JP2009229638A - Transfer container for semiconductor member - Google Patents

Transfer container for semiconductor member Download PDF

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JP2009229638A
JP2009229638A JP2008073009A JP2008073009A JP2009229638A JP 2009229638 A JP2009229638 A JP 2009229638A JP 2008073009 A JP2008073009 A JP 2008073009A JP 2008073009 A JP2008073009 A JP 2008073009A JP 2009229638 A JP2009229638 A JP 2009229638A
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base
support
reticle
transfer container
lid
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Liwen Liao
莉▲ぶん▼ 廖
Liyin Chen
俐慇 陳
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E SUN PREC IND CO Ltd
E-SUN PRECISION INDUSTRIAL CO Ltd
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E SUN PREC IND CO Ltd
E-SUN PRECISION INDUSTRIAL CO Ltd
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Priority to JP2008073009A priority Critical patent/JP2009229638A/en
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Packaging Frangible Articles (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To improve a component support structure in a transfer container in a semiconductor processing process. <P>SOLUTION: The transfer container includes a base 50, and a lid 60, and composes a support part of reticle 70 in a U-shape on two conflict bases 52 and a conflict component 58 on the base. The transfer container includes hard support components 55 mutually facing both ends of the inside of the conflict base respectively. Each support component includes a first high projection piece and a second low projection piece having differences of height respectively. Their apex is made an arch form to make a point contact of a support contact face. The two support components on the same conflict base arrange the second low projection piece relatively inside, and even when the reticle is displaced, and slides down from the first projection piece, the second projection piece is received. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、半導体を製造する過程において、半導体レチクル或いはウェハーなどの物品を各工程間で移送するための移載容器内部の支持物品の技術に関し、特に、支持接触面積を小さくし、且つ二箇所の支持ポイントのある移載容器の支持構造によって物品と支持構造が摩擦により生じるダスト現象が減少し、更に物品が滑る或いは衝撃を受けて損傷することを防止する。   The present invention relates to a technology of a supporting article inside a transfer container for transferring an article such as a semiconductor reticle or a wafer between processes in the process of manufacturing a semiconductor, and in particular, a supporting contact area is reduced and two places are provided. The support structure of the transfer container having the support points reduces the dust phenomenon caused by friction between the article and the support structure, and further prevents the article from sliding or being damaged by impact.

近年、電子製品は絶えず薄く、短く小さく、短波長、高周波化などの特徴で発展しており、電子製品の核心となるチップは更にマイクロ化および高性能化する必要がある。そのためには、チップ上の集積回路線幅を小さくすれば、更に多くの集積回路導線および部品を設置することができる。現有の集積回路線幅は既に早期の0.25マイクロメートルから今の90〜45ナノメートルに縮小しているため、チップの集積回路線幅を小さくする成否の鍵は、主として半導体製造過程の光リソグラフィ製造過程技術にある。これらの設備ではスキャナーとレチクルが使用されるため、光リソグラフィ製造過程の物品、例えばレチクル或いはウェハーの表面にダスト或いは水分があると、製造の良品率に直接且つ厳重な影響を及ぼす。ゆえに、光リソグラフィ製造過程は極めてレベルの高い無塵室の中で行う必要がある。これらの問題を解決するために、アメリカ特許申請案第US 4,532,970号およびアメリカ特許申請案第US 4,534,389号では、ウェハー、レチクルを密閉した環境状態で移送するシステムを開発し、周囲環境のダスト、水分或いは有害物質がレチクルとウェハーの環境に入り込まないよう確保するものが発明された。   In recent years, electronic products are constantly being developed with features such as being thin, short and small, having a short wavelength and high frequency, and it is necessary to further miniaturize and enhance the performance of chips that are the core of electronic products. For this purpose, if the integrated circuit line width on the chip is reduced, more integrated circuit conductors and components can be installed. Since the existing integrated circuit line width has already been reduced from the early 0.25 micrometer to the present 90-45 nanometer, the key to success in reducing the chip integrated circuit line width is mainly photolithography manufacturing in the semiconductor manufacturing process In process technology. Since these equipment use a scanner and a reticle, dust or moisture on the surface of an optical lithography manufacturing article, for example, a reticle or wafer, has a direct and severe influence on the yield rate of manufacturing. Therefore, the photolithography manufacturing process needs to be performed in a very high dust-free chamber. In order to solve these problems, US Patent Application No. US 4,532,970 and US Patent Application No. US 4,534,389 have developed a system for transferring wafers and reticles in a sealed environment, and are able to remove dust and moisture from the surrounding environment. Alternatively, something was invented to ensure that harmful substances do not enter the environment of the reticle and wafer.

しかし、従来のレチクルボックスの例を見ると、図1に示すように、該レチクルボックス(10)は、枠(11)、基台(12)、蓋(13)、数本のガイドアーム(14)及び数本のプッシュアーム(15)を具有する。該基台(12)は、蓋(13)と連結する枠(11)と嵌合し、且つ該基台(12)は数個の支持ブロック(16)を介してレチクル(20)の下面を支持し、該支持ブロック(16)はレチクル(20)を載せる水平支持面(160)を具有する。   However, looking at an example of a conventional reticle box, as shown in FIG. 1, the reticle box (10) has a frame (11), a base (12), a lid (13), several guide arms (14 ) And several push arms (15). The base (12) is fitted to a frame (11) connected to the lid (13), and the base (12) is attached to the lower surface of the reticle (20) via several support blocks (16). The support block (16) has a horizontal support surface (160) on which the reticle (20) is placed.

前述のレチクルボックス(10)の基台(12)は、支持面(160)を具有する支持ブロック(16)が該レチクル(20)を支える構造は、支持面(160)とレチクル(20)の接触面積が大きく、硬度が低く、摩擦に耐えることができないため摩擦してダストが生じやすく、レチクル(20)底面の配線パターンのレジスト層を損傷しやすい。これらのダストは、レチクル露光時に影響を及ぼすため、不良品を作り、生産効率にも直接影響を与える。よって、ダストが一定の量に達すると、レチクルボックス(10)及びレチクル(20)の清掃を行う、または新しいレチクル(20)の保護フィルムを交換、或いはレチクル(20)図形を新たに製作しなければならないなど、運営コストが増加し、工場の競争力及び経済利益を下げることになる。   The base (12) of the above-mentioned reticle box (10) has a structure in which the support block (16) having the support surface (160) supports the reticle (20) has the structure of the support surface (160) and the reticle (20). Since the contact area is large, the hardness is low, and it cannot withstand friction, dust is likely to be generated due to friction, and the resist layer of the wiring pattern on the bottom surface of the reticle (20) is likely to be damaged. Since these dusts affect the reticle exposure, they produce defective products and directly affect production efficiency. Therefore, when the dust reaches a certain amount, the reticle box (10) and reticle (20) must be cleaned, the protective film of the new reticle (20) must be replaced, or a new reticle (20) figure must be produced. The operational cost will increase, and the competitiveness and economic profit of the factory will be lowered.

公知の台湾特許申請案第TWI224719号の「レチクルサポート装置」は、主にレチクルボックスの中で、ポリエーテルエーテルケトン(PEEK)製の突出ブロックでレチクルを支える。該突出ブロックの頂面に中央に傾斜したアーチ型の保持部を形成する。該特許申請案のデザインは、従来のダストが発生しやすい問題を克服するが、該接触面積が尚も広すぎる上、基台との結合がベストでないため、温度差による膨張収縮のある環境においては、緩んで外れやすくなるため、使用しにくい。   The known “reticle support device” of Taiwanese patent application proposal TWI224719 mainly supports a reticle with a protruding block made of polyetheretherketone (PEEK) in a reticle box. An arch-shaped holding portion inclined in the center is formed on the top surface of the protruding block. The design of the proposed patent application overcomes the problem of conventional dust generation, but the contact area is still too wide and the connection with the base is not the best, so in an environment with expansion and contraction due to temperature difference Is difficult to use because it will loosen and come off easily.

更に、従来技術或いは前述の特許申請案のレチクルボックスは、使用過程において人手により該レチクル(20)を該基台(12)の支持ブロック(16)或いは突出ブロックに置く場合、視線が遮られ、或いは位置が変位するなどの場合、レチクル(16)の置かれた位置に大きな誤差が生じると、該レチクル(16)の片側が一つの支持ブロック(16)或いは突出ブロックの上から落ちて該レチクル(20)の底面が直接該基台(12)の表面にぶつかり、該レチクル(20)の底面が損傷してしまうため、更なる改善する必要があった。
特開2002−299430号公報
Furthermore, the reticle box of the prior art or the above-mentioned patent application proposal is obstructed when the reticle (20) is manually placed on the support block (16) or the protruding block of the base (12) during the use process, Alternatively, when the position is displaced, if a large error occurs in the position where the reticle (16) is placed, one side of the reticle (16) falls from the top of one support block (16) or the protruding block, and the reticle Since the bottom surface of (20) directly hits the surface of the base (12) and the bottom surface of the reticle (20) was damaged, further improvement was necessary.
JP 2002-299430 A

本発明の第1の目的は、支持物品が直接滑り落ちるのを防止し、物品が守られる移載容器及び移載容器の支持構造に応用する構造を提供することにある。
本発明の第2の目的は、摩擦面積及びダストの発生を減少し、物品が傷つくのを避けられる移載容器及び移載容器の支持構造に応用する構造を提供することにある。
A first object of the present invention is to provide a structure that prevents a supporting article from sliding down directly and is applied to a transfer container that protects the article and a support structure for the transfer container.
A second object of the present invention is to provide a transfer container that reduces the friction area and the generation of dust and prevents articles from being damaged, and a structure applied to a transfer container support structure.

上述の目的を解決するために、本発明は移載容器及び移載容器の支持構造を提供することにあり、該移載容器は半導体レチクル或いはウェハーなどの物品を載せるために使用し、基台及び蓋で構成される。基台の頂上両側の両端にそれぞれ物品を支持する支持部品を設け、両端の両側の支持部品は同一直線上に配列する。各支持部品の頂上縁に第一突出片及び第二突出片を具有し、第一突出片及び第二突出片は互いに間に距離を形成する。且つ、第一突出片は第二突出片より高く、同側の支持部品により、低い第二突出片を相対する内側に位置させる。該蓋は前述の基台を覆う或いは分離することができる。   In order to solve the above-described object, the present invention provides a transfer container and a support structure for the transfer container, and the transfer container is used for mounting an article such as a semiconductor reticle or a wafer, And a lid. Support parts for supporting articles are provided at both ends on both sides of the top of the base, and the support parts on both sides of both ends are arranged on the same straight line. A first projecting piece and a second projecting piece are provided at the top edge of each support component, and the first projecting piece and the second projecting piece form a distance between each other. And a 1st protrusion piece is higher than a 2nd protrusion piece, and the lower 2nd protrusion piece is located in the inner side which opposes by the support component of the same side. The lid can cover or separate the aforementioned base.

第一及び第二突出片を設けることにより、物品を支持する際、物品の位置が比較的高い第一突出片より変位する場合、第二突出片も支持できることで、二次のプロテクトを形成し、物品が直接滑り落ちるのを避けることができ、更に物品と支持部品の摩擦面積を減少することができるため、ダストの発生及び損傷する現象を減らすことで、全体的の製造良品率を上げ、製品の付加価値を増すことで、競争力及び経済利益をアップさせることができる。   By providing the first and second projecting pieces, when the article is supported, when the position of the article is displaced from the relatively high first projecting piece, the second projecting piece can also be supported, thereby forming a secondary protection. The product can be prevented from sliding down directly, and the friction area between the product and the supporting parts can be reduced, reducing the generation of dust and the phenomenon of damage, thereby increasing the overall production quality rate. By increasing the added value, competitiveness and economic benefits can be improved.

本発明は、半導体の製造工程におけるレチクル或いはウェハーなどの物品の移載容器の支持構造を明確に示すために図に沿って詳細な説明を行う。図2に示すように、レチクル(70)を収容する移載容器(5)は、基台(50)及び蓋(60)からなる。レチクル(70)が基台(50)の上に置かれ、且つ蓋(60)は該基台(50)を覆って結合することより、移載容器(5)を構成する。   The present invention will be described in detail with reference to the drawings in order to clearly show a support structure of a transfer container for an article such as a reticle or a wafer in a semiconductor manufacturing process. As shown in FIG. 2, the transfer container (5) that houses the reticle (70) includes a base (50) and a lid (60). The reticle (70) is placed on the base (50), and the lid (60) covers and joins the base (50) to constitute the transfer container (5).

図2及び図3に示すのは、基台(50)の周囲に複数個の蓋(60)を結合するための溝(51)を形成し、また基台(50)上に二つの相対応し、且つ平行に配列する抵触台(52)を設け、該二つの抵触台(52)の外側縁にそれぞれ複数枚の突出片(53)を設ける。各突出片(53)は、内側に逆L字型の片(54)を設けてレチクル(70)を挟む。また、二つの抵触台(52)の間の基台(50)端縁に抵触部品(58)を設け、該抵触部品(58)の外側縁に上向きに突出する複数枚のレチクル(70)を宛がう突出片(59)を設ける。よって、レチクル(70)は抵触台(52)と抵触部品(58)により、基台(50)に固定される。更に、二つの抵触台(52)は相対する内側縁の両端にそれぞれ支持部品(55)を設けることで、確実に該レチクル(70)を支持する。   2 and 3 show that a groove (51) for connecting a plurality of lids (60) is formed around the base (50), and two phases correspond to each other on the base (50). In addition, the counter blocks (52) arranged in parallel are provided, and a plurality of protruding pieces (53) are respectively provided on the outer edges of the two counter blocks (52). Each protruding piece (53) is provided with an inverted L-shaped piece (54) on the inner side and sandwiches the reticle (70). Further, a contact part (58) is provided at the edge of the base (50) between the two contact parts (52), and a plurality of reticles (70) protruding upward are formed on the outer edge of the contact part (58). A projecting piece (59) is provided. Therefore, the reticle (70) is fixed to the base (50) by the conflicting base (52) and the conflicting part (58). Further, the two counters (52) are provided with support parts (55) at both ends of the opposite inner edges, so that the reticle (70) is reliably supported.

図4及び図5に示すのは、該支持部品(55)の詳細であって、ポリエーテルエーテルケトン(PEEK)或いはベスペル(VESPEL)などの摩擦に強く、高い硬度の材質で作られる。支持部品(55)は、頂上縁に第一突出片(551)と第二突出片(553)を具有し、第一突出片(551)及び第二突出片(553)は互いに間隔を形成する。また、第一突出片(551)は第二突出片(553)より高く、また同一の抵触台(52)両端にある支持部品(55)は、高さの低い第二突出片(553)を相対的に内側に配置し、第一突出片(551)及び第二突出片(553)の段差のある構成によって、該レチクル(70)の片側が抵触台(52)より脱落しても、そこにとどまって該レチクル(70)が直接該基台(50)の抵触台(52)の表面に落ちるのを防止することができる(図9参照)。更に、第一、第二突出片(551)(553)の頂上端をアーチ型(552)(554)に形成することによって、該レチクル(70)を支持する接触面積を減少する。また、支持部品(55)の後側に固定ブロック(56)を形成し、該固定ブロック(56)の支持部品(55)の背面に接する位置にネック(560)を形成し、支持部品(55)を抵触台(52)と一体に射出成型する際にしっかりと抵触台(52)に固定するようにして支持部品(55)が任意に緩んで外れるのを防止し、使用寿命を延長することができる。   FIG. 4 and FIG. 5 show the details of the support component (55), which is made of a material having high hardness and resistance to friction such as polyether ether ketone (PEEK) or vespel (VESPEL). The support component (55) includes a first projecting piece (551) and a second projecting piece (553) at the top edge, and the first projecting piece (551) and the second projecting piece (553) form a space between each other. . Further, the first protruding piece (551) is higher than the second protruding piece (553), and the support parts (55) at both ends of the same baffle (52) are provided with the second protruding piece (553) having a low height. Even if one side of the reticle (70) falls off from the contact table (52) due to the configuration in which the first projecting piece (551) and the second projecting piece (553) are stepped, they are disposed relatively inside, Therefore, it is possible to prevent the reticle (70) from falling directly on the surface of the collision table (52) of the base (50) (see FIG. 9). Further, by forming the top ends of the first and second projecting pieces (551) and (553) in an arched shape (552) and (554), the contact area for supporting the reticle (70) is reduced. Further, a fixing block (56) is formed on the rear side of the support component (55), a neck (560) is formed at a position in contact with the back surface of the support component (55) of the fixing block (56), and the support component (55 ) Is firmly fixed to the contact block (52) when it is injection-molded integrally with the contact table (52) to prevent the support part (55) from loosening and coming off, and extending the service life. Can do.

また、蓋(60)は、プラスティックの外ケース(61)及び金属の内型(65)によって構成する。取っ手(62)を具有する外ケース(61)内部の底縁に、前述基台(50)の溝(51)と対応する嵌合部品(63)を具有し、蓋(60)は嵌合部品(63)によって基台(50)と嵌合或いは分離する。内型(65)の内側に複数のレチクル(70)をプレス及び支えるホールド部品(66)を設ける。また、基台(50)の抵触部品(58)の反対側に相当する内型の位置に設けたホールド部品(66)にプッシュ片(68)を具有し、該プッシュプ片と抵触部品との間で、レチクル(70)を正しく基台(50)の抵触台(52)と抵触部品(58)の上に位置させ、ホールド部品(66)により、蓋(60)が基台(50)にかぶせる際にレチクル(70)の位置を修正し、レチクル(70)が滑って位置がずれるのを防止する。   The lid (60) is constituted by a plastic outer case (61) and a metal inner mold (65). On the bottom edge inside the outer case (61) having the handle (62), there is a fitting part (63) corresponding to the groove (51) of the base (50), and the lid (60) is a fitting part. (63) is fitted or separated from the base (50). A holding part (66) for pressing and supporting a plurality of reticles (70) is provided inside the inner mold (65). Further, the holding part (66) provided at the position of the inner mold corresponding to the opposite side of the contact part (58) of the base (50) is provided with a push piece (68), and between the push-pop part and the contact part. Then, position the reticle (70) correctly on the contact block (52) and the contact part (58) of the base (50), and the cover (60) is placed on the base (50) by the hold part (66). At this time, the position of the reticle (70) is corrected to prevent the reticle (70) from slipping and shifting its position.

以上の構成によって、支持接触面積が小さく、且つ二重のプロテクト作用を具有する移載容器の支持構造が完成する。   With the above configuration, a support structure for a transfer container having a small support contact area and a double protection function is completed.

前述の構造により、本発明を具体的に実施する際、図6、7及び図9に示すように、本発明の移載容器(5)に該レチクル(70)を置く際、人手により或いは機械のアームで入れる、或いは其の他の適切な方法で、該レチクル(70)を該基台(50)の抵触台(52)の支持部品(55)の上に置き、各支持部品(55)の比較的高い第一突出片(551)上に該レチクル(70)の下面を宛がうと共に、該レチクル(70)を、蓋(60)のホールド部品(66)のプッシュ片(67)と、基台(50)にある抵触部品(58)の突出片(59)の間に位置させて、該レチクル(70)が水平に支持し、変位するのを防止する。本発明の移載容器(5)の中に該レチクル(70)を置くと同時に、該レチクル(70)が適切な位置に置かれる調整機能を提供する。   With the above-described structure, when the present invention is specifically carried out, as shown in FIGS. 6, 7 and 9, when placing the reticle (70) on the transfer container (5) of the present invention, either manually or by machine The reticle (70) is placed on the support part (55) of the base (50) of the base (50) by using the arm of the support part (55). The lower surface of the reticle (70) is placed on the relatively high first protruding piece (551), and the reticle (70) is connected to the push piece (67) of the holding part (66) of the lid (60). The reticle (70) is horizontally supported and prevented from being displaced by being positioned between the protruding pieces (59) of the conflicting parts (58) on the base (50). At the same time that the reticle (70) is placed in the transfer container (5) of the present invention, an adjustment function is provided in which the reticle (70) is placed in an appropriate position.

図1の従来技術のレチクルボックスと比較すると、本発明の基台(50)にある抵触台(52)の支持部品(55)が該レチクル(70)を支える際、比較的高い第一突出片(551)のみと接触し、また第一突出片(551)の頂上縁がアーチ状(552)になっているため、該レチクル(70)とは点で接触し、接触面積が大幅に減少できる。よって摩擦によるダストが減少し、同時にレチクル(70)が傷つくのを防止して製造の良品率を上げることができる。更にレチクル(70)が異なる要素により片側に変位して落ちる場合も、該支持部品(55)の比較的低い第二突出片(553)が補助して該レチクル(70)を支えることによって、二次のプロテクトを形成し、該レチクル(70)の底面が直接該基台(50)或いは抵触台(52)の表面にぶつかるのを防止することにより、確実に該レチクル(70)の底面がぶつかって損傷するのを防止する機能を具える。   Compared with the prior art reticle box of FIG. 1, when the support part (55) of the counter stand (52) in the base (50) of the present invention supports the reticle (70), the relatively high first protruding piece (551) only, and since the top edge of the first protruding piece (551) is arched (552), it contacts the reticle (70) at a point, and the contact area can be greatly reduced. . Therefore, dust due to friction is reduced, and at the same time, the reticle (70) can be prevented from being damaged, and the yield rate of manufacturing can be increased. Further, even when the reticle (70) is displaced to one side by a different element and falls, the relatively low second protruding piece (553) of the support component (55) supports the reticle (70) by supporting the reticle (70). By forming the next protection and preventing the bottom surface of the reticle (70) from directly hitting the surface of the base (50) or the contact table (52), the bottom surface of the reticle (70) is surely hit. It has a function to prevent damage.

更に、本発明の支持部品(55)に固定ブロック(56)を具有し、また、支持部品(55)は抵触台(52)を射出成型するときに、支持部品(55)の固定ブロック(56)と一体化しているため、大幅に支持部品(55)と抵触台(52) の結合力をアップし、支持部品(55)が製造過程の温度差により緩むことなく、使用寿命が延長される。
Furthermore, the support part (55) of the present invention has a fixing block (56), and when the support part (55) is injection-molded to the block (52), the fixing block (56) of the support part (55) is provided. ), The coupling force between the support part (55) and the contact block (52) is greatly increased, and the service life is extended without the support part (55) becoming loose due to temperature differences in the manufacturing process. .

従来技術のレチクルボックスの組み立て断面略図である。2 is a schematic cross-sectional view of an assembly of a prior art reticle box. 本発明の立体分解略図である。1 is a schematic diagram of a three-dimensional decomposition of the present invention. 本発明の基台立体分解略図である。It is a base three-dimensional exploded schematic diagram of the present invention. 本発明の基台局部拡大略図である。It is a base local part expansion schematic of this invention. 本発明の支持部品局部拡大略図である。It is a support component local expansion schematic of this invention. 本発明の蓋と基台が結合する前の平面断面図である。It is plane sectional drawing before the lid | cover and base of this invention couple | bond together. 本発明の支持部品がレチクルを支える状態を前から見た平面略図である。It is the plane schematic diagram which looked at the state where the support component of the present invention supports the reticle from the front. 本発明の支持部品がレチクルを支える状態をサイドから見た平面略図である。It is the plane top view which looked at the state in which the support component of this invention supports a reticle from the side. 本発明のレチクルが変位して滑り落ちた後の断面図であり、レチクルが直接抵触部品にぶつかるのを防止する説明である。It is sectional drawing after the reticle of this invention displaces and slides down, It is the description which prevents that a reticle directly collides with a conflicting component.

符号の説明Explanation of symbols

10レチクルボックス
11枠
12基台
13蓋
14ガイドアーム
15プッシュアーム
16支持ブロック
160支持面
20レチクル
5移載容器
50基台
51溝
52抵触台
53突出片
54逆L字型片
55支持部品
551第一突出片
552アーチ
553第二突出片
554アーチ
56固定ブロック
560ネック
58 抵触部品
59突出片
60蓋
61外ケース
62取っ手
63嵌合部品
65 内型
66 ホールド部品
67プッシュ片
70 レチクル
10 reticle box
11 frames
12 bases
13 lids
14 guide arm
15 push arm
16 support blocks
160 support surface
20 reticle
5 Transfer container
50 units
51 grooves
52 contact table
53 protruding piece
54 reverse L-shaped piece
55 Supporting parts
551 1st protruding piece
552 arch
553 Second protruding piece
554 Arch
56 fixed blocks
560 neck
58 Conflicting parts
59 protruding piece
60 lids
61 outer case
62 handle
63 mating parts
65 Inner type
66 Hold parts
67 push pieces
70 reticle

Claims (6)

基台及び蓋から構成し、
該基台は、上面両側の両端にそれぞれ物品の支持部品を設け、各支持部品はそれぞれの側で支持位置に応じた間隔で配置し、各支持部品上に相互に間隔を置いて第一突出片及び第二突出片を設けて第一突出片は第二突出片の高さより高くすると共に高さの低い第二突出片は同じ側の支持部品の相対する内側に配置し、
蓋は、基台を覆い、かつ分離可能としたことを特徴とする半導体レチクル或いはウェハーなどの物品の移載容器。
Consists of a base and lid,
The base is provided with support parts for the articles at both ends on both sides of the upper surface, and each support part is arranged at an interval according to the support position on each side, and the first protrusions are spaced apart from each other on the support parts. The first projecting piece is higher than the height of the second projecting piece and the second projecting piece having a lower height is disposed on the opposite side of the support component on the same side;
A lid is a container for transferring an article such as a semiconductor reticle or a wafer, wherein the lid covers the base and is separable.
前記蓋は、取っ手を具有するプラスティックの外殻と、金属の内型によって構成することを特徴とする請求項1記載の移載容器。   2. The transfer container according to claim 1, wherein the lid is constituted by a plastic outer shell having a handle and a metal inner mold. 該基台上に二つの相互に相対して平行に配列する抵触台を設け、上記支持部品はそれぞれ該二つの抵触台の両端に設けられ、また、抵触台の外側縁にそれぞれ物品両側縁にあてがう逆L字型片を具有し、該基台上の二つの抵触台間の側端に、物品をあてがうための抵触部品を配置し、
蓋は、その内側に部品をプレス及び支えるホールド部品を設け、前述の抵触部品と反対側に位置してプッシュ片を設け、
プッシュ片により部品が基台の抵触台及び抵触部品に正しく位置決めされるするようガイドすることを特徴とする請求項1記載の移載容器。
Two contact blocks arranged in parallel with each other are provided on the base, and the support parts are provided at both ends of the two contact tables, respectively, and at the outer edges of the contact tables, respectively, at both side edges of the article. It has an inverted L-shaped piece to be applied, and a conflicting part for applying an article is arranged on the side edge between the two conflicting tables on the base,
The lid is provided with a holding part that presses and supports the part inside, and a push piece is provided on the opposite side of the above-mentioned conflicting part,
2. The transfer container according to claim 1, wherein the push piece guides the component so that the component is correctly positioned on the base block and the block.
前記支持部品の第一、第二突出片の頂上端をアーチ状に形成して該部品を支持する接触面積が小さくしたことを特徴とする請求項1記載の移載容器。   2. The transfer container according to claim 1, wherein the top and top ends of the first and second projecting pieces of the support part are formed in an arch shape to reduce a contact area for supporting the part. 前記支持部品の後側に固定ブロックを形成し、該固定ブロックの両側にそれぞれネックを形成して支持部品が接触台と共に一体射出成型時に、しっかりと抵触台と固定されるようにしたことを特徴とする請求項1記載の移載容器。   A fixing block is formed on the rear side of the supporting part, and necks are formed on both sides of the fixing block so that the supporting part is firmly fixed to the conflicting base at the time of integral injection molding together with the contact base. 2. The transfer container according to claim 1. 前記支持部品は、ポリエーテルエーテルケトン(PEEK)、又はベスペル(VESPEL)などの摩耗に強く、高い硬度を持つ材質で作られたことを特徴とする請求項1或いは請求項4或いは請求項5記載の移載容器。   6. The support component according to claim 1, wherein the support component is made of a material having a high hardness and being resistant to wear, such as polyether ether ketone (PEEK) or VESPEL. Transfer container.
JP2008073009A 2008-03-21 2008-03-21 Transfer container for semiconductor member Pending JP2009229638A (en)

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Publications (1)

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117945150A (en) * 2024-03-11 2024-04-30 苏州玖钧智能装备有限公司 Deviation rectifying and righting mechanism for photovoltaic silicon wafer conveyor

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JP2001048283A (en) * 1999-08-06 2001-02-20 Mitsui Chemicals Inc Disc carrier and its manufacture
JP2004119566A (en) * 2002-09-25 2004-04-15 Toppan Printing Co Ltd Mask case
JP2004140049A (en) * 2002-10-16 2004-05-13 Sumitomo Mitsubishi Silicon Corp Wafer tray
JP2005064275A (en) * 2003-08-13 2005-03-10 Shin Etsu Polymer Co Ltd Container package and manufacturing method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05175321A (en) * 1991-07-12 1993-07-13 Canon Inc Board container and lid opener
JPH10142773A (en) * 1996-11-12 1998-05-29 Yuukou Jushi Kk Housing case for substrate of photomask and the like
JP2001048283A (en) * 1999-08-06 2001-02-20 Mitsui Chemicals Inc Disc carrier and its manufacture
JP2004119566A (en) * 2002-09-25 2004-04-15 Toppan Printing Co Ltd Mask case
JP2004140049A (en) * 2002-10-16 2004-05-13 Sumitomo Mitsubishi Silicon Corp Wafer tray
JP2005064275A (en) * 2003-08-13 2005-03-10 Shin Etsu Polymer Co Ltd Container package and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117945150A (en) * 2024-03-11 2024-04-30 苏州玖钧智能装备有限公司 Deviation rectifying and righting mechanism for photovoltaic silicon wafer conveyor

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