JPH11179350A - Ultraviolet radiation device - Google Patents

Ultraviolet radiation device

Info

Publication number
JPH11179350A
JPH11179350A JP9354845A JP35484597A JPH11179350A JP H11179350 A JPH11179350 A JP H11179350A JP 9354845 A JP9354845 A JP 9354845A JP 35484597 A JP35484597 A JP 35484597A JP H11179350 A JPH11179350 A JP H11179350A
Authority
JP
Japan
Prior art keywords
pipe
ultraviolet
resistors
fluid
resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9354845A
Other languages
Japanese (ja)
Other versions
JP3902304B2 (en
Inventor
Noboru Sakano
昇 阪野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP35484597A priority Critical patent/JP3902304B2/en
Publication of JPH11179350A publication Critical patent/JPH11179350A/en
Application granted granted Critical
Publication of JP3902304B2 publication Critical patent/JP3902304B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide an ultraviolet radiation device wherein even ultraviolet radiation having short wavelength can be efficiently treated using a simple construction. SOLUTION: A bar-shaped ultraviolet lamp 6 is disposed coaxially at the center of a pipe 2 through which a fluid to be treated flows, and a plurality of resistors 1a-1h are arranged in the gap between the lamp and the pipe. And the pipe 2 is formed from ultraviolet-ray transmitting materials so that ultraviolet rays from an ultraviolet lamp 7 disposed outside the pipe 2 can be applied to the fluid in the pipe 2. Moreover each of the resistors is formed into a fan- shaped plate wherein the width of the plate is made narrower toward the center from the outer periphery thereof, and the resistors are arranged in such a manner that they are spaced at regular intervals in the axial direction so as to not to interfere with each other and inclined toward the downstream side and they are spaced by predetermined angles apart one from another in the circumferential direction of the pipe.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、流体に対して殺菌
や酸化分解等の紫外線照射処理を行う紫外線照射装置に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet irradiation apparatus for performing an ultraviolet irradiation treatment such as sterilization or oxidative decomposition on a fluid.

【0002】[0002]

【従来の技術】処理すべき流体を容器内に導入し、ここ
に設けられた紫外線ランプからの紫外線を流体に照射し
て殺菌や酸化分解等の紫外線照射処理を行う紫外線照射
装置が知られている。
2. Description of the Related Art There is known an ultraviolet irradiation apparatus for introducing a fluid to be treated into a container and irradiating the fluid with ultraviolet rays from an ultraviolet lamp provided therein to perform an ultraviolet irradiation treatment such as sterilization or oxidative decomposition. I have.

【0003】[0003]

【発明が解決しようとする課題】この種の紫外線照射装
置において、短波長(例えば184.9nm)の紫外線
を用いる場合、紫外線の減衰が大きいために、紫外線照
射効果が得られるのが紫外線ランプから5〜6mm程度
の領域に制限され、効率の良い処理を行うには困難な面
がある。これは、流体が一様に紫外線ランプの近傍を通
過するようにすれば良く、紫外線照射装置に攪拌機能を
付加することで解決可能であるが、従来の紫外線照射装
置に攪拌機器を装着したのでは装置の構造が徒に複雑化
し、大型化並びにコストの上昇が避けられず、その上十
分に満足し得る効果を得ることが期待し難しい。
In this type of ultraviolet irradiation apparatus, when ultraviolet light having a short wavelength (for example, 184.9 nm) is used, ultraviolet light is greatly attenuated. The area is limited to about 5 to 6 mm, and there is a difficulty in performing efficient processing. This can be achieved by adding a stirring function to the ultraviolet irradiation device, as long as the fluid uniformly passes near the ultraviolet lamp. However, a stirring device is attached to the conventional ultraviolet irradiation device. In such a case, the structure of the apparatus is complicated, the size and the cost are inevitably increased, and it is difficult to expect a sufficiently satisfactory effect.

【0004】本発明は、このような発明者の知見に基づ
き案出されたものであり、その主な目的は、短波長の紫
外線でも簡単な構成で効率の良い処理が可能なように紫
外線照射装置を構成することにある。
The present invention has been devised based on the knowledge of the inventor, and a main object of the present invention is to irradiate ultraviolet rays with a simple structure so that efficient processing can be performed even with short wavelength ultraviolet rays. It is to constitute an apparatus.

【0005】[0005]

【課題を解決するための手段】このような目的を果たす
ために、本発明においては、処理すべき流体が内部を流
通するパイプの中心部に棒状の紫外線ランプを同軸的に
配置すると共に、該紫外線ランプと前記パイプとの間の
間隙に複数の抵抗体を配設したものとした。
In order to achieve the above object, according to the present invention, a rod-shaped ultraviolet lamp is coaxially disposed at the center of a pipe through which a fluid to be treated flows, and the rod is disposed at the center thereof. A plurality of resistors were provided in the gap between the ultraviolet lamp and the pipe.

【0006】これによると、紫外線ランプとパイプとの
間の間隙を流通する流体に対して紫外線ランプから紫外
線が照射されるが、このとき同時に複数の抵抗体によっ
て生じる乱流により流体が攪拌される。したがって、流
通流体が一様に紫外線ランプの近傍を通過するようにな
り、減衰の大きな短波長の紫外線を流体に均一に照射す
ることが可能となる。また、複数の流体を同時に流通さ
せれば混合処理と紫外線照射処理とを同時並行的に実施
することができる。そして、抵抗体による乱流により攪
拌作用を得るため、煩雑な可動機構が不要であり、小型
化を図ると共に運転コストの上昇を抑えることができ、
さらにメンテナンス性に優れたものとすることができ
る。
[0006] According to this, the ultraviolet light is irradiated from the ultraviolet lamp to the fluid flowing through the gap between the ultraviolet lamp and the pipe. At this time, the fluid is stirred by turbulence generated by a plurality of resistors. . Therefore, the flowing fluid uniformly passes near the ultraviolet lamp, and it is possible to uniformly irradiate the fluid with short-wavelength ultraviolet light having large attenuation. If a plurality of fluids are allowed to flow at the same time, the mixing process and the ultraviolet irradiation process can be performed simultaneously and in parallel. And since a stirring action is obtained by the turbulent flow of the resistor, a complicated moving mechanism is unnecessary, and it is possible to reduce the size and increase the operating cost,
Further, it is possible to achieve excellent maintenance.

【0007】特に、抵抗体の表面に光触媒材料をコーテ
ィングしたり、あるいは抵抗体全体を光触媒材料で形成
したりして、流体に接触する抵抗体の少なくとも表面部
分を二酸化チタン等の光触媒材料で形成すると好まし
く、これによると、光触媒の表面で紫外線による光化学
反応が活性化され、紫外線処理の効率を格段に高めるこ
とができる。なお、パイプ自体あるいはその内周面部分
を光触媒材料で形成するようにしても良いが、流体と光
触媒との接触効率を高める上では抵抗体の方が効果的で
ある。
In particular, the surface of the resistor is coated with a photocatalytic material, or the entire resistor is formed of a photocatalytic material, and at least the surface portion of the resistor in contact with the fluid is formed of a photocatalytic material such as titanium dioxide. Preferably, according to this, the photochemical reaction by the ultraviolet rays is activated on the surface of the photocatalyst, and the efficiency of the ultraviolet treatment can be remarkably increased. The pipe itself or the inner peripheral surface thereof may be formed of a photocatalytic material, but the resistor is more effective in increasing the contact efficiency between the fluid and the photocatalyst.

【0008】その上、前記パイプを紫外線透過材料で形
成して、該パイプの外側に配置された紫外線ランプから
の紫外線を前記パイプ内の流体に照射するようにすると
良い。これによると、パイプ内を流通する流体に対して
波長の異なる紫外線を同時に照射することができ、装置
を大型化することなく幅広い紫外線処理が可能になる。
例えば、パイプ内を流通する流体に対してパイプ中心部
に配置した紫外線ランプから短波長の紫外線を照射する
一方で、パイプの外側に配置した紫外線ランプから長波
長の紫外線(例えば253.7nm以上)を照射するこ
とができる。
In addition, it is preferable that the pipe is formed of an ultraviolet transmitting material, and that the fluid in the pipe is irradiated with ultraviolet rays from an ultraviolet lamp disposed outside the pipe. According to this, it is possible to simultaneously irradiate ultraviolet rays having different wavelengths to the fluid flowing through the pipe, and it is possible to perform a wide range of ultraviolet treatment without increasing the size of the apparatus.
For example, while ultraviolet light of a short wavelength is irradiated from an ultraviolet lamp arranged at the center of the pipe to a fluid flowing in the pipe, ultraviolet light of a long wavelength (for example, 253.7 nm or more) is emitted from an ultraviolet lamp arranged outside the pipe. Can be irradiated.

【0009】前記パイプを形成する紫外線透過材料とし
ては石英ガラスが良く、これによると、比較的短い波長
の紫外線も透過可能であり、しかも熱衝撃に強く、化学
的耐久性にも優れている。この他、無ケイ酸ガラス等の
紫外線透過ガラスも可能であり、処理目的に応じて照射
する紫外線を透過可能な材料のものを適宜選択すれば良
い。また、外側に配置される紫外線ランプの形態は、パ
イプ内の流体に向けて紫外線を照射可能なものであれば
特に限定されないが、例えば、パイプの軸線に平行に配
置された棒状のものを周方向に等間隔をおいて複数設け
ると、パイプ内の流体に対して概ね均等な照射が可能に
なる。
As the ultraviolet transmitting material for forming the pipe, quartz glass is preferable. According to this, ultraviolet light having a relatively short wavelength can be transmitted, and it is resistant to thermal shock and excellent in chemical durability. In addition, UV-transmitting glass such as silicate-free glass is also possible, and a material capable of transmitting UV light to be irradiated may be appropriately selected depending on the purpose of processing. The form of the ultraviolet lamp disposed outside is not particularly limited as long as it can irradiate ultraviolet light toward the fluid in the pipe. For example, a rod-shaped lamp arranged parallel to the axis of the pipe may be used. By providing a plurality of pipes at equal intervals in the direction, it is possible to irradiate the fluid in the pipe with a substantially uniform irradiation.

【0010】これに加えて、前記の複数の抵抗体は、共
に外周側から中心部に向けて細くなった略扇形をなす板
状に形成されたものであり、下流側に傾斜した状態で互
いに接触しないように軸線方向に所定の間隔をおき、か
つパイプの周方向に順次所定角度ずつずらして設けられ
ていると好ましい。これによると、導入流体がショート
パスすることなく抵抗体のいずれかに衝突して分散さ
れ、パイプ内に強力な乱流が発生して流体が激しく攪拌
されるため、効果的な攪拌混合が可能となる。そして、
比較的単純な形状であるため製作が容易であり、パイプ
の内周面から突出した態様でパイプと一体形成すること
も可能であり、製造コストの上昇を抑えることができ
る。しかも、目詰まりし難いため、繊維質や固形物等が
混入した液体の殺菌等の処理も可能になる。
[0010] In addition, the plurality of resistors are formed in a substantially fan-shaped plate shape narrowing from the outer peripheral side toward the center, and are mutually inclined in the downstream direction. It is preferable that they are provided at predetermined intervals in the axial direction so as not to come into contact with each other and are sequentially shifted by a predetermined angle in the circumferential direction of the pipe. According to this, the introduced fluid collides with one of the resistors without being short-passed and is dispersed, generating strong turbulence in the pipe and agitating the fluid vigorously, enabling effective stirring and mixing Becomes And
Since it has a relatively simple shape, it is easy to manufacture, and it can be formed integrally with the pipe so as to protrude from the inner peripheral surface of the pipe, thereby suppressing an increase in manufacturing cost. Moreover, since it is hard to be clogged, it is also possible to perform a treatment such as sterilization of a liquid mixed with fibrous material or solid matter.

【0011】[0011]

【発明の実施の形態】以下に添付の図面を参照して本発
明の構成を詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The configuration of the present invention will be described below in detail with reference to the accompanying drawings.

【0012】図1は、本発明に基づき構成された紫外線
照射装置を示している。この紫外線照射装置は、略扇形
状をなす複数の抵抗体1a〜1hが内周面に設けられた
円形断面をなすパイプ2と、このパイプ2の一端に接合
されたT字管3と、このT字管3の一端に接合された安
定器等が内蔵された制御ユニット4と、この制御ユニッ
ト4から延出されて、保護ガラス管5に覆われた状態で
T字管3を通ってパイプ2の中心部に挿設された紫外線
放電管6と、パイプ2の周囲に配置された紫外線放電管
7とを有しており、処理すべき流体がT字管3の入口8
から導入されてパイプ2の他端側の出口9から回収され
るようになっている。なお、図1はパイプ2を一部省略
して示しており、抵抗体1a〜1hと同様の抵抗体が全
長に渡って設けられている。
FIG. 1 shows an ultraviolet irradiation device configured according to the present invention. The ultraviolet irradiation device includes a pipe 2 having a circular cross-section in which a plurality of substantially fan-shaped resistors 1a to 1h are provided on an inner peripheral surface, a T-shaped pipe 3 joined to one end of the pipe 2, A control unit 4 having a built-in ballast and the like joined to one end of the T-tube 3 and a pipe extending from the control unit 4 and passing through the T-tube 3 in a state covered with a protective glass tube 5. 2 has an ultraviolet discharge tube 6 inserted in the center of the tube 2 and an ultraviolet discharge tube 7 arranged around the pipe 2 so that a fluid to be treated is supplied to an inlet 8 of the T-tube 3.
And collected from the outlet 9 at the other end of the pipe 2. In FIG. 1, the pipe 2 is partially omitted, and resistors similar to the resistors 1a to 1h are provided over the entire length.

【0013】抵抗体1a〜1hとパイプ2とは、石英ガ
ラス材料にて一体に形成されており、パイプ2の外側の
紫外線放電管7からの紫外線を透過可能なようになって
いる。この外側の紫外線放電管7は、パイプ2内の流体
に略均等に紫外線を照射可能なように、パイプ2の軸線
に平行に配置され、その周方向に等間隔をおいて複数設
けられている。抵抗体1a〜1hの表面には二酸化チタ
ン等の光触媒材料によるコーティングが施されている。
The resistors 1a to 1h and the pipe 2 are integrally formed of a quartz glass material so that ultraviolet rays from an ultraviolet discharge tube 7 outside the pipe 2 can be transmitted. The outer ultraviolet discharge tubes 7 are arranged in parallel to the axis of the pipe 2 so that the fluid in the pipe 2 can be irradiated with the ultraviolet light substantially uniformly, and a plurality of the ultraviolet discharge tubes 7 are provided at equal intervals in the circumferential direction. . The surfaces of the resistors 1a to 1h are coated with a photocatalytic material such as titanium dioxide.

【0014】パイプ2の内部に配置される紫外線放電管
6は、短波長の紫外線を放射するものであり、例えば波
長184.9nmの紫外線を放射する水銀ランプが用い
られる。他方、外部に配置される紫外線放電管7は、長
波長の紫外線を放射するものであり、例えば波長25
3.7nm以上の紫外線を放射する水銀ランプが用いら
れる。これにより、保護ガラス管5とパイプ2との間の
間隙を流通する流体に対して波長の異なる2種類の紫外
線が照射される。なお、両紫外線放電管6・7には、こ
の他、処理の目的に応じて水素や希ガス入り放電管等の
各種の紫外線ランプを適宜選択すれば良い。
The ultraviolet discharge tube 6 arranged inside the pipe 2 emits ultraviolet light having a short wavelength, and for example, a mercury lamp which emits ultraviolet light having a wavelength of 184.9 nm is used. On the other hand, the ultraviolet discharge tube 7 arranged outside radiates ultraviolet light of a long wavelength.
A mercury lamp that emits ultraviolet light of 3.7 nm or more is used. As a result, the fluid flowing through the gap between the protective glass tube 5 and the pipe 2 is irradiated with two types of ultraviolet rays having different wavelengths. In addition, various ultraviolet lamps such as a discharge tube containing hydrogen or a rare gas may be appropriately selected for the two ultraviolet discharge tubes 6 and 7 according to the purpose of processing.

【0015】保護ガラス管5は、内部の紫外線放電管6
の発する紫外線を透過可能な所要の紫外線透過性を有す
るガラス材料で形成されている。T字管3には、流通流
体に対して化学的に安定な物性を有する材料、例えばス
テンレス鋼で形成されたものが用いられる。
The protective glass tube 5 has an internal ultraviolet discharge tube 6
It is formed of a glass material having a required ultraviolet ray transmissivity capable of transmitting the ultraviolet rays emitted by the above. The T-tube 3 is made of a material having physical properties that are chemically stable to the flowing fluid, for example, a material formed of stainless steel.

【0016】抵抗体1a〜1hは、外周側から中心部に
向けて細くなった略扇形をなす板状のものであり、下流
側に向けて所定の角度で傾斜した状態でパイプ2の内周
面から突設され、その先端縁は保護ガラス管5の外周面
に沿って弧状に形成されている。この抵抗体1a〜1h
のパイプ2の軸線に対する傾斜角度は、用途に応じて適
宜設定すれば良いが、45°前後が適当である。
The resistors 1a to 1h are plate-like members having a substantially fan shape narrowing from the outer peripheral side toward the central portion. The protective glass tube 5 is formed in an arc shape along the outer peripheral surface of the protective glass tube 5. These resistors 1a to 1h
The angle of inclination of the pipe 2 with respect to the axis of the pipe 2 may be appropriately set according to the intended use, but is preferably about 45 °.

【0017】これらの抵抗体1a〜1hは、上流側から
第1・第2の抵抗体1a・1b、第3・第4の抵抗体1
c・1dといったように、隣り合う2つの抵抗体が順
次、ハ字形状に対をなして互いに対向する角度位置に配
置されている。例えば、図2に示すように、第1・第2
の両抵抗体1a・1bは上下に対向した位置に配置され
ている。また、これらの第1・第2の両抵抗体1a・1
bは相互に異なる大きさに形成されている。すなわち、
下流側の第2の抵抗体1bが上流側の第1の抵抗体1a
より大きく形成されている。
These resistors 1a to 1h are composed of first and second resistors 1a and 1b, third and fourth resistors 1 from the upstream side.
Two adjacent resistors, such as c and 1d, are sequentially arranged at angular positions facing each other in pairs in a C shape. For example, as shown in FIG.
Are arranged at positions vertically opposed to each other. The first and second resistors 1a and 1a
b is formed in mutually different sizes. That is,
The second resistor 1b on the downstream side is replaced with the first resistor 1a on the upstream side.
It is formed larger.

【0018】これと同様に第3・第4の両抵抗体1c・
1dも、図3に示すように、相互に異なる大きさに形成
され、互いに対向する角度位置に配置されているが、こ
れらの抵抗体1c・1dは、第1・第2の抵抗体1a・
1bに対して周方向に45度ずれた位置に配置されてい
る。以下同様にして、互いに対向して対をなす第5・第
6の両抵抗体1e・1f、第7・第8の両抵抗体1g・
1hが、周方向に45度ずつずらして配置されている。
したがって、抵抗体1a〜1hのうちの互いに対をなす
ものはその直前の対をなすものに対して前後に重なり合
っている。なお、エレメント1の全長に渡って設けられ
た図1に示さない抵抗体も上記と同様の配列規則に従っ
て所定位置に配置される。
Similarly, the third and fourth resistors 1c
As shown in FIG. 3, the first and second resistors 1c and 1d are also formed at mutually different angular positions, as shown in FIG.
It is arranged at a position shifted 45 degrees in the circumferential direction with respect to 1b. Similarly, the fifth and sixth resistors 1e and 1f, the seventh and eighth resistors 1g,
1h are arranged by being shifted by 45 degrees in the circumferential direction.
Therefore, one of the resistors 1a to 1h, which forms a pair with each other, overlaps with the immediately preceding pair of resistors 1a to 1h. Note that resistors not shown in FIG. 1 provided over the entire length of the element 1 are also arranged at predetermined positions according to the same arrangement rule as described above.

【0019】このため、パイプ2内に流体を導入する
と、上流側の第1の抵抗体1aに相対する流れはこの抵
抗体1aに衝突して左右に分散され、第1の抵抗体1a
に相対しない流れもショートパスすることなく次の第2
の抵抗体1bか若しくは下流側の抵抗体1c〜1hのい
ずれかに衝突して周囲に分散されることになる。こうし
て抵抗体1a〜1hによる導入流体の衝突と分散とが順
次繰り返されると、パイプ2内には強力な乱流が発生し
て流体が激しく攪拌される。
For this reason, when a fluid is introduced into the pipe 2, the flow facing the first resistor 1a on the upstream side collides with the resistor 1a and is dispersed right and left, and the first resistor 1a
The flow that is not relative to
Of the resistor 1b or the resistors 1c to 1h on the downstream side. When the collision and dispersion of the introduced fluid by the resistors 1a to 1h are sequentially repeated in this manner, a strong turbulent flow is generated in the pipe 2, and the fluid is vigorously stirred.

【0020】なお、上記実施形態においては、抵抗体1
a〜1hとパイプ2とを石英ガラスで形成してパイプ2
の外部からの紫外線を透過可能に構成したが、この外部
からの紫外線照射を省略する場合には、パイプ2並びに
抵抗体1a〜1hをステンレス鋼等、導入流体に対して
化学的に安定な適宜な材料を用いて形成すれば良い。
In the above embodiment, the resistor 1
a to 1h and the pipe 2 are made of quartz glass and the pipe 2
When ultraviolet irradiation from the outside is omitted, the pipe 2 and the resistors 1a to 1h may be appropriately made chemically stable with respect to the introduced fluid, such as stainless steel. What is necessary is just to form using a suitable material.

【0021】図4は、上記実施形態の一部を変更した第
1の変形例を示している。ここでは、紫外線放電管6の
保護ガラス管5とパイプ11との間の間隙に複数の抵抗
体を配設するために、パイプ11と別体の抵抗体エレメ
ント12をパイプ11内に挿設する構成としている。
FIG. 4 shows a first modification in which a part of the above embodiment is modified. Here, in order to dispose a plurality of resistors in the gap between the protective glass tube 5 of the ultraviolet discharge tube 6 and the pipe 11, a separate resistor element 12 from the pipe 11 is inserted into the pipe 11. It has a configuration.

【0022】抵抗体エレメント12は、パイプ11に挿
設可能な外径を有する円筒体13の内周面に、前記のご
とくハ字形状に対をなす抵抗体14a・14bを1組だ
け、一体に形成したものであり、この抵抗体エレメント
12を所要の数、周方向に順次所定角度ずつずらして挿
設することで、上記実施形態と同様の配列規則に従って
多数の抵抗体をパイプ11内に配置することができ、製
作が容易になる。この場合、円筒体13の両端部に、隣
接する円筒体13同士が周方向に所定角度だけずれて係
合するように所要の凹凸を形成しておけばパイプ11に
対する抵抗体エレメント12の装着作業が容易になると
共に、抵抗体エレメント12がずれるのを防止すること
ができる。抵抗体エレメント12は、流通流体に対して
化学的に安定な適宜な材料を用いて形成すれば良いが、
二酸化チタン等の光触媒材料を所要の面にコーティング
したり、あるいは全体を光触媒材料で形成すると良い。
なお、抵抗体エレメント12やパイプ11を石英ガラス
等の紫外線透過材料で形成することも可能である。
The resistor element 12 is formed by integrating a pair of resistors 14a and 14b in a C-shape as described above on the inner peripheral surface of a cylindrical body 13 having an outer diameter that can be inserted into the pipe 11. By inserting a required number of the resistor elements 12 in the circumferential direction and sequentially shifting them by a predetermined angle, a large number of resistor elements 12 are placed in the pipe 11 in accordance with the same arrangement rule as in the above embodiment. Can be placed, making it easier to manufacture. In this case, if the required unevenness is formed at both ends of the cylindrical body 13 so that the adjacent cylindrical bodies 13 are displaced from each other by a predetermined angle in the circumferential direction, the mounting operation of the resistor element 12 to the pipe 11 is performed. And the displacement of the resistor element 12 can be prevented. The resistor element 12 may be formed using an appropriate material that is chemically stable to the flowing fluid.
A desired surface may be coated with a photocatalytic material such as titanium dioxide, or the entire surface may be formed of the photocatalytic material.
Note that the resistor element 12 and the pipe 11 can be formed of an ultraviolet transmitting material such as quartz glass.

【0023】図5は、上記実施形態の一部を変更した第
2の変形例を示している。ここでは、上記図4に示した
例と同様にパイプ21内に抵抗体エレメント22を挿設
する構成としているが、この抵抗体エレメント22で
は、パイプ21の内周面に沿うように周方向に複数列ん
で配置された軸線方向の支柱23を介して、ハ字形状に
対をなす抵抗体24a・24bが相互に連結一体化され
ている。支柱23の両端は円環状をなす一対の端板25
で相互に連結されている。各抵抗体24a・24bは、
その基部に3つ貫設した取付孔に支柱23が挿通され、
隣り合う3本の支柱23間に架設された状態で固定され
ている。
FIG. 5 shows a second modification in which a part of the above embodiment is modified. Here, as in the example shown in FIG. 4 described above, the resistor element 22 is inserted into the pipe 21, but in the resistor element 22, the resistor element 22 is arranged in the circumferential direction along the inner peripheral surface of the pipe 21. Through a plurality of rows of axial columns 23, resistors 24a and 24b forming a pair in a C shape are mutually connected and integrated. Both ends of the support 23 are a pair of annular end plates 25.
Are interconnected. Each resistor 24a, 24b is
The support column 23 is inserted into three mounting holes penetrating the base,
It is fixed in a state of being bridged between three adjacent columns 23.

【0024】図5では支柱23を一部省略して示してい
るが、この支柱23の長さ、すなわち抵抗体エレメント
22の全長は、製造の手間や取り扱いの便宜並びにパイ
プ21の全長等を勘案して適宜な寸法に設定され、その
全長に渡って抵抗体24a・24bと同様の抵抗体が上
記実施形態と同様の配列規則に従って設けられる。この
場合、周方向に等間隔をおいて合計8本設けた支柱23
に対して1本ずつずらして抵抗体を取り付ければ、抵抗
体が周方向に45度ずつずれた配置構成とすることがで
きる。なお、抵抗体の配置角度は、支柱23の配設本数
を適宜増減して調節することができる。
In FIG. 5, the support 23 is partially omitted, but the length of the support 23, that is, the total length of the resistor element 22 is taken into consideration in terms of manufacturing labor and convenience of handling, the total length of the pipe 21, and the like. The resistors are set to appropriate dimensions, and the same resistors as the resistors 24a and 24b are provided over the entire length in accordance with the same arrangement rules as in the above embodiment. In this case, a total of eight columns 23 are provided at equal intervals in the circumferential direction.
When the resistors are attached one by one, the resistors can be arranged so as to be shifted by 45 degrees in the circumferential direction. In addition, the arrangement angle of the resistor can be adjusted by appropriately increasing or decreasing the number of columns 23 arranged.

【0025】このように構成すると、パイプ21を石英
ガラス等の紫外線透過材料で形成するだけで、抵抗体エ
レメント22の材質の如何に拘わらず、パイプ21の外
側に配置された紫外線放電管からの紫外線をパイプ21
内の流体に照射することが可能となる。この場合、抵抗
体エレメント22は流通流体に対して化学的に安定な適
宜な材料を用いて形成すれば良いが、特に抵抗体24a
・24bに二酸化チタン等の光触媒材料をコーティング
するか若しくはその全体を光触媒材料で形成するように
すると良い。
With such a configuration, the pipe 21 is formed only of an ultraviolet transmitting material such as quartz glass, and regardless of the material of the resistor element 22, the light from the ultraviolet discharge tube disposed outside the pipe 21 can be obtained. UV rays on pipe 21
It is possible to irradiate the fluid inside. In this case, the resistor element 22 may be formed using an appropriate material that is chemically stable to the flowing fluid.
It is preferable to coat 24b with a photocatalytic material such as titanium dioxide or to form the entirety of the photocatalytic material.

【0026】また、抵抗体エレメント22は、これを構
成する支柱23、抵抗体24a・24b並びに端板25
を互いに別体に形成した上で溶接等にて接合することで
簡単に製作することができ、さらに抵抗体24a・24
bそのものも、鋳造、あるいは所定形状に型抜きされた
板材の折り曲げ加工等によって比較的容易に形成するこ
とができる。さらに、抵抗体24a・24bの各々を隣
り合う複数の支柱23間に架設することで端板25と相
俟って支柱23同士が強固に連結一体化され、抵抗体エ
レメント22全体の剛性が高められるため、支柱23を
比較的小径に形成しても抵抗体24a・24bを安定に
保持することが可能であり、流路断面の減少を抑えると
共に、外部から紫外線を照射する際にさほど支障となら
ないで済む。
The resistor element 22 includes a support column 23, resistors 24a and 24b, and an end plate 25.
Can be easily manufactured by forming them separately from each other and joining them by welding or the like.
b itself can be formed relatively easily by casting or bending a plate material cut into a predetermined shape. Further, by arranging each of the resistors 24a and 24b between a plurality of columns 23 adjacent to each other, the columns 23 are firmly connected and integrated together with the end plate 25, and the rigidity of the entire resistor element 22 is increased. Therefore, even if the support column 23 is formed to have a relatively small diameter, the resistors 24a and 24b can be stably held, suppressing a decrease in the cross-section of the flow path, and significantly hindering external ultraviolet irradiation. You don't have to.

【0027】[0027]

【発明の効果】このように本発明によれば、減衰の大き
な短波長の紫外線でも抵抗体による攪拌作用により流通
流体に対して効率の良い照射処理が可能となり、食品製
造用上水等の殺菌・減菌処理はもとより、有機物、有機
塩素化合物、シアン、並びにアンモニア化合物の酸化分
解処理や、近年特に問題化しているダイオキシン等の難
分解性物質等の分解処理といったように幅広い分野にお
いて活用することが可能となる。しかも、抵抗体による
乱流により攪拌作用を得るため、小型化を図ると共に運
転コストの上昇を抑える上で顕著な効果が得られ、優れ
た処理能力を有する省エネルギー酸化反応器として利用
することができる。さらに、攪拌による混合機能により
複数の流体の混合処理と紫外線照射処理とを同時並行的
に行うことができ、設置スペースの削減並びにコストの
低減を図る上で大きな効果が得られる。
As described above, according to the present invention, it is possible to efficiently irradiate a flowing fluid by agitating action of a resistor even with a short-wavelength ultraviolet light having a large attenuation, thereby disinfecting clean water for food production.・ Use in a wide range of fields such as sterilization treatment, as well as oxidative decomposition treatment of organic substances, organic chlorine compounds, cyanide, and ammonia compounds, and decomposition treatment of hardly decomposable substances such as dioxin, which has become a particular problem in recent years. Becomes possible. In addition, since the stirring effect is obtained by the turbulent flow of the resistor, a remarkable effect is obtained in miniaturizing the device and suppressing an increase in the operating cost, and the device can be used as an energy-saving oxidation reactor having excellent processing capability. . Furthermore, the mixing process by agitation enables the mixing process of a plurality of fluids and the ultraviolet irradiation process to be performed simultaneously and in parallel, and a great effect can be obtained in reducing the installation space and cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に基づき構成された紫外線照射装置を示
す斜視図。
FIG. 1 is a perspective view showing an ultraviolet irradiation device configured according to the present invention.

【図2】図1に示したパイプを上流側から見た正面図。FIG. 2 is a front view of the pipe shown in FIG. 1 as viewed from the upstream side.

【図3】図1に示したパイプを軸線に直交する平面で切
断して示す断面図。
FIG. 3 is a cross-sectional view showing the pipe shown in FIG.

【図4】図1に示した紫外線照射装置を一部変更した例
を示す斜視図。
FIG. 4 is a perspective view showing an example in which the ultraviolet irradiation device shown in FIG. 1 is partially modified.

【図5】同じく図1に示した紫外線照射装置を一部変更
した例を示す斜視図。
FIG. 5 is a perspective view showing an example in which the ultraviolet irradiation device shown in FIG. 1 is partially modified.

【符号の説明】[Explanation of symbols]

1a〜1h 抵抗体 2 パイプ 3 T字管 4 制御ユニット 5 保護ガラス管 6・7 紫外線放電管 8 入口 9 出口 11 パイプ 12 抵抗体エレメント 13 円筒体 14a・14b 抵抗体 21 パイプ 22 抵抗体エレメント 23 支柱 24a・24b 抵抗体 25 端板 1a to 1h Resistor 2 Pipe 3 T-tube 4 Control unit 5 Protective glass tube 6.7 UV discharge tube 8 Inlet 9 Outlet 11 Pipe 12 Resistor element 13 Cylindrical body 14a / 14b Resistor 21 Pipe 22 Resistor element 23 Post 24a ・ 24b Resistor 25 End plate

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 処理すべき流体が内部を流通するパイ
プの中心部に棒状の紫外線ランプを同軸的に配置すると
共に、該紫外線ランプと前記パイプとの間の間隙に複数
の抵抗体を配設したことを特徴とする紫外線照射装置。
1. A rod-shaped ultraviolet lamp is coaxially arranged at the center of a pipe through which a fluid to be treated flows, and a plurality of resistors are arranged in a gap between the ultraviolet lamp and the pipe. An ultraviolet irradiation device, characterized in that:
【請求項2】 前記抵抗体の少なくとも表面部分を光
触媒材料で形成したことを特徴とする請求項1に記載の
紫外線照射装置。
2. The ultraviolet irradiation device according to claim 1, wherein at least a surface portion of said resistor is formed of a photocatalytic material.
【請求項3】 前記パイプを紫外線透過材料で形成し
て、該パイプの外側に配置された紫外線ランプからの紫
外線を前記パイプ内の流体に照射するようにしたことを
特徴とする請求項1若しくは請求項2に記載の紫外線照
射装置。
3. The pipe according to claim 1, wherein the pipe is formed of an ultraviolet ray transmitting material, and the fluid in the pipe is irradiated with ultraviolet rays from an ultraviolet lamp disposed outside the pipe. The ultraviolet irradiation device according to claim 2.
【請求項4】 複数の前記抵抗体は、共に外周側から
中心部に向けて細くなった略扇形をなす板状に形成され
たものであり、下流側に傾斜した状態で互いに接触しな
いように軸線方向に所定の間隔をおき、かつ前記パイプ
の周方向に順次所定角度ずつずらして設けられたことを
特徴とする請求項1乃至請求項3のいずれかに記載の紫
外線照射装置。
4. The plurality of resistors are formed in a substantially fan-shaped plate shape narrowing from an outer peripheral side toward a central portion, and are not in contact with each other in a state of being inclined downstream. The ultraviolet irradiation device according to any one of claims 1 to 3, wherein the ultraviolet irradiation device is provided at predetermined intervals in an axial direction and sequentially shifted by a predetermined angle in a circumferential direction of the pipe.
JP35484597A 1997-12-24 1997-12-24 UV irradiation equipment Expired - Fee Related JP3902304B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35484597A JP3902304B2 (en) 1997-12-24 1997-12-24 UV irradiation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35484597A JP3902304B2 (en) 1997-12-24 1997-12-24 UV irradiation equipment

Publications (2)

Publication Number Publication Date
JPH11179350A true JPH11179350A (en) 1999-07-06
JP3902304B2 JP3902304B2 (en) 2007-04-04

Family

ID=18440303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35484597A Expired - Fee Related JP3902304B2 (en) 1997-12-24 1997-12-24 UV irradiation equipment

Country Status (1)

Country Link
JP (1) JP3902304B2 (en)

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JP2007500055A (en) * 2003-05-08 2007-01-11 エコ−アールエックス, インコーポレイテッド System for purifying and removing contaminants from gaseous fluids
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Publication number Priority date Publication date Assignee Title
JP2007500055A (en) * 2003-05-08 2007-01-11 エコ−アールエックス, インコーポレイテッド System for purifying and removing contaminants from gaseous fluids
JP2010509042A (en) * 2006-11-08 2010-03-25 ヴェデコ アクチエンゲゼルシャフト Apparatus and method for improving mixing during UV disinfection of liquids
JP2010012443A (en) * 2008-07-07 2010-01-21 Noboru Sakano Ultrasonic wave treating device
KR100918514B1 (en) * 2008-08-12 2009-09-24 주식회사 21세기 하이테크 A water cleaning and sterilization device of the water
JP2010075916A (en) * 2008-08-29 2010-04-08 Meidensha Corp Ozone decomposing device and process system
JP2013523307A (en) * 2010-04-07 2013-06-17 ユーブイ−プラス カンパニー リミテッド UV fluid sterilizer suitable for sterilization of fluid with low UV transmittance
WO2014122185A1 (en) * 2013-02-05 2014-08-14 Ipurtech Limited Uv apparatus
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