JP2009214323A - Apparatus and method for manufacture of article having micro-pattern - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for manufacturing an article having a micro-pattern which control breakage of the parent mold, achieve high transfer precision of the micro-pattern, allow a reduction of the pressure in transferring and reduce the consumption of the hardenable resin. <P>SOLUTION: The method of manufacturing an article having a micro-pattern comprises transferring a micro-pattern formed on the surface of the parent mold 100 temporarily to a transfer substrate 104 to form a replica mold having a reversed pattern and transferring the reversed pattern formed on the surface of the replica mold to the surface of the body 102 of the article. The first hardenable resin is supplied from the first supply means 17 to the surface of the parent mold 100 on which the micro-pattern is formed, and the first hardenable resin is used in transferring the micro-pattern on the parent mold 100 to the transfer substrate 104. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an apparatus for manufacturing an article having a fine pattern by an optical nanoimprint method and a method for manufacturing the article.

In recent years, a so-called nanoimprint method, in which a parent mold having a fine pattern on the surface and a base material are brought into contact with each other and a reverse pattern of the fine pattern transferred to the surface of the base material, has attracted attention (for example, see Patent Document 1). .
Among them, a process of sandwiching and pressing a photocurable resin between the surface of the parent mold where the fine pattern is formed and the surface of the base material, curing the photocurable resin by irradiating light from the parent mold side Attention has been focused on a method (photo nanoimprint method) of sequentially performing a step of forming a product and a step of peeling the parent mold from the cured product.
A quartz mold is usually used as the parent mold. However, since the quartz mold is hard, when the material of the base material is hard (for example, a semiconductor substrate, a hard disk substrate, etc.), the quartz mold and / or the base material may be damaged.

As a method for solving this problem, the following method has been proposed.
(1) The fine pattern of the template is transferred to a plastic polymer foil having the surface of a UV curable prepolymer to produce an intermediate disk, and the reverse pattern of the intermediate disk is transferred to a substrate coated with the UV curable prepolymer. Method (Patent Document 2).
According to this method, since the fine pattern of the template is transferred to the target substrate via the flexible plastic polymer foil, damage to the template and the substrate can be suppressed.

However, the method (1) has the following problems.
(I) From the viewpoint of the handleability of the plastic polymer foil, a UV-curing prepolymer on the surface of the plastic polymer foil is used which has a considerably high viscosity. Therefore, transfer when transferring the fine pattern of the template to the plastic polymer foil The accuracy is low.
(Ii) Further, since the viscosity of the UV-cured prepolymer on the surface of the plastic polymer foil is considerably high, the pressure during transfer must be considerably high, which places a burden on the apparatus and the template. In some cases, the template is damaged.
(Iii) The surface of the UV curable prepolymer must be formed on the entire surface of the plastic polymer foil, resulting in an increase in wasted UV curable prepolymer that is not used for transfer.
Special Table 2002-539604 JP 2007-165812 A

  The present invention provides a manufacturing apparatus and a manufacturing method for an article having a fine pattern, in which damage to the parent mold is suppressed, the transfer accuracy of the fine pattern is high, the pressure during transfer can be reduced, and the amount of curable resin used can be suppressed. Provide a method.

An apparatus for producing an article having a fine pattern according to the present invention is an apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article main body.
First supply means (A) for supplying a first curable resin to the surface on which the fine pattern of the parent mold is formed;
First contact means (B) for bringing the first curable resin on the surface of the parent mold into contact with the transfer substrate;
A first curing means (C) that cures the first curable resin existing between the parent mold and the transfer substrate to form a first cured product having a reverse pattern;
First separation means (D) for separating the first cured product and the parent mold attached to the surface of the transfer substrate;
Moving means for relatively moving the transfer substrate and the article body so that the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is opposed to the surface of the article body (E) and
Second supply means (F) for supplying a second curable resin to the surface of the article body;
A second contact means (G) for bringing the second curable resin on the surface of the article body into contact with the first cured product attached to the surface of the transfer substrate;
A second curing means (second curing means) that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern. H) and
And a second separating means (I) for separating the second cured product attached to the surface of the article main body and the first cured product attached to the surface of the transfer substrate.

An apparatus for producing an article having a fine pattern according to the present invention is an apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article main body.
A first supply means (A ′) for supplying a first curable resin to the surface of the transfer substrate;
First contact means (B ′) for bringing the first curable resin on the surface of the transfer substrate into contact with the surface on which the fine pattern of the parent mold is formed;
A first curing means (C) that cures the first curable resin existing between the parent mold and the transfer substrate to form a first cured product having a reverse pattern;
First separation means (D) for separating the first cured product and the parent mold attached to the surface of the transfer substrate;
Moving means for relatively moving the transfer substrate and the article body so that the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is opposed to the surface of the article body (E) and
A second supply means (F ′) for supplying a second curable resin to the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is formed;
A second contact means (G ′) for bringing the second curable resin on the surface of the first cured product into contact with the article body;
A second curing means (second curing means) that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern. H) and a second separating means (I) for separating the second cured product attached to the surface of the article body and the first cured product attached to the surface of the transfer substrate. .

The method for producing an article having a fine pattern according to the present invention is a method for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article body,
A first supply step (a) for supplying a first curable resin to the surface on which the fine pattern of the parent mold is formed;
A first contact step (b) for bringing the first curable resin on the surface of the parent mold into contact with the transfer substrate;
A first curing step (c) in which a first curable resin existing between the parent mold and the transfer substrate is cured to form a first cured product having a reverse pattern;
A first separation step (d) for separating the first cured product and the parent mold attached to the surface of the transfer substrate;
A moving step of relatively moving the transfer substrate and the article body so that the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is opposed to the surface of the article body (E) and
A second supply step (f) for supplying a second curable resin to the surface of the article body;
A second contact step (g) for bringing the second curable resin on the surface of the article body into contact with the first cured product attached to the surface of the transfer substrate;
A second curing step (second curing step) in which the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate is cured to form a second cured product having a fine pattern ( h) and
And a second separation step (i) for separating the second cured product attached to the surface of the article main body and the first cured product attached to the surface of the transfer substrate.

The method for producing an article having a fine pattern according to the present invention is a method for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article body,
A first supply step (a ′) for supplying a first curable resin to the surface of the transfer substrate;
A first contact step (b ′) for bringing the first curable resin on the surface of the transfer substrate into contact with the surface on which the fine pattern of the parent mold is formed;
A first curing step (c) in which a first curable resin existing between the parent mold and the transfer substrate is cured to form a first cured product having a reverse pattern;
A first separation step (d) for separating the first cured product and the parent mold attached to the surface of the transfer substrate;
A moving step of relatively moving the transfer substrate and the article body so that the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is opposed to the surface of the article body (E) and
A second supply step (f ′) of supplying a second curable resin to the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is formed;
A second contact step (g ′) for bringing the second curable resin on the surface of the first cured product into contact with the article body;
A second curing step (second curing step) in which the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate is cured to form a second cured product having a fine pattern ( h) and
And a second separation step (i) for separating the second cured product attached to the surface of the article main body and the first cured product attached to the surface of the transfer substrate.

  The first curable resin includes a compound (P) having a fluorine atom and having at least one carbon-carbon unsaturated double bond, and having no fluorine atom and having a carbon-carbon unsaturated double bond. Compound (Q) having one or more bonds, fluorine-containing surfactant (R), and photopolymerization initiator (S), substantially free of solvent, compound (P), compound (Q) Of the total (100% by mass) of the fluorine-containing surfactant (R) and the photopolymerization initiator (S), the compound (P) is 0.1 to 45% by mass and the compound (Q) is 50 to 98%. It is preferable that it is a photocurable composition which is a mass%, a fluorine-containing surfactant (R) is 0.1-20 mass%, and a photoinitiator (S) is 1-10 mass%.

An apparatus for producing an article having a fine pattern according to the present invention is an apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article main body.
A lower disk for alternately holding n parent molds and n article bodies at positions of a circumference of 2n on a concentric circle on the upper surface of the disk (where n is an integer of 1 or more); ,
It is arranged coaxially with the lower disk so that the central axis that passes through the center of the disk and is orthogonal to the surface of the disk is coincident, and 2n pieces are arranged at a position equivalent to the circumference 2n on the concentric circle on the lower surface of the disk. An upper disk for holding the transfer substrate;
Elevating means (first contact means (B), first separating means) for moving the lower disk and / or the upper disk in the vertical direction so that the lower disk and the upper disk approach or separate from each other (D), corresponding to the second contact means (G) and the second separation means (I));
Rotating the lower and / or upper disk around the central axis so that the parent mold or article body on the upper surface of the lower disk faces the transfer substrate on the lower surface of the upper disk Means (corresponding to moving means (E));
First supply means (A) for supplying a first curable resin to the surface on which the fine pattern of the parent mold is formed;
Second supply means (F) for supplying a second curable resin to the surface of the article body;
A first curing means (C) that cures the first curable resin existing between the parent mold and the transfer substrate to form a first cured product having a reverse pattern;
A second curing means (second curing means) that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern. H) and

An apparatus for producing an article having a fine pattern according to the present invention is an apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article main body.
A lower disk that holds 2n transfer substrates at positions of a circumference of 2n on a concentric circle on the upper surface of the disk (where n is an integer of 1 or more);
It is arranged coaxially with the lower disk so that the central axis which passes through the center of the disk and is orthogonal to the surface of the disk is coincident, and n pieces are arranged at a position equivalent to the circumference 2n on the concentric circle on the lower surface of the disk. Upper discs alternately holding the parent mold and the n article bodies,
Lifting means ((first contact means (B ′), first) for moving the lower disk and / or the upper disk in the vertical direction so that the lower disk and the upper disk approach or separate from each other Corresponding to separation means (D), second contact means (G ′) and second separation means (I)));
Rotation that rotates the lower disk and / or upper disk around the central axis so that the transfer substrate on the upper surface of the lower disk faces the parent mold or the article body on the lower surface of the upper disk Means (corresponding to moving means (E));
A first supply means (A ′) for supplying a first curable resin to the surface of the transfer substrate;
A second supply means (F ′) for supplying a second curable resin to the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is formed;
A first curing means (C) that cures the first curable resin existing between the parent mold and the transfer substrate to form a first cured product having a reverse pattern;
A second curing means (second curing means) that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern. H) and

An apparatus for producing an article having a fine pattern according to the present invention is an apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article main body.
First moving means (corresponding to moving means (E)) for moving the belt-shaped transfer substrate in a certain direction;
First holding means for holding the parent mold;
A second moving means for moving the first holding means so as to cross the transfer substrate below the transfer substrate;
First supply means (A) for supplying a first curable resin to the surface on which the fine pattern of the parent mold is formed;
The first curable resin on the surface of the parent mold and the transfer at the first intersection where the transfer substrate moved by the first moving means and the first holding means moved by the second moving means intersect. First contact / separation means (first contact means (B) and first contact) for contacting the base material for transfer and separating the first cured product and the parent mold attached to the surface of the transfer base material. Corresponding to separation means (D));
A first curing means (C) that cures the first curable resin existing between the parent mold and the transfer substrate to form a first cured product having a reverse pattern;
A second holding means for holding the article body;
The second holding means corresponds to third moving means (moving means (E)) for moving the second holding means so as to cross the transfer base material below the transfer base material on the downstream side of the first intersection. )When,
Second supply means (F) for supplying a second curable resin to the surface of the article body;
Transfer with the second curable resin on the surface of the article main body at the second intersection where the transfer substrate moved by the first moving means and the second holding means moved by the third moving means intersect The first cured product attached to the surface of the transfer substrate is brought into contact with the first cured product, and the second cured product attached to the surface of the article body is separated from the first cured product attached to the surface of the transfer substrate. Second contact / separation means (corresponding to second contact means (G) and second separation means (I));
A second curing means (second curing means) that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern. H) and

According to the apparatus for manufacturing an article having a fine pattern of the present invention, the damage of the parent mold is suppressed, the transfer accuracy of the fine pattern is high, the pressure during transfer can be reduced, and the amount of curable resin used can be suppressed. .
According to the method for producing an article having a fine pattern of the present invention, the damage to the parent mold is suppressed, the transfer accuracy of the fine pattern is high, the pressure during transfer can be reduced, and the amount of curable resin used can be suppressed. .

[First Embodiment]
(Production apparatus for articles having fine patterns)
1-3 is a figure which shows 1st Embodiment of the manufacturing apparatus of the articles | goods which have a fine pattern of this invention. The manufacturing apparatus is an apparatus for manufacturing an article having a fine pattern by transferring a fine pattern formed on the surface of the parent mold 100 to the surface of the article main body 102; A lower disk 12 on which vacuum suction chucks 11 for alternately holding four parent molds 100 and four article main bodies 102 are formed at eight positions; passing through the center of the donut-shaped disk and a circle Eight transfer base materials 104 are arranged coaxially with the lower disk 12 so that the central axes orthogonal to the surface of the plate coincide with each other, and are arranged on a concentric circle on the lower surface of the disk at a position equivalent to eight circumferences. An upper disk 14 on which a vacuum suction chuck 13 to be held is formed; elevating means 15 for moving the upper disk 14 in the vertical direction so that the lower disk 12 and the upper disk 14 approach or separate; Up to the parent mold 100 on the upper surface of the lower disk 12 Rotating means 16 for rotating the lower disk 12 about the central axis so that the article body 102 and the transfer substrate 104 on the lower surface of the upper disk 14 face each other; First supply means 17 for supplying the first curable resin to the formed surface; second supply means 18 for supplying the second curable resin to the surface of the article main body 102; A doughnut-shaped curing means 19 (first curing means and second curing means) installed on the upper surface; and a suction pump connected to the vacuum suction chuck 11 via a suction pipe 21 provided with a control device 20 on the way A suction pump 25 connected to the vacuum suction chuck 13 via a suction pipe 24 provided with a control device 23 in the middle; a pump 26 and control devices 27 and 28 located before and after the pump 26 are provided in the middle Is A first curable resin tank 30 connected to the first supply means 17 through a supply pipe 29; and a supply pipe 34 provided with a pump 31 and control devices 32, 33 located before and after the pump 31 in the middle. A second curable resin tank 35 connected to the second supply means 18 via the power supply; a power supply 38 connected to the curing means 19 via a wiring 37 provided with a control device 36 in the middle; a suction pump 22; A device in which a first curable resin tank 30 and a second curable resin tank 35 are installed, and a rotating top plate 39 that rotates together with the lower disk 12 by a rotating means 16; a suction pump 25 and a power source 38 are installed A top plate 40; a device bottom plate 41 on which the rotation means 16 is installed; a device support 42 having one end joined to the device top plate 40 and the other end joined to the device bottom plate 41; a parent mold 100 and an article body 102 Is supplied to the lower disk 12, and a first conveying device 43 for taking out an article having a fine pattern from the lower disk 12; a transfer substrate 104 is supplied to the upper disk 14, and a first cured product And a second conveying device 44 for taking out the transfer base material 104 adhered to the surface from the upper disk 14.

  The upper disk 14 is made of a transparent material so that the ultraviolet light from the curing means 19 is transmitted. Examples of the transparent material include glasses (quartz glass, borosilicate glass, etc.), plastics (polymethyl methacrylate, polycarbonate, polyethylene terephthalate, etc.) and the like.

  The elevating means 15 moves the upper disk 14 in the vertical direction so that the lower disk 12 and the upper disk 14 approach each other, thereby transferring the first curable resin and the transfer material on the surface of the parent mold 100. A means (first contact means) for bringing the substrate 104 into contact with the second curable resin on the surface of the article body 102 and a first cured product adhering to the surface of the transfer substrate 104; Means (second contact means).

  Further, the elevating means 15 moves the upper disk 14 in the vertical direction so that the lower disk 12 and the upper disk 14 are separated from each other, so that the first adhering to the surface of the transfer substrate 104 is provided. A means for separating the cured product from the parent mold 100 (first separation means), and at the same time, a second cured product adhering to the surface of the article main body 102 and a first adhering to the surface of the transfer substrate 104. Means for separating the cured product (second separation means).

  The elevating means 15 includes a linear guide 45 formed on the surface of the apparatus support 42, a linear slider 46 that moves in the vertical direction along the linear guide, and a guide provided between the upper disk 14 and the linear slider 46. The support 47 is composed of an upper disk support 48 that is joined to the upper disk 14 and the linear slider 46 and moves in the vertical direction by the linear slider 46 along the guide support 47.

  The rotating means 16 rotates the lower disk 12 so that the surface of the first cured product on which the reverse pattern attached to the surface of the transfer substrate 104 is formed and the surface of the article main body 102 face each other. And means for moving the master mold 100 and the article main body 102 so that the surface of the transfer substrate 104 and the surface of the master mold 100 face each other.

  The rotating means 16 includes a rotating shaft 49 provided coaxially with the central axis of the lower disk 12, a lower disk support 50 that is joined to the lower disk 12 and rotates together with the rotating shaft 49, A drive motor 51 that rotates the shaft 49 and a control device (not shown) that controls the drive motor are configured.

  Each of the first supply means 17 and the second supply means 18 includes a dispenser 52 that discharges each curable resin, and a drive device 54 that is connected to the dispenser 52 by an arm 53 and moves the dispenser 52 in the horizontal direction. Is done.

  The curing means 19 is provided between the first curable resin existing between the parent mold 100 and the transfer substrate 104 and between the article main body 102 and the first cured product attached to the surface of the transfer substrate 104. The UV-LED light source unit forms a first cured product having a reverse pattern and a second cured product having a fine pattern by irradiating the second curable resin existing in the substrate with ultraviolet rays and curing them.

(Method for producing article having fine pattern)
Next, a method for manufacturing an article having a fine pattern using the manufacturing apparatus of the first embodiment will be described.
An article having a fine pattern includes a preparation step, a first supply step, a first contact step, a first curing step, a first separation step, a movement step, a first and a second supply step, which will be described later. The first and second contact steps, the first and second curing steps, the first and second separation steps, and the replacement step are sequentially manufactured. After the replacement step, the moving step, the first and second supply steps, the first and second contact steps, the first and second curing steps, the first and second separation steps, and the replacement step are repeated.

Preparation steps:
The first conveying device 43 supplies the parent mold 100 and the article main body 102 to the lower disk 12 and alternately holds them on the vacuum suction chuck 11, and the second conveying device 44 holds the transfer substrate 104 on the upper circle. It is supplied to the plate 14 and is held by the vacuum suction chuck 13.

  At this time, the alignment may be adjusted. As a method of adjusting the alignment, the parent mold 100, the article main body 102, and the transfer base material 104 are marked, and the vacuum suction chuck 11 of the lower disk 12 and the vacuum suction chuck 13 of the upper disk 14 are marked. A method of adjusting the position with a CCD camera or the like so that these marks coincide with each other; a hole is formed in the parent mold 100, the article main body 102, and the transfer base material 104, and the vacuum suction chuck 11 and the upper disk of the lower disk 12 A method in which a cylinder is provided in the vacuum suction chuck 13 of 14 and positioning is performed through the cylinder in the hole; a method of positioning by providing a guide in the vacuum suction chuck 11 of the lower disk 12 and the vacuum suction chuck 13 of the upper disk 14 Etc.

The parent mold 100 has a fine pattern on the surface.
A fine pattern means a fine recessed part and / or convex part.
As a convex part, the elongate protruding item | line extended on the surface of the parent mold 100, the processus | protrusion scattered on the surface, etc. are mentioned.
As a recessed part, the elongate groove | channel extended on the surface of the parent mold 100, the hole scattered on the surface, etc. are mentioned.

Examples of the shape of the ridge or groove include a straight line, a curved line, a bent shape, and the like. A plurality of ridges or grooves may exist in parallel and have a stripe shape.
Examples of the cross-sectional shape of the ridge or groove in the direction perpendicular to the longitudinal direction include a rectangle, a trapezoid, a triangle, and a semicircle.
Examples of the shape of the protrusion or the hole include a triangular prism, a quadrangular prism, a hexagonal prism, a cylinder, a triangular pyramid, a quadrangular pyramid, a hexagonal pyramid, a conical hemisphere, and a polyhedron.

The average width of the ridges or grooves is preferably 1 nm to 500 nm, and more preferably 5 nm to 300 nm. The width of the ridge means the length of the base in the cross section in the direction orthogonal to the longitudinal direction. The width of the groove means the length of the upper side in the cross section in the direction orthogonal to the longitudinal direction.
The average width of the protrusions or holes is preferably 1 nm to 500 nm, and more preferably 5 nm to 300 nm. The width of the protrusion means the length of the bottom side in a cross section perpendicular to the longitudinal direction when the bottom surface is elongated, and otherwise means the maximum length of the bottom surface of the protrusion. The width of the hole means the length of the upper side in the cross section perpendicular to the longitudinal direction when the opening is elongated, and otherwise means the maximum length of the opening of the hole.

As for the height of a convex part, 1 nm-500 micrometers are preferable on average, and 10 nm-10 micrometers are more preferable.
The average depth of the recesses is preferably 1 nm to 500 μm, and more preferably 10 nm to 10 μm.

  In the region where the fine patterns are densely packed, the interval between adjacent convex portions (or concave portions) is preferably 1 nm to 500 μm on average, and more preferably 5 nm to 300 μm. The interval between adjacent convex portions means the distance from the end of the base of the cross section of the convex portion to the start of the base of the cross section of the adjacent convex portion. The interval between adjacent recesses means the distance from the end of the upper side of the cross section of the recess to the start end of the upper side of the cross section of the adjacent recess.

As for the minimum dimension of a convex part, 1 nm-500 micrometers are preferable. The minimum dimension means the minimum dimension among the width, length, and height of the convex portion.
The minimum dimension of the recess is preferably 1 nm to 500 μm. The minimum dimension means the minimum dimension among the width, length and depth of the recess.

  Materials for the parent mold 100 include semiconductors (silicon, etc.), metals (tantalum, nickel, copper, stainless steel, aluminum, titanium, etc.), glasses (quartz glass, borosilicate glass, etc.), ceramics ( Silicon carbide, silicon nitride, sapphire, etc.), plastics (fluorine resin, silicone resin, polymethyl methacrylate, polyvinyl alcohol, polylactic acid, polyethylene terephthalate, etc.), and those using a part of the living body (lotus leaves, etc.). ) And the like.

A mold release agent may be applied to the surface on which the fine pattern of the parent mold 100 is formed.
Examples of the release agent include a fluorine-containing silane coupling agent and a silicone-containing silane coupling agent.

The parent mold 100 is manufactured by forming a fine pattern on the surface by electron beam drawing, X-ray drawing, photolithography, cutting, laser drawing, self-organization, or the like.
Alternatively, a replica mold replicated from the parent mold 100 by a nickel electroforming method; a cast method using a sol-gel material (SOG or the like) or a resin; a nanoimprint method or the like may be used as the parent mold 100.

Examples of the article body 102 include a semiconductor substrate, a hard disk substrate, an optical element substrate, an optical filter substrate, a MEMS substrate (such as a biosensor), an optical disk substrate, a solar cell substrate, an LED substrate, and a display substrate.
The article main body 102 is preferably one that has been surface-treated so that the second cured product adheres, or one that is made of a material to which the second cured product easily adheres.

The transfer substrate 104 is made of a transparent material so that the ultraviolet light from the curing means 19 is transmitted.
Examples of the transparent material include glasses (quartz glass, borosilicate glass, etc.), plastics (silicone resin, fluororesin, polyethylene terephthalate, urethane resin, acrylic resin, polycarbonate, polyimide, etc.), etc. Polyethylene terephthalate, acrylic resin, and polycarbonate are preferable from the viewpoint of adhesiveness to the cured product and suppressing damage to the parent mold 100.

  The light transmittance of the transfer substrate 104 is preferably 50% or more, and more preferably 70% or more. The light transmittance is a light transmittance of light having a wavelength of 360 to 500 nm of the transfer substrate 104 having a thickness of 50 μm.

The transfer substrate 104 may be plate-shaped or film-shaped.
The shape of the transfer substrate 104 may be a square, a donut, or a circle.
The transfer substrate 104 is preferably the same size as the parent mold 100 or larger than the parent mold 100, and more preferably 2 mm or more larger than the parent mold 100 in terms of easy release.

  The transfer substrate 104 may be surface-treated from the viewpoint of adhesiveness with the first cured product. Examples of the surface treatment method include a method of applying a silane coupling agent, a method of applying a functional silane compound, a method of plasma treatment, and a method of coating a primer.

  As the silane coupling agent, an amino group-containing silane coupling agent (3-aminopropyltriethoxysilane, 3-aminopropylmethyldiethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, etc.), silane coupling agents having an epoxy group (3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, etc.). ), A silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: FS-10) containing a large amount of an organic compound.

Examples of the functional silane compound include tetramethoxysilane and tetraethoxysilane.
Gas species used for the plasma treatment include O ₂ , N ₂ , CF ₄ , C ₂ F ₆ , Ar, Cl ₂ , HCl, HBr, CHF ₃ , C ₄ F ₈ , BCl ₃ , NH ₃ , CO, and the like. Can be mentioned. The gas species may be arbitrarily mixed and used.
Examples of the primer include acrylic resin (polymethyl methacrylate, etc.), BARC (Bottom Anti-reflection Coating) used in semiconductors, and the like.

First supply step:
The first curable resin is supplied from the first supply means 17 to the surface of the parent mold 100 on which the fine pattern is formed.

The first curable resin is preferably a fluorine-based photocurable composition from the viewpoint of releasability between the first cured product and the parent mold 100.
Examples of the photocurable composition include a compound (P) having a fluorine atom and having at least one carbon-carbon unsaturated double bond, and a carbon-carbon unsaturated double having no fluorine atom. A compound containing a compound (Q) having one or more bonds, a fluorine-containing surfactant (R), and a photopolymerization initiator (S) and substantially free of a solvent is preferable.

  Examples of the compound (P) include fluoro (meth) acrylates, fluorodienes, fluorovinyl ethers, fluoro cyclic monomers and the like, and from the viewpoint of compatibility, fluoro (meth) acrylates or fluorodienes are preferable.

Examples of the fluoro (meth) acrylates include the following compounds.
3- (perfluoro-3-methylbutyl) -2-hydroxypropyl (meth) acrylate,
2,2,2-trifluoro-1- (trifluoromethyl) ethyl (meth) acrylate,
_{CH 2 = CHCOO (CH 2)} 2 (CF 2) 10 F,
_{CH 2 = CHCOO (CH 2)} 2 (CF 2) 8 F,
_{CH 2 = CHCOO (CH 2)} 2 (CF 2) 6 F,
_{CH 2 = C (CH 3)} COO (CH 2) 2 (CF 2) 10 F,
_{CH 2 = C (CH 3)} COO (CH 2) 2 (CF 2) 8 F,
_{CH 2 = C (CH 3)} COO (CH 2) 2 (CF 2) 6 F,
_{CH 2 = CHCOOCH 2 (CF 2} ) 6 F,
_{CH 2 = C (CH 3)} COOCH 2 (CF 2) 6 F,
_{CH 2 = CHCOOCH 2 (CF 2} ) 7 F,
_{CH 2 = C (CH 3)} COOCH 2 (CF 2) 7 F,
CH ₂ = CHCOOCH ₂ CF ₂ CF ₂ H,
_{CH 2 = CHCOOCH 2 (CF 2} CF 2) 2 H,
_{CH 2 = CHCOOCH 2 (CF 2} CF 2) 4 H,
_{CH 2 = C (CH 3)} COOCH 2 (CF 2 CF 2) H,
_{CH 2 = C (CH 3)} COOCH 2 (CF 2 CF 2) 2 H,
_{CH 2 = C (CH 3)} COOCH 2 (CF 2 CF 2) 4 H,
_{CH 2 = CHCOOCH 2 CF 2 OCF} 2 CF 2 OCF 3,
_{CH 2 = CHCOOCH 2 CF 2 O} (CF 2 CF 2 O) 3 CF 3,
_{CH 2 = C (CH 3)} COOCH 2 CF 2 OCF 2 CF 2 OCF 3,
_{CH 2 = C (CH 3)} COOCH 2 CF 2 O (CF 2 CF 2 O) 3 CF 3,
_{CH 2 = CHCOOCH 2 CF (CF} 3) OCF 2 CF (CF 3) O (CF 2) 3 F,
_{CH 2 = CHCOOCH 2 CF (CF} 3) O (CF 2 CF (CF 3) O) 2 (CF 2) 3 F,
_{CH 2 = C (CH 3)} COOCH 2 CF (CF 3) OCF 2 CF (CF 3) O (CF 2) 3 F,
_{CH 2 = C (CH 3)} COOCH 2 CF (CF 3) O (CF 2 CF (CF 3) O) 2 (CF 2) 3 F,
_{CH 2 = CFCOOCH 2 CH (OH} ) CH 2 (CF 2) 6 CF (CF 3) 2,
_{CH 2 = CFCOOCH 2 CH (CH} 2 OH) CH 2 (CF 2) 6 CF (CF 3) 2,
_{CH 2 = CFCOOCH 2 CH (OH} ) CH 2 (CF 2) 10 F,
_{CH 2 = CFCOOCH 2 CH (CH} 2 OH) CH 2 (CF 2) 10 F,
_{CH 2 = CHCOOCH 2 CF 2 (} OCF 2 CF 2) n OCF 2 CH 2 OCOCH = CH 2 ( where, n is an integer of 4-20.) Or the like.

  As the fluoro (meth) acrylates, a compound (P1) represented by the following formula is preferable from the viewpoint of compatibility and environmental characteristics.

However, ^{R 1} represents a hydrogen atom or a methyl group, ^{R 2} and ^{R 3} each represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, ^{R 4} and ^{R 5} are each fluorine atom, carbon 1 Represents a perfluoroalkyl group of ˜4 or a perfluoroalkoxy group of 1 to 4 carbon atoms, R ⁶ represents a hydrogen atom or a fluorine atom, m represents an integer of 1 to 4, and n represents 1 to 16 Indicates an integer. n is preferably an integer of 1 to 10 from the viewpoint of compatibility, and more preferably an integer of 3 to 6 from the viewpoint of environmental characteristics.

Examples of the fluorodienes include the following compounds.
CF ₂ = CFOCF ₂ CF = CF ₂ ,
CF ₂ = CFOCF ₂ CF ₂ CF = CF ₂ ,
CF ₂ = CFCF ₂ CF = CF ₂ ,
CF ₂ = CFCF ₂ CH═CH ₂ ,
_{CF 2 = CFCF 2 C (CF} 3) (OH) CH 2 CH = CH 2,
_{CF 2 = CFCF 2 C (CF} 3) (OH) CH = CH 2,
_{CF 2 = CFCH 2 CH (CH} 2 C (CF 3) 2 OH) CH 2 CH = CH 2 and the like.

Examples of the fluorovinyl ethers include the following compounds.
CF ₂ = CFO (CF ₂ ) ₃ F,
CF ₂ = CFO (CF ₂ ) ₃ COOCH ₃ etc.

  The following compounds are mentioned as fluoro cyclic monomers.

A compound (P) may be used individually by 1 type, and may use 2 or more types together.
The ratio of compound (P) is 0.1-45 mass in the sum total (100 mass%) of compound (P), compound (Q), fluorine-containing surfactant (R), and photoinitiator (S). %, Preferably 3 to 30% by mass. If the ratio of a compound (P) is 0.1 mass% or more, the 1st hardened | cured material which is excellent in mold release property can be obtained, and also foaming of a photocurable composition is suppressed. Since the foaming of the photocurable composition can be suppressed, it becomes easy to filter at the time of preparation, and the defect of the reverse pattern of the first cured product due to the mixing of bubbles can be eliminated. If the ratio of a compound (P) is 45 mass% or less, since it can mix uniformly, the 1st hardened | cured material excellent in mechanical strength can be obtained.

  Compound (Q) has no fluorine atom and one carbon-carbon unsaturated double bond (Q1), and has no fluorine atom and two carbon-carbon unsaturated double bonds. A mixture with one or more compounds (Q2) is preferred.

  The compound (Q1) is a component that dissolves other components and is a component that improves the compatibility between the compound (P) and the compound (Q2). If the compatibility between the compound (P) and the compound (Q2) is good, the foaming during the preparation of the photocurable composition can be suppressed, and the preparation of the photocurable composition can be facilitated, for example, through the filter. A uniform photocurable composition is obtained. Furthermore, by obtaining a homogeneous cured product, it is possible to sufficiently exhibit mold releasability and mechanical strength.

  The viscosity of the compound (Q1) at 25 ° C. is preferably 0.1 to 200 mPa · s. If the viscosity of a compound (Q1) is this range, it will be easy to adjust the viscosity of a photocurable composition low.

As the compound (Q1), the following compounds may be mentioned.
Phenoxyethyl (meth) acrylate, 2-hydroxy-3-phenoxypyrrolyl (meth) acrylate, phenoxyethylene glycol (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, benzyl (meth) acrylate, methoxytriethylene glycol (meth) acrylate , Methoxypolyethylene glycol (meth) acrylate, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, behenyl (meth) acrylate, 2- (meth) acryloyloxyethyl succinic acid, stearyl (meth) acrylate, isostearyl ( (Meth) acrylate, lauryl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 3- (trimethoxysilyl) propyl (meth) acrylate, butyl ( Acrylate), ethoxyethyl (meth) acrylate, methoxyethyl (meth) acrylate, glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, allyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxy Propyl (meth) acrylate, N, N-diethylaminoethyl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, 2-methyl-2-adamantyl (meth) acrylate, 2 -Ethyl-2-adamantyl (meth) acrylate, 3-hydroxy-1-adamantyl (meth) acrylate, 1-adamantyl (meth) acrylate, isobornyl (meth) acrylate, β-carboxyethyl (Meth) acrylate, octyl (meth) acrylate, decyl (meth) acrylate, (2- (tertbutylamino) ethyl (meth) acrylate, 1,2,2,6,6-pentamethyl-4-piperidyl (meth) Acrylate, n-butyl (meth) acrylate, tert-butyl (meth) acrylate, 4-tert-butylcyclohexyl (meth) acrylate, hydroxyethylated o-phenylphenol (meth) acrylate, o-phenylphenol glycidyl ether (meth) Acrylate, etc.

As the compound (Q1), one type may be used alone, or two or more types may be used in combination.
The ratio of the compound (Q1) is 10 to 55% by mass in the total (100% by mass) of the compound (P), the compound (Q), the fluorine-containing surfactant (R) and the photopolymerization initiator (S). Yes, 15 to 45 mass% is preferable. If the ratio of a compound (Q1) is 10 mass% or more, the viscosity of a photocurable composition can be adjusted low and compatibility with a compound (P) and a compound (Q2) will become favorable. If the ratio of a compound (Q1) is 55 mass% or less, a sensitivity will become favorable and a crosslinking density will also rise, Therefore The 1st hardened | cured material excellent in mechanical strength can be obtained.

As the compound (Q2), the following compounds may be mentioned.
Bisphenol A di (meth) acrylate, modified bisphenol A di (meth) acrylate (ethoxylated bisphenol A di (meth) acrylate, propoxylated bisphenol A di (meth) acrylate, propoxylated ethoxylated bisphenol A di (meth) acrylate, bisphenol A glycerolate di (meth) acrylate, bisphenol A propoxylate glycerolate di (meth) acrylate, etc.), ethoxylated bisphenol F di (meth) acrylate, tricyclodecane dimethanol di (meth) acrylate, full orange (meth) Acrylate, ethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, 1,3-butanediol di (meth) acrylate, 1,4-butanedio Rudi (meth) acrylate, glycerol 1,3-diglycerolate di (meth) acrylate, 1,6-hexanediol ethoxylate di (meth) acrylate, 1,6-hexanediol propoxylate di (meth) acrylate, 1, 6-hexanediol di (meth) acrylate, 3-hydroxy-2,2-dimethylpropionate di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, 1,10-decanediol di (meth) Acrylate, diethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, neopentyl glycol propoxylate di (meth) acrylate, polyethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate Glycerol di (meth) acrylate, propylene glycol glycerolate di (meth) acrylate, polypropylene glycol di (meth) acrylate, polyoxyethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, triethylene glycol di (meta) ) Acrylate, tetraethylene glycol di (meth) acrylate, tripropylene glycol glycerolate di (meth) acrylate, 2-hydroxy-3-acryloyloxypropyl (meth) acrylate, 2-methyl-1,3-propanediol diacrylate , Trimethylolpropane benzoate di (meth) acrylate, pentaerythritol di (meth) acrylate monostearyl acid, trimethylolpropane ethoxylate Methyl ether di (meth) acrylate, diurethane di (meth) acrylate, 1,3-bis (3-methacryloyloxypropyl) -1,1,3,3-tetramethyldisiloxane, trimethylolpropane tri (meth) Acrylate, trimethylolpropane ethoxytri (meth) acrylate, polyether tri (meth) acrylate, glycerin propoxytri (meth) acrylate, pentaerythritol tri (meth) acrylate, ethoxylated isocyanuric acid triacrylate, ethoxylated trimethylolpropane triacrylate , Propoxylated trimethylolpropane triacrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol ethoxytetra (meth) acrylate, ditrimethylol group Pantetora (meth) acrylate, propoxylated pentaerythritol tetraacrylate, dipentaerythritol hexa (meth) acrylate, aromatic urethane tri (meth) acrylate, aromatic urethane tetra (meth) acrylate, aromatic urethane hexa (meth) acrylate.

As the compound (Q2), one type may be used alone, or two or more types may be used in combination.
The ratio of compound (Q2) is 15 to 60% by mass in the total (100% by mass) of compound (P), compound (Q), fluorine-containing surfactant (R) and photopolymerization initiator (S). Yes, 20-45 mass% is preferable. If the ratio of a compound (Q2) is 15 mass% or more, the 1st hardened | cured material which is excellent in mechanical strength can be obtained. If the ratio of a compound (Q2) is 60 mass% or less, a 1st hardened | cured material will not become brittle.

  The ratio of compound (Q) (total of compound (Q1) and compound (Q2)) is the sum of compound (P), compound (Q), fluorine-containing surfactant (R) and photopolymerization initiator (S) ( 100 mass%), 50 to 98 mass%, preferably 60 to 80 mass%.

The fluorine-containing surfactant (R) is a component that improves the releasability of the first cured product.
As the fluorine-containing surfactant (R), a fluorine-containing surfactant having a fluorine content of 10 to 70% by mass is preferable, and a fluorine-containing surfactant having a fluorine content of 10 to 40% by mass is more preferable. The fluorine-containing surfactant may be water-soluble or fat-soluble.

  As the fluorine-containing surfactant (R), an anionic fluorine-containing surfactant, a cationic fluorine-containing surfactant, an amphoteric fluorine-containing surfactant, or a nonionic fluorine-containing surfactant is preferable. A photocurable composition The nonionic fluorine-containing surfactant is more preferable from the viewpoint of the compatibility in the above and the dispersibility in the first cured product.

As the anionic fluorine-containing surfactant, a polyfluoroalkyl carboxylate, a polyfluoroalkyl phosphate, or a polyfluoroalkyl sulfonate is preferable.
Specific examples of the anionic fluorine-containing surfactant include Surflon S-111 (trade name, manufactured by Seimi Chemical Co., Ltd.), Florard FC-143 (trade name, manufactured by 3M), Megafark F-120 (trade name, Dainippon) Ink Chemical Industry Co., Ltd.).

As the cationic fluorine-containing surfactant, a trimethylammonium salt of polyfluoroalkylcarboxylic acid or a trimethylammonium salt of polyfluoroalkylsulfonic acid amide is preferable.
Specific examples of the cationic fluorine-containing surfactant include Surflon S-121 (trade name, manufactured by Seimi Chemical Co., Ltd.), Florard FC-134 (trade name, manufactured by 3M), Megafark F-150 (trade name, Dainippon) Ink Chemical Industry Co., Ltd.).

As the amphoteric fluorine-containing surfactant, polyfluoroalkyl betaine is preferable.
Specific examples of amphoteric fluorine-containing surfactants include Surflon S-132 (trade name, manufactured by Seimi Chemical Co., Ltd.), Fluorad FX-172 (trade name, manufactured by 3M), Megafark F-120 (trade name, Dainippon Ink, Ltd.) Chemical Industry Co., Ltd.).

As the nonionic fluorine-containing surfactant, polyfluoroalkylamine oxide or polyfluoroalkyl / alkylene oxide adduct is preferable.
Specific examples of the nonionic fluorine-containing surfactant include Surflon S-145 (trade name, manufactured by Seimi Chemical Co., Ltd.), Surflon S-393 (trade name, manufactured by Seimi Chemical Co., Ltd.), and Surflon KH-20 (trade name, Seimi). Chemical Co., Ltd.), Surflon KH-40 (trade name, manufactured by Seimi Chemical Co., Ltd.), Florard FC-170 (trade name, manufactured by 3M), Florado FC-430 (trade name, manufactured by 3M), Megafark F-141 ( Trade name, manufactured by Dainippon Ink & Chemicals, Inc.).

A fluorine-containing surfactant (R) may be used individually by 1 type, and may use 2 or more types together.
The ratio of the fluorine-containing surfactant (R) is 0.00% of the total (100% by mass) of the compound (P), the compound (Q), the fluorine-containing surfactant (R) and the photopolymerization initiator (S). 1-20 mass% is preferable and 0.3-1 mass% is more preferable. If the ratio of the fluorine-containing surfactant (R) is 0.1% by mass or more, the releasability is improved. When the ratio of the fluorine-containing surfactant (R) is 20% by mass or less, inhibition of curing of the photocurable composition can be suppressed, and phase separation of the first cured product can be suppressed.

  As photopolymerization initiator (S), acetophenone photopolymerization initiator, benzoin photopolymerization initiator, benzophenone photopolymerization initiator, thioxanthone photopolymerization initiator, α-aminoketone photopolymerization initiator, α-hydroxy Ketone-based photopolymerization initiator, α-acyloxime ester, benzyl- (o-ethoxycarbonyl) -α-monooxime, acylphosphine oxide, glyoxyester, 3-ketocoumarin, 2-ethylanthraquinone, camphorquinone, tetramethylthiuram Sulfide, azobisisobutyronitrile, benzoyl peroxide, dialkyl peroxide, tert-butyl peroxypivalate, and the like. From the viewpoint of sensitivity and compatibility, acetophenone photopolymerization initiator, benzoin photopolymerization initiator, α -Aminoketone photopolymerization An initiator or a benzophenone photopolymerization initiator is preferred.

Examples of the acetophenone photopolymerization initiator include the following compounds.
Acetophenone, p- (tert-butyl) 1 ′, 1 ′, 1′-trichloroacetophenone, chloroacetophenone, 2 ′, 2′-diethoxyacetophenone, hydroxyacetophenone, 2,2-dimethoxy-2′-phenylacetophenone, 2 -Aminoacetophenone, dialkylaminoacetophenone and the like.

Examples of the benzoin photopolymerization initiator include the following compounds.
Benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-2-methylpropan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, benzyldimethyl ketal and the like.

Examples of the α-aminoketone photopolymerization initiator include the following compounds.
2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, and the like.

Examples of the benzophenone-based photopolymerization initiator include the following compounds.
Benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, methyl-o-benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, hydroxypropylbenzophenone, acrylic benzophenone, 4,4′-bis (dimethylamino) benzophenone, and the like.

A photoinitiator (S) may be used individually by 1 type, and may use 2 or more types together.
The ratio of the photopolymerization initiator (S) is 1 to 10 in the total (100% by mass) of the compound (P), the compound (Q), the fluorine-containing surfactant (R) and the photopolymerization initiator (S). It is mass%, and 3-8 mass% is preferable. If the ratio of a photoinitiator (S) is 1 mass% or more, a 1st hardened | cured material can be obtained easily, without performing operation, such as a heating. If the ratio of the photopolymerization initiator (S) is 10% by mass or less, the photopolymerization initiator (S) remaining in the first cured product decreases because the mixture can be uniformly mixed. Degradation of physical properties can be suppressed.

The photocurable composition may further contain other components such as a resin, an oligomer, and an inorganic compound.
Examples of the resin include a fluorine-containing resin, a fluorine-containing oligomer, an ester oligomer, and polymethyl methacrylate.
Examples of inorganic compounds include titania fine particles and silica fine particles.
The ratio of another component is 30 mass% or less in a photocurable composition (100 mass%).

First contact step:
After the dispenser 52 of the first supply means 17 has been withdrawn from the top of the parent mold 100, the elevating means 15 is driven to lower the upper disk 14 to bring the lower disk 12 and the upper disk 14 closer. The first curable resin on the surface of the parent mold 100 is brought into contact with the transfer substrate 104.
At this time, the parent mold 100 and the transfer substrate 104 may be rotated together to spread the first curable resin over the entire surface of the parent mold 100.

  The pressure at the time of contact is preferably 0.1 KPa to 10 MPa. If the pressure is less than 0.1 KPa, the fine pattern of the parent mold 100 cannot be accurately transferred to the first cured product. When the pressure exceeds 10 MPa, the pressurization process becomes long, the throughput is slowed down, the load is excessively applied to the device, the balance of the device is lost, and the parent mold 100 is damaged.

First curing step:
The first curable resin existing between the parent mold 100 and the transfer substrate 104 is irradiated with ultraviolet rays from the curing means 19 to cure the first curable resin, and has a reversed pattern in which the fine pattern of the parent mold 100 is reversed. Let it be a 1st hardened | cured material.

The wavelength of ultraviolet light is preferably 365 nm or 254 nm.
Irradiation with ultraviolet rays may be performed in the air, in a vacuum, or in a gas atmosphere (such as carbon dioxide).

First separation step:
By driving the elevating means 15, the upper disk 14 is raised, the lower disk 12 and the upper disk 14 are separated from each other, and the first cured product and the parent mold 100 adhered to the surface of the transfer substrate 104 Isolate. In this way, a replica mold having a reverse pattern on the surface, which is made of the transfer substrate 104 and the first cured product, is obtained.

Move step:
The rotating means 16 is driven to rotate the lower disk 12, and the surface of the replica mold in which the reverse pattern is formed (the surface of the first cured product adhering to the surface of the transfer substrate 104) and the article body 102. The parent mold 100 and the article main body 102 are moved so that the surface faces each other and the surface of the transfer substrate 104 faces the surface on which the fine pattern of the parent mold 100 is formed.

First and second supply steps:
The first curable resin is supplied from the first supply means 17 to the surface of the parent mold 100 on which the fine pattern is formed (first supply step), and the second supply means is supplied to the surface of the article main body 102. A second curable resin is supplied from 18 (second supply step).

  What is necessary is just to determine a 2nd curable resin suitably according to the kind etc. of the articles | goods obtained. As the second curable resin, a photocurable resin having sensitivity at 330 to 600 nm is preferable, and a photocurable resin having sensitivity at 365 to 500 nm is more preferable.

First and second contact steps:
After the dispenser 52 of each supply means is retracted from above the parent mold 100 and the article main body 102, the elevating means 15 is driven to raise the upper disk 14 so that the lower disk 12 and the upper disk 14 approach each other. The first curable resin on the surface of the parent mold 100 and the transfer substrate 104 are brought into contact with each other (first contact step), and at the same time, the second curable resin on the surface of the article body 102 and the replica mold (First cured product attached to the surface of the transfer substrate 104) is brought into contact (second contact step).

  At this time, the parent mold 100 and the transfer substrate 104 may be rotated together to spread the first curable resin over the entire surface of the parent mold 100. Further, the article main body 102 and the replica mold may be rotated together to spread the second curable resin over the entire surface of the replica mold.

  The pressure at the time of contact is preferably 0.1 KPa to 10 MPa. If the pressure is less than 0.1 KPa, the fine pattern of the parent mold 100 cannot be accurately transferred to the first cured product. Further, the reverse pattern of the replica mold cannot be accurately transferred to the second cured product. When the pressure exceeds 10 MPa, the pressurizing process becomes long, the throughput is slowed down, the load is excessively applied to the device, the balance of the device is lost, and the parent mold 100 and the replica mold are damaged.

First and second curing steps:
A first curable resin existing between the parent mold 100 and the transfer substrate 104, and between the article main body 102 and the replica mold (first cured product attached to the surface of the transfer substrate 104). The second curable resin that is present is irradiated with ultraviolet rays from the curing means 19 to be cured, and the first cured product having an inverted pattern obtained by inverting the fine pattern of the parent mold 100 and the inverted pattern of the replica mold are inverted. The second cured product having the fine pattern thus obtained is used.

The wavelength of ultraviolet light is preferably 365 nm or 254 nm.
Irradiation with ultraviolet rays may be performed in the air, in a vacuum, or in a gas atmosphere (such as carbon dioxide).

First and second separation steps:
By driving the elevating means 15, the upper disk 14 is raised, the lower disk 12 and the upper disk 14 are separated from each other, and the first cured product and the parent mold 100 adhered to the surface of the transfer substrate 104 Are separated (first separation step), and at the same time, the second cured product adhering to the surface of the article body 102 and the replica mold (first cured product adhering to the surface of the transfer substrate 104) are separated. (Second separation step). Thus, the replica mold having the reverse pattern on the surface, which is composed of the transfer substrate 104 and the first cured product, and the article having the fine pattern on the surface, which is composed of the article main body 102 and the second cured product. Get at the same time.

Replacement steps:
After the article (the article main body 102 with the second cured product attached to the surface) is taken out from the lower disk 12 by the first conveying device 43, the article main body 102 is removed from the lower disk 12 by the first conveying device 43. And the second transfer device 44 removes the replica mold (the transfer substrate 104 with the first cured product attached to the surface) from the upper disk 14, The transfer substrate 104 is supplied to the upper disk 14 by the second conveying device 44 and is held by the vacuum suction chuck 13.

The parent mold 100 does not need to be taken out except when the position is misaligned or damaged.
The replica mold is usually made disposable once. When the replica mold is used several times, the second supply step, the second contact step, the second curing step, the second separation step, the article and the article main body are not taken out in the replacement step. What is necessary is just to repeat a replacement step.

  In the manufacturing apparatus and the manufacturing method of the first embodiment described above, when a fine pattern formed on the surface of the parent mold 100 is transferred to the surface of the transfer substrate 104 to form a reverse pattern, Since the first curable resin supplied to the surface on which the fine pattern of the parent mold 100 is formed is used, compared to the case of using a plastic polymer foil having a surface of a UV curable prepolymer as in the prior art, the following There are advantages.

(I) Since the first curable resin has a lower viscosity than the UV curable prepolymer on the surface of the plastic polymer foil, the transfer accuracy when the fine pattern of the parent mold 100 is transferred to the transfer substrate 104 is improved. high.
(Ii) Also, since the first curable resin has a lower viscosity than the UV curable prepolymer on the surface of the plastic polymer foil, the pressure at the time of transfer can be lowered and the apparatus and the parent mold 100 are burdened. Therefore, damage to the parent mold can be suppressed.
(Iii) Since the first curable resin is supplied to the surface on which the fine pattern of the parent mold 100 is formed, there is no useless first curable resin that is not used for transfer.

  Moreover, in the manufacturing apparatus and manufacturing method of 1st Embodiment demonstrated above, since the replica mold which has a reverse pattern, and the articles | goods which have a fine pattern can be manufactured simultaneously, productivity can be improved. Further, since the replica mold and the article can be manufactured with only one lifting means 15, the apparatus can be simplified. Further, since the article main body 102 is held immediately next to the parent mold 100, the movement distance of the replica mold is shortened, and the productivity is improved.

  In the manufacturing apparatus and manufacturing method of the first embodiment, the transfer base 104 is held on the lower disk 12, the parent mold 100 and the article body 102 are held on the upper disk 14, and the transfer base is held. The first curable resin is supplied to the surface of the material 104, and the second curable resin is supplied to the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate 104 is formed. May be. However, for the following reason, the parent mold 100 and the article main body 102 are held on the lower disk 12, the transfer base material 104 is held on the upper disk 14, and the surface of the parent mold 100 on which the fine pattern is formed is formed. It is preferable to supply the first curable resin and supply the second curable resin to the surface of the article main body 102.

(I) The handleability is better when the article having the fine pattern is finally formed on the surface of the lower disk 12.
(Ii) When the parent mold 100 and the article main body 102 are held on the upper disk 14, the materials of the parent mold 100 and the article main body 102 are limited to transparent materials.
(Iii) When an opaque material is used as the material of the parent mold 100 and the article body 102, it is necessary to provide the curing means 19 on the lower surface of the lower disk 12 and to form the lower disk 12 with a transparent material.

In the manufacturing apparatus and manufacturing method of the first embodiment, as means for holding the parent mold 100, the article main body 102, and the transfer base material 104 on the lower disk 12 and the upper disk 14, vacuum suction is used. The chuck is not limited to an electrostatic chuck, an adhesive tape, a mechanical holding means, or the like.
The means for supplying the curable resin is not limited to a dispenser, and may be an ink jet, a spin coater, a die coater, or the like.
The curing means 19 may be installed on the lower surface of the lower disk 12 when the parent mold 100 and the lower disk 12 are made of a transparent material.

2 to 4, the lower disk 12 may be moved up and down by the lifting means 15 and the upper disk 14 may be rotated by the rotating means 16.
In addition, in the manufacturing apparatus shown in FIGS. 2 to 4, the same components as those in the manufacturing apparatus shown in FIGS.

[Second Embodiment]
(Production apparatus for articles having fine patterns)
7 and 8 are views showing a second embodiment of an apparatus for manufacturing an article having a fine pattern according to the present invention. The manufacturing apparatus is an apparatus for manufacturing an article having a fine pattern by transferring a fine pattern formed on the surface of the parent mold 100 to the surface of the article main body 102; A group of rollers (first moving means) to be moved to each other; holding four parent molds 100 and two parent mold setting plates 61 (first holding means); provided on both sides of each parent mold setting plate 61 The linear drive device 63 (second moving means) that reciprocally moves each parent mold setting plate 61 along the linear guide 62 so as to intersect the transfer base material 104 below the transfer base material 104. A first dispenser 64 (first supply means) for supplying a first curable resin to the surface on which the fine pattern of the parent mold 100 is formed at both ends of the linear guide 62; The first raising / lowering means 66 (first contact) for raising and lowering the parent mold installation plate 61 at a first intersection 65 where the transfer substrate 104 and the parent mold installation plate 61 moved by the linear driving device 63 intersect. Separation means); first curing means 67 disposed above the transfer substrate 104 at the first intersection 65; and a plurality of article main body installation plates 68 (second second) holding the four article main bodies 102 Holding means); provided on both sides of each article main body installation plate 68, each article main body installation plate 68 is placed below the transfer base 104 on the downstream side of the first intersection 65, and the transfer base material 104. A linear driving device 70 (third moving means) that moves in a certain direction along the linear guide 69 so as to intersect with the substrate; a transfer substrate 104 that moves by a group of rollers; and an article body that moves by the linear driving device 70 Installation board 6 A second dispenser 71 (second supply means) for supplying a second curable resin to the surface of the article main body 102 on the upstream side of the second intersection 72 where the two intersect with each other; A second elevating means 73 (second contact / separation means) for elevating and lowering the article main body installation plate 68; and a second curing means disposed above the transfer substrate 104 at the second intersection 72. 74; and a compressed air supply pipe 75 provided so as to surround the first curing means 67 above the transfer substrate 104 at the first intersection 65; and connected to the end of the compressed air supply pipe 75 and compressed. An air compressor 76 for sending compressed air to the air supply pipe 75; a compressed air supply pipe 77 provided so as to surround the second curing means 74 above the transfer substrate 104 at the second intersection 72; Compressed air supply pipe connected to the end of the air supply pipe 77 An air compressor 76 for sending compressed air to 77; a gantry 78 for supporting the linear guide 62; a gantry 79 for supporting the linear guide 69; a pump 80 and control devices 81 and 82 located before and after the pump 80 in the middle. A first curable resin tank 84 connected to the first dispenser 64 via a provided supply pipe 83; a supply provided with a pump 85 and control devices 86, 87 located before and after the pump 85 in the middle A second curable resin tank 89 connected to the second dispenser 71 via a pipe 88; and a power source (not shown) connected to each curing means via a wiring 90.

  Note that in the second embodiment, the same components as those in the first embodiment are denoted by the same reference numerals and description thereof is omitted. The description of the same material as that in the first embodiment is also omitted.

  The roller group includes a transfer substrate unwinding roller 91, a transfer substrate unwinding roller 92, and a plurality of guide rollers 93 disposed between the transfer substrate unwinding roller 91 and the transfer substrate unwinding roller 92. Consists of

  The roller group and the linear driving device 63 are driven so that the surface of the transfer substrate 104 and the surface of the parent mold 100 face each other at the first intersection 65. 100, and after the fine pattern of the parent mold 100 is transferred to the transfer substrate 104, the transfer substrate 104 and the parent mold 100 are moved from the first intersection 65 to the second intersection 72 and the second intersection, respectively. It is a means for moving to one dispenser 64.

  By driving each of the roller group and the linear driving device 70, the surface of the first cured product on which the reverse pattern attached to the surface of the transfer substrate 104 at the second intersection 72 is formed and the article main body 102. This is a means for moving the transfer base material 104 and the article main body 102 so as to face the surface, and the reverse pattern of the first cured product attached to the surface of the transfer base material 104 is transferred to the article main body 102. Later, the transfer base 104 and the article body 102 (article) are moved from the second intersection to the transfer base take-up roller 92 and the article carry-out port (not shown), respectively.

The first elevating means 66 is a means (first contact means) for bringing the first curable resin on the surface of the parent mold 100 into contact with the transfer substrate 104 by raising the parent mold installation plate 61. There is a means (first separation means) for separating the first cured product and the parent mold 100 attached to the surface of the transfer substrate 104 by lowering the parent mold setting plate 61.
The first lifting / lowering means 66 includes a lifting / lowering rod 94 that contacts the lower surface of the parent mold installation plate 61 and a driving device 95 that moves the lifting / lowering rod 94 in the vertical direction.

The second lifting and lowering means 73 raises the article main body installation plate 68 to bring the second curable resin on the surface of the article main body 102 into contact with the first cured product attached to the surface of the transfer base material. The second cured product attached to the surface of the article main body 102 and the first adhesive attached to the surface of the transfer substrate 104 by lowering the article main body installation plate 68. It is a means (2nd separation means) which isolate | separates hardened | cured material.
The second lifting / lowering means 73 includes a lifting / lowering rod 94 that contacts the lower surface of the article main body installation plate 68 and a driving device 95 that moves the lifting / lowering rod 94 in the vertical direction.

The first curing means 67 irradiates the first curable resin existing between the parent mold 100 and the transfer substrate 104 with ultraviolet rays to cure the first curable resin having a reverse pattern and UV light source.
The second curing means 74 irradiates the second curable resin existing between the article main body 102 and the first cured product adhering to the surface of the transfer substrate 104 with ultraviolet rays to cure it, It is a UV light source as a second cured product having a fine pattern.

The diameter of the compressed air supply pipe 75 on the transfer substrate 104 side is gradually increased toward the opening so that the opening has the same size as the parent mold installation plate 61. 96 is provided.
Further, a lower seal member 97 is also provided at the periphery of the parent mold installation plate 61. When the parent mold installation plate 61 is raised by the first elevating means 66, the upper seal member 96 and the lower seal member are disposed. 97, the transfer substrate 104 can be clamped.

The diameter of the compressed air supply pipe 77 on the transfer base 104 side is gradually increased toward the opening so that the opening has the same size as the article main body installation plate 68, and an upper seal member is provided at the periphery of the opening. 96 is provided.
Further, a lower seal member 97 is also provided at the periphery of the article main body installation plate 68. When the article main body installation plate 68 is raised by the second elevating means 73, the upper seal member 96 and the lower seal member are disposed. 97, the transfer substrate 104 can be clamped.

The two parent mold setting plates 61 are connected by a connecting tool 98.
The plurality of article main body installation plates 68 are connected by a connector 99.

(Method for producing article having fine pattern)
Next, a method for manufacturing an article having a fine pattern using the manufacturing apparatus of the second embodiment will be described.
Articles having a fine pattern are described below: a preparation step, a first supply step, a first movement step, a first contact step, a first curing step, a first separation step, and a first and second supply. It is manufactured through a step, first and second moving steps, first and second contact steps, first and second curing steps, and first and second separation steps in this order. After the first and second separation steps, the first and second supply steps, the first and second moving steps, the first and second contact steps, the first and second curing steps, the first and second curing steps, Repeat the second separation step.

Preparation steps:
The parent mold 100 is held on the parent mold installation plate 61 in advance.
Further, the article main body 102 is always supplied to the article main body installation plate 68 and held by a conveying device (not shown) during the manufacture of the article.
At this time, the alignment may be adjusted. As a method for adjusting the alignment, a method similar to the method exemplified in the first embodiment may be used.
During the manufacture of the article, the parent mold 100 does not need to be removed except when the position is misaligned or damaged.

First supply step:
A first curable resin is supplied from the first dispenser 64 to the surface of the parent mold 100 on which the fine pattern is formed.

First movement step:
By driving the linear driving device 63, the master mold installation plate is arranged so that the surface of the transfer base material 104 and the surface of the master mold 100 coated with the first curable resin face each other at the first intersection 65. At the same time, the other parent mold placement plate 61 holding the parent mold 100 facing the transfer substrate 104 at the first intersection 65 is moved from the first intersection 65 to the first dispenser 64. Move.

First contact step:
The first raising / lowering means 66 is driven to raise the parent mold installation plate 61, and the transfer base material 104 is held between the upper seal member 96 of the compressed air supply pipe 75 and the lower seal member 97 of the parent mold installation plate 61. After that, compressed air is supplied to the compressed air supply pipe 75 to bring the first curable resin on the surface of the parent mold 100 into contact with the transfer substrate 104.

  The pressure at the time of contact is preferably 0.1 KPa to 10 MPa. If the pressure is less than 0.1 KPa, the fine pattern of the parent mold 100 cannot be accurately transferred to the first cured product. When the pressure exceeds 10 MPa, the pressurization process becomes long, the throughput is slowed down, the load is excessively applied to the device, the balance of the device is lost, and the parent mold 100 is damaged.

First curing step:
The first curable resin existing between the parent mold 100 and the transfer substrate 104 is irradiated with ultraviolet rays from the first curing means 67 and cured, and the fine pattern of the parent mold 100 is inverted. Let it be the 1st hardened | cured material which has a pattern.

The wavelength of ultraviolet light is preferably 365 nm or 254 nm.
Irradiation with ultraviolet rays may be performed in the air, in a vacuum, or in a gas atmosphere (such as carbon dioxide).

First separation step:
After the supply of compressed air to the compressed air supply pipe 75 is stopped, the first raising / lowering means 66 is driven to lower the parent mold installation plate 61, and the first curing adhered to the surface of the transfer substrate 104. The object and the parent mold 100 are separated. In this way, a replica mold having a reverse pattern on the surface, which is made of the transfer substrate 104 and the first cured product, is obtained.

First and second supply steps:
The first curable resin is supplied from the first dispenser 64 to the surface on which the fine pattern of the parent mold 100 held by the waiting parent mold installation plate 61 is formed (first supply step), and the first The second curable resin is supplied from the second dispenser 71 to the surface of the article main body 102 held by the article main body installation plate 68 on the upstream side of the second intersection 72 (second supply step).

First and second movement steps:
By driving the roller group and the linear driving device 63, the transfer is performed so that the surface of the transfer substrate 104 and the surface of the parent mold 100 coated with the first curable resin face each other at the first intersection 65. The other holding the replica mold (transfer base material 104) obtained at the first intersection 65 and the parent mold 100 facing the replica mold at the same time as moving the base material 104 and the master mold placement plate 61 The parent mold placement plate 61 is moved from the first intersection 65 to the second intersection 72 and the first dispenser 64, respectively (first movement step).

  At the same time, by driving the roller group and the linear driving device 70, the surface on which the reverse pattern of the replica mold is formed at the second intersection 72 (the surface of the first cured product attached to the surface of the transfer substrate 104). ) And the surface of the article main body 102 coated with the second curable resin are moved so that the replica mold (base material for transfer 104) and the article main body installation plate 68 are moved, and at the same time, the replica mold inversion pattern. After transferring the reversal pattern of the first cured product attached to the surface of the transfer substrate 104 to the article body 102, the replica mold (transfer substrate 104) and the article body installation plate 68 are moved from the second intersection. Each is moved to the transfer substrate take-up roller 92 and the article unloading port (not shown) side (second moving step).

First and second contact steps:
The first raising / lowering means 66 is driven to raise the parent mold installation plate 61, and the transfer base material 104 is held between the upper seal member 96 of the compressed air supply pipe 75 and the lower seal member 97 of the parent mold installation plate 61. After that, the compressed air is supplied to the compressed air supply pipe 75 to bring the first curable resin on the surface of the parent mold 100 into contact with the transfer substrate 104 (first contact step).

  At the same time, the second elevating means 73 is driven to raise the article main body installation plate 68, and the replica mold (transfer) is performed by the upper seal member 96 of the compressed air supply pipe 77 and the lower seal member 97 of the article main body installation plate 68. After sandwiching the substrate for transfer 104), compressed air is supplied to the compressed air supply pipe 77, and the second curable resin on the surface of the article main body 102 and the replica mold (the first attached to the surface of the transfer substrate 104). 1 cured product) (second contact step).

  The pressure at the time of contact is preferably 0.1 KPa to 10 MPa. If the pressure is less than 0.1 KPa, the fine pattern of the parent mold 100 cannot be accurately transferred to the first cured product. Further, the reverse pattern of the replica mold cannot be accurately transferred to the second cured product. When the pressure exceeds 10 MPa, the pressurizing process becomes long, the throughput is slowed down, the load is excessively applied to the device, the balance of the device is lost, and the parent mold 100 and the replica mold are damaged.

First and second curing steps:
The first curable resin existing between the parent mold 100 and the transfer substrate 104 is irradiated with ultraviolet rays from the first curing means 67 and cured, and the fine pattern of the parent mold 100 is inverted. A first cured product having a pattern is formed (first curing step).

  At the same time, the second curing means 74 irradiates the second curable resin existing between the article main body 102 and the replica mold (the first cured product adhering to the surface of the transfer base material 104) from the second curing means 74. These are cured to obtain a second cured product having a fine pattern in which the inverted pattern of the replica mold is inverted (second curing step).

The wavelength of ultraviolet light is preferably 365 nm or 254 nm.
Irradiation with ultraviolet rays may be performed in the air, in a vacuum, or in a gas atmosphere (such as carbon dioxide).

First and second separation steps:
After the supply of compressed air to the compressed air supply pipe 75 is stopped, the first raising / lowering means 66 is driven to lower the parent mold installation plate 61, and the first curing adhered to the surface of the transfer substrate 104. The object and the parent mold 100 are separated. In this manner, a replica mold having a reverse pattern on the surface, which is made of the transfer substrate 104 and the first cured product, is obtained (first separation step).

  At the same time, after the supply of compressed air to the compressed air supply pipe 77 is stopped, the second elevating means 73 is driven to lower the article main body installation plate 68 to attach the second adhering to the surface of the article main body 102. The cured product and the replica mold (first cured product attached to the surface of the transfer substrate 104) are separated. In this way, an article having a fine pattern on the surface, which is composed of the article main body 102 and the second cured product, is obtained (second separation step).

  In the manufacturing apparatus and the manufacturing method of the second embodiment described above, when the reversal pattern is formed by transferring the fine pattern formed on the surface of the parent mold 100 to the surface of the transfer substrate 104, Since the first curable resin supplied to the surface on which the fine pattern of the parent mold 100 is formed is used, compared to the case where the plastic polymer foil having the surface of the UV curable prepolymer is used as in the prior art, the following There are advantages.

(I) Since the first curable resin has a lower viscosity than the UV curable prepolymer on the surface of the plastic polymer foil, the transfer accuracy when the fine pattern of the parent mold 100 is transferred to the transfer substrate 104 is improved. high.
(Ii) Also, since the first curable resin has a lower viscosity than the UV curable prepolymer on the surface of the plastic polymer foil, the pressure at the time of transfer can be lowered and the apparatus and the parent mold 100 are burdened. Therefore, damage to the parent mold can be suppressed.
(Iii) Since the first curable resin is supplied to the surface on which the fine pattern of the parent mold 100 is formed, there is no useless first curable resin that is not used for transfer.

  Moreover, in the manufacturing apparatus and manufacturing method of the second embodiment described above, since a replica mold having a reverse pattern and an article having a fine pattern can be manufactured at the same time, productivity can be improved.

In the manufacturing apparatus and manufacturing method of the second embodiment, as means for holding the parent mold 100, the article main body 102, and the transfer base material 104 on each installation plate, a vacuum suction chuck, an electrostatic suction chuck, and an adhesive tape And mechanical holding means.
The means for supplying the curable resin is not limited to a dispenser, and may be an ink jet, a spin coater, a die coater, or the like.

EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to these examples.
Examples 1 and 2 are examples, and example 3 is a comparative example.

Preparation of fluorine-based photocurable composition:
In a vial container (internal volume 1 L), 10 g of nonionic fluorine-containing surfactant (manufactured by Seimi Chemical Co., Ltd., trade name: Surflon S-393), 350 g of 2-methyl-2-adamantyl acrylate (manufactured by Idemitsu Kosan Co., Ltd.), 350 g of tetraethylene glycol dimethacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 240 g of CH ₂ ═C (CH ₃ ) COO (CH ₂ ) ₂ (CF ₂ ) ₈ F (manufactured by Aldrich) are added, and then a photopolymerization initiator 50 g of Ciba-Geigy Specialty Co., Ltd. (trade name: Irgacure 651) is added, filtered through a 0.2 μm polytetrafluoroethylene (hereinafter referred to as PTFE) filter, and fluorinated light. A curable composition was obtained.

Preparation of non-fluorinated photocurable composition:
350 g of trimethylolpropane triacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 350 g of diethylene glycol dimethacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 100 g of pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.), 50 g of isobornyl acrylate (manufactured by Aldrich) and 100 g of 1-vinyl-2-pyrrolidone (manufactured by Tokyo Chemical Industry Co., Ltd.) are added, and then a photopolymerization initiator (manufactured by Ciba-Geigy Specialty), trade name: Irgacure 651) was added, and the mixture was filtered through a 0.2 μm PTFE filter to obtain a non-fluorine-based photocurable composition.

[Example 1]
As the parent mold 100, a 2 cm × 2 cm nickel mold having a fine pattern consisting of lines and spaces in which a plurality of convex shapes having a width of 100 nm and a height of 100 nm are formed at intervals of 100 nm is prepared. .
A biaxially stretched polyester film (trade name: Cosmo Shine A4100, thickness: 188 μm) cut to 2.3 cm × 2.3 cm is prepared as the transfer substrate 104.
As the article main body 102, a silicon wafer cut to 2 cm × 2 cm square is prepared.
The fluorine-based photocurable composition is prepared as the first curable resin.
The non-fluorine-based photocurable composition is prepared as the second curable resin.

  An article having a fine pattern is manufactured using the manufacturing apparatus according to the first embodiment shown in FIGS. As a result, an article having 80 fine patterns per hour is obtained.

[Example 2]
An article having a fine pattern is manufactured in the same manner as in Example 1 except that the manufacturing apparatus according to the second embodiment shown in FIGS. 7 to 8 is used. As a result, an article having 80 fine patterns per hour is obtained.

[Example 3]
As the parent mold, the surface of the nickel mold of Example 1 was used as a mold release agent (manufactured by Aldrich, trichloro (3, 3, 4, 4, 5, 5, 6, 6, 7, 7, 8, 8, 8). -Prepared by treatment with tridecafluorooctyl) silane).
As the article body, a silicon wafer cut into 2 cm × 2 cm square is prepared.
As the curable resin, the non-fluorine-based photocurable composition is prepared.

An article having a fine pattern is manufactured by the following procedure using a commercially available manufacturing apparatus (Mingchang Kiko Co., Ltd., trade name: NM-0401).
(I) A curable resin is supplied to the surface on which the fine pattern of the parent mold is formed.
(Ii) The curable resin on the surface of the parent mold is brought into contact with the article body.
(Iii) The curable resin existing between the parent mold and the article main body is irradiated with ultraviolet rays and cured to obtain a first cured product having a reverse pattern.
(Iv) The first cured product and the parent mold attached to the surface of the article body are separated to obtain an article having a fine pattern.
As a result, an article having 12 fine patterns per hour is obtained.

  Articles having a fine pattern obtained by the production method and production method of the present invention are optical elements (microlens array, optical waveguide, wavelength filter, polarizing plate, optical switching, Fresnel zone plate, binary optical element, blaze optical element, Photonic crystals, etc.), antireflection filters, biochips, microreactor chips, recording media, display members (ribs, etc.), catalyst carriers, filtration filters, sensor members, super water-repellent materials, energy-related members (fuel cells , Three-dimensional battery, capacitor, Peltier device, solar cell, etc.), MEMS, semiconductor device and the like.

It is a front view which shows an example of 1st Embodiment of the manufacturing apparatus of the articles | goods which have a fine pattern of this invention. It is a top view of the lower half of the manufacturing apparatus of FIG. It is a bottom view of the upper half of the manufacturing apparatus of FIG. It is a front view which shows the other example of 1st Embodiment of the manufacturing apparatus of the articles | goods which have a fine pattern of this invention. It is a top view of the lower half of the manufacturing apparatus of FIG. It is a bottom view of the upper half of the manufacturing apparatus of FIG. It is a front view which shows an example of 2nd Embodiment of the manufacturing apparatus of the articles | goods which have a fine pattern of this invention. It is a top view of the lower half of the manufacturing apparatus of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 12 Lower disk 14 Upper disk 15 Lifting means 16 Rotating means 17 1st supply means 18 2nd supply means 19 Curing means (1st hardening means and 2nd hardening means)
61 Parent mold installation plate (first holding means)
63 Linear drive device (second moving means)
64 1st dispenser (1st supply means)
65 First intersection 66 First lifting / lowering means (first contact / separation means)
67 First curing means 68 Article body installation plate (second holding means)
70 Linear drive device (third moving means)
71 2nd dispenser (2nd supply means)
72 2nd intersection 73 2nd raising / lowering means (2nd contact and separation means)
74 Second curing means 91 Transfer base material unwinding roller (first moving means)
92 Transfer material take-up roller (first moving means)
93 Guide roller (first moving means)
100 Parent mold 102 Article body 104 Transfer substrate

Claims (8)

An apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article body,
A first supply means for supplying a first curable resin to the surface on which the fine pattern of the parent mold is formed;
First contact means for bringing the first curable resin on the surface of the parent mold into contact with the transfer substrate;
A first curing unit that cures the first curable resin present between the parent mold and the transfer base material to form a first cured product having a reverse pattern;
First separation means for separating the first cured product and the parent mold attached to the surface of the transfer substrate;
Moving means for relatively moving the transfer substrate and the article body so that the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is opposed to the surface of the article body When,
A second supply means for supplying a second curable resin to the surface of the article body;
A second contact means for bringing the second curable resin on the surface of the article body into contact with the first cured product attached to the surface of the transfer substrate;
A second curing unit that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern; ,
An apparatus for manufacturing an article having a fine pattern, comprising: a second separation unit that separates a second cured product attached to the surface of the article main body and a first cured product attached to the surface of the transfer substrate. An apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article body,
A first supply means for supplying a first curable resin to the surface of the transfer substrate;
A first contact means for bringing the first curable resin on the surface of the transfer substrate into contact with the surface on which the fine pattern of the parent mold is formed;
A first curing unit that cures the first curable resin present between the parent mold and the transfer base material to form a first cured product having a reverse pattern;
First separation means for separating the first cured product and the parent mold attached to the surface of the transfer substrate;
Moving means for relatively moving the transfer substrate and the article body so that the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is opposed to the surface of the article body When,
A second supply means for supplying a second curable resin to the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is formed;
A second contact means for bringing the second curable resin on the surface of the first cured product into contact with the article body;
A second curing unit that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern; ,
An apparatus for manufacturing an article having a fine pattern, comprising: a second separation unit that separates a second cured product attached to the surface of the article main body and a first cured product attached to the surface of the transfer substrate. A method for producing an article having a fine pattern by transferring a fine pattern formed on the surface of a parent mold to the surface of the article body,
A first supply step of supplying a first curable resin to the surface on which the fine pattern of the parent mold is formed;
A first contact step of bringing the first curable resin on the surface of the parent mold into contact with the transfer substrate;
A first curing step of curing a first curable resin present between the parent mold and the transfer substrate to form a first cured product having a reverse pattern;
A first separation step of separating the first cured product and the parent mold attached to the surface of the transfer substrate;
A moving step of relatively moving the transfer substrate and the article body so that the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is opposed to the surface of the article body When,
A second supply step of supplying a second curable resin to the surface of the article body;
A second contact step of bringing the second curable resin on the surface of the article body into contact with the first cured product attached to the surface of the transfer substrate;
A second curing step of curing the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern; ,
A method for producing an article having a fine pattern, comprising: a second separation step of separating the second cured product attached to the surface of the article main body and the first cured product attached to the surface of the transfer substrate. A method for producing an article having a fine pattern by transferring a fine pattern formed on the surface of a parent mold to the surface of the article body,
A first supply step of supplying a first curable resin to the surface of the transfer substrate;
A first contact step of bringing the first curable resin on the surface of the transfer substrate into contact with the surface on which the fine pattern of the parent mold is formed;
A first curing step of curing a first curable resin present between the parent mold and the transfer substrate to form a first cured product having a reverse pattern;
A first separation step of separating the first cured product and the parent mold attached to the surface of the transfer substrate;
A moving step of relatively moving the transfer substrate and the article body so that the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is opposed to the surface of the article body When,
A second supply step of supplying a second curable resin to the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is formed;
A second contact step of bringing the second curable resin on the surface of the first cured product into contact with the article body;
A second curing step of curing the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern; ,
A method for producing an article having a fine pattern, comprising: a second separation step of separating the second cured product attached to the surface of the article main body and the first cured product attached to the surface of the transfer substrate. The first curable resin has a fluorine atom and has at least one carbon-carbon unsaturated double bond (P), and has no fluorine atom and has a carbon-carbon unsaturated double bond. Containing a compound (Q) having one or more bonds, a fluorine-containing surfactant (R), and a photopolymerization initiator (S), and substantially free of a solvent;
Of the total (100% by mass) of compound (P), compound (Q), fluorine-containing surfactant (R) and photopolymerization initiator (S), compound (P) is 0.1 to 45% by mass. The photocuring in which the compound (Q) is 50 to 98% by mass, the fluorine-containing surfactant (R) is 0.1 to 20% by mass, and the photopolymerization initiator (S) is 1 to 10% by mass. The manufacturing method of the articles | goods which have a fine pattern of Claim 3 or 4 which is an adhesive composition. An apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article body,
A lower disk for alternately holding n parent molds and n article bodies at positions of a circumference of 2n on a concentric circle on the upper surface of the disk (where n is an integer of 1 or more); ,
It is arranged coaxially with the lower disk so that the central axis that passes through the center of the disk and is orthogonal to the surface of the disk is coincident, and 2n pieces are arranged at a position equivalent to the circumference 2n on the concentric circle on the lower surface of the disk. An upper disk for holding the transfer substrate;
Elevating means for moving the lower disk and / or the upper disk in the vertical direction so that the lower disk and the upper disk approach or separate from each other;
Rotating the lower and / or upper disk around the central axis so that the parent mold or article body on the upper surface of the lower disk faces the transfer substrate on the lower surface of the upper disk Means,
A first supply means for supplying a first curable resin to the surface on which the fine pattern of the parent mold is formed;
A second supply means for supplying a second curable resin to the surface of the article body;
A first curing unit that cures the first curable resin present between the parent mold and the transfer base material to form a first cured product having a reverse pattern;
A second curing unit that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern; An apparatus for manufacturing an article having a fine pattern. An apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article body,
A lower disk that holds 2n transfer substrates at positions of a circumference of 2n on a concentric circle on the upper surface of the disk (where n is an integer of 1 or more);
It is arranged coaxially with the lower disk so that the central axis which passes through the center of the disk and is orthogonal to the surface of the disk is coincident, and n pieces are arranged at a position equivalent to the circumference 2n on the concentric circle on the lower surface of the disk. Upper discs alternately holding the parent mold and the n article bodies,
Elevating means for moving the lower disk and / or the upper disk in the vertical direction so that the lower disk and the upper disk approach or separate from each other;
Rotation that rotates the lower disk and / or upper disk around the central axis so that the transfer substrate on the upper surface of the lower disk faces the parent mold or the article body on the lower surface of the upper disk Means,
A first supply means for supplying a first curable resin to the surface of the transfer substrate;
A second supply means for supplying a second curable resin to the surface on which the reverse pattern of the first cured product attached to the surface of the transfer substrate is formed;
A first curing unit that cures the first curable resin present between the parent mold and the transfer base material to form a first cured product having a reverse pattern;
A second curing unit that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern; An apparatus for manufacturing an article having a fine pattern. An apparatus for producing an article having a fine pattern by transferring the fine pattern formed on the surface of the parent mold to the surface of the article body,
First moving means for moving the belt-shaped transfer substrate in a certain direction;
First holding means for holding the parent mold;
A second moving means for moving the first holding means so as to cross the transfer substrate below the transfer substrate;
A first supply means for supplying a first curable resin to the surface on which the fine pattern of the parent mold is formed;
The first curable resin on the surface of the parent mold and the transfer at the first intersection where the transfer substrate moved by the first moving means and the first holding means moved by the second moving means intersect. A first contact / separation means for contacting the substrate for transfer and separating the first cured product and the parent mold attached to the surface of the substrate for transfer;
A first curing unit that cures the first curable resin present between the parent mold and the transfer base material to form a first cured product having a reverse pattern;
A second holding means for holding the article body;
Third moving means for moving the second holding means so as to cross the transfer base material below the transfer base material on the downstream side of the first intersection;
A second supply means for supplying a second curable resin to the surface of the article body;
Transfer with the second curable resin on the surface of the article main body at a second intersection where the transfer substrate moved by the first moving means and the second holding means moved by the third moving means intersect The first cured product attached to the surface of the transfer substrate is brought into contact with the first cured product, and the second cured product attached to the surface of the article main body is separated from the first cured product attached to the surface of the transfer substrate. A second contact / separation means;
A second curing unit that cures the second curable resin existing between the article main body and the first cured product attached to the surface of the transfer substrate to form a second cured product having a fine pattern; ,
An apparatus for manufacturing an article having a fine pattern.

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