JP2010096526A - Light wave interference measuring device - Google Patents

Light wave interference measuring device Download PDF

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JP2010096526A
JP2010096526A JP2008265237A JP2008265237A JP2010096526A JP 2010096526 A JP2010096526 A JP 2010096526A JP 2008265237 A JP2008265237 A JP 2008265237A JP 2008265237 A JP2008265237 A JP 2008265237A JP 2010096526 A JP2010096526 A JP 2010096526A
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interference
test surface
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Souto Katsura
宗涛 葛
Hideo Kanda
秀雄 神田
Takayuki Saito
隆行 齋藤
Noboru Koizumi
昇 小泉
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Fujinon Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To measure the shape of a surface to be inspected having a concave section, a convex section, and an off-axis stationary point section. <P>SOLUTION: A position in the direction of a measurement light axis L of a surface 80 to be inspected to an interference optical system 2 is changed by a sample stage so that measurement light comprising spherical waves is converged once and then is diverged while being applied to the concave section 81 when measuring the concave section 81 on the surface 80 to be inspected and measurement light comprising spherical waves is converged while being applied to the convex section 82 when measuring the convex section 82. Also, when measuring the off-axis stationary point section 83, measurement light comprising plane waves is applied to the off-axis stationary point section 83. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、被検面に測定光を照射し、該被検面からの戻り光と参照光との干渉により得られる干渉縞に基づき被検面の形状を測定する光波干渉測定装置に関し、特に、被検面が凹面部と凸面部と軸外停留点部を有してなる場合の形状測定に好適な光波干渉測定装置に関する。   The present invention relates to a light wave interference measuring apparatus that irradiates a test surface with measurement light and measures the shape of the test surface based on interference fringes obtained by interference between return light from the test surface and reference light. The present invention relates to a light wave interference measuring apparatus suitable for shape measurement in a case where a test surface has a concave surface portion, a convex surface portion, and an off-axis stationary point portion.

従来、非球面形状の被検面に球面波を照射して被検面からの戻り光と参照光との干渉により形成される干渉縞に基づき、被検面の形状を特定する手法が知られているが、このような手法により被検面全域に対応した干渉縞を得ることは難しい。   Conventionally, there has been known a method for identifying the shape of a test surface based on interference fringes formed by irradiating a spherical surface on a test surface with an aspherical shape and interference between return light from the test surface and reference light. However, it is difficult to obtain interference fringes corresponding to the entire test surface by such a method.

そこで、干渉計または被検面を測定光軸方向に順次移動させることにより、被検面の径方向の部分領域毎に対応した干渉縞が順次生じるようにし、その各干渉縞を解析して被検面の径方向の各部分領域の形状を求め、それらを繋ぎ合わせることにより被検面全域の形状を特定する手法が知られている(下記特許文献1参照)。   Therefore, by sequentially moving the interferometer or the test surface in the direction of the measurement optical axis, interference fringes corresponding to each partial region in the radial direction of the test surface are sequentially generated, and each interference fringe is analyzed and analyzed. A technique is known in which the shape of each partial region in the radial direction of the inspection surface is obtained and the shape of the entire inspection surface is specified by connecting them (see Patent Document 1 below).

一方、干渉計または被検面を測定光軸と垂直な面内において順次移動させ、移動毎に被検面の各部分領域に対応した干渉縞を縞解析可能な程度に拡大して撮像し、その各干渉縞を解析して被検面の各部分領域の形状を求め、それらを繋ぎ合わせることにより被検面全域の形状を特定する手法も知られている(下記特許文献2参照)。   On the other hand, the interferometer or the test surface is sequentially moved in a plane perpendicular to the measurement optical axis, and the interference fringes corresponding to the respective partial areas of the test surface are enlarged and imaged so that the fringe analysis can be performed for each movement. A technique is also known in which each interference fringe is analyzed to determine the shape of each partial region of the test surface, and the shape of the entire test surface is specified by connecting them (see Patent Document 2 below).

特開昭62−126305号公報JP-A-62-126305 USP6,956,657USP 6,956,657

近年、非球面レンズの形状が複雑化しており、1つのレンズ面において、該レンズ面の光軸(中心軸)を中心に、凹形状となっている部分(凹面部)と凸形状となっている部分(凸面部)と光軸外において頂点または底点となって勾配が零となる部分(軸外停留点部)を併せ持つような形状のものが利用されるようになっている。このような凹面部と凸面部を有する被検面の形状を光干渉計測により測定することは困難であるとされ、これまでは、光触針を用いた三次元形状測定により形状測定が行われていた。   In recent years, the shape of an aspheric lens has become complicated, and in one lens surface, a concave portion (concave surface portion) and a convex shape are formed around the optical axis (center axis) of the lens surface. A shape having a portion (convex surface portion) and a portion (off-axis stationary point portion) where the slope becomes zero or the top or bottom point outside the optical axis is used. It is said that it is difficult to measure the shape of the test surface having such a concave portion and a convex portion by optical interference measurement, and until now, shape measurement has been performed by three-dimensional shape measurement using an optical stylus. It was.

光干渉計測による形状測定が困難とされる理由としては、凹面部と凸面部とでは、被検面の光軸に対する面の勾配が互いに逆となる(被検面を上方に向けたときに、凹面部では光軸に向かって下り勾配となるのに対し、凸面部では光軸に向かって上り勾配となる)ことが挙げられる。すなわち、一般的な光干渉計測法では、被検面に照射された測定光が被検面から再帰反射される(戻り光が元の光路を逆進する)領域のみで適正な干渉縞が得られるが、被検面に照射される測定光が、測定光軸に沿って発散しながら進行する球面波か、測定光軸に沿って収束しながら進行する球面波、または平面波のいずれかに固定されている従来の干渉計では、被検面からの戻り光の進行方向が凹面部と凸面部とで全く異なるため、凹面部と凸面部の両方の領域で共に適正な干渉縞を得ることができないのである。   The reason why the shape measurement by the optical interference measurement is difficult is that, in the concave surface portion and the convex surface portion, the gradient of the surface with respect to the optical axis of the test surface is opposite to each other (when the test surface is directed upward, The concave surface portion has a downward gradient toward the optical axis, whereas the convex surface portion has an upward gradient toward the optical axis). That is, in a general optical interference measurement method, an appropriate interference fringe can be obtained only in the region where the measurement light irradiated on the test surface is retroreflected from the test surface (the return light travels backward in the original optical path). However, the measurement light applied to the surface to be measured is fixed to either a spherical wave that travels while diverging along the measurement optical axis, a spherical wave that travels while converging along the measurement optical axis, or a plane wave In the conventional interferometer, the traveling direction of the return light from the test surface is completely different between the concave surface portion and the convex surface portion, so that it is possible to obtain appropriate interference fringes in both the concave surface portion and the convex surface region. It is not possible.

一方、軸外停留点部は、面の勾配が略零となっている(軸外停留点部に法線を立てた場合、その法線は、被検面の光軸と平行になる)ので、測定光として球面波を用いた場合、軸外停留点部に照射された測定光が再帰反射されず、やはり適正な干渉縞を得ることができない。   On the other hand, the off-axis stop point has a substantially zero surface gradient (when a normal is set at the off-axis stop point, the normal is parallel to the optical axis of the test surface). When a spherical wave is used as the measurement light, the measurement light applied to the off-axis stationary point is not retroreflected, and an appropriate interference fringe cannot be obtained.

本発明は、このような事情に鑑みなされたものであり、凹面部と凸面部と軸外停留点部を有してなる被検面の形状を測定することが可能な光波干渉測定装置を提供することを目的とする。   The present invention has been made in view of such circumstances, and provides an optical interference measuring apparatus capable of measuring the shape of a test surface having a concave surface portion, a convex surface portion, and an off-axis stop point portion. The purpose is to do.

上記目的を達成するため、本発明の光波干渉測定装置は以下のように構成されている。   In order to achieve the above object, the optical interference measuring apparatus of the present invention is configured as follows.

すなわち、本発明に係る光波干渉測定装置は、被検面の光軸が測定光軸と一致するように該被検面を保持する保持手段と、光源部からの出力光を測定光に変換して前記被検面に照射し該被検面からの戻り光を参照光と合波して干渉光を得る干渉光学系と、得られた干渉光を該干渉光学系の光路から分岐させる分岐光学素子と、分岐された干渉光により形成される干渉縞を撮像する撮像系と、撮像された干渉縞を解析して前記被検面の形状を求める測定解析系と、前記干渉光学系に対する前記被検面の前記測定光軸方向の相対的位置を変化させる照射位置可変手段と、を備えた光波干渉測定装置であって、
前記被検面は、前記光軸を中心に前記干渉光学系側に凹となる凹面部と、該光軸を中心に該干渉光学系側に凸となる凸面部と、該光軸から外れた位置にあって該光軸に対し垂直な軸外停留点部とを有するものであり、
前記干渉光学系は、収束しながら進行する球面波または円筒波、および平面波を選択的に前記測定光として出力するものであり、
前記軸外停留点部を測定する場合には、前記平面波からなる前記測定光を該軸外停留点部に照射して測定を行い、
前記照射位置可変手段を用いて前記相対的位置を変化させることにより、前記凹面部を測定する場合には、前記球面波または前記円筒波からなる前記測定光が一旦収束した後に発散しながら該凹面部に照射されるようにして測定を行い、前記凸面部を測定する場合には、前記球面波または前記円筒波からなる前記測定光が収束しながら該凸面部に照射されるようにして測定を行う、ことを特徴とする。
That is, the optical interference measuring apparatus according to the present invention converts the output light from the light source unit into measurement light, holding means for holding the test surface so that the optical axis of the test surface coincides with the measurement optical axis. An interference optical system that irradiates the test surface and combines the return light from the test surface with reference light to obtain interference light, and branching optics that branches the obtained interference light from the optical path of the interference optical system An element, an imaging system that captures interference fringes formed by the branched interference light, a measurement analysis system that analyzes the captured interference fringes to determine the shape of the test surface, and the target for the interference optical system An irradiation position variable means for changing a relative position of the surface to be measured in the direction of the measurement optical axis, and a light wave interference measuring apparatus comprising:
The test surface is deviated from the optical axis, a concave surface portion that is concave toward the interference optical system side around the optical axis, and a convex surface portion that is convex toward the interference optical system side around the optical axis. And having an off-axis stop point perpendicular to the optical axis.
The interference optical system selectively outputs a spherical wave or a cylindrical wave that travels while converging, and a plane wave as the measurement light,
When measuring the off-axis stop point portion, measure by irradiating the off-axis stop point portion with the measurement light consisting of the plane wave,
When measuring the concave portion by changing the relative position using the irradiation position varying means, the concave surface is diverges after the measurement light composed of the spherical wave or the cylindrical wave is once converged. When measuring the convex surface portion, the measurement is performed so that the measurement light consisting of the spherical wave or the cylindrical wave is irradiated to the convex surface portion while converging. It is characterized by performing.

本発明において、前記照射位置可変手段を用いて前記相対的位置を順次変化させながら、前記凹面部または前記凸面部の複数の部分領域毎に対応した複数の領域別干渉縞を前記撮像系において順次撮像し、
前記測定解析系において、前記複数の領域別干渉縞に基づき前記複数の部分領域毎の形状情報を求め、該複数の部分領域毎の形状情報を互いに繋ぎ合わせることにより、該複数の部分領域を合併した全域の形状情報を求める、とすることができる。
In the present invention, a plurality of inter-region interference fringes corresponding to each of the concave surface portion or the plurality of partial regions of the convex surface portion are sequentially changed in the imaging system while the relative position is sequentially changed using the irradiation position varying means. Image
In the measurement analysis system, shape information for each of the plurality of partial regions is obtained based on the plurality of region-specific interference fringes, and the plurality of partial regions are merged by connecting the shape information for each of the plurality of partial regions. The shape information of the entire area can be obtained.

また、前記被検面に前記測定光が照射されたときに該被検面の一部領域から反射されて前記撮像系に入射する不要光の発生を防止するために、前記一部領域に入射する前記測定光の光量が低減するように該測定光の前記被検面上での光量分布を調整する光量分布調整手段を、前記光源部と前記分岐光学素子との間の光路上に配置することが好ましい。   Further, when the measurement surface is irradiated with the measurement light, the measurement surface is incident on the partial area to prevent generation of unnecessary light that is reflected from the partial area of the measurement surface and is incident on the imaging system. A light amount distribution adjusting means for adjusting a light amount distribution of the measurement light on the test surface so as to reduce a light amount of the measurement light is disposed on an optical path between the light source unit and the branch optical element. It is preferable.

本発明において、被検面とは、該被検面の光軸(中心軸)回りに回転対称な形状のもの以外に、柱面形状のものを含む。   In the present invention, the test surface includes a columnar shape in addition to a rotationally symmetric shape around the optical axis (center axis) of the test surface.

また、凹面部とは、被検面を上方に向けたときに、被検面の光軸に向かって下り勾配となる領域、すなわち、該凹面部に法線を立てた場合、その法線が、該法線に沿って凹面部から離れるのに従って一旦は被検面の光軸に近づくように延びることとなる領域を意味し、凸面部とは、被検面を上方に向けたときに、被検面の光軸に向かって上り勾配となる領域、すなわち、該凸面部に法線を立てた場合、その法線が、該法線に沿って凸面部から離れるのに従って始めから被検面の光軸から遠ざかるように延びることとなる領域を意味する。   In addition, the concave surface portion is a region that is inclined downward toward the optical axis of the test surface when the test surface is directed upward, that is, when a normal line is set on the concave surface portion, the normal line is , Means a region that will extend so as to approach the optical axis of the test surface as it moves away from the concave portion along the normal line, and the convex surface portion when the test surface is directed upward, A region that is inclined upward toward the optical axis of the test surface, that is, when a normal line is set on the convex surface part, the test surface starts from the beginning as the normal line moves away from the convex surface part along the normal line. It means a region that extends away from the optical axis.

また、軸外停留点部とは、被検面の光軸から外れた位置に在って、被検面を上方に向けたときに勾配が零となる領域、すなわち、該軸外停留点部に法線を立てた場合、その法線が、被検面の光軸と平行となるような領域を意味する。なお、通常、凹面部と凸面部との境界領域が軸外停留点部となる。   Further, the off-axis stop point portion is a region that is at a position off the optical axis of the test surface and has a gradient of zero when the test surface is directed upward, that is, the off-axis stop point portion. Means a region where the normal is parallel to the optical axis of the test surface. In general, the boundary region between the concave surface portion and the convex surface portion is an off-axis stop point portion.

本発明に係る光波干渉測定装置は、上述の構成を備えていることにより、以下のような作用効果を奏する。   The lightwave interference measuring apparatus according to the present invention has the following configuration and effects as described above.

すなわち、本発明の光波干渉測定装置においては、照射位置可変手段を用いて被検面の測定光軸方向に沿った相対的位置を変化させることによって、凹面部を測定する場合には、球面波または円筒波からなる測定光が一旦収束した後に発散しながら該凹面部に照射されるようにし、凸面部を測定する場合には、球面波または円筒波からなる測定光が収束しながら該凸面部に照射されるようにしている。また、軸外停留点部を測定する場合には、平面波からなる測定光が該軸外停留点部に照射されるようにしている。   That is, in the light wave interference measuring apparatus of the present invention, when measuring the concave surface by changing the relative position along the measurement optical axis direction of the test surface using the irradiation position varying means, the spherical wave is measured. Alternatively, when the convex portion is measured so that the measurement light consisting of a cylindrical wave is once converged and then diverges, and the convex portion is measured, the measurement light consisting of a spherical wave or a cylindrical wave converges while the convex surface portion To be irradiated. Moreover, when measuring an off-axis stop point part, the measurement light which consists of a plane wave is irradiated to this off-axis stop point part.

これにより、凹面部と凸面部と軸外停留点部のいずれの領域でも、被検面で再帰反射される測定光の戻り光を発生させることができるので、凹面部と凸面部と軸外停留点部のいずれの領域においても共に適正な干渉縞を得ることが可能となる。   As a result, the return light of the measurement light retroreflected by the test surface can be generated in any region of the concave surface portion, the convex surface portion, and the off-axis stationary point portion. It is possible to obtain an appropriate interference fringe in any region of the point portion.

したがって、本発明に係る光波干渉測定装置によれば、凹面部と凸面部と軸外停留点部を有してなる被検面の形状を高精度に測定することが可能となる。   Therefore, according to the light wave interference measuring apparatus according to the present invention, the shape of the test surface having the concave surface portion, the convex surface portion, and the off-axis stop point portion can be measured with high accuracy.

以下、本発明の実施形態について、図面を参照しながら詳細に説明する。図1は本発明の一実施形態に係る光波干渉測定装置の概略構成図である。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic configuration diagram of a lightwave interference measuring apparatus according to an embodiment of the present invention.

図1に示す本実施形態の光波干渉測定装置1は、被検レンズ8が有する被検面80(被検レンズ8の図中上側のレンズ面)の形状を測定解析するものであり、被検面80に測定光を照射し該被検面80からの戻り光を参照光と合成して干渉光を得る干渉光学系2と、得られた干渉光を干渉光学系2の光路から分岐させるハーフミラー等の分岐光学素子3と、分岐された干渉光により形成される干渉縞を撮像する撮像系4と、撮像された干渉縞を解析して被検面80の形状を求める測定解析系5と、被検レンズ8が載置保持されるサンプルステージ6と、光量分布調整手段7と、を備えてなる。   The light wave interference measuring apparatus 1 of the present embodiment shown in FIG. 1 measures and analyzes the shape of a test surface 80 (the lens surface on the upper side of the test lens 8 in the drawing) of the test lens 8. The interference optical system 2 that irradiates the surface 80 with measurement light and combines the return light from the test surface 80 with the reference light to obtain interference light, and a half that branches the obtained interference light from the optical path of the interference optical system 2 A branching optical element 3 such as a mirror, an image pickup system 4 for picking up an interference fringe formed by the branched interference light, a measurement analysis system 5 for analyzing the picked-up interference fringe to obtain the shape of the test surface 80, and The sample stage 6 on which the test lens 8 is placed and held, and the light amount distribution adjusting means 7 are provided.

上記干渉光学系2は、フィゾータイプの光学系配置をなすものであり、高可干渉性の光束を出力する光源部20と、該光源部21からの出力光を平行光束に変換する第1コリメータレンズ21と、該第1コリメータレンズ21からの平行光束を一旦収束させる収束レンズ22と、該収束レンズ22からの収束光束の集光点に配されたピンホール23aを有するピンホール板23と、該ピンホール23aを通過した発散光束を平行光束に変換する第2コリメータレンズ24と、該第2コリメータレンズ24からの平行光束を測定光軸Lに沿って収束しながら進行する球面波に変換する球面基準レンズ25と、を備えてなる。   The interference optical system 2 has a Fizeau type optical system arrangement, and includes a light source unit 20 that outputs a highly coherent light beam and a first collimator that converts output light from the light source unit 21 into a parallel light beam. A lens 21, a converging lens 22 that temporarily converges the parallel light flux from the first collimator lens 21, and a pinhole plate 23 having a pinhole 23a disposed at a converging point of the converging light flux from the converging lens 22, A second collimator lens 24 that converts the divergent light beam that has passed through the pinhole 23a into a parallel light beam, and a parallel light beam from the second collimator lens 24 is converted into a spherical wave that travels while converging along the measurement optical axis L. And a spherical reference lens 25.

上記球面基準レンズ25は、球面形状をなす参照基準球面25aを有してなり、当該球面基準レンズ25に入射された、第2コリメータレンズ24からの光束の一部を、この参照基準球面25aにおいて再帰反射して参照光となすとともに、該光束の他の一部を球面波からなる測定光となして被検面80に向け出力するように構成されている。そして、上記被検面80から反射された測定光の一部が、参照基準球面25aで反射された参照光と合波されることにより干渉光が得られるようになっている。   The spherical standard lens 25 has a reference standard spherical surface 25a having a spherical shape, and a part of the light beam from the second collimator lens 24 incident on the spherical standard lens 25 is reflected on the reference standard spherical surface 25a. The light beam is retroreflected to become reference light, and another part of the light flux is made to be measurement light composed of spherical waves and output toward the test surface 80. Then, a part of the measurement light reflected from the test surface 80 is combined with the reference light reflected by the reference standard spherical surface 25a, whereby interference light is obtained.

また、本実施形態においては、上記球面基準レンズ25を、平面基準板26または円筒基準レンズ27と交換可能に構成されている。平面基準板26は、参照基準平面26aを有するものであり、被検面80や柱面形状をなす他の被検面(後述の被検面90)の所定領域(後述の軸外停留点部83,93)を測定する際に使用される。円筒基準レンズ27は、図1の紙面と垂直な方向に延びる円柱面(円筒面)形状の参照基準円筒面27aを有するものであり、後述の被検面90を測定する際に使用される。なお、図1では、上記球面基準レンズ25および円筒基準レンズ27を各々1枚のレンズで構成されているように示しているが、実際には複数枚のレンズにより構成される場合もある。また、これらの球面基準レンズ25、平面基準板26および円筒基準レンズ27は、測定光軸L上において図示せぬフリンジスキャンアダプタに保持され、フリンジスキャン計測等を実施する際に測定光軸L方向に微動せしめられるように構成されている。   In the present embodiment, the spherical reference lens 25 is configured to be replaceable with a flat reference plate 26 or a cylindrical reference lens 27. The plane reference plate 26 has a reference reference plane 26a, and a predetermined area (an off-axis stop point section described later) on the test surface 80 or another test surface (a test surface 90 described later) having a columnar shape. 83, 93). The cylindrical reference lens 27 has a reference standard cylindrical surface 27a having a cylindrical surface (cylindrical surface) extending in a direction perpendicular to the paper surface of FIG. 1 and is used when measuring a test surface 90 described later. In FIG. 1, the spherical reference lens 25 and the cylindrical reference lens 27 are shown as being composed of a single lens, but in reality, the spherical reference lens 25 and the cylindrical reference lens 27 may be composed of a plurality of lenses. Further, the spherical reference lens 25, the flat reference plate 26, and the cylindrical reference lens 27 are held on a measurement optical axis L by a fringe scan adapter (not shown), and in the measurement optical axis L direction when performing fringe scan measurement or the like. It is configured so that it can be moved slightly.

上記撮像系4は、結像レンズ40と、CCDやCMOS等からなる2次元イメージセンサ42を有してなる撮像カメラ41とを備えてなり、結像レンズ40により2次元イメージセンサ42上に形成された干渉縞の画像データを取得するように構成されている。   The imaging system 4 includes an imaging lens 40 and an imaging camera 41 having a two-dimensional image sensor 42 made of a CCD, a CMOS, or the like, and is formed on the two-dimensional image sensor 42 by the imaging lens 40. The image data of the interference fringes is obtained.

上記測定解析系5は、2次元イメージセンサ42により取得された干渉縞の画像データに基づき、被検面80の形状データを求める、コンピュータ等からなる形状解析手段50と、該形状解析手段50による解析結果や画像を表示する表示装置51と、キーボードやマウス等からなる入力装置52とを備えてなる。なお、本実施形態において上記形状解析手段50は、上述のサンプルステージ6および光量分布調整手段7の駆動を制御するように構成されている。   The measurement analysis system 5 includes a shape analysis unit 50 including a computer for obtaining shape data of the test surface 80 based on image data of interference fringes acquired by the two-dimensional image sensor 42, and the shape analysis unit 50. The display device 51 includes an analysis result and an image, and an input device 52 including a keyboard and a mouse. In the present embodiment, the shape analyzing unit 50 is configured to control the driving of the sample stage 6 and the light amount distribution adjusting unit 7 described above.

上記サンプルステージ6は、本実施形態において保持手段および照射位置可変手段を構成するものであり、被検面80の光軸Cが測定光軸Lと一致するように被検レンズ8の位置調整を行うとともに、被検レンズ8を測定光軸L方向に移動させることにより、被検面80に対する測定光の照射位置を変えるように構成されている。 The sample stage 6 constitutes a holding means and an irradiation position variable means in the present embodiment, and the position of the lens 8 to be adjusted is adjusted so that the optical axis C 1 of the test surface 80 coincides with the measurement optical axis L. In addition, the irradiation position of the measurement light on the test surface 80 is changed by moving the test lens 8 in the direction of the measurement optical axis L.

上記光量分布調整手段7は、被検面80に測定光が照射されたときに該被検面80の一部領域から反射されて撮像系4に入射する不要光の発生を防止するために、この一部領域に入射する測定光の光量が低減するように測定光の被検面80上での光量分布を調整するための遮光パターン(詳しくは後述する)を形成するものであり、上述の第1コリメータレンズ21と収束レンズ22との間の平行光束の光路上に配置された透過型液晶表示素子70(本実施形態における空間光変調素子)を備えてなる。   The light amount distribution adjusting means 7 prevents the generation of unnecessary light that is reflected from a partial region of the test surface 80 and incident on the imaging system 4 when the test surface 80 is irradiated with measurement light. A light shielding pattern (described in detail later) for adjusting the light amount distribution of the measurement light on the test surface 80 so as to reduce the light amount of the measurement light incident on this partial region is formed. A transmissive liquid crystal display element 70 (spatial light modulation element in the present embodiment) disposed on the optical path of the parallel light flux between the first collimator lens 21 and the converging lens 22 is provided.

次に、上述の被検レンズ8について説明する。図2は被検レンズ8の構成を示す図((A)は断面図、(B)は平面図)である。   Next, the test lens 8 will be described. FIGS. 2A and 2B are diagrams (A is a cross-sectional view and FIG. 2B is a plan view) showing a configuration of the lens 8 to be examined.

図2に示すように被検レンズ8は、光軸Cを中心とした回転対称の被検面80を有しており、該被検面80は、光軸Cを中心に上記干渉光学系2側(図2(A)での上側)に凹となる凹面部81と、光軸Cを中心に上記干渉光学系2側に凸となる凸面部82と、凹面部81と凸面部82との境界部分に位置する軸外停留点部83とを有してなる。 Subject lens 8 as shown in FIG. 2 has a test surface 80 of the rotationally symmetric around the optical axis C 1,該被interfering optical system 80, the interference optical around the optical axis C 1 system 2 side concave portion 81 which is concave (upper side in FIG. 2 (a)), a convex portion 82 which is convex to the optical axis C 1 in the interference optical system 2 side to the center, the concave portion 81 and convex portion 82 and an off-axis stop point portion 83 located at a boundary portion with 82.

凹面部81は、被検面80を上方に向けたときに、光軸Cに向かって下り勾配となる領域、すなわち、該凹面部81に立てた法線Nが、該法線Nに沿って凹面部81から離れるのに従って光軸Cに一旦近づく(交わる)ように延びる領域であり、凸面部82は、被検面80を上方に向けたときに、光軸Cに向かって上り勾配となる領域、すなわち、該凸面部82に立てた法線Nが、該法線Nに沿って凸面部82から離れるのに従って始めから光軸Cから遠ざかるように延びる領域である。また、軸外停留点部83は、厳密には、該軸外停留点部83に立てた法線Nの方向が、光軸Cの方向と一致する(平行となる)線状の領域であるが、本実施形態では少し広くとって、図中幅dの円環状の領域を軸外停留点部83としている。そして、この軸外停留点部83の内周側に位置する幅(径)dの凹状領域を凹面部81とし、軸外停留点部83の外周側に位置する幅dの円環状の凸状領域を凸面部82としている。 Concave portion 81, when directed to the test surface 80 upwardly, the area comprising a down slope toward the optical axis C 1, namely, the normal line N 1 stood the concave surface portion 81, normal line N 1 along a once approached (cross) as to extend region to the optical axis C 1 in accordance with the distance from the concave portion 81, the convex portion 82, when directed to the test surface 80 upwards, towards the optical axis C 1 Te region to be a rising gradient, i.e., the normal N 2 stood on the convex surface portion 82 is, in a region extending away from the optical axis C 1 from the beginning in accordance with the distance from the convex portion 82 along the normal line N 2 is there. In addition, strictly speaking, the off-axis stop point portion 83 is a linear region in which the direction of the normal line N 3 standing on the off-axis stop point portion 83 coincides with (is parallel to) the direction of the optical axis C 1. although, it is taken a little wider in the present embodiment, the annular region of the drawing width d 2 and the off-axis stationary point portion 83. Then, a concave region having a width (diameter) d 1 positioned on the inner peripheral side of the off-axis stop point portion 83 is defined as a concave surface portion 81, and an annular shape having a width d 3 positioned on the outer peripheral side of the off-axis stop point portion 83. The convex region is a convex surface portion 82.

以下、光波干渉測定装置1の作用および測定手順について説明する。図3は被検面80への測定光の照射パターン((A)は凹面部81、(B)は凸面部82、(C)は軸外停留点部83の各測定時)を示す図であり、図4は被検面80を測定する際の遮光パターンの一例((A)は凹面部81、(B)は凸面部82および軸外停留点部83の各測定時)を示す図である。なお、以下の説明では、被検面80の凹面部81、凸面部82、軸外停留点部83の順に測定する場合を例にとっているが、測定順序は適宜変更することが可能である。   Hereinafter, the operation and measurement procedure of the optical interference measuring apparatus 1 will be described. FIG. 3 is a diagram showing an irradiation pattern of the measurement light to the test surface 80 ((A) is the concave surface portion 81, (B) is the convex surface portion 82, and (C) is each measurement of the off-axis stop point portion 83). FIG. 4 is a diagram showing an example of a light shielding pattern when measuring the test surface 80 ((A) is a concave surface portion 81, (B) is a measurement time of each of the convex surface portion 82 and the off-axis stop point portion 83). is there. In the following description, a case where measurement is performed in the order of the concave surface portion 81, the convex surface portion 82, and the off-axis stop point portion 83 of the test surface 80 is taken as an example, but the measurement order can be changed as appropriate.

(1)まず、サンプルステージ6を用いて、被検面80の光軸Cが測定光軸Lと一致するように被検レンズ80の位置調整を行う。なお、干渉光学系2、分岐光学素子3および撮像系4のアライメント調整は完了しているものとする。 (1) First, using the sample stage 6, the position of the test lens 80 is adjusted so that the optical axis C 1 of the test surface 80 coincides with the measurement optical axis L. It is assumed that the alignment adjustment of the interference optical system 2, the branch optical element 3, and the imaging system 4 has been completed.

(2)次に、被検面80の凹面部81を測定するために、サンプルステージ6を用いて、被検面80の測定光軸L方向の位置調整を行う。この位置調整は、干渉光学系2から出力された球面波からなる測定光が、図3(A)に示すように、測定光軸L上で一旦収束した後、発散しながら凹面部81に入射する状態となるように行われる。   (2) Next, in order to measure the concave surface portion 81 of the test surface 80, the sample stage 6 is used to adjust the position of the test surface 80 in the measurement optical axis L direction. In this position adjustment, the measurement light composed of the spherical wave output from the interference optical system 2 once converges on the measurement optical axis L as shown in FIG. 3A, and then enters the concave portion 81 while diverging. It is performed so that it will be in the state to do.

(3)次いで、透過型液晶表示素子70を用いて、凹面部81の測定時における測定光の光量分布を調整するための遮光パターンP(図4(A)参照)を形成する。この遮光パターンPは、光源部20からの出力光を透過する円板状の透光エリアSが中央部に形成され、その周辺部に、出力光を遮断する遮光エリアS(図中で斜線を付した部分。以下同様)が形成されたものであり、凹面部81を測定する際に、透光エリアSが凹面部81に投影され、遮光エリアSが凸面部82および軸外停留点部83に投影されるように設定されている。この遮光パターンPの投影により、凹面部81の測定時における凸面部82および軸外停留点部83からの不要光の発生を防止するようになっている。 (3) Next, by using the transmissive liquid crystal display element 70, a light shielding pattern P 1 (see FIG. 4A) for adjusting the light quantity distribution of the measurement light at the time of measuring the concave surface portion 81 is formed. In this light shielding pattern P 1 , a disc-shaped light transmitting area S 1 that transmits the output light from the light source unit 20 is formed in the central portion, and a light shielding area S 2 that blocks the output light in the peripheral portion (in the drawing). in part shaded. hereinafter the same) are those formed, when measuring the concave portion 81, the light transmitting area S 1 is projected onto the concave portion 81, the light shielding area S 2 is convex portion 82 and the shaft It is set to be projected on the outer stop point 83. The projection of the light-shielding pattern P 1, so as to prevent the generation of unnecessary light from the convex portion 82 and the off-axis stationary point portion 83 during measurement of the concave portion 81.

(4)次に、凹面部81に測定光を照射して、凹面部81の被測定領域から反射された戻り光と、球面基準レンズ25の参照基準球面25aからの参照光との干渉により形成される干渉縞を撮像系4において撮像し、その画像データを形状解析手段50に入力する。なお、凹面部81は、非球面形状をなしており、曲率が場所ごとに変化するので、凹面部81全域に対応した干渉縞画像を一度に得ることは難しい。そこで、サンプルステージ6を用いて被検面80の測定光軸L方向の位置を順次変化させながら、凹面部81の複数の部分領域毎(各々の部分領域は光軸Cを中心とした円板状または円環状となる)に対応した複数の領域別干渉縞を撮像系4において順次撮像し、その各画像データを取得するようにする。 (4) Next, the concave surface portion 81 is irradiated with the measurement light, and formed by interference between the return light reflected from the measured region of the concave surface portion 81 and the reference light from the reference standard spherical surface 25a of the spherical standard lens 25. The interference fringes to be picked up are picked up by the image pickup system 4, and the image data is input to the shape analysis means 50. The concave surface portion 81 has an aspherical shape, and the curvature changes from place to place, so it is difficult to obtain an interference fringe image corresponding to the entire concave surface portion 81 at a time. Therefore, while the sample stage 6 is sequentially changed the position of the measuring optical axis L direction of the test surface 80 with a plurality of each partial area (each partial area of the concave portion 81 around the optical axis C 1 circle A plurality of area-specific interference fringes corresponding to a plate shape or an annular shape are sequentially imaged in the imaging system 4 to acquire each image data.

(5)次いで、被検面80の凸面部82を測定するために、サンプルステージ6を用いて、被検面80の測定光軸L方向の位置調整を行う。この位置調整は、干渉光学系2から出力された球面波からなる測定光が、図3(B)に示すように、収束しながら凸面部82に入射する状態となるように行われる。   (5) Next, in order to measure the convex portion 82 of the test surface 80, the position of the test surface 80 in the measurement optical axis L direction is adjusted using the sample stage 6. This position adjustment is performed so that the measurement light composed of the spherical wave output from the interference optical system 2 enters the convex portion 82 while converging as shown in FIG.

(6)次に、透過型液晶表示素子70を用いて、凸面部82の測定時における測定光の光量分布を調整するための遮光パターンP(図4(B)参照)を形成する。この遮光パターンPは、光源部20からの出力光を遮断する円板状の遮光エリアSが中央部に形成され、その周辺部に、出力光を透過する透光エリアSが形成されたものであり、凸面部82を測定する際に、透光エリアSが凸面部82および軸外停留点部83に投影され、遮光エリアSが凹面部81に投影されるように設定されている。この遮光パターンPの投影により、凸面部82の測定時における凹面部81からの不要光の発生を防止するようになっている。なお、この凸面部82の測定に際しては、軸外停留点部83にも測定光が照射されることとなるが、コンピュータシミュレーション等による光線追跡によって、該軸外停留点部83からの反射光は、後述の不要光とはならないことを確認した上で、このような遮光パターンPを投影するようにしている。 (6) Next, by using the transmissive liquid crystal display element 70, a light shielding pattern P 2 (see FIG. 4B) for adjusting the light quantity distribution of the measurement light at the time of measuring the convex surface portion 82 is formed. In the light shielding pattern P 2 , a disc-shaped light shielding area S 2 that blocks output light from the light source unit 20 is formed at the center, and a light transmitting area S 1 that transmits output light is formed at the periphery thereof. are as hereinbefore, when measuring the convex portion 82, the light transmitting area S 1 is projected onto the convex portion 82 and the off-axis stationary point portion 83 is set so as the light-shielding area S 2 is projected to the concave portion 81 ing. The projection of the light shielding pattern P 2, so as to prevent the occurrence of unnecessary light from the concave portion 81 at the time of measurement of the convex portion 82. In the measurement of the convex surface portion 82, the measurement light is also applied to the off-axis stop point portion 83. However, the reflected light from the off-axis stop point portion 83 is obtained by ray tracing by computer simulation or the like. , after confirming that not unnecessary light which will be described later, so that projecting the light shielding pattern P 2.

(7)続いて、凸面部82に測定光を照射して、凸面部82の被測定領域から反射された戻り光と、球面基準レンズ25の参照基準球面25aからの参照光との干渉により形成される干渉縞を撮像系4において撮像し、その画像データを形状解析手段50に入力する。なお、凸面部82は、非球面形状をなしており、曲率が場所ごとに変化するので、凸面部82全域に対応した干渉縞画像を得ることは難しい。そこで、凹面部81の測定時と同様に、サンプルステージ6を用いて被検面80の測定光軸L方向の位置を順次変化させながら、凸面部82の複数の部分領域毎(各々の部分領域は光軸Cを中心とした円環状となる)に対応した複数の領域別干渉縞を撮像系4において順次撮像し、その各画像データを取得するようにする。 (7) Subsequently, the convex surface portion 82 is irradiated with the measurement light, and formed by interference between the return light reflected from the measurement region of the convex surface portion 82 and the reference light from the reference standard spherical surface 25a of the spherical standard lens 25. The interference fringes to be picked up are picked up by the image pickup system 4, and the image data is input to the shape analysis means 50. Note that the convex surface portion 82 has an aspherical shape, and the curvature varies from place to location, so that it is difficult to obtain an interference fringe image corresponding to the entire convex surface portion 82. Therefore, as in the measurement of the concave surface portion 81, the sample surface 6 is used to sequentially change the position of the surface 80 to be measured in the measurement optical axis L direction for each of the plurality of partial regions (each partial region). the multiple regions specific interference fringes corresponding to the annular shape around the optical axis C 1) sequentially captured by the image capturing system 4, so as to obtain the respective image data.

(8)次に、被検面80の軸外停留点部83を測定するために、球面基準レンズ25に替えて平面基準板26を測定光軸L上に配置するとともに、サンプルステージ6を用いて、被検面80の測定光軸L方向の位置調整を行う。この位置調整は、干渉光学系2から出力された平面波からなる測定光が、図3(C)に示すように、軸外停留点部83に入射し、該軸外停留点部83の形状情報を担持した干渉縞を、撮像系4において撮像し得る状態となるように行われる。なお、軸外停留点部83の測定時には、透過型液晶表示素子70を用いて上述の遮光パターンPを形成し、これを被検面80に投影するようにする(透光エリアSが凸面部82および軸外停留点部83に投影され、遮光エリアSが凹面部81に投影されるようにする)。 (8) Next, in order to measure the off-axis stationary point 83 of the test surface 80, the flat reference plate 26 is arranged on the measurement optical axis L instead of the spherical reference lens 25, and the sample stage 6 is used. Then, the position of the test surface 80 in the measurement optical axis L direction is adjusted. In this position adjustment, as shown in FIG. 3C, the measurement light composed of a plane wave output from the interference optical system 2 is incident on the off-axis stop point portion 83, and the shape information of the off-axis stop point portion 83 is obtained. Is performed so that the imaging system 4 can capture an image of the interference fringes carrying the. At the time of measurement of the off-axis stationary point portion 83, using a transmission type liquid crystal display device 70 to form a light shielding pattern P 2 described above, this is to be projected onto the test surface 80 (the translucent areas S 1 is is projected on the convex portion 82 and the off-axis stationary point portion 83, the light shielding area S 2 is to be projected to the concave portion 81).

(9)続いて、軸外停留点部83に測定光を照射して、軸外停留点部83から反射された戻り光と、平面基準板26の参照基準平面26aからの参照光との干渉により形成される干渉縞を撮像系4において撮像し、その画像データを形状解析手段50に入力する。なお、この軸外停留点部83の測定に際しては、凸面部82にも測定光が照射されることとなるが、コンピュータシミュレーション等による光線追跡によって、該凸面部82からの反射光は、後述の不要光とはならないことを確認した上で、このような遮光パターンPを投影するようにしている。 (9) Subsequently, the measurement light is irradiated to the off-axis stop point 83, and interference between the return light reflected from the off-axis stop point 83 and the reference light from the reference reference plane 26a of the flat reference plate 26 is achieved. The imaging system 4 captures the interference fringes formed by the above and inputs the image data to the shape analysis means 50. In the measurement of the off-axis stop point 83, the convex surface 82 is also irradiated with measurement light. However, the reflected light from the convex surface 82 is reflected by the ray tracing by computer simulation or the like as described later. after confirming that not unnecessary light, so that projecting the light shielding pattern P 2.

(10)次に、形状解析手段50において、各々の干渉縞の画像データに基づき、凹面部81、凸面部82および軸外停留点部83の形状情報を求め、各々の形状情報を互いに繋ぎ合わせることにより、被検面80全域の形状情報を求める。具体的には、凹面部81の上記複数の部分領域毎に対応した複数の領域別干渉縞の画像データに基づき複数の部分領域毎の形状情報を求め、該複数の部分領域毎の形状情報を互いに繋ぎ合わせることにより、該複数の部分領域を合併した凹面部81全域の形状情報を求める。同様に、凸面部82の上記複数の部分領域毎に対応した複数の領域別干渉縞の画像データに基づき複数の部分領域毎の形状情報を求め、該複数の部分領域毎の形状情報を互いに繋ぎ合わせることにより、該複数の部分領域を合併した凸面部82全域の形状情報を求める。また、軸外停留点部83に対応した干渉縞の画像データに基づき軸外停留点部83の形状情報を求める。そして、凹面部81全域、凸面部82全域および軸外停留点部83の各形状情報を互いに繋ぎ合わせることにより、被検面80全域の形状情報を求める。   (10) Next, the shape analysis means 50 obtains the shape information of the concave surface portion 81, the convex surface portion 82, and the off-axis stop point portion 83 based on the image data of each interference fringe, and connects the shape information to each other. Thus, the shape information of the entire test surface 80 is obtained. Specifically, shape information for each of the plurality of partial regions is obtained based on the image data of the plurality of region-specific interference fringes corresponding to the plurality of partial regions of the concave surface portion 81, and the shape information for each of the plurality of partial regions is obtained. By connecting them together, the shape information of the entire concave surface portion 81 obtained by merging the plurality of partial regions is obtained. Similarly, shape information for each of the plurality of partial areas is obtained based on the image data of the plurality of area-specific interference fringes corresponding to the plurality of partial areas of the convex portion 82, and the shape information for each of the plurality of partial areas is connected to each other. By combining them, shape information of the entire convex surface portion 82 obtained by merging the plurality of partial regions is obtained. Further, the shape information of the off-axis stop point 83 is obtained based on the image data of the interference fringes corresponding to the off-axis stop point 83. Then, the shape information of the entire test surface 80 is obtained by connecting the shape information of the entire concave surface portion 81, the entire convex surface portion 82, and the off-axis stop point portion 83.

なお、上述のように遮光パターンP,Pは、被検面80に測定光が照射されたときに該被検面80の一部領域から反射されて撮像系4に入射する不要光の発生を防止するために、この一部領域に入射する測定光の光量を低減させるためのものである。ここで、この不要光について図5を用いて説明する。図5は測定時に発生する不要光を示す模式図であり、図5の上部には、2次元イメージセンサ42の正面図がその断面図と共に模式的に示してある(正面図の方が上方に位置する)。また、図5では、分岐光学素子3、第2コリメータレンズ24、球面基準レンズ25および結像レンズ40を含む光学系を簡略化して示してある。 As described above, the light shielding patterns P 1 and P 2 are formed of unnecessary light that is reflected from a partial region of the test surface 80 and incident on the imaging system 4 when the test surface 80 is irradiated with measurement light. In order to prevent the occurrence, the amount of measurement light incident on the partial region is reduced. Here, this unnecessary light will be described with reference to FIG. FIG. 5 is a schematic diagram showing unnecessary light generated at the time of measurement. A front view of the two-dimensional image sensor 42 is schematically shown in the upper part of FIG. 5 together with a cross-sectional view thereof. To position). In FIG. 5, the optical system including the branch optical element 3, the second collimator lens 24, the spherical reference lens 25, and the imaging lens 40 is shown in a simplified manner.

図5に示すように、被検面80の凸面部82を測定するために、収束する球面波からなる測定光を被検面80に照射する場合を考察する。このとき、凸面部82から再帰反射され、球面基準レンズ25、第2コリメータレンズ24、分岐光学素子3および結像レンズ40を経て2次元イメージセンサ42上の結像点Fに入射する光があるとする。一方、同時に、凹面部81から反射されて上記結像点Fに入射する、光量の大きい光がある場合に、この光が不要光となる。なお、被検面80が回転対称形状であるため、このような不要光が入射する位置は、2次元イメージセンサ42上において円を描くように生じる。本実施例では、凸面部82を測定する際に、上記遮光パターンPを被検面80に投影することにより、凹面部81に入射する測定光の光量を低減することができるので、このような不要光の発生を防止することが可能となる。なお、凹面部81を測定する場合の不要光の発生および上記遮光パターンPの作用についても同様である。 As shown in FIG. 5, in order to measure the convex surface portion 82 of the test surface 80, the case where the test surface 80 is irradiated with measurement light composed of converging spherical waves will be considered. At this time, there is light that is retroreflected from the convex surface portion 82 and enters the imaging point F on the two-dimensional image sensor 42 through the spherical reference lens 25, the second collimator lens 24, the branching optical element 3, and the imaging lens 40. And On the other hand, when there is a large amount of light that is reflected from the concave surface portion 81 and is incident on the imaging point F, this light becomes unnecessary light. In addition, since the test surface 80 has a rotationally symmetric shape, the position where such unnecessary light is incident is generated on the two-dimensional image sensor 42 so as to draw a circle. In the present embodiment, when measuring the convex portion 82, by projecting said light shielding pattern P 2 on the test surface 80, it is possible to reduce the power of the measuring beam incident on the concave portion 81, thus It is possible to prevent generation of unnecessary light. The same applies to the development and operation of the light-shielding pattern P 1 of the unwanted light when measuring the concave portion 81.

また、どのように測定光を照射したときに、被検面80のどの位置から不要光が発生するかについては、コンピュータシミュレーション等による光線追跡によって事前に把握することが可能である。そこで、このような光線追跡により把握した、不要光が発生する領域のみを遮光するような遮光パターン(図示略)を被検面80に投影してもよい。   Further, it is possible to know in advance by ray tracing by computer simulation or the like from which position of the test surface 80 the unnecessary light is generated when the measurement light is irradiated. Therefore, a light shielding pattern (not shown) which is grasped by such ray tracing and which shields only a region where unnecessary light is generated may be projected onto the test surface 80.

一方、上述のように、凹面部81や凸面部82を複数の部分領域に分割し、その部分領域毎に測定を行う場合には、この各部分領域のみに測定光が照射されるような遮光パターン(図6に示す遮光パターンP)を被検面80に投影してもよい。図6は被検面80を測定する際の遮光パターンの別の例を示す図である。図6に示す遮光パターンPは、光源部20からの出力光を透過する透光エリアSが、上記複数の部分領域毎に対応するように円環状に形成され、その他の部分が、出力光を遮断する遮光エリアSとされたものであり、複数の部分領域毎に測定する際に、透光エリアSが測定対象となる部分領域に投影され、遮光エリアSが被検面80のその余の領域に投影されるように設定されている。また、複数の部分領域の位置や大きさの変化に応じて、透光エリアSの径や円環の幅が順次変更されるようになっている。この遮光パターンPの投影により、測定対象となる部分領域以外の領域からの不要光の発生を防止することが可能となる。 On the other hand, as described above, when the concave surface portion 81 or the convex surface portion 82 is divided into a plurality of partial areas and measurement is performed for each partial area, the light shielding is performed so that only each partial area is irradiated with the measurement light. A pattern (a light shielding pattern P 3 shown in FIG. 6) may be projected onto the test surface 80. FIG. 6 is a diagram showing another example of the light shielding pattern when measuring the test surface 80. Shielding pattern P 3 shown in FIG. 6, the light transmitting area S 1 for transmitting output light from the light source portion 20 is formed in an annular shape so as to correspond to each of the plurality of partial regions, other parts are output The light-shielding area S 2 is a light-shielding area S 2, and when measuring a plurality of partial areas, the light-transmitting area S 1 is projected onto the partial area to be measured, and the light-shielding area S 2 is the test surface. It is set to be projected onto the remaining area of 80. Further, in accordance with a change in position or size of a plurality of partial regions, the width of the diameter and annular light transmitting area S 1 is adapted to be sequentially changed. The projection of the light shielding pattern P 3, it is possible to prevent the generation of unnecessary light from the area other than the partial region to be measured.

次に、他の被検レンズ(図7に示す被検レンズ9)を測定する場合について説明する。図7は他の被検レンズ9の構成を示す図((A)断面図、(B)平面図)であり、図8はこの被検レンズ9の被検面90を測定するときの遮光パターンの一例((A)は凹面部、(B)は凸面部および軸外停留点部の各測定時)を示す図である。また、図9はこの被検面90を測定するときの遮光パターンの別の例を示す図である。   Next, the case of measuring another test lens (the test lens 9 shown in FIG. 7) will be described. FIG. 7 is a diagram ((A) cross-sectional view, (B) plan view) showing the configuration of another lens 9 to be tested, and FIG. 8 is a light-shielding pattern when measuring the surface 90 to be tested. (A) is a concave surface part, (B) is a figure which shows the time of each measurement of a convex surface part and an off-axis stop point part. FIG. 9 is a diagram showing another example of the light shielding pattern when measuring the test surface 90.

図7に示すように被検レンズ9は、光軸Cを挟んで図中左右対称となる柱面形状の被検面90を有しており、該被検面90は、光軸Cを中心に上記干渉光学系2側(図7(A)での上側)に凹となる凹面部91と、光軸Cを中心に上記干渉光学系2側に凸となる凸面部92と、凹面部91と凸面部92との境界部分に位置する軸外停留点部93とを有してなる。 As shown in FIG. 7, the test lens 9 has a columnar test surface 90 that is symmetrical in the figure with the optical axis C 2 in between, and the test surface 90 has an optical axis C 2. a concave portion 91 which is concave, a convex portion 92 that protrudes in the interference optical system 2 side around the optical axis C 2 of the above about the interference optical system 2 side (upper side in FIG. 7 (a)), It has an off-axis stop point portion 93 located at the boundary portion between the concave surface portion 91 and the convex surface portion 92.

なお、凹面部91、凸面部92および軸外停留点部93の形状の特徴は、柱面形状の一部を構成するものである点を除けば上記被検面80と同様であり、図中幅d´の直帯状の2つの領域を軸外停留点部93とし、この2つの軸外停留点部93の内側に位置する幅(径)d´の凹状領域を凹面部91とし、各軸外停留点部93の外側に位置する幅d´の2つの直帯状の領域を凸面部92としている。 The features of the shapes of the concave surface portion 91, the convex surface portion 92, and the off-axis stop point portion 93 are the same as those of the test surface 80 except that they constitute a part of the column surface shape. Two straight belt-shaped regions having a width d 2 ′ are defined as off-axis stationary point portions 93, and a concave region having a width (diameter) d 1 ′ located inside the two off-axis stationary point portions 93 is defined as a concave surface portion 91. Two straight belt-like regions having a width d 3 ′ located outside each off-axis stop point portion 93 are defined as a convex surface portion 92.

この被検レンズ9の被検面90を測定する場合は、図1に示す円筒基準レンズ27を測定光軸L上に配置する。なお、測定手順は、上記被検面80を測定する場合と同様であり、詳細な説明は省略する。   When measuring the test surface 90 of the test lens 9, the cylindrical reference lens 27 shown in FIG. 1 is arranged on the measurement optical axis L. The measurement procedure is the same as that for measuring the test surface 80, and a detailed description thereof will be omitted.

一方、図8(A)に示す遮光パターンPは、上記凹面部91を測定する際に、上記透過型液晶表示素子70を用いて形成されるものである。この遮光パターンPは、光源部20からの出力光を透過する直帯状の透光エリアSが中央部に形成され、その左右両側に、出力光を遮断する2つの遮光エリアSが形成されたものであり、凹面部91を測定する際に、透光エリアSが凹面部91に投影され、遮光エリアSが凸面部92および軸外停留点部93に投影されるように設定されている。この遮光パターンPの投影により、凹面部91の測定時における凸面部92および軸外停留点部93からの不要光の発生を防止するようになっている。 On the other hand, the light shielding pattern P 4 shown in FIG. 8A is formed using the transmissive liquid crystal display element 70 when measuring the concave surface portion 91. In the light shielding pattern P 4 , a straight belt-like light transmitting area S 1 that transmits the output light from the light source unit 20 is formed in the center, and two light shielding areas S 2 that block the output light are formed on the left and right sides thereof. are those which are, in measuring the concave portion 91, configured to translucent area S 1 is projected onto the concave portion 91, the light shielding area S 2 is projected on the convex portion 92 and the off-axis stationary point portion 93 Has been. By projecting the light shielding pattern P 4 , unnecessary light from the convex surface portion 92 and the off-axis stop point portion 93 at the time of measuring the concave surface portion 91 is prevented.

また、図8(B)に示す遮光パターンPは、上記凸面部92を測定する際に、上記透過型液晶表示素子70を用いて形成されるものである。この遮光パターンPは、光源部20からの出力光を遮断する直帯状の遮光エリアSが中央部に形成され、その左右両側に、出力光を透過する2つの透光エリアSが形成されたものであり、凸面部92を測定する際に、透光エリアSが凸面部92および軸外停留点部93に投影され、遮光エリアSが凹面部91に投影されるように設定されている。この遮光パターンPの投影により、凸面部92の測定時における凹面部91からの不要光の発生を防止するようになっている。なお、この凸面部92の測定に際しては、軸外停留点部93にも測定光が照射されることとなるが、コンピュータシミュレーション等による光線追跡によって、該軸外停留点部93からの反射光は、前述の不要光とはならないことを確認した上で、このような遮光パターンPを投影するようにしている。 The light shielding pattern P 5 shown in FIG. 8 (B), when measuring the convex portion 92, and is formed by using the transmission type liquid crystal display device 70. In the light shielding pattern P 5 , a straight belt-shaped light shielding area S 2 that blocks output light from the light source unit 20 is formed in the central portion, and two light transmitting areas S 1 that transmit output light are formed on the left and right sides thereof. are those which are, in measuring the convex portion 92, the light transmitting area S 1 is projected onto the convex portion 92 and the off-axis stationary point portion 93, configured shielding area S 2 is projected to the concave portion 91 Has been. The projection of the light-shielding pattern P 5, so as to prevent the occurrence of unnecessary light from the concave portion 91 at the time of measurement of the convex portion 92. When measuring the convex surface portion 92, the off-axis stationary point portion 93 is also irradiated with the measuring light. However, the reflected light from the off-axis stationary point portion 93 is reflected by ray tracing by computer simulation or the like. , so that after confirming that not unnecessary light of the foregoing, projecting the light shielding pattern P 4.

また、この遮光パターンPは、軸外停留点部93を測定する場合にも用いられる。すなわち、軸外停留点部93を測定する際には、円筒基準レンズ27に替えて平面基準板26が測定光軸L上に配置されるとともに、過型液晶表示素子70を用いて遮光パターンPを形成し、これを被検面90に投影するようにする(透光エリアSが凸面部92および軸外停留点部93に投影され、遮光エリアSが凹面部91に投影されるようにする)。なお、この軸外停留点部93の測定に際しては、凸面部92にも測定光が照射されることとなるが、コンピュータシミュレーション等による光線追跡によって、該凸面部92からの反射光は、前述の不要光とはならないことを確認した上で、このような遮光パターンPを投影するようにしている。 Further, the light-shielding pattern P 4 is also used when measuring the off-axis stationary point portion 93. That is, when measuring the off-axis stop point 93, the flat reference plate 26 is disposed on the measurement optical axis L instead of the cylindrical reference lens 27, and the light shielding pattern P is used using the over-type liquid crystal display element 70. 4 is projected onto the test surface 90 (the translucent area S 1 is projected onto the convex surface portion 92 and the off-axis stop point portion 93, and the light shielding area S 2 is projected onto the concave surface portion 91. ). In measuring the off-axis stop point 93, the convex surface 92 is also irradiated with measurement light. However, the reflected light from the convex surface 92 is reflected by the ray tracing by computer simulation or the like as described above. after confirming that not unnecessary light, so that projecting the light shielding pattern P 4.

また、図9に示す遮光パターンPは、上述の被検面80における凹面部81および凸面部82に対する測定と同様に、凹面部91や凸面部92を複数の部分領域に分割し、その部分領域毎に測定を行う場合において、この各部分領域のみに測定光が照射されるようにするためのものである。この遮光パターンPは、光源部20からの出力光を透過する透光エリアSが、複数の部分領域毎に対応するように2つの細い直帯状に形成され、その他の部分が、出力光を遮断する遮光エリアSとされたものであり、複数の部分領域毎に測定する際に、透光エリアSが測定対象となる部分領域に投影され、遮光エリアSが被検面90のその余の領域に投影されるように設定されている。また、複数の部分領域の位置や大きさの変化に応じて、2つの透光エリアSの位置や幅が適宜変更されるようになっている。この遮光パターンPの投影により、測定対象となる部分領域以外の領域からの不要光の発生を防止することが可能となる。 The light shielding pattern P 6 shown in FIG. 9, as well as the measurements for the concave portion 81 and convex portion 82 of the test surface 80 described above, dividing the concave portion 91 and convex portion 92 into a plurality of partial regions, parts thereof In the case where the measurement is performed for each region, the measurement light is irradiated only to each partial region. The light-shielding pattern P 6 is formed in two thin straight strips so that the light-transmitting area S 1 that transmits the output light from the light source unit 20 corresponds to each of a plurality of partial areas, and the other portions are output light. has been set to the light-shielding area S 2 for blocking, when measuring for each of the plurality of partial regions, is projected onto a partial area light transmitting area S 1 is be measured, the light-shielding area S 2 is the surface to be inspected 90 It is set to be projected onto the remaining area of. Further, in accordance with a change in position or size of a plurality of partial regions, two positions and widths of the translucent area S 1 is adapted to be changed as appropriate. The projection of the light-shielding pattern P 6, it is possible to prevent the generation of unnecessary light from the area other than the partial region to be measured.

以上、本発明の実施形態について詳細に説明したが、本発明は上述の実施形態に限定されるものではなく、種々に態様を変更することが可能である。   As mentioned above, although embodiment of this invention was described in detail, this invention is not limited to the above-mentioned embodiment, A various aspect can be changed.

例えば、上述の実施形態では、回転対称形状の被検面80と柱面形状の被検面90を共に測定するために、球面波を出力する球面基準レンズ25と、円筒波を出力する円筒基準レンズ27とを交換可能に備えているが、測定対象となる被検面の形状が限定されている場合には、2種類の基準レンズを備える必要はない。   For example, in the above-described embodiment, in order to measure both the rotationally symmetric test surface 80 and the columnar test surface 90, the spherical reference lens 25 that outputs spherical waves and the cylindrical reference that outputs cylindrical waves. Although the lens 27 is interchangeably provided, it is not necessary to provide two types of reference lenses when the shape of the surface to be measured is limited.

また、上述の実施形態では、被検面80,90の軸外停留点部83,93を測定する場合に、平面波を出力する平面基準板26を交換可能に備えているが、このような軸外停留点部を測定対象としない場合や、測定対象とする場合でも上記球面基準レンズ25や円筒基準レンズ27によって測定が可能である場合には、平面基準板26を備える必要はない。   In the above-described embodiment, when measuring the off-axis stop points 83 and 93 of the test surfaces 80 and 90, the plane reference plate 26 that outputs a plane wave is replaceably provided. In the case where the outer stationary point portion is not a measurement target or the measurement is possible with the spherical reference lens 25 or the cylindrical reference lens 27 even when the measurement is performed, the planar reference plate 26 is not necessary.

また、上述の実施形態では、光量分布調整手段7の空間光変調素子が透過型液晶表示素子70とされているが、反射型液晶表示素子やDMD(デジタル・マイクロミラー・デバイス)等の空間光変調素子を用いることも可能である。   In the above-described embodiment, the spatial light modulation element of the light quantity distribution adjusting means 7 is the transmissive liquid crystal display element 70, but spatial light such as a reflective liquid crystal display element or DMD (digital micromirror device) is used. It is also possible to use a modulation element.

また、光量分布調整手段7を、光源部20からの出力光を2つの光束に分岐し、該2つの光束を互いに異なる経路を経由させた後に互いに干渉させることによって測定光の光量分布を調整する干渉縞形成光学系を用いて構成することも可能である。このような干渉縞形成光学系については、特願2008−256886号明細書に詳述されている。   Further, the light quantity distribution adjusting means 7 adjusts the light quantity distribution of the measurement light by branching the output light from the light source unit 20 into two light beams and causing the two light beams to interfere with each other after passing through different paths. It is also possible to use an interference fringe forming optical system. Such an interference fringe forming optical system is described in detail in Japanese Patent Application No. 2008-256886.

また、上述の実施形態では、干渉光学系2がフィゾータイプの光学系配置をなすものとされているが、マイケルソンタイプ等の他の光学系配置をなす干渉光学系を用いることも可能である。   In the above-described embodiment, the interference optical system 2 has a Fizeau type optical system arrangement, but an interference optical system having another optical system arrangement such as a Michelson type can also be used. .

一実施形態に係る光波干渉測定装置の概略構成図1 is a schematic configuration diagram of a lightwave interference measurement apparatus according to an embodiment. 被検レンズの構成を示す図((A)断面図、(B)平面図)The figure which shows the structure of a to-be-tested lens ((A) sectional drawing, (B) top view) 測定光の照射パターン((A)凹面部、(B)凸面部、(C)軸外停留点部の各測定時)を示す図The figure which shows the irradiation pattern (at the time of each measurement of (A) concave surface part, (B) convex surface part, (C) off-axis stop point part) of measurement light 遮光パターンの一例((A)は凹面部、(B)は凸面部および軸外停留点部の各測定時)を示す図The figure which shows an example (when (A) is a concave surface part, (B) is each measurement of a convex surface part and an off-axis stop point part) a light-shielding pattern) 発生する不要光を模式的に示す図A diagram schematically showing the unnecessary light generated 遮光パターンの別の例を示す図The figure which shows another example of a light-shielding pattern 他の被検レンズの構成を示す図((A)断面図、(B)平面図)The figure which shows the structure of another test lens ((A) sectional drawing, (B) top view) 他の被検面測定時の遮光パターンの一例((A)は凹面部、(B)は凸面部および軸外停留点部の各測定時)を示す図The figure which shows an example of the light-shielding pattern at the time of other test surface measurement ((A) is a concave surface part, (B) is at the time of each measurement of a convex surface part and an off-axis stop point part). 他の被検面測定時の遮光パターンの別の例を示す図The figure which shows another example of the light-shielding pattern at the time of other test surface measurement

符号の説明Explanation of symbols

1 光波干渉測定装置
2 干渉光学系
3 分岐光学素子
4 撮像系
5 測定解析系
6 サンプルステージ
7 光量分布調整手段
8,9 被検レンズ
20 光源部
21 第1コリメータレンズ
22 収束レンズ
23 ピンホール板
23a ピンホール
24 第2コリメータレンズ
25 球面基準レンズ
25a 参照基準球面
26 平面基準板
26a 参照基準平面
27 円筒基準レンズ
27a 参照基準円筒面
40 結像レンズ
41 撮像カメラ
42 2次元イメージセンサ
50 形状解析手段
51 表示装置
52 入力装置
70 透過型液晶表示素子
80,90 被検面
81,91 凹面部
82,92 凸面部
83,93 軸外停留点部
,C (被検面の)光軸
L 測定光軸
〜N 法線
〜P 遮光パターン
(遮光パターンの)透光エリア
(遮光パターンの)遮光エリア
DESCRIPTION OF SYMBOLS 1 Light wave interference measuring device 2 Interference optical system 3 Branching optical element 4 Imaging system 5 Measurement analysis system 6 Sample stage 7 Light quantity distribution adjustment means 8, 9 Test lens 20 Light source part 21 First collimator lens 22 Converging lens 23 Pinhole plate 23a Pinhole 24 Second collimator lens 25 Spherical standard lens 25a Reference standard spherical surface 26 Plane standard plate 26a Reference standard plane 27 Cylindrical standard lens 27a Reference standard cylindrical surface 40 Imaging lens 41 Imaging camera 42 Two-dimensional image sensor 50 Shape analysis means 51 Display Device 52 Input device 70 Transmission type liquid crystal display element 80, 90 Test surface 81, 91 Concave surface portion 82, 92 Convex surface portion 83, 93 Off-axis stop point C 1 , C 2 (axis of test) Optical axis L Measurement light axis N 1 to N 3 normal P 1 to P 6 shielding pattern S 1 (light-shielding pattern) translucent area S 2 Light shielding area (of light shielding pattern)

Claims (3)

被検面の光軸が測定光軸と一致するように該被検面を保持する保持手段と、光源部からの出力光を測定光に変換して前記被検面に照射し該被検面からの戻り光を参照光と合波して干渉光を得る干渉光学系と、得られた干渉光を該干渉光学系の光路から分岐させる分岐光学素子と、分岐された干渉光により形成される干渉縞を撮像する撮像系と、撮像された干渉縞を解析して前記被検面の形状を求める測定解析系と、前記干渉光学系に対する前記被検面の前記測定光軸方向の相対的位置を変化させる照射位置可変手段と、を備えた光波干渉測定装置であって、
前記被検面は、前記光軸を中心に前記干渉光学系側に凹となる凹面部と、該光軸を中心に該干渉光学系側に凸となる凸面部と、該光軸から外れた位置にあって該光軸に対し垂直な軸外停留点部とを有するものであり、
前記干渉光学系は、収束しながら進行する球面波または円筒波、および平面波を選択的に前記測定光として出力するものであり、
前記軸外停留点部を測定する場合には、前記平面波からなる前記測定光を該軸外停留点部に照射して測定を行い、
前記照射位置可変手段を用いて前記相対的位置を変化させることにより、前記凹面部を測定する場合には、前記球面波または前記円筒波からなる前記測定光が一旦収束した後に発散しながら該凹面部に照射されるようにして測定を行い、前記凸面部を測定する場合には、前記球面波または前記円筒波からなる前記測定光が収束しながら該凸面部に照射されるようにして測定を行う、ことを特徴とする光波干渉測定装置。
Holding means for holding the test surface so that the optical axis of the test surface coincides with the measurement optical axis, and the test surface by converting the output light from the light source unit into measurement light and irradiating the test surface An interference optical system that combines return light from the reference light with reference light to obtain interference light, a branch optical element that branches the obtained interference light from the optical path of the interference optical system, and a branched interference light An imaging system that images interference fringes, a measurement analysis system that analyzes the captured interference fringes to obtain the shape of the test surface, and a relative position of the test surface relative to the interference optical system in the measurement optical axis direction A light wave interference measuring device comprising an irradiation position variable means for changing
The test surface is deviated from the optical axis, a concave surface portion that is concave toward the interference optical system side around the optical axis, and a convex surface portion that is convex toward the interference optical system side around the optical axis. And having an off-axis stop point perpendicular to the optical axis.
The interference optical system selectively outputs a spherical wave or a cylindrical wave that travels while converging, and a plane wave as the measurement light,
When measuring the off-axis stop point portion, measure by irradiating the off-axis stop point portion with the measurement light consisting of the plane wave,
When measuring the concave portion by changing the relative position using the irradiation position varying means, the concave surface is diverges after the measurement light composed of the spherical wave or the cylindrical wave is once converged. When measuring the convex surface portion, the measurement is performed so that the measurement light consisting of the spherical wave or the cylindrical wave is irradiated to the convex surface portion while converging. A light wave interference measuring apparatus characterized by performing.
前記照射位置可変手段を用いて前記相対的位置を順次変化させながら、前記凹面部または前記凸面部の複数の部分領域毎に対応した複数の領域別干渉縞を前記撮像系において順次撮像し、
前記測定解析系において、前記複数の領域別干渉縞に基づき前記複数の部分領域毎の形状情報を求め、該複数の部分領域毎の形状情報を互いに繋ぎ合わせることにより、該複数の部分領域を合併した全域の形状情報を求める、ことを特徴とする請求項1記載の光波干渉測定装置。
While sequentially changing the relative position using the irradiation position variable means, a plurality of inter-region interference fringes corresponding to each of the concave surface portion or a plurality of partial regions of the convex surface portion is sequentially imaged in the imaging system,
In the measurement analysis system, shape information for each of the plurality of partial regions is obtained based on the plurality of region-specific interference fringes, and the plurality of partial regions are merged by connecting the shape information for each of the plurality of partial regions. 2. The optical interference measuring apparatus according to claim 1, wherein shape information of the entire area is obtained.
前記被検面に前記測定光が照射されたときに該被検面の一部領域から反射されて前記撮像系に入射する不要光の発生を防止するために、前記一部領域に入射する前記測定光の光量が低減するように該測定光の前記被検面上での光量分布を調整する光量分布調整手段を、前記光源部と前記分岐光学素子との間の光路上に配置してなる、ことを特徴とする請求項1または2記載の光波干渉測定装置。
In order to prevent generation of unnecessary light that is reflected from a partial region of the test surface and is incident on the imaging system when the measurement light is irradiated on the test surface, the light is incident on the partial region. A light amount distribution adjusting means for adjusting a light amount distribution on the test surface of the measurement light so as to reduce the light amount of the measurement light is disposed on an optical path between the light source unit and the branch optical element. The light wave interference measuring apparatus according to claim 1 or 2, characterized in that
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018200250A (en) * 2017-05-29 2018-12-20 パナソニックIpマネジメント株式会社 Interferometry device and interferometry method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018200250A (en) * 2017-05-29 2018-12-20 パナソニックIpマネジメント株式会社 Interferometry device and interferometry method

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