JP2009162965A5 - - Google Patents

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Publication number
JP2009162965A5
JP2009162965A5 JP2008000059A JP2008000059A JP2009162965A5 JP 2009162965 A5 JP2009162965 A5 JP 2009162965A5 JP 2008000059 A JP2008000059 A JP 2008000059A JP 2008000059 A JP2008000059 A JP 2008000059A JP 2009162965 A5 JP2009162965 A5 JP 2009162965A5
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JP
Japan
Prior art keywords
layer
particles
forming
substrate
particle
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JP2008000059A
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English (en)
Japanese (ja)
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JP4945460B2 (ja
JP2009162965A (ja
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Priority to JP2008000059A priority Critical patent/JP4945460B2/ja
Priority claimed from JP2008000059A external-priority patent/JP4945460B2/ja
Priority to US12/347,187 priority patent/US8361339B2/en
Publication of JP2009162965A publication Critical patent/JP2009162965A/ja
Publication of JP2009162965A5 publication Critical patent/JP2009162965A5/ja
Application granted granted Critical
Publication of JP4945460B2 publication Critical patent/JP4945460B2/ja
Priority to US13/723,374 priority patent/US8840258B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008000059A 2008-01-04 2008-01-04 反射防止構造の形成方法および反射防止構造 Expired - Fee Related JP4945460B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008000059A JP4945460B2 (ja) 2008-01-04 2008-01-04 反射防止構造の形成方法および反射防止構造
US12/347,187 US8361339B2 (en) 2008-01-04 2008-12-31 Antireflection structure formation method and antireflection structure
US13/723,374 US8840258B2 (en) 2008-01-04 2012-12-21 Antireflection structure formation method and antireflection structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008000059A JP4945460B2 (ja) 2008-01-04 2008-01-04 反射防止構造の形成方法および反射防止構造

Publications (3)

Publication Number Publication Date
JP2009162965A JP2009162965A (ja) 2009-07-23
JP2009162965A5 true JP2009162965A5 (https=) 2010-12-02
JP4945460B2 JP4945460B2 (ja) 2012-06-06

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JP2008000059A Expired - Fee Related JP4945460B2 (ja) 2008-01-04 2008-01-04 反射防止構造の形成方法および反射防止構造

Country Status (2)

Country Link
US (2) US8361339B2 (https=)
JP (1) JP4945460B2 (https=)

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CN102859397B (zh) 2010-04-13 2015-11-25 旭化成电子材料株式会社 自支撑膜、自支撑结构体、自支撑膜的制造方法及表膜
US9017566B2 (en) * 2010-04-30 2015-04-28 Corning Incorporated Anti-glare surface treatment method and articles thereof
US9085484B2 (en) 2010-04-30 2015-07-21 Corning Incorporated Anti-glare surface treatment method and articles thereof
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WO2013151038A1 (ja) * 2012-04-04 2013-10-10 ナルックス株式会社 耐光性プラスチックシート及びその製造方法
WO2013154077A1 (ja) * 2012-04-09 2013-10-17 旭硝子株式会社 微細パターンを表面に有する物品およびその製造方法、ならびに光学物品、その製造方法および複製モールドの製造方法
WO2013181007A1 (en) * 2012-05-29 2013-12-05 Corning Incorporated Method for texturing a glass surface
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TWI564585B (zh) 2012-12-06 2017-01-01 大同股份有限公司 抗反射基板結構及其製作方法
CN104781059B (zh) * 2012-12-13 2017-05-10 王子控股株式会社 光学元件制作用模具及其制造方法、光学元件
JP2015138179A (ja) * 2014-01-23 2015-07-30 王子ホールディングス株式会社 微細構造体および微細構造体の製造方法
DE102014105939B4 (de) * 2014-04-28 2019-08-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung einer Entspiegelungsschicht auf einer Silikonoberfläche und optisches Element
US20180050959A1 (en) * 2015-03-24 2018-02-22 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. Fabrication of nanostructures in and on organic and inorganic substrates using mediating layers
CN106384745B (zh) * 2016-11-16 2019-01-08 京东方科技集团股份有限公司 显示基板的制备方法
CN107561611B (zh) * 2017-08-04 2020-04-28 东莞市中图半导体科技有限公司 一种蓝宝石基板的表面图案化加工方法
KR101962034B1 (ko) 2017-10-25 2019-03-25 한국기초과학지원연구원 무반사 나노패턴을 포함하는 광대역 대물렌즈 및 이의 제조방법
CN108037549A (zh) * 2017-12-11 2018-05-15 中国科学院长春光学精密机械与物理研究所 一种接触屏及其制备方法
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CN116356577A (zh) * 2023-04-07 2023-06-30 长春理工大学 一种自清洁碳纤维及其制备方法

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