JP2010177423A5 - - Google Patents

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Publication number
JP2010177423A5
JP2010177423A5 JP2009018093A JP2009018093A JP2010177423A5 JP 2010177423 A5 JP2010177423 A5 JP 2010177423A5 JP 2009018093 A JP2009018093 A JP 2009018093A JP 2009018093 A JP2009018093 A JP 2009018093A JP 2010177423 A5 JP2010177423 A5 JP 2010177423A5
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JP
Japan
Prior art keywords
optical system
projection optical
pattern
projected
images
Prior art date
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Granted
Application number
JP2009018093A
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English (en)
Japanese (ja)
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JP5505685B2 (ja
JP2010177423A (ja
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Priority to JP2009018093A priority Critical patent/JP5505685B2/ja
Priority claimed from JP2009018093A external-priority patent/JP5505685B2/ja
Publication of JP2010177423A publication Critical patent/JP2010177423A/ja
Publication of JP2010177423A5 publication Critical patent/JP2010177423A5/ja
Application granted granted Critical
Publication of JP5505685B2 publication Critical patent/JP5505685B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009018093A 2009-01-29 2009-01-29 投影光学系、並びに露光方法及び装置 Expired - Fee Related JP5505685B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009018093A JP5505685B2 (ja) 2009-01-29 2009-01-29 投影光学系、並びに露光方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009018093A JP5505685B2 (ja) 2009-01-29 2009-01-29 投影光学系、並びに露光方法及び装置

Publications (3)

Publication Number Publication Date
JP2010177423A JP2010177423A (ja) 2010-08-12
JP2010177423A5 true JP2010177423A5 (https=) 2012-10-25
JP5505685B2 JP5505685B2 (ja) 2014-05-28

Family

ID=42708076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009018093A Expired - Fee Related JP5505685B2 (ja) 2009-01-29 2009-01-29 投影光学系、並びに露光方法及び装置

Country Status (1)

Country Link
JP (1) JP5505685B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI564671B (zh) * 2011-05-30 2017-01-01 Orc Manufacturing Co Ltd Exposure device
JP5881314B2 (ja) * 2011-05-30 2016-03-09 株式会社オーク製作所 露光装置
EP2720072A1 (en) * 2012-10-12 2014-04-16 Vision Engineering Limited Optical instrument with diffractive element
CN105954980A (zh) * 2016-07-20 2016-09-21 马颖鏖 基于数字微镜阵列的紫外曝光机及其控制方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07297110A (ja) * 1994-04-27 1995-11-10 Nikon Corp 投影露光装置
JP3689490B2 (ja) * 1996-06-07 2005-08-31 キヤノン株式会社 ノズル部材の製造方法及びそれを用いた加工装置
JP2004200430A (ja) * 2002-12-19 2004-07-15 Nikon Corp 露光装置、露光装置の調整方法及び露光方法
JP4929762B2 (ja) * 2006-03-03 2012-05-09 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
EP2040283A4 (en) * 2006-07-12 2012-02-08 Nikon Corp OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD

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