JP7329996B2 - Substrate holder - Google Patents

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JP7329996B2
JP7329996B2 JP2019127371A JP2019127371A JP7329996B2 JP 7329996 B2 JP7329996 B2 JP 7329996B2 JP 2019127371 A JP2019127371 A JP 2019127371A JP 2019127371 A JP2019127371 A JP 2019127371A JP 7329996 B2 JP7329996 B2 JP 7329996B2
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mounting
substrate
members
mounting member
substrate holding
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JP2021012981A (en
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八代 村上
徹夫 北林
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Description

本発明は、基板保持装置に関する。 The present invention relates to a substrate holding device.

半導体製造装置において、基材に静電吸着用電極が埋設され、半導体ウエハなどの基板に対して測定、運搬、加工などの各種処理を行うために、基板を静電吸着して保持する基板保持装置が知られている。このような基板保持装置においては、撓みや反りなどの変形がある基板を、変形を解消して平坦に保持する必要がある。 In semiconductor manufacturing equipment, an electrostatic attraction electrode is embedded in a base material, and a substrate such as a semiconductor wafer is held by electrostatic attraction in order to perform various processes such as measurement, transportation, and processing on the substrate. device is known. In such a substrate holding device, it is necessary to eliminate the deformation and hold the substrate evenly, even if the substrate is deformed by bending or warping.

なお、特許文献1には、3本の昇降支柱にそれぞれ支持された正六角形型の静電チャックが蜂の巣状に配置された分割静電チャック構造が開示されている。各昇降支柱の伸縮に応じてそれぞれの静電チャックが傾動又は昇降する。 Patent Document 1 discloses a divided electrostatic chuck structure in which regular hexagonal electrostatic chucks each supported by three elevating columns are arranged in a honeycomb pattern. Each electrostatic chuck tilts or ascends and descends according to the extension and contraction of each elevation column.

特開2006-135062号公報JP 2006-135062 A

しかしながら、基材の表面から離れている箇所においては、静電力によって基板を吸着することができないので、変形が大きな基板を平坦に吸着保持することが困難であった。 However, since the substrate cannot be attracted by the electrostatic force at a location away from the surface of the base material, it has been difficult to flatly attract and hold a substrate that is greatly deformed.

また、上記特許文献1に開示されている分割静電チャック構造においては、各静電チャックをそれぞれ支持する昇降支柱の伸縮制御を独立して行わなければならず、制御が困難であった。さらに、X-Y平面上に設けたレーザ変位計によって静電チャックの吸着面の配列の距離や傾斜状態を計測することにより、吸着面の高精度な平坦性を実現している。しかし、これでは、静電チャックの吸着面とこれに載置された基板との隙間を計測することは不可能であり、変形した基板を平坦に吸着するように制御することは想定されていない。 In addition, in the divided electrostatic chuck structure disclosed in Patent Document 1, expansion and contraction of the elevating columns that support the respective electrostatic chucks must be independently controlled, which is difficult to control. Furthermore, by measuring the distance and inclination of the arrangement of the attracting surfaces of the electrostatic chuck with a laser displacement gauge provided on the XY plane, highly accurate flatness of the attracting surface is realized. However, with this method, it is impossible to measure the gap between the attraction surface of the electrostatic chuck and the substrate placed thereon, and it is not assumed that the deformed substrate is flatly attracted. .

本発明は、かかる事情に鑑みてなされたものであり、変形を有する基板を簡易に平坦に吸着保持することを図り得る基板保持装置を提供することを目的とする。 SUMMARY OF THE INVENTION It is an object of the present invention to provide a substrate holding device capable of easily and flatly holding a deformed substrate by suction.

本発明の基板保持装置は、基板が載置される載置面をそれぞれ有する複数の載置部材と、前記複数の載置部材のうち少なくとも1つの載置部材に設けられた前記基板を静電吸着するための静電吸着電極と、を備える基板保持装置であって、 前記載置部材の上端角部にC面取り又はR面取りを有し、前記複数の載置部材のうち少なくとも前記静電吸着電極が設けられた第1の載置部材及び前記第1の載置部材との間に介在部材を介して配置された第2の載置部材がそれぞれ前記載置面と垂直な方向に移動可能であって、前記第1の載置部材が前記載置面と垂直な方向に移動した場合、当該移動に付随して、前記第2の載置部材の載置面が前記第1の載置部材の載置面の高さ位置に向って、前記載置面と垂直な方向に移動することを特徴とする。 A substrate holding apparatus according to the present invention includes a plurality of mounting members each having a mounting surface on which a substrate is mounted, and electrostatically holding the substrate provided on at least one mounting member among the plurality of mounting members. and an electrostatic chucking electrode for chucking, wherein the mounting member has a chamfered chamfer or a rounded chamfer at an upper end corner of the mounting member, and at least the electrostatic chucking among the plurality of mounting members. A first mounting member provided with an electrode and a second mounting member interposed between the first mounting member and the first mounting member are movable in a direction perpendicular to the mounting surface. When the first mounting member moves in a direction perpendicular to the mounting surface, the mounting surface of the second mounting member moves along with the movement of the first mounting member. It is characterized by moving in a direction perpendicular to the mounting surface toward the height position of the mounting surface of the member.

本発明によれば、第1の載置部材が載置面と垂直な方向に移動した場合、当該移動に付随して、第2の載置部材の載置面が第1の載置部材の載置面の高さ位置に向って、載置面と垂直な方向に移動するので、第1の載置部材を移動させるだけで、第2の載置部材もこれらの載置面の高さの差を小さくするように移動する。そのため、第1の載置部材の載置面を基板に接触又は近接するように移動させれば、これに付随して第2の載置部材も載置面が基板に接触又は近接するように移動する。よって、上記特許文献1に記載されたように多数の伸縮制御を行うことなく、基板の変形を解消した平坦な保持を図ることが可能となる。 According to the present invention, when the first mounting member moves in a direction perpendicular to the mounting surface, the mounting surface of the second mounting member moves along with the movement of the first mounting member. Since it moves in a direction perpendicular to the mounting surface toward the height position of the mounting surface, only by moving the first mounting member, the second mounting member also moves to the height of these mounting surfaces. move to reduce the difference between Therefore, when the mounting surface of the first mounting member is moved to come into contact with or approach the substrate, the mounting surface of the second mounting member also comes into contact with or comes close to the substrate. Moving. Therefore, it is possible to eliminate the deformation of the substrate and hold it flat without performing a large number of expansion/contraction controls as described in Patent Document 1 above.

本発明において、前記介在部材は弾性体からなる連結部材であり、前記第1の載置部材と前記第2の載置部材とは前記連結部材によって連結されていることが好ましい。 In the present invention, it is preferable that the interposed member is a connecting member made of an elastic body, and the first mounting member and the second mounting member are connected by the connecting member.

また、本発明において、前記第1の載置部材及び前記第2の載置部材は前記載置面と垂直な方向に重なり合う部分を有し、前記第1の載置部材及び前記第2の載置部材の前記重なり合う部分の間に弾性体からなる前記介在部材が配置されていることも好ましい。 Further, in the present invention, the first placement member and the second placement member have a portion that overlaps with the placement surface in a direction perpendicular to the placement surface, and the first placement member and the second placement member overlap each other. It is also preferable that the intervening member made of an elastic material is arranged between the overlapping portions of the placement member.

これらの場合、第2の載置部材が介在部材を介して配置された第1の載置部材に付随して移動する構成を簡易に実現することが可能となる。 In these cases, it is possible to easily realize a configuration in which the second mounting member moves along with the first mounting member arranged via the intervening member.

本発明において、前記複数の載置部材の隣接する載置部材間の全ての隙間が気密に封止されていることが好ましい。 In the present invention, it is preferable that all gaps between adjacent mounting members of the plurality of mounting members are airtightly sealed.

この場合、載置面より基板が載置される側の空間と、載置面よりこれと反対側の空間とに圧力差を設けることが可能となり、この圧力差によって第1の載置部材を移動させることが可能となり得る。 In this case, it is possible to create a pressure difference between the space on the side of the mounting surface on which the substrate is mounted and the space on the opposite side of the mounting surface. It may be possible to move

本発明の第1の実施形態に係る基板保持装置を示す模式上面図。1 is a schematic top view showing a substrate holding device according to a first embodiment of the present invention; FIG. 図1のII-II線における模式断面図。FIG. 2 is a schematic cross-sectional view taken along line II-II of FIG. 1; 載置部材が上昇する途中の状態を示す模式断面図。FIG. 4 is a schematic cross-sectional view showing a state in which the mounting member is in the process of being raised; 全ての載置部材が上昇した状態を示す模式断面図。FIG. 4 is a schematic cross-sectional view showing a state in which all mounting members are lifted; 全ての載置部材が下降した状態を示す模式断面図。FIG. 4 is a schematic cross-sectional view showing a state in which all mounting members are lowered; 本発明の第1の実施形態の変形に係る基板保持装置を示す模式断面図。FIG. 4 is a schematic cross-sectional view showing a substrate holding device according to a modification of the first embodiment of the present invention; 載置部材が上昇する途中の状態を示す模式断面図。FIG. 4 is a schematic cross-sectional view showing a state in which the mounting member is in the process of being raised; 全ての載置部材が上昇した状態を示す模式断面図。FIG. 4 is a schematic cross-sectional view showing a state in which all mounting members are lifted; 本発明の第1の実施形態の他の変形に係る基板保持装置を示す模式上面図。FIG. 5 is a schematic top view showing a substrate holding device according to another modification of the first embodiment of the present invention; 本発明の第1の実施形態の別の変形に係る基板保持装置を示す部分拡大模式断面図。FIG. 4 is a partially enlarged schematic cross-sectional view showing a substrate holding device according to another modification of the first embodiment of the present invention; 本発明の第2の実施形態に係る基板保持装置を示す模式断面図。FIG. 4 is a schematic cross-sectional view showing a substrate holding device according to a second embodiment of the present invention; 本発明の第3の実施形態に係る基板保持装置を示す模式断面図。FIG. 5 is a schematic cross-sectional view showing a substrate holding device according to a third embodiment of the present invention;

本発明の第1の実施形態に係る基板保持装置100について図面を参照して説明する。なお、図面においては、基板保持装置100及びその構成要素などを明確化するためにデフォルメされており、実際の比率を表すものではなく、上下などの方向も単なる例示である。 A substrate holding device 100 according to a first embodiment of the present invention will be described with reference to the drawings. In the drawings, the substrate holding device 100 and its constituent elements are deformed for clarity, and do not represent actual ratios, and directions such as up and down are merely examples.

図1及び図2を参照して、基板保持装置100は、基台10と、装置本体10に支持され、基板Wが載置される載置面11a~14aをそれぞれ有する複数の載置部材11~14とを備えている。これら載置部材11~14は、基台10に対して、載置面11a~14aと垂直な方向(図1における上下方向、以下、上下方向という)に移動可能に構成されている。ただし、上下方向以外の方向、すなわち、基台10に対して載置面11a~14aと水平な方向(図1における左右方向、以下、水平方向という)にも移動可能、さらには載置面11a~14aが傾動可能であってもよい。 1 and 2, a substrate holding apparatus 100 includes a base 10 and a plurality of mounting members 11 supported by an apparatus main body 10 and having mounting surfaces 11a to 14a on which substrates W are mounted. 14. These mounting members 11 to 14 are configured to be movable with respect to the base 10 in a direction perpendicular to the mounting surfaces 11a to 14a (vertical direction in FIG. 1, hereinafter referred to as vertical direction). However, it is also possible to move in directions other than the vertical direction, that is, in directions parallel to the mounting surfaces 11a to 14a with respect to the base 10 (horizontal direction in FIG. 1, hereinafter referred to as the horizontal direction), and furthermore, the mounting surface 11a. 14a may be tiltable.

ここでは、載置面11aは円形状であり、載置面12a~14aは載置面11a~13aをそれぞれ順に取り囲む円環形状である。ただし、各載置面11a~14aの間にはそれぞれ隙間が設けられている。そして、載置部材11は、載置面11aを上面とする大略円柱状であり、載置部材12~14は、それぞれ載置面12a~14aを上面とする大略円環柱状である。なお、本実施形態において、載置部材11は本発明の第1の載置部材に相当し、載置部材12は本発明の第2の載置部材に相当する。 Here, the mounting surface 11a has a circular shape, and the mounting surfaces 12a to 14a have annular shapes surrounding the mounting surfaces 11a to 13a, respectively. However, gaps are provided between the mounting surfaces 11a to 14a. The mounting member 11 has a substantially columnar shape with a mounting surface 11a as an upper surface, and the mounting members 12 to 14 have a substantially cylindrical cylindrical shape with mounting surfaces 12a to 14a as upper surfaces. In this embodiment, the mounting member 11 corresponds to the first mounting member of the invention, and the mounting member 12 corresponds to the second mounting member of the invention.

各載置面11a~14aは、広い平面状の面であっても、複数の凸部の面一な先端面の群からなるものであってもよい。複数の凸部の面一な先端面の群は、例えば、多数のピン(凸部)の面一な先端面の群、又は、環状などの複数のリブ(凸部)の先端面であってもよい。 Each of the mounting surfaces 11a to 14a may be a wide planar surface or may be a group of flat tip surfaces of a plurality of projections. The group of flat tip surfaces of the plurality of protrusions is, for example, a group of flat tip surfaces of a large number of pins (protrusions) or the tip surfaces of a plurality of annular ribs (protrusions). good too.

なお、各載置面11a~14aを多数のピンの面一な先端面の群として、載置面14aが、これらのピンの先端面の群を取り囲む環状のリブの先端面を有するものであってもよい。このとき、リブの先端面はピンの先端面より低くてもよい。 Each of the mounting surfaces 11a to 14a is a group of flush tip surfaces of a large number of pins, and the mounting surface 14a has an annular rib tip surface surrounding the group of pin tip surfaces. may At this time, the tip surface of the rib may be lower than the tip surface of the pin.

そして、基台10には、載置部材14の外周面に倣った周面を有する凹部10aが形成されている。これにより、基台10の凹部10a内に、載置部材11~14が収容されている。 The base 10 is formed with a recess 10 a having a peripheral surface that follows the outer peripheral surface of the mounting member 14 . As a result, the mounting members 11 to 14 are accommodated in the recess 10a of the base 10. As shown in FIG.

さらに、各載置部材11~14には、それぞれ単一又は一組の電極11b~14bが内蔵されている。これら電極11b~14bは、電力が供給されることにより基板Wとの間に静電力が発生し、基板Wを載置面11a~14aに静電吸着する静電吸着用の電極である。このような電極11b~14bを備えることにより、基板保持蔵置100は静電チャックとして機能する。 Further, each mounting member 11-14 incorporates a single or a set of electrodes 11b-14b, respectively. These electrodes 11b to 14b are electrodes for electrostatic attraction, which generate electrostatic force between the electrodes 11b to 14b and the substrate W when electric power is supplied to electrostatically attract the substrate W to the mounting surfaces 11a to 14a. By providing such electrodes 11b to 14b, the substrate holding device 100 functions as an electrostatic chuck.

そして、各電極11b~14bには、載置部材11~14の載置面11a~14aとは反対側の面(下面)側にて端部が露出する給電部11c~14cが設けられている。 Each of the electrodes 11b to 14b is provided with power supply portions 11c to 14c whose ends are exposed on the surface (lower surface) opposite to the mounting surfaces 11a to 14a of the mounting members 11 to 14. .

さらに、基台10には、外部電源20にそれぞれ電気的に接続された給電部31~34が内蔵されており、これらの端部は基台10の凹部10aの底面10bにてそれぞれ露出している。そして、給電部11c~14cの上記端部と給電部31~34の上記端部とが接続部材41~44によってそれぞれ電気的に接続されている。 Further, the base 10 has built-in power supply units 31 to 34 electrically connected to the external power supply 20, respectively, and the ends of these are exposed at the bottom surface 10b of the concave portion 10a of the base 10, respectively. there is The end portions of the power feeding portions 11c to 14c and the end portions of the power feeding portions 31 to 34 are electrically connected by connecting members 41 to 44, respectively.

接続部材41~44は、例えば導電性材料からなるばねなどの弾性体からなることが好ましい。また、接続部材44~44は、導電性材料からなり可撓性を有する紐状などとして構成されるものであってもよい。これにより、載置部材11~14が基台10に対して上下方向などに移動した場合も、電極11b~14bと外部電源20との電気的な接続状態が維持される。 The connection members 41 to 44 are preferably made of elastic bodies such as springs made of a conductive material. Also, the connection members 44 to 44 may be made of a conductive material and configured as a flexible cord. Thus, even when the mounting members 11 to 14 move vertically with respect to the base 10, the electrical connections between the electrodes 11b to 14b and the external power source 20 are maintained.

なお、図2においては、接続部材41~44が、基台10の凹部10aの底面10bに形成された各窪み部10c内に収容されている。このように構成することにより、接続部材41~44は、ある程度の長さを有すること、ひいては伸縮変化量が確保される。 In FIG. 2, the connection members 41 to 44 are housed in respective recesses 10c formed in the bottom surface 10b of the recess 10a of the base 10. As shown in FIG. By constructing in this manner, the connection members 41 to 44 have a certain length, and thus the amount of change in expansion and contraction is ensured.

さらに、載置部材11と載置部材12との間には連結部材51が、載置部材12と載置部材13との間には連結部材52が、載置部材13と載置部材14との間には連結部材53がそれぞれ設けられている。なお、連結部材51~53は本発明の介在部材に相当する。 Further, a connecting member 51 is provided between the mounting members 11 and 12, a connecting member 52 is provided between the mounting members 12 and 13, and a connecting member 52 is provided between the mounting members 13 and 14. Connecting members 53 are respectively provided between them. Incidentally, the connecting members 51 to 53 correspond to intervening members of the present invention.

各連結部材51~53は、それぞれ1個又は複数個であり、好ましくは載置部材11~14間に対称に配置されている。また、連結部材51~53は、載置部材11~14との隙間全体に亘るものであってもよい。そして、連結部材51~53は、シリコン、天然ゴム、合成ゴム、各種ばねなどの弾性体からなることが好ましい。これにより、載置部材11~14間の隙間の距離変動が許容される。 Each of the connecting members 51-53 is one or plural in number, and preferably arranged symmetrically between the mounting members 11-14. Also, the connecting members 51-53 may extend over the entire gaps between the mounting members 11-14. The connecting members 51 to 53 are preferably made of an elastic material such as silicon, natural rubber, synthetic rubber, various springs, or the like. As a result, variations in the distance between the mounting members 11 to 14 are allowed.

このように構成されているので、載置部材12は載置部材11の上下方向の移動(昇降)に付随して、連結部材51を介して、載置面12aの高さ位置が載置面11aの高さ位置となる方向に向って移動するように構成されている。ただし、このとき、載置部材12は、上下方向にだけ移動するものに限定されず、水平方向の移動や傾動を伴うものであってもよい。 Since the mounting member 12 is configured in this way, the height position of the mounting surface 12a is adjusted to the mounting surface via the connecting member 51 as the mounting member 11 moves (elevates) in the vertical direction. It is configured to move toward the height position of 11a. However, at this time, the placement member 12 is not limited to one that moves only in the vertical direction, and may be one that accompanies horizontal movement or tilting.

なお、載置部材12は、載置部材11の上下方向の移動に付随して、載置面12aが載置面11aと面一になるまで移動することが好ましい。ただし、載置面12aと載置面11aと高さ位置に多少の差があってもよく、また、載置面12aと載置面11aとが平行でなく多少の傾きの差があってもよい。このような載置面11aと載置面12aとの関係は、他の隣接する載置面12a~14a間の関係にも当てはまる。 It is preferable that the mounting member 12 moves along with the vertical movement of the mounting member 11 until the mounting surface 12a becomes flush with the mounting surface 11a. However, the mounting surface 12a and the mounting surface 11a may have a slight difference in height position, and even if the mounting surface 12a and the mounting surface 11a are not parallel and have a slight difference in inclination. good. Such a relationship between the mounting surface 11a and the mounting surface 12a also applies to the relationship between other adjacent mounting surfaces 12a to 14a.

基板保持装置100には、さらに、基台10に対して載置部材11を昇降させる昇降機構21を備えている。この昇降機構21は、例えば、ピエゾ素子、リニアモータ、エアシリンダなどである。昇降機構21には、昇降機構21による載置部材11の昇降動作を制御するための制御機構22が接続されている。 The substrate holding device 100 further includes an elevating mechanism 21 for elevating the mounting member 11 with respect to the base 10 . This elevating mechanism 21 is, for example, a piezo element, a linear motor, an air cylinder, or the like. A control mechanism 22 is connected to the lifting mechanism 21 for controlling the lifting operation of the mounting member 11 by the lifting mechanism 21 .

次に、基板保持装置100を用いて基板Wを静電吸着する方法について説明する。本基板保持装置100は、特に、図2に示すように基板Wの中央部が上方に凸となるように撓んでいる場合に、基板Wを平坦に矯正して吸着するに適したものである。 Next, a method for electrostatically attracting the substrate W using the substrate holding device 100 will be described. The substrate holding apparatus 100 is particularly suitable for flattening and sucking the substrate W when the central portion of the substrate W is bent upwardly as shown in FIG. .

中央部が上方に凸となるように撓んでいる基板Wを載置面11a~14aの上に載置した場合、基板Wは周縁部に位置する載置面14aに接触しているが、他の載置面11a~13aには接触していない。そして、この状態で、外部電源20から各電極11b~14bに電力を供給しても、静電吸着力によっては基板Wを載置面11a~13a、特に載置面11aに吸着させることはできない。 When the substrate W is placed on the mounting surfaces 11a to 14a, the substrate W is in contact with the mounting surface 14a located at the peripheral portion. is not in contact with the mounting surfaces 11a to 13a of the . In this state, even if power is supplied from the external power supply 20 to the electrodes 11b to 14b, the substrate W cannot be attracted to the mounting surfaces 11a to 13a, particularly the mounting surface 11a, by the electrostatic attraction force. .

そこで、外部電源20から各電極11b~14bに電力を供給しながら、図3Aを参照して、制御機構22によって載置部材11が上方向に移動するように昇降機構21を制御して、載置面11aを基板Wに接触させる。このとき、載置面11aに接触した基板Wが持ち上がって、載置面14aと基板Wとが離れてもよい。また、静電吸着力によっては基板Wを載置面11aに吸着することができる程度の隙間が載置面11aと基板Wとの間にあってもよい。なお、図3A以降においては、電極11b~11d及びこれらに給電する機構などは図示を省略している。 Therefore, while power is being supplied from the external power source 20 to the electrodes 11b to 14b, the control mechanism 22 controls the lifting mechanism 21 to move the mounting member 11 upward, referring to FIG. 3A. The placement surface 11a is brought into contact with the substrate W. As shown in FIG. At this time, the substrate W in contact with the mounting surface 11a may be lifted and the mounting surface 14a and the substrate W may be separated. Further, there may be a gap between the mounting surface 11a and the substrate W that allows the substrate W to be attracted to the mounting surface 11a depending on the electrostatic attraction force. In FIG. 3A and subsequent figures, the electrodes 11b to 11d and a mechanism for supplying power to them are omitted from illustration.

載置部材11が上方向に移動することに付随して、載置部材11と連結部材51を介して接続されている載置部材12も上方向に移動する。ただし、連結部材51が弾性体などからなるので、載置部材12は載置部材11よりも遅れて移動する。同様に、載置部材13は載置部材12よりも遅れて、載置部材14は載置部材13よりも遅れて、それぞれ上方向に移動する。 As the mounting member 11 moves upward, the mounting member 12 connected to the mounting member 11 via the connecting member 51 also moves upward. However, since the connecting member 51 is made of an elastic material or the like, the mounting member 12 moves later than the mounting member 11 . Similarly, the mounting member 13 and the mounting member 14 move upward later than the mounting member 12 and 13, respectively.

これにより、載置面11a、載置面12a、載置面13a、載置面14aの順に高さ位置が高くなる。そして、この高さ位置の態様は基板Wの撓みの態様と同様であるので、基板Wと各載置面11a~14aとの距離が短くなる。そのため、各載置面11a~14aに基板Wを静電吸着することが可能となる。 As a result, the height position increases in the order of the mounting surface 11a, the mounting surface 12a, the mounting surface 13a, and the mounting surface 14a. Since the mode of the height position is the same as the mode of bending of the substrate W, the distance between the substrate W and each mounting surface 11a to 14a is shortened. Therefore, the substrate W can be electrostatically attracted to each of the mounting surfaces 11a to 14a.

弾性体などからなる連結部材51~53が当初の形態に戻るように変形するので、その後、図3Bに示すように、載置面11a~14aの高さ位置の差は解消される。これにより、基板Wは載置面11a~14a上に平坦に吸着保持される。ただし、載置面11a~14aの高さ位置の差がなく面一となることが好ましいが、許容範囲内であれば高さ位置の差や傾斜が載置面11a~14a間に存在してもよい。 Since the connecting members 51 to 53 made of elastic bodies or the like are deformed so as to return to the original shape, the difference in the height positions of the mounting surfaces 11a to 14a is then eliminated as shown in FIG. 3B. Thereby, the substrate W is flatly sucked and held on the mounting surfaces 11a to 14a. However, it is preferable that the mounting surfaces 11a to 14a are flush with each other without a difference in height position, but within the allowable range, a difference in height position or inclination exists between the mounting surfaces 11a to 14a. good too.

その後、制御機構22によって載置部材11が下方向に移動するように昇降機構21を制御する。このとき、載置部材11~14はそれぞれ連結部材51~53によって接続されている他に、これらの載置面11a~14aに吸着保持された基板Wによっても接続されていることになる。ここで、基板Wは弾性体でないので、載置部材11に移動に伴って載置部材12~14は、載置部材11とほぼ一緒に、すなわち載置面11a~14aの高さ位置の差がほぼ変わることなく移動する。 After that, the control mechanism 22 controls the lifting mechanism 21 so that the mounting member 11 moves downward. At this time, the mounting members 11 to 14 are connected not only by the connecting members 51 to 53, respectively, but also by the substrates W adsorbed and held on the mounting surfaces 11a to 14a. Here, since the substrate W is not an elastic body, the mounting members 12 to 14 move almost together with the mounting member 11 as it moves to the mounting member 11, that is, the difference in the height positions of the mounting surfaces 11a to 14a. moves almost unchanged.

これにより、図3Cに示すように、載置部材11~14が下方に移動した状態で、載置面11a~14aに基板Wが平坦に吸着保持された状態となる。 As a result, as shown in FIG. 3C, the substrate W is flatly sucked and held on the mounting surfaces 11a to 14a with the mounting members 11 to 14 moved downward.

なお、上述した方法では、外部電源20から各電極11b~14bに電力を供給しながら、載置部材11の上方向への移動を開始したが、これに限定されない。例えば、載置部材11の上方向への移動をまず開始し、載置面11aが基板Wに接触した瞬間又はその直後、あるいは静電吸着が可能な程度に載置面11aが基板Wに近接したときに、外部電源20から各電極11b~14bへの電力の供給を開始してもよい。 In the method described above, the mounting member 11 starts to move upward while power is being supplied from the external power source 20 to the electrodes 11b to 14b, but the method is not limited to this. For example, the mounting member 11 first starts moving upward, and the mounting surface 11a contacts the substrate W at the moment or immediately after that, or when the mounting surface 11a approaches the substrate W to such an extent that electrostatic adsorption is possible. Then, the supply of power from the external power supply 20 to each of the electrodes 11b to 14b may be started.

次に、図4Aを参照して、基板保持装置100の変形である基板保持装置110について説明する。基板保持装置100では昇降機構21が載置部材11を昇降するものであったが、基板保持装置110は昇降機構21が載置部材14を昇降する点において相違する。なお、本実施形態において、載置部材14は本発明の第1の載置部材に相当し、載置部材13は本発明の第2の載置部材に相当する。 Next, referring to FIG. 4A, a substrate holding device 110, which is a modification of substrate holding device 100, will be described. In the substrate holding device 100 , the elevating mechanism 21 elevates the mounting member 11 , but the substrate holding device 110 differs in that the elevating mechanism 21 elevates the mounting member 14 . In this embodiment, the mounting member 14 corresponds to the first mounting member of the invention, and the mounting member 13 corresponds to the second mounting member of the invention.

基板保持装置110は、特に、基板Wの中央部が下方に凸となるように撓んでいる場合に、基板Wを平坦に矯正して吸着するに適したものである。 The substrate holding device 110 is particularly suitable for flattening and sucking the substrate W when the central portion of the substrate W is bent downwardly.

このように撓んだ基板Wを基板保持装置110を用いて静電吸着する場合、まず、外部電源20から各電極11b~14bに電力を供給しながら、制御機構22によって載置部材14が上方向に移動するように昇降機構21を制御して、載置面14aを基板Wに接触させる。 When the substrate holding device 110 is used to electrostatically attract the substrate W thus bent, first, while power is being supplied from the external power supply 20 to the electrodes 11b to 14b, the control mechanism 22 raises the mounting member 14. The mounting surface 14a is brought into contact with the substrate W by controlling the lifting mechanism 21 so as to move in the direction.

載置部材14が上方向に移動することに付随して、載置部材13、載置部材12、載置部材11がこの順に遅れて上方向に移動する。これにより、図4Bに示すように、載置面14a、載置面13a、載置面12a、載置面11aの順に高さ位置が高くなる。そして、この高さ位置の態様は基板Wの撓みの態様と同様であるので、基板Wと各載置面11a~14aとの距離が短くなる。そのため、各載置面11a~14aに基板Wを静電吸着することが可能となる。 Accompanying the upward movement of the mounting member 14, the mounting member 13, the mounting member 12, and the mounting member 11 move upward in this order with a delay. As a result, as shown in FIG. 4B, the height positions of the mounting surface 14a, the mounting surface 13a, the mounting surface 12a, and the mounting surface 11a increase in this order. Since the mode of the height position is the same as the mode of bending of the substrate W, the distance between the substrate W and each mounting surface 11a to 14a is shortened. Therefore, the substrate W can be electrostatically attracted to each of the mounting surfaces 11a to 14a.

その後、弾性体などからなる連結部材51~53が当初の形態に戻るように変形するので、図4Cに示すように、載置面11a~14aの高さ位置の差は解消される。これにより、基板Wは載置面11a~14a上に平坦に吸着保持される。 After that, the connecting members 51 to 53 made of an elastic material or the like are deformed so as to return to the original shape, so that the difference in the height positions of the mounting surfaces 11a to 14a is eliminated as shown in FIG. 4C. Thereby, the substrate W is flatly sucked and held on the mounting surfaces 11a to 14a.

その後、制御機構22によって載置部材14が下方向に移動するように昇降機構21を制御する。この載置部材14に移動に伴って載置部材11~13は、載置部材14とほぼ一緒に移動する。 Thereafter, the elevating mechanism 21 is controlled by the control mechanism 22 so that the mounting member 14 moves downward. As the mounting member 14 moves, the mounting members 11 to 13 move substantially together with the mounting member 14 .

これにより、載置部材11~14が下方に移動した状態で、載置面11a~14aに基板Wが平坦に吸着保持された状態となる。 As a result, the substrates W are flatly adsorbed and held on the mounting surfaces 11a to 14a with the mounting members 11 to 14 moved downward.

なお、上述した第1の実施形態及びその変形において、昇降機構21が1つの載置部材11又は14のみを昇降させるものについて説明した。しかし、これに限定されず、例えば、載置部材11,14をそれぞれ独立して昇降させる2つの昇降機構を有するものであってもよい。これにより、中央部が上下の何れに凸になるように撓んでいる基板Wも平坦に吸着することが可能となる。さらに、吸着した基板Wを下降させるときに、2つの昇降機構を同時に作動させることにより、下降時に基板Wに撓みなどが発生することをより確実に抑制することが可能となる。 In addition, in the above-described first embodiment and its modification, the elevating mechanism 21 raises and lowers only one mounting member 11 or 14 has been described. However, it is not limited to this, and for example, two elevating mechanisms for independently elevating the mounting members 11 and 14 may be provided. As a result, it is possible to evenly suck the substrate W that is bent such that the central portion is convex upward or downward. Furthermore, by simultaneously operating the two lifting mechanisms when lowering the sucked substrate W, it is possible to more reliably prevent the substrate W from being bent or the like during the lowering.

また、載置面11a~14aが中央の円形状のものとこれを順に取り囲む3つの円環形状のものなるものについて説明した。しかし、載置面11a~14aの形状や個数などはこれに限定されない。 Also, the description has been given of the mounting surfaces 11a to 14a having a central circular shape and three ring-shaped ones surrounding it in order. However, the shape and number of the mounting surfaces 11a to 14a are not limited to this.

例えば、図5に示すように、円形状の載置面61aの周囲に4つの載置面62a~65aが全体として円環状であり、さらにその外側に4つの載置面66a~69aが全体として円環状となっているものであってもよい。この場合、各載置面61a~69aの隣接するもの同士が介在部材70によって接続されている。この場合、昇降機構21は図示しないが、中央部が上方に凸になるように撓んでいる基板Wを吸着する場合は、載置面61aを有する載置部材61を昇降可能とし、中央部が下方に凸になるように撓んでいる基板Wを吸着する場合は、載置面66a~69aを有する載置部材66~69を全て又はこれらのうち何れか少なくとも1つを昇降可能とすればよい。 For example, as shown in FIG. 5, four mounting surfaces 62a to 65a are formed in an annular shape as a whole around a circular mounting surface 61a, and four mounting surfaces 66a to 69a are formed as a whole on the outer side of the circular mounting surface 61a. It may be circular. In this case, adjacent placement surfaces 61a to 69a are connected by intervening members . In this case, the elevating mechanism 21 is not shown, but when sucking the substrate W bent so that the central portion is convex upward, the mounting member 61 having the mounting surface 61a can be moved up and down so that the central portion is In the case of sucking a substrate W bent in a downwardly protruding manner, all or at least one of the mounting members 66 to 69 having mounting surfaces 66a to 69a may be made vertically movable. .

その他、昇降機構によって昇降可能に構成されている1の載置部材(本発明の第1の載置部材に相当)と、昇降機構によって直接的に昇降するものではない他の載置部材(本発明の第2の載置部材に相当)とを備えるものであれば、本発明の範囲に含まれる。例えば、図示しないが、上記特許文献1を参照して複数の正六角形状の載置面が蜂の巣状に配置され、これらの載置面を有する載置部材が介在部材を介して配置され、そのうち少なくとも何れかの載置部材が昇降機構によって昇降可能に構成されていればよい。 In addition, one mounting member (corresponding to the first mounting member of the present invention) configured to be vertically movable by an elevating mechanism, and another mounting member that is not directly elevated by the elevating mechanism (this (corresponding to the second placing member of the invention) is included in the scope of the present invention. For example, although not shown, referring to Patent Document 1, a plurality of regular hexagonal mounting surfaces are arranged in a honeycomb pattern, and mounting members having these mounting surfaces are arranged via intervening members. It is sufficient that at least one of the mounting members is configured to be vertically movable by a lifting mechanism.

そして、載置面の形状、配置、個数、及び昇降機構によって昇降可能な載置部材の個数、選択などは、吸着すべき基板Wの変形の態様に応じて定めればよい。また、載置部材のうち他の載置部材とは独立に昇降可能に構成されていてもよく、例えば、全ての載置部材が介在部材によって他の載置部材と接続されていなくともよい。 The shape, arrangement and number of mounting surfaces, and the number and selection of mounting members that can be raised and lowered by the lifting mechanism may be determined according to the deformation mode of the substrate W to be picked up. Further, the placement members may be configured to be movable up and down independently of the other placement members, and for example, all the placement members may not be connected to the other placement members by intervening members.

さらに、図2に示すように、連結部材51~53は、載置部材11~14の側面の上下方向全体に亘って設けられていることが好ましい。これにより、連結部材51~53の強度の向上を図ることが可能となると共に、載置部材11~14の付随した上下方向の移動の安定性を図ることが可能となる。ただし、図示しないが、連結部材51~53は、載置部材11~14の側面の上下方向の一部にのみ設けられていてもよく、又、載置部材11~14の下面を接続するように設けられていてもよい。 Furthermore, as shown in FIG. 2, it is preferable that the connecting members 51 to 53 are provided over the entire side surfaces of the mounting members 11 to 14 in the vertical direction. As a result, it is possible to improve the strength of the connecting members 51 to 53, and to stabilize the movement of the mounting members 11 to 14 in the vertical direction. However, although not shown, the connecting members 51 to 53 may be provided only on part of the side surfaces of the mounting members 11 to 14 in the vertical direction, and may be arranged so as to connect the lower surfaces of the mounting members 11 to 14. may be provided in

さらに、載置面11a~14aの高さ位置が異なる場合、載置面11a~14aの角部と基板Wの裏面とが接触して、基板Wが載置面11a~14aに対して浮き上がるおそれが生じる。そこで、図6に示すように、載置部材11~14の上端角部にC面取り又はR面取りなどのように面取り加工を行う。これにより、基板Wの浮き上がりの防止を図ることが可能となる。 Furthermore, when the height positions of the mounting surfaces 11a to 14a are different, the corners of the mounting surfaces 11a to 14a may come into contact with the rear surface of the substrate W, causing the substrate W to float with respect to the mounting surfaces 11a to 14a. occurs. Therefore, as shown in FIG. 6, chamfering such as C-chamfering or R-chamfering is performed on the upper end corners of the mounting members 11 to 14 . This makes it possible to prevent the substrate W from floating.

さらに、各載置部材11~14に埋設されている電極11b~14bに対して、それぞれ独立して基台10側に配置された給電部31~34から電力を供給される場合について説明した。しかし、これに限定されず、電極11b~14bに対して、図示しないが、これらが埋設されている載置部材11~14に隣接する載置部材11~14に配置された給電部を介したうえで基台10側に配置された給電部から電力が供給されてもよい。 Furthermore, the case where power is independently supplied from the power supply units 31 to 34 arranged on the base 10 side to the electrodes 11b to 14b embedded in the mounting members 11 to 14 has been described. However, not limited to this, the electrodes 11b to 14b are fed via power supply units (not shown) disposed on the mounting members 11 to 14 adjacent to the mounting members 11 to 14 in which the electrodes 11b to 14b are embedded. Electric power may be supplied from a power supply unit arranged on the base 10 side.

次に、図7を参照して、本発明の第2の実施形態に係る基板保持装置200について説明する。この基板保持装置200は、上述した基板保持装置100と載置面11a~14a及び昇降機構21などの形状、個数、機構、配置、並びに、電極11b~14bの形状、個数、機構、配置、さらにはこれら電極11b~14bに対する給電機構は同じである。よって、これらに関する説明、及び給電機構に関する図示は省略する。 Next, a substrate holding device 200 according to a second embodiment of the present invention will be described with reference to FIG. This substrate holding device 200 includes the shape, number, mechanism, and arrangement of the substrate holding device 100, the mounting surfaces 11a to 14a, and the elevating mechanism 21, and the shape, number, mechanism, and arrangement of the electrodes 11b to 14b. have the same feeding mechanism for these electrodes 11b to 14b. Therefore, the description of these and the illustration of the power feeding mechanism are omitted.

基板保持装置200においては、隣接する載置面11a~14aを有する載置部材71~74が、載置面11a~14aと垂直な方向、すなわち上下方向に重なり合う部分を有し、これら重なり合う部分の間に介在部材81~83が配置されている。なお、本実施形態において、載置部材71は本発明の第1の載置部材に相当し、載置部材72は本発明の第2の載置部材に相当する。 In the substrate holding device 200, the mounting members 71 to 74 having adjacent mounting surfaces 11a to 14a have overlapping portions in a direction perpendicular to the mounting surfaces 11a to 14a, that is, in the vertical direction. Interposed members 81 to 83 are arranged therebetween. In this embodiment, the mounting member 71 corresponds to the first mounting member of the invention, and the mounting member 72 corresponds to the second mounting member of the invention.

ここでは、具体的には、載置部材71~73の下部に外側に向って突出するように円環状の突出部71a~73aが形成されており、載置部材72~74の上部に中心側に向って突出するように円環状の突出部72b~74bが形成されている。そして、突出部71a~73aと突出部72b~74bとは上下方向に重なる部分を有するように構成されており、この重なり合う部分の間に、介在部材81~83がそれぞれ配置されている。 Here, specifically, annular protrusions 71a to 73a are formed in the lower portions of the mounting members 71 to 73 so as to protrude outward, and the upper portions of the mounting members 72 to 74 are provided on the center side. Annular protrusions 72b to 74b are formed so as to protrude toward. The projecting portions 71a to 73a and the projecting portions 72b to 74b are configured to have overlapping portions in the vertical direction, and intervening members 81 to 83 are respectively arranged between the overlapping portions.

介在部材81~83は、ここではシリコンゴムからあるOリングであるが、他の弾性体からなる部材、例えば、他のゴムからなる円環状のもの、円環状のばねなどであってもよい。このように円環状であれば、突出部71a~73aと突出部72b~74bとの間に安定的に保持されるので好ましい。 Although the intervening members 81 to 83 are O-rings made of silicon rubber here, they may be members made of other elastic bodies, such as annular ones made of other rubber, annular springs, and the like. Such an annular shape is preferable because it is stably held between the protrusions 71a to 73a and the protrusions 72b to 74b.

ただし、介在部材81~83は、円環状に限定されず、一部の切り欠きを有する円環状、さらには、複数の部材からなるものであってもよい。介在部材81~83が複数の部材からなる場合、これらが突出部71a~73aと突出部72b~74bとの間から外れないように、突出部71a~73a又は突出部72b~74bの少なくとも一方にこれらの外れを防止するためのガイドなどを設けることが好ましい。 However, the intervening members 81 to 83 are not limited to an annular shape, and may be an annular shape having a notch, or may be composed of a plurality of members. When the intervening members 81 to 83 are composed of a plurality of members, at least one of the protrusions 71a to 73a or the protrusions 72b to 74b is provided with a It is preferable to provide a guide or the like to prevent these from coming off.

以上のように構成された基板保持装置200においては、載置部材71が上方向に移動することに付随して、載置部材71と介在部材81を介して接続されている載置部材72も上方向に移動する。ただし、介在部材81が弾性体からなるので、載置部材72は載置部材11よりも遅れて移動する。同様に、載置部材73は載置部材72よりも遅れて、載置部材74は載置部材73よりも遅れて、それぞれ上方向に移動する。 In the substrate holding device 200 configured as described above, as the mounting member 71 moves upward, the mounting member 72 connected to the mounting member 71 via the intervening member 81 also moves. Move up. However, since the intervening member 81 is made of an elastic material, the placement member 72 moves later than the placement member 11 . Similarly, the mounting member 73 and the mounting member 74 move upward later than the mounting member 72 and 73, respectively.

このように、基板保持装置200は、基板保持装置100と同じように動作するので、基板保持装置100と中央部が凸状に突出するように撓んだ基板Wを平坦に支持することが可能となる。 In this manner, the substrate holding device 200 operates in the same manner as the substrate holding device 100, so that it is possible to flatly support the substrate W that is bent so that the central portion protrudes from the substrate holding device 100. becomes.

次に、図8を参照して、本発明の第3の実施形態に係る基板保持装置300について説明する。この基板保持装置300は、上述した基板保持装置100と載置面11a~14a、載置部材11~14などの形状、個数、機構、配置、並びに、電極11b~14bの形状、個数、機構、配置、さらにはこれら電極11b~14bに対する給電機構は同じである。よって、これらに関する説明、及び給電機構に関する図示は省略する。 Next, a substrate holding device 300 according to a third embodiment of the present invention will be described with reference to FIG. The substrate holding device 300 includes the above-described substrate holding device 100, the mounting surfaces 11a to 14a, the mounting members 11 to 14, etc. in shape, number, mechanism, and arrangement, and the electrodes 11b to 14b in shape, number, mechanism, and arrangement. The arrangement as well as the feeding mechanism for these electrodes 11b-14b are the same. Therefore, the description of these and the illustration of the power feeding mechanism are omitted.

基板保持装置300においては、基板保持装置100とは異なり、昇降機構21及びこれを制御する制御機構22を備えていない。その代りに、基板保持装置300は、基台10の凹部10aと載置部材11~14との隙間からなる空間S1に連通するように接続され、空間S1の圧力を変更することが可能な内部圧力調整機構91を備えている。 Unlike the substrate holding apparatus 100, the substrate holding apparatus 300 does not include the lifting mechanism 21 and the control mechanism 22 for controlling it. Instead, the substrate holding device 300 is connected so as to communicate with the space S1 formed by the gaps between the recess 10a of the base 10 and the mounting members 11 to 14, and is capable of changing the pressure in the space S1. A pressure adjustment mechanism 91 is provided.

また、基板保持装置300全体は、真空チャンバ92によって取り囲まれている。そして、この真空チャンバ92の内、詳しくは、基板保持装置300の外方の空間S2に連通するように接続され、空間S2の圧力を変更することが可能な内部圧力調整機構93を備えている。内部圧力調整機構91,93は、例えば、それぞれ真空ポンプなどのポンプ及びポンプを制御する制御機構などとから構成されている。 The entire substrate holding apparatus 300 is also surrounded by a vacuum chamber 92 . In this vacuum chamber 92, more specifically, an internal pressure adjusting mechanism 93 is provided so as to communicate with the space S2 outside the substrate holding device 300 and is capable of changing the pressure in the space S2. . The internal pressure adjustment mechanisms 91 and 93 are each composed of, for example, a pump such as a vacuum pump and a control mechanism for controlling the pump.

さらに、連結部材51~53は、隣接する載置部材11~14間の全ての隙間が気密に封止されるように構成されている。例えば、連結部材51は、シリコンゴムなどからなる接着剤が載置部材11,12の間の円環状の隙間を気密に充填している。また、上述した第2の実施形態に係るように、載置部材71~74の上下方向に重なり合う部分の間に配置されたOリングからなどからなるものであってもよい。 Furthermore, the connecting members 51 to 53 are configured so that all the gaps between the adjacent mounting members 11 to 14 are hermetically sealed. For example, in the connecting member 51, an adhesive agent made of silicone rubber or the like fills an annular gap between the mounting members 11 and 12 in an airtight manner. Further, as in the above-described second embodiment, the mounting members 71 to 74 may be formed of O-rings or the like disposed between the vertically overlapping portions.

また、載置部材14の外周面と基台10の凹部10aの内周面とは気密となっている。また、これらの間にパッキンやOリングなどによって気密になるように構成されていてもよい。 Further, the outer peripheral surface of the mounting member 14 and the inner peripheral surface of the concave portion 10a of the base 10 are airtight. Moreover, it may be constructed so as to be airtight with a packing, an O-ring, or the like between them.

さらに、連結部材51は連結部材52よりも変形し易く,連結部材52は連結部材53よりも変形し易いように構成されている。 Furthermore, the connecting member 51 is configured to deform more easily than the connecting member 52 , and the connecting member 52 is configured to deform more easily than the connecting member 53 .

次に、基板保持装置300を用いて基板Wを静電吸着する方法について説明する。本基板保持装置300は、特に、基板Wの中央部が上方に凸となるように撓んでいる場合に、基板Wを平坦に矯正して吸着するに適したものである。 Next, a method for electrostatically attracting the substrate W using the substrate holding device 300 will be described. The substrate holding apparatus 300 is particularly suitable for flattening and sucking the substrate W when the central portion of the substrate W is bent upwardly.

まず、外部電源20から各電極11b~11dに電力を供給しながら、内部圧力調整機構91,93の少なくとも一方を制御することによって、空間S1の内部圧力P1を空間S2の内部圧力P2よりも大きくさせる。これにより、空間S1の体積が増加するように、載置部材11~14が上方向に移動する。 First, by controlling at least one of the internal pressure adjusting mechanisms 91 and 93 while supplying power from the external power supply 20 to the electrodes 11b to 11d, the internal pressure P1 of the space S1 is made higher than the internal pressure P2 of the space S2. Let As a result, the mounting members 11 to 14 move upward so as to increase the volume of the space S1.

このとき、連結部材51~53の材質、高さ(厚さ)及び幅などを異ならせることにより、連結部材51,52,53の順に変形し易くなる。これにより、載置部材12は載置部材11よりも遅れて、載置部材13は載置部材12よりも遅れて、載置部材14は載置部材13よりも遅れて、それぞれ上方向に移動する。これにより、載置面11a、載置面12a、載置面13a、載置面14aの順に高さ位置が高くなる。そして、この高さ位置の態様は基板Wの撓みの態様と同様であるので、基板Wと各載置面11a~14aとの距離が短くなる。そのため、各載置面11a~14aに基板Wを静電吸着することが可能となる。 At this time, by varying the material, height (thickness) and width of the connecting members 51 to 53, the connecting members 51, 52 and 53 are easily deformed in this order. As a result, the mounting member 12 moves upward after the mounting member 11, the mounting member 13 moves upward after the mounting member 12, and the mounting member 14 moves upward after the mounting member 13. do. As a result, the height position increases in the order of the mounting surface 11a, the mounting surface 12a, the mounting surface 13a, and the mounting surface 14a. Since the mode of the height position is the same as the mode of bending of the substrate W, the distance between the substrate W and each mounting surface 11a to 14a is shortened. Therefore, the substrate W can be electrostatically attracted to each of the mounting surfaces 11a to 14a.

その後、弾性体からなる連結部材51~53が当初の形態に戻るように変形するので、載置面11a~14aの高さ位置の差は解消される。これにより、基板Wは載置面11a~14a上に平坦に吸着保持される。ただし、載置面11a~14aの高さ位置の差が全くなく面一となることが好ましいが、許容範囲内であれば高さ位置の差や傾斜が載置面11a~14aに存在してもよい。 After that, the connecting members 51 to 53 made of an elastic body are deformed so as to return to the original shape, so that the difference in the height positions of the mounting surfaces 11a to 14a is eliminated. Thereby, the substrate W is flatly sucked and held on the mounting surfaces 11a to 14a. However, although it is preferable that the mounting surfaces 11a to 14a are flush with each other without any difference in height position, if the mounting surfaces 11a to 14a have a difference in height position or an inclination within an allowable range, the mounting surfaces 11a to 14a may have different heights. good too.

その後、内部圧力調整機構91,93の少なくとも一方を制御することによって、空間S1の内部圧力P1を空間S2の内部圧力P2よりも小さくさせる。これにより、空間S1の体積が減少するように、載置部材11~14が下方向に移動する。これにより、載置部材11~14はほぼ一緒に、すなわち載置面11a~14aの高さ位置の差がほぼ変わることなく移動する。これにより、載置面11a~14aに基板Wが平坦に吸着保持された状態となる。 After that, by controlling at least one of the internal pressure adjusting mechanisms 91 and 93, the internal pressure P1 of the space S1 is made smaller than the internal pressure P2 of the space S2. As a result, the mounting members 11 to 14 move downward so as to reduce the volume of the space S1. As a result, the mounting members 11 to 14 move substantially together, that is, the difference in height position between the mounting surfaces 11a to 14a does not substantially change. As a result, the substrate W is flatly sucked and held on the mounting surfaces 11a to 14a.

なお、連結部材51は連結部材52よりも変形し難く、連結部材52は連結部材53よりも変形し難いように構成すれば、載置部材14は載置部材13よりも遅れて、載置部材13は載置部材12よりも遅れて、載置部材12は載置部材11よりも遅れて、それぞれ上方向に移動する。これにより、中央部が下方に凸状に撓んでいる基板Wを平坦に吸着保持することが可能となる。 If the connecting member 51 is configured to be less deformable than the connecting member 52 and the connecting member 52 is more difficult to deform than the connecting member 53, then the mounting member 14 is placed behind the mounting member 13. 13 moves upward with a delay from the mounting member 12, and the mounting member 12 moves upward with a delay from the mounting member 11, respectively. As a result, it is possible to flatly suck and hold the substrate W whose central portion is curved downward.

載置部材11~14の各載置面11a~14aは、必ずしも互いに平行を維持した状態で上下方向に移動するものだけに限られない。載置部材11~14の各載置面11a~14aが半径方向又は周方向において互いに異なる向きに傾斜し、載置面11a~14aの全体が略凹凸形状となる状態で移動するものであってもよい。 The mounting surfaces 11a to 14a of the mounting members 11 to 14 are not necessarily limited to moving in the vertical direction while being parallel to each other. The mounting surfaces 11a to 14a of the mounting members 11 to 14 are inclined in different directions in the radial direction or the circumferential direction, and the entire mounting surfaces 11a to 14a move in a substantially uneven shape. good too.

10…基台、 10a…凹部、 11…載置部材(第1の載置部材)、 12…載置部材(第2の載置部材)、 13…載置部材(第2の載置部材)、 14…載置部材(第1の載置部材)、11a~14a,61a~69a…載置面、 11b~14b…電極(静電吸着電極)、 11c~14c…給電部、 20…外部電源、 21…昇降機構、 22…制御機構、 31~34…給電部、 41~44…接続部材、 51~53…連結部材(介在部材)、 61~69…載置部材、 70…連結部材(介在部材)、 71…載置部材(第1の載置部材)、 72…載置部材(第2の載置部材)、73,74…載置部材、 71a~73a…突出部、 72b~74b…突出部、 81~83…介在部材、 91,93…内部圧力調整機構、 92…真空チャンバ、 100,110,200,300…基板保持装置、 S1,S2…空間、 W…基板。 DESCRIPTION OF SYMBOLS 10... Base, 10a... Recessed part, 11... Mounting member (1st mounting member), 12... Mounting member (2nd mounting member), 13... Mounting member (2nd mounting member) 14 Mounting member (first mounting member) 11a to 14a, 61a to 69a Mounting surface 11b to 14b Electrode (electrostatic adsorption electrode) 11c to 14c Power supply unit 20 External power supply 21 Elevating mechanism 22 Control mechanism 31 to 34 Power feeder 41 to 44 Connecting member 51 to 53 Connecting member (intervening member) 61 to 69 Mounting member 70 Connecting member (intervening member) 71 Placement member (first placement member) 72 Placement member (second placement member) 73, 74 Placement member 71a to 73a Projection 72b to 74b Protrusions 81 to 83 Interposed member 91, 93 Internal pressure adjusting mechanism 92 Vacuum chamber 100, 110, 200, 300 Substrate holding device S1, S2 Space W Substrate.

Claims (4)

基板が載置される載置面をそれぞれ有する複数の載置部材と、前記複数の載置部材のうち少なくとも1つの載置部材に設けられた前記基板を静電吸着するための静電吸着電極と、を備える基板保持装置であって、
前記載置部材の上端角部にC面取り又はR面取りを有し、
前記複数の載置部材のうち少なくとも前記静電吸着電極が設けられた第1の載置部材及び前記第1の載置部材との間に介在部材を介して配置された第2の載置部材がそれぞれ前記載置面と垂直な方向に移動可能であって、
前記第1の載置部材が前記載置面と垂直な方向に移動した場合、当該移動に付随して、前記第2の載置部材の載置面が前記第1の載置部材の載置面の高さ位置に向って、前記載置面と垂直な方向に移動することを特徴とする基板保持装置。
a plurality of mounting members each having a mounting surface on which a substrate is mounted; and an electrostatic attraction electrode for electrostatically attracting the substrate provided on at least one of the plurality of mounting members. and a substrate holding device comprising:
having a C-chamfer or R-chamfer at the upper end corner of the mounting member;
A first mounting member provided with at least the electrostatic attraction electrode among the plurality of mounting members, and a second mounting member disposed between the first mounting member and the first mounting member with an intervening member interposed therebetween. are movable in a direction perpendicular to the mounting surface,
When the first placement member moves in a direction perpendicular to the placement surface, the placement surface of the second placement member moves along with the movement of the placement surface of the first placement member. A substrate holding device that moves in a direction perpendicular to the mounting surface toward a height position of the surface.
前記介在部材は弾性体からなる連結部材であり、
前記第1の載置部材と前記第2の載置部材とは前記連結部材によって連結されていることを特徴とする請求項1に記載の基板保持装置。
The intervening member is a connecting member made of an elastic body,
2. The substrate holding apparatus according to claim 1, wherein said first mounting member and said second mounting member are connected by said connecting member.
前記第1の載置部材及び前記第2の載置部材は前記載置面と垂直な方向に重なり合う部分を有し、前記第1の載置部材及び前記第2の載置部材の前記重なり合う部分の間に弾性体からなる前記介在部材が配置されていることを特徴とする請求項1に記載の基板保持装置。 The first mounting member and the second mounting member have overlapping portions in a direction perpendicular to the mounting surface, and the overlapping portions of the first mounting member and the second mounting member 2. The substrate holding device according to claim 1, wherein said intervening member made of an elastic material is arranged between said. 前記複数の載置部材の隣接する載置部材間の全ての隙間が気密に封止されていることを特徴とする請求項1から3の何れか1項に記載の基板保持装置。 4. The substrate holding device according to claim 1, wherein all gaps between adjacent mounting members of said plurality of mounting members are airtightly sealed.
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JP2015088590A (en) 2013-10-30 2015-05-07 キヤノン株式会社 Substrate suction device and substrate flatness correction method
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JP2012248733A (en) 2011-05-30 2012-12-13 Hitachi High-Technologies Corp Charged particle beam device and electrostatic chuck device
JP2015088590A (en) 2013-10-30 2015-05-07 キヤノン株式会社 Substrate suction device and substrate flatness correction method
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