JP2009146975A - Substrate treating device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate treating device which is improved in throughput on the whole by decreasing operation stop states of a transport robot as much as possible. <P>SOLUTION: The transport robot TR is controlled to repeatedly perform one cycle of transporting processes from an entrance position (feed mounting portion SPASS) to an exit position (return mounting portion RPASS) through reloading positions 1, 2, 3, and 4. When it is found that a new substrate appears at the entrance position while the transport robot is performing a transporting process of a first cycle, the transporting process of the step is changed to include a final transporting process of movement to the entrance position. While the transport robot TR is performing the final transporting process included in the transporting process of the step having been changed, namely, during moving operation to the entrance position, a transporting process of a following second cycle beings to be set. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a substrate processing apparatus for successively processing a plurality of semiconductor substrates, glass substrates for liquid crystal display devices, glass substrates for photomasks, optical disk substrates and the like (hereinafter simply referred to as “substrates”).

  As is well known, products such as semiconductors and liquid crystal displays are manufactured by performing a series of processes such as cleaning, resist coating, exposure, development, etching, interlayer insulation film formation, heat treatment, and dicing on the substrate. Has been. In general, a single substrate processing apparatus is configured by incorporating a processing unit that executes these various types of processing and a transfer robot that transfers a substrate to the processing unit. For example, an apparatus incorporating a coating processing unit that performs resist coating processing on a substrate, a development processing unit that performs development processing on a substrate, and a transport robot that transports the substrate between them is widely used as a so-called coater and developer.

  As an example of such a substrate processing apparatus, for example, in Patent Document 1, one cell is configured with one transfer robot and a plurality of processing units to be transferred, and the plurality of cells are arranged in parallel. There is disclosed a coater and developer that provides a substrate transfer unit between cells and transfers a substrate between transfer robots of adjacent cells via the substrate transfer unit.

  The apparatus disclosed in Patent Document 1 performs a resist coating process and a development process on a substrate. Similarly to this, a configuration in which a plurality of cells are connected via a substrate transfer unit is used for other types of processes. It is also conceivable to apply to a cleaning processing apparatus that cleans a substrate using a brush, for example. That is, the cleaning processing apparatus is configured by connecting the indexer cell for collecting the unprocessed substrate and the processed substrate to the cleaning processing cell in which the brush cleaning unit is arranged via the substrate delivery unit. Each of the indexer cell and the cleaning treatment cell is provided with a dedicated transport robot for each cell.

JP 2005-93653 A

  In the substrate processing apparatus having such a cell structure, all the main substrates in the cell are handled by one transfer robot, and the operation speed of the transfer robot is directly connected to the throughput of the entire apparatus. Therefore, even a slight stop of the transfer robot that performs the continuous transfer operation in the cell is a factor that decreases the throughput of the entire apparatus.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate processing apparatus in which the operation stop state of the transfer robot is reduced as much as possible to improve the throughput of the entire apparatus.

  In order to solve the above-mentioned problem, the invention of claim 1 is directed to a substrate processing apparatus for continuously processing a plurality of substrates, one transfer robot and a plurality of transfer positions to which a substrate is transferred by the transfer robot. A unit processing section, a section control means for controlling the entire operation in the unit processing section, and a transport robot control means for controlling the operation of the transport robot, wherein the plurality of transfer positions are the unit processing section. An entrance position that serves as an entrance of the substrate to the compartment and an exit position that serves as an exit of the substrate from the unit processing compartment, wherein the compartment control means is configured such that the transfer robot moves from the entrance position toward the exit position. The transfer process of one cycle to be performed for each transfer position is sequentially set, and the transfer robot control means The operation of the transfer robot is controlled so as to sequentially execute the transfer process of one cycle set by the section control means, and the transfer position of the first cycle is set to the entrance position while the transfer robot is executing. When it is found that a new substrate appears, the section control means changes the transfer process of the first cycle so as to include a final transfer process of moving to the entrance position, and the transfer robot control The means controls the operation of the transfer robot so as to execute the transfer process of the first cycle after the change.

  According to a second aspect of the present invention, in the substrate processing apparatus according to the first aspect of the invention, the section control means executes the final transport step included in the transport step of the first cycle after the transport robot is changed. During the operation, the setting of the transport process of the second cycle following the transport process of the first cycle is started.

  According to a third aspect of the present invention, in the substrate processing apparatus for continuously processing a plurality of substrates, a unit processing section having one transfer robot and a plurality of transfer positions to which the substrate is transferred by the transfer robot. And a transfer control means for controlling the transfer operation of the transfer robot in the unit processing section, wherein the plurality of transfer positions include an entrance position serving as an entrance of a substrate to the unit processing section and the unit processing section. An exit position serving as an exit of the substrate from the substrate, wherein the transport control means performs a one-cycle transport operation for the plurality of transfer positions from the entrance position to the exit position by the transport robot. When it is found that a new substrate appears at the entrance position, And controlling the conveying robot to perform a movement to said inlet position as final operation.

  According to the first and second aspects of the present invention, when it is found that a new substrate appears at the entrance position while the transport robot performs the transport process of the first cycle, The section control means changes the transfer process of the first cycle so as to include the final transfer process of moving, and the transfer robot control means operates the transfer robot so as to execute the changed transfer process of the first cycle. Therefore, when a new substrate appears at the entrance position, the transfer robot moves to the entrance position without stopping the operation, and the operation stop state of the transfer robot is reduced as much as possible to increase the throughput of the entire apparatus. Can be improved.

  In particular, according to the invention of claim 2, while the transfer robot is executing the final transfer process included in the transfer process of the first cycle after the change, the section control means is in the transfer process of the first cycle. Since the setting of the transfer process of the subsequent second cycle is started, the throughput can be improved by the overlap time of the movement time of the transfer robot to the entrance position and the transfer process setting time of the second cycle.

  According to the invention of claim 3, a new substrate appears at the entrance position while the transport robot performs a one-cycle transport operation for a plurality of transfer positions from the entrance position to the exit position. Is determined, the transfer robot is controlled to move to the entrance position as the final operation of the transfer operation in one cycle. Therefore, the transfer robot stops the operation when a new substrate appears at the entrance position. Therefore, the robot can move to the entrance position without any problem, and the operation stop state of the transfer robot can be reduced as much as possible to improve the throughput of the entire apparatus.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  FIG. 1 is a plan view of a substrate processing apparatus 100 according to the present invention. FIG. 2 is a view as seen from the line AA in FIG. 1 and 2 are appropriately attached with an XYZ orthogonal coordinate system in which the Z-axis direction is the vertical direction and the XY plane is the horizontal plane in order to clarify the directional relationship. The substrate processing apparatus 100 is a cleaning apparatus that continuously performs scrub cleaning processing on a plurality of substrates such as semiconductor wafers. The substrate processing apparatus 100 includes two cells (unit processing sections) of an indexer cell ID and a cleaning processing cell SP arranged in parallel. It is configured.

  The indexer cell ID is a cell for discharging an unprocessed substrate received from the outside of the apparatus to the cleaning processing cell SP and carrying out a processed substrate received from the cleaning processing cell SP to the outside of the apparatus. The indexer cell ID includes a carrier stage 11 on which a plurality of carriers C (four in this embodiment) are placed side by side in the Y-axis direction, an unprocessed substrate W is taken out from each carrier C, and each carrier C has been processed. And an indexer robot 12 for storing the substrate W.

  On the carrier stage 11, a carrier C storing an unprocessed substrate W is carried from the outside of the apparatus by an AGV (Automated Guided Vehicle) or the like and placed. Further, the substrate W that has been subjected to the scrub cleaning process in the apparatus is stored again in the carrier C placed on the carrier stage 11. The carrier C storing the processed substrate W is also carried out of the apparatus by AGV or the like. That is, the carrier stage 11 functions as a substrate integration unit that integrates the unprocessed substrate W and the processed substrate W. In addition to the FOUP (front opening unified pod) that accommodates the substrate W in a sealed space, the carrier C may be a standard mechanical interface (SMIF) pod or an OC (open cassette) that exposes the storage substrate W to the outside air. There may be.

  The indexer robot 12 includes two transfer arms 13a and 13b, an arm stage 12b on which these arms are mounted, and a movable base 12a. The movable table 12a is screwed into a ball screw 12c extending in parallel with the carrier stage 11 (along the Y-axis direction) and is slidable with respect to the two guide rails 12d. Therefore, when the ball screw 12c is rotated by a rotation motor (not shown), the entire indexer robot 12 including the movable base 12a moves horizontally along the Y-axis direction.

  An arm stage 12b is mounted on the movable table 12a. The movable table 12a incorporates a motor for turning the arm stage 12b around an axis along the vertical direction (Z-axis direction) and a motor for moving up and down along the vertical direction (both not shown). . On the arm stage 12b, the above-described two transfer arms 13a and 13b are arranged vertically with a predetermined pitch. As shown in FIG. 1, the transfer arms 13 a and 13 b have “C” -shaped tips in plan view, and a plurality of pins protruding inward from the inside of the “C” -shaped frame. By supporting the peripheral edge of the substrate W from below, the two transfer arms 13a and 13b can hold one substrate W respectively. Further, each of the transfer arms 13a and 13b is configured to be movable back and forth in the horizontal direction (in the turning radius direction of the arm stage 12b) independently by a slide drive mechanism (not shown) provided in the arm stage 12b. .

  With such a configuration, the transfer arms 13a and 13b can perform horizontal movement along the Y-axis direction, up-and-down movement, turning operation in a horizontal plane, and advance and retreat movement along the turning radius direction. Then, the indexer robot 12 causes each of the transfer arms 13a and 13b to access the carrier C placed on the carrier stage 11 and each substrate placement unit of the substrate delivery unit 50 described later, and the carrier stage 11 and the substrate delivery unit 50 The substrate W is transferred between the two.

  A cleaning cell SP is provided adjacent to the indexer cell ID. A partition wall 15 is provided between the indexer cell ID and the cleaning cell SP, and a substrate delivery section 50 is provided through a part of the partition wall 15. That is, the substrate delivery unit 50 is provided at the connection portion between the indexer cell ID and the cleaning cell SP, and is interposed for delivery of the substrate W between both cells.

  The substrate delivery section 50 according to the present embodiment is configured by stacking two stages of substrate placement sections in the vertical direction. The upper substrate mounting portion is a return mounting portion RPASS for transferring the processed substrate W from the cleaning processing cell SP to the indexer cell ID. On the other hand, the lower substrate platform is a feed platform SPASS for transferring an unprocessed substrate W from the indexer cell ID to the cleaning cell SP. Each of the feed placement unit SPASS and the return placement unit RPASS is configured by standing three fixed support pins on a flat plate (see FIG. 1).

  With respect to each of the sending placement unit SPASS and the return placing unit RPASS, the indexer robot 12 having the indexer cell ID and the transport robot TR of the cleaning processing cell SP can access each other to deliver the substrate W. is there. The indexer robot 12 with the indexer cell ID places the unprocessed substrate W taken out from the carrier C on the feeding platform SPASS, and the transport robot TR of the cleaning cell SP receives and takes it out. Conversely, the transport robot TR places the cleaned processed substrate W on the return placement unit RPASS, which is received by the indexer robot 12 and stored in the carrier C. An optical sensor (not shown) that detects the presence / absence of the substrate W is provided in each of the feeding placement unit SPASS and the return placement unit RPASS.

  The cleaning processing cell SP is a cell that performs a scrub cleaning process on the substrate W, and includes two cleaning processing units SS1 and SS2 that perform the scrub cleaning process, reversing units FR and RF that invert the front and back of the substrate W, and a cleaning processing unit. And a transfer robot TR that transfers the substrate W to the SS1 and SS2 and the reversing units FR and RF. In the cleaning processing cell SP, the cleaning processing unit SS1 and the cleaning processing unit SS2 are arranged to face each other with the transport robot TR interposed therebetween. Specifically, the cleaning processing unit SS1 is located on the back side of the apparatus, and the cleaning processing unit SS2 is located on the front side of the apparatus.

  The cleaning processing unit SS1 and the cleaning processing unit SS2 have the same configuration. That is, each of the cleaning processing units SS1 and SS2 holds the substrate W in a horizontal posture and rotates the substrate W held on the spin chuck 22 on the spin chuck 22 that rotates around the axis along the vertical direction. A cleaning brush 23 that performs scrub cleaning in contact with or in close proximity, a nozzle that discharges cleaning liquid (for example, pure water) onto the upper surface of the substrate W, a spin motor that rotates the spin chuck 22, and the substrate W held on the spin chuck 22 A cup or the like surrounding the periphery is provided (nozzle, spin motor and cup are not shown). The cleaning units SS1 and SS2 can clean either the substrate W whose front surface (device pattern formation surface) faces upward or the substrate W whose rear surface faces upward. The spin chuck 22 The substrate W is held by gripping the edge of the substrate.

  The two reversing parts FR and RF are installed at the end (the (+ X) side end) opposite to the indexer cell ID of the transport path where the transport robot TR is disposed. The inversion part FR inverts the substrate W whose top surface is facing upward by 180 ° up and down and turns the back surface upward. Conversely, the reversing unit RF reverses the substrate W whose back surface is facing upward by 180 degrees up and down and turns the front surface upward.

  The transfer robot TR includes two holding arms 6a and 6b that hold the substrate W in a horizontal posture in close proximity to each other. The holding arms 6a and 6b have a "C" shape at the front end portion in plan view, and a plurality of pins projecting inward from the inside of the "C" shaped arm lower the periphery of the substrate W. It comes to support from.

  The base 8 of the transport robot TR is fixedly installed on the apparatus base (apparatus frame). On this base 8, a guide shaft 9a is erected and a belt drive mechanism 9b is provided. The belt drive mechanism 9b rotates the timing belt between two upper and lower pulleys by a pulse motor. When the belt driving mechanism 9b rotates the timing belt, the lifting platform 10a connected thereto is guided by the guide shaft 9a and moves up and down along the vertical direction.

  Further, an arm base 10b is mounted on the lifting platform 10a so as to be able to turn around an axis along the vertical direction. A motor for turning the arm base 10b is built in the elevator 10a. The two holding arms 6a and 6b described above are arranged vertically on the arm base 10b. Each holding arm 6a, 6b is configured to be able to move forward and backward independently in the horizontal direction (in the turning radius direction of the arm base 10b) by a slide drive mechanism mounted on the arm base 10b.

  With such a configuration, the transfer robot TR individually feeds the two holding arms 6a and 6b to access the mounting unit SPASS, the return mounting unit RPASS, the reversing units FR and RF, and the cleaning processing units SS1 and SS2. Thus, the substrate W can be exchanged with them. Note that another mechanism such as a screw feed mechanism using a ball screw may be employed as the lifting drive mechanism of the transport robot TR.

  Next, a control mechanism of the substrate processing apparatus 100 having the above mechanical configuration will be described. FIG. 3 is a block diagram showing a main configuration of the control mechanism. The control mechanism of the substrate processing apparatus 100 has a hierarchical structure, in which two cell controllers are provided below the main controller MC, and a plurality of controllers are provided below each of them. The configuration of each controller as hardware is the same as that of a general computer. That is, each controller stores a CPU that performs various arithmetic processes, a ROM that is a read-only memory that stores basic programs, a RAM that is a readable and writable memory that stores various information, and control applications and data. A magnetic disk or the like is provided.

  One uppermost main controller MC is provided in the entire substrate processing apparatus 100, and is mainly responsible for management and information control of the entire apparatus. The main controller MC is provided with a main panel MP and a keyboard KB. The main panel MP functions as a display for the main controller MC. In addition, various commands and parameters can be input to the main controller MC from the keyboard KB. The main panel MP may be configured by a touch panel, and input work may be performed from the main panel MP to the main controller MC.

  Two cell controllers, that is, an ID cell controller IDC and an SS cell controller SSC are provided below the main controller MC. One cell controller is provided corresponding to each cell, an ID cell controller IDC is provided corresponding to the indexer cell ID, and an SS cell controller SSC is provided corresponding to the cleaning cell SP. . Each cell controller controls the overall operation of the corresponding cell.

  The ID cell controller IDC has an algorithm for carrying a substrate within the indexer cell ID, and passes a substrate carrying command to the indexer robot controller IRC based on the substrate processing information from the main controller MC. The substrate delivery unit 50 and the carrier stage 11 are also connected to the ID cell controller IDC, and detection signals indicating the presence / absence of the substrate W in the substrate delivery unit 50 and the presence / absence of the carrier C in the carrier stage 11 are transmitted to the ID cell controller IDC. Is done.

  The indexer robot controller IRC is a subordinate controller of the ID cell controller IDC, and instructs the indexer robot 12 to perform a specific moving operation, placing operation, and taking operation in response to a conveyance command from the ID cell controller IDC. In addition, between the indexer robot controller IRC and the indexer robot 12, a controller (not shown) that converts a command from the indexer robot controller IRC and calculates drive data for the indexer robot 12 is provided. 12 receives drive data from the controller and performs various operations such as horizontal movement, up and down, and turning.

  On the other hand, the SS cell controller SSC has an algorithm for transporting the substrate in the cleaning processing cell SP, and passes a substrate transport command to the transport robot controller TRC based on the substrate processing information from the main controller MC. Further, the SS cell controller SSC passes a command for cleaning processing and reversal processing to a unit controller (not shown) based on the substrate processing information from the main controller MC, and the unit controller receiving the command receives the cleaning processing unit SS1. , SS2 and the inverters FR and RF are controlled to perform each process. Furthermore, the SS cell controller SSC is also connected to the substrate delivery unit 50, and a detection signal indicating the presence or absence of the substrate W in the substrate delivery unit 50 is transmitted to the SS cell controller SSC.

  The transport robot controller TRC is a subordinate controller of the SS cell controller SSC, and receives a transport command from the SS cell controller SSC, and instructs the transport robot TR to perform a specific moving operation, placing operation, and taking operation. Similarly to the above, between the transfer robot controller TRC and the transfer robot TR, a controller (not shown) that converts the command from the transfer robot controller TRC and calculates drive data for the transfer robot TR is provided. The transfer robot TR receives drive data from the controller and performs various operations such as horizontal movement, raising and lowering, and turning.

  Next, the operation of the substrate processing apparatus 100 of the present embodiment, specifically, the procedure for transporting the substrate W in the substrate processing apparatus 100 will be described. The main controller MC stores a recipe describing a processing procedure and processing conditions, disassembles the description contents of the recipe, and passes them to the ID cell controller IDC and the SS cell controller SSC. Then, the ID cell controller IDC and the SS cell controller SSC give instructions to the lower controller according to the description contents of the recipe delivered from the main controller MC, and the substrate transport and substrate processing in the indexer cell ID and the cleaning processing cell SP are executed. Is done.

  First, an unprocessed substrate W is loaded from the outside of the apparatus into the carrier stage 11 of the indexer cell ID by AGV or the like while being stored in the carrier C. Subsequently, the indexer robot 12 takes out the unprocessed substrate W from the carrier C, and transports it to the feeding placement unit SPASS of the substrate delivery unit 50. When the unprocessed substrate W is placed on the sending platform SPASS, the transport robot TR circulates and transports the substrate W in the cleaning processing cell SP, and the substrate W is subjected to cleaning processing. Hereinafter, the transfer operation of the substrate W by the transfer robot TR in the cleaning processing cell SP will be described in detail.

  The cleaning process of the substrate W in the substrate processing apparatus 100 may include front surface cleaning, back surface cleaning, or front and back surface cleaning processing. Depending on which process is performed, the transport procedure of the substrate W (the transport procedure of the substrate is referred to as “flow”) differs. FIG. 4 is a diagram illustrating an example of a flow. Such a flow is in accordance with the description content of the recipe. Flow A is a transfer procedure when the back surface cleaning is performed on the substrate W, and Flow B is a transfer procedure when the surface cleaning is performed on the substrate W.

  When the back surface cleaning is performed on the substrate W, as shown in the flow A, the unprocessed substrate W received from the indexer cell ID is transported to the reversing unit FR and the back surface is directed upward, and then the cleaning processing unit SS1 or the cleaning unit The substrate is transferred to one of the processing units SS2 to execute the back surface cleaning process. After the cleaning process, the substrate is transferred to the reversing unit RF so that the surface is directed upward, and then the processed substrate W is returned to the indexer cell ID. The cleaning processing unit SS1 and the cleaning processing unit SS2 are so-called parallel processing units that perform exactly the same processing, and may be transported to any of the cleaning processes. The reason why such a parallel processing unit is provided is that the cleaning processing in the cleaning processing units SS1 and SS2 takes a long time compared with the inversion operation in the inversion units FR and RF.

  On the other hand, when surface cleaning is performed on the substrate W, as shown in the flow B, the unprocessed substrate W received from the indexer cell ID is directly transferred to either the cleaning processing unit SS1 or the cleaning processing unit SS2, and the surface cleaning is performed. The process is executed, and the substrate W after the cleaning process is returned to the indexer cell ID. Regardless of the transfer procedure of flows A and B, the transfer robot TR executes all the transfer of the substrate in the cleaning processing cell SP.

  The operation of the transfer robot TR proceeds when the transfer command from the SS cell controller SSC is decomposed into specific operations by the transfer robot controller TRC and the operation of the transfer robot TR is controlled. More specifically, the SS cell controller SSC that has received the flow described in the recipe from the main controller MC sequentially creates a transfer process table for one cycle and passes it to the transfer robot controller TRC. The transfer robot controller TRC performs the transfer process. The contents of the table are disassembled into specific moving operations, placing operations, and taking operations, and are executed by the transport robot TR.

  Here, the “transporting process for one cycle” indicates a transporting process in which the transporting robot TR makes a round from the sending mounting unit SPASS to the returning mounting unit RPASS as shown in FIG. As described above, the cleaning processing cell SP is provided with two cleaning processing units SS1, SS2 and two inversion units FR, RF as processing units. In addition, a connecting portion between the indexer cell ID and the cleaning processing cell SP is provided with a feeding placement portion SPASS and a return placement portion RPASS. The transfer robot TR of the cleaning processing cell SP transfers the substrate W by transferring the substrate to all of the sending and placing unit SPASS, the return mounting unit RPASS, the reversing units FR and RF, and the cleaning processing units SS1 and SS2. I do. That is, there are six transfer positions that are the transfer target positions of the transfer robot TR, and the cleaning processing cell SP has six transfer targets to which the substrate W is transferred by one transfer robot TR and the transfer robot TR. Has a loading position. A “cell” is a unit processing section having one transfer robot and a plurality of transfer positions to which the substrate W is transferred by the transfer robot.

  Out of the six transfer positions, the feed placement unit SPASS and the return placement unit RPASS are respectively an entrance position serving as an entrance of the substrate W to the cleaning processing cell SP and an exit serving as an exit of the substrate W from the cleaning processing cell SP. It is a position. In the following description, the reversing unit FR, the cleaning processing unit SS1, the cleaning processing unit SS2, and the reversing unit RF, which are other transfer positions, are referred to as transfer positions 1, 2, 3, and 4, respectively. The transfer robot TR is controlled so as to repeatedly perform the cyclic transfer from the entrance position (feed placement unit SPASS) to the exit position (return placement unit RPASS) through the transfer positions 1, 2, 3, and 4. The transfer process performed for the transfer positions 1, 2, 3 and 4 from the entrance position to the exit position is the “transfer process for one cycle”.

  The SS cell controller SSC sequentially creates a conveyance process table for one cycle based on the description contents of the recipe received from the main controller MC. Then, every time the SS cell controller SSC creates a transfer process table for one cycle, it passes the transfer process table to the transfer robot controller TRC. The transfer robot controller TRC controls the transfer robot TR so that the transfer robot TR executes the various operations by disassembling the received transfer process table for one cycle into specific movement operations, placing operations, and taking operations.

  FIG. 6 is a diagram illustrating an example of a transport process table. Here, a case where two substrates W are processed according to the flow A and then 25 substrates W are processed according to the flow B will be described as an example. In the figure, the first substrate W processed in accordance with the flow A is denoted as “A1”, the second substrate W is denoted as “A2”, and the first substrate W processed in accordance with the flow B is denoted as “A1”. “B1”, the second substrate W is denoted as “B2”, and the third substrate W is denoted as “B3”. Further, each of steps 1, 2, 3,... Is a transfer process table for one cycle created by the SS cell controller SSC, and is created in the order of step numbers.

  First, the first substrate A <b> 1 is transferred from the carrier C to the feed placement unit SPASS by the indexer robot 12. At this time, when the indexer robot 12 starts a moving operation for transporting the substrate A1 to the placement unit SPASS, a transport advance notice signal to the effect that the substrate A1 is transported into the cleaning cell SP is sent from the ID cell controller IDC to the SS cell controller. Send to SSC. The SS cell controller SSC recognizes that an unprocessed substrate A1 appears in the sending and placing unit SPASS at the time when the transport notice signal is received, and creates the transport process chart of Step 1.

  The transport process table for one cycle created as step 1 is configured only by a process of transporting the substrate A1 from the entrance position (feed placement unit SPASS) to the transfer position 1 (reversing unit FR). The transport process chart of Step 1 is transferred from the SS cell controller SSC to the transport robot controller TRC. The transfer robot controller TRC that has received the transfer process chart of step 1 transfers the substrate A1 from the entrance position to the transfer position 1 "takes the substrate at the entrance position and moves to the transfer position 1" and "transfer position" The operation is disassembled into two transfer operations of “place the substrate at 1” and command the transfer robot TR. More precisely, a controller provided between the transfer robot controller TRC and the transfer robot TR performs an operation for converting the two transfer operations into drive data, and transmits the drive data to the transfer robot TR. The transport robot TR that has received the command inserts one of the holding arms 6a and 6b into the feeding platform SPASS, picks up the substrate A1 that has appeared in the feeding platform SPASS, moves so as to face the reversing unit FR, A holding arm for holding the substrate A1 is inserted into the reversing part FR, and the substrate A1 is placed.

  While the transport robot TR is performing the transport process for one cycle of Step 1 as described above, the next substrate A2 is transported from the carrier C to the feed placement unit PASS by the indexer robot 12. Then, before the transfer robot TR completes the transfer process of Step 1 (before completing the placing operation of the substrate A1 in the reversing unit FR), the substrate A2 may appear on the feeding platform SPASS which is the entrance position. is there.

  In the present embodiment, when the SS cell controller SSC receives from the ID cell controller IDC a transport advance notice signal that the substrate A2 is loaded into the cleaning processing cell SP before the transport robot TR completes the transport process of Step 1. That is, when it is found that the substrate A2 appears at the entrance position, the SS cell controller SSC changes the transport process table in Step 1. Specifically, a process of transferring the substrate A1 to the transfer position 1 and then moving to the feed placement unit SPASS which is the entrance position is added to the end of the transfer process of Step 1. Then, the transfer robot controller TRC that has received the changed transfer process chart of Step 1 performs the transfer operation of “place the substrate at the transfer position 1” and “moves the substrate at the transfer position 1 to the entrance position”. The transfer operation is changed to a command for the transfer robot TR. As a result, the transfer robot TR performs an operation of placing the substrate A1 on the reversing unit FR and then returning to the feeding platform SPASS which is the entrance position.

  In addition, after the transfer robot TR places the substrate A1 on the reversing unit FR and then moves to the feed placement unit SPASS, the SS cell controller SSC creates a transfer process table in the next step 2. The transport process table for one cycle created as step 2 includes a process of transporting the substrate A2 that has appeared at the entrance position (feed placement unit SPASS) from the entrance position to the transfer position 1 (reversing unit FR), and the back surface. Is transferred to the transfer position 1 (reverse part FR) from the transfer position 1 (reverse part FR) to the transfer position 2 (cleaning part SS1).

  On the other hand, if the SS cell controller SSC does not receive the transfer notice signal indicating that the substrate A2 is loaded into the cleaning processing cell SP before the transfer robot TR completes the transfer process of Step 1, the steps as described above are performed. No change is made to the conveyance process chart of 1. In this case, after the transfer robot TR completes and stops the placing operation of the substrate A1 in the reversing unit FR, the SS cell controller SSC issues a transfer notice signal to the effect that the substrate A2 is loaded into the cleaning processing cell SP. The SS cell controller SSC creates the transport process chart of the next step 2 at the time of reception from. The conveyance process table for one cycle created as step 2 is the same as described above.

  The created transport process chart of step 2 is transferred from the SS cell controller SSC to the transport robot controller TRC. The transfer robot controller TRC that has received the transfer process table of step 2 performs the transfer process for one cycle of step 2 “takes the substrate at the entrance position and moves it to the transfer position 1”, and “transfers the substrate at the transfer position 1”. At the same time, the robot moves to the transfer position 2 by placing the substrate that has been brought in, and is instructed to the transfer robot TR by breaking it down into three transfer operations of “place the substrate at the transfer position 2”. Upon receipt of the command, the transfer robot TR inserts one of the holding arms 6a and 6b into the feed placement unit SPASS, picks up the substrate A2, moves so as to face the reversing unit FR, and moves the two holding arms 6a and 6b. The substrate A1 and the substrate A2 that are inverted so that the back surface is directed upward are exchanged, and the holding arm that holds the substrate A1 is moved to the cleaning processing unit SS1 and inserted into the cleaning processing unit SS1. To place the substrate A1.

  While the transport robot TR is performing the transport process for one cycle of Step 2, the next substrate B1 is transported from the carrier C to the feed placement unit PASS by the indexer robot 12. Then, before the transfer robot TR completes the transfer process of Step 2 (before completing the placing operation of the substrate A1 in the cleaning processing unit SS1), the substrate B1 appears on the feed placement unit SPASS which is the entrance position. There is also.

  Similar to the above, when the SS cell controller SSC receives a transfer notice signal from the ID cell controller IDC to the effect that the substrate B1 is loaded into the cleaning processing cell SP before the transfer robot TR completes the transfer process of Step 2. The SS cell controller SSC changes the transport process chart in step 2. Specifically, a process of transferring the substrate A1 to the transfer position 2 and then moving to the feed placement unit SPASS which is the entrance position is added at the end of the transfer process of Step 2. Then, the transfer robot controller TRC that has received the changed transfer process chart of step 2 performs the transfer operation of “place the substrate at the transfer position 2” and “moves the substrate at the transfer position 2 to the entrance position”. The transfer operation is changed to a command for the transfer robot TR. As a result, the transfer robot TR performs an operation of placing the substrate A1 on the cleaning processing unit SS1 and then returning to the feeding placement unit SPASS which is the entrance position.

  In addition, after the transfer robot TR has placed the substrate A1 on the cleaning processing unit SS1, the SS cell controller SSC creates a transfer process table in the next step 3 while moving to the feed placement unit SPASS. The transfer process table for one cycle created as Step 3 does not transfer the substrate B1 that appears at the entrance position (feed placement unit SPASS), and transfers the substrate A2 that is inverted so that the back surface faces upward. It consists only of the process of conveying from the mounting position 1 (reversing part FR) to the transfer position 3 (cleaning process part SS2). That is, the substrate B1 is the first substrate W to be processed according to the flow B, and is the substrate W that should be directly transferred to the cleaning processing units SS1 and SS2 without being reversed by the reversing unit FR. However, since the cleaning processing sections SS1 and SS2 are both occupied by the back surface cleaning processing of the substrates A1 and A2, the substrate B1 cannot be transported from the sending and placing section SPASS. For this reason, in the transport process of Step 3, the substrate B1 remains placed on the feeding platform SPASS which is the entrance position.

  On the other hand, if the SS cell controller SSC does not receive the transfer notice signal to the effect that the substrate B1 is loaded into the cleaning processing cell SP before the transfer robot TR completes the transfer process of step 2, the transfer of step 2 is performed. The schedule is not changed. In this case, after the transfer robot TR completes and stops the placing operation of the substrate A1 in the cleaning processing unit SS1, the SS cell controller SSC receives a transfer notice signal indicating that the substrate B1 is loaded into the cleaning processing cell SP. At the time of reception from the IDC, the SS cell controller SSC creates a transport process chart in the next step 3. The conveyance process table for one cycle created as step 3 is the same as described above.

  The created transfer process chart of step 3 is transferred from the SS cell controller SSC to the transfer robot controller TRC. The transfer robot controller TRC that has received the transfer process table of Step 3 breaks down the transfer process for one cycle of Step 3 into a plurality of transfer operations and commands the transfer robot TR. Then, the transfer robot TR performs an operation in accordance with a command received from the transfer robot controller TRC.

  Next, when the transport robot TR is executing the transport process of step 3, since the substrate B1 has already appeared on the feed platform SPASS which is the entrance position, the SS cell controller SSC performs the transport process table of step 3. And a process of moving the substrate A2 to the transfer position 3 and then moving to the feed placement unit SPASS which is the entrance position is added at the end of the transfer process of Step 3. Then, the transfer robot controller TRC that has received the changed transfer process chart of step 3 causes the transfer robot TR to perform a transfer operation that finally moves to the entrance position.

  After the transfer robot TR places the substrate A2 on the cleaning processing unit SS2, the SS cell controller SSC creates a transfer process table in the next step 4 while moving to the feed placement unit SPASS. The transport process table for one cycle created as step 4 includes a process of transporting the substrate B1 that has appeared at the entrance position (feed placement unit SPASS) from the entrance position to the transfer position 2 (cleaning processing unit SS1); The substrate A1 that has undergone the back surface cleaning is transported from the transfer position 2 (cleaning processing unit SS1) to the transfer position 4 (reversing unit RF).

  The created transfer process chart of step 4 is transferred from the SS cell controller SSC to the transfer robot controller TRC. The transfer robot controller TRC that has received the transfer process table of Step 4 breaks down the transfer process for one cycle of Step 4 into a plurality of transfer operations and commands the transfer robot TR. Then, the transfer robot TR performs an operation in accordance with a command received from the transfer robot controller TRC.

  Thereafter, the same procedure is repeated, and the transfer operation by the transfer robot TR in the cleaning processing cell SP proceeds. In other words, if the SS cell controller SSC receives a transfer notice signal for the substrate B2 before the transfer robot TR completes the transfer process of step 4, the SS cell controller SSC enters the entrance position at the end of the transfer process of step 4. Add a moving process to. Then, after the transfer robot TR puts the substrate A1 on which the back surface cleaning is completed on the reversing part RF, the SS cell controller SSC creates the transfer process chart of the next step 5 while moving to the sending and placing part SPASS. To do. If the SS cell controller SSC has not received the transfer notice signal, the SS cell controller SSC completes the placement operation of the substrate A1 in the reversing unit RF and stops, and then the SS cell controller SSC performs the next step 5 transfer process chart. Create

  The transport process table for one cycle created as step 5 includes a process of transporting the substrate B2 that has appeared at the entrance position (feed placement unit SPASS) from the entrance position to the transfer position 3 (cleaning processing unit SS2), The step of transporting the substrate A2 after the back surface cleaning from the transfer position 3 (cleaning processing unit SS2) to the transfer position 4 (reversing unit RF), and the substrate A1 inverted so that the front surface faces upward is transferred. And a step of transporting from position 4 (reversing part RF) to an exit position (returning placement part RPASS). The created transfer process chart of step 5 is transferred from the SS cell controller SSC to the transfer robot controller TRC. The transfer robot controller TRC that has received the transfer process table of Step 5 breaks down the transfer process for one cycle of Step 5 into a plurality of transfer operations and commands the transfer robot TR. Then, the transfer robot TR performs an operation in accordance with a command received from the transfer robot controller TRC.

  After that, the transfer process chart of steps 6, 7, 8,... Is created in sequence, and the transfer operation of the transfer robot TR is executed in accordance with it. As shown in FIG. 6, the transport process table for one cycle created as step 6 includes the substrate B3 at the entrance position (feed placement unit SPASS), the substrate B1 at the transfer position 2 (cleaning processing unit SS1), and the transfer process. The substrate B2 at the mounting position 3 (cleaning processing unit SS2) is not transported, and the substrate A2 that has been inverted so that the surface faces upward is moved from the transfer position 4 (reversing unit RF) to the exit position (returning mounting unit RPASS). ) Is comprised only of the process of conveying. Further, the transport process table for one cycle created as step 7 is a process of transporting the substrate B3 that has appeared at the entrance position (feed placement unit SPASS) from the entrance position to the transfer position 2 (cleaning processing unit SS1). And a step of transporting the substrate B1 after the surface cleaning from the transfer position 2 (cleaning processing unit SS1) to the exit position (returning mounting unit RPASS).

  As described above, the substrate conveyance and the substrate processing proceed. The cleaned substrate W placed on the return placement unit RPASSS which is the exit position is stored in the carrier C by the indexer robot 12 having the indexer cell ID. The carrier C storing the predetermined number of processed substrates W is carried out of the apparatus from the carrier stage 11.

  In the present embodiment, the SS cell controller SSC receives a transfer notice signal from the ID cell controller IDC that a new substrate is loaded into the cleaning processing cell SP before the transfer robot TR completes the transfer process of a certain step. In this case, the SS cell controller SSC has changed the transfer process table of the step, that is, the step that has already been started. Conventionally, there has been no change in the conveyance process table of steps that have already been executed. For this reason, the transfer robot TR temporarily stops the operation after completing the operation of the transfer process table of the step that has already been executed, regardless of the presence / absence of a new substrate loading notice signal. Then, after the transfer robot TR stops operating, the SS cell controller SSC creates a transfer process table for the next step, and the transfer robot TR starts a new transfer operation according to the transfer process table. In other words, there was a slight state in which the SS cell controller SSC waited for creation of the transport process chart for the next step while stopping before the final transfer position of the transport process chart for a certain step. . Then, the instruction waiting stop state of the transfer robot TR reduces the overall throughput of the substrate processing apparatus 100.

  For this reason, in the present embodiment, a new substrate W appears at the entrance position (feed placement unit SPASS) while the transport robot TR is executing a transport process of a certain step (transport process of the first cycle). When it is found that the SS cell controller SSC changes the transfer process of the step so as to include the final transfer process of moving to the entrance position, the transfer robot controller TRC changes the transfer process of the step after the change. The operation of the transfer robot TR is controlled so as to execute. Then, while the transport robot TR is performing the final transport process included in the transport process of the step after the change, that is, while performing the movement operation to the entrance position, the SS cell controller SSC transports the next step. Setting of the process (conveying process of the second cycle) is started.

  Therefore, the transfer robot TR that has finished moving to the entrance position can immediately execute the transfer process of the next step, and the stop state of the transfer robot TR can be eliminated. As a result, the overall throughput of the substrate processing apparatus 100 can be improved.

  However, while the transfer robot TR moves from the final transfer position in the transfer process of a certain step to the entrance position, the setting of the transfer process of the next step by the SS cell controller SSC may not be completed. For example, when the transport process of the next step is very complicated, the transport process setting time by the SS cell controller SSC may be longer than the machine operation time during which the transport robot TR moves to the entrance position. In such a case, the transfer robot TR that has finished moving to the entrance position waits for a while until the setting of the transfer process is completed. Compared with the movement to the entrance position, the operation stop state of the transfer robot TR can be significantly reduced and the throughput of the substrate processing apparatus 100 can be improved. That is, conventionally, it takes (transport process setting time) + (machine operation time to the inlet position) from the completion of the transport process of one step to the start of the transport process of the next step. However, according to the present embodiment, (the transfer process setting time) or (the machine operation time to the inlet position), whichever is longer, can be set to the throughput corresponding to the overlap time of both. Can be improved.

  Note that it is not preferable that the transfer robot TR moves to the entrance position at the end of the transfer process for one cycle regardless of the presence or absence of the transfer notice signal. The reason for this is that if a new substrate W does not appear at the entrance position, the operation start transfer position in the transport process of the next step may be other than the entrance position. In this case, the travel time to the entrance position This is because the movement time from the entrance position to the operation start transfer position is wasted, and the throughput may be reduced.

  While the embodiments of the present invention have been described above, the present invention can be modified in various ways other than those described above without departing from the spirit of the present invention. For example, the transfer control of the transfer robot TR performed in the cleaning processing cell SP in the above embodiment may be applied to the indexer robot 12 with the indexer cell ID. In the indexer cell ID, the return placement unit RPASS is an entrance position, and the feed placement unit SPASS is an exit position.

  Moreover, in the said embodiment, although the board | substrate delivery part 50 was used as the upper and lower two-stage feed mounting part SPASS and the return mounting part RPASS, this is, for example, a three-stage feed mounting part and a three-stage return mounting part. May be laminated. In this case, there are three entrance positions and three exit positions, respectively, and it is found that a new substrate W appears at one of the entrance positions while the transport robot TR performs a transport process of a certain step. When this happens, the SS cell controller SSC changes the transfer process of the step so as to include the final transfer process of moving to the entrance position.

  In the above embodiment, the cleaning processing cell SP includes the two cleaning processing units SS1 and SS2. However, a larger number of cleaning processing units may be provided. Even in this case, although the number of transfer positions increases, the same transport control of the transport robot TR as in the above embodiment can be performed.

  Also, the transport procedure of the substrate W executed in the substrate processing apparatus 100 is not limited to the two flows A and B, and both front surface cleaning and back surface cleaning may be performed.

  In the above embodiment, the transport control of the transport robot TR is performed by the cooperation of the SS cell controller SSC and the transport robot controller TRC below the SS cell controller SSC. However, the present invention is not limited to such a form. It suffices if there is a controller that controls the transfer operation of the transfer robot TR in the cell SP. In this case, the controller executes transport control of both the SS cell controller SSC and the transport robot controller TRC in the above embodiment. That is, while the transfer robot TR is performing a one-cycle transfer operation for a plurality of transfer positions from the entrance position (feed placement unit SPASS) to the exit position (return placement unit RPASS), the entrance position is newly set. When it is found that a new substrate W appears, the transport robot TR is controlled so as to move to the entrance position as the final operation of the transport operation in one cycle.

  Furthermore, the substrate processing apparatus to which the technology according to the present invention is applied is not limited to a cleaning apparatus that performs scrub cleaning on the substrate W, but a single transfer robot and a plurality of targets to which the substrate is transferred by the transfer robot. Any substrate processing apparatus provided with a cell having a transfer position of, for example, is also effective for a coater and developer in which a cell for performing a resist coating process and a cell for performing a development process are arranged in parallel via a substrate transfer section.

1 is a plan view of a substrate processing apparatus according to the present invention. It is the figure which looked at the substrate processing apparatus of FIG. 1 from the AA line. It is a block diagram which shows the principal part structure of the control mechanism of a substrate processing apparatus. It is a figure which shows the example of a flow. It is a figure which shows the conveyance process cycle of a conveyance robot. It is a figure which shows an example of a conveyance process table | surface.

Explanation of symbols

6a, 6b Holding arm 11 Carrier stage 12 Indexer robot 13a, 13b Transfer arm 50 Substrate delivery unit 100 Substrate processing unit C carrier FR, RF reversing unit ID indexer cell IDC ID cell controller IRC indexer robot controller MC main controller RPASS Return mounting unit SPASS feed placement unit SP cleaning processing cell SS1, SS2 cleaning processing unit SSC SS cell controller TR transfer robot TRC transfer robot controller W substrate

Claims (3)

A substrate processing apparatus for continuously processing a plurality of substrates,
A unit processing section having one transfer robot and a plurality of transfer positions to which a substrate is transferred by the transfer robot;
Partition control means for controlling the overall operation in the unit processing partition;
A transfer robot control means for controlling the operation of the transfer robot;
With
The plurality of transfer positions include an entrance position to be an entrance of a substrate to the unit processing section and an exit position to be an exit of a substrate from the unit processing section,
The section control means sequentially sets a one-cycle transfer process that the transfer robot performs for the plurality of transfer positions from the entrance position toward the exit position,
The transfer robot control unit controls the operation of the transfer robot so as to sequentially execute the transfer process of the one cycle set by the partition control unit,
A final transfer step of moving to the entrance position when it is found that a new substrate appears at the entrance position while the transfer robot is executing the transfer step of the first cycle. The section control means changes the transfer process of the first cycle, and the transfer robot control means controls the operation of the transfer robot so as to execute the changed transfer process of the first cycle. A substrate processing apparatus. The substrate processing apparatus according to claim 1,
The partition control means is configured to carry the second cycle following the first cycle carrying step while the carrying robot is executing the final carrying step included in the changed first cycle carrying step. A substrate processing apparatus which starts setting of a process. A substrate processing apparatus for continuously processing a plurality of substrates,
A unit processing section having one transfer robot and a plurality of transfer positions to which a substrate is transferred by the transfer robot;
Transport control means for controlling the transport operation of the transport robot in the unit processing section;
With
The plurality of transfer positions include an entrance position that serves as an entrance of a substrate to the unit processing section and an exit position that serves as an exit of the substrate from the unit processing section,
The transport control means is configured such that a new substrate appears at the entrance position while the transport robot performs a one-cycle transport operation for the plurality of transfer positions from the entrance position to the exit position. The substrate processing apparatus controls the transfer robot so as to move to the entrance position as a final operation of the transfer operation of the one cycle when it is determined.

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