JP2010109294A5 - - Google Patents

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Publication number
JP2010109294A5
JP2010109294A5 JP2008282435A JP2008282435A JP2010109294A5 JP 2010109294 A5 JP2010109294 A5 JP 2010109294A5 JP 2008282435 A JP2008282435 A JP 2008282435A JP 2008282435 A JP2008282435 A JP 2008282435A JP 2010109294 A5 JP2010109294 A5 JP 2010109294A5
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JP
Japan
Prior art keywords
optical system
pinhole
measuring apparatus
optical member
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008282435A
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English (en)
Japanese (ja)
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JP2010109294A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008282435A priority Critical patent/JP2010109294A/ja
Priority claimed from JP2008282435A external-priority patent/JP2010109294A/ja
Priority to US12/608,771 priority patent/US20100110403A1/en
Publication of JP2010109294A publication Critical patent/JP2010109294A/ja
Publication of JP2010109294A5 publication Critical patent/JP2010109294A5/ja
Pending legal-status Critical Current

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JP2008282435A 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法 Pending JP2010109294A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008282435A JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法
US12/608,771 US20100110403A1 (en) 2008-10-31 2009-10-29 Measurement apparatus, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008282435A JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2010109294A JP2010109294A (ja) 2010-05-13
JP2010109294A5 true JP2010109294A5 (enExample) 2011-12-15

Family

ID=42130975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008282435A Pending JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US20100110403A1 (enExample)
JP (1) JP2010109294A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010016057A (ja) * 2008-07-01 2010-01-21 Canon Inc 測定方法、測定装置、露光装置、露光方法、デバイスの製造方法及び設計方法
WO2012072090A1 (en) * 2010-11-29 2012-06-07 Carl Zeiss Smt Gmbh Method of determining a border of an intensity distribution
NL2008957A (en) * 2011-07-08 2013-01-09 Asml Netherlands Bv Methods and systems for pattern design with tailored response to wavefront aberration.
NL2016625A (en) * 2015-04-20 2016-10-24 Asml Netherlands Bv Lithographic Method and Apparatus.

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW587199B (en) * 1999-09-29 2004-05-11 Asml Netherlands Bv Lithographic method and apparatus
JP2002169083A (ja) * 2000-11-30 2002-06-14 Nikon Corp 対物光学系、収差測定装置、投影露光装置、対物光学系の製造方法、収差測定装置の製造方法、投影露光装置の製造方法及びマイクロデバイスの製造方法
KR100654784B1 (ko) * 2001-08-31 2006-12-08 캐논 가부시끼가이샤 레티클과 광학특성의 측정방법
KR100673487B1 (ko) * 2002-04-17 2007-01-24 캐논 가부시끼가이샤 레티클 및 광학특성 계측방법
JP2004014865A (ja) * 2002-06-07 2004-01-15 Nikon Corp レチクル、波面収差測定機、及び半導体露光装置の製造方法
US6963390B1 (en) * 2002-07-19 2005-11-08 Litel Instruments In-situ interferometer arrangement
JP2006080444A (ja) * 2004-09-13 2006-03-23 Canon Inc 測定装置、テストレチクル、露光装置及びデバイス製造方法
JP2007066926A (ja) * 2005-08-29 2007-03-15 Canon Inc 計測方法及び装置、露光装置、並びに、デバイス製造方法
US7388652B2 (en) * 2006-06-15 2008-06-17 Asml Netherlands B.V. Wave front sensor with grey filter and lithographic apparatus comprising same

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