JP2019066792A - Photosensitive resin composition, photosensitive element, and printed wiring board and method for manufacturing the same - Google Patents

Abstract

To provide a photosensitive resin composition that has excellent adhesion (peel strength) to a conductor layer formed on an insulating layer, excellent insulating reliability (HAST resistance), and sufficient photoreaction characteristics, a photosensitive element, and a printed wiring board obtained using the photosensitive resin composition or the photosensitive element and a method for manufacturing the same.SOLUTION: A photosensitive resin composition contains (A) a photopolymerizable compound having an ethylenically unsaturated group, (B) a photopolymerization initiator, (C) an epoxy resin, (D) a polyfunctional maleimide compound, and (E) a melamine-modified novolak type phenol resin, where (B) the photopolymerization initiator preferably contains (B1) a compound having oxime ester.SELECTED DRAWING: None

Description

  The present invention relates to a photosensitive resin composition suitable for forming an insulating layer such as a multilayer printed wiring board, a photosensitive element, a printed wiring board, and a method of manufacturing the same.

  In recent years, miniaturization and high performance of electronic devices have progressed, and in multilayer printed wiring boards, the increase in the number of circuit layers and the increase in density due to the miniaturization of wiring have progressed. In particular, the density of semiconductor package substrates such as BGA (ball grid array) and CSP (chip size package) on which semiconductor chips are mounted is remarkably increased, and in addition to miniaturization of wiring, thinning of insulating layers and vias for interlayer connection The diameter of the In such semiconductor package substrates, along with the miniaturization of circuits, a semi-additive method of forming circuits by plating has become mainstream.

  In the semi-additive method, for example, after forming an insulating layer on a conductor circuit, a via processing for interlayer connection is laser irradiation and a desmear process is performed as resin residue removal. (2) Thereafter, the substrate is subjected to electroless copper plating treatment to form a pattern with a dry film resist, and then electrolytic copper plating is performed to form a copper circuit layer. (3) Finally, a copper circuit is formed by resist stripping and flash etching of the electroless layer.

  However, in recent years, the via processing size by laser irradiation has reached a limit for higher density, and a photo via method in which smaller diameter vias are collectively formed by photolithography has attracted attention.

  On the other hand, in the case of the photosensitive resin composition corresponding to the photolithography method, it was not sufficient to satisfy the characteristics required for the semiconductor package substrate which requires high reliability.

JP, 2010-128317, A

  The present invention is a photosensitive material having excellent adhesion (peel strength) with a conductor layer formed on an insulating layer, and having excellent insulation reliability (HAST resistance) and sufficient photoreaction characteristics. LAYER RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND PRINTED WIRING BOARD USING THE PHOTOSENSITIVE RESIN COMPOSITION OR THE PHOTOSENSITIVE ELEMENTS AS MATERIALS FOR FORMING PHOTO VIARS The object is to provide a method for producing the same. The purpose is to provide a photo via material.

  The inventors of the present invention conducted intensive studies to find that (A) a photopolymerizable compound having an ethylenically unsaturated group, (B) a photopolymerization initiator, (C) an epoxy resin, (D) a polyfunctional maleimide compound, and E) A photosensitive resin composition containing a melamine-modified novolak type phenolic resin has excellent adhesion (peel strength) with the conductor layer, excellent insulation reliability, and sufficient photoreaction characteristics I found out.

（式中、Ｒ_１は、炭素数１〜１２のアルキル基、炭素数４〜１０のシクロアルキル基、又は置換若しくは無置換のフェニル基を示す。Ｒ_２は、置換若しくは無置換のフルオレニル基又は置換若しくは無置換のカルバゾリル基を示す。Ｒ_３は、炭素数１〜１２のアルキル基、炭素数１〜１２のアルコキシ基、炭素数４〜１０のシクロアルキル基、フェニル基又はトリル基を示す。） In addition, the photopolymerization initiator (B) further exhibits excellent photoreaction characteristics by including the photopolymerization initiator of the compound having the (B1) oxime ester structure. The compound having an oxime ester structure (B1) preferably has a structure represented by the following general formula (1).

(Wherein, R ₁ represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, or a substituted or unsubstituted phenyl group. R ₂ represents a substituted or unsubstituted fluorenyl group or R ₃ represents a substituted or unsubstituted carbazolyl group, R ₃ represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, a phenyl group or a tolyl group. )

  The photopolymerizable compound (A) having an ethylenically unsaturated group of the present invention is preferably an acid-modified epoxy acrylate compound having a carboxyl group in the molecule, and by alkali development, small diameter vias are collectively formed by photolithography. .

  Moreover, the outstanding adhesiveness (peel strength) is further expressed by containing the (E) melamine modified novolak-type phenol resin.

  Further, by containing an epoxidized polybutadiene as one of the (C) epoxy resins, similarly excellent adhesion (peel strength) is further developed.

  In addition, by including (F) an organic peroxide having a one-hour half-life temperature of 100 ° C. to 180 ° C., the Tg of the resin after curing is increased, and the insulation reliability and the like are further improved. It is desirable to contain the organic peroxide.

  The photosensitive resin composition of the present invention is used as a photosensitive element comprising a support and a photosensitive layer formed on the support using the photosensitive resin composition.

  Moreover, said photosensitive resin composition and photosensitive element are used as resin for insulating layer formation of the multilayer printed wiring board which has a conductor layer formed on the insulating layer. In particular, after being treated with an alkaline permanganate etching solution (desmear solution), it is suitable as a resin for forming an insulating layer of a multilayer printed wiring board on which wiring is formed on a resist by a copper plating process, and exhibits excellent characteristics. .

According to the present invention, it has excellent adhesion (peel strength) with the conductor layer formed on the insulating layer, has excellent insulation reliability (HAST resistance), and has sufficient photoreaction characteristics. The photosensitive resin composition and photosensitive element which have it can be provided. The photosensitive resin composition or photosensitive element can be used as a material for forming a photo via of a printed circuit board.
In particular, after treating with an alkaline permanganate etching solution (desmear solution), it is suitable when used as a resin for an insulating layer of a multilayer printed wiring board in which a wiring is formed on a resist by a copper plating process.

Hereinafter, preferred embodiments of the present invention will be described in detail.
The photosensitive resin composition of the present invention comprises (A) a photopolymerizable compound having an ethylenically unsaturated group, (B1) a photopolymerization initiator containing a compound having an oxime ester structure, (C) an epoxy resin, It contains (D) a polyfunctional maleimide compound, and (E) a melamine modified novolac type phenol resin. Moreover, (G) an inorganic filler etc. can be contained as needed. The components will be described below.

<(A) Photopolymerizable Compound Having Ethylenically Unsaturated Group>
The photopolymerizable compound having an ethylenically unsaturated group of the present invention refers to a compound having an ethylenically unsaturated group in the molecule, and is not particularly limited as long as it has a (meth) acryloyl group as a photosensitive group. . Preferably, an acid-modified epoxy acrylate compound having a carboxyl group in the molecule is used in addition to the ethylenically unsaturated group. Thereby, alkali developability can be provided. In addition, when the compound which has a carboxyl group in a molecule | numerator is not used, it develops with a solvent etc. and a photosensitive pattern can be obtained.

  The acid-modified epoxy acrylate compound is, for example, (a3) a saturated or unsaturated group-containing polybasic acid anhydride in the reaction product (A ′) of (a1) epoxy resin and (a2) unsaturated group-containing monocarboxylic acid It can be obtained by reaction. The (a1) epoxy resin is not particularly limited. For example, novolak epoxy resin, bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, salicylaldehyde epoxy resin, bisphenol A novolac epoxy Resin, bisphenol F novolac epoxy resin, biphenyl novolac epoxy resin, rubber-modified epoxy resin, etc. may be mentioned. In addition, an epoxy resin-based polyurethane resin obtained by reacting the above reaction product (A ') with an isocyanate may be used. These are used alone or in combination of two or more.

  As the acid-modified epoxy acrylate compounds mentioned above, for example, CCR-1218H, CCR-1159H, CCR-1222H, PCR-1050, TCR-1335H, ZAR-1035, ZAR-2001H, UXE-3024, ZFR-1185 and ZCR- 1569H, ZCR-6000, ZCR-8000 (above, Nippon Kayaku Co., Ltd., trade name), UE-9000, UE-EXP-2810PM, UE-EXP-3045 (above, DIC Corporation, trade name), etc. Are commercially available.

  As a photopolymerizable compound which does not have a carboxyl group, there exist a thing of the dipenta erythritol hexaacrylate and its analog structure, for example, and commercially, KAYARAD DPHA, KAYARAD D-310, KAYARAD D-330, KAYARAD DPCA 20, 30, and KAYARAD DPCA-60, 120 (all are manufactured by Nippon Kayaku Co., Ltd., trade names). As a polyfunctional photopolymerization compound having three or more ethylenically unsaturated groups in one molecule, commercially available is trimethylolpropane triethoxy triacrylate (SR-454, manufactured by Nippon Kayaku Co., Ltd., etc.), etc. It is possible.

  Moreover, as a photopolymerizable compound which has a bisphenol A structure in the photopolymerizable compound which does not have a carboxyl group, for example, FA- 321M which is 2, 2-bis (4- (methacryloxy penta ethoxy) phenyl) propane Commercially available as Hitachi Chemical Co., Ltd., product name) or BPE-500 (product of Shin-Nakamura Chemical Co., Ltd. product name), 2, 2-bis (4- (methacryloxypentadecaethoxy) phenyl ) Is commercially available as BPE-1300 (trade name, manufactured by Shin-Nakamura Chemical Co., Ltd.).

  The photopolymerizable compounds may be used alone or in combination of two or more, and it is particularly desirable to contain at least one or more polyfunctional photopolymerization monomers having three or more ethylenic unsaturated groups in one molecule. . Among them, a polyfunctional photopolymerization monomer having six or more ethylenically unsaturated groups in one molecule is effective for improving the crack resistance at the time of reflow mounting.

（式中、Ｒ_１は、炭素数１〜１２のアルキル基、炭素数４〜１０のシクロアルキル基、又は置換若しくは無置換のフェニル基を示す。Ｒ_２は、置換若しくは無置換のフルオレニル基又は置換若しくは無置換のカルバゾリル基を示す。Ｒ_３は、炭素数１〜１２のアルキル基、炭素数１〜１２のアルコキシ基、炭素数４〜１０のシクロアルキル基、フェニル基又はトリル基を示す。） <(B) Photopolymerization initiator>
As the (B) photopolymerization initiator of the present invention, it is preferable to use a compound having an oxime ester structure (B1) which can obtain a great effect in improving the photoreaction characteristics. It is preferable that the compound which has (B1) oxime ester structure used as (B) photoinitiator of this invention has a structure represented by following General formula (1).

(Wherein, R ₁ represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, or a substituted or unsubstituted phenyl group. R ₂ represents a substituted or unsubstituted fluorenyl group or R ₃ represents a substituted or unsubstituted carbazolyl group, R ₃ represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, a phenyl group or a tolyl group. )

  Among compounds having a structure represented by the following general formula (1), for example, (2- (acetyloxyiminomethyl) thioxanthen-9-one), (1,2-octanedione, 1- [4-] (Phenylthio)-, 2- (o-benzoyloxime)], ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (o-acetyloxime And the like, and among them, ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (o-acetyloxime)) is used. Is most preferred. This is commercially available as IRGACURE-OXE02 (manufactured by BASF).

  Moreover, as the photopolymerization initiator (B), other compounds other than the compound having an oxime ester structure (B1) can also be used. For example, benzophenone, N, N'-tetraalkyl-4,4'- Diaminobenzophenone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-propanone-1,4, Aromatic ketones such as 4'-bis (dimethylamino) benzophenone (Michler's ketone), 4,4'-bis (diethylamino) benzophenone, 4-methoxy-4'-dimethylaminobenzophenone, and quinones such as alkyl anthraquinone and phenanthrene quinone , Benzoin, alkyl benzoin and other benzoin compounds, benzoin al Benzoin ether compounds such as diethyl ether, benzoin phenyl ether etc., benzyl derivatives such as benzyl dimethyl ketal, 2- (o-chlorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (M-methoxyphenyl) imidazole dimer, 2- (o-fluorophenyl) -4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2 2,4,5-Triarylimidazoles such as 2,4-di (p-methoxyphenyl) -5-phenylimidazole dimer and 2- (2,4-dimethoxyphenyl) -4,5-diphenylimidazole dimer Dimers, N-phenylglycine, N-phenylglycine derivatives, 9-phenylacridine, etc. Coumarins such as zine derivatives, 1,2-octanedione, 7-diethylamino-4-methylcoumarin, thioxanthones such as 2,4-diethylthioxanthone, 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, etc. And acyl phosphine oxide compounds of the following.

  Commercially, there are IRGACURE series manufactured by BASF, etc. For example, it is commercially available as IRGACURE 369, IRGACURE 907, IRGACURE TPO, IRGACURE 819 (all are manufactured by BASF, trade names). One or more of these may be used in combination with a photopolymerization initiator which is a compound having a (B1) oxime ester structure.

  The content of the photopolymerization initiator is preferably 0.01 to 20 parts by mass, more preferably 0.1 to 10, based on 100 parts by mass in total of the resin component excluding the (G) inorganic filler and the solvent component. It is a mass part, More preferably, it is 0.2-6 mass parts. When the content of the photopolymerization initiator (B) is within this range, the photosensitivity of the photosensitive resin composition and the photocurability inside are excellent, and as a result, the resolution and the via shape become better.

<(C) Epoxy resin>
The (C) epoxy resin of the present invention is not particularly limited, but bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin, naphthol epoxy resin Naphthalene type epoxy resin, Naphthylene ether type epoxy resin, glycidyl amine type epoxy resin, biphenyl type epoxy resin, alicyclic epoxy resin, heterocyclic epoxy resin, spiro ring containing epoxy resin, cyclohexane dimethanol type epoxy resin, tri Methylol-type epoxy resin etc. are mentioned. These may be used alone or in combination of two or more.

  Among them, in particular, from the viewpoints of heat resistance improvement, insulation reliability improvement and adhesion improvement with copper, bisphenol A type epoxy resin, naphthol type epoxy resin, naphthalene type epoxy resin, biphenyl type epoxy resin, naphthalene ether type Epoxy resins are preferred. Specifically, for example, bisphenol A type epoxy resin ("Epikote 828EL", "YL 980" manufactured by Mitsubishi Chemical Corporation), bisphenol F type epoxy resin ("JER806H", "YL 983 U" manufactured by Mitsubishi Chemical Corporation), naphthalene type Epoxy resin ("HP4032D", "HP4710" manufactured by DIC Corporation), naphthalene skeleton-containing polyfunctional epoxy resin ("NC7000" manufactured by Nippon Kayaku Co., Ltd.), naphthol type epoxy resin ("NSN" manufactured by Nippon Steel Chemical Co., Ltd.) 475 V "), epoxy resin having a biphenyl structure (" NC3000H "," NC3500 "manufactured by Nippon Kayaku Co., Ltd.," YX4000HK "," YL6121 "manufactured by Mitsubishi Chemical Corporation), anthracene epoxy resin (" Mitsubishi Chemical Co., Ltd. " YX8800 "), glycerol type Carboxymethyl resin (manufactured by Nippon Steel Chemical Co., Ltd. "ZX1542"), such as naphthylene ether type epoxy resin (manufactured by DIC Corporation "EXA7311-G3") can be mentioned.

  Two or more epoxy resins may be used in combination. Further, it is preferable to use an epoxy resin which is liquid at room temperature and an aromatic epoxy resin which is solid at room temperature.

  Furthermore, the photosensitive resin composition of the present invention uses, as an epoxy resin, an epoxy resin having a butadiene structure ("PB-3600", "Epolide PB" manufactured by Daicel Chemical Industries, Ltd.) in combination with other epoxy resin Is desirable. By using it together with the melamine modified novolak type phenol resin of the component (E), it is possible to obtain excellent adhesion to the conductor layer formed on the insulating layer.

  The content of the epoxy resin (C) is preferably 5 to 70 parts by mass, more preferably 10 to 50 parts by mass, based on 100 parts by mass of the total of the resin components excluding the inorganic filler and the solvent component (G). It is more preferably 15 to 40 parts by mass. When the content of the epoxy resin (C) is less than 5 parts by mass, sufficient crosslinking of the photosensitive resin composition can not be obtained, and adhesion with copper and insulation reliability can not be obtained. On the other hand, when it exceeds 70 parts by mass, the resolution and the developability become insufficient.

<(D) Polyfunctional maleimide compound>
The polyfunctional maleimide compound used in the present invention is not particularly limited, but 1-methyl-2,4-bismaleimide benzene, N, N'-m-phenylene bismaleimide, N, N'-p-phenylene bismaleimide N, N'-m-toluylene bismaleimide, N, N'-4,4'-biphenylene bismaleimide, N, N'-4,4 '-[3,3'-dimethylbiphenylene] bismaleimide, N , N'-4,4 '-[3,3'-dimethyldiphenylmethane] bismaleimide, N, N'-4,4'-[3,3'-diethyldiphenylmethane] bismaleimide, N, N'-4, 4′-diphenylmethane bismaleimide, N, N′-4,4′-diphenylpropane bismaleimide, N, N′-4,4′-diphenylether bismaleimide, 2,2-bis [4- (4-maleimide) Phenoxy) phenyl] propane, 1,1-bis [2-methyl-4- (4-maleimidophenoxy) -5-t-butylphenyl] -2-methylpropane, 4,4′-methylene-bis [1- ( 4-maleimidophenoxy) -2,6-bis (1,1-dimethylethyl) benzene], 4,4 ′-(1-methylethylidene) -bis [1- (maleimidophenoxy) -2,6-bis (1) 1,2-Dimethylethyl) benzene], 2,2-bis [4- (4-maleimidophenoxy) phenyl] propane, 2,2-bis [3-methyl-4- (4-maleimidophenoxy) phenyl] propane, 2 , 2-Bis [3,5-dimethyl-4- (4-maleimidophenoxy) phenyl] propane, 2,2-bis [3-ethyl-4- (4-maleimidophenoxy) phenyl] pro , Bis [3-methyl-4- (4-maleimidophenoxy) phenyl] methane, bis [3,5-dimethyl-4- (4-maleimidophenoxy) phenyl] methane, bis [3-ethyl-4- (4) -Maleimido phenoxy) phenyl] methane, phenyl methane maleimide etc. are mentioned. These can be used singly or in combination of two or more.

  Commercially, for example, it is available as BMI series manufactured by Daiwa Kasei Kogyo Co., Ltd., and BMI-1000, BMI-2000, BMI-2300, BMI-3000, BMI-4000, BMI-5000, BMI-5100, BMI- 7000, BMI-TMH (Daiwa Kasei Kogyo Co., Ltd., trade name), etc. are available. Among these, it is desirable to use BMI-5100, BMI-4000, and BMI-2300 from the viewpoint of solubility in solvents.

  The content of the polyfunctional maleimide compound (D) is preferably 2 to 40 parts by mass, more preferably 5 to 30 parts by mass, based on 100 parts by mass in total of the resin component excluding the inorganic filler and the solvent component (G). Part, more preferably 10 to 25 parts by mass. When the content of the (D) polyfunctional maleimide compound is less than 2 parts by mass, the insulation reliability tends to be lowered. On the other hand, if it exceeds 40 parts by mass, the resolution and the developability become insufficient.

（式中、Ｒ＝Ｈ又はＣＨ_３を示し、Ｒａ及びＲｂは、独立にＨ又は下記一般式（３）式で表されるノボラック型フェノール樹脂の残基を示す。ｎは１以上の整数である。）

（式中、Ｒ＝Ｈ又はＣＨ_３を示し、ｍは１以上の整数である。） <(E) Melamine Modified Novolak Phenolic Resin>
The melamine-modified novolac phenolic resin of the present invention acts as a curing agent for (C) epoxy resin. The melamine-modified novolak type phenolic resin is a condensate obtained by reacting melamines with phenols and aldehydes, and the nitrogen content is preferably 2 to 30 parts by mass, more preferably 4 to 25 parts by mass. More preferably, it is 6-20 mass parts. The structural example of a melamine modified novolak type phenol resin is shown in the following general formula (2).

(Wherein, R = H or CH ₃ is shown, and Ra and Rb are independently H or a residue of a novolac-type phenolic resin represented by the following general formula (3). N is an integer of 1 or more) is there.)

(Wherein, R = H or CH ₃ is indicated, and m is an integer of 1 or more)

  Commercially, for example, it is available as PHENOLITE series manufactured by DIC Corporation, LA-7052, LA-7054, LA-7751, LA-1356, LA-3018-50P (trade name of DIC Corporation) Etc. are available.

<(F) organic peroxide>
The organic peroxide functions as a thermal radical initiator that generates radicals by heat, and in the present invention, the one-hour half-life temperature of 100 to 180 ° C. is used. By using the organic peroxide having such a one-hour half-life temperature, it is possible to improve the crosslink density of the photosensitive resin composition, the storage stability, and the wide latitude of the laminating temperature. Specifically, dicumyl peroxide (manufactured by NOF Corporation, trade name "PARKIL D"), α, α'-bis (t-butylperoxy-m-isopropyl) benzene (manufactured by NOF Corporation, products) Name “Perbutyl P”), 2,5-Dimethyl-2,5-di (t-butylperoxy) hexane-3 (manufactured by NOF Corporation, trade name “Perhexin 25b”), t-Butylperoxybenzoate ( Nippon Oil and Fats Co., Ltd., trade name "Perbutyl Z", t-butyl cumyl peroxide (trade name "Perbutyl C", trade name "Perbutyl C"), cyclohexane peroxide, 1,1-bis (t-butyl peroxy) ) Cyclohexane, 1,1-bis (t-butylperoxy) 3,3,5-trimethylcyclohexane, 2,2-bis (t-butylperoxy) octa) N-butyl-4,4-bis (t-butylperoxy) valerate, di-t-butyl peroxide, benzoyl peroxide, cumylperoxy neodecanate, 2,5-dimethyl-2,5-di ( Benzoylperoxy) hexane, t-butylperoxyisopropyl carbonate, t-butylperoxyallyl carbonate, t-butylperoxyacetate, 2,2-bis (t-butylperoxy) butane, di-t-butylperoxy Isophthalate and t-butylperoxymaleic acid can be used. These can be used alone or in combination of two or more.

  The content of the organic peroxide (F) is preferably 0.01 to 5 parts by mass, more preferably 0. 5 parts by mass with respect to 100 parts by mass in total of the resin component excluding the (G) inorganic filler and the solvent component. 1 to 3 parts by mass. When the content of the organic peroxide (F) is less than 0.01 parts by mass, curing is difficult to complete in a short time, and the cured product tends to be nonuniform. On the other hand, when the content exceeds 5 parts by mass, the tolerance of the drying temperature and the lamination temperature decreases. In addition, due to the organic peroxide remaining without decomposition, the insulation reliability of the insulating layer after curing and the crack resistance tend to be lowered.

<(G) Inorganic filler>
The photosensitive resin composition of the present invention preferably further contains (G) an inorganic filler for the purpose of improving various properties such as adhesion and coating film hardness. For example, silica (SiO ₂ ), alumina (Al ₂ O ₃ ), titania (TiO ₂ ), tantalum oxide (Ta ₂ O ₅ ), zirconia (ZrO ₂ ), silicon nitride (Si ₃ N ₄ ), barium titanate BaO · TiO ₂ ), barium carbonate (BaCO ₃ ), magnesium carbonate, aluminum oxide, aluminum hydroxide, magnesium hydroxide, lead titanate (PbO · TiO ₂ ), lead zirconate titanate (PZT), zirconate titanate lead lanthanum (PLZT), gallium oxide _{(Ga 2 O} 3), spinel _{(MgO · Al 2 O 3)} , mullite _{(3Al 2 O 3 · 2SiO 2} ), cordierite _{(2MgO · 2Al 2 O 3 /} 5SiO 2) , talc _{(3MgO · 4SiO 2 · H 2} O), aluminum titanate _(TiO 2 -Al _{2 3),} yttria-containing zirconia _{(Y 2 O 3 -ZrO 2)} , barium silicate (BaO · 8SiO _2), boron nitride (BN), calcium carbonate (CaCO _3), barium sulfate (BaSO _4), calcium sulfate (CaSO ₄ ) Zinc oxide (ZnO), magnesium titanate (MgO.TiO ₂ ), hydrotalcite, mica, calcined kaolin, carbon (C), etc. can be used. These inorganic fillers can be used singly or in combination of two or more.

  The content of the inorganic filler (G) is preferably 0 to 80% by mass, more preferably 10 to 70% by mass, and more preferably 20 to 60% by mass, based on the total solid content of the photosensitive resin composition. Is more preferably 30 to 50% by mass. When the content is within the above range, film strength, heat resistance, insulation reliability, thermal shock resistance, resolution and the like can be further improved. The inorganic filler preferably has a maximum particle diameter of 0.01 to 20 μm, more preferably 0.05 to 10 μm, still more preferably 0.1 to 5 μm, and 0.1 to 1 μm. And particularly preferred. When the maximum particle size exceeds 20 μm, the insulation reliability tends to be impaired.

  Among the inorganic fillers (G), it is preferable to use silica fine particles from the viewpoint of being able to improve the insulation reliability.

  Various organic solvents can be used as a diluent for the photosensitive resin composition used in the present invention. Examples of the organic solvent include ketones such as ethyl methyl ketone and cyclohexanone, aromatic hydrocarbons such as toluene, xylene and tetramethylbenzene, methyl cellosolve, butyl cellosolve, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, Glycol ethers such as dipropylene glycol monoethyl ether, dipropylene glycol diethyl ether, triethylene glycol monoethyl ether etc. Ethyl acetate, butyl acetate, esters such as butyl cellosolve acetate, carbitol acetate etc. Aliphatic carbonization such as octane and decane Petroleum solvents such as hydrogens, petroleum ether, petroleum naphtha, hydrogenated petroleum naphtha, solvent naphtha, etc. may be mentioned.

  In the photosensitive resin composition of the present invention, an epoxy resin curing agent can be used in combination for the purpose of further improving various properties such as heat resistance, adhesion and chemical resistance of the final cured film.

  Specific examples of such epoxy resin curing agents include, for example, 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 2-phenylimidazole and 2-phenyl-4-methyl Imidazole derivatives such as -5-hydroxymethyl imidazole: guanamines such as acetoguanamine and benzoguanamine: diaminodiphenylmethane, m-phenylenediamine, m-xylenediamine, diaminodiphenylsulfone, dicyandiamide, urea, urea derivative, melamine, polybasic hydrazide and the like Polyamines of these: Organic acid salts and / or epoxy adducts of these: Amine complexes of boron trifluoride: Ethyldiamino-S-triazine, 2,4-diamino-S-triazine, 2,4-diamino-6-xylyl- S Triazine derivatives such as triazine: trimethylamine, N, N-dimethyloctylamine, N-benzyldimethylamine, pyridine, N-methylmorpholine, hexa (N-methyl) melamine, 2,4,6-tris (dimethylaminophenol) Tertiary amines such as tetramethylguanidine and m-aminophenol: Polyphenols such as polyvinylphenol, polyvinylphenol bromide, phenol novolac and alkylphenol novolac: Organics such as tributylphosphine, triphenylphosphine and tris-2-cyanoethylphosphine Phosphines: Phosphonium salts such as tri-n-butyl (2,5-dihydroxyphenyl) phosphonium bromide, hexadecyl tributyl phosnium chloride, etc .: Benzyl trimethyl Quaternary ammonium salts such as ammonium chloride, phenyltributyl ammonium chloride and the like: unsaturated group-containing polybasic acid anhydrides as described above: diphenyliodonium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, 2,4,6-triphenylthiopyri And lithium hexafluorophosphate.

  The epoxy resin curing agent is used singly or in combination of two or more, and the amount of the epoxy resin curing agent contained in the photocurable resin composition is preferably 0.01% in 100% by mass of the photosensitive resin composition. It is preferably used in an amount of 20 to 20% by mass, more preferably 0.1 to 10% by mass.

  Further, in the photosensitive resin composition of the present invention, if necessary, (I) cyanamide compounds such as dicyandiamide or (J) triazine compounds such as melamine may be used. These can be obtained by uniformly kneading and mixing the blended components with a roll mill, bead mill or the like.

<Method of producing photosensitive element>
The photosensitive element of the present invention can be produced, for example, as follows. That is, the obtained photosensitive resin composition is prepared as a coating solution having a solid content of about 30 to 60% by mass, and the coating solution is coated on a support such as a support film to form a coating layer, and the coating is performed. The photosensitive element of the present invention can be produced by drying the layer to form a photosensitive layer.
The application of the coating solution onto the support can be carried out by a known method of, for example, a roll coater, a comma coater, a gravure coater, an air knife coater, a die coater or a bar coater.

  The drying of the coating layer is not particularly limited as long as at least a part of the organic solvent can be removed from the coating layer. For example, it is preferable to carry out at 70 to 150 ° C. for about 5 to 30 minutes. After drying, the amount of the residual organic solvent in the photosensitive layer is preferably 2% by mass or less from the viewpoint of preventing the diffusion of the organic solvent in the subsequent steps.

  The thickness of the photosensitive layer in the photosensitive element can be appropriately selected depending on the application, but the thickness after drying is preferably 1 to 100 μm, more preferably 1 to 50 μm, and 5 to 40 μm. Is more preferred. By the thickness of a photosensitive layer being 1 micrometer or more, industrial coating becomes easy and productivity improves. Further, by being 100 μm or less, adhesion and resolution are improved.

  The form of the photosensitive element is not particularly limited. For example, it may be in the form of a sheet, or may be in the form of a roll wound around a core.

When winding up in a roll, it is preferable to wind up so that a support such as a support film is on the outside. Examples of the core include plastics such as polyethylene resin, polypropylene resin, polystyrene resin, polyvinyl chloride resin, ABS resin (acrylonitrile-butadiene-styrene copolymer), and the like. From the viewpoint of end face protection, it is preferable to place an end face separator on the end face of the roll-shaped photosensitive element roll thus obtained, and it is preferable to place a moisture-proof end face separator from the viewpoint of edge fusion resistance. Moreover, as a packing method, it is preferable to wrap and package in a black sheet with small moisture permeability.
The photosensitive element of the present invention can be suitably used, for example, in a method of manufacturing an insulating layer by a photo via method described later and a method of manufacturing a printed wiring board. Above all, it is suitable for application to a method of manufacturing a printed wiring board in which a circuit is formed on a conductor layer by plating.

<Method of manufacturing printed wiring board by photo via method>
An example of the manufacturing method of the insulating layer using the photosensitive resin of this invention is shown below. The present invention is not limited to the following method.

Although it is a semi-additive construction method by the photo beer method, for example, it comprises the following steps.
(1) Insulating layer formation process After forming a photosensitive element on a conductor circuit by vacuum press lamination, via processing for interlayer connection is performed by exposure and development, and then curing of the resin by post UV curing and thermal curing A process to be performed.
(2) Step of surface roughening by desmear treatment and formation of copper circuit layer After roughening of the resin surface by desmear treatment, a step of subjecting the substrate to electroless copper plating. Furthermore, after that, after forming a pattern with dry film resist on electroless copper plating, the process of forming a copper circuit layer by performing electrolytic copper plating.
(3) Step of Resist Peeling and Forming of Copper Circuit Finally, a step of peeling a dry film resist and forming a copper circuit by removing the electroless plating layer by flash etching.

Hereinafter, the steps (1) to (3) will be described.
(1) Step of Forming Insulating Layer In the step of forming the insulating layer, the photosensitive element is pressure-bonded by a known vacuum press laminating method. After removing the protective film from the photosensitive element of the present invention, the photosensitive layer of the photosensitive element is pressure-bonded to the substrate while being heated under reduced pressure. The heating of the photosensitive layer and / or the substrate during pressure bonding is preferably performed at a temperature of 70 to 130 ° C. The pressure bonding is preferably performed at a pressure of about 0.1 to 1.0 MPa (about 1 to 10 kgf / cm ² ), but these conditions are appropriately selected as necessary.

  In the exposure and development steps, at least a part of the photosensitive layer formed on the substrate is irradiated with an actinic ray, so that the part irradiated with the actinic ray is photocured to form a pattern.

  There is no restriction | limiting in particular as an exposure method, For example, the method (mask exposure method) which irradiates an actinic ray in the shape of an image through the negative or positive mask pattern called artwork is mentioned. Alternatively, a method may be employed in which actinic rays are imagewise irradiated by a direct drawing exposure method such as a laser direct imaging (LDI) exposure method or a digital light processing (DLP) exposure method.

As a light source of actinic light, known light sources can be used. For example, gas lasers such as carbon arc lamps, mercury vapor arc lamps, high pressure mercury lamps, xenon lamps and argon lasers, solid lasers such as YAG lasers, semiconductor lasers, etc. Those that effectively emit ultraviolet light and visible light are used. The exposure dose is appropriately selected depending on the light source used and the thickness of the photosensitive layer, etc. For example, in the case of ultraviolet irradiation from a high pressure mercury lamp, the thickness of the photosensitive layer is usually about 10 to 1000 J / m ² at 1 to 100 μm. 15 to 500 J / m ² is more preferable.

  In development, an uncured portion of the photosensitive layer is removed from the substrate, whereby an insulating layer made of a photocured cured material is formed on the substrate.

  In the case where a support such as a support film is present on the photosensitive layer, the support film is removed, and then removal (development) of the unexposed portion other than the exposed portion is performed. There are wet development and dry development as a developing method, but wet development is widely used.

  In the case of wet development, development is performed by a known development method using a developer corresponding to the photosensitive resin composition. As the development method, methods using dip method, battle method, spray method, brushing, slapping, scraping, swing immersion and the like can be mentioned, and from the viewpoint of improvement of resolution, the high pressure spray method is most suitable. The development may be carried out by combining these two or more methods.

  The configuration of the developer is appropriately selected according to the configuration of the photosensitive resin composition. For example, an alkaline aqueous solution, an aqueous developer and an organic solvent developer can be mentioned.

In the present invention, after the unexposed area is removed in the development step, a post UV curing of about 0.2 to 10 J / cm ² and heating at about 60 to 250 ° C. are performed as necessary to further increase the insulating layer. It may be cured.

(2) Surface Roughening by Desmear Treatment and Forming Step of Copper Circuit Layer The resin surface can be roughened by desmear treatment, if necessary. Examples of the desmear treatment solution (oxidizing roughening solution) include chromium / sulfuric acid roughening solution, alkali permanganic acid roughening solution (sodium permanganate roughening solution, etc.), sodium fluoride / chromium / sulfuric acid roughening solution Etc. can be used.

  After desmearing, circuit formation and via conduction are performed by a semi-additive process. In the semi-additive process, first, the seed layer is formed by performing electroless copper treatment using a palladium catalyst or the like on the bottom of the via after desmearing, the wall of the via, and the entire surface of the insulating layer. The electroless copper plating of the seed layer is for forming a feeding layer for performing electrolytic copper plating, and is usually formed to a thickness of about 0.1 to 2.0 μm. If the seed layer is too thin, the connection reliability during subsequent electroplating tends to decrease, and if the seed layer is too thick, the amount of etching for subsequent flash etching of the seed layer between the interconnections must be increased. There is a tendency for the damage given to the wiring to increase.

  The electroless copper treatment is carried out by the deposition of metallic copper on the resin surface by the reaction of copper ions and a reducing agent. The electroless plating and the electrolytic plating may be any known method, and the method is not limited to a specific method, but the catalyst of the electroless plating treatment step comprises a palladium-tin mixed catalyst, and the primary particle diameter of the catalyst is It is preferable that it is 10 nm or less. Moreover, it is preferable that the plating composition of an electroless-plating process process contains hypophosphorous acid as a reducing agent.

As electroless copper plating, "MSK-DK" manufactured by Atotech Japan Co., Ltd., "Sul cup PEA ver. 4" manufactured by Uemura Kogyo Co., Ltd., etc. may be mentioned.
After the electroless copper plating treatment, a dry film resist is thermocompression-bonded onto the electroless copper plating by a roll laminator. The thickness of the dry film resist should be in a range higher than the wiring height after copper electroplating, and one having a thickness of 5 to 30 μm is preferably used.

  As the dry film resist, "FOTEC" series manufactured by Hitachi Chemical Co., Ltd. or the like is used. After dry film resist formation, the dry film resist is exposed through a mask on which the wiring pattern is drawn. It is also possible to carry out the exposure with the same device as the photosensitive element, a light source. After exposure, the support film is peeled off, development is performed using an aqueous alkaline solution, and the unexposed area is removed to form a pattern. After this, an operation of removing the development residue of the dry film resist may be performed using plasma or the like as necessary. After development, copper electroplating is performed to form a copper circuit layer and via filling.

(3) Step of Resist Peeling and Forming of Copper Circuit After copper electroplating, the dry film resist is stripped using an alkaline aqueous solution or an amine-based release agent. After the dry film resist is peeled off, flash etching is performed to remove the seed layer between the interconnections. Flash etch is performed using an acidic, oxidizing solution such as sulfuric acid and hydrogen peroxide. Specifically, "SAC" manufactured by Ebara Eugelight Co., Ltd. and "CPE-800" manufactured by Mitsubishi Gas Chemical Co., Ltd. may be mentioned. After the flash etching, palladium and the like attached to portions between the wires are removed as needed. The removal of palladium is preferably carried out using an acidic solution such as nitric acid or hydrochloric acid. Specifically, Ebara Eugerite "PJ" solution is mentioned.

  After dry film resist stripping or after a flash etch process, a post bake process is performed. The post-baking process completely thermosettings the unreacted thermosetting component, thereby further improving the insulation reliability, the curing characteristics and the plating adhesion. Although the heat curing conditions vary depending on the type of the resin composition and the like, it is preferable that the curing temperature is 150 to 240 ° C. and the curing time is 15 to 100 minutes.

  The post-baking completes the manufacturing process of the printed wiring board by a single photo via method, but the process is repeated to manufacture a substrate according to the number of required insulating layers. Also, a solder resist layer is formed on the outermost layer.

  Thus, although the photosensitive resin composition of this invention can be used for manufacture of a printed wiring board, it is not limited to it, It is used for the manufacturing process of wafer processes, such as FOWLP (Fan Out Wafer Level Package) etc. You may use it.

  Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples. In addition, the compounding quantity in a part in an Example, and a table | surface shows a mass part in a synthesis example.

Synthesis Example 1 Synthesis of Acid-Modified Epoxy Acrylate
Charge 350 parts by mass of bisphenol F novolac epoxy resin (EXA-7376, manufactured by DIC Corporation), 70 parts by mass of acrylic acid, 0.5 parts by mass of methyl hydroquinone, and 120 parts by mass of carbitol acetate, and heat to 90 ° C. and stir The reaction was carried out to completely dissolve the mixture. Next, the obtained solution was cooled to 60 ° C., 2 parts by mass of triphenylphosphine was added, and the mixture was heated to 100 ° C. until the acid value of the solution became 1 mg KOH / g. To the solution after reaction, 98 parts by mass of tetrahydrophthalic anhydride (THPAC) and 85 parts by mass of carbitol acetate are added, heated to 80 ° C. for reaction for about 6 hours, and cooled. A solution of acid-modified epoxy acrylate resin (A-1) as component (A) which is% was obtained.

  About Examples 1-3 and the reference examples 1-3, it mixed by the total amount (mass part) shown in following Table 1, and knead | mixed with 3 roll mills, and obtained the photosensitive resin composition solution. Finally, propylene glycol monomethyl ether acetate was added to adjust the solid content concentration to 60% by mass, to prepare a photosensitive resin composition.

  Next, the photosensitive resin composition layer is applied as a photosensitive resin composition layer by uniformly applying the prepared photosensitive resin composition solution on a 25 μm thick polyethylene terephthalate film (G2-25 manufactured by Teijin Limited, a trade name) as a support layer. Film was dried at 100.degree. C. for about 10 minutes using a hot air convection dryer. The film thickness after drying of the photosensitive resin composition layer was 25 μm.

  Subsequently, on the surface of the photosensitive resin composition layer opposite to the side in contact with the support, an OPP biaxially stretched polypropylene film (MA-411, manufactured by Oji Specialty Paper Co., Ltd., trade name) is used as a protective film. The laminated photosensitive element was obtained.

Ａ−２：カヤラッドＤＰＨＡ：ジペンタエリスリトールペンタアクリレート（日本化薬株式会社製、商品名）
Ｂ−１：イルガキュアＯＸＥ０２：エタノン，１−［９−エチル−６−（２−メチルベンゾイル）−９Ｈ−カルバゾール−３−イル］−，１−（ｏ−アセチルオキシム））（ＢＡＳＦジャパン株式会社製、商品名）
Ｂ−２：イルガキュア９０７：２−メチル−［４−（メチルチオ）フェニル］モルフォリノ−１−プロパノン（ＢＡＳＦジャパン株式会社製、商品名）
Ｂ−３：ＤＥＴＸ−Ｓ：２，４−ジエチルチオキサントン（日本化薬株式会社製、商品名）
Ｃ−１：ＮＣ−３０００Ｈ：ビフェニルアラルキルエポキシ樹脂（日本化薬株式会社製、商品名）
Ｃ−２：エピコート８２８：ビスフェノールＡ型エポキシ樹脂（三菱化学株式会社製、商品名）
Ｃ−３：ＰＢ３６００：エポキシ化ポリブタジエン（ダイセル化学株式会社製、商品名）
Ｄ−１：ＢＭＩ−４０００：ビスマレイミド（大和化成工業株式会社製、商品名）
Ｅ−１：ＬＡ−７０５２：メラミン変性ノボラック型フェノール樹脂（ＤＩＣ株式会社製、商品名）
Ｆ−１：パーヘキシン２５Ｂ：２，５−ジメチル−２，５−ビス（ｔｅｒｔ−ブチルペルオキシ）−３−ヘキシン（日本油脂株式会社製、商品名）
Ｇ−１：ＭＥＫスラリー：シリカスラリー（株式会社アドマテックス製、サンプル名）

A-2: Kayarad DPHA: dipentaerythritol pentaacrylate (manufactured by Nippon Kayaku Co., Ltd., trade name)
B-1: Irgacure OXE02: Ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (o-acetyloxime) (manufactured by BASF Japan Ltd.) ,Product name)
B-2: Irgacure 907: 2-Methyl- [4- (methylthio) phenyl] morpholino-1-propanone (manufactured by BASF Japan Ltd., trade name)
B-3: DETX-S: 2,4-diethylthioxanthone (manufactured by Nippon Kayaku Co., Ltd., trade name)
C-1: NC-3000H: biphenyl aralkyl epoxy resin (manufactured by Nippon Kayaku Co., Ltd., trade name)
C-2: Epicoat 828: Bisphenol A epoxy resin (Mitsubishi Chemical Corporation, trade name)
C-3: PB3600: Epoxidized polybutadiene (made by Daicel Chemical Industries, Ltd., trade name)
D-1: BMI-4000: bismaleimide (Daiwa Kasei Kogyo Co., Ltd., trade name)
E-1: LA-7052: Melamine modified novolac type phenol resin (made by DIC Corporation, trade name)
F-1: perhexine 25B: 2,5-dimethyl-2,5-bis (tert-butylperoxy) -3-hexyne (manufactured by NOF Corp., trade name)
G-1: MEK slurry: silica slurry (made by Admatex Co., Ltd., sample name)

[Evaluation of resolution]
Pretreatment liquid CZ-8100 (MEC Corporation) for roughening the copper surface of a printed wiring board substrate (MCL-E-679, manufactured by Hitachi Chemical Co., Ltd., trade name) in which a copper foil of 12 μm thickness is laminated on a glass epoxy substrate ), Washed with water, and dried. Using a press-type vacuum laminator (MVLP-500, manufactured by Meishin Machinery Co., Ltd., trade name) on this printed wiring board substrate, the hot plate temperature at 70 ° C., the evacuation time 20 seconds, the lamination press time 30 seconds, The protective film of the photosensitive element was peeled off and laminated under the conditions of an atmospheric pressure of 4 kPa or less and a pressure bonding pressure of 0.4 MPa to obtain a laminate for evaluation.

  Then, after standing at room temperature for 1 hour or more, the support film is peeled off and removed, a 41-step step tablet is installed, and a direct imaging exposure apparatus DXP-3512 (manufactured by Oak Manufacturing Co., Ltd.) using a super high pressure mercury lamp as a light source. Exposure was performed using. The exposure pattern used was a pattern in which dots having a diameter of 30 to 100 μm were arranged in a grid.

After exposure, the film was left at room temperature for 30 minutes, and then the photosensitive resin composition in the unexposed area was spray developed with a 1% by mass aqueous sodium carbonate solution at 30 ° C. for 60 seconds. After development, the amount of exposure energy at which the number of gloss-remaining steps of the 41-step tablet becomes 10.0 was taken as the sensitivity (unit: mJ / cm ² ) of the photosensitive resin composition layer. The photosensitive resin composition layer was evaluated using the pattern exposed at this sensitivity.

  The evaluation of resolution was performed by performing exposure and spray development with an exposure energy amount such that the number of steps is 10.0, and after development, observing and evaluating a via pattern using an optical microscope. The case where the via (dot diameter 60 μm part) of the dot pattern was opened was determined as “A”, and the case where it was not opened as “B”. The determination of "A" in which the via opening is open shows a good characteristic. The results are shown in Table 2 below.

[Light sensitivity]
The copper surface of a copper-clad laminate (MCL-E-67, manufactured by Hitachi Chemical Co., Ltd.) in which a copper foil of 12 μm thickness is laminated on a glass epoxy substrate is treated with a roughening pretreatment solution CZ-8100 (manufactured by Mec Co., Ltd.) After washing with water, it was dried. Using a press-type vacuum laminator (MVLP-500, manufactured by Meishin Machinery Co., Ltd., trade name) on this printed wiring board substrate, the hot plate temperature at 70 ° C., the evacuation time 20 seconds, the lamination press time 30 seconds, The protective film of the photosensitive element was peeled off and laminated under the conditions of an atmospheric pressure of 4 kPa or less and a pressure bonding pressure of 0.4 MPa to obtain a laminate for evaluation.

On the surface of the laminate obtained in this manner, the concentration range 0.00 to 2.00, the concentration step 0.05, the size of the tablet (rectangle) is 20 mm × 187 mm, and the size of each step (rectangle) A phototool (made by Stoffer) having a 41-step step tablet of 3 mm × 12 mm is brought into close contact, irradiated with ultraviolet light with an accumulated exposure amount of 100 mJ / cm ² , and developed for 60 seconds with a 1% by mass aqueous sodium carbonate solution The number of remaining step steps was evaluated as sensitivity. The higher the number of remaining step steps, the higher the sensitivity, and it is preferable that eight or more steps remain. The results are shown in Table 2 below.

[Evaluation of peel strength]
Pretreatment liquid CZ-8100 (MEC Corporation) for roughening the copper surface of a printed wiring board substrate (MCL-E-679, manufactured by Hitachi Chemical Co., Ltd., trade name) in which a copper foil of 12 μm thickness is laminated on a glass epoxy substrate ), Washed with water, and dried. Using a press-type vacuum laminator (MVLP-500, manufactured by Meishin Machinery Co., Ltd., trade name) on this printed wiring board substrate, the hot plate temperature at 70 ° C., the evacuation time 20 seconds, the lamination press time 30 seconds, The protective film of the photosensitive element was peeled off and laminated under the conditions of an atmospheric pressure of 4 kPa or less and a pressure bonding pressure of 0.4 MPa to obtain a laminate for evaluation.

  Then, after standing at room temperature for 1 hour or more, the support film is peeled off and removed, a 41-step step tablet is installed, and a parallel light exposure machine EXM-1201 (manufactured by Oak Manufacturing Co., Ltd.) using a super high pressure mercury lamp as a light source. The entire surface exposure was performed using an exposure energy amount such that the number of steps of gloss remaining was 10.0. After exposure, it was left at room temperature for 30 minutes, and then the photosensitive resin composition in the unexposed area was spray developed for 60 seconds with a 1% by mass aqueous sodium carbonate solution at 30 ° C.

Thereafter, post UV curing is performed at a conveyor speed of ² J / cm ² with a high pressure mercury lamp lamp irradiation type UV conveyor device (manufactured by Oak Manufacturing Co., Ltd.), and then, using a hot air circulating dryer (manufactured by Futaba Science Co., Ltd.) A post heat cure of 170 ° C./1 hour was performed.

  As roughening treatment of the substrate, swelling liquid "Swelling Dip Security Gant P" (manufactured by Atotech Japan Co., Ltd.) at 70 ° C. for 5 minutes, and roughening liquid "Doses Security Gant P 500 J" (manufactured by Atotech Japan Co., Ltd.) 70 A desmearing process was performed using a neutralization solution "Reduction Conditioner Security Gantage P500" (manufactured by Atotech Japan Co., Ltd.) at 40 ° C for 5 minutes for 10 minutes.

After this, electroless plating solution "Puriganto MSK-DK" (manufactured by Atotech Japan Co., Ltd.) at 30 ° C for 20 minutes, and electroplating solution "Copalasid HL" (manufactured by Atotech Japan Co., Ltd.) at 2 A / dm ² conditions. And 24 ° C. for 2 hours to prepare an evaluation substrate for peel measurement.

  The measurement of plating peel strength set the plating copper thickness to 35 micrometers thickness, and measured the conductor tearing-off strength of the evaluation sample. The peel was measured for the vertical peel strength. The measurement was performed at room temperature 23 ° C. The measuring method conformed to JIS-C-6481. The peel strength was determined to be good if it was 0.4 kN / m or more. The results are shown in Table 2 below.

[Evaluation of HAST resistance]
A substrate for printed wiring board (MCL-E-679FG, manufactured by Hitachi Chemical Co., Ltd., trade name) in which a copper foil of 12 μm thickness is laminated on a core material on a glass epoxy substrate, a buildup material for forming semiadd wiring (AS-Z6, A comb-shaped electrode having a line / space of 12 μm / 12 μm was manufactured using Hitachi Chemical Co., Ltd., trade name), and this was used as an evaluation substrate.

An insulating layer consisting of the cured product of the photosensitive element is formed on the comb-like electrode on this evaluation substrate in the same manner as in the above-mentioned “resolution evaluation” (exposure is performed so that the insulating layer remains on the comb-like electrode portion) (UV irradiation, heat treatment and formation), followed by exposure to 130 ° C., 85% RH, 6 V for 200 hours. Thereafter, the resistance value was measured to evaluate the HAST resistance of the insulating layer. The time when the resistance value is 10 ^-6 Ω or less is taken as the occurrence time of migration, and after 200 hours, one without occurrence of migration is “A”, one after 100 hours to 200 hours with “B The thing which generate | occur | produced in less than 100 hours was determined as "C." The results are shown in Table 2 below.

  As apparent from the results shown in Table 2, the photosensitive resin compositions of the present invention of Examples 1 to 3 have excellent resolution and excellent properties with the conductor layer formed on the insulating layer. It was confirmed to have peel strength and, in addition, to have excellent insulation reliability (HAST resistance). Furthermore, by using the compound which has (B1) oxime ester structure as (B) photoinitiator, sufficient photoreaction characteristic was obtained and the sensitivity improvement was able to be aimed at compared with the reference examples 1-3.

  According to the present invention, a photosensitive resin composition suitable for forming an insulating layer such as a multilayer printed wiring board excellent in high sensitivity, resolution, adhesion, and insulation reliability, and photosensitivity comprising the photosensitive resin composition Sex elements can be provided. Moreover, it is useful to formation of the insulating layer of the printed wiring board for electronic devices. Furthermore, it is effectively used for the formation of the insulating layer of FOWLP (Fan Out Wan Out Wafer Package).

Claims (13)

  (A) A photopolymerizable compound having an ethylenically unsaturated group, (B) a photopolymerization initiator, (C) an epoxy resin, (D) a polyfunctional maleimide compound, and (E) a melamine-modified novolac phenol resin Photosensitive resin composition.   The photosensitive resin composition according to claim 1, wherein the (B) photopolymerization initiator comprises a photopolymerization initiator of a compound having a (B1) oxime ester structure. The photosensitive resin composition according to claim 2, wherein the compound having the oxime ester structure (B1) is a compound having a structure represented by the following general formula (1).

(Wherein, R ₁ represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, or a substituted or unsubstituted phenyl group. R ₂ represents a substituted or unsubstituted fluorenyl group or R ₃ represents a substituted or unsubstituted carbazolyl group, R ₃ represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, a phenyl group or a tolyl group. )   The photocurable compound according to any one of claims 1 to 3, wherein the photopolymerizable compound (A) having an ethylenically unsaturated group is an acid-modified epoxy acrylate compound having a carboxyl group in the molecule. Resin composition.   An epoxidized polybutadiene is contained as one of said (C) epoxy resins, The photosensitive resin composition as described in any one of Claims 1-4 characterized by the above-mentioned.   The photosensitive resin composition according to any one of claims 1 to 5, further comprising (F) an organic peroxide having a one-hour half-life temperature of 100 to 180 ° C.   A photosensitive element comprising: a support; and a photosensitive layer formed using the photosensitive resin composition according to any one of claims 1 to 6 on the support.   The photosensitive resin composition as described in any one of Claims 1-6 used for formation of the insulating layer of the multilayer printed wiring board which has a conductor layer formed on the insulating layer.   The photosensitive element according to claim 7, which is used for forming an insulating layer of a multilayer printed wiring board having a conductor layer formed on the insulating layer.   The photosensitive resin composition according to claim 8, which is used for forming an insulating layer of a multilayer printed wiring board having a wiring formed on a resist by a copper plating process after being treated with an alkaline permanganate etching solution (desmear solution). object.   The photosensitive element according to claim 9, which is used for forming an insulating layer of a multilayer printed wiring board having a wiring formed on a resist by a copper plating process after being treated with an alkaline permanganate etching solution (desmear solution).   The printed wiring board provided with the insulating layer which consists of a photosensitive resin composition as described in any one of Claims 1-6.   The manufacturing method of a printed wiring board provided with the insulating layer formed using the photosensitive resin composition as described in any one of Claims 1-6, or the photosensitive element as described in Claim 7.