JP2009186555A - Exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that can be reduced in size, can perform maskless exposure with stable operation and reduce an exposure time. <P>SOLUTION: The exposure apparatus includes: a stage on which an exposure object (A) can be mounted and moved; a light source; an MEMS (micro electro mechanical system) optical scanner that repeatedly tilts mirrors; and an exposure optical system that exposes an exposure object to light from the light source via the mirrors. When the exposure object is irradiated with light from the light source by scanning via the tilted mirrors by the MEMS optical scanner, patterns PA1 to PA6 are transferred onto the exposure object by moving the stage at a constant velocity in a direction Y approximately orthogonal to the light scanning direction X by the MEMS optical scanner and by controlling to an on-off state of the light from the light source. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an exposure apparatus capable of maskless exposure.

  Conventionally, a photolithography process is frequently used for forming a circuit pattern in a manufacturing process of a semiconductor integrated circuit or a liquid crystal device. Photolithography uses a photomask on which a predetermined pattern is formed, and the photomask pattern is transferred onto the substrate by exposing it onto a substrate such as silicon coated with a photoresist through the photomask. Then, a pattern is formed on the substrate through a development process, an etching process, and the like.

  A maskless exposure (direct exposure) apparatus that directly forms a desired pattern on a substrate or the like without using a photomask instead of the photolithography process as described above has been proposed (for example, see Patent Document 1 below). According to such maskless exposure, a photomask is unnecessary, which is advantageous in terms of cost, and high-precision exposure is possible.

The maskless exposure apparatus described in Patent Document 1 includes a scanning unit that relatively scans a desired exposure pattern imaged by an imaging optical system of an exposure head and the surface of an object to be exposed. An XY stage is used. As an optical scanning means, an optical scanning optical system using a polygon mirror, a galvanometer mirror and a lens optical system is known. In addition, it has been proposed to use a two-dimensional light modulation element instead of the optical scanning optical system (for example, see Patent Document 2 below).
JP 2006-259882 A JP 2003-15077 A

  If an optical scanning optical system using a polygon mirror or a galvano mirror and a lens optical system is used as the above optical scanning means, the overall configuration of the apparatus becomes large, which is an obstacle to miniaturization of the apparatus, and is expensive. Responsiveness is not good. In addition, it is said that the two-dimensional light modulation element has a problem of shortening the life and occurrence of malfunction, and a special configuration and cost are required for countermeasure against malfunction (see Patent Document 1), which is not preferable. Further, in the above-described exposure apparatus, according to the stationary exposure method that stops the stage movement by the step feed by the XY stage, the exposure time is increased and the productivity is lowered.

  An object of the present invention is to provide an exposure apparatus that can be reduced in size, can perform maskless exposure with a stable operation, and can shorten the exposure time.

  In order to achieve the above object, the exposure apparatus according to the present embodiment includes a stage that can move an object to be exposed, a light source, a MEMS optical scanner that repeatedly tilts a mirror, and light from the light source through the mirror. An exposure optical system that exposes the object to be exposed, and scans the light from the light source with a mirror tilted by the MEMS optical scanner and irradiates the object on the object to be exposed to the MEMS. The pattern is exposed on the object to be exposed by moving the light from the light source at a constant speed in a direction substantially orthogonal to the light scanning direction by the optical scanner and controlling on / off of the light from the light source.

  According to this exposure apparatus, a mirror is repeatedly tilted by a MEMS light scanner, and light from a light source is scanned to obtain scanning light, which can be directly exposed on an object to be exposed. MEMS (abbreviation) is an abbreviation for micro electro mechanical systems, and is a small device in which mechanical component parts are manufactured in a minimum size. The MEMS optical scanner is a MEMS optical device that scans light by driving a mirror by an actuator, and is configured to be small in size and highly reliable and stable in operation. As described above, by using the MEMS optical scanner for optical scanning, it is possible to reduce the size of the apparatus and realize an exposure apparatus capable of maskless exposure with stable operation.

  Furthermore, by moving the stage at a constant speed in a direction substantially perpendicular to the optical scanning direction by the MEMS optical scanner, and controlling on / off of light from the light source, a desired pattern can be exposed on the object to be exposed. Moreover, since the stage is continuously moved during the exposure, the exposure time can be shortened and the productivity can be improved. By controlling on / off of light from the light source, for example, a desired pattern such as an intermittent pattern in the scanning direction or an intermittent pattern in a direction orthogonal to the scanning direction can be exposed.

  In the exposure apparatus, it is preferable to synchronize the movement of the stage and the driving of the MEMS optical scanner (repetitive tilting of the mirror). For this purpose, for example, the movement of the stage based on the phase lock control based on the periodic signal generated by the movement of the stage and the reference periodic signal of the movement of the stage obtained from the reference signal of the MEMS optical scanner. The driving of the MEMS optical scanner can be synchronized.

  In addition, the exposure optical system includes an objective lens, and is provided with an autofocus mechanism that automatically focuses the objective lens with respect to the object to be exposed, so that it can be automatically focused during exposure. Therefore, high-precision exposure is possible even if the surface of the object to be exposed has irregularities.

  A stage detection unit that detects the position of the stage; the stage includes a motor as a drive source; and the stage is controlled by driving the motor based on a detection signal of the position detection unit. Feedback control can be performed to control the position of the stage with high accuracy.

  According to the exposure apparatus of the present invention, it is possible to reduce the size and perform maskless exposure with a stable operation, further reduce the exposure time, and improve the productivity.

  The best mode for carrying out the present invention will be described below with reference to the drawings. FIG. 1 is a view showing the schematic arrangement of the entire exposure apparatus according to this embodiment. FIG. 2 is a view for explaining the exposure optical system of FIG. FIG. 3 is a schematic diagram for explaining the relationship between the mirror and the lens of the MEMS optical scanner of the exposure optical system of FIG.

  As shown in FIG. 1, the exposure apparatus 10 has an XY stage 11 on which an object to be exposed A is placed and held and can move in the XY direction, a light source 12 composed of a semiconductor laser, and a light source 12 guided by an optical fiber FI. An exposure optical system that exposes the exposure object A with the emitted light, and an objective lens in the lens barrel 31 of the exposure optical system when performing exposure in the vertical direction of the drawing with respect to the exposure object A on the XY stage 11 An autofocus mechanism that drives and automatically focuses, an observation optical system for observing the exposure object A on the XY stage 11, and a control device 13 that controls the XY stage 11, the light source 12, and the like are provided. Yes.

  In the exposure optical system, as shown in FIGS. 1 to 3, light from the light source 12 is introduced through an optical fiber FI, collimated by a collimator lens C, reflected by a mirror M, a lens L2, a mirror 19, and a lens. The light is condensed and focused on the surface A1 of the object A on the stage 11 by the objective lens J in the lens barrel 31 via the L1, beam splitter 29, and spot irradiation is performed.

  Each optical element from the collimating lens C to the lens L1 in the exposure optical system described above is disposed and accommodated in the housing 20.

  As shown in FIG. 1, the autofocus mechanism is configured such that the light from the autofocus laser light source 22 passes through the beam splitters 27, 28, and 29 and the objective lens J (FIG. 2) in the lens barrel 31 covers the XY stage 11. The light is condensed on the surface A1 of the exposure object A, and the reflected light enters the light receiving element 21 including a photodiode (PD) through the objective lens J, the beam splitters 29, 28, and 27, the tube lens 32, and the beam splitter 26. Based on the incident light signal, the lens barrel 31 is driven in the optical axis direction by an actuator 23 made of a known piezo element, and the objective lens J (FIG. 2) in the lens barrel 31 is moved to focus. ing.

  The above-described beam splitters 26, 27, 28, 29 and the tube lens 32 are disposed and accommodated in the housing 30.

  The observation optical system can observe the object A by introducing illumination light from the light introducing unit 25 and irradiating the object A on the XY stage 11 and imaging the reflected light with the CCD camera 24. ing.

  As shown in FIG. 1, a light receiving element 21, an autofocus laser light source 22, a CCD camera 24, and a light introducing portion 25 are attached to the housing 30, and an actuator 23 is disposed at the lower end of the housing 30. A lens barrel 31 is disposed below the lens.

  The XY stage 11 includes a linear motion mechanism composed of a known ball screw or the like that converts the rotary motions of the stepping motors 15a and 15b and the stepping motors 15a and 15b of FIG. 1 into linear motions in the X and Y directions. Is built-in. The XY stage 11 can be moved at a constant speed in the horizontal direction (X direction) in FIG. 1 and in the vertical direction (Y direction) in FIG. 1 by the constant speed rotations of the stepping motors 15a and 15b.

  The control device 13 controls the stepping motors 15 a and 15 b via the motor driver 16. In addition, the exposure apparatus 10 includes a position detection unit 14 including an encoder that detects each position of the XY stage 11 in the X direction and the Y direction.

  The control device 13 controls the movement amounts of the XY stage 11 in the X direction and the Y direction. At this time, feedback control is performed on the stepping motors 15a and 15b based on the position detection signal input from the position detection unit 14. The XY stage 11 can be controlled with high accuracy.

  In addition, the control device 13 performs on / off control of the light source 12 via the driver 17 to turn on / off light from the light source 12. Note that a known electric shutter may be placed after the light source 12 and the electric shutter may be controlled by the control device 13 to turn on and off the light from the light source 12.

  Further, the control device 13 includes a CPU (Central Processing Unit), and the CPU controls the light source 12 and the XY stage 11 in a predetermined sequence so that exposure of a predetermined pattern is possible.

  The mirror M shown in FIGS. 1 to 3 constitutes a part of the MEMS optical scanner. The MEMS optical scanner will be described with reference to FIGS. 4 and 5.

  FIG. 4 is a schematic diagram for explaining the basic structure and operation principle of a MEMS optical scanner that can be used in the exposure apparatus of FIGS. FIG. 5 is a top view (a) showing a specific example of a MEMS optical scanner that can be used in the exposure apparatus of FIGS. 1 to 3, a cross-sectional view (b), and a bottom view (c) cut in the bb line direction. .

  In the MEMS optical scanner shown in FIG. 4, a rectangular planar mirror M is formed in a rectangular yoke Y so as to be connected to the yoke Y by a pair of torsion bars T, T, and a drive coil is formed along the outer periphery of the mirror M. D is formed, and a pair of permanent magnets P1 and P2 is disposed so as to face the outside of the yoke Y, and is an electromagnetically driven resonance type in which a mirror is driven by an electromagnetically driven actuator.

  In the MEMS optical scanner, as shown in FIG. 4, when a magnetic field having a magnetic flux density B is generated in a direction perpendicular to the torsion bars T and T by the permanent magnets P1 and P2 and a current i is supplied to the drive coil D, rotation by Lorentz force F occurs. The torsion bars T and T are rotated against the elastic restoring force by torque, and the mirror M is tilted. By making the current i an alternating current, the torsion bars T and T resonate and rotate in the rotation direction r and the opposite direction r ′, so that the mirror M resonates and repeats the inclination. Since F∝i · B, the inclination of the mirror M can be changed by changing the amount of current. Since the mirror M is inclined in the rotational directions r and r 'and changes the direction of light incident on the mirror M and reflected in one direction, the MEMS optical scanner in FIG. 4 is a one-dimensional movable type.

  Specifically, as shown in FIGS. 5A to 5C, the MEMS optical scanner 1 is provided with a yoke 4 on the reference surface 6 a side of the substrate 6, and with the permanent magnets 2 and 3 facing the inside of the yoke 4. The silicon chip 7 is provided between the permanent magnets 2 and 3, the mirror 5 is disposed so as to be surrounded by the silicon chip 7, a drive coil is formed as shown in FIG. As shown in FIGS. 5B and 5C, the mirror 5 resonates in the rotation direction r around the rotation center axis p and in the opposite direction r ′ as shown in FIGS. This is repeated, and is configured as a one-dimensional movable type electromagnetically driven resonance type.

  In the MEMS optical scanner 1 shown in FIGS. 5A to 5C, when the incident light n is reflected by the mirror M on the opposite surface 6b side of the reference surface 6a of the substrate 6, the reflected light n ′ is reflected from the reference surface 6a. The angle changes according to the tilt angle of the mirror 5. The MEMS optical scanner 1 is provided with a torsion bar similar to the torsion bar T in FIG. 4 on the rotation center axis p.

  The MEMS optical scanner 1 shown in FIGS. 5A to 5C has minute components, and the overall dimensions thereof are, for example, 30 mm × 22 mm × 5 mm (thickness). Is 4 mm × 4 mm. Such a MEMS optical scanner is sold, for example, by Nippon Signal Co., Ltd. under the trade name “ECO SCAN: ESS115B”.

  The MEMS optical scanner 1 is disposed at the position of the mirror M in FIGS. That is, the MEMS optical scanner 1 has mounting holes 6c at the four corners of the substrate 6, and the mirror 5 exhibits the function of the mirror M at a predetermined position in the housing 20 of the exposure apparatus 10 in FIG. It attaches with the attachment hole 6c so that it may do. Further, the MEMS optical scanner 1 is controlled by a control device 13 as shown in FIG.

  Next, the exposure operation of the exposure apparatus 10 in FIGS. 1 to 3 will be described with reference to FIGS. FIG. 6 is a schematic diagram for explaining an example of a pattern exposed on the surface of the object to be exposed in FIG.

  First, exposure by the exposure apparatus 10 will be described. First, light from the light source 12 is converted into parallel light m by the collimator lens C and enters the mirror M as shown in FIGS. The mirror M corresponds to the mirror 5 of the MEMS optical scanner 1 shown in FIGS. 5A to 5C. By passing an alternating current through the MEMS optical scanner 1 like the drive coil D shown in FIG. 4, the twist shown in FIG. The rotation about the rod T is repeated, and the inclination is repeated with respect to the optical axis b in FIGS. That is, the mirror M is tilted at the tilt angle α2 in the X direction around the optical axis b as shown in FIGS.

Here, as shown in FIG. 3, with respect to the light m ′ reflected by the mirror M inclined in the X direction, the following expression is established between the mirror M and the lens L2.
tan (α2) = x2 / f2

  Next, the light m ′ reflected by the mirror M is converted into an objective lens having a focal length f0 through a lens L2 having a focal length f2, a mirror 19 (FIG. 1), a lens L1 having a focal length f1, and a beam splitter 29 (FIG. 1). The light is condensed by J on the surface A1 of the object A to be exposed in FIG.

The mirror M scans the parallel light m from the light source 12 in the X direction in FIG. 3 by the MEMS optical scanner 1, and the scanning length x0 of the scanning light in the X direction from the optical axis c on the surface A1 in FIG. It can represent with following Formula (1).
x0 = f0 · (f2 / f1) · tan (α2) (1)
Where α2: tilt angle (runout angle) in the X direction with respect to the optical axis b of the mirror M

  As described above, the light from the light source 12 is scanned by the mirror M in the X direction with the scanning length x0 on the surface A1 of the exposure object A placed and held on the XY stage 11 of FIG. Line exposure can be performed.

  Next, exposure of a predetermined pattern by the above-described exposure apparatus 10 will be described. The object A is placed and held on the XY stage 11, the MEMS optical scanner 1 is driven, and the mirror M is vibrated, so that the scanning light scans on the surface A1 of the object A as shown in FIG. Scanned in direction X. Further, the moving direction of the exposure object A by the XY stage 11 is set to the Y direction, and the stepping motor 15b of the XY stage 11 is driven to move the XY stage 11 in the moving direction (direction orthogonal to the scanning direction X) Y at a constant speed. Move.

  In order to stably drive the MEMS optical scanner 1 driven at the resonance frequency, it is necessary to vibrate the mirror M at a constant frequency. Therefore, when exposure is performed using such a resonance type mirror, exposure is performed by moving the stage 11 so that the exposure timing reference is the MEMS optical scanner 1.

  That is, by synchronizing the movement of the XY stage 11 with the vibration of the mirror M by the MEMS optical scanner 1, the angle of the mirror M and the exposure position are synchronized (matched) while moving the XY stage 11 at a constant speed. The exposure is performed by turning on and off the light from.

  For example, while moving the XY stage 11 at a constant speed, a line pattern PA1 having a length corresponding to the scanning length x0 in the X direction is exposed on the surface A1 of the exposure object A as shown in FIG. By turning off the light from the light source 12 for a time corresponding to, and then exposing the next line pattern PA2, an intermittent pattern can be exposed in the Y direction. The line pattern PA2 is an intermittent line pattern by turning on and off the light from the light source 12. Similarly, the line patterns PA3 to PA6 are exposed.

  Alternatively, the line patterns PA2 to PA6 may be exposed by moving the XY stage 11 and stopping at a predetermined exposure position to expose the line pattern PA1 of FIG.

  When the autofocus mechanism shown in FIG. 1 is activated during the exposure, the light from the laser light source 22 is condensed on the surface A1 of the exposure object A via the objective lens J (FIG. 2), and the reflected light thereof. Enters the light receiving element 21, and the actuator 23 drives the objective lens J in the lens barrel 31 in the direction of the optical axis based on the incident light signal to automatically focus. By continuously operating the autofocus mechanism during exposure, exposure can be performed with high accuracy even if the surface A1 of the object A to be exposed has irregularities. Further, the surface A1 of the exposure object A is observed with the CCD camera 24 as necessary.

  As described above, the MEMS optical scanner is a MEMS optical device that scans light by resonating a mirror by an electromagnetically driven actuator, and is configured in a small size and has high reliability and stable operation. By using the scanner for optical scanning of the exposure apparatus 10, it is possible to reduce the size of the apparatus and realize an exposure apparatus capable of maskless exposure with stable operation.

  According to the conventional optical scanning optical scanning optical system using a polygon mirror or galvano mirror and a lens optical system, the overall configuration of the apparatus is large, expensive, and responsive. By using the MEMS optical scanner as in the above embodiment, it is possible to reduce the size and size of the exposure apparatus 10, and to perform optical scanning of the exposure apparatus 10 with good response, and further save power compared to the conventional configuration. In addition, the conventional two-dimensional light modulation element, which is another optical scanning means, has a problem of shortening the lifetime and occurrence of malfunction, but by using a MEMS optical scanner, reliable and stable exposure is possible. It becomes.

  Next, the constant speed exposure method as shown in FIG. 6 in the present embodiment will be described more specifically with reference to FIGS. FIG. 7 is a block diagram for explaining the constant-speed exposure control in the control device 13 of FIG. FIG. 8 is a timing chart of signals (a) to (g) in the constant speed exposure control of FIG.

  As shown in FIG. 7, when a set value V related to the speed control of the XY stage 11 is input and the XY stage 11 is moved at a constant speed, the logic is inverted as the XY stage 11 passes through a periodic position. A breakpoint signal (periodic BP output signal) having a constant frequency such as 8 (f) is output, this periodic BP output signal is input to the sampler 63, and the sampling signal Yout (i) is input to the integrator 65, Further, a reference breakpoint period signal (reference BP period signal) as shown in FIG. 8D is input from the reference signal generator 61 to the sampler 64 via the -1/2 offset circuit 62, and the sampling signal Yo (i ) Is input to the integrator 65, and the phase difference signal integrated by a predetermined number i of samples by the integrator 65 is normalized by Imax based on the phase difference of these periodic signals, and the target value e is output. Write, IderutaVmax is converted into ΔVmax is fed back control by (V-eΔVmax) is made. Such PLL control is proportional control. When the target value e = 0, the phase of the periodic BP output signal is locked as shown in FIG. 8G, and the phase difference becomes zero.

  The break point (BP) is a position where the signal logic is inverted depending on the registered position. Further, the reference BP periodic signal can be obtained by multiplying or dividing the scanner zero cross signal as shown in FIG.

  The mirror M of the MEMS optical scanner (scanner) 1 in FIG. 1 vibrates at the time interval (angle) in FIG. 8A, and the control device 13 in FIG. 1 transmits the back electromotive force signal of the scanner 1 in FIG. From FIG. 8, a scanner zero cross signal as shown in FIG. 8C is obtained and used as an exposure timing signal.

  As shown in FIG. 6, the XY stage 11 is moved at a constant speed with the moving direction Y of the XY stage 11 orthogonal to the optical scanning direction X of the mirror M by the MEMS optical scanner. At this time, as shown in FIG. 8F, the periodic BP output signal is output by the periodic movement of the XY stage 11.

  A scanner zero-cross signal as shown in FIG. 8C is multiplied or divided to obtain a reference BP periodic signal, and the PLL as described above is obtained from this reference BP periodic signal and the periodic BP output signal of FIG. By performing control (phase lock control), a periodic BP output signal having a phase match as shown in FIG. 8G is obtained.

  By controlling the speed of the XY stage 11 by the PLL control as described above, the vibration of the mirror M of the MEMS optical scanner 1 and the exposure position on the surface A1 of the object A to be exposed on the XY stage 11 can be synchronized. it can.

  When the XY stage 11 moves at a constant speed and reaches a predetermined exposure position on the surface A1 of the exposure object A, a predetermined clock is generated according to the exposure command value using the zero cross signal of FIG. Exposure is performed by turning on and off the light irradiation with a number.

Next, each control parameter in the constant speed exposure control will be described.
Minimum exposure interval in the Y direction in FIG. 6: Δxex (mm)
Periodic BP interval: ΔxBP (mm)
Exposure stage speed: Vex (mm / s)
Periodic BP output frequency: fBP (Hz)
Frequency of MEMS optical scanner 1: fscan (Hz)
Ratio of periodic BP interval ΔxBP to minimum exposure interval Δxex: Δxex / ΔxBP ≧ 1

The calculation formula of each control parameter is as follows. However, Δxex / ΔxBP ≧ 2 (integer)
Vex (mm / s) = fscan (Hz) × Δxex (mm)
ΔxBP (mm) = Δxex (mm) × (Δxex / ΔxBP)
From stage speed v = fscan · Δxex = fBP (2ΔxBP)
fBP = fscan · Δxex / (2ΔxBP)

  By the constant-speed exposure control as described above, the light irradiation from the light source 12 is performed by matching (synchronizing) the angle of the mirror M of the MEMS optical scanner 1 with the exposure position while moving the exposure object A at a constant speed on the XY stage 11. The line patterns PA1 to PA6 as shown in FIG. 6 can be exposed by performing ON / OFF control of the light irradiation. Further, since the exposure object A is exposed while continuing to move the XY stage 11, the exposure time can be shortened and productivity can be improved as compared with the conventional static exposure method.

  Note that the vibration frequency of the mirror M of the MEMS optical scanner 1 is considerably larger than the speed of the XY stage 11, so that even if the XY stage 11 is moved at a constant speed and exposed with scanning light from the mirror M, the line pattern PA1. There is no effect on the linearity of .about.PA6.

  In this embodiment, FIG. 6 is only an example of patterns that can be exposed. By controlling on / off of light from the light source 12, an arbitrary pattern can be formed on the object A by the light from the light source 12. Exposure can be made on the surface A1. For example, the control device 13 causes the CPU to read a program for exposing in a desired pattern from a storage device such as an internal or external hard disk storage device, and controls the light source 12 according to the program, whereby the exposure device 10 Automatic exposure with this pattern is possible.

  As described above, the best mode for carrying out the present invention has been described. However, the present invention is not limited to these, and various modifications are possible within the scope of the technical idea of the present invention. For example, the scanning width 0 in the X direction of the scanning light on the surface A1 of the exposure object A can be changed within a predetermined range by changing the mirror tilt angle by changing the drive current amount of the mirror M to the MEMS optical scanner 1. Can be adjusted.

  Moreover, although the MEMS optical scanner was comprised from the resonance type displaced by an alternating current, the MEMS optical scanner displaced by a direct current may be sufficient.

It is a figure which shows the schematic structure of the whole exposure apparatus by this Embodiment. It is a figure for demonstrating the exposure optical system of FIG. It is a schematic diagram for demonstrating the relationship between the mirror and lens of the MEMS optical scanner of the exposure optical system of FIG. FIG. 4 is a schematic diagram for explaining the basic structure and operation principle of a MEMS optical scanner that can be used in the exposure apparatus of FIGS. FIG. 4 is a top view (a) showing a specific example of a MEMS optical scanner that can be used in the exposure apparatus of FIGS. 1 to 3, a cross-sectional view (b), and a bottom view (c) taken along line bb. It is a schematic diagram for demonstrating an example of the pattern exposed on the surface of the to-be-exposed thing of FIG. It is a block diagram for demonstrating the constant-speed exposure control in the control apparatus 13 of FIG. It is a timing chart of each signal (a)-(g) in the constant-speed exposure control of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 MEMS optical scanner 5 Mirror 10 Exposure apparatus 11 XY stage 12 Light source 13 Control apparatus 14 Position detection part 15a, 15b Stepping motor 21 Light receiving element 22 Autofocus laser light source 23 Actuator 24 CCD camera 25 Light introduction part 26-29 Beam splitter 20 , 30 Housing 31 Lens tube 32 Tube lens A Object to be exposed A1 Surface B Magnetic flux density C Collimating lens D Drive coil F Lorentz force FI Optical fiber J Objective lens L1, L2 Lens M Mirror P1, P2 Permanent magnet PA1-PA6 Line pattern T Twist bar Y Yoke b Optical axis c Optical axis i Current m Parallel light m 'Reflected light p Rotation center axis r Rotation direction r' Reverse direction of rotation direction r

Claims (5)

A stage capable of moving the object to be exposed, a light source, a MEMS optical scanner that repeatedly tilts a mirror, and an exposure optical system that exposes light from the light source onto the object to be exposed through the mirror,
When the light from the light source is scanned by the mirror tilted by the MEMS optical scanner and irradiated onto the object to be exposed, the stage is moved at a constant speed in a direction substantially orthogonal to the optical scanning direction by the MEMS optical scanner. And an exposure apparatus that exposes a pattern on the object to be exposed by controlling on / off of light from the light source.   The exposure apparatus according to claim 1, wherein movement of the stage is synchronized with driving of the MEMS optical scanner.   The movement of the stage and the driving of the MEMS optical scanner based on phase lock control based on the periodic signal generated by the movement of the stage and the reference periodic signal of the movement of the stage obtained from the reference signal of the MEMS optical scanner, The exposure apparatus according to claim 1, wherein the two are synchronized. The exposure optical system includes an objective lens;
The exposure apparatus according to claim 1, further comprising an autofocus mechanism that drives the objective lens relative to the object to be exposed and automatically focuses the object. A position detector for detecting the position of the stage;
The stage has a motor as a drive source,
The exposure apparatus according to any one of claims 1 to 4, wherein the motor is driven based on a detection signal of the position detection unit to control the position of the stage.

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