JP2010170768A - Organic el device, method for manufacturing organic el device, and electronic device - Google Patents

Organic el device, method for manufacturing organic el device, and electronic device Download PDF

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JP2010170768A
JP2010170768A JP2009010632A JP2009010632A JP2010170768A JP 2010170768 A JP2010170768 A JP 2010170768A JP 2009010632 A JP2009010632 A JP 2009010632A JP 2009010632 A JP2009010632 A JP 2009010632A JP 2010170768 A JP2010170768 A JP 2010170768A
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insulating film
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element substrate
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JP5040933B2 (en
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Yasunori Hattori
恭典 服部
Tsukasa Eguchi
司 江口
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Seiko Epson Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic EL (Electroluminescence) device of high reliability suppressing the occurrence of dark spots. <P>SOLUTION: The organic EL device includes an organic insulating film 14 formed on an element substrate 20; a pixel electrode 15 formed on the organic insulating film 14; an organic light-emitting layer 17 formed on the pixel electrode 15; an inorganic insulating film 16 formed covering the exposed portion of the organic insulating film 14 on the element substrate 20; and a sealing substrate 30 joined to the element substrate 20 through a frame-like joint member 31 formed on the inorganic insulating film 16. An opening H3 of the inorganic insulating film 16 for exposing a part of the organic insulating film 14 is provided inside a region surrounded by the joint member 31, and a desiccant 32 is provided covering the organic insulating film 14 exposed to the opening H3. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、有機EL装置、有機EL装置の製造方法、電子機器に関するものである。   The present invention relates to an organic EL device, a method for manufacturing the organic EL device, and an electronic apparatus.

一般に、有機EL(エレクトロルミネッセンス)素子は、酸素や水分に極めて弱く、すぐ劣化してしまうという欠点を有している。有機EL素子は、層間絶縁膜を介してTFTと接続される構造が一般的であるが、層間絶縁膜として適した有機絶縁膜は、水蒸気を透過し、水分を吸収しやすいという特性を持っている。そのため、従来は、層間絶縁膜と有機EL素子との間に、層間絶縁膜よりも水分透過率の小さい無機絶縁膜を形成することが行われている。   In general, an organic EL (electroluminescence) element has a defect that it is very weak against oxygen and moisture and deteriorates immediately. An organic EL element generally has a structure connected to a TFT through an interlayer insulating film. However, an organic insulating film suitable as an interlayer insulating film has a characteristic of easily transmitting moisture and absorbing moisture. Yes. Therefore, conventionally, an inorganic insulating film having a moisture permeability smaller than that of the interlayer insulating film is formed between the interlayer insulating film and the organic EL element.

しかしながら、層間絶縁膜の表面を無機絶縁膜で完全に覆った有機EL装置では、有機発光層形成前のベーク工程や信頼性試験における加熱処理等によって、層間絶縁膜に膜剥がれが発生し、必ずしも目的とする効果が得られないという問題があった。これは、層間絶縁膜に含まれていた水分が、熱等の外的要因によって層間絶縁膜を膨張させ、有機発光層へ拡散するためと考えられている。   However, in an organic EL device in which the surface of the interlayer insulating film is completely covered with an inorganic insulating film, film peeling occurs in the interlayer insulating film due to the baking process before the formation of the organic light emitting layer or the heat treatment in the reliability test. There was a problem that the intended effect could not be obtained. This is thought to be because moisture contained in the interlayer insulating film expands the interlayer insulating film due to external factors such as heat and diffuses into the organic light emitting layer.

そこで、特許文献1,2では、無機絶縁膜の一部に開口部を形成した有機EL装置が提案されている。この構成によれば、層間絶縁膜からの水分の放出が無機絶縁膜によって妨げられることがないので、開口部を通して層間絶縁膜に含まれる水分を効率よく放出することができる。したがって、層間絶縁膜中の水分に起因したダークスポットの発生が防止され、信頼性に優れた有機EL装置が提供できる。   Therefore, Patent Documents 1 and 2 propose an organic EL device in which an opening is formed in a part of an inorganic insulating film. According to this configuration, since the release of moisture from the interlayer insulating film is not hindered by the inorganic insulating film, moisture contained in the interlayer insulating film can be efficiently released through the opening. Therefore, generation of dark spots due to moisture in the interlayer insulating film is prevented, and an organic EL device having excellent reliability can be provided.

特開2007−188808JP2007-188808 特開2007−250244JP2007-250244

しかしながら、無機絶縁膜の一部に開口部を形成した有機EL装置では、外部からの水分の浸入も生じ易いという不具合を有している。そのため、封止基板によって有機EL素子を封止した後、製品として出荷した場合に、無機絶縁膜で完全に層間絶縁膜の表面を覆ったものに比べて、思ったほど寿命が延びず、必ずしも期待した効果が得られないという問題があった。   However, the organic EL device in which an opening is formed in a part of the inorganic insulating film has a problem that moisture permeates easily from the outside. Therefore, when the organic EL element is sealed with a sealing substrate and then shipped as a product, the lifetime is not extended as expected compared to the case where the surface of the interlayer insulating film is completely covered with an inorganic insulating film, and not necessarily There was a problem that the expected effect could not be obtained.

本発明はこのような事情に鑑みてなされたものであって、ダークスポットの発生を抑制した信頼性の高い有機EL装置、有機EL装置の製造方法、及び電子機器を提供することを目的とする。   The present invention has been made in view of such circumstances, and an object thereof is to provide a highly reliable organic EL device that suppresses the occurrence of dark spots, a method for manufacturing the organic EL device, and an electronic apparatus. .

上記の課題を解決するため、本発明の有機EL装置は、素子基板に形成された有機絶縁膜と、前記有機絶縁膜上に形成された画素電極と、前記画素電極上に形成された有機発光層と、前記素子基板において前記有機絶縁膜が露出した部位を覆って形成された無機絶縁膜と、前記無機絶縁膜上に形成された枠状の接合部材を介して前記素子基板と接合された封止基板と、を備えた有機EL装置であって、前記接合部材に囲まれた領域の内側に、前記有機絶縁膜の一部を露出させる前記無機絶縁膜の開口部が設けられ、前記開口部に露出した前記有機絶縁膜を覆って乾燥剤が設けられていることを特徴とする。
この構成によれば、無機絶縁膜の一部に開口部が形成されているので、有機絶縁膜からの水分の放出が無機絶縁膜によって妨げられることがない。そのため、開口部を介して有機絶縁膜に含まれている水分を容易に放出することができる。また、外部からの水分の浸入は乾燥剤によって防止されるため、製品出荷後に開口部を介して水分が浸入することもない。さらに、封止基板で発光部を封止した後において、有機絶縁膜中の水分を乾燥剤によって吸収することができるため、例えば、製品出荷前の信頼性試験において加熱処理を行った場合でも、有機EL装置に有機絶縁膜の膜剥がれや、それによるダークスポットの発生等が生じることはない。したがって、長寿命で信頼性に優れた有機EL装置が提供できる。
In order to solve the above problems, an organic EL device according to the present invention includes an organic insulating film formed on an element substrate, a pixel electrode formed on the organic insulating film, and an organic light emitting formed on the pixel electrode. Layer, an inorganic insulating film formed on the element substrate so as to cover the exposed portion of the organic insulating film, and a frame-shaped bonding member formed on the inorganic insulating film, and bonded to the element substrate An opening of the inorganic insulating film that exposes a portion of the organic insulating film inside a region surrounded by the bonding member, and the opening A desiccant is provided so as to cover the organic insulating film exposed to the part.
According to this configuration, since the opening is formed in a part of the inorganic insulating film, the release of moisture from the organic insulating film is not hindered by the inorganic insulating film. Therefore, moisture contained in the organic insulating film can be easily released through the opening. In addition, since the entry of moisture from the outside is prevented by the desiccant, moisture does not enter through the opening after the product is shipped. Furthermore, since the moisture in the organic insulating film can be absorbed by the desiccant after sealing the light emitting part with the sealing substrate, for example, even when heat treatment is performed in a reliability test before product shipment, In the organic EL device, the organic insulating film is not peeled off and dark spots are not generated. Therefore, it is possible to provide an organic EL device having a long lifetime and excellent reliability.

本発明においては、前記接合部材に囲まれた領域の内側に、複数の前記画素電極が形成されてなる発光領域が設けられ、前記発光領域の周囲を囲んで1つ又は複数の前記開口部が形成されていることが望ましい。
この構成によれば、無機絶縁膜の開口部が発光領域の外側に配置されているため、例えば発光領域の内部(すなわち、画素電極間の領域)に開口部を形成する場合に比べて、開口部の大きさやレイアウトを自由に設計することができる。また、乾燥剤が発光領域の周囲を囲むように配置されるため、乾燥剤の量を多くすることができ、素子基板と封止基板との接合部から侵入する水分を効果的に捕捉することができる。そのため、例えばトップエミッション構造の有機EL装置に適用した場合には、発光領域と重なる部分に配置される乾燥剤を薄くすることができ、或いは、完全に省略することにより、封止基板側からの光の取り出し効率を向上させることができる。
In the present invention, a light emitting region in which a plurality of pixel electrodes are formed is provided inside a region surrounded by the bonding member, and one or a plurality of the opening portions surround the light emitting region. It is desirable that it be formed.
According to this configuration, since the opening of the inorganic insulating film is disposed outside the light emitting region, for example, the opening is formed as compared with the case where the opening is formed inside the light emitting region (ie, the region between the pixel electrodes). The size and layout of the part can be designed freely. Further, since the desiccant is arranged so as to surround the light emitting region, the amount of the desiccant can be increased, and moisture that enters from the joint portion between the element substrate and the sealing substrate can be effectively captured. Can do. Therefore, for example, when applied to an organic EL device having a top emission structure, the desiccant disposed in the portion overlapping with the light emitting region can be thinned, or by omitting it completely, from the sealing substrate side. The light extraction efficiency can be improved.

本発明においては、前記乾燥剤は、前記開口部を覆って前記発光領域の周囲を囲むと共に、前記封止基板と前記無機絶縁膜の開口部に露出した前記有機絶縁膜との双方に密着していることが望ましい。
この構成によれば、乾燥剤が素子基板と封止基板との双方に密着しているので、素子基板と封止基板との接合部から侵入する水分をより効果的に捕捉することができる。
In the present invention, the desiccant covers the opening and surrounds the periphery of the light emitting region, and is in close contact with both the sealing substrate and the organic insulating film exposed at the opening of the inorganic insulating film. It is desirable that
According to this configuration, since the desiccant is in close contact with both the element substrate and the sealing substrate, it is possible to more effectively capture moisture entering from the joint portion between the element substrate and the sealing substrate.

本発明の有機EL装置の製造方法は、素子基板に形成された有機絶縁膜と、前記有機絶縁膜上に形成された画素電極と、前記画素電極上に形成された有機発光層と、前記素子基板において前記有機絶縁膜が露出した部位を覆って形成された無機絶縁膜と、前記無機絶縁膜上に形成された枠状の接合部材を介して前記素子基板と接合された封止基板と、を備えた有機EL装置の製造方法であって、前記有機発光層の形成前に、前記接合部材に囲まれた領域の内側に、前記有機絶縁膜の一部を露出させる前記無機絶縁膜の開口部を形成し、前記有機絶縁膜を加熱することにより、前記開口部を介して前記有機絶縁膜に含まれている水分を放出する工程を含み、前記有機発光層の形成後、前記封止基板を前記素子基板に接合する前又は接合する際に、前記無機絶縁膜の開口部に露出した前記有機絶縁膜を覆って乾燥剤を配置する工程を含むことを特徴とする。
この方法によれば、無機絶縁膜の一部に開口部が形成されているので、有機絶縁膜からの水分の放出が無機絶縁膜によって妨げられることがない。そのため、開口部を介して有機絶縁膜に含まれている水分を容易に放出することができる。また、外部からの水分の浸入は乾燥剤によって防止されるため、製品出荷後に開口部を介して水分が浸入することもない。さらに、封止基板で発光部を封止した後において、有機絶縁膜中の水分を乾燥剤によって吸収することができるため、例えば、製品出荷前の信頼性試験において加熱処理を行った場合でも、有機EL装置に有機絶縁膜の膜剥がれや、それによるダークスポットの発生等が生じることはない。したがって、長寿命で信頼性に優れた有機EL装置が提供できる。
The organic EL device manufacturing method of the present invention includes an organic insulating film formed on an element substrate, a pixel electrode formed on the organic insulating film, an organic light emitting layer formed on the pixel electrode, and the element. An inorganic insulating film formed so as to cover a portion of the substrate where the organic insulating film is exposed; a sealing substrate bonded to the element substrate via a frame-shaped bonding member formed on the inorganic insulating film; An opening of the inorganic insulating film that exposes a part of the organic insulating film inside a region surrounded by the bonding member before the formation of the organic light emitting layer. Forming a portion and heating the organic insulating film to release moisture contained in the organic insulating film through the opening, and after forming the organic light emitting layer, the sealing substrate Before or during bonding to the element substrate Characterized in that it comprises a step of placing a desiccant to cover the organic insulating film exposed in the opening of the inorganic insulating film.
According to this method, since the opening is formed in a part of the inorganic insulating film, the release of moisture from the organic insulating film is not hindered by the inorganic insulating film. Therefore, moisture contained in the organic insulating film can be easily released through the opening. In addition, since the entry of moisture from the outside is prevented by the desiccant, moisture does not enter through the opening after the product is shipped. Furthermore, after sealing the light emitting part with the sealing substrate, moisture in the organic insulating film can be absorbed by the desiccant. The organic EL device does not peel off the organic insulating film or cause a dark spot. Therefore, it is possible to provide an organic EL device having a long lifetime and excellent reliability.

本発明においては、前記無機絶縁膜を形成する工程は、前記画素電極を覆って前記有機絶縁膜上に無機材料膜を形成する工程と、前記無機材料膜の一部を除去して前記画素電極の一部を露出させる開口部を形成する工程と、を含み、前記有機絶縁膜の一部を露出させる前記開口部の形成工程は、前記画素電極の一部を露出させる開口部の形成工程と同時に行われることが望ましい。
この方法によれば、製造工程を増加させずに効率的に開口部を形成することができる。
In the present invention, the step of forming the inorganic insulating film includes a step of forming an inorganic material film on the organic insulating film so as to cover the pixel electrode, and a part of the inorganic material film is removed to form the pixel electrode. Forming an opening that exposes a portion of the organic insulating film, and forming the opening that exposes a portion of the organic insulating film includes: forming an opening that exposes a portion of the pixel electrode; It is desirable to be performed simultaneously.
According to this method, the opening can be efficiently formed without increasing the number of manufacturing steps.

本発明においては、前記封止基板と前記素子基板とを接合する工程は、前記乾燥剤が付着した前記封止基板を前記素子基板上に配置し、前記乾燥剤を前記無機絶縁膜の開口部に露出した前記有機絶縁膜に密着させる工程を含むことが望ましい。
この方法によれば、乾燥剤を素子基板と封止基板との双方に密着させることができる。そのため、素子基板と封止基板との接合部から侵入する水分を効果的に捕捉することができる。
In the present invention, in the step of bonding the sealing substrate and the element substrate, the sealing substrate to which the desiccant is attached is disposed on the element substrate, and the desiccant is disposed in the opening of the inorganic insulating film. It is desirable to include a step of closely contacting the organic insulating film exposed to the surface.
According to this method, the desiccant can be adhered to both the element substrate and the sealing substrate. Therefore, it is possible to effectively capture moisture entering from the joint portion between the element substrate and the sealing substrate.

本発明の電子機器は、上述した本発明の有機EL装置を備えていることを特徴とする。
この構成によれば、ダークスポットの発生を抑制した信頼性の高い電子機器を提供することができる。
An electronic apparatus according to the present invention includes the above-described organic EL device according to the present invention.
According to this configuration, it is possible to provide a highly reliable electronic device that suppresses the occurrence of dark spots.

有機EL装置の一例であるラインヘッドの平面図である。It is a top view of a line head which is an example of an organic EL device. 図1のA−A′断面図である。It is AA 'sectional drawing of FIG. ラインヘッドの製造方法の説明図である。It is explanatory drawing of the manufacturing method of a line head. ラインヘッドの製造方法の説明図である。It is explanatory drawing of the manufacturing method of a line head. ラインヘッドの製造方法の説明図である。It is explanatory drawing of the manufacturing method of a line head. ラインヘッドの製造方法の説明図である。It is explanatory drawing of the manufacturing method of a line head. 電子機器の一例であるが画像形成装置の概略図である。1 is a schematic diagram of an image forming apparatus as an example of an electronic apparatus.

[有機EL装置]
図1は、本発明の有機EL装置の一例であるラインヘッド1の平面図である。ラインヘッド1は、長細い矩形の素子基板20上に、複数の有機EL(エレクトロルミネセンス)素子19を配列してなる発光領域1Aを有している。なお、図1では有機EL素子19を2列にしてこれらを千鳥状に配置したが、1列の有機EL素子19で形成してもよい。
[Organic EL device]
FIG. 1 is a plan view of a line head 1 which is an example of the organic EL device of the present invention. The line head 1 has a light emitting region 1A formed by arranging a plurality of organic EL (electroluminescence) elements 19 on a long and thin rectangular element substrate 20. In FIG. 1, the organic EL elements 19 are arranged in two rows in a staggered manner, but they may be formed by one row of organic EL elements 19.

図2は、ラインヘッド1の断面図である。ラインヘッド1は、有機EL素子19が形成された素子基板20と、素子基板20の有機EL素子19が形成された面を封止する封止基板30とを備えている。素子基板20と封止基板30は、両基板の対向領域の周縁部に設けられた枠状の接合部材31を介して接合され一体化されている。   FIG. 2 is a cross-sectional view of the line head 1. The line head 1 includes an element substrate 20 on which an organic EL element 19 is formed, and a sealing substrate 30 that seals a surface of the element substrate 20 on which the organic EL element 19 is formed. The element substrate 20 and the sealing substrate 30 are bonded and integrated through a frame-shaped bonding member 31 provided at the peripheral edge of the opposing region of both substrates.

素子基板20は、ガラス等からなる基板10上に、半導体層123及びゲート電極124を有するTFT(スイッチング素子)12を含む回路部11を備えている。回路部11の表面には、TFT12のソース電極121及びドレイン電極122を覆って、SiOを主体とする無機絶縁膜13が形成されている。無機絶縁膜13上には、感光性、絶縁性および耐熱性を備えたアクリル系やポリイミド系等の樹脂材料を主体とする有機絶縁膜(平坦化膜)14が形成されている。 The element substrate 20 includes a circuit unit 11 including a TFT (switching element) 12 having a semiconductor layer 123 and a gate electrode 124 on a substrate 10 made of glass or the like. On the surface of the circuit portion 11, an inorganic insulating film 13 mainly composed of SiO 2 is formed so as to cover the source electrode 121 and the drain electrode 122 of the TFT 12. On the inorganic insulating film 13, an organic insulating film (planarizing film) 14 mainly composed of an acrylic or polyimide resin material having photosensitivity, insulation and heat resistance is formed.

有機絶縁膜14上には、ITO等からなる画素電極(第1電極)15が形成されている。画素電極15は、有機絶縁膜14及び無機絶縁膜13を貫通するコンタクトホールH1を介してTFT12のドレイン電極122と接続されている。   A pixel electrode (first electrode) 15 made of ITO or the like is formed on the organic insulating film 14. The pixel electrode 15 is connected to the drain electrode 122 of the TFT 12 through a contact hole H 1 that penetrates the organic insulating film 14 and the inorganic insulating film 13.

有機絶縁膜14上には、画素電極15を覆って、SiOやSiN等の無機絶縁膜16が形成されている。無機絶縁膜16は、有機絶縁膜14よりも水分透過率が低い材料で形成され、有機絶縁膜14中に含まれる水分が有機EL素子19に拡散するのを防止している。また、無機絶縁膜16は、素子基板20において有機絶縁膜14が露出する部位全体を覆って形成され、外部から有機絶縁膜14に水分が浸入することを防止している。 An inorganic insulating film 16 such as SiO 2 or SiN is formed on the organic insulating film 14 so as to cover the pixel electrode 15. The inorganic insulating film 16 is formed of a material having a moisture permeability lower than that of the organic insulating film 14, and prevents moisture contained in the organic insulating film 14 from diffusing into the organic EL element 19. The inorganic insulating film 16 is formed so as to cover the entire portion of the element substrate 20 where the organic insulating film 14 is exposed, and prevents moisture from entering the organic insulating film 14 from the outside.

無機絶縁膜16には、画素電極15の一部を露出させる開口部H2が形成されている。無機絶縁膜16上には、開口部H2に露出した画素電極15を覆って、有機低分子材料又は有機高分子材料からなる有機発光層17が形成されている。また、有機発光層17を覆って、MgAgからなる共通電極(第2電極)18が形成されている。画素電極15、有機発光層17、及び共通電極18によって有機EL素子19が形成され、有機EL素子19が素子基板20の長手方向に沿って複数形成されることにより、素子基板20に細長いライン状の発光領域1Aが形成されている(図1参照)。   In the inorganic insulating film 16, an opening H <b> 2 that exposes a part of the pixel electrode 15 is formed. On the inorganic insulating film 16, an organic light emitting layer 17 made of an organic low molecular material or an organic polymer material is formed so as to cover the pixel electrode 15 exposed in the opening H2. A common electrode (second electrode) 18 made of MgAg is formed so as to cover the organic light emitting layer 17. An organic EL element 19 is formed by the pixel electrode 15, the organic light emitting layer 17, and the common electrode 18, and a plurality of organic EL elements 19 are formed along the longitudinal direction of the element substrate 20. 1A is formed (see FIG. 1).

なお、図2では、有機EL素子19を画素電極15と共通電極18との間に有機発光層17を挟持することにより形成したが、画素電極15と有機発光層17との間には、必要に応じて正孔注入層や正孔輸送層等を形成することができる。また、有機発光層17と共通電極18との間にも、必要に応じて電子輸送層や電子注入層を形成することができる。本発明では、有機発光層に付加して形成される正孔注入層、正孔輸送層、電子輸送層、電子注入層等の層を含めて「有機発光層」と定義する。   In FIG. 2, the organic EL element 19 is formed by sandwiching the organic light emitting layer 17 between the pixel electrode 15 and the common electrode 18, but is necessary between the pixel electrode 15 and the organic light emitting layer 17. Depending on the case, a hole injection layer, a hole transport layer, and the like can be formed. In addition, an electron transport layer or an electron injection layer can be formed between the organic light emitting layer 17 and the common electrode 18 as necessary. In the present invention, layers including a hole injection layer, a hole transport layer, an electron transport layer, an electron injection layer, and the like formed by being added to the organic light emitting layer are defined as “organic light emitting layer”.

無機絶縁膜16には、画素電極15と重ならない領域に開口部H3が形成されている。開口部H3の位置は、図1に示すように、接合部材31と発光領域1Aとの間である。開口部H3は、発光領域1Aの周囲を囲むように、素子基板20の長手方向に沿って多数形成されている。本実施形態では、複数の開口部H3を発光領域1Aの上下にそれぞれ1列ずつ配置したが、複数列ずつ配置しても良い。また、素子基板20の長手方向だけでなく短手方向にも形成し、発光領域1Aの周囲を枠状に取り囲むように配置しても良い。さらに、素子基板20の長手方向に配列した複数の開口部H3を繋げて、連続した一本の細長い開口部H3を形成しても良い。   In the inorganic insulating film 16, an opening H <b> 3 is formed in a region that does not overlap with the pixel electrode 15. As shown in FIG. 1, the position of the opening H3 is between the joining member 31 and the light emitting region 1A. A large number of openings H3 are formed along the longitudinal direction of the element substrate 20 so as to surround the periphery of the light emitting region 1A. In the present embodiment, the plurality of openings H3 are arranged one by one above and below the light emitting region 1A, but may be arranged by a plurality of rows. Further, it may be formed not only in the longitudinal direction of the element substrate 20 but also in the lateral direction, and arranged so as to surround the light emitting region 1A in a frame shape. Further, a plurality of openings H3 arranged in the longitudinal direction of the element substrate 20 may be connected to form a continuous elongated opening H3.

無機絶縁膜16の開口部H3には、乾燥剤32が配置されている。乾燥剤32は、開口部H3に露出する有機絶縁膜14を覆うと共に、その上部が封止基板30と接触している。乾燥剤32は、開口部H3と共に発光領域1Aの周囲を囲むように配置され、素子基板20、封止基板30、及び接合部材31によって囲まれた封止空間内に収容されている。乾燥剤32は、開口部H3毎に形成しても良く、一方向に配列した複数の開口部H3に対して共通の細長いライン状の乾燥剤を形成しても良い。   A desiccant 32 is disposed in the opening H3 of the inorganic insulating film 16. The desiccant 32 covers the organic insulating film 14 exposed in the opening H <b> 3, and the upper part thereof is in contact with the sealing substrate 30. The desiccant 32 is disposed so as to surround the periphery of the light emitting region 1 </ b> A together with the opening H <b> 3, and is accommodated in a sealed space surrounded by the element substrate 20, the sealing substrate 30, and the bonding member 31. The desiccant 32 may be formed for each opening H3, or a common long and thin line desiccant may be formed for a plurality of openings H3 arranged in one direction.

乾燥剤32は、封止空間内の雰囲気下で吸湿効果を発揮するものであれば、特に限定されることはなく種々のものが使用可能である。例えば、酸化ナトリウム(NaO)、酸化カリウム(KO)、酸化カルシウム(CaO)、酸化バリウム(BaO)、酸化マグネシウム(MgO)、酸化ストロンチウム(SrO)、硫酸リチウム(LiSO)、硫酸ナトリウム(NaSO)、硫酸カルシウム(CaSO)、硫酸マグネシウム(MgSO)、硫酸コバルト(CoSO)、硫酸ガリウム(Ga(SO)、硫酸チタン(Ti(SO)、硫酸ニッケル(NiSO)、塩化カルシウム(CaCl)、塩化マグネシウム(MgCl)、塩化ストロンチウム(SrCl)、塩化イットリウム(YCl)、塩化銅(CuCl)、フッ化セシウム(CsF)、フッ化タンタル(TaF)、フッ化ニオブ(NbF)、臭化カルシウム(CaBr)、臭化セリウム(CeBr)、臭化セレン(SeBr)、臭化バナジウム(VBr)、臭化マグネシウム(MgBr)、ヨウ化バリウム(BaI)、ヨウ化マグネシウム(MgI)、過塩素酸バリウム(Ba(ClO)、過塩素酸マグネシウム(Mg(ClO)等が挙げられる。 The desiccant 32 is not particularly limited as long as it exhibits a hygroscopic effect under an atmosphere in the sealed space, and various kinds of desiccants can be used. For example, sodium oxide (Na 2 O), (O K 2) potassium oxide, calcium oxide (CaO), barium oxide (BaO), magnesium oxide (MgO), strontium oxide (SrO), lithium sulfate (Li 2 SO 4) , Sodium sulfate (Na 2 SO 4 ), calcium sulfate (CaSO 4 ), magnesium sulfate (MgSO 4 ), cobalt sulfate (CoSO 4 ), gallium sulfate (Ga 2 (SO 4 ) 3 ), titanium sulfate (Ti (SO 4) 2 ), nickel sulfate (NiSO 4 ), calcium chloride (CaCl 2 ), magnesium chloride (MgCl 2 ), strontium chloride (SrCl 2 ), yttrium chloride (YCl 3 ), copper chloride (CuCl 2 ), cesium fluoride ( CsF), tantalum fluoride (TaF 5 ), niobium fluoride (NbF) 5 ), calcium bromide (CaBr 2 ), cerium bromide (CeBr 3 ), selenium bromide (SeBr 4 ), vanadium bromide (VBr 2 ), magnesium bromide (MgBr 2 ), barium iodide (BaI 2 ) , Magnesium iodide (MgI 2 ), barium perchlorate (Ba (ClO 4 ) 2 ), magnesium perchlorate (Mg (ClO 4 ) 2 ), and the like.

乾燥剤32は、必要に応じて、封止基板30の発光領域1Aと対向する面に形成しても良い。この場合、発光領域1Aの周囲に十分な厚みの乾燥剤32が形成されているため、発光領域1Aと対向する面に配置する乾燥剤の厚みは必要最小限に抑えることができる。特に、本実施形態のラインヘッド1では、乾燥剤32が素子基板20と封止基板30との双方に密着し、接合部材31と発光領域1Aとの間を隔離するように形成されているため、接合領域からの水分の浸入が効果的に抑制される。そのため、発光領域1Aと対向する面に配置する乾燥剤を完全に省略することもでき、この場合、トップエミッション型の有機EL装置に適用した場合に、封止基板30側からの光の取り出し効率を最大限高めることができる。   You may form the desiccant 32 in the surface facing the light emission area | region 1A of the sealing substrate 30 as needed. In this case, since the desiccant 32 having a sufficient thickness is formed around the light emitting region 1A, the thickness of the desiccant disposed on the surface facing the light emitting region 1A can be minimized. In particular, in the line head 1 of the present embodiment, the desiccant 32 is formed so as to be in close contact with both the element substrate 20 and the sealing substrate 30 and to isolate the bonding member 31 from the light emitting region 1A. Intrusion of moisture from the joining region is effectively suppressed. Therefore, the desiccant disposed on the surface facing the light emitting region 1A can be completely omitted. In this case, when applied to a top emission type organic EL device, the light extraction efficiency from the sealing substrate 30 side Can be maximized.

無機絶縁膜16上には、発光領域1A及び乾燥剤32を内側に囲む枠状の接合部材31が形成されている。接合部材31は、エポキシ樹脂やガラスフリット等からなり、接合部材31を介して素子基板20と封止基板30とが接合されている。   On the inorganic insulating film 16, a frame-shaped bonding member 31 that surrounds the light emitting region 1 </ b> A and the desiccant 32 is formed. The bonding member 31 is made of epoxy resin, glass frit, or the like, and the element substrate 20 and the sealing substrate 30 are bonded via the bonding member 31.

図3〜図6は、ラインヘッド1の製造方法の一例を示す工程図である。まず、図3に示すように、公知の手法を用いて、基板10上に回路部11、無機絶縁膜13、有機絶縁膜14、画素電極15を形成する。そして、有機絶縁膜14上に、画素電極15を覆って無機材料膜16Aを形成し、無機材料膜16A上にフォトレジストMを形成する。フォトレジストMには、画素電極15上及び画素電極15の非形成領域上(発光領域と接合部材との間の位置)に開口部H4,H5が形成されている。   3 to 6 are process diagrams showing an example of a method for manufacturing the line head 1. First, as shown in FIG. 3, the circuit portion 11, the inorganic insulating film 13, the organic insulating film 14, and the pixel electrode 15 are formed on the substrate 10 using a known method. Then, an inorganic material film 16A is formed on the organic insulating film 14 so as to cover the pixel electrode 15, and a photoresist M is formed on the inorganic material film 16A. Openings H4 and H5 are formed in the photoresist M on the pixel electrode 15 and on the non-formation region of the pixel electrode 15 (position between the light emitting region and the bonding member).

次に、図4に示すように、フォトレジストMをマスクとして無機材料膜16Aをウェットエッチングし、画素電極15上及び画素電極15の非形成領域上に開口部H2,H3を有する無機絶縁膜16を形成する。続いて、有機絶縁膜14を加熱し、有機絶縁膜14に含まれている水分を放出する。例えば、ドライエアー雰囲気で、有機絶縁膜14を約150〜250℃に加熱して、約5〜120分間保持する。これにより、有機絶縁膜14に含まれている水分が無機絶縁膜16の開口部H3を通って外部に放出される。   Next, as shown in FIG. 4, the inorganic material film 16 </ b> A is wet-etched using the photoresist M as a mask, and the inorganic insulating film 16 having openings H <b> 2 and H <b> 3 on the pixel electrode 15 and the non-formation region of the pixel electrode 15. Form. Subsequently, the organic insulating film 14 is heated to release moisture contained in the organic insulating film 14. For example, the organic insulating film 14 is heated to about 150 to 250 ° C. in a dry air atmosphere and held for about 5 to 120 minutes. As a result, moisture contained in the organic insulating film 14 is released to the outside through the opening H3 of the inorganic insulating film 16.

次に、図5に示すように、公知の手法を用いて、開口部H2に露出した画素電極15上に有機発光層17と共通電極18を形成し、有機EL素子19を形成する。   Next, as shown in FIG. 5, the organic light emitting layer 17 and the common electrode 18 are formed on the pixel electrode 15 exposed to the opening H <b> 2 using a known method, and the organic EL element 19 is formed.

次に、図6に示すように、有機EL素子19が形成された素子基板20と、接合部材31及び乾燥剤32が付着した封止基板30とを対向配置し、乾燥剤32と開口部H3とを位置決めしつつ、接合部材31によって素子基板20と封止基板30とを接合する。このとき、乾燥剤32の厚みは、最終的に得られる封止空間のギャップ(封止基板30と開口部H3に露出した有機絶縁膜14との間の間隔)よりも厚く形成しておく。こうすることで、封止基板30を素子基板20上に加圧したときに、乾燥剤32が押しつぶされて開口部H3全体を覆うと共に、開口部H3内に露出した有機絶縁膜14と密着する。   Next, as shown in FIG. 6, the element substrate 20 on which the organic EL element 19 is formed and the sealing substrate 30 to which the bonding member 31 and the desiccant 32 are attached are arranged to face each other, and the desiccant 32 and the opening H <b> 3. The element substrate 20 and the sealing substrate 30 are bonded to each other by the bonding member 31. At this time, the desiccant 32 is formed thicker than the gap of the finally obtained sealing space (interval between the sealing substrate 30 and the organic insulating film 14 exposed at the opening H3). Thus, when the sealing substrate 30 is pressed onto the element substrate 20, the desiccant 32 is crushed to cover the entire opening H 3 and to be in close contact with the organic insulating film 14 exposed in the opening H 3. .

乾燥剤32の形成方法としては、真空蒸着法、スピンコート法、インクジェット法等の公知の手法を用いることができる。シート状の乾燥剤を封止基板30に接着してもよい。この場合、封止基板30に溝を設け、この溝に接着剤を用いて乾燥剤を固定することにより、十分な厚みの乾燥剤を形成することができる。   As a method for forming the desiccant 32, a known method such as a vacuum deposition method, a spin coating method, or an ink jet method can be used. A sheet-like desiccant may be adhered to the sealing substrate 30. In this case, a desiccant having a sufficient thickness can be formed by providing a groove in the sealing substrate 30 and fixing the desiccant to the groove using an adhesive.

本実施形態のラインヘッド1によれば、無機絶縁膜16の一部に開口部H3が形成されているので、有機絶縁膜14からの水分の放出が無機絶縁膜16によって妨げられることがない。そのため、開口部H3を介して有機絶縁膜14に含まれている水分を容易に放出することができる。また、外部からの水分の浸入は乾燥剤32によって防止されるため、製品出荷後に開口部H3を介して水分が浸入することもない。さらに、封止基板30で発光部を封止した後において、有機絶縁膜14中の水分を乾燥剤32によって吸収することができるため、例えば、製品出荷前の信頼性試験において加熱処理を行った場合でも、ラインヘッド1に有機絶縁膜14の膜剥がれや、それによるダークスポットの発生等が生じることはない。したがって、長寿命で信頼性に優れたラインヘッド1が提供できる。   According to the line head 1 of the present embodiment, since the opening H3 is formed in a part of the inorganic insulating film 16, release of moisture from the organic insulating film 14 is not hindered by the inorganic insulating film 16. Therefore, moisture contained in the organic insulating film 14 can be easily released through the opening H3. In addition, since the entry of moisture from the outside is prevented by the desiccant 32, moisture does not enter through the opening H3 after product shipment. Furthermore, since the moisture in the organic insulating film 14 can be absorbed by the desiccant 32 after sealing the light emitting part with the sealing substrate 30, for example, heat treatment was performed in a reliability test before product shipment. Even in such a case, the film peeling of the organic insulating film 14 on the line head 1 and the occurrence of dark spots due to the film peeling do not occur. Therefore, it is possible to provide the line head 1 having a long life and excellent reliability.

また、無機絶縁膜16の開口部H3が発光領域1Aの外側に配置されているため、例えば発光領域1Aの内部(すなわち、画素電極15間の領域)に開口部H3を形成する場合に比べて、開口部H3の大きさやレイアウトを自由に設計することができる。また、乾燥剤32が発光領域1Aの周囲を囲むように配置されるため、乾燥剤32の量を多くすることができ、素子基板20と封止基板30との接合部から侵入する水分を効果的に捕捉することができる。そのため、例えばトップエミッション構造のラインヘッドに適用した場合には、発光領域1Aと重なる部分に配置される乾燥剤を薄くすることができ、或いは、完全に省略することにより、封止基板30側からの光の取り出し効率を向上させることができる。   Further, since the opening H3 of the inorganic insulating film 16 is disposed outside the light emitting region 1A, for example, compared to the case where the opening H3 is formed inside the light emitting region 1A (that is, the region between the pixel electrodes 15). The size and layout of the opening H3 can be freely designed. Further, since the desiccant 32 is disposed so as to surround the light emitting region 1A, the amount of the desiccant 32 can be increased, and moisture entering from the joint portion between the element substrate 20 and the sealing substrate 30 is effective. Can be captured. Therefore, for example, when applied to a line head having a top emission structure, the desiccant disposed in the portion overlapping the light emitting region 1A can be thinned, or can be omitted completely from the sealing substrate 30 side. The light extraction efficiency can be improved.

以上、有機EL装置の一例としてラインヘッドを説明したが、本発明はラインヘッドに限らず、有機ELディスプレイ等、種々の有機EL装置に適用可能である。有機EL装置の構成や形状も上述のものに限定されず、本発明の主旨から逸脱しない範囲において設計要求等に基づき種々変更可能である。   Although the line head has been described as an example of the organic EL device, the present invention is not limited to the line head, and can be applied to various organic EL devices such as an organic EL display. The configuration and shape of the organic EL device are not limited to those described above, and various changes can be made based on design requirements and the like without departing from the gist of the present invention.

[電子機器]
図7は、本発明の有機EL装置を備えた電子機器の一例である画像形成装置1000の概略図である。画像形成装置1000は、ラインヘッド1を露光手段として組み込んだラインヘッドモジュール1003を備えている。ラインヘッドモジュール1003は、複数の有機EL素子を整列配置したラインヘッド1と、ラインヘッド1からの光を正立等倍結像させるレンズ素子を整列配置したSLアレイ(レンズアレイ)1001と、ラインヘッド1およびSLアレイ1001の外周部を保持するヘッドケース1002と、を備えている。ラインヘッド1とSLアレイアレイ1001とは、互いにアライメントされた状態でヘッドケース1002に保持されており、これによってSLアレイ1001は、ラインヘッド1からの光を感光体ドラム1004に正立等倍結像させるようになっている。本実施形態の画像形成装置1000は、上述した本発明に係るラインヘッド1を備えているため、ダークスポットの発生を抑制した信頼性の高い画像形成装置となる。
[Electronics]
FIG. 7 is a schematic diagram of an image forming apparatus 1000 which is an example of an electronic apparatus including the organic EL device of the present invention. The image forming apparatus 1000 includes a line head module 1003 in which the line head 1 is incorporated as an exposure unit. The line head module 1003 includes a line head 1 in which a plurality of organic EL elements are arranged and arranged, a SL array (lens array) 1001 in which lens elements that form images of the light from the line head 1 in an erecting equal magnification are arranged, and a line A head case 1002 that holds the outer periphery of the head 1 and the SL array 1001. The line head 1 and the SL array array 1001 are held in the head case 1002 in an aligned state. As a result, the SL array 1001 concatenates the light from the line head 1 to the photosensitive drum 1004 at an equal magnification. It is supposed to be imaged. Since the image forming apparatus 1000 of the present embodiment includes the above-described line head 1 according to the present invention, the image forming apparatus 1000 is a highly reliable image forming apparatus that suppresses the occurrence of dark spots.

1…ラインヘッド(有機EL装置)、1A…発光領域、14…有機絶縁膜、15…画素電極、16…無機絶縁膜、16A…無機材料膜、17…有機発光層、18…共通電極、19…有機EL素子、20…素子基板、30…封止基板、31…接合部材、32…乾燥剤、1000…画像形成装置(電子機器)、H1,H2,H3,H4,H5…開口部 DESCRIPTION OF SYMBOLS 1 ... Line head (organic EL apparatus), 1A ... Light emission area, 14 ... Organic insulating film, 15 ... Pixel electrode, 16 ... Inorganic insulating film, 16A ... Inorganic material film, 17 ... Organic light emitting layer, 18 ... Common electrode, 19 DESCRIPTION OF SYMBOLS ... Organic EL element, 20 ... Element substrate, 30 ... Sealing substrate, 31 ... Joining member, 32 ... Desiccant, 1000 ... Image forming apparatus (electronic device), H1, H2, H3, H4, H5 ... Opening

Claims (7)

素子基板に形成された有機絶縁膜と、前記有機絶縁膜上に形成された画素電極と、前記画素電極上に形成された有機発光層と、前記素子基板において前記有機絶縁膜が露出した部位を覆って形成された無機絶縁膜と、前記無機絶縁膜上に形成された枠状の接合部材を介して前記素子基板と接合された封止基板と、を備えた有機EL装置であって、
前記接合部材に囲まれた領域の内側に、前記有機絶縁膜の一部を露出させる前記無機絶縁膜の開口部が設けられ、前記開口部に露出した前記有機絶縁膜を覆って乾燥剤が設けられていることを特徴とする有機EL装置。
An organic insulating film formed on the element substrate; a pixel electrode formed on the organic insulating film; an organic light emitting layer formed on the pixel electrode; and a portion where the organic insulating film is exposed on the element substrate. An organic EL device comprising: an inorganic insulating film formed to cover; and a sealing substrate bonded to the element substrate via a frame-shaped bonding member formed on the inorganic insulating film,
An opening of the inorganic insulating film that exposes a part of the organic insulating film is provided inside a region surrounded by the bonding member, and a desiccant is provided to cover the organic insulating film exposed to the opening. An organic EL device characterized by that.
前記接合部材に囲まれた領域の内側に、複数の前記画素電極が形成されてなる発光領域が設けられ、前記発光領域の周囲を囲んで1つ又は複数の前記開口部が形成されていることを特徴とする請求項1に記載の有機EL装置。   A light emitting region in which a plurality of the pixel electrodes are formed is provided inside a region surrounded by the bonding member, and one or a plurality of the openings are formed surrounding the light emitting region. The organic EL device according to claim 1. 前記乾燥剤は、前記開口部を覆って前記発光領域の周囲を囲むと共に、前記封止基板と前記無機絶縁膜の開口部に露出した前記有機絶縁膜との双方に密着していることを特徴とする請求項2に記載の有機EL装置。   The desiccant covers the opening and surrounds the periphery of the light emitting region, and is in close contact with both the sealing substrate and the organic insulating film exposed at the opening of the inorganic insulating film. The organic EL device according to claim 2. 素子基板に形成された有機絶縁膜と、前記有機絶縁膜上に形成された画素電極と、前記画素電極上に形成された有機発光層と、前記素子基板において前記有機絶縁膜が露出した部位を覆って形成された無機絶縁膜と、前記無機絶縁膜上に形成された枠状の接合部材を介して前記素子基板と接合された封止基板と、を備えた有機EL装置の製造方法であって、
前記有機発光層の形成前に、前記接合部材に囲まれた領域の内側に、前記有機絶縁膜の一部を露出させる前記無機絶縁膜の開口部を形成し、前記有機絶縁膜を加熱することにより、前記開口部を介して前記有機絶縁膜に含まれている水分を放出する工程を含み、
前記有機発光層の形成後、前記封止基板を前記素子基板に接合する前又は接合する際に、前記無機絶縁膜の開口部に露出した前記有機絶縁膜を覆って乾燥剤を配置する工程を含むことを特徴とする有機EL装置の製造方法。
An organic insulating film formed on the element substrate; a pixel electrode formed on the organic insulating film; an organic light emitting layer formed on the pixel electrode; and a portion where the organic insulating film is exposed on the element substrate. A manufacturing method of an organic EL device comprising: an inorganic insulating film formed to cover; and a sealing substrate bonded to the element substrate via a frame-shaped bonding member formed on the inorganic insulating film. And
Before forming the organic light emitting layer, forming an opening of the inorganic insulating film to expose a part of the organic insulating film inside a region surrounded by the bonding member, and heating the organic insulating film A step of releasing moisture contained in the organic insulating film through the opening,
A step of disposing a desiccant over the organic insulating film exposed in the opening of the inorganic insulating film after the formation of the organic light emitting layer and before or when the sealing substrate is bonded to the element substrate. A method for producing an organic EL device, comprising:
前記無機絶縁膜を形成する工程は、前記画素電極を覆って前記有機絶縁膜上に無機材料膜を形成する工程と、前記無機材料膜の一部を除去して前記画素電極の一部を露出させる開口部を形成する工程と、を含み、
前記有機絶縁膜の一部を露出させる前記開口部の形成工程は、前記画素電極の一部を露出させる開口部の形成工程と同時に行われることを特徴とする請求項4に記載の有機EL装置の製造方法。
The step of forming the inorganic insulating film includes a step of forming an inorganic material film on the organic insulating film so as to cover the pixel electrode, and a part of the inorganic material film is removed to expose a part of the pixel electrode. Forming an opening to be made, and
5. The organic EL device according to claim 4, wherein the step of forming the opening exposing a part of the organic insulating film is performed simultaneously with the step of forming the opening exposing a part of the pixel electrode. Manufacturing method.
前記封止基板と前記素子基板とを接合する工程は、前記乾燥剤が付着した前記封止基板を前記素子基板上に配置し、前記乾燥剤を前記無機絶縁膜の開口部に露出した前記有機絶縁膜に密着させる工程を含むことを特徴とする請求項4に記載の有機EL装置の製造方法。   The step of bonding the sealing substrate and the element substrate includes arranging the sealing substrate to which the desiccant is attached on the element substrate, and exposing the desiccant to the opening of the inorganic insulating film. The method for manufacturing an organic EL device according to claim 4, further comprising a step of closely contacting the insulating film. 請求項1〜3のいずれか1項に記載の有機EL装置を備えていることを特徴とする電子機器。   An electronic apparatus comprising the organic EL device according to claim 1.
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