JP2010012443A - Ultrasonic wave treating device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To shorten processing time, reduce a size, reduce an operation cost and save energy by raising the utilization efficiency of ultrasonic waves. <P>SOLUTION: A rod shaped ultrasonic irradiator 3 is coaxially arranged in the center part of a straight pipe part 21 of a casing 2 where a fluid to be treated is circulated, and a plurality of resistances 41, 42 are arranged which generate turbulence for agitating the fluid in a gap between the ultrasonic wave radiation body and the straight pipe part 21. The plurality of resistance bodies are projected in a plate shape toward the center part from the outer peripheral side together, are arranged at predetermined intervals in an axial direction not to be into contact with each other in the tilted states to the downstream side and are arranged in such a way successively to shift predetermined angles in the circumference direction. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an ultrasonic processing apparatus that performs required processing by irradiating a fluid with ultrasonic waves.

2. Description of the Related Art There are various types of ultrasonic processing apparatuses that perform required processing by irradiating a fluid with ultrasonic waves. For example, a configuration in which ultrasonic waves are irradiated from the outside of a container that stores the fluid to be processed (see Patent Document 1), a configuration in which ultrasonic waves are irradiated from the outside of a pipe through which the fluid to be processed flows (see Patent Documents 2 and 3), A configuration in which an ultrasonic radiator is disposed inside a container for storing a fluid to be processed (see Patent Documents 4 and 5), and a structure in which ultrasonic waves are irradiated from the outside of a static mixer (see Patent Documents 6 and 7). Things are known.
JP 2008-012233 A JP-A-10-216507 JP 2005-199253 A JP 2008-036586 A JP 2003-200042 A JP 2004-195403 A JP 2007-330894 A

  However, in the configuration in which ultrasonic waves are irradiated from the outside of the container for storing the fluid to be processed as described above or from the outside of the tube through which the fluid to be processed flows, the loss of ultrasonic waves is large and the utilization efficiency of the ultrasonic waves is reduced. As a result, there is a problem that the operating cost increases. In addition, the configuration in which the ultrasonic radiator is disposed inside the container for storing the fluid to be treated is advantageous in reducing the loss of ultrasonic waves. Depending on the distance, the ultrasonic irradiation becomes uneven, so if you want to secure a sufficient irradiation amount at a position away from the ultrasonic radiator, the ultrasonic wave is irradiated more than necessary near the ultrasonic radiator. As a result, there arises a problem that the use efficiency of ultrasonic waves cannot be sufficiently improved.

  On the other hand, the method of irradiating ultrasonic waves from the outside of the static mixer is effective in making the ultrasonic irradiation uniform because the fluid is stirred by the internal resistor. Due to the loss of sound waves, there is a problem that the utilization efficiency of ultrasonic waves is lowered. On the other hand, a configuration in which an ultrasonic radiator is disposed inside the static mixer is conceivable, but in this case, it is necessary to configure so that the stirring function by the resistor is not impaired. It is desired to configure the ultrasonic radiator so that the use efficiency of ultrasonic waves can be improved.

  The present invention has been devised based on such inventor's knowledge, and its main purpose is to increase the use efficiency of ultrasonic waves, shorten the processing time, reduce the size of the apparatus, and reduce the operating cost. Another object of the present invention is to provide an ultrasonic processing apparatus configured to save energy.

  In order to solve such a problem, in the ultrasonic processing apparatus according to the present invention, a rod-shaped ultrasonic radiator is coaxially arranged at the center of a pipe through which a fluid to be processed flows, and this ultrasonic wave A plurality of resistors for generating a turbulent flow for stirring the fluid are disposed in a gap between the radiator and the pipe, and the plurality of resistors are formed in a plate shape from the outer peripheral side toward the center. The protrusions are provided so as not to contact each other while being inclined toward the downstream side, with a predetermined interval in the axial direction and sequentially shifted by a predetermined angle in the circumferential direction.

  According to the present invention, the ultrasonic radiator is arranged inside the static mixer, and the ultrasonic radiator is ultrasonically applied to the fluid flowing through the gap between the ultrasonic radiator and the pipe. At this time, the fluid is stirred by turbulent flow generated by a plurality of resistors. For this reason, since the loss of ultrasonic waves is small and it is possible to irradiate the ultrasonic waves uniformly to the fluid, the use efficiency of ultrasonic waves can be improved, the processing time is shortened, the apparatus is downsized and the operation is performed. Cost reduction and energy saving can be achieved.

  In addition, the stirrer function by the resistor is not impaired, and the resistor that is inclined toward the downstream side guides the fluid toward the ultrasonic radiator in the center, so that the fluid can be uniformly distributed in the vicinity of the ultrasonic radiator. As a result, the use efficiency of ultrasonic waves can be greatly improved. This is particularly effective when high-frequency ultrasonic waves that are easily attenuated are used, or when a gas that significantly attenuates the ultrasonic waves is included, that is, when a gas-liquid mixed state is established due to gas absorption or the like. It is also effective in the case of a liquid with low fluidity (for example, biological sludge).

  Furthermore, it is possible to secure a sufficiently large gap between the resistors in a simple form in which the resistors are inclined from the inner peripheral surface of the cylindrical body while being inclined to the downstream side so as not to oppose the flow. Therefore, it is difficult to cause clogging, and a liquid (for example, biological sludge) mixed with fibers or solids can be treated.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is a cross-sectional view showing an ultrasonic processing apparatus according to the present invention. The ultrasonic processing apparatus 1 includes a casing 2 through which a fluid to be processed flows, an ultrasonic radiator 3 that irradiates the fluid flowing through the casing 2 with ultrasonic waves, and a fluid that flows through the casing 2. And a plurality of resistor elements 4 including resistors 41 and 42 that generate turbulent flow for stirring.

  The casing 2 includes a straight pipe portion (pipe) 21 having a circular cross section, an introduction pipe portion 22 branched from the straight pipe portion 21 in a T shape, and flange portions 23 and 24 provided at both ends of the straight pipe portion 21. The fluid to be processed is introduced from the inlet portion 25 of the introduction pipe portion 22 and is recovered from the outlet portion 26 through the straight pipe portion 21.

  The introduction pipe section 22 is provided with an injection pipe 27. This injection pipe 27 is used for stirring and mixing a plurality of types of fluids (gas absorption and addition of additives) in parallel with the ultrasonic treatment. For example, in the gas absorption process, the raw material liquid is introduced from the inlet 25 while the raw material gas is injected from the injection pipe 27. In addition, when not stirring and mixing such a plurality of types of fluids, the injection tube 27 is not necessary and can be omitted.

  The straight pipe portion 21 of the casing 2 is coaxially arranged with a straight rod-like ultrasonic radiator 3 at the center thereof, and a base portion 31 that supports the ultrasonic radiator 3 in a cantilever state is provided as an introduction pipe. It is fixed to an end plate 28 joined to a flange portion 24 adjacent to the portion 22 in such a manner as to close the opening of the straight pipe portion 21.

  An ultrasonic transducer (piezoelectric element) serving as an oscillation source of the ultrasonic radiator 3 is disposed in the base unit 31, and this ultrasonic transducer is a controller (oscillator) so as to generate ultrasonic waves having a required frequency. 32.

  The resistor element 4 is inserted into the straight pipe portion 21 of the casing 2, and is first from the mutually opposing inner peripheral surfaces of the cylindrical body 43 having a circular cross section having an outer diameter corresponding to the inner diameter of the straight pipe portion 21. The second pair of resistors 41 and 42 are each projected in a plate shape toward the center, and the fluid flowing through the gap between the cylindrical body 43 and the ultrasonic radiator 3 that are continuous in the axial direction is resistant It is stirred by the bodies 41 and 42.

  The resistors 41 and 42 are both arranged in a C shape in such a state that they are inclined toward the downstream side, that is, in a state where the center portion side is located on the downstream side with respect to the outer peripheral side. They are shifted in the axial direction so as to ensure a required interval between the two. The inclination angle of the resistors 41 and 42 with respect to the axis of the straight pipe portion 21 may be appropriately set according to the application, but around 45 ° is appropriate.

  FIG. 2 is a perspective view showing the resistor element shown in FIG. FIG. 3 is a front view of the resistor element shown in FIG. 1 as viewed from the upstream side. FIG. 4 is a front view for explaining the arrangement state of the resistor elements shown in FIG.

  As shown in FIG. 3, the resistors 41 and 42 are formed in a substantially fan-shaped plate shape whose width gradually decreases from the outer peripheral side toward the center. The leading edges of the resistors 41 and 42 are formed in an arc shape along the outer peripheral surface of the ultrasonic radiator 3. In particular, here, the first resistor 41 on the upstream side is formed short and the second resistor 42 on the downstream side is formed long, but both the resistors 41 and 42 may have the same size.

  As shown in FIG. 2, irregularities are formed at the end of the cylindrical body 43 in the axial direction so as to be coupled to the adjacent one while being shifted by 45 degrees in the circumferential direction. Moreover, it can be divided into two divided bodies 43a and 43b in which a pair of resistor bodies 41 and 42 are formed by a dividing line along the axial direction, thereby facilitating manufacture and adhering to the surface. Obstacles can be easily removed.

  As shown in FIG. 4, the resistor element 4 is arranged so as to be shifted in the same direction by 45 degrees with respect to the immediately preceding resistor element 4, and each subsequent resistor element with respect to the most upstream resistor element 4. 4 are angular positions such as 45 degrees, 90 degrees, 135 degrees, 180 degrees, 225 degrees, 270 degrees, and 315 degrees in the circumferential direction. Accordingly, when viewed as a whole, the pair of resistors 41 and 42 are arranged so as to draw a spiral with a lead angle corresponding to the shift angle of the resistor element 4.

  In this ultrasonic processing apparatus 1, ultrasonic waves in a predetermined frequency range are irradiated from the ultrasonic radiator 3 to the fluid flowing through the gap between the ultrasonic radiator 3 and the straight pipe portion 21 of the casing 2. As a result, cavitation occurs in the liquid, and an extremely high pressure state is locally formed by the shock wave generated when the fine bubbles generated at this time collapse, and an extremely high temperature state is locally formed. The reaction is promoted.

  Furthermore, the cavitation caused by ultrasonic waves causes the decomposition of water molecules, which destroys the cell walls of the microorganisms by the chemical oxidation action of the hydroxy radicals generated thereby and the physical destruction action by shock waves. Can be killed.

  Further, in this ultrasonic processing apparatus 1, the fluid is pumped by a pump so as to obtain a required flow velocity and is introduced from the inlet portion 25, and in the resistor element 4, the resistors 41 and 42 have a plate shape. The flow colliding with the resistors 41 and 42 is dispersed in multiple directions around the resistors 41 and 42, and a vortex (wake) due to entrainment occurs on the back side of the resistors 41 and 42. Furthermore, since the resistor element 4 is arranged while being shifted by a predetermined angle in the circumferential direction along the flow direction, and the resistors 41 and 42 are arranged in a spiral shape as a whole, the resistor 41 does not cause a short path. -Colliding with any one of 42, the collision, dispersion and entrainment of the fluid by the resistors 41, 42 are repeated one after another, so that a strong turbulent flow is generated in the straight pipe portion 21, and the fluid is vigorously stirred. The

  As described above, in the ultrasonic processing apparatus 1, the fluid is agitated by the turbulent flow generated by the resistors 41 and 42 simultaneously with the irradiation of the ultrasonic wave by the ultrasonic radiator 3, so that the ultrasonic wave is uniformly irradiated to the fluid. In particular, since the resistors 41 and 42 inclined toward the downstream side guide the fluid toward the ultrasonic radiator 3 at the center, the fluid uniformly passes through the vicinity of the ultrasonic radiator 3. The irradiation efficiency of ultrasonic waves can be greatly improved. This is particularly effective when high-frequency ultrasonic waves with large attenuation are used, or when a gas that attenuates the ultrasonic waves is included, that is, when a gas-liquid mixed state is obtained due to gas absorption or the like. It is also effective in the case of a liquid with low fluidity (for example, biological sludge).

  Further, if a plurality of fluids are circulated simultaneously, the mixing process and the ultrasonic irradiation process can be performed simultaneously. In particular, in the gas absorption process, the bubbles of the raw material gas are finely crushed by the turbulent action of the resistors 41 and 42 to generate a large amount of fine bubbles at a high density, thereby improving the gas-liquid contact efficiency. Consumption can be greatly reduced.

  Furthermore, if the liquid to be treated containing microorganisms is introduced together with the agitation gas, the agitation gas becomes fine bubbles due to the turbulent action of the resistors 41 and 42, and the impact effect due to the pressure fluctuation generated when the fine bubbles collapse. The cell wall of the microorganism can be damaged, and the efficiency of the treatment for killing the microorganism is dramatically improved by the synergistic effect of the turbulent action by the resistors 41 and 42 and the ultrasonic action by the ultrasonic radiator 3. Can be increased.

  In this case, ozone gas having an action of chemically destroying the cell wall of the microorganism may be used as the stirring gas. The ozone, the ultrasonic wave by the ultrasonic radiator 3, and the turbulent flow by the resistors 41 and 42 are used. The processing efficiency can be further enhanced by the synergistic effect. In this case, in this ultrasonic processing apparatus 1, it is only necessary to directly inject ozone gas from the injection pipe 27 without generating ozone water, so that high-efficiency processing can be performed with a simple and small apparatus at low cost. Can be done.

  By utilizing the action of destroying the cell walls of such microorganisms, the ultrasonic treatment apparatus 1 can be used for the treatment of, for example, drinking water or water for food production, and performs a sterilization treatment that kills bacteria in the raw water. Furthermore, the chemical substance can be decomposed by the ultrasonic wave of the ultrasonic radiator 3 and decomposed and removed in the raw water.

  Ballast water treatment, that is, killing aquatic organisms to prevent the destruction of ecosystems due to the release of aquatic organisms (plankton, etc.) contained in the ship's ballast water to the sea area when ballast water is discharged Can be used for processing. Especially in seawater, since bromic acid generated by contact with ozone has a high bactericidal action, ozone is preferably used in combination.

  Further, it can be applied to the treatment of biological sludge generated by biological treatment of organic wastewater (eg activated sludge method). This biological sludge contains a large amount of microorganisms that have been propagated by ingesting organic substances in water, and further biological treatment becomes possible through solubilization that breaks down the cell walls of these microorganisms and releases organic substances in the cells, reducing sludge volume. However, the use of this ultrasonic treatment device 1 can dramatically increase the efficiency of the sludge solubilization treatment. Even in this biological sludge treatment, ozone may be used in combination.

  In addition, this ultrasonic processing apparatus 1 utilizes the action of promoting the chemical reaction by the ultrasonic wave of the ultrasonic radiator 3 and the high gas-liquid contact efficiency realized by the strong turbulent flow generated by the resistors 41 and 42. In addition, it can be used for the treatment of groundwater and sludge sludge contaminated with hardly degradable substances such as dioxin, and the high gas-liquid contact efficiency by turbulent flow promotes the dissolution of ozone and other oxidants. And the chemical reaction promoting action by ultrasonic waves cooperates, so that the hardly decomposable substance can be efficiently decomposed.

  In addition to this, the ultrasonic processing apparatus 1 can be widely used in applications that promote various chemical reactions, and a dispersion process of a plurality of types of materials, for example, an emulsion generation process required in the field of food production and the like. (Emulsification) is also effective, and the processing efficiency can be dramatically increased.

  In particular, in the ultrasonic processing apparatus 1, the resistors 41 and 42 have a simple configuration in which the resistors 41 and 42 are protruded from the inner peripheral surface of the cylindrical body in a state where the resistors 41 and 42 are inclined downstream so as not to oppose the flow. Since a sufficiently large gap can be secured between each other, there is no place where fibrous or particulate solid matter is caught or deposited, and clogging is also caused by liquid matter containing a large amount of solid matter such as sludge. Stable processing can be performed without waking up.

  The ultrasonic treatment apparatus according to the present invention has the effect of improving the utilization efficiency of ultrasonic waves, and is used for applications such as gas absorption treatment, sterilization treatment, biological sludge treatment, chemical substance decomposition treatment, etc. It is useful as a device.

It is sectional drawing which shows the ultrasonic processing apparatus by this invention. It is a perspective view which shows the resistor element shown in FIG. It is the front view which looked at the resistor element shown in FIG. 1 from the upstream. It is a front view explaining the arrangement | positioning condition of the resistor elements shown in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Ultrasonic processing apparatus 2 Casing 3 Ultrasonic radiator 4 Resistor element 21 Straight pipe part (pipe)
22 Introducing pipe part 25 Inlet part 26 Outlet part 27 Injection pipes 41 and 42 Resistor 43 Cylindrical body

Claims (1)

A rod-shaped ultrasonic radiator is coaxially arranged at the center of the pipe through which the fluid to be processed flows, and a turbulent flow for stirring the fluid is provided in the gap between the ultrasonic radiator and the pipe. A plurality of resistors to be generated are arranged,
The plurality of resistors are projected in a plate shape from the outer peripheral side toward the central portion, are spaced at a predetermined interval in the axial direction so as not to contact each other while being inclined toward the downstream side, and sequentially at a predetermined angle in the circumferential direction. An ultrasonic processing apparatus characterized by being provided by being shifted one by one.

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