JP2010002739A - Method for producing filter for display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for producing a filter for a display having excellent anti-reflectiveness even in the case another functional layer is formed on an electromagnetic wave shielding layer. <P>SOLUTION: The method includes: a step (a) of applying a first functional layer forming coating solution containing at least a synthetic resin on a transparent substrate 110 having a mesh-shaped electromagnetic wave shielding layer 120; and a step (b) of forming a first functional layer 130b by laminating a smoothing sheet 180 on a coating layer 130a obtained by the step (a) and then hardening the synthetic resin. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention is applicable to various displays such as a plasma display panel (PDP), a cathode ray tube (CRT) display, a liquid crystal display, an organic EL (electroluminescent) display, and a field emission display (FED) including a surface electric field display (SED). The present invention relates to a method for manufacturing a filter having various functions such as antireflection, near infrared ray shielding, and electromagnetic wave shielding.

  In recent years, flat panel displays such as liquid crystal displays, plasma displays (PDPs), EL displays, and CRT displays have been mainly used for large-screen displays, and PDPs have become common as next-generation large-screen display devices. However, in this PDP, high-frequency pulse discharge is performed on the light emitting unit for image display, and there is a risk of unnecessary electromagnetic radiation and infrared radiation that may cause malfunction of an infrared remote controller or the like.

  For this reason, a filter having an electromagnetic wave shielding layer formed on a transparent substrate is known as a filter used for a display such as a PDP. In the electromagnetic wave shielding layer, for example, (1) a transparent conductive thin film containing metallic silver, (2) a conductive mesh in which a metal wire or conductive fiber is made into a net, (3) an opening is provided in a metal foil such as a copper foil. A conductive layer such as a mesh-like one or (4) a conductive ink printed in a mesh-like shape is used. Especially, since a high light transmittance is acquired by an opening part, the mesh-shaped electroconductive layer of (2)-(4) is used suitably. Electromagnetic waves are shielded by the conductive mesh portion, and light transmission is ensured by the opening.

  Furthermore, conventional display filters have a hard coat layer for imparting scratch resistance, and an antireflection layer for improving the visibility by suppressing the reflection of light rays irradiated from an external light source such as a fluorescent lamp. Laminated. Furthermore, a display filter in which a near-infrared shielding layer is provided on one surface of a transparent substrate in order to shield infrared rays has been proposed.

  For example, Patent Document 1 discloses a display filter including a laminate in which a single transparent substrate, a conductive mesh, an outermost antireflection film, and a near-infrared cut film are laminated and integrated. Has been. The electromagnetic wave shielding layer, the hard coat layer, the antireflection layer, and the near-infrared shielding layer are laminated and used according to the use of the display filter.

International Publication No. 2006/309660 Pamphlet

  In the display filter, since high electromagnetic shielding properties can be obtained, it is preferable that the mesh-like electromagnetic shielding layer on the transparent substrate is disposed on the user side. In order to produce other functional layers such as an antireflection layer and a near-infrared absorbing layer on the mesh-like electromagnetic shielding layer, an uncured synthetic resin and, if necessary, a coating solution containing fine particles are meshed. A method of coating directly on the electromagnetic wave shielding layer and curing by irradiation with actinic rays such as ultraviolet rays or heating is used. However, such a method has a problem that a display filter having excellent antireflection properties cannot be obtained.

  Therefore, an object of this invention is to provide the manufacturing method of the display filter which has the outstanding antireflection property, when another functional layer is formed on an electromagnetic wave shield layer.

  In a conventional display filter, the projections of the mesh-shaped electromagnetic wave shielding layer cause large irregularities on the surface of other functional layers, and the irregularities may cause irregular reflection of light, thereby reducing the antireflection property. . As a result of various studies paying attention to such a situation, the present inventors formed a first functional layer by applying a coating liquid on a transparent substrate having a mesh-like electromagnetic shielding layer. In doing so, it has been found that a display filter having significantly improved antireflection properties can be obtained by performing a step of smoothing the coating layer using a smoothing sheet.

That is, the present invention comprises a step (a) of applying a first functional layer-forming coating solution containing a synthetic resin composition on a transparent substrate having a mesh-like electromagnetic wave shielding layer;
And (b) forming a first functional layer by curing the coating layer after laminating a smoothing sheet on the coating layer obtained in the step (a). The above-mentioned problem is solved by a display filter manufacturing method characterized by the above.

  According to the method of the present invention, it is possible to form a first functional layer having a smoothed surface on a mesh-like electromagnetic shielding layer. Thereby, irregular reflection of light is suppressed and it becomes possible to manufacture a display filter having excellent antireflection properties. Therefore, the display filter has excellent visibility of an image displayed on the display, and is useful as a display filter installed on the entire surface of a display such as a plasma display (PDP), a liquid crystal display, an organic EL display, and a field emission display. is there.

  FIG. 1 is a schematic cross-sectional view for explaining an example of a method for producing a display filter of the present invention.

  In the method of the present invention, first, the step (a) of applying a first functional layer-forming coating solution containing a synthetic resin composition on the transparent substrate 110 having the mesh-like electromagnetic wave shielding layer 120 is performed. carry out. Next, after laminating the smoothing sheet 180 on the coating layer 130a obtained by the step (a), the first functional layer 130b is preferably cured by curing the coating layer by irradiation with ultraviolet rays. Step (b) of forming is performed. By curing the coating layer 130a with the smoothing sheet 110 laminated in this way, the first functional layer 130b having excellent surface flatness can be formed on the electromagnetic wave shielding layer 120.

  In the present invention, the first functional layer may be any layer as long as it includes a synthetic resin having a certain function formed on the electromagnetic wave shielding layer. Therefore, the first functional layer is formed using a coating liquid containing a synthetic resin composition.

  Examples of the first functional layer include a near infrared absorption layer, a hard coat layer, and / or an antireflection layer. Examples of the antireflection layer include a low refractive index layer having a low refractive index and / or a high refractive index layer having a high refractive index.

  Especially, it is preferable that a 1st functional layer is a hard-coat layer. According to the method of the present invention, a hard coat layer having excellent surface flatness can be formed on an electromagnetic wave shielding layer, and a display filter having high antireflection properties can be obtained. In the present invention, the hard coat layer means a layer having a hardness of H or more in a pencil hardness test specified by JIS 5600-5-4 (1999).

  The synthetic resin composition used in the first functional layer forming coating solution contains at least a synthetic resin. The synthetic resin is generally a thermosetting resin or an ultraviolet curable resin, and an ultraviolet curable resin is preferable. The ultraviolet curable resin can be cured in a short time, and the first functional layer having excellent surface smoothness can be formed.

  Examples of the thermosetting resin include phenol resin, resorcinol resin, urea resin, melamine resin, epoxy resin, acrylic resin, urethane resin, furan resin, and silicon resin.

  Examples of the ultraviolet curable resin (monomer, oligomer) include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and 2-ethylhexyl polyethoxy (meth) acrylate. , Benzyl (meth) acrylate, isobornyl (meth) acrylate, phenyloxyethyl (meth) acrylate, tricyclodecane mono (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, acryloylmorpholine , N-vinylcaprolactam, 2-hydroxy-3-phenyloxypropyl (meth) acrylate, o-phenylphenyloxyethyl (meth) acrylate, neopentylglyce Di (meth) acrylate, neopentyl glycol dipropoxy di (meth) acrylate, neopentyl glycol di (meth) acrylate hydroxypivalate, tricyclodecane dimethylol di (meth) acrylate, 1,6-hexanediol di (meth) Acrylate, nonanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, tris [(meth) acryloxyethyl] isocyanurate, ditrimethylolpropane (Meth) acrylate monomers such as tetra (meth) acrylate; polyol compounds (for example, ethylene glycol, propylene glycol, neopentyl glycol, , 6-hexanediol, 3-methyl-1,5-pentanediol, 1,9-nonanediol, 2-ethyl-2-butyl-1,3-propanediol, trimethylolpropane, diethylene glycol, dipropylene glycol, polypropylene Polyols such as glycol, 1,4-dimethylolcyclohexane, bisphenol A polyethoxydiol, polytetramethylene glycol, the polyols and succinic acid, maleic acid, itaconic acid, adipic acid, hydrogenated dimer acid, phthalic acid, isophthalic acid Polyester polyols which are reaction products of polybasic acids such as acid and terephthalic acid or acid anhydrides thereof, polycaprolactone polyols which are reaction products of the polyols and ε-caprolactone, the polyols and the above, Polybasic acid or this Reaction products of these acid anhydrides with ε-caprolactone, polycarbonate polyol, polymer polyol, etc.) and organic polyisocyanate (for example, tolylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, diphenylmethane-4,4′-diisocyanate, diisocyanate) Cyclopentanyl diisocyanate, hexamethylene diisocyanate, 2,4,4′-trimethylhexamethylene diisocyanate, 2,2′-4-trimethylhexamethylene diisocyanate, etc.) and a hydroxyl group-containing (meth) acrylate (for example, 2-hydroxyethyl (meta ) Acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenyloxypropyl (meth) acrylate , Cyclohexane-1,4-dimethylol mono (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, glycerin di (meth) acrylate, etc.) (Meth) such as bisphenol type epoxy (meth) acrylate, which is a reaction product of bisphenol type epoxy resin such as polyurethane (meth) acrylate, bisphenol A type epoxy resin, bisphenol F type epoxy resin and (meth) acrylic acid which is a reaction product Examples include acrylate oligomers. These compounds can be used alone or in combination. These ultraviolet curable resins may be used as a thermosetting resin together with a thermal polymerization initiator.

  Of the above UV curable resins (monomers and oligomers), hard polyfunctional monomers such as pentaerythritol tri (meth) acrylate, pentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate are mainly used. It is preferable.

  The synthetic resin composition used for the first functional layer forming coating solution preferably further contains a photopolymerization initiator of an ultraviolet curable resin. As the photopolymerization initiator, any compound suitable for the properties of the ultraviolet curable resin can be used. For example, acetophenone such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 Benzoin series such as benzyl dimethyl ketal, benzophenone, 4-phenylbenzophenone, benzophenone series such as hydroxybenzophenone, thioxanthone series such as isopropylthioxanthone, 2-4-diethylthioxanthone, and other special types include methylphenyl glyoxylate Etc. can be used. Particularly preferably, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1, Examples include benzophenone. These photopolymerization initiators may be optionally selected from one or more known photopolymerization accelerators such as benzoic acid type or tertiary amine type such as 4-dimethylaminobenzoic acid. It can be used by mixing at a ratio. Moreover, it can be used by 1 type, or 2 or more types of mixture of only a photoinitiator. In particular, 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba Specialty Chemicals, Irgacure (registered trademark) 184) is preferable.

  The content of the photopolymerization initiator is generally 0.1 to 10% by mass, preferably 0.1 to 5% by mass, based on the coating liquid.

  The first functional layer forming coating solution may contain an organic solvent. The organic solvent is not particularly limited, but an organic solvent that dissolves the synthetic resin composition and can be easily dried is preferable. Specific examples include ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, alcohol solvents, cellosolve solvents, petroleum solvents and the like. These may be used individually by 1 type, and 2 or more types may be mixed and used for them.

  The content of the organic solvent is preferably 50 parts by mass or less, preferably 20 to 40 parts by mass, and particularly preferably 25 to 35 parts by mass with respect to 100 parts by mass of the synthetic resin composition. With such a content, irregularities that can occur on the surface due to volatilization of the organic solvent during curing of the coating layer can be suppressed, and a first functional layer having excellent surface smoothness is formed. It becomes possible to do.

  The synthetic resin composition used for the first functional layer-forming coating solution preferably further contains silicone oil. Thereby, it becomes possible to improve the coating property of a coating liquid. Preferred examples of the silicone oil include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil. These may be used individually by 1 type, and 2 or more types may be mixed and used for them. Moreover, when there are a plurality of types of first functional layers, the silicone oils contained in each layer may be the same or different, but are preferably the same. As the silicone oil, dimethyl silicone oil is particularly preferably used.

  The content of the silicone oil is preferably 0.0005 to 0.1 parts by mass, more preferably 0.001 to 0.05 parts by mass with respect to 100 parts by mass of the synthetic resin. Thereby, the 1st functional layer excellent in transparency and surface smoothness is obtained.

  When the first functional layer forming coating solution is used as a hard coat layer forming coating solution, the first functional layer forming coating solution may contain only a synthetic resin, It may further contain other components such as an ultraviolet absorber, an infrared absorber, an anti-aging agent, a paint processing aid, and a colorant. It is preferable to contain a UV absorber, particularly a benzotriazole UV absorber or a benzophenone UV absorber. Thereby, prevention of yellowing etc. of a filter can be performed efficiently. The content of other components is generally 0.1 to 10% by mass, preferably 0.1 to 5% by mass, based on the coating solution.

  In the step (a), the above-described first functional layer forming coating solution is applied onto a transparent substrate having a mesh-like electromagnetic wave shielding layer. The coating method is not particularly limited, and examples thereof include known methods such as a gravure coater, a roll coater (size press, gate roll coater, etc.), a bar coater, an air knife coater, and a blade coater.

  Before laminating the smoothing sheet on the coating layer obtained by the coating, it is preferable to dry the coating layer to remove the organic solvent. Drying is preferably performed by heating the coating layer at 70 to 130 ° C., particularly 75 to 125 ° C., for 5 to 60 seconds, particularly 10 to 30 seconds.

  Next, in the step (b), a smoothing sheet is laminated on the coating layer obtained in the step (a) described above.

  The smoothing sheet should just be a sheet | seat which has high surface smoothness. The smoothing sheet preferably has a surface roughness Ra of 0.05 μm or less, particularly 0.04 μm or less. Moreover, when hardening a coating layer by ultraviolet irradiation, it is preferable to use the sheet | seat which is further excellent in transparency.

  Examples of the smoothing sheet include polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyester resins such as terephthalic acid-isophthalic acid-ethylene glycol copolymer, terephthalic acid-cyclohexanedimethanol-ethylene glycol copolymer, nylon 6, and the like. Polyamide resins, polyolefin resins such as polypropylene and polymethylpentene, acrylic resins such as polymethyl methacrylate, styrene resins such as polystyrene and styrene-acrylonitrile copolymers, cellulose resins such as triacetyl cellulose, and imides A sheet made of a transparent resin such as resin or polycarbonate resin is preferably used. Among these, a sheet made of polyethylene terephthalate is preferable.

  The thickness of the smoothing sheet is usually about 12 to 500 μm, preferably 50 to 200 μm, and more preferably 50 to 125 μm. If the thickness of the smoothing sheet is too thin, the mechanical strength is insufficient and warping, loosening, breakage, etc. occur, and if it is too thick, peeling becomes difficult.

  Moreover, after laminating the smoothing sheet on the coating layer, it is preferable to pressurize the smoothing sheet layer with a roller or the like. Thereby, the surface of the first functional layer can be highly smoothed. Specifically, use of a hand roller, means for passing a transparent base material in which a smoothing sheet is laminated on a coating layer between a plurality of rollers, or the like is used. Moreover, you may heat a coating layer at the time of the pressurization with a roller.

  In order to cure the coating layer after laminating the smoothing sheet on the coating layer, it may be performed using means such as heating or ultraviolet irradiation. Since a first functional layer having excellent surface smoothness can be formed, it is preferable to use an ultraviolet curable synthetic resin composition and cure the coating layer by ultraviolet irradiation. Therefore, the ultraviolet curable synthetic resin composition preferably contains the above-described ultraviolet curable resin and a photopolymerization initiator.

  In the case of ultraviolet curing, many light sources that emit light in the ultraviolet to visible range can be used as the light source, such as ultra-high pressure, high pressure, low pressure mercury lamp, chemical lamp, xenon lamp, halogen lamp, mercury lamp, carbon arc lamp, incandescent lamp, A laser beam etc. can be mentioned. The irradiation time cannot be determined unconditionally depending on the type of lamp and the intensity of the light source, but is about several seconds to several minutes. Further, in order to accelerate curing, the coating layer may be preheated to 40 to 120 ° C. and irradiated with ultraviolet rays.

  When forming a hard-coat layer as a 1st functional layer, the thickness of a hard-coat layer is 1-50 micrometers normally, Preferably it is 5-40 micrometers, Most preferably, it is 5-35 micrometers. Further, the hard coat layer preferably has a refractive index lower than that of the transparent base material, and it is generally easy to obtain a refractive index lower than that of the substrate by using the ultraviolet curable resin. Therefore, it is preferable to use a material having a high refractive index such as PET as the transparent substrate, and the hard coat layer preferably has a refractive index of 1.60 or less.

  In the method of the present invention, as described above, after forming a hard coat layer as a first functional layer on a transparent substrate having a mesh-like electromagnetic wave shielding layer using a smoothing sheet, It is preferable to carry out the step of forming an antireflection layer. By forming the antireflection layer in this way, the antireflection property can be further improved.

  Examples of the antireflection layer include a low refractive index layer having a low refractive index and / or a high refractive index layer having a high refractive index. As the antireflection layer, (1) only a low refractive index layer having a lower refractive index than the hard coat layer may be formed on the hard coat layer, and (2) a high refractive index layer having a higher refractive index than the hard coat layer, A low refractive index layer having a lower refractive index than that of the hard coat layer may be laminated in this order. The more layers, the better antireflection properties are obtained.

  In order to form the low refractive index layer, a coating liquid containing fine particles such as silica and fluororesin, preferably hollow silica is used in addition to the synthetic resin.

  As the hollow silica, those having an average particle diameter of 10 to 100 nm, preferably 10 to 50 nm, and a specific gravity of 0.5 to 1.0, preferably 0.8 to 0.9 are preferable.

Silica, preferably hollow silica, may be treated with a silane coupling agent. Thereby, stability and antireflection can be improved. Examples of the silane coupling agent include a general formula: R _n SiX _(4-n) (wherein R is an alkoxy group having 1 to 4 carbon atoms, a methacryloylalkyl group, a methacryloyloxy group, an acryloyloxy group, or A perfluoro (meth) acryloyl group, wherein X represents an alkoxy group having 1 to 4 carbon atoms, a silanol group, a halogen atom, or a hydrogen atom, and n represents an integer of 1 to 3, preferably 1. Preferred are those mentioned above.

  In order to treat silica with a silane coupling agent, a conventionally known method such as a method in which a silane coupling agent is added to a dispersion of silica and an acid or alkali is added as a hydrolysis catalyst as necessary. Can be used.

  Content of microparticles | fine-particles, such as a silica and a fluororesin, becomes like this. Preferably it is 10-40 mass% with respect to a coating liquid, More preferably, it is 10-30 mass%.

  The low refractive index layer preferably contains silicone oil. The content of silicone oil in the low refractive index layer is preferably 0.0005 to 0.1 parts by mass, and more preferably 0.001 to 0.05 parts per 100 parts by mass of the synthetic resin contained in the low refractive index layer. Part by mass.

In order to form a high refractive index layer, besides synthetic resin, ITO, ATO, Sb ₂ O ₃ , ZrO ₂ , SbO ₂ , In ₂ O ₃ , SnO ₂ , ZnO, Al-doped ZnO, TiO _2, etc. A coating solution containing metal oxide fine particles is used.

  The metal oxide fine particles preferably have an average particle diameter of 10 to 10000 nm, preferably 10 to 50 nm. ITO, particularly those having an average particle size of 10 to 50 nm are preferred.

  The high refractive index layer preferably contains silicone oil. The content of silicone oil in the high refractive index layer is preferably 0.0005 to 0.1 parts by mass, more preferably 0.001 to 0.05 parts per 100 parts by mass of the synthetic resin contained in the high refractive index layer. Part by mass.

  The coating liquid used for forming the low refractive index layer and the high refractive index layer may each contain an organic solvent. As the synthetic resin, silicone oil, and organic solvent used in the coating solution, the same ones as described above used in the first functional layer can be used.

  The low refractive index layer and the high refractive index layer can be formed by sequentially applying each coating solution on the hard coat layer and then irradiating with ultraviolet rays. As a coating method and ultraviolet irradiation conditions, it can carry out similarly to having mentioned above. In this case, all the layers may be coated and then cured together, but it is preferable to coat and cure each layer one by one. Moreover, you may laminate | stack a smoothing sheet on a coating layer before hardening.

  The thickness of the low refractive index layer is usually in the range of 10 to 500 nm, preferably 20 to 200 nm. The refractive index of the low refractive index layer is preferably 1.35 to 1.45. When the refractive index is more than 1.45, the antireflection characteristic of the antireflection film is deteriorated.

  The thickness of the high refractive index layer is usually 10 to 500 nm, preferably 20 to 200 nm. The refractive index of the high refractive index layer is preferably 1.64 or more. By setting the refractive index of the high refractive index layer to 1.64 or more, the minimum reflectance of the surface reflectance of the antireflection layer can be made within 1.5%, and it is 1.69 or more, preferably 1.69 to By setting it to 1.82, the minimum reflectance of the surface reflectance of the antireflection layer can be kept within 1.0%.

  The transparent substrate used in the method of the present invention is not particularly limited as long as it has transparency and flexibility and can withstand subsequent processing. Examples of the material for the transparent substrate include glass, polyester (eg, polyethylene terephthalate, (PET), polybutylene terephthalate), acrylic resin (eg, polymethyl methacrylate (PMMA)), polycarbonate (PC), polystyrene, and cellulose triacetate. , Polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion crosslinked ethylene-methacrylic acid copolymer, polyurethane, cellophane, etc. PET, PC, and PMMA, which are less transparent due to processing (heating, solvent, bending) and are highly transparent, are preferable. Especially, since it has ultraviolet absorptivity, it is preferable that it is PET. A transparent base material is used as a sheet | seat, a film, or a board which consists of these materials.

  The thickness of the transparent substrate is not particularly limited, but is preferably 6 to 250 μm, particularly 6 to 150 μm.

  Moreover, the mesh-shaped electromagnetic wave shielding layer formed on a transparent base material contains a metal and has electroconductivity. For example, (1) what consists of metals, such as copper, (2) what disperse | distributed electroconductive particle in binder resin can be mentioned.

  (1) In the electromagnetic wave shielding layer made of a metal such as copper, copper, stainless steel, aluminum, nickel, iron, brass, or an alloy thereof, preferably copper, stainless steel, or aluminum is used as the metal.

  In order to produce the electromagnetic wave shielding layer of (1), first, a vapor deposition method such as sputtering, ion plating, electron beam vapor deposition, vacuum vapor deposition or chemical vapor deposition, or a method such as printing or coating is used. What is necessary is just to perform using well-known methods, such as the method of forming the metal foil which consists of the said metal on a transparent base material, and then making the mesh shape by etching the said metal foil and providing an opening part.

  In order to produce the electromagnetic shielding layer of (1), in addition to the above method, dots are formed on a transparent substrate with a material soluble in a solvent, and the film surface is insoluble in a solvent. A method in which a conductive material layer made of a conductive material is formed and the film surface is brought into contact with a solvent to remove the dots and the conductive material layer on the dots may be used. Such a method is described in, for example, Japanese Patent Application Laid-Open No. 2001-332889.

  (2) In the electromagnetic wave shielding layer in which conductive particles are dispersed in a binder resin, examples of the conductive particles include aluminum, nickel, indium, chromium, gold, vanadium, tin, cadmium, silver, platinum, copper, Metals such as titanium, cobalt, lead, alloys; or ITO, indium oxide, tin oxide, zinc oxide, indium oxide-tin oxide (ITO, so-called indium-doped tin oxide), tin oxide-antimony oxide (ATO, so-called antimony-doped oxide) Tin), and conductive oxides such as zinc oxide-aluminum oxide (ZAO; so-called aluminum-doped zinc oxide). In particular, ITO is preferable.

  Examples of the binder resin include acrylic resin, polyester resin, epoxy resin, urethane resin, phenol resin, maleic acid resin, melamine resin, urea resin, polyimide resin, and silicon-containing resin. Furthermore, it is preferable that it is a thermosetting resin among these resins.

  In order to produce the electromagnetic wave shielding layer of (2), a method of printing a conductive ink in which conductive particles are dispersed in a binder resin in a mesh shape on a transparent substrate can be used. In addition to the conductive particles and the binder resin, the conductive ink may further contain a solvent in order to adjust to an appropriate viscosity. Examples of the solvent include alcohols such as hexanol, octanol, nonanol, decanol, undecanol, dodecanol, tridecanol, tetradecanol, pentadecanol, stearyl alcohol, seryl alcohol, cyclohexanol, terpineol; ethylene glycol monobutyl ether (butyl cellosolve), ethylene Examples thereof include alkyl ethers such as glycol monophenyl ether, diethylene glycol, diethylene glycol monobutyl ether (butyl carbitol), cellosolve acetate, butyl cellosolve acetate, carbitol acetate, and butyl carbitol acetate.

  In order to print the conductive ink in a mesh on the transparent substrate, a known method such as gravure printing, flexographic printing, gravure offset printing, screen printing, ink jet printing, or electrostatic printing may be used. Then, it is made to dry and harden at room temperature-120 degreeC as needed.

  As the electromagnetic wave shielding layer, it is preferable to use the electromagnetic wave shielding layer of (1) among the above-described ones because it is excellent in antiglare property and electrical conductivity.

  The shape of the opening surrounded by the line of the electromagnetic wave shielding layer can be any shape such as a circle, an ellipse, and a square (quadrangle, hexagon), but is generally a square, and particularly preferably a square. . The lines are net-like, but are preferably grid-like.

  The shape of the mesh pattern in the electromagnetic wave shielding layer is not particularly limited, and examples thereof include a lattice shape in which square openings are formed, and a punching metal shape in which circular, hexagonal, triangular or elliptical openings are formed. It is done. Further, the openings are not limited to those regularly arranged, and may be a random pattern.

  The line width of the mesh-like (including lattice-like) electromagnetic wave shielding layer is generally 20 μm or less, preferably 5 to 15 μm, particularly 5 to 12 μm. The line pitch is preferably 200 μm or less. Further, the aperture ratio is preferably 75 to 95%, particularly 80 to 95%. The aperture ratio is obtained by calculation from the line width of the mesh and the number of lines existing in 1 inch width.

  In order to improve the electromagnetic shielding effect by setting the electromagnetic shielding layer to a lower resistance value, it is preferable to form a metal plating layer on the electromagnetic shielding layer.

  The metal plating layer can be formed by a known electrolytic plating method or electroless plating method. Generally, copper, copper alloy, nickel, silver, gold, zinc or tin can be used as the metal used for plating. These can be used alone or as two or more kinds of alloys. You may do it. Especially, it is preferable to use the layer which consists of an alloy of nickel and zinc or an alloy of nickel and tin for a metal plating layer. Thereby, the black alloy electroconductive layer excellent in black degree and electroconductivity is obtained, and while anti-glare property can be improved, anti-glare property can be provided.

  The mass ratio (Ni / Zn) of nickel to zinc or tin in the black alloy conductive layer made of an alloy of nickel and zinc or tin is 0.4 to 1.4, particularly 0.2 to 1.2. Is preferred. Thereby, a black alloy conductive layer having a uniform black color tone can be obtained, and an electromagnetic wave shielding layer having high antiglare property can be obtained even if the thickness is thin.

  The thickness of the black alloy conductive layer is preferably 0.001 to 1 μm, particularly preferably 0.01 to 0.1 μm. If the thickness of the black alloy conductive layer is less than 0.001 μm, there is a possibility that sufficient antiglare property cannot be imparted to a sufficient electromagnetic shielding layer. If the thickness exceeds 1 μm, the thickness of the electromagnetic shielding layer increases, and the display filter This is not desirable from the viewpoint of surface planarization.

  Moreover, you may provide anti-glare performance to an electromagnetic wave shield layer. This antiglare treatment may be performed by performing a blackening treatment on the surface of the electromagnetic wave shielding layer and providing a blackening layer. For example, it can be performed by oxidation treatment of a metal film, black plating of a chromium alloy or the like, application of black or dark ink, or the like.

  In the method of the present invention, as described above, after forming the first functional layer on the transparent base material having the mesh-like electromagnetic wave shield layer, the side opposite to the surface on which the electromagnetic wave shield layer of the transparent base material is formed. It is preferable to further perform a step of forming a second functional layer on the surface.

  The second functional layer may be any layer as long as it is formed on the surface of the transparent substrate opposite to the surface on which the electromagnetic wave shielding layer is formed and includes a synthetic resin exhibiting some function. The second functional layer is generally a near-infrared absorbing layer, a transparent adhesive layer, or a combination thereof. Specifically as a 2nd functional layer, it consists of (1) what consists only of a near-infrared absorption layer, (2) what consists of a transparent adhesive layer, or (3) consists of a near-infrared absorption layer and a transparent adhesive layer. It is preferable to consist of things (provided on the transparent substrate in this order).

  The near-infrared absorbing layer (that is, the near-infrared shielding layer) used as the second functional layer is generally obtained by forming a layer containing a pigment or the like on the surface of the transparent substrate. The near-infrared absorbing layer can be obtained, for example, by applying a coating solution containing an ultraviolet curable or electron beam curable synthetic resin as a pigment and a binder, and if necessary, drying and curing. As the coating method, the same method as described above as the first functional layer forming coating solution is used. When used as a film, it is generally a near-infrared cut film, such as a film containing a pigment or the like.

  The dye generally has an absorption maximum at a wavelength of 800 to 1200 nm. Examples include phthalocyanine dyes, metal complex dyes, nickel dithiolene complex dyes, cyanine dyes, squarylium dyes, polymethine dyes, Examples thereof include azomethine dyes, azo dyes, polyazo dyes, diimonium dyes, aminium dyes, and anthraquinone dyes, and cyanine dyes and squarylium dyes are particularly preferable. These dyes can be used alone or in combination.

  As an example of the synthetic resin as the binder, acrylic resin, fluororesin, polyester resin, vinyl chloride resin, styrene resin, norbornene resin and the like are preferably used. These may be used individually by 1 type and may be used in mixture of 2 or more types.

  In the present invention, the near-infrared absorbing layer may be provided with a function of adjusting color tone by providing a function of absorbing neon light emission. Therefore, a neon-emitting selective absorption dye may be included in the near-infrared absorbing layer forming coating solution.

  Neon luminescent selective absorption dyes include cyanine dyes, squarylium dyes, anthraquinone dyes, phthalocyanine dyes, polymethine dyes, polyazo dyes, azurenium dyes, diphenylmethane dyes, and triphenylmethane dyes. it can. Such a selective absorption dye is required to have a selective absorption of neon emission near 585 nm and a small absorption at other visible light wavelengths, so that the absorption maximum wavelength is 575 to 595 nm and the absorption spectrum half width is What is 40 nm or less is preferable.

  Also, when combining multiple types of near-infrared or neon luminescent absorbing dyes, if there is a problem with the solubility of the dye, if there is a reaction between the dyes due to mixing, if there is a decline in heat resistance, moisture resistance, etc. All the near-infrared absorbing dyes need not be contained in the same layer, and may be contained in another layer.

  In addition, as long as optical properties are not greatly affected, coloring pigments, ultraviolet absorbers, antioxidants and the like may be further added to the near-infrared absorbing layer forming coating solution.

  As a near-infrared absorption characteristic of the display filter of the present invention, it is preferable that the transmittance at 850 to 1000 nm is 20% or less, and further 15%. Moreover, as selective absorptivity, it is preferable that the transmittance | permeability of 585 nm is 50% or less. Especially in the former case, there is an effect of reducing the transmittance in a wavelength region where malfunction of a remote controller of a peripheral device is pointed out. In the latter case, an orange color having a peak at 575 to 595 nm is color reproducibility. This has the effect of absorbing the orange wavelength, thereby improving the redness and improving the color reproducibility.

  The thickness of the near-infrared absorbing layer is not particularly limited, but is preferably about 0.5 to 50 μm in terms of near-infrared absorption and visible light transmission.

  It is preferable that the near-infrared absorbing layer contains a color correction pigment. Alternatively, a color tone correction layer containing a color tone correction pigment may be provided in the same manner as the near infrared absorption layer.

  As the color correction pigment, in order to neutralize the yellowish brown to green color tone of the near-infrared shielding layer and adjust the color balance, those which are complementary colors thereof are preferable. Examples of such pigments include general pigments such as inorganic pigments, organic pigments, organic dyes, and pigments. Examples of inorganic pigments include cobalt compounds, iron compounds, chromium compounds, and examples of organic pigments include azo, indolinone, quinacridone, bat, phthalocyanine, and naphthalocyanine. Examples of the organic dyes and pigments include azo, azine, anthraquinone, indigoid, oxazine, quinophthalone, squalium, stilbene, triphenylmethane, naphthoquinone, pyrarozone, and polymethine. Of these, organic pigments are preferably used in view of the balance between color developability and durability.

  The transparent adhesive layer is a layer for adhering the display filter of the present invention to the display, and any resin can be used as long as it has an adhesive function.

  Examples of the resin having an adhesive function in the transparent adhesive layer include ethylene-vinyl acetate copolymer (EVA), ethylene-methyl acrylate copolymer, acrylic resin (eg, ethylene- (meth) acrylic acid copolymer). , Ethylene- (meth) acrylic acid ethyl copolymer, ethylene- (meth) methyl acrylate copolymer, metal ion crosslinked ethylene- (meth) acrylic acid copolymer), partially saponified ethylene-vinyl acetate copolymer, Examples include ethylene-based copolymers such as carboxylated ethylene-vinyl acetate copolymer, ethylene- (meth) acryl-maleic anhydride copolymer, ethylene-vinyl acetate- (meth) acrylate copolymer (note that And “(meth) acryl” means “acryl or methacryl”.) In addition, polyvinyl butyral (PVB) resin, epoxy resin, phenol resin, silicone resin, polyester resin, urethane resin, rubber adhesive, SEBS (styrene / ethylene / butylene / styrene), SBS (styrene / butadiene / styrene), etc. Thermoplastic elastomers and the like can also be used, but it is acrylic resin-based pressure-sensitive adhesives and epoxy resins that can easily obtain good adhesiveness.

  The thickness of the transparent adhesive layer is generally 10 to 50 μm, preferably 20 to 30 μm. In general, the display filter can be equipped by heat-pressing the pressure-sensitive adhesive layer to a glass plate of the display.

  When EVA is also used as the material for the transparent adhesive layer, the EVA has a vinyl acetate content of 5 to 50% by weight, preferably 15 to 40% by weight. When the vinyl acetate content is less than 5% by weight, there is a problem in transparency, and when it exceeds 40% by weight, the mechanical properties are remarkably deteriorated and the film formation becomes difficult and the films are easily blocked.

  When EVA or the like is used, the transparent pressure-sensitive adhesive layer may further contain a crosslinking agent. As the cross-linking agent, an organic peroxide is suitable for heat cross-linking and is selected in consideration of sheet processing temperature, cross-linking temperature, storage stability, and the like. Examples of peroxides that can be used include 2,5-dimethylhexane-2,5-dihydroperoxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane-3; -Butyl peroxide; t-butylcumyl peroxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane; dicumyl peroxide; α, α'-bis (t-butylperoxyisopropyl) ) Benzene; n-butyl-4,4-bis (t-butylperoxy) valerate; 2,2-bis (t-butylperoxy) butane; 1,1-bis (t-butylperoxy) cyclohexane; , 1-bis (t-butylperoxy) -3,3,5-trimethylcyclohexane; t-butylperoxybenzoate; benzoyl peroxide; Luperoxyacetate; 2,5-dimethyl-2,5-bis (tertiarybutylperoxy) hexyne-3; 1,1-bis (tertiarybutylperoxy) -3,3,5-trimethylcyclohexane; 1-bis (tert-butylperoxy) cyclohexane; methyl ethyl ketone peroxide; 2,5-dimethylhexyl-2,5-bisperoxybenzoate; tert-butyl hydroperoxide; p-menthane hydroperoxide; p-chlorobenzoyl Peroxides; tertiary butyl peroxyisobutyrate; hydroxyheptyl peroxide; chlorohexanone peroxide. These peroxides are used singly or in combination of two or more, and are usually used at a ratio of 5 parts by mass or less, preferably 0.5 to 5.0 parts by mass with respect to 100 parts by weight of EVA. .

  The organic peroxide is usually kneaded with EVA using an extruder, a roll mill or the like, but may be dissolved in an organic solvent, a plasticizer, a vinyl monomer or the like and added to the EVA film by an impregnation method.

  In order to improve the physical properties of EVA (mechanical strength, optical properties, adhesion, weather resistance, whitening resistance, crosslinking speed, etc.), various acryloxy group or methacryloxy group and allyl group-containing compounds are added to the transparent adhesive layer. Further, it can be added. As the compound used for this purpose, acrylic acid or methacrylic acid derivatives, for example, esters and amides thereof are the most common. As the ester residue, in addition to alkyl groups such as methyl, ethyl, dodecyl, stearyl, lauryl, cyclohexyl groups , Tetrahydrofurfuryl group, aminoethyl group, 2-hydroxyethyl group, 3-hydroxypropyl group, 3-chloro-2-hydroxypropyl group and the like. Further, esters with polyfunctional alcohols such as ethylene glycol, triethylene glycol, polyethylene glycol, trimethylolpropane, and pentaerythritol can also be used. A typical amide is diacetone acrylamide.

  Examples thereof include polyfunctional esters such as acrylic or methacrylic acid esters such as trimethylolpropane, pentaerythritol, glycerin, triallyl cyanurate, triallyl isocyanurate, diallyl phthalate, diallyl isophthalate, diallyl maleate, etc. Examples include allyl group-containing compounds. These are used alone or in combination of two or more, and are usually used in an amount of 0.1 to 2 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of EVA. .

  When EVA is cross-linked by light, the photosensitizer in the transparent adhesive layer is usually 5 parts by mass or less, preferably 0.1 to 3.0 parts by mass with respect to 100 parts by mass of EVA instead of the peroxide. used.

  In this case, usable photosensitizers include, for example, benzoin, benzophenone, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, dibenzyl, 5-nitroacenaphthene, hexachlorocyclopentadiene, p-nitrodiphenyl. , P-nitroaniline, 2,4,6-trinitroaniline, 1,2-benzanthraquinone, 3-methyl-1,3-diaza-1,9-benzanthrone, and the like. Alternatively, two or more types can be mixed and used.

  Moreover, a silane coupling agent may be used together as an adhesion promoter in the transparent adhesive layer. As this silane coupling agent, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycid Xylpropyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-chloropropylmethoxysilane, vinyltrichlorosilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N- β (aminoethyl) -γ-aminopropyltrimethoxysilane and the like can be mentioned.

  The silane coupling agent is generally used in an amount of 0.001 to 10 parts by mass, preferably 0.001 to 5 parts by mass, based on 100 parts by mass of EVA, and one or more types are mixed and used.

  In addition, the transparent adhesive layer according to the present invention may contain a small amount of an ultraviolet absorber, an infrared absorber, an anti-aging agent, a coating processing aid, a colorant and the like. Further, a small amount of a filler such as hydrophobic silica and calcium carbonate may be included.

  For example, EVA and the above-mentioned additive are mixed and kneaded with an extruder, a roll, etc., and then the transparent adhesive layer is formed into a predetermined shape by a film forming method such as calendar, roll, T-die extrusion, inflation, etc. It is manufactured by.

  It is preferable that a release sheet is further provided on the transparent adhesive layer. The release sheet material is preferably a transparent polymer having a glass transition temperature of 50 ° C. or higher. Examples of such a material include polyester resins such as polyethylene terephthalate, polycyclohexylene terephthalate, and polyethylene naphthalate, nylon 46, and modified nylon. In addition to polyamide resins such as 6T, nylon MXD6 and polyphthalamide, ketone resins such as polyphenylene sulfide and polythioether sulfone, and sulfone resins such as polysulfone and polyether sulfone, polyether nitrile, polyarylate, poly Resins based on polymers such as ether imide, polyamide imide, polycarbonate, polymethyl methacrylate, triacetyl cellulose, polystyrene and polyvinyl chloride can be used. . Of these, polycarbonate, polymethyl methacrylate, polyvinyl chloride, polystyrene, and polyethylene terephthalate can be suitably used. The thickness is preferably 10 to 200 μm, particularly preferably 30 to 100 μm.

  A first functional layer including an antireflection layer comprising the above-described hard coat layer, low refractive index layer, and high refractive index layer, which is a preferred embodiment of the present invention, a near infrared absorption layer, and a transparent adhesive layer, FIG. 2 shows a schematic cross-sectional view of a display filter having a second functional layer containing. The display filter shown in FIG. 2 includes a transparent substrate 210, a mesh-shaped electromagnetic wave shield layer 220 formed on the transparent substrate 210, a hard coat layer 230b formed on the electromagnetic wave shield layer 220, The low refractive index layer 240 formed on the coat layer 230b and the high refractive index layer 250 formed on the low refractive index layer 240 are included. Further, the display filter has a near-infrared absorbing layer 260 and a transparent adhesive layer 270 on the surface of the transparent substrate 210 opposite to the surface on which the electromagnetic wave shielding layer 220 is formed.

  According to the method of the present invention described above, a first functional layer having high surface smoothness, preferably a hard coat layer can be formed. Therefore, the antireflection layer formed on such a hard coat layer has a surface roughness Ra of 0.1 μm or less, preferably 0.01 to 0.1 μm, more preferably 0.01 to 0.08 μm. A display filter having surface smoothness, thereby suppressing irregular reflection of light and excellent antireflection properties can be obtained.

  In the present invention, the surface roughness Ra of the antireflection layer and the smoothing sheet can be measured using a surface roughness meter (Surfcom 480A manufactured by Tokyo Seimitsu Co., Ltd.) according to JIS B0601-2001.

  The display filter produced by the method of the present invention is not particularly limited, but can be applied to a display using means such as bonding to the surface of the image display glass plate of the display via a transparent adhesive layer. Such displays include field emission displays (FED) including surface field display (SED), liquid crystal displays (LCD), plasma display panels (PDP), flat panel displays (FPD) such as EL displays, and CRTs. A display etc. are mentioned.

  EXAMPLES Hereinafter, although an Example is shown and this invention is demonstrated concretely, this invention is not limited to a following example.

Example 1
1. Formation of mesh electromagnetic wave shielding layer A 20% aqueous solution of polyvinyl alcohol was printed in a dot shape on a polyethylene terephthalate film (thickness: 100 μm). The size of one dot is a square shape with one side of 155 μm, the interval between dots is 20 μm, and the dot arrangement is a square lattice. The printing thickness is 0.2 μm after drying.

  On top of that, copper was vacuum-deposited so as to have an average film thickness of 0.4 μm. Next, it was immersed in room temperature water and rubbed with a sponge to dissolve and remove the dot portion, then rinsed with water and dried to form a mesh-like electromagnetic wave shielding layer on the entire surface of the polyethylene film.

  The electromagnetic wave shielding layer on the surface of the film has a square lattice shape corresponding to the negative pattern of dots accurately, the average thickness is 3.6 μm, the average line width is 30 μm, the average pitch is 170 μm, and the aperture ratio is 18%. Met.

2. Formation of Black Alloy Conductive Layer A black alloy conductive layer (thickness 0.2 μm) covering the entire surface of the electromagnetic shield layer by performing zinc-nickel alloy plating on the electromagnetic shield layer formed on the PET film under the following conditions. ) Was formed.

(Plating conditions)
Plating solution temperature: 40 ° C
Current density: 5 to 10 A / dm ²
Plating time: 10 seconds Plating solution amount: 120 m ³
(Plating solution composition)
Zn ²⁺ concentration with ZnCl ₂ is 2.0g / l, NiCl Ni ²⁺ concentration using ₂ · 6H ₂ O is 0.5g / l, K ⁺ concentration using KCl is 250 g / l, pH 10 Plating solution Was used.

3. Formation of Hard Coat Layer 5 parts by mass of a polymerization initiator (Irgacure (registered trademark) 184 (manufactured by Ciba Specialty Chemicals)) is added to 100 parts by mass of dipentaerythritol hexaacrylate as a resin component to obtain a solid content A It was. On the other hand, solvent A was obtained by mixing 2-propanol and cyclohexanone at a mass ratio of 7: 3. Solid content A and solvent A are mixed at a mass ratio of 2: 8, 0.02 part by mass of silicone oil (KF96-200CS Shin-Etsu Silicone) is added, and the mixture is stirred at room temperature for 1 hour, thereby coating the hard coat layer. Was prepared.

Next, the hard coat layer coating material was applied to the entire surface of the electromagnetic wave shielding layer with a bar coater, and the obtained coating layer was dried at 120 ° C. for 30 seconds. A polyethylene terephthalate film (Teijin (registered trademark) Tetoron (registered trademark) film 3 manufactured by Teijin DuPont Films, Ltd., surface roughness Ra 0.008 μm) is laminated as a smoothing sheet on the coating layer using a hand roller, After irradiating ultraviolet rays with an integrated light quantity of 600 mJ / cm ^2, the polyethylene terephthalate film was peeled off to form a hard coat layer (thickness 10 μm, refractive index 1.49) on the electromagnetic wave shielding layer.

4). Formation of high refractive index layer Composite colloidal sol of titanium dioxide and zirconium dioxide (average particle size 13.1 μm, solid content concentration 30% by mass, methanol solvent, mass ratio of titanium dioxide and zirconium dioxide = 85: 15) with respect to 200 parts by mass , 50 parts by mass of trimethylolpropane acrylate (EO 3 mol addition) as a resin component, 7 parts by mass of a polymerization initiator (Irgacure (registered trademark) 1800 (manufactured by Ciba Specialty Chemicals)), 50 parts by mass of isopropyl alcohol as a solvent, and silicone 0.01 parts by mass of oil (KF96-50CS Shin-Etsu Silicone) was added, stirred for 1 hour at room temperature, and then filtered through a polypropylene filter having a pore size of 1 μm to prepare a coating material for a high refractive index layer.

Next, a coating material for a high refractive index layer is applied onto the hard coat layer with a bar coater, dried at 80 ° C. for 10 seconds, and then irradiated with ultraviolet rays having an integrated light amount of 600 mJ / cm ² to form a coating on the hard coat layer. A high refractive index layer (thickness 110 nm, refractive index 1.70) was formed.

5). Formation of Low Refractive Index Layer 3-Methacryloxypropyltrimethoxysilane (KBM-503 Shin-Etsu Silicone) as a silane coupling agent with respect to 100 parts by mass of methanol dispersion of silica fine particles (average particle size 15 nm, solid content concentration 50% by mass) 3 parts by weight, 1 part by weight of 1N hydrochloric acid as a catalyst was added, stirred at room temperature for 12 hours, and then allowed to stand at room temperature for 50 hours to prepare a silane-coupled silica fine particle dispersion.

  With respect to 5 parts by mass of this silica fine particle dispersion, 25 parts by mass of pentaerythritol hexaacrylate as a resin component, 94 parts by mass of methyl isobutyl ketone and 5 parts by mass of isobutyl alcohol as a solvent, a polymerization initiator (Irgacure (registered trademark) 907 (Ciba Specialty) Chemical company)) 2 parts by mass, and further 0.001 part by mass of silicone oil (KF96-50CS Shin-Etsu Silicone), stirred for 1 hour at room temperature, and then filtered through a polypropylene filter with a pore size of 1 μm. A layer coating was prepared.

Next, a coating material for low refractive index adjustment is applied onto the high refractive index layer with a bar coater, dried at 80 ° C. for 10 seconds, and then irradiated with ultraviolet rays having an integrated light amount of 600 mJ / cm ² to form a hard coat layer. A high refractive index layer (thickness 95 nm, refractive index 1.39) was formed thereon. Thereby, a filter for display was obtained.

(Example 2)
In the coating material for hard coat layer of Example 1, the resin component was changed from 100 parts by mass of dipentaerythritol hexaacrylate to 50 parts by mass of pentaerythritol tetraacrylate and 50 parts by mass of ethoxycabisphenol A diacrylate (EO 4 mol addition). A display filter was produced in the same manner as in Example 1 except that the thickness of the hard coat layer was 14 μm.

(Comparative Example 1)
A display filter was produced in the same manner as in Example 1 except that a polyethylene terephthalate film as a smoothing sheet was not used in forming the hard coat layer.

(Comparative Example 2)
In the formation of the hard coat layer, a display filter was produced in the same manner as in Example 2 except that a polyethylene terephthalate film as a smoothing sheet was not used and the thickness of the hard coat layer was 20 μm.

(Evaluation)
1. Thickness of the hard coat layer The thickness of the hard coat layer was measured using a thin film measuring meter F20 (manufactured by Filmetrics Co., Ltd.). The results are shown in Table 1.

2. Surface roughness Ra
The surface roughness Ra of the high refractive index layer in the display filter is measured using a surface roughness meter (Surfcom 480A, manufactured by Tokyo Seimitsu Co., Ltd.) according to JIS B 0601 (1994), a measurement length of 4 mm, Measurements were made at a cut-off value of 0.8 mm. The results are shown in Table 1.

3. Reflectance (minimum reflectance, luminous reflectance)
A black vinyl tape is attached to the back surface of the display filter (the back surface of the electromagnetic wave shield layer forming surface) using a hand roller, and a spectrophotometer (U-4000 manufactured by Hitachi High-Technologies Corporation) is used to obtain a 5 ° regular reflectance. By measuring, the reflectance (minimum reflectance, luminous reflectance) of the transparent base material with a low reflection film was measured. The lowest reflectance within the wavelength range of 400 nm to 700 nm is defined as the minimum reflectance, and the average reflectance within the wavelength range of 400 to 700 nm is defined as the luminous reflectance. The results are shown in Table 1.

4). Pencil Hardness of Hard Coat Layer Based on JIS-5600-5-4, the prepared hard coat layer was measured with a load of 500 g. Place a pencil on the hard coat layer, apply a load of 500 g from the top at an angle of 45 degrees, and scratch about 5 mm to check the degree of damage. The results are shown in Table 1.

  Since the method of the present invention is excellent in the visibility of the image displayed on the display, a method for producing a display filter installed on the entire surface of a display such as a plasma display (PDP), a liquid crystal display, an organic EL display, a field emission display, etc. Useful as.

It is explanatory drawing explaining the manufacturing method of this invention along each process. Sectional drawing of the filter for displays of this invention is shown.

Explanation of symbols

110, 210 transparent substrate,
120, 220 mesh electromagnetic shielding layer,
130a coating layer,
130b, 230b hard coat layer,
180 smoothing sheet,
240 low refractive index layer,
250 high refractive index layer,
260 Near-infrared absorbing layer,
270 Transparent adhesive layer.

Claims (10)

A step (a) of applying a first functional layer-forming coating solution containing a synthetic resin composition on a transparent substrate having a mesh-shaped electromagnetic wave shielding layer;
After laminating the smoothing sheet on the coating layer obtained by the step (a), the step of forming the first functional layer by curing the coating layer (b),
A method for producing a display filter, comprising:   The display filter method according to claim 1, wherein the first functional layer is a hard coat layer.   The manufacturing method of the filter for a display of Claim 1 or 2 in which the said synthetic resin composition contains a ultraviolet curable resin and a photoinitiator. The said coating liquid contains 50 mass parts or less of organic solvents with respect to 100 mass parts of said synthetic resin compositions, The manufacture of the filter for displays of any one of Claims 1-3 characterized by the above-mentioned. Method.   The said coating liquid contains at least 1 sort (s) of silicone oil selected from the group which consists of dimethyl silicone oil, methylphenyl silicone oil, and methyl hydrogen silicone oil, The any one of Claims 1-4 characterized by the above-mentioned. The manufacturing method of the filter for displays as described in a term.   The display according to claim 1, wherein the coating layer is dried by heating at 70 to 130 ° C. for 5 to 60 seconds, and then a smoothing sheet is laminated. Method for manufacturing a filter for an automobile.   The method for producing a display filter according to claim 1, wherein the smoothing sheet has a surface roughness Ra of 0.05 μm or less.   The method for manufacturing a display filter according to claim 3, wherein the coating layer is cured by irradiating with ultraviolet rays in the step (b).   The method for manufacturing a display filter according to claim 2, further comprising a step of forming an antireflection layer on the hard coat layer.   The method further comprises forming a high refractive index layer having a higher refractive index than the hard coat layer and a low refractive index layer having a lower refractive index than the hard coat layer on the hard coat layer. The manufacturing method of the filter for displays of Claim 9.

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