JP2009239141A - Method of boring insulation sheet and method of manufacturing wiring board - Google Patents

Method of boring insulation sheet and method of manufacturing wiring board Download PDF

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JP2009239141A
JP2009239141A JP2008085463A JP2008085463A JP2009239141A JP 2009239141 A JP2009239141 A JP 2009239141A JP 2008085463 A JP2008085463 A JP 2008085463A JP 2008085463 A JP2008085463 A JP 2008085463A JP 2009239141 A JP2009239141 A JP 2009239141A
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insulating sheet
conductive paste
hole
sheet
insulation sheet
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JP5106206B2 (en
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Isamu Kirikihira
勇 桐木平
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Kyocera SLC Technologies Corp
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Kyocera SLC Technologies Corp
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<P>PROBLEM TO BE SOLVED: To provide a method of boring an insulation sheet, in which cutting waste sticks neither in a through-hole of the insulation sheet nor on its periphery; and to provide a method of manufacturing a wiring board, in which electric signals are excellently sent to and received from a mounted semiconductor element. <P>SOLUTION: In the method of boring the insulation sheet in which a through-hole is bored in the insulation sheet 3 by sucking and fixing the insulation sheet 1 on a suction table 30 with an air-permeable sheet 20 interposed, and irradiating the insulation sheet 1 with laser light L from its upper surface side, the air-permeable sheet 20 is made of a resin material where a liquid phase is formed during the laser irradiation. In the method of manufacturing the wiring board, conductive paste is charged in the through-hole 3 of the insulation sheet 1 having the through-hole 3 formed by the method, and a wiring conductor made of metal foil is laminated on an upper surface of the insulation sheet 1 charged with the conductive paste to be connected to the conductive paste. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、絶縁シートにレーザ加工により貫通孔を穿孔する絶縁シートの穿孔方法およびこの穿孔方法を用いた配線基板の製造方法に関するものである。   The present invention relates to a method for punching an insulating sheet in which a through hole is drilled in an insulating sheet by laser processing, and a method for manufacturing a wiring board using the punching method.

従来から、半導体素子等の電子部品を搭載するために用いられる配線基板として、ガラスクロス等の耐熱性繊維基材に未硬化熱硬化性樹脂を含浸させた絶縁シートを熱硬化させて成る絶縁層と銅箔等の金属箔から成る配線導体とを交互に積層すると共に、絶縁層を挟んで上下に位置する配線導体同士を、絶縁層に形成された貫通孔内に充填された導電ペーストを硬化させて成る貫通導体により電気的に接続して成る配線基板が知られている。   Conventionally, an insulating layer formed by thermally curing an insulating sheet impregnated with an uncured thermosetting resin on a heat-resistant fiber base material such as glass cloth as a wiring substrate used for mounting electronic components such as semiconductor elements And wiring conductors made of metal foil such as copper foil are alternately laminated, and the conductive paste filled in the through holes formed in the insulating layer is cured between the wiring conductors located above and below the insulating layer. A wiring board is known which is electrically connected by a through conductor formed as described above.

この配線基板は、例えば下記のようにして製造される。
(a)耐熱性繊維基材に未硬化の熱硬化性樹脂を含浸させた絶縁シートの両主面にポリエチレンテレフタレートから成る厚みが5〜15μm程度の樹脂フィルムを剥離可能に密着させる。
(b)次に、樹脂フィルムが密着された絶縁シートを間に紙や布等の通気性シートを挟んで吸着テーブル上に吸着した状態で樹脂フィルム上からレーザ加工を施すことにより上下の樹脂フィルムおよび絶縁シートを連通する貫通孔を形成する。
(c)次に、樹脂フィルムおよび絶縁シートを連通する貫通孔内に金属等の導電粉末および未硬化の熱硬化性樹脂から成る導電ペーストを上面側の樹脂フィルム上からスクリーン印刷(圧入)で充填する。なお、この場合、貫通孔の形成された樹脂フィルムが印刷用のマスクとして用いられる。
(d)次に、貫通孔内に導電ペーストが充填された絶縁シートの両主面から樹脂フィルムを剥離して除去する。このとき、絶縁シートの貫通孔内に充填された導電ペーストは樹脂フィルムの厚み分に対応して絶縁シートの主面から突出した状態となる。
(e)次に、別途、転写用フィルム上に所定パターンに形成しておいた金属箔から成る配線導体を、絶縁シートの少なくとも一方の主面に、導電ペーストの端部を覆うようにして圧接して積層する。
(f)ついで、配線導体が積層された絶縁シートを複数枚積層し、180〜240℃の温度で数分〜数時間、熱プレスを用いて加熱加圧し、前記絶縁シートおよび前記導電ペーストを硬化させて配線基板を得る。
This wiring board is manufactured as follows, for example.
(A) A resin film having a thickness of about 5 to 15 μm made of polyethylene terephthalate is detachably adhered to both main surfaces of an insulating sheet obtained by impregnating a heat-resistant fiber base material with an uncured thermosetting resin.
(B) Next, the upper and lower resin films are subjected to laser processing from above the resin film in a state where the insulating sheet to which the resin film is closely attached is adsorbed on the adsorption table with a breathable sheet such as paper or cloth in between. And the through-hole which connects an insulating sheet is formed.
(C) Next, a conductive paste made of a conductive powder such as metal and an uncured thermosetting resin is filled into the through-hole communicating with the resin film and the insulating sheet from above the resin film by screen printing (press-fit). To do. In this case, a resin film having a through hole is used as a mask for printing.
(D) Next, the resin film is peeled and removed from both main surfaces of the insulating sheet filled with the conductive paste in the through holes. At this time, the conductive paste filled in the through holes of the insulating sheet is in a state of protruding from the main surface of the insulating sheet corresponding to the thickness of the resin film.
(E) Next, a wiring conductor made of a metal foil previously formed in a predetermined pattern on the transfer film is pressed against at least one main surface of the insulating sheet so as to cover the end of the conductive paste. And laminate.
(F) Next, a plurality of insulating sheets on which wiring conductors are laminated are laminated, and heated and pressed using a hot press at a temperature of 180 to 240 ° C. for several minutes to several hours to cure the insulating sheet and the conductive paste. To obtain a wiring board.

しかしながら、上述のように、樹脂フィルムが密着された絶縁シートを間に紙や布から成る通気性シートを挟んで吸着テーブル上に吸着した状態で樹脂フィルム上からレーザ加工を施すことにより上下の樹脂フィルムおよび絶縁シートを連通する貫通孔を形成すると、通気性シートを構成する紙や布は繊維からなり、レーザ照射により加工屑として数μm程度の大きさの繊維屑が発生して周囲に飛び散りやすいこと、および繊維の間に数μm〜数十μm程度の大さの隙間があることから、レーザ加工により発生した繊維屑が貫通孔内に飛散して絶縁シートの貫通孔内に付着したり、通気性シートの繊維の間の隙間を通って樹脂フィルム表面の貫通孔周囲に付着したりする。絶縁シートの貫通孔内や樹脂フィルムの表面に繊維屑が付着していると、貫通孔内に導電ペーストを充填する際に繊維屑が導電ペースト内に巻き込まれて異物となってしまう。そして、貫通孔内の導電ペーストを硬化させて貫通導体とした場合に、貫通導体における金属粉末同士の接触を異物として巻き込まれた繊維屑が阻害して貫通導体の電気抵抗が高くなり、その結果、搭載される半導体素子との間の電気信号のやりとりを良好にできなくなってしまうという問題点があった。
特開2003−283129号公報 特開平11−90667号公報
However, as described above, the upper and lower resins are obtained by applying laser processing from above the resin film in a state where the insulating sheet to which the resin film is closely attached is adsorbed on the adsorption table with a breathable sheet made of paper or cloth in between. When a through-hole that communicates the film and the insulating sheet is formed, the paper or cloth constituting the air-permeable sheet is made of fibers, and fiber scraps of a size of about several μm are easily generated as processing scraps by laser irradiation and scattered around. In addition, since there is a gap of about several μm to several tens of μm between the fibers, fiber waste generated by laser processing is scattered in the through hole and adhered to the through hole of the insulating sheet, It adheres around the through-holes on the surface of the resin film through the gaps between the fibers of the breathable sheet. When fiber waste adheres to the inside of the through hole of the insulating sheet or the surface of the resin film, the fiber waste is caught in the conductive paste when filling the through hole with the conductive paste and becomes a foreign substance. Then, when the conductive paste in the through hole is cured to form a through conductor, the fiber waste that is involved as a foreign object in the contact between the metal powders in the through conductor is obstructed, and the electrical resistance of the through conductor is increased. There is a problem in that it becomes impossible to exchange electric signals with a semiconductor element to be mounted.
JP 2003-283129 A JP-A-11-90667

本発明の課題は、絶縁シートの貫通孔内や貫通孔周辺にレーザ加工屑が付着することがない絶縁シートの穿孔方法を提供することにある。また、本発明の別の課題は、導電ペーストを硬化させて成る貫通導体の電気抵抗が異物により高くなることがなく、搭載される半導体素子との間の電気信号のやりとりを良好に行なうことが可能な配線基板を製造することが可能な配線基板の製造方法を提供することにある。   The subject of this invention is providing the punching method of the insulating sheet in which the laser processing waste does not adhere in the through-hole of an insulating sheet, or a through-hole periphery. Another object of the present invention is that the electrical resistance of the through conductor formed by curing the conductive paste does not increase due to the foreign matter, and the electrical signal can be exchanged with the mounted semiconductor element satisfactorily. An object of the present invention is to provide a wiring board manufacturing method capable of manufacturing a possible wiring board.

本発明の絶縁シートの穿孔方法は、吸着テーブル上に通気性シートを挟んで絶縁シートを吸着固定するとともに、該絶縁シートの上面側からレーザを照射して前記絶縁シートに貫通孔を形成する絶縁シートの穿孔方法であって、前記通気性シートは、レーザ照射時に液相が形成される樹脂材料から成ることを特徴とするものである。
さらに、本発明の絶縁シートの穿孔方法は、前記通気性シートは、大きさが5〜20nmのボイドにより形成されたナノ多孔質領域がその厚み方向に縞状に並んで形成されていることを特徴とするものである。
In the insulating sheet punching method of the present invention, an insulating sheet is sucked and fixed by sandwiching a breathable sheet on a suction table, and a laser is irradiated from the upper surface side of the insulating sheet to form a through hole in the insulating sheet. The sheet perforation method is characterized in that the breathable sheet is made of a resin material that forms a liquid phase upon laser irradiation.
Furthermore, in the method for perforating an insulating sheet of the present invention, the breathable sheet is formed such that nanoporous regions formed by voids having a size of 5 to 20 nm are formed in a stripe pattern in the thickness direction. It is a feature.

また、本発明の配線基板の製造方法は、上記本発明の絶縁シートの穿孔方法により貫通孔が形成された絶縁シートの前記貫通孔内に導電ペーストを充填するとともに、該導電ペーストが充填された前記絶縁シートの表面に金属箔から成る配線導体を前記導電ペーストと接続するように積層する工程を含むことを特徴とするものである。   Further, in the method for manufacturing a wiring board according to the present invention, the conductive paste is filled in the through hole of the insulating sheet in which the through hole is formed by the method for punching the insulating sheet of the present invention, and the conductive paste is filled. It includes a step of laminating a wiring conductor made of a metal foil on the surface of the insulating sheet so as to be connected to the conductive paste.

本発明の絶縁シートの穿孔方法によれば、通気性シートは、レーザ照射時に液相が形成される樹脂材料から成ることから、レーザ加工により溶融はするものの、溶融物は飛び散ることがなく、したがって絶縁シートに形成された貫通孔内に付着することはない。
さらに前記通気性シートが、大きさが5〜20nmのボイドにより形成されたナノ多孔質領域をその厚み方向に縞状に有したものの場合、例え大きさが数μm程度の屑が発生したとしても、その屑がナノ多孔質領域を通過して貫通孔の周辺に付着することはない。
また、本発明の配線基板の製造方法によれば、上記本発明の絶縁シートの穿孔方法により貫通孔が形成された絶縁シートの前記貫通孔内に導電ペーストを充填することから、貫通孔内に充填された導電ペーストに異物が混入することがない。したがって、導電ペーストを硬化させて成る貫通導体の電気抵抗が高くなることがなく、搭載される半導体素子との間の電気信号のやりとりを良好に行なうことが可能な配線基板を歩留り良く製造することができる。
According to the method for perforating an insulating sheet of the present invention, since the breathable sheet is made of a resin material that forms a liquid phase upon laser irradiation, it melts by laser processing, but the melt does not scatter. It does not adhere in the through-hole formed in the insulating sheet.
Further, in the case where the breathable sheet has a nanoporous region formed by voids having a size of 5 to 20 nm in a stripe shape in the thickness direction, even if scraps having a size of about several μm are generated. The debris does not pass through the nanoporous region and adhere to the periphery of the through hole.
In addition, according to the method for manufacturing a wiring board of the present invention, the conductive paste is filled in the through hole of the insulating sheet in which the through hole is formed by the method for punching the insulating sheet of the present invention. Foreign matter is not mixed into the filled conductive paste. Therefore, a wiring board capable of satisfactorily exchanging electrical signals with a mounted semiconductor element without increasing the electrical resistance of a through conductor formed by curing a conductive paste, and manufacturing with good yield. Can do.

次に、本発明の実施形態にかかる絶縁シートの穿孔方法について、添付の図面を基に説明する。図1〜図3は、本実施形態の絶縁シートの穿孔方法を説明するための工程毎の概略断面図であり、これらの図中、1は絶縁シート、2は樹脂フィルム、3は貫通孔、20は通気性シート、30は吸着テーブルである。   Next, a method for punching an insulating sheet according to an embodiment of the present invention will be described with reference to the accompanying drawings. 1 to 3 are schematic cross-sectional views for each step for explaining a method for punching an insulating sheet according to the present embodiment. In these drawings, 1 is an insulating sheet, 2 is a resin film, 3 is a through-hole, 20 is a breathable sheet and 30 is a suction table.

先ず、図1に示すように、上下両主面に樹脂フィルム2が貼着された絶縁シート1と、通気性シート20と、吸着テーブル30とを準備する。   First, as shown in FIG. 1, an insulating sheet 1 having a resin film 2 attached to both upper and lower main surfaces, a breathable sheet 20, and a suction table 30 are prepared.

絶縁シート1は、厚みが30〜200μm程度、幅および長さがそれぞれ20〜60cm程度の長方形であり、耐熱繊維の束を縦横に織ってシート状にした耐熱繊維基材に未硬化の熱硬化性樹脂を含浸させた後、乾燥あるいは半硬化状態としたものであり、耐熱繊維としては、例えばガラス繊維やアラミド繊維・全芳香族エステル繊維等が用いられ、また熱硬化性樹脂としては、例えばエポキシ樹脂やビスマレイミドトリアジン樹脂、アリル変性ポリフェニレンエーテル樹脂等が用いられる。また、樹脂フィルム2は、厚みが5〜15μm程度であり、例えばポリエチレンテレフタレート等のフィルムが用いられており、図示しない粘着材を介して絶縁シート1の両主面に剥離可能に貼着されている。   The insulating sheet 1 is a rectangle having a thickness of about 30 to 200 μm, a width and a length of about 20 to 60 cm, respectively, and a heat-resistant fiber base material obtained by weaving a bundle of heat-resistant fibers vertically and horizontally into a sheet shape, and uncured thermosetting. After impregnating the curable resin, it is in a dry or semi-cured state, and as the heat-resistant fiber, for example, glass fiber, aramid fiber, wholly aromatic ester fiber, etc. are used, and as the thermosetting resin, for example, Epoxy resins, bismaleimide triazine resins, allyl-modified polyphenylene ether resins and the like are used. The resin film 2 has a thickness of about 5 to 15 μm, and a film such as polyethylene terephthalate is used. The resin film 2 is detachably attached to both main surfaces of the insulating sheet 1 through an adhesive material (not shown). Yes.

また、通気性シート20は、例えばポリエチレンやポリプロピレン、ポリエステル、ポリカーボネート、ポリアミド、ポリイミド等の樹脂から成り、厚みが100〜300μm程度である。そしてその上面から下面にかけて5〜20nm程度の微小なボイドが形成された幅が5〜10μm程度のナノ多孔質領域が20〜30μmの間隔で規則的に並んだ構造を有しており、ナノ多孔質領域を通してその上面側から下面側に空気を通過させる通気性を有している。通気性シート20における空気の通過量としては、0.1〜2cc/分程度が好ましい。このような通気性シート20は、例えばポリエステルから成る樹脂シートを、その分子配向方向と略平行に折り曲げて折り曲げ部を形成し、その後、樹脂シートを前記折り曲げ部における折り曲げ線に対して直交する方向に引っ張って分子配向方向と略平行に連続的な縞状のナノ多孔質領域を形成することにより得ることができる。   The breathable sheet 20 is made of a resin such as polyethylene, polypropylene, polyester, polycarbonate, polyamide, or polyimide, and has a thickness of about 100 to 300 μm. A nanoporous region having a width of about 5 to 10 μm in which minute voids of about 5 to 20 nm are formed from the upper surface to the lower surface is regularly arranged at intervals of 20 to 30 μm. It has air permeability that allows air to pass from the upper surface side to the lower surface side through the quality region. The amount of air passing through the breathable sheet 20 is preferably about 0.1 to 2 cc / min. Such a breathable sheet 20 is formed by bending a resin sheet made of polyester, for example, substantially in parallel with the molecular orientation direction to form a bent portion, and then the direction orthogonal to the bending line in the bent portion. To form a continuous striped nanoporous region substantially parallel to the molecular orientation direction.

また、吸着テーブル30は、例えばアルミナ粒子をガラスで固めて焼成して形成した多孔質セラミックから成る厚みが5〜50mm程度の平板であり、その下面側が図示しない吸引装置に接続されている。そして、その上面側から空気を吸い込むことによりその上面に載置された被載置物を吸引固定することができる。   Further, the suction table 30 is a flat plate made of porous ceramic formed by, for example, hardening alumina particles with glass and firing, and the lower surface thereof is connected to a suction device (not shown). Then, the object placed on the upper surface can be sucked and fixed by sucking air from the upper surface side.

次に、図2に示すように、樹脂フィルム2が貼着された絶縁シート1を通気性シート20を介して吸着テーブル30の上に載置するとともに、図示しない吸引装置により吸着テーブル30の下面側から吸着テーブル30および通気性シート20を通して空気を吸引することにより吸着テーブル30上に前記絶縁シート1を吸着固定する。   Next, as shown in FIG. 2, the insulating sheet 1 to which the resin film 2 is adhered is placed on the suction table 30 through the breathable sheet 20, and the lower surface of the suction table 30 by a suction device (not shown). The insulating sheet 1 is sucked and fixed onto the suction table 30 by sucking air from the side through the suction table 30 and the breathable sheet 20.

次に、図3に示すように、樹脂フィルム2が貼着された絶縁シート1の上方からレーザLを照射して樹脂フィルム2および絶縁シート1を貫通する複数の貫通孔3を形成する。このとき、通気性シート20にも貫通孔が形成される。しかしながら、通気性シート20は、前述したように樹脂からなることから、レーザLの照射によって液相を形成して溶融するものの、溶融物は飛び散ることがなく、したがって絶縁シート1に形成された貫通孔3内にレーザ加工屑が付着することはない。さらに、通気性シート20は、5〜20nm程度の微小なボイドが形成された幅が5〜10μm程度のナノ多孔質領域が20〜30μmの間隔で規則的に並んだ構造のため、例え大きさが数μmの微小なレーザ加工屑が発生したとしても、その屑が通気性シートを透過して樹脂フィルム2表面の貫通孔3周辺に付着することはない。かくして本発明の絶縁シートの穿孔方法によれば、絶縁シートの貫通孔内およびその周辺にレーザ加工屑の付着がない絶縁シートの穿孔方法を提供することができる。   Next, as shown in FIG. 3, a plurality of through holes 3 penetrating the resin film 2 and the insulating sheet 1 are formed by irradiating the laser L from above the insulating sheet 1 to which the resin film 2 is adhered. At this time, a through hole is also formed in the breathable sheet 20. However, since the air-permeable sheet 20 is made of resin as described above, it melts by forming a liquid phase by irradiation with the laser L, but the melt does not scatter, and thus the penetration formed in the insulating sheet 1. Laser processing debris does not adhere in the hole 3. Further, the air-permeable sheet 20 has a structure in which nano-porous regions having a width of about 5 to 10 μm in which minute voids of about 5 to 20 nm are formed are regularly arranged at intervals of 20 to 30 μm. However, even if a small laser processing scrap of several μm is generated, the scrap does not pass through the breathable sheet and adhere to the periphery of the through hole 3 on the surface of the resin film 2. Thus, according to the method for perforating an insulating sheet of the present invention, it is possible to provide a method for perforating an insulating sheet in which there is no adhesion of laser processing waste in and around the through hole of the insulating sheet.

次に、本発明の実施形態にかかる配線基板の製造方法について説明する。図4(a)〜図6(h)は本実施形態の配線基板の製造方法を説明するための工程毎の概略断面図であり、これらの図中、1は絶縁シート、2は樹脂フィルム、3は貫通孔、4は導電ペースト、5は配線導体である。   Next, the manufacturing method of the wiring board concerning embodiment of this invention is demonstrated. 4 (a) to 6 (h) are schematic cross-sectional views for each step for explaining the method of manufacturing the wiring board according to the present embodiment. In these drawings, 1 is an insulating sheet, 2 is a resin film, 3 is a through hole, 4 is a conductive paste, and 5 is a wiring conductor.

先ず、図4(a)に示すように、上述した方法により貫通孔3が形成された絶縁シート1を準備する。なお、絶縁シート1の両主面には上述したように樹脂フィルム2を貼着しておく。次に、図4(b)に示すように、樹脂フィルム2および絶縁シート1を連通する貫通孔3内に導電ペースト4を充填する。貫通孔3内に導電ペースト4を充填するには、上面側の樹脂フィルム2上に導電ペースト4を供給するとともに、その上を硬質ゴム製のスキージを導電ペースト4を掻きながら摺動させることにより充填する方法が採用される。このとき、絶縁シート1の貫通孔3内および樹脂フィルム2の表面にはレーザ加工に伴う加工屑がないことから貫通孔3内に充填された導電ペースト4に異物が混入することはない。   First, as shown to Fig.4 (a), the insulating sheet 1 in which the through-hole 3 was formed by the method mentioned above is prepared. In addition, the resin film 2 is stuck on both main surfaces of the insulating sheet 1 as described above. Next, as shown in FIG. 4 (b), the conductive paste 4 is filled into the through holes 3 that allow the resin film 2 and the insulating sheet 1 to communicate with each other. In order to fill the through hole 3 with the conductive paste 4, the conductive paste 4 is supplied onto the resin film 2 on the upper surface side, and a squeegee made of hard rubber is slid on the conductive paste 4 while scraping it. A filling method is adopted. At this time, since there is no processing waste associated with laser processing in the through hole 3 of the insulating sheet 1 and the surface of the resin film 2, no foreign matter is mixed into the conductive paste 4 filled in the through hole 3.

導電ペースト4は、例えば錫と銀とビスマスと銅との合金から成る金属粉末とトリアリルシアヌレートやトリアリルイソシアヌレート、トリスエポキシプロピルイソシアヌレート、トリス(2−ヒドロキシエチル)イソシアヌレート等のトリアジン系熱硬化性樹脂とを含有している。そして、前記金属粉末同士の接触により導電性を呈する。なお、前記金属粉末の含有量は、導電ペースト4の総量に対して、80〜95重量%が好ましい。金属粉末の含有量が80重量%より少ないと、トリアジン系熱硬化性樹脂により金属粉末同士の接続が妨げられ、導通抵抗が上昇してしまう傾向があり、95重量%を超えると、金属粉末およびトリアジン系熱硬化性樹脂を含有した導電ペーストの粘度が上がり過ぎて良好に充填ができない傾向にある。したがって、金属粉末の含有量は80〜95重量%が好ましい。   The conductive paste 4 is made of, for example, a metal powder made of an alloy of tin, silver, bismuth and copper and a triazine type such as triallyl cyanurate, triallyl isocyanurate, trisepoxypropyl isocyanurate, tris (2-hydroxyethyl) isocyanurate. Containing thermosetting resin. And it exhibits electroconductivity by contact between the metal powders. In addition, the content of the metal powder is preferably 80 to 95% by weight with respect to the total amount of the conductive paste 4. When the content of the metal powder is less than 80% by weight, the connection between the metal powders is hindered by the triazine-based thermosetting resin, and the conduction resistance tends to increase. When the content exceeds 95% by weight, the metal powder and There is a tendency that the viscosity of the conductive paste containing the triazine-based thermosetting resin is so high that it cannot be satisfactorily filled. Therefore, the content of the metal powder is preferably 80 to 95% by weight.

次に、図4(c)に示すように、絶縁シート1の両主面から樹脂フィルム2を剥離して除去する。このとき、樹脂フィルム2の貫通孔3内に充填されていた導電ペースト4は樹脂フィルム2の厚みに応じた高さだけ突出した状態で残ることとなる。なおこのとき、樹脂フィルム2の厚みが5μm未満であると、絶縁シート1の主面から突出する導電ペースト4の高さが低いものとなって、後述するように、絶縁シート1の主面に導電ペースト4の端部を覆うように配線導体5を積層する際に、導電ペースト4と配線導体5との密着が弱いものとなる危険性が高くなり、逆に15μmを超えると、絶縁シート1の主面から突出する導電ペースト4の高さが高いものとなって、絶縁シート1の主面に導電ペースト4の端部を覆うように配線導体5を積層する際に、導電ペースト4の突出部が横に大きく潰れて配線導体5からはみ出してしまう危険性が高くなる。したがって、樹脂フィルム2の厚みは5〜15μmの範囲が好ましい。   Next, as shown in FIG. 4C, the resin film 2 is peeled off from both main surfaces of the insulating sheet 1 and removed. At this time, the conductive paste 4 filled in the through holes 3 of the resin film 2 remains in a state of protruding by a height corresponding to the thickness of the resin film 2. At this time, when the thickness of the resin film 2 is less than 5 μm, the conductive paste 4 protruding from the main surface of the insulating sheet 1 has a low height, and as described later, the main surface of the insulating sheet 1 is formed. When the wiring conductor 5 is laminated so as to cover the end portion of the conductive paste 4, there is a high risk that the adhesion between the conductive paste 4 and the wiring conductor 5 becomes weak. When the wiring conductor 5 is laminated on the main surface of the insulating sheet 1 so as to cover the end portion of the conductive paste 4, the conductive paste 4 protrudes from the main surface of the insulating sheet 1. There is a high risk that the portion will be greatly crushed laterally and protrude from the wiring conductor 5. Therefore, the thickness of the resin film 2 is preferably in the range of 5 to 15 μm.

次に、図5(d)に示すように、別途、ポリエチレンナフタレート等の樹脂フィルムから成る転写用フィルム6の一方の主面上に剥離可能に密着された銅箔等の金属箔から成る配線導体5を準備する。この転写用フィルム6上の配線導体5は、転写用フィルム6の一方の主面に銅箔等の金属箔を間に図示しない粘着材を介して密着した後、その金属箔をフォトリソグラフィー技術により所定のパターンにエッチングすることにより形成される。配線導体5の厚みは5〜30μm程度である。   Next, as shown in FIG. 5D, separately, a wiring made of a metal foil such as a copper foil, which is peelably adhered to one main surface of a transfer film 6 made of a resin film such as polyethylene naphthalate. A conductor 5 is prepared. The wiring conductor 5 on the transfer film 6 has a metal foil such as a copper foil adhered to one main surface of the transfer film 6 via an adhesive material (not shown), and then the metal foil is bonded by photolithography. It is formed by etching into a predetermined pattern. The thickness of the wiring conductor 5 is about 5 to 30 μm.

次に、図5(e)に示すように、絶縁シート1の上に転写用フィルム6上の配線導体5を導電ペースト4の端部を覆うように重ねてプレスすることにより積層した後、図5(f)に示すように、転写用フィルム6を除去することにより、配線導体5を転写する。   Next, as shown in FIG. 5 (e), the wiring conductor 5 on the transfer film 6 is laminated on the insulating sheet 1 so as to cover the end of the conductive paste 4, and then laminated. As shown in 5 (f), the wiring conductor 5 is transferred by removing the transfer film 6.

次に、図6(g)に示すように、上述のようにして貫通孔3に導電ペースト4が充填されているとともに表面に配線導体5が積層された絶縁シート1を配線基板の製造に必要な形態で複数枚揃える(ここでは絶縁シート1が3枚の場合を示している)。   Next, as shown in FIG. 6G, the insulating sheet 1 in which the through-hole 3 is filled with the conductive paste 4 and the wiring conductor 5 is laminated on the surface as described above is necessary for manufacturing the wiring board. A plurality of sheets are prepared in such a form (here, a case where there are three insulating sheets 1) is shown.

次に、図6(h)に示すように、上記複数枚の絶縁シート1を所定の配置で上下に重ね合わせた状態でプレスしながら加熱し、絶縁シート1の熱硬化性樹脂および導電ペースト4の熱硬化性樹脂を熱硬化させることにより、複数の絶縁シート1が硬化した絶縁層11と配線導体5とが交互に積層されているとともに、導電ペースト4が硬化した貫通導体14により上下の配線導体5が電気的に接続された配線基板10が得られる。このとき、貫通孔3内に充填された導電ペースト4には異物が混入していないことから、導電ペースト4を硬化させて成る貫通導体14の電気抵抗が高くなることがなく、搭載される半導体素子との間の電気信号のやりとりを良好に行なうことが可能な配線基板を提供することができる。   Next, as shown in FIG. 6 (h), the plurality of insulating sheets 1 are heated while being pressed in a state where they are stacked one above the other in a predetermined arrangement, and the thermosetting resin and the conductive paste 4 of the insulating sheet 1. By thermally curing the thermosetting resin, insulating layers 11 and wiring conductors 5 in which a plurality of insulating sheets 1 are cured are alternately stacked, and upper and lower wirings are formed by through conductors 14 in which conductive paste 4 is cured. A wiring board 10 to which the conductors 5 are electrically connected is obtained. At this time, since no foreign matter is mixed in the conductive paste 4 filled in the through hole 3, the electrical resistance of the through conductor 14 formed by curing the conductive paste 4 does not increase, and the mounted semiconductor It is possible to provide a wiring board capable of satisfactorily exchanging electrical signals with elements.

は、本発明の絶縁シートの穿孔方法を説明するための工程毎の概略断面図である。These are the schematic sectional drawings for every process for demonstrating the punching method of the insulating sheet of this invention. は、本発明の絶縁シートの穿孔方法を説明するための工程毎の概略断面図である。These are the schematic sectional drawings for every process for demonstrating the punching method of the insulating sheet of this invention. は、本発明の絶縁シートの穿孔方法を説明するための工程毎の概略断面図である。These are the schematic sectional drawings for every process for demonstrating the punching method of the insulating sheet of this invention. (a)〜(c)は、本発明の配線基板の製造方法を説明するための工程毎の概略断面図である。(A)-(c) is a schematic sectional drawing for every process for demonstrating the manufacturing method of the wiring board of this invention. (d)〜(f)は、本発明の配線基板の製造方法を説明するための工程毎の概略断面図である。(D)-(f) is a schematic sectional drawing for every process for demonstrating the manufacturing method of the wiring board of this invention. (g),(h)は、本発明の配線基板の製造方法を説明するための工程毎の概略断面図である。(G), (h) is a schematic sectional drawing for every process for demonstrating the manufacturing method of the wiring board of this invention.

符号の説明Explanation of symbols

1 絶縁シート
2 樹脂フィルム
3 貫通孔
4 導電ペースト
5 配線導体
10 配線基板
20 通気性シート
30 吸着テーブル
DESCRIPTION OF SYMBOLS 1 Insulation sheet 2 Resin film 3 Through-hole 4 Conductive paste 5 Wiring conductor 10 Wiring board 20 Breathable sheet 30 Adsorption table

Claims (3)

吸着テーブル上に通気性シートを挟んで絶縁シートを吸着固定するとともに、該絶縁シートの上面側からレーザを照射して前記絶縁シートに貫通孔を形成する絶縁シートの穿孔方法であって、前記通気性シートは、レーザ照射時に液相が形成される樹脂材料から成ることを特徴とする絶縁シートの穿孔方法。   A method for perforating an insulating sheet, wherein an insulating sheet is adsorbed and fixed by sandwiching a breathable sheet on an adsorption table, and a through hole is formed in the insulating sheet by irradiating a laser from an upper surface side of the insulating sheet. The insulating sheet is made of a resin material that forms a liquid phase upon laser irradiation. 前記通気性シートは、大きさが5〜20nmのボイドにより形成されたナノ多孔質領域がその厚み方向に縞状に並んで形成されていることを特徴とする請求項1記載の絶縁シートの穿孔方法。   2. The perforated insulating sheet according to claim 1, wherein the breathable sheet has nanoporous regions formed by voids having a size of 5 to 20 nm arranged in stripes in the thickness direction. Method. 請求項1または2に記載の方法により貫通孔が形成された絶縁シートの前記貫通孔内に導電ペーストを充填するとともに、該導電ペーストが充填された前記絶縁シートの表面に金属箔から成る配線導体を前記導電ペーストと接続するように積層する工程を含むことを特徴とする配線基板の製造方法。   A wiring conductor made of a metal foil on the surface of the insulating sheet filled with the conductive paste while filling the through-hole of the insulating sheet in which the through-hole is formed by the method according to claim 1 or 2 A method for manufacturing a wiring board, comprising: laminating a conductive paste so as to be connected to the conductive paste.
JP2008085463A 2008-03-28 2008-03-28 Insulating sheet punching method and wiring board manufacturing method Expired - Fee Related JP5106206B2 (en)

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CN103763871A (en) * 2014-02-18 2014-04-30 无锡江南计算技术研究所 Printed board open hole printing ink filling method and hole filling breathable board

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