JP2009235272A5 - - Google Patents

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JP2009235272A5
JP2009235272A5 JP2008084470A JP2008084470A JP2009235272A5 JP 2009235272 A5 JP2009235272 A5 JP 2009235272A5 JP 2008084470 A JP2008084470 A JP 2008084470A JP 2008084470 A JP2008084470 A JP 2008084470A JP 2009235272 A5 JP2009235272 A5 JP 2009235272A5
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group
double bond
ethylenic double
phosphate ester
molecule
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JP2008084470A
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JP5255307B2 (en
JP2009235272A (en
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Priority claimed from JP2008084470A external-priority patent/JP5255307B2/en
Priority to JP2008084470A priority Critical patent/JP5255307B2/en
Priority to PCT/JP2009/000309 priority patent/WO2009118976A1/en
Priority to KR1020107020474A priority patent/KR101215459B1/en
Priority to DE112009000690T priority patent/DE112009000690T5/en
Priority to US12/933,938 priority patent/US8425790B2/en
Priority to CN200980109426.8A priority patent/CN101978001B/en
Publication of JP2009235272A publication Critical patent/JP2009235272A/en
Publication of JP2009235272A5 publication Critical patent/JP2009235272A5/ja
Publication of JP5255307B2 publication Critical patent/JP5255307B2/en
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Claims (5)

活性エネルギー線により重合可能な重合性モノマーを含むエッチングレジスト用インクジェットインキ組成物であって、
前記重合性モノマーは全モノマー中に、
分子内にリン酸エステル基とエチレン性二重結合基を有する重合性リン酸エステル化合物を０．５〜１３質量％と、
分子内に２個以上のエチレン性二重結合基を有し、リン酸エステル基を有さない多官能性モノマーであって、前記エチレン性二重結合基量が４×１０−３〜８×１０−３ｍｏｌ／ｇである多官能性モノマーを１０〜７５質量％と、
分子内に１個のエチレン性二重結合基を有し、リン酸エステル基を有さない単官能性モノマーを１０〜７５質量％含み、
２５℃における粘度は、３〜５０ｍＰａ・ｓである、エッチングレジスト用インクジェットインキ組成物。 An inkjet ink composition for an etching resist containing a polymerizable monomer that can be polymerized by active energy rays,
The polymerizable monomer is in all monomers,
0.5 to 13% by mass of a polymerizable phosphate ester compound having a phosphate ester group and an ethylenic double bond group in the molecule;
A polyfunctional monomer having two or more ethylenic double bond groups in the molecule and no phosphate ester group, wherein the amount of the ethylenic double bond groups is 4 × 10 −3 to 8 × 10 to 75% by mass of a polyfunctional monomer having a concentration of 10 −3 mol / g,
Has one ethylenic double bond group in the molecule, a monofunctional monomer having no phosphoric acid ester group 10 to 75 wt% seen including,
An ink-jet ink composition for etching resists having a viscosity at 25 ° C. of 3 to 50 mPa · s. 前記重合性リン酸エステル化合物は、下記の一般式（Ａ１）〜（Ａ４）のいずれかで表される化合物である、請求項１記載の組成物。
Figure 2009235272
 ［式中、Ｒは水素原子またはメチル基を表し、Ｒ１は炭素数が１〜４のアルキレン基を表す］
Figure 2009235272
 ［式中、Ｒ、Ｒ１は前記一般式（Ａ１）と同様に定義される］
Figure 2009235272
 ［式中、Ｒ、Ｒ１は前記一般式（Ａ１）と同様に定義され、Ｒ２はそれぞれ独立に炭素数が１〜１０のアルキレン基を表す］
Figure 2009235272
 ［式中、Ｒ、Ｒ１、Ｒ２はそれぞれ前記一般式（Ａ３）と同様に定義される］ The composition according to claim 1, wherein the polymerizable phosphate ester compound is a compound represented by any one of the following general formulas (A1) to (A4).
Figure 2009235272
 [Wherein, R represents a hydrogen atom or a methyl group, and R 1 represents an alkylene group having 1 to 4 carbon atoms]
Figure 2009235272
 [Wherein, R and R 1 are defined as in the general formula (A1)].
Figure 2009235272
 [Wherein, R and R 1 are defined in the same manner as in the general formula (A1), and R 2 each independently represents an alkylene group having 1 to 10 carbon atoms]
Figure 2009235272
 [Wherein R, R 1 and R 2 are respectively defined in the same manner as in the general formula (A3)] 前記多官能性モノマーは、下記一般式（Ｂ１）または（Ｂ２）で表される化合物である、請求項１記載の組成物。
Figure 2009235272
 ［式中、Ｒは独立に水素原子またはメチル基を表し、Ｒ１０は独立に炭素数が１〜５のアルキル基を表し、Ｐは０〜４の整数を表し、Ｘは、単結合、メチレン基、イソプロピリデン基を表し、ｎとｍはそれぞれ０〜６の数を表す］
Figure 2009235272
 ［式中、Ｒは前記一般式（Ｂ１）と同様に定義され、Ｒ２０は炭素数が３〜９のアルキレン基を表す］ The composition according to claim 1, wherein the polyfunctional monomer is a compound represented by the following general formula (B1) or (B2).
Figure 2009235272
 [Wherein, R independently represents a hydrogen atom or a methyl group, R 10 independently represents an alkyl group having 1 to 5 carbon atoms, P represents an integer of 0 to 4, X represents a single bond, methylene. Group and isopropylidene group, n and m each represent a number of 0 to 6]
Figure 2009235272
 [Wherein, R is defined in the same manner as in the general formula (B1), and R 20 represents an alkylene group having 3 to 9 carbon atoms] 金属板の上に請求項１記載の組成物を吐出する工程と、
活性エネルギー線を照射して前記組成物を硬化させる工程と、
前工程で得た金属板の表面をエッチングする工程と、
エッチングされた金属板をアルカリ液で処理して、前記硬化された組成物を除去する工程、を含むエッチング金属板の製造方法。 Discharging the composition according to claim 1 onto a metal plate;
Irradiating active energy rays to cure the composition;
Etching the surface of the metal plate obtained in the previous process;
A method for producing an etched metal plate, comprising: treating the etched metal plate with an alkaline solution to remove the cured composition. 金属板と、前記金属板の表面の少なくとも一部を被覆する、重合性モノマーを含む活性エネルギー線硬化性インキ組成物の活性エネルギー線硬化物からなるエッチングレジスト膜とを有し、An etching resist film made of an active energy ray-cured product of an active energy ray-curable ink composition containing a polymerizable monomer and covering at least a part of the surface of the metal plate;
前記重合性モノマーは全モノマー中に、The polymerizable monomer is in all monomers,
分子内にリン酸エステル基とエチレン性二重結合基を有する重合性リン酸エステル化合物を０．５〜１３質量％と、0.5 to 13% by mass of a polymerizable phosphate ester compound having a phosphate ester group and an ethylenic double bond group in the molecule;
分子内に２個以上のエチレン性二重結合基を有し、リン酸エステル基を有さない多官能性モノマーであって、前記エチレン性二重結合基量が４×１０A polyfunctional monomer having two or more ethylenic double bond groups in the molecule and having no phosphate group, wherein the ethylenic double bond group amount is 4 × 10 −３-3 〜８×１０~ 8x10 −３-3 ｍｏｌ／ｇである多官能性モノマーを１０〜７５質量％と、10 to 75% by mass of a polyfunctional monomer that is mol / g,
分子内に１個のエチレン性二重結合基を有し、リン酸エステル基を有さない単官能性モノマーを１０〜７５質量％含む、10 to 75% by mass of a monofunctional monomer having one ethylenic double bond group in the molecule and having no phosphate ester group,
樹脂被覆金属板。Resin coated metal plate.
JP2008084470A 2008-03-27 2008-03-27 Inkjet ink composition for etching resist Active JP5255307B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2008084470A JP5255307B2 (en) 2008-03-27 2008-03-27 Inkjet ink composition for etching resist
US12/933,938 US8425790B2 (en) 2008-03-27 2009-01-27 Ink-jet ink composition for etching resist
KR1020107020474A KR101215459B1 (en) 2008-03-27 2009-01-27 Ink-jet ink composition for etching resist
DE112009000690T DE112009000690T5 (en) 2008-03-27 2009-01-27 Inkjet ink composition for etch resists
PCT/JP2009/000309 WO2009118976A1 (en) 2008-03-27 2009-01-27 Ink-jet ink composition for etching resist
CN200980109426.8A CN101978001B (en) 2008-03-27 2009-01-27 Ink-jet ink composition for etching resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008084470A JP5255307B2 (en) 2008-03-27 2008-03-27 Inkjet ink composition for etching resist

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JP2009235272A JP2009235272A (en) 2009-10-15
JP2009235272A5 true JP2009235272A5 (en) 2010-10-14
JP5255307B2 JP5255307B2 (en) 2013-08-07

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JP6446219B2 (en) * 2013-10-02 2018-12-26 株式会社タケトモ PTP package and method for producing the same, and method for preventing forgery of PTP package
WO2015080155A1 (en) * 2013-11-27 2015-06-04 Jnc株式会社 Photocurable inkjet ink
JP6109896B2 (en) 2015-09-03 2017-04-05 日新製鋼株式会社 Method for removing resist film from metal plate and method for producing etched metal plate
JP6659278B2 (en) * 2015-09-03 2020-03-04 日鉄日新製鋼株式会社 Masking cured film removing device and etching metal plate manufacturing device
JP6956549B2 (en) 2017-07-14 2021-11-02 サカタインクス株式会社 Photocurable inkjet printing ink composition
TWI798395B (en) 2018-03-30 2023-04-11 日商太陽油墨製造股份有限公司 Curable composition for inkjet printing, cured product thereof, and electronic parts having the cured product
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