JP2010109294A - 測定装置、露光装置およびデバイス製造方法 - Google Patents

測定装置、露光装置およびデバイス製造方法 Download PDF

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Publication number
JP2010109294A
JP2010109294A JP2008282435A JP2008282435A JP2010109294A JP 2010109294 A JP2010109294 A JP 2010109294A JP 2008282435 A JP2008282435 A JP 2008282435A JP 2008282435 A JP2008282435 A JP 2008282435A JP 2010109294 A JP2010109294 A JP 2010109294A
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JP
Japan
Prior art keywords
optical system
test
pinhole
illuminance
pupil region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008282435A
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English (en)
Japanese (ja)
Other versions
JP2010109294A5 (enExample
Inventor
Makiko Ogasawara
真貴子 小笠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008282435A priority Critical patent/JP2010109294A/ja
Priority to US12/608,771 priority patent/US20100110403A1/en
Publication of JP2010109294A publication Critical patent/JP2010109294A/ja
Publication of JP2010109294A5 publication Critical patent/JP2010109294A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/68—Introducing or correcting distortion, e.g. in connection with oblique projection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008282435A 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法 Pending JP2010109294A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008282435A JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法
US12/608,771 US20100110403A1 (en) 2008-10-31 2009-10-29 Measurement apparatus, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008282435A JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2010109294A true JP2010109294A (ja) 2010-05-13
JP2010109294A5 JP2010109294A5 (enExample) 2011-12-15

Family

ID=42130975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008282435A Pending JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US20100110403A1 (enExample)
JP (1) JP2010109294A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010016057A (ja) * 2008-07-01 2010-01-21 Canon Inc 測定方法、測定装置、露光装置、露光方法、デバイスの製造方法及び設計方法
WO2012072090A1 (en) * 2010-11-29 2012-06-07 Carl Zeiss Smt Gmbh Method of determining a border of an intensity distribution
NL2008957A (en) * 2011-07-08 2013-01-09 Asml Netherlands Bv Methods and systems for pattern design with tailored response to wavefront aberration.
NL2016625A (en) * 2015-04-20 2016-10-24 Asml Netherlands Bv Lithographic Method and Apparatus.

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002169083A (ja) * 2000-11-30 2002-06-14 Nikon Corp 対物光学系、収差測定装置、投影露光装置、対物光学系の製造方法、収差測定装置の製造方法、投影露光装置の製造方法及びマイクロデバイスの製造方法
WO2003021352A1 (en) * 2001-08-31 2003-03-13 Canon Kabushiki Kaisha Reticle and optical characteristic measuring method
WO2003088329A1 (fr) * 2002-04-17 2003-10-23 Canon Kabushiki Kaisha Reticule et procede de mesure de caracteristique optique
JP2004014865A (ja) * 2002-06-07 2004-01-15 Nikon Corp レチクル、波面収差測定機、及び半導体露光装置の製造方法
US20050264783A1 (en) * 2002-07-19 2005-12-01 Litel Instruments In-situ interferometer arrangement
JP2006080444A (ja) * 2004-09-13 2006-03-23 Canon Inc 測定装置、テストレチクル、露光装置及びデバイス製造方法
JP2007066926A (ja) * 2005-08-29 2007-03-15 Canon Inc 計測方法及び装置、露光装置、並びに、デバイス製造方法
JP2007335863A (ja) * 2006-06-15 2007-12-27 Asml Netherlands Bv グレーフィルタを有する波面センサおよびそれを含むリソグラフィ装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW587199B (en) * 1999-09-29 2004-05-11 Asml Netherlands Bv Lithographic method and apparatus

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002169083A (ja) * 2000-11-30 2002-06-14 Nikon Corp 対物光学系、収差測定装置、投影露光装置、対物光学系の製造方法、収差測定装置の製造方法、投影露光装置の製造方法及びマイクロデバイスの製造方法
WO2003021352A1 (en) * 2001-08-31 2003-03-13 Canon Kabushiki Kaisha Reticle and optical characteristic measuring method
WO2003088329A1 (fr) * 2002-04-17 2003-10-23 Canon Kabushiki Kaisha Reticule et procede de mesure de caracteristique optique
JP2004014865A (ja) * 2002-06-07 2004-01-15 Nikon Corp レチクル、波面収差測定機、及び半導体露光装置の製造方法
US20050264783A1 (en) * 2002-07-19 2005-12-01 Litel Instruments In-situ interferometer arrangement
JP2006080444A (ja) * 2004-09-13 2006-03-23 Canon Inc 測定装置、テストレチクル、露光装置及びデバイス製造方法
JP2007066926A (ja) * 2005-08-29 2007-03-15 Canon Inc 計測方法及び装置、露光装置、並びに、デバイス製造方法
JP2007335863A (ja) * 2006-06-15 2007-12-27 Asml Netherlands Bv グレーフィルタを有する波面センサおよびそれを含むリソグラフィ装置

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Publication number Publication date
US20100110403A1 (en) 2010-05-06

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