JP2010003771A5 - - Google Patents

Download PDF

Info

Publication number
JP2010003771A5
JP2010003771A5 JP2008159705A JP2008159705A JP2010003771A5 JP 2010003771 A5 JP2010003771 A5 JP 2010003771A5 JP 2008159705 A JP2008159705 A JP 2008159705A JP 2008159705 A JP2008159705 A JP 2008159705A JP 2010003771 A5 JP2010003771 A5 JP 2010003771A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008159705A
Other versions
JP5458513B2 (ja
JP2010003771A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008159705A priority Critical patent/JP5458513B2/ja
Priority claimed from JP2008159705A external-priority patent/JP5458513B2/ja
Priority to PCT/JP2009/060273 priority patent/WO2009154085A1/ja
Priority to TW098120187A priority patent/TWI525398B/zh
Publication of JP2010003771A publication Critical patent/JP2010003771A/ja
Priority to US12/963,923 priority patent/US8792083B2/en
Publication of JP2010003771A5 publication Critical patent/JP2010003771A5/ja
Application granted granted Critical
Publication of JP5458513B2 publication Critical patent/JP5458513B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008159705A 2008-06-18 2008-06-18 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法 Active JP5458513B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008159705A JP5458513B2 (ja) 2008-06-18 2008-06-18 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法
PCT/JP2009/060273 WO2009154085A1 (ja) 2008-06-18 2009-06-04 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法
TW098120187A TWI525398B (zh) 2008-06-18 2009-06-17 Light generating device, light source device and its adjustment method, light irradiation device, exposure device, and element manufacturing method
US12/963,923 US8792083B2 (en) 2008-06-18 2010-12-09 Seed light generation device, light source device, adjustment method thereof, light irradiation device, exposure device, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008159705A JP5458513B2 (ja) 2008-06-18 2008-06-18 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2010003771A JP2010003771A (ja) 2010-01-07
JP2010003771A5 true JP2010003771A5 (ja) 2011-05-26
JP5458513B2 JP5458513B2 (ja) 2014-04-02

Family

ID=41434001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008159705A Active JP5458513B2 (ja) 2008-06-18 2008-06-18 種光発生装置、光源装置及びその調整方法、光照射装置、露光装置、並びにデバイス製造方法

Country Status (4)

Country Link
US (1) US8792083B2 (ja)
JP (1) JP5458513B2 (ja)
TW (1) TWI525398B (ja)
WO (1) WO2009154085A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101145683B1 (ko) * 2010-10-13 2012-05-24 광주과학기술원 레이저 시스템에서 버스트 모드 발진 방법 및 이를 위한 장치
KR20150008904A (ko) 2012-06-12 2015-01-23 포탄 에너지 게엠베하 증폭기와 조정 가능한 펄스 시퀀스를 갖는 단 펄스 레이저
EP3062146B1 (en) * 2013-10-25 2020-01-22 Nikon Corporation Laser device, and exposure device and inspection device provided with laser device
TWI656704B (zh) * 2014-02-18 2019-04-11 日商尼康股份有限公司 Method for generating pulsed light, pulsed laser device, and exposure device and inspection device having the same
JP2015210517A (ja) * 2014-09-09 2015-11-24 株式会社ニコン パターン描画装置、パターン描画方法、および、デバイス製造方法
JP6428675B2 (ja) * 2016-02-22 2018-11-28 株式会社ニコン パターン描画用の光源装置
US10451890B2 (en) * 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
JP6587026B2 (ja) * 2018-10-30 2019-10-09 株式会社ニコン パターン露光装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02103982A (ja) * 1988-06-20 1990-04-17 Fujitsu Ltd 半導体発光装置
WO2001020397A1 (fr) * 1999-09-10 2001-03-22 Nikon Corporation Dispositif laser et procede d'exposition
JP2001085313A (ja) * 1999-09-13 2001-03-30 Nikon Corp 露光方法及び装置、並びにデバイスの製造方法
WO2002095486A1 (fr) * 2001-05-18 2002-11-28 Nikon Corporation Dispositif de source lumineuse et dispositif de rayonnement lumineux, ainsi que leur procede de fabrication
JP2004335782A (ja) * 2003-05-08 2004-11-25 Komatsu Ltd 注入同期式レーザ装置
JP4798687B2 (ja) * 2004-07-09 2011-10-19 株式会社小松製作所 狭帯域化レーザ装置

Similar Documents

Publication Publication Date Title
BR112016019572A2 (ja)
BRPI0909040A2 (ja)
BRPI0917573A2 (ja)
BRPI0908549B8 (ja)
BRPI0917525A2 (ja)
BRPI0922455A2 (ja)
BRPI0907698A2 (ja)
BRPI0908285A2 (ja)
BRPI0910485A2 (ja)
BRPI0914750A2 (ja)
BRPI0922669A2 (ja)
BRPI0908120A2 (ja)
BRPI0912462A2 (ja)
BRPI0915616A2 (ja)
BRPI0904541A8 (ja)
BRPI0916284A2 (ja)
BRPI0909508A2 (ja)
BRPI0911617A2 (ja)
BRPI0913605A2 (ja)
BRPI0914852A2 (ja)
BRPI0910572A2 (ja)
BRPI0914820A2 (ja)
AR073287B1 (ja)
BRPI0923127A (ja)
BRPI0923137A2 (ja)