、この混合した溶剤液を選択して気化させ、この選択した溶剤液の溶剤ガスを含む希釈溶剤ガスを溶剤ガス処理装置本体200へ供給することができる。   In addition, a tank 105 for storing a mixture of a plurality of solvent solutions in advance at a predetermined ratio is stored, and the mixed solvent solution is selected and vaporized, and the selected solvent solution is diluted with a solvent gas. The solvent gas can be supplied to the solvent gas processing apparatus main body 200.

また、気化させた溶剤液の溶剤ガスを含む希釈溶剤ガス中の溶剤ガスの濃度は、ブロア136による希釈気体の供給量および/またはポンプ118による溶剤液の供給量の調節によって設定することがでる。   Further, the concentration of the solvent gas in the diluted solvent gas including the solvent gas of the vaporized solvent liquid can be set by adjusting the supply amount of the diluted gas by the blower 136 and / or the supply amount of the solvent liquid by the pump 118. .

ブロア136による希釈気体の供給量を一定とした場合は、ポンプ118による溶剤液の供給量の調節によって設定することがでる。また、ポンプ118による溶剤液の供給量を一定とした場合は、ブロア136による希釈気体の供給量の調節によって設定することがでる。さらに、ブロア136による希釈気体の供給量およびポンプ118による溶剤液の供給量の調節によって設定することがでる。このように希釈溶剤ガスの量、希釈溶剤ガス中の溶剤ガス濃度を任意に変化させることができるものである。   When the supply amount of the diluted gas by the blower 136 is constant, it can be set by adjusting the supply amount of the solvent liquid by the pump 118. Further, when the supply amount of the solvent liquid by the pump 118 is constant, it can be set by adjusting the supply amount of the diluted gas by the blower 136. Further, it can be set by adjusting the supply amount of the dilution gas by the blower 136 and the supply amount of the solvent liquid by the pump 118. Thus, the amount of the diluted solvent gas and the solvent gas concentration in the diluted solvent gas can be arbitrarily changed.

希釈溶剤ガスの量、希釈溶剤ガス中の溶剤ガス濃度は、ブロア136による希釈気体の供給量、ポンプ118による溶剤液の供給量を変化させる速度を制御することで、任意に設定することができる。さらに、気化させる溶剤液の選択は、開閉弁114、115、116、117の開閉制御によってほぼ瞬時に切り替えることができる。   The amount of the diluted solvent gas and the solvent gas concentration in the diluted solvent gas can be arbitrarily set by controlling the rate at which the diluted gas supply amount by the blower 136 and the solvent liquid supply amount by the pump 118 are changed. . Furthermore, the selection of the solvent liquid to be vaporized can be switched almost instantaneously by opening / closing control of the on-off valves 114, 115, 116, 117.

図4に示す(a)は、希釈溶剤ガス中の溶剤ガス濃度を無段階に増加または減少方向に変化させて、また、(b)は希釈溶剤ガス中の溶剤ガス濃度を段階的に変化させて、溶剤ガス処理装置本体200へ供給する例を示す。   (A) shown in FIG. 4 changes the solvent gas concentration in the diluting solvent gas in a stepless increase or decrease direction, and (b) changes the solvent gas concentration in the diluting solvent gas stepwise. An example of supplying to the solvent gas processing apparatus main body 200 will be shown.

また、溶剤ガスと空気を混合した希釈溶剤ガス中の溶剤ガスの濃度を爆発限界の下限値以下となるように溶剤液の気化手段への供給量または希釈気体の供給量を制御するものである。   Further, the supply amount of the solvent liquid to the vaporizing means or the supply amount of the dilution gas is controlled so that the concentration of the solvent gas in the diluted solvent gas mixed with the solvent gas and air is not more than the lower limit of the explosion limit. .

さらに、溶剤ガス濃度計202が溶剤ガスの爆発限界の下限値以上の濃度を検出したときは、溶剤ガスの爆発限界の下限値以下に溶剤液の気化手段への供給量を減少させるか、または溶剤液の気化手段への供給を停止するようにしてもよい。この場合には安全性をより向上させることができる。   Further, when the solvent gas concentration meter 202 detects a concentration not less than the lower limit value of the explosion limit of the solvent gas, the supply amount of the solvent liquid to the vaporization means is decreased below the lower limit value of the explosion limit of the solvent gas, or You may make it stop supply to the vaporization means of a solvent liquid. In this case, safety can be further improved.

また、希釈気体供給量の検出手段(図示なし)を備え、前記希釈気体供給量検出手段が所定値以下の希釈気体の供給量を検出したときは、溶剤液の気化手段への供給を停止させるようにしてもよい。この場合にはブロア136の停止時等置ける安全性をより向上させることができる。   Further, a dilution gas supply amount detection means (not shown) is provided, and when the dilution gas supply amount detection means detects a supply amount of dilution gas below a predetermined value, supply of the solvent liquid to the vaporization means is stopped. You may do it. In this case, it is possible to further improve the safety of the blower 136 when it is stopped.

以上のように、本発明の溶剤ガス処理装置は、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能としたものである。   As described above, the solvent gas processing apparatus of the present invention has a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and heats and vaporizes the solvent liquid of the volatile organic compound to form a solvent gas. A solvent gas generator for generating a diluted solvent gas mixed with the solvent gas and a diluent gas, a gas supply line for supplying a gas to be processed containing a volatile organic compound to the solvent gas processor body, and a solvent gas generator A diluted solvent gas supply line for supplying the diluted solvent gas generated by the apparatus to the solvent gas processing apparatus main body, and supplying the diluted gas generated by the gas to be processed and the solvent gas generating apparatus to the solvent gas processing apparatus main body. The supply operation can be selected, the operation for evaluating the processing capacity of the solvent gas of the solvent gas processing apparatus main body by the supply of the diluted solvent gas generated by the solvent gas generator, and the supply of the gas to be processed In which it made it possible to perform the processing operation of the processing gas.

これによって、短時間での溶剤ガス濃度の変動(バラツキ)が無く、さらに、希釈溶剤ガスの量または希釈溶剤ガス中の溶剤ガス濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができる。したがって、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。   As a result, there is no fluctuation (variation) in the solvent gas concentration in a short time, and furthermore, the amount of the diluted solvent gas or the solvent gas concentration in the diluted solvent gas is arbitrarily changed to various conditions to An evaluation of the processing capacity can be performed. Therefore, it is possible to always evaluate the processing ability of the volatile organic compound accurately and stably.

また、溶剤ガスを含まない校正気体の供給ラインを備え、校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能としたことを特徴とする溶剤ガス処理装置としたものである。   Further, the present invention is a solvent gas processing apparatus comprising a calibration gas supply line that does not contain solvent gas, and is capable of performing calibration operation of the solvent gas processing apparatus main body by supplying calibration gas. .

これによって、校正気体の供給によって、溶剤ガス濃度計の計測精度の向上を図ることができる。また、溶剤ガス処理装置本体内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   Thereby, the measurement accuracy of the solvent gas concentration meter can be improved by supplying the calibration gas. Further, once the residual solvent gas in the main body of the solvent gas processing apparatus is driven out, it is possible to grasp the processing capacity by the diluted solvent gas from the solvent gas generating apparatus with higher accuracy.

また、揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うことを特徴とする溶剤ガス処理装置の運転方法としたものである。   In addition, a solvent gas processing apparatus main body for processing a gas to be treated containing a volatile organic compound, and a solvent liquid obtained by heating and vaporizing a solvent liquid of the volatile organic compound to form a solvent gas, and a dilution mixed with the solvent gas and a dilution gas Solvent gas generator for generating solvent gas, gas to be processed to be supplied to the main body of the solvent gas processing apparatus containing a volatile organic compound, and solvent gas processing of diluted solvent gas generated by the solvent gas generator A dilute solvent gas supply line to the apparatus main body, the supply of the dilute solvent gas generated by the gas to be treated and the solvent gas generator to the solvent gas treatment apparatus main body can be selected, and the solvent gas generator generates It is possible to perform the operation for evaluating the processing capacity of the solvent gas processing apparatus main body by supplying the diluted solvent gas and the processing operation for the gas to be processed by supplying the gas to be processed. In addition, after supplying a diluted solvent gas from the solvent gas generator and performing an evaluation operation of the solvent gas processing capacity of the main body of the solvent gas processing device, a processing operation of the gas to be processed by supplying the gas to be processed is performed. This is a characteristic operation method of the solvent gas processing apparatus.

これによって、短時間での溶剤ガス濃度の変動(バラツキ)が無く、さらに、希釈溶剤ガスの量または希釈溶剤ガス中の溶剤ガス濃度を任意に様々な条件に変化させて、溶剤ガス処理装置の処理能力の評価を行うことができる。したがって、常に正確で安定した揮発性有機化合物の処理能力の評価を行うことができる。   As a result, there is no fluctuation (variation) in the solvent gas concentration in a short time, and furthermore, the amount of the diluted solvent gas or the solvent gas concentration in the diluted solvent gas is arbitrarily changed to various conditions to An evaluation of the processing capacity can be performed. Therefore, it is possible to always evaluate the processing ability of the volatile organic compound accurately and stably.

また、溶剤ガスを含まない校正気体の供給ラインを備え、校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能とするとともに、校正用気体を溶剤ガス処理装置本体へ供給した後、溶剤ガス発生装置から溶剤ガスを供給して溶剤ガス処理装置本体部の処理能力の評価運転を行うことを特徴とする溶剤ガス処理装置の運転方法としたものである。   In addition, a calibration gas supply line that does not contain solvent gas is provided, and it is possible to perform calibration operation of the solvent gas processing apparatus main body by supplying calibration gas, and the calibration gas is supplied to the solvent gas processing apparatus main body. Thereafter, the solvent gas is supplied from the solvent gas generator, and the operation for evaluating the processing capacity of the main body of the solvent gas processor is performed.

これによって、校正気体の供給によって、溶剤ガス濃度計の計測精度の向上を図ることができる。また、溶剤ガス処理装置本体内の残留溶剤ガスを一旦追い出すことによって、溶剤ガス発生装置からの希釈溶剤ガスによる処理能力の把握をより精度良く行うことがでる。   Thereby, the measurement accuracy of the solvent gas concentration meter can be improved by supplying the calibration gas. Further, once the residual solvent gas in the main body of the solvent gas processing apparatus is driven out, it is possible to grasp the processing capacity by the diluted solvent gas from the solvent gas generating apparatus with higher accuracy.

また、揮発性有機化合物の溶剤液の溶剤液供給手段と、前記溶剤液供給手段により供給した溶剤液を加熱気化させて溶剤ガスを発生させる気化手段と、前記気化手段への溶剤液の供給量を制御して溶剤ガスの発生量を調節する溶剤液供給量制御手段と、前記溶剤ガスに混合する希釈気体を供給する希釈気体供給手段と、前記希釈気体の供給量を調節する希釈気体供給量制御手段と、を備え、前記溶剤ガスと希釈気体を混合して希釈溶剤ガスとするとともに、前記溶剤液の気化手段への供給量および/または希釈気体の供給量を制御して前記希釈溶剤ガス中の溶剤ガス濃度を調節可能とするとともに、前記希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス発生装置としたものである。   Further, a solvent liquid supply means for the solvent liquid of the volatile organic compound, a vaporization means for generating a solvent gas by heating and vaporizing the solvent liquid supplied by the solvent liquid supply means, and a supply amount of the solvent liquid to the vaporization means A liquid supply amount control means for adjusting the amount of solvent gas generated by controlling the gas, a dilution gas supply means for supplying a dilution gas to be mixed with the solvent gas, and a dilution gas supply amount for adjusting the supply amount of the dilution gas Control means, and mixing the solvent gas and the dilution gas to obtain a dilution solvent gas, and controlling the supply amount of the solvent liquid to the vaporization means and / or the supply amount of the dilution gas to control the dilution solvent gas The solvent gas concentration can be adjusted, and the diluted solvent gas is supplied to the main body of the solvent gas processing apparatus.

これによって、溶剤ガス濃度を任意に様々な条件に変化させた希釈溶剤ガスを溶剤ガス処理装置へ供給することができる。   As a result, the diluted solvent gas whose solvent gas concentration is arbitrarily changed under various conditions can be supplied to the solvent gas processing apparatus.

また、複数の種類の溶剤液の内、いずれか一つの溶剤液を選択して気化手段に供給し溶剤ガスを発生させる溶剤ガス発生装置としたものである。   Further, the present invention is a solvent gas generator that selects any one of a plurality of types of solvent liquids and supplies it to the vaporization means to generate a solvent gas.

これによって、複数の種類の溶剤液の溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with solvent gases of a plurality of types of solvent liquids, and to set a wider range of evaluation conditions for the solvent gas processing capacity of the solvent gas processing apparatus main body. be able to.

また、複数の種類の溶剤液を同時に気化手段に供給し、前記複数の種類の溶剤液の混合した混合溶剤ガスを発生させる溶剤ガス発生装置としたものである。   Further, the solvent gas generator is configured to simultaneously supply a plurality of types of solvent liquids to the vaporizing means and generate a mixed solvent gas in which the plurality of types of solvent liquids are mixed.

これによって、複数の種類の溶剤液の混合した混合溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with a mixed solvent gas in which a plurality of types of solvent liquids are mixed. Can be set widely.

また、複数の種類の溶剤液の各々の溶剤ガスの成分割合を調節可能にしたことを特徴とする溶剤ガス発生装置としたものである。   In addition, the solvent gas generator is characterized in that the component ratio of the solvent gas in each of a plurality of types of solvent liquids can be adjusted.

これによって、複数の種類の溶剤液の様々な成分割合の溶剤ガスでの溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   As a result, it is possible to evaluate the processing capacity of the solvent gas processing apparatus main body with solvent gases of various component ratios of a plurality of types of solvent liquids, and the evaluation conditions of the processing capacity of the solvent gas in the solvent gas processing apparatus main body Can be set more widely.

また、希釈溶剤ガス中の溶剤ガスの濃度を所定時間内において変化させて希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス発生装置としたものである。   Further, the solvent gas generator is characterized in that the concentration of the solvent gas in the diluted solvent gas is changed within a predetermined time and the diluted solvent gas is supplied to the main body of the solvent gas processing apparatus.

これによって、所定時間内における溶剤ガスの濃度の変化による溶剤ガス処理装置本体の処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   This makes it possible to evaluate the processing capacity of the solvent gas processing apparatus main body due to a change in the concentration of the solvent gas within a predetermined time, and to set a wider range of evaluation conditions for the solvent gas processing capacity in the solvent gas processing apparatus main body. be able to.

また、溶剤ガスと空気を混合した希釈溶剤ガス中の溶剤ガスの濃度を爆発限界の下限値以下となるように溶剤液の気化手段への供給量または希釈気体の供給量を制御することを特徴とする溶剤ガス発生装置としたものである。   Further, the supply amount of the solvent liquid to the vaporizing means or the supply amount of the dilution gas is controlled so that the concentration of the solvent gas in the diluted solvent gas mixed with the solvent gas and air is not more than the lower limit value of the explosion limit. And a solvent gas generator.

これによって、常に安全な状態に維持して希釈溶剤ガスを溶剤ガス処理装置本体へ供給することができる。   Accordingly, the diluted solvent gas can be supplied to the solvent gas processing apparatus main body while always maintaining a safe state.

また、希釈溶剤ガスの温度を検出する温度検出手段を備え、前記温度検出手段により希釈溶剤ガスの温度を調節する温度調節手段を備えたことを特徴とする溶剤ガス発生装置としたものである。   In addition, the present invention provides a solvent gas generator comprising temperature detecting means for detecting the temperature of the diluted solvent gas, and temperature adjusting means for adjusting the temperature of the diluted solvent gas by the temperature detecting means.

これによって、溶剤ガス処理装置本体での溶剤ガスの温度変化における処理能力の評価を行うことができ、溶剤ガス処理装置本体での溶剤ガスの処理能力の評価条件をより幅広く設定することができる。   This makes it possible to evaluate the processing capacity of the solvent gas processing apparatus main body with respect to the temperature change of the solvent gas, and to set a wider range of evaluation conditions for the solvent gas processing capacity of the solvent gas processing apparatus main body.

なお、図2、図3に示す構成の、溶剤ガス発生装置としたが、これに限定するものではなく、他の構成であってもよい。特にポンプ(溶剤液供給手段)118は、各溶剤液のタンクごとに設けてもよい。   In addition, although it was set as the solvent gas generator of the structure shown in FIG. 2, FIG. 3, it is not limited to this, Other structures may be sufficient. In particular, a pump (solvent liquid supply means) 118 may be provided for each tank of the solvent liquid.

各種溶剤ガスの浄化処理を必要とする広範囲の装置の用途にも適用できる。 The present invention can be applied to a wide range of apparatuses that require purification treatment of various solvent gases.

100 溶剤ガス発生装置
101 溶剤液供給部
102 タンク
103 タンク
104 タンク
105 タンク
106 供給管
107 供給管
108 供給管
109 供給管
110 流量計
111 流量計
112 流量計
113 流量計
114 開閉弁
115 開閉弁
116 開閉弁
117 開閉弁
118 ポンプ
118a 溶剤液供給量制御手段
119 吐出管
120 気化混合部
121 気化管
122 ヒータ
123 気化通路
124 気化促進体
125 廃液管
126 開閉弁
127 導出管
128 ノズル体
129 ノズル孔
130 電磁ソレノイド
131 ニードル
132 テーパ部
133 先端部
134 送風筒
135 整流板
135a 小孔
136 ブロア
136a 希釈気体供給量制御手段
137 吐出筒
138 溶剤ガス供給ライン
139 開閉弁
140 ヒータ
140a 温度検出手段
200 溶剤ガス処理装置本体
201 流量計
202 溶剤ガス濃度計
203 溶剤ガス濃度計
204 触媒酸化式溶剤ガス処理装置本体
205 触媒体
206 加熱ヒータ
250 燃焼蓄熱式溶剤ガス処理装置本体
251 バーナ
252a 蓄熱材
252b 蓄熱材
253 流路切替部
254a 接続部材
254b 接続部材
300 被処理気体供給ライン
301 ブロア
302 開閉弁
400 校正気体供給ライン
401 開閉弁
DESCRIPTION OF SYMBOLS 100 Solvent gas generator 101 Solvent liquid supply part 102 Tank 103 Tank 104 Tank 105 Tank 106 Supply pipe 107 Supply pipe 108 Supply pipe 109 Supply pipe 110 Flowmeter 111 Flowmeter 112 Flowmeter 113 Flowmeter 114 Open / close valve 115 Open / close valve 116 Open / close Valve 117 On-off valve 118 Pump 118a Solvent liquid supply amount control means 119 Discharge pipe 120 Vapor mixing unit 121 Vaporization pipe 122 Heater 123 Vaporization passage 124 Vaporization promotion body 125 Waste liquid pipe 126 On-off valve 127 Outlet pipe 128 Nozzle body 129 Nozzle hole 130 Electromagnetic solenoid 131 Needle 132 Tapered part 133 Tip part 134 Blower cylinder 135 Current plate 135a Small hole 136 Blower 136a Diluted gas supply amount control means 137 Discharge cylinder 138 Solvent gas supply line 139 On-off valve 14 Heater 140a Temperature detection means 200 Solvent gas processing device main body 201 Flow meter 202 Solvent gas concentration meter 203 Solvent gas concentration meter 204 Catalytic oxidation type solvent gas processing device main body 205 Catalyst body 206 Heating heater 250 Combustion heat storage type solvent gas processing device main body 251 Burner 252a Heat storage material 252b Heat storage material 253 Flow path switching unit 254a Connection member 254b Connection member 300 Processed gas supply line 301 Blower 302 Open / close valve 400 Calibration gas supply line 401 Open / close valve

Claims (11)

揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能としたことを特徴とする溶剤ガス処理装置。 A solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a diluted solvent gas obtained by heating and evaporating a solvent liquid of the volatile organic compound to form a solvent gas and mixing the solvent gas and the diluent gas. Gas generating device for generating gas, a gas supply line for processing gas containing a volatile organic compound to a solvent gas processing device main body, and a solvent gas processing device main body for diluted solvent gas generated by the solvent gas generating device A diluted solvent gas supply line to the gas to be treated and the supply of the diluted solvent gas generated by the solvent gas generator to the solvent gas processor main body can be selected and generated by the solvent gas generator. It is possible to perform an operation for evaluating the processing capacity of the solvent gas of the main body of the solvent gas processing apparatus by supplying the diluted solvent gas and a processing operation for the gas to be processed by supplying the gas to be processed. Solvent gas processing apparatus according to claim and. 溶剤ガスを含まない校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能としたことを特徴とする請求項1に記載の溶剤ガス処理装置。 The solvent gas processing apparatus according to claim 1, wherein the solvent gas processing apparatus main body can be calibrated by supplying a calibration gas that does not contain solvent gas. 揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体と、揮発性有機化合物の溶剤液を加熱気化させて溶剤ガスとするとともに、前記溶剤ガスと希釈気体と混合させた希釈溶剤ガスを発生させる溶剤ガス発生装置と、揮発性有機化合物を含む被処理気体の溶剤ガス処理装置本体への被処理気体供給ラインと、溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への希釈溶剤ガス供給ラインと、を備え、前記被処理気体と溶剤ガス発生装置で発生させた希釈溶剤ガスの溶剤ガス処理装置本体への供給を選択可能とし、溶剤ガス発生装置で発生させた希釈溶剤ガスの供給による溶剤ガス処理装置本体の処理能力の評価運転と、被処理気体の供給による前記被処理気体の処理運転を行うことを可能とするとともに、溶剤ガス発生装置から希釈溶剤ガスを供給して溶剤ガス処理装置本体の溶剤ガスの処理能力の評価運転を行った後、被処理気体の供給による前記被処理気体の処理運転を行うことを特徴とする溶剤ガス処理装置の運転方法。 A solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a diluted solvent gas obtained by heating and evaporating a solvent liquid of the volatile organic compound to form a solvent gas and mixing the solvent gas and the diluent gas. Gas generating device for generating gas, a gas supply line for processing gas containing a volatile organic compound to a solvent gas processing device main body, and a solvent gas processing device main body for diluted solvent gas generated by the solvent gas generating device A diluted solvent gas supply line to the gas to be treated and the supply of the diluted solvent gas generated by the solvent gas generator to the solvent gas processor main body can be selected and generated by the solvent gas generator. It is possible to perform an operation for evaluating the processing capability of the solvent gas processing apparatus main body by supplying a diluted solvent gas, and a processing operation for the gas to be processed by supplying the gas to be processed. A dilute solvent gas is supplied from the agent gas generator and the solvent gas processing capacity of the solvent gas processing apparatus main body is evaluated, and then the gas to be processed is processed by supplying the gas to be processed. To operate the solvent gas processing apparatus. 溶剤ガスを含まない校正気体の供給ラインを備え、校正用気体の供給による溶剤ガス処理装置本体の校正運転を行うことを可能とするとともに、校正用気体を溶剤ガス処理装置本体へ供給した後、溶剤ガス発生装置から溶剤ガスを供給して溶剤ガス処理装置本体部の処理能力の評価運転を行うことを特徴とする請求項3に記載の溶剤ガス処理装置の運転方法。 It is equipped with a calibration gas supply line that does not contain solvent gas, and it is possible to perform calibration operation of the solvent gas processing apparatus main body by supplying calibration gas, and after supplying the calibration gas to the solvent gas processing apparatus main body, 4. The method for operating a solvent gas processing apparatus according to claim 3, wherein the solvent gas is supplied from the solvent gas generating apparatus and the operation for evaluating the processing capacity of the main body of the solvent gas processing apparatus is performed. 揮発性有機化合物を含む被処理気体を処理する溶剤ガス処理装置本体の処理能力の評価運転用として溶剤ガスを供給する溶剤ガス発生装置であって、揮発性有機化合物の溶剤液の溶剤液供給手段と、前記溶剤液供給手段により供給した溶剤液を加熱気化させて溶剤ガスを発生させる気化手段と、前記気化手段への溶剤液の供給量を制御して溶剤ガスの発生量を調節する溶剤液供給量制御手段と、前記溶剤ガスに混合する希釈気体を供給する希釈気体供給手段と、前記希釈気体の供給量を調節する希釈気体供給量制御手段と、を備え、前記溶剤ガスと希釈気体を混合して希釈溶剤ガスとするとともに、前記溶剤液の気化手段への供給量および/または希釈気体の供給量を制御して前記希釈溶剤ガス中の溶剤ガス濃度を調節可能とするとともに、前記希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする溶剤ガス発生装置。 A solvent gas generator for supplying a solvent gas for use in an evaluation operation of a processing capacity of a solvent gas processing apparatus main body for processing a gas to be processed containing a volatile organic compound, and a solvent liquid supply means for a solvent liquid of a volatile organic compound And a vaporizer that heats and vaporizes the solvent liquid supplied by the solvent liquid supply means to generate a solvent gas; and a solvent liquid that controls a supply amount of the solvent liquid to the vaporizer and adjusts a generated amount of the solvent gas A supply amount control means; a dilution gas supply means for supplying a dilution gas to be mixed with the solvent gas; and a dilution gas supply amount control means for adjusting the supply amount of the dilution gas. Mixing into a diluted solvent gas, and controlling the supply amount of the solvent liquid to the vaporization means and / or the supply amount of the dilution gas to adjust the solvent gas concentration in the diluted solvent gas, Solvent gas generator and supplying the serial dilution solvent gas into the solvent gas processing apparatus main body. 複数の種類の溶剤液の内、いずれか一つの溶剤液を選択して気化手段に供給し溶剤ガスを発生させることを特徴とする請求項5に記載の溶剤ガス発生装置。 6. The solvent gas generator according to claim 5, wherein any one of a plurality of types of solvent liquid is selected and supplied to the vaporizing means to generate a solvent gas. 複数の種類の溶剤液を同時に気化手段に供給し、前記複数の種類の溶剤液の混合した混合溶剤ガスを発生させることを特徴とする請求項5に記載の溶剤ガス発生装置。 6. The solvent gas generator according to claim 5, wherein a plurality of types of solvent liquids are simultaneously supplied to the vaporizing means to generate a mixed solvent gas in which the plurality of types of solvent liquids are mixed. 複数の種類の溶剤液の各々の溶剤ガスの成分割合を調節可能にしたことを特徴とする請求項7に記載の溶剤ガス発生装置。 8. The solvent gas generator according to claim 7, wherein a component ratio of each solvent gas of the plurality of types of solvent liquids is adjustable. 希釈溶剤ガス中の溶剤ガスの濃度を所定時間内において変化させて希釈溶剤ガスを溶剤ガス処理装置本体へ供給することを特徴とする請求項5〜8のいずれか1項に記載の溶剤ガス発生装置。 The solvent gas generation according to any one of claims 5 to 8, wherein the concentration of the solvent gas in the diluted solvent gas is changed within a predetermined time, and the diluted solvent gas is supplied to the main body of the solvent gas processing apparatus. apparatus. 溶剤ガスと空気を混合した希釈溶剤ガス中の溶剤ガスの濃度を爆発限界の下限値以下となるように溶剤液の気化手段への供給量または希釈気体の供給量を制御することを特徴とする請求項5〜9のいずれか1項に記載の溶剤ガス発生装置。 The supply amount of the solvent liquid to the vaporizing means or the supply amount of the dilution gas is controlled so that the concentration of the solvent gas in the diluted solvent gas mixed with the solvent gas and the air is not more than the lower limit of the explosion limit. The solvent gas generator of any one of Claims 5-9. 希釈溶剤ガスの温度を検出する温度検出手段を備え、前記温度検出手段により希釈溶剤ガスの温度を調節する温度調節手段を備えたことを特徴とする請求項5〜10のいずれか1項に記載の溶剤ガス発生装置。 The temperature detecting means for detecting the temperature of the diluted solvent gas is provided, and the temperature adjusting means for adjusting the temperature of the diluted solvent gas by the temperature detecting means is provided. Solvent gas generator.
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