JP2010199052A5 - - Google Patents

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Publication number
JP2010199052A5
JP2010199052A5 JP2009131305A JP2009131305A JP2010199052A5 JP 2010199052 A5 JP2010199052 A5 JP 2010199052A5 JP 2009131305 A JP2009131305 A JP 2009131305A JP 2009131305 A JP2009131305 A JP 2009131305A JP 2010199052 A5 JP2010199052 A5 JP 2010199052A5
Authority
JP
Japan
Prior art keywords
emulsion layer
gradation
present
mass
particularly limited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2009131305A
Other languages
English (en)
Other versions
JP2010199052A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009131305A priority Critical patent/JP2010199052A/ja
Priority claimed from JP2009131305A external-priority patent/JP2010199052A/ja
Priority to CN201010105471.0A priority patent/CN101794645B/zh
Priority to US12/696,683 priority patent/US8017306B2/en
Priority to KR1020100009092A priority patent/KR20100089032A/ko
Publication of JP2010199052A publication Critical patent/JP2010199052A/ja
Publication of JP2010199052A5 publication Critical patent/JP2010199052A5/ja
Abandoned legal-status Critical Current

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Description

乳剤層の膨潤は250%以上であることを特徴とする。本発明において、膨潤率は以下のように定義する。
膨潤率(%)=100×((b)−(a))/(a)
<溶媒>
上記乳剤層の形成に用いられる溶媒は、特に限定されるものではないが、例えば、水、有機溶媒(例えば、メタノール等アルコール類、アセトン等ケトン類、ホルムアミド等のアミド類、ジメチルスルホキシド等のスルホキシド類、酢酸エチル等のエステル類、エーテル類等)、イオン性液体、及びこれらの混合溶媒を挙げることができる。本発明の乳剤層に用いられる溶媒の含有量は、前記乳剤層に含まれる銀塩、バインダ等の合計の質量に対して30〜90質量%の範囲であり、50〜80質量%の範囲であることが好ましい。
本発明における現像処理後の階調は、特に限定されるものではないが、4.0を超えることが好ましい。現像処理後の階調が4.0を超えると、光透過性部の透明性を高く保ったまま、導電性金属部の導電性を高めることができる。階調を4.0以上にする手段としては、例えば、ロジウムイオン、イリジウムイオンのドープが挙げられる。
JP2009131305A 2009-02-02 2009-05-29 導電膜の製造方法 Abandoned JP2010199052A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009131305A JP2010199052A (ja) 2009-02-02 2009-05-29 導電膜の製造方法
CN201010105471.0A CN101794645B (zh) 2009-02-02 2010-01-28 制备导电膜的方法
US12/696,683 US8017306B2 (en) 2009-02-02 2010-01-29 Method for producing conductive film
KR1020100009092A KR20100089032A (ko) 2009-02-02 2010-02-01 도전성 필름의 제조 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009021821 2009-02-02
JP2009131305A JP2010199052A (ja) 2009-02-02 2009-05-29 導電膜の製造方法

Publications (2)

Publication Number Publication Date
JP2010199052A JP2010199052A (ja) 2010-09-09
JP2010199052A5 true JP2010199052A5 (ja) 2012-03-15

Family

ID=42540691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009131305A Abandoned JP2010199052A (ja) 2009-02-02 2009-05-29 導電膜の製造方法

Country Status (4)

Country Link
US (1) US8017306B2 (ja)
JP (1) JP2010199052A (ja)
KR (1) KR20100089032A (ja)
CN (1) CN101794645B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140231723A1 (en) * 2013-02-20 2014-08-21 Kurt Michael Sanger Enhancing silver conductivity
JP2016009731A (ja) * 2014-06-24 2016-01-18 コニカミノルタ株式会社 導電パターン形成方法および導電パターン形成装置
US10067599B2 (en) * 2016-07-29 2018-09-04 Ncr Corporation Touchscreen defroster

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6040338A (ja) * 1983-08-16 1985-03-02 Canon Inc シ−ト自動送り装置
JP2717734B2 (ja) 1991-02-28 1998-02-25 日本写真印刷株式会社 透光性電磁波シールド材料とその製造方法
JPH10163673A (ja) 1996-10-01 1998-06-19 Nisshinbo Ind Inc 電磁波シールドパネル及びその製造方法
US6188174B1 (en) * 1996-10-01 2001-02-13 Nisshinbo Insustries, Inc. Electromagnetic radiation shield panel and method of producing the same
JP3363083B2 (ja) 1997-12-17 2003-01-07 住友大阪セメント株式会社 透明基体およびその製造方法
JP2000176950A (ja) * 1998-12-16 2000-06-27 Konica Corp セルローストリアセテートフィルムの製造方法及び取り扱い方法
US6706165B2 (en) 2000-01-07 2004-03-16 President And Fellows Of Harvard College Fabrication of metallic microstructures via exposure of photosensitive composition
JP4169530B2 (ja) 2002-04-24 2008-10-22 株式会社ブリヂストン 電磁波シールド性光透過窓材及びその製造方法
JP4641719B2 (ja) * 2002-12-27 2011-03-02 富士フイルム株式会社 透光性電磁波シールド膜の製造方法及び透光性電磁波シールド膜
JP2005016281A (ja) * 2003-06-27 2005-01-20 Inb Planning:Kk ゴム製直立ポール
WO2007037545A1 (en) * 2005-09-30 2007-04-05 Fujifilm Corporation Method for producing conductive film and light-sensitive material for conductive film production
JP4961220B2 (ja) * 2006-01-31 2012-06-27 富士フイルム株式会社 導電性膜の製造方法、並びに、透光性電磁波シールド膜、光学フィルターおよびプラズマディスプレイパネル
JP5192713B2 (ja) * 2007-03-30 2013-05-08 富士フイルム株式会社 導電膜及びその製造方法

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