JP2009255188A - Polishing apparatus - Google Patents

Polishing apparatus Download PDF

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JP2009255188A
JP2009255188A JP2008104265A JP2008104265A JP2009255188A JP 2009255188 A JP2009255188 A JP 2009255188A JP 2008104265 A JP2008104265 A JP 2008104265A JP 2008104265 A JP2008104265 A JP 2008104265A JP 2009255188 A JP2009255188 A JP 2009255188A
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polishing
grinding
lower plate
plate
unit
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Japanese (ja)
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Naoki Asada
直樹 浅田
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Nikon Corp
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Nikon Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a polishing apparatus improving flatness of the surface of a polishing member. <P>SOLUTION: This polishing apparatus is provided with a polishing unit 50 for polishing the surface of the polishing member held by a retaining mechanism to correct the flatness of the surface. The polishing unit 50 is composed of: a dressing head portion 110 partially polishing the surface of the polishing member; a measurement section 90 measuring the surface shape of the polishing member, a horizontal movement mechanism 60 moving the dressing head portion 110 in a horizontal direction substantially parallel to the surface of the polishing member; and a control section controlling the operation of the horizontal movement mechanism 60 so as to move the dressing head portion 110 in response to the surface shape measured by the measurement section 90. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、ガラス板等の板部材の表面を研磨する研磨装置に関する。   The present invention relates to a polishing apparatus for polishing a surface of a plate member such as a glass plate.

ガラス板の表面を研磨する研磨装置には、互いに対向するように配設した一対の研磨部材をガラス板の両面に当接させて相対回転させることにより、ガラス板の両面を研磨する構成のものが知られている(例えば、特許文献1を参照)。このような研磨装置においては、ガラス板の表面を平坦に研磨するため研磨部材の表面も平坦化する必要があるが、例えば、大型ガラスの両面を研磨する研磨装置においては、ガラス板を上下に挟む円盤状の研磨部材(以下、上皿および下皿と称する)を平坦化加工する方法として、皿径が半分程度の修正皿を用いて、装置に取り付けられた状態の下皿の表面を研削し平面度を修正する方法や、上下の皿を装置から取り外して、専用の研削装置(例えば、ロータリー研削盤等)により各皿の表面を研削し平面度を修正する方法が採用されている。   A polishing apparatus for polishing the surface of a glass plate is configured to polish both surfaces of a glass plate by bringing a pair of polishing members disposed so as to face each other into contact with each other and rotating relative to each other. Is known (see, for example, Patent Document 1). In such a polishing apparatus, it is necessary to flatten the surface of the polishing member in order to polish the surface of the glass plate flatly. For example, in a polishing apparatus that polishes both sides of a large glass, the glass plate is moved up and down. As a method of flattening the sandwiched disc-shaped polishing member (hereinafter referred to as the upper plate and the lower plate), the surface of the lower plate attached to the apparatus is ground using a correction plate having a plate diameter of about half. A method of correcting the flatness and a method of removing the upper and lower dishes from the apparatus and grinding the surface of each dish with a dedicated grinding apparatus (for example, a rotary grinder) to correct the flatness are employed.

なお、修正皿を用いて下皿表面の平面度を修正する場合、修正皿を下皿の表面に当接させた状態で下皿を回転駆動し、下皿との摩擦力を利用して修正皿を回転させるいわゆる連れ回しや、修正皿および下皿をともに回転駆動することにより、下皿の表面を研削し平面度を修正する。
特開2001−30151号公報
In addition, when correcting the flatness of the surface of the lower plate using the correction plate, the lower plate is rotated while the correction plate is in contact with the surface of the lower plate, and corrected using the frictional force with the lower plate. The surface of the lower plate is ground and the flatness is corrected by so-called “rotating” for rotating the plate and rotating the correction plate and the lower plate together.
JP 2001-30151 A

しかしながら、修正皿を用いて下皿表面の平面度を修正する場合、例えば、修正皿の位置が固定されていたため下皿表面の凸部に選択的に研磨圧力をかけることができず、下皿表面の平面度を高めるのが難しかった。また、専用の研削装置により下皿表面の平面度を修正する場合、装置から取り外した上下の皿を再び取り付けるため、取り付け誤差等により研削直後の平面度が得られるとは限らなかった。   However, when the flatness of the surface of the lower plate is corrected using the correction plate, for example, the position of the correction plate is fixed, so that it is not possible to selectively apply the polishing pressure to the convex portion of the lower plate surface. It was difficult to increase the flatness of the surface. In addition, when the flatness of the lower plate surface is corrected by a dedicated grinding device, the upper and lower plates removed from the device are attached again, so that the flatness immediately after grinding is not always obtained due to an attachment error or the like.

本発明は、このような問題に鑑みてなされたものであり、研磨部材表面の平面度を向上させることが可能な研磨装置を提供することを目的とする。   This invention is made | formed in view of such a problem, and it aims at providing the grinding | polishing apparatus which can improve the flatness of the surface of a grinding | polishing member.

このような目的達成のため、本発明に係る研磨装置は、板部材の表面を研磨可能な研磨部材と、前記研磨部材を保持する保持機構とを備え、前記保持機構に保持された前記研磨部材を前記板部材の表面に当接させて相対移動させることにより、前記板部材の表面を研磨するように構成された研磨装置において、前記保持機構に保持された前記研磨部材の表面を研削して前記表面の平面度を修正する研削ユニットを備え、前記研削ユニットは、前記研磨部材の表面を部分的に研削可能な研削工具と、前記研磨部材の表面形状を測定する測定部と、前記研削工具を前記研磨部材の表面と略平行な方向に移動させる移動機構と、前記測定部により測定された前記表面形状に応じて前記研磨工具を移動させるように前記移動機構の作動を制御する制御部とを有して構成される。   In order to achieve such an object, a polishing apparatus according to the present invention includes a polishing member capable of polishing a surface of a plate member, and a holding mechanism that holds the polishing member, and the polishing member held by the holding mechanism In a polishing apparatus configured to polish the surface of the plate member by grinding the surface of the polishing member held by the holding mechanism. A grinding unit for correcting the flatness of the surface, the grinding unit being capable of partially grinding the surface of the polishing member, a measuring unit for measuring the surface shape of the polishing member, and the grinding tool A movement mechanism for moving the polishing tool in a direction substantially parallel to the surface of the polishing member, and a control for controlling the operation of the movement mechanism to move the polishing tool in accordance with the surface shape measured by the measurement unit Configured to have a door.

本発明によれば、研磨部材表面の平面度を向上させることが可能になる。   According to the present invention, it is possible to improve the flatness of the surface of the polishing member.

以下、図面を参照して本発明の好ましい実施形態について説明する。本発明を適用した研磨装置1の概略構成を図1に示す。研磨装置1は、キャリア15の側面を支持するキャリア支持機構20と、キャリア15に保持されたガラス板10を研磨する研磨ヘッド機構30と、研磨ヘッド機構30を構成する上皿31の表面31aを研削する上皿研削ユニット40(図2を参照)と、研磨ヘッド機構30を構成する下皿36の表面36aを研削する下皿研削ユニット50(図2を参照)とを主体に構成される。   Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. A schematic configuration of a polishing apparatus 1 to which the present invention is applied is shown in FIG. The polishing apparatus 1 includes a carrier support mechanism 20 that supports the side surface of the carrier 15, a polishing head mechanism 30 that polishes the glass plate 10 held by the carrier 15, and a surface 31 a of an upper plate 31 that constitutes the polishing head mechanism 30. An upper plate grinding unit 40 (see FIG. 2) for grinding and a lower plate grinding unit 50 (see FIG. 2) for grinding the surface 36a of the lower plate 36 constituting the polishing head mechanism 30 are mainly configured.

ガラス板10を搬送するためのキャリア15は、図2にも示すように、枠部材16と、保持部材17とを有して構成される。枠部材16は、ステンレス等の金属材料を用いて、外周部が略円形の枠板状に形成され、枠部材16の内側に保持部材17が取り付けられる。保持部材17は、可撓性の高い樹脂材料を用いて中央に矩形の孔部を有する板状に形成され、ガラス板10の形状に合わせて形成された当該孔部にガラス板10が嵌合されて保持されるようになっている。このようにキャリア15に保持されたガラス板10は、図示しない搬送装置によりキャリア15とともに下皿36の表面36aに載置されるとともに、この状態でキャリア15の側面がキャリア支持機構20に支持される。なお、枠部材16および保持部材17は、ガラス板10よりも薄くなるように形成される。   As shown in FIG. 2, the carrier 15 for transporting the glass plate 10 includes a frame member 16 and a holding member 17. The frame member 16 is made of a metal material such as stainless steel and the outer peripheral portion is formed into a substantially circular frame plate shape, and the holding member 17 is attached to the inside of the frame member 16. The holding member 17 is formed in a plate shape having a rectangular hole at the center using a highly flexible resin material, and the glass plate 10 is fitted in the hole formed in accordance with the shape of the glass plate 10. To be held. The glass plate 10 thus held by the carrier 15 is placed on the surface 36a of the lower plate 36 together with the carrier 15 by a conveying device (not shown), and the side surface of the carrier 15 is supported by the carrier support mechanism 20 in this state. The The frame member 16 and the holding member 17 are formed to be thinner than the glass plate 10.

キャリア支持機構20は、図2に示すように、キャリア15に対してそれぞれ等間隔(90度間隔)に配設された、3つのガイドローラ21,22,23と、1つの駆動ローラ24とを有して構成され、各ローラ21〜24によってキャリア15の側面を支持する。駆動ローラ24は、ローラ用モータ25と連結されており、ローラ用モータ25の回転駆動力を受けて回転するようになっている。そして、駆動ローラ24に対する回転駆動力は、キャリア15と駆動ローラ24との間の摩擦力を利用してキャリア15に伝達され、これにより、駆動ローラ24(ローラ用モータ25)の回転駆動力を利用して、キャリア15、すなわち下皿36の表面36aに載置されたガラス板10が回転駆動されるようになっている。   As shown in FIG. 2, the carrier support mechanism 20 includes three guide rollers 21, 22, and 23 and one drive roller 24 that are arranged at equal intervals (90-degree intervals) with respect to the carrier 15. And the side surfaces of the carrier 15 are supported by the rollers 21 to 24. The driving roller 24 is connected to a roller motor 25 and is rotated by receiving the rotational driving force of the roller motor 25. And the rotational driving force with respect to the driving roller 24 is transmitted to the carrier 15 using the frictional force between the carrier 15 and the driving roller 24, and thereby the rotational driving force of the driving roller 24 (roller motor 25) is reduced. Utilizing the carrier 15, that is, the glass plate 10 placed on the surface 36a of the lower plate 36 is rotationally driven.

研磨ヘッド機構30は、ガラス板10の上面および下面をそれぞれ研磨可能な上下一対の上皿31および下皿36と、上皿31および下皿36をそれぞれ互いに対向するように保持する上皿保持部32および下皿保持部37とを主体に構成される。上皿31は、セラミックス等の高剛性材料を用いて円盤状に形成され、研磨面となる上皿31の表面31aは高い平面度を有している。上皿保持部32は、下皿保持部37の上方に設けられ、上皿31の表面31aが下側を向くように上皿31を保持する。また、上皿保持部32は、上部スピンドル33と連結されて回転可能に構成されており、上皿保持部32とともに上皿31を回転および上下移動させることができるようになっている。 The polishing head mechanism 30 includes a pair of upper and lower upper plates 31 and 36 that can polish the upper surface and the lower surface of the glass plate 10 respectively, and an upper plate holding unit that holds the upper plate 31 and the lower plate 36 so as to face each other. 32 and the lower dish holding part 37 are comprised mainly. The upper plate 31 is formed in a disk shape using a high-rigidity material such as ceramics, and the surface 31a of the upper plate 31 serving as a polishing surface has high flatness. The upper plate holding part 32 is provided above the lower plate holding part 37, and holds the upper plate 31 so that the surface 31a of the upper plate 31 faces downward. The upper plate holding part 32 is connected to the upper spindle 33 so as to be rotatable, and the upper plate 31 can be rotated and moved up and down together with the upper plate holding part 32.

下皿36は、セラミックス等の高剛性材料を用いて円盤状に形成され、研磨面となる下皿36の表面36aは高い平面度を有している。下皿保持部37は、上皿保持部32の下方に設けられ、下皿36の表面36aが上側を向くように下皿36を保持する。また、下皿保持部37は、下部スピンドル38と連結されて回転可能に構成されており、下皿保持部37とともに下皿36を回転させることができるようになっている。   The lower plate 36 is formed in a disk shape using a high-rigidity material such as ceramics, and the surface 36a of the lower plate 36 serving as a polishing surface has high flatness. The lower dish holding part 37 is provided below the upper dish holding part 32, and holds the lower dish 36 so that the surface 36a of the lower dish 36 faces upward. Further, the lower plate holding part 37 is connected to the lower spindle 38 and is configured to be rotatable, and the lower plate 36 can be rotated together with the lower plate holding part 37.

そして、キャリア15に保持されたガラス板10を図示しない搬送装置により下皿36の表面36aに載置し、上皿保持部32に保持された上皿31を下方に移動させて上皿31および下皿36をそれぞれガラス板10の両面(上面および下面)に当接させ、キャリア15の側面を支持するキャリア支持機構20の駆動ローラ24を回転駆動してキャリア15(ガラス板10)を回転させることにより、ガラス板10の両面を研磨する。なおこのとき、図示しない研磨剤供給装置により、上皿31および下皿36とガラス板10との当接部に研磨剤もしくは研磨液等が供給される。   And the glass plate 10 hold | maintained at the carrier 15 is mounted in the surface 36a of the lower pan 36 with the conveying apparatus which is not shown in figure, the upper pan 31 hold | maintained at the upper pan holding part 32 is moved below, and the upper pan 31 and The lower plate 36 is brought into contact with both surfaces (upper surface and lower surface) of the glass plate 10, and the carrier roller (glass plate 10) is rotated by rotationally driving the driving roller 24 of the carrier support mechanism 20 that supports the side surface of the carrier 15. Thus, both surfaces of the glass plate 10 are polished. At this time, an abrasive or a polishing liquid is supplied to the contact portion between the upper plate 31 and the lower plate 36 and the glass plate 10 by an unillustrated abrasive supply device.

このようにしてガラス板10の両面が研磨される研磨装置1において、上皿研削ユニット40により上皿保持部32に保持された上皿31の表面31aを研削して当該表面31aの平面度を修正するとともに、下皿研削ユニット50により下皿保持部37に保持された下皿36の表面36aを研削して当該表面36aの平面度を修正するようになっている。そこで、下皿研削ユニット50について図3〜図5を追加参照しながら以下に説明する。なお、上皿研削ユニット40は、下皿研削ユニット50と上下の向きが逆になるだけで、下皿研削ユニット50と同様の構成であるため、詳細な説明を省略する。   In the polishing apparatus 1 in which both surfaces of the glass plate 10 are polished in this way, the surface 31a of the upper plate 31 held by the upper plate holding unit 32 by the upper plate grinding unit 40 is ground to obtain the flatness of the surface 31a. In addition to correction, the surface 36a of the lower plate 36 held by the lower plate holding unit 37 by the lower plate grinding unit 50 is ground to correct the flatness of the surface 36a. Therefore, the lower dish grinding unit 50 will be described below with additional reference to FIGS. The upper plate grinding unit 40 has the same configuration as that of the lower plate grinding unit 50 except that the upper and lower directions thereof are reversed, and detailed description thereof will be omitted.

さて、下皿研削ユニット50は、図4に示すように、筐体部51と、制御装置55(図3を参照)と、水平移動機構60と、ドレス昇降機構70と、測定部90と、ドレス回転機構100と、ドレスヘッド部110と、給水装置130と、エア供給制御部140とを主体に構成される。筐体部51は、下側が開放された水平方向に長い箱形に形成される。また、筐体部51は、図3に示すように、下皿保持部37(およびキャリア支持機構20)の側方に配設され、下皿36の研削を行うときには、制御装置55の作動制御により、図示しない揺動機構を用いて常には所定の退避位置に位置する筐体部51が下皿36の上方に揺動するようになっている。このとき、筐体部51の先端側が下皿36の中心部近傍から半径方向に沿って延びるようになっており、後述するドレスヘッド部110の水平移動と下皿36の回転移動とを組み合わせることにより、下皿36の表面36a全体を研削できるようになっている。   Now, as shown in FIG. 4, the lower dish grinding unit 50 includes a casing 51, a control device 55 (see FIG. 3), a horizontal movement mechanism 60, a dress elevating mechanism 70, a measuring unit 90, The dress rotation mechanism 100, the dress head unit 110, the water supply device 130, and the air supply control unit 140 are mainly configured. The casing 51 is formed in a box shape that is long in the horizontal direction with the lower side open. Further, as shown in FIG. 3, the casing 51 is disposed on the side of the lower plate holding unit 37 (and the carrier support mechanism 20), and when the lower plate 36 is ground, the operation control of the control device 55 is performed. Thus, the casing 51 that is always located at a predetermined retraction position is swung above the lower plate 36 by using a swing mechanism (not shown). At this time, the front end side of the housing part 51 extends in the radial direction from the vicinity of the center part of the lower plate 36, and the horizontal movement of the dress head unit 110 described later and the rotational movement of the lower plate 36 are combined. Thus, the entire surface 36a of the lower plate 36 can be ground.

筐体部51の先端部には、傾斜調整ネジ52が設けられており、筐体部51の基端部に設けられた揺動中心軸53を中心として、筐体部51、すなわち下皿研削ユニット50の上下方向の傾き(水平レベル)を調整できるようになっている。なおこのとき、筐体部51の先端側の下部に第1ダイヤルゲージ57が取り付けられるとともに、第2ダイヤルゲージ58が取り付けられ、例えば、第1および第2ダイヤルゲージ57,58をそれぞれ下皿36の表面36aに当接させて計測した変位量に基づいて、下皿研削ユニット50の上下方向の傾き(水平レベル)が調整される。   A tilt adjustment screw 52 is provided at the distal end of the casing 51, and the casing 51, that is, lower plate grinding, is centered on a swinging central axis 53 provided at the base end of the casing 51. The vertical inclination (horizontal level) of the unit 50 can be adjusted. At this time, the first dial gauge 57 and the second dial gauge 58 are attached to the lower portion of the front end side of the housing portion 51. For example, the first and second dial gauges 57 and 58 are respectively attached to the lower plate 36. The vertical inclination (horizontal level) of the lower plate grinding unit 50 is adjusted based on the amount of displacement measured by contacting the surface 36a.

水平移動機構60は、筐体部51の内部に配設された走行軸61と、走行軸61と螺合された走行体62と、走行軸61を回転駆動する走行軸用モータ64とを主体に構成され、走行体62と繋がるドレスヘッド部110を走行軸61に沿って水平移動(すなわち、下皿36の表面36aと略平行な方向に移動)させるようになっている。走行軸61は、いわゆるボールネジであり、筐体部51の先端部近傍から基端部まで跨って、走行軸61の中心軸を中心に回転自在に取り付けられる。なお、走行軸61は筐体部51と略平行に延びることになる。走行軸61の先端部には、走行軸用従動プーリ63が取り付けられている。   The horizontal movement mechanism 60 mainly includes a traveling shaft 61 disposed inside the housing 51, a traveling body 62 screwed to the traveling shaft 61, and a traveling shaft motor 64 that rotationally drives the traveling shaft 61. The dress head unit 110 connected to the traveling body 62 is horizontally moved along the traveling axis 61 (that is, moved in a direction substantially parallel to the surface 36a of the lower plate 36). The traveling shaft 61 is a so-called ball screw, and is attached so as to be rotatable around the central axis of the traveling shaft 61 from the vicinity of the distal end portion of the housing portion 51 to the base end portion. The traveling shaft 61 extends substantially parallel to the casing 51. A travel shaft driven pulley 63 is attached to the tip of the travel shaft 61.

走行体62は、走行軸61と螺合されており、走行軸61の回転に応じて水平(往復)移動するようになっている。この走行体62には、ドレス昇降機構70の昇降ベース部材71が連結され、これにより、ドレス昇降機構70およびドレス回転機構100を介して繋がるドレスヘッド部110を走行軸61に沿って水平移動させることが可能になる。また、走行体62には、測定部90が連結されており、測定部90の接触式変位センサ91をドレスヘッド部110とともに水平移動させることができるようになっている。   The traveling body 62 is screwed with the traveling shaft 61, and moves horizontally (reciprocally) according to the rotation of the traveling shaft 61. The traveling body 62 is connected to the elevating base member 71 of the dress elevating mechanism 70, thereby horizontally moving the dress head unit 110 connected via the dress elevating mechanism 70 and the dress rotating mechanism 100 along the traveling axis 61. It becomes possible. In addition, a measuring unit 90 is connected to the traveling body 62 so that the contact-type displacement sensor 91 of the measuring unit 90 can be moved horizontally together with the dress head unit 110.

走行軸用モータ64は、筐体部51の内側に取り付けられており、走行軸用モータ64の回転軸に走行軸用減速機65が連結されるとともに、走行軸用減速機65の出力軸に走行軸用駆動プーリ66が連結される。走行軸用駆動プーリ66と走行軸用従動プーリ63との間にベルトが巻き掛けられ、走行軸用モータ64の回転駆動力が走行軸用減速機65、走行軸用駆動プーリ66、および走行軸用従動プーリ63を介して走行軸61に伝達され、走行軸用モータ64により走行軸61が回転駆動される。なお、走行体62と繋がるドレスヘッド部110の走行軸61上の原点位置を検出する走行軸用原点検出センサ67および、ドレスヘッド部110(走行体62)が走行軸61の先端部および基端部に達したか否かを検出する走行軸用リミットセンサ68,69が、筐体部51の内側に取り付けられている。   The travel shaft motor 64 is attached to the inside of the casing 51, and the travel shaft speed reducer 65 is connected to the rotation shaft of the travel shaft motor 64, and the travel shaft speed reducer 65 is connected to the output shaft. A travel shaft drive pulley 66 is coupled. A belt is wound between the travel shaft drive pulley 66 and the travel shaft driven pulley 63, and the rotational drive force of the travel shaft motor 64 causes the travel shaft speed reducer 65, the travel shaft drive pulley 66, and the travel shaft. The travel shaft 61 is transmitted to the travel shaft 61 via the driven pulley 63, and the travel shaft 61 is rotationally driven by the travel shaft motor 64. The travel axis origin detection sensor 67 for detecting the origin position on the travel axis 61 of the dress head portion 110 connected to the travel body 62 and the dress head portion 110 (the travel body 62) are the distal end portion and the proximal end of the travel shaft 61. Travel axis limit sensors 68 and 69 for detecting whether or not the vehicle has reached the center are attached to the inside of the casing 51.

ドレス昇降機構70は、水平移動機構60の走行体62と連結された昇降ベース部材71と、昇降ベース部材71に取り付けられた2つの昇降用ボールネジ72,75と、昇降用ボールネジ72,75と螺合された昇降部材77と、昇降用ボールネジ72,75を回転駆動する昇降用モータ78とを主体に構成され、昇降部材77と繋がるドレスヘッド部110を昇降用ボールネジ72,75に沿って昇降させるようになっている。昇降ベース部材71は、箱形に形成されており、水平移動機構60の走行体62と連結されて水平移動可能に構成される。   The dress elevating mechanism 70 includes an elevating base member 71 connected to the traveling body 62 of the horizontal moving mechanism 60, two elevating ball screws 72 and 75 attached to the elevating base member 71, elevating ball screws 72 and 75, and screws. The elevating member 77 and the elevating motor 78 that rotationally drives the elevating ball screws 72 and 75 are mainly configured, and the dress head portion 110 connected to the elevating member 77 is moved up and down along the elevating ball screws 72 and 75. It is like that. The elevating base member 71 is formed in a box shape, and is connected to the traveling body 62 of the horizontal movement mechanism 60 so as to be horizontally movable.

2つの昇降用ボールネジ72,75はそれぞれ、昇降ベース部材71の内部に回転自在に取り付けられる。このとき、各昇降用ボールネジ72,75はそれぞれ、互いに平行となるように上下方向を向いている。第1の昇降用ボールネジ72の下端部には、第1の昇降用従動プーリ73が取り付けられ、第1の昇降用ボールネジ72の上端部には、駆動伝達プーリ74が取り付けられている。また、第2の昇降用ボールネジ75の上端部には、第2の昇降用従動プーリ76が取り付けられ、第2の昇降用従動プーリ76と駆動伝達プーリ74との間にベルトが巻き掛けられる。   Each of the two lifting ball screws 72 and 75 is rotatably mounted inside the lifting base member 71. At this time, the elevating ball screws 72 and 75 are directed in the vertical direction so as to be parallel to each other. A first elevating driven pulley 73 is attached to the lower end portion of the first elevating ball screw 72, and a drive transmission pulley 74 is attached to the upper end portion of the first elevating ball screw 72. A second elevating driven pulley 76 is attached to the upper end portion of the second elevating ball screw 75, and a belt is wound between the second elevating driven pulley 76 and the drive transmission pulley 74.

昇降用モータ78は、昇降ベース部材71に取り付けられており、昇降用モータ78の回転軸に昇降用減速機79が連結されるとともに、昇降用減速機79の出力軸に昇降用駆動プーリ80が連結される。昇降用駆動プーリ80と第1の昇降用従動プーリ73との間にベルトが巻き掛けられ、昇降用モータ78の回転駆動力が昇降用減速機79、昇降用駆動プーリ80、および第1の昇降用従動プーリ73を介して第1の昇降用ボールネジ72に伝達されるとともに、駆動伝達プーリ74および第2の昇降用従動プーリ76を介して第2の昇降用ボールネジ75に伝達され、昇降用モータ78により第1および第2の昇降用ボールネジ72,75がそれぞれ回転駆動される。なお、昇降部材77と繋がるドレスヘッド部110の昇降用ボールネジ72,75上の原点位置を検出する昇降用原点検出センサ81および、ドレスヘッド部110(昇降部材77)が昇降用ボールネジ72,75の上端部および下端部に達したか否かを検出する昇降用リミットセンサ82,83が、昇降ベース部材71に取り付けられている。   The elevating motor 78 is attached to the elevating base member 71, and the elevating speed reducer 79 is connected to the rotating shaft of the elevating motor 78, and the elevating drive pulley 80 is connected to the output shaft of the elevating speed reducer 79. Connected. A belt is wound between the elevating drive pulley 80 and the first elevating driven pulley 73, and the rotational driving force of the elevating motor 78 is used as the elevating speed reducer 79, the elevating drive pulley 80, and the first elevating / lowering pulley. The first elevating ball screw 72 is transmitted to the first elevating ball screw 72 via the driving pulley 73 and the second elevating ball screw 75 is transmitted to the second elevating ball screw 75 via the drive transmitting pulley 74 and the second elevating driven pulley 76. The first and second lifting ball screws 72 and 75 are driven to rotate by 78. The lift origin sensor 81 for detecting the origin position on the lift ball screws 72 and 75 of the dress head portion 110 connected to the lift member 77 and the dress head portion 110 (the lift member 77) of the lift ball screws 72 and 75. Elevating limit sensors 82 and 83 for detecting whether or not the upper end portion and the lower end portion have been reached are attached to the elevating base member 71.

測定部90は、下皿36の表面36aの高さを測定する接触式変位センサ91と、接触式変位センサ91を昇降させる昇降シリンダ92とを主体に構成される。接触式変位センサ91は、先端に設けられたプローブを下皿36の表面36aに接触させることで、下皿36の表面36aの高さを測定し、その測定信号を制御装置55(図3を参照)に出力する。昇降シリンダ92は、いわゆるエアシリンダであり、ロッド部が連結部材93を介して接触式変位センサ91と連結され、空気圧を利用して接触式変位センサ91を昇降させる。そのため、昇降シリンダ92の配管は、スピードコントローラ94,95を介してエア供給制御部140のシリンダ駆動バルブ152と接続される。また、昇降シリンダ92は、水平移動機構60の走行体62と連結されており、ドレスヘッド部110とともに接触式変位センサ91を水平移動可能に構成される。なお、接触式変位センサ91が所定の上昇位置および下降位置に達したか否かを検出する昇降用リミットセンサ96,97が、昇降シリンダ92に内蔵されている。   The measuring unit 90 is mainly composed of a contact-type displacement sensor 91 that measures the height of the surface 36 a of the lower plate 36 and an elevating cylinder 92 that raises and lowers the contact-type displacement sensor 91. The contact-type displacement sensor 91 measures the height of the surface 36a of the lower plate 36 by bringing the probe provided at the tip into contact with the surface 36a of the lower plate 36, and sends the measurement signal to the control device 55 (see FIG. 3). Output). The elevating cylinder 92 is a so-called air cylinder, the rod portion of which is connected to the contact type displacement sensor 91 via the connecting member 93, and raises and lowers the contact type displacement sensor 91 using air pressure. Therefore, the piping of the elevating cylinder 92 is connected to the cylinder drive valve 152 of the air supply control unit 140 via the speed controllers 94 and 95. The elevating cylinder 92 is connected to the traveling body 62 of the horizontal movement mechanism 60, and is configured to be able to move the contact displacement sensor 91 together with the dress head 110. In addition, elevating limit sensors 96 and 97 for detecting whether or not the contact-type displacement sensor 91 has reached a predetermined ascending position and descending position are built in the elevating cylinder 92.

ドレス回転機構100は、ドレス昇降機構70の昇降部材77に回転可能に取り付けられたスピンドル101と、スピンドル101を回転駆動する回転用モータ104とを主体に構成され、スピンドル101の下端部に連結されたドレスヘッド部110を回転させるようになっている。スピンドル101は、中空円筒状に形成されており、ドレス昇降機構70の昇降部材77に回転可能に取り付けられるとともに、当該昇降部材77とともに昇降可能に構成される。   The dress rotation mechanism 100 is mainly composed of a spindle 101 rotatably attached to an elevating member 77 of the dress elevating mechanism 70, and a rotation motor 104 that rotationally drives the spindle 101, and is connected to a lower end portion of the spindle 101. The dress head portion 110 is rotated. The spindle 101 is formed in a hollow cylindrical shape, is rotatably attached to an elevating member 77 of the dress elevating mechanism 70, and is configured to be elevate together with the elevating member 77.

スピンドル101の下端部にはドレスヘッド部110が連結されており、ドレスヘッド部110の内部(後述の圧力室H)へ空気を給排するためのエア通路がスピンドル101の内部に形成される。一方、スピンドル101の上端部にはロータリージョイント103が取り付けられており、エア供給制御部140の加圧用管路141と接続される。また、スピンドル101の中央部近傍には、回転用従動プーリ102が取り付けられる。   A dress head portion 110 is connected to a lower end portion of the spindle 101, and an air passage for supplying and discharging air to the inside of the dress head portion 110 (a pressure chamber H described later) is formed inside the spindle 101. On the other hand, a rotary joint 103 is attached to the upper end portion of the spindle 101 and is connected to the pressurizing pipeline 141 of the air supply control unit 140. A driven pulley for rotation 102 is attached near the center of the spindle 101.

回転用モータ104は、ドレス昇降機構70の昇降部材77に取り付けられており、回転用モータ104の回転軸に回転用減速機105が連結されるとともに、回転用減速機105の出力軸に回転用駆動プーリ106が連結される。回転用駆動プーリ106と回転用従動プーリ102との間にベルトが巻き掛けられ、回転用モータ104の回転駆動力が回転用減速機105、回転用駆動プーリ106、および回転用従動プーリ102を介してスピンドル101に伝達され、回転用モータ104によりスピンドル101が回転駆動される。なお、スピンドル101と繋がるドレスヘッド部110の回転を検出する回転検出センサ107が、昇降部材77に取り付けられている。   The rotation motor 104 is attached to the elevating member 77 of the dress elevating mechanism 70, and the rotation speed reducer 105 is connected to the rotation shaft of the rotation motor 104 and the output shaft of the rotation speed reducer 105 is rotated. Drive pulley 106 is coupled. A belt is wound between the rotation driving pulley 106 and the rotation driven pulley 102, and the rotation driving force of the rotation motor 104 is transmitted via the rotation reduction gear 105, the rotation driving pulley 106, and the rotation driven pulley 102. Is transmitted to the spindle 101, and the spindle 101 is rotationally driven by the rotation motor 104. A rotation detection sensor 107 that detects the rotation of the dress head unit 110 connected to the spindle 101 is attached to the elevating member 77.

ドレスヘッド部110は、図5に示すように、スピンドル101の下端部に連結されたヘッドハウジング111と、ヘッドハウジング111の開口部を塞ぐように設けられた研削工具121とを主体に構成される。ヘッドハウジング111は、スピンドル101と連結される連結部112と、連結部112の下側に連結されたプレート部113と、プレート部113の下側に連結されたアウターリング117とを主体に構成され、これらによって下側に開口した有底円筒形に形成される。   As shown in FIG. 5, the dress head unit 110 is mainly composed of a head housing 111 connected to the lower end of the spindle 101 and a grinding tool 121 provided so as to close the opening of the head housing 111. . The head housing 111 is mainly composed of a connecting portion 112 connected to the spindle 101, a plate portion 113 connected to the lower side of the connecting portion 112, and an outer ring 117 connected to the lower side of the plate portion 113. By these, it forms in the bottomed cylindrical shape opened to the lower side.

連結部112は、中央に開口を有する円盤状に形成され、連結部112の中央部上側にスピンドル101の下端部が連結される。連結部112の開口はスピンドル101の内部と繋がっており、スピンドル101の内部(エア通路)からヘッドハウジング111の内部(後述の圧力室H)に空気が給排されるようになっている。プレート部113は、中央に開口を有する円盤状に形成され、連結部112の外周部下側に連結される。アウターリング117は、プレート部113と同等の外径を有する断面視L字型のリング状に形成され、プレート部113の外周部下側に連結される。アウターリング117の底部には、複数のガイドピン118が上方を向いて取り付けられている。   The connecting portion 112 is formed in a disk shape having an opening at the center, and the lower end portion of the spindle 101 is connected to the upper center portion of the connecting portion 112. The opening of the connecting portion 112 is connected to the inside of the spindle 101, and air is supplied and discharged from the inside of the spindle 101 (air passage) to the inside of the head housing 111 (pressure chamber H described later). The plate portion 113 is formed in a disk shape having an opening at the center, and is connected to the lower side of the outer peripheral portion of the connecting portion 112. The outer ring 117 is formed in an L-shaped ring shape having an outer diameter equivalent to that of the plate portion 113, and is connected to the lower side of the outer peripheral portion of the plate portion 113. A plurality of guide pins 118 are attached to the bottom of the outer ring 117 so as to face upward.

プレート部113の下側におけるアウターリング117の内側には、インナーリング114が取り付けられており、インナーリング114の内側上面に取り付けられた固定リング115との間に、ダイヤフラム116の外周側が挟持される。ダイヤフラム116は、ゴム等の弾性の高い樹脂材料を用いて円盤状に形成され、ダイヤフラム116の外周側がインナーリング114と固定リング115との間に挟持されるとともに、内周側が研削工具121の上部プレート122と下部プレート123との間に挟持される。これにより、ヘッドハウジング111と、研削工具121と、ダイヤフラム116とに囲まれて、ヘッドハウジング111内に圧力室Hが形成される。そして、研削工具121の中央上面で圧力室H内の空気圧を受けて、研削工具121が上下方向(下皿36の表面36aへ向かう方向)へ往復移動できるようになっている。   An inner ring 114 is attached to the inner side of the outer ring 117 below the plate portion 113, and the outer peripheral side of the diaphragm 116 is sandwiched between the fixing ring 115 attached to the inner upper surface of the inner ring 114. . The diaphragm 116 is formed in a disk shape using a highly elastic resin material such as rubber, and the outer peripheral side of the diaphragm 116 is sandwiched between the inner ring 114 and the fixing ring 115, and the inner peripheral side is the upper part of the grinding tool 121. It is sandwiched between the plate 122 and the lower plate 123. Accordingly, a pressure chamber H is formed in the head housing 111 surrounded by the head housing 111, the grinding tool 121, and the diaphragm 116. The grinding tool 121 can reciprocate in the vertical direction (direction toward the surface 36 a of the lower plate 36) by receiving the air pressure in the pressure chamber H at the center upper surface of the grinding tool 121.

研削工具121は、上部プレート122と、上部プレート122の下側に連結された下部プレート123と、下部プレート123の下側に連結された研削部材125とを有して構成される。上部プレート122は円盤状に形成され、下部プレート123との間にダイヤフラム116の内周側が挟持される。下部プレート123は、上部プレート122よりも外径の大きい円盤状に形成され、上部プレート122の下側に連結される。研削部材125は、例えばダイヤモンド砥粒を含んだセラミック材を用いて、下部プレート123よりも外径の小さい円盤状に形成され、下部プレート123の下側に連結される。そして、研削部材125の表面(下面)が下皿36の表面36aを研削する研削面となる。   The grinding tool 121 includes an upper plate 122, a lower plate 123 connected to the lower side of the upper plate 122, and a grinding member 125 connected to the lower side of the lower plate 123. The upper plate 122 is formed in a disk shape, and the inner peripheral side of the diaphragm 116 is sandwiched between the upper plate 122 and the lower plate 123. The lower plate 123 is formed in a disk shape having a larger outer diameter than the upper plate 122 and is connected to the lower side of the upper plate 122. The grinding member 125 is formed into a disk shape having a smaller outer diameter than the lower plate 123 using, for example, a ceramic material containing diamond abrasive grains, and is connected to the lower side of the lower plate 123. The surface (lower surface) of the grinding member 125 becomes a grinding surface for grinding the surface 36 a of the lower plate 36.

下部プレート123の外周部には、ヘッドハウジング111のガイドピン118と位置整合した複数のガイド溝124が形成されており、ヘッドハウジング111のアウターリング117に取り付けられた複数のガイドピン118がそれぞれ、ガイド溝124に係合するようになっている。これにより、スピンドル101と連結されたヘッドハウジング111の回転駆動力は、ガイドピン118およびガイド溝124を介して研削工具121に伝達される。なお、ガイド溝124は、ガイドピン118よりも若干大きく形成されており、研削工具121が下皿36の表面36aの形状に対し倣う(傾斜する)ことができるようになっている。   A plurality of guide grooves 124 aligned with the guide pins 118 of the head housing 111 are formed on the outer peripheral portion of the lower plate 123, and the plurality of guide pins 118 attached to the outer ring 117 of the head housing 111 are respectively The guide groove 124 is engaged. As a result, the rotational driving force of the head housing 111 connected to the spindle 101 is transmitted to the grinding tool 121 via the guide pins 118 and the guide grooves 124. The guide groove 124 is formed to be slightly larger than the guide pin 118 so that the grinding tool 121 can follow (tilt) the shape of the surface 36a of the lower plate 36.

給水装置130は、図4に示すように、下皿表面36aの研削中に洗浄水を供給する装置であり、給水装置130の給水管路139には、上流側から順に、水供給源Bと繋がる通路の開閉を行うマスターバルブ131と、給水管路139内の水圧を所望の水圧に減圧するレギュレータ132と、給水管路139の開閉を行う給水バルブ133とが配設される。給水バルブ133は、エア供給制御部140のセンサ用管路151から分岐して供給される空気の圧力を受けて、給水管路139を開放し、洗浄水を供給するようになっている。なお、センサ用管路151と給水バルブ133との間の管路には、給水バルブ133による給水管路139の開閉作動を制御する給水作動バルブ155が配設されている。また、給水バルブ133において、給水バルブ133を通過する水の流量を調節することが可能である。   As shown in FIG. 4, the water supply device 130 is a device that supplies cleaning water during grinding of the lower plate surface 36 a, and the water supply line 139 of the water supply device 130 is connected to the water supply source B in order from the upstream side. A master valve 131 that opens and closes the connecting passage, a regulator 132 that reduces the water pressure in the water supply line 139 to a desired water pressure, and a water supply valve 133 that opens and closes the water supply line 139 are provided. The water supply valve 133 receives the pressure of the air branched and supplied from the sensor pipe line 151 of the air supply control unit 140, opens the water supply pipe line 139, and supplies cleaning water. A water supply operation valve 155 that controls the opening / closing operation of the water supply conduit 139 by the water supply valve 133 is disposed in the conduit between the sensor conduit 151 and the water supply valve 133. In addition, the water supply valve 133 can adjust the flow rate of water passing through the water supply valve 133.

エア供給制御部140は、ドレスヘッド部110のヘッドハウジング111の内部に空気を供給する加圧用管路141と、測定部90の昇降シリンダ92に空気を供給するセンサ用管路151と、測定部90により下皿36の表面36aの高さを測定するときに下皿36の表面36aに残った水分を吹き飛ばす空気を供給するエアブロー用管路161の3つの管路を有して構成される。加圧用管路141は、エア供給源Aからスピンドル101(ロータリージョイント103)を介してヘッドハウジング111の内部に繋がっており、加圧用管路141には、上流側から順に、エア供給源Aと繋がる通路の開閉を行うマスターバルブ142と、加圧用管路141内の空気圧を減圧する第1レギュレータ143と、加圧用管路141内の空気圧をさらに減圧する第2レギュレータ144と、加圧用制御ユニット145とが配設される。   The air supply control unit 140 includes a pressurization pipeline 141 that supplies air to the inside of the head housing 111 of the dress head unit 110, a sensor pipeline 151 that supplies air to the lift cylinder 92 of the measurement unit 90, and a measurement unit. When the height of the surface 36a of the lower plate 36 is measured by 90, it is configured to have three pipes of an air blow pipe 161 for supplying air that blows away moisture remaining on the surface 36a of the lower plate 36. The pressurizing conduit 141 is connected from the air supply source A to the inside of the head housing 111 via the spindle 101 (rotary joint 103). The pressurizing conduit 141 is connected to the air supply source A in order from the upstream side. A master valve 142 that opens and closes the connecting passage, a first regulator 143 that reduces the air pressure in the pressurizing pipe 141, a second regulator 144 that further reduces the air pressure in the pressurizing pipe 141, and a pressurizing control unit 145.

加圧用制御ユニット145は、制御装置55(図3を参照)からの空気圧制御信号を受けて加圧用管路141内の空気圧を所定の空気圧に制御する電空レギュレータ146と、電空レギュレータ146よりも下流側の管路に設けられた開閉バルブ149とを有して構成される。また、電空レギュレータ146と開閉バルブ149との間の管路には、当該管路内の空気圧を検出して電空レギュレータ146に出力する第1圧力センサ147と、当該管路内の空気圧を予備的に検出する第2圧力センサ148とが配設されている。開閉バルブ149は、第2レギュレータ144の下流側から分岐して供給される空気の圧力を受けて、常には加圧用管路141を開放し、電空レギュレータ146によって得られた所定の空気圧を有する空気をヘッドハウジング111の内部に供給するようになっている。一方、制御装置55から所定の駆動信号が入力されると、開閉バルブ149は、加圧用管路141を閉鎖するとともに、ヘッドハウジング111の内部を大気圧に開放し、ヘッドハウジング111内の加圧空気を外部に排出するようになっている。そのため、開閉バルブ149には、空気の排出音を抑えるサイレンサ149aが取り付けられている。   The pressurization control unit 145 receives an air pressure control signal from the control device 55 (see FIG. 3), and controls the air pressure in the pressurization pipe line 141 to a predetermined air pressure, and the electropneumatic regulator 146. And an open / close valve 149 provided in the downstream pipe line. In addition, a pipe line between the electropneumatic regulator 146 and the open / close valve 149 has a first pressure sensor 147 that detects the air pressure in the pipe line and outputs it to the electropneumatic regulator 146, and the air pressure in the pipe line. A second pressure sensor 148 for preliminary detection is provided. The on-off valve 149 receives the pressure of the air branched and supplied from the downstream side of the second regulator 144, and always opens the pressurizing pipeline 141 and has a predetermined air pressure obtained by the electropneumatic regulator 146. Air is supplied into the head housing 111. On the other hand, when a predetermined drive signal is input from the control device 55, the open / close valve 149 closes the pressurizing conduit 141 and opens the inside of the head housing 111 to the atmospheric pressure, and pressurizes the head housing 111. Air is discharged to the outside. Therefore, the open / close valve 149 is provided with a silencer 149a that suppresses air exhaust noise.

センサ用管路151は、加圧用管路141における第1レギュレータ143の下流側から分岐して昇降シリンダ92に繋がっており、センサ用管路151には、シリンダ駆動バルブ152が配設されている。シリンダ駆動バルブ152は、制御装置55(図3を参照)からの切替信号を受け、センサ用管路151からの空気を昇降シリンダ92内の2つのシリンダ室のうちいずれか一方に切り替えて供給する。これにより、シリンダ駆動バルブ152を切替作動させることで、昇降シリンダ92による接触式変位センサ91の昇降作動を切り替えることができる。   The sensor pipe 151 branches from the downstream side of the first regulator 143 in the pressurizing pipe 141 and is connected to the lift cylinder 92. The sensor pipe 151 is provided with a cylinder drive valve 152. . The cylinder driving valve 152 receives a switching signal from the control device 55 (see FIG. 3), and supplies the air from the sensor conduit 151 to either one of the two cylinder chambers in the elevating cylinder 92. . Thereby, the raising / lowering operation of the contact-type displacement sensor 91 by the raising / lowering cylinder 92 can be switched by switching the cylinder drive valve 152.

エアブロー用管路161は、加圧用管路141における第2レギュレータ144の下流側から分岐しており、エアブロー用管路161には、エアブロー用管路161を開閉する開閉バルブ162が配設されている。開閉バルブ162は、センサ用管路151から分岐して供給される空気の圧力を受けて、エアブロー用管路161を開放し、下皿36の表面36aに残った水分を吹き飛ばす空気を供給するようになっている。なお、センサ用管路151と開閉バルブ162との間の管路には、開閉バルブ162によるエアブロー用管路161の開閉作動を制御するエアブロー作動バルブ156が配設されている。   The air blow conduit 161 branches off from the downstream side of the second regulator 144 in the pressurization conduit 141, and the air blow conduit 161 is provided with an opening / closing valve 162 that opens and closes the air blow conduit 161. Yes. The open / close valve 162 receives the pressure of the air that is branched from the sensor pipe 151 and opens the air blow pipe 161 to supply air that blows away the water remaining on the surface 36 a of the lower plate 36. It has become. An air blow operation valve 156 for controlling the opening / closing operation of the air blow conduit 161 by the opening / closing valve 162 is disposed in the conduit between the sensor conduit 151 and the opening / closing valve 162.

以上のように構成される下皿研削ユニット50により、下皿保持部37に保持された下皿36の表面36aを研削して当該表面36aの平面度を修正するには、まず、制御装置55の作動制御により、図示しない揺動機構を用いて所定の退避位置に位置する筐体部51を下皿36の上方に揺動させる。このとき、水平移動機構60によりドレスヘッド部110を水平移動させるとドレスヘッド部110の回転軸が下皿36の中心軸(回転軸)と同軸になるようにする。これにより、水平移動機構60によってドレスヘッド部110および測定部90(接触式変位センサ91)が下皿36の半径方向に沿って水平移動することになる。またこのとき、傾斜調整ネジ52を用いて、筐体部51、すなわち下皿研削ユニット50の上下方向の傾き(水平レベル)を調整する。   In order to correct the flatness of the surface 36a by grinding the surface 36a of the lower plate 36 held by the lower plate holding unit 37 by the lower plate grinding unit 50 configured as described above, first, the control device 55 is used. With the operation control, the casing 51 located at a predetermined retraction position is swung above the lower plate 36 using a swing mechanism (not shown). At this time, when the dress head unit 110 is horizontally moved by the horizontal movement mechanism 60, the rotation axis of the dress head unit 110 is made to be coaxial with the central axis (rotation axis) of the lower plate 36. Accordingly, the dress head unit 110 and the measuring unit 90 (contact displacement sensor 91) are horizontally moved along the radial direction of the lower plate 36 by the horizontal movement mechanism 60. At this time, the tilt adjustment screw 52 is used to adjust the vertical tilt (horizontal level) of the casing 51, that is, the lower plate grinding unit 50.

次に、水平移動機構60により下皿36の半径方向に沿って測定部90を水平移動させながら、測定部90の接触式変位センサ91により複数の測定位置において下皿36の表面36aの高さを測定する。なおこのとき、測定部90の昇降シリンダ92は、シリンダ駆動バルブ152の切替作動により、下皿36の表面36aの高さを測定するときには、接触式変位センサ91のプローブが下皿36の表面36aに接触するまで接触式変位センサ91を下降させ、測定が終了すると接触式変位センサ91を上昇させる。そして、下皿保持部37に保持された下皿36を所定角度ずつ回転させながら上記測定を繰り返すことにより、下皿36の表面36aの高さを全体にわたって測定することが可能になる。接触式変位センサ91の測定信号は制御装置55に出力され、制御装置55は、接触式変位センサ91によって測定された各測定位置における下皿36の表面36aの高さに基づいて、下皿36の表面36aの平面度および(水平からの)傾斜角を算出する。   Next, while the measurement unit 90 is horizontally moved along the radial direction of the lower plate 36 by the horizontal movement mechanism 60, the height of the surface 36a of the lower plate 36 at a plurality of measurement positions by the contact-type displacement sensor 91 of the measurement unit 90. Measure. At this time, when the elevation cylinder 92 of the measuring unit 90 measures the height of the surface 36a of the lower plate 36 by the switching operation of the cylinder drive valve 152, the probe of the contact-type displacement sensor 91 is moved to the surface 36a of the lower plate 36. The contact-type displacement sensor 91 is lowered until it touches, and when the measurement is completed, the contact-type displacement sensor 91 is raised. Then, by repeating the above measurement while rotating the lower plate 36 held by the lower plate holding unit 37 by a predetermined angle, the height of the surface 36a of the lower plate 36 can be measured over the whole. The measurement signal of the contact type displacement sensor 91 is output to the control device 55, and the control device 55 is based on the height of the surface 36 a of the lower plate 36 at each measurement position measured by the contact type displacement sensor 91. The flatness and the inclination angle (from the horizontal) of the surface 36a are calculated.

下皿36の表面36aの平面度を算出すると、制御装置55は、算出した平面度が要求される平面度に達していない場合、接触式変位センサ91により測定された下皿36の表面36aの高さに応じて、例えば下皿表面36aにおける凸部分にドレスヘッド部110が移動するように水平移動機構60、ドレス昇降機構70、および下皿保持部37等の作動を制御し、さらに、下皿表面36aにおける凸部分を研削して平坦化するためにドレス回転機構100および電空レギュレータ146等の作動を制御して、ドレスヘッド部110の研削工具121(研削部材125)を回転させながら当該凸部分に押圧させる。このとき、下皿36の表面36aを平坦化するため、ドレス回転機構100によるドレスヘッド部110(研削工具121)の回転数や、電空レギュレータ146からヘッドハウジング111の内部に供給される空気圧(すなわち、研削工具121の押圧力)等を調整しながら、研削工具121(研削部材125)による下皿表面36aの研削が行われる。   When the flatness of the surface 36a of the lower plate 36 is calculated, the control device 55 determines that the surface 36a of the lower plate 36 measured by the contact-type displacement sensor 91 when the calculated flatness does not reach the required flatness. In accordance with the height, for example, the operations of the horizontal movement mechanism 60, the dress raising / lowering mechanism 70, the lower plate holding portion 37, and the like are controlled so that the dress head portion 110 moves to a convex portion on the lower plate surface 36a. In order to grind and flatten the convex portion on the dish surface 36a, the operations of the dress rotating mechanism 100, the electropneumatic regulator 146, and the like are controlled, and the grinding tool 121 (grinding member 125) of the dress head portion 110 is rotated. Press the convex part. At this time, in order to flatten the surface 36 a of the lower plate 36, the rotation speed of the dress head unit 110 (grinding tool 121) by the dress rotating mechanism 100 and the air pressure supplied from the electropneumatic regulator 146 to the inside of the head housing 111 ( That is, the lower plate surface 36a is ground by the grinding tool 121 (grinding member 125) while adjusting the pressing force of the grinding tool 121) and the like.

そして、下皿表面36aの研削を行った後、前述の場合と同様にして再び下皿36の表面36aの高さを測定し、算出した下皿36の表面36aの平面度が要求される平面度に達しているかどうか確認を行う。   Then, after grinding the lower plate surface 36a, the height of the surface 36a of the lower plate 36 is measured again in the same manner as described above, and the calculated flatness of the surface 36a of the lower plate 36 is required. Check if it has reached the required degree.

この結果、本実施形態の研磨装置1によれば、制御装置55が、接触式変位センサ91により測定された下皿36の表面36aの高さに応じて水平移動機構60の作動を制御するため、下皿表面36aにおける凸部分を選択的に研削することができ、下皿表面36aの平面度を向上させることが可能になる。また、下皿保持部37に保持された下皿36の表面36aを研削して当該表面36aの平面度を修正するため、下皿36の取り付け誤差等の影響を排除することができ、下皿表面36aの平面度をより向上させることが可能になる。   As a result, according to the polishing apparatus 1 of the present embodiment, the control device 55 controls the operation of the horizontal movement mechanism 60 according to the height of the surface 36a of the lower plate 36 measured by the contact displacement sensor 91. The convex portion on the lower plate surface 36a can be selectively ground, and the flatness of the lower plate surface 36a can be improved. Further, since the flatness of the surface 36a is corrected by grinding the surface 36a of the lower plate 36 held by the lower plate holding part 37, it is possible to eliminate the influence of the mounting error of the lower plate 36, etc. It becomes possible to further improve the flatness of the surface 36a.

このとき、下皿研削ユニット50は、ドレスヘッド部110の研削工具121を下皿36の表面36aに当接させて回転させることより、下皿36の表面36aを部分的に研削可能に構成されることが好ましく、このようにすれば、下皿表面36aにおける凸部分を効果的に研削することができる。   At this time, the lower plate grinding unit 50 is configured to be able to partially grind the surface 36a of the lower plate 36 by rotating the grinding tool 121 of the dress head portion 110 in contact with the surface 36a of the lower plate 36. In this way, it is possible to effectively grind the convex portion on the lower plate surface 36a.

さらに、ドレスヘッド部110は、下皿36の表面形状に応じて研削工具121の傾きを調整する(研削工具121が倣う)調整機構(ガイドピン118およびガイド溝124)を有して構成されることが好ましく、このようにすれば、下皿表面36aにおける凸部分をより平坦に研削することができる。   Further, the dress head unit 110 is configured to have an adjustment mechanism (guide pin 118 and guide groove 124) that adjusts the inclination of the grinding tool 121 according to the surface shape of the lower plate 36 (followed by the grinding tool 121). It is preferable that the convex portion on the lower plate surface 36a can be ground more flatly.

また、上皿研削ユニット40および下皿研削ユニット50を用いて、ガラス板10の両面を研磨する上皿31および下皿36のうち少なくともいずれかの表面を研削して平面度を修正するようにすることが好ましく、このようにすれば、各皿の平面度だけでなく、上皿31および下皿36の表面同士の平行度を向上させることが可能になる。   Further, by using the upper plate grinding unit 40 and the lower plate grinding unit 50, the flatness is corrected by grinding at least one of the surfaces of the upper plate 31 and the lower plate 36 for polishing both surfaces of the glass plate 10. In this way, it is possible to improve not only the flatness of each dish, but also the parallelism between the surfaces of the upper dish 31 and the lower dish 36.

なお、上述の実施形態において、ガラス板10の両面を研磨する研磨装置1を例に説明したが、これに限られるものではなく、例えば、液晶ガラス基板やウェハ、金属板等の板部材を研磨する研磨装置においても、本発明を適用可能である。   In the above-described embodiment, the polishing apparatus 1 for polishing both surfaces of the glass plate 10 has been described as an example. However, the present invention is not limited to this. For example, a plate member such as a liquid crystal glass substrate, a wafer, or a metal plate is polished. The present invention can also be applied to the polishing apparatus.

本発明に係る研磨装置の側面図(部分断面図)である。It is a side view (partial sectional view) of a polishing apparatus according to the present invention. 研磨装置の平面図である。It is a top view of a polish device. キャリアを取り除いた状態での研磨装置の平面図である。It is a top view of the polish device in the state where a carrier was removed. 下皿研削ユニットの側断面図である。It is a sectional side view of a lower plate grinding unit. ドレスヘッド部の側断面図である。It is a sectional side view of a dress head part.

符号の説明Explanation of symbols

1 研磨装置
10 ガラス板(板部材) 15 キャリア
30 研磨ヘッド機構
31 上皿(研磨部材) 32 上皿保持部(保持機構)
36 下皿(研磨部材) 37 下皿保持部(保持機構)
40 上皿研削ユニット
50 下皿研削ユニット 55 制御装置(制御部)
60 水平移動機構(移動機構) 70 ドレス昇降機構
90 測定部 91 接触式変位センサ
100 ドレス回転機構 110 ドレスヘッド部
111 ヘッドハウジング 118 ガイドピン(調整機構)
121 研削工具 124 ガイド溝
DESCRIPTION OF SYMBOLS 1 Polishing apparatus 10 Glass plate (plate member) 15 Carrier 30 Polishing head mechanism 31 Upper plate (polishing member) 32 Upper plate holding part (holding mechanism)
36 Lower plate (abrasive member) 37 Lower plate holder (holding mechanism)
40 Upper plate grinding unit 50 Lower plate grinding unit 55 Control device (control unit)
60 Horizontal Movement Mechanism (Movement Mechanism) 70 Dress Lifting Mechanism 90 Measurement Unit 91 Contact Displacement Sensor 100 Dress Rotation Mechanism 110 Dress Head Unit 111 Head Housing 118 Guide Pin (Adjustment Mechanism)
121 Grinding tool 124 Guide groove

Claims (4)

板部材の表面を研磨可能な研磨部材と、前記研磨部材を保持する保持機構とを備え、前記保持機構に保持された前記研磨部材を前記板部材の表面に当接させて相対移動させることにより、前記板部材の表面を研磨するように構成された研磨装置において、
前記保持機構に保持された前記研磨部材の表面を研削して前記表面の平面度を修正する研削ユニットを備え、
前記研削ユニットは、
前記研磨部材の表面を部分的に研削可能な研削工具と、
前記研磨部材の表面形状を測定する測定部と、
前記研削工具を前記研磨部材の表面と略平行な方向に移動させる移動機構と、
前記測定部により測定された前記表面形状に応じて前記研磨工具を移動させるように前記移動機構の作動を制御する制御部とを有して構成されることを特徴とする研磨装置。
A polishing member capable of polishing the surface of the plate member; and a holding mechanism for holding the polishing member; and by moving the polishing member held by the holding mechanism in contact with the surface of the plate member In the polishing apparatus configured to polish the surface of the plate member,
A grinding unit for correcting the flatness of the surface by grinding the surface of the polishing member held by the holding mechanism;
The grinding unit is
A grinding tool capable of partially grinding the surface of the abrasive member;
A measuring unit for measuring the surface shape of the polishing member;
A moving mechanism for moving the grinding tool in a direction substantially parallel to the surface of the polishing member;
A polishing apparatus comprising: a control unit that controls the operation of the moving mechanism so as to move the polishing tool according to the surface shape measured by the measuring unit.
前記研削ユニットは、前記研削工具を保持して回転可能なドレスヘッド部を有し、前記ドレスヘッド部に保持された前記研削工具を前記研磨部材の表面に当接させて回転させることにより、前記研磨部材の表面を部分的に研削可能に構成されており、
前記移動機構は、前記研削工具を保持する前記ドレスヘッド部を前記研磨部材の表面と略平行な方向に移動させることを特徴とする請求項1に記載の研磨装置。
The grinding unit has a dress head portion that is rotatable while holding the grinding tool, and the grinding tool held by the dress head portion is brought into contact with the surface of the polishing member to rotate the grinding tool. It is configured to be able to partially grind the surface of the abrasive member,
The polishing apparatus according to claim 1, wherein the moving mechanism moves the dress head unit holding the grinding tool in a direction substantially parallel to a surface of the polishing member.
前記ドレスヘッド部は、前記研磨部材の表面形状に応じて前記研削工具の傾きを調整する調整機構を有して構成されることを特徴とする請求項2に記載の研磨装置。   The polishing apparatus according to claim 2, wherein the dress head unit includes an adjustment mechanism that adjusts an inclination of the grinding tool according to a surface shape of the polishing member. 前記研磨部材は、前記板部材の両面をそれぞれ研磨可能な一対の研磨部材であり、前記保持機構は、前記一対の研磨部材を互いに対向するように保持し、前記保持機構に保持された前記一対の研磨部材をそれぞれ前記板部材の両面に当接させて相対移動させることにより、前記板部材の両面を研磨するように構成されており、
前記研削ユニットは、前記保持機構に保持された前記一対の研磨部材のうち少なくともいずれかの研磨部材の表面を研削して前記表面の平面度を修正することを特徴とする請求項1から3のうちいずれか一項に記載の研磨装置。
The polishing member is a pair of polishing members capable of polishing both surfaces of the plate member, and the holding mechanism holds the pair of polishing members so as to face each other and holds the pair of holding members held by the holding mechanism. The polishing member is configured to polish both surfaces of the plate member by bringing the polishing member into contact with both surfaces of the plate member and moving them relative to each other.
The grinding unit corrects the flatness of the surface by grinding the surface of at least one of the pair of polishing members held by the holding mechanism. Polishing apparatus as described in any one of them.
JP2008104265A 2008-04-14 2008-04-14 Polishing apparatus Pending JP2009255188A (en)

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