JP2009142766A - Delivery method of gas to be treated to decomposition treatment device and decomposition treatment device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a delivery method of a gas to be treated to a decomposition treatment device which enables variably quantitatively determining and supplying the gas to be treated containing a halogen-containing compound in accordance with an intra-temperature of a reaction tube, and stably supplying of the gasified halogen-containing compound into the reaction tube, without regasification of the gasified halogen-containing compound, and a decomposition treatment device. <P>SOLUTION: This decomposition treatment device 10 is equipped with a tubing pump 78 for delivering the gas to be treated which is obtained by gasifying the liquid halogen-containing compound, in a variably quantitatively determinable manner, to the reaction tube 20 in accordance with the internal temperature of the reaction tube 20. In addition, a partial pressure setting device 90 is arranged in a pipeline 84 between the tubing pump 78 and the reaction tube 20. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for delivering a gas to be processed to a decomposition processing apparatus and a decomposition processing apparatus.

  In recent years, refrigerators and cooling devices (air conditioners) produced before the start of restrictions on the production and use of chlorofluorocarbons for the purpose of reducing ozone layer destruction are being discarded. In addition, chlorofluorocarbons and halocarbons are frequently used for cleaning industrial products and the like. These halogen-containing compounds are known as greenhouse gases exhibiting a high warming potential, and chlorofluorocarbons are further known as ozone-depleting gases. Hereinafter, chlorofluorocarbons, halogen compounds such as halogens, halogen gas, and the like are collectively referred to as “halogen-containing compounds”.

  Therefore, there is a demand for a method and apparatus for efficiently decomposing used recovered halogen-containing compounds. Thus, for example, Patent Document 1 and Patent Document 2 have been proposed as decomposition processing apparatuses in order to meet the demand.

In these decomposition treatment apparatuses, when the waste halogen-containing compound is decomposed, the reaction treatment agent (that is, the adsorbent) mainly composed of calcium oxide is reacted with the waste halogen-containing compound.
JP 2004-261726 A JP 2001-79344 A

By the way, when decomposing a halogen-containing compound that is in a liquid state under normal temperature and atmospheric pressure, it is preferable to gasify the liquid halogen-containing compound and introduce it into the reaction tube.
This is because when a halogen-containing compound is supplied in a liquid state into the reaction tube, it can be supplied only to a part of the adsorbent in the reaction tube. This is because there is a possibility that it cannot be sufficiently decomposed.

  However, since the liquid halogen-containing compound has a higher boiling point than the halogen-containing compound having a boiling point of less than 0 ° C. under atmospheric pressure, the external environment of the pipeline through which the gas to be treated passes even if vaporized by heating or the like. It easily condenses and reliquefies depending on the temperature (for example, in winter), and the halogen-containing compound cannot be stably and quantitatively supplied into the reaction tube. As a result, there is a problem that it becomes impossible to perform the decomposition treatment of the gas to be treated in the reaction tube.

Further, when the liquid halogen-containing compound is decomposed, it is preferable to supply the gasified halogen-containing compound into the decomposition processing apparatus variably and quantitatively according to the temperature.
This is because the gas to be treated is decomposed by an exothermic reaction with respect to the adsorbent or the like in the reaction tube of the decomposition treatment apparatus, but if the gas to be treated for the decomposition reaction in the reaction tube decreases, the heat generation also decreases. Therefore, the temperature in the reaction tube decreases. In such a case, in order not to lower the temperature in the reaction tube more than necessary, the amount of the gas to be treated that is quantitatively sent into the reaction tube is increased. On the other hand, if the amount of gas to be subjected to the decomposition reaction in the reaction tube increases, heat generation increases, and the temperature in the reaction tube increases. In such a case, in order not to raise the temperature in the reaction tube more than necessary, the amount of the gas to be processed quantitatively sent into the reaction tube is reduced.

  As described above, when the temperature in the reaction tube changes depending on the situation where the gas to be processed is processed, it is desirable to change the supply amount of the halogen-containing compound delivered into the reaction tube accordingly. However, conventionally, no decomposition treatment apparatus has been proposed that supplies a halogen-containing compound that is gasified in a variable and quantitative manner according to the temperature in the reaction tube to the reaction tube.

  An object of the present invention is to stably supply a gas to be treated containing a halogen-containing compound into a reaction tube without re-liquefying the gasified halogen-containing compound when the liquid halogen-containing compound is gasified. Another object of the present invention is to provide a method for delivering a gas to be processed and a decomposition processing apparatus.

  Furthermore, another object of the present invention is to variably supply a gas to be treated containing a halogen-containing compound according to the temperature in the reaction tube and to stably supply the gasified halogen-containing compound without reliquefaction. An object of the present invention is to provide a method for delivering a gas to be processed to a decomposition processing apparatus that can be supplied into a reaction tube, and a decomposition processing apparatus.

  In order to solve the above-mentioned problems, the invention described in claim 1 is characterized in that a gas to be treated obtained by gasifying a liquid halogen-containing compound is sent to a reaction tube of a decomposition treatment apparatus, and the halogen-containing compound is sent into the reaction tube. A process gas delivery method to a decomposition processing apparatus for performing a decomposition process of the above, wherein a partial pressure of the halogen-containing compound is set to be equal to or lower than a saturated vapor pressure of a temperature in a pipeline through which the gas to be processed passes. The gist of the present invention is a method for delivering a gas to be treated to a decomposition treatment apparatus characterized by delivering a gas to be treated containing a compound to a reaction tube. The liquid halogen-containing compound in the present invention refers to a halogen-containing compound having a boiling point of 0 ° C. or higher under atmospheric pressure. For example, it is intended to include a halogen-containing compound that becomes liquid at normal temperature and pressure.

  According to a second aspect of the present invention, a gas to be treated obtained by gasifying a liquid halogen-containing compound is sent to a reaction tube of a decomposition treatment apparatus, and the decomposition treatment apparatus for decomposing the halogen-containing compound in the reaction tube is treated. A gas delivery method, wherein the gas to be treated is delivered in a variable amount according to the temperature in the reaction tube, and the partial pressure of the halogen-containing compound delivered into the reaction tube is set to a saturated vapor pressure or less. The gist of the method for delivering the gas to be processed to the decomposition processing apparatus characterized by the above.

  According to a third aspect of the present invention, a gas to be treated obtained by gasifying a liquid halogen-containing compound is sent to a reaction tube of a decomposition treatment apparatus, and the decomposition treatment apparatus for decomposing the halogen-containing compound in the reaction tube is treated. A gas delivery method, wherein the gas to be treated is sent in a fixed amount, and the partial pressure of the halogen-containing compound delivered into the reaction tube is a saturated vapor pressure of a temperature in a pipe line through which the gas to be treated passes. The gist of the present invention is to supply a gas to be processed to a decomposition processing apparatus characterized by the following.

  According to a fourth aspect of the present invention, in any one of the first to third aspects, when the partial pressure of the halogen-containing compound delivered into the reaction tube is set to be equal to or lower than the saturated vapor pressure, By injecting a carrier gas, the partial pressure of the halogen-containing compound is made equal to or lower than the saturated vapor pressure of the temperature in the pipe line through which the gas to be treated passes.

  According to a fifth aspect of the present invention, there is provided a decomposition treatment apparatus in which a gas to be treated obtained by gasifying a liquid halogen-containing compound is introduced into a reaction tube, and the halogen-containing compound is decomposed in the reaction tube. In summary, the decomposition treatment apparatus is characterized in that a partial pressure setting device is provided upstream, wherein a partial pressure of the halogen-containing compound is set to be equal to or lower than a saturated vapor pressure of a temperature in a pipeline through which the gas to be treated passes. To do.

  According to a sixth aspect of the present invention, in the fifth aspect, the variable quantitative sending means for sending the gas to be treated gasified from the liquid halogen-containing compound to the reaction tube in a variable quantitative manner according to the temperature in the reaction tube. And the partial pressure setting device is provided in a conduit between the variable quantitative delivery means and the reaction tube.

  A seventh aspect of the present invention is the method according to the fifth aspect, further comprising a fixed amount sending means for sending the gas to be treated to the reaction tube in a quantifiable manner, wherein the partial pressure setting device is provided between the fixed amount sending means and the reaction tube. It is provided in the pipeline.

  According to an eighth aspect of the present invention, in any one of the fifth to seventh aspects, the partial pressure setting device injects a carrier gas into the gas to be treated, thereby dividing the partial pressure of the halogen-containing compound. Is equal to or lower than the saturated vapor pressure of the temperature in the pipeline through which the gas to be treated passes.

  According to the inventions of claims 1, 3 and 5, 7, when a liquid halogen-containing compound is gasified, the gasified halogen-containing compound stably contains the halogen-containing compound without reliquefaction. There is an effect that the gas to be processed can be supplied into the reaction tube.

  Further, according to the inventions of claim 2 and claim 6, the gas to be treated containing the halogen-containing compound can be variably supplied depending on the temperature of the reaction tube, and the gasified halogen-containing compound can be reliquefied. And can be stably fed into the reaction tube.

  According to the fourth and eighth aspects of the invention, the partial pressure of the halogen-containing compound can be easily realized below the saturated vapor pressure by injecting the carrier gas into the gas to be treated.

Hereinafter, an embodiment of the present invention will be described with reference to FIG. FIG. 1 shows a schematic diagram of a halogen-containing compound decomposition treatment apparatus and a gas supply passage.
As shown in FIG. 1, a carrier gas is stored in the carrier gas cylinder 70, and the carrier gas is injected from the carrier gas cylinder 70 into the storage cylinder 74 through a regulator 72 provided in a pipe line 84. In the present embodiment, the carrier gas is nitrogen gas, but may be an inert gas such as argon gas. The storage cylinder 74 stores a halogen-containing compound that becomes liquid at 0 ° C. or higher and atmospheric pressure. In the present embodiment, the storage cylinder 74 has halon 2402 as a halogen-containing compound. Further, a part of the liquid halogen-containing compound is gasified by the carrier gas supplied from the carrier gas cylinder 70 and is sent out from the storage cylinder 74 at a partial pressure equal to or lower than the saturated vapor pressure at the temperature of the pipe 84. An open / close valve 72 a is provided between the regulator 72 and the storage cylinder 74.

  A halogen-containing compound gas sent from the storage cylinder 74 (hereinafter, a gas containing a carrier gas and a halogen-containing compound is referred to as a gas to be treated) is sent to the decomposition processing apparatus 10 by a tubing pump 78. The tubing pump 78 can deliver a certain amount of gas at a certain time and acts as a variable metering pump by changing the amount of rotation per time. The tubing pump 78 corresponds to a variable quantitative delivery means.

  The control device 80 variably controls the amount of rotation per hour of the tubing pump 78 based on the detected value of the temperature sensor 82 that detects the temperature of the reaction zone 26 in the reaction tube 20 in the decomposition processing device 10 described later. The control device 80 corresponds to a control unit that controls the variable fixed amount sending means according to the temperature in the reaction tube so that the gas to be treated in which the liquid halogen-containing compound is gasified can be variably quantified in the reaction tube.

  An open / close valve 76 is provided between the storage cylinder 74 and the tubing pump 78. An opening / closing valve 86 is provided in the pipe line 84 between the tubing pump 78 and the decomposition processing apparatus 10, and partial pressure adjusting air as a carrier gas is injected through a blower 88. A partial pressure setting device 90 is constituted by the blower 88 and the injection pipe 89 for injecting partial pressure adjusting air into the pipe 84. The blower 88 may be a fan instead of the blower 88.

Here, the partial pressure adjustment by the partial pressure adjusting air injected by the blower 88 will be described.
As described above, since the tubing pump 78 is a variable metering pump, the metering of the gas to be processed that is delivered per fixed time is variable according to the temperature of the reaction tube 20 described later. In this case, when the temperature of the pipe 84 is constant, the partial pressure of the halogen-containing compound delivered from the tubing pump 78 is larger when the fixed value reaches the maximum value than when the fixed value reaches the minimum value.

  On the other hand, the saturated vapor pressure increases as the temperature increases, and decreases as the temperature decreases. Therefore, if the conduit 84 decreases due to the temperature of the external environment, the saturated vapor pressure of the halogen-containing compound also decreases.

  For this reason, the gasified halogen-containing halogenated compound is obtained when the quantification of the tubing pump 78 is maximized to increase the partial pressure of the halogen-containing compound and the temperature of the pipe 84 at which the saturated vapor pressure of the halogen-containing compound decreases is low. The compound may re-liquefy.

  Therefore, in this embodiment, the temperature change in the external environment of the pipe line 84 connected to the decomposition processing apparatus 10 is predicted with a margin in advance. Even when the tube pump 78 is driven at the minimum value (minimum temperature) of the temperature change and the maximum quantification, the partial pressure of the halogen-containing compound is less than the saturated vapor pressure of the halogen-containing compound. Thus, the supply amount of the partial pressure adjustment air supplied by the blower 88 is set. In the present embodiment, the injection amount of the partial pressure adjusting air injected by the blower 88 is fixed.

Here, the minimum temperature is the minimum value of the temperature caused by the influence of the external environment because the temperature of the pipe 84 changes depending on the external environment, such as winter and summer.
In this way, when partial pressure adjusting air is injected into the pipe 84, the partial pressure of the halogen-containing compound delivered from the tubing pump 78 is further reduced to a value equal to or lower than the saturated vapor pressure at the temperature of the pipe 84. It is sent out with the partial pressure.

Next, an outline of the halogen-containing compound decomposition treatment apparatus will be described.
In the decomposition treatment apparatus 10, a packed bed 22 made of an adsorbent is formed in the reaction tube 20, and a gas to be treated containing a halogen-containing compound is continuously introduced into and led out from the packed bed 22, Treatment of the halogen-containing compound is carried out by contacting the adsorbent mainly by reaction adsorption while the compound is decomposed.

A calcium-based adsorbent is used. Examples of the calcium-based adsorbent include quick lime (CaO) obtained by firing limestone and dolomite and light-burned dolomite (CaO · MgO). In addition, slaked lime (Ca (OH) ₂ ), limestone (calcium carbonate (CaCO ₃ )), calcium silicate (CaSiO ₃ ) and the like can also be used as the calcium-based adsorbent. Further, the calcium-based adsorbent may contain magnesium oxide such as lightly burned dolomite (CaO · MgO). In this embodiment, quick lime (CaO) or light-burned dolomite (CaO · MgO) is used as the adsorbent.

  The particle size of the adsorbent varies depending on the particle shape, but is usually 2 to 50 mm, preferably 5 to 10 mm. If the particle size is too small, the porosity of the packed bed 22 (gas diffusion zone, reaction zone) is low and gas flow is hindered. Conversely, if the particle size is too large, gas diffusion into the particle is not possible. It is enough.

  Further, the gas to be processed that is decomposed by the decomposition processing apparatus 10 is a halogen-containing compound containing chlorofluorocarbons and halones. In this embodiment, as described above, Halon 2402 (boiling point 47 ° C.) is used as the halogen-containing compound, but other halons may be used. Further, as liquid halogen-containing compounds, for example, chlorofluorocarbons include chlorofluorocarbon-11 (boiling point 23.8 ° C.), chlorofluorocarbon-113 (boiling point 47.6 ° C.), HCFC-123 (boiling point 27.degree. C.). 9 ° C.), HCFC-141b (boiling point 32.2 ° C.), HCFC-225cb (boiling point 56.1 ° C.), and HCFC (hydrochlorofluorocarbon). Other examples of chlorofluorocarbons as liquid halogen-containing compounds include HFC-43-10mes (boiling point 55.0 ° C), HFC-245fa (boiling point 15.3 ° C), HFC-365mfc (boiling point 40.2 ° C). ) HFC (hydrofluorocarbon), C5F12 (boiling point 30.0 ° C.), C6F14 (boiling point 56.0 ° C.) PFC (parafluorocarbon), and the like. In addition, the boiling point of each said halogen-containing compound is a thing under atmospheric pressure.

  These gas concentrations are preferably 10 to 100 vol%, more preferably 30 to 100 vol%. In addition, it is not preferable that the concentration is less than 10 vol% because a large amount of energy is required for heating.

  The decomposition treatment of chlorofluorocarbons and halones is preferably performed by contacting with an adsorbent at a temperature of 700 to 1400 ° C. When this temperature is lower than 700 ° C., the decomposition treatment capacity is lowered. If it exceeds 1400 ° C., the reactivity with chlorofluorocarbons and halones is lowered, which is not preferable. The decomposition treatment of chlorofluorocarbons and halones is accompanied by a known exothermic reaction.

  The reaction tube 20 of the present embodiment is a vertical type, and the packed bed 22 is formed with a gas diffusion zone 24 and a reaction zone 26 vertically. A first cooling means 28 is formed in the upper part of the reaction tube 20, and an adsorbent supply hopper 32 having an inlet 30 is disposed above the first cooling means 28. The first cooling means 28 is disposed at a corresponding portion of the gas diffusion zone 24 of the reaction tube 20. In the reaction tube 20, a gas inlet 34 to be processed connected to a pipe 84 is provided at a position above the first cooling means 28.

  Electric heaters H1 and H2 serving as heating portions are provided at portions corresponding to the reaction zone 26 of the reaction tube 20. The electric heaters H1 and H2 can be output controlled by a control means (not shown). The heating means is not limited to an electric heater (resistance heating element), but may be other electric heating means such as induction heating or thermal heating means such as combustion heating. The electric heater H <b> 1 is a cylindrical electric heater provided on the outer surface of the reaction tube 20. The electric heater H2 is a seeded heater (electric heater) in which only the part corresponding to the reaction zone 26 is a heating part. The reason why the electric heaters H1 and H2 are provided inside and outside the reaction zone 26 of the reaction tube 20 is to reduce the temperature difference between inside and outside the cross section of the reaction zone 26. Here, only the heating means provided outside the reaction tube 20 or only the heating means provided inside the reaction tube 20 may be provided, or a plurality of heating means provided inside the reaction tube 20 may be provided. It may be.

  The lower part of the reaction tube 20 corresponding to the reaction zone 26 is provided as a conduit 36 extending downward. A cylindrical covering tube 38 is disposed on the outer periphery of the conduit 36. A gap 38 a is provided between the cover tube 38 and the conduit 36, guides the gas discharged from the lower opening of the conduit 36, and discharges from the gas outlet 40 to be processed provided in the cover tube 38. To do. Although not shown, the gas to be processed outlet 40 is connected to necessary post-processing equipment such as a dust collection tank. A water cooling jacket 42 as a second cooling means is provided on the outer periphery of the cover tube 38.

  A blower (not shown) is provided as a differential pressure generating means on one side or both sides of the processing gas inlet 34 and the processing gas outlet 40 so as to generate a gas flow by suction. The differential pressure generating means usually corresponds to the required processing amount and the packing density of the adsorbent in the reaction tube 20 by appropriately using a blower (fan, blower) serving as a pressurized transporter or a compressor (compressor) serving as a decompression transporter. And select as appropriate.

Further, the conduit 36 guides the packed bed 22 below the reaction tube 20 to the adsorbent discharge mechanism 44 disposed below.
The adsorbent discharge mechanism 44 includes, for example, a screw conveyor 46 as forced discharge means, and the adsorbent is disposed between the adsorbent inlet side of the forced discharge means and the lower end side (adsorbent outlet) of the reaction tube 20. The covering tube 38 to which is moved is arranged.

The cover tube 38 and the conduit 36 act to cool the adsorbent that has flowed out (flowed down) from the lower end side of the reaction tube 20 by the water cooling jacket 42 to form an adsorbent cooling zone 48.
In addition, this adsorbent cooling zone 48 cooperates with forced discharge means such as the screw conveyor 46, and also has an action of restricting the gas flow between the gas discharge port 40 and the processing target gas outlet 40 through the outlet 50 of the forced discharge means. Play. This is because an adsorbent filling portion that generates a pressure loss of the fluid flow is formed between the gas outlet 40 and the outlet 50 of the forced discharge means. By this action, the flow of the gas to be processed from the gas to be processed inlet 34 to the gas outlet 40 to be processed becomes smooth.

Next, the decomposition process of the halogen-containing compound decomposition apparatus 10 will be described.
First, in a state where the screw conveyor 46 is stopped, the adsorbent supply hopper 32 is filled with the adsorbent in the lower part of the cover tube 38 and the reaction tube 20 from the charging port 30, and the adsorbent supply hopper 32 is further filled. Add the adsorbent until is almost full.

  Next, the electric heaters H1 and H2 are turned on (ON), and the internal atmospheric temperature of the reaction zone 26 is raised and maintained until the temperature exceeds the decomposition reaction temperature of the halogen-containing compound. Here, the set temperature of the decomposition reaction temperature is usually 700 ° C. or more from the viewpoint of decomposition reaction, that is, efficiency. The upper limit is about 1400 ° C. or less, preferably 900 ° C. or less, from the viewpoint of thermal efficiency and chemical equilibrium.

Here, the set temperature is assumed to be at a substantially central position of the reaction zone 26, for example, at point D to point E in FIG.
And normally, the gas diffusion zone 24 provided with the 1st cooling means 28 is less than decomposition reaction temperature. Here, the gas diffusion zone 24 is usually at a temperature much lower than the decomposition reaction temperature, which is at most 200 ° C. and usually 100 ° C. (for example, point B in FIG. 1). This is because the adsorbent packed bed 22 forming the gas diffusion zone 24 has a very low thermal conductivity and is not easily affected by the temperature of the reaction zone 26.

  When a blower (not shown) is operated in this state, the halogen-containing compound is sucked and introduced into the packed bed 22 of the reaction tube 20 from the gas inlet 34 to be processed. Then, the gas to be treated sucked and introduced from the gas to be treated inlet 34 is transported (conveyed) to the reaction zone 26 while being diffused in the gas diffusion zone 24. At this time, the ambient temperature of the adsorbent in the gas diffusion zone 24 is lower than the decomposition reaction temperature of the gas to be processed. Therefore, the gas to be treated moves to the reaction zone 26 while being diffused in the adsorbent filling gap.

The treated gas that has reached the reaction zone 26 is discharged from the treated gas outlet 40 as an exhaust gas after being decomposed and reacted and adsorbed by the adsorbent in the reaction zone 26 to remove the halogen component.
A transition zone (intermediate zone) that is a temperature gradient zone (for example, 100 ° C. or higher and lower than 600 ° C.) exists at the boundary between the gas diffusion zone 24 and the reaction zone 26.

  When the screw conveyor 46 is driven, the adsorbent in the reaction tube 20 gradually moves downward due to gravity. The adsorbent in the conduit 36 is cooled by heat dissipation by movement. The used adsorbent that has undergone the adsorption reaction is further forcibly cooled by the water cooling jacket 42 in the conduit 36 and the cover tube 38, reaches the inlet of the screw conveyor 46, and is further collected from the outlet 50 of the conveyor. Dropped into the container.

  Here, the temperature of the reaction zone 26 which is the temperature of the reaction tube 20 is detected by the temperature sensor 82. Based on the temperature detection of the temperature sensor 82, the control device 80 determines the degree of the amount of the halogen-containing compound that gives an exothermic reaction during the decomposition process.

  The temperature in the reaction zone 26 includes a contribution due to heating of the electric heaters H1 and H2 and a contribution due to an exothermic reaction during the decomposition treatment. In this case, for example, when the contribution due to heating of the electric heaters H1 and H2 is constant, the change in the contribution of the exothermic reaction during the decomposition treatment is greatly related to the temperature change. From this, the contribution of only the electric heaters H1 and H2 is determined in an unreacted state by a test or the like in advance, and if the temperature is measured, the contribution of the exothermic reaction, that is, the halogen-containing effect on the exothermic reaction. A determination can be made as to the degree of the amount of the compound.

  If the controller 80 determines that the temperature is lower than the first threshold value set in advance, the controller 80 determines that the halogen-containing compound exerted on the exothermic reaction is small, that is, the halogen-containing compound delivered to the reaction tube 20 is small. Then, the amount of rotation per hour of the tubing pump 78 is increased to increase the amount of the halogen-containing compound delivered to the reaction tube 20.

  As a result, a gas having a high partial pressure of the halogen-containing compound delivered from the tubing pump 78 is delivered. In this case, the partial pressure becomes equal to or lower than the saturated vapor pressure at the temperature of the pipe line 84 due to the injection of the partial pressure adjusting air by the blower 88.

  If the temperature of the reaction zone 26 detected by the temperature sensor 82 is higher than the second threshold (> first threshold), the control device 80 determines that there are too many halogen-containing compounds delivered to the reaction tube 20. Thus, the amount of rotation per hour of the tubing pump 78 is reduced in order to reduce the amount of the halogen-containing compound delivered to the reaction tube 20. As a result, a gas having a low partial pressure of the halogen-containing compound delivered from the tubing pump 78 is delivered. In this case, the partial pressure becomes equal to or lower than the saturated vapor pressure at the temperature of the pipe line 84 due to the injection of the partial pressure adjusting air by the blower 88.

Now, this embodiment has the following features.
(1) In the method for delivering the gas to be processed according to this embodiment, the partial pressure of halon 2402 (halogen-containing compound) is set to be equal to or lower than the saturated vapor pressure of the temperature in the conduit 84 through which the gas to be processed passes, and the halon 2402 is included. The gas to be treated was sent out to the reaction tube 20. In the decomposition processing apparatus 10 of the present embodiment, the partial pressure setting is set so that the partial pressure of the halogen-containing compound of Halon 2402 is equal to or lower than the saturated vapor pressure of the temperature in the pipe 84 through which the gas to be processed passes upstream of the reaction tube 20. A device 90 is provided.

  As a result, when the liquid halon 2402 (halogen-containing compound) is gasified, the gas to be treated is stably supplied into the reaction tube 20 without containing the gasified halon 2402 again. Can do.

  (2) In the method for delivering the gas to be treated according to the present embodiment, the gas to be treated is sent in a variable amount according to the temperature in the reaction tube 20, and halon 2402 (halogen-containing compound) delivered into the reaction tube 20. ) Is made equal to or lower than the saturated vapor pressure of the temperature in the pipe 84 through which the gas to be treated passes.

  In order to realize the above-described method, the decomposition processing apparatus 10 according to the present embodiment variably quantifies the gas to be processed by gasifying the liquid halon 2402 in the reaction tube 20 according to the temperature in the reaction tube 20. A tubing pump 78 (variable quantitative delivery means) for delivering the fluid is provided, and a partial pressure setting device 90 is provided in a conduit 84 between the tubing pump 78 and the reaction tube 20.

  As a result, the gas to be processed including halon 2402 can be variably quantified and supplied according to the temperature of the reaction tube 20, and the gasified halon 2402 can be stably supplied into the reaction tube 20 without being liquefied again. Can do.

  (3) In the method for delivering the gas to be treated according to the present embodiment, when the partial pressure of the halon 2402 delivered into the reaction tube 20 is made equal to or lower than the saturated vapor pressure, the partial pressure adjusting air (carrier) By injecting the gas), the partial pressure of the halon 2402 is made to be equal to or lower than the saturated vapor pressure of the temperature in the pipe 84 through which the gas to be processed passes.

  In order to realize the method for delivering the gas to be processed, in the decomposition processing apparatus 10 of this embodiment, the partial pressure setting device 90 injects partial pressure adjusting air (carrier gas) into the gas to be processed. As a result, the partial pressure of the halon 2402 is made equal to or lower than the saturated vapor pressure of the temperature in the pipe 84 through which the gas to be processed passes.

As a result, by injecting partial pressure adjusting air (carrier gas) into the gas to be processed, the partial pressure of halon 2402 can be easily realized below the saturated vapor pressure.
In addition, you may change embodiment of this invention as follows.

  In the above embodiment, the tubing pump 78 is a variable metering pump, but it may be simply a metering pump. Instead, as shown in FIG. 2, the control device 80 changes the rotation amount of the blower 88 according to the temperature detected by the temperature sensor 82 as the temperature detecting means.

  In this case, since the fixed amount of the halogen-containing compound delivered from the tubing pump 78 is fixed, for example, when the temperature of the reaction tube 20 is lower than the third threshold, the control device 80 decreases the rotation amount of the blower 88, The supply amount of the partial pressure adjusting air injected into the conduit 84 is decreased, and the partial pressure of the halogen-containing compound is increased. The third threshold value is a value obtained in advance by a test or the like. Further, when the temperature of the reaction tube 20 is higher than the fourth threshold value (> the third threshold value), the control device 80 increases the rotation amount of the blower 88 and supplies the partial pressure adjusting air injected into the conduit 84. Increase the amount and lower the partial pressure of the halogen-containing compound. The fourth threshold value is a value obtained in advance by a test or the like.

  In this case, the tubing pump 78 corresponds to a fixed amount delivery means. The control device 80 is a control means for setting the partial pressure of the halogen-containing compound to be equal to or lower than the saturated vapor pressure at the temperature of the pipe 84 by changing the driving amount of the blower 88 according to the temperature in the reaction tube 20. Equivalent to.

  Even in this case, when the liquid halogen-containing compound is gasified, the gas to be treated can be stably supplied into the reaction tube without containing the gasified halogen-containing compound again. it can.

In the above embodiment, the reaction tube 20 is a vertical standing type, but even if it is an inclined standing type, the same effect as the vertical standing type can be expected as long as the inclination angle allows the adsorbent to fall by its own weight.
In the above embodiment, the packed bed 22 of the adsorbent in the reaction tube 20 is used as a fixed layer, and after processing a predetermined amount of gas batchwise, the introduction of the processing gas is stopped and the screw conveyor 46 is driven, and the reaction tube The packed bed 22 of the adsorbent in 20 may be replaced with an unused adsorbent in which an unused adsorbent is caused to flow down from the adsorbent supply hopper 32.

In the embodiment, the adsorbent may be both calcium-based and magnesium-based, but the decomposition treatment apparatus 10 that decomposes the gas to be treated only with the calcium-based adsorbent may be used.
In the above embodiment, the variable fixed amount delivery means is constituted by the tubing pump 78, but may be constituted by a rotary pump, a gear pump, a diaphragm type pump or the like.

FIG. 1 of one embodiment is a schematic view of a halogen-containing compound decomposition treatment apparatus and a gas supply path. The schematic of the supply path of the to-be-processed gas of other embodiment.

Explanation of symbols

10 ... Decomposition treatment device, 20 ... Reaction tube,
78 ... Tubing pump (variable quantitative delivery means, quantitative delivery means),
88 ... Blower, 90 ... Partial pressure setting device.

Claims (8)

A method for delivering a gas to be processed to a decomposition processing apparatus for sending a gas to be processed gasified from a liquid halogen-containing compound to a reaction tube of a decomposition processing apparatus and performing the decomposition treatment of the halogen-containing compound in the reaction tube. ,
A decomposition treatment characterized in that a partial pressure of the halogen-containing compound is set to be equal to or lower than a saturated vapor pressure of a temperature in a pipe through which the gas to be treated passes, and the gas to be treated containing the halogen-containing compound is sent to a reaction tube. A method for delivering a gas to be processed to an apparatus. A method for delivering a gas to be processed to a decomposition processing apparatus for sending a gas to be processed gasified from a liquid halogen-containing compound to a reaction tube of a decomposition processing apparatus and performing the decomposition treatment of the halogen-containing compound in the reaction tube. ,
The gas to be treated is sent in a variable amount according to the temperature in the reaction tube, and the partial pressure of the halogen-containing compound delivered into the reaction tube is saturated with the temperature in the pipe through which the gas to be treated passes. A method for delivering a gas to be processed to a decomposition processing apparatus, characterized in that the pressure is lower than the pressure. A method for delivering a gas to be processed to a decomposition processing apparatus for sending a gas to be processed gasified from a liquid halogen-containing compound to a reaction tube of a decomposition processing apparatus and performing the decomposition treatment of the halogen-containing compound in the reaction tube. ,
The gas to be treated is sent out in a fixed amount, and the partial pressure of the halogen-containing compound delivered into the reaction tube is made equal to or lower than the saturated vapor pressure of the temperature in the pipe through which the gas to be treated passes. A method for delivering a gas to be processed to a decomposition processing apparatus.   When the partial pressure of the halogen-containing compound delivered into the reaction tube is made equal to or lower than the saturated vapor pressure, the treatment gas passes through the partial pressure of the halogen-containing compound by injecting a carrier gas into the treatment gas. The method for delivering a gas to be processed to the decomposition processing apparatus according to any one of claims 1 to 3, wherein the temperature is equal to or lower than a saturated vapor pressure of a temperature in a pipeline. In a decomposition treatment apparatus in which a gas to be treated obtained by gasifying a liquid halogen-containing compound is introduced into a reaction tube, and the halogen-containing compound is decomposed in the reaction tube,
A decomposition treatment characterized in that a partial pressure setting device is provided upstream of the reaction tube so that the partial pressure of the halogen-containing compound is equal to or lower than the saturated vapor pressure of the temperature in the pipe through which the gas to be treated passes. apparatus. According to the temperature in the reaction tube, comprising a variable quantitative sending means for sending the gas to be treated gasified liquid halogen-containing compound to the reaction tube in a variable quantitative manner,
The decomposition processing apparatus according to claim 5, wherein the partial pressure setting device is provided in a pipe line between the variable quantitative delivery means and the reaction tube. A fixed amount sending means for sending the gas to be treated to the reaction tube in a quantifiable manner;
The decomposition processing apparatus according to claim 5, wherein the partial pressure setting device is provided in a pipe line between the quantitative delivery means and the reaction tube.   The partial pressure setting device makes the partial pressure of the halogen-containing compound equal to or lower than the saturated vapor pressure of the temperature in the pipe through which the gas to be processed passes by injecting a carrier gas into the gas to be processed. The decomposition processing apparatus according to any one of claims 5 to 7.

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