JP2009248018A - Wet detoxification method and its apparatus - Google Patents

Wet detoxification method and its apparatus Download PDF

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JP2009248018A
JP2009248018A JP2008100496A JP2008100496A JP2009248018A JP 2009248018 A JP2009248018 A JP 2009248018A JP 2008100496 A JP2008100496 A JP 2008100496A JP 2008100496 A JP2008100496 A JP 2008100496A JP 2009248018 A JP2009248018 A JP 2009248018A
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water
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Hiroshi Oshibe
弘 押部
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TOSETSU KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a wet detoxification apparatus capable of treating waste water, and a wet detoxification method using the waste water effectively. <P>SOLUTION: The wet detoxification apparatus includes a gas suction part 3 into which a toxic gas G is supplied, a wet exhaust gas treating part 6 disposed at the upper part of the gas suction part 3 and having a shower room 7, an exhaust part 9 continuing the shower room, a circulating water vessel 17 disposed at the under part of the gas suction part, and a circulating pump 25 supplying water in the circulating vessel into the shower room wherein a second water treating part for purifying the water in the circulating vessel and a reusing water part 23 are provided while the water in the reusing water part 23 is supplied into the shower room by a reusing water replenishing pump 30. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

この発明は、半導体製造装置や液晶製造装置等から排出される有害ガスを除害、回収するための除害方法及びその装置に関するものであり、更に述べると、除害に用いた排水を処理できる、湿式除害方法及びその装置に関するものである。   The present invention relates to a detoxification method and apparatus for detoxifying and collecting harmful gases discharged from a semiconductor production apparatus, a liquid crystal production apparatus, etc., and more specifically, can treat waste water used for detoxification. The present invention relates to a wet removal method and an apparatus therefor.

半導体製造ラインや液晶製造ラインから排出されるガスには、SiOやWO等の微細な粉体等の有害物が含まれていて、大変危険である。
そこで、従来、前記ガスを除害手段、例えば、充填方式やフィルタ方式等により除害した後に、大気開放している。(例えば、特許文献1、参照)。
The gas discharged from the semiconductor production line or the liquid crystal production line contains harmful substances such as fine powders such as SiO 2 and WO 3 and is very dangerous.
Therefore, conventionally, the gas is released to the atmosphere after it is removed by an abatement means such as a filling method or a filter method. (For example, refer to Patent Document 1).

前記充填方式は、充填物の表面に形成された水膜と、ガスの慣性衝突、微細粒子の拡散付着によってダストの捕集を行う方法であり、また、フィルタ方式は、加圧した水を供給して、ガスの洗浄を行う方法である。   The filling method is a method of collecting dust by water film formed on the surface of the filling, gas inertial collision, diffusion of fine particles, and the filter method supplies pressurized water. Thus, the gas cleaning is performed.

特開2002−172309号公報JP 2002-172309 A

除害に用いられた排水は、有害物を含んでいるので、そのまま廃棄処分することはできない。そこで、従来、その排水を所定場所(例えば、タンク)に集め、纏めて排水処理を行っている。しかし、このような排水処理方式は、設備費や処理費などが嵩むので、経済的に不利である。また、排水処理した水は廃棄されているので、資源の再利用上、問題がある。   Waste water used for detoxification contains harmful substances and cannot be disposed of as it is. Therefore, conventionally, the drainage is collected in a predetermined place (for example, a tank) and collectively drained. However, such a wastewater treatment method is economically disadvantageous because of increased equipment costs and treatment costs. Moreover, since the wastewater-treated water is discarded, there is a problem in reusing resources.

この発明は、上記事情に鑑み、排水処理可能な湿式除害装置を提供することを目的とする。他の目的は、排水を有効に利用することである。   In view of the above circumstances, an object of the present invention is to provide a wet-type abatement apparatus capable of wastewater treatment. Another purpose is to use waste water effectively.

この発明は、有害ガスが供給される吸気部と、該吸気部の上部に設けられ、シャワー室を有する湿式排気処理部と、該シャワー室に連続する排気部と、前記吸気部の下部に設けられた循環水槽と、前記循環水槽の水を前記シャワー室に供給する循環水供給手段と、を備えている湿式除害装置において、 前記循環水槽の水を浄化するための水処理手段を備えていることを特徴とする。   The present invention provides an intake section to which harmful gas is supplied, a wet exhaust treatment section having a shower chamber provided above the intake section, an exhaust section continuing to the shower chamber, and a lower section of the intake section. A wet detoxification apparatus comprising a circulating water tank and a circulating water supply means for supplying water from the circulating water tank to the shower chamber, comprising a water treatment means for purifying the water in the circulating water tank. It is characterized by being.

この発明の前記水処理手段は、前記循環水槽に連設したオーバーフロー式浄化槽であることを特徴とする。この発明の前記水処理手段は、浄化された水を貯留する再利用水部を備えていることを特徴とする。   The water treatment means according to the present invention is an overflow type septic tank connected to the circulating water tank. The water treatment means of the present invention is characterized by including a reuse water section for storing purified water.

この発明の前記再利用水部は、再利用水供給手段を介して前記シャワー室に連結されていることを特徴とする。この発明の前記水処理手段は、前記吸気部と循環水槽との間に配設された第1水処理部と、前記循環水槽の側部に連設された第2水処理部とから構成されていることを特徴とする。   The reuse water part of the present invention is connected to the shower room via a reuse water supply means. The water treatment means of the present invention comprises a first water treatment part disposed between the intake part and the circulating water tank, and a second water treatment part connected to the side of the circulating water tank. It is characterized by.

この発明は、吸気部に供給された有害ガスを、シャワー室を備えた湿式排気処理部を通して除害するとともに、前記湿式排気処理部から落下する水を前記吸気部の下部に設けた循環水槽に貯留し、前記循環水槽の水を循環水供給手段を介して前記シャワー室に供給する湿式除害方法において、前記循環水槽に連続する水処理手段を設け、該水処理手段で処理された再利用水を前記シャワー室に供給することを特徴とする。   The present invention removes harmful gas supplied to the intake section through a wet exhaust treatment section provided with a shower chamber, and supplies water falling from the wet exhaust treatment section to a circulating water tank provided at a lower portion of the intake section. In the wet detoxification method for storing and supplying the water in the circulating water tank to the shower chamber via the circulating water supply means, a water treatment means that is continuous with the circulating water tank is provided, and the reuse treated by the water treatment means Water is supplied to the shower room.

この発明は、循環水槽の水を浄化するための水処理手段を備えているので、排水は浄化され、きれいな状態となる。そのため、従来例と異なり、排水を所定の場所(タンク)に集めて纏めて水処理する必要はない。   Since this invention is provided with the water treatment means for purifying the water in the circulating water tank, the waste water is purified and becomes clean. Therefore, unlike the conventional example, it is not necessary to collect the wastewater in a predetermined place (tank) and collect the water.

この発明の水処理手段は、再利用水部を備えているので、ここに貯留された浄化水は、
再利用水供給手段を介して湿式排気処理部のシャワー室に供給することができる。そのため、シャワー室には、循環水槽からの循環水と、再利用水部からの再利用水とが供給されるので、循環水槽17内の水は、前記両水が混合した混合水となる。この混合水は、前記再利用水を使用せず、循環水だけを使用した場合の水よりも、きれいで汚染度が低く、PH値も高くなる。そのため、シャワー室に噴射される水は、比較的きれいな状態なので、効率よく除害を行うことができる。
又、従来例に比べ、循環水槽の汚染濃度が高くならないので、水道水等の新水の使用量を少なくすることができる。
Since the water treatment means of the present invention includes a reuse water section, the purified water stored here is
It can be supplied to the shower chamber of the wet exhaust treatment section through the reuse water supply means. Therefore, since the circulating water from the circulating water tank and the reused water from the reused water section are supplied to the shower chamber, the water in the circulating water tank 17 is a mixed water in which both the waters are mixed. This mixed water does not use the recycled water, and is clean and has a lower pollution degree and a higher PH value than water in which only the circulating water is used. Therefore, since the water sprayed into the shower room is in a relatively clean state, it can be efficiently removed.
Further, since the concentration of contamination in the circulating water tank does not increase compared to the conventional example, the amount of new water used such as tap water can be reduced.

水処理手段は、第1水処理部と第2水処理部とから構成されているので、湿式排気処理部から落下する水は、第1水処理部で処理された後、循環水槽内に流入する。そのため、該循環水槽内の汚染濃度を低くすることができる。   Since the water treatment means is composed of the first water treatment part and the second water treatment part, the water falling from the wet exhaust treatment part flows into the circulating water tank after being treated by the first water treatment part. To do. Therefore, the contamination concentration in the circulating water tank can be lowered.

この発明の第1実施の形態を図1により説明する。
水を用いて除害する除害装置(ここでは、「湿式除害装置」という)1は、吸気口3aを有する吸気部(「吸気室」ともいう)3を備えている。この吸気口3aは、図示しない半導体製造装置等の排気管に接続されている。
A first embodiment of the present invention will be described with reference to FIG.
A detoxifying apparatus (herein referred to as “wet detoxifying apparatus”) 1 that performs detoxification using water includes an intake portion (also referred to as “intake chamber”) 3 having an intake port 3a. The intake port 3a is connected to an exhaust pipe such as a semiconductor manufacturing apparatus (not shown).

前記吸気部3の上部には、湿式排気処理部6が設けられている。この湿式排気処理部6は、シャワー室7と、該シャワー室7と前記吸気部3とを仕切る充填材5と、から構成され、前記シャワー室7には複数のシャワー部7aが配設されている。前記シャワー室7の上部には、水切り部10を介して排気室9が設けられている。この排気室9は、排気管11を介して排気ファン13に連通している。   A wet exhaust treatment unit 6 is provided above the intake unit 3. The wet exhaust treatment unit 6 includes a shower chamber 7 and a filler 5 that partitions the shower chamber 7 and the intake unit 3. The shower chamber 7 includes a plurality of shower units 7 a. Yes. An exhaust chamber 9 is provided on the upper portion of the shower chamber 7 through a draining portion 10. The exhaust chamber 9 communicates with an exhaust fan 13 via an exhaust pipe 11.

前記吸気室3の下部には、第1水処理部15を介して循環水槽17が設けられている。この第1水処理部15には、木炭等の浄化材が設けられている。前記循環水槽17の側部には、水を浄化する水処理手段である、第2水処理部19が連設されている。この第2水処理部19は、例えば、オーバーフロー式浄化槽であり、仕切板に仕切られた、複数の浄化室21を備えているが、各浄化室21に、木炭等の浄化材を配設して良い。   A circulating water tank 17 is provided below the intake chamber 3 via a first water treatment unit 15. The first water treatment unit 15 is provided with a purification material such as charcoal. A second water treatment unit 19, which is a water treatment unit for purifying water, is continuously provided on the side of the circulating water tank 17. The second water treatment unit 19 is, for example, an overflow septic tank, and includes a plurality of purification chambers 21 partitioned by a partition plate. In each purification chamber 21, a purification material such as charcoal is disposed. Good.

前記第2水処理部19の側部には、再利用水部23が連設され、この再利用水部23には、浄化処理された、きれいな水が収容されている。この再利用水部23には、水位が所定レベルを超えたときに排水するオーバーフロー27と、水道水等の新水を外部から供給する新水補給部29が設けられている。   A reuse water unit 23 is connected to the side of the second water treatment unit 19, and clean water that has been purified is accommodated in the reuse water unit 23. The reuse water unit 23 is provided with an overflow 27 for draining when the water level exceeds a predetermined level, and a new water supply unit 29 for supplying new water such as tap water from the outside.

前記循環水槽17は、循環水供給手段である、循環ポンプ25を介してシャワー室7のシャワー部7aに連通している。また、前記再利用水部23は、再利用水供給手段である、再利用水補給ポンプ30を介して前記シャワー室7のシャワー部7aに連通している。   The circulating water tank 17 communicates with the shower part 7a of the shower chamber 7 via a circulating pump 25, which is a circulating water supply means. The reused water unit 23 communicates with the shower unit 7a of the shower chamber 7 through a reused water supply pump 30 serving as a reused water supply unit.

次に、本実施の形態の作動について説明する。
湿式除害装置1の制御スイッチ(図示省略)をオンにすると、排気ファン13が駆動し、吸気口3aから有害ガスGが吸気室3内に吸引される。この有害ガスGは、吸気部3内を上昇し、充填材5を通ってシャワー室7に入り、シャワー部7aのシャワー水と接触した後、水切り部10を通り、水分が取り除かれる。このようにして除害された清浄ガスG1は、排気室9、排気管11を介して器外に排気される。
Next, the operation of the present embodiment will be described.
When a control switch (not shown) of the wet-type abatement apparatus 1 is turned on, the exhaust fan 13 is driven, and harmful gas G is sucked into the intake chamber 3 from the intake port 3a. This harmful gas G rises in the intake section 3, enters the shower chamber 7 through the filler 5, contacts the shower water in the shower section 7a, and then passes through the draining section 10 to remove moisture. The clean gas G1 thus removed is exhausted to the outside through the exhaust chamber 9 and the exhaust pipe 11.

前記湿式排気処理部6のシャワー室7の水は、充填材5内を通り抜け、吸気室3内を上昇する有害ガスGと接触しながら落下し、第1水処理部15で第1回目の水処理を受けた後、循環水槽17内に落下する。
この第1水処理部15での水処理は、排水が通り抜けるのに時間がかかり過ぎないようにするために、比較的簡単に行われる。
The water in the shower chamber 7 of the wet exhaust treatment unit 6 passes through the filler 5 and falls in contact with the harmful gas G rising in the intake chamber 3, and the first water treatment unit 15 performs the first water. After receiving the treatment, it falls into the circulating water tank 17.
The water treatment in the first water treatment unit 15 is performed relatively easily so as not to take too much time for the drainage to pass through.

循環水槽17内の水wは、所定量を超えるとオーバーフローして第2水処理部19に入り、浄化されながら進行し、再利用水部23に到達する。このとき、再利用水部23内の水は、水道水等の新水、又は、これに近い程度まで浄化されているが、この浄化の程度は、必要に応じて適宜選択される。   When the water w in the circulating water tank 17 exceeds a predetermined amount, it overflows and enters the second water treatment unit 19, proceeds while being purified, and reaches the reused water unit 23. At this time, the water in the reused water unit 23 is purified to fresh water such as tap water or the like, but the degree of purification is appropriately selected as necessary.

循環水槽17内の水w1は、循環ポンプ25によりシャワー室7のシャワー部7aに供給され、シャワー室7内に噴射され、又、再利用水部23の水w2は、再利用水補給ポンプ30によりシャワー室7のシャワー部7aに供給され、シャワー室7内に噴射される。   The water w1 in the circulating water tank 17 is supplied to the shower part 7a of the shower room 7 by the circulation pump 25 and is injected into the shower room 7, and the water w2 in the reused water part 23 is reused by the reused water supply pump 30. Is supplied to the shower section 7 a of the shower chamber 7 and sprayed into the shower chamber 7.

従って、シャワー室7には、循環水槽17からの循環水w1と、再利用水部23からの再利用水w2とが供給されるので、循環水槽17内の水は、前記両水w1、w2が混合した混合水となる。この混合水は、前記再利用水w2を使用せず、循環水w1だけを使用した場合の水よりも、きれいで汚染度が低く、PH値も高くなる。そのため、シャワー室7に噴射される水は、比較的きれいな状態なので、効率よく除害を行うことができる。
又、従来例に比べ、循環水槽17の汚染濃度が高くならないので、水道水等の新水の使用量を少なくすることができる。
Accordingly, since the shower room 7 is supplied with the circulating water w1 from the circulating water tank 17 and the reused water w2 from the reused water unit 23, the water in the circulating water tank 17 is the waters w1 and w2. Becomes mixed water. The mixed water does not use the reused water w2, and is clean and less contaminated and has a higher PH value than water in the case where only the circulating water w1 is used. Therefore, since the water sprayed to the shower chamber 7 is in a relatively clean state, it can be efficiently removed.
Further, since the concentration of contamination in the circulating water tank 17 does not increase as compared with the conventional example, the amount of new water such as tap water can be reduced.

運転途中に、循環水槽17の水位が設計値より低下した場合には、新水補給部29から水道水等の新水を注入し、再利用水部23の水位を設計レベルに維持するが、この新水の補給は、循環水槽17に行うようにしても良い。   During operation, when the water level of the circulating water tank 17 falls below the design value, fresh water such as tap water is injected from the new water supply unit 29 and the water level of the reused water unit 23 is maintained at the design level. This replenishment of fresh water may be performed in the circulating water tank 17.

この発明の実施の形態は、前記に限定されるものではなく、例えば、次のようにしても良い。
(1)前記再利用水部23の水は、浄化された水なので、器外の他の機器、例えば、洗浄装置に利用することができる。
The embodiment of the present invention is not limited to the above, and may be as follows, for example.
(1) Since the water in the reuse water section 23 is purified water, it can be used for other equipment such as a cleaning device.

(2)水処理手段の第2水処理部として、オーバーフロー式浄化槽を用いたが、その他の公知の水処理手段を利用しても良い。
(3)水処理手段として、第1水処理部と第2水処理部とを用いたが、第1水処理部を省略してもよい。
(2) Although the overflow type septic tank is used as the second water treatment unit of the water treatment means, other known water treatment means may be used.
(3) Although the first water treatment unit and the second water treatment unit are used as the water treatment means, the first water treatment unit may be omitted.

本発明の第1実施の形態を示す正面断面図である。It is front sectional drawing which shows 1st Embodiment of this invention.

符号の説明Explanation of symbols

1 湿式除害装置
3 吸気部
5 充填材
7 シャワー室
15 第1水処理部
17 循環水槽
19 第2水処理部
23 再利用水部
G 有害ガス
G1 清浄ガス
w1 循環水
w2 再利用水
DESCRIPTION OF SYMBOLS 1 Wet abatement device 3 Intake part 5 Filler 7 Shower room 15 1st water treatment part 17 Circulating water tank 19 2nd water treatment part 23 Reuse water part G Toxic gas G1 Clean gas w1 Circulating water w2 Recycled water

Claims (6)

有害ガスが供給される吸気部と、該吸気部の上部に設けられ、シャワー室を有する湿式排気処理部と、該シャワー室に連続する排気部と、前記吸気部の下部に設けられた循環水槽と、前記循環水槽の水を前記シャワー室に供給する循環水供給手段と、を備えている湿式除害装置において、
前記循環水槽の水を浄化するための水処理手段を備えていることを特徴とする湿式除害装置。
An intake part to which harmful gas is supplied, a wet exhaust treatment part provided at the upper part of the intake part and having a shower room, an exhaust part continuing to the shower room, and a circulating water tank provided at the lower part of the intake part And a wet-type abatement device comprising circulating water supply means for supplying water from the circulating water tank to the shower chamber,
A wet-type abatement apparatus comprising water treatment means for purifying the water in the circulating water tank.
前記水処理手段は、前記循環水槽に連設したオーバーフロー式浄化槽であることを特徴とする請求項1記載の湿式除害装置。   The wet detoxification apparatus according to claim 1, wherein the water treatment means is an overflow type septic tank connected to the circulating water tank. 前記水処理手段は、浄化された水を貯留する再利用水部を備えていることを特徴とする請求項2記載の湿式除害装置。   The wet detoxification apparatus according to claim 2, wherein the water treatment means includes a reuse water section for storing purified water. 前記再利用水部は、再利用水供給手段を介して前記シャワー室に連結されていることを特徴とする請求項3記載の湿式除害装置。   4. The wet abatement apparatus according to claim 3, wherein the reuse water section is connected to the shower chamber via a reuse water supply means. 前記水処理手段は、前記吸気部と循環水槽との間に配設された第1水処理部と、前記循環水槽の側部に連設された第2水処理部とから構成されていることを特徴とする請求項1記載の湿式除害装置。   The water treatment means is composed of a first water treatment part disposed between the intake part and the circulating water tank, and a second water treatment part connected to the side of the circulating water tank. 2. The wet abatement apparatus according to claim 1, wherein 吸気部に供給された有害ガスを、シャワー室を備えた湿式排気処理部を通して除害するとともに、前記湿式排気処理部から落下する水を前記吸気部の下部に設けた循環水槽に貯留し、前記循環水槽の水を循環水供給手段を介して前記シャワー室に供給する湿式除害方法において、
前記循環水槽に連続する水処理手段を設け、該水処理手段で処理された再利用水を前記シャワー室に供給することを特徴とする湿式除害方法。
The harmful gas supplied to the intake section is detoxified through a wet exhaust treatment section provided with a shower room, and water falling from the wet exhaust treatment section is stored in a circulating water tank provided at a lower portion of the intake section, In the wet detoxification method of supplying water from the circulating water tank to the shower room through the circulating water supply means,
A wet detoxification method comprising: providing a continuous water treatment means in the circulating water tank, and supplying reused water treated by the water treatment means to the shower chamber.
JP2008100496A 2008-04-08 2008-04-08 Wet detoxification method and its apparatus Pending JP2009248018A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103357247A (en) * 2013-03-13 2013-10-23 山东成林光电技术有限责任公司 Washing system and washing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5648222A (en) * 1979-09-27 1981-05-01 Katsuro Suzuki Deodorizing method and deodorizing apparatus
JPH01155931A (en) * 1987-12-10 1989-06-19 Sumitomo Metal Ind Ltd Process for preventing malodor of waste gas generated from quenching tower of coke oven
JP2005177758A (en) * 2005-02-18 2005-07-07 Ebara Corp Biological deodorization method of odorant gas containing ammonia and apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5648222A (en) * 1979-09-27 1981-05-01 Katsuro Suzuki Deodorizing method and deodorizing apparatus
JPH01155931A (en) * 1987-12-10 1989-06-19 Sumitomo Metal Ind Ltd Process for preventing malodor of waste gas generated from quenching tower of coke oven
JP2005177758A (en) * 2005-02-18 2005-07-07 Ebara Corp Biological deodorization method of odorant gas containing ammonia and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103357247A (en) * 2013-03-13 2013-10-23 山东成林光电技术有限责任公司 Washing system and washing method

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