JP2010157526A - Substrate mounting device with alignment function, and film forming device including substrate mounting device - Google Patents

Substrate mounting device with alignment function, and film forming device including substrate mounting device Download PDF

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Publication number
JP2010157526A
JP2010157526A JP2008333259A JP2008333259A JP2010157526A JP 2010157526 A JP2010157526 A JP 2010157526A JP 2008333259 A JP2008333259 A JP 2008333259A JP 2008333259 A JP2008333259 A JP 2008333259A JP 2010157526 A JP2010157526 A JP 2010157526A
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substrate
sides
mounting table
shaft portion
alignment function
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JP2008333259A
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Japanese (ja)
Inventor
Hiroko Kato
裕子 加藤
Masashi Kikuchi
正志 菊池
Atsuji Kamezaki
厚治 亀崎
Tomohiko Okayama
智彦 岡山
Eisuke Hori
英介 堀
Yoshio Shimizu
美穂 清水
Keiko Abe
慶子 阿部
Keisuke Shimoda
圭介 下田
Kenji Eto
謙次 江藤
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Ulvac Inc
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Ulvac Inc
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Priority to JP2008333259A priority Critical patent/JP2010157526A/en
Publication of JP2010157526A publication Critical patent/JP2010157526A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a durable and inexpensive substrate placing device with an alignment function, and a film forming device including the substrate placing device. <P>SOLUTION: Through-holes 9 are arranged on four sides of a placing table 12. A cylinder part 3 and a shaft part 4 in which the cylinder part 3 is inserted are arranged in the through-hole 9. A flange part 8 is arranged on an upper end of the shaft part 4. A substrate 20 positioned above the placing table 12 is put on the flange part 8 by raising the cylinder part 3 and shaft part 4. The shaft parts 4 of the two sides out of the four sides are inclined by an inclination mechanism toward the shaft parts 4, which are other two sides for positioning, to press the substrate 20 and make in contact with a side surface of the shaft parts 4 of the sides for positioning to position the substrate. A camera and an XYθ stage are not necessary and accurate positioning can be achieved. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は基板載置装置に関し、特に、アラインメント機能を有する基板載置装置と、その基板載置装置が配置された成膜装置に関する。   The present invention relates to a substrate mounting apparatus, and more particularly to a substrate mounting apparatus having an alignment function and a film forming apparatus in which the substrate mounting apparatus is arranged.

パターニングされたフォトレジストのマスクとエッチングによって、薄膜を所望のパターンに成形するフォトリソグラフに替え、成膜の際に、成膜対象物の表面にシャドウマスクを配置し、シャドウマスクによって成膜物質の陰を形成して所望のパターンの薄膜を成膜する技術が注目されている。   Instead of photolithography that forms a thin film into a desired pattern by patterning a photoresist mask and etching, a shadow mask is placed on the surface of the film formation target during film formation. A technique for forming a thin film having a desired pattern by forming a shade has attracted attention.

シャドウマスクに対して成膜対象物を位置合わせするために、カメラとXYθステージ等の位置合わせ装置を用いることも可能であるが、サブマイクロンオーダーのフォトリソグラフのような精度はシャドウマスクには要求されないので、低コストの装置で要求精度を満たす装置の開発が求められている。   It is possible to use an alignment device such as a camera and an XYθ stage to align the film formation target with the shadow mask, but accuracy such as sub-micron order photolithography is required for the shadow mask. Therefore, there is a demand for development of a device that satisfies the required accuracy with a low-cost device.

本発明は上記要求に応じて創作された基板載置装置であり、簡単な構造で使用に対する耐力が高く、要求精度を確保できる基板載置装置と、その基板載置装置を用いた成膜装置に関する。   The present invention is a substrate mounting apparatus created in response to the above requirements, a substrate mounting apparatus that has a simple structure, has high durability against use, and can ensure the required accuracy, and a film forming apparatus using the substrate mounting apparatus About.

上記課題を解決するため、本発明は、四辺形の基板が載置される載置台と、前記載置台上の、前記基板よりも大きな四辺形の各四辺の位置で、それぞれ前記載置台を貫通する貫通孔と、前記貫通孔にそれぞれ挿通され、上端に基板を載置可能な筒部と、前記各筒部に挿通され、上端が前記貫通孔と前記筒部の上端よりも上方に位置する軸部と、前記各軸部の前記各筒部よりも下方に形成され、前記各筒部を乗せた台座部と、前記台座部を乗せ、前記載置台に対して昇降移動可能に構成され、前記筒部を前記軸部と一緒に昇降移動させる昇降部材と、前記昇降部材が上昇すると、前記四辺のうち互いに直行する二辺に位置する前記軸部を、前記載置台の内側方向に傾ける傾斜機構と、が設けられたアラインメント機能付き基板載置装置である。
また、本発明は、前記四辺のうち、前記二辺とは異なる残りの二辺のうちの一辺には、前記軸部が二個以上配置されたアラインメント機能付き基板載置装置である。
また、本発明は、前記傾斜機構は、前記昇降部材の上昇により変形し、変形が復元しようとする下方向きの復元力を、前記台座部の前記軸部よりも前記載置台の内側に位置する部分に印加する第一のバネ部材を有するアラインメント機能付き基板載置装置である。
また、本発明は、前記バネ部材は、前記載置台裏面に設けられ、前記昇降部材が上昇すると前記台座部と接触して曲げられる板バネであるアラインメント機能付き基板載置装置である。
また、本発明は、前記軸部が配置された前記四辺のうち、少なくとも直交する二辺に位置する前記軸部の上端に、前記載置台の内側に向かう斜面が設けられたアラインメント機能付き基板載置装置である。
また、本発明は、前記斜面を有する前記軸部の上端は円錐形に形成され、円錐の側面が前記斜面にされたアラインメント機能付き基板載置装置である。
また、本発明は、前記筒部の上端には、水平方向に拡がるフランジ部を有し、前記基板は前記フランジ部上に載置されるアラインメント機能付き基板載置装置である。
また、本発明は、前記昇降部材が所定位置よりも上昇すると変形し、変形が復元しようとする下向きの復元力を、前記傾斜機構で傾斜されない前記軸部の前記台座部に印加するアラインメント機能付き基板載置装置である。
また、本発明は、載置台と、前記載置台上の四辺形の少なくとも直交する二辺の位置に形成された貫通孔と、前記二辺の残りの他の二辺の位置に設けられ、基板を定位置で停止させる位置決め部材と、前記貫通孔にそれぞれ挿通され、上端に基板を載置可能な筒部と、前記各筒部に挿通され、上端が前記貫通孔と前記筒部の上端よりも上方に位置する軸部と、前記各軸部の前記各筒部よりも下方に形成され、前記各筒部を乗せた台座部と、前記台座部を乗せ、前記載置台に対して昇降移動可能に構成され、前記筒部を前記軸部と一緒に昇降移動させる昇降部材と、前記昇降部材が上昇すると、前記軸部を、前記載置台の内側方向に傾ける傾斜機構と、を有するアラインメント機能付き基板載置装置である。
また、本発明は、上記いずれかの基板載置装置と、前記基板載置装置の上方に位置するシャドウマスクを載置するマスク載置装置と、前記マスク載置装置の上方に位置する成膜源と、前記基板載置装置と前記マスク載置装置と前記成膜源が配置された真空槽と、前記昇降部材を昇降移動させる動力機構とを有する成膜装置である。
In order to solve the above problems, the present invention penetrates the mounting table at each of the four sides of the mounting table on which the quadrangular substrate is mounted and the quadrilateral larger than the substrate on the mounting table. A through-hole, a cylindrical portion inserted through the through-hole and capable of placing a substrate on the upper end, and inserted through the cylindrical portions, with the upper end positioned above the upper end of the through-hole and the cylindrical portion. A shaft part, formed below the tube part of each shaft part, a pedestal part on which the tube part is placed, and the pedestal part are placed, and is configured to be movable up and down with respect to the mounting table, A tilt member that tilts the shaft portion positioned on two sides of the four sides perpendicular to each other when the lift member moves up and down to move the tube portion up and down together with the shaft portion. A substrate mounting apparatus with an alignment function provided with a mechanism.
Moreover, this invention is a board | substrate mounting apparatus with an alignment function by which two or more said axial parts are arrange | positioned in one side of the remaining two sides different from the said two sides among the said four sides.
Further, according to the present invention, the tilt mechanism is deformed by the ascending / descending member ascending, and a downward restoring force to be restored is located on the inner side of the mounting table than the shaft portion of the pedestal portion. It is the board | substrate mounting apparatus with an alignment function which has the 1st spring member applied to a part.
Moreover, this invention is a board | substrate mounting apparatus with an alignment function which is a leaf | plate spring which the said spring member is provided in the said mounting base back surface, and is bent in contact with the said base part when the said raising / lowering member raises.
Further, the present invention provides a substrate mounting with an alignment function in which an inclined surface directed to the inside of the mounting table is provided at an upper end of the shaft portion located on at least two orthogonal sides among the four sides on which the shaft portion is disposed. Device.
Further, the present invention is the substrate mounting apparatus with an alignment function, wherein an upper end of the shaft portion having the inclined surface is formed in a conical shape, and a side surface of the cone is formed into the inclined surface.
Moreover, this invention has a flange part extended in a horizontal direction in the upper end of the said cylinder part, and the said board | substrate is a board | substrate mounting apparatus with an alignment function mounted on the said flange part.
In addition, the present invention has an alignment function that applies a downward restoring force, which is deformed when the elevating member is raised above a predetermined position, and is not inclined by the tilt mechanism, to the pedestal portion that is not inclined by the tilt mechanism. It is a substrate mounting device.
Further, the present invention provides a mounting table, a through-hole formed in at least two orthogonal positions of the quadrilateral on the mounting table, and a position on the other two sides of the two sides, A positioning member that stops at a fixed position, a cylindrical portion that is inserted through the through-hole and on which the substrate can be placed, and an upper end that is inserted into each cylindrical portion from the through-hole and the upper end of the cylindrical portion. A shaft portion positioned above, a pedestal portion on which each cylindrical portion is placed, and a pedestal portion on which each cylindrical portion is placed, and the pedestal portion is placed and moved up and down with respect to the mounting table. Alignment function comprising: an elevating member configured to move up and down together with the shaft portion, and an inclination mechanism that tilts the shaft portion inward of the mounting table when the elevating member is raised. This is a substrate mounting apparatus.
In addition, the present invention provides any one of the above-described substrate placement apparatuses, a mask placement apparatus for placing a shadow mask located above the substrate placement apparatus, and a film formation located above the mask placement apparatus. The film forming apparatus includes a source, a substrate mounting apparatus, the mask mounting apparatus, a vacuum chamber in which the film forming source is disposed, and a power mechanism for moving the lifting member up and down.

載置台上方のシャドウマスクは、基板が位置合わせ位置に配置されたときに、基板の表面の所定の位置に薄膜を形成できるように配置されており、シャドウマスクと、位置合わせ位置の基板とは位置合わせがされた状態になり、位置精度の高い薄膜を形成することができる。   The shadow mask above the mounting table is arranged so that a thin film can be formed at a predetermined position on the surface of the substrate when the substrate is arranged at the alignment position. The shadow mask and the substrate at the alignment position are The film is aligned, and a thin film with high positional accuracy can be formed.

傾斜装置には弾力性があり、また、位置決め用の辺に配置された軸部にもバネ部材が設けられているから、基板を移動させて位置決めする際に基板が破損することはない。   The tilting device is elastic, and a spring member is also provided on the shaft portion arranged on the positioning side, so that the substrate is not damaged when the substrate is moved and positioned.

図1(a)の符号10は、本発明の成膜装置を示している。この成膜装置10は、真空槽11と、基板載置装置2と、マスク載置装置13を有している。
基板載置装置2は載置台12を有している。マスク載置装置13と載置台12とは水平に配置されている。
マスク載置装置13は、中央部分に開口が形成されており、マスク載置装置13にシャドウマスク14を配置すると、この開口から鉛直下方方向にシャドウマスク14が露出できるようにされている。
マスク載置装置13上にはシャドウマスク14が乗せられている。
Reference numeral 10 in FIG. 1A denotes a film forming apparatus of the present invention. The film forming apparatus 10 includes a vacuum chamber 11, a substrate mounting device 2, and a mask mounting device 13.
The substrate mounting device 2 has a mounting table 12. The mask mounting device 13 and the mounting table 12 are arranged horizontally.
The mask mounting device 13 has an opening at the center portion, and when the shadow mask 14 is arranged in the mask mounting device 13, the shadow mask 14 can be exposed vertically downward from the opening.
A shadow mask 14 is placed on the mask placing device 13.

基板に薄膜を形成する場合、真空排気系23によって真空槽11の内部を真空排気し、シャドウマスク14をマスク載置装置13と共に載置台12から離間して上方に移動させ、真空槽11内に基板を搬入し、シャドウマスク14と載置台12の間に静止させ、載置台12を上方に移動させて載置台12上に基板を乗せ、更に上昇させて基板をシャドウマスク14に密着させる。   When forming a thin film on the substrate, the inside of the vacuum chamber 11 is evacuated by the evacuation system 23, the shadow mask 14 is moved away from the mounting table 12 together with the mask mounting device 13, and moved into the vacuum chamber 11. The substrate is loaded, and is stationary between the shadow mask 14 and the mounting table 12, the mounting table 12 is moved upward to place the substrate on the mounting table 12, and further lifted to bring the substrate into close contact with the shadow mask 14.

図1(b)はその状態を示しており、基板20が載置台12上に配置され、シャドウマスク14に密着されている。
ここで、この成膜装置10は、ターゲットを有するスパッタリング装置や、原料ガスを導入するシャワープレートを有するCVD装置等の、真空雰囲気中で薄膜を形成する装置であり、ターゲットやシャワープレートなどの成膜源15が、真空槽11の天井付近に配置され、成膜源15の下方位置に、シャドウマスク14と基板20が上方からこの順序で配置されている。
FIG. 1B shows this state, where the substrate 20 is placed on the mounting table 12 and is in close contact with the shadow mask 14.
Here, the film forming apparatus 10 is an apparatus for forming a thin film in a vacuum atmosphere such as a sputtering apparatus having a target or a CVD apparatus having a shower plate for introducing a source gas. The film source 15 is disposed near the ceiling of the vacuum chamber 11, and the shadow mask 14 and the substrate 20 are disposed in this order from above at a position below the film formation source 15.

図2は、載置台12と、マスク載置装置13と、シャドウマスク14の概略斜視図である。
シャドウマスク14には、一乃至複数の開口21が形成されており、ターゲットから飛び出したスパッタリング粒子やシャワープレートから放出された原料ガスなどの、成膜源15から供給された成膜物質が開口21を通過し、基板20表面に到達すると、開口21の形成に従って基板20表面に薄膜が形成される。
このとき、シャドウマスク14と基板20とが位置合わせされていると、薄膜を、基板20上の所定位置に形成することができる。
FIG. 2 is a schematic perspective view of the mounting table 12, the mask mounting device 13, and the shadow mask 14.
One or a plurality of openings 21 are formed in the shadow mask 14, and a film formation material supplied from the film formation source 15 such as sputtering particles jumping out from the target or a source gas discharged from the shower plate is formed in the openings 21. , And reaches the surface of the substrate 20, a thin film is formed on the surface of the substrate 20 according to the formation of the opening 21.
At this time, if the shadow mask 14 and the substrate 20 are aligned, the thin film can be formed at a predetermined position on the substrate 20.

本発明の位置合わせ方法を説明する。
載置台12の平面図を図3に示し、基板20の搬入前の載置台12の縦方向切断断面図を図6(a)に示す。
載置台12上には、基板20よりも大きな長方形又は正方形の四辺形28の四辺に沿って、貫通孔9が形成されており、各貫通孔9には筒部3が鉛直に挿通されている。ここでは、その四辺形28は、各軸部4の中心軸線を通り、段差を形成する四辺形として示されている。
The alignment method of the present invention will be described.
A plan view of the mounting table 12 is shown in FIG. 3, and a longitudinal sectional view of the mounting table 12 before the substrate 20 is carried in is shown in FIG.
On the mounting table 12, through holes 9 are formed along the four sides of a rectangular or square quadrilateral 28 larger than the substrate 20, and the cylindrical portion 3 is vertically inserted into each through hole 9. . Here, the quadrilateral 28 is shown as a quadrilateral that passes through the central axis of each shaft portion 4 and forms a step.

各筒部3の上端は水平方向に拡がるフランジ部8が形成されている、四辺に位置する筒部3のフランジ部8は同じ高さに位置しており、フランジ部8の幅は、フランジ部8の端部の載置台12の内側に向く部分が、基板20よりも小さな四辺形26に接するようになっている。従って、フランジ部8上に基板を乗せることができる。
各筒部3には軸部4が鉛直に挿通されており、軸部4上端は、筒部3の上端よりも上方に突き出されている。
The upper end of each cylinder part 3 is formed with a flange part 8 that expands in the horizontal direction. The flange part 8 of the cylinder part 3 located on the four sides is located at the same height, and the width of the flange part 8 is the flange part. A portion facing the inside of the mounting table 12 at the end of 8 is in contact with a quadrangle 26 smaller than the substrate 20. Therefore, the substrate can be placed on the flange portion 8.
A shaft portion 4 is vertically inserted into each tube portion 3, and an upper end of the shaft portion 4 protrudes above the upper end of the tube portion 3.

各軸部4の下端には、軸部4の直径よりも大きな台座部5が設けられており、筒部3は、台座部5上から離間できるように台座部5上に乗せられている。
載置台12の下方には、昇降部材18が配置されている。真空槽11の外部には上下移動機構が配置されている。
A pedestal portion 5 larger than the diameter of the shaft portion 4 is provided at the lower end of each shaft portion 4, and the cylindrical portion 3 is placed on the pedestal portion 5 so as to be separated from the pedestal portion 5.
Below the mounting table 12, an elevating member 18 is disposed. A vertical movement mechanism is disposed outside the vacuum chamber 11.

昇降部材18は、真空槽11の底面を気密に挿通された図1の昇降軸19によって上下移動機構に接続されており、上下移動機構が動作すると、昇降部材18が真空槽11の内部で真空雰囲気を維持したまま昇降移動できる。
昇降部材18の上方を向いた表面は平坦な部分があり、各軸部4の台座部5は昇降部材18の平坦な部分の上に乗せられている。昇降部材18が昇降移動すると、各軸部4と、軸部4の台座部5上の筒部3とは、一緒に昇降移動する。
The elevating member 18 is connected to the vertical movement mechanism by the elevating shaft 19 of FIG. 1 that is airtightly inserted through the bottom surface of the vacuum chamber 11, and when the vertical movement mechanism operates, the elevating member 18 is evacuated inside the vacuum chamber 11. You can move up and down while maintaining the atmosphere.
The surface facing upward of the elevating member 18 has a flat portion, and the pedestal portion 5 of each shaft portion 4 is placed on the flat portion of the elevating member 18. When the elevating member 18 moves up and down, each shaft portion 4 and the tube portion 3 on the pedestal portion 5 of the shaft portion 4 move up and down together.

図6(a)は、基板20を配置する前に昇降部材18を降下させ、載置台12と、載置台12の上方のシャドウマスク14との間に隙間を形成した状態である。
各筒部3の側面は、図3の符号22で示すように、基板20よりも大きく、基板20を内側に配置可能な位置合わせ用の四辺形(22)に接触するように配置されている。
FIG. 6A shows a state in which the elevating member 18 is lowered before the substrate 20 is arranged, and a gap is formed between the mounting table 12 and the shadow mask 14 above the mounting table 12.
As shown by reference numeral 22 in FIG. 3, the side surface of each cylindrical portion 3 is larger than the substrate 20 and is disposed so as to contact a positioning quadrilateral (22) that allows the substrate 20 to be disposed inside. .

この位置合わせ用の四辺形22のうち、予め設定された位置決め用二辺22a、22bに、これも予め設定された基板20の二辺が一致したときに基板20の位置合わせがされたものと規定されており、シャドウマスク14は、位置合わせがされた基板20に対して、所望の位置に薄膜が形成されるように配置されている。   Among the quadrilaterals 22 for alignment, the substrate 20 is aligned when the two predetermined sides 20a and 22b coincide with the preset two sides of the substrate 20. The shadow mask 14 is defined so that a thin film is formed at a desired position with respect to the aligned substrate 20.

基板搬送ロボットのハンド上に基板20が乗せられ、隣室から真空槽11内にハンドが搬入され、シャドウマスク14と載置台12の間の高さであって載置台12上の位置で静止する。次いで、昇降部材18が上方に移動し、軸部4と筒部3とが一緒に持ち上げられると、軸部4と筒部3はハンドのフィンガー間を通過し、基板20よりも上方位置に軸部4の上端が突出しようとする。   The substrate 20 is placed on the hand of the substrate transfer robot, the hand is carried into the vacuum chamber 11 from the adjacent chamber, and is stationary at a position on the mounting table 12 at a height between the shadow mask 14 and the mounting table 12. Next, when the elevating member 18 moves upward and the shaft portion 4 and the tube portion 3 are lifted together, the shaft portion 4 and the tube portion 3 pass between the fingers of the hand, and the shaft 20 is positioned above the substrate 20. The upper end of the part 4 tries to protrude.

四辺に沿って配置された軸部4のうち、直交する二辺に位置する軸部4の上端には、載置台12の内側方向に向く斜面6が形成されており、基板20は、軸部4と筒部3が基板20よりも上方に突き出るときに、斜面6と接触せずにフランジ部8上に乗るか、一旦斜面6に乗り、斜面6上を滑落してフランジ部8上に乗る。
従って、基板20をフランジ部8上に載置するために、位置合わせ用の四辺形22よりも広い、軸部4の側面や頂点を結ぶ四辺形内に基板20を位置させて、軸部4及び筒部3を基板の下方から上昇させることができる。
An inclined surface 6 facing the inner side of the mounting table 12 is formed at the upper end of the shaft portion 4 located on two orthogonal sides among the shaft portions 4 arranged along the four sides. When 4 and the cylindrical portion 3 protrude above the substrate 20, they ride on the flange portion 8 without contacting the slope 6, or once ride on the slope 6 and slide down on the slope 6 and ride on the flange portion 8. .
Therefore, in order to place the substrate 20 on the flange portion 8, the substrate 20 is positioned in a quadrilateral that connects the side surfaces and apexes of the shaft portion 4 wider than the quadrangle 22 for alignment, and the shaft portion 4. And the cylinder part 3 can be raised from the downward direction of a board | substrate.

図6(b)は、基板20がフランジ部8上に乗った状態を示す側面図である。この状態では、基板20はフランジ部8上で位置合わせ用四辺形22内に配置されたことになる。この場合、各軸部4は鉛直にされており、位置合わせ用四辺形22内に配置された基板20は、最大で、四辺のうちの直交する二辺に位置する軸部4の側面と接触することはできるが、四辺に位置する全軸部4の側面に同時に接触することはできない。
この基板載置装置2は、位置決め用二辺22a、22b以外の二辺22c、22dに位置する軸部4を傾斜させる傾斜装置を有している。
FIG. 6B is a side view showing a state in which the substrate 20 is on the flange portion 8. In this state, the substrate 20 is disposed in the alignment quadrilateral 22 on the flange portion 8. In this case, each shaft portion 4 is vertical, and the substrate 20 disposed in the alignment quadrilateral 22 is in contact with the side surfaces of the shaft portion 4 that are located on two orthogonal sides at the maximum. Although it can do, it cannot touch simultaneously the side surface of all the axial parts 4 located in four sides.
The substrate mounting device 2 has a tilting device that tilts the shaft portion 4 positioned on the two sides 22c and 22d other than the positioning two sides 22a and 22b.

ここでは、傾斜装置は載置台12の裏面に設けられた板バネ7で構成されている。板バネ7は、その先端が、昇降部材18が上昇したときに、台座部5に載置台12の内側方向の部分と接触可能に配置されており、接触後、更に昇降部材18が上昇すると、板バネ7が曲げられ、その復元力によって、板バネ7の先端と接触する部分が押圧される。
その台座部5上の軸部4と、筒部3との間には隙間が形成されており、台座部5が押圧された軸部4は、載置台12の内側方向に向けて傾斜される。
Here, the tilting device is composed of a leaf spring 7 provided on the back surface of the mounting table 12. When the elevating member 18 is raised, the leaf spring 7 is disposed on the pedestal portion 5 so as to be able to come into contact with the inner side portion of the mounting table 12. After the elevating member 18 is further raised after contact, The leaf spring 7 is bent, and the portion that contacts the tip of the leaf spring 7 is pressed by the restoring force.
A gap is formed between the shaft portion 4 on the pedestal portion 5 and the cylindrical portion 3, and the shaft portion 4 against which the pedestal portion 5 is pressed is inclined toward the inner side of the mounting table 12. .

軸部4が傾斜した場合、各軸部4の側面に接触できる位置合わせ用四辺形22の大きさも小さくなり、基板20は位置合わせ用四辺形22の外側にはみ出ることはできないので、傾斜した軸部4によって基板20は押圧され、位置決め用二辺22a、22bの方向に移動する。図6(c)は基板20が押圧される状態を示している。   When the shaft portion 4 is inclined, the size of the alignment quadrilateral 22 that can come into contact with the side surface of each shaft portion 4 is also reduced, and the substrate 20 cannot protrude outside the alignment quadrilateral 22. The board | substrate 20 is pressed by the part 4, and moves to the direction of two sides 22a and 22b for positioning. FIG. 6C shows a state where the substrate 20 is pressed.

位置合わせ用四辺形22が小さくなり、その大きさが基板20の大きさと等しくなったときに、基板20の縁は四辺に位置する軸部4の側面と接触する。このとき、予め位置決め用二辺22a、22bに近接配置された基板20の二辺が、位置決め用二辺22a、22bと一致する。
そして、更に傾斜しようとすると、その軸部4により、基板20は傾斜しない軸部4に向けて押圧される。
When the alignment quadrilateral 22 becomes smaller and the size thereof becomes equal to the size of the substrate 20, the edge of the substrate 20 comes into contact with the side surface of the shaft portion 4 located on the four sides. At this time, the two sides of the substrate 20 that are disposed in proximity to the positioning two sides 22a and 22b in advance coincide with the positioning two sides 22a and 22b.
When further tilting is attempted, the shaft portion 4 presses the substrate 20 toward the shaft portion 4 that does not tilt.

位置合わせ用の二辺22a、22bに位置する軸部4も、筒部3の内周面と離間し、その間に隙間が形成されている。また、その軸部4の台座部5と載置台12の間には、バネ部材17が配置されており、板バネ7が軸部4を傾けるときにはバネ部材17も圧縮されている。基板20によって位置合わせ用の二辺22a、22bに位置する軸部4が押圧されると、その軸部4は僅かに傾き、基板20による押圧力がバネ部材17の変形によって吸収される。   The shaft portion 4 positioned on the two sides 22a and 22b for alignment is also separated from the inner peripheral surface of the cylindrical portion 3, and a gap is formed therebetween. Further, a spring member 17 is disposed between the pedestal portion 5 of the shaft portion 4 and the mounting table 12, and the spring member 17 is also compressed when the plate spring 7 tilts the shaft portion 4. When the shaft portion 4 positioned on the alignment two sides 22 a and 22 b is pressed by the substrate 20, the shaft portion 4 is slightly tilted, and the pressing force by the substrate 20 is absorbed by the deformation of the spring member 17.

その状態から元の位置に戻るように、載置台12が上昇すると(又は昇降部材18が下降すると)、板バネ7やバネ部材17の変形は復元し、基板20への押圧力は消滅し、基板20は、基板20の二辺が、位置決め用二辺22a、22bと一致した状態を維持している。この状態は、基板20が位置合わせされた状態であり、図4に示すように、基板20は、位置合わせ位置でフランジ部8に対して静止している。   When the mounting table 12 is raised (or the elevating member 18 is lowered) so as to return to the original position from that state, the deformation of the leaf spring 7 and the spring member 17 is restored, and the pressing force on the substrate 20 disappears. The substrate 20 maintains a state in which the two sides of the substrate 20 coincide with the positioning two sides 22a and 22b. This state is a state in which the substrate 20 is aligned. As shown in FIG. 4, the substrate 20 is stationary with respect to the flange portion 8 at the alignment position.

このとき、板バネ7やバネ部材17は変形を復元するときに、復元力によって台座部5を昇降部材18側に押圧するので、筒部3や軸部4が貫通孔9の縁に引っ掛かって載置台12に固定されてしまって昇降部材18から離間するようなことはない。   At this time, when the plate spring 7 and the spring member 17 are restored in deformation, the pedestal portion 5 is pressed toward the lifting member 18 by the restoring force, so that the cylindrical portion 3 and the shaft portion 4 are caught by the edge of the through hole 9. It is not fixed to the mounting table 12 and separated from the lifting member 18.

載置台12には、フランジ部8を収容する有底又は無底の溝が設けられており、載置台12がフランジ部8と同じ高さまで相対移動すると、基板20は、位置合わせされた状態で載置台12上に乗せられる。
更に、マスク載置装置13の下降や基板載置装置2の上昇により、図5の平面図及び図6(c)の側面図のように、載置台12の位置決め用二辺22a、22bに対して位置合わせがされた基板20とシャドウマスク14とが密着し、シャドウマスク14の開口21底面の基板20上に薄膜が形成される。
The mounting table 12 is provided with a bottomed or non-bottomed groove for accommodating the flange portion 8. When the mounting table 12 is relatively moved to the same height as the flange portion 8, the substrate 20 is in an aligned state. It is placed on the mounting table 12.
Further, due to the lowering of the mask placing device 13 and the raising of the substrate placing device 2, as shown in the plan view of FIG. 5 and the side view of FIG. The aligned substrate 20 and the shadow mask 14 are in close contact with each other, and a thin film is formed on the substrate 20 on the bottom surface of the opening 21 of the shadow mask 14.

以上説明したように、マスク載置装置13に配置されたシャドウマスク14は、基板20が位置合わせされたときに、基板20の表面の所定の位置に薄膜を形成できるように配置されており、基板20が位置合わせされるとシャドウマスク14と基板20とが位置合わせがされた状態になり、位置精度の高い薄膜を形成することができる。   As described above, the shadow mask 14 arranged in the mask placing device 13 is arranged so that a thin film can be formed at a predetermined position on the surface of the substrate 20 when the substrate 20 is aligned. When the substrate 20 is aligned, the shadow mask 14 and the substrate 20 are aligned, and a thin film with high positional accuracy can be formed.

なお、上記実施例では、位置合わせ用の二辺22a、22bの位置に、筒部3内に挿入した軸部4を配置したが、本発明の位置決め部材は基板20を軸部4の側面で位置決めするものに限定されず、傾斜して基板20を移動させる軸部4以外の軸部4に替え、突起や突条などの基板の移動を停止させる部材であってもよい。   In the above embodiment, the shaft portion 4 inserted into the cylindrical portion 3 is disposed at the positions of the two sides 22a and 22b for alignment. However, the positioning member of the present invention has the substrate 20 on the side surface of the shaft portion 4. The member is not limited to the positioning member, and may be a member that stops the movement of the substrate such as a protrusion or a ridge instead of the shaft portion 4 other than the shaft portion 4 that moves the substrate 20 in an inclined manner.

また、上記実施例では、四辺の各辺に二個ずつ筒部3と軸部4を設けてたが、その個数に限定されるものではなく、特に、突起や軸部4により、基板側面と部分的に接触して位置決めする場合、位置決め用の二辺のうち、一辺には一個、他の一辺は二個設けて基板20と接触するようにすればよい。   In the above embodiment, two cylindrical portions 3 and shaft portions 4 are provided on each of the four sides. However, the number of the cylindrical portions 3 and the shaft portions 4 is not limited to this. When positioning by partial contact, one of the two positioning sides may be provided on one side and two on the other side so as to be in contact with the substrate 20.

なお、上記傾斜装置7は、載置台12に設けた板バネ7であったが、台座部5に設けられた板バネであってもよいし、板バネではなく、螺旋状のバネであってもよい。   In addition, although the said inclination apparatus 7 was the leaf | plate spring 7 provided in the mounting base 12, the leaf | plate spring provided in the base part 5 may be sufficient, and not a leaf | plate spring but a spiral spring, Also good.

(a)、(b):本発明の成膜装置を説明するための図(a), (b): The figure for demonstrating the film-forming apparatus of this invention シャドウマスクとマスク載置装置と載置台の位置関係を説明するための図The figure for demonstrating the positional relationship of a shadow mask, a mask mounting apparatus, and a mounting base. 載置台の平面図Plan view of mounting table 基板が位置合わせされた状態の載置台の平面図Plan view of mounting table with substrate aligned 基板とシャドウマスクが配置された載置台の平面図Plan view of mounting table with substrate and shadow mask (a)〜(d):載置台の基板の位置合わせを説明するための図(a)-(d): The figure for demonstrating alignment of the board | substrate of a mounting base

符号の説明Explanation of symbols

2……基板載置装置
3……筒部
4……軸部
5……台座部
6……斜面
7……傾斜装置(板バネ)
8……フランジ部
9……貫通孔
12……載置台
20……基板
2 ... Substrate placing device 3 ... Cylinder 4 ... Shaft 5 ... Pedestal 6 ... Slope 7 ... Tilt device (leaf spring)
8 ... Flange 9 ... Through-hole 12 ... Mounting table 20 ... Substrate

Claims (10)

四辺形の基板が載置される載置台と、
前記載置台上の、前記基板よりも大きな四辺形の各四辺の位置で、それぞれ前記載置台を貫通する貫通孔と、
前記貫通孔にそれぞれ挿通され、上端に基板を載置可能な筒部と、
前記各筒部に挿通され、上端が前記貫通孔と前記筒部の上端よりも上方に位置する軸部と、
前記各軸部の前記各筒部よりも下方に形成され、前記各筒部を乗せた台座部と、
前記台座部を乗せ、前記載置台に対して昇降移動可能に構成され、前記筒部を前記軸部と一緒に昇降移動させる昇降部材と、
前記昇降部材が上昇すると、前記四辺のうち互いに直行する二辺に位置する前記軸部を、前記載置台の内側方向に傾ける傾斜機構と、
が設けられたアラインメント機能付き基板載置装置。
A mounting table on which a quadrilateral substrate is mounted;
A through hole penetrating the mounting table at each of the four sides of the quadrilateral larger than the substrate on the mounting table,
A cylindrical portion that is inserted through each of the through holes and on which the substrate can be placed;
A shaft portion that is inserted through each of the tube portions, and whose upper end is located above the through hole and the upper end of the tube portion;
A pedestal portion formed below each cylindrical portion of each shaft portion, on which each cylindrical portion is placed;
An elevating member that mounts the pedestal portion and is configured to be movable up and down relative to the mounting table, and moves the cylindrical portion up and down together with the shaft portion;
When the elevating member rises, an inclination mechanism that inclines the shaft portion positioned on two sides orthogonal to each other in the four sides toward the inner side of the mounting table,
A substrate mounting apparatus with an alignment function provided with
前記四辺のうち、前記二辺とは異なる残りの二辺のうちの一辺には、前記軸部が二個以上配置された請求項1記載のアラインメント機能付き基板載置装置。   The substrate mounting apparatus with an alignment function according to claim 1, wherein two or more of the shaft portions are arranged on one side of the remaining two sides different from the two sides among the four sides. 前記傾斜機構は、前記昇降部材の上昇により変形し、変形が復元しようとする下方向きの復元力を、前記台座部の前記軸部よりも前記載置台の内側に位置する部分に印加する第一のバネ部材を有する請求項1又は請求項2のいずれか1項記載のアラインメント機能付き基板載置装置。   The tilting mechanism is deformed by the ascending / descending member ascending, and applies a downward restoring force to which the deformation is to be restored to a portion of the pedestal portion that is located inside the mounting table before the shaft portion. The board | substrate mounting apparatus with an alignment function of any one of Claim 1 or Claim 2 which has this spring member. 前記バネ部材は、前記載置台裏面に設けられ、前記昇降部材が上昇すると前記台座部と接触して曲げられる板バネである請求項3記載のアラインメント機能付き基板載置装置。   4. The substrate mounting apparatus with an alignment function according to claim 3, wherein the spring member is a plate spring provided on the back surface of the mounting table and bent when contacting the pedestal portion when the lifting member is raised. 前記軸部が配置された前記四辺のうち、少なくとも直交する二辺に位置する前記軸部の上端に、前記載置台の内側に向かう斜面が設けられた請求項1乃至請求項4のいずれか1項記載のアラインメント機能付き基板載置装置。   The slope according to any one of claims 1 to 4, wherein an inclined surface directed to the inside of the mounting table is provided at an upper end of the shaft portion located at least on two sides orthogonal to each other among the four sides on which the shaft portion is disposed. The substrate mounting apparatus with an alignment function according to the item. 前記斜面を有する前記軸部の上端は円錐形に形成され、円錐の側面が前記斜面にされた請求項5記載のアラインメント機能付き基板載置装置。   6. The substrate mounting apparatus with an alignment function according to claim 5, wherein an upper end of the shaft portion having the inclined surface is formed in a conical shape, and a side surface of the cone is formed into the inclined surface. 前記筒部の上端には、水平方向に拡がるフランジ部を有し、前記基板は前記フランジ部上に載置される請求項1乃至請求項6のいずれか1項記載のアラインメント機能付き基板載置装置。   The substrate mounting with an alignment function according to any one of claims 1 to 6, wherein a flange portion that extends in a horizontal direction is provided at an upper end of the cylindrical portion, and the substrate is mounted on the flange portion. apparatus. 前記昇降部材が所定位置よりも上昇すると変形し、変形が復元しようとする下向きの復元力を、前記傾斜機構で傾斜されない前記軸部の前記台座部に印加する請求項1乃至請求項7のいずれか1項記載のアラインメント機能付き基板載置装置。   8. The device according to claim 1, wherein the lifting member is deformed when it is raised above a predetermined position, and a downward restoring force to restore the deformation is applied to the pedestal portion of the shaft portion that is not tilted by the tilt mechanism. The substrate mounting apparatus with an alignment function according to claim 1. 載置台と、
前記載置台上の四辺形の少なくとも直交する二辺の位置に形成された貫通孔と、
前記二辺の残りの他の二辺の位置に設けられ、基板を定位置で停止させる位置決め部材と、
前記貫通孔にそれぞれ挿通され、上端に基板を載置可能な筒部と、
前記各筒部に挿通され、上端が前記貫通孔と前記筒部の上端よりも上方に位置する軸部と、
前記各軸部の前記各筒部よりも下方に形成され、前記各筒部を乗せた台座部と、
前記台座部を乗せ、前記載置台に対して昇降移動可能に構成され、前記筒部を前記軸部と一緒に昇降移動させる昇降部材と、
前記昇降部材が上昇すると、前記軸部を、前記載置台の内側方向に傾ける傾斜機構と、
を有するアラインメント機能付き基板載置装置。
A mounting table;
A through-hole formed at the position of at least two orthogonal sides of the quadrilateral on the mounting table;
A positioning member provided at the position of the other two sides of the two sides and stopping the substrate at a fixed position;
A cylindrical portion that is inserted through each of the through holes and on which the substrate can be placed;
A shaft portion that is inserted through each of the tube portions, and whose upper end is located above the through hole and the upper end of the tube portion;
A pedestal portion formed below each cylindrical portion of each shaft portion, on which each cylindrical portion is placed;
An elevating member that mounts the pedestal portion and is configured to be movable up and down relative to the mounting table, and moves the cylindrical portion up and down together with the shaft portion;
When the elevating member rises, an inclination mechanism that inclines the shaft portion toward the inner side of the mounting table,
A substrate mounting apparatus with an alignment function.
請求項1乃至請求項9のいずれか1項記載の基板載置装置と、前記基板載置装置の上方に位置するシャドウマスクを載置するマスク載置装置と、前記マスク載置装置の上方に位置する成膜源と、前記基板載置装置と前記マスク載置装置と前記成膜源が配置された真空槽と、前記昇降部材を昇降移動させる動力機構とを有する成膜装置。   10. The substrate placement device according to claim 1, a mask placement device for placing a shadow mask positioned above the substrate placement device, and above the mask placement device. A film forming apparatus comprising: a film forming source positioned; a substrate mounting apparatus; the mask mounting apparatus; a vacuum chamber in which the film forming source is disposed; and a power mechanism for moving the elevating member up and down.
JP2008333259A 2008-12-26 2008-12-26 Substrate mounting device with alignment function, and film forming device including substrate mounting device Pending JP2010157526A (en)

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