JP2009537310A5 - - Google Patents

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Publication number
JP2009537310A5
JP2009537310A5 JP2009511055A JP2009511055A JP2009537310A5 JP 2009537310 A5 JP2009537310 A5 JP 2009537310A5 JP 2009511055 A JP2009511055 A JP 2009511055A JP 2009511055 A JP2009511055 A JP 2009511055A JP 2009537310 A5 JP2009537310 A5 JP 2009537310A5
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JP
Japan
Prior art keywords
support
layer
visible light
article
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2009511055A
Other languages
English (en)
Other versions
JP2009537310A (ja
Filing date
Publication date
Priority claimed from US11/437,923 external-priority patent/US20070269750A1/en
Application filed filed Critical
Publication of JP2009537310A publication Critical patent/JP2009537310A/ja
Publication of JP2009537310A5 publication Critical patent/JP2009537310A5/ja
Withdrawn legal-status Critical Current

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Claims (5)

  1. 支持体を用意し、前記支持体の一方の側に多色マスクを塗布し、該支持体の他方の側に、可視光によって硬化可能な層を塗布し、そして該光硬化性層を該マスクを通して可視光で露光することにより、露光された部分において、硬化されたパターンを形成するように、光によって硬化可能な層を硬化させることを含んで成る積層透明構造体を形成する方法。
  2. 該支持体の前記多色マスクとは反対の側に、機能性透明材料層を適用することをさらに含んで成る請求項1に記載の方法。
  3. 透明支持体と、該支持体の裏側の多色マスクと、該多色マスクの少なくとも1つの色と見当合わせされた、該支持体の表側の少なくとも1つのパターン化層とを含んで成る物品。
  4. 支持体の裏側上に画像形成層、並びに該支持体の表側上に、該支持体から順に、機能透明層及び可視光によって硬化可能な層を有する当該支持体を含んで成る物品。
  5. 支持体の裏側に画像形成層、及び表側に、可視光スペクトルの一部だけと整合するスペクトルを有する可視光によって硬化される材料から成る少なくとも1つの層を有する当該支持体を含んで成る物品。
JP2009511055A 2006-05-19 2007-05-16 透明構造体を形成するための着色マスキング Withdrawn JP2009537310A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/437,923 US20070269750A1 (en) 2006-05-19 2006-05-19 Colored masking for forming transparent structures
PCT/US2007/011734 WO2007136656A2 (en) 2006-05-19 2007-05-16 Colored masking for forming transparent structures

Publications (2)

Publication Number Publication Date
JP2009537310A JP2009537310A (ja) 2009-10-29
JP2009537310A5 true JP2009537310A5 (ja) 2011-06-30

Family

ID=38712363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009511055A Withdrawn JP2009537310A (ja) 2006-05-19 2007-05-16 透明構造体を形成するための着色マスキング

Country Status (5)

Country Link
US (2) US20070269750A1 (ja)
EP (1) EP2018596A2 (ja)
JP (1) JP2009537310A (ja)
TW (1) TW200813490A (ja)
WO (1) WO2007136656A2 (ja)

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US8173355B2 (en) * 2007-11-20 2012-05-08 Eastman Kodak Company Gradient colored mask
US8129098B2 (en) * 2007-11-20 2012-03-06 Eastman Kodak Company Colored mask combined with selective area deposition
US8221964B2 (en) * 2007-11-20 2012-07-17 Eastman Kodak Company Integrated color mask
US8153352B2 (en) * 2007-11-20 2012-04-10 Eastman Kodak Company Multicolored mask process for making display circuitry
US8062693B2 (en) * 2008-09-22 2011-11-22 Sunpower Corporation Generation of contact masks for inkjet printing on solar cell substrates
US8409911B2 (en) * 2009-02-24 2013-04-02 Sunpower Corporation Methods for metallization of solar cells
DE102009033762A1 (de) * 2009-07-17 2011-01-27 Leonhard Kurz Stiftung & Co. Kg Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper
US20110048505A1 (en) * 2009-08-27 2011-03-03 Gabriela Bunea Module Level Solution to Solar Cell Polarization Using an Encapsulant with Opened UV Transmission Curve
US8377738B2 (en) 2010-07-01 2013-02-19 Sunpower Corporation Fabrication of solar cells with counter doping prevention
US20120104103A1 (en) * 2010-10-29 2012-05-03 Nxp B.V. Integrated pcb uhf rfid matching network/antenna
US10381720B2 (en) 2010-12-08 2019-08-13 Nxp B.V. Radio frequency identification (RFID) integrated circuit (IC) and matching network/antenna embedded in surface mount devices (SMD)
WO2013048834A1 (en) * 2011-09-30 2013-04-04 3M Innovative Properties Company Methods of continuously wet etching a patterned substrate
WO2014008358A1 (en) * 2012-07-05 2014-01-09 Cornell University Porous membrane apparatus, method, and applications
US9812590B2 (en) 2012-10-25 2017-11-07 Sunpower Corporation Bifacial solar cell module with backside reflector
US9035172B2 (en) 2012-11-26 2015-05-19 Sunpower Corporation Crack resistant solar cell modules
US20140170427A1 (en) * 2012-12-13 2014-06-19 Carestream Health, Inc. Anticorrosion agents for transparent conductive film
US8796061B2 (en) 2012-12-21 2014-08-05 Sunpower Corporation Module assembly for thin solar cells
US9685571B2 (en) 2013-08-14 2017-06-20 Sunpower Corporation Solar cell module with high electric susceptibility layer
KR102287813B1 (ko) * 2014-05-30 2021-08-10 삼성전자주식회사 하드마스크 조성물 및 이를 이용한 패턴의 형성방법
CN104900531A (zh) * 2015-06-08 2015-09-09 京东方科技集团股份有限公司 一种氧化物薄膜晶体管、阵列基板及制作方法、显示装置
DE102015015452A1 (de) * 2015-12-02 2017-06-08 Forschungszentrum Jülich GmbH Verfahren zum Planarisieren von Nanostrukturen

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US2371746A (en) * 1942-12-12 1945-03-20 Eastman Kodak Co Photographic color correction process
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BE542578A (ja) * 1954-11-05
JPS60149025A (ja) * 1984-01-13 1985-08-06 Seiko Epson Corp 液晶表示装置
US5314769A (en) * 1991-04-25 1994-05-24 Nippon Oil Co., Ltd. Method for producing color filter
US5391507A (en) * 1993-09-03 1995-02-21 General Electric Company Lift-off fabrication method for self-aligned thin film transistors
US6338988B1 (en) * 1999-09-30 2002-01-15 International Business Machines Corporation Method for fabricating self-aligned thin-film transistors to define a drain and source in a single photolithographic step
GB9927287D0 (en) * 1999-11-19 2000-01-12 Koninkl Philips Electronics Nv Top gate thin film transistor and method of producing the same
KR100672645B1 (ko) * 2003-10-02 2007-01-23 엘지.필립스 엘시디 주식회사 컬러필터 기판의 제조방법
US7056834B2 (en) * 2004-02-10 2006-06-06 Hewlett-Packard Development Company, L.P. Forming a plurality of thin-film devices using imprint lithography
US7259106B2 (en) * 2004-09-10 2007-08-21 Versatilis Llc Method of making a microelectronic and/or optoelectronic circuitry sheet
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