JP2010219450A - 半導体素子封止体の製造方法および半導体パッケージの製造方法 - Google Patents
半導体素子封止体の製造方法および半導体パッケージの製造方法 Download PDFInfo
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- JP2010219450A JP2010219450A JP2009067096A JP2009067096A JP2010219450A JP 2010219450 A JP2010219450 A JP 2010219450A JP 2009067096 A JP2009067096 A JP 2009067096A JP 2009067096 A JP2009067096 A JP 2009067096A JP 2010219450 A JP2010219450 A JP 2010219450A
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Images
Classifications
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- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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Abstract
【解決手段】本発明の半導体素子封止体の製造方法は、複数の貫通孔151が形成されたシート材15’と、少なくとも1つの電極パッドを有する複数の半導体素子16と、半導体素子16を封止する封止部17とを有する半導体素子封止体170を製造する方法であり、シート材15’を用意し、シート材15’の厚さ方向に貫通孔151を形成する工程と、貫通孔151に前記電極パッドが対応するように、半導体素子16をシート材15’上に配置する工程と、シート材15’の上面に、シート材15’と半導体素子16とを覆うように封止して封止部17を形成することにより半導体素子封止体170を得る工程とを有する。
【選択図】図2
Description
平板状をなすシート材を用意し、該シート材の厚さ方向に複数の貫通孔を形成する貫通孔形成工程と、
前記貫通孔に前記電極パッドが対応するように、複数の前記半導体素子を前記シート材上に配置する半導体素子配置工程と、
前記半導体素子が配置されている側の面に、前記シート材と前記半導体素子とを覆うように封止して封止部を形成することにより前記半導体素子封止体を得る封止部形成工程とを有することを特徴とする半導体素子封止体の製造方法。
前記シート材の前記半導体素子とは反対の面側に、前記導体ポストに電気的に接続する配線を形成する配線形成工程と、
前記半導体素子とは反対側の面に、前記配線の一部が露出するように、開口部を備える被覆部を形成する被覆部形成工程と、
前記開口部で露出する前記配線に、前記バンプを電気的に接続するバンプ接続工程と、
前記半導体素子毎に対応するように、前記半導体素子封止体を個片化することにより、複数の半導体パッケージを一括して得る個片化工程とを有することを特徴とする半導体パッケージの製造方法。
前記シート材の前記半導体素子とは反対の面側に、前記導体ポストに電気的に接続する配線を形成する配線形成工程と、
前記半導体素子とは反対側の面に、前記配線の一部が露出するように、開口部を備える被覆部を形成する被覆部形成工程と、
前記開口部で露出する前記配線に、前記バンプを電気的に接続するバンプ接続工程と、
前記導体柱の前記シート材と反対側の端部が露出するまで、前記封止部の前記シート材と反対側の面を研削および/または研磨する研削・研磨工程と、
前記半導体素子毎に対応するように、前記半導体素子封止体を個片化することにより、複数の半導体パッケージを一括して得る個片化工程とを有することを特徴とする半導体パッケージの製造方法。
まず、パッケージ10を製造する方法について説明する。
[3−1]まず、エポキシ樹脂組成物を瞬時に下型キャビティ504内に供給することができるシャッター等の樹脂材料供給機構を備えた樹脂材料供給容器502上に、振動フィーダー501等の搬送手段を用いて顆粒状のエポキシ樹脂組成物503を一定量搬送し、これにより、顆粒状のエポキシ樹脂組成物503が入れられた樹脂材料供給容器502を用意する(図5参照。)。
ρw:測定時の温度における蒸留水の密度(g/ml)
Mw:蒸留水を満たし、さらに界面活性剤を数滴添加したピクノメータの質量(g)
Mp:試料の質量(g)
Mt:蒸留水と界面活性剤と試料をいれたピクノメータの質量(g)
[4−1]まず、図2(e)に示すように、シート材15’の上面側、すなわちシート材15’の半導体素子16とは反対側に、シート材15’の上面、貫通孔151の内面および貫通孔151から露出する電極パッドを覆うように一体的に、導電性を有するシード層141を形成する。
以上のような工程を経て、貫通孔151内に導体ポスト14が形成される。
[5−1]まず、図3(c)に示すように、シート材15’の上面側、すなわち本実施形態ではシード層141の上面の配線13を形成しない領域にマスク132を形成する。
ここで、本工程[5−2]において、配線13を電解メッキ法により形成する場合には、前述のように、シード層141を除去することなくシート材15’の上面に残存させていることから、このシード層141を電極として用いて、電解メッキ法により配線13を形成することができる。
また、R3として窒素含有環状化合物を用いても良い。これにより、金属配線(特に銅配線)等との密着性に優れる。この前記窒素含有環状化合物としては、例えば(1H−テトラゾル−5−イル)アミノ基、1−(1H−テトラゾル−5−イル)メチル−アミノ基、3−(1H−テトラゾル−5−イル)ベンズ−アミノ基等が挙げられる。
前記一般式(4)で示すように、Yには、R2が0〜4個結合される。
上記R3は、水酸基のアルカリ水溶液に対する溶解性を調節する目的で用いられる。
次に、上述したアルカリ可溶系樹脂組成物の他に、感光性を有する絶縁性材料として好適に用いられるものとして、ノルボルネン系樹脂組成物が挙げられる。このノルボルネン系樹脂組成物の中でも、特に、密着性、厚さ均一性および段差埋め込み性を顕著に発揮するものとして、環状オレフィンの重合体またはその水素添加物(A)および下記一般式(5)で示される構造を有する化合物(B)を含む樹脂組成物が好ましく用いられる。
これらの中でも、樹脂組成物のシート材15’に対する塗布性の観点から、メシチレン、デカヒドロナフタレン、2−ヘプタノンが好ましい。
このような半導体パッケージ10の製造方法によれば、前記工程[1]において、半導体素子16を配置したシート材15’に、直接、貫通孔151が形成され、前記工程[4]において、この貫通孔151に導体ポスト14が形成される。そのため、前記背景技術で説明した半導体パッケージの製造方法のように、ダミー基板から半導体素子封止体を取り外し、さらに導体ポストを形成するための被覆層を半導体素子封止体に形成する必要がないので、半導体パッケージを一括して複数製造する際の、工程数の削減を図ることができるため、半導体パッケージの生産性の向上を図ることができる。
次に、パッケージ20を製造する方法について説明する。
以上のような工程を経て、半導体パッケージ20が製造される。
11、21 バンプ
12、22 被覆部
121、221 開口部
13、23 配線
132、142 マスク
14、24 導体ポスト
141 シード層
15、25 インターポーザー
151、251 貫通孔
15’、25’ シート材
16、26 半導体素子
17、27 封止部
170、270 半導体素子封止体
28 導体柱
30 半導体装置
501 振動フィーダー
502 樹脂材料供給容器
503 エポキシ樹脂組成物
504 下型キャビティ
600 半導体パッケージ
601 ダミー基板
602 接着層
610 封止体
611 バンプ
612 第2の被覆層
613 配線
614 導体ポスト
615 第1の被覆層
616 半導体素子
617 封止部
622 開口部
625 貫通孔
Claims (9)
- 複数の貫通孔が形成されたシート材と、該シート材上に配置され少なくとも1つの電極パッドを有する複数の半導体素子と、該半導体素子を封止する封止部とを有する半導体素子封止体の製造方法であって、
平板状をなすシート材を用意し、該シート材の厚さ方向に複数の貫通孔を形成する貫通孔形成工程と、
前記貫通孔に前記電極パッドが対応するように、複数の前記半導体素子を前記シート材上に配置する半導体素子配置工程と、
前記半導体素子が配置されている側の面に、前記シート材と前記半導体素子とを覆うように封止して封止部を形成することにより前記半導体素子封止体を得る封止部形成工程とを有することを特徴とする半導体素子封止体の製造方法。 - 前記封止部形成工程において、前記封止部は、顆粒状のエポキシ樹脂組成物を溶融させた状態で、前記シート材および半導体素子を覆うように、前記半導体素子が配置されている側の面に供給した後、この溶融状態のエポキシ樹脂組成物を圧縮成形することにより形成される請求項1に記載の半導体素子封止体の製造方法。
- 前記貫通孔形成工程において、前記貫通孔は、前記半導体素子配置工程で前記シート材上に配置される複数の前記半導体素子が備える電極パッドの総数よりも多く形成される請求項1または2に記載の半導体素子封止体の製造方法。
- 前記半導体素子配置工程において、さらに、前記貫通孔に対応するように、導電性を有する導体柱を前記シート材上に配置する請求項3に記載の半導体素子封止体の製造方法。
- 請求項1ないし3のいずれかに記載の半導体素子封止体の製造方法により製造された半導体素子封止体を用意し、前記貫通孔に導電性を有する導体ポストを形成する導体ポスト形成工程と、
前記シート材の前記半導体素子とは反対の面側に、前記導体ポストに電気的に接続する配線を形成する配線形成工程と、
前記半導体素子とは反対側の面に、前記配線の一部が露出するように、開口部を備える被覆部を形成する被覆部形成工程と、
前記開口部で露出する前記配線に、前記バンプを電気的に接続するバンプ接続工程と、
前記半導体素子毎に対応するように、前記半導体素子封止体を個片化することにより、複数の半導体パッケージを一括して得る個片化工程とを有することを特徴とする半導体パッケージの製造方法。 - 請求項4に記載の半導体素子封止体の製造方法により製造された半導体素子封止体を用意し、前記貫通孔に導電性を有する導体ポストを形成する導体ポスト形成工程と、
前記シート材の前記半導体素子とは反対の面側に、前記導体ポストに電気的に接続する配線を形成する配線形成工程と、
前記半導体素子とは反対側の面に、前記配線の一部が露出するように、開口部を備える被覆部を形成する被覆部形成工程と、
前記開口部で露出する前記配線に、前記バンプを電気的に接続するバンプ接続工程と、
前記導体柱の前記シート材と反対側の端部が露出するまで、前記封止部の前記シート材と反対側の面を研削および/または研磨する研削・研磨工程と、
前記半導体素子毎に対応するように、前記半導体素子封止体を個片化することにより、複数の半導体パッケージを一括して得る個片化工程とを有することを特徴とする半導体パッケージの製造方法。 - 前記導体ポスト形成工程において、前記導体ポストは、電解メッキ法により形成される請求項5または6に記載の半導体パッケージの製造方法。
- 前記配線形成工程において、前記配線は、電解メッキ法により形成される請求項5ないし7のいずれかに記載の半導体パッケージの製造方法。
- 前記導体ポストと前記バンプとは、前記シート材の面方向において、異なる位置に形成される請求項5ないし8のいずれかに記載の半導体パッケージの製造方法。
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JP2012129260A (ja) * | 2010-12-13 | 2012-07-05 | Sumitomo Bakelite Co Ltd | 半導体素子封止体の製造方法および半導体パッケージの製造方法 |
JP2012129262A (ja) * | 2010-12-13 | 2012-07-05 | Sumitomo Bakelite Co Ltd | 半導体素子封止体の製造方法および半導体パッケージの製造方法 |
JP2012129261A (ja) * | 2010-12-13 | 2012-07-05 | Sumitomo Bakelite Co Ltd | 半導体素子封止体の製造方法および半導体パッケージの製造方法 |
JP2012129263A (ja) * | 2010-12-13 | 2012-07-05 | Sumitomo Bakelite Co Ltd | 半導体素子封止体の製造方法および半導体パッケージの製造方法 |
JP2020087981A (ja) * | 2018-11-15 | 2020-06-04 | 有限会社アイピーシステムズ | ビア配線形成用基板及びビア配線形成用基板の製造方法並びに半導体装置実装部品の製造方法 |
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JP2008016539A (ja) * | 2006-07-04 | 2008-01-24 | Seiko Instruments Inc | 半導体パッケージ及び半導体パッケージの製造方法 |
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JP2007157879A (ja) * | 2005-12-02 | 2007-06-21 | Sony Corp | 半導体装置及びその製造方法、並びに半導体ウェーハ |
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JP2012129260A (ja) * | 2010-12-13 | 2012-07-05 | Sumitomo Bakelite Co Ltd | 半導体素子封止体の製造方法および半導体パッケージの製造方法 |
JP2012129262A (ja) * | 2010-12-13 | 2012-07-05 | Sumitomo Bakelite Co Ltd | 半導体素子封止体の製造方法および半導体パッケージの製造方法 |
JP2012129261A (ja) * | 2010-12-13 | 2012-07-05 | Sumitomo Bakelite Co Ltd | 半導体素子封止体の製造方法および半導体パッケージの製造方法 |
JP2012129263A (ja) * | 2010-12-13 | 2012-07-05 | Sumitomo Bakelite Co Ltd | 半導体素子封止体の製造方法および半導体パッケージの製造方法 |
JP2020087981A (ja) * | 2018-11-15 | 2020-06-04 | 有限会社アイピーシステムズ | ビア配線形成用基板及びビア配線形成用基板の製造方法並びに半導体装置実装部品の製造方法 |
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