JPH11211999A - Optical modulating element and display device - Google Patents

Optical modulating element and display device

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Publication number
JPH11211999A
JPH11211999A JP1552098A JP1552098A JPH11211999A JP H11211999 A JPH11211999 A JP H11211999A JP 1552098 A JP1552098 A JP 1552098A JP 1552098 A JP1552098 A JP 1552098A JP H11211999 A JPH11211999 A JP H11211999A
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substrates
layer
thickness
light
cell
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JP1552098A
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Japanese (ja)
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Tatsuichiro Kin
Toshiaki Yatabe
俊明 谷田部
辰一郎 金
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Teijin Ltd
帝人株式会社
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Priority to JP1552098A priority Critical patent/JPH11211999A/en
Publication of JPH11211999A publication Critical patent/JPH11211999A/en
Application status is Pending legal-status Critical

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B26/00Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
    • G02B26/001Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating based on interference in an adjustable optical cavity

Abstract

PROBLEM TO BE SOLVED: To provide a novel optical modulating element and a display device for which no polarizing plate is used.
SOLUTION: This device is composed of two substrates, one of which is transparent at least, arranged while being opposed and a supporting structure for supporting both the substrates and has a cell having the void layer with thickness from 0.05 to 20 μm and an outer means capable of changing the thickness of this void layer. Then, this optical modulating element changes the spectrum pattern of light transmitted through or reflected on the cell based on the interference effect of reflected light on two interfaces of the said void layer and both the substrates, and the display device arranges these optical modulating elements in the shape of one-dimensional array or two-dimensional matrix.
COPYRIGHT: (C)1999,JPO

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【発明の属する技術分野】本発明は光変調素子およびそれを用いた表示装置に関する。 The present invention relates to relates to a display apparatus using an optical modulation element, and it. かかる表示装置は光演算処理装置や光の色を時間的に変化させることができるカラー照明装置等の構成部品として、もしくは各種メーターのインジケーター、各種コンピューター、携帯情報端末等のモニター等の用途に好適に用いることができる。 As the display device components such as a color lighting apparatus capable of changing the color of the light processing unit and the light temporally, or indicator of various meters, various computer suitable for applications such as a monitor, such as portable information terminals it can be used for.

【0002】 [0002]

【従来の技術】近年パソコンその他各種機器のモニターとして液晶表示装置が広く用いられるようになってきている。 2. Description of the Related Art As a monitor of recent years, personal computers and other various devices have come to a liquid crystal display device is widely used. しかしながらこれらの液晶表示装置は偏光板による光の吸収という問題があり、明るい表示が得られにくいといった問題がある。 However, these liquid crystal display device has a problem that the absorption of light by the polarizing plate, there is a problem bright display is difficult to obtain.

【0003】 [0003]

【発明の解決しようとする課題】本発明は前述した問題点を解決するために、偏光板を用いない新規な光変調素子および表示装置を供給することを目的とする。 [To be solved problem of the invention The present invention is to solve the above problems, and an object thereof is to provide a novel optical modulation device and a display device using no polarizing plate.

【0004】 [0004]

【課題を解決するための手段】本発明は、少なくとも一枚が透明な対向配置された二枚の基板と、両基板を支持するための支持構造とからなり、厚さが0.05〜20 SUMMARY OF THE INVENTION The present invention comprises a two substrates at least one is transparent opposed, a support structure for supporting the substrates, the thickness of 0.05 to 20
μmの空隙層を有するセルと、該空隙層の厚みを変化させ得る外的手段とを有し、空隙層と両基板との二界面での反射光の干渉効果に基づきセルを透過もしくは反射する光のスペクトルパターンを変化させることを特徴とする光変調素子であり、更にはこのセルを一次元のアレー状もしくは二次元のマトリクス状に配列させ、各セルの空隙層の厚みを個別に変化させる外的手段を用いて各種情報の表示を行う表示装置である。 A cell having a void layer of [mu] m, and an external unit capable of changing the thickness of said void layer, transmits or reflects the cell based on the interference effect of the reflected light in two interface between the gap layer and the substrates an optical modulation element characterized by varying the spectral pattern of light, even by arranging the cell in a one-dimensional array-like or two-dimensional matrix, changing individually the thickness of the space layer of each cell a display device for displaying various information using external means.

【0005】本発明の光変調素子は、空隙層を有するセルおよび該空隙層の厚みを変化させ得る外的手段とを有する。 [0005] The light modulation elements according to the invention comprises an outer means capable of changing the thickness of the cell and said void layer having a void layer. そしてかかるセルは、対向配置された少なくとも一枚が透明な二枚の基板と両基板を対向支持するための支持構造から構成される。 And such cell is composed of at least one disposed opposite the two substrates and the substrates a transparent and a support structure for facing supporting.

【0006】本発明において、空隙層は、空気もしくは窒素、アルゴン等の不活性な気体が封入された層、もしくは真空層である事が好ましい。 [0006] In the present invention, the gap layer, it is preferred air or nitrogen, inert gas such as argon layer are enclosed, or is a vacuum layer. 前述のセル構造においてこの空隙層の厚みが非常に薄い場合には、被変調光が自然光や蛍光ランプの照明光等であっても基板と空隙層の二つの界面の反射光の間で強い光干渉が起こり、観測光には光強度の極大、極小ピーク(以下干渉ピークと記す)を有するスペクトルパターンがはっきりと観察される。 When the thickness of the space layer is very thin in the cell structure described above, intense light between the reflected light of the two interface between the substrate and the porous layer even illumination, etc. of the modulated light is natural light or fluorescent lamp interference occurs, the maximum light intensity in the observation light, the spectral pattern with the minimum peak (hereinafter referred to as interference peaks) is clearly observed.

【0007】一般に空隙層の厚みがあまり厚くなると二つの界面反射光の光干渉性が低下してしまい、また逆に薄すぎても光変調効率が低下するため、空隙層の厚みはおよそ0.05〜20μmの範囲において変化させることが好ましい。 [0007] Generally for the thickness of the gap layer to decrease too thick becomes the cause reduced light interference of two interface reflection light and the optical modulation efficiency is too thin Conversely, the thickness of the gap layer is approximately zero. it is preferable to change the range of 05~20Myuemu.

【0008】ところで前述の光干渉によるスペクトルパターンは空隙層の屈折率と厚みの条件により変化することから、外的な手段を用いて空隙層の厚みを変化させることによりセルを透過もしくは反射する光のスペクトルパターンおよび色相を変化させることができ、またレーザー光等の単一波長の光もしくは色フィルター等により選択された特定波長領域の光の強度を変化させることができる。 By the way the aforementioned spectral pattern due to light interference from changing the conditions of the refractive index and the thickness of the gap layer, the light transmitted through or reflected cells by changing the thickness of the gap layer with external means of it is possible to change the spectral pattern and hue, also it is possible to change the intensity of light in a specific wavelength region selected by the light or the color filter or the like of a single wavelength such as a laser beam.

【0009】本発明の光変調素子において、空隙層の厚みを変化させる外的手段の方法としては、たとえば直流電源、交流電源等の電荷供給源と、トランジスタおよびトランジスタアレー等によるスイッチング回路、各種C [0009] In the optical modulator of this invention, as a method of external means for varying the thickness of the gap layer, for example a direct current power source, a charge supply source such as the AC power supply, the switching circuit by the transistor and the transistor array or the like, various C
PU、メモリー等を組み合わせてなるプログラム信号発生装置等の電荷供給装置により、対向基板間に静電気力や静磁気力を働かせて引力、斥力を発生させる方法、もしくはマグネット、電磁コイル、圧電素子、電歪素子、 PU, the charge supply device program signal generating device or the like comprising a combination of memory and the like, methods exert an electrostatic force or magnetostatic force between the opposed substrate attraction, to generate a repulsive force or magnets, electromagnetic coils, piezoelectric elements, electrostatic strain element,
磁歪素子、歪抵抗線等を同様の方法で駆動することにより基板を変位させる方法、もしくは空隙層を熱的に膨張、収縮させる方法等が挙げられる。 Magnetostrictive element, the method to displace the substrate by driving in the same way a strain resistance wire or the like or a thermally expanding the gap layer, a method, and the like to shrink.

【0010】これらの方法においては空隙層の厚みの変化は基板のたわみ変形もしくは支持構造の膜厚方向の変形およびこれらの弾性回復によってもたらされる。 [0010] change in the thickness of the space layer in these methods is provided by deformation and these elastic recovery of the film thickness direction of the deflection deformation or support structure of the substrate. すなわち基板が軟質で変形しやすく支持構造が硬質で変形しにくいように設計した場合、空隙層の厚み変化は主に基板のたわみ変形による事になりり、基板が硬質で変形しにくいものを用い支持構造に軟質で変形しやすいように設計した場合には、主に支持構造の膜厚方向の厚み変化による事になる。 That is, when the substrate is deformed easily support structure soft is designed to hardly deform a hard, change in thickness of the space layer is mainly used Nariri, what substrate is less likely to deform in rigid that by bending deformation of the substrate when designed to support structure as easily deformed soft will be due primarily to the thickness direction of the change in thickness of the support structure. ここで前者の基板の変形を用いる場合には支持構造はセルの周囲部分にのみ形成される事が好ましく(図1、図2に例示)、後者の支持構造の変形を用いる場合には支持構造が基板全面に適度な密度で分散形成されていることが好ましい。 Here the support structure is preferably formed only on the peripheral portion of the cell in the case of using the deformation of the former substrate (Fig. 1, illustrated in FIG. 2), in the case of using a deformation of the latter support structure supporting structure There is preferably dispersed formed at moderate density on the entire surface of the substrate.

【0011】尚、前者の場合には支持構造が形成された部分もしくはその周囲の部分が光変調に関与しないデットスペースになる事から、これらの部分に光吸収層を形成したり、これらのデッドスペースに光が入射しないように設計したマイクロレンズ等を基板上に設けるといった方法も好ましい。 [0011] Incidentally, the fact that part of the support structure forming portion or periphery thereof is dead space which is not involved in the optical modulation in the case of the former, or to form a light-absorbing layer in these parts, these dead a method such as providing the microlenses light is designed so as not to enter the space on the substrate preferably.

【0012】支持構造を形成する材料に関しては特に限定されないが、エラストマーを含む熱可塑性樹脂、熱硬化樹脂、紫外線硬化樹脂、セラミック材料、金属材料等各種のものが挙げられ、前述のようにセルの設計により軟質、硬質の選択が為される。 [0012] Not specifically defined, the material for forming the support structure, the thermoplastic resin containing an elastomer, thermosetting resin, ultraviolet curable resin, ceramic material, include those of a metal material such as various, cells as described above soft, selection of hard is made by design. これら支持構造のパターニング方法としては印刷法やホトリソグラフィー法、レーザーエッチング法、プラズマエッチング法等の方法の適用が可能であるが、特に熱可塑性樹脂を用いる場合には、熱可塑性高分子フィルムを打ち抜いてパターンを形成した後に基板上にラミネートする方法等も用いる事ができる。 Printing method or photolithography as the patterning method of the support structure, laser etching method, it is possible to apply a method such as a plasma etching method, particularly when using a thermoplastic resin, punched thermoplastic polymer film how to laminate on the substrate after forming the pattern Te or the like can also be used. 尚、前述の印刷法を用いた場合、粒径のそろった真球状のシリカ、プラスチックビーズ等のスペーサー材料をマトリクス中に分散させることにより、空隙層の厚みの微調整が可能である。 In the case of using the printing method described above, spherical silica having a uniform particle size, by dispersing a spacer material such as plastic beads in a matrix, it is possible to finely adjust the thickness of the gap layer.

【0013】又、前述のように本発明の光変調素子は、 [0013] Also, light modulation element of the present invention as described above,
光変調の原理として光干渉効果を用いていることから、 From the fact that using an optical interference effect as the principle of light modulation,
より効果的な光変調を行うために光変調を行う波長域での基板と空隙層界面の反射率をある程度高く設計することが好ましい。 It is preferable to some extent designed higher substrate and reflectivity of the gap layer interface in the wavelength range for performing optical modulation for more efficient optical modulator.

【0014】このためには、例えば光学膜厚値(膜厚× [0014] For this purpose, for example optical thickness value (thickness ×
屈折率)を前記波長域にあわせて適切に設定した高屈折率層を基板上に一層形成する方法を用いることができるが、さらに高い反射率を得るためには、例えば最表面層を高屈折率層として高屈折率層と低屈折率層を交互に積層する方法(図6に例示)等を用いることができる。 Although a high refractive index layer was set appropriately combined refractive index) in the wavelength range can be used a method of further formed on the substrate, in order to obtain a high reflectance, for example high refractive outermost surface layer a high refractive index layer and a low refractive index layer can be used and a method of alternately stacked (illustrated in FIG. 6) as a percentage layer.

【0015】このような高屈折率層としては、たとえば酸化チタン、酸化ジルコニウム、酸化タンタル、酸化インジウム、酸化錫、酸化パラジウム、インジウム錫酸化物(以下ITOと記す)等が挙げられ、低屈折率層としては酸化珪素、酸化アルミニウム等の金属酸化物層等が挙げられる。 [0015] Examples of such a high refractive index layer, for example titanium oxide, zirconium oxide, tantalum oxide, indium oxide, tin oxide, palladium oxide, (hereinafter referred to as ITO), indium tin oxide and the like, a low refractive index the layer of silicon oxide, metal oxide layer such as aluminum oxide. これらの層は、真空蒸着、スパッタリング、イオンプレーティング、CVD等の真空プロセスもしくはゾルゲル法等の湿式プロセス等により形成することができる。 These layers can be formed by vacuum deposition, sputtering, ion plating, wet process such as a vacuum process or a sol-gel method such as CVD.

【0016】本発明の光変調素子を構成する基板は2枚が対向に配置されている。 The substrate constituting the optical modulator device of the present invention has two are disposed opposite. かかる基板としてはガラス、 Glass as such substrates are,
プラスチック等の各種の材料を用いることができる。 Various materials such as plastic can be used. かかる素子を透過型として用いる場合には二枚の基板の透明性が高いことが好ましいが、反射型として用いる場合は観察側から見て背面側の基板(以下背面基板と記す) It preferably has high transparency two substrates in case of using such a device as a transmission type, (hereinafter referred to as a rear substrate) the back side of the substrate as viewed from the observation side is used as a reflective type
にはむしろ透明性の低い基板を用いることが好ましい。 It is preferable to use a low substrate rather transparent to.

【0017】このような透明性の低い基板の例としては例えば色ガラスのように各種色素、顔料、カーボンブラック等を高分子、セラミック等のバインダ中に分散したものを成形したり、適当な基体上にコーティングしてなる光吸収性基板、アルミニウム、銀、クロム、ニッケルその他の金属を成形したり、適当な基体上にコーティングしてなる光反射性基板、ならびに各種の光散乱性基板等が挙げられる。 [0017] or by molding which is dispersed various dyes as in the example The example colored glass such transparency low substrate, pigments, and carbon black polymer, a binder such as ceramics, a suitable substrate light absorbing substrate obtained by coating the above, aluminum, like silver, chromium, nickel or molding the other metal, light-reflective substrate obtained by coating on a suitable substrate, and various light-scattering substrate or the like It is. 尚、該素子を半透過型で用いる場合には背面基板の光吸収性、光反射性、光散乱性を若干弱めることにより光がある程度透過することができるようにすれば良い。 The optical absorption of the rear substrate in the case of using the element in the semi-transmissive, light reflectivity, light may be such that it can be transmitted to some extent by weakening the light scattering properties slightly.

【0018】またかかる素子を透過型で用いる場合には、観察側から見て表示部の背面に適当な照明装置を設けることが好ましい。 [0018] When using such a device with a transmission, it is preferable to provide a suitable lighting device on the back of the display unit as viewed from the observation side. このような照明装置としては一般の蛍光ランプ、エレクトロルミネセンス(EL)ランプ、LED等が挙げられるが、面状の照明が必要となる場合には面状の導光板とその端部に配置されたエッジランプおよび光拡散板等からなるバックライトシステム等も好ましく用いられる。 Such a general fluorescent lamp as a lighting device, an electroluminescent (EL) lamp, but LED and the like, when the illumination planar is required is disposed with its end surface of the light guide plate the backlight system and the like consisting of an edge light and a light diffusing plate, etc. were also used preferably.

【0019】またかかる素子の光出射側の最表面には外部光の表面反射を防ぐ反射防止処理を行う事も好ましく行われる。 [0019] carrying out a reflection preventing process for preventing the surface reflection of external light on the outermost surface of the light emitting side of such elements is also preferred. このような反射防止処理としては、例えば最表面に屈折率の異なる薄膜層を積層して光干渉により反射を減じる方法や最表面を粗面化して適度に光を散乱させる等の方法等が挙げられる。 As such a reflection preventing treatment, and a method can be mentioned, such as that scatter appropriately light or a method outermost surface to reduce reflected roughened by light interference by stacking different thin film layer refractive index, for example, the outermost surface It is.

【0020】ところで本発明の光変調素子において、光変調方法として静電気力を利用する場合には、基板上に蓄積する電荷量を自由にコントロールできるような電荷蓄積可能な基板を用いる必要がある。 By the way in the optical modulator of this invention, when utilizing electrostatic force as an optical modulation method, it is necessary to use a charge accumulable substrate, such as can be freely controlled amount of charges accumulated on the substrate. このため少なくとも基板は導電性を有することが好ましく、導電性の基板もしくは導電層が表面に形成された基板が好ましく用いられる。 Therefore, at least the substrate preferably has a conductive substrate a conductive substrate or a conductive layer formed on the surface is preferably used. これらの基板としてはアルミニウム、銀、クロム、ニッケル等の金属を成形もしくはコーティングした基板、金属、カーボン等の導電性微粒子をバインダ中に分散して成形もしくはコーティングした基板等が挙げられるが、かかる素子においては二枚の基板のうち少なくとも一方は透明である必要があり、これにはITO層等の透明電極層を真空蒸着、スパッタリング等の方法でコーティングした基板を好ましく用いることができる。 Aluminum as these substrates, silver, chromium, substrate obtained by molding or coating a metal such as nickel, a metal, although substrates such as conductive fine particles such as molded or coated by dispersing in a binder carbon and the like, such elements requires at least one of the two substrates is transparent in there is, this can be preferably used a substrate a transparent electrode layer of ITO layer or the like is coated by vacuum deposition, sputtering or the like.
尚、前述のように基板と空隙層の界面の反射率を高める目的で、透明導電層を少なくとも一層の高屈折率層として含み、最表面層を高屈折率層として高屈折率層と低屈折率層を交互に重ね合わせた積層体がコーティングされた基板(図6に例示)を用いることも好ましい。 In order to increase the reflectivity of the interface between the substrate and the porous layer as described above, wherein the transparent conductive layer as at least one layer of high refractive index layer, high refractive index layer and a low refractive the outermost layer as a high refractive index layer it is also preferred to use a substrate laminate obtained by superposing the rate layer alternately coated (illustrated in Figure 6).

【0021】尚、前記において電極がコーティングされた基板を用いる場合には、電極面が形成されている側の基板面が空隙層に接するようにしてセルを作成することが好ましいが、基板が厚み数ミクロン以下の薄いものである場合には必ずしも電極面は空隙層に接していなくとも良い。 [0021] In the case of using a substrate on which electrodes are coated in above, it is preferable that the substrate surface on the side where the electrode surface is formed to create a cell and in contact with the gap layer, the substrate thickness necessarily electrode surface may not have contact with the gap layer in the case of those less thin few microns.

【0022】ここで外部電気回路によりセルに適当な直流電圧を印可した場合には両基板上に異なる極性の電荷が蓄積されるため基板間に静電引力が発生し、逆に両基板に同極性の電荷を蓄積させた場合には静電斥力が発生する結果、前者の場合空隙層の厚みの減少、後者の場合厚みの増加が発生する。 The same where the electrostatic attraction is generated between the substrates the polarity of charges different on both substrates is accumulated in the case of applying an external electric circuit suitable DC voltage to the cell by, conversely to the substrates results if allowed to accumulate polarity of charge the electrostatic repulsive force is generated, the decrease in the thickness of the former case the void layer, an increase in thickness in the latter case occurs.

【0023】尚、前記セルにおいては両電極の短絡防止の目的で一方もしくは両方の電極上に薄い透明な絶縁層を形成(図3に例示)したり、絶縁性のスペーサーを分散すること(図4に例示)も必要に応じて行われる。 [0023] Incidentally, or to form a thin transparent insulating layer on one or both of the electrodes for the purpose of preventing short-circuiting of the electrodes (illustrated in FIG. 3) in the cell, distributing the insulating spacers (Fig. 4 to illustrate) is also performed as needed.

【0024】透明絶縁層としては、酸化チタン、チタン酸バリウム、酸化タンタル等の屈折率の高い金属酸化物層等が好ましく用いられ、絶縁性のスペーサーとしては前述の支持構造を形成する材料として例示した各種材料のうちで所定の絶縁性を有するものが使用できる。 [0024] As the transparent insulating layer, titanium oxide, barium titanate, a high metal oxide layer or the like is used preferably refractive index of tantalum oxide, exemplified as the material for forming the aforementioned support structure as an insulating spacer having a predetermined insulation property can be used among the various materials.

【0025】また本発明の光変調素子の光変調方法に関して圧電素子による基板の変位を用いる場合のセル構造については、例えば図7に示す構造や図8に示す構造等が挙げられる。 [0025] The cell structure in the case of using the displacement of the substrate by the piezoelectric element with respect to also the light modulation method of the optical modulator of the present invention include for example the structure such as shown in structure and 8 shown in FIG. 7. 前者は、両面に電極層が形成された圧電性を有する層(以下まとめて圧電駆動部と記す)がセルを構成する一方の基板の片面に形成されており、他方の基板と圧電駆動部との間に空隙層を有するような構造になっている。 The former, (referred to as a piezoelectric drive unit collectively hereinafter) layer having a piezoelectric property of the electrode layer is formed on both surfaces are formed on one surface of one of the substrates constituting the cell, and the other substrate and the piezoelectric drive unit It has a structure having an air gap layer between. 後者は圧電駆動部がセルの支持構造となっており、セルの二枚の基板間に空隙層を有する構造である。 The latter has become the piezoelectric driving unit and the support structure of the cell, a structure having an air gap layer between two substrates of the cell.

【0026】両者とも電圧印加時に厚み方向の変位を生じるような圧電駆動部が用いられ、外部からの電圧印加により圧電駆動部の厚みを変化させる事により空隙層の厚みを変化させる事ができる。 [0026] During Both voltage application piezoelectric driving unit such as occur the displacement in the thickness direction is used, it is possible to vary the thickness of the gap layer by changing the thickness of the piezoelectric driving unit by applying a voltage from the outside. ここで圧電性を有する層は、例えばチタン酸バリウム、ニオブ酸リチウム等の無機系の圧電材料やポリフッ化ビニリデン等の有機系の圧電材料により作成することができる。 Here the layer having a piezoelectric property, can be prepared, for example, barium titanate, an organic-based piezoelectric material such as piezoelectric material and polyvinylidene fluoride inorganic lithium niobate.

【0027】なお圧電駆動部は適当な接着剤を用いて基板と強く接着させることが好ましいが、これらの構造では圧電駆動層や接着層の厚みで空隙層の厚みが決定されてしまう事から、場合によっては図8に示すような空隙層の厚みを最適な値に調整するための層を基板上に設ける等の方法が好ましく用いられる。 It should be noted piezo drive While it is preferred to adhere strongly to the substrate using a suitable adhesive, since it would be determined the thickness of the gap layer in the thickness of the piezoelectric drive layer and the adhesive layer in these structures, optionally method such as a layer for adjusting the thickness optimum value of the gap layer as shown in FIG. 8 on the substrate is preferably used.

【0028】ところで前述の静電気力や圧電変位により空隙層の厚みの変化を引き起こす方法を用いる場合には、空隙層の厚みが印加電圧の絶対値に追随して変化することから、様々な電圧駆動波形での光変調が可能である。 By the way in the case of using a method of causing a change in the thickness of the gap layer by electrostatic force or a piezoelectric displacement of the foregoing, since the thickness of the gap layer is changed following the absolute value of the applied voltage, a variety of voltage drive it is possible to light modulation waveform.

【0029】本発明における光変調素子において、各セルを個別に駆動する方法に関しては、単位セルが基本的にキャパシタンス構造を有していることから、セグメント(スタチック)駆動方式もしくはアクティブマトリクス駆動方式等の適用が好ましい。 [0029] In the optical modulator device of the present invention, for the method of driving each cell separately, since the unit cell has a basic capacitance structure segment (static) driving method or an active matrix driving method or the like application is preferred.

【0030】ここでセグメント駆動を行う場合には、光変調駆動に人間の可聴音域未満の周波数の波形(以下光変調信号と記す)を用い、この駆動波形に可聴音域の周波数の波形(以下音響信号と記す)を重畳することにより、本装置は光変調機能と音源としての機能の両方を兼ねることができる。 [0030] When performing here segment drive uses the human audible range than the frequency of the waveform (hereinafter referred to as the optical modulation signal) to the light modulation driving, the frequency of the waveform in the audible range to the drive waveform (hereinafter acoustic by superimposing referred to as signals), the apparatus can also serve as both the function as an optical modulation function and the sound source.

【0031】ただしこの場合、あらかじめ光変調の1周期あたりの音響信号の平均実効電圧を算出しておき、その電圧値を逆バイアスした光変調信号をかける必要がある。 [0031] However, in this case, advance to calculate the average effective voltage of the audio signal per one period in advance optical modulation, it is necessary to apply a modulated optical signal obtained by the reverse bias the voltage value.

【0032】本発明の光変調素子は、該素子を構成するセルを一次元のアレー状もしくは二次元のマトリクス状に配列して表示部とし、各セルの空隙層の厚みを個別に変化させ得る上記の如き外的手段を付与して、各種情報の表示を行う表示装置に利用することができる。 The light modulation element of the present invention, the display unit by arranging cells of the device to an one-dimensional array-like or two-dimensional matrix can individually alter the thickness of the space layer of each cell by applying the above-mentioned external means, it can be utilized for a display device for displaying various information. あるいはかかる光変調素子を一次元のアレー状もしくは二次元のマトリクス状に配列することにより各種情報の表示を行う表示装置として有用である。 Or it is useful as a display device for displaying various information by arranging such light modulation elements in a one-dimensional array-like or two-dimensional matrix.

【0033】かかる表示装置は光演算処理装置や光の色を時間的に変化させることができるカラー照明装置等の構成部品として、もしくは各種メーターのインジケーター、各種コンピューター、携帯情報端末等のモニター等の用途に好適に用いることができる。 [0033] As the display device components such as a color lighting apparatus capable of changing the color of the light processing unit and the light temporally, or indicator of various meters, various computers, such as a monitor or the like of the portable information terminal it can be suitably used for applications.

【0034】 [0034]

【実施例】以下、本発明を更に詳しく説明するために実施例を記すが、本発明はこの実施例に限定されるものではなく、当業者であれば容易に類推てきる様々な形態での実施が可能である。 EXAMPLES Hereinafter, referred the embodiment in order to explain the present invention in more detail, the present invention is not limited to this embodiment, in various forms Kiru Te easily inferred by those skilled in the art implementation is possible.

【0035】なお以下の光学的測定に関しては日立製分光光度計U−3500の直達透過率測定モードを用いて行ったものである。 It should be noted with respect to the following optical measurements in which was performed using the direct transmittance measurement mode Hitachi spectrophotometer U-3500.

【0036】[実施例1]0.7mm厚の2枚のガラス基板上にインジウム/錫=95:5重量比のITOターゲットを使用して約30nm厚、面積抵抗約150オーム/□のITO層をスパッタリングにより形成した。 [0036] [Example 1] 0.7 mm thick two indium glass substrate / tin = 95: about 30nm thick using an ITO target of 5 weight ratio, sheet resistance of about 150 ohms / □ ITO layer It was formed by sputtering. 続いて両基板のITO層上に市販の感光性レジストをスピンコーターにより塗布した後、公知の方法を用いてIT Subsequently was applied by a spin coater commercially available photosensitive resist on the ITO layer of the substrates, IT using methods known
O層のパターニングを行い、10mm角の電極部と配線部からなる3×3の電極パターン(図1に図示)を形成した。 To pattern the O layer was formed composed of the wiring portion electrode of 10mm square 3 × 3 of the electrode pattern (shown in Figure 1).

【0037】つぎにこの一方の基板上のITO電極部の周囲に図1に図示したようなパターンで、4ミクロンの粒径の真球プラスチックビーズ(積水ファインケミカル社製商品名ミクロパールMP204)を2重量%分散したエポキシ系樹脂とアミン系硬化触媒からなる樹脂材料をスクリーン印刷した後、二つの基板がそれぞれの電極部が対向して重なり合うような配置で貼り合わせ、両面を金属板で押さえつけながら80℃で30分の熱処理を行った後、130℃で1時間の熱処理を行い印刷層を硬化させて支持構造を形成し、単位セルが3×3のマトリクス状に配列した透明電極セルを作成した。 Next in a pattern as illustrated in FIG. 1 around the ITO electrode portions on the substrate in this one, 4 micron particle size of the true spherical plastic beads (Sekisui Fine Chemical Co., trade name Micropearl the MP 204) 2 after the resin material was screen printed consisting wt% dispersed epoxy resin and an amine curing catalyst, bonded in place such as to overlap with the two substrates to face each of the electrode portions, while pressing on both sides with a metal plate 80 after heat treatment for 30 minutes was performed at ° C., to cure the printed layer was heat-treated for 1 hour at 130 ° C. the support structure formed to prepare a transparent electrode cell unit cells arranged in a matrix of 3 × 3 .

【0038】こうして作成した透明電極セルを構成する一つの単位セルを選択し、その空隙層(空気層)の厚みを光干渉法により測定したところ3.98ミクロンであった。 [0038] Thus by selecting one of the unit cells constituting the transparent electrode cell created, it was 3.98 microns was measured by optical interferometry the thickness of the space layer (air layer).

【0039】引き続いてこのセルの両電極間に70Vの直流電圧を印可したところ、空隙層の厚みは3.85ミクロンに減少し、セルの光透過スペクトルのパターンが大きく変化した(図10に図示)。 [0039] Subsequently was by applying a DC voltage of 70V between the electrodes of the cell, decreasing the thickness 3.85 micron gap layer, the pattern of the light transmission spectrum of the cell is greatly changed (shown in Figure 10 ). 尚この時波長550 It should be noted that when the wavelength 550
nmにおける光透過率は電圧無印可時には約67.8% Light transmittance at nm is at no voltage friendly about 67.8%
であったが、電圧印可時には約81.0%と大きく変化した。 Which it was at, but when the voltage applied was changed greatly to about 81.0%.

【0040】 [0040]

【発明の効果】本発明によれば、偏光板を用いない新規な表示装置を供給することが可能となり、本分野の発展に貢献するところ大である。 According to the present invention, it is possible to supply a novel display device using no polarizing plate, a large place to contribute to the development of the art.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】本発明の実施例に用いたITO層ならびに支持構造がパターン状に形成された基板面の模式図である。 1 is a schematic view of a substrate surface on which the ITO layer and the support structure used in the embodiment is formed in a pattern of the present invention.

【図2】本発明において静電気力を用いるセルの単位構造の一例で、実施例に用いた透明電極セルの単位構造を示す断面模式図である。 In one example of the unit structure of the cell using the electrostatic force in the present invention, FIG, it is a schematic sectional view showing a unit structure of the transparent electrode cell used in the Examples.

【図3】本発明における静電気力を用いるセルの単位構造の一例を示す断面模式図である。 It is a schematic sectional view showing an example of a unit structure of the cell using the electrostatic force in the invention, FIG.

【図4】本発明における静電気力を用いるセルの単位構造の一例を示す断面模式図である。 It is a schematic sectional view showing an example of a unit structure of the cell using the electrostatic force in the present invention; FIG.

【図5】本発明における静電気力を用いるセルの単位構造の一例を示す断面模式図であり、反射型の画像表示装置に好適なセル構造である。 [Figure 5] is a schematic sectional view showing an example of a unit structure of the cell using the electrostatic force in the present invention, the preferred cell structure in the reflection type image display device.

【図6】本発明において基板表面の反射率を高める場合に用いられる積層体構造の一例を示す断面模式図である。 Is a schematic sectional view showing an example of the laminate structure used when increasing the reflectivity of the substrate surface in the present invention; FIG.

【図7】本発明における圧電素子を用いたセルの単位構造の一例を示す断面模式図である。 It is a schematic sectional view showing an example of a unit structure of the cell using a piezoelectric element in the present invention; FIG.

【図8】本発明における圧電素子を用いたセルの単位構造の一例を示す断面模式図である。 It is a schematic sectional view showing an example of a unit structure of the cell using a piezoelectric element in the present invention; FIG.

【図9】本発明において色フィルターを用いたセルの単位構造の一例を示す断面模式図である。 It is a schematic sectional view showing an example of a unit structure of the cell using a color filter in the present invention; FIG.

【図10】本発明の実施例におけるセルの光透過スペクトルパターンである。 It is a light transmission spectrum pattern of a cell in the embodiment of the invention; FIG.

【符号の説明】 DESCRIPTION OF SYMBOLS

1a 透明導電層電極部 1b 透明導電層配線部 2 透明基板 3 支持構造 4 絶縁層 5 絶縁スペーサー 6 光吸収性を有する基板 7 低屈折率層 8 高屈折率層 9 電極層 10 圧電性を有する層 11 空隙厚み調整層 12 色フィルター 13 70Vの電圧を印加した場合のセルの光透過スペクトルパターン 14 電圧を印加しない場合のセルの光透過スペクトルパターン Layer having 1a transparent conductive layer electrode portion 1b transparent conductive layer wiring section 2 transparent substrate 3 supporting structure 4 substrate 7 low refractive index layer 8 high refractive index layer 9 electrode layer 10 piezoelectric having an insulating layer 5 insulating spacers 6 light absorbing 11 light transmissive spectral pattern of cells when not applied light transmission spectrum pattern 14 voltage of the cell when a voltage is applied in the gap thickness adjusting layer 12 colors filter 13 70 V

Claims (6)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 少なくとも一枚が透明な対向配置された二枚の基板と、両基板を支持するための支持構造とからなり、厚さが0.05〜20μmの空隙層を有するセルと、該空隙層の厚みを変化させ得る外的手段とを有することを特徴とする光変調素子。 And 1. A two substrates at least one is transparent opposed consists of a support structure for supporting the substrates, the cell thickness having a void layer of 0.05 to 20 m, light modulation element, characterized in that it comprises an outer means capable of changing the thickness of said void layer.
  2. 【請求項2】 少なくとも一枚が透明な対向配置された二枚の基板と、両基板を支持するための支持構造とからなり、厚さが0.05〜20μmの空隙層を有するセルと、該空隙層の厚みを変化させ得る外的手段とを有し、 2. A two substrates at least one is transparent opposed consists of a support structure for supporting the substrates, the cell thickness having a void layer of 0.05 to 20 m, and an external unit capable of changing the thickness of said void layer,
    空隙層と両基板との二界面での反射光の干渉効果に基づきセルを透過もしくは反射する光のスペクトルパターンを変化させることを特徴とする光変調素子。 Light modulation element, characterized in that changing the spectral pattern of light transmitted through or reflected cell based on the interference effect of the reflected light in two interface between the gap layer and the substrates.
  3. 【請求項3】 二枚の基板として導電性の基板を用い、 3. using a conductive substrate as a two substrates,
    両基板に電荷を供給することにより空隙層の厚みを変化させることを特徴とする請求項1または2記載の光変調素子。 Light modulation element according to claim 1 or 2, wherein the changing the thickness of the gap layer by supplying a charge to the substrates.
  4. 【請求項4】 二枚の基板として導電性の基板を用い、 4. using a conductive substrate as a two substrates,
    外的手段として両基板に電荷を供給しうる電荷供給装置を用いることを特徴とする請求項1または2記載の光変調素子。 Light modulation element according to claim 1, wherein the use of a charge supply device capable of supplying a charge to the substrates as external means.
  5. 【請求項5】 上記セルを一次元のアレー状もしくは二次元のマトリクス状に配列してなる表示部と、各セルの空隙層の厚みを個別に変化させ得る外的手段を有し、各種情報の表示を行うことを特徴とする表示装置。 5. A includes a display unit formed by arranging the cells in a one-dimensional array-like or two-dimensional matrix, the external means may individually alter the thickness of the space layer in each cell, various information display device and performs display.
  6. 【請求項6】 請求項1〜4のいずれかに記載の光変調素子を一次元のアレー状もしくは二次元のマトリクス状に配列してなることを特徴とする表示装置。 6. A display device characterized by comprising arranging the light modulation element in a one-dimensional array-like or two-dimensional matrix according to any one of claims 1 to 4.
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