JP2009500272A - 表面改質を伴った半導体ナノ粒子 - Google Patents
表面改質を伴った半導体ナノ粒子 Download PDFInfo
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- B82—NANOTECHNOLOGY
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- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
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- H01L29/76—Unipolar devices, e.g. field effect transistors
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- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78681—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising AIIIBV or AIIBVI or AIVBVI semiconductor materials, or Se or Te
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
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- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
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Abstract
Description
1.既知のバルク相と比較して異なる構造および組成;
2.表面の状態および過程を支配させる、より高い体積に対する表面比;および
3.物体のサイズが、波長および基本励起(電子状態、光学波長またはフォノン励起)の可干渉距離と同様または小さい場合の、量子閉じこめの効果。
半導体インクはMTI Crystals Corpの市販の真性シリコンナノ粉末から準備した。初期粉末はシランガスのレーザー分解によって、無酸素環境において生産される。これは通常、保証酸素濃度が1ないし2 %である乾燥窒素雰囲気内で出荷される。水素濃度は特定せず、および他の不純物は検出されない。
実施例2:
半導体機能をもつナノ粒子の第2の実施例は、上記で定義したように、チョクラルスキー結晶成長によるドープされた単結晶シリコンウエハーの機械的摩耗によって作成されたナノ粒子シリコンに関する。これらは、ウエハーにおける自然酸化物を前もって除去することなしに、空気中で1時間、高スピードで環状粉砕機によって粉砕した。従って高酸素濃度が期待されるが、これは未確認のままである。得られた粒子は不規則な形であり、最大寸法の中央値が200nmで、数十ナノメートルから400nmに渡る、広いサイズ分布を有する。平均サイズの粒子は遠心分離機によって分離され、エタノールの懸濁液により沈殿した。
半導体機能性を有するナノ粒子の第3の実施例は、上記で定義したように、南アフリカ共和国、ポロクワネのSilicon Smelters (Pty) Ltdによって提供された、98%純度の金属級のシリコンの機械的摩擦によって生産されたナノ粒子シリコンに関する。シリコン原料は5日間、空気中でロータリーボール粉砕機において粉砕し、15mm直径のイットリウム安定化ジルコニアを粉砕媒体(Inframat Incによる提供)、およびエタノールを潤滑油として使用した。得られた粒子のサイズは2時間の粉砕に環状粉砕機を使用し作成した同物質由来の粉末と比較して、およそ100nmと見積もられた。シリコンにおける前処理は適用されず、およびシリコンウエハーより生産された粉末(実施例2)に対して、同様の酸素および水素濃度を有することが明らかとなった。91%の粉末両画分を有する、ナノ粒子インクで、両方法によって粉砕された粉末を使用して生産されたものは、比抵抗が2.2 MΩ cmのn型である、同様な電気的特性を有する。
Claims (36)
- 1以上のII、III、IV、V、およびVI族の単一元素または元素化合物を含むナノ粒子であって、半導体特性、1nmないし500nmの範囲のサイズを有し、および0.1ないし20原子百分率の酸素および水素よりなる群から選択した置換基を含むナノ粒子。
- 30nmないし200nmの範囲のサイズを有する、請求項1記載のナノ粒子。
- およそ60nmの平均直径を有する、請求項2記載のナノ粒子。
- 20nmないし400nmの範囲のサイズ分布を有し、最大寸法の中央値がおよそ200nmである、請求項1記載のナノ粒子。
- およそ100nmの平均サイズを有する、請求項1記載のナノ粒子。
- 真性シリコンを含む、請求項1ないし5のいずれか1記載のナノ粒子。
- 半導体は金属級のシリコンである、請求項1ないし5のいずれか1記載のナノ粒子。
- ドープされたシリコンを含む、請求項1ないし5のいずれか1記載のナノ粒子。
- シリコンがVまたはVI族元素でドープされ、およびn型の特性を有する、請求項8記載のナノ粒子。
- シリコンがアンチモンまたはリンでドープされた、請求項9記載のナノ粒子。
- シリコンがIIまたはIII族元素でドープされ、およびp型の特性を有する、請求項8記載のナノ粒子。
- シリコンがホウ素でドープされた、請求項11記載のナノ粒子。
- Ge、GaAs、AlGaAs、GaN、InP、SiC、およびSiGe合金の1以上を含む、請求項1ないし5のいずれか1記載のナノ粒子。
- 酸素又は水素を含む置換基が各ナノ粒子の表面に位置する、請求項1ないし13のいずれか1記載のナノ粒子。
- 各ナノ粒子の表面が少なくとも部分的に、少なくとも元素の1つがナノ粒子に含まれている酸化物で覆われた、請求項1ないし14のいずれか1記載のナノ粒子。
- 酸化物が自然酸化物である、請求項15記載のナノ粒子。
- 酸化物が熱的または化学的合成によって生産され、および続いて電荷の流れが起こるよう修飾された、請求項15記載のナノ粒子。
- 酸化物がエッチングされて、その厚みを低下させおよび/またはその気孔率を増加させた、請求項17記載のナノ粒子。
- 物質が合成中の酸化物に含ませて、酸化物に半導体特性をもたらす、請求項17記載のナノ粒子。
- 各ナノ粒子の表面が部分的または全体的に酸素または水素で終了する、請求項1ないし14のいずれか1記載のナノ粒子。
- 各ナノ粒子の表面が部分的または全体的にヒドロキシル(OH)基で終了する、請求項1ないし14のいずれか1記載のナノ粒子。
- 各ナノ粒子の表面が部分的または全体的に酸素、水素およびヒドロキシル基の組合せで終了する、請求項1ないし14のいずれか1記載のナノ粒子。
- 請求項1ないし22のいずれか1記載のナノ粒子およびバインダーを含む印刷可能な組成物。
- バインダーが導体、半導体または絶縁体である、無機バインダーである、請求項23記載の印刷可能な組成物。
- バインダーが導体、半導体または絶縁体である、ポリマーバインダーである、請求項23記載の印刷可能な組成物。
- バインダーが、ナノ粒子の物質と反応をしてその半導体特性を供する成分を有する、化学的に活性なバインダーである、請求項23記載の印刷可能な組成物。
- 請求項1ないし22のいずれか1記載のナノ粒子、およびナノ粒子が分散した固体マトリックスを含む複合材料。
- ナノ粒子がマトリックス内でランダムに分散した、請求項27記載の複合材料。
- ナノ粒子がマトリックス内で規則的配置で分散された、請求項27記載の複合材料。
- 請求項1ないし22のいずれか1記載のナノ粒子を含み、ここにナノ粒子は相互接続ネットワークまたは緻密体を形成する複合材料。
- 請求項23ないし26のいずれか1記載の印刷可能な組成物または請求項27ないし30のいずれか1記載の複合材料を含む、活性な半導体層または構造。
- 請求項31記載の少なくとも1つの半導体層または構造を含む、半導体機器、構成要素または回路素子。
- 少なくとも1つの請求項32記載の半導体機器を含む電気もしくは電子回路または、電子部品の組立品。
- 1以上のII、III、IV、V、およびVI族の単一元素または元素化合物を含む原料物質を酸素および/または水素の存在下で粉砕して、n型またはp型の半導体特性、1nmないし500nmの範囲のサイズを有し、および0.1ないし20原子百分率の酸素および水素よりなる群から選択される置換基を含むナノ粒子を得る工程を含む、ナノ粒子の製法。
- 原料物質がドープされた、または真性シリコンを含む、請求項34記載の方法。
- 原料物質の粉砕が空気の存在下で行われる、請求項34または請求項35記載の方法。
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JP2011096795A (ja) * | 2009-10-29 | 2011-05-12 | Kazufumi Ogawa | Si微粒子を用いたTFT及びその製造方法とそれらを用いたTFTアレイと表示デバイス |
JP2014518535A (ja) * | 2011-03-09 | 2014-07-31 | アンスティテュ、ナショナール、デ、スィアンス、アプリケ、ド、リヨン | 冶金級シリコンまたは精錬冶金級シリコンからシリコン系ナノ粒子を製造する方法 |
JP2015533755A (ja) * | 2012-08-21 | 2015-11-26 | クラトス・エル・エル・シー | 官能化iva族粒子およびその使用方法 |
WO2024062628A1 (ja) * | 2022-09-22 | 2024-03-28 | シャープディスプレイテクノロジー株式会社 | 発光素子、表示デバイス、発光素子の製造方法 |
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KR20130128383A (ko) | 2010-09-13 | 2013-11-26 | 피에스티 센서스 (피티와이) 리미티드 | 프린팅된 온도 센서 |
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JP2011096795A (ja) * | 2009-10-29 | 2011-05-12 | Kazufumi Ogawa | Si微粒子を用いたTFT及びその製造方法とそれらを用いたTFTアレイと表示デバイス |
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ZA200800436B (en) | 2009-09-30 |
KR20080096640A (ko) | 2008-10-31 |
JP5361376B2 (ja) | 2013-12-04 |
CN106185797A (zh) | 2016-12-07 |
US8354662B2 (en) | 2013-01-15 |
CN106185797B (zh) | 2019-03-12 |
US20100148144A1 (en) | 2010-06-17 |
CN101218168A (zh) | 2008-07-09 |
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