JP2010003771A5 - - Google Patents
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- JP2010003771A5 JP2010003771A5 JP2008159705A JP2008159705A JP2010003771A5 JP 2010003771 A5 JP2010003771 A5 JP 2010003771A5 JP 2008159705 A JP2008159705 A JP 2008159705A JP 2008159705 A JP2008159705 A JP 2008159705A JP 2010003771 A5 JP2010003771 A5 JP 2010003771A5
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008159705A JP5458513B2 (ja) | 2008-06-18 | 2008-06-18 | 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法 |
PCT/JP2009/060273 WO2009154085A1 (ja) | 2008-06-18 | 2009-06-04 | 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法 |
TW098120187A TWI525398B (zh) | 2008-06-18 | 2009-06-17 | Light generating device, light source device and its adjustment method, light irradiation device, exposure device, and element manufacturing method |
US12/963,923 US8792083B2 (en) | 2008-06-18 | 2010-12-09 | Seed light generation device, light source device, adjustment method thereof, light irradiation device, exposure device, and device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008159705A JP5458513B2 (ja) | 2008-06-18 | 2008-06-18 | 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010003771A JP2010003771A (ja) | 2010-01-07 |
JP2010003771A5 true JP2010003771A5 (ja) | 2011-05-26 |
JP5458513B2 JP5458513B2 (ja) | 2014-04-02 |
Family
ID=41434001
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008159705A Active JP5458513B2 (ja) | 2008-06-18 | 2008-06-18 | 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8792083B2 (ja) |
JP (1) | JP5458513B2 (ja) |
TW (1) | TWI525398B (ja) |
WO (1) | WO2009154085A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101145683B1 (ko) * | 2010-10-13 | 2012-05-24 | 광주과학기술원 | 레이저 시스템에서 버스트 모드 발진 방법 및 이를 위한 장치 |
KR20150008904A (ko) | 2012-06-12 | 2015-01-23 | 포탄 에너지 게엠베하 | 증폭기와 조정 가능한 펄스 시퀀스를 갖는 단 펄스 레이저 |
EP3062146B1 (en) * | 2013-10-25 | 2020-01-22 | Nikon Corporation | Laser device, and exposure device and inspection device provided with laser device |
TWI656704B (zh) * | 2014-02-18 | 2019-04-11 | 日商尼康股份有限公司 | Method for generating pulsed light, pulsed laser device, and exposure device and inspection device having the same |
JP2015210517A (ja) * | 2014-09-09 | 2015-11-24 | 株式会社ニコン | パターン描画装置、パターン描画方法、および、デバイス製造方法 |
JP6428675B2 (ja) * | 2016-02-22 | 2018-11-28 | 株式会社ニコン | パターン描画用の光源装置 |
US10451890B2 (en) * | 2017-01-16 | 2019-10-22 | Cymer, Llc | Reducing speckle in an excimer light source |
JP6587026B2 (ja) * | 2018-10-30 | 2019-10-09 | 株式会社ニコン | パターン露光装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02103982A (ja) * | 1988-06-20 | 1990-04-17 | Fujitsu Ltd | 半導体発光装置 |
WO2001020397A1 (fr) * | 1999-09-10 | 2001-03-22 | Nikon Corporation | Dispositif laser et procede d'exposition |
JP2001085313A (ja) * | 1999-09-13 | 2001-03-30 | Nikon Corp | 露光方法及び装置、並びにデバイスの製造方法 |
WO2002095486A1 (fr) * | 2001-05-18 | 2002-11-28 | Nikon Corporation | Dispositif de source lumineuse et dispositif de rayonnement lumineux, ainsi que leur procede de fabrication |
JP2004335782A (ja) * | 2003-05-08 | 2004-11-25 | Komatsu Ltd | 注入同期式レーザ装置 |
JP4798687B2 (ja) * | 2004-07-09 | 2011-10-19 | 株式会社小松製作所 | 狭帯域化レーザ装置 |
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2008
- 2008-06-18 JP JP2008159705A patent/JP5458513B2/ja active Active
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2009
- 2009-06-04 WO PCT/JP2009/060273 patent/WO2009154085A1/ja active Application Filing
- 2009-06-17 TW TW098120187A patent/TWI525398B/zh active
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2010
- 2010-12-09 US US12/963,923 patent/US8792083B2/en active Active