KR20100005647A - Ultrasonic treatment device - Google Patents

Abstract

PURPOSE: A ultrasonic treatment device is provided to reduce operation costs of the device while reducing processing time, and to improve efficiency of ultrasonic waves to reduce energy consumption efficiently. CONSTITUTION: A ultrasonic treatment device(1) includes the following: a casing(2) in which fluid flows; a ultrasonic radiator irradiating ultrasonic waves in fluid circulating inside the casing; and a plurality of resistance elements with a first and a second registers(41,42) occurring turbulence to agitate the fluid. The casing has a straight segment part(21), an introduction tube part(22) and a flange part(23,24). The fluid is collected from an outlet(26) through the straight segment part. A base part is fixed on an end plate(28). A ultrasonic oscillator is arranged on the base, and the ultrasonic oscillator is driven by a controller(32).

Description

Ultrasonic Processing Device {ULTRASONIC TREATMENT DEVICE}

TECHNICAL FIELD The present invention relates to an ultrasonic processing apparatus for irradiating a fluid with ultrasonic waves to perform a necessary treatment.

BACKGROUND ART Ultrasonic treatment apparatuses for irradiating ultrasonic fluid to a fluid to perform a desired treatment are known in various configurations. For example, the structure which irradiates an ultrasonic wave from the outer side of the container which stores a to-be-processed fluid (refer patent document 1), and the structure which irradiates an ultrasonic wave from the outer side of the pipe which a to-be-processed fluid flows (patent document 2, 3) Reference), a configuration in which an ultrasonic radiator is provided inside a container for storing a fluid to be treated (see Patent Documents 4 and 5), and a configuration (see Patent Documents 6 and 7) for irradiating ultrasonic waves from the outside of the static mixer. have.

[Patent Document 1] Japanese Patent Publication No. 2008-012233

[Patent Document 2] Japanese Patent Application Laid-Open No. 1998-216507

[Patent Document 3] Japanese Patent Laid-Open No. 2005-199253

[Patent Document 4] Japanese Patent Publication No. 2008-036586

[Patent Document 5] Japanese Patent Publication No. 2003-200042

[Patent Document 6] Japanese Patent Publication No. 2004-195403

[Patent Document 7] Japanese Patent Publication No. 2007-330894

However, in the configuration in which the ultrasonic waves are irradiated from the outside of the container storing the processing fluid or from the outside of the tube through which the processing fluid flows as described above, the loss of the ultrasonic waves is large, the utilization efficiency of the ultrasonic waves is reduced, and the running cost is high. There is a growing problem. In addition, in the configuration in which the ultrasonic radiator is provided inside the container for storing the fluid to be treated, it is advantageous to reduce the loss of the ultrasonic wave, but the irradiation amount of the ultrasonic wave to the fluid varies depending on the distance from the ultrasonic radiator, Since it becomes uneven, when trying to ensure sufficient irradiation amount from the position away from an ultrasonic radiator, ultrasonic waves will irradiate more than necessary in the vicinity of an ultrasonic radiator, and as a result, the problem that the utilization efficiency of an ultrasonic wave cannot fully be raised arises.

On the other hand, in the method of irradiating the ultrasonic waves from the outside of the stationary mixer, the fluid is agitated by the internal resistor, which is effective for uniformizing the irradiation of the ultrasonic waves. there is a problem. On the other hand, a configuration in which the ultrasonic radiator is arranged inside the stationary mixer may be considered. In this case, however, it is necessary to configure the ultrasonic radiator so that the stirring function by the resistor is not impaired. It is required to be configured to increase the use efficiency.

The present invention has been made on the basis of the inventor's knowledge, and its main purpose is to make ultrasonic use more efficient, to reduce the processing time, to reduce the size of the apparatus, to reduce the operating cost, and to save energy. It is to provide a device.

In order to solve this problem, in the ultrasonic processing apparatus according to the present invention, a rod-shaped ultrasonic radiator is coaxially arranged at the center of a pipe through which a fluid to be treated flows, and at the same time, the ultrasonic radiator and the pipe A plurality of resistors for generating turbulent flow for agitating the fluid are provided in the gap, and all of the plurality of resistors protrude in a plate shape from the outer circumferential side toward the center and do not contact each other in a state inclined downstream. It was assumed that the spacers were provided at predetermined intervals in the axial direction and shifted by predetermined angles sequentially in the circumferential direction.

According to the present invention, the ultrasonic radiator is arranged inside the stationary mixer, and ultrasonic waves are irradiated from the ultrasonic radiator with respect to the fluid flowing through the gap between the ultrasonic radiator and the pipe, and at the same time, the plurality of resistors The fluid is stirred by the generated turbulence. As a result, the loss of the ultrasonic wave is small and the ultrasonic wave can be irradiated to the fluid uniformly, so that the utilization efficiency of the ultrasonic wave can be improved, and the processing time can be shortened, the apparatus can be reduced, the operating cost can be reduced, and the energy can be saved. Can get angry.

In addition, since the stirring function by the resistor is not impaired, in particular, since the resistor inclined to the downstream side guides the fluid toward the ultrasonic radiator in the center, the fluid uniformly passes near the ultrasonic radiator, and thus uses ultrasonic waves. The efficiency can be greatly improved. This is particularly effective in the case of using a high frequency ultrasonic wave that is easy to attenuate, or in the case of containing a gas that significantly attenuates the ultrasonic wave, that is, in a gas-liquid mixed state by gas absorption or the like. Moreover, it is effective also in the case of liquid with low fluidity (for example, bio sludge etc.).

In addition, since the resistor is protruded from the inner circumferential surface of the tubular body in a state inclined to the downstream side so as not to disobey the flow, and a sufficiently large gap can be secured between the resistors, it is difficult to cause clogging, and it is hard to cause clogging. The liquid (for example, bio sludge etc.) which mixed etc. can also be processed.

Best Mode for Carrying Out the Invention Embodiments of the present invention will be described below with reference to the drawings.

1 is a cross-sectional view showing an ultrasonic processing apparatus according to the present invention. The ultrasonic processing apparatus 1 includes a casing 2 through which a fluid to be treated flows, an ultrasonic radiator 3 that irradiates ultrasonic fluid to a fluid flowing through the casing 2, and an interior of the casing 2. It has a some resistor element 4 provided with the resistors 41 and 42 which generate the turbulence for stirring the fluid which distribute | circulates.

The casing 2 includes a straight pipe section (pipe) 21 having a circular cross section, an introduction pipe section 22 branched from the straight pipe section 21 in a T-shape, and a straight pipe section 21. The flanges 23 and 24 are provided at both ends, and the fluid to be treated is introduced from the inlet portion 25 of the inlet tube portion 22 and recovered from the outlet portion 26 through the straight tube portion 21.

The inlet pipe part 22 is provided with the inlet pipe 27, and this inlet pipe 27 is used when stirring and mixing several types of fluids in parallel with ultrasonication (gas absorption or addition of an additive). For example, in the gas absorption process, the raw material liquid is introduced from the inlet portion 25 while the raw material gas is injected from the injection tube 27. In addition, when the agitation and mixing of these plural types of fluids are not performed, the injection pipe 27 can be omitted without necessity.

A straight rod-shaped ultrasonic radiator 3 is coaxially disposed at the central portion 21 of the casing 2, and a base 31 for supporting the ultrasonic radiator 3 in a cantilever state is provided. ) Is fixed to the end plate 28 joined to the flange portion 24 adjacent to the introduction tube portion 22 in a state where the opening of the straight tube portion 21 is closed.

On the base 31, an ultrasonic vibrator (piezoelectric element) serving as an oscillation source of the ultrasonic radiator 3 is disposed, and the ultrasonic vibrator is driven from the controller (oscillator) 32 so that an ultrasonic wave of a desired frequency is generated.

The resistor element 4 is inserted into and installed in the straight pipe portion 21 of the casing 2 and faces each other of the tubular bodies 43 having a circular cross section having an outer diameter corresponding to the inner diameter of the straight pipe portion 21. The first and second pairs of resistors 41 and 42 protrude in a plate shape toward the center from the inner circumferential surface, respectively, and distribute a gap between the cylindrical body 43 and the ultrasonic radiator 3 that are continuous in the axial direction. The fluid to be stirred is agitated by the resistors 41 and 42.

The resistors 41 and 42 are all inclined toward the downstream side, i.e., are arranged in a H shape with the center side inclined with respect to the outer circumferential side on the downstream side, between the two low antibodies 41 and 42. It is provided shifting in the axial direction so as to secure a predetermined interval. Although the inclination angle with respect to the axis line of the straight pipe part 21 of these resistors 41 and 42 may be set suitably according to a use, 45 degrees is suitable.

FIG. 2 is a perspective view showing the resistor element shown in FIG. 1. FIG. 3 is a front view of the resistor element shown in FIG. 1 as viewed from the upstream side. It is a front view explaining the arrangement situation of the resistor elements shown in FIG.

As shown in FIG. 3, the resistors 41 and 42 are formed in the plate shape which becomes substantially fan shape becoming narrow gradually toward the center part from the outer peripheral side. The leading edges of the resistors 41 and 42 are formed in an arc shape along the outer circumferential surface of the ultrasonic radiator 3. In particular, here, although the upstream 1st resistor 41 is formed in the short length and the downstream 2nd resistor 42 is formed in the long length, both resistors 41 and 42 may be made the same size.

As shown in FIG. 2, the unevenness | corrugation is formed in the edge part of the axial direction of the cylindrical body 43 so that a 45 degree shift may be shifted with respect to an adjoining one in the circumferential direction. Moreover, it is possible to divide into two division bodies 43a and 43b in which a pair of resistors 41 and 42 are formed by division lines along the axial direction, thereby facilitating manufacture and at the same time. The attached obstacles can be easily removed.

As shown in FIG. 4, the resistor elements 4 are arranged in the same direction by 45 ° with respect to the resistor element 4 immediately before, and each of the resistor elements subsequent to the resistor element 4 on the most upstream side ( 4) are angular positions of 45 °, 90 °, 135 °, 180 °, 225 °, 270 ° and 315 ° in the circumferential direction, respectively. Therefore, when viewed as a whole, paired resistors 41 and 42 are arranged to draw spirals with lead angles corresponding to shifted angles of resistor element 4, respectively.

In this ultrasonic processing apparatus 1, by irradiating the ultrasonic wave of a predetermined | prescribed frequency range from the ultrasonic radiator 3 with respect to the fluid which distribute | circulates the clearance gap between the ultrasonic radiator 3 and the straight pipe part 21 of the casing 2, Cavitation occurs in the liquid, and the shock wave generated at the time of collapse of the microbubbles generated at this time forms a very high pressure state locally, and a very high temperature state is locally formed, resulting in a chemical reaction. This is facilitated.

In addition, the cavitation generated by the ultrasonic waves causes the decomposition of water molecules, and by destroying the cell walls of the microorganisms by the chemical oxidation action of the hydroxy radicals thus produced and the physical destruction by the shock wave, the microorganisms are killed. Processing to make it possible.

In addition, in the ultrasonic processing apparatus 1, the fluid is pumped by a pump so as to obtain a required flow rate, and is introduced from the inlet portion 25. In the resistor element 4, the resistors 41 and 42 have a plate shape. Since the flow which collides with the resistors 41 and 42 is disperse | distributed in various directions around the resistors 41 and 42, and it is curled by the back side of the resistors 41 and 42, it is a vortex (return ( Is generated). In addition, since the resistor elements 4 are arranged while being shifted by a predetermined angle in the circumferential direction along the flow direction, and the resistors 41 and 42 are arranged in a spiral shape as a whole, the fluid does not pass quickly and the resistors 41, The collision with any one of 42) and the collision, dispersion, and curling of the fluid by the resistors 41 and 42 are repeated in sequence, so that strong turbulence occurs in the straight pipe portion 21, and the fluid is vigorously stirred.

Thus, in the ultrasonic processing apparatus 1, since a fluid is stirred by turbulence generated by the resistors 41 and 42 simultaneously with the irradiation of the ultrasonic wave by the ultrasonic radiator 3, ultrasonic wave can be irradiated to a fluid uniformly. In particular, since the resistors 41 and 42, which are inclined downward, guide the fluid toward the ultrasonic radiator 3 in the center, the fluid uniformly passes near the ultrasonic radiator 3, thereby improving the irradiation efficiency of the ultrasonic wave. It can greatly improve. This is particularly effective when using a high frequency ultrasonic wave with large attenuation, or when a gas containing the ultrasonic wave is attenuated, i.e., in a gas-liquid mixed state by gas absorption or the like. It is also effective in the case of liquids having low fluidity (for example, bio sludge etc.).

Moreover, when a some fluid is circulated simultaneously, a mixing process and an ultrasonic irradiation process can be performed simultaneously. In particular, in the gas absorption process, since bubbles of the source gas are finely broken by the action of turbulence by the resistors 41 and 42, fine bubbles are generated in large quantities at high density, and the gas-liquid contact efficiency can be increased. The consumption can be greatly reduced.

In addition, when the to-be-processed liquid containing microorganisms is introduced together with the gas for stirring, the gas for stirring becomes microbubble by the action of the turbulence by the resistors 41 and 42, and the pressure generated at the time of collapse of the microbubbles. The impact caused by the fluctuation can damage the cell walls of the microorganisms, and the synergistic effect of the turbulence by the resistors 41 and 42 and the action of the ultrasonic waves by the ultrasonic radiator 3 kills the microorganisms. The efficiency of the treatment can be dramatically increased.

In this case, ozone gas having a function of chemically destroying the cell walls of the microorganisms may be used as the gas for stirring, and the ozone and the ultrasonic waves by the ultrasonic radiator 3 and the turbulence by the resistors 41 and 42 may be used. By the synergistic effect of, the treatment efficiency can be further increased. In this case, in the ultrasonic processing apparatus 1, ozone gas may be directly injected from the injection pipe 27 without generating ozone water, thereby making it possible to carry out high-efficiency processing at a low cost with a simple and compact apparatus.

By utilizing the action of destroying the cell walls of such microorganisms, the ultrasonic treatment apparatus 1 can be used for treatment of, for example, drinking water or water for food production, and can be used for sterilization treatment to kill bacteria in raw water. It can be efficiently performed and the decomposition | disassembly removal of the harmful substance contained in raw water is attained by the decomposition | decomposition action of the chemical substance by the ultrasonic wave of the ultrasonic radiator 3.

In addition, ballast water treatment, that is, aquatic organisms (plankton, etc.) included in the ballast water of a ship is released into the sea area during discharge of the ballast water to kill the aquatic organisms in order to prevent the destruction of the ecosystem. Can be used. In particular, in seawater, bromic acid produced by contact with ozone has a high bactericidal action, so ozone may be used in combination.

It is also applicable to the treatment of bio sludge generated in biological treatment of organic wastewater (active sludge method or the like). This bio sludge contains a large amount of microorganisms that have ingested and ingested organic matter in water, and can be further processed by solubilization which destroys the cell wall of the microorganism and releases the organic matter in the cells. Although solubilization can be performed, the efficiency of the solubilization process of sludge can be increased remarkably using this ultrasonic processing apparatus 1. In this bio sludge treatment, ozone may be used in combination.

Moreover, this ultrasonic processing apparatus 1 utilizes the high gas-liquid contact efficiency realized by the action | stimulation of the chemical reaction by the ultrasonic wave of the ultrasonic radiator 3, and the strong turbulence generated by the resistors 41 and 42, It can be used for the treatment of groundwater or dredged sludge contaminated with hardly decomposable substances such as dioxine, and the dissolution of oxidizing agents such as ozone is promoted by the high gas-liquid contact efficiency by turbulence. The action and the chemical reaction promoting action by the ultrasonic wave cooperate to effectively decompose the hardly decomposable substance.

In addition, the ultrasonic treatment apparatus 1 can be widely used for promoting various chemical reactions, and is also required in the field of dispersion treatment of a plurality of kinds of materials, for example, food production, etc. It is also effective for the production process (emulsification) of the catalyst, and the treatment efficiency can be dramatically increased.

In particular, in this ultrasonic processing apparatus 1, in the simple form which protruded from the inner peripheral surface of the cylindrical body in the state which inclined the downstream side so that the resistors 41 and 42 may not disobey flow, and between the resistors 41 and 42 comrades, Since a sufficiently large gap can be secured, there is no place where fibrous or particulate solids are caught or deposited, and even a liquid substance containing a large amount of solids such as sludge can be prevented and stable treatment can be performed.

The ultrasonic processing apparatus according to the present invention has the effect of increasing the utilization efficiency of ultrasonic waves, and is useful as an ultrasonic processing apparatus or the like used for applications such as gas absorption treatment, sterilization treatment, bio sludge treatment, and chemical decomposition treatment.

1 is a cross-sectional view showing an ultrasonic processing apparatus according to the present invention.

FIG. 2 is a perspective view showing the resistor element shown in FIG. 1. FIG.

FIG. 3 is a front view of the resistor element shown in FIG. 1 as viewed from the upstream side. FIG.

4 is a front view for explaining an arrangement situation of the resistor elements shown in FIG. 1;

Explanation of symbols for the main parts of the drawings

1: ultrasonic processing apparatus 2: casing

3: ultrasonic radiator 4: resistor element

21: straight pipe (pipe) 22: inlet pipe

25: inlet 26: outlet

27: injection tube 41, 42: resistor

43: tubular body

Claims (1)

A rod-shaped ultrasonic radiator is coaxially disposed at the center of the pipe through which the fluid to be treated flows, and at the same time, a turbulent flow for stirring the fluid is generated in the gap between the ultrasonic radiator and the pipe. A plurality of resistors are arranged, All of the plurality of resistors protrude in a plate shape from the outer circumferential side toward the center portion, and are provided with predetermined intervals in the axial direction so as not to contact each other in a state inclined downstream, and are sequentially shifted by a predetermined angle in the circumferential direction. Ultrasonic processing apparatus characterized in that.

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