JP2009532725A5 - - Google Patents

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Publication number
JP2009532725A5
JP2009532725A5 JP2009503431A JP2009503431A JP2009532725A5 JP 2009532725 A5 JP2009532725 A5 JP 2009532725A5 JP 2009503431 A JP2009503431 A JP 2009503431A JP 2009503431 A JP2009503431 A JP 2009503431A JP 2009532725 A5 JP2009532725 A5 JP 2009532725A5
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Japan
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optical system
mirror
projection objective
image
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JP2009503431A
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Japanese (ja)
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JP2009532725A (ja
JP5479890B2 (ja
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Priority claimed from PCT/EP2006/008869 external-priority patent/WO2007031271A1/en
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Priority claimed from PCT/EP2007/000068 external-priority patent/WO2007115597A1/en
Publication of JP2009532725A publication Critical patent/JP2009532725A/ja
Publication of JP2009532725A5 publication Critical patent/JP2009532725A5/ja
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JP2009503431A 2006-04-07 2007-01-05 マイクロリソグラフィ投影光学システム、装置、及び製造方法 Expired - Fee Related JP5479890B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US79338706P 2006-04-07 2006-04-07
US60/793387 2006-04-07
EPPCT/EP2006/008869 2006-09-12
PCT/EP2006/008869 WO2007031271A1 (en) 2005-09-13 2006-09-12 Microlithography projection optical system, method for manufacturing a device and method to design an optical surface
PCT/EP2007/000068 WO2007115597A1 (en) 2006-04-07 2007-01-05 Microlithography projection optical system, tool and method of production

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013206713A Division JP5830508B2 (ja) 2006-04-07 2013-10-01 マイクロリソグラフィ投影光学システム、装置、及び製造方法

Publications (3)

Publication Number Publication Date
JP2009532725A JP2009532725A (ja) 2009-09-10
JP2009532725A5 true JP2009532725A5 (enExample) 2012-11-15
JP5479890B2 JP5479890B2 (ja) 2014-04-23

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JP2009503431A Expired - Fee Related JP5479890B2 (ja) 2006-04-07 2007-01-05 マイクロリソグラフィ投影光学システム、装置、及び製造方法
JP2009503430A Expired - Fee Related JP5479889B2 (ja) 2006-04-07 2007-01-05 デバイス製造用のマイクロリソグラフィ投影光学システム及び方法
JP2013206713A Expired - Fee Related JP5830508B2 (ja) 2006-04-07 2013-10-01 マイクロリソグラフィ投影光学システム、装置、及び製造方法

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JP2009503430A Expired - Fee Related JP5479889B2 (ja) 2006-04-07 2007-01-05 デバイス製造用のマイクロリソグラフィ投影光学システム及び方法
JP2013206713A Expired - Fee Related JP5830508B2 (ja) 2006-04-07 2013-10-01 マイクロリソグラフィ投影光学システム、装置、及び製造方法

Country Status (7)

Country Link
US (5) US20090052073A1 (enExample)
EP (2) EP2005249A1 (enExample)
JP (3) JP5479890B2 (enExample)
KR (1) KR101475956B1 (enExample)
CN (1) CN101416117B (enExample)
TW (2) TWI451186B (enExample)
WO (2) WO2007115597A1 (enExample)

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CN105511075B (zh) * 2016-01-13 2017-10-13 中国科学院上海技术物理研究所 一种大视场摆扫二维像移补偿双通道成像仪光学系统
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