JP2009190069A - Machining method and device for transparent substrate by laser - Google Patents

Machining method and device for transparent substrate by laser Download PDF

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JP2009190069A
JP2009190069A JP2008034437A JP2008034437A JP2009190069A JP 2009190069 A JP2009190069 A JP 2009190069A JP 2008034437 A JP2008034437 A JP 2008034437A JP 2008034437 A JP2008034437 A JP 2008034437A JP 2009190069 A JP2009190069 A JP 2009190069A
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substrate
laser
condensing
light
laser beam
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JP5379384B2 (en
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Kazuya Takasago
一弥 高砂
Masanao Kamata
将尚 鎌田
Satomi Sumiyoshi
哲実 住吉
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Cyber Laser Inc
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Cyber Laser Inc
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067Dividing the beam into multiple beams, e.g. multifocusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0613Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis
    • B23K26/0617Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis and with spots spaced along the common axis
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/0222Scoring using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/08Severing cooled glass by fusing, i.e. by melting through the glass
    • C03B33/082Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/54Glass
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and a device where, for the purpose of satisfactory cutting of a substrate of glass or the like, such the substrate is economically machined by using an ultra-short pulsed laser. <P>SOLUTION: According to the following method, by focusing condensing points on the surface or inside of the substrate and irradiating it with a laser beam, a plurality of, preferably continuous cavities by a self-focusing effect are formed from the front face to the back face of the substrate. The method includes: a stage (1) where a laser beam with an ultra-short pulse width having a transparent wavelength to the substrate is generated and emitted, and the emitted laser beam is divided; a stage (2) where the respective divided laser beams are condensed on a plurality of condensing points aligned so as to be separated along the scheduled cutting lines of the substrate at different intervals different from the surface (front face) of the substrate at the side on which they are made incident; and a stage (3) where the plurality of condensing points are relatively moved to the substrate along the scheduled cutting lines of the substrate. Then, the condensing point formed at the position near the surface (back face) which is the opposite side to the front face of the substrate is scanned first. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、レーザ加工装置及び加工方法に係り、ガラス基板などの加工物体に超短パルスレーザを照射して、その内部に自己収束効果による空洞を形成する装置及び方法に関するものである。
The present invention relates to a laser processing apparatus and a processing method, and more particularly to an apparatus and method for irradiating a processing object such as a glass substrate with an ultrashort pulse laser to form a cavity due to a self-focusing effect therein.

電子工業において液晶表示パネルやプラズマ表示パネルなどのパネル構成材料として、透明なガラス板が基板の間に画素を構成する要素の組み込みに用いられている。透明ガラス基板は表示パネルの製造コスト低減のため、大きなガラス基板を使用して、工程の途中で個別パネルに分割し、最終的な製品のサイズに仕上げる。この場合、大きな基板から切断する工程が必要で、その方法の1つとしてレーザを用いることが提示されている。超短パルスを用いる方法において、光軸方向に集光点の位置が異なる複数のスポットを形成する方法により基板の厚さ方向に加工部を複数形成することが特開2006−130556号公報の中に記載されている。この提示された方法ではレーザ発振器は単一でも複数でもよく、複数レーザビームを別々の集光レンズで同一光軸上において、異なる位置に集光点ができるようにビームスプリッタで2本のビームを同軸上に合致させて、基板に照射し、基板の深さ方向に複数の加工点を形成している。   In the electronics industry, a transparent glass plate is used as a panel constituent material for liquid crystal display panels, plasma display panels, and the like to incorporate elements constituting pixels between substrates. In order to reduce the manufacturing cost of the display panel, the transparent glass substrate is divided into individual panels in the middle of the process using a large glass substrate and finished to the final product size. In this case, a process of cutting from a large substrate is required, and it has been proposed to use a laser as one of the methods. In the method using an ultrashort pulse, a plurality of processed portions are formed in the thickness direction of a substrate by a method of forming a plurality of spots having different focal point positions in the optical axis direction. It is described in. In the proposed method, the laser oscillator may be single or plural, and two beams are separated by a beam splitter so that a plurality of laser beams can be focused at different positions on the same optical axis by different condensing lenses. A plurality of processing points are formed in the depth direction of the substrate by matching the same axis and irradiating the substrate.

基板の厚さが大型化し、それに伴い基板厚みが増加すると、従来の深さ方向に複数の集光点を形成する方法では十分な基板分割するだけの加工量において不足する。即ち、深さを2点の集光点で確保するためには、超短パルスレーザの出力エネルギーを大幅に増加しないと加工量が得られない、また過大なエネルギーを投入すると加工部の体積の増加を生じ、切断加工幅の増加を伴い、基板材料歩留まりの低下を招く。複数集光点を形成することを試みると、複数の集光点を得る集光レンズの後の基板内の集光点までの光路長を長く確保しないとビームスプリッタで1本の加工用のレーザビームに束ねることが困難になる。これを実現するためには上記光路長を長くとることにより、収束ビームの開口数が小さくしないと困難になる。   When the thickness of the substrate is increased and the thickness of the substrate is increased accordingly, the conventional method of forming a plurality of condensing points in the depth direction is insufficient in a processing amount sufficient to divide the substrate. In other words, in order to secure the depth at two condensing points, the machining amount cannot be obtained unless the output energy of the ultrashort pulse laser is significantly increased. This causes an increase, which increases the cutting width and causes a reduction in substrate material yield. If an attempt is made to form a plurality of condensing points, a single laser beam for processing by a beam splitter unless a long optical path length to the condensing point in the substrate after the condensing lens for obtaining the plurality of condensing points is secured. It becomes difficult to bundle the beam. In order to realize this, it is difficult to increase the optical path length unless the numerical aperture of the convergent beam is reduced.

開口数を小さくすることは、集光点におけるビーム直径が大きくなり、そのために集光点におけるレーザパワー密度が小さくなる、そのため加工を透明体に施すために要するパワー密度の閾値まで確保するには入射レーザエネルギーを増大する必要性が発生する。従って、集光点数を増加することは、レーザ発振出力エネルギーも集光点数の数の増加係数以上にレーザパワーの増加が必要になる。このことは実用上の利点が見出せない。   Reducing the numerical aperture increases the beam diameter at the condensing point, thereby reducing the laser power density at the condensing point. Therefore, in order to ensure the power density threshold required for processing the transparent body A need arises to increase the incident laser energy. Therefore, increasing the number of condensing points requires that the laser oscillation output energy also increase the laser power beyond the increase factor of the number of condensing points. This has no practical advantage.

特開2007−142000号公報には、複数の集光点を基板内部に多格子吸収方法を用いて透明体内部に変質層を形成し、厚さ方向に複数の内部改質層を形成することで、基板分離工程においてスクライビングの加工幅を形成しないで割断によって基板分離を行う提案がされている。複数の集光点を作成する際、複数のレーザ光源を用いるので装置が高価となる。   Japanese Patent Laid-Open No. 2007-142000 discloses that a plurality of condensing points are formed inside a transparent body using a multi-grating absorption method inside a substrate, and a plurality of internal modified layers are formed in the thickness direction. Thus, it has been proposed to perform substrate separation by cleaving without forming a scribing width in the substrate separation step. When creating a plurality of condensing points, the apparatus becomes expensive because a plurality of laser light sources are used.

米国再発行特許第37585号明細書US Reissue Patent No. 37585 Specification 特開2006−130566号公報JP 2006-130566 A 特開2002−205180号公報JP 2002-205180 A 特開昭56−129340号公報JP-A-56-129340 特開2004−111946号公報JP 2004-111946 A 特開2007−142000号公報Japanese Patent Laid-Open No. 2007-142000 特開2004−337902号公報JP 2004-337902 A

解決しようとする問題点は、固体レーザの超短パルスの出力を用いて透明体を表面から高精度で効能率に加工を実施する方法とその装置を提供する際に、レーザ光源の低コスト化を図る点にある。   The problem to be solved is to reduce the cost of the laser light source when providing a method and apparatus for processing a transparent body with high accuracy and efficiency from the surface using the output of an ultrashort pulse of a solid-state laser. It is in the point which aims at.

上記課題を解決するため、本発明では、
(1)基板の表面または内部に集光点を合わせてレーザ光を照射することにより、当該基板の内部に自己収束効果による空洞を形成するレーザ加工装置であって、
基板に対して透明な波長を有し、基板100ps以下のパルス幅を有するレーザ光を発生させて出射するパルスレーザ光源と、そのレーザ光源から出射したレーザ光を分割する手段と、
分割されたレーザ光のそれぞれを、入射する側の基板表面(オモテ面)から異なる距離にある、基板の切断予定線に沿って離間して整列される複数集光点に集光させる集光レンズと、
前記基板の切断予定線に沿って、前記レーザ光をパルス状に照射しながら、前記基板に対して前記複数集光点を相対的に移動させる相対移動手段と、を備え
レーザ光照射によって、前記集光点付近に水平方向に間隔をあけて基板の内部に自己収束効果による複数の空洞を同時に形成することと、前記相対移動手段により前記集光点を相対的に移動するにあたり、基板のオモテ面とは反対側の面(ウラ面)に近い位置に形成された集光点が、オモテ面により近い位置に集光点を形成した集光点よりも先に走査されることを特徴とする。
(2)また、前記レーザ光を分割する手段が、偏光回転素子を入射側に有し、該偏光回転素子からの出射光が2枚の貼り合わされた偏光プリズムの一方に入射し、貼り合わせ面にて反射光と他方の偏光プリズムへの透過光に分割される構造を有し、偏光回転素子の回転角変化に依存して、該反射光と該透過光との分割比率が決定するレーザ光分割装置であることを特徴とする。
(3)また、偏光回転素子を入射側に有し、該偏光回転素子からの出射光が2枚の貼り合わされた偏光プリズムの一方に入射し、貼り合わせ面にて反射光と他方の偏光プリズムへの透過光に分割される構造を有し、偏光回転素子の回転角変化に依存して、該反射光と該透過光との分割比率が決定することを特徴とする。
In order to solve the above problems, in the present invention,
(1) A laser processing apparatus for forming a cavity due to a self-convergence effect in a substrate by irradiating a laser beam with a focusing point on the surface or inside of the substrate,
A pulse laser light source that emits and emits laser light having a wavelength transparent to the substrate and having a pulse width of 100 ps or less, and means for dividing the laser light emitted from the laser light source;
A condensing lens that condenses each of the divided laser beams at a plurality of condensing points that are spaced apart from each other along a planned cutting line of the substrate at different distances from the substrate surface (front surface) on the incident side. When,
Relative moving means for moving the plurality of condensing points relative to the substrate while irradiating the laser beam in a pulsed manner along a planned cutting line of the substrate, When a plurality of cavities due to the self-convergence effect are simultaneously formed in the interior of the substrate with a space in the vicinity of the condensing point, and the relative movement of the condensing point by the relative moving means, The condensing point formed at a position close to the surface (back surface) opposite to the surface is scanned before the condensing point at which the condensing point is formed at a position closer to the front surface. .
(2) Further, the means for dividing the laser beam has a polarization rotation element on the incident side, and light emitted from the polarization rotation element is incident on one of the two bonded polarization prisms, and is bonded to the bonding surface. The laser beam has a structure that is split into reflected light and transmitted light to the other polarizing prism at, and the split ratio of the reflected light and transmitted light is determined depending on the rotation angle change of the polarization rotation element It is a dividing device.
(3) Also, a polarization rotation element is provided on the incident side, and light emitted from the polarization rotation element is incident on one of the two bonded polarization prisms, and the reflected light and the other polarization prism are incident on the bonding surface. And the split ratio of the reflected light and the transmitted light is determined depending on the rotation angle change of the polarization rotation element.

一方、本発明では、
(1)基板の表面または内部に集光点を合わせてレーザ光を照射することにより、当該基板の内部に自己収束効果による空洞を形成するレーザ加工方法であって、
基板に対して透明な波長を有し、基板100ps以下のパルス幅を有するレーザ光を発生させて出射するステップと、そのレーザ光源から出射したレーザ光を分割するステップと、
分割されたレーザ光のそれぞれを、入射する側の基板表面(オモテ面)から異なる距離にある、基板の切断予定線に沿って離間して整列される複数集光点に集光させるステップと、
前記基板の切断予定線に沿って、前記レーザ光をパルス状に照射しながら、前記基板に対して前記複数集光点を相対的に移動させるステップ、とを備え
レーザ光照射によって、前記集光点付近に水平方向に間隔をあけて基板の内部に自己収束効果による複数の空洞を同時に形成することと、前記相対的に移動させるステップの際、基板のオモテ面とは反対側の面(ウラ面)に近い位置に形成された集光点が、オモテ面により近い位置に集光点を形成した集光点よりも先に走査されることを特徴とする。
(2)また、空洞を基板のオモテ面またはウラ面の何れか一方または両方に達する空洞を形成することを特徴とする。
(3)また、前記のレーザ光を分割するステップにおいて、基板のオモテ面またはウラ面に最も近い空洞を形成する分割光の強度が他の分割光の強度よりも大きくなるように分割することを特徴とする。
On the other hand, in the present invention,
(1) A laser processing method for forming a cavity due to a self-focusing effect in a substrate by irradiating a laser beam with a focusing point on the surface or inside of the substrate,
Generating and emitting laser light having a wavelength transparent to the substrate and having a pulse width of 100 ps or less of the substrate; dividing the laser light emitted from the laser light source;
Condensing each of the divided laser beams at a plurality of condensing points that are spaced apart from each other along a planned cutting line of the substrate at different distances from the incident substrate surface (front surface);
Moving the plurality of condensing points relative to the substrate while irradiating the laser light in a pulsed manner along a planned cutting line of the substrate, and condensing the light by laser light irradiation. A plurality of cavities due to the self-convergence effect are simultaneously formed in the substrate at horizontal intervals in the vicinity of the point, and a surface opposite to the front surface of the substrate (back surface) is used in the relative movement step. The condensing point formed at a position close to the surface) is scanned before the condensing point at which the condensing point is formed at a position closer to the front surface.
(2) Further, the present invention is characterized in that a cavity that reaches one or both of the front side and the back side of the substrate is formed.
(3) Further, in the step of dividing the laser light, the laser light is divided so that the intensity of the divided light that forms the cavity closest to the front or back surface of the substrate is larger than the intensity of the other divided light. Features.

単一のレーザ光源を用い、レーザ光を分割し、分割したビームのそれぞれが、基板内部または表面において区分的に自己収束効果による空洞が形成されるので、基板オモテ面(レーザ光が入射する側の基板面)からウラ面(オモテ面とは反対側の基板面)に亘って空洞が好ましくは連続的に多数形成されるので、
(1)単一のレーザ光源を用いるので、経済的な装置または方法となる。
(2)その後の基板分割工程の際、分割に要する力が大幅に低下でき、分割時の歩留まりを向上することができる。
A single laser light source is used to divide the laser beam, and each of the divided beams forms a cavity due to a self-focusing effect in the substrate or on the surface, so that the substrate front surface (the side on which the laser beam is incident) Since a number of cavities are formed preferably continuously from the substrate surface) to the back surface (substrate surface opposite to the front surface),
(1) Since a single laser light source is used, an economical apparatus or method is obtained.
(2) In the subsequent substrate dividing step, the force required for the division can be greatly reduced, and the yield during the division can be improved.

本発明では、レーザ照射で加工対象物体内に自己収束作用を発生させることにより該物体を加工する方法を用いるので、この方法をまず説明する。これは、ガラス基板等の加工物体に対して透明となる波長の超短パルスレーザ光を用いて、加工物体内部に小さな直径のビームを集光点の焦点深度より長い範囲にわたってレーザ光進行方向に設け、加工物体内部に自己集束作用を発生させるものである。自己収束作用の発生により、レーザ光の進行方向に集光チャネルが、ビームウェストよりも長い距離にわたって形成され、集光チャネル部分に空洞が形成される。レーザ光による加工幅を小さくしたまま、レーザ光の進行方向の加工距離を通常のアブレーション加工よりも格段に大きくなるという特徴がある。   In the present invention, a method of processing an object by generating a self-focusing action in the object to be processed by laser irradiation will be described first. This is because ultra-short pulse laser light with a wavelength that is transparent to a processing object such as a glass substrate is used, and a small-diameter beam is irradiated in the laser beam traveling direction over a range longer than the focal depth of the focal point. It is provided to generate a self-focusing action inside the processed object. Due to the occurrence of the self-focusing action, a condensing channel is formed over a distance longer than the beam waist in the traveling direction of the laser light, and a cavity is formed in the condensing channel portion. There is a feature that the processing distance in the traveling direction of the laser beam is remarkably increased as compared with the normal ablation processing while the processing width by the laser beam is reduced.

超短パルスはモード同期レーザ発振器からの出力を所定のエネルギーまで例えばチタンサファイア増幅媒体で増幅し、そのパルスを必要に応じてパワーレベルを調整し、その出力レーザビームをレンズなどの集光光学系により集光させる。レーザビーム光軸方向の集光位置をガラス基板等加工物体の表面または内部の適当な位置に設定する。   The ultrashort pulse amplifies the output from the mode-locked laser oscillator to a predetermined energy with, for example, a titanium sapphire amplification medium, adjusts the power level of the pulse as necessary, and the output laser beam is a condensing optical system such as a lens. To collect light. The condensing position in the laser beam optical axis direction is set to an appropriate position on the surface or inside of the processed object such as a glass substrate.

ここで、超短パルスのレーザとはパルス幅100ps以内のレーザであり、好ましくは、パルス幅500fsないし10psである。また、被加工物体に対して透明となるとは、かならずしも加工物体が100%光を透過するという意味とは限らず、レーザ光がある程度透過できる場合も含まれるものとする。例えば、被加工物体をシリコン基板とすると、波長が1μmないし2μmである赤外の領域であればよい。   Here, the ultrashort pulse laser is a laser having a pulse width of 100 ps or less, and preferably has a pulse width of 500 fs to 10 ps. Further, “being transparent with respect to the object to be processed” does not necessarily mean that the object to be processed transmits 100% light, and includes cases where laser light can be transmitted to some extent. For example, when the object to be processed is a silicon substrate, it may be an infrared region having a wavelength of 1 μm to 2 μm.

図1は本願発明である加工装置の実施例である。超短パルスレーザ発振器1、それから発射されたレーザビーム2を分割する分割手段71,分割されたレーザビームのそれぞれを集光させる集光レンズ群35、加工対象の基板72を配置するための基板搭載台52、及び基板搭載台52を移動するためXYテーブル49を有する。XYテーブル49はX方向の送りテーブル50とその下に配置されたY方向の送りテーブル51から構成される。XYテーブル49は周知の制御技術によって動作がプログラムされて高精度な位置、速度制御が行われながら加工線に沿って走査される。基板72はXYテーブル49の上に基板搭載台52を介して搭載される。加工対象基板はガラス製であり、例えばCorning社製Eagle2000(厚さ700μm)を用いることができる。   FIG. 1 shows an embodiment of a processing apparatus according to the present invention. Ultrashort pulse laser oscillator 1, splitting means 71 for splitting laser beam 2 emitted from it, condensing lens group 35 for condensing each of the split laser beams, and substrate mounting for placing a substrate 72 to be processed An XY table 49 is provided to move the table 52 and the substrate mounting table 52. The XY table 49 includes an X-direction feed table 50 and a Y-direction feed table 51 disposed below the X-direction feed table 50. The XY table 49 is scanned along a processing line while its operation is programmed by a well-known control technique and highly accurate position and speed control is performed. The substrate 72 is mounted on the XY table 49 via the substrate mounting table 52. The substrate to be processed is made of glass, for example, Corning Eagle 2000 (thickness: 700 μm) can be used.

超短パルスレーザ発振器1においては、レーザ媒体の例として、チタンサファイア結晶(中心波長780nm)のほか、エルビウム添加ファイバー、イットリビウム添加ファイバー、Nd:YAG結晶、Nd:YVO4結晶、Nd:YLF結晶などがあげられる。ただし、ガラス基板を被加工物体とする場合、レーザ媒体はチタンサファイア結晶とするのが好ましい。このレーザビーム2をビーム分割手段71を利用して分割する。   In the ultrashort pulse laser oscillator 1, as an example of a laser medium, in addition to a titanium sapphire crystal (central wavelength 780 nm), an erbium-doped fiber, an yttrium-doped fiber, an Nd: YAG crystal, an Nd: YVO4 crystal, an Nd: YLF crystal, etc. can give. However, when the glass substrate is an object to be processed, the laser medium is preferably a titanium sapphire crystal. The laser beam 2 is split using a beam splitting means 71.

ビーム分割手段71では、ミラー3で反射し、必要に応じて偏光回転素子4を通過させ、その後の偏光ビームスプリッタにおけるビームエネルギー分割比を調整する場合に備える。この偏光回転素子4を通過したビームをビームスプリッタ6によってビーム7とビーム8とに分割する、ビーム7は更にビームスプリッタ11においてビーム31とビーム32とに分割する、更にビーム32はビームスプリッタ14でビーム25とビーム26とに分割し、ビーム31はビームスプリッタ18によってビーム23とビーム24とに分割する。これらの光路内にはミラー12、13及び15がビーム光路方向の偏向に用いられている。一方、同様にビーム8はビームスプリッタ16,21及び22と光路偏向のミラー9,17,19及び20を用いて別々の平行なビーム27,28,29及び30に分割される。ビーム分割手段71によって、8本の平行なビーム23〜30が発生する。   The beam splitting means 71 is provided for the case where the beam is reflected by the mirror 3 and passed through the polarization rotation element 4 as necessary, and the beam energy splitting ratio in the subsequent polarizing beam splitter is adjusted. The beam that has passed through the polarization rotator 4 is split into a beam 7 and a beam 8 by a beam splitter 6. The beam 7 is further split into a beam 31 and a beam 32 by a beam splitter 11, and the beam 32 is split by a beam splitter 14. The beam 25 is divided into the beam 26 and the beam 31 is divided into the beam 23 and the beam 24 by the beam splitter 18. In these optical paths, mirrors 12, 13 and 15 are used for deflection in the beam optical path direction. On the other hand, the beam 8 is similarly split into separate parallel beams 27, 28, 29 and 30 using beam splitters 16, 21 and 22 and optical path deflecting mirrors 9, 17, 19 and 20. The beam splitting means 71 generates eight parallel beams 23-30.

平行なビーム23〜30の8本のビームはそれぞれ、集光レンズ群35内の集光レンズ36〜43によって集光される。それらの集光レンズ36〜43は、基板面に対して、少しずつ高さを高くして配置される。すなわち、集光レンズ36〜43は傾斜した線44に沿った位置に設置される。集光レンズ36〜43は開口数(NA)の大きなレンズを用いることが好ましい。開口数が大きいと、ビームスポットを小さくでき、レーザーパルスのエネルギー密度を大きくすることができるからである。
Eight beams of the parallel beams 23 to 30 are condensed by the condenser lenses 36 to 43 in the condenser lens group 35, respectively. These condensing lenses 36 to 43 are arranged with the height gradually increased with respect to the substrate surface. That is, the condenser lenses 36 to 43 are installed at positions along the inclined line 44. The condensing lenses 36 to 43 are preferably lenses having a large numerical aperture (NA). This is because when the numerical aperture is large, the beam spot can be reduced, and the energy density of the laser pulse can be increased.

ビーム23の集光点46が、基板のより深い場所に集光点が形成されるように集光レンズ36は配置される。このビーム23は基板72のウラ面74付近に、自己収束作用によって空洞が形成される程度のエネルギーとパワー強度を持った強度に設定される。従ってウラ面には自己収束作用による空洞からなる溝又は離間した穴が形成される。   The condensing lens 36 is arranged so that the condensing point 46 of the beam 23 is formed at a deeper location on the substrate. This beam 23 is set to an intensity having such energy and power intensity that a cavity is formed near the back surface 74 of the substrate 72 by a self-focusing action. Accordingly, a hollow groove or a spaced hole is formed on the back surface by a self-convergence action.

ビーム24はその集光点が先のビーム23の集光点より基板オモテ面に近い位置に形成されるように、集光レンズ37は集光レンズ36より上方に設置される。集光レンズ38〜43もそれぞれに対応したビーム25〜30の集光点が前の集光点よりも基板オモテ面73に接近するように、それぞれ前のレンズに比べてより上方となるように配置する。最後の集光レンズ43は対応したビーム30の集光点45がオモテ面73に最も近づき、好ましくは、オモテ面上となるように配置する。各ビーム24〜30も自己収束作用によって空洞が形成される程度のエネルギーとパワー強度を持った強度に設定される。   The condensing lens 37 is installed above the condensing lens 36 so that the condensing point of the beam 24 is formed at a position closer to the substrate front surface than the condensing point of the previous beam 23. The condensing lenses 38 to 43 are also positioned higher than the previous lens so that the condensing points of the corresponding beams 25 to 30 are closer to the substrate front surface 73 than the previous condensing points. Deploy. The last condensing lens 43 is arranged so that the condensing point 45 of the corresponding beam 30 is closest to the front surface 73 and is preferably on the front surface. Each of the beams 24 to 30 is also set to an intensity having such an energy and power intensity that a cavity is formed by the self-focusing action.

以上に示したように、ビーム23〜30の集光点は、基板72の内部のウラ面74に近い点46からオモテ面73に近い又はオモテ面73上に渡ってオモテ面及び内部の深さ53〜59に形成される。このため、自己収束作用による空洞83〜90が集光点数に対応して形成される。これらの集光点または空洞は、X方向47に沿って一列に並ぶ。その方向が基板の切断予定線となる。   As described above, the focal points of the beams 23 to 30 are from the point 46 close to the back surface 74 inside the substrate 72 to the front surface 73 or the front surface and the depth inside the front surface 73. 53-59. For this reason, the cavities 83-90 by a self-convergence effect | action are formed corresponding to the number of condensing points. These condensing points or cavities are arranged in a line along the X direction 47. The direction becomes a planned cutting line of the substrate.

この装置で、基板72を切断予定線に沿って、レンズ群35で形成される集光点に対して相対的に移動する。すなわち、XYテーブル49によってX方向矢印47の向きに、基板搭載台52の移動を介して基板72を走査する。これにより、基板72内部に、ウラ面74に近い位置からオモテ面73に近い位置に自己収束作用による空洞83〜90が順次形成される。   With this apparatus, the substrate 72 is moved relative to the condensing point formed by the lens group 35 along the planned cutting line. That is, the substrate 72 is scanned by the XY table 49 in the direction of the X direction arrow 47 through the movement of the substrate mounting base 52. As a result, cavities 83 to 90 are formed sequentially in the substrate 72 from a position close to the back surface 74 to a position close to the front surface 73 by self-convergence.

図では基板厚さを誇張して表示しているが、実際の基板は1mm以下であるので基板内に接近して又は連続して空洞83〜90を複数形成できる。従って、空洞83〜90が多数ウラ面74からオモテ面73に向かって形成できる。基板走査により空洞は加工線を形成するので、この加工線に沿って基板72を分離することが容易になる。   Although the substrate thickness is exaggerated in the figure, the actual substrate is 1 mm or less, so that a plurality of cavities 83 to 90 can be formed close to or continuously in the substrate. Therefore, a large number of cavities 83 to 90 can be formed from the back surface 74 toward the front surface 73. Since the cavity forms a processing line by scanning the substrate, it becomes easy to separate the substrate 72 along the processing line.

図2にこの様子を示す。基板72の移動方向がX方向矢印で47あり、集光レンズ36によるビーム23の集光点46が基板ウラ面74に最も近いので、基板ウラ面の空洞83が最初に形成される。基板72の移動により、順次上方に空洞84〜90が積み重なる。空洞形成は集光点の数だけ(この例では8回)繰り返され、その結果として基板72の右側に示したように、基板オモテ面からウラ面にわたる直線状の空洞が形成される。この図のように、1つの空洞はその上または下の空洞と連続的につながるように形成されることが望ましいが、かならずしも連続的としなくてもよい。該直線状の空洞は、基板72の走査により、X方向に連続的に形成されて、基板分離の断面となる。   FIG. 2 shows this state. Since the moving direction of the substrate 72 is 47 by the X direction arrow and the condensing point 46 of the beam 23 by the condensing lens 36 is closest to the substrate back surface 74, the cavity 83 of the substrate back surface is formed first. As the substrate 72 moves, the cavities 84 to 90 are sequentially stacked upward. Cavity formation is repeated by the number of condensing points (8 times in this example). As a result, as shown on the right side of the substrate 72, a linear cavity extending from the front surface to the back surface is formed. As shown in this figure, it is desirable that one cavity is formed so as to be continuously connected to the cavity above or below it, but it is not always necessary to be continuous. The linear cavities are continuously formed in the X direction by scanning the substrate 72 to form a cross section for substrate separation.

なお、初回に形成される空洞が基板ウラ面74に到達することと最後に形成される空洞が基板オモテ面73に到達することとのいずれかまたは両方が達成されることが望ましい。オモテ面またはウラ面の少なくとも一方に空洞を有すると基板分割が容易になり、また歩留まりの向上につながるからである。   It should be noted that it is desirable to achieve either or both of the fact that the first formed cavity reaches the substrate back surface 74 and the last formed cavity reaches the substrate front surface 73. This is because if a cavity is provided on at least one of the front and back surfaces, the substrate can be divided easily and the yield can be improved.

図1におけるビームスプリッタ6は誘電体多層膜の蒸着ミラーを有する透明平板とすることができる。また、図3に示すような、2枚の偏光プリズム64,65を貼り合わせてビームスプリッタ63を構成することができる。偏光プリズム64,65は方解石製のものが利用できる。ビームスプリッタ63において一方の偏光プリズム65に入射光60が入射し、貼り合わせ面にて入射光60は、透過光と反射光の2つに分割され、他の偏光プリズム64及びもとの偏光プリズム65から出射光62及び62がそれぞれ出射する。ビームスプリッタ63への入射ビーム60を事前に偏光回転素子4を通すと、偏光回転素子4の回転角度に依存して偏光方向が変わるので、透過光と反射光の比率が変化する。したがって該偏光回転素子の回転角度に依存してビームスプリッタ63からの出射光61及び62の分割割合を可変にすることが可能である。   The beam splitter 6 in FIG. 1 can be a transparent flat plate having a dielectric multilayer film deposition mirror. Further, the beam splitter 63 can be configured by bonding two polarizing prisms 64 and 65 as shown in FIG. The polarizing prisms 64 and 65 can be made of calcite. In the beam splitter 63, incident light 60 is incident on one polarizing prism 65, and the incident light 60 is divided into two parts of transmitted light and reflected light on the bonding surface, and the other polarizing prism 64 and the original polarizing prism. Outgoing lights 62 and 62 are emitted from 65, respectively. When the incident beam 60 to the beam splitter 63 is passed through the polarization rotation element 4 in advance, the polarization direction changes depending on the rotation angle of the polarization rotation element 4, so that the ratio of transmitted light and reflected light changes. Therefore, it is possible to vary the division ratio of the outgoing lights 61 and 62 from the beam splitter 63 depending on the rotation angle of the polarization rotation element.

ビーム分割の際に等分割するのではなく、分割されたビームに強度の差違を設けることにより、加工材料に応じて分割の容易さから強度の配分を決定することが可能である。例えば、オモテ面73及びウラ面74にそれぞれ最も近い位置の集光点45または46を形成するビーム30または23を他のビームよりも強度を強く、例えば3倍の強度に設定することができる。基板内部の照射部におけるビームエネルギーはオモテ面又はウラ面に照射するエネルギーより低いエネルギーレベルに設定しても基板分割には有効に作用する。したがって、このようにビームの強度に差違を設けると、合計で少ないレーザ光強度とすることができるので、ビーム分割手段71を通す前である、レーザ発振器1によるレーザビーム2の強度を小さくすることができる。   Rather than equal splitting at the time of beam splitting, it is possible to determine the intensity distribution from the ease of splitting according to the work material by providing a difference in intensity between the split beams. For example, the intensity of the beam 30 or 23 forming the condensing point 45 or 46 closest to the front surface 73 and the back surface 74 can be set to be higher than that of the other beams, for example, three times the intensity. Even if the beam energy in the irradiation part inside the substrate is set to an energy level lower than the energy applied to the front surface or the back surface, it effectively acts on the substrate division. Therefore, if the difference in the beam intensity is provided in this way, the total laser beam intensity can be reduced, so that the intensity of the laser beam 2 by the laser oscillator 1 before passing through the beam splitting means 71 can be reduced. Can do.

上記実施例では集光レンズを基板からの高さの変化量で基板内の加工位置を調整したが、集光レンズ36〜43を同じ高さに配置して複数平行ビーム23〜30の光路にビーム広がり角度の変化を互いに持たせ、集光レンズと合成特性で基板内の集光位置を調整することでもよい。また、上記実施例では、XYテーブル49を移動させて基板72を移動することにより集光点と基板との相対移動を行ったが、レンズ群35及びビーム23〜30を移動させることによっても相対移動は可能である。   In the above embodiment, the processing position in the substrate is adjusted by the amount of change in the height of the condenser lens from the substrate. However, the condenser lenses 36 to 43 are arranged at the same height to be in the optical path of the plurality of parallel beams 23 to 30. It is also possible to adjust the condensing position in the substrate with the converging lens and the synthesis characteristic by giving the beam divergence angle changes to each other. In the above embodiment, the XY table 49 is moved and the substrate 72 is moved to move the focusing point and the substrate relative to each other. However, the lens group 35 and the beams 23 to 30 are also moved relative to each other. Movement is possible.

以上本発明の実施例を説明した。特許請求の範囲に記載された発明の技術的思想から逸脱することなく、これらに変更を施すことができることは明らかである。   The embodiments of the present invention have been described above. Obviously, modifications may be made to the invention without departing from the scope of the invention as set forth in the appended claims.

本発明は、液晶やプラズマなどの表示デバイスに用いられる透明ガラス基板分割切断の精密加工に適用できる。   The present invention can be applied to precision processing of transparent glass substrate division cutting used for display devices such as liquid crystal and plasma.

本発明の加工装置及び方法の1実施例を説明するための図。The figure for demonstrating one Example of the processing apparatus and method of this invention. 図1の装置または方法により、基板が加工される状況を示すための図。The figure for showing the condition where a board | substrate is processed by the apparatus or method of FIG. レーザ光を分割する手段の1実施例を示す。An embodiment of means for dividing the laser beam will be described.

符号の説明Explanation of symbols

1:超短パルスレーザ発振器
2:レーザビーム
3,9,12,13、15,17,20,19:ミラー
4:偏光回転素子
6,11,16,18,14,21,22:ビームスプリッタ
23〜30:分割されたビーム
35:集光レンズ群
36〜43:集光レンズ
45:ビーム30による集光点
46:ビーム23による集光点
47:X方向矢印
48:Y方向
49:XYテーブル
50:X方向送りテーブル
51:Y方向送りテーブル
52:基板搭載台
53〜59:内部の深さ
60:ビームスプリッタへの入射光
61、62:ビームスプリッタからの出射光
63:ビームスプリッタ
64、65:方解石の偏光プリズム
71:ビーム分割手段
72:基板
73:基板オモテ面
74:基板ウラ面
83〜90:空洞
1: Ultrashort pulse laser oscillator 2: Laser beam 3, 9, 12, 13, 15, 17, 20, 19: Mirror 4: Polarization rotating element 6, 11, 16, 18, 14, 21, 22: Beam splitter 23 -30: split beam 35: condensing lens group 36-43: condensing lens 45: condensing point 46 by beam 30: condensing point 47 by beam 23: X direction arrow 48: Y direction 49: XY table 50 : X-direction feed table 51: Y-direction feed table 52: Substrate mounting bases 53 to 59: Internal depth 60: Light incident on the beam splitter 61, 62: Light emitted from the beam splitter 63: Beam splitters 64 and 65: Calcite polarizing prism 71: beam splitting means 72: substrate 73: substrate front surface 74: substrate back surface 83-90: cavity

Claims (6)

基板の表面または内部に集光点を合わせてレーザ光を照射することにより、当該基板の内部に自己収束効果による空洞を形成するレーザ加工装置であって、
基板に対して透明な波長を有し、基板100ps以下のパルス幅を有するレーザ光を発生させて出射するパルスレーザ光源と、そのレーザ光源から出射したレーザ光を分割する手段と、
分割されたレーザ光のそれぞれを、入射する側の基板表面(オモテ面)から異なる距離にある、基板の切断予定線に沿って離間して整列される複数集光点に集光させる集光レンズと、
前記基板の切断予定線に沿って、前記レーザ光をパルス状に照射しながら、前記基板に対して前記複数集光点を相対的に移動させる相対移動手段と、を備え
レーザ光照射によって、前記集光点付近に水平方向に間隔をあけて基板の内部に自己収束効果による複数の空洞を同時に形成することと、前記相対移動手段により前記集光点を相対的に移動するにあたり、基板のオモテ面とは反対側の面(ウラ面)に近い位置に形成された集光点が、オモテ面により近い位置に集光点を形成した集光点よりも先に走査されることを特徴とするレーザ加工装置。
A laser processing apparatus for forming a cavity due to a self-focusing effect in the substrate by irradiating a laser beam with a focusing point on the surface or inside of the substrate,
A pulse laser light source that emits and emits laser light having a wavelength transparent to the substrate and having a pulse width of 100 ps or less, and means for dividing the laser light emitted from the laser light source;
A condensing lens that condenses each of the divided laser beams at a plurality of condensing points that are spaced apart from each other along the planned cutting line of the substrate, which are at different distances from the substrate surface (front surface) on the incident side. When,
Relative moving means for moving the plurality of condensing points relative to the substrate while irradiating the laser beam in a pulsed manner along a planned cutting line of the substrate, In forming a plurality of cavities due to the self-convergence effect at the same time in the vicinity of the condensing point in the horizontal direction, and relatively moving the condensing point by the relative movement means, The condensing point formed at a position close to the surface (back surface) opposite to the surface is scanned before the condensing point at which the condensing point is formed at a position closer to the front surface. Laser processing equipment.
請求項1のレーザ加工装置であって、前記レーザ光を分割する手段が、偏光回転素子を入射側に有し、該偏光回転素子からの出射光が2枚の貼り合わされた偏光プリズムの一方に入射し、貼り合わせ面にて反射光と他方の偏光プリズムへの透過光に分割される構造を有し、偏光回転素子の回転角変化に依存して、該反射光と該透過光との分割比率が決定するレーザ光分割装置であることを特徴とする、レーザ加工装置。   2. The laser processing apparatus according to claim 1, wherein the means for splitting the laser beam has a polarization rotation element on the incident side, and light emitted from the polarization rotation element is applied to one of the two polarizing prisms bonded together. Incident light is split into reflected light and transmitted light to the other polarizing prism at the bonding surface, and the reflected light and transmitted light are split depending on the rotation angle change of the polarization rotation element. A laser processing apparatus, which is a laser beam splitting apparatus that determines a ratio. 偏光回転素子を入射側に有し、該偏光回転素子からの出射光が2枚の貼り合わされた偏光プリズムの一方に入射し、貼り合わせ面にて反射光と他方の偏光プリズムへの透過光に分割される構造を有し、偏光回転素子の回転角変化に依存して、該反射光と該透過光との分割比率が決定することを特徴とする、
レーザ光分割装置。
A polarization rotation element is provided on the incident side, and light emitted from the polarization rotation element enters one of the two bonded polarization prisms, and is reflected by the bonded surface and transmitted to the other polarization prism. It has a structure to be divided, and the division ratio of the reflected light and the transmitted light is determined depending on the rotation angle change of the polarization rotation element,
Laser beam splitter.
基板の表面または内部に集光点を合わせてレーザ光を照射することにより、当該基板の内部に自己収束効果による空洞を形成するレーザ加工方法であって、
基板に対して透明な波長を有し、基板100ps以下のパルス幅を有するレーザ光を発生させて出射するステップと、そのレーザ光源から出射したレーザ光を分割するステップと、
分割されたレーザ光のそれぞれを、入射する側の基板表面(オモテ面)から異なる距離にある、基板の切断予定線に沿って離間して整列される複数集光点に集光させるステップと、
前記基板の切断予定線に沿って、前記レーザ光をパルス状に照射しながら、前記基板に対して前記複数集光点を相対的に移動させるステップ、とを備え
レーザ光照射によって、前記集光点付近に水平方向に間隔をあけて基板の内部に自己収束効果による複数の空洞を同時に形成することと、前記相対的に移動させるステップの際、基板のオモテ面とは反対側の面(ウラ面)に近い位置に形成された集光点が、オモテ面により近い位置に集光点を形成した集光点よりも先に走査されることを特徴とするレーザ加工方法。
A laser processing method for forming a cavity due to a self-convergence effect in the substrate by irradiating a laser beam with a focusing point on the surface or inside of the substrate,
Generating and emitting laser light having a wavelength transparent to the substrate and having a pulse width of 100 ps or less of the substrate; dividing the laser light emitted from the laser light source;
Condensing each of the divided laser beams to a plurality of condensing points that are spaced apart from each other along a planned cutting line of the substrate at different distances from the incident substrate surface (front surface);
Moving the plurality of condensing points relative to the substrate while irradiating the laser light in a pulsed manner along a planned cutting line of the substrate, and condensing the light by laser light irradiation. A plurality of cavities due to the self-convergence effect are simultaneously formed in the substrate with a space in the horizontal direction near the point, and a surface opposite to the front surface of the substrate (back surface) during the relative movement step. A laser processing method characterized in that a condensing point formed at a position near the surface is scanned before a condensing point at which the condensing point is formed at a position closer to the front surface.
空洞を基板のオモテ面またはウラ面の何れか一方または両方に達する空洞を形成する、請求項4に記載のレーザ加工方法。   The laser processing method according to claim 4, wherein the cavity is formed so as to reach one or both of the front side and the back side of the substrate. 前記のレーザ光を分割するステップにおいて、基板のオモテ面またはウラ面に最も近い空洞を形成する分割光の強度が他の分割光の強度よりも大きくなるように分割することを特徴とする、請求項4または5に記載のレーザ加工方法。   The step of splitting the laser light is characterized in that splitting is performed such that the intensity of the split light that forms a cavity closest to the front or back surface of the substrate is greater than the intensity of the other split light. Item 6. The laser processing method according to Item 4 or 5.
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