JP2009295655A5

JP2009295655A5 - Substrate processing apparatus and substrate processing method

Info

Publication number: JP2009295655A5
Application number: JP2008145423A
Authority: JP
Filing date: 2008-06-03
Publication date: 2012-10-11
Anticipated expiration: 2028-06-03

Description

本発明は、基板処理装置および基板処理方法に関する。 The present invention relates to a substrate processing apparatus and a substrate processing method .

本発明の基板処理装置は、マイクロバブル、マイクロナノバブル、あるいはナノバブルのいずれかの微小気泡を含む液体を基板に供給して当該基板の洗浄処理を行う基板処理装置であって、
前記微小気泡を含む液体を生成する微小気泡液生成部と、
前記微小気泡液生成部から供給される前記微小気泡を含む液体から有機系の汚染物を除去する有機汚染除去装置であって、前記液体中に含まれる前記微小気泡を圧壊することなく、その波長またはエネルギー強度がコントロールされた紫外線を照射する有機汚染除去装置を含む異物除去機構部と、
を備え、
この異物除去機構部を通過した前記液体並びに当該液体に含まれる前記微小気泡を前記基板に供給するチューブとを備え、
このチューブを介して前記基板に供給される、前記微小気泡を含む液体を用いて、前記基板の洗浄処理を行うことを特徴とする。 The substrate processing apparatus of the present invention is a substrate processing apparatus that supplies a liquid containing microbubbles, either microbubbles, micronanobubbles, or nanobubbles, to the substrate to perform cleaning processing on the substrate
A microbubble liquid generator that generates a liquid containing the microbubbles;
An organic decontamination apparatus that removes organic contaminants from a liquid containing the microbubbles supplied from the microbubble liquid generation unit, the wavelength of the organic bubbles removing without crushing the microbubbles contained in the liquid Or a foreign matter removal mechanism including an organic contamination removal device that irradiates ultraviolet rays with controlled energy intensity
With
A tube that supplies the liquid that has passed through the foreign matter removing mechanism and the microbubbles contained in the liquid to the substrate;
The substrate is cleaned using the liquid containing the microbubbles supplied to the substrate through the tube.

また、本発明の微細気泡生成方法は、マイクロバブル、マイクロナノバブル、あるいはナノバブルのいずれかの微小気泡を含む液体を生成する微小気泡液生成部から供給される前記微小気泡を含む液体から、異物除去機構部にて異物を除去した、前記微小気泡を含む前記液体を基板に供給して当該基板の洗浄処理を行う基板処理方法であって、
前記微小気泡液生成部により、前記微小気泡を含む液体を生成し、
前記異物除去機構部により、前記微小気泡液生成部から供給される前記微小気泡を含む液体に、当該液体中に含まれる前記微小気泡を圧壊することなく、その波長またはエネルギー強度がコントロールされた紫外線を照射して前記液体から有機系の汚染物を除去し、
前記異物除去機構部を通過した前記液体並びに当該液体に含まれる前記微小気泡を前記基板に供給して当該基板の洗浄処理を行うことを特徴とする。 In addition, the method for generating fine bubbles according to the present invention removes foreign matter from the liquid containing microbubbles supplied from the microbubble liquid generation unit that generates a liquid containing microbubbles of microbubbles, micronanobubbles, or nanobubbles. A substrate processing method in which foreign substances are removed by a mechanism part, the liquid containing the microbubbles is supplied to a substrate, and the substrate is cleaned .
The microbubble liquid generation unit generates a liquid containing the microbubbles,
Ultraviolet light whose wavelength or energy intensity is controlled by the foreign matter removing mechanism unit without crushing the microbubbles contained in the liquid to the liquid containing the microbubbles supplied from the microbubble liquid generating unit. To remove organic contaminants from the liquid ,
A cleaning process for the substrate is performed by supplying the liquid that has passed through the foreign matter removing mechanism and the microbubbles contained in the liquid to the substrate .

本発明によれば、異物を確実に除去することができる基板処理装置および基板処理方法を提供することができる。
ADVANTAGE OF THE INVENTION According to this invention, the substrate processing apparatus and substrate processing method which can remove a foreign material reliably can be provided.

Claims

A substrate processing apparatus that supplies a liquid containing microbubbles, either microbubbles, micronanobubbles, or nanobubbles, to a substrate and performs a cleaning process on the substrate,
A microbubble liquid generator that generates a liquid containing the microbubbles;
An organic decontamination apparatus that removes organic contaminants from a liquid containing the microbubbles supplied from the microbubble liquid generation unit, the wavelength of the organic bubbles removing without crushing the microbubbles contained in the liquid Or a foreign matter removal mechanism including an organic contamination removal device that irradiates ultraviolet rays with controlled energy intensity,
With
A tube that supplies the liquid that has passed through the foreign matter removing mechanism and the microbubbles contained in the liquid to the substrate;
A substrate processing apparatus, wherein the substrate is subjected to a cleaning process using a liquid containing microbubbles supplied to the substrate through the tube.

The foreign matter removing mechanism further includes a metal impurity filter for removing metal impurities from the liquid containing the microbubbles, a dissolved gas removing mechanism for removing dissolved gas from the liquid containing the microbubbles, and particles from the liquid containing the microbubbles. The substrate processing apparatus according to claim 1, comprising at least one of particle removing units to be removed.

The microbubble liquid generation unit and the foreign matter removal mechanism unit are connected by a circulation pipe for returning the liquid containing the microbubbles that has passed through the foreign matter removal mechanism unit to the microbubble liquid generation unit. The substrate processing apparatus according to claim 1, wherein:

The micro-bubbles, micro-nano-bubbles, or micro-bubbles that have been removed from the liquid containing the micro-bubbles supplied from the micro-bubble liquid generating unit that generates the liquid containing micro-bubbles of the micro-bubbles. A substrate processing method for supplying a liquid containing bubbles to a substrate to perform a cleaning process on the substrate ,
The microbubble liquid generation unit generates a liquid containing the microbubbles,
Ultraviolet light whose wavelength or energy intensity is controlled by the foreign matter removing mechanism unit without crushing the microbubbles contained in the liquid to the liquid containing the microbubbles supplied from the microbubble liquid generating unit. To remove organic contaminants from the liquid ,
A substrate processing method comprising: supplying the liquid that has passed through the foreign matter removing mechanism and the microbubbles contained in the liquid to the substrate to perform a cleaning process on the substrate .