JP2009526015A5 - - Google Patents
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- Publication number
- JP2009526015A5 JP2009526015A5 JP2008553748A JP2008553748A JP2009526015A5 JP 2009526015 A5 JP2009526015 A5 JP 2009526015A5 JP 2008553748 A JP2008553748 A JP 2008553748A JP 2008553748 A JP2008553748 A JP 2008553748A JP 2009526015 A5 JP2009526015 A5 JP 2009526015A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- formula
- group
- compound represented
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atoms Chemical group C* 0.000 claims 7
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- -1 benzophenone carboxylic acid Chemical class 0.000 claims 2
- 239000002537 cosmetic Substances 0.000 claims 2
- PDLPMGPHYARAFP-UHFFFAOYSA-N (3-hydroxy-2-phenylphenyl)-phenylmethanone Chemical class C=1C=CC=CC=1C=1C(O)=CC=CC=1C(=O)C1=CC=CC=C1 PDLPMGPHYARAFP-UHFFFAOYSA-N 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 239000000969 carrier Substances 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 125000000392 cycloalkenyl group Chemical group 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000004433 nitrogen atoms Chemical group N* 0.000 claims 1
- 0 C*(N(C)O*)[Cn] Chemical compound C*(N(C)O*)[Cn] 0.000 description 1
Claims (3)
- 式(1)
R1及びR2は、互いに独立して、水素原子;炭素原子数1ないし20のアルキル基;炭素原子数2ないし20のアルケニル基;炭素原子数3ないし20のシクロアルキル基;炭素原子数3ないし10のシクロアルケニル基を表わすか;又は、
R1及びR2は、結合している窒素原子と一緒になって、5−又は6−員の複素環を形成し;
R3、R4及びR5は、互いに独立して、炭素原子数1ないし4のアルキル基;炭素原子数
1ないし4のアルコキシ基;又は、式(1a)
;
Aは、1つ以上の*−O−*又は*−O−(CO)−*基によって所望により中断された直鎖の又は枝分かれした炭素原子数3ないし6のアルキレン基を表わし;及び、
mは、0又は1ないし5の数を表わす。]で表される化合物。 - 化粧品に受容され得るキャリヤー又は助剤と共に、請求項1に記載の式(1)で表わされる化合物を少なくとも1種以上含む化粧品。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06101454.4 | 2006-02-09 | ||
EP06101454 | 2006-02-09 | ||
PCT/EP2007/051117 WO2007090832A1 (en) | 2006-02-09 | 2007-02-06 | Hydroxybenzophenone derivatives |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009526015A JP2009526015A (ja) | 2009-07-16 |
JP2009526015A5 true JP2009526015A5 (ja) | 2010-03-11 |
JP5294877B2 JP5294877B2 (ja) | 2013-09-18 |
Family
ID=36010871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008553748A Expired - Fee Related JP5294877B2 (ja) | 2006-02-09 | 2007-02-06 | ヒドロキシベンゾフェノン誘導体 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7999128B2 (ja) |
EP (1) | EP1981895B1 (ja) |
JP (1) | JP5294877B2 (ja) |
ES (1) | ES2584204T3 (ja) |
GB (1) | GB2435041A (ja) |
WO (1) | WO2007090832A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007024343A1 (de) * | 2007-05-22 | 2008-11-27 | Beiersdorf Ag | Kosmetische Zubereitung mit polymerem UV-Filter und Metalloxiden |
AR100211A1 (es) * | 2014-05-19 | 2016-09-21 | Interquim Sa | Procedimiento para la preparación de un polímero fotoprotector progresivo de organosilicio; polímero fotoprotector progresivo de organosilicio, su uso, composición que lo comprende, monómero precursor, procedimientos para la preparación de dicho monómero precursor |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2938047A (en) | 1958-11-13 | 1960-05-24 | Union Carbide Corp | Carbobenzophenoneoxyalkyl siloxanes and their preparation |
US4042613A (en) | 1974-04-23 | 1977-08-16 | Dai Nippon Printing Co., Ltd. | Benzophenone derivatives and their preparation and application |
US4495360A (en) * | 1982-04-30 | 1985-01-22 | General Electric Company | Ultraviolet light absorbing agents, method for making, compositions and articles containing same |
US5270426A (en) * | 1990-01-22 | 1993-12-14 | Shin-Etsu Chemical Co., Ltd. | Organosilicon compound |
JPH03287588A (ja) * | 1990-04-02 | 1991-12-18 | Shiseido Co Ltd | ベンゾフェノン誘導体、紫外線吸収剤及び皮膚外用剤 |
FR2684551B1 (fr) * | 1991-12-05 | 1995-04-21 | Oreal | Huile cosmetique filtrante contenant une silicone filtre et un melange d'une silicone volatile et d'une huile de silicone ou d'une gomme de silicone et emulsion cosmetique filtrante contenant une telle huile. |
DE59510278D1 (de) | 1994-02-10 | 2002-08-22 | Ciba Sc Holding Ag | Holzschutzanstrich |
US6071052A (en) | 1997-06-30 | 2000-06-06 | Lok-Mor, Inc. | Extended height lock nut |
FR2782516B1 (fr) * | 1998-08-21 | 2001-09-07 | Oreal | Procede de photostabilisation de filtres solaires derives du dibenzoylmethane, compositions cosmetiques filtrantes photostabilisees ainsi obtenues et leurs utilisation |
DE19917906A1 (de) * | 1999-04-20 | 2000-10-26 | Basf Ag | Verwendung von aminosubstituierten Hydroxybenzophenonen als photostabile UV-Filter in kosmetischen und pharmazeutischen Zubereitungen |
DE10011317A1 (de) * | 2000-03-10 | 2001-09-13 | Basf Ag | Verwendung von aminosubstituierten Hydroxybenzophenonen als Lichtschutzmittel und Stabilisatoren für nicht lenbendes organisches Material |
DE10012408A1 (de) | 2000-03-15 | 2001-09-20 | Basf Ag | Verwendung von Lichtschutzmittelkombinationen, die als wesentlichen Bestandteil aminosubstituierte Hydroxybenzophenone enthalten als photostabile UV-Filter in kosmetischen und pharmazeutischen Zubereitungen |
DE10143963A1 (de) | 2001-09-07 | 2003-03-27 | Basf Ag | Kosmetische und dermatologische Zubereitungen in Form von W/O-Emulsionen, enthaltend ein aminosubstituiertes Hydroxybenzophenon |
DE10155963A1 (de) | 2001-11-09 | 2003-05-22 | Beiersdorf Ag | Kosmetische und dermatologische Lichtschutzformulierungen mit einem Gehalt an Hydroxybenzophenonen, Triazin- und/oder Benzotriazol-Derivaten |
CN100424076C (zh) * | 2002-04-12 | 2008-10-08 | 帝斯曼知识产权资产管理有限公司 | 氨基羟基二苯酮的有机硅氧烷衍生物及其在化妆品制备中作为uv-a滤光剂的用途 |
BR0316607B1 (pt) * | 2002-12-12 | 2014-12-23 | Ciba Sc Holding Ag | Derivados de hidroxifenil benzofenona substituídos com amino, seu uso, e preparação cosmética. |
CN101189045B (zh) | 2005-05-31 | 2013-07-24 | 帝斯曼知识产权资产管理有限公司 | 新颖的聚硅氧烷遮光剂 |
-
2007
- 2007-02-06 JP JP2008553748A patent/JP5294877B2/ja not_active Expired - Fee Related
- 2007-02-06 ES ES07726317.6T patent/ES2584204T3/es active Active
- 2007-02-06 US US12/223,686 patent/US7999128B2/en not_active Expired - Fee Related
- 2007-02-06 EP EP07726317.6A patent/EP1981895B1/en active Active
- 2007-02-06 WO PCT/EP2007/051117 patent/WO2007090832A1/en active Application Filing
- 2007-02-07 GB GB0702326A patent/GB2435041A/en not_active Withdrawn
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