JP2009541314A5 - - Google Patents

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Publication number
JP2009541314A5
JP2009541314A5 JP2009516496A JP2009516496A JP2009541314A5 JP 2009541314 A5 JP2009541314 A5 JP 2009541314A5 JP 2009516496 A JP2009516496 A JP 2009516496A JP 2009516496 A JP2009516496 A JP 2009516496A JP 2009541314 A5 JP2009541314 A5 JP 2009541314A5
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JP
Japan
Prior art keywords
alkoxysilane
carbon atoms
activated carbon
group
halide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009516496A
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English (en)
Japanese (ja)
Other versions
JP5247688B2 (ja
JP2009541314A (ja
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Publication date
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Priority claimed from PCT/US2007/013015 external-priority patent/WO2007149201A2/en
Publication of JP2009541314A publication Critical patent/JP2009541314A/ja
Publication of JP2009541314A5 publication Critical patent/JP2009541314A5/ja
Application granted granted Critical
Publication of JP5247688B2 publication Critical patent/JP5247688B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009516496A 2006-06-20 2007-05-31 低減されたハロゲン化物含有量を有するアルコキシシランの調製方法 Active JP5247688B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US81507306P 2006-06-20 2006-06-20
US60/815,073 2006-06-20
PCT/US2007/013015 WO2007149201A2 (en) 2006-06-20 2007-05-31 Method for preparation of alkoxysilanes having reduced halide content

Publications (3)

Publication Number Publication Date
JP2009541314A JP2009541314A (ja) 2009-11-26
JP2009541314A5 true JP2009541314A5 (https=) 2011-04-07
JP5247688B2 JP5247688B2 (ja) 2013-07-24

Family

ID=38671044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009516496A Active JP5247688B2 (ja) 2006-06-20 2007-05-31 低減されたハロゲン化物含有量を有するアルコキシシランの調製方法

Country Status (6)

Country Link
US (1) US20090270646A1 (https=)
EP (1) EP2032588B1 (https=)
JP (1) JP5247688B2 (https=)
CN (1) CN101437830B (https=)
TW (1) TW200808816A (https=)
WO (1) WO2007149201A2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3768658B1 (en) 2018-03-21 2024-06-26 Rohm and Haas Company Method for preparing acrylic acid
US11168181B2 (en) * 2019-09-11 2021-11-09 Dow Silicones Corporation Method for the preparation of an alkoxy-functional organohydrogensiloxane oligomer and use of said oligomer
CN112789282B (zh) 2019-09-11 2021-09-28 美国陶氏有机硅公司 用于使用纯化的起始物质的烷氧基官能有机氢硅氧烷低聚物的制备用途和低聚物的用途的方法
CN117701240A (zh) * 2023-12-26 2024-03-15 烟台德邦科技股份有限公司 一种保型性良好的有机聚硅氧烷组合物及其制备方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798828B2 (ja) * 1990-05-18 1995-10-25 東芝シリコーン株式会社 アルコキシシランの精製方法
DE69116612T2 (de) * 1990-07-05 1996-05-30 Osi Specialties Inc Verfahren zur Verminderung der Verunreinigung durch Halogenide in Alkoxysilanen
JPH04230291A (ja) * 1990-12-05 1992-08-19 Showa Denko Kk アルコキシシラン中の塩素化合物の除去方法
JP3197295B2 (ja) * 1991-07-25 2001-08-13 多摩化学工業株式会社 アルコキシシランの脱塩素処理方法
JP2938727B2 (ja) * 1993-09-14 1999-08-25 信越化学工業株式会社 メチルジメトキシシランの保存方法
CA2161181A1 (en) * 1994-10-25 1996-04-26 Frank Kropfgans Process for the preparation of 3-halo- and -pseudohaloalkylsilane esters
JP3567034B2 (ja) * 1995-11-30 2004-09-15 ジーイー東芝シリコーン株式会社 アルコキシシランの精製方法
JP3823400B2 (ja) * 1996-05-23 2006-09-20 東亞合成株式会社 高純度アルコキシシランの製造方法
DE19624032A1 (de) * 1996-06-17 1997-12-18 Huels Chemische Werke Ag Oligomerengemisch kondensierter Alkylalkoxysilane
DE19821156B4 (de) * 1998-05-12 2006-04-06 Degussa Ag Verfahren zur Minderung von Resthalogengehalten und Farbzahlverbesserung in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen und die Verwendung von Aktivkohle dazu
US5914421A (en) * 1998-07-01 1999-06-22 Dow Corning Corporation Method for preparation of alkoxysilanes having reduced halide content
DE19849196A1 (de) * 1998-10-26 2000-04-27 Degussa Verfahren zur Neutralisation und Minderung von Resthalogengehalten in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen

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