JP2010240536A5 - Pattern formation method - Google Patents
Pattern formation method Download PDFInfo
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- JP2010240536A5 JP2010240536A5 JP2009090175A JP2009090175A JP2010240536A5 JP 2010240536 A5 JP2010240536 A5 JP 2010240536A5 JP 2009090175 A JP2009090175 A JP 2009090175A JP 2009090175 A JP2009090175 A JP 2009090175A JP 2010240536 A5 JP2010240536 A5 JP 2010240536A5
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- lyophilic
- pattern
- material layer
- forming method
- recess
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Description
本発明は、電子機器の製造に好適に用いられるパターン形成方法に関する。 The present invention relates to a pattern forming how suitably used in the manufacture of electronic devices.
本発明はかかる問題点に鑑みてなされたもので、その目的は、高精細なパターンを高精度に形成することができるパターン形成方法を提供することにある。 The present invention has been made in view of the above problems, its object is to provide a patterning how capable of forming a highly precise pattern with high precision.
本発明のパターン形成方法では、テンプレートとして、窪みの底面および側壁の一部に親液性領域、窪みを取り囲む撥液性領域をそれぞれ有する基体を用いる。このテンプレートに、流動性材料を、例えば流動性材料の塗布あるいは流動性材料中への浸漬により接触させる。こののち、例えば、親液性部材の親水性表面をテンプレートの撥液性領域上の流動性材料と接するように、基体と親液性部材とを相対的に移動させる。これにより、撥液性領域上の流動性材料がほとんど取り除かれる一方で、窪み中の流動性材料は、窪みの側壁全面にはじかれることなく、窪み底面および側壁の一部の親液性領域と接触した状態をとり、窪みの平面形状に対応した流動性材料のパターンが形成される。よって、窪みの形状が高精細であっても、その窪みの形状に対応したパターンを精度よく形成することができる。 The patterning how the present invention, a template as, a substrate having lyophilic area in a part of the bottom and side walls of the recess, liquid repellent region surrounding the recess, respectively used. The flowable material is brought into contact with the template by, for example, application of the flowable material or immersion in the flowable material. After that, for example, the base and the lyophilic member are relatively moved so that the hydrophilic surface of the lyophilic member is in contact with the fluid material on the lyophobic region of the template. As a result, the flowable material on the liquid-repellent region is almost removed, while the flowable material in the recess is not repelled by the entire sidewall of the recess, and the lyophilic region at the bottom of the recess and a part of the sidewall. A pattern of the flowable material corresponding to the planar shape of the depression is formed in the contact state. Therefore, even if the shape of the dent is high definition, a pattern corresponding to the shape of the dent can be accurately formed.
本発明のパターン形成方法では、親液性領域を窪みの底面だけでなく側壁の一部にも有するテンプレートを用いる。これにより、親液性領域が窪み底面のみの従来のテンプレート構造を有する基体を用いた場合と比較して、高精細なパターンを高精度に形成することができる。 The patterning how the present invention uses a template having also a part of the side wall as well as the bottom surface of the recess of the lyophilic region. Thereby, compared with the case where the base | substrate which has the conventional template structure of a lyophilic area | region only a hollow bottom is used, a high-definition pattern can be formed with high precision.
Claims (10)
流動性材料を、前記テンプレート構造に接触させる工程と、
前記流動性材料を前記テンプレート構造に接触させたのち、前記基体と親液性表面を有する親液性部材とを相対的に移動させて、前記窪みの平面形状に対応した前記流動性材料のパターンを形成する工程と
を含むパターン形成方法。 Forming a recess as a template structure on the substrate, forming a lyophilic region on a part of the bottom and side walls of the recess, and forming a lyophobic region in a region surrounding the recess;
Contacting a flowable material with the template structure;
After the fluid material is brought into contact with the template structure, the substrate and the lyophilic member having a lyophilic surface are relatively moved so that the pattern of the fluid material corresponding to the planar shape of the depression is obtained. Forming a pattern.
請求項１記載のパターン形成方法。 The pattern forming method according to claim 1, wherein after the fluid material is brought into contact with the template structure so as to cover the lyophilic region, the base and the lyophilic member are relatively moved.
請求項１記載のパターン形成方法。 The pattern forming method according to claim 1, further comprising a step of drying or baking the pattern of the fluid material.
請求項１記載のパターン形成方法。 The pattern formation method according to claim 1, wherein the recess is formed at a depth of 1 nm to 10 μm.
請求項１記載のパターン形成方法。 The pattern forming method according to claim 1, wherein the base and the lyophilic member are relatively moved at a speed of 0.01 mm / s to 1000 mm / s.
請求項１記載のパターン形成方法。 The pattern forming method according to claim 1, wherein the base and the lyophilic member are relatively moved so as to keep the distance between them at 0.1 μm or more and 10 mm or less.
請求項１記載のパターン形成方法。 The pattern forming method according to claim 1, wherein the base and the lyophilic member are relatively moved by fixing one of the base and the lyophilic member and moving the other.
前記基体として親液性表面を有するものを用い、前記基体の親液性表面に、親液性材料層を形成するステップと、
前記親液性材料層上に、撥液性材料層を形成するステップと、
前記親液性材料層および撥液性材料層に開口部を形成し、前記基体の親液性表面を露出させることにより、前記窪みを形成するステップとを含む
請求項１記載のパターン形成方法。 Forming the template structure comprises:
Using a lyophilic surface as the substrate, and forming a lyophilic material layer on the lyophilic surface of the substrate;
Forming a liquid repellent material layer on the lyophilic material layer;
The pattern forming method according to claim 1, further comprising: forming an opening in the lyophilic material layer and the lyophobic material layer and exposing the lyophilic surface of the substrate to expose the recess.
請求項８記載のパターン形成方法。 The pattern forming method according to claim 8, wherein an adhesive layer is formed on the lyophilic material layer, and then the liquid repellent material layer is formed on the adhesive layer.
請求項８記載のパターン形成方法。 The pattern forming method according to claim 8, wherein the lyophilic material layer is formed of a metal material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009090175A JP5376136B2 (en) | 2009-04-02 | 2009-04-02 | Pattern formation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009090175A JP5376136B2 (en) | 2009-04-02 | 2009-04-02 | Pattern formation method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010240536A JP2010240536A (en) | 2010-10-28 |
| JP2010240536A5 true JP2010240536A5 (en) | 2012-05-10 |
| JP5376136B2 JP5376136B2 (en) | 2013-12-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009090175A Expired - Fee Related JP5376136B2 (en) | 2009-04-02 | 2009-04-02 | Pattern formation method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5376136B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6067605B2 (en) * | 2014-02-26 | 2017-01-25 | 富士フイルム株式会社 | Pattern formation method |
| JP6529842B2 (en) * | 2015-07-14 | 2019-06-12 | 芝浦メカトロニクス株式会社 | Template manufacturing apparatus for imprint and template manufacturing method |
| JP7351501B2 (en) | 2019-04-25 | 2023-09-27 | 株式会社Ｓｉｊテクノロジ | Droplet discharge device and droplet discharge method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4982932B2 (en) * | 2001-09-03 | 2012-07-25 | ソニー株式会社 | Manufacturing method of image display device |
| JP4158755B2 (en) * | 2004-09-30 | 2008-10-01 | セイコーエプソン株式会社 | Method for producing functional film, method for producing thin film transistor |
| JP2006167697A (en) * | 2004-12-20 | 2006-06-29 | Sony Corp | Pattern forming method, and method for manufacturing electronic application equipment |
| JP4967926B2 (en) * | 2007-08-23 | 2012-07-04 | 大日本印刷株式会社 | Organic electroluminescence device and method for producing the same |
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2009
- 2009-04-02 JP JP2009090175A patent/JP5376136B2/en not_active Expired - Fee Related
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