JP2010008644A5 - - Google Patents

Download PDF

Info

Publication number
JP2010008644A5
JP2010008644A5 JP2008166972A JP2008166972A JP2010008644A5 JP 2010008644 A5 JP2010008644 A5 JP 2010008644A5 JP 2008166972 A JP2008166972 A JP 2008166972A JP 2008166972 A JP2008166972 A JP 2008166972A JP 2010008644 A5 JP2010008644 A5 JP 2010008644A5
Authority
JP
Japan
Prior art keywords
substrate
electrode
mirror
optical filter
protrusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008166972A
Other languages
Japanese (ja)
Other versions
JP2010008644A (en
JP5369515B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2008166972A priority Critical patent/JP5369515B2/en
Priority claimed from JP2008166972A external-priority patent/JP5369515B2/en
Publication of JP2010008644A publication Critical patent/JP2010008644A/en
Publication of JP2010008644A5 publication Critical patent/JP2010008644A5/ja
Application granted granted Critical
Publication of JP5369515B2 publication Critical patent/JP5369515B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (14)

第１基板と、A first substrate;
前記第１基板の一面に対向する第２基板と、  A second substrate facing one surface of the first substrate;
前記第１基板の一面に設けられ前記第１基板の厚み方向に変位する第１ミラーと、  A first mirror provided on one surface of the first substrate and displaced in a thickness direction of the first substrate;
前記第２基板に設けられ前記第１ミラーにギャップを介して対向する第２ミラーと、  A second mirror provided on the second substrate and facing the first mirror via a gap;
前記第１基板に設けられた第１電極と、  A first electrode provided on the first substrate;
前記第２基板に設けられ前記第１電極にギャップを介して対向する第２電極と、  A second electrode provided on the second substrate and facing the first electrode through a gap;
前記第１ミラーの前記変位により前記第１基板または前記第２基板と当接する突起と、を備えたことを特徴とする光フィルタ。  An optical filter comprising: a protrusion that contacts the first substrate or the second substrate by the displacement of the first mirror. 前記突起は、  The protrusion is
前記第１ミラーと前記第２ミラーとが当接するのを防止する第１の突起と、  A first protrusion for preventing the first mirror and the second mirror from contacting each other;
前記第１電極と前記第２電極とが当接するのを防止する第２の突起と、を有することを特徴とする請求項１記載の光フィルタ。  The optical filter according to claim 1, further comprising a second protrusion that prevents the first electrode and the second electrode from coming into contact with each other. 前記第１ミラーと前記第２ミラーとは平面視した状態で円形に形成され、The first mirror and the second mirror are formed in a circular shape in plan view,
前記第１電極と前記第２電極とは平面視した状態で、前記第１電極または前記第２電極を囲んだ円環状に形成されており、  The first electrode and the second electrode are formed in an annular shape surrounding the first electrode or the second electrode in a state in plan view,
前記突起は、前記第１ミラーまたは前記第２ミラーの前記円形の周方向に沿って配設され、あるいは、前記第１電極または前記第２電極の前記円環状の周方向に沿って配設されていることを特徴とする請求項１又は２に記載の光フィルタ。  The protrusion is disposed along the circular circumferential direction of the first mirror or the second mirror, or is disposed along the annular circumferential direction of the first electrode or the second electrode. The optical filter according to claim 1, wherein the optical filter is provided. 前記第１ミラーと前記第２ミラーとは平面視した状態で円形に形成され、The first mirror and the second mirror are formed in a circular shape in plan view,
前記第１電極と前記第２電極とは平面視した状態で、前記第１電極または前記第２電極を囲んだ円環状に形成されており、  The first electrode and the second electrode are formed in an annular shape surrounding the first electrode or the second electrode in a state in plan view,
前記突起は、前記第１ミラーまたは前記第２ミラーの前記円形の中心を通る直線上に沿って配設され、あるいは、前記第１電極または前記第２電極の前記円環における外周円の中心を通る直線上に沿って配設されていることを特徴とする請求項１又は２に記載の光フィルタ。  The protrusion is arranged along a straight line passing through the circular center of the first mirror or the second mirror, or the center of the outer circumference circle in the ring of the first electrode or the second electrode. The optical filter according to claim 1, wherein the optical filter is disposed along a straight line passing therethrough. 前記第１ミラーまたは前記第２ミラーの円形の中心を通る直線上に沿って配設された突起の列が、放射状に設けられ、又は、前記電極の円環における外周円の中心を通る直線上に沿って配設された突起の列が、放射状に設けられていることを特徴とする請求項４に記載の光フィルタ。A row of protrusions arranged along a straight line passing through the circular center of the first mirror or the second mirror is provided radially, or on a straight line passing through the center of the outer circumference of the circle of the electrode The optical filter according to claim 4, wherein the row of protrusions arranged along the radial direction is provided radially. 前記第１基板及び前記第２基板が透明材料であることを特徴とする請求項１〜５のいずれか一項に記載の光フィルタ。The optical filter according to claim 1, wherein the first substrate and the second substrate are made of a transparent material. 前記第１基板及び前記第２基板がシリコンであることを特徴とする請求項１〜５のいずれか一項に記載の光フィルタ。The optical filter according to claim 1, wherein the first substrate and the second substrate are silicon. 前記第１電極と前記第２電極とが当接するのを防止する前記第２の突起は、絶縁材料であることを特徴とする請求項２に記載の光フィルタ。The optical filter according to claim 2, wherein the second protrusion that prevents the first electrode and the second electrode from contacting each other is made of an insulating material. 前記突起は、前記第１基板あるいは前記第２基板の一部であることを特徴とする請求項１〜８のいずれか一項に記載の光フィルタ。The optical filter according to claim 1, wherein the protrusion is a part of the first substrate or the second substrate. 前記第１ミラーと前記第２ミラーとが当接するのを防止する突起が設けられ、前記突起は、前記第１電極または前記第２電極の形成材料であることを特徴とする請求項１〜８のいずれか一項に記載の光フィルタ。9. A protrusion for preventing the first mirror and the second mirror from contacting each other, wherein the protrusion is a material for forming the first electrode or the second electrode. The optical filter according to any one of the above. 第１基板の一方の面にミラーと電極とを設ける工程と、
第２基板の一方の面にミラーと電極とを設ける工程と、
前記第１基板と第２基板とを、それぞれの一方の面が対向するようにして一部を当接させ、残部を離間させるとともに、これら基板の対向する面間の離間した部位に、第１のギャップを介して前記ミラーを対向して配置し、かつ、第２のギャップを介して前記電極を対向して配置する工程と、
前記第１基板に、前記電極間の静電力によって変位し、前記第１のギャップを変化させる可動部を形成する工程と、を備え、
前記第１基板と第２基板との間に、前記一対のミラーが互いに当接するのに干渉し、あるいは前記一対の電極が互いに当接するのに干渉する突起を設ける工程を有することを特徴とする光フィルタの製造方法。 Providing a mirror and an electrode on one surface of the first substrate;
Providing a mirror and an electrode on one surface of the second substrate;
A part of the first substrate and the second substrate are brought into contact with each other so as to face each other, the remaining portion is separated, and the first substrate and the second substrate are separated from each other between the opposed surfaces of the first substrate. Disposing the mirror oppositely through the gap and disposing the electrode oppositely through the second gap;
Forming a movable portion that is displaced by an electrostatic force between the electrodes and changes the first gap on the first substrate, and
Providing a projection between the first substrate and the second substrate that interferes with the pair of mirrors coming into contact with each other or interferes with the pair of electrodes coming into contact with each other. Manufacturing method of optical filter. 前記基板に前記ミラーと前記電極とを設け、さらに前記第２のギャップを介して前記電極を対向して配置する際に、前記一対のミラーが互いに当接するのに干渉する前記突起を、前記電極の形成材料で形成することを特徴とする請求項１１記載の光フィルタの製造方法。   When the substrate is provided with the mirror and the electrode, and the electrode is disposed to face the second gap, the protrusion that interferes with the pair of mirrors coming into contact with each other is provided with the electrode. The method for manufacturing an optical filter according to claim 11, wherein the optical filter is formed of the forming material. 前記突起を、前記第１基板あるいは前記第２基板の一部で形成することを特徴とする請求項１１記載の光フィルタの製造方法。   12. The method of manufacturing an optical filter according to claim 11, wherein the protrusion is formed by a part of the first substrate or the second substrate. 第１基板と、前記第１基板の一面に対向する第２基板と、前記第１基板の一面に設けられ前記第１基板の厚み方向に変位する第１ミラーと、前記第２基板に設けられ前記第１ミラーにギャップを介して対向する第２ミラーと、前記第１基板に設けられた第１電極と、前記第２基板に設けられ前記第１電極にギャップを介して対向する第２電極と、を有し、前記第１ミラーの前記変位により前記第１基板または前記第２基板と当接する突起が設けられた光フィルタを備えた光学フィルタ装置モジュール。A first substrate; a second substrate facing one surface of the first substrate; a first mirror provided on one surface of the first substrate and displaced in a thickness direction of the first substrate; and provided on the second substrate. A second mirror opposed to the first mirror via a gap; a first electrode provided on the first substrate; and a second electrode provided on the second substrate opposed to the first electrode via a gap. And an optical filter device module provided with an optical filter provided with a protrusion that comes into contact with the first substrate or the second substrate by the displacement of the first mirror.
JP2008166972A 2008-06-26 2008-06-26 Optical filter, method for manufacturing the same, and optical filter device module Expired - Fee Related JP5369515B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008166972A JP5369515B2 (en) 2008-06-26 2008-06-26 Optical filter, method for manufacturing the same, and optical filter device module

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008166972A JP5369515B2 (en) 2008-06-26 2008-06-26 Optical filter, method for manufacturing the same, and optical filter device module

Publications (3)

Publication Number Publication Date
JP2010008644A JP2010008644A (en) 2010-01-14
JP2010008644A5 true JP2010008644A5 (en) 2011-07-21
JP5369515B2 JP5369515B2 (en) 2013-12-18

Family

ID=41589246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008166972A Expired - Fee Related JP5369515B2 (en) 2008-06-26 2008-06-26 Optical filter, method for manufacturing the same, and optical filter device module

Country Status (1)

Country Link
JP (1) JP5369515B2 (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5593671B2 (en) * 2009-10-05 2014-09-24 セイコーエプソン株式会社 Wavelength variable interference filter, colorimetric sensor, colorimetric module
JP5458983B2 (en) * 2010-03-15 2014-04-02 セイコーエプソン株式会社 Manufacturing method of optical filter
JP5589459B2 (en) 2010-03-15 2014-09-17 セイコーエプソン株式会社 Optical filter, optical filter module, analytical instrument and optical instrument
JP6010275B2 (en) 2010-03-15 2016-10-19 セイコーエプソン株式会社 Optical filter and analytical instrument and optical instrument using the same
JP5434719B2 (en) 2010-03-19 2014-03-05 セイコーエプソン株式会社 Optical filters and analytical instruments
JP5381884B2 (en) * 2010-04-16 2014-01-08 セイコーエプソン株式会社 Method for manufacturing tunable interference filter
JP5928992B2 (en) 2010-10-07 2016-06-01 セイコーエプソン株式会社 Method for manufacturing tunable interference filter
JP5177209B2 (en) 2010-11-24 2013-04-03 株式会社デンソー Fabry-Perot interferometer
JP5716412B2 (en) 2011-01-24 2015-05-13 セイコーエプソン株式会社 Wavelength variable interference filter, optical module, and optical analyzer
JP5909850B2 (en) 2011-02-15 2016-04-27 セイコーエプソン株式会社 Wavelength variable interference filter, optical module, and optical analyzer
JP5786424B2 (en) * 2011-04-11 2015-09-30 セイコーエプソン株式会社 Wavelength variable interference filter, optical module, and electronic device
JP6160055B2 (en) * 2012-10-01 2017-07-12 セイコーエプソン株式会社 Wavelength variable interference filter, method of manufacturing wavelength variable interference filter, optical apparatus and optical component
JP6107120B2 (en) * 2012-12-20 2017-04-05 セイコーエプソン株式会社 Optical filter device and electronic apparatus
JP6135365B2 (en) * 2013-07-29 2017-05-31 セイコーエプソン株式会社 Interference filter, optical filter device, optical module, electronic apparatus, manufacturing method of interference filter, and MEMS element
JP5915693B2 (en) * 2014-05-12 2016-05-11 セイコーエプソン株式会社 Optical filter, optical filter module, analytical instrument and optical instrument
JP2016065937A (en) * 2014-09-24 2016-04-28 パイオニア株式会社 Variable wavelength optical filter and manufacturing method therefor
JP5978506B2 (en) * 2014-11-14 2016-08-24 セイコーエプソン株式会社 Interference filter, optical module, and analyzer
JP6135707B2 (en) * 2015-05-07 2017-05-31 セイコーエプソン株式会社 Optical filter and analytical instrument and optical instrument using the same
JP2016029491A (en) * 2015-09-30 2016-03-03 セイコーエプソン株式会社 Wavelength variable interference filter, optical module, and optical analyzer
JP6168137B2 (en) * 2015-12-28 2017-07-26 セイコーエプソン株式会社 Optical filter, optical filter module, analytical instrument and optical instrument
JP2016095526A (en) * 2016-01-05 2016-05-26 セイコーエプソン株式会社 Wavelength variable interference filter, optical module and optical analysis device
US11474343B2 (en) 2016-11-20 2022-10-18 Unispectral Ltd. Tunable MEMS etalon device
JP6844355B2 (en) * 2017-03-17 2021-03-17 セイコーエプソン株式会社 Optical module and driving method of optical module
JP2017187799A (en) * 2017-06-27 2017-10-12 セイコーエプソン株式会社 Method for driving optical filter
JP6798566B2 (en) * 2019-01-09 2020-12-09 セイコーエプソン株式会社 Optical filter and optical filter module, analytical equipment and optical equipment
JP6754464B2 (en) * 2019-04-23 2020-09-09 パイオニア株式会社 Tunable optical filter
JP7200842B2 (en) 2019-06-21 2023-01-10 セイコーエプソン株式会社 Tunable Interference Filter

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07243963A (en) * 1994-03-07 1995-09-19 Yazaki Corp Optical resonator and manufacture thereof
JPH11211999A (en) * 1998-01-28 1999-08-06 Teijin Ltd Optical modulating element and display device
JP2003057438A (en) * 2001-08-09 2003-02-26 Yokogawa Electric Corp Fabry-perot filter
JP2003195189A (en) * 2001-12-25 2003-07-09 Fuji Photo Film Co Ltd Optical modulation element and its manufacturing method
JP2005031326A (en) * 2003-07-11 2005-02-03 Nippon Telegr & Teleph Corp <Ntt> Optical filter
JP2005305614A (en) * 2004-04-23 2005-11-04 Seiko Epson Corp Microstructure manufacturing method, microstructure, wavelength tunable optical filter, and micromirror
EP1779173A1 (en) * 2004-07-29 2007-05-02 Idc, Llc System and method for micro-electromechanical operating of an interferometric modulator
JP4561728B2 (en) * 2006-11-02 2010-10-13 セイコーエプソン株式会社 Optical device, optical device manufacturing method, tunable filter, tunable filter module, and optical spectrum analyzer

Similar Documents

Publication Publication Date Title
JP2010008644A5 (en)
JP5369515B2 (en) Optical filter, method for manufacturing the same, and optical filter device module
KR101761982B1 (en) Mems device
JP2004530897A5 (en)
JP2013525828A5 (en)
JP2012521565A5 (en)
RU2009149664A (en) PAINTED CONTACT LENSES HAVING A DEPTH EFFECT
JP2012220656A5 (en)
US20120167683A1 (en) MEMS device and deformation protection structure therefor and method for making same
TWI634069B (en) Hybrid integrated component and process for its production
JP2010103701A (en) Mems sensor
JP2008129149A (en) Tunable spectroscopic element
JP2007303922A (en) Capacitive pressure sensor
JP6481265B2 (en) MEMS element
KR101115419B1 (en) Manufacturing method of capacitive force sensor using heat adhesive tape
JP6187376B2 (en) Fabry-Perot interferometer
JP5515314B2 (en) Wavelength selective infrared detector
JP2009111243A5 (en)
WO2012142845A1 (en) Mems light valve, display device and forming method thereof
JP2008039595A (en) Capacitance acceleration sensor
JP2017181435A (en) Stress sensor
JP2012065524A5 (en)
JP6882850B2 (en) Stress sensor
TWI836324B (en) Microelectromechanical infrared sensing appartus and fabrication method thereof
JP2013181863A (en) Mems element and method for manufacturing mems element