JP2010078820A - Method for producing photosensitive film, photosensitive film, photosensitive laminate, permanent pattern forming method and printed circuit board - Google Patents
Method for producing photosensitive film, photosensitive film, photosensitive laminate, permanent pattern forming method and printed circuit board Download PDFInfo
- Publication number
- JP2010078820A JP2010078820A JP2008246108A JP2008246108A JP2010078820A JP 2010078820 A JP2010078820 A JP 2010078820A JP 2008246108 A JP2008246108 A JP 2008246108A JP 2008246108 A JP2008246108 A JP 2008246108A JP 2010078820 A JP2010078820 A JP 2010078820A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- group
- photosensitive film
- film
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 63
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 150000001875 compounds Chemical class 0.000 claims abstract description 76
- 238000000576 coating method Methods 0.000 claims abstract description 38
- 239000011248 coating agent Substances 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 239000011342 resin composition Substances 0.000 claims abstract description 33
- 239000007788 liquid Substances 0.000 claims abstract description 18
- 239000003999 initiator Substances 0.000 claims abstract description 17
- 239000002253 acid Substances 0.000 claims abstract description 16
- 238000001035 drying Methods 0.000 claims abstract description 13
- 238000002360 preparation method Methods 0.000 claims abstract description 8
- 239000003513 alkali Substances 0.000 claims abstract description 6
- 230000008569 process Effects 0.000 claims description 20
- 239000003431 cross linking reagent Substances 0.000 claims description 14
- 239000000945 filler Substances 0.000 claims description 7
- 230000007261 regionalization Effects 0.000 claims description 3
- 230000007547 defect Effects 0.000 abstract description 17
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- -1 polyethylene Polymers 0.000 description 136
- 239000010410 layer Substances 0.000 description 77
- 239000003822 epoxy resin Substances 0.000 description 50
- 229920000647 polyepoxide Polymers 0.000 description 50
- 230000000670 limiting effect Effects 0.000 description 26
- 239000000243 solution Substances 0.000 description 26
- 239000000049 pigment Substances 0.000 description 25
- 230000001681 protective effect Effects 0.000 description 23
- 229910000679 solder Inorganic materials 0.000 description 20
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 19
- 238000010438 heat treatment Methods 0.000 description 19
- 239000007787 solid Substances 0.000 description 19
- 239000004593 Epoxy Substances 0.000 description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 238000009413 insulation Methods 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 125000001424 substituent group Chemical group 0.000 description 12
- 229920001187 thermosetting polymer Polymers 0.000 description 12
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- 229920001577 copolymer Polymers 0.000 description 10
- 230000035945 sensitivity Effects 0.000 description 10
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000011161 development Methods 0.000 description 9
- 230000018109 developmental process Effects 0.000 description 9
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- 239000005020 polyethylene terephthalate Substances 0.000 description 9
- 229920000139 polyethylene terephthalate Polymers 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 8
- MBHRHUJRKGNOKX-UHFFFAOYSA-N [(4,6-diamino-1,3,5-triazin-2-yl)amino]methanol Chemical compound NC1=NC(N)=NC(NCO)=N1 MBHRHUJRKGNOKX-UHFFFAOYSA-N 0.000 description 8
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 7
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 7
- 238000001723 curing Methods 0.000 description 7
- 125000003700 epoxy group Chemical group 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 239000005056 polyisocyanate Substances 0.000 description 7
- 229920001228 polyisocyanate Polymers 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- QTUVQQKHBMGYEH-UHFFFAOYSA-N 2-(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC=N1 QTUVQQKHBMGYEH-UHFFFAOYSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 239000004743 Polypropylene Substances 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000002318 adhesion promoter Substances 0.000 description 6
- 150000001298 alcohols Chemical class 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 239000012948 isocyanate Substances 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 229920001155 polypropylene Polymers 0.000 description 6
- 238000012719 thermal polymerization Methods 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 5
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 5
- 125000002252 acyl group Chemical group 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- 230000001976 improved effect Effects 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 125000003566 oxetanyl group Chemical group 0.000 description 5
- 125000000466 oxiranyl group Chemical group 0.000 description 5
- 239000004014 plasticizer Substances 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical class NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 4
- HHOJVZAEHZGDRB-UHFFFAOYSA-N 2-(4,6-diamino-1,3,5-triazin-2-yl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=NC(N)=NC(N)=N1 HHOJVZAEHZGDRB-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 4
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 4
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 4
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 4
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N benzo-alpha-pyrone Natural products C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 4
- 239000002981 blocking agent Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 235000011187 glycerol Nutrition 0.000 description 4
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 4
- 150000002923 oximes Chemical class 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 4
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 3
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001251 acridines Chemical class 0.000 description 3
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000004104 aryloxy group Chemical group 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
- 244000309464 bull Species 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 235000001671 coumarin Nutrition 0.000 description 3
- IOJUPLGTWVMSFF-UHFFFAOYSA-N cyclobenzothiazole Natural products C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 3
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical compound [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 3
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 150000008282 halocarbons Chemical class 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000007974 melamines Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 230000001235 sensitizing effect Effects 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000001029 thermal curing Methods 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical class OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- WMWQTUBQTYZJRI-UHFFFAOYSA-N 1-(4-methoxyphenyl)-n,n-dimethylmethanamine Chemical compound COC1=CC=C(CN(C)C)C=C1 WMWQTUBQTYZJRI-UHFFFAOYSA-N 0.000 description 2
- 125000004214 1-pyrrolidinyl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 2
- XUVKSPPGPPFPQN-UHFFFAOYSA-N 10-Methyl-9(10H)-acridone Chemical compound C1=CC=C2N(C)C3=CC=CC=C3C(=O)C2=C1 XUVKSPPGPPFPQN-UHFFFAOYSA-N 0.000 description 2
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical class C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- DXUMYHZTYVPBEZ-UHFFFAOYSA-N 2,4,6-tris(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DXUMYHZTYVPBEZ-UHFFFAOYSA-N 0.000 description 2
- TZWMFMSDVQGDTC-UHFFFAOYSA-N 2-(2,4-dichlorophenyl)-2-[2-(2,4-dichlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC(Cl)=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC(Cl)=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 TZWMFMSDVQGDTC-UHFFFAOYSA-N 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 2
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- MIUYEAQDHPVUNY-UHFFFAOYSA-N 2-naphthalen-1-yl-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound O1C(C(Cl)(Cl)Cl)=NN=C1C1=CC=CC2=CC=CC=C12 MIUYEAQDHPVUNY-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- DOPJDUKVDLSBPL-UHFFFAOYSA-N 3-(1-benzofuran-2-carbonyl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2OC(C(=O)C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=CC2=C1 DOPJDUKVDLSBPL-UHFFFAOYSA-N 0.000 description 2
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 2
- POTFCSBOXWLDJQ-UHFFFAOYSA-N 3-(2-oxo-5,7-dipropoxychromene-3-carbonyl)-5,7-dipropoxychromen-2-one Chemical compound C1=C(OCCC)C=C2OC(=O)C(C(=O)C3=CC4=C(OCCC)C=C(C=C4OC3=O)OCCC)=CC2=C1OCCC POTFCSBOXWLDJQ-UHFFFAOYSA-N 0.000 description 2
- DIHMJMCGHJMDSE-UHFFFAOYSA-N 3-benzoyl-5,7-dipropoxychromen-2-one Chemical compound O=C1OC2=CC(OCCC)=CC(OCCC)=C2C=C1C(=O)C1=CC=CC=C1 DIHMJMCGHJMDSE-UHFFFAOYSA-N 0.000 description 2
- CPVJWBWVJUAOMV-UHFFFAOYSA-N 3-benzoyl-7-(diethylamino)chromen-2-one Chemical compound O=C1OC2=CC(N(CC)CC)=CC=C2C=C1C(=O)C1=CC=CC=C1 CPVJWBWVJUAOMV-UHFFFAOYSA-N 0.000 description 2
- HYORIVUCOQKMOC-UHFFFAOYSA-N 3-benzoyl-7-methoxychromen-2-one Chemical compound O=C1OC2=CC(OC)=CC=C2C=C1C(=O)C1=CC=CC=C1 HYORIVUCOQKMOC-UHFFFAOYSA-N 0.000 description 2
- GRFNBEZIAWKNCO-UHFFFAOYSA-N 3-pyridinol Chemical compound OC1=CC=CN=C1 GRFNBEZIAWKNCO-UHFFFAOYSA-N 0.000 description 2
- JXNHGZAPOSHJMX-UHFFFAOYSA-N 4-ethenyl-1h-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)(C=C)N1 JXNHGZAPOSHJMX-UHFFFAOYSA-N 0.000 description 2
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- ZXLYUNPVVODNRE-UHFFFAOYSA-N 6-ethenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=C)=N1 ZXLYUNPVVODNRE-UHFFFAOYSA-N 0.000 description 2
- UMPGSTJFSOVGTI-UHFFFAOYSA-N 7-(diethylamino)-3-[3-[4-(diethylamino)phenyl]prop-2-enoyl]chromen-2-one Chemical compound C1=CC(N(CC)CC)=CC=C1C=CC(=O)C1=CC2=CC=C(N(CC)CC)C=C2OC1=O UMPGSTJFSOVGTI-UHFFFAOYSA-N 0.000 description 2
- VPZOKYTXVDEFMM-UHFFFAOYSA-N 7-(diethylamino)-3-[4-(dimethylamino)benzoyl]chromen-2-one Chemical compound O=C1OC2=CC(N(CC)CC)=CC=C2C=C1C(=O)C1=CC=C(N(C)C)C=C1 VPZOKYTXVDEFMM-UHFFFAOYSA-N 0.000 description 2
- SANIRTQDABNCHF-UHFFFAOYSA-N 7-(diethylamino)-3-[7-(diethylamino)-2-oxochromene-3-carbonyl]chromen-2-one Chemical compound C1=C(N(CC)CC)C=C2OC(=O)C(C(=O)C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=CC2=C1 SANIRTQDABNCHF-UHFFFAOYSA-N 0.000 description 2
- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 description 2
- GDALETGZDYOOGB-UHFFFAOYSA-N Acridone Natural products C1=C(O)C=C2N(C)C3=CC=CC=C3C(=O)C2=C1O GDALETGZDYOOGB-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 description 2
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- FZEYVTFCMJSGMP-UHFFFAOYSA-N acridone Chemical class C1=CC=C2C(=O)C3=CC=CC=C3NC2=C1 FZEYVTFCMJSGMP-UHFFFAOYSA-N 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 150000001263 acyl chlorides Chemical class 0.000 description 2
- 125000004442 acylamino group Chemical group 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 2
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 238000010538 cationic polymerization reaction Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 125000002668 chloroacetyl group Chemical group ClCC(=O)* 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 150000004775 coumarins Chemical class 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- VEZUQRBDRNJBJY-UHFFFAOYSA-N cyclohexanone oxime Chemical compound ON=C1CCCCC1 VEZUQRBDRNJBJY-UHFFFAOYSA-N 0.000 description 2
- 125000003074 decanoyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- JQCXWCOOWVGKMT-UHFFFAOYSA-N diheptyl phthalate Chemical compound CCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC JQCXWCOOWVGKMT-UHFFFAOYSA-N 0.000 description 2
- MGWAVDBGNNKXQV-UHFFFAOYSA-N diisobutyl phthalate Chemical compound CC(C)COC(=O)C1=CC=CC=C1C(=O)OCC(C)C MGWAVDBGNNKXQV-UHFFFAOYSA-N 0.000 description 2
- ALOUNLDAKADEEB-UHFFFAOYSA-N dimethyl sebacate Chemical compound COC(=O)CCCCCCCCC(=O)OC ALOUNLDAKADEEB-UHFFFAOYSA-N 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- 125000003104 hexanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- OSWPMRLSEDHDFF-UHFFFAOYSA-N methyl salicylate Chemical compound COC(=O)C1=CC=CC=C1O OSWPMRLSEDHDFF-UHFFFAOYSA-N 0.000 description 2
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 229960000907 methylthioninium chloride Drugs 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- JAOPKYRWYXCGOQ-UHFFFAOYSA-N n,n-dimethyl-1-(4-methylphenyl)methanamine Chemical compound CN(C)CC1=CC=C(C)C=C1 JAOPKYRWYXCGOQ-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 150000002832 nitroso derivatives Chemical class 0.000 description 2
- 239000012766 organic filler Substances 0.000 description 2
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 2
- 150000002921 oxetanes Chemical class 0.000 description 2
- 229950000688 phenothiazine Drugs 0.000 description 2
- 150000003018 phosphorus compounds Chemical class 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000001325 propanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical class OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000004448 titration Methods 0.000 description 2
- LVTPRIAGCBEGPW-UHFFFAOYSA-N (2-benzoyloxyphenyl) benzoate Chemical compound C=1C=CC=CC=1C(=O)OC1=CC=CC=C1OC(=O)C1=CC=CC=C1 LVTPRIAGCBEGPW-UHFFFAOYSA-N 0.000 description 1
- LIZLYZVAYZQVPG-UHFFFAOYSA-N (3-bromo-2-fluorophenyl)methanol Chemical compound OCC1=CC=CC(Br)=C1F LIZLYZVAYZQVPG-UHFFFAOYSA-N 0.000 description 1
- RSHKWPIEJYAPCL-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1(CC)COC1 RSHKWPIEJYAPCL-UHFFFAOYSA-N 0.000 description 1
- PVPBBTJXIKFICP-UHFFFAOYSA-N (7-aminophenothiazin-3-ylidene)azanium;chloride Chemical compound [Cl-].C1=CC(=[NH2+])C=C2SC3=CC(N)=CC=C3N=C21 PVPBBTJXIKFICP-UHFFFAOYSA-N 0.000 description 1
- FIDRAVVQGKNYQK-UHFFFAOYSA-N 1,2,3,4-tetrahydrotriazine Chemical compound C1NNNC=C1 FIDRAVVQGKNYQK-UHFFFAOYSA-N 0.000 description 1
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- VGHSXKTVMPXHNG-UHFFFAOYSA-N 1,3-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC(N=C=O)=C1 VGHSXKTVMPXHNG-UHFFFAOYSA-N 0.000 description 1
- WDCYWAQPCXBPJA-UHFFFAOYSA-N 1,3-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1 WDCYWAQPCXBPJA-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 description 1
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- JCMZZYSPSGHBNM-UHFFFAOYSA-N 1-(4-piperidin-1-ylphenyl)ethanone Chemical compound C1=CC(C(=O)C)=CC=C1N1CCCCC1 JCMZZYSPSGHBNM-UHFFFAOYSA-N 0.000 description 1
- SOLBSNQBVLAREX-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]-2-hydroxy-2-phenylethanone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C(O)C1=CC=CC=C1 SOLBSNQBVLAREX-UHFFFAOYSA-N 0.000 description 1
- DJQUGRDXHMJDTJ-UHFFFAOYSA-N 1-chloro-10h-acridin-9-one Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl DJQUGRDXHMJDTJ-UHFFFAOYSA-N 0.000 description 1
- VKQJCUYEEABXNK-UHFFFAOYSA-N 1-chloro-4-propoxythioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(OCCC)=CC=C2Cl VKQJCUYEEABXNK-UHFFFAOYSA-N 0.000 description 1
- DKTOWFDVEJQWPF-UHFFFAOYSA-N 1-ethylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CC DKTOWFDVEJQWPF-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- 125000001088 1-naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- YUBXLROQJAIVDR-UHFFFAOYSA-N 10-butyl-1-chloroacridin-9-one Chemical compound C1=CC=C2N(CCCC)C3=CC=CC=C3C(=O)C2=C1Cl YUBXLROQJAIVDR-UHFFFAOYSA-N 0.000 description 1
- VYMSWGOFSKMMCE-UHFFFAOYSA-N 10-butyl-2-chloroacridin-9-one Chemical compound ClC1=CC=C2N(CCCC)C3=CC=CC=C3C(=O)C2=C1 VYMSWGOFSKMMCE-UHFFFAOYSA-N 0.000 description 1
- QFDDZIRGHKFRMR-UHFFFAOYSA-N 10-butylacridin-9-one Chemical compound C1=CC=C2N(CCCC)C3=CC=CC=C3C(=O)C2=C1 QFDDZIRGHKFRMR-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- IXHBSOXJLNEOPY-UHFFFAOYSA-N 2'-anilino-6'-(n-ethyl-4-methylanilino)-3'-methylspiro[2-benzofuran-3,9'-xanthene]-1-one Chemical compound C=1C=C(C2(C3=CC=CC=C3C(=O)O2)C2=CC(NC=3C=CC=CC=3)=C(C)C=C2O2)C2=CC=1N(CC)C1=CC=C(C)C=C1 IXHBSOXJLNEOPY-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- CCZNFGBAORROPB-UHFFFAOYSA-N 2,4,6-tris(dibromomethyl)-1,3,5-triazine Chemical compound BrC(Br)C1=NC(C(Br)Br)=NC(C(Br)Br)=N1 CCZNFGBAORROPB-UHFFFAOYSA-N 0.000 description 1
- MTDGBBNHRZHGEH-UHFFFAOYSA-N 2,4-bis(trichloromethyl)-6-[4-(trifluoromethyl)phenyl]-1,3,5-triazine Chemical compound C1=CC(C(F)(F)F)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MTDGBBNHRZHGEH-UHFFFAOYSA-N 0.000 description 1
- MAHQWACFPXJCDL-UHFFFAOYSA-N 2-(1,1,2-trichloroethyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClCC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MAHQWACFPXJCDL-UHFFFAOYSA-N 0.000 description 1
- SAHBIKWAASNWOR-UHFFFAOYSA-N 2-(1-ethynyl-4-naphthalen-1-ylcyclohexa-2,4-dien-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C2(C=CC(=CC2)C=2C3=CC=CC=C3C=CC=2)C#C)=N1 SAHBIKWAASNWOR-UHFFFAOYSA-N 0.000 description 1
- GUKYYIQMUCVKHI-UHFFFAOYSA-N 2-(2,4-dichlorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC1=CC(Cl)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 GUKYYIQMUCVKHI-UHFFFAOYSA-N 0.000 description 1
- AWIDAKDPDDHWLU-UHFFFAOYSA-N 2-(2,6-dibromophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C(=CC=CC=2Br)Br)=N1 AWIDAKDPDDHWLU-UHFFFAOYSA-N 0.000 description 1
- XTPBFBGLZJRBQA-UHFFFAOYSA-N 2-(2,6-difluorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound FC1=CC=CC(F)=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 XTPBFBGLZJRBQA-UHFFFAOYSA-N 0.000 description 1
- BQDBORJXHYJUIV-UHFFFAOYSA-N 2-(2-bromophenyl)-2-[2-(2-bromophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound BrC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Br)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 BQDBORJXHYJUIV-UHFFFAOYSA-N 0.000 description 1
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 1
- OBNDKPYBWSTKBI-UHFFFAOYSA-N 2-(2-fluorophenyl)-2-[2-(2-fluorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound FC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)F)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 OBNDKPYBWSTKBI-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- GYQVIILSLSOFDA-UHFFFAOYSA-N 2-(2-methylphenyl)-2-[2-(2-methylphenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound CC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)C)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GYQVIILSLSOFDA-UHFFFAOYSA-N 0.000 description 1
- DOVNOFWZOSWFKA-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethyl 4-(dimethylamino)benzoate Chemical compound CN(C)C1=CC=C(C(=O)OCCOC(=O)C(C)=C)C=C1 DOVNOFWZOSWFKA-UHFFFAOYSA-N 0.000 description 1
- FNHQLSVILKHZNI-UHFFFAOYSA-N 2-(2-nitrophenyl)-2-[2-(2-nitrophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound [O-][N+](=O)C1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)[N+]([O-])=O)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 FNHQLSVILKHZNI-UHFFFAOYSA-N 0.000 description 1
- DQMOHZLFVGYNAN-UHFFFAOYSA-N 2-(2-phenylethenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=CC=2C=CC=CC=2)=N1 DQMOHZLFVGYNAN-UHFFFAOYSA-N 0.000 description 1
- NNZJWOOLGPPUKX-UHFFFAOYSA-N 2-(2-phenylethenyl)-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound O1C(C(Cl)(Cl)Cl)=NN=C1C=CC1=CC=CC=C1 NNZJWOOLGPPUKX-UHFFFAOYSA-N 0.000 description 1
- WJKHYAJKIXYSHS-UHFFFAOYSA-N 2-(4-chlorophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(Cl)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 WJKHYAJKIXYSHS-UHFFFAOYSA-N 0.000 description 1
- XULUENWKJRQIIT-UHFFFAOYSA-N 2-(4-chlorophenyl)-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound C1=CC(Cl)=CC=C1C1=NN=C(C(Cl)(Cl)Cl)O1 XULUENWKJRQIIT-UHFFFAOYSA-N 0.000 description 1
- NLNVSTLNDJGLTL-UHFFFAOYSA-N 2-(4-ethoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OCC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 NLNVSTLNDJGLTL-UHFFFAOYSA-N 0.000 description 1
- FVNIIPIYHHEXQA-UHFFFAOYSA-N 2-(4-methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 FVNIIPIYHHEXQA-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- MPNIGZBDAMWHSX-UHFFFAOYSA-N 2-(4-methylphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MPNIGZBDAMWHSX-UHFFFAOYSA-N 0.000 description 1
- BZUILZIKDIMXBK-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCC1OC1 BZUILZIKDIMXBK-UHFFFAOYSA-N 0.000 description 1
- CWQZLVPKEVXEOB-UHFFFAOYSA-N 2-(tribromomethyl)-1,3,5-triazine Chemical compound BrC(Br)(Br)C1=NC=NC=N1 CWQZLVPKEVXEOB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- MCNPOZMLKGDJGP-QPJJXVBHSA-N 2-[(e)-2-(4-methoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1\C=C\C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MCNPOZMLKGDJGP-QPJJXVBHSA-N 0.000 description 1
- OVOUKWFJRHALDD-UHFFFAOYSA-N 2-[2-(2-acetyloxyethoxy)ethoxy]ethyl acetate Chemical compound CC(=O)OCCOCCOCCOC(C)=O OVOUKWFJRHALDD-UHFFFAOYSA-N 0.000 description 1
- IJXPXNZUSXLSTF-UHFFFAOYSA-N 2-[2-(4-butoxyphenyl)ethenyl]-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound C1=CC(OCCCC)=CC=C1C=CC1=NN=C(C(Cl)(Cl)Cl)O1 IJXPXNZUSXLSTF-UHFFFAOYSA-N 0.000 description 1
- FCVQHUQFQWAUCC-UHFFFAOYSA-N 2-[2-(4-chlorophenyl)ethenyl]-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound C1=CC(Cl)=CC=C1C=CC1=NN=C(C(Cl)(Cl)Cl)O1 FCVQHUQFQWAUCC-UHFFFAOYSA-N 0.000 description 1
- JIKJXWFVPDDJNU-UHFFFAOYSA-N 2-[2-(4-methoxyphenyl)ethenyl]-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound C1=CC(OC)=CC=C1C=CC1=NN=C(C(Cl)(Cl)Cl)O1 JIKJXWFVPDDJNU-UHFFFAOYSA-N 0.000 description 1
- JENKIIWNWASCFW-UHFFFAOYSA-N 2-[2-(4-methylphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 JENKIIWNWASCFW-UHFFFAOYSA-N 0.000 description 1
- DXYGJDUJLDXFOD-UHFFFAOYSA-N 2-[2-[2-(2-acetyloxyethoxy)ethoxy]ethoxy]ethyl acetate Chemical compound CC(=O)OCCOCCOCCOCCOC(C)=O DXYGJDUJLDXFOD-UHFFFAOYSA-N 0.000 description 1
- AFVRGYYWROABOW-UHFFFAOYSA-N 2-[2-[2-(2-chlorophenyl)ethenyl]phenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC1=CC=CC=C1C=CC1=CC=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 AFVRGYYWROABOW-UHFFFAOYSA-N 0.000 description 1
- XZSHETPTCXWJQQ-UHFFFAOYSA-N 2-[4,5-diphenyl-2-[2-(trifluoromethyl)phenyl]imidazol-2-yl]-4,5-diphenyl-2-[2-(trifluoromethyl)phenyl]imidazole Chemical compound FC(F)(F)C1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)C(F)(F)F)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 XZSHETPTCXWJQQ-UHFFFAOYSA-N 0.000 description 1
- NBFVAHHLOQOFHL-UHFFFAOYSA-N 2-[4-(2-ethoxyethyl)naphthalen-1-yl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(CCOCC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 NBFVAHHLOQOFHL-UHFFFAOYSA-N 0.000 description 1
- TWMGONWXQSKRMH-UHFFFAOYSA-N 2-[4-(2-phenylethenyl)phenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC(C=CC=3C=CC=CC=3)=CC=2)=N1 TWMGONWXQSKRMH-UHFFFAOYSA-N 0.000 description 1
- QEHXZQIWTHKWJG-UHFFFAOYSA-N 2-[4-(2-phenylethynyl)phenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC(=CC=2)C#CC=2C=CC=CC=2)=N1 QEHXZQIWTHKWJG-UHFFFAOYSA-N 0.000 description 1
- OOMPWXYVDCCBEU-UHFFFAOYSA-N 2-[4-[2-(4-methoxyphenyl)ethenyl]phenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C=CC1=CC=C(C=2N=C(N=C(N=2)C(Cl)(Cl)Cl)C(Cl)(Cl)Cl)C=C1 OOMPWXYVDCCBEU-UHFFFAOYSA-N 0.000 description 1
- UJCKHWCWNBGGGA-UHFFFAOYSA-N 2-[4-[2-(4-methoxyphenyl)ethynyl]phenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C#CC1=CC=C(C=2N=C(N=C(N=2)C(Cl)(Cl)Cl)C(Cl)(Cl)Cl)C=C1 UJCKHWCWNBGGGA-UHFFFAOYSA-N 0.000 description 1
- ITAUYOVPSYCCBG-UHFFFAOYSA-N 2-[4-[2-(4-methylphenyl)ethynyl]phenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C#CC1=CC=C(C=2N=C(N=C(N=2)C(Cl)(Cl)Cl)C(Cl)(Cl)Cl)C=C1 ITAUYOVPSYCCBG-UHFFFAOYSA-N 0.000 description 1
- QQYSAMWCESIVCV-UHFFFAOYSA-N 2-[5-[2-carboxy-5-(dimethylamino)phenyl]pentyl]-4-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(C(O)=O)C(CCCCCC=2C(=CC=C(C=2)N(C)C)C(O)=O)=C1 QQYSAMWCESIVCV-UHFFFAOYSA-N 0.000 description 1
- CHSVVAWYRBLWTK-UHFFFAOYSA-N 2-[[2-[1-[2-(oxiran-2-ylmethoxy)phenyl]-9h-fluoren-2-yl]phenoxy]methyl]oxirane Chemical compound C1OC1COC1=CC=CC=C1C1=CC=C(C2=CC=CC=C2C2)C2=C1C1=CC=CC=C1OCC1CO1 CHSVVAWYRBLWTK-UHFFFAOYSA-N 0.000 description 1
- IAFBRPFISOTXSO-UHFFFAOYSA-N 2-[[2-chloro-4-[3-chloro-4-[[1-(2,4-dimethylanilino)-1,3-dioxobutan-2-yl]diazenyl]phenyl]phenyl]diazenyl]-n-(2,4-dimethylphenyl)-3-oxobutanamide Chemical compound C=1C=C(C)C=C(C)C=1NC(=O)C(C(=O)C)N=NC(C(=C1)Cl)=CC=C1C(C=C1Cl)=CC=C1N=NC(C(C)=O)C(=O)NC1=CC=C(C)C=C1C IAFBRPFISOTXSO-UHFFFAOYSA-N 0.000 description 1
- GNCOVOVCHIHPHP-UHFFFAOYSA-N 2-[[4-[4-[(1-anilino-1,3-dioxobutan-2-yl)diazenyl]-3-chlorophenyl]-2-chlorophenyl]diazenyl]-3-oxo-n-phenylbutanamide Chemical compound C=1C=CC=CC=1NC(=O)C(C(=O)C)N=NC(C(=C1)Cl)=CC=C1C(C=C1Cl)=CC=C1N=NC(C(C)=O)C(=O)NC1=CC=CC=C1 GNCOVOVCHIHPHP-UHFFFAOYSA-N 0.000 description 1
- PULOARGYCVHSDH-UHFFFAOYSA-N 2-amino-3,4,5-tris(oxiran-2-ylmethyl)phenol Chemical compound C1OC1CC1=C(CC2OC2)C(N)=C(O)C=C1CC1CO1 PULOARGYCVHSDH-UHFFFAOYSA-N 0.000 description 1
- XSQFAWMDRFSIMY-UHFFFAOYSA-N 2-chloro-4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C(Cl)=C1 XSQFAWMDRFSIMY-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- TZLVUWBGUNVFES-UHFFFAOYSA-N 2-ethyl-5-methylpyrazol-3-amine Chemical compound CCN1N=C(C)C=C1N TZLVUWBGUNVFES-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- URPRWILECKGGKP-UHFFFAOYSA-N 2-methoxy-4-methyl-6-(trichloromethyl)-1,3,5-triazine Chemical compound COC1=NC(C)=NC(C(Cl)(Cl)Cl)=N1 URPRWILECKGGKP-UHFFFAOYSA-N 0.000 description 1
- GOTIJEQQGSMAIN-UHFFFAOYSA-N 2-methyl-4,6-bis(tribromomethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Br)(Br)Br)=NC(C(Br)(Br)Br)=N1 GOTIJEQQGSMAIN-UHFFFAOYSA-N 0.000 description 1
- LETDRANQSOEVCX-UHFFFAOYSA-N 2-methyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 LETDRANQSOEVCX-UHFFFAOYSA-N 0.000 description 1
- QPQDRKMZQYSVAN-UHFFFAOYSA-N 2-naphthalen-2-yl-5-(tribromomethyl)-1,3,4-oxadiazole Chemical compound O1C(C(Br)(Br)Br)=NN=C1C1=CC=C(C=CC=C2)C2=C1 QPQDRKMZQYSVAN-UHFFFAOYSA-N 0.000 description 1
- ATCQBNBWQDWKAF-UHFFFAOYSA-N 2-naphthalen-2-yl-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound O1C(C(Cl)(Cl)Cl)=NN=C1C1=CC=C(C=CC=C2)C2=C1 ATCQBNBWQDWKAF-UHFFFAOYSA-N 0.000 description 1
- 125000001216 2-naphthoyl group Chemical group C1=C(C=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- PWHRSISNZCATDZ-UHFFFAOYSA-N 2-nonyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound CCCCCCCCCC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 PWHRSISNZCATDZ-UHFFFAOYSA-N 0.000 description 1
- PZBLUWVMZMXIKZ-UHFFFAOYSA-N 2-o-(2-ethoxy-2-oxoethyl) 1-o-ethyl benzene-1,2-dicarboxylate Chemical compound CCOC(=O)COC(=O)C1=CC=CC=C1C(=O)OCC PZBLUWVMZMXIKZ-UHFFFAOYSA-N 0.000 description 1
- YJERZJLSXBRUDQ-UHFFFAOYSA-N 2-o-(3,4-dihydroxybutyl) 1-o-methyl benzene-1,2-dicarboxylate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OCCC(O)CO YJERZJLSXBRUDQ-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- HAZQZUFYRLFOLC-UHFFFAOYSA-N 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC=CC=2)=N1 HAZQZUFYRLFOLC-UHFFFAOYSA-N 0.000 description 1
- UAJYMEORHSIBOF-UHFFFAOYSA-N 2-phenyl-5-(tribromomethyl)-1,3,4-oxadiazole Chemical compound O1C(C(Br)(Br)Br)=NN=C1C1=CC=CC=C1 UAJYMEORHSIBOF-UHFFFAOYSA-N 0.000 description 1
- ZJUAJDHQUFXWLV-UHFFFAOYSA-N 2-phenyl-5-(trichloromethyl)-1,3,4-oxadiazole Chemical compound O1C(C(Cl)(Cl)Cl)=NN=C1C1=CC=CC=C1 ZJUAJDHQUFXWLV-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- KKAJSJJFBSOMGS-UHFFFAOYSA-N 3,6-diamino-10-methylacridinium chloride Chemical compound [Cl-].C1=C(N)C=C2[N+](C)=C(C=C(N)C=C3)C3=CC2=C1 KKAJSJJFBSOMGS-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- KEPGNQLKWDULGD-UHFFFAOYSA-N 3-(3-prop-2-enoyloxypropoxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCCCOCCCOC(=O)C=C KEPGNQLKWDULGD-UHFFFAOYSA-N 0.000 description 1
- NEGFNJRAUMCZMY-UHFFFAOYSA-N 3-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC(C(O)=O)=C1 NEGFNJRAUMCZMY-UHFFFAOYSA-N 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- ODQSBWZDOSNPAH-UHFFFAOYSA-N 3-ethoxy-n,n-diethylaniline Chemical compound CCOC1=CC=CC(N(CC)CC)=C1 ODQSBWZDOSNPAH-UHFFFAOYSA-N 0.000 description 1
- DYJPQQUZBUUKAH-UHFFFAOYSA-N 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethoxymethoxymethyl]oxetane Chemical compound C1OCC1(CC)COCOCOCC1(CC)COC1 DYJPQQUZBUUKAH-UHFFFAOYSA-N 0.000 description 1
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 1
- 125000004207 3-methoxyphenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(OC([H])([H])[H])=C1[H] 0.000 description 1
- AOXLOPQXIGICOF-UHFFFAOYSA-N 3-methyl-3-[(3-methyloxetan-3-yl)methoxymethoxymethoxymethyl]oxetane Chemical compound C1OCC1(C)COCOCOCC1(C)COC1 AOXLOPQXIGICOF-UHFFFAOYSA-N 0.000 description 1
- UVJGOUQARONWII-UHFFFAOYSA-N 3-methyl-3-[[4-[(3-methyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(C)COC2)C=CC=1COCC1(C)COC1 UVJGOUQARONWII-UHFFFAOYSA-N 0.000 description 1
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical class CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- YDIYEOMDOWUDTJ-UHFFFAOYSA-M 4-(dimethylamino)benzoate Chemical compound CN(C)C1=CC=C(C([O-])=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-M 0.000 description 1
- UDGNCGOMVIKQOW-UHFFFAOYSA-N 4-[(dimethylamino)methyl]-n,n-dimethylaniline Chemical compound CN(C)CC1=CC=C(N(C)C)C=C1 UDGNCGOMVIKQOW-UHFFFAOYSA-N 0.000 description 1
- VBNIYPOGDJUMEM-UHFFFAOYSA-N 4-[2-(4-methoxyphenyl)ethenyl]-6-(trichloromethyl)-1,3,5-triazin-2-amine Chemical compound C1=CC(OC)=CC=C1C=CC1=NC(N)=NC(C(Cl)(Cl)Cl)=N1 VBNIYPOGDJUMEM-UHFFFAOYSA-N 0.000 description 1
- XYZWMVYYUIMRIZ-UHFFFAOYSA-N 4-bromo-n,n-dimethylaniline Chemical compound CN(C)C1=CC=C(Br)C=C1 XYZWMVYYUIMRIZ-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N 4-nonylphenol Chemical compound CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- NTDQQZYCCIDJRK-UHFFFAOYSA-N 4-octylphenol Chemical compound CCCCCCCCC1=CC=C(O)C=C1 NTDQQZYCCIDJRK-UHFFFAOYSA-N 0.000 description 1
- JTHGIRIGZAGNOX-UHFFFAOYSA-N 4-pentan-2-ylphenol Chemical compound CCCC(C)C1=CC=C(O)C=C1 JTHGIRIGZAGNOX-UHFFFAOYSA-N 0.000 description 1
- ZUTYZAFDFLLILI-UHFFFAOYSA-N 4-sec-Butylphenol Chemical compound CCC(C)C1=CC=C(O)C=C1 ZUTYZAFDFLLILI-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- DDOLBYSFUDPBPX-UHFFFAOYSA-N 5-methylsulfanyl-2-sulfanyl-3h-thiadiazole Chemical compound CSC1=CNN(S)S1 DDOLBYSFUDPBPX-UHFFFAOYSA-N 0.000 description 1
- XHLKOHSAWQPOFO-UHFFFAOYSA-N 5-phenyl-1h-imidazole Chemical compound N1C=NC=C1C1=CC=CC=C1 XHLKOHSAWQPOFO-UHFFFAOYSA-N 0.000 description 1
- CBDCJHXEZLXYSN-UHFFFAOYSA-N 7-(benzotriazol-2-yl)chromen-2-one Chemical compound N1=C2C=CC=CC2=NN1C1=CC=C2C=CC(=O)OC2=C1 CBDCJHXEZLXYSN-UHFFFAOYSA-N 0.000 description 1
- BZGXVSAGPUNNHF-UHFFFAOYSA-N 7-(diethylamino)-3-(2-methoxybenzoyl)chromen-2-one Chemical compound O=C1OC2=CC(N(CC)CC)=CC=C2C=C1C(=O)C1=CC=CC=C1OC BZGXVSAGPUNNHF-UHFFFAOYSA-N 0.000 description 1
- ZZFQJJZCMZPXMI-UHFFFAOYSA-N 7-(diethylamino)-3-(furan-2-carbonyl)chromen-2-one Chemical compound O=C1OC2=CC(N(CC)CC)=CC=C2C=C1C(=O)C1=CC=CO1 ZZFQJJZCMZPXMI-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical group NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- WQBCAASPALGAKX-UHFFFAOYSA-N Benzenemethanol, 4-(dimethylamino)- Chemical compound CN(C)C1=CC=C(CO)C=C1 WQBCAASPALGAKX-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NDKYEUQMPZIGFN-UHFFFAOYSA-N Butyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCCCC NDKYEUQMPZIGFN-UHFFFAOYSA-N 0.000 description 1
- JQJPBYFTQAANLE-UHFFFAOYSA-N Butyl nitrite Chemical compound CCCCON=O JQJPBYFTQAANLE-UHFFFAOYSA-N 0.000 description 1
- GOJCZVPJCKEBQV-UHFFFAOYSA-N Butyl phthalyl butylglycolate Chemical compound CCCCOC(=O)COC(=O)C1=CC=CC=C1C(=O)OCCCC GOJCZVPJCKEBQV-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- PDSCSYLDRHAHOX-UHFFFAOYSA-N Dibutyl malate Chemical compound CCCCOC(=O)CC(O)C(=O)OCCCC PDSCSYLDRHAHOX-UHFFFAOYSA-N 0.000 description 1
- VOWAEIGWURALJQ-UHFFFAOYSA-N Dicyclohexyl phthalate Chemical compound C=1C=CC=C(C(=O)OC2CCCCC2)C=1C(=O)OC1CCCCC1 VOWAEIGWURALJQ-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- RDOFJDLLWVCMRU-UHFFFAOYSA-N Diisobutyl adipate Chemical compound CC(C)COC(=O)CCCCC(=O)OCC(C)C RDOFJDLLWVCMRU-UHFFFAOYSA-N 0.000 description 1
- ZVFDTKUVRCTHQE-UHFFFAOYSA-N Diisodecyl phthalate Chemical compound CC(C)CCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC(C)C ZVFDTKUVRCTHQE-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- QQZWEECEMNQSTG-UHFFFAOYSA-N Ethyl nitrite Chemical compound CCON=O QQZWEECEMNQSTG-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-L Malonate Chemical compound [O-]C(=O)CC([O-])=O OFOBLEOULBTSOW-UHFFFAOYSA-L 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- KWORKYDIARWARF-UHFFFAOYSA-N N-(4-chloro-2-methylphenyl)-4-[(4-chloro-2-methylphenyl)diazenyl]-3-hydroxynaphthalene-2-carboxamide Chemical compound Cc1cc(Cl)ccc1NC(=O)c1cc2ccccc2c(N=Nc2ccc(Cl)cc2C)c1O KWORKYDIARWARF-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- YCUVUDODLRLVIC-UHFFFAOYSA-N Sudan black B Chemical compound C1=CC(=C23)NC(C)(C)NC2=CC=CC3=C1N=NC(C1=CC=CC=C11)=CC=C1N=NC1=CC=CC=C1 YCUVUDODLRLVIC-UHFFFAOYSA-N 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- DOOTYTYQINUNNV-UHFFFAOYSA-N Triethyl citrate Chemical compound CCOC(=O)CC(O)(C(=O)OCC)CC(=O)OCC DOOTYTYQINUNNV-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- SLGBZMMZGDRARJ-UHFFFAOYSA-N Triphenylene Natural products C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C2=C1 SLGBZMMZGDRARJ-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000007877 V-601 Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- OVZXISBUYCEVEV-OUKQBFOZSA-N [(e)-1-phenylprop-1-en-2-yl]benzene Chemical compound C=1C=CC=CC=1C(/C)=C/C1=CC=CC=C1 OVZXISBUYCEVEV-OUKQBFOZSA-N 0.000 description 1
- TUOBEAZXHLTYLF-UHFFFAOYSA-N [2-(hydroxymethyl)-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CC)COC(=O)C=C TUOBEAZXHLTYLF-UHFFFAOYSA-N 0.000 description 1
- HSZUHSXXAOWGQY-UHFFFAOYSA-N [2-methyl-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(C)(COC(=O)C=C)COC(=O)C=C HSZUHSXXAOWGQY-UHFFFAOYSA-N 0.000 description 1
- KLQWZWNTTNRVOZ-UHFFFAOYSA-M [3-(3,4-dimethyl-9-oxothioxanthen-2-yl)oxy-2-hydroxypropyl]-trimethylazanium;chloride Chemical compound [Cl-].C1=CC=C2C(=O)C3=CC(OCC(O)C[N+](C)(C)C)=C(C)C(C)=C3SC2=C1 KLQWZWNTTNRVOZ-UHFFFAOYSA-M 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- DPKHZNPWBDQZCN-UHFFFAOYSA-N acridine orange free base Chemical compound C1=CC(N(C)C)=CC2=NC3=CC(N(C)C)=CC=C3C=C21 DPKHZNPWBDQZCN-UHFFFAOYSA-N 0.000 description 1
- 229940023020 acriflavine Drugs 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 229940027998 antiseptic and disinfectant acridine derivative Drugs 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- QFFVPLLCYGOFPU-UHFFFAOYSA-N barium chromate Chemical compound [Ba+2].[O-][Cr]([O-])(=O)=O QFFVPLLCYGOFPU-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- DZBUGLKDJFMEHC-UHFFFAOYSA-N benzoquinolinylidene Natural products C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 1
- ZDZHCHYQNPQSGG-UHFFFAOYSA-N binaphthyl group Chemical group C1(=CC=CC2=CC=CC=C12)C1=CC=CC2=CC=CC=C12 ZDZHCHYQNPQSGG-UHFFFAOYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- IYJMFNNRVITCDG-UHFFFAOYSA-N biphenylene;phenol Chemical group OC1=CC=CC=C1.C1=CC=C2C3=CC=CC=C3C2=C1 IYJMFNNRVITCDG-UHFFFAOYSA-N 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- HSUIVCLOAAJSRE-UHFFFAOYSA-N bis(2-methoxyethyl) benzene-1,2-dicarboxylate Chemical compound COCCOC(=O)C1=CC=CC=C1C(=O)OCCOC HSUIVCLOAAJSRE-UHFFFAOYSA-N 0.000 description 1
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
- DJUWPHRCMMMSCV-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) hexanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCCC(=O)OCC1CC2OC2CC1 DJUWPHRCMMMSCV-UHFFFAOYSA-N 0.000 description 1
- JRPRCOLKIYRSNH-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) benzene-1,2-dicarboxylate Chemical compound C=1C=CC=C(C(=O)OCC2OC2)C=1C(=O)OCC1CO1 JRPRCOLKIYRSNH-UHFFFAOYSA-N 0.000 description 1
- XFUOBHWPTSIEOV-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) cyclohexane-1,2-dicarboxylate Chemical compound C1CCCC(C(=O)OCC2OC2)C1C(=O)OCC1CO1 XFUOBHWPTSIEOV-UHFFFAOYSA-N 0.000 description 1
- KBWLNCUTNDKMPN-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) hexanedioate Chemical compound C1OC1COC(=O)CCCCC(=O)OCC1CO1 KBWLNCUTNDKMPN-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 125000005997 bromomethyl group Chemical group 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- VTJUKNSKBAOEHE-UHFFFAOYSA-N calixarene Chemical class COC(=O)COC1=C(CC=2C(=C(CC=3C(=C(C4)C=C(C=3)C(C)(C)C)OCC(=O)OC)C=C(C=2)C(C)(C)C)OCC(=O)OC)C=C(C(C)(C)C)C=C1CC1=C(OCC(=O)OC)C4=CC(C(C)(C)C)=C1 VTJUKNSKBAOEHE-UHFFFAOYSA-N 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- FZFAMSAMCHXGEF-UHFFFAOYSA-N chloro formate Chemical compound ClOC=O FZFAMSAMCHXGEF-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical class [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000006184 cosolvent Substances 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 229940031769 diisobutyl adipate Drugs 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229940014772 dimethyl sebacate Drugs 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- XWVQUJDBOICHGH-UHFFFAOYSA-N dioctyl nonanedioate Chemical compound CCCCCCCCOC(=O)CCCCCCCC(=O)OCCCCCCCC XWVQUJDBOICHGH-UHFFFAOYSA-N 0.000 description 1
- DWNAQMUDCDVSLT-UHFFFAOYSA-N diphenyl phthalate Chemical compound C=1C=CC=C(C(=O)OC=2C=CC=CC=2)C=1C(=O)OC1=CC=CC=C1 DWNAQMUDCDVSLT-UHFFFAOYSA-N 0.000 description 1
- YCTPHBFPVPLULH-UHFFFAOYSA-N diphenyl-(3-phenylthiophen-2-yl)sulfanium Chemical class S1C=CC(C=2C=CC=CC=2)=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 YCTPHBFPVPLULH-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- PODOEQVNFJSWIK-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethoxyphenyl)methanone Chemical compound COC1=CC(OC)=CC(OC)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 PODOEQVNFJSWIK-UHFFFAOYSA-N 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- YCZJVRCZIPDYHH-UHFFFAOYSA-N ditridecyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCCCCCCC YCZJVRCZIPDYHH-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
- 229940011411 erythrosine Drugs 0.000 description 1
- 235000012732 erythrosine Nutrition 0.000 description 1
- 239000004174 erythrosine Substances 0.000 description 1
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- DSNISQNGLMDZQX-UHFFFAOYSA-N ethyl 2-[4-[4,6-bis(trichloromethyl)-1,3,5-triazin-2-yl]-2-bromo-n-(2-ethoxy-2-oxoethyl)anilino]acetate Chemical compound C1=C(Br)C(N(CC(=O)OCC)CC(=O)OCC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DSNISQNGLMDZQX-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000000852 hydrogen donor Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 235000019239 indanthrene blue RS Nutrition 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- OWFXIOWLTKNBAP-UHFFFAOYSA-N isoamyl nitrite Chemical compound CC(C)CCON=O OWFXIOWLTKNBAP-UHFFFAOYSA-N 0.000 description 1
- 125000005929 isobutyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])OC(*)=O 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- SKRDXYBATCVEMS-UHFFFAOYSA-N isopropyl nitrite Chemical compound CC(C)ON=O SKRDXYBATCVEMS-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 125000000400 lauroyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 229910000032 lithium hydrogen carbonate Inorganic materials 0.000 description 1
- HQRPHMAXFVUBJX-UHFFFAOYSA-M lithium;hydrogen carbonate Chemical compound [Li+].OC([O-])=O HQRPHMAXFVUBJX-UHFFFAOYSA-M 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- BLLFVUPNHCTMSV-UHFFFAOYSA-N methyl nitrite Chemical compound CON=O BLLFVUPNHCTMSV-UHFFFAOYSA-N 0.000 description 1
- 229960001047 methyl salicylate Drugs 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 description 1
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 description 1
- MXHTZQSKTCCMFG-UHFFFAOYSA-N n,n-dibenzyl-1-phenylmethanamine Chemical compound C=1C=CC=CC=1CN(CC=1C=CC=CC=1)CC1=CC=CC=C1 MXHTZQSKTCCMFG-UHFFFAOYSA-N 0.000 description 1
- ISGXOWLMGOPVPB-UHFFFAOYSA-N n,n-dibenzylaniline Chemical compound C=1C=CC=CC=1CN(C=1C=CC=CC=1)CC1=CC=CC=C1 ISGXOWLMGOPVPB-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 1
- LXZGVFCKZRHKMU-UHFFFAOYSA-N n-benzyl-n-methylaniline Chemical compound C=1C=CC=CC=1N(C)CC1=CC=CC=C1 LXZGVFCKZRHKMU-UHFFFAOYSA-N 0.000 description 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229940117969 neopentyl glycol Drugs 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000009935 nitrosation Effects 0.000 description 1
- 238000007034 nitrosation reaction Methods 0.000 description 1
- 229920006284 nylon film Polymers 0.000 description 1
- 125000002801 octanoyl group Chemical group C(CCCCCCC)(=O)* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical class OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 150000005331 phenylglycines Chemical class 0.000 description 1
- CCDXIADKBDSBJU-UHFFFAOYSA-N phenylmethanetriol Chemical compound OC(O)(O)C1=CC=CC=C1 CCDXIADKBDSBJU-UHFFFAOYSA-N 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 235000014786 phosphorus Nutrition 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229960003975 potassium Drugs 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 125000005400 pyridylcarbonyl group Chemical group N1=C(C=CC=C1)C(=O)* 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- AZJPTIGZZTZIDR-UHFFFAOYSA-L rose bengal Chemical compound [K+].[K+].[O-]C(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 AZJPTIGZZTZIDR-UHFFFAOYSA-L 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical group [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- FHIODWDKXMVJGO-UHFFFAOYSA-N sodium;8-anilino-5-[[4-[(5-sulfonaphthalen-1-yl)diazenyl]naphthalen-1-yl]diazenyl]naphthalene-1-sulfonic acid Chemical compound [Na+].C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1N=NC(C1=CC=CC=C11)=CC=C1N=NC(C1=CC=CC(=C11)S(O)(=O)=O)=CC=C1NC1=CC=CC=C1 FHIODWDKXMVJGO-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000003696 stearoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000004897 thiazines Chemical class 0.000 description 1
- 229950003937 tolonium Drugs 0.000 description 1
- HNONEKILPDHFOL-UHFFFAOYSA-M tolonium chloride Chemical compound [Cl-].C1=C(C)C(N)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 HNONEKILPDHFOL-UHFFFAOYSA-M 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- 125000005147 toluenesulfonyl group Chemical group C=1(C(=CC=CC1)S(=O)(=O)*)C 0.000 description 1
- OVZXISBUYCEVEV-UHFFFAOYSA-N trans-alpha-methylstilbene Natural products C=1C=CC=CC=1C(C)=CC1=CC=CC=C1 OVZXISBUYCEVEV-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- DWWMSEANWMWMCB-UHFFFAOYSA-N tribromomethylsulfonylbenzene Chemical compound BrC(Br)(Br)S(=O)(=O)C1=CC=CC=C1 DWWMSEANWMWMCB-UHFFFAOYSA-N 0.000 description 1
- SWZDQOUHBYYPJD-UHFFFAOYSA-N tridodecylamine Chemical compound CCCCCCCCCCCCN(CCCCCCCCCCCC)CCCCCCCCCCCC SWZDQOUHBYYPJD-UHFFFAOYSA-N 0.000 description 1
- 239000001069 triethyl citrate Substances 0.000 description 1
- VMYFZRTXGLUXMZ-UHFFFAOYSA-N triethyl citrate Natural products CCOC(=O)C(O)(C(=O)OCC)C(=O)OCC VMYFZRTXGLUXMZ-UHFFFAOYSA-N 0.000 description 1
- 235000013769 triethyl citrate Nutrition 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 125000001834 xanthenyl group Chemical class C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
本発明は、高感度、高解像度であり、感度の経時安定性、膜硬化性、及び耐熱衝撃性が良好で、高精細な永久パターンを効率よく形成可能な感光性樹脂組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板に関する。 The present invention is a photosensitive resin composition and a photosensitive film that have high sensitivity, high resolution, good sensitivity over time, film curability, and thermal shock resistance, and can efficiently form a high-definition permanent pattern. The present invention relates to a photosensitive laminate, a permanent pattern forming method, and a printed board.
電子機器の小型化、多機能化に伴って、現在プリント配線板はより高密度化の方向に進んでいる。例えば、導体回路の細線化、高多層化、ブラインドホ−ル、バリードホール等のインタースティシャルバイアホールを含むスルーホールの小径化、小型チップ部品の表面実装による高密度実装等が挙げられる。 Along with the downsizing and multi-functionalization of electronic devices, printed wiring boards are now in the direction of higher density. For example, conductor circuits can be thinned, multi-layered, blind holes, through holes including interstitial via holes such as burred holes, and high-density mounting by surface mounting of small chip components.
従来のプリント配線板用ソルダレジストとしては、例えば、エポキシ樹脂、エポキシメラミン樹脂等の耐熱性熱硬化性樹脂にアミン、イミダゾール、酸無水物等の熱硬化触媒およびブチルセロソルブ、ブチルカルビトール等の有機溶剤を調合した熱硬化型ソルダレジスト;アクリル酸エステル、メタクリル酸エステル等の重合性モノマーに、エポキシアクリレート、ウレタンアクリレート等の架橋性ポリマー、並びにベンゾインエチルエーテル、ベンゾフェノン等の光増感剤を配合してなる紫外線硬化型ソルダレジスト;上記熱硬化型ソルダレジストと紫外線硬化型ソルダレジストに含まれる各成分を組み合わせたデユアルキュア型ソルダレジスト等が挙げられる。 Conventional solder resists for printed wiring boards include, for example, heat-resistant thermosetting resins such as epoxy resins and epoxy melamine resins, thermosetting catalysts such as amines, imidazoles, and acid anhydrides, and organic solvents such as butyl cellosolve and butyl carbitol. A thermosetting solder resist prepared by blending a polymerizable monomer such as acrylic acid ester or methacrylic acid ester with a crosslinkable polymer such as epoxy acrylate or urethane acrylate, and a photosensitizer such as benzoin ethyl ether or benzophenone. And UV curing type solder resists; dual cure type solder resists in which the above-mentioned thermosetting type solder resist and each component contained in the UV type solder resist are combined.
ソルダレジストの形成方法としては、例えば、前記ソルダレジストが形成される銅張積層板等の基体上に、感光性樹脂組成物からなる感光層を形成し、前記感光層に対して露光を行い、該露光後、前記感光層を現像して所定パターンを有するソルダレジストとする方法が挙げられる。
そして、基体上に感光層を形成する方法としては、液状タイプの感光性樹脂組成物をスクリーンコーター、ディップコーターそしてバーコーター等で基体上に塗工形成する方法。または、感光性樹脂組成物をポリエステルフィルムやポリエチレンからなる保護フィルムでサンドイッチすることにより3層構造のドライフィルムとし、これをロールラミネーターや真空ラミネーター等で基体上にラミネートして感光層とする方法等が挙げられる。
As a method for forming a solder resist, for example, a photosensitive layer made of a photosensitive resin composition is formed on a substrate such as a copper clad laminate on which the solder resist is formed, and the photosensitive layer is exposed, Examples of the method include developing the photosensitive layer after the exposure to form a solder resist having a predetermined pattern.
As a method for forming a photosensitive layer on a substrate, a liquid type photosensitive resin composition is formed on a substrate by a screen coater, a dip coater, a bar coater or the like. Alternatively, a photosensitive resin composition is sandwiched with a polyester film or a protective film made of polyethylene to form a dry film having a three-layer structure, and this is laminated on a substrate with a roll laminator or a vacuum laminator to form a photosensitive layer, etc. Is mentioned.
近年、高密度化が進み、配線密度が高くなったことから、部品搭載時にソルダレジスト表面の平坦化が求められている。ドライフィルム型ソルダレジストは、真空ラミネーター等で加圧成型ができ、しかも溶剤揮発による体積収縮が小さいことから、液状タイプのソルダレジストと比較して平坦化には有利であり切望されている。しかしながら、ドライフィルム型ソルダレジストの場合、フィルム製造工程でピンホールやハジキ等の面状欠陥が生じた場合には、基体上へのラミネート後の工程でこの欠陥を修復することは困難である。硬化膜(ソルダレジスト)にピンホールやハジキ等の面状欠陥が残った状態では、プリント配線板の絶縁信頼性が低下してしまうので、如何に面状欠陥が少ないドライフィルムを製造するかが課題となっていた。 In recent years, since the density has been increased and the wiring density has been increased, the solder resist surface is required to be flattened when mounting components. The dry film type solder resist can be pressure-molded with a vacuum laminator or the like, and has a small volume shrinkage due to solvent volatilization. Therefore, the dry film type solder resist is advantageous for planarization as compared with a liquid type solder resist, and is eagerly desired. However, in the case of a dry film type solder resist, when a planar defect such as a pinhole or a repellency occurs in the film manufacturing process, it is difficult to repair this defect in the process after lamination on the substrate. In the state where planar defects such as pinholes and repellants remain in the cured film (solder resist), the insulation reliability of the printed wiring board will decrease, so how to produce a dry film with few planar defects It was an issue.
ここで、特許文献1では、均一な膜厚の感光層を形成するため、レジスト組成物に界面活性剤を含有させることが提案されている。
しかしながら、特許文献1に記載のレジスト組成物は、液状タイプとして基体に塗布することを意図したものであって、ドライフィルムとして利用することを意図したものではない。また、レジスト組成物に界面活性剤を含有させると、感光層と基体との密着性が悪くなるという問題がある。
Here, Patent Document 1 proposes that a resist composition contains a surfactant in order to form a photosensitive layer having a uniform thickness.
However, the resist composition described in Patent Document 1 is intended to be applied to a substrate as a liquid type and is not intended to be used as a dry film. Further, when a surfactant is contained in the resist composition, there is a problem that the adhesion between the photosensitive layer and the substrate is deteriorated.
本発明は、前記従来における諸問題を解決し、以下の目的を達成することを課題とする。即ち、本発明は、基体に塗布した際の膜厚が均一でピンホールやハジキ等の面状欠陥が発生しにくく、しかもプリント配線形成用基板等の基体との密着性に優れ、高精細な永久パターンを効率良く形成可能な感光性フィルム、感光性フィルムの製造方法、感光性積層体、永久パターン形成方法、及びプリント基板を提供することを目的とする。 An object of the present invention is to solve the conventional problems and achieve the following objects. That is, the present invention has a uniform film thickness when applied to a substrate, is less likely to cause surface defects such as pinholes and repellency, and has excellent adhesion to a substrate such as a printed wiring board, and has high definition. It aims at providing the photosensitive film which can form a permanent pattern efficiently, the manufacturing method of a photosensitive film, the photosensitive laminated body, the permanent pattern formation method, and a printed circuit board.
前記課題を解決するための手段としては以下の通りである。即ち、
<1> i)感光性基およびアルカリ現像性を付与するための酸基を導入した化合物、ii)重合性化合物、iii)光重合開始剤を含む感光性樹脂組成物を含有する塗布液を調製する塗布液調製工程と、
前記塗布液に脱泡処理を施す脱泡工程と、
前記脱泡工程後に、前記塗布液を支持体に塗布する塗布工程と、
前記塗布液を乾燥させて前記支持体上に感光層を形成する乾燥工程と、
を含むことを特徴とする感光性フィルムの製造方法である。
<2> 脱泡処理が、超音波脱泡である前記<1>に記載の感光性フィルムの製造方法である。
<3> 感光性樹脂組成物が、さらに、iv)熱架橋剤を含む前記<1>から<2>のいずれかに記載の感光性フィルムの製造方法である。
<4> 感光性樹脂組成物が、さらに、v)フィラーを含む前記<1>から<3>のいずれかに記載の感光性フィルムの製造方法である。
<5> 塗布液の粘度が、5mPa・sから100mPa・sであることを特徴とする前記<1>から<4>のいずれかに記載の感光性フィルムの製造方法である。
<6> 塗布液の粘度が、10mPa・sから50mPa・sであることを特徴とする前記<5>に記載の感光性フィルムの製造方法である。
<7> 前記<1>から<6>のいずれかに記載の製造方法で作製された感光性フィルムであって、長尺状であり、ロール状に巻かれてなることを特徴とする感光性フィルムである。
<8> 基体と、前記基体上に設けられた感光層と、を備える感光性積層体であって、
前記感光層は、前記<1>から<6>のいずれかに記載の製造方法で作製された感光性フィルムから転写されたことを特徴とする感光性積層体である。
<9> 前記<8>に記載の感光性積層体における感光層に対して露光を行う露光工程を少なくとも含むことを特徴とする永久パターン形成方法である。
<10> 前記<9>に記載の永久パターン形成方法によって形成された永久パターンを備えることを特徴とするプリント基板である。
Means for solving the above problems are as follows. That is,
<1> i) A coating solution containing a photosensitive resin composition containing a photosensitive group and an acid group for imparting alkali developability, ii) a polymerizable compound, and iii) a photopolymerization initiator. A coating solution preparation step,
A defoaming step of defoaming the coating solution;
After the defoaming step, an application step of applying the coating liquid to a support;
A drying step of drying the coating solution to form a photosensitive layer on the support;
It is a manufacturing method of the photosensitive film characterized by including.
<2> The method for producing a photosensitive film according to <1>, wherein the defoaming treatment is ultrasonic defoaming.
<3> The method for producing a photosensitive film according to any one of <1> to <2>, wherein the photosensitive resin composition further includes iv) a thermal crosslinking agent.
<4> The method for producing a photosensitive film according to any one of <1> to <3>, wherein the photosensitive resin composition further includes v) a filler.
<5> The method for producing a photosensitive film according to any one of <1> to <4>, wherein the viscosity of the coating solution is from 5 mPa · s to 100 mPa · s.
<6> The method for producing a photosensitive film according to <5>, wherein the coating solution has a viscosity of 10 mPa · s to 50 mPa · s.
<7> A photosensitive film produced by the production method according to any one of <1> to <6>, wherein the photosensitive film has a long shape and is wound in a roll shape. It is a film.
<8> A photosensitive laminate comprising a substrate and a photosensitive layer provided on the substrate,
The photosensitive layer is a photosensitive laminate that is transferred from a photosensitive film produced by the production method according to any one of <1> to <6>.
<9> A method for forming a permanent pattern, comprising at least an exposure step of exposing the photosensitive layer in the photosensitive laminate according to <8>.
<10> A printed circuit board comprising a permanent pattern formed by the method for forming a permanent pattern according to <9>.
本発明によれば、前記従来における諸問題を解決し、前記目的を達成することができ、基体に塗布した際の膜厚が均一でピンホールやハジキ等の面状欠陥が発生しにくく、しかもプリント配線形成用基板等の基体との密着性に優れ、高精細な永久パターンを効率良く形成可能な感光性フィルム、感光性フィルムの製造方法、感光性積層体、永久パターン形成方法、及びプリント基板を提供することができる。 According to the present invention, the conventional problems can be solved, the object can be achieved, the film thickness when applied to the substrate is uniform, and surface defects such as pinholes and repellency are unlikely to occur. Photosensitive film having excellent adhesion to a substrate such as a printed wiring board and capable of efficiently forming a high-definition permanent pattern, a method for producing a photosensitive film, a photosensitive laminate, a permanent pattern forming method, and a printed board Can be provided.
(感光性フィルムの製造方法)
本発明の感光性フィルムの製造方法は、少なくとも塗布液調製工程、脱泡工程、塗布工程、乾燥工程、を含み、さらに、必要に応じて適宜選択した、その他の工程を含む。
(Method for producing photosensitive film)
The method for producing a photosensitive film of the present invention includes at least a coating liquid preparation step, a defoaming step, a coating step, and a drying step, and further includes other steps that are appropriately selected as necessary.
<塗布液調製工程>
前記塗布液調製工程は、後述の感光性樹脂組成物を含有する塗布液を調製する工程である。
前記塗布液を調製する方法としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、前記感光性樹脂組成物を水又は有機溶剤などの溶媒に溶解、乳化又は分散させる方法が挙げられる。また、公知の界面活性剤を添加してもよい。
前記溶媒としては、特に制限はなく、目的に応じて適宜選択することができる。
メチルエチルケトン、シクロヘキサノンなどのケトン類;トルエン、キシレン、テトラメチルベンゼンなどの芳香族炭化水素類、メチルセロソルブ、ブチルセロソルブ、メチルカルビトール、ブチルカルビトール、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、トリエチレングリコールモノエチルエーテルなどのグリコールエーテル類;酢酸エチル、酢酸ブチル、及び上記グリコールエーテル類の酢酸エステル化物などのエステル類;エタノール、プロパノール、エチレングリコール、プロピレングリコールなどのアルコール類;石油エーテル、石油ナフサ、水添石油サフサ、ソルベントナフサなどの石油系溶剤を挙げることができるが、これに限定されない。
前記塗布液の粘度としては、特に制限はなく、目的に応じて適宜選択することができるが、例えば、5mPa・sから100mPa・sが好ましく、10mPa・sから50mPa・sがより好ましい。
<Coating solution preparation process>
The coating solution preparation step is a step of preparing a coating solution containing a photosensitive resin composition described later.
A method for preparing the coating solution is not particularly limited and may be appropriately selected depending on the intended purpose. For example, a method of dissolving, emulsifying or dispersing the photosensitive resin composition in a solvent such as water or an organic solvent. Is mentioned. Moreover, you may add a well-known surfactant.
There is no restriction | limiting in particular as said solvent, According to the objective, it can select suitably.
Ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene, xylene and tetramethylbenzene, methyl cellosolve, butyl cellosolve, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, dipropylene glycol monoethyl ether, triethylene Glycol ethers such as glycol monoethyl ether; esters such as ethyl acetate, butyl acetate, and acetic acid esterified products of the above glycol ethers; alcohols such as ethanol, propanol, ethylene glycol, propylene glycol; petroleum ether, petroleum naphtha, Examples thereof include, but are not limited to, petroleum solvents such as hydrogenated petroleum safsa and solvent naphtha.
There is no restriction | limiting in particular as a viscosity of the said coating liquid, Although it can select suitably according to the objective, For example, 5 mPa * s to 100 mPa * s is preferable and 10 mPa * s to 50 mPa * s is more preferable.
−感光性樹脂組成物−
前記感光性樹脂組成物は、少なくとも、i)感光性基およびアルカリ現像性を付与するための酸基を導入した化合物(バインダー)、ii)重合性化合物、iii)光重合開始剤、を有してなり、さらに必要に応じて、iv)熱架橋剤、v)フィラーなどのその他の成分を含有してなる。
-Photosensitive resin composition-
The photosensitive resin composition has at least i) a compound (binder) into which an acid group for imparting a photosensitive group and alkali developability is introduced, ii) a polymerizable compound, and iii) a photopolymerization initiator. Further, it contains other components such as iv) a thermal crosslinking agent and v) a filler as necessary.
−−バインダー−−
前記バインダーとしては、感光性基およびアルカリ現像性を付与するための酸基を導入した化合物であれば、特に制限はなく、目的に応じて適宜選択することができ、例えば、2個以上のエポキシ基を有するエポキシ樹脂と不飽和(メタ)アクリル酸とを反応させた後、さらに多塩基酸無水物を反応させて得られる重合体;(メタ)アクリル酸エステルと不飽和基を含有し且つ少なくとも1個の酸基を有する化合物とから得られた共重合体の一部の酸基にグリシジル(メタ)アクリレートを付加させた変性共重合体;カルボキシル基含有(メタ)アクリル系共重合樹脂と脂環式エポキシ基含有不飽和化合物との反応により得られる重合体などが挙げられる。
--Binder--
The binder is not particularly limited as long as it is a compound into which a photosensitive group and an acid group for imparting alkali developability are introduced, and can be appropriately selected according to the purpose. For example, two or more epoxy A polymer obtained by reacting an epoxy resin having a group with unsaturated (meth) acrylic acid and further reacting with a polybasic acid anhydride; containing a (meth) acrylic acid ester and an unsaturated group, and at least Modified copolymer obtained by adding glycidyl (meth) acrylate to some acid groups of a copolymer obtained from a compound having one acid group; carboxyl group-containing (meth) acrylic copolymer resin and fat Examples thereof include a polymer obtained by a reaction with a cyclic epoxy group-containing unsaturated compound.
これらの中でも、感光性樹脂組成物をドライフィルム化して感光層とした際に、タック性が低いことから、(メタ)アクリル酸エステルと不飽和基を含有し且つ少なくとも1個の酸基を有する化合物とから得られた共重合体の一部の酸基にグリシジル(メタ)アクリレートを付加させた変性共重合体が好ましい。 Among these, when the photosensitive resin composition is formed into a dry film to form a photosensitive layer, the tackiness is low, and therefore it contains a (meth) acrylic acid ester and an unsaturated group and has at least one acid group. A modified copolymer obtained by adding glycidyl (meth) acrylate to some acid groups of a copolymer obtained from the compound is preferable.
前記バインダーの前記感光性樹脂組成物固形分中の固形分含有量は、5〜80質量%が好ましく、30〜60質量%がより好ましい。該固形分含有量が5質量%以上であれば、現像性、露光感度が良好となり、80質量%以下であれば、感光層の粘着性が強くなりすぎることを防止できる。 5-80 mass% is preferable and, as for solid content in the said photosensitive resin composition solid content of the said binder, 30-60 mass% is more preferable. If the solid content is 5% by mass or more, developability and exposure sensitivity are good, and if it is 80% by mass or less, it is possible to prevent the adhesiveness of the photosensitive layer from becoming too strong.
−−重合性化合物−−
前記重合性化合物としては、特に制限はなく、目的に応じて適宜選択することができるが、例えば、エチレン性不飽和結合を1つ以上有する化合物が好ましい。
--Polymerizable compound--
There is no restriction | limiting in particular as said polymeric compound, Although it can select suitably according to the objective, For example, the compound which has one or more ethylenically unsaturated bonds is preferable.
前記エチレン性不飽和結合としては、例えば、(メタ)アクリロイル基、(メタ)アクリルアミド基、スチリル基、ビニルエステルやビニルエーテル等のビニル基、アリルエーテルやアリルエステル等のアリル基、などが挙げられる。 Examples of the ethylenically unsaturated bond include (meth) acryloyl group, (meth) acrylamide group, styryl group, vinyl group such as vinyl ester and vinyl ether, allyl group such as allyl ether and allyl ester, and the like.
前記エチレン性不飽和結合を1つ以上有する化合物としては、特に制限はなく、目的に応じて適宜選択することができるが、例えば、(メタ)アクリル基を有するモノマーから選択される少なくとも1種が好適に挙げられる。 The compound having one or more ethylenically unsaturated bonds is not particularly limited and may be appropriately selected depending on the intended purpose. For example, at least one selected from monomers having a (meth) acryl group is Preferably mentioned.
前記(メタ)アクリル基を有するモノマーとしては、特に制限はなく、目的に応じて適宜選択することができ、例えば、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、フェノキシエチル(メタ)アクリレート等の単官能アクリレートや単官能メタクリレート;ポリエチレングリコールジ(メタ)アクリレート、ポリプロピレングリコールジ(メタ)アクリレート、トリメチロールエタントリアクリレート、トリメチロールプロパントリアクリレート、トリメチロールプロパンジアクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ペンタエリトリトールテトラ(メタ)アクリレート、ペンタエリトリトールトリ(メタ)アクリレート、ジペンタエリトリトールヘキサ(メタ)アクリレート、ジペンタエリトリトールペンタ(メタ)アクリレート、ヘキサンジオールジ(メタ)アクリレート、トリメチロールプロパントリ(アクリロイルオキシプロピル)エーテル、トリ(アクリロイルオキシエチル)イソシアヌレート、トリ(アクリロイルオキシエチル)シアヌレート、グリセリントリ(メタ)アクリレート、トリメチロールプロパンやグリセリン、ビスフェノール等の多官能アルコールに、エチレンオキサイドやプロピレンオキサイドを付加反応した後で(メタ)アクリレート化したもの、特公昭48−41708号、特公昭50−6034号、特開昭51−37193号等の各公報に記載されているウレタンアクリレート類;特開昭48−64183号、特公昭49−43191号、特公昭52−30490号等の各公報に記載されているポリエステルアクリレート類;エポキシ樹脂と(メタ)アクリル酸の反応生成物であるエポキシアクリレート類等の多官能アクリレートやメタクリレートなどが挙げられる。これらの中でも、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリトリトールテトラ(メタ)アクリレート、ジペンタエリトリトールヘキサ(メタ)アクリレート、ジペンタエリトリトールペンタ(メタ)アクリレートが特に好ましい。 There is no restriction | limiting in particular as a monomer which has the said (meth) acryl group, According to the objective, it can select suitably, For example, polyethyleneglycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, phenoxyethyl (meth) ) Monofunctional acrylates and monofunctional methacrylates such as acrylates; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, trimethylolpropane diacrylate, neopentylglycol di (Meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (Meth) acrylate, dipentaerythritol penta (meth) acrylate, hexanediol di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin Poly (functional) alcohols such as tri (meth) acrylate, trimethylolpropane, glycerin, bisphenol, etc., which are subjected to addition reaction with ethylene oxide and propylene oxide, and converted to (meth) acrylate, Japanese Patent Publication No. 48-41708, Japanese Patent Publication No. 50- Urethane acrylates described in JP-A-6034, JP-A-51-37193, etc .; JP-A-48-64183, JP-B-49-43191, JP-B-52-30 Polyester acrylates described in each publication of such 90 No.; and epoxy resin and (meth) polyfunctional acrylates or methacrylates such as epoxy acrylates which are reaction products of acrylic acid. Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate are particularly preferable.
前記重合性化合物の前記感光性樹脂組成物固形分中の固形分含有量は、5〜50質量%が好ましく、10〜40質量%がより好ましい。該固形分含有量が5質量%以上であれば、現像性、露光感度が良好となり、50質量%以下であれば、感光層の粘着性が強くなりすぎることを防止できる。 5-50 mass% is preferable and, as for solid content in the said photosensitive resin composition solid content of the said polymeric compound, 10-40 mass% is more preferable. When the solid content is 5% by mass or more, developability and exposure sensitivity are good, and when the solid content is 50% by mass or less, the adhesiveness of the photosensitive layer can be prevented from becoming too strong.
−−光重合開始剤−−
前記光重合開始剤としては、前記重合性化合物の重合を開始する能力を有する限り、特に制限はなく、目的に応じて適宜選択することができるが、例えば、紫外線領域から可視の光線に対して感光性を有するものが好ましく、光励起された増感剤と何らかの作用を生じ、活性ラジカルを生成する活性剤であってもよく、モノマーの種類に応じてカチオン重合を開始させるような開始剤であってもよい。
また、前記光重合開始剤は、波長約300〜800nmの範囲内に少なくとも約50の分子吸光係数を有する成分を少なくとも1種含有していることが好ましい。前記波長は330〜500nmがより好ましい。
-Photopolymerization initiator-
The photopolymerization initiator is not particularly limited as long as it has the ability to initiate the polymerization of the polymerizable compound, and can be appropriately selected according to the purpose. Those having photosensitivity are preferable, and may be an activator that generates an active radical by causing some action with a photoexcited sensitizer, and is an initiator that initiates cationic polymerization according to the type of monomer. May be.
The photopolymerization initiator preferably contains at least one component having a molecular extinction coefficient of at least about 50 within a wavelength range of about 300 to 800 nm. The wavelength is more preferably 330 to 500 nm.
前記光重合開始剤としては、例えば、ハロゲン化炭化水素誘導体(例えば、トリアジン骨格を有するもの、オキサジアゾール骨格を有するもの等)、ヘキサアリールビイミダゾール、オキシム誘導体、有機過酸化物、チオ化合物、ケトン化合物、芳香族オニウム塩、メタロセン類などが挙げられる。これらの中でも、感光層の感度、保存性、及び感光層とプリント配線板形成用基板との密着性等の観点から、トリアジン骨格を有するハロゲン化炭化水素、オキシム誘導体、ケトン化合物、ヘキサアリールビイミダゾール系化合物が好ましい。 Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton), hexaarylbiimidazoles, oxime derivatives, organic peroxides, thio compounds, Examples include ketone compounds, aromatic onium salts, and metallocenes. Among these, halogenated hydrocarbons having a triazine skeleton, oxime derivatives, ketone compounds, hexaarylbiimidazoles from the viewpoints of sensitivity and storage stability of the photosensitive layer, and adhesion between the photosensitive layer and the printed wiring board forming substrate. System compounds are preferred.
前記ヘキサアリールビイミダゾールとしては、例えば、2,2’−ビス(2−クロロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(o−フロロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2−ブロモフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2,4−ジクロロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2−クロロフェニル)−4,4’,5,5’−テトラ(3−メトキシフェニル)ビイミダゾール、2,2’−ビス(2−クロロフェニル)−4,4’,5,5’−テトラ(4−メトキシフェニル)ビイミダゾール、2,2’−ビス(4−メトキシフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2,4−ジクロロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2−ニトロフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2−メチルフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、2,2’−ビス(2−トリフルオロメチルフェニル)−4,4’,5,5’−テトラフェニルビイミダゾール、WO00/52529号公報に記載の化合物などが挙げられる。 Examples of the hexaarylbiimidazole include 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-fluorophenyl)- 4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2-bromophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis ( 2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetra (3-methoxyphenyl) ) Biimidazole, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetra (4-methoxyphenyl) biimidazole, 2,2′-bis (4-methoxyphenyl) -4 , 4 ', , 5′-tetraphenylbiimidazole, 2,2′-bis (2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2-nitrophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-methylphenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-trifluoromethylphenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, compounds described in WO00 / 52529, and the like.
前記ビイミダゾール類は、例えば、Bull.Chem.Soc.Japan,33,565(1960)、及びJ.Org.Chem,36(16)2262(1971)に開示されている方法により容易に合成することができる。 The biimidazoles are described in, for example, Bull. Chem. Soc. Japan, 33, 565 (1960); Org. It can be easily synthesized by the method disclosed in Chem, 36 (16) 2262 (1971).
トリアジン骨格を有するハロゲン化炭化水素化合物としては、例えば、若林ら著、Bull.Chem.Soc.Japan,42、2924(1969)記載の化合物、英国特許1388492号明細書記載の化合物、特開昭53−133428号公報記載の化合物、独国特許3337024号明細書記載の化合物、F.C.Schaefer等によるJ.Org.Chem.;29、1527(1964)記載の化合物、特開昭62−58241号公報記載の化合物、特開平5−281728号公報記載の化合物、特開平5−34920号公報記載化合物、米国特許第4212976号明細書に記載されている化合物等が挙げられる。 Examples of the halogenated hydrocarbon compound having a triazine skeleton include those described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), a compound described in British Patent 1388492, a compound described in JP-A-53-133428, a compound described in German Patent 3337024, F.I. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), compounds described in JP-A-62-258241, compounds described in JP-A-5-281728, compounds described in JP-A-5-34920, US Pat. No. 4,221,976 And the compounds described in the book.
前記若林ら著、Bull.Chem.Soc.Japan,42、2924(1969)記載の化合物としては、例えば、2−フェニル−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(4−クロルフェニル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(4−トリル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(4−メトキシフェニル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(2,4−ジクロルフェニル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2,4,6−トリス(トリクロルメチル)−1,3,5−トリアジン、2−メチル−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−n−ノニル−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、及び2−(α,α,β−トリクロルエチル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジンなどが挙げられる。 Wakabayashi et al., Bull. Chem. Soc. As a compound described in Japan, 42, 2924 (1969), for example, 2-phenyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-chlorophenyl) -4,6 -Bis (trichloromethyl) -1,3,5-triazine, 2- (4-tolyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxyphenyl)- 4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (2,4-dichlorophenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2, 4,6-tris (trichloromethyl) -1,3,5-triazine, 2-methyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2-n-nonyl-4,6- Bis (trichloromethyl) 1,3,5-triazine, and 2-(alpha, alpha, beta-trichloroethyl) -4,6-bis (trichloromethyl) -1,3,5-triazine.
前記英国特許1388492号明細書記載の化合物としては、例えば、2−スチリル−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(4−メチルスチリル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(4−メトキシスチリル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(4−メトキシスチリル)−4−アミノ−6−トリクロルメチル−1,3,5−トリアジンなどが挙げられる。 Examples of the compound described in the British Patent 1388492 include 2-styryl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methylstyryl) -4,6- Bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxystyryl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxystyryl)- 4-amino-6-trichloromethyl-1,3,5-triazine and the like can be mentioned.
前記特開昭53−133428号公報記載の化合物としては、例えば、2−(4−メトキシ−ナフト−1−イル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(4−エトキシ−ナフト−1−イル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−〔4−(2−エトキシエチル)−ナフト−1−イル〕−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、2−(4,7−ジメトキシ−ナフト−1−イル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジン、及び2−(アセナフト−5−イル)−4,6−ビス(トリクロルメチル)−1,3,5−トリアジンなどが挙げられる。 Examples of the compounds described in JP-A-53-133428 include 2- (4-methoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2 -(4-Ethoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- [4- (2-ethoxyethyl) -naphth-1-yl]- 4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4,7-dimethoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -1,3,5- Examples include triazine and 2- (acenaphtho-5-yl) -4,6-bis (trichloromethyl) -1,3,5-triazine.
前記独国特許3337024号明細書記載の化合物としては、例えば、2−(4−スチリルフェニル)−4、6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−(4−メトキシスチリル)フェニル)−4、6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(1−ナフチルビニレンフェニル)−4、6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−クロロスチリルフェニル−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−チオフェン−2−ビニレンフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−チオフェン−3−ビニレンフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−フラン−2−ビニレンフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、及び2−(4−ベンゾフラン−2−ビニレンフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジンなどが挙げられる。 Examples of the compound described in the specification of German Patent 3333724 include 2- (4-styrylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4- (4 -Methoxystyryl) phenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (1-naphthylvinylenephenyl) -4,6-bis (trichloromethyl) -1,3,5 -Triazine, 2-chlorostyrylphenyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-thiophen-2-vinylenephenyl) -4,6-bis (trichloromethyl)- 1,3,5-triazine, 2- (4-thiophene-3-vinylenephenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-furan-2 Vinylenephenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, and 2- (4-benzofuran-2-vinylenephenyl) -4,6-bis (trichloromethyl) -1,3 5-triazine etc. are mentioned.
前記F.C.Schaefer等によるJ.Org.Chem.;29、1527(1964)記載の化合物としては、例えば、2−メチル−4,6−ビス(トリブロモメチル)−1,3,5−トリアジン、2,4,6−トリス(トリブロモメチル)−1,3,5−トリアジン、2,4,6−トリス(ジブロモメチル)−1,3,5−トリアジン、2−アミノ−4−メチル−6−トリ(ブロモメチル)−1,3,5−トリアジン、及び2−メトキシ−4−メチル−6−トリクロロメチル−1,3,5−トリアジンなどが挙げられる。 F. above. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964) include, for example, 2-methyl-4,6-bis (tribromomethyl) -1,3,5-triazine, 2,4,6-tris (tribromomethyl); -1,3,5-triazine, 2,4,6-tris (dibromomethyl) -1,3,5-triazine, 2-amino-4-methyl-6-tri (bromomethyl) -1,3,5- Examples include triazine and 2-methoxy-4-methyl-6-trichloromethyl-1,3,5-triazine.
前記特開昭62−58241号公報記載の化合物としては、例えば、2−(4−フェニルエチニルフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−ナフチル−1−エチニルフェニル−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−(4−トリルエチニル)フェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−(4−メトキシフェニル)エチニルフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−(4−イソプロピルフェニルエチニル)フェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(4−(4−エチルフェニルエチニル)フェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジンなどが挙げられる。 Examples of the compounds described in JP-A-62-258241 include 2- (4-phenylethynylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4- Naphthyl-1-ethynylphenyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4- (4-tolylethynyl) phenyl) -4,6-bis (trichloromethyl) -1 , 3,5-triazine, 2- (4- (4-methoxyphenyl) ethynylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4- (4-isopropylphenyl) Ethynyl) phenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4- (4-ethylphenylethynyl) phenyl) -4,6-bis (trichloromethyl) Le) -1,3,5-triazine.
前記特開平5−281728号公報記載の化合物としては、例えば、2−(4−トリフルオロメチルフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(2,6−ジフルオロフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(2,6−ジクロロフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジン、2−(2,6−ジブロモフェニル)−4,6−ビス(トリクロロメチル)−1,3,5−トリアジンなどが挙げられる。 Examples of the compound described in JP-A-5-281728 include 2- (4-trifluoromethylphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (2, 6-difluorophenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (2,6-dichlorophenyl) -4,6-bis (trichloromethyl) -1,3,5- Examples include triazine, 2- (2,6-dibromophenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine.
前記特開平5−34920号公報記載化合物としては、例えば、2,4−ビス(トリクロロメチル)−6−[4−(N,N−ジエトキシカルボニルメチルアミノ)−3−ブロモフェニル]−1,3,5−トリアジン、米国特許第4239850号明細書に記載されているトリハロメチル−s−トリアジン化合物、更に2,4,6−トリス(トリクロロメチル)−s−トリアジン、2−(4−クロロフェニル)−4,6−ビス(トリブロモメチル)−s−トリアジンなどが挙げられる。 Examples of the compound described in JP-A-5-34920 include 2,4-bis (trichloromethyl) -6- [4- (N, N-diethoxycarbonylmethylamino) -3-bromophenyl] -1, 3,5-triazine, trihalomethyl-s-triazine compounds described in US Pat. No. 4,239,850, 2,4,6-tris (trichloromethyl) -s-triazine, 2- (4-chlorophenyl) Examples include -4,6-bis (tribromomethyl) -s-triazine.
前記米国特許第4212976号明細書に記載されている化合物としては、例えば、オキサジアゾール骨格を有する化合物(例えば、2−トリクロロメチル−5−フェニル−1,3,4−オキサジアゾール、2−トリクロロメチル−5−(4−クロロフェニル)−1,3,4−オキサジアゾール、2−トリクロロメチル−5−(1−ナフチル)−1,3,4−オキサジアゾール、2−トリクロロメチル−5−(2−ナフチル)−1,3,4−オキサジアゾール、2−トリブロモメチル−5−フェニル−1,3,4−オキサジアゾール、2−トリブロモメチル−5−(2−ナフチル)−1,3,4−オキサジアゾール;2−トリクロロメチル−5−スチリル−1,3,4−オキサジアゾール、2−トリクロロメチル−5−(4−クロルスチリル)−1,3,4−オキサジアゾール、2−トリクロロメチル−5−(4−メトキシスチリル)−1,3,4−オキサジアゾール、2−トリクロロメチル−5−(1−ナフチル)−1,3,4−オキサジアゾール、2−トリクロロメチル−5−(4−n−ブトキシスチリル)−1,3,4−オキサジアゾール、2−トリプロモメチル−5−スチリル−1,3,4−オキサジアゾール等)などが挙げられる。 Examples of the compound described in US Pat. No. 4,221,976 include compounds having an oxadiazole skeleton (for example, 2-trichloromethyl-5-phenyl-1,3,4-oxadiazole, 2- Trichloromethyl-5- (4-chlorophenyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1,3,4-oxadiazole, 2-trichloromethyl-5 -(2-naphthyl) -1,3,4-oxadiazole, 2-tribromomethyl-5-phenyl-1,3,4-oxadiazole, 2-tribromomethyl-5- (2-naphthyl) -1,3,4-oxadiazole; 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (4-chlorostyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (4-methoxystyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1, 3,4-oxadiazole, 2-trichloromethyl-5- (4-n-butoxystyryl) -1,3,4-oxadiazole, 2-tripromomethyl-5-styryl-1,3,4 Oxadiazole and the like).
本発明で好適に用いられるオキシム誘導体としては、例えば、下記一般式(1)で表される。 As an oxime derivative used suitably by this invention, it represents with following General formula (1), for example.
ただし、上記一般式(1)中、R1は、水素原子、置換基を有してもよいアシル基、アルコキシカルボニル基、アリールオキシカルボニル基、アルキルスルホニル基、及びアリールスルホニル基のいずれかを表し、R2は、それぞれ独立に置換基を表す。mは、0〜4の整数を表し、2以上の場合は、互いに連結し環を形成してもよい。Aは、4、5、6、及び7員環のいずれかを表す。また、Aは、5及び6員環のいずれかであるのが好ましい。 However, in the general formula (1), R 1 represents any one of a hydrogen atom, an optionally substituted acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an alkylsulfonyl group, and an arylsulfonyl group. , R 2 each independently represents a substituent. m represents an integer of 0 to 4, and in the case of 2 or more, they may be connected to each other to form a ring. A represents any of 4, 5, 6, and 7-membered rings. A is preferably either a 5- or 6-membered ring.
また、本発明で用いられるオキシム誘導体(オキシム化合物)としては、下記一般式(2)で表されるものがより好ましい。 Moreover, as an oxime derivative (oxime compound) used by this invention, what is represented by following General formula (2) is more preferable.
ただし、上記一般式(2)中、R1は、水素原子、置換基を有してもよいアシル基、アルコキシカルボニル基、アリールオキシカルボニル基、アルキルスルホニル基、及びアリールスルホニル基のいずれかを表し、R2は、それぞれ独立に置換基を表す。mは、0〜4の整数を表し、2以上の場合は、互いに連結し環を形成してもよい。Xは、CH2、O、及びSのいずれかを表す。Aは、5及び6員環のいずれかを表す。 However, in the general formula (2), R 1 represents any of a hydrogen atom, an optionally substituted acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an alkylsulfonyl group, and an arylsulfonyl group. , R 2 each independently represents a substituent. m represents an integer of 0 to 4, and in the case of 2 or more, they may be connected to each other to form a ring. X represents any of CH 2 , O, and S. A represents either a 5- or 6-membered ring.
前記一般式(1)及び(2)中、R1で表されるアシル基としては、脂肪族、芳香族、及び複素環のいずれでもよく、更に置換基を有してもよい。
脂肪族基としては、アセチル基、プロパノイル基、ブタノイル基、ヘキサノイル基、デカノイル基、フェノキシアセチル基、クロロアセチル基、などが挙げられる。芳香族基としては、ベンゾイル基、ナフトイル基、メトキシベンゾイル基、ニトロベンゾイル基、などが挙げられる。複素環基としては、フラノイル基、チオフェノイル基、などが挙げられる。
置換基としては、アルコキシ基、アリールオキシ基、及びハロゲン原子のいずれかが好ましい。アシル基としては、総炭素数2〜30のものが好ましく、総炭素数2〜20のものがより好ましく、総炭素数2〜16のものが特に好ましい。このようなアシル基としては、例えば、アセチル基、プロパノイル基、メチルプロパノイル基、ブタノイル基、ピバロイル基、ヘキサノイル基、シクロヘキサンカルボニル基、オクタノイル基、デカノイル基、ドデカノイル基、オクタデカノイル基、ベンジルカルボニル基、フェノキシアセチル基、2−エチルヘキサノイル基、クロロアセチル基、ベンゾイル基、パラメトキシベンゾイル基、2,5−ジブトキシベンゾイル基、1−ナフトイル基、2−ナフトイル基、ピリジルカルボニル基、メタクリロイル基、アクリロイル基、などが挙げられる。
In the general formulas (1) and (2), the acyl group represented by R 1 may be any of aliphatic, aromatic, and heterocyclic, and may further have a substituent.
Examples of the aliphatic group include an acetyl group, a propanoyl group, a butanoyl group, a hexanoyl group, a decanoyl group, a phenoxyacetyl group, and a chloroacetyl group. Examples of the aromatic group include a benzoyl group, a naphthoyl group, a methoxybenzoyl group, and a nitrobenzoyl group. Examples of the heterocyclic group include a furanoyl group and a thiophenoyl group.
As the substituent, any of an alkoxy group, an aryloxy group, and a halogen atom is preferable. As the acyl group, those having 2 to 30 carbon atoms are preferable, those having 2 to 20 carbon atoms are more preferable, and those having 2 to 16 carbon atoms are particularly preferable. Examples of the acyl group include acetyl group, propanoyl group, methylpropanoyl group, butanoyl group, pivaloyl group, hexanoyl group, cyclohexanecarbonyl group, octanoyl group, decanoyl group, dodecanoyl group, octadecanoyl group, benzylcarbonyl Group, phenoxyacetyl group, 2-ethylhexanoyl group, chloroacetyl group, benzoyl group, paramethoxybenzoyl group, 2,5-dibutoxybenzoyl group, 1-naphthoyl group, 2-naphthoyl group, pyridylcarbonyl group, methacryloyl group , An acryloyl group, and the like.
アルキルオキシカルボニル基としては、置換基を有していてもよく、総炭素数が2〜30のアルコキシカルボニル基が好ましく、総炭素数2〜20のものがより好ましく、総炭素数2〜16のものが特に好ましい。このようなアルコキシカルボニル基としては、例えば、メトキシカルボニル基、エトキシカルボニル基、イソプロポキシカルボニルブトキシカルボニル基、イソブチルオキシカルボニル基、アリルオキシカルボニル基、オクチルオキシカルボニル基、ドデシルオキシカルボニル基、エトキシエトキシカルボニル基、が挙げられる。 The alkyloxycarbonyl group may have a substituent and is preferably an alkoxycarbonyl group having 2 to 30 carbon atoms in total, more preferably having 2 to 20 carbon atoms in total, and 2 to 16 carbon atoms in total. Those are particularly preferred. Examples of such alkoxycarbonyl groups include methoxycarbonyl group, ethoxycarbonyl group, isopropoxycarbonylbutoxycarbonyl group, isobutyloxycarbonyl group, allyloxycarbonyl group, octyloxycarbonyl group, dodecyloxycarbonyl group, ethoxyethoxycarbonyl group. .
アリールオキシカルボニル基としては、置換基を有していてもよく、総炭素数7〜30のアルコキシカルボニル基が好ましく、総炭素数7〜20のものがより好ましく、総炭素数7〜16のものが特に好ましい。この様なアリールオキシカルボニル基としては、例えば、フェノキシカルボニル基、2−ナフトキシカルボニル基、パラメトキシフェノキシカルボニル基、2,5−ジエトキシフェノキシカルボニル基、パラクロロフェノキシカルボニル基、パラニトロフェノキシカルボニル基、パラシアノフェノキシカルボニル基、が挙げられる。 The aryloxycarbonyl group may have a substituent and is preferably an alkoxycarbonyl group having a total carbon number of 7 to 30, more preferably a total carbon number of 7 to 20, and a total carbon number of 7 to 16. Is particularly preferred. Examples of such aryloxycarbonyl groups include phenoxycarbonyl group, 2-naphthoxycarbonyl group, paramethoxyphenoxycarbonyl group, 2,5-diethoxyphenoxycarbonyl group, parachlorophenoxycarbonyl group, paranitrophenoxycarbonyl group. And paracyanophenoxycarbonyl group.
アルキルスルホニル基としては、更に、置換基を有してもよい。該置換基としては、例えば、フェニル基、ハロゲン原子、アルコキシ基、アリールオキシ基、アルコキシカルボニル基、アシルオキシ基、アシルアミノ基、カルバモイル基、シアノ基、カルボン酸基、スルホン酸基、ヘテロ環基、が好ましく挙げられる。アルキルスルホニル基としては、メチルスルホニル基、ブチルスルホニル基、オクチルスルホニル基、デシルスルホニル基、ドデシルスルホニル基、ベンジルスルホニル基、トリフルオロメチルスルホニル基、が特に好ましく挙げられる。 The alkylsulfonyl group may further have a substituent. Examples of the substituent include a phenyl group, a halogen atom, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an acyloxy group, an acylamino group, a carbamoyl group, a cyano group, a carboxylic acid group, a sulfonic acid group, and a heterocyclic group. Preferably mentioned. Particularly preferred examples of the alkylsulfonyl group include a methylsulfonyl group, a butylsulfonyl group, an octylsulfonyl group, a decylsulfonyl group, a dodecylsulfonyl group, a benzylsulfonyl group, and a trifluoromethylsulfonyl group.
アリールスルホニル基としては、更に、置換基を有してもよい。該置換基としては、例えば、フェニル基、ハロゲン原子、アルコキシ基、アリールオキシ基、アルコキシカルボニル基、アシルオキシ基、アシルアミノ基、カルバモイル基、シアノ基、カルボン酸基、スルホン酸基、ヘテロ環基、が好ましく挙げられる。アリールスルホニル基としては、ベンゼンスルホニル基、トルエンスルホニル基、クロロベンゼンスルホニル基、ブトキシベンゼンスルホニル基、2,5−ジブトキシベンゼンスルホニル基、パラニトロベンゼンスルホニル基、パーフルオロベンゼンスルホニル基、が特に好ましく挙げられる。 The arylsulfonyl group may further have a substituent. Examples of the substituent include a phenyl group, a halogen atom, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an acyloxy group, an acylamino group, a carbamoyl group, a cyano group, a carboxylic acid group, a sulfonic acid group, and a heterocyclic group. Preferably mentioned. Particularly preferred examples of the arylsulfonyl group include a benzenesulfonyl group, a toluenesulfonyl group, a chlorobenzenesulfonyl group, a butoxybenzenesulfonyl group, a 2,5-dibutoxybenzenesulfonyl group, a paranitrobenzenesulfonyl group, and a perfluorobenzenesulfonyl group.
前記一般式(1)及び(2)中、R2で示される置換基としては、脂肪族、芳香族、複素芳香族、ハロゲン原子、−OR3、−SR3、−NR3R4、が挙げられる。R3、及びR4は、互いに連結して環を形成してもよい。また、R3、及びR4は、それぞれ独立に水素原子若しくは脂肪族基、芳香族基、複素芳香族基のいずれかを表す。mが2以上であり、互いに連結して環を形成する場合は、それぞれ独立したR2どうしで環を形成してもよく、R3及びR4の少なくともいずれかを介して環を形成してもよい。 In the general formulas (1) and (2), examples of the substituent represented by R 2 include aliphatic, aromatic, heteroaromatic, halogen atom, —OR 3 , —SR 3 , —NR 3 R 4 . Can be mentioned. R 3 and R 4 may be linked to each other to form a ring. R 3 and R 4 each independently represent a hydrogen atom, an aliphatic group, an aromatic group, or a heteroaromatic group. When m is 2 or more and are connected to each other to form a ring, each R 2 may form a ring, and a ring may be formed via at least one of R 3 and R 4. Also good.
前記置換基R2を介して環を形成する場合は下記構造が挙げられる。 In the case where a ring is formed via the substituent R 2 , the following structures are exemplified.
前記構造式中、Y及びZは、CH2、−O−、−S−、及び−NR−のいずれかを表す。 In the structural formula, Y and Z represent any one of CH 2 , —O—, —S—, and —NR—.
R2、R3、及びR4の脂肪族基、芳香族基、及び複素芳香族基の具体例としては、前記R1と同様のものが挙げられる。 Specific examples of the aliphatic group, aromatic group, and heteroaromatic group of R 2 , R 3 , and R 4 include the same groups as those described above for R 1 .
前記一般式(1)で表されるオキシム化合物の具体例としては、下記構造式(1)〜(51)で表される化合物が挙げられるが、本発明は、これらに限定されるものではない。 Specific examples of the oxime compound represented by the general formula (1) include compounds represented by the following structural formulas (1) to (51), but the present invention is not limited thereto. .
なお、本発明で用いられるオキシム化合物は、1H−NMRスペクトル、UV−vis吸収スペクトルを測定して同定することができる。 In addition, the oxime compound used by this invention can be identified by measuring a < 1 > H-NMR spectrum and a UV-vis absorption spectrum.
−−−オキシム化合物の製造方法−−−
前記オキシム化合物の製造方法としては、対応するオキシム化合物とアシル塩化物又は無水物との、塩基(例えば、トリエチルアミン、ピリジン)存在下で、THF、DMF、アセトニトリル等の不活性溶媒中か、ピリジンのような塩基性溶媒中で反応させることにより容易に合成できる。前記反応温度としては、−10〜60℃が好ましい。
また、前記アシル塩化物として、クロロ蟻酸エステル、アルキルスルホニルクロライド、アリールスルホニルクロライドを用いることにより、対応する種々のオキシムエステル化合物が合成可能である。
--- Method for producing oxime compound ---
As a method for producing the oxime compound, the corresponding oxime compound and acyl chloride or anhydride in the presence of a base (for example, triethylamine, pyridine) in an inert solvent such as THF, DMF, acetonitrile, It can be easily synthesized by reacting in such a basic solvent. As said reaction temperature, -10-60 degreeC is preferable.
Further, by using chloroformate, alkylsulfonyl chloride, and arylsulfonyl chloride as the acyl chloride, various corresponding oxime ester compounds can be synthesized.
前記オキシム化合物製造時の出発材料として用いられるオキシム化合物の合成方法としては、標準的な化学の教科書(例えばJ.March,Advanced Organic Chemistry,4th Edition,Wiley Interscience,1992)、又は専門的なモノグラフ、例えば、S.R. Sandler & W. Karo, Organic functional group preparations,Vol.3,Academic Pressに記載された、様々な方法によって得ることができる。 As a method for synthesizing the oxime compound used as a starting material in the production of the oxime compound, standard chemistry textbooks (for example, J. March, Advanced Organic Chemistry, 4th Edition, Wiley Interscience, 1992), or a professional monograph For example, S. R. Sandler & W. Karo, Organic functional group preparations, Vol. 3, can be obtained by various methods described in Academic Press.
前記オキシム化合物の特に好ましい合成方法としては、例えば、アルデヒド又はケトンと、ヒドロキシルアミン、又はその塩とを、エタノール若しくはエタノール水のような極性溶媒中で反応させる方法が挙げられる。この場合、酢酸ナトリウム又はピリジンのような塩基を加えて、反応混合物のpHを制御する。反応速度がpH依存性であり、塩基は、開始時にか、又は反応の間連続的に加え得ることは周知である。ピリジンのような塩基性溶媒を、塩基及び/又は溶媒若しくは助溶剤として用いることもできる。前記反応温度としては、一般的には、混合物の還流温度、即ち、約60〜120℃が好ましい。 As a particularly preferable synthesis method of the oxime compound, for example, a method of reacting an aldehyde or ketone with hydroxylamine or a salt thereof in a polar solvent such as ethanol or ethanol water can be mentioned. In this case, a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH dependent and the base can be added at the start or continuously during the reaction. A basic solvent such as pyridine can also be used as the base and / or solvent or cosolvent. The reaction temperature is generally preferably the reflux temperature of the mixture, that is, about 60 to 120 ° C.
前記オキシム化合物の他の異なる好ましい合成方法としては、亜硝酸又は亜硝酸アルキルによる「活性」メチレン基のニトロソ化による方法が挙げられる。例えば、Organic Syntheses coll.Vol.VI(J.Wiley&Sons,New York,1988),pp.199 and 840に記載されたような、アルカリ性条件と、例えば、Organic Synthesis coll.Vol.V,pp.32 and 373,coll.Vol.III,pp.191 and 513,coll.Vol.II,pp.202,204 and 363に記載されたような、酸性条件との双方が、本発明における出発材料として用いられるオキシム化合物の合成に好適である。
前記亜硝酸としては、通常、亜硝酸ナトリウムから生成される。
前記亜硝酸アルキルとしては、例えば、亜硝酸メチル、亜硝酸エチル、亜硝酸イソプロピル、亜硝酸ブチル又は亜硝酸イソアミル、が挙げられる。
Another different preferred method of synthesis of the oxime compound is by nitrosation of an “active” methylene group with nitrous acid or alkyl nitrite. See, for example, Organic Synthesis coll. Vol. VI (J. Wiley & Sons, New York, 1988), pp. 199 and 840 and alkaline conditions such as those described in Organic Synthesis coll. Vol. V, pp. 32 and 373, coll. Vol. III, pp. 191 and 513, coll. Vol. II, pp. Both acidic conditions as described in 202, 204 and 363 are suitable for the synthesis of oxime compounds used as starting materials in the present invention.
The nitrous acid is usually produced from sodium nitrite.
Examples of the alkyl nitrite include methyl nitrite, ethyl nitrite, isopropyl nitrite, butyl nitrite, and isoamyl nitrite.
前記オキシムエステルの基としては、2種類の立体配置(Z)又は(E)で存在するものであってもよい。慣用の方法によって、異性体を分離してもよいし、異性体混合物を光開始用の種として、そのままで用いてもよい。従って、本発明のオキシム化合物は、前記構造式(1)〜(51)の化合物の立体配置上の異性体の混合物であってもよい。 The oxime ester group may exist in two types of configuration (Z) or (E). The isomers may be separated by conventional methods, or the isomer mixture may be used as it is as a photoinitiating seed. Therefore, the oxime compound of the present invention may be a mixture of isomers on the configuration of the compounds of the structural formulas (1) to (51).
オキシム化合物は、保存安定性に優れ、高感度であることにより、重合性組成物に添加することで、保存時は重合を生じることなく保存安定性に優れ、エネルギー線、特に光の照射により活性ラジカルを発生して効率的に重合を開始し、該重合性化合物が短時間で効率的に重合し得る高感度な重合性組成物を得ることができる。 The oxime compound has excellent storage stability and high sensitivity, and when added to the polymerizable composition, it has excellent storage stability without causing polymerization during storage, and is active when irradiated with energy rays, particularly light. It is possible to obtain a highly sensitive polymerizable composition capable of efficiently generating polymerization by generating radicals and capable of polymerizing the polymerizable compound efficiently in a short time.
また、上記以外の光重合開始剤として、アクリジン誘導体(例えば、9−フェニルアクリジン、1,7−ビス(9、9’−アクリジニル)ヘプタン等)、N−フェニルグリシン等、ポリハロゲン化合物(例えば、四臭化炭素、フェニルトリブロモメチルスルホン、フェニルトリクロロメチルケトン等)、クマリン類(例えば、3−(2−ベンゾフロイル)−7−ジエチルアミノクマリン、3−(2−ベンゾフロイル)−7−(1−ピロリジニル)クマリン、3−ベンゾイル−7−ジエチルアミノクマリン、3−(2−メトキシベンゾイル)−7−ジエチルアミノクマリン、3−(4−ジメチルアミノベンゾイル)−7−ジエチルアミノクマリン、3,3’−カルボニルビス(5,7−ジ−n−プロポキシクマリン)、3,3’−カルボニルビス(7−ジエチルアミノクマリン)、3−ベンゾイル−7−メトキシクマリン、3−(2−フロイル)−7−ジエチルアミノクマリン、3−(4−ジエチルアミノシンナモイル)−7−ジエチルアミノクマリン、7−メトキシ−3−(3−ピリジルカルボニル)クマリン、3−ベンゾイル−5,7−ジプロポキシクマリン、7−ベンゾトリアゾール−2−イルクマリン、また、特開平5-19475号、特開平7-271028号、特開2002-363206号、特開2002-363207号、特開2002-363208号、特開2002-363209号公報等に記載のクマリン化合物など)、アミン類(例えば、4−ジメチルアミノ安息香酸エチル、4−ジメチルアミノ安息香酸n−ブチル、4−ジメチルアミノ安息香酸フェネチル、4−ジメチルアミノ安息香酸2−フタルイミドエチル、4−ジメチルアミノ安息香酸2−メタクリロイルオキシエチル、ペンタメチレンビス(4−ジメチルアミノベンゾエート)、3−ジメチルアミノ安息香酸のフェネチル、ペンタメチレンエステル、4−ジメチルアミノベンズアルデヒド、2−クロル−4−ジメチルアミノベンズアルデヒド、4−ジメチルアミノベンジルアルコール、エチル(4−ジメチルアミノベンゾイル)アセテート、4−ピペリジノアセトフェノン、4−ジメチルアミノベンゾイン、N,N−ジメチル−4−トルイジン、N,N−ジエチル−3−フェネチジン、トリベンジルアミン、ジベンジルフェニルアミン、N−メチル−N−フェニルベンジルアミン、4−ブロム−N,N−ジメチルアニリン、トリドデシルアミン、アミノフルオラン類(ODB,ODBII等)、クリスタルバイオレットラクトン、ロイコクリスタルバイオレット等)、アシルホスフィンオキシド類(例えば、ビス(2,4,6−トリメチルベンゾイル)−フェニルホスフィンオキシド、ビス(2,6−ジメトキシベンゾイル)−2,4,4−トリメチル−ペンチルフェニルホスフィンオキシド、LucirinTPOなど)などが挙げられる。 Further, as photopolymerization initiators other than the above, acridine derivatives (for example, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane, etc.), N-phenylglycine, and the like, polyhalogen compounds (for example, Carbon tetrabromide, phenyltribromomethylsulfone, phenyltrichloromethylketone, etc.), coumarins (for example, 3- (2-benzofuroyl) -7-diethylaminocoumarin, 3- (2-benzofuroyl) -7- (1-pyrrolidinyl) ) Coumarin, 3-benzoyl-7-diethylaminocoumarin, 3- (2-methoxybenzoyl) -7-diethylaminocoumarin, 3- (4-dimethylaminobenzoyl) -7-diethylaminocoumarin, 3,3′-carbonylbis (5 , 7-di-n-propoxycoumarin), 3,3′-carbonylbis (7-diethylaminocoumarin), 3-benzoyl-7-methoxycoumarin, 3- (2-furoyl) -7-diethylaminocoumarin, 3- (4-diethylaminocinnamoyl) -7-diethylaminocoumarin, 7-methoxy-3- (3-pyridylcarbonyl) coumarin, 3-benzoyl-5,7-dipropoxycoumarin, 7-benzotriazol-2-ylcoumarin, JP-A-5-19475, JP-A-7-271028, JP-A-2002-363206 No., JP-A-2002-363207, JP-A-2002-363208, JP-A-2002-363209, etc.), amines (for example, ethyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoate) N-butyl acid, 4-dimethylaminobenzoic acid phenethyl, 4-dimethyl 2-phthalimidoethyl tilaminobenzoate, 2-methacryloyloxyethyl 4-dimethylaminobenzoate, pentamethylenebis (4-dimethylaminobenzoate), phenethyl of 3-dimethylaminobenzoic acid, pentamethylene ester, 4-dimethylaminobenzaldehyde, 2-chloro-4-dimethylaminobenzaldehyde, 4-dimethylaminobenzyl alcohol, ethyl (4-dimethylaminobenzoyl) acetate, 4-piperidinoacetophenone, 4-dimethylaminobenzoin, N, N-dimethyl-4-toluidine, N, N-diethyl-3-phenetidine, tribenzylamine, dibenzylphenylamine, N-methyl-N-phenylbenzylamine, 4-bromo-N, N-dimethylaniline, tridodecylamine, amino Nofluoranes (ODB, ODBII, etc.), crystal violet lactone, leuco crystal violet, etc., acylphosphine oxides (for example, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, bis (2,6-dimethoxybenzoyl) ) -2,4,4-trimethyl-pentylphenylphosphine oxide, Lucirin TPO, etc.).
更に、米国特許第2367660号明細書に記載されているビシナルポリケタルドニル化合物、米国特許第2448828号明細書に記載されているアシロインエーテル化合物、米国特許第2722512号明細書に記載されているα−炭化水素で置換された芳香族アシロイン化合物、米国特許第3046127号明細書及び同第2951758号明細書に記載の多核キノン化合物、特開2002−229194号公報に記載の有機ホウ素化合物、ラジカル発生剤、トリアリールスルホニウム塩(例えば、ヘキサフロロアンチモンやヘキサフロロホスフェートとの塩)、ホスホニウム塩化合物(例えば、(フェニルチオフェニル)ジフェニルスルホニウム塩等)(カチオン重合開始剤として有効)、WO01/71428号公報記載のオニウム塩化合物などが挙げられる。 Further, vicinal polyketaldonyl compounds described in US Pat. No. 2,367,660, acyloin ether compounds described in US Pat. No. 2,448,828, and US Pat. No. 2,722,512 are described. An aromatic acyloin compound substituted with α-hydrocarbon, a polynuclear quinone compound described in US Pat. Nos. 3,046,127 and 2,951,758, an organoboron compound described in JP-A-2002-229194, and a radical Generator, triarylsulfonium salt (for example, salt with hexafluoroantimony or hexafluorophosphate), phosphonium salt compound (for example, (phenylthiophenyl) diphenylsulfonium salt, etc.) (effective as a cationic polymerization initiator), WO01 / 71428 Onium Such compounds.
前記光重合開始剤は、1種単独で使用してもよく、2種以上を併用してもよい。2種以上の組合せとしては、例えば、米国特許第3549367号明細書に記載のヘキサアリールビイミダゾールと4−アミノケトン類との組合せ、特公昭51−48516号公報に記載のベンゾチアゾール化合物とトリハロメチル−s−トリアジン化合物の組合せ、また、芳香族ケトン化合物(例えば、チオキサントン等)と水素供与体(例えば、ジアルキルアミノ含有化合物、フェノール化合物等)の組合せ、ヘキサアリールビイミダゾールとチタノセンとの組合せ、クマリン類とチタノセンとフェニルグリシン類との組合せなどが挙げられる。
前記光重合開始剤の特に好ましい例としては、後述する露光において、波長が405nmのレーザ光に対応可能である、前記ホスフィンオキサイド類、前記α−アミノアルキルケトン類、前記トリアジン骨格を有するハロゲン化炭化水素化合物と後述する増感剤としてのアミン化合物とを組合せた複合光開始剤、ヘキサアリールビイミダゾール化合物、あるいは、チタノセンなどが挙げられる。
The said photoinitiator may be used individually by 1 type, and may use 2 or more types together. Examples of the combination of two or more include, for example, a combination of hexaarylbiimidazole and 4-aminoketone described in US Pat. No. 3,549,367, a benzothiazole compound described in Japanese Patent Publication No. 51-48516, and trihalomethyl- Combinations of s-triazine compounds, combinations of aromatic ketone compounds (such as thioxanthone) and hydrogen donors (such as dialkylamino-containing compounds and phenol compounds), combinations of hexaarylbiimidazole and titanocene, and coumarins And combinations of titanocene and phenylglycines.
Particularly preferred examples of the photopolymerization initiator include halogenated carbonization having the phosphine oxides, the α-aminoalkyl ketones, and the triazine skeleton capable of supporting laser light having a wavelength of 405 nm in the exposure described later. Examples include a composite photoinitiator, a hexaarylbiimidazole compound, or titanocene, which is a combination of a hydrogen compound and an amine compound as a sensitizer described later.
前記光重合開始剤の前記感光性樹脂組成物における含有量は、0.1〜30質量%が好ましく、0.5〜20質量%がより好ましく、0.5〜15質量%が特に好ましい。 The content of the photopolymerization initiator in the photosensitive resin composition is preferably 0.1 to 30% by mass, more preferably 0.5 to 20% by mass, and particularly preferably 0.5 to 15% by mass.
−−その他の成分−−
前記その他の成分としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、熱架橋剤、フィラー、熱硬化促進剤、増感剤、熱重合禁止剤、可塑剤、着色剤(着色顔料あるいは染料)などが挙げられ、更に基材表面への密着促進剤及びその他の助剤類(例えば、導電性粒子、充填剤、消泡剤、難燃剤、レベリング剤、剥離促進剤、酸化防止剤、香料、表面張力調整剤、連鎖移動剤など)を併用してもよい。
これらの成分を適宜含有させることにより、目的とする感光性フィルムの安定性、写真性、膜物性などの性質を調整することができる。
-Other ingredients-
The other components are not particularly limited and may be appropriately selected depending on the purpose. For example, thermal crosslinking agents, fillers, thermosetting accelerators, sensitizers, thermal polymerization inhibitors, plasticizers, and colorants. (Color pigments or dyes) and the like, and further adhesion promoters to the substrate surface and other auxiliary agents (for example, conductive particles, fillers, antifoaming agents, flame retardants, leveling agents, peeling accelerators, Antioxidants, fragrances, surface tension modifiers, chain transfer agents, etc.) may be used in combination.
By appropriately containing these components, properties such as the stability, photographic properties, and film properties of the intended photosensitive film can be adjusted.
−−−熱架橋剤−−−
熱架橋剤としては、特に制限はなく、目的に応じて適宜選択することができ、前記感光性フィルムを用いて形成される感光層の硬化後の膜強度を改良するために、現像性等に悪影響を与えない範囲で、例えば、エポキシ化合物を含む化合物、(例えば、1分子内に少なくとも2つのオキシラン基を有するエポキシ化合物)、1分子内に少なくとも2つのオキセタニル基を有するオキセタン化合物を用いることができ、特開2007−47729号公報に記載されているようなオキシラン基を有するエポキシ化合物、β位にアルキル基を有するエポキシ化合物、オキセタニル基を有するオキセタン化合物、ポリイソシアネート化合物、ポリイソシアネート及びその誘導体のイソシアネート基にブロック剤を反応させて得られる化合物などが挙げられる。
--- Thermal crosslinking agent ---
The thermal crosslinking agent is not particularly limited and can be appropriately selected depending on the purpose. In order to improve the film strength after curing of the photosensitive layer formed using the photosensitive film, it can be developed and the like. For example, a compound containing an epoxy compound (for example, an epoxy compound having at least two oxirane groups in one molecule) or an oxetane compound having at least two oxetanyl groups in one molecule may be used within a range that does not adversely influence. An epoxy compound having an oxirane group, an epoxy compound having an alkyl group at the β-position, an oxetane compound having an oxetanyl group, a polyisocyanate compound, a polyisocyanate and derivatives thereof as described in JP-A-2007-47729 Examples include compounds obtained by reacting isocyanate groups with blocking agents It is.
また、前記熱架橋剤として、メラミン誘導体を用いることができる。該メラミン誘導体としては、例えば、メチロールメラミン、アルキル化メチロールメラミン(メチロール基を、メチル、エチル、ブチル等でエーテル化した化合物)等が挙げられる。これらは1種単独で使用してもよいし、2種以上を併用してもよい。これらの中でも、保存安定性が良好で、感光層の表面硬度あるいは硬化膜の膜強度自体の向上に有効である点で、アルキル化メチロールメラミンが好ましく、ヘキサメチル化メチロールメラミンが特に好ましい。 Moreover, a melamine derivative can be used as the thermal crosslinking agent. Examples of the melamine derivative include methylol melamine, alkylated methylol melamine (a compound obtained by etherifying a methylol group with methyl, ethyl, butyl, or the like). These may be used individually by 1 type and may use 2 or more types together. Among these, alkylated methylol melamine is preferable and hexamethylated methylol melamine is particularly preferable in that it has good storage stability and is effective in improving the surface hardness of the photosensitive layer or the film strength itself of the cured film.
前記熱架橋剤の前記感光性樹脂組成物固形分中の固形分含有量は、1質量%〜50質量%が好ましく、3質量%〜30質量%がより好ましい。該固形分含有量が1質量%以上であれば、硬化膜の膜強度が向上され、50質量%以下であれば、現像性、露光感度が良好となる。 1 mass%-50 mass% are preferable, and, as for solid content in the said photosensitive resin composition solid content of the said thermal crosslinking agent, 3 mass%-30 mass% are more preferable. When the solid content is 1% by mass or more, the film strength of the cured film is improved, and when it is 50% by mass or less, the developability and the exposure sensitivity are improved.
前記エポキシ化合物としては、例えば、1分子中に少なくとも2つのオキシラン基を有するエポキシ化合物、β位にアルキル基を有するエポキシ基を少なくとも1分子中に2つ含むエポキシ化合物などが挙げられる。 Examples of the epoxy compound include an epoxy compound having at least two oxirane groups in one molecule and an epoxy compound having at least two epoxy groups having an alkyl group at the β-position in one molecule.
前記1分子中に少なくとも2つのオキシラン基を有するエポキシ化合物としては、例えば、ビキシレノール型もしくはビフェノール型エポキシ樹脂(「YX4000ジャパンエポキシレジン社製」等)又はこれらの混合物、イソシアヌレート骨格等を有する複素環式エポキシ樹脂(「TEPIC;日産化学工業(株)製」、「アラルダイトPT810;チバ・スペシャルティ・ケミカルズ社製」等)、ビスフェノールA型エポキシ樹脂、ノボラック型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾ−ルノボラック型エポキシ樹脂、ハロゲン化エポキシ樹脂(例えば低臭素化エポキシ樹脂、高ハロゲン化エポキシ樹脂、臭素化フェノールノボラック型エポキシ樹脂など)、アリル基含有ビスフェノールA型エポキシ樹脂、トリスフェノールメタン型エポキシ樹脂、ジフェニルジメタノール型エポキシ樹脂、フェノールビフェニレン型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂(「HP−7200,HP−7200H;大日本インキ化学工業(株)製」等)、グリシジルアミン型エポキシ樹脂(ジアミノジフェニルメタン型エポキシ樹脂、ジグリシジルアニリン、トリグリシジルアミノフェノール等)、グリジジルエステル型エポキシ樹脂(フタル酸ジグリシジルエステル、アジピン酸ジグリシジルエステル、ヘキサヒドロフタル酸ジグリシジルエステル、ダイマー酸ジグリシジルエステル等)ヒダントイン型エポキシ樹脂、脂環式エポキシ樹脂(3,4−エポキシシクロヘキシルメチル−3’,4’−エポキシシクロヘキサンカルボキシレート、ビス(3,4−エポキシシクロヘキシルメチル)アジペート、ジシクロペンタジエンジエポキシド、「GT−300、GT−400、ZEHPE3150;ダイセル化学工業製」等、)、イミド型脂環式エポキシ樹脂、トリヒドロキシフェニルメタン型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、テトラフェニロールエタン型エポキシ樹脂、グリシジルフタレート樹脂、テトラグリシジルキシレノイルエタン樹脂、ナフタレン基含有エポキシ樹脂(ナフトールアラルキル型エポキシ樹脂、ナフトールノボラック型エポキシ樹脂、4官能ナフタレン型エポキシ樹脂、市販品としては「ESN−190,ESN−360;新日鉄化学(株)製」、「HP−4032,EXA−4750,EXA−4700;大日本インキ化学工業(株)製」等)、フェノール化合物とジビニルベンゼンやジシクロペンタジエン等のジオレフィン化合物との付加反応によって得られるポリフェノール化合物と、エピクロルヒドリンとの反応物、4−ビニルシクロヘキセン−1−オキサイドの開環重合物を過酢酸等でエポキシ化したもの、線状含リン構造を有するエポキシ樹脂、環状含リン構造を有するエポキシ樹脂、α−メチルスチルベン型液晶エポキシ樹脂、ジベンゾイルオキシベンゼン型液晶エポキシ樹脂、アゾフェニル型液晶エポキシ樹脂、アゾメチンフェニル型液晶エポキシ樹脂、ビナフチル型液晶エポキシ樹脂、アジン型エポキシ樹脂、グリシジルメタアクリレート共重合系エポキシ樹脂(「CP−50S,CP−50M;日本油脂(株)製」等)、シクロヘキシルマレイミドとグリシジルメタアクリレートとの共重合エポキシ樹脂、ビス(グリシジルオキシフェニル)フルオレン型エポキシ樹脂、ビス(グリシジルオキシフェニル)アダマンタン型エポキシ樹脂などが挙げられるが、これらに限られるものではない。これらのエポキシ樹脂は、1種単独で使用してもよいし、2種以上を併用してもよい。 Examples of the epoxy compound having at least two oxirane groups in one molecule include, for example, a bixylenol type or biphenol type epoxy resin (“YX4000 Japan Epoxy Resin” etc.) or a mixture thereof, a complex having an isocyanurate skeleton, etc. Cyclic epoxy resin (“TEPIC; manufactured by Nissan Chemical Industries, Ltd.”, “Araldite PT810; manufactured by Ciba Specialty Chemicals”, etc.), bisphenol A type epoxy resin, novolak type epoxy resin, bisphenol F type epoxy resin, water Bisphenol A type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, halogenated epoxy resin (for example, low brominated epoxy resin, high halogenated epoxy resin) Brominated phenol novolac type epoxy resin, etc.), allyl group-containing bisphenol A type epoxy resin, trisphenol methane type epoxy resin, diphenyldimethanol type epoxy resin, phenol biphenylene type epoxy resin, dicyclopentadiene type epoxy resin ("HP-7200"). , HP-7200H; manufactured by Dainippon Ink and Chemicals, Inc.), glycidylamine type epoxy resin (diaminodiphenylmethane type epoxy resin, diglycidylaniline, triglycidylaminophenol, etc.), glycidyl ester type epoxy resin (phthalic acid) Diglycidyl ester, adipic acid diglycidyl ester, hexahydrophthalic acid diglycidyl ester, dimer acid diglycidyl ester, etc.) Hydantoin type epoxy resin, alicyclic epoxy resin ( , 4-epoxycyclohexylmethyl-3 ′, 4′-epoxycyclohexanecarboxylate, bis (3,4-epoxycyclohexylmethyl) adipate, dicyclopentadiene diepoxide, “GT-300, GT-400, ZEHPE3150; Daicel Chemical Industries , Imide type alicyclic epoxy resin, trihydroxyphenylmethane type epoxy resin, bisphenol A novolak type epoxy resin, tetraphenylolethane type epoxy resin, glycidyl phthalate resin, tetraglycidyl xylenoyl ethane resin, naphthalene Group-containing epoxy resin (naphthol aralkyl type epoxy resin, naphthol novolac type epoxy resin, tetrafunctional naphthalene type epoxy resin, commercially available products such as “ESN-190, ESN-360; Gaku Co., Ltd. "," HP-4032, EXA-4750, EXA-4700; Dainippon Ink and Chemicals Co., Ltd. "), phenol compounds and diolefin compounds such as divinylbenzene and dicyclopentadiene Reaction product of polyphenol compound obtained by reaction and epichlorohydrin, ring-opening polymer of 4-vinylcyclohexene-1-oxide epoxidized with peracetic acid, epoxy resin having linear phosphorus-containing structure, cyclic phosphorus-containing Epoxy resin having structure, α-methylstilbene type liquid crystal epoxy resin, dibenzoyloxybenzene type liquid crystal epoxy resin, azophenyl type liquid crystal epoxy resin, azomethine phenyl type liquid crystal epoxy resin, binaphthyl type liquid crystal epoxy resin, azine type epoxy resin, glycidyl meta Acrylate copolymer epoxy Si resin (“CP-50S, CP-50M; manufactured by NOF Corporation”, etc.), copolymerized epoxy resin of cyclohexylmaleimide and glycidyl methacrylate, bis (glycidyloxyphenyl) fluorene type epoxy resin, bis (glycidyloxy) Phenyl) adamantane type epoxy resin and the like can be mentioned, but not limited thereto. These epoxy resins may be used individually by 1 type, and may use 2 or more types together.
また、1分子中に少なくとも2つのオキシラン基を有する前記エポキシ化合物以外に、β位にアルキル基を有するエポキシ基を少なくとも1分子中に2つ含むエポキシ化合物を用いることができ、β位がアルキル基で置換されたエポキシ基(より具体的には、β−アルキル置換グリシジル基など)を含む化合物が特に好ましい。
前記β位にアルキル基を有するエポキシ基を少なくとも含むエポキシ化合物は、1分子中に含まれる2個以上のエポキシ基のすべてがβ−アルキル置換グリシジル基であってもよく、少なくとも1個のエポキシ基がβ−アルキル置換グリシジル基であってもよい。
In addition to the epoxy compound having at least two oxirane groups in one molecule, an epoxy compound containing at least two epoxy groups having an alkyl group at the β-position can be used, and the β-position is an alkyl group. Particularly preferred is a compound containing an epoxy group substituted with a (specifically, a β-alkyl-substituted glycidyl group or the like).
In the epoxy compound containing at least an epoxy group having an alkyl group at the β-position, all of two or more epoxy groups contained in one molecule may be a β-alkyl-substituted glycidyl group, and at least one epoxy group May be a β-alkyl-substituted glycidyl group.
前記オキセタン化合物としては、例えば、1分子内に少なくとも2つのオキセタニル基を有するオキセタン化合物が挙げられる。
具体的には、例えば、ビス[(3−メチル−3−オキセタニルメトキシ)メチル]エーテル、ビス[(3−エチル−3−オキセタニルメトキシ)メチル]エーテル、1,4−ビス[(3−メチル−3−オキセタニルメトキシ)メチル]ベンゼン、1,4−ビス[(3−エチル−3−オキセタニルメトキシ)メチル]ベンゼン、(3−メチル−3−オキセタニル)メチルアクリレート、(3−エチル−3−オキセタニル)メチルアクリレート、(3−メチル−3−オキセタニル)メチルメタクリレート、(3−エチル−3−オキセタニル)メチルメタクリレート又はこれらのオリゴマーあるいは共重合体等の多官能オキセタン類の他、オキセタン基を有する化合物と、ノボラック樹脂、ポリ(p−ヒドロキシスチレン)、カルド型ビスフェノール類、カリックスアレーン類、カリックスレゾルシンアレーン類、シルセスキオキサン等の水酸基を有する樹脂など、とのエーテル化合物が挙げられ、この他、オキセタン環を有する不飽和モノマーとアルキル(メタ)アクリレートとの共重合体なども挙げられる。
Examples of the oxetane compound include oxetane compounds having at least two oxetanyl groups in one molecule.
Specifically, for example, bis [(3-methyl-3-oxetanylmethoxy) methyl] ether, bis [(3-ethyl-3-oxetanylmethoxy) methyl] ether, 1,4-bis [(3-methyl- 3-Oxetanylmethoxy) methyl] benzene, 1,4-bis [(3-ethyl-3-oxetanylmethoxy) methyl] benzene, (3-methyl-3-oxetanyl) methyl acrylate, (3-ethyl-3-oxetanyl) In addition to polyfunctional oxetanes such as methyl acrylate, (3-methyl-3-oxetanyl) methyl methacrylate, (3-ethyl-3-oxetanyl) methyl methacrylate or oligomers or copolymers thereof, compounds having an oxetane group; Novolac resin, poly (p-hydroxystyrene), cardo type bisphenol , Calixarenes, calixresorcinarenes, and ether compounds such as silsesquioxane and other hydroxyl group-containing resins. In addition to these, an unsaturated monomer having an oxetane ring and an alkyl (meth) acrylate A polymer etc. are also mentioned.
また、前記ポリイソシアネート化合物としては、特開平5−9407号公報記載のポリイソシアネート化合物を用いることができ、該ポリイソシアネート化合物は、少なくとも2つのイソシアネート基を含む脂肪族、環式脂肪族又は芳香族基置換脂肪族化合物から誘導されていてもよい。具体的には、2官能イソシアネート(例えば、1,3−フェニレンジイソシアネートと1,4−フェニレンジイソシアネートとの混合物、2,4−及び2,6−トルエンジイソシアネート、1,3−及び1,4−キシリレンジイソシアネート、ビス(4−イソシアネート−フェニル)メタン、ビス(4−イソシアネートシクロヘキシル)メタン、イソフォロンジイソシアネート、ヘキサメチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネート等)、該2官能イソシアネートと、トリメチロールプロパン、ペンタリスルトール、グリセリン等との多官能アルコール;該多官能アルコールのアルキレンオキサイド付加体と、前記2官能イソシアネートとの付加体;ヘキサメチレンジイソシアネート、ヘキサメチレン−1,6−ジイソシアネート及びその誘導体等の環式三量体;などが挙げられる。 Moreover, as the polyisocyanate compound, a polyisocyanate compound described in JP-A-5-9407 can be used, and the polyisocyanate compound is an aliphatic, cycloaliphatic or aromatic group containing at least two isocyanate groups. It may be derived from a group-substituted aliphatic compound. Specifically, bifunctional isocyanate (for example, a mixture of 1,3-phenylene diisocyanate and 1,4-phenylene diisocyanate, 2,4- and 2,6-toluene diisocyanate, 1,3- and 1,4-xylylene). Diisocyanate, bis (4-isocyanate-phenyl) methane, bis (4-isocyanatocyclohexyl) methane, isophorone diisocyanate, hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, etc.), the bifunctional isocyanate, trimethylolpropane, pentalithol tol Polyfunctional alcohols such as glycerin; alkylene oxide adducts of the polyfunctional alcohols and adducts of the bifunctional isocyanates; hexamethylene diisocyanate, hexamethylene-1,6-di Isocyanate and cyclic trimers thereof derivatives; and the like.
前記ポリイソシアネート化合物にブロック剤を反応させて得られる化合物、すなわちポリイソシアネート及びその誘導体のイソシアネート基にブロック剤を反応させて得られる化合物における、イソシアネート基ブロック剤としては、アルコール類(例えば、イソプロパノール、tert−ブタノール等)、ラクタム類(例えば、ε−カプロラクタム等)、フェノール類(例えば、フェノール、クレゾール、p−tert−ブチルフェノール、p−sec−ブチルフェノール、p−sec−アミルフェノール、p−オクチルフェノール、p−ノニルフェノール等)、複素環式ヒドロキシル化合物(例えば、3−ヒドロキシピリジン、8−ヒドロキシキノリン等)、活性メチレン化合物(例えば、ジアルキルマロネート、メチルエチルケトキシム、アセチルアセトン、アルキルアセトアセテートオキシム、アセトオキシム、シクロヘキサノンオキシム等)などが挙げられる。これらの他、特開平6−295060号公報記載の分子内に少なくとも1つの重合可能な二重結合及び少なくとも1つのブロックイソシアネート基のいずれかを有する化合物などを用いることができる。 As an isocyanate group blocking agent in a compound obtained by reacting a blocking agent with the polyisocyanate compound, that is, a compound obtained by reacting a blocking agent with an isocyanate group of polyisocyanate and derivatives thereof, alcohols (for example, isopropanol, tert-butanol etc.), lactams (eg ε-caprolactam etc.), phenols (eg phenol, cresol, p-tert-butylphenol, p-sec-butylphenol, p-sec-amylphenol, p-octylphenol, p -Nonylphenol, etc.), heterocyclic hydroxyl compounds (eg, 3-hydroxypyridine, 8-hydroxyquinoline, etc.), active methylene compounds (eg, dialkyl malonate, methyl ethyl ketoxy) , Acetylacetone, alkyl acetoacetate oxime, acetoxime, cyclohexanone oxime, etc.) and the like. In addition to these, compounds having at least one polymerizable double bond and at least one blocked isocyanate group in the molecule described in JP-A-6-295060 can be used.
前記メラミン誘導体としては、例えば、メチロールメラミン、アルキル化メチロールメラミン(メチロール基を、メチル、エチル、ブチルなどでエーテル化した化合物)などが挙げられる。これらは1種単独で使用してもよいし、2種以上を併用してもよい。これらの中でも、保存安定性が良好で、感光層の表面硬度あるいは硬化膜の膜強度自体の向上に有効である点で、アルキル化メチロールメラミンが好ましく、ヘキサメチル化メチロールメラミンが特に好ましい。 Examples of the melamine derivative include methylol melamine, alkylated methylol melamine (a compound obtained by etherifying a methylol group with methyl, ethyl, butyl, or the like). These may be used individually by 1 type and may use 2 or more types together. Among these, alkylated methylol melamine is preferable and hexamethylated methylol melamine is particularly preferable in that it has good storage stability and is effective in improving the surface hardness of the photosensitive layer or the film strength itself of the cured film.
−−−フィラー−−−
前記感光性樹脂組成物には、必要に応じて、永久パターンの表面硬度の向上、あるいは線膨張係数を低く抑えること、あるいは、硬化膜自体の誘電率や誘電正接を低く抑えることを目的として、無機フィラーや有機フィラー(有機微粒子)を添加することができる。前記無機フィラーとしては、特に制限はなく、公知のものの中から適宜選択することができ、例えば、カオリン、硫酸バリウム、チタン酸バリウム、酸化ケイ素粉、微粉状酸化ケイ素、気相法シリカ、無定形シリカ、結晶性シリカ、溶融シリカ、球状シリカ、タルク、クレー、炭酸マグネシウム、炭酸カルシウム、酸化アルミニウム、水酸化アルミニウム、マイカなどが挙げられる。これらの中でも、冷熱衝撃試験耐性の観点から、シリカが好ましい。前記無機フィラーの平均粒径は、10μm未満が好ましく、3μm以下がより好ましい。該平均粒径が10μm未満であれば、光散乱により解像度が劣化することを防止できる。
前記有機フィラーとしては、特に制限はなく、目的に応じて適宜選択することができ、例えば、メラミン樹脂、ベンゾグアナミン樹脂、架橋ポリスチレン樹脂などが挙げられる。また、平均粒径1〜5μm、吸油量100〜200m2/g程度のシリカ、架橋樹脂からなる球状多孔質微粒子などを用いることができる。
--- Filler ---
In the photosensitive resin composition, if necessary, for the purpose of improving the surface hardness of the permanent pattern, or keeping the coefficient of linear expansion low, or keeping the dielectric constant and dielectric loss tangent of the cured film itself low. An inorganic filler or an organic filler (organic fine particles) can be added. The inorganic filler is not particularly limited and may be appropriately selected from known ones. For example, kaolin, barium sulfate, barium titanate, silicon oxide powder, finely divided silicon oxide, vapor phase method silica, amorphous Examples thereof include silica, crystalline silica, fused silica, spherical silica, talc, clay, magnesium carbonate, calcium carbonate, aluminum oxide, aluminum hydroxide, and mica. Among these, silica is preferable from the viewpoint of thermal shock resistance. The average particle size of the inorganic filler is preferably less than 10 μm, and more preferably 3 μm or less. When the average particle diameter is less than 10 μm, it is possible to prevent the resolution from being deteriorated by light scattering.
There is no restriction | limiting in particular as said organic filler, According to the objective, it can select suitably, For example, a melamine resin, a benzoguanamine resin, a crosslinked polystyrene resin etc. are mentioned. Further, silica having an average particle diameter of 1 to 5 μm and an oil absorption of about 100 to 200 m 2 / g, spherical porous fine particles made of a crosslinked resin, and the like can be used.
前記フィラーの添加量は、5〜60質量%が好ましい。該添加量が5質量%以上であれば、十分に線膨張係数を低下させることができ、60質量%以下であれば、感光層表面に硬化膜を形成した場合に、該硬化膜の膜質が脆くなることを防ぎ、永久パターンを用いて配線を形成する場合において、配線の保護膜としての機能が損なわれることを回避できる。 The amount of the filler added is preferably 5 to 60% by mass. If the addition amount is 5% by mass or more, the linear expansion coefficient can be sufficiently reduced, and if it is 60% by mass or less, the film quality of the cured film can be improved when a cured film is formed on the surface of the photosensitive layer. When the wiring is formed using a permanent pattern, it is possible to prevent the function of the wiring as a protective film from being impaired.
−−−熱硬化促進剤−−−
前記熱架橋剤としてのエポキシ化合物や前記オキセタン化合物の熱硬化を促進するため、熱硬化促進剤として、例えば、アミン化合物(例えば、ジシアンジアミド、ベンジルジメチルアミン、4−(ジメチルアミノ)−N,N−ジメチルベンジルアミン、4−メトキシ−N,N−ジメチルベンジルアミン、4−メチル−N,N−ジメチルベンジルアミン等)、4級アンモニウム塩化合物(例えば、トリエチルベンジルアンモニウムクロリド等)、ブロックイソシアネート化合物(例えば、ジメチルアミン等)、イミダゾール誘導体二環式アミジン化合物及びその塩(例えば、イミダゾール、2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、4−フェニルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−(2−シアノエチル)−2−エチル−4−メチルイミダゾール等)、リン化合物(例えば、トリフェニルホスフィン等)、グアナミン化合物(例えば、メラミン、グアナミン、アセトグアナミン、ベンゾグアナミン等)、S−トリアジン誘導体(例えば、2,4−ジアミノ−6−メタクリロイルオキシエチル−S−トリアジン、2−ビニル−2,4−ジアミノ−S−トリアジン、2−ビニル−4,6−ジアミノ−S−トリアジン・イソシアヌル酸付加物、2,4−ジアミノ−6−メタクリロイルオキシエチル−S−トリアジン・イソシアヌル酸付加物等)などを用いることができる。これらは1種単独で使用してもよく、2種以上を併用してもよい。なお、前記エポキシ樹脂化合物や前記オキセタン化合物の硬化触媒、あるいは、これらとカルボキシル基の反応を促進することができるものであれば、特に制限はなく、上記以外の熱硬化を促進可能な化合物を用いてもよい。
前記エポキシ化合物、前記オキセタン化合物、及びこれらとカルボン酸との熱硬化を促進可能な熱硬化促進剤の前記感光性樹脂組成物固形分中の固形分含有量は、通常0.01〜15質量%である。
--- Thermosetting accelerator ---
In order to accelerate the thermal curing of the epoxy compound or the oxetane compound as the thermal crosslinking agent, for example, an amine compound (for example, dicyandiamide, benzyldimethylamine, 4- (dimethylamino) -N, N- Dimethylbenzylamine, 4-methoxy-N, N-dimethylbenzylamine, 4-methyl-N, N-dimethylbenzylamine, etc.), quaternary ammonium salt compounds (eg, triethylbenzylammonium chloride, etc.), blocked isocyanate compounds (eg, , Dimethylamine, etc.), imidazole derivative bicyclic amidine compounds and salts thereof (for example, imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 4-phenylimidazole, -Cyanoethyl-2-phenylimidazole, 1- (2-cyanoethyl) -2-ethyl-4-methylimidazole, etc.), phosphorus compounds (eg triphenylphosphine etc.), guanamine compounds (eg melamine, guanamine, acetoguanamine, Benzoguanamine etc.), S-triazine derivatives (for example, 2,4-diamino-6-methacryloyloxyethyl-S-triazine, 2-vinyl-2,4-diamino-S-triazine, 2-vinyl-4,6-diamino -S-triazine / isocyanuric acid adduct, 2,4-diamino-6-methacryloyloxyethyl-S-triazine / isocyanuric acid adduct, etc.) can be used. These may be used alone or in combination of two or more. The epoxy resin compound or the oxetane compound is a curing catalyst, or any compound that can accelerate the reaction between the epoxy resin compound and the oxetane compound and a carboxyl group. May be.
Solid content in the said photosensitive resin composition solid content of the said epoxy compound, the said oxetane compound, and the thermosetting accelerator which can accelerate | stimulate thermosetting with these and carboxylic acid is 0.01-15 mass% normally. It is.
また、前記熱架橋剤としてのエポキシ化合物や前記オキセタン化合物以外の熱架橋剤の熱硬化を促進するため、熱硬化促進剤として、例えば、アミン化合物(例えば、ジシアンジアミド、ベンジルジメチルアミン、4−(ジメチルアミノ)−N,N−ジメチルベンジルアミン、4−メトキシ−N,N−ジメチルベンジルアミン、4−メチル−N,N−ジメチルベンジルアミン等)、4級アンモニウム塩化合物(例えば、トリエチルベンジルアンモニウムクロリド等)、ブロックイソシアネート化合物(例えば、ジメチルアミン等)、イミダゾール誘導体二環式アミジン化合物及びその塩(例えば、イミダゾール、2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、4−フェニルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−(2−シアノエチル)−2−エチル−4−メチルイミダゾール等)、リン化合物(例えば、トリフェニルホスフィン等)、グアナミン化合物(例えば、メラミン、グアナミン、アセトグアナミン、ベンゾグアナミン等)、S−トリアジン誘導体(例えば、2,4−ジアミノ−6−メタクリロイルオキシエチル−S−トリアジン、2−ビニル−2,4−ジアミノ−S−トリアジン、2−ビニル−4,6−ジアミノ−S−トリアジン・イソシアヌル酸付加物、2,4−ジアミノ−6−メタクリロイルオキシエチル−S−トリアジン・イソシアヌル酸付加物等)などを用いることができる。これらは1種単独で使用してもよく、2種以上を併用してもよい。なお、前記熱架橋剤の硬化触媒、あるいは、これらとカルボキシル基の反応を促進することができるものであれば、特に制限はなく、上記以外の熱硬化を促進可能な化合物を用いてもよい。
前記熱架橋剤、及びこれらとカルボン酸との熱硬化を促進可能な熱硬化促進剤の前記感光性樹脂組成物中の固形分含有量は、0.01〜15質量%が好ましい。
Moreover, in order to accelerate | stimulate the thermosetting of thermal crosslinking agents other than the epoxy compound as said thermal crosslinking agent or the said oxetane compound, as a thermosetting accelerator, for example, an amine compound (For example, dicyandiamide, benzyldimethylamine, 4- (dimethyl). Amino) -N, N-dimethylbenzylamine, 4-methoxy-N, N-dimethylbenzylamine, 4-methyl-N, N-dimethylbenzylamine, etc.), quaternary ammonium salt compounds (for example, triethylbenzylammonium chloride, etc.) ), Blocked isocyanate compounds (such as dimethylamine), imidazole derivative bicyclic amidine compounds and salts thereof (such as imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenyl) Imidazole, 4-fu Nylimidazole, 1-cyanoethyl-2-phenylimidazole, 1- (2-cyanoethyl) -2-ethyl-4-methylimidazole, etc.), phosphorus compounds (eg, triphenylphosphine), guanamine compounds (eg, melamine, guanamine) , Acetoguanamine, benzoguanamine, etc.), S-triazine derivatives (for example, 2,4-diamino-6-methacryloyloxyethyl-S-triazine, 2-vinyl-2,4-diamino-S-triazine, 2-vinyl-4 , 6-diamino-S-triazine / isocyanuric acid adduct, 2,4-diamino-6-methacryloyloxyethyl-S-triazine / isocyanuric acid adduct, and the like. These may be used alone or in combination of two or more. In addition, there is no restriction | limiting in particular if the curing catalyst of the said thermal crosslinking agent or the reaction of these and a carboxyl group can be accelerated | stimulated, You may use the compound which can accelerate | stimulate thermosetting other than the above.
The solid content in the photosensitive resin composition of the thermal crosslinking agent and the thermal curing accelerator capable of accelerating thermal curing between these and a carboxylic acid is preferably 0.01 to 15% by mass.
−−−増感剤−−−
前記増感剤としては、特に制限はなく、公知の増感剤の中から適宜選択することができるが、例えば、公知の多核芳香族類(例えば、ピレン、ペリレン、トリフェニレン)、キサンテン類(例えば、フルオレセイン、エオシン、エリスロシン、ローダミンB、ローズベンガル)、シアニン類(例えば、インドカルボシアニン、チアカルボシアニン、オキサカルボシアニン)、メロシアニン類(例えば、メロシアニン、カルボメロシアニン)、チアジン類(例えば、チオニン、メチレンブルー、トルイジンブルー)、アクリジン類(例えば、アクリジンオレンジ、クロロフラビン、アクリフラビン、9−フェニルアクリジン、1,7−ビス(9,9’−アクリジニル)ヘプタン)、アントラキノン類(例えば、アントラキノン)、スクアリウム類(例えば、スクアリウム)、アクリドン類(例えば、アクリドン、クロロアクリドン、N−メチルアクリドン、N−ブチルアクリドン、N−ブチル−クロロアクリドン、2−クロロ−10−ブチルアクリドン等)、クマリン類(例えば、3−(2−ベンゾフロイル)−7−ジエチルアミノクマリン、3−(2−ベンゾフロイル)−7−(1−ピロリジニル)クマリン、3−ベンゾイル−7−ジエチルアミノクマリン、3−(2−メトキシベンゾイル)−7−ジエチルアミノクマリン、3−(4−ジメチルアミノベンゾイル)−7−ジエチルアミノクマリン、3,3’−カルボニルビス(5,7−ジ−n−プロポキシクマリン)、3,3’−カルボニルビス(7−ジエチルアミノクマリン)、3−ベンゾイル−7−メトキシクマリン、3−(2−フロイル)−7−ジエチルアミノクマリン、3−(4−ジエチルアミノシンナモイル)−7−ジエチルアミノクマリン、7−メトキシ−3−(3−ピリジルカルボニル)クマリン、3−ベンゾイル−5,7−ジプロポキシクマリン等)、及びチオキサントン化合物(チオキサントン、イソプロピルチオキサントン、2,4−時エチルチオキサントン、1−クロロ−4−プロピルオキシチオキサントン、QuantacureQTX等)などがあげられ、他に特開平5-19475号、特開平7-271028号、特開2002-363206号、特開2002-363207号、特開2002-363208号、特開2002-363209号等の各公報に記載のクマリン化合物など)が挙げられ、これらの中でも、芳香族環や複素環が縮環した化合物(縮環系化合物)が好ましく、ヘテロ縮環系ケトン化合物、及びアクリジン類がより好ましい。前記ヘテロ縮環系ケトン化合物の中でも、アクリドン化合物及びチオキサントン化合物が特に好ましい。
--- Sensitizer ---
The sensitizer is not particularly limited and may be appropriately selected from known sensitizers. For example, known polynuclear aromatics (for example, pyrene, perylene, triphenylene), xanthenes (for example, , Fluorescein, eosin, erythrosine, rhodamine B, rose bengal), cyanines (eg, indocarbocyanine, thiacarbocyanine, oxacarbocyanine), merocyanines (eg, merocyanine, carbomerocyanine), thiazines (eg, thionine, Methylene blue, toluidine blue), acridines (for example, acridine orange, chloroflavin, acriflavine, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane), anthraquinones (for example, anthraquinone), squalium Kind (For example, squalium), acridones (for example, acridone, chloroacridone, N-methylacridone, N-butylacridone, N-butyl-chloroacridone, 2-chloro-10-butylacridone, etc.), coumarin (Eg, 3- (2-benzofuroyl) -7-diethylaminocoumarin, 3- (2-benzofuroyl) -7- (1-pyrrolidinyl) coumarin, 3-benzoyl-7-diethylaminocoumarin, 3- (2-methoxybenzoyl) ) -7-diethylaminocoumarin, 3- (4-dimethylaminobenzoyl) -7-diethylaminocoumarin, 3,3′-carbonylbis (5,7-di-n-propoxycoumarin), 3,3′-carbonylbis ( 7-diethylaminocoumarin), 3-benzoyl-7-methoxycoumarin, 3- (2-fur Yl) -7-diethylaminocoumarin, 3- (4-diethylaminocinnamoyl) -7-diethylaminocoumarin, 7-methoxy-3- (3-pyridylcarbonyl) coumarin, 3-benzoyl-5,7-dipropoxycoumarin, etc.) And thioxanthone compounds (thioxanthone, isopropyl thioxanthone, 2,4-hour ethyl thioxanthone, 1-chloro-4-propyloxythioxanthone, Quantacure QTX, etc.) and the like, as well as JP-A-5-19475 and JP-A-7-271028 No., JP-A 2002-363206, JP-A 2002-363207, JP-A 2002-363208, JP-A 2002-363209, and the like. Compounds with condensed rings or heterocycles ( Ring compounds) are preferred, hetero condensed ring systems ketone compounds, and acridines are more preferred. Among the hetero-fused ketone compounds, an acridone compound and a thioxanthone compound are particularly preferable.
前記光重合開始剤と前記増感剤との組合せとしては、例えば、特開2001−305734号公報に記載の電子移動型開始系[(1)電子供与型開始剤及び増感色素、(2)電子受容型開始剤及び増感色素、(3)電子供与型開始剤、増感色素及び電子受容型開始剤(三元開始系)]などの組合せが挙げられる。 Examples of the combination of the photopolymerization initiator and the sensitizer include, for example, an electron transfer start system described in JP-A-2001-305734 [(1) an electron donating initiator and a sensitizing dye, (2) A combination of an electron-accepting initiator and a sensitizing dye, (3) an electron-donating initiator, a sensitizing dye and an electron-accepting initiator (ternary initiation system)], and the like.
前記増感剤の含有量は、感光性フィルム用感光性樹脂組成物の全成分に対し、0.01〜4質量%が好ましく、0.02〜2質量%がより好ましく、0.05〜1質量%が特に好ましい。
前記含有量が、0.01質量%以上であれば、感度が良好となり、4質量%以下であれば、パターンの形状が良好となる。
The content of the sensitizer is preferably 0.01 to 4% by mass, more preferably 0.02 to 2% by mass, and more preferably 0.05 to 1% with respect to all components of the photosensitive resin composition for photosensitive film. Mass% is particularly preferred.
If the said content is 0.01 mass% or more, a sensitivity will become favorable, and if it is 4 mass% or less, the shape of a pattern will become favorable.
−−−熱重合禁止剤−−−
前記熱重合禁止剤は、前記感光層における前記重合性化合物の熱的な重合又は経時的な重合を防止するために添加してもよい。
前記熱重合禁止剤としては、例えば、4−メトキシフェノール、ハイドロキノン、アルキルまたはアリール置換ハイドロキノン、t−ブチルカテコール、ピロガロール、2−ヒドロキシベンゾフェノン、4−メトキシ−2−ヒドロキシベンゾフェノン、塩化第一銅、フェノチアジン、クロラニル、ナフチルアミン、β−ナフトール、2,6−ジ−t−ブチル−4−クレゾール、2,2’−メチレンビス(4−メチル−6−t−ブチルフェノール)、ピリジン、ニトロベンゼン、ジニトロベンゼン、ピクリン酸、4−トルイジン、メチレンブルー、銅と有機キレート剤反応物、サリチル酸メチル、及びフェノチアジン、ニトロソ化合物、ニトロソ化合物とAlとのキレート、などが挙げられる。
--- Thermal polymerization inhibitor ---
The thermal polymerization inhibitor may be added to prevent thermal polymerization or temporal polymerization of the polymerizable compound in the photosensitive layer.
Examples of the thermal polymerization inhibitor include 4-methoxyphenol, hydroquinone, alkyl or aryl-substituted hydroquinone, t-butylcatechol, pyrogallol, 2-hydroxybenzophenone, 4-methoxy-2-hydroxybenzophenone, cuprous chloride, phenothiazine. , Chloranil, naphthylamine, β-naphthol, 2,6-di-tert-butyl-4-cresol, 2,2′-methylenebis (4-methyl-6-tert-butylphenol), pyridine, nitrobenzene, dinitrobenzene, picric acid 4-toluidine, methylene blue, copper and organic chelating agent reactant, methyl salicylate, and phenothiazine, nitroso compound, chelate of nitroso compound and Al, and the like.
前記熱重合禁止剤の含有量は、前記感光性樹脂組成物に対して0.001〜5質量%が好ましく、0.005〜2質量%がより好ましく、0.01〜1質量%が特に好ましい。
前記含有量が、0.001質量%以上であれば、保存時の安定性低下を防止でき、5質量%以下であれば、活性エネルギー線に対する感度が良好となる。
The content of the thermal polymerization inhibitor is preferably 0.001 to 5% by mass, more preferably 0.005 to 2% by mass, and particularly preferably 0.01 to 1% by mass with respect to the photosensitive resin composition. .
When the content is 0.001% by mass or more, a decrease in stability during storage can be prevented, and when the content is 5% by mass or less, sensitivity to active energy rays is improved.
−−−可塑剤−−−
前記可塑剤は、前記感光層の膜物性(可撓性)をコントロールするために添加してもよい。
前記可塑剤としては、例えば、ジメチルフタレート、ジブチルフタレート、ジイソブチルフタレート、ジヘプチルフタレート、ジオクチルフタレート、ジシクロヘキシルフタレート、ジトリデシルフタレート、ブチルベンジルフタレート、ジイソデシルフタレート、ジフェニルフタレート、ジアリルフタレート、オクチルカプリールフタレート等のフタル酸エステル類;トリエチレングリコールジアセテート、テトラエチレングリコールジアセテート、ジメチルグリコースフタレート、エチルフタリールエチルグリコレート、メチルフタリールエチルグリコレート、ブチルフタリールブチルグリコレート、トリエチレングリコールジカブリル酸エステル等のグリコールエステル類;トリクレジルホスフェート、トリフェニルホスフェート等のリン酸エステル類;4−トルエンスルホンアミド、ベンゼンスルホンアミド、N−n−ブチルベンゼンスルホンアミド、N−n−ブチルアセトアミド等のアミド類;ジイソブチルアジペート、ジオクチルアジペート、ジメチルセバケート、ジブチルセパケート、ジオクチルセパケート、ジオクチルアゼレート、ジブチルマレート等の脂肪族二塩基酸エステル類;クエン酸トリエチル、クエン酸トリブチル、グリセリントリアセチルエステル、ラウリン酸ブチル、4,5−ジエポキシシクロヘキサン−1,2−ジカルボン酸ジオクチル等、ポリエチレングリコール、ポリプロピレングリコール等のグリコール類が挙げられる。
---- Plasticizer ---
The plasticizer may be added to control film physical properties (flexibility) of the photosensitive layer.
Examples of the plasticizer include dimethyl phthalate, dibutyl phthalate, diisobutyl phthalate, diheptyl phthalate, dioctyl phthalate, dicyclohexyl phthalate, ditridecyl phthalate, butyl benzyl phthalate, diisodecyl phthalate, diphenyl phthalate, diallyl phthalate, octyl capryl phthalate, and the like. Phthalic acid esters: Triethylene glycol diacetate, tetraethylene glycol diacetate, dimethylglycol phthalate, ethyl phthalyl ethyl glycolate, methyl phthalyl ethyl glycolate, butyl phthalyl butyl glycolate, triethylene glycol dicabrylate, etc. Glycol esters of tricresyl phosphate, triphenyl phosphate, etc. Acid esters; 4-toluenesulfonamide, benzenesulfonamide, Nn-butylbenzenesulfonamide, amides such as Nn-butylacetamide; diisobutyl adipate, dioctyl adipate, dimethyl sebacate, dibutyl sepacate, dioctyl Aliphatic dibasic acid esters such as sepacate, dioctyl azelate, dibutyl malate; triethyl citrate, tributyl citrate, glycerin triacetyl ester, butyl laurate, 4,5-diepoxycyclohexane-1,2-dicarboxylic acid Examples include glycols such as dioctyl acid, polyethylene glycol, and polypropylene glycol.
前記可塑剤の含有量は、前記感光層の全成分に対して0.1〜50質量%が好ましく、0.5〜40質量%がより好ましく、1〜30質量%が特に好ましい。 The content of the plasticizer is preferably from 0.1 to 50 mass%, more preferably from 0.5 to 40 mass%, particularly preferably from 1 to 30 mass%, based on all components of the photosensitive layer.
−−−着色顔料−−−
前記着色顔料としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、ビクトリア・ピュアーブルーBO(C.I.42595)、オーラミン(C.I.41000)、ファット・ブラックHB(C.I.26150)、モノライト・エローGT(C.I.ピグメント・エロー12)、パーマネント・エローGR(C.I.ピグメント・エロー17)、パーマネント・エローHR(C.I.ピグメント・エロー83)、パーマネント・カーミンFBB(C.I.ピグメント・レッド146)、ホスターバームレッドESB(C.I.ピグメント・バイオレット19)、パーマネント・ルビーFBH(C.I.ピグメント・レッド11)ファステル・ピンクBスプラ(C.I.ピグメント・レッド81)モナストラル・ファースト・ブルー(C.I.ピグメント・ブルー15)、モノライト・ファースト・ブラックB(C.I.ピグメント・ブラック1)、カーボン、C.I.ピグメント・レッド97、C.I.ピグメント・レッド122、C.I.ピグメント・レッド149、C.I.ピグメント・レッド168、C.I.ピグメント・レッド177、C.I.ピグメント・レッド180、C.I.ピグメント・レッド192、C.I.ピグメント・レッド215、C.I.ピグメント・グリーン7、C.I.ピグメント・グリーン36、C.I.ピグメント・ブルー15:1、C.I.ピグメント・ブルー15:4、C.I.ピグメント・ブルー15:6、C.I.ピグメント・ブルー22、C.I.ピグメント・ブルー60、C.I.ピグメント・ブルー64などが挙げられる。これらは1種単独で用いてもよいし、2種以上を併用してもよい。また、必要に応じて、公知の染料の中から、適宜選択した染料を使用することができる。
--- Colored pigment ---
There is no restriction | limiting in particular as said coloring pigment, According to the objective, it can select suitably, For example, Victoria pure blue BO (CI. 42595), auramine (CI. 41000), fat black HB (CI. 26150), Monolite Yellow GT (CI Pigment Yellow 12), Permanent Yellow GR (CI Pigment Yellow 17), Permanent Yellow HR (CI Pigment Yellow HR). Yellow 83), Permanent Carmine FBB (CI Pigment Red 146), Hoster Balm Red ESB (CI Pigment Violet 19), Permanent Ruby FBH (CI Pigment Red 11) Fastel Pink B Supra (CI Pigment Red 81) Monastral Fa Strike Blue (C.I. Pigment Blue 15), mono Light Fast Black B (C.I. Pigment Black 1), carbon, C. I. Pigment red 97, C.I. I. Pigment red 122, C.I. I. Pigment red 149, C.I. I. Pigment red 168, C.I. I. Pigment red 177, C.I. I. Pigment red 180, C.I. I. Pigment red 192, C.I. I. Pigment red 215, C.I. I. Pigment green 7, C.I. I. Pigment green 36, C.I. I. Pigment blue 15: 1, C.I. I. Pigment blue 15: 4, C.I. I. Pigment blue 15: 6, C.I. I. Pigment blue 22, C.I. I. Pigment blue 60, C.I. I. Pigment blue 64 and the like. These may be used alone or in combination of two or more. Moreover, the dye suitably selected from well-known dye can be used as needed.
前記着色顔料の前記感光性樹脂組成物固形分中の固形分含有量は、永久パターン形成の際の感光層の露光感度、解像性などを考慮して決めることができ、前記着色顔料の種類により異なるが、一般的には0.01〜10質量%が好ましく、0.05〜5質量%がより好ましい。 The solid content in the solid content of the photosensitive resin composition of the colored pigment can be determined in consideration of the exposure sensitivity, resolution, etc. of the photosensitive layer during permanent pattern formation. Generally, 0.01 to 10% by mass is preferable, and 0.05 to 5% by mass is more preferable.
−−−密着促進剤−−−
各層間の密着性、又は感光層と基体との密着性を向上させるために、各層に公知のいわゆる密着促進剤を用いることができる。
--- Adhesion promoter ---
In order to improve the adhesion between the layers or the adhesion between the photosensitive layer and the substrate, a known so-called adhesion promoter can be used for each layer.
前記密着促進剤としては、例えば、特開平5−11439号公報、特開平5−341532号公報、及び特開平6−43638号公報等に記載の密着促進剤が好適挙げられる。具体的には、ベンズイミダゾール、ベンズオキサゾール、ベンズチアゾール、2−メルカプトベンズイミダゾール、2−メルカプトベンズオキサゾール、2−メルカプトベンズチアゾール、3−モルホリノメチル−1−フェニル−トリアゾール−2−チオン、3−モルホリノメチル−5−フェニル−オキサジアゾール−2−チオン、5−アミノ−3−モルホリノメチル−チアジアゾール−2−チオン、及び2−メルカプト−5−メチルチオ−チアジアゾール、トリアゾール、テトラゾール、ベンゾトリアゾール、カルボキシベンゾトリアゾール、アミノ基含有ベンゾトリアゾール、シランカップリング剤などが挙げられる。 Preferable examples of the adhesion promoter include adhesion promoters described in JP-A Nos. 5-11439, 5-341532, and 6-43638. Specifically, benzimidazole, benzoxazole, benzthiazole, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzthiazole, 3-morpholinomethyl-1-phenyl-triazole-2-thione, 3-morpholino Methyl-5-phenyl-oxadiazole-2-thione, 5-amino-3-morpholinomethyl-thiadiazole-2-thione, and 2-mercapto-5-methylthio-thiadiazole, triazole, tetrazole, benzotriazole, carboxybenzotriazole Amino group-containing benzotriazole, silane coupling agents, and the like.
前記密着促進剤の含有量は、前記感光層の全成分に対して0.001質量%〜20質量%が好ましく、0.01〜10質量%がより好ましく、0.1質量%〜5質量%が特に好ましい。 The content of the adhesion promoter is preferably 0.001% by mass to 20% by mass, more preferably 0.01% by mass to 10% by mass, and 0.1% by mass to 5% by mass with respect to all components of the photosensitive layer. Is particularly preferred.
<脱泡工程>
前記脱泡工程は、前記塗布液に脱泡処理を施す工程である。
脱泡処理の方法としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、真空ポンプを用いた膜脱泡や遠心力を用いた遠心分離脱泡、超音波脱泡装置を用いた超音波脱泡などが挙げられる。中でも、超音波脱泡が、ピンホールやハジキ等の面状欠陥を抑制する効果の点で、好ましい。
<Defoaming process>
The defoaming step is a step of defoaming the coating solution.
The method of defoaming treatment is not particularly limited and can be appropriately selected according to the purpose. For example, membrane defoaming using a vacuum pump, centrifugal defoaming using centrifugal force, ultrasonic defoaming device For example, ultrasonic defoaming using. Among these, ultrasonic defoaming is preferable in terms of the effect of suppressing planar defects such as pinholes and repellencies.
前記超音波脱泡装置とは、超音波照射によってキャビテーションを生じさせることで、気体の発泡を促進する装置のことである。つまり、局所的に生じる微小な圧力変動によって、液中気体の発泡や溶解が生じることで、液の脱泡を行っている。超音波照射時の圧力に特に制約はないが、気体溶解性制御の観点から常圧での超音波照射が望ましい。装置の制御は、電圧値によって超音波振動子の出力制御をしている。例として、日本アレックス(株)や本多電子(株)の超音波発信器に超音波振動子をつないだものを、配管やタンクに設置したものが挙げられる。 The ultrasonic defoaming device is a device that promotes gas foaming by generating cavitation by ultrasonic irradiation. In other words, the liquid is degassed by the foaming or dissolution of the gas in the liquid caused by the minute pressure fluctuation that occurs locally. Although there is no restriction | limiting in particular in the pressure at the time of ultrasonic irradiation, the ultrasonic irradiation at a normal pressure is desirable from a viewpoint of gas solubility control. The control of the apparatus is the output control of the ultrasonic transducer by the voltage value. As an example, an ultrasonic transmitter connected to an ultrasonic transmitter of Nippon Alex Co., Ltd. or Honda Electronics Co., Ltd., which is installed in a pipe or a tank.
前記超音波脱泡装置を用いる場合の条件としては、特に制限はなく、目的に応じて適宜選択することができるが、出力としては、例えば、1V以上200V以下が好ましく、10V以上150V以下がより好ましく、30V以上110V以下が特に好ましい。
また、膜脱泡装置を用いる場合の条件としては、特に制限はなく、目的に応じて適宜選択することができるが、出力としては、例えば、大気圧以下が好ましく、0.01気圧以上0.5気圧以下がより好ましく、0.05気圧以上0.15気圧以下が特に好ましい。
The conditions for using the ultrasonic defoaming device are not particularly limited and can be appropriately selected according to the purpose. The output is preferably 1 V or more and 200 V or less, and more preferably 10 V or more and 150 V or less. 30 V or more and 110 V or less is particularly preferable.
The conditions for using the membrane defoaming apparatus are not particularly limited and may be appropriately selected depending on the intended purpose. However, the output is preferably, for example, atmospheric pressure or lower, and preferably 0.01 atmospheric pressure or higher and 0.0. 5 atm or less is more preferable, and 0.05 atm or more and 0.15 atm or less is particularly preferable.
<塗布工程>
前記塗布工程は、前記脱泡工程後に、前記塗布液を支持体に塗布する工程である。
前記塗布液の塗布方法としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、スプレー法、ロールコート法、回転塗布法、スリットコート法、エクストルージョンコート法、カーテンコート法、ダイコート法、グラビアコート法、ワイヤーバーコート法、ナイフコート法等の各種の塗布方法が挙げられる。
<Application process>
The coating step is a step of coating the coating liquid on a support after the defoaming step.
The method for applying the coating liquid is not particularly limited and may be appropriately selected depending on the intended purpose. For example, a spray method, a roll coating method, a spin coating method, a slit coating method, an extrusion coating method, a curtain coating method. And various coating methods such as a die coating method, a gravure coating method, a wire bar coating method, and a knife coating method.
−支持体−
前記支持体としては、特に制限はなく、目的に応じて適宜選択することができるが、前記感光層を剥離可能であり、かつ光の透過性が良好であるものが好ましく、更に表面の平滑性が良好であることがより好ましい。
-Support-
The support is not particularly limited and may be appropriately selected depending on the intended purpose. However, it is preferable that the photosensitive layer is peelable and has good light transmittance, and further has a smooth surface. Is more preferable.
前記支持体は、合成樹脂製で、かつ透明であるものが好ましく、例えば、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリプロピレン、ポリエチレン、三酢酸セルロース、二酢酸セルロース、ポリ(メタ)アクリル酸アルキルエステル、ポリ(メタ)アクリル酸エステル共重合体、ポリ塩化ビニル、ポリビニルアルコール、ポリカーボネート、ポリスチレン、セロファン、ポリ塩化ビニリデン共重合体、ポリアミド、ポリイミド、塩化ビニル・酢酸ビニル共重合体、ポリテトラフロロエチレン、ポリトリフロロエチレン、セルロース系フィルム、ナイロンフィルム等の各種のプラスチックフィルムが挙げられ、これらの中でも、ポリエチレンテレフタレートが特に好ましい。これらは、1種単独で使用してもよく、2種以上を併用してもよい。 The support is preferably made of synthetic resin and transparent, for example, polyethylene terephthalate, polyethylene naphthalate, polypropylene, polyethylene, cellulose triacetate, cellulose diacetate, poly (meth) acrylic acid alkyl ester, poly ( (Meth) acrylic acid ester copolymer, polyvinyl chloride, polyvinyl alcohol, polycarbonate, polystyrene, cellophane, polyvinylidene chloride copolymer, polyamide, polyimide, vinyl chloride / vinyl acetate copolymer, polytetrafluoroethylene, polytrifluoro Various plastic films, such as ethylene, a cellulose film, and a nylon film, are mentioned, Among these, polyethylene terephthalate is particularly preferable. These may be used alone or in combination of two or more.
前記支持体の厚みは、特に制限はなく、目的に応じて適宜選択することができるが、例えば、2〜150μmが好ましく、5〜100μmがより好ましく、8〜50μmが特に好ましい。 There is no restriction | limiting in particular in the thickness of the said support body, Although it can select suitably according to the objective, For example, 2-150 micrometers is preferable, 5-100 micrometers is more preferable, and 8-50 micrometers is especially preferable.
前記支持体の形状としては、特に制限はなく、目的に応じて適宜選択することができるが、長尺状が好ましい。前記長尺状の支持体の長さは、特に制限はなく、例えば、10〜20,000mの長さのものが挙げられる。 There is no restriction | limiting in particular as a shape of the said support body, Although it can select suitably according to the objective, A long shape is preferable. There is no restriction | limiting in particular in the length of the said elongate support body, For example, the thing of 10-20,000m length is mentioned.
<乾燥工程>
前記乾燥工程は、前記塗布液を乾燥させて前記支持体上に感光層を形成する工程である。
前記乾燥の条件としては、各成分、溶媒の種類、使用割合等によっても異なるが、通常60〜110℃の温度で30秒間〜15分間程度である。
<Drying process>
The drying step is a step of drying the coating solution to form a photosensitive layer on the support.
The drying conditions vary depending on each component, the type of solvent, the use ratio, and the like, but are usually about 60 to 110 ° C. for about 30 seconds to 15 minutes.
−感光層−
前記感光層は、感光性樹脂組成物からなる層であれば、特に制限はなく、目的に応じて適宜選択することができる。
前記感光層の厚みとしては、特に制限はなく、目的に応じて適宜選択することができるが、例えば、1〜100μmが好ましく、2〜50μmがより好ましく、4〜30μmが特に好ましい。
また、前記感光層の積層数としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、1層であってもよく、2層以上であってもよい。
-Photosensitive layer-
If the said photosensitive layer is a layer which consists of photosensitive resin compositions, there will be no restriction | limiting in particular, According to the objective, it can select suitably.
There is no restriction | limiting in particular as thickness of the said photosensitive layer, Although it can select suitably according to the objective, For example, 1-100 micrometers is preferable, 2-50 micrometers is more preferable, and 4-30 micrometers is especially preferable.
Further, the number of laminated photosensitive layers is not particularly limited and may be appropriately selected depending on the purpose. For example, it may be one layer or two or more layers.
本発明の感光性フィルムの製造法によれば、面状欠陥の少ないフィルムが製造可能なことから、絶縁性に優れた高精細な永久パターン(保護膜、層間絶縁膜、及びソルダーレジストパターンなど)を効率よく得ることができる。 According to the method for producing a photosensitive film of the present invention, since a film having few surface defects can be produced, a high-definition permanent pattern excellent in insulation (a protective film, an interlayer insulation film, a solder resist pattern, etc.) Can be obtained efficiently.
(感光性フィルム)
本発明の感光性フィルムは、少なくとも、支持体と、該支持体上に本発明の感光性樹脂組成物からなる感光層を有してなり、さらに必要に応じて、熱可塑性樹脂層等の適宜選択されるその他の層を有してなる。
支持体と感光層の構成については、上述の通りである。
(Photosensitive film)
The photosensitive film of the present invention has at least a support and a photosensitive layer comprising the photosensitive resin composition of the present invention on the support, and further, if necessary, a thermoplastic resin layer or the like as appropriate. With other layers selected.
The structures of the support and the photosensitive layer are as described above.
<その他の層>
前記その他の層としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、保護フィルム、熱可塑性樹脂層、バリア層、剥離層、接着層、光吸収層、表面保護層等の層が挙げられる。前記感光性フィルムは、これらの層を1種単独で有していてもよく、2種以上を有していてもよい。
<Other layers>
The other layer is not particularly limited and may be appropriately selected depending on the intended purpose. For example, a protective film, a thermoplastic resin layer, a barrier layer, a release layer, an adhesive layer, a light absorbing layer, a surface protective layer, etc. Layer. The said photosensitive film may have these layers individually by 1 type, and may have 2 or more types.
<<保護フィルム>>
前記感光性フィルムは、前記感光層上に保護フィルムを形成してもよい。
前記保護フィルムとしては、例えば、前記支持体に使用されるもの、紙、ポリエチレン、ポリプロピレンがラミネートされた紙、などが挙げられ、これらの中でも、ポリエチレンフィルム、ポリプロピレンフィルムが好ましい。
前記保護フィルムの厚みは、特に制限はなく、目的に応じて適宜選択することができるが、例えば、5〜100μmが好ましく、8〜50μmがより好ましく、10〜30μmが特に好ましい。
前記支持体と保護フィルムとの組合せ(支持体/保護フィルム)としては、例えば、ポリエチレンテレフタレート/ポリプロピレン、ポリエチレンテレフタレート/ポリエチレン、ポリ塩化ビニル/セロフアン、ポリイミド/ポリプロピレン、ポリエチレンテレフタレート/ポリエチレンテレフタレートなどが挙げられる。また、支持体及び保護フィルムの少なくともいずれかを表面処理することにより、層間接着力を調整することができる。前記支持体の表面処理は、前記感光層との接着力を高めるために施されてもよく、例えば、下塗層の塗設、コロナ放電処理、火炎処理、紫外線照射処理、高周波照射処理、グロー放電照射処理、活性プラズマ照射処理、レーザ光線照射処理などを挙げることができる。
<< Protective film >>
The photosensitive film may form a protective film on the photosensitive layer.
Examples of the protective film include those used for the support, paper, polyethylene, paper laminated with polypropylene, and the like. Among these, a polyethylene film and a polypropylene film are preferable.
There is no restriction | limiting in particular in the thickness of the said protective film, Although it can select suitably according to the objective, For example, 5-100 micrometers is preferable, 8-50 micrometers is more preferable, 10-30 micrometers is especially preferable.
Examples of the combination of the support and the protective film (support / protective film) include polyethylene terephthalate / polypropylene, polyethylene terephthalate / polyethylene, polyvinyl chloride / cellophane, polyimide / polypropylene, polyethylene terephthalate / polyethylene terephthalate, and the like. . Moreover, interlayer adhesion can be adjusted by surface-treating at least one of the support and the protective film. The surface treatment of the support may be performed in order to increase the adhesive force with the photosensitive layer. For example, coating of a primer layer, corona discharge treatment, flame treatment, ultraviolet irradiation treatment, high frequency irradiation treatment, glow treatment Examples thereof include discharge irradiation treatment, active plasma irradiation treatment, and laser beam irradiation treatment.
また、前記支持体と前記保護フィルムとの静摩擦係数は、0.3〜1.4が好ましく、0.5〜1.2がより好ましい。
前記静摩擦係数が、0.3以上であれば、滑り過ぎによって、ロール状にした場合に巻ズレが発生することを防止でき、1.4以下であれば、良好なロール状に巻くことができる。
Moreover, 0.3-1.4 are preferable and the static friction coefficient of the said support body and the said protective film has more preferable 0.5-1.2.
If the static friction coefficient is 0.3 or more, it is possible to prevent the occurrence of winding misalignment when it is made into a roll shape due to excessive slip, and if it is 1.4 or less, it can be wound into a good roll shape. .
前記感光性フィルムは、例えば、円筒状の巻芯に巻き取って、長尺状でロール状に巻かれて保管されることが好ましい。前記長尺状の感光性フィルムの長さは、特に制限はなく、例えば、10〜20,000mの範囲から適宜選択することができる。また、ユーザーが使いやすいようにスリット加工し、100〜1,000mの範囲の長尺体をロール状にしてもよい。なお、この場合には、前記支持体が一番外側になるように巻き取られることが好ましい。また、前記ロール状の感光性フィルムをシート状にスリットしてもよい。保管の際、端面の保護、エッジフュージョンを防止する観点から、端面にはセパレーター(特に防湿性のもの、乾燥剤入りのもの)を設置することが好ましく、また梱包も透湿性の低い素材を用いる事が好ましい。 For example, the photosensitive film is preferably wound around a cylindrical core, wound into a long roll, and stored. There is no restriction | limiting in particular in the length of the said elongate photosensitive film, For example, it can select suitably from the range of 10-20,000m. Further, slitting may be performed so that the user can easily use, and a long body in the range of 100 to 1,000 m may be formed into a roll. In this case, it is preferable that the support is wound up so as to be the outermost side. Moreover, you may slit the said roll-shaped photosensitive film in a sheet form. From the viewpoint of protecting the end face and preventing edge fusion during storage, it is preferable to install a separator (especially moisture-proof and desiccant-containing) on the end face, and use a low moisture-permeable material for packaging. Things are preferable.
前記保護フィルムは、前記保護フィルムと前記感光層との接着性を調整するために表面処理してもよい。前記表面処理は、例えば、前記保護フィルムの表面に、ポリオルガノシロキサン、弗素化ポリオレフィン、ポリフルオロエチレン、ポリビニルアルコール等のポリマーからなる下塗層を形成させる。該下塗層の形成は、前記ポリマーの塗布液を前記保護フィルムの表面に塗布した後、30〜150℃で1〜30分間乾燥させることにより形成させることができる。前記乾燥の際の温度は50〜120℃が特に好ましい。 The protective film may be surface-treated in order to adjust the adhesion between the protective film and the photosensitive layer. In the surface treatment, for example, an undercoat layer made of a polymer such as polyorganosiloxane, fluorinated polyolefin, polyfluoroethylene, or polyvinyl alcohol is formed on the surface of the protective film. The undercoat layer can be formed by applying the polymer coating solution to the surface of the protective film and then drying at 30 to 150 ° C. for 1 to 30 minutes. As for the temperature in the case of the said drying, 50-120 degreeC is especially preferable.
(感光性積層体)
前記感光性積層体は、少なくとも基体と、前記基体上に設けられた感光層と、有してなり、目的に応じて適宜選択されるその他の層を積層してなる。
前記感光層は、上述の製造方法で作製された前記感光性フィルムから転写されたものであり、上述と同様の構成を有する。
(Photosensitive laminate)
The photosensitive laminate includes at least a base and a photosensitive layer provided on the base, and is formed by stacking other layers appropriately selected according to the purpose.
The photosensitive layer is transferred from the photosensitive film produced by the manufacturing method described above, and has the same configuration as described above.
<基体>
前記基体は、感光層が形成される被処理基体、又は本発明の感光性フィルムの少なくとも感光層が転写される被転写体となるもので、特に制限はなく、目的に応じて適宜選択することができ、例えば、表面平滑性の高いものから凸凹のある表面を持つものまで任意に選択できる。板状の基体が好ましく、いわゆる基板が使用される。具体的には、公知のプリント配線板製造用の基板(プリント基板)、ガラス板(ソーダガラス板など)、合成樹脂性のフィルム、紙、金属板などが挙げられる。
<Substrate>
The substrate is a substrate to be processed on which a photosensitive layer is formed, or a substrate to which at least the photosensitive layer of the photosensitive film of the present invention is transferred, and is not particularly limited, and is appropriately selected depending on the purpose. For example, it can be arbitrarily selected from those having high surface smoothness to those having a rough surface. A plate-like substrate is preferable, and a so-called substrate is used. Specific examples include known printed wiring board manufacturing substrates (printed substrates), glass plates (soda glass plates, etc.), synthetic resin films, paper, metal plates, and the like.
<感光性積層体の製造方法>
前記感光性積層体の製造方法として、本発明の感光性フィルムにおける少なくとも感光層を加熱及び加圧の少なくともいずれかを行いながら転写して積層する方法が挙げられる。
<Method for producing photosensitive laminate>
Examples of the method for producing the photosensitive laminate include a method in which at least the photosensitive layer in the photosensitive film of the present invention is transferred and laminated while performing at least one of heating and pressing.
感光性積層体の製造方法は、前記基体の表面に本発明の感光性フィルムを加熱及び加圧の少なくともいずれかを行いながら積層する。なお、前記感光性フィルムが前記保護フィルムを有する場合には、該保護フィルムを剥離し、前記基体に前記感光層が重なるようにして積層するのが好ましい。
前記加熱温度は、特に制限はなく、目的に応じて適宜選択することができ、例えば、15〜180℃が好ましく、60〜140℃がより好ましい。
前記加圧の圧力は、特に制限はなく、目的に応じて適宜選択することができ、例えば、0.1〜1.0MPaが好ましく、0.2〜0.8MPaがより好ましい。
In the method for producing a photosensitive laminate, the photosensitive film of the present invention is laminated on the surface of the substrate while at least one of heating and pressing. In addition, when the said photosensitive film has the said protective film, it is preferable to peel this protective film and to laminate | stack so that the said photosensitive layer may overlap with the said base | substrate.
There is no restriction | limiting in particular in the said heating temperature, According to the objective, it can select suitably, For example, 15-180 degreeC is preferable and 60-140 degreeC is more preferable.
There is no restriction | limiting in particular in the said pressurization pressure, According to the objective, it can select suitably, For example, 0.1-1.0 MPa is preferable and 0.2-0.8 MPa is more preferable.
前記加熱の少なくともいずれかを行う装置としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、ラミネーター(例えば、大成ラミネータ社製 VP−II、ニチゴーモートン(株)製 VP130)などが好適に挙げられる。 There is no restriction | limiting in particular as an apparatus which performs at least any one of the said heating, According to the objective, it can select suitably, For example, Laminator (For example, Taisei Laminator VP-II, Nichigo Morton VP130) Etc. are preferable.
本発明の感光性フィルム及び前記感光性積層体は、膜厚が均一でピンホールやハジキ等の面状欠陥の発生割合が極端に低いため、絶縁信頼性に優れ、高精細な永久パターン(保護膜、層間絶縁膜、及びソルダーレジストパターンなど)を効率よく形成可能である。したがって、電子材料分野における高精細な永久パターンの形成用として広く用いることができ、特に、プリント基板の永久パターン形成用に好適に用いることができる。 The photosensitive film and the photosensitive laminate of the present invention have a uniform film thickness and an extremely low occurrence rate of planar defects such as pinholes and repellency, so that they have excellent insulation reliability and high-definition permanent patterns (protection) Film, interlayer insulating film, solder resist pattern, etc.) can be formed efficiently. Therefore, it can be widely used for forming a high-definition permanent pattern in the field of electronic materials, and can be suitably used particularly for forming a permanent pattern on a printed circuit board.
(永久パターン形成方法)
本発明の永久パターン形成方法は、露光工程を少なくとも含み、さらに、必要に応じて適宜選択した現像工程等のその他の工程を含む。
(Permanent pattern forming method)
The permanent pattern forming method of the present invention includes at least an exposure step and further includes other steps such as a development step appropriately selected as necessary.
<露光工程>
前記露光工程は、本発明の感光性積層体における感光層に対し、露光を行う工程である。本発明の感光性積層体については上述の通りである。
<Exposure process>
The said exposure process is a process of exposing with respect to the photosensitive layer in the photosensitive laminated body of this invention. The photosensitive laminate of the present invention is as described above.
前記露光の対象としては、前記感光性積層体における感光層である限り、特に制限はなく、目的に応じて適宜選択することができ、例えば、上述のように、基材上に感光性フィルムを加熱及び加圧の少なくともいずれかを行いながら積層して形成した積層体に対して行われることが好ましい。 The exposure target is not particularly limited as long as it is a photosensitive layer in the photosensitive laminate, and can be appropriately selected according to the purpose. For example, as described above, a photosensitive film is formed on a substrate. It is preferably performed on a laminate formed by laminating while performing at least one of heating and pressurization.
前記露光としては、特に制限はなく、目的に応じて適宜選択することができ、デジタル露光、アナログ露光等が挙げられるが、これらの中でもデジタル露光が好ましい。 There is no restriction | limiting in particular as said exposure, According to the objective, it can select suitably, Digital exposure, analog exposure, etc. are mentioned, Among these, digital exposure is preferable.
<その他の工程>
前記その他の工程としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、基材の表面処理工程、現像工程、硬化処理工程、ポスト露光工程などが挙げられる。
<Other processes>
There is no restriction | limiting in particular as said other process, According to the objective, it can select suitably, For example, the surface treatment process of a base material, a development process, a hardening process process, a post exposure process etc. are mentioned.
<<現像工程>>
前記現像としては、前記感光層の未露光部分を除去することにより行われる。
前記未硬化領域の除去方法としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、現像液を用いて除去する方法などが挙げられる。
<< Development process >>
The development is performed by removing an unexposed portion of the photosensitive layer.
There is no restriction | limiting in particular as the removal method of the said unhardened area | region, According to the objective, it can select suitably, For example, the method etc. which remove using a developing solution are mentioned.
前記現像液としては、特に制限はなく、目的に応じて適宜選択することができるが、例えば、アルカリ性水溶液、水系現像液、有機溶剤などが挙げられ、これらの中でも、弱アルカリ性の水溶液が好ましい。該弱アルカリ水溶液の塩基成分としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、リン酸ナトリウム、リン酸カリウム、ピロリン酸ナトリウム、ピロリン酸カリウム、硼砂などが挙げられる。 There is no restriction | limiting in particular as said developing solution, Although it can select suitably according to the objective, For example, alkaline aqueous solution, an aqueous developing solution, an organic solvent etc. are mentioned, Among these, weakly alkaline aqueous solution is preferable. Examples of the basic component of the weak alkaline aqueous solution include lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, potassium carbonate, lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium phosphate, phosphorus Examples include potassium acid, sodium pyrophosphate, potassium pyrophosphate, and borax.
前記弱アルカリ性の水溶液のpHは、例えば、約8〜12が好ましく、約9〜11がより好ましい。前記弱アルカリ性の水溶液としては、例えば、0.1〜5質量%の炭酸ナトリウム水溶液又は炭酸カリウム水溶液などが挙げられる。
前記現像液の温度は、前記感光層の現像性に合わせて適宜選択することができるが、例えば、約25〜40℃が好ましい。
For example, the pH of the weakly alkaline aqueous solution is preferably about 8 to 12, and more preferably about 9 to 11. Examples of the weak alkaline aqueous solution include a 0.1 to 5% by mass aqueous sodium carbonate solution or an aqueous potassium carbonate solution.
The temperature of the developer can be appropriately selected according to the developability of the photosensitive layer, and is preferably about 25 to 40 ° C., for example.
前記現像液は、界面活性剤、消泡剤、有機塩基(例えば、エチレンジアミン、エタノールアミン、テトラメチルアンモニウムハイドロキサイド、ジエチレントリアミン、トリエチレンペンタミン、モルホリン、トリエタノールアミン等)や、現像を促進させるため有機溶剤(例えば、アルコール類、ケトン類、エステル類、エーテル類、アミド類、ラクトン類等)などと併用してもよい。また、前記現像液は、水又はアルカリ水溶液と有機溶剤を混合した水系現像液であってもよく、有機溶剤単独であってもよい。 The developer includes a surfactant, an antifoaming agent, an organic base (for example, ethylenediamine, ethanolamine, tetramethylammonium hydroxide, diethylenetriamine, triethylenepentamine, morpholine, triethanolamine, etc.) and development. Therefore, it may be used in combination with an organic solvent (for example, alcohols, ketones, esters, ethers, amides, lactones, etc.). The developer may be an aqueous developer obtained by mixing water or an aqueous alkali solution and an organic solvent, or may be an organic solvent alone.
<<硬化処理工程>>
前記硬化処理工程は、前記現像工程が行われた後、形成されたパターンにおける感光層に対して硬化処理を行う工程である。
前記硬化処理工程としては、特に制限はなく、目的に応じて適宜選択することができるが、例えば、全面露光処理、全面加熱処理などが好適に挙げられる。
<< Curing treatment process >>
The curing treatment step is a step of performing a curing treatment on the photosensitive layer in the formed pattern after the development step is performed.
There is no restriction | limiting in particular as said hardening process, Although it can select suitably according to the objective, For example, a whole surface exposure process, a whole surface heat processing, etc. are mentioned suitably.
前記全面露光処理の方法としては、例えば、前記現像後に、前記永久パターンが形成された前記積層体上の全面を露光する方法が挙げられる。該全面露光により、前記感光層を形成する感光性樹脂組成物中の樹脂の硬化が促進され、前記永久パターンの表面が硬化される。
前記全面露光を行う装置としては、特に制限はなく、目的に応じて適宜選択することができるが、例えば、超高圧水銀灯などのUV露光機が好適に挙げられる。
Examples of the entire surface exposure processing method include a method of exposing the entire surface of the laminate on which the permanent pattern is formed after the development. By the entire surface exposure, curing of the resin in the photosensitive resin composition forming the photosensitive layer is accelerated, and the surface of the permanent pattern is cured.
There is no restriction | limiting in particular as an apparatus which performs the said whole surface exposure, Although it can select suitably according to the objective, For example, UV exposure machines, such as an ultrahigh pressure mercury lamp, are mentioned suitably.
前記全面加熱処理の方法としては、前記現像の後に、前記永久パターンが形成された前記積層体上の全面を加熱する方法が挙げられる。該全面加熱により、前記永久パターンの表面の膜強度が高められる。
前記全面加熱における加熱温度は、120〜250℃が好ましく、120〜200℃がより好ましい。該加熱温度が120℃以上であれば、加熱処理によって膜強度が向上し、250℃以下であれば、前記感光性樹脂組成物中の樹脂の分解が生じ、膜質が弱く脆くなることを防止できる。
前記全面加熱における加熱時間は、10〜120分が好ましく、15〜60分がより好ましい。
前記全面加熱を行う装置としては、特に制限はなく、公知の装置の中から、目的に応じて適宜選択することができ、例えば、ドライオーブン、ホットプレート、IRヒーターなどが挙げられる。
Examples of the entire surface heat treatment method include a method of heating the entire surface of the laminate on which the permanent pattern is formed after the development. By heating the entire surface, the film strength of the surface of the permanent pattern is increased.
120-250 degreeC is preferable and the heating temperature in the said whole surface heating has more preferable 120-200 degreeC. When the heating temperature is 120 ° C. or higher, the film strength is improved by heat treatment, and when the heating temperature is 250 ° C. or lower, the resin in the photosensitive resin composition is decomposed and the film quality is prevented from becoming weak and brittle. .
The heating time in the entire surface heating is preferably 10 to 120 minutes, and more preferably 15 to 60 minutes.
There is no restriction | limiting in particular as an apparatus which performs the said whole surface heating, According to the objective, it can select suitably from well-known apparatuses, For example, a dry oven, a hot plate, IR heater etc. are mentioned.
前記永久パターンの形成方法が、保護膜、層間絶縁膜、及びソルダーレジストパターンの少なくともいずれかを形成する永久パターン形成方法である場合には、プリント配線板上に前記永久パターン形成方法により、永久パターンを形成し、更に、以下のように半田付けを行うことができる。
即ち、前記現像により、前記永久パターンである硬化層が形成され、前記プリント配線板の表面に金属層が露出される。該プリント配線板の表面に露出した金属層の部位に対して金メッキを行った後、半田付けを行う。そして、半田付けを行った部位に、半導体や部品などを実装する。このとき、前記硬化層による永久パターンが、保護膜あるいは絶縁膜(層間絶縁膜)、ソルダーレジストとしての機能を発揮し、外部からの衝撃や隣同士の電極の導通が防止される。
When the permanent pattern forming method is a permanent pattern forming method for forming at least one of a protective film, an interlayer insulating film, and a solder resist pattern, the permanent pattern is formed on the printed wiring board by the permanent pattern forming method. Further, soldering can be performed as follows.
That is, by the development, a hardened layer that is the permanent pattern is formed, and the metal layer is exposed on the surface of the printed wiring board. Gold plating is performed on the portion of the metal layer exposed on the surface of the printed wiring board, and then soldering is performed. Then, a semiconductor or a component is mounted on the soldered portion. At this time, the permanent pattern by the hardened layer exhibits a function as a protective film, an insulating film (interlayer insulating film), or a solder resist, and prevents external impact and conduction between adjacent electrodes.
(プリント基板)
本発明のプリント基板は、少なくとも基体と、前記永久パターン形成方法により形成された永久パターンと、を有してなり、さらに、必要に応じて適宜選択した、その他の構成を有する。
その他の構成としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、基材と前記永久パターン間に、さらに絶縁層が設けられたビルドアップ基板などが挙げられる。
(Printed board)
The printed circuit board of the present invention comprises at least a substrate and a permanent pattern formed by the permanent pattern forming method, and further has other configurations appropriately selected as necessary.
There is no restriction | limiting in particular as another structure, According to the objective, it can select suitably, For example, the buildup board | substrate etc. in which the insulating layer was further provided between the base material and the said permanent pattern are mentioned.
次に、実施例及び比較例を挙げて本発明をより具体的に説明するが、本発明は下記実施例に制限されるものではない。 EXAMPLES Next, although an Example and a comparative example are given and this invention is demonstrated more concretely, this invention is not restrict | limited to the following Example.
−バインダーの合成−
1,000mL三口フラスコに1−メトキシ−2−プロパノール159gを入れ、窒素気流下、85℃まで加熱した。これに、ベンジルメタクリレート63.4g、メタクリル酸72.3g、V−601(和光純薬製)3.0gの1−メトキシ−2−プロパノール159g溶液を、2時間かけて滴下した。滴下終了後、更に5時間加熱して反応させた。次いで、加熱を止め、ベンジルメタクリレート/メタクリル酸(30/70mol%比)の共重合体を得た。
次に、前記共重合体溶液の内、120.0gを300mL三口フラスコに移し、グリシジルメタクリレート16.6g、p−メトキシフェノール0.16gを加え、撹拌し溶解させた。溶解後、空気バブリングを行いながら、トリフェニルホスフィン3.0gを加え、100℃に加熱し、20分経過した後、グリシジルメタクリレートを加えて付加反応を行った。グリシジルメタクリレートが消失したことを、ガスクロマトグラフィーで確認し、加熱を止めた。1−メトキシ−2−プロパノールを加え、固形分45質量%の下記構造式(29)で表されるバインダーの溶液を調製した。
得られたバインダーの質量平均分子量(Mw)をポリスチレンを標準物質としたゲルパーミエーションクロマトグラフィー法(GPC)により測定した結果、30,000であった。また、水酸化ナトリウムを用いた滴定から、固形分あたりの酸価は、2.2meq/gであった。更に、ヨウ素価滴定により求めた固形分あたりのエチレン性不飽和結合の含有量(C=C価)は、2.1meq/gであった。
-Binder synthesis-
In a 1,000 mL three-necked flask, 159 g of 1-methoxy-2-propanol was placed and heated to 85 ° C. under a nitrogen stream. To this, a solution of 159 g of 1-methoxy-2-propanol containing 63.4 g of benzyl methacrylate, 72.3 g of methacrylic acid, and 3.0 g of V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) was dropped over 2 hours. After completion of the dropwise addition, the reaction was further continued by heating for 5 hours. Subsequently, the heating was stopped to obtain a copolymer of benzyl methacrylate / methacrylic acid (ratio of 30/70 mol%).
Next, 120.0 g of the copolymer solution was transferred to a 300 mL three-necked flask, and 16.6 g of glycidyl methacrylate and 0.16 g of p-methoxyphenol were added and stirred to dissolve. After dissolution, 3.0 g of triphenylphosphine was added while performing air bubbling, heated to 100 ° C., and after 20 minutes, glycidyl methacrylate was added to perform an addition reaction. The disappearance of glycidyl methacrylate was confirmed by gas chromatography, and heating was stopped. 1-Methoxy-2-propanol was added to prepare a binder solution represented by the following structural formula (29) having a solid content of 45% by mass.
It was 30,000 as a result of measuring the mass mean molecular weight (Mw) of the obtained binder by the gel permeation chromatography method (GPC) which used polystyrene as the standard substance. Moreover, the acid value per solid content was 2.2 meq / g from the titration using sodium hydroxide. Furthermore, the content of ethylenically unsaturated bonds per solid (C = C value) determined by iodine value titration was 2.1 meq / g.
(実施例1)
−感光性樹脂組成物の調製−
各成分を下記の量で配合して、感光性樹脂組成物溶液(塗布液)を調製した。
〔感光性樹脂組成物溶液の各成分量〕
・前記バインダー(前記1−メトキシ−2−プロパノール溶液中に固形分質量45質量%)・・・45.51質量部
・ペンタエリスリトールテトラアクリレート(重合性化合物)・・・11.03質量部
・構造式(26)で表される光重合開始剤・・・0.35質量部
・ジエチルチオキサントン・・・0.37質量部
・ビスF型エポキシ樹脂(熱架橋剤、東都化成(株)製、YDF-170)・・・4.57質量部
・熱硬化剤(ジシアンジアミド)・・・0.08質量部
・シリカSO-C2((株)アドマテックス社製)・・・7.11質量部
・着色顔料(BASF社製、HELIOGEN BLUE D7086)・・・0.17質量部
・メチルエチルケトン・・・16.74質量部
・酢酸ノルマルプロピル・・・13.96質量部
なお、感光性樹脂組成物溶液の粘度は、40mPa・sであった。
Example 1
-Preparation of photosensitive resin composition-
Each component was mix | blended with the following quantity, and the photosensitive resin composition solution (coating liquid) was prepared.
[Each component amount of photosensitive resin composition solution]
-Binder (solid content in the 1-methoxy-2-propanol solution: 45% by mass) ... 45.51 parts by mass-Pentaerythritol tetraacrylate (polymerizable compound) ... 11.03 parts by mass Photopolymerization initiator represented by formula (26): 0.35 parts by mass / diethylthioxanthone ... 0.37 parts by mass / bis-F type epoxy resin (thermal crosslinking agent, manufactured by Toto Kasei Co., Ltd., YDF -170) ... 4.57 parts by mass-thermosetting agent (dicyandiamide) -0.08 parts by mass-Silica SO-C2 (manufactured by Admatechs) ... 7.11 parts by mass-coloring Pigment (manufactured by BASF, HELIOGEN BLUE D7086) ... 0.17 parts by mass, methyl ethyl ketone ... 16.74 parts by mass, normal propyl acetate ... 13.96 parts by mass The viscosity of the photosensitive resin composition solution Is 40 mPa It was s.
−感光性フィルムの製造−
得られた感光性樹脂組成物溶液を、超音波脱泡装置(SDF)に通した後、前記支持体としての厚み16μmのPET(ポリエチレンテレフタレート)フィルム上に、塗布し、乾燥させて、膜厚30μmの感光層を形成した。次いで、該感光層の上に、前記保護フィルムとして20μm厚のポリプロピレンフィルムをラミネートで積層し、前記感光性フィルムを製造した。なお、超音波脱泡装置は、発信機として日本アレックス(株) NEOSONICシリーズ 0833-16を用い、電圧値を35Vに設定し、発信出力を調整して使用した。
-Production of photosensitive film-
The obtained photosensitive resin composition solution was passed through an ultrasonic defoaming device (SDF), and then applied onto a PET (polyethylene terephthalate) film having a thickness of 16 μm as the support and dried to obtain a film thickness. A 30 μm photosensitive layer was formed. Next, a 20 μm-thick polypropylene film was laminated as a protective film on the photosensitive layer to produce the photosensitive film. In addition, the ultrasonic defoaming device used Nippon Alex Co., Ltd. NEOSONIC series 0833-16 as a transmitter, set the voltage value to 35V, and used the transmitter output.
<面状欠陥の評価>
評価手順/基準を記載する。上記方法で作製した感光性フィルムを、赤色透過光で目視評価した。評価基準として、直径が1mm以上の気泡をハジキ(大)、1mm以下をハジキ(小)とした。なお、感光性フィルムの大きさは1m2とした。
<Evaluation of planar defects>
Describe the evaluation procedure / criteria. The photosensitive film produced by the above method was visually evaluated with red transmitted light. As evaluation criteria, bubbles having a diameter of 1 mm or more were repelled (large), and bubbles of 1 mm or less were repelled (small). The size of the photosensitive film was 1 m 2 .
<絶縁信頼性試験>
プリント基板としての配線形成済みの銅張積層板(L/S=50μm/50μm櫛型パターン、銅厚み12μm)の表面に化学研磨処理を施して調製した。該銅張積層板上に、前記感光性フィルムの感光層が前記銅張積層板に接するようにして前記感光性フィルムにおける保護フィルムを剥がしながら、真空ラミネーター(ニチゴーモートン(株)社製、VP130)を用いて積層させ、前記銅張積層板と、前記感光層と、前記ポリエチレンテレフタレートフィルム(支持体)とがこの順に積層された感光性積層体を調製した。圧着条件は、真空引きの時間40秒、圧着温度70℃、圧着圧力0.2MPa、加圧時間10秒とした。この基板を用いて、130℃/85%/0.196Mpa/10V/200hの条件でETAC製、イオンマイグレーション評価装置SIR12を用いて絶縁信頼性試験を実施した。なお、結果は、10検体試験を行い、短絡した個数を記載した。結果を表1に示す。
<Insulation reliability test>
It was prepared by subjecting the surface of a copper-clad laminate (L / S = 50 μm / 50 μm comb pattern, copper thickness 12 μm) on which wiring was formed as a printed circuit board to a chemical polishing treatment. A vacuum laminator (VP130, manufactured by Nichigo Morton Co., Ltd.) was peeled off on the copper-clad laminate while peeling the protective film from the photosensitive film so that the photosensitive layer of the photosensitive film was in contact with the copper-clad laminate. The photosensitive laminate was prepared by laminating the copper-clad laminate, the photosensitive layer, and the polyethylene terephthalate film (support) in this order. The pressure bonding conditions were a vacuum drawing time of 40 seconds, a pressure bonding temperature of 70 ° C., a pressure bonding pressure of 0.2 MPa, and a pressure application time of 10 seconds. Using this substrate, an insulation reliability test was conducted using an ion migration evaluation apparatus SIR12 manufactured by ETAC under the conditions of 130 ° C./85%/0.196Mpa/10V/200h. In addition, as for the result, 10 specimen test was done and the number which short-circuited was described. The results are shown in Table 1.
(実施例2)
SDFの条件を35Vから70Vに変更した以外は、実施例1と同様にして、感光性フィルムを製造し、面状欠陥及び絶縁信頼性の評価を行った。結果を表1に示す。
(Example 2)
A photosensitive film was produced in the same manner as in Example 1 except that the SDF condition was changed from 35 V to 70 V, and surface defects and insulation reliability were evaluated. The results are shown in Table 1.
(実施例3)
SDFの条件を35Vから100Vに変更した以外は、実施例1と同様にして、感光性フィルムを製造し、面状欠陥及び絶縁信頼性の評価を行った。結果を表1に示す。
(Example 3)
A photosensitive film was produced in the same manner as in Example 1 except that the SDF condition was changed from 35V to 100V, and surface defects and insulation reliability were evaluated. The results are shown in Table 1.
(比較例1)
SDFの条件を35Vから0Vに変更した以外は、実施例1と同様にして、感光性フィルムを製造し、面状欠陥及び絶縁信頼性の評価を行った。結果を表1に示す。
(Comparative Example 1)
A photosensitive film was produced in the same manner as in Example 1 except that the SDF condition was changed from 35 V to 0 V, and surface defects and insulation reliability were evaluated. The results are shown in Table 1.
表1から、脱泡工程を実施しない比較例1の感光性フィルムは、面状欠陥が多く、絶縁信頼性が著しく悪いのに対し、脱泡工程を実施した実施例1〜3の感光性フィルムは、面状欠陥が非常に少なく、絶縁信頼性に優れていることがわかる。 From Table 1, although the photosensitive film of the comparative example 1 which does not implement a defoaming process has many planar defects and insulation reliability is remarkably bad, the photosensitive film of Examples 1-3 which implemented the defoaming process It can be seen that there are very few planar defects and the insulation reliability is excellent.
本発明の感光性フィルムにおいて脱泡処理を施した塗布液は、ピンホールやハジキ等の面状欠陥の発生割合を大きく抑制できることから、絶縁信頼性に優れた感光性フィルム、感光性積層体を提供できる。従って、高精細な永久パターン(保護膜、層間絶縁膜、及びソルダーレジストパターンなど)を効率よく形成可能であるため、電子材料分野における高精細な永久パターンの形成用として広く用いることができ、特に、プリント基板の永久パターン形成用に好適に用いることができる。
本発明の永久パターン形成方法は、本発明の前記感光性フィルムを用いるため、高精細な露光が必要とされる各種パターンの形成などに好適に使用することができ、特に、プリント基板の永久パターン形成に好適に使用することができる。
The coating liquid that has been subjected to defoaming treatment in the photosensitive film of the present invention can greatly suppress the rate of occurrence of surface defects such as pinholes and repellency, so that a photosensitive film and a photosensitive laminate excellent in insulation reliability can be obtained. Can be provided. Therefore, since a high-definition permanent pattern (such as a protective film, an interlayer insulating film, and a solder resist pattern) can be efficiently formed, it can be widely used for forming a high-definition permanent pattern in the field of electronic materials. And can be suitably used for forming a permanent pattern on a printed circuit board.
Since the method for forming a permanent pattern of the present invention uses the photosensitive film of the present invention, it can be suitably used for forming various patterns that require high-definition exposure. It can be used suitably for formation.
Claims (10)
前記塗布液に脱泡処理を施す脱泡工程と、
前記脱泡工程後に、前記塗布液を支持体に塗布する塗布工程と、
前記塗布液を乾燥させて前記支持体上に感光層を形成する乾燥工程と、
を含むことを特徴とする感光性フィルムの製造方法。 i) a coating solution containing a photosensitive resin composition containing a photosensitive group and an acid group for imparting alkali developability, ii) a polymerizable compound, and iii) a photopolymerization initiator. A preparation process;
A defoaming step of defoaming the coating solution;
After the defoaming step, an application step of applying the coating liquid to a support;
A drying step of drying the coating solution to form a photosensitive layer on the support;
The manufacturing method of the photosensitive film characterized by including.
長尺状であり、ロール状に巻かれてなることを特徴とする感光性フィルム。 A photosensitive film produced by the production method according to claim 1,
A photosensitive film which is long and is wound into a roll.
前記感光層は、請求項1から6のいずれかに記載の製造方法で作製された感光性フィルムから転写されたことを特徴とする感光性積層体。 A photosensitive laminate comprising a substrate and a photosensitive layer provided on the substrate,
A photosensitive laminate, wherein the photosensitive layer is transferred from a photosensitive film produced by the production method according to claim 1.
A printed circuit board comprising a permanent pattern formed by the permanent pattern forming method according to claim 9.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008246108A JP2010078820A (en) | 2008-09-25 | 2008-09-25 | Method for producing photosensitive film, photosensitive film, photosensitive laminate, permanent pattern forming method and printed circuit board |
KR1020090087182A KR20100035106A (en) | 2008-09-25 | 2009-09-15 | Manufacturing method for photosensitive film, photosensitive film, photosensitive laminate, method for forming permanent pattern and printed board |
TW098131833A TW201022845A (en) | 2008-09-25 | 2009-09-22 | Manufacturing method for photosensitive film, photosensitive film, photosensitive laminate, method for forming permanent pattern and printed board |
CN200910178635A CN101685256A (en) | 2008-09-25 | 2009-09-24 | Photosensitive film manufacturing method, photosensitive film, photosensitive laminating body, permanent pattern forming method and printing circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008246108A JP2010078820A (en) | 2008-09-25 | 2008-09-25 | Method for producing photosensitive film, photosensitive film, photosensitive laminate, permanent pattern forming method and printed circuit board |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2010078820A true JP2010078820A (en) | 2010-04-08 |
Family
ID=42048470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008246108A Abandoned JP2010078820A (en) | 2008-09-25 | 2008-09-25 | Method for producing photosensitive film, photosensitive film, photosensitive laminate, permanent pattern forming method and printed circuit board |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2010078820A (en) |
KR (1) | KR20100035106A (en) |
CN (1) | CN101685256A (en) |
TW (1) | TW201022845A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012255925A (en) * | 2011-06-09 | 2012-12-27 | Hitachi Chem Co Ltd | Photosensitive resin composition, and photosensitive element and permanent resist using the same |
CN107138050A (en) * | 2017-05-27 | 2017-09-08 | 天津工业大学 | The preparation method of quaternary ammonium salt graft modification cellulose acetate reverse osmosis film |
CN113168093A (en) * | 2018-12-05 | 2021-07-23 | 富士胶片株式会社 | Pattern forming method, photosensitive resin composition, cured film, laminate, and device |
JP2023508388A (en) * | 2019-12-31 | 2023-03-02 | コーロン インダストリーズ インク | Photosensitive laminate, method for producing photosensitive laminate, and method for producing circuit board |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013539072A (en) * | 2010-09-16 | 2013-10-17 | エルジー・ケム・リミテッド | Photosensitive resin composition, dry film solder resist and circuit board |
WO2013125854A1 (en) * | 2012-02-20 | 2013-08-29 | 주식회사 엘지화학 | Radiation curable and thermosettable resin composition, and dry film solder resist |
US9389504B2 (en) | 2012-02-20 | 2016-07-12 | Lg Chem, Ltd. | Photo-curable and thermo-curable resin composition, and dry film solder resist |
CN103607837A (en) * | 2013-10-21 | 2014-02-26 | 溧阳市东大技术转移中心有限公司 | Printed circuit board structure |
CN108459465B (en) * | 2017-01-17 | 2021-12-14 | 太阳油墨制造株式会社 | Photosensitive film, photosensitive film laminate, and cured product formed using same |
CN108319116A (en) * | 2018-02-07 | 2018-07-24 | 武汉华星光电技术有限公司 | Developer solution retracting device |
CN111760470A (en) * | 2020-07-06 | 2020-10-13 | 中国海诚工程科技股份有限公司 | Membrane transfer coating MBR (membrane bioreactor) membrane and preparation method thereof |
-
2008
- 2008-09-25 JP JP2008246108A patent/JP2010078820A/en not_active Abandoned
-
2009
- 2009-09-15 KR KR1020090087182A patent/KR20100035106A/en not_active Application Discontinuation
- 2009-09-22 TW TW098131833A patent/TW201022845A/en unknown
- 2009-09-24 CN CN200910178635A patent/CN101685256A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012255925A (en) * | 2011-06-09 | 2012-12-27 | Hitachi Chem Co Ltd | Photosensitive resin composition, and photosensitive element and permanent resist using the same |
CN107138050A (en) * | 2017-05-27 | 2017-09-08 | 天津工业大学 | The preparation method of quaternary ammonium salt graft modification cellulose acetate reverse osmosis film |
CN107138050B (en) * | 2017-05-27 | 2020-01-14 | 天津工业大学 | Preparation method of quaternary ammonium salt grafted modified cellulose acetate reverse osmosis membrane |
CN113168093A (en) * | 2018-12-05 | 2021-07-23 | 富士胶片株式会社 | Pattern forming method, photosensitive resin composition, cured film, laminate, and device |
CN113168093B (en) * | 2018-12-05 | 2024-04-30 | 富士胶片株式会社 | Pattern forming method, photosensitive resin composition, cured film, laminate, and device |
JP2023508388A (en) * | 2019-12-31 | 2023-03-02 | コーロン インダストリーズ インク | Photosensitive laminate, method for producing photosensitive laminate, and method for producing circuit board |
Also Published As
Publication number | Publication date |
---|---|
CN101685256A (en) | 2010-03-31 |
TW201022845A (en) | 2010-06-16 |
KR20100035106A (en) | 2010-04-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2010078820A (en) | Method for producing photosensitive film, photosensitive film, photosensitive laminate, permanent pattern forming method and printed circuit board | |
JP2009086376A (en) | Photosensitive composition, photosensitive film, photosensitive layered product, permanent pattern forming method, printed circuit board | |
KR20100014419A (en) | Photosensitive composition, photosensitive film, method for formation of permanent pattern, and print substrate | |
JP2007178500A (en) | Photosensitive film, permanent pattern and method for forming the same | |
JP2010160419A (en) | Photosensitive resin composition, photosensitive film, method for forming resist pattern and permanent resist using the same | |
JP2007010785A (en) | Method for forming permanent pattern | |
JP2019066792A (en) | Photosensitive resin composition, photosensitive element, and printed wiring board and method for manufacturing the same | |
JP2010204174A (en) | Photosensitive laminate and photosensitive film, and production method of printed board | |
JP2011180376A (en) | Method for forming permanent pattern and photosensitive film | |
JP2005202066A (en) | Light-sensitive transfer sheet, light-sensitive laminate, image pattern forming method, and wiring pattern forming method | |
JP2007047771A (en) | Photosensitive film, method for producing the same and permanent pattern forming method | |
JP2010079089A (en) | Pattern forming method | |
KR20080066845A (en) | Photosensitive composition, phososensitive film, permanent pattern, and method for formation of the permanent pattern | |
EP1489460A2 (en) | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | |
JP2010078814A (en) | Photosensitive resin composition, photosensitive film, photosensitive laminate, permanent pattern forming method and printed circuit board | |
JP5255504B2 (en) | Photosensitive composition, photosensitive film, photosensitive laminate, permanent pattern forming method, and printed circuit board | |
JP2006330655A (en) | Photosensitive composition, photosensitive film, permanent pattern and method for forming the same | |
JP2011070083A (en) | Photosensitive film and permanent pattern forming method | |
JP2007156404A (en) | Method of producing polymerizable composition, photosensitive film and method of producing the same, and permanent pattern forming method | |
JP2010230721A (en) | Photosensitive composition, photosensitive film, and method for forming permanent pattern | |
JP4620700B2 (en) | Photosensitive composition, photosensitive film, method for forming permanent pattern, and printed circuit board | |
JP2007133108A (en) | Photosensitive solder resist composition and film, and permanent pattern and method of forming same | |
JP4178916B2 (en) | Blue-violet laser photosensitive composition, and image forming material, image forming material, and image forming method using the same | |
JP2005331695A (en) | Photosensitive transfer sheet, photosensitive laminate, image pattern forming method, and wiring pattern forming method | |
JP5378856B2 (en) | Photosensitive composition, photosensitive film, photosensitive laminate, permanent pattern forming method, and printed circuit board |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110214 |
|
A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20120611 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120615 |