JP2009193014A - Patterning elliptical polarizer - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a polarizer which can be inexpensively manufactured and includes a patterning retardation layer and a patterning polarizing layer. <P>SOLUTION: The elliptical polarizer includes the patterning polarizing layer including two or more regions having directions of different axes of absorption and the patterning retardation layer including two or more regions having directions of different slow axis, the patterning retardation layer containing a polymer having an orientation group at a side chain. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

The present invention relates to a patterned elliptically polarizing plate. More specifically, the present invention relates to a patterned elliptically polarizing plate manufactured by laminating a patterned retardation layer and a patterned polarizing layer.

A patterned polarizing plate having a plurality of absorption axis directions in a pattern is considered to be useful for practical use of complicated birefringence conditions.
Patent Document 1 describes a guest-host type polarizer and describes that patterning is possible. However, a specific manufacturing method is not disclosed. In addition, when applied to a liquid crystal display device, since it is not combined with a phase difference plate, there is a problem that viewing angle dependency is large.

Patent Document 2 discloses an alignment dye-containing film in which a dichroic dye is uniaxially aligned, a polarizing element using the same, and a TN and STN liquid crystal display device. A production method has been adopted in which an alignment dye film is formed on a fluororesin alignment film and transferred to a target, and the presence or absence of an alignment dye-containing film can be patterned by patterning the alignment film with a photoresist. There is a disclosure. However, there is no disclosure about a method of combining with a phase difference plate. In addition, since the fluororesin alignment film is produced by attaching a lump of fluororesin to a heated substrate with pressure, there is a problem that it is difficult to obtain a uniform film.

Patent Document 3 discloses a guest-host polarizer in which a color filter and a polarizer are integrated. In the production process of the polarizer, the color filter dye that orients light orthogonal to the oriented polarizer dye absorbs the light. The disclosed polarizer further includes a photothermal conversion layer, and pattern transfer is performed using photothermal interaction. However, there is no disclosure about a method of combining with a phase difference plate. Moreover, since the transfer using photothermal interaction is performed, there is a problem that the fineness of patterning is poor.

Patent Document 4 discloses a patterning phase difference plate and a patterning polarizing plate using a photonic crystal by a multilayer film sputtering method, and an ellipsometer that combines them with a light receiving element array. Since the nick crystal system is used, there is a problem that an expensive apparatus such as an electron beam lithography, a dry etching apparatus, or a sputtering apparatus is required. Moreover, since many thin films must be laminated, productivity is low.
Special Table 2007-510946 JP-A-9-73015 Special Table 2003-513298 International Publication WO2004 / 008196

The subject of this invention is providing the polarizing plate which has a patterning phase difference layer and a patterning polarizing layer which can be manufactured cheaply.

As a result of intensive studies for solving the above problems, the present inventors have found that a patterned polarizing plate can be produced at low cost by using a polymer having an orientation group. The present invention was originally completed.
That is, the present invention provides the following [1] to [16]: [1] A patterned polarizing layer including two or more regions having different absorption axis directions, and different slow axis directions. An elliptically polarizing plate comprising a patterned retardation layer containing a polymer having an orientation group in a side chain, which is a patterned retardation layer comprising two or more regions.

[2] The elliptically polarizing plate according to [1], wherein the patterning polarizing layer contains a dichroic dye and a polymer having an orientation group in a side chain.
[3] The elliptically polarizing plate according to [1] or [2], wherein the patterning retardation layer contains a liquid crystalline compound.
[4] The elliptically polarizing plate according to any one of [1] to [3], wherein the patterning polarizing layer contains a liquid crystalline compound.
[5] The alignment layer 1, the patterning polarizing layer, the alignment layer 2, and the patterning retardation layer are provided in this order, and the alignment layer 1 and the patterning polarizing layer, and the alignment layer 2 and the patterning retardation layer are respectively The elliptically polarizing plate according to any one of [1] to [4], which is adjacent.

[6] A method for producing an elliptically polarizing film, comprising the following steps (11) to (13):
(11) A composition containing a photo-alignment material is applied on a support or a patterned polarizing layer and dried, and pattern alignment with polarized ultraviolet light is performed to produce an alignment layer, or on the support or the patterned polarizing layer A step of applying an alignment film solution, rubbing the dried and baked layer through a mask to produce an alignment layer;
(12) A step of exposing the dried layer by applying a solution containing a polymer having an orientation group in the side chain on the alignment layer obtained in step (11);
(13) A step of developing the exposed layer obtained in step (12) to produce a patterning retardation layer.

[7] A method for producing an elliptically polarizing film, comprising the following steps (14) to (16):
(14) A composition containing a photo-alignment material is applied onto a support or a patterned retardation layer and dried, and pattern alignment with polarized ultraviolet light is performed to produce an alignment layer, or on a support or a patterned retardation layer Applying an alignment layer solution to the layer and rubbing the dried and baked layer through a mask to produce an alignment layer;
(15) A step of applying a solution containing a polymer having an orientation group on the side chain and a dichroic dye on the orientation layer obtained in the step (14) and exposing the dried layer;
(16) A step of developing a patterned polarizing layer by developing the exposed layer obtained in step (15).

[8] The solution containing a polymer having an orientation group in the side chain contains a polymerizable liquid crystalline compound for heat development, and the development is performed by heat treatment at 50 ° C. to 400 ° C. [6] or [7 ] The manufacturing method of description.
[9] The solution according to [6] or [7], wherein the solution containing a polymer having an orientation group in the side chain contains an alkali-developable polymerizable liquid crystal compound, and the development is performed in an aqueous solution having a pH of 10 or more and 14 or less. Manufacturing method.
[10] The production according to [6] or [7], wherein the solution containing a polymer having an orientation group in the side chain contains a polymerizable liquid crystalline compound for organic solvent development, and the development is organic solvent development. Method.

[11] A liquid crystal display device comprising the elliptically polarizing plate according to any one of [1] to [5].
[12] An image sensor including the elliptically polarizing plate according to any one of [1] to [5].
[13] A polarization measuring device including the elliptically polarizing plate according to any one of [1] to [5].
[14] A one-dimensional sensor array including the elliptically polarizing plate according to any one of [1] to [5].
[15] A film thickness measuring device including the elliptically polarizing plate according to any one of [1] to [5].
[16] A 3D display device including the elliptically polarizing plate according to any one of [1] to [5].

According to the present invention, a patterned elliptically polarizing plate having a patterned retardation layer and a patterned polarizing layer, which can be manufactured at low cost, is provided.

Hereinafter, the present invention will be described in detail.
In the present specification, “to” is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.

  In the present specification, “the same” for the angle means that the difference in angle is within a range of less than ± 5 °. This range is preferably less than ± 4 °, and more preferably less than ± 3 °. Therefore, for example, when “the direction of the shaft is the same”, it means that the difference in the direction of the shaft is within a range of less than ± 5 °, and when “the direction of the shaft is different”, It means that the difference in orientation is ± 5 ° or more.

  In this specification, retardation, retardation, or Re represents in-plane retardation. In-plane retardation (Re (λ)) is measured with KOBRA 21ADH or WR (manufactured by Oji Scientific Instruments) by making light having a wavelength of λ nm incident in the normal direction of the film. Retardation or Re in this specification means those measured at wavelengths of 611 ± 5 nm, 545 ± 5 nm, and 435 ± 5 nm for R, G, and B, respectively. It means that measured at a wavelength of 5 nm or 590 ± 5 nm.

The elliptically polarizing plate of the present invention is a polarizing plate patterned in the axial direction, a patterned retardation layer patterned in the slow axis direction and the retardation layer amount, and a patterning patterned in the absorption axis direction and the presence or absence of the layer. A polarizing layer.
It should be noted that the “axial direction” includes a state having no axial direction. In addition, the state having no axial direction includes a state where a layer is missing. That is, in the elliptically polarizing plate of the present invention, the presence or absence of a layer may be formed in a pattern. In this specification, “axial direction” means an in-plane axial direction.

  In the present specification, “patterning” refers to the production of two or more regions having different optical properties depending on the direction of the absorption axis or the slow axis, the presence or absence of a layer, etc., on a film-like object. Or it means having two or more of the same region. Here, the regions having the same optical properties do not need to be continuous with each other, and may be distributed in a pattern. In addition, it is assumed that two or more existing regions having different optical properties are gathered to form a continuous film-like object. (See Figure 1)

Hereinafter, materials, manufacturing methods, and the like will be described in detail for the patterned elliptically polarizing plate of the present invention. However, the present invention is not limited to this embodiment, and other embodiments can be carried out with reference to the following description and conventionally known methods, and the present invention is limited to the embodiments described below. It is not something.
The elliptically polarizing plate of the present invention includes a patterning retardation layer and a patterning polarizing layer. Below, the manufacturing method of a patterning phase difference layer and a patterning polarizing layer is demonstrated first.

(Retardation layer)
The patterning retardation layer can be formed by patterning the retardation layer. The phase difference layer may be a layer having optical characteristics that have at least one incident direction where Re is not substantially 0 when the phase difference is measured, that is, isotropic. In the patterned elliptically polarizing plate of the present invention, the retardation layer is formed from a composition containing a polymer having an orientation group in the side chain. Since the orientation groups have the property of being easily aligned in a uniform direction, control of the axial direction is facilitated by using a polymer having an orientation group in the side chain.

(Polymer having orientation group)
The polymer having an orientation group is composed of a polymer main chain and a polymer side chain. Any component of the polymer main chain may be used, and examples thereof include polyacrylate, polymethacrylate, polysiloxane, and polyvinyl. The orientation group is contained in the polymer side chain. The alignment group has a partial structure (mesogen) imparting a function exhibiting liquid crystallinity.
Any structure may be used as the partial structure that provides the liquid crystallinity. For example, the “polymers” edited by the Liquid Crystal Handbook Editorial Committee, Liquid Crystal Handbook, Maruzen, Chapters 3 and 8 of 2000 What is described in "Liquid crystal" is mentioned.

The retardation layer also preferably contains a liquid crystal compound having at least one reactive group. The polymer having an orientation group in the side chain may be a liquid crystal compound. By forming the retardation layer from a composition containing a liquid crystal compound having at least one reactive group, control of the slow axis direction by an alignment layer described later and the like is facilitated. Such a retardation layer can be prepared by applying and drying a solution containing a liquid crystal compound having at least one reactive group to form a liquid crystal phase, and then polymerizing and fixing by irradiation with heat or ionizing radiation. . Such a manufacturing method will be described below.

[Liquid crystal compounds]
In general, liquid crystal compounds can be classified into a rod type and a disk type from the shape. In addition, there are low and high molecular types, respectively. Polymer generally refers to a polymer having a degree of polymerization of 100 or more (Polymer Physics / Phase Transition Dynamics, Masao Doi, 2 pages, Iwanami Shoten, 1992). In the present invention, any liquid crystal compound can be used, but a rod-like liquid crystal compound or a disk-like liquid crystal compound is preferably used. Two or more kinds of rod-like liquid crystalline compounds, two or more kinds of disc-like liquid crystalline compounds, or a mixture of a rod-like liquid crystalline compound and a disk-like liquid crystalline compound may be used. It is more preferable to use a rod-like liquid crystal compound or a disk-like liquid crystal compound having a reactive group since temperature change and humidity change can be reduced, and at least one of the reactive groups in one liquid crystal molecule is 2 or more. More preferably it is. The liquid crystal compound may be a mixture of two or more, and in that case, at least one preferably has two or more reactive groups.

It is also preferable that the liquid crystal compound has two or more reactive groups having different polymerization conditions. In this case, it is possible to produce a retardation layer containing a polymer having an unreacted reactive group by selecting conditions and polymerizing only a part of plural types of reactive groups. The polymerization conditions used may be the wavelength range of ionizing radiation used for polymerization immobilization, or the difference in polymerization mechanism used, but preferably a radical reaction group and a cationic reaction that can be controlled by the type of initiator used. A combination of groups is good. A combination in which the radical reactive group is an acrylic group and / or a methacryl group and the cationic group is a vinyl ether group, an oxetane group and / or an epoxy group is particularly preferable because the reactivity can be easily controlled.

Examples of rod-like liquid crystalline compounds include azomethines, azoxys, cyanobiphenyls, cyanophenyl esters, benzoic acid esters, cyclohexanecarboxylic acid phenyl esters, cyanophenylcyclohexanes, cyano-substituted phenylpyrimidines, alkoxy-substituted phenylpyrimidines. , Phenyldioxanes, tolanes and alkenylcyclohexylbenzonitriles are preferably used. Not only the above low-molecular liquid crystalline compounds but also high-molecular liquid crystalline compounds can be used. The polymer liquid crystal compound is a polymer compound obtained by polymerizing a rod-like liquid crystal compound having a low molecular reactive group. The rod-like liquid crystalline compound having a low-molecular reactive group that is particularly preferably used is a rod-like liquid crystalline compound represented by the following general formula (I).
Formula (I): Q ¹ -L ¹ -A ¹ -L ³ -ML ⁴ -A ² -L ² -Q ²
In the formula, Q ¹ and Q ² are each independently a reactive group, and L ¹ , L ² , L ³ and L ⁴ each independently represent a single bond or a divalent linking group. A ¹ and A ² each independently represent a spacer group having 2 to 20 carbon atoms. M represents a mesogenic group.
Hereinafter, the rod-like liquid crystal compound having a reactive group represented by the general formula (I) will be described in more detail. In the formula, Q ¹ and Q ² are each independently a reactive group. The polymerization reaction of the reactive group is preferably addition polymerization (including ring-opening polymerization) or condensation polymerization. In other words, the reactive group is preferably a reactive group capable of addition polymerization reaction or condensation polymerization reaction. Examples of reactive groups are shown below.

Examples of the divalent linking group represented by L ¹ , L ² , L ³ and L ⁴ include —O—, —S—, —CO—, —NR ² —, —CO—O—, and —O—CO. —O—, —CO—NR ² —, —NR ² —CO—, —O—CO—, —O—CO—NR ² —, —NR ² —CO—O—, and NR ² —CO—NR ^2. A divalent linking group selected from the group consisting of-is preferred. R ² is an alkyl group having 1 to 7 carbon atoms or a hydrogen atom. In the formula (I), Q ¹ -L ¹ and Q ² -L ² -are CH ₂ ═CH—CO—O—, CH ₂ ═C (CH ₃ ) —CO—O—, and CH ₂ ═C ( Cl) -CO-O-CO- O- are _{preferable, CH 2 = CH-CO-} O- is most preferable.

A ¹ and A ² represent spacer groups having 2 to 20 carbon atoms. An alkylene group having 2 to 12 carbon atoms, an alkenylene group, and an alkynylene group are preferable, and an alkylene group is particularly preferable. The spacer group is preferably a chain and may contain oxygen atoms or sulfur atoms that are not adjacent to each other. The spacer group may have a substituent and may be substituted with a halogen atom (fluorine, chlorine, bromine), a cyano group, a methyl group, or an ethyl group.
Examples of the mesogenic group represented by M include all known mesogenic groups. In particular, a group represented by the following general formula (II) is preferable.
Formula (II): - (- W 1 -L 5) n -W 2 -
In the formula, W ¹ and W ² each independently represent a divalent cyclic alkylene group or a cyclic alkenylene group, a divalent aryl group or a divalent heterocyclic group, and L ⁵ represents a single bond or a linking group. Specific examples of the linking group include specific examples of groups represented by L ^{1 to} L ⁴ in the formula (I), —CH ₂ —O—, and —O—CH ₂ —. n represents 1, 2 or 3.

W ¹ and W ² include 1,4-cyclohexanediyl, 1,4-phenylene, pyrimidine-2,5-diyl, pyridine-2,5diyl, 1,3,4-thiadiazole-2,5-diyl, 1,3,4-oxadiazole-2,5-diyl, naphthalene-2,6-diyl, naphthalene-1,5-diyl, thiophene-2,5-diyl, pyridazine-3,6-diyl . In the case of 1,4-cyclohexanediyl, there are trans isomers and cis isomers, but either isomer may be used, and a mixture in any proportion may be used. More preferably, it is a trans form. W ¹ and W ² may each have a substituent. Examples of the substituent include a halogen atom (fluorine, chlorine, bromine, iodine), a cyano group, an alkyl group having 1 to 10 carbon atoms (methyl group, ethyl group, propyl group, etc.), and an alkoxy group having 1 to 10 carbon atoms. (Methoxy group, ethoxy group, etc.), C1-10 acyl group (formyl group, acetyl group, etc.), C1-10 alkoxycarbonyl group (methoxycarbonyl group, ethoxycarbonyl group, etc.), carbon atom Examples thereof include an acyloxy group of 1 to 10 (acetyloxy group, propionyloxy group, etc.), nitro group, trifluoromethyl group, difluoromethyl group and the like.
Preferred examples of the basic skeleton of the mesogenic group represented by the general formula (II) are shown below. These may be substituted with the above substituents.

  Examples of the compound represented by the general formula (I) are shown below, but the present invention is not limited thereto. In addition, the compound represented by general formula (I) is compoundable by the method as described in Japanese National Patent Publication No. 11-513019 (WO97 / 00600).

  As another aspect of the present invention, there is an aspect in which a discotic liquid crystal is used for the retardation layer. The retardation layer is preferably a layer of a low molecular weight liquid crystal discotic compound such as a monomer or a polymer layer obtained by polymerization (curing) of a polymerizable liquid crystal discotic compound. Examples of the discotic (discotic) compound include C.I. Destrade et al., Mol. Cryst. 71, 111 (1981), benzene derivatives described in C.I. Destrade et al., Mol. Cryst. 122, 141 (1985), Physicslett, A, 78, 82 (1990); Kohne et al., Angew. Chem. 96, page 70 (1984) and the cyclohexane derivatives described in J. Am. M.M. Lehn et al. Chem. Commun. , 1794 (1985), J. Am. Zhang et al., J. Am. Chem. Soc. 116, page 2655 (1994), and azacrown-based and phenylacetylene-based macrocycles. The above discotic (discotic) compounds generally have a discotic nucleus at the center of the molecule, and groups (L) such as linear alkyl groups, alkoxy groups, and substituted benzoyloxy groups are substituted in a radial pattern. In other words, it has liquid crystallinity and generally includes a so-called discotic liquid crystal. However, when such an aggregate of molecules is uniformly oriented, it exhibits negative uniaxiality, but is not limited to this description. Further, in the present invention, it is not necessary that the final product is formed from a discotic compound, for example, the low molecular discotic liquid crystal has a group that reacts with heat, light, or the like. As a result, it may be polymerized or cross-linked by reaction with heat, light or the like, resulting in high molecular weight and loss of liquid crystallinity.

In the present invention, it is preferable to use a discotic liquid crystalline compound represented by the following general formula (III).
Formula (III): D (-LP) _n
In the formula, D is a discotic core, L is a divalent linking group, P is a polymerizable group, and n is an integer of 4 to 12.
In the formula (III), preferred specific examples of the discotic core (D), the divalent linking group (L) and the polymerizable group (P) are (D1) described in JP-A No. 2001-4837, respectively. To (D15), (L1) to (L25), (P1) to (P18), and the disk-shaped core (D), divalent linking group (L) and polymerizable group ( The contents regarding P) can be preferably applied here.
Preferred examples of the discotic compound are shown below.

The retardation layer is formed by applying a composition containing a liquid crystal compound (for example, a coating solution) to the surface of an alignment layer described later to obtain an alignment state exhibiting a desired liquid crystal phase, and then converting the alignment state to heat or ionizing radiation. It is preferable that it is a layer produced by fixing by irradiation.
When a discotic liquid crystalline compound having a reactive group is used as the liquid crystalline compound, it may be fixed in any alignment state of horizontal alignment, vertical alignment, inclined alignment, and twist alignment. In the present specification, “horizontal alignment” means that in the case of a rod-like liquid crystal, the molecular long axis and the horizontal plane of the transparent support are parallel, and in the case of a disc-like liquid crystal, the circle of the core of the disc-like liquid crystal compound. The horizontal plane of the board and the transparent support is said to be parallel, but it is not required to be strictly parallel. In the present specification, an orientation with an inclination angle of less than 10 degrees with the horizontal plane is meant. And The inclination angle is preferably 0 to 5 degrees, more preferably 0 to 3 degrees, further preferably 0 to 2 degrees, and most preferably 0 to 1 degree.

  When two or more retardation layers composed of a composition containing a liquid crystalline compound are laminated, the combination of the liquid crystalline compounds is not particularly limited, and a laminate of all layers made of a discotic liquid crystalline compound, which is all rod-like liquid crystalline It may be a laminate of a layer made of a compound, a laminate of a layer made of a composition containing a discotic liquid crystalline compound and a layer made of a composition containing a rod-like liquid crystalline compound. Moreover, the combination of the alignment states of each layer is not particularly limited, and retardation layers having the same alignment state may be stacked, or retardation layers having different alignment states may be stacked.

  The retardation layer is preferably formed by applying a coating liquid containing a liquid crystalline compound and the following polymerization initiator and other additives onto a predetermined alignment layer described later. As a solvent used for preparing the coating solution, an organic solvent is preferably used. Examples of organic solvents include amides (eg, N, N-dimethylformamide), sulfoxides (eg, dimethyl sulfoxide), heterocyclic compounds (eg, pyridine), hydrocarbons (eg, benzene, hexane), alkyl halides (eg, , Chloroform, dichloromethane), esters (eg, methyl acetate, butyl acetate), ketones (eg, acetone, methyl ethyl ketone), ethers (eg, tetrahydrofuran, 1,2-dimethoxyethane). Alkyl halides and ketones are preferred. Two or more organic solvents may be used in combination.

[Fixation of alignment state of liquid crystalline compounds]
The aligned liquid crystalline compound is preferably fixed while maintaining the alignment state. The immobilization is preferably carried out by a polymerization reaction of a reactive group introduced into the liquid crystal compound. The polymerization reaction includes a thermal polymerization reaction using a thermal polymerization initiator and a photopolymerization reaction using a photopolymerization initiator, and a photopolymerization reaction is more preferable. The photopolymerization reaction may be either radical polymerization or cationic polymerization. Examples of radical photopolymerization initiators include α-carbonyl compounds (described in US Pat. Nos. 2,367,661 and 2,367,670), acyloin ethers (described in US Pat. No. 2,448,828), α-hydrocarbon substituted aromatics. Aciloin compound (described in US Pat. No. 2,722,512), polynuclear quinone compound (described in US Pat. Nos. 3,046,127 and 2,951,758), a combination of triarylimidazole dimer and p-aminophenyl ketone (US Pat. No. 3,549,367) Acridine and phenazine compounds (JP-A-60-105667, US Pat. No. 4,239,850) and oxadiazole compounds (US Pat. No. 4,212,970). Examples of the cationic photopolymerization initiator include organic sulfonium salt systems, iodonium salt systems, phosphonium salt systems, and the like. Organic sulfonium salt systems are preferable, and triphenylsulfonium salts are particularly preferable. As counter ions of these compounds, hexafluoroantimonate, hexafluorophosphate, and the like are preferably used.

It is preferable that the usage-amount of a photoinitiator is 0.01-20 mass% of solid content of a coating liquid, and it is further more preferable that it is 0.5-5 mass%. Light irradiation for the polymerization of the liquid crystalline compound is preferably performed using ultraviolet rays. Irradiation energy is preferably ^{10mJ / cm 2 ~10J / cm 2} , further preferably 25~800mJ / cm ^2. Illuminance is preferably 10 to 1,000 / cm ^2, more preferably 20 to 500 mW / cm ^2, further preferably 40~350mW / cm ^2. The irradiation wavelength preferably has a peak at 250 to 450 nm, and more preferably has a peak at 300 to 410 nm. In order to accelerate the photopolymerization reaction, light irradiation may be performed under an inert gas atmosphere such as nitrogen or under heating conditions.

[Optical alignment by polarized irradiation]
The retardation layer may be a layer in which in-plane retardation is manifested or increased by photo-alignment by polarized light irradiation. This polarized light irradiation may serve as the photopolymerization process in the above-described orientation fixing, or may be further fixed by non-polarized light irradiation after first polarized light irradiation, or may be fixed first by non-polarized light irradiation. The photo-alignment may be carried out by irradiation with polarized light, but it is desirable to carry out only the irradiation with polarized light or to perform further immobilization with non-polarized light after performing polarized light irradiation first. When polarized light irradiation also serves as a photopolymerization process in the above-described orientation fixation and a radical polymerization initiator is used as a polymerization initiator, polarized light irradiation should be performed in an inert gas atmosphere with an oxygen concentration of 0.5% or less. preferable. The irradiation energy is preferably ^{20mJ / cm 2 ~10J / cm 2} , further preferably 100 to 800 mJ / cm ^2. The illuminance is preferably 20 to 1000 mW / cm ^2, more preferably 50 to 500 mW / cm ^2, further preferably 100 to 350 mW / cm ^2. Although there is no restriction | limiting in particular about the kind of liquid crystalline compound hardened | cured by polarized light irradiation, The liquid crystalline compound which has an ethylenically unsaturated group as a reactive group is preferable. The irradiation wavelength preferably has a peak at 300 to 450 nm, and more preferably has a peak at 350 to 400 nm.

[Post-curing by UV irradiation after polarized irradiation]
The retardation layer may be further irradiated with polarized or non-polarized ultraviolet rays after the first irradiation with polarized light (irradiation for photo-alignment). By further irradiating polarized or non-polarized ultraviolet rays after the first irradiation with polarized light, the reaction rate of the reactive group is increased (post-curing), the adhesiveness and the like are improved, and production can be carried out at a high transport speed. Post-curing may be polarized or non-polarized, but is preferably polarized. Moreover, it is preferable to carry out post-curing twice or more, and polarized light or non-polarized light may be combined with polarized light and non-polarized light. However, when combined, it is preferable to irradiate polarized light before non-polarized light. Irradiation with ultraviolet rays may or may not be replaced with an inert gas. However, particularly when a radical polymerization initiator is used as the polymerization initiator, it is preferably performed in an inert gas atmosphere having an oxygen concentration of 0.5% or less. The irradiation energy is preferably ^{20mJ / cm 2 ~10J / cm 2} , further preferably 100 to 800 mJ / cm ^2. The illuminance is preferably 20 to 1000 mW / cm ^2, more preferably 50 to 500 mW / cm ^2, further preferably 100 to 350 mW / cm ^2. In the case of polarized light irradiation, the irradiation wavelength preferably has a peak at 300 to 450 nm, and more preferably 350 to 400 nm. In the case of non-polarized light irradiation, it preferably has a peak at 200 to 450 nm, and more preferably has a peak at 250 to 400 nm.

[Horizontal alignment agent]
In the composition for forming the retardation layer, at least one of a fluorine-containing homopolymer or copolymer using a compound represented by the following general formulas (1) to (3) and a monomer represented by the general formula (4) is contained. Thus, the molecules of the liquid crystal compound can be substantially horizontally aligned.
Hereinafter, the following general formulas (1) to (4) will be described in order.

In the formula, R ¹ , R ² and R ³ each independently represent a hydrogen atom or a substituent, and X ¹ , X ² and X ^{3 each} represent a single bond or a divalent linking group. The substituent represented by each of R ^{1 to} R ³ is preferably a substituted or unsubstituted alkyl group (more preferably an unsubstituted alkyl group or a fluorine-substituted alkyl group), an aryl group (particularly a fluorine-substituted alkyl). An aryl group having a group is preferred), a substituted or unsubstituted amino group, an alkoxy group, an alkylthio group, and a halogen atom. The divalent linking groups represented by X ¹ , X ² and X ³ are each an alkylene group, an alkenylene group, a divalent aromatic group, a divalent heterocyclic residue, —CO—, —NR ^a — ( R ^a is ^a divalent linking group selected from the group consisting of an alkyl group having 1 to 5 carbon atoms or a hydrogen atom), —O—, —S—, —SO—, —SO ₂ —, and combinations thereof. Preferably there is. The divalent linking group is selected from the group consisting of an alkylene group, a phenylene group, —CO—, —NR ^a —, —O—, —S—, and SO ₂ —, or the group. It is more preferably a divalent linking group in which at least two groups are combined. The alkylene group preferably has 1 to 12 carbon atoms. The alkenylene group preferably has 2 to 12 carbon atoms. The number of carbon atoms of the divalent aromatic group is preferably 6-10.

In the formula, R represents a substituent, and m represents an integer of 0 to 5. When m represents an integer greater than or equal to 2, several R may be same or different. Preferred substituents for R are the same as those listed as preferred ranges for the substituents represented by R ¹ , R ² , and R ³ . m preferably represents an integer of 1 to 3, particularly preferably 2 or 3.

In the formula, R ⁴ , R ⁵ , R ⁶ , R ⁷ , R ⁸ and R ⁹ each independently represent a hydrogen atom or a substituent. The substituents represented by R ⁴ , R ⁵ , R ⁶ , R ⁷ , R ⁸ and R ⁹ are preferably the substituents represented by R ¹ , R ² and R ³ in the general formula (1). It is listed as a thing. As the horizontal alignment agent used in the present invention, the compounds described in paragraphs [0092] to [0096] of JP-A-2005-99248 can be used, and the synthesis method of these compounds is also described in the specification. ing.

In the formula, R represents a hydrogen atom or a methyl group, X represents an oxygen atom or a sulfur atom, Z represents a hydrogen atom or a fluorine atom, m is an integer of 1 to 6, and n is an integer of 1 to 12. Represents. In addition to the fluorine-containing polymer containing the general formula (4), the compounds described in JP-A-2005-206638 and JP-A-2006-91205 can be used as the unevenness improving polymer in coating as a horizontal alignment agent. Are also described in the specification.
The addition amount of the horizontal alignment agent is preferably 0.01 to 20% by mass, more preferably 0.01 to 10% by mass, and particularly preferably 0.02 to 1% by mass of the mass of the liquid crystal compound. In addition, the compounds represented by the general formulas (1) to (4) may be used alone or in combination of two or more.

[Post-processing of retardation layer]
Various post-treatments may be performed in order to modify the produced retardation layer. Examples of post-treatment include corona treatment for improving adhesion, addition of a plasticizer for improving flexibility, addition of a thermal polymerization inhibitor for improving storage stability, and a coupling treatment for improving reactivity. It is done. Further, when the polymer in the optically anisotropic layer has an unreacted reactive group, addition of a polymerization initiator corresponding to the reactive group is also an effective modifying means. Examples of the means for adding the plasticizer and the photopolymerization initiator include a means for immersing the optically anisotropic layer in a solution of the corresponding additive and a solution of the corresponding additive on the optically anisotropic layer. And means for infiltration. In addition, when another layer is applied on the optically anisotropic layer, an additive may be added to the coating solution of the layer and immersed in the optically anisotropic layer.

In addition, although the presence or absence of a shaft and the presence or absence of a layer can be patterned by the development process described later, since the type of liquid crystalline compound that can be dissolved by development differs depending on the type of development, in order to pattern the presence or absence of a layer What is necessary is just to select the kind of liquid crystalline compound appropriately. For example,
As the alkali-developable polymerizable liquid crystal compound, compounds described in “0063” to “0076” in JP-A No. 2007-199661 can be selected. In addition, as the polymerizable liquid crystalline compound for heat development, compounds I-1 to I-25 can be selected. Furthermore, compounds I-1 to I-25 can be selected as polymerizable liquid crystalline compounds for organic solvent development.

(Polarizing layer)
The patterned polarizing layer can be formed by patterning the polarizing layer. The type of the polarizing layer is not particularly limited and is not particularly limited as long as patterning is possible, but the polarizing layer in the patterning polarizing plate of the present invention is patterned in the absorption axis direction or the presence or absence of a layer. In order to facilitate, it is preferably formed from a composition containing a polymer having an orientation group in the side chain, as in the above-mentioned retardation layer, and the composition further comprises a liquid crystal compound. It is preferable that By further including a dichroic dye in the composition, a function as a polarizing layer can be imparted to a layer formed in the same manner as the retardation layer. A patterning polarizing layer formed from a polarizing layer formed from a composition containing a liquid crystalline compound and a dichroic dye comprises: a patterning retardation layer formed from a retardation layer formed from a composition containing a liquid crystalline compound; It can be manufactured similarly.

(Dichroic dye)
A dichroic dye is defined as a compound that dissolves in a host liquid crystal and has a function of absorbing light. The absorption maximum and absorption band of the dichroic dye are not particularly limited, but a dye having an absorption maximum in the yellow region (Y), magenta region (M), or cyan region (C) is preferable.

Although the dichroic dye used for a composition may be used independently, what mixed two or more may be used. When mixing a plurality of dyes, dyes having the same type of chromophore may be mixed, or dichroic dyes having different chromophores may be mixed. It is preferable to use a mixture of dichroic dyes having an absorption maximum.
Examples of known dichroic dyes include those described in AV Ivashchenko, Diachronic Dyes for Liquid Crystal Display, CRC, 1994.
The chromophore of the dichroic dye is not particularly limited. Is mentioned. Preferred are azo dyes, anthraquinone dyes, and phenoxazine dyes.

The azo dye may be any one such as a monoazo dye, a bisazo dye, a trisazo dye, a tetrakisazo dye, and a pentakisazo dye, but is preferably a monoazo dye, a bisazo dye, or a trisazo dye.
The ring structure contained in the azo dye includes aromatic groups (benzene ring, naphthalene ring, etc.) as well as heterocyclic rings (quinoline ring, pyridine ring, thiazole ring, benzothiazole ring, oxazole ring, benzoxazole ring, imidazole ring, Benzimidazole ring, pyrimidine ring, etc.).

  As the substituent of the anthraquinone dye, those containing an oxygen atom, a sulfur atom or a nitrogen atom are preferable, and examples thereof include an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkylamino group and an arylamino group. The substitution number of the substituent may be any number, but di-substitution, tri-substitution, and tetrakis substitution are preferred, and di-substitution and tri-substitution are particularly preferred. The substitution position of the substituent is not particularly limited, but preferably 1,4-position di-substitution, 1,5-position di-substitution, 1,4,5-position tri-substitution, 1,2,4-position tri-substitution, 1,2, They are 5-position tri-substituted, 1,2,4,5-position tetra-substituted and 1,2,5,6-position tetra-substituted structures.

The substituent of the phenoxazone dye (phenoxazin-3-one) preferably includes an oxygen atom, a sulfur atom or a nitrogen atom, and examples thereof include an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkylamino group and an arylamino group.
The dichroic dye used in the present invention has an aspect ratio (molecular major axis length / molecular minor axis length) of preferably 2 or more, more preferably 3 or more, and an angle formed between the molecular axis and the transition moment. Preferably, it is within 20 °, and the ratio of the absorbance at the maximum absorption wavelength in the major axis direction of the dye molecule to the absorbance in the minor axis direction is preferably 5 or more, more preferably 8 or more, and particularly preferably 10 or more. If it is the above, as a dichroic pigment | dye used for this invention, it can be used regardless of dye and a pigment. In particular, among dichroic dyes used in conventional dye-based polarizing films and guest-host type liquid crystal displays, a method of aligning in a liquid crystal cell after dissolving in nematic liquid crystal, a stretched and oriented PVA or a derivative film thereof When the dye is oriented by a method such as adsorption, the maximum value of the ratio of the absorbance in the orientation direction at a specific absorption wavelength to the absorbance in the direction orthogonal thereto is preferably 5 or more, preferably 8 or more, more preferably 10 What becomes the above is used suitably.

As dichroic dyes, merocyanine, styryl, azomethine, anthraquinone, azo, quinone, quinophthalone, perylene, indigo, tetrazine, etc. are known and practically used for weather resistance, etc. The azo and anthraquinone dichroic dyes used are preferred. In particular, azo dyes include disazo and trisazo. On the other hand, examples of the dichroic dye used in the polarizing film include polyazo dyes and anthraquinone dyes. More specific examples of the polyazo dye include stilbene and benzidine.

Specific examples thereof include compounds described in JP-A-9-73015, paragraphs “0012” to “0025”.
The dichroic dye may be a polymer having an orientation group in the side chain.

[Alignment layer]
As described above, an alignment layer may be used for forming the retardation layer and the polarizing layer. In this specification, the alignment layer may be referred to as an alignment film. Since the alignment layer functions so as to define the alignment direction of the liquid crystal compound provided thereon, the patterning retardation layer and the patterned polarizing layer can be easily obtained by patterning the function of the alignment film. The alignment layer is generally provided on a support or temporary support described later or an undercoat layer coated on the support or temporary support. The alignment layer may be any layer as long as it can impart alignment properties to the retardation layer and the polarizing layer, and typical examples include a photo alignment layer and a rubbing alignment layer.
The type of alignment layer can be selected and used regardless of the type of development described below.

(Photo-alignment layer)
The photo-alignment layer can be made from a photo-alignment material. As photo-alignment materials, photo-isomerization materials that reversibly change the alignment regulation force by changing only the molecular shape mainly by irradiating polarized light, and photo-reactive materials that change the molecule itself by irradiating polarized light. And is classified as The photo-alignment layer may use any of the above-mentioned photoisomerization material and photoreaction material, but it is more preferable to use a photoreaction material. As described above, since the photoreactive material is a material that reacts with polarized light to develop an alignment regulating force when irradiated with polarized light, it is possible to irreversibly develop an alignment regulating force. This is because the stability over time of the regulatory power is excellent.

The photoreactive material can be further classified according to the type of reaction caused by polarized light irradiation. Specifically, a photodimerization type material that develops an alignment regulation force by causing a photodimerization reaction, a photodegradable material that produces an orientation regulation force by producing a photodecomposition reaction, an orientation regulation by producing a photobinding reaction It can be divided into a photocoupled material that develops force, a photodecomposition-coupled material that develops alignment regulation force by causing a photodecomposition reaction and a photocoupled reaction, and the like. In the present invention, any of such photodimerization type material, photodecomposition type material, photocoupling type material, and photolysis-bonding type material may be used, and it is more preferable to use photodimerization type material.
Specific examples of the photo-alignment material are given below, but the present invention is not limited to the following specific examples. In addition, x, y, z in a formula shows the mole percentage of each repeating unit.

（ラビング配向層）
配向層の好ましい例としては、有機化合物（好ましくはポリマー）のラビング処理された層、無機化合物の斜方蒸着層、およびマイクログルーブを有する層、さらにω−トリコサン酸、ジオクタデシルメチルアンモニウムクロライドおよびステアリル酸メチル等のラングミュア・ブロジェット法（ＬＢ膜）により形成される累積膜、あるいは電場あるいは磁場の付与により誘電体を配向させた層を挙げることができる。

(Rubbing alignment layer)
Preferred examples of the alignment layer include a rubbing treatment layer of an organic compound (preferably a polymer), an oblique deposition layer of an inorganic compound, and a layer having a microgroove, and ω-tricosanoic acid, dioctadecylmethylammonium chloride and stearyl. Examples include a cumulative film formed by Langmuir-Blodgett method (LB film) such as methyl acid, or a layer in which a dielectric is oriented by applying an electric field or a magnetic field.

  Examples of organic compounds for the alignment layer include polymethyl methacrylate, acrylic acid / methacrylic acid copolymer, styrene / maleimide copolymer, polyvinyl alcohol, poly (N-methylolacrylamide), polyvinylpyrrolidone, styrene / vinyltoluene. Copolymer, chlorosulfonated polyethylene, nitrocellulose, polyvinyl chloride, chlorinated polyolefin, polyester, polyimide, vinyl acetate / vinyl chloride copolymer, ethylene / vinyl acetate copolymer, carboxymethyl cellulose, polyethylene, polypropylene, polycarbonate, etc. And polymers such as silane coupling agents. Examples of preferable polymers include polyimide, polystyrene, polymers of styrene derivatives, gelatin, polyvinyl alcohol, and alkyl-modified polyvinyl alcohol having an alkyl group (preferably having 6 or more carbon atoms).

  A polymer is preferably used for forming the alignment layer. The type of polymer that can be used can be determined according to the orientation (particularly the average tilt angle) of the liquid crystal compound. For example, in order to align the liquid crystalline compound horizontally, a polymer that does not decrease the surface energy of the alignment layer (ordinary alignment polymer) is used. Specific types of polymers are described in various documents about liquid crystal cells or optical compensation sheets. For example, polyvinyl alcohol or modified polyvinyl alcohol, a copolymer with polyacrylic acid or polyacrylate, polyvinyl pyrrolidone, cellulose, or modified cellulose are preferably used. The alignment layer material may have a functional group capable of reacting with the reactive group of the liquid crystal compound. The reactive group can be introduced by introducing a repeating unit having a reactive group in the side chain or as a substituent of a cyclic group. It is more preferable to use an alignment layer that forms a chemical bond with the liquid crystal compound at the interface. Such an alignment layer is described in JP-A-9-152509, and acid chloride or Karenz MOI (manufactured by Showa Denko KK). The modified polyvinyl alcohol in which an acrylic group is introduced into the side chain by using The thickness of the alignment layer is preferably 0.01 to 5 μm, and more preferably 0.05 to 2 μm. The alignment layer may have a function as an oxygen blocking film.

  A polyimide film (preferably fluorine atom-containing polyimide) widely used as an alignment layer for LCD is also preferable as the organic alignment layer. This is a polyamic acid (for example, LQ / LX series manufactured by Hitachi Chemical Co., Ltd., SE series manufactured by Nissan Chemical Co., Ltd., etc.) is applied to the support surface and baked at 100 to 300 ° C. for 0.5 to 1 hour. And then obtained by rubbing.

  Moreover, the rubbing process can utilize a processing method widely adopted as a liquid crystal alignment process of LCD. That is, a method of obtaining the orientation by rubbing the surface of the orientation layer in a certain direction using paper, gauze, felt, rubber, nylon, polyester fiber or the like can be used. Generally, it is carried out by rubbing several times using a cloth or the like in which fibers having a uniform length and thickness are planted on average.

Moreover, as a vapor deposition material for the inorganic oblique vapor deposition film, SiO ₂ is representative, and metal oxides such as TiO ₂ and ZnO ₂ , fluorides such as MgF ₂ , and metals such as Au and Al. The metal oxide can be used as an oblique deposition material as long as it has a high dielectric constant, and is not limited to the above. The inorganic oblique deposition film can be formed using a deposition apparatus. An inorganic oblique vapor deposition film can be formed by fixing the film (support) and performing vapor deposition, or moving the long film and performing continuous vapor deposition.

(Patterning method)
[Pattern exposure]
In any of the retardation layer containing a liquid crystalline compound and the polarizing layer containing a liquid crystalline compound, pattern exposure can be performed for patterning of the layer. Usually, pattern exposure is performed so that the area | region which wants to leave birefringence or polarization property may be exposed about a layer.
Moreover, the photo-alignment layer by which the orientation direction was prescribed | regulated by pattern shape can be obtained by performing pattern exposure of polarized ultraviolet light to the composition for photo-alignment layer formation containing a photo-alignment material.
As a pattern exposure method, contact exposure using a mask, proxy exposure, projection exposure, or the like may be used, or direct drawing may be performed by focusing on a predetermined position without using a mask using a laser or an electron beam. The irradiation wavelength of the light source for the exposure preferably has a peak at 250 to 450 nm, and more preferably has a peak at 300 to 410 nm. In the case where a step is simultaneously formed by the photosensitive resin layer, it is also preferable to irradiate light in a wavelength region that can cure the resin layer (eg, 365 nm, 405 nm, etc.). Specifically, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, a blue laser, and the like can be given. Usually 3~2000mJ / cm ² about the preferred amount of exposure, and more preferably 5~1000mJ / cm ² or so, more preferably 10 to 500 mJ / cm ² or so, and most preferably at about 10 to 100 mJ / cm ² .

[developing]
Patterning with or without a layer or with or without an axis in the axial direction can be performed by development.
By producing a retardation layer or a polarizing layer using the above liquid crystalline compound for heat development and performing heat development, the exposed portion of the layer is fixed with the alignment of liquid crystal molecules by ultraviolet light exposure to generate an axial direction. On the other hand, since the alignment of the liquid crystal molecules is not fixed in the unexposed portion of the layer and the alignment is randomized by heat and no axial direction is generated, patterning with or without an axis is possible.
A retardation layer or polarizing layer is prepared using the alkali-developable liquid crystalline compound and subjected to alkaline liquid development, or a retardation layer or polarizing layer is prepared using the organic solvent developing liquid crystalline compound. Then, by performing organic solvent development, the alignment of the liquid crystal molecules is fixed in the exposed portion of the layer by ultraviolet light exposure and does not dissolve in the developer. On the other hand, since the alignment of the liquid crystal molecules is not fixed in the unexposed portion of the layer, the layer is dissolved, and the presence or absence of the layer (the unmissed portion of the layer and the missing portion of the layer) can be patterned.

(Heat development)
The presence / absence of the shaft can be produced by baking the pattern-exposed layer at 80 ° C. or higher and 400 ° C. or lower. Furthermore, patterning of the phase difference amount is also possible.
Baking reduces the retardation of the unexposed areas in the layer, while the exposed areas have little or no or no increase in retardation, resulting in the unexposed areas of the retardation of the exposed areas. Compared to the above, a pattern of the presence or absence of an axis or a phase difference amount is produced.
In order to exert an optical effect, the retardation of the exposed portion after baking is preferably 5 nm or more, more preferably 10 nm or more and 5000 nm or less, and most preferably 20 nm or more and 2000 nm or less. When the thickness is 5 nm or less, it is difficult to visually identify the produced birefringence pattern.

  In order to exert an optical effect, the retardation after baking of the unexposed portion in the layer is preferably 80% or less before baking, more preferably 60% or less before baking, and baking. It is more preferably 20% or less, and most preferably less than 5 nm.

(Alkali development)
Although it does not specifically limit as aqueous alkali solution used for an alkali image development, If a typical thing is illustrated, aqueous solution, such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, a pyridine, a triethanolamine, will be mentioned. The pH of the aqueous solution may be 7.1 to 14.0, but is preferably 7.1 to 12.0, more preferably 8.0 to 10.0 from the viewpoint of developability and waste liquid treatment. . The alkaline aqueous solution may contain a surfactant or an organic solvent miscible with water in order to further improve the developability. As the surfactant, an anionic surfactant, a cationic surfactant, or a nonionic surfactant can be used. Among these, the use of an anionic surfactant and a nonionic surfactant is preferable from the viewpoint of the transparency of the solution. These can also be used in combination. Examples of organic solvents miscible with water include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-butyl ether, and benzyl alcohol. , Acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, N-methylpyrrolidone, tetrahydrofuran, acetonitrile, etc. it can. The content of these organic solvents is preferably 70% by mass or less, more preferably 50% by mass or less, and still more preferably 30% by mass or less with respect to the total solvent.

(Organic solvent development)
Examples of organic solvents used for organic solvent development include amides (eg, N, N-dimethylformamide), sulfoxides (eg, dimethyl sulfoxide), heterocyclic compounds (eg, pyridine), hydrocarbons (eg, benzene, hexane). ), Alkyl halides (eg, chloroform, dichloromethane), esters (eg, methyl acetate, butyl acetate), ketones (eg, acetone, methyl ethyl ketone), ethers (eg, tetrahydrofuran, 1,2-dimethoxyethane). Of these, alkyl halides and ketones are preferred. Two or more organic solvents may be used in combination.

Known methods such as paddle development, shower development, shower & spin development, and dip development can be used as a method for removing a portion dissolved without being fixed. By spraying a developer onto the exposed resin layer with a shower, the uncured portion can be removed. In addition, it is preferable to spray an alkaline solution having a low solubility of the resin layer by a shower or the like before development to remove the thermoplastic resin layer, the intermediate layer, and the like. Further, after the development, it is preferable to remove the development residue while spraying a cleaning agent or the like with a shower and rubbing with a brush or the like. As the cleaning liquid, known ones can be used, including (phosphate, silicate, nonionic surfactant, antifoaming agent and stabilizer, trade name “T-SD1 (manufactured by Fuji Photo Film Co., Ltd.)”, or Sodium carbonate / phenoxyoxyethylene surfactant-containing, trade name “T-SD2 (Fuji Photo Film Co., Ltd.)”) is preferred. The liquid temperature of the developer is preferably 20 ° C. to 40 ° C., and the pH of the developer is preferably 8 to 13.

[Axial patterning]
The method of patterning in the axial direction is not particularly limited. As described above, patterning in the direction of the slow axis in the retardation layer and the direction of the absorption axis in the polarizing layer can be preferably performed using the alignment layer. .
A layer containing a liquid crystal compound provided on the photo-alignment layer, preferably a layer containing a liquid crystal compound provided directly on the photo-alignment layer is a polarized light from which the photo-alignment layer was produced when irradiated with ultraviolet light. Liquid crystal molecules are aligned in the polarization direction of ultraviolet light. Similarly, a layer containing a liquid crystal compound provided on the rubbing alignment layer, preferably a layer containing a liquid crystal compound provided directly on the rubbing alignment layer, is liquid crystal in the rubbing direction when irradiated with ultraviolet light. The molecules are oriented.

Therefore, when a patterned retardation layer or a patterned polarizing layer is provided on the photo-alignment layer, the layer formed from the photo-alignment layer-forming composition containing the photo-alignment material is irradiated with polarized ultraviolet light through a mask or the like. Then, the photo-alignment property of this layer is patterned. A composition containing a liquid crystal compound is applied on the obtained photo-alignment layer, dried, etc., and then irradiated with ultraviolet light to obtain a retardation layer or a polarizing layer whose axial direction is patterned. Similarly, when providing a patterned retardation layer or a patterned polarizing layer on a rubbing alignment layer, the layer before rubbing formed from the rubbing alignment layer forming composition is rubbed through a mask or the like, and this layer is formed. The rubbing direction is patterned. A composition containing a liquid crystal compound is applied onto the obtained rubbing alignment layer, dried, etc., and then irradiated with ultraviolet light to obtain a retardation layer or a polarizing layer whose axial direction is patterned.

Flow charts of examples of the method of patterning in the axial direction of the polarizing layer or retardation layer made of a composition containing a liquid crystal compound are shown in FIGS.

(Other layers)
[Support]
The patterning polarizing plate of the present invention, or the patterning polarizing layer or the patterning retardation layer used for the production of the patterning polarizing plate may have a support. The support is not particularly limited, and may be rigid or flexible. The support in the patterning polarizing layer or the patterning retardation layer may be peeled off after the two are bonded together.
The rigid support is not particularly limited, but is a known glass plate such as a soda glass plate having a silicon oxide film on its surface, a low expansion glass, a non-alkali glass, a quartz glass plate, a metal such as an aluminum plate, an iron plate, or a SUS plate. A board, a resin board, a ceramic board, a stone board, etc. are mentioned. There are no particular limitations on the flexible support, but cellulose esters (eg, cellulose acetate, cellulose propionate, cellulose butyrate), polyolefins (eg, norbornene polymers), poly (meth) acrylic acid esters (eg, polymethyl) Methacrylate), polycarbonate, polyester and polysulfone, and norbornene-based plastic films. In view of ease of handling, the thickness of the rigid support is preferably 100 to 3000 μm, and more preferably 300 to 1500 μm. As a film thickness of a flexible support body, 3-500 micrometers is preferable and 10-200 micrometers is more preferable.

(Production method using transfer material)
The patterning polarizing layer or the patterning retardation layer may be produced using a transfer material. The flow in that case is shown in FIG.
It is also possible to create a patterned elliptically polarizing plate using a transfer material. The transfer material may be used only for the preparation of the patterning retardation layer, the transfer material may be used only for the preparation of the patterning polarizing layer, or the transfer material is used for the preparation of both the patterning retardation layer and the patterning polarizing layer. May be. By using the transfer material, application using an organic solvent can be performed at a place different from the place where the patterning material is produced, and the work and equipment burden when using the patterning material are reduced.
The functional layer useful in the transfer material will be described below.

[Temporary support]
The transfer material preferably has a temporary support. The temporary support may be transparent or opaque and is not particularly limited. Examples of polymers constituting the temporary support include cellulose esters (eg, cellulose acetate, cellulose propionate, cellulose butyrate), polyolefins (eg, norbornene-based polymers), poly (meth) acrylic acid esters (eg, poly Methyl methacrylate), polycarbonate, polyester and polysulfone, norbornene-based polymers. For the purpose of inspecting optical properties in the production process, the transparent support is preferably a transparent and low birefringent material, and from the viewpoint of low birefringence, cellulose ester and norbornene are preferred. As a commercially available norbornene-based polymer, Arton (manufactured by JSR Co., Ltd.), Zeonex, Zeonore (manufactured by Nippon Zeon Co., Ltd.), or the like can be used. Inexpensive polycarbonate, polyethylene terephthalate, and the like are also preferably used.

[Transfer adhesive layer]
The transfer material preferably has a transfer adhesive layer. The transfer adhesive layer is not particularly limited as long as it is transparent, uncolored, and has sufficient transferability, and includes an adhesive layer made of an adhesive, a pressure-sensitive resin layer, a heat-sensitive resin layer, a photosensitive resin layer, and the like. However, a photosensitive or heat-sensitive resin layer is desirable from the viewpoint of baking resistance required when used for a substrate for a liquid crystal display device.

[Adhesive layer]
As the pressure-sensitive adhesive, for example, a material that is excellent in optical transparency and exhibits appropriate wettability, cohesiveness, and adhesive pressure-sensitive adhesive properties is preferable. Specific examples include pressure-sensitive adhesives that are appropriately prepared using a polymer such as an acrylic polymer, silicone polymer, polyester, polyurethane, polyether, and synthetic rubber as a base polymer. Control of the adhesive properties of the pressure-sensitive adhesive layer can be achieved by, for example, controlling the degree of crosslinking and molecular weight depending on the composition and molecular weight of the base polymer forming the pressure-sensitive adhesive layer, the crosslinking method, the content ratio of the crosslinkable functional group, the blending ratio of the crosslinking agent, etc. It can be suitably performed by a conventionally known method such as adjustment.

[Pressure-sensitive resin layer]
The pressure-sensitive resin layer is not particularly limited as long as adhesiveness is exhibited by applying pressure, and rubber-based, acrylic-based, vinyl ether-based, and silicone-based pressure-sensitive adhesives can be used as the pressure-sensitive adhesive. In the production stage and coating stage of adhesives, solvent-based adhesives, non-aqueous emulsion adhesives, water-based emulsion adhesives, water-soluble adhesives, hot-melt adhesives, liquid curable adhesives, delayeds A tack-type adhesive can be used. The rubber-based pressure-sensitive adhesive is disclosed in New Polymer Library 13 “Adhesion Technology”, Kobunshi Publishing Co., Ltd. 41 (1987). The vinyl ether-based pressure-sensitive adhesives include those mainly composed of alkyl vinyl ether polymers having 2 to 4 carbon atoms, and those in which a plasticizer is mixed with vinyl chloride / vinyl acetate copolymer, vinyl acetate polymer, polyvinyl butyral, or the like. As the silicone-based pressure-sensitive adhesive, a rubber-like siloxane can be used to give film formation and film condensing power, and a resin-like siloxane can be used to give stickiness and adhesion.

[Thermosensitive resin layer]
The heat-sensitive resin layer is not particularly limited as long as it exhibits adhesiveness by applying heat, and examples of the heat-sensitive adhesive include a heat-meltable compound and a thermoplastic resin. Examples of the heat-fusible compound include low molecular weight thermoplastic resins such as polystyrene resin, acrylic resin, styrene-acrylic resin, polyester resin, and polyurethane resin, carnauba wax, mole, candelilla wax, rice wax, and Plant waxes such as aucuric wax, beeswax, insect wax, shellac, and animal waxes such as whale wax, paraffin wax, microcrystalline wax, polyethylene wax, Fischer-Tropsch wax, ester wax, and oxidation Examples include various waxes such as petroleum waxes such as waxes, and mineral waxes such as montan wax, ozokerite, and ceresin wax. Furthermore, rosin derivatives such as rosin, hydrogenated rosin, polymerized rosin, rosin modified glycerin, rosin modified maleic resin, rosin modified polyester resin, rosin modified phenolic resin and ester gum, phenol resin, terpene resin, ketone resin, cyclopentadiene Examples thereof include resins, aromatic hydrocarbon resins, aliphatic hydrocarbon resins, and alicyclic hydrocarbon resins.

  These heat-meltable compounds preferably have a molecular weight of usually 10,000 or less, particularly 5,000 or less and a melting point or softening point in the range of 50 to 150 ° C. These hot melt compounds may be used alone or in combination of two or more. Examples of the thermoplastic resin include ethylene copolymers, polyamide resins, polyester resins, polyurethane resins, polyolefin resins, acrylic resins, and cellulose resins. Of these, ethylene copolymers and the like are particularly preferably used.

[Photosensitive resin layer]
The photosensitive resin layer is made of a photosensitive resin composition, and may be positive type or negative type, and is not particularly limited. A commercially available resist material can be used, and it is preferable to exhibit adhesiveness by light irradiation. In view of environmental and explosion-proof problems in the manufacturing process of articles such as substrates for liquid crystal display devices, aqueous development with an organic solvent of 5% or less is preferred, and alkaline development is particularly preferred. The photosensitive resin layer is preferably formed from a resin composition containing at least (1) a polymer, (2) a monomer or oligomer, and (3) a photopolymerization initiator or a photopolymerization initiator system.

Hereinafter, the components (1) to (3) will be described.
(1) Polymer As the polymer (hereinafter sometimes simply referred to as “binder”), an alkali-soluble resin composed of a polymer having a polar group such as a carboxylic acid group or a carboxylic acid group in the side chain is preferable. Examples thereof include JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, JP-B-54-25957, JP-A-59-53836, and JP-A-57-36. A methacrylic acid copolymer, an acrylic acid copolymer, an itaconic acid copolymer, a crotonic acid copolymer, a maleic acid copolymer, a partially esterified maleic acid copolymer as described in JP-A-59-71048 Etc. Moreover, the cellulose derivative which has a carboxylic acid group in a side chain can also be mentioned, In addition to this, what added the cyclic acid anhydride to the polymer which has a hydroxyl group can also be used preferably. Further, as particularly preferred examples, copolymers of benzyl (meth) acrylate and (meth) acrylic acid described in US Pat. No. 4,139,391, benzyl (meth) acrylate, (meth) acrylic acid and other monomers And a multi-component copolymer. These binder polymers having polar groups may be used alone or in the form of a composition used in combination with ordinary film-forming polymers. The polymer content relative to the total solid content is generally 20 to 70% by mass, preferably 25 to 65% by mass, and more preferably 25 to 45% by mass.

(2) Monomer or oligomer The monomer or oligomer used in the photosensitive resin layer is preferably a monomer or oligomer that has two or more ethylenically unsaturated double bonds and undergoes addition polymerization by light irradiation. . Examples of such monomers and oligomers include compounds having at least one addition-polymerizable ethylenically unsaturated group in the molecule and having a boiling point of 100 ° C. or higher at normal pressure. Examples include monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) ) Acrylate, trimethylolethane triacrylate, trimethylolpropane tri (meth) acrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, di Pentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexa Diol di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri (meth) acrylate; multifunctional such as trimethylolpropane and glycerin Polyfunctional acrylates and polyfunctional methacrylates such as those obtained by adding ethylene oxide or propylene oxide to alcohol and then (meth) acrylated can be mentioned.

Further, urethane acrylates described in JP-B-48-41708, JP-B-50-6034 and JP-A-51-37193; JP-A-48-64183, JP-B-49-43191 And polyester acrylates described in JP-B-52-30490; polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid.
Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate are preferable.
In addition, “polymerizable compound B” described in JP-A-11-133600 can also be mentioned as a preferable example.
These monomers or oligomers may be used alone or in admixture of two or more. The content of the colored resin composition with respect to the total solid content is generally 5 to 50% by mass, and 10 to 40% by mass. Is preferred.

(3) Photopolymerization initiator or photopolymerization initiator system As the photopolymerization initiator or photopolymerization initiator system used in the photosensitive resin layer, a vicinal poly disclosed in US Pat. No. 2,367,660 is used. Ketaldonyl compounds, acyloin ether compounds described in US Pat. No. 2,448,828, aromatic acyloin compounds substituted with α-hydrocarbons described in US Pat. No. 2,722,512, US Pat. No. 3,046,127 And a polynuclear quinone compound described in U.S. Pat. No. 2,951,758, a combination of a triarylimidazole dimer described in U.S. Pat. No. 3,549,367 and a p-aminoketone, and a benzoin described in JP-B 51-48516. Thiazole compounds and trihalomethyl-s-triazine compounds, US Pat. No. 4,239,850 It may be mentioned triazine compounds, U.S. Patent trihalomethyl oxadiazole compounds described in No. 4,212,976 specification or the like - trihalomethyl listed in. In particular, trihalomethyl-s-triazine, trihalomethyloxadiazole, and triarylimidazole dimer are preferable.
In addition, “polymerization initiator C” described in JP-A-11-133600 can also be mentioned as a preferable example.

These photopolymerization initiators or photopolymerization initiator systems may be used singly or as a mixture of two or more, but it is particularly preferable to use two or more. When at least two kinds of photopolymerization initiators are used, display characteristics, particularly display unevenness, can be reduced.
The content of the photopolymerization initiator or the photopolymerization initiator system with respect to the total solid content of the colored resin composition is generally 0.5 to 20% by mass, and preferably 1 to 15% by mass.

The photosensitive resin layer preferably contains an appropriate surfactant from the viewpoint of effectively preventing unevenness. The surfactant can be used as long as it is mixed with the photosensitive resin composition. Preferred surfactants used in the present invention include JP 2003-337424 A [0090] to [0091], JP 2003-177522 A [0092] to [0093], and JP 2003-177523 A [0094]. ] To [0095], JP 2003-177521 A [0096] to [0097], JP 2003-177519 A [0098] to [0099], JP 2003-177520 A [0100] to [0101]. [0102] to [0103] of JP-A-11-133600 and surfactants disclosed as inventions of JP-A-6-16684 are preferred. In order to obtain a higher effect, a fluorosurfactant and / or a silicon surfactant (a fluorosurfactant or a silicon surfactant, a surfactant containing both a fluorine atom and a silicon atom) ) Or two or more types are preferable, and a fluorosurfactant is most preferable. When using a fluorosurfactant, the number of fluorine atoms in the fluorine-containing substituent in the surfactant molecule is preferably 1 to 38, more preferably 5 to 25, and most preferably 7 to 20. If the number of fluorine atoms is too large, it is not preferable in that the solubility in an ordinary solvent containing no fluorine is lowered. If the number of fluorine atoms is too small, it is not preferable in that the effect of improving unevenness cannot be obtained.
As a particularly preferred surfactant, the following general formula (a) and a monomer represented by the general formula (b) are included, and the mass ratio of the general formula (a) / the general formula (b) is 20/80 to 60 / The thing containing 40 copolymers is mentioned.

In the formula, R ¹ , R ² and R ³ each independently represent a hydrogen atom or a methyl group, and R ⁴ represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. n represents an integer of 1 to 18, and m represents an integer of 2 to 14. p and q represent integers of 0 to 18, but are not included when both p and q are simultaneously 0.

A particularly preferred surfactant represented by the general formula (a) is referred to as a monomer (a), and a monomer represented by the general formula (b) is referred to as a monomer (b). C _m F _{2m + 1} shown in the general formula (a) may be linear or branched. m shows the integer of 2-14, Preferably it is an integer of 4-12. The content of C _m F _{2m + 1} is preferably 20 to 70% by mass, particularly preferably 40 to 60% by mass, based on the monomer (a). R ¹ represents a hydrogen atom or a methyl group. Moreover, n shows 1-18, and 2-10 are preferable especially. R ² and R ³ shown in the general formula (b) each independently represent a hydrogen atom or a methyl group, and R ⁴ represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. p and q each represent an integer of 0 to 18, but p and q do not include 0. p and q are preferably 2 to 8.

Moreover, as a particularly preferable monomer (a) contained in one molecule of the surfactant, those having the same structure or different structures within the above defined range may be used. The same applies to the monomer (b).
The particularly preferable weight average molecular weight Mw of the surfactant is preferably 1000 to 40000, and more preferably 5000 to 20000. The surfactant contains the monomer represented by the general formula (a) and the general formula (b), and the weight ratio of the general formula (a) / the general formula (b) is 20/80 to 60/40. It is characterized by containing a coalescence. Particularly preferred 100 parts by weight of the surfactant is preferably such that the monomer (a) is 20 to 60 parts by weight, the monomer (b) is 80 to 40 parts by weight, and other optional monomers are the remaining parts by weight. It is preferable that the monomer (a) is composed of 25 to 60 parts by mass, the monomer (b) is composed of 60 to 40 parts by mass, and other optional monomers are composed of the remaining part by mass.

Examples of copolymerizable monomers other than the monomers (a) and (b) include styrene, vinyl toluene, α-methyl styrene, 2-methyl styrene, chlorostyrene, vinyl benzoic acid, sodium vinylbenzene sulfonate, aminostyrene, and the like. Styrene and its derivatives, substituted products, dienes such as butadiene and isoprene, acrylonitrile, vinyl ethers, methacrylic acid, acrylic acid, itaconic acid, crotonic acid, maleic acid, partially esterified maleic acid, styrene sulfonic acid maleic anhydride, silica And vinyl monomers such as cinnamate, vinyl chloride and vinyl acetate.
Particularly preferred surfactants are copolymers such as monomer (a) and monomer (b), but the monomer sequence is not particularly limited and may be random or regular, for example, block or graft. Furthermore, particularly preferable surfactants can be used by mixing two or more of those having different molecular structures and / or monomer compositions.
As content of the said surfactant, 0.01-10 mass% is preferable with respect to the layer total solid of a photosensitive resin layer, and 0.1-7 mass% is especially preferable. The surfactant contains a predetermined amount of a surfactant having a specific structure, an ethylene oxide group, and a polypropylene oxide group, and a liquid crystal provided with the photosensitive resin layer by containing it in a specific range in the photosensitive resin layer. Display unevenness of the display device is improved. If it is less than 0.01% by mass relative to the total solid content, the display unevenness is not improved, and if it exceeds 10% by mass, the effect of improving the display unevenness does not appear much. When the above-mentioned particularly preferable surfactant is contained in the photosensitive resin layer, it is preferable in that display unevenness is improved.

  Specific examples of preferable fluorine-based surfactants include compounds described in paragraph numbers [0054] to [0063] of JP-A No. 2004-163610. Moreover, the following commercially available surfactant can also be used as it is. Examples of commercially available surfactants that can be used include F-top EF301 and EF303 (manufactured by Shin-Akita Kasei Co., Ltd.), Florard FC430 and 431 (manufactured by Sumitomo 3M Ltd.), MegaFuck F171, F173, F176, F189, and R08. (Dainippon Ink Co., Ltd.), Surflon S-382, SC101, 102, 103, 104, 105, 106 (Asahi Glass Co., Ltd.) and other fluorine-based surfactants, or silicon-based surfactants. be able to. Polysiloxane polymers KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.) and Troisol S-366 (manufactured by Troy Chemical Co., Ltd.) can also be used as the silicon surfactant. In the present invention, a compound described in paragraphs [0046] to [0052] of JP-A No. 2004-331812, which is a fluorine-based surfactant not containing the monomer represented by the general formula (a), is used. Is also preferable.

[Mechanical property control layer]
It is preferable to form a mechanical property control layer between the temporary support and the retardation layer of the transfer material in order to control the mechanical properties and the unevenness followability. As the mechanical property control layer, those exhibiting flexible elasticity, those softened by heat, those exhibiting fluidity by heat, and the like are preferable, and a thermoplastic resin layer is particularly preferable. As the component used for the thermoplastic resin layer, organic polymer materials described in JP-A-5-72724 are preferable. It is particularly preferable that the softening point by the measurement method is selected from organic polymer substances having a temperature of about 80 ° C. or less. Specifically, polyolefins such as polyethylene and polypropylene, ethylene copolymers such as ethylene and vinyl acetate or saponified products thereof, ethylene and acrylic acid esters or saponified products thereof, polyvinyl chloride, vinyl chloride and vinyl acetate and saponified products thereof. Vinyl chloride copolymer such as fluoride, polyvinylidene chloride, vinylidene chloride copolymer, polystyrene, styrene copolymer such as styrene and (meth) acrylic acid ester or saponified product thereof, polyvinyl toluene, vinyl toluene and (meta ) Vinyl toluene copolymer such as acrylic ester or saponified product thereof, poly (meth) acrylic ester, (meth) acrylic ester copolymer such as butyl (meth) acrylate and vinyl acetate, vinyl acetate copolymer Combined nylon, copolymer nylon, N-alkoxy Chill nylon, and organic polymeric polyamide resins such as N- dimethylamino nylon.

[Peeling layer]
The transfer material may have a release layer on the temporary support. The release layer controls the adhesion between the temporary support and the release layer or between the release layer and the layer immediately above the release layer, and serves to assist the release of the temporary support after transferring the retardation layer. In addition, the other functional layers described above, such as an alignment layer and a mechanical property control layer, may have a function as a release layer.
In the transfer material, it is preferable to provide an intermediate layer for the purpose of preventing mixing of components during application of a plurality of application layers and during storage after application. As the intermediate layer, it is preferable to use an oxygen barrier film having an oxygen barrier function described in JP-A-5-72724 as an “isolation layer” or the alignment layer for forming the optical anisotropy. Of these, a layer formed by mixing polyvinyl alcohol or polyvinylpyrrolidone and one or more of these modified products is particularly preferable. The thermoplastic resin layer, the oxygen blocking film, and the alignment layer can also be used.

[Surface protective layer]
A thin surface protective layer is preferably provided on the resin layer in order to protect it from contamination and damage during storage. The nature of the surface protective layer is not particularly limited and may be made of the same or similar material as the temporary support, but it must be easily separated from the adjacent layer (for example, transfer adhesive layer). As a material for the surface protective layer, for example, silicon paper, polyolefin or polytetrafluoroethylene sheet is suitable.

  Each layer such as a retardation layer, a photosensitive resin layer, a transfer adhesive layer, an orientation layer, a thermoplastic resin layer, a mechanical property control layer and an intermediate layer is formed by a dip coating method, an air knife coating method, a spin coating method, a slit coating method, It can be formed by coating by a curtain coating method, a roller coating method, a wire bar coating method, a gravure coating method or an extrusion coating method (US Pat. No. 2,681,294). Two or more layers may be applied simultaneously. The method of simultaneous application is described in US Pat. Nos. 2,761,791, 2,941,898, 3,508,947, and 3,526,528 and Yuji Harasaki, Coating Engineering, page 253, Asakura Shoten (1973).

[Method of transferring transfer material onto transfer material]
The method for transferring the transfer material onto a transfer material such as a support (substrate) is not particularly limited, and the method is not particularly limited as long as the retardation layer can be transferred onto the substrate. For example, a transfer material formed in a film shape can be attached by pressing or thermocompression bonding with a roller or flat plate heated and / or pressurized using a laminator with the transfer adhesive layer surface side of the transfer material surface side. . Specific examples include laminators and laminating methods described in JP-A-7-110575, JP-A-11-77942, JP-A-2000-334836, and JP-A-2002-148794. From this point of view, it is preferable to use the method described in JP-A-7-110575.
Examples of the material to be transferred include a support, a laminate including a support and another functional layer.

(Preparation of patterned elliptically polarizing plate)
The patterned elliptically polarizing plate was prepared by sequentially applying the alignment layer and the polarizing layer as described above on the patterned retardation layer prepared as described above, and providing the patterned polarizing layer, or as described above. As described above, the alignment layer and the retardation layer are sequentially coated on the patterning polarizing layer to provide the patterning retardation layer. Furthermore, the patterning elliptically polarizing plate can be formed by bonding a patterning retardation plate and a patterning polarizing plate. When pasting, it is desirable to use an adhesive.
The same adhesive as the transfer adhesive layer can be used.

The present invention will be described more specifically with reference to the following examples. The materials, reagents, amounts and ratios of substances, operations, and the like shown in the following examples can be appropriately changed without departing from the gist of the present invention. Therefore, the scope of the present invention is not limited to the following specific examples.

First, a preparation method and a production method of each material will be described.

(Preparation method of glass substrate)
A smoothing agent (COLOR MOSAIC CT-2000L manufactured by Fuji Film Electro Materials Co., Ltd.) is applied to a glass substrate by a spin coating method (1000 rpm, 30 seconds), and heated in an oven at 200 ° C. for 1 hour.
(Method for producing photo-alignment film H-1)
A 1 mass% tetrahydrofuran solution of the following compound P-16 (x = 0.9, y = 0.1) is prepared. This solution is applied onto the glass substrate by spin coating (3500 rpm, 20 seconds) so that the thickness after drying is about 0.05 to 0.15 μm, and dried at 100 ° C. for 2 minutes.

The film obtained above is irradiated with ultraviolet rays using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm under air. At this time, a wire grid polarizer (manufactured by Moxtek, ProFlux PPL02) is set in direction 1, and exposure is further performed through a mask (quartz exposure mask having an image pattern). The distance between the exposure mask surface and the photo- alignment film is set to 200 μm. The illuminance of ultraviolet rays used at this time is 100 mW / cm ² in the UV-A region (integration of wavelengths 380 nm to 320 nm), and the irradiation amount is 1000 mJ / cm ² in the UV-A region.

Furthermore, after applying a methanol solution of 1% by weight photoacid generator (Chiba, UVI-6974), ultraviolet rays were glassed using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm under air. By irradiating the entire surface of the substrate, a photo-alignment film H-1 is produced. The illuminance of ultraviolet rays used at this time is 260 mW / cm ² in the UV-A region (integration of wavelengths 380 nm to 320 nm), and the irradiation amount is 2600 mJ / cm ² in the UV-A region.

(Method for producing rubbing alignment film H-2)
An alignment film coating solution RN-1199 (manufactured by Nissan Chemical Industries, Ltd.) is spin-coated on a glass substrate (3000 rpm / 30 seconds) and dried in an 80 ° C. oven for 3 minutes. Then, it is further heated in a 220 ° C. clean oven for 60 minutes.
A mask is placed on the substrate obtained by referring to the description of paragraph number “0181” of Japanese Patent Laid-Open No. 2006-221189, and rubbing is performed in direction 1 from the top.

(Production method of retardation layer)
Application of alkali-developable liquid crystalline composition, patterning exposure, and development (preparation of coating liquid LC-1 for retardation layer)
After preparing the following composition, it is filtered through a polypropylene filter having a pore size of 0.2 μm and used as a coating liquid LC-1 for retardation layer.
LC-1-1 was obtained from Tetrahedron Lett. Synthesized according to the method described in Journal, Vol. 43, page 6793 (2002). LC-1-2 is synthesized by the method described in EP1388538A1, page 21.
────────────────────────────────────────
Coating composition for retardation layer (%)
────────────────────────────────────────
Bar-shaped liquid crystal (Paliocolor LC242, BASF Japan) 25.42
4,4′-Azoxydianisole 0.52
CH ₂ = CH-COO (CH ₂ ) ₄ COO-Ph-COO-Ph-COOH 3.30
CH ₂ = CH-COO (CH ₂ ) ₄ COO-Ph-COOH 3.30
(However, Ph represents a phenylene group)
Horizontal alignment agent (LC-1-1) 0.10
Photopolymerization initiator (LC-1-2) 1.36
Methyl ethyl ketone 66.0
────────────────────────────────────────

(Patterning exposure method)
The LC-1 solution is applied with the # 6 wire bar coater on the photo-alignment film H-1 or the rubbing alignment film H-2 prepared above, and the film surface temperature is 95 ° C. for 2 minutes by heating and aging, and uniform. A layer having a liquid crystal phase is formed. Thereafter, a mask is applied, and UV light is irradiated at an illuminance of 200 mW / cm ² and an irradiation amount of 200 mJ / cm ² in a nitrogen atmosphere with an oxygen concentration of 0.3% or less.

(Development method)
Using an aqueous solution containing 2.38% tetramethylammonium hydroxide and 50% methanol with logP = -0.27 as the organic solvent as the developer, the surface was developed with a rotating brush while shower developing at 30 ° C with a cone-type nozzle pressure of 0.15 MPa. The development residue was removed and the resulting substrate was developed. Subsequently, using detergent (phosphate, silicate, nonionic surfactant / antifoaming agent / stabilizer, trade name T-SD1 (manufactured by FUJIFILM Corporation), 33 ° C., 20 seconds, cone type nozzle Residue removal using a rotating brush with a shower and nylon bristles at a pressure of 0.02 MPa, and post-exposure with 500 mJ / cm ² of light with an ultra-high pressure mercury lamp, followed by heat treatment at 220 ° C. for 15 minutes to perform 500 mJ pure water shower cleaning. And dry at 100 ° C. for 2 minutes.

Application of liquid crystalline composition for thermal development, patterning exposure, and development (preparation method of coating liquid LC-2 for retardation layer)
After preparing the following composition, it is filtered through a polypropylene filter having a pore size of 0.2 μm and used as a coating liquid LC-2 for retardation layer.
LC-2-1 was synthesized based on the method described in JP-A No. 2004-123882. LC-1-1 is a liquid crystal compound having two reactive groups. One of the two reactive groups is an acrylic group which is a radical reactive group, and the other is an oxetane group which is a cationic reactive group. is there.
LC-2-2 is Tetrahedron Lett. Synthesized according to the method described in Journal, Vol. 43, page 6793 (2002).
───────────────────────────────────────
Coating composition for retardation layer (%)
───────────────────────────────────────
Rod-like liquid crystal (LC-2-1) 19.57
Horizontal alignment agent (LC-2-2) 0.01
Cationic photopolymerization initiator (Cyracure UVI 6974, manufactured by Dow Chemical) 0.40
Polymerization control agent (IRGANOX1076, manufactured by Ciba Specialty Chemicals Co., Ltd.)
0.02
Methyl ethyl ketone 80.0
───────────────────────────────────────

After coating the retardation layer coating liquid LC-2 on the photo-alignment film H-1 or the rubbing alignment film H-2 prepared above and drying the film at a film surface temperature of 105 ° C. for 2 minutes to obtain a liquid crystal phase state, Irradiation with ultraviolet rays using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) of 160 W / cm under air to fix the alignment state and form a retardation layer having a thickness of 2.4 μm. A layer sample is prepared. The illuminance of ultraviolet rays used at this time is 50 mW / cm ² in the UV-B region (integration of wavelengths 280 nm to 320 nm), and the irradiation amount is 35 mJ / cm ² in the UV-B region.

(Preparation method of polymerization initiator supply coating liquid AD-1)
After preparing the following composition, it is filtered through a polypropylene filter having a pore size of 0.2 μm and used as a polymerization initiator supply coating liquid AD-1.
───────────────────────────────────
Coating solution composition for transfer adhesive layer (% by mass)
───────────────────────────────────
Benzyl methacrylate / methacrylic acid / methyl methacrylate = 35.9 / 22.4 / 41.7 molar ratio random copolymer (weight average molecular weight 38,000) 8.05
KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.) 4.83
Radical photopolymerization initiator (2-trichloromethyl-5- (p-styrylstyryl)
1,3,4-oxadiazole) 0.12
Hydroquinone monomethyl ether 0.002
Megafuck F-176PF (Dainippon Ink Chemical Co., Ltd.) 0.05
Propylene glycol monomethyl ether acetate 34.80
Methyl ethyl ketone 50.538
Methanol 1.61
───────────────────────────────────

(Pattern exposure method)
The polymerization initiator supply layer liquid AD-1 is applied on the retardation layer sample obtained above and dried to form a 1.0 μm polymerization initiator supply layer. Pattern exposure is performed at an exposure amount of 50 mJ / cm ² using an M-3L mask aligner manufactured by the company and a photomask having a pattern made of chromium on quartz glass.

(Development method)
Next, baking is performed for 1 hour in a clean oven at 230 ° C. to produce a corresponding retardation pattern.

Application of liquid crystalline composition for organic solvent development / patterning exposure / development In the same manner as described above, LC-2 is applied and UV-irradiated onto the photo-alignment film H-1 or the rubbing alignment film H-2.
Subsequently, the obtained substrate was immersed in methyl ethyl ketone and brush-washed to produce a corresponding retardation pattern. Then, it is dried at 100 ° C. for 2 minutes.

(Preparation method of polarizing layer)
Application of alkaline-developable liquid crystalline composition, patterning exposure, and development As the alkaline-liquid crystalline developable liquid crystalline composition, the above-described alkali was used except that a polarizing layer coating liquid LC-4 having the following composition was prepared and used. Similar to the development retardation layer, coating, patterning exposure, and development are performed on the photo-alignment film H-1 or the rubbing alignment film H-2.
(Preparation method of coating liquid LC-4 for polarizing layer)
After preparing the following composition, it is filtered through a polypropylene filter having a pore size of 0.2 μm and used as a polarizing layer coating liquid LC-4.
LC-1-1 was obtained from Tetrahedron Lett. Synthesized according to the method described in Journal, Vol. 43, page 6793 (2002). LC-1-2 is synthesized by the method described in EP1388538A1, page 21.
────────────────────────────────────────
Polarizing layer coating solution composition (%)
────────────────────────────────────────
Bar-shaped liquid crystal (Paliocolor LC242, BASF Japan) 24.15
Dichroic dye (G-239, manufactured by Hayashibara Biochemical Research Institute) 1.27
4,4′-Azoxydianisole 0.52
CH ₂ = CH-COO (CH ₂ ) ₄ COO-Ph-COO-Ph-COOH 3.30
CH ₂ = CH-COO (CH ₂ ) ₄ COO-Ph-COOH 3.30
(However, Ph represents a phenylene group)
Horizontal alignment agent (LC-1-1) 0.10
Photopolymerization initiator (LC-1-2) 1.36
Methyl ethyl ketone 66.0
────────────────────────────────────────

Coating, patterning exposure, and development of liquid crystal composition for thermal development The above retardation for thermal development, except that the polarizing layer coating liquid LC-5 having the following composition was used as the thermal development liquid crystalline composition. Similarly to the layer, coating, patterning exposure, and development are performed on the photo-alignment film H-1 or the rubbing alignment film H-2.

(Preparation method of coating liquid LC-5 for polarizing layer)
After preparing the following composition, it is filtered through a polypropylene filter having a pore size of 0.2 μm and used as a coating liquid LC-5 for polarizing layer.
LC-1-1 was synthesized based on the method described in JP-A No. 2004-123882. LC-1-1 is a liquid crystal compound having two reactive groups. One of the two reactive groups is an acrylic group which is a radical reactive group, and the other is an oxetane group which is a cationic reactive group. is there.
LC-1-2 is Tetrahedron Lett. Synthesized according to the method described in Journal, Vol. 43, page 6793 (2002).
───────────────────────────────────────
Polarizing layer coating solution composition (%)
───────────────────────────────────────
Rod-like liquid crystal (LC-1-1) 18.59
Dichroic dye (G-239, manufactured by Hayashibara Biochemical Research Institute) 0.98
Horizontal alignment agent (LC-1-2) 0.01
Cationic photopolymerization initiator (Cyracure UVI 6974, manufactured by Dow Chemical) 0.40
Polymerization control agent (IRGANOX1076, manufactured by Ciba Specialty Chemicals Co., Ltd.)
0.02
Methyl ethyl ketone 80.0
───────────────────────────────────────

(Coating of liquid crystal for organic solvent development, patterning exposure, and development method)
As the liquid crystalline composition for organic solvent development, the polarizing layer coating liquid LC-5 having the above composition was prepared and used, as in the above-described retardation layer for organic solvent development, on the photo-alignment film H-1 or rubbing alignment. Coating, patterning exposure, and development are performed on the film H-2.

(Production of elliptically polarizing film)
Using the materials and methods described above, elliptically polarizing films (Examples 1 to 7) were produced in the combinations shown in the following table.
As a specific procedure, an elliptically polarizing film in which an alignment layer for a retardation layer, a patterning retardation layer, an alignment layer for a polarizing layer, and a patterning polarizing layer are sequentially laminated on a glass substrate, and each layer is laminated in this order is produced. did.

Similarly, in any of the samples of Examples 1 to 7, the retardation film was subjected to the alignment treatment pattern 1 and the polarizing film was subjected to the alignment treatment pattern 2 according to the alignment treatment pattern 2.
As the mask pattern, M-1 to M-8 shown in FIG. 8 were used, and an alignment treatment was performed using the rubbing direction or polarization direction of R-1 to R-3 shown in FIG. In any of the examples, the slow axis direction of the retardation film is as indicated by the arrow of pattern 1 in FIG. 10, and the absorption axis direction of the polarizing film is as indicated by the arrow of pattern 2 in FIG. The amount of retardation of the retardation film was about 140 nm. Also, the absorption axis of the completed elliptical polarizing plate is as shown in Pattern 3 (the clockwise arrow part absorbs clockwise circularly polarized light, and the counterclockwise arrow part absorbs counterclockwise circularly polarized light. To show)
Note that one square (one side of the square) of the mask shown in FIG. 8 is 200 μm. In this embodiment, the mask square is 200 μm, but it can be made smaller.

The above optical characteristics were measured with the optical system shown in FIG. A halogen light source MHF-D100LR manufactured by Moritex was used as the halogen light source, and a fiber multichannel spectrometer USB2000 manufactured by Ocean Optics was used as the photodetector.
The optical system shown in FIG. 11 is a measurement position limiting mask, and can limit the measurement position and measure the optical characteristics of one mask. Arbitrary elliptically polarized light is generated by changing the direction of the polarizing plate and the direction of the λ / 4 plate. If the elliptical polarization state of the light matches the elliptical polarization state of the polarizing film, the light is absorbed and light detection becomes impossible. In the case of being orthogonal, light is transmitted most often. The elliptical polarization state of the polarizing plate can be accurately determined by the angular relationship between the sample, the polarizing plate, and the λ / 4 plate.

(Example using transfer material: Example 8)
(Preparation of coating liquid CU-1 for thermoplastic resin layer)
The following composition was prepared, filtered through a polypropylene filter having a pore diameter of 30 μm, and used as a coating liquid CU-1 for a thermoplastic resin layer.
──────────────────────────────────────── Coating composition for thermoplastic resin layer (% )
──────────────────────────────────────――Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / Methacrylic acid copolymer (copolymerization composition ratio (molar ratio) = 55/30/10/5, weight average molecular weight = 100,000, Tg≈70 ° C.)
5.89 styrene / acrylic acid copolymer (copolymerization composition ratio (molar ratio) = 65/35, weight average molecular weight = 10,000, Tg≈100 ° C.)
13.74
BPE-500 (manufactured by Shin-Nakamura Chemical Co., Ltd.) 9.20
Megafuck F-780-F (manufactured by Dainippon Ink & Chemicals, Inc.) 0.55
Methanol 11.22
Propylene glycol monomethyl ether acetate 6.43
Methyl ethyl ketone 52.97
───────────────────────────────────────

(Preparation of coating liquid AL-1 for alignment layer)
The following composition was prepared, filtered through a polypropylene filter having a pore size of 30 μm, and used as the intermediate layer / alignment layer coating solution AL-1.
──────────────────────────────────――
Coating solution composition for intermediate layer / alignment layer (%)
──────────────────────────────────――
Polyvinyl alcohol (PVA205, manufactured by Kuraray Co., Ltd.) 3.21
Polyvinylpyrrolidone (Luvitec K30, manufactured by BASF) 1.48
Distilled water 52.1
Methanol 43.21
──────────────────────────────────――

(Production of retardation film transfer material T-1)
On a temporary support of a 100 μm-thick easy-adhesive polyethylene terephthalate film (Cosmo Shine A4100, manufactured by Toyobo Co., Ltd.), in order using a wire bar, a coating solution CU-1 for a thermoplastic resin layer, for an alignment layer The coating liquid AL-1 was applied and dried. The dry film thicknesses were 14.6 μm and 1.6 μm, respectively. Further, mask rubbing was performed according to the alignment treatment pattern 1, and then LC-2 was applied using a wire bar, dried at a film surface temperature of 105 ° C. for 2 minutes to form a liquid crystal phase, and then 160 W / cm under air. Using an air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.), the alignment state is fixed by irradiating ultraviolet rays with an illuminance of 240 mW / cm ² and an irradiation amount of 600 mJ / cm ² , and the thickness is about 3.5 μm. A phase difference layer is formed, and finally a photosensitive transfer adhesive layer coating solution AD-1 is applied and dried to form a 1.0 μm photosensitive resin layer, followed by drying, and then a protective film (thickness 12 μm polypropylene). Film) was pressure-bonded to prepare a transfer material T-1 for a retardation film.

(Preparation of polarizing film transfer material T-2)
On a temporary support of a 100 μm-thick easy-adhesive polyethylene terephthalate film (Cosmo Shine A4100, manufactured by Toyobo Co., Ltd.), in order using a wire bar, a coating solution CU-1 for a thermoplastic resin layer, for an alignment layer The coating liquid AL-1 was applied and dried. The dry film thicknesses were 14.6 μm and 1.6 μm, respectively. Further, mask rubbing was performed using the alignment treatment pattern 2, and then LC-5 was applied using a wire bar, dried at a film surface temperature of 105 ° C. for 2 minutes to form a liquid crystal phase, and then 160 W under air. Using an air-cooled metal halide lamp (produced by Eye Graphics Co., Ltd.) at a thickness of 3.5 μm, the alignment state is fixed by irradiating ultraviolet rays with an illuminance of 240 mW / cm ² and an irradiation amount of 600 mJ / cm ^2. And finally, a coating solution AD-1 for photosensitive transfer adhesive layer is applied and dried to form a photosensitive resin layer having a thickness of 1.0 μm, followed by drying, and then a protective film (thickness). 12 μm polypropylene film) was pressure-bonded to prepare a polarizing film transfer material T-2.

(Production of retardation pattern)
The alkali-free glass substrate was washed with a rotating brush having nylon hair while spraying a glass detergent solution adjusted to 25 ° C. for 20 seconds by showering, and after washing with pure water shower, silane coupling solution (N-β (aminoethyl)) A 0.3% aqueous solution of γ-aminopropyltrimethoxysilane (trade name: KBM-603, Shin-Etsu Chemical) was sprayed for 20 seconds with a shower and washed with pure water. This substrate was heated at 100 ° C. for 2 minutes by a substrate preheating apparatus.
After peeling off the protective film of the transfer material T-1 for producing the birefringence pattern, a laminator (manufactured by Hitachi Industries, Ltd. (Lamic II type)) was used, and the substrate heated at 100 ° C. for 2 minutes was heated to the rubber roller temperature. Lamination was performed at 130 ° C., linear pressure of 100 N / cm, and conveyance speed of 1.4 m / min. After lamination, the temporary support was peeled off to prepare a birefringence pattern builder.

Next, with a triethanolamine developer (2.5% triethanolamine-containing, nonionic surfactant-containing, polypropylene-based antifoaming agent, trade name: T-PD1, manufactured by Fuji Photo Film Co., Ltd.) Shower development was performed at 30 ° C. for 50 seconds and a flat nozzle pressure of 0.04 MPa to remove the mechanical property control layer and the alignment layer, followed by baking in a clean oven at 230 ° C. for 1 hour to prepare a retardation pattern sample.

(Preparation of polarizing film pattern)
After removing the protective film of the transfer material T-2 for preparing the polarization pattern, a retardation pattern sample heated at 100 ° C. for 2 minutes using a laminator (manufactured by Hitachi Industries, Ltd. (Lamic II type)) Lamination was performed at a roller temperature of 130 ° C., a linear pressure of 100 N / cm, and a conveyance speed of 1.4 m / min. After lamination, the temporary support was peeled off to prepare an elliptical polarization pattern builder.

Next, with a triethanolamine developer (2.5% triethanolamine-containing, nonionic surfactant-containing, polypropylene-based antifoaming agent, trade name: T-PD1, manufactured by Fuji Photo Film Co., Ltd.) Shower development was performed at 30 ° C. for 50 seconds and a flat nozzle pressure of 0.04 MPa, and the mechanical property control layer and the alignment layer were removed. Then, baking was performed for 1 hour in a clean oven at 230 ° C. to produce a corresponding elliptically polarized pattern sample.
When the optical characteristics of the produced elliptically polarized pattern sample were measured, it was found that the optical characteristics as in pattern 3 were obtained.

(Production of in-cell transflective liquid crystal display device: Example 9)
(Production of substrates for liquid crystal display devices)
A color filter substrate 32 having a black matrix 31 and three color filters of RGB was formed on a glass substrate by a general method described in Kosuke Kobayashi, Color Liquid Crystal Display, page 240, Sangyo Tosho (1994). On top of that, a patterned elliptically polarizing material was prepared in the same manner as in Example 1.

(Production of transflective LCD)
A transflective ECB-LCD was manufactured by forming an alignment film made of a transparent electrode and polyimide on a liquid crystal display device substrate, and using a TFT substrate with a reflector 46 as the opposite liquid crystal display device substrate. (Fig. 12)

(Production of image sensor: Example 10)
With reference to the description in Japanese Patent Application Laid-Open No. 2007-86720, an image obtained by mounting an elliptical polarizing film by laminating a patterned elliptical polarizing film created as in Example 1 on an image sensor such as a CCD or CMOS. A sensor can be made.

(Preparation of ellipsometer: Example 11)
With reference to the description of Japanese Patent Application Laid-Open No. 2007-86720, a patterned elliptically polarizing film having a pattern as shown in FIG. 13 (the arrow indicates absorption polarization) produced as in Example 1 is attached on the image sensor. A Stokes meter was produced.

(Production of one-dimensional polarization sensor array: Example 12)
Creating a one-dimensional polarization sensor array by pasting a patterned elliptically polarizing film, which is created as in Example 1, as shown in FIG. 14 (arrows indicate absorption polarization) onto the photodetector array Can do.

(Production of film thickness measuring device: Example 13)
With reference to the description in Japanese Patent Application Laid-Open No. 2005-114704, a film thickness measuring device can be manufactured using the elliptically polarizing film of Example 1.
As described in JP-A-2005-114704, elliptically polarized light in which a phase difference film (FIG. 15 (a-1)) whose direction has been changed and a polarizing layer (FIG. 15 (a-2)) whose direction has been changed is combined. An elliptical polarizing film is formed by combining a film or a retardation layer (FIG. 15 (b-1)) having a changed phase difference and a polarizing layer (FIG. 15 (b-2)) having a changed direction, and is formed on the entire surface of the image sensor. Paste.
A sample whose thickness is to be measured is irradiated with light whose polarization state is known from an oblique direction, and the reflected wave is observed with the image sensor. The light intensity of each elliptically polarized pixel is measured and analyzed to determine the film thickness and refractive index of the sample.

(Production of 3D display device: Example 14)
Before an image display device such as a liquid crystal display, a plasma television, or a CRT, the phase difference layer as shown in FIG. A patterning elliptically polarizing film having the absorption axis pattern (b) is attached. The observer observes the image display device wearing sunglasses with longitudinally and laterally polarized polarizing plates respectively on the left and right eyes. By displaying images for the left eye and right eye on the image display device, 3D display is possible.

It is a figure which shows the meaning of "patterning" typically. It is a figure which shows the flow of patterning of a photo-alignment film. It is a figure which shows the flow of patterning of the alignment film for rubbing. It is a figure which shows the flow of the patterning of the layer which consists of an alkali developable polymerizable liquid crystal composition provided in alignment film form. It is a figure which shows the flow of the patterning of the layer which consists of a heat developable polymeric liquid crystal composition provided in alignment film form. It is a figure which shows the flow of the patterning of the layer which consists of an organic-solvent developable polymerizable liquid crystal composition provided in alignment film form. It is a figure which shows the flow in the case of providing a patterning phase difference layer or a patterning polarizing layer using a transfer material. It is a figure which shows the mask pattern used in the Example. It is a figure which shows the rubbing direction or polarization direction used in the Example. Pattern 1 of the retardation layer (arrow in the figure indicates the slow axis), pattern 2 of the polarizing layer (arrow in the figure indicates the absorption axis), and pattern 3 of the patterned elliptically polarizing plate prepared in the example It is a figure which shows (the arrow in a figure shows absorption polarized light). It is a figure which shows the optical system used for the measurement of the polarization state of the patterning elliptical polarizing plate produced in the Example. It is a figure which shows the schematic of the transflective liquid crystal display device produced in the Example. It is a figure which shows the pattern of the ellipsometer produced in the Example. It is a figure which shows the pattern of the one-dimensional polarization sensor array produced in the Example. It is a figure which shows the pattern of the phase difference layer and polarizing layer of a patterning polarizing plate in the film thickness measuring apparatus produced in the Example. It is a figure which shows the pattern of the phase difference layer and polarizing layer of the patterning polarizing plate in the 3D display apparatus produced in the Example.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Halogen light source 2 Pinhole 3 Lens 4 Polarizing plate and rotation holder 5 λ / 4 plate and rotation holder 6 Sample and XY stage 7 Mask for measuring position limitation (200 μm × 200 μm square hole is opened)
8 Photodetector 11 Substrate 31 Black matrix 32 Color filter substrate 33 Smoothing layer 34 Alignment film 35 Polarizing film 36 Phase difference layer 41 Polarizing layer 42 Cellulose acetate film 43 Cellulose acetate film 44 Adhesive layer 45 Drive element 46 Reflecting plate 47 Liquid crystal 49 Polarizer

Claims (16)

A patterning polarizing layer including two or more regions having different absorption axis directions and a patterning retardation layer including two or more regions having different slow axis directions and having an orientation group in the side chain An elliptically polarizing plate including a patterning retardation layer containing molecules. The elliptically polarizing plate according to claim 1, wherein the patterning polarizing layer contains a dichroic dye and a polymer having an orientation group in a side chain. The elliptically polarizing plate according to claim 1, wherein the patterning retardation layer contains a liquid crystal compound. The elliptically polarizing plate as described in any one of Claims 1-3 in which the said patterning polarizing layer contains a liquid crystalline compound. The alignment layer 1, the patterning polarizing layer, the alignment layer 2, and the patterning retardation layer are provided in this order, and the alignment layer 1 and the patterning polarizing layer, and the alignment layer 2 and the patterning retardation layer are adjacent to each other. The elliptically polarizing plate according to any one of claims 1 to 4. A method for producing an elliptically polarizing film, comprising the following steps (11) to (13):
(11) On the support or patterning polarizing layer, a composition containing a photo-alignment material is applied and dried, and pattern alignment with polarized ultraviolet light is performed to produce an alignment layer, or on the support or patterning polarizing layer. A step of applying an alignment film solution and rubbing the dried and baked layer through a mask to produce an alignment layer;
(12) A step of exposing the dried layer by applying a solution containing a polymer having an orientation group in the side chain on the orientation layer obtained in step (11);
(13) A step of producing a patterning retardation layer by developing the layer after exposure obtained in step (12). A method for producing an elliptically polarizing film, comprising the following steps (14) to (16):
(14) A composition containing a photo-alignment material is applied onto a support or a patterned retardation layer and dried, and pattern alignment with polarized ultraviolet light is performed to produce an alignment layer, or on a support or a patterned retardation layer Applying an alignment layer solution to the layer and rubbing the dried and baked layer through a mask to produce an alignment layer;
(15) A step of applying a solution containing a polymer having an orientation group in the side chain and a dichroic dye on the orientation layer obtained in the step (14) and exposing the dried layer;
(16) A step of developing a patterned polarizing layer by developing the layer after exposure obtained in step (15). The production according to claim 6 or 7, wherein the solution containing a polymer having an orientation group in the side chain contains a polymerizable liquid crystalline compound for heat development, and the development is performed by heat treatment at 50 ° C to 400 ° C. Method. The production method according to claim 6 or 7, wherein the solution containing a polymer having an orientation group in the side chain contains an alkali-developable polymerizable liquid crystal compound, and the development is performed in an aqueous solution having a pH of 10 or more and 14 or less. The production method according to claim 6 or 7, wherein the solution containing a polymer having an orientation group in the side chain contains a polymerizable liquid crystalline compound for organic solvent development, and the development is organic solvent development. The liquid crystal display device containing the elliptically polarizing plate as described in any one of Claims 1-5. The image sensor containing the elliptically polarizing plate as described in any one of Claims 1-5. A polarization measuring device including the elliptically polarizing plate according to claim 1. The one-dimensional sensor array containing the elliptically polarizing plate as described in any one of Claims 1-5. The film thickness measuring apparatus containing the elliptically polarizing plate as described in any one of Claims 1-5. The 3D display apparatus containing the elliptically polarizing plate as described in any one of Claims 1-5.

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