JP2010041059A - 塗布、現像装置 - Google Patents

塗布、現像装置 Download PDF

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Publication number
JP2010041059A
JP2010041059A JP2009211791A JP2009211791A JP2010041059A JP 2010041059 A JP2010041059 A JP 2010041059A JP 2009211791 A JP2009211791 A JP 2009211791A JP 2009211791 A JP2009211791 A JP 2009211791A JP 2010041059 A JP2010041059 A JP 2010041059A
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Japan
Prior art keywords
unit
block
processing
substrate
coating
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Pending
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JP2009211791A
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English (en)
Japanese (ja)
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JP2010041059A5 (enExample
Inventor
Masami Akumoto
正巳 飽本
Shinichi Hayashi
伸一 林
Yasushi Hayashida
林田　　安
Nobuaki Matsuoka
伸明 松岡
Yoshio Kimura
義雄 木村
Kazunari Ueda
一成 上田
Akira Ito
晃 伊東
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2009211791A priority Critical patent/JP2010041059A/ja
Publication of JP2010041059A publication Critical patent/JP2010041059A/ja
Publication of JP2010041059A5 publication Critical patent/JP2010041059A5/ja
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009211791A 2009-09-14 2009-09-14 塗布、現像装置 Pending JP2010041059A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009211791A JP2010041059A (ja) 2009-09-14 2009-09-14 塗布、現像装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009211791A JP2010041059A (ja) 2009-09-14 2009-09-14 塗布、現像装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2005025509A Division JP4459831B2 (ja) 2005-02-01 2005-02-01 塗布、現像装置

Publications (2)

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JP2010041059A true JP2010041059A (ja) 2010-02-18
JP2010041059A5 JP2010041059A5 (enExample) 2010-11-18

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ID=42013200

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JP2009211791A Pending JP2010041059A (ja) 2009-09-14 2009-09-14 塗布、現像装置

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JP (1) JP2010041059A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012054472A (ja) * 2010-09-02 2012-03-15 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
JP2013236110A (ja) * 2013-08-13 2013-11-21 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
JP2013236109A (ja) * 2013-08-13 2013-11-21 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
JP2013243406A (ja) * 2013-08-13 2013-12-05 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
CN110943018A (zh) * 2018-09-21 2020-03-31 株式会社斯库林集团 衬底处理装置及衬底处理方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05178416A (ja) * 1991-11-05 1993-07-20 Tokyo Electron Ltd 板状体の処理装置及び搬送装置
JP2002252156A (ja) * 2001-02-22 2002-09-06 Tokyo Electron Ltd 処理装置
JP2004015023A (ja) * 2002-06-11 2004-01-15 Dainippon Screen Mfg Co Ltd 基板処理装置およびその方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05178416A (ja) * 1991-11-05 1993-07-20 Tokyo Electron Ltd 板状体の処理装置及び搬送装置
JP2002252156A (ja) * 2001-02-22 2002-09-06 Tokyo Electron Ltd 処理装置
JP2004015023A (ja) * 2002-06-11 2004-01-15 Dainippon Screen Mfg Co Ltd 基板処理装置およびその方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012054472A (ja) * 2010-09-02 2012-03-15 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
JP2013236110A (ja) * 2013-08-13 2013-11-21 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
JP2013236109A (ja) * 2013-08-13 2013-11-21 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
JP2013243406A (ja) * 2013-08-13 2013-12-05 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
CN110943018A (zh) * 2018-09-21 2020-03-31 株式会社斯库林集团 衬底处理装置及衬底处理方法

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