JP2009137811A - Ozone supply device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an ozone supply device that can be made small in size. <P>SOLUTION: The ozone supply device 31 includes piping 313 where piping of an ozone supply system 311 and piping of an ozone discharge system 312 are linked, to which ozone chambers 9a, 9b are connected via filters 28a, 28b, respectively. The piping of the ozone discharge system 312 is preferably provided with a valve V1 that closes on the basis of the pressure in the piping. Alternatively, instead of the valve V1, a bypass valve and a filter can be provided to the piping of the ozone discharge system 312 in parallel with each other. The bypass valve opens the piping of the ozone discharge system on the basis of the pressure in the piping. Further, instead of the bypass valve, a check valve that opens on the basis of the pressure in the piping can be provided to the piping of the ozone discharge system 312. Further, instead of the above valves and the filter, a filter device having an overpressure bypass function can be provided to the piping of the ozone discharge system 312. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a technique for supplying high-concentration ozone gas obtained by liquefying ozone gas.

In recent years, the use of ozone (element symbol: O ₂ ) has been developed in various fields including water and sewage treatment using its strong oxidizing power. In particular, in the field of manufacturing semiconductor devices, application to Si wafer cleaning and TEOS-CVD (Tetra Ethyl Ortho Silica-Chemical Vapor Deposition) is being studied. Si wafer cleaning uses ozone water in which ozone gas is dissolved in pure water as a cleaning solution, and it has been announced that heavy metals and organic substances on Si wafers can be removed by using it together with dilute hydrofluoric acid aqueous solution (non-patent document) 1). TEOS-CVD is used to form an interlayer insulating film when a semiconductor element is formed into a multilayer wiring, and is characterized in that the unevenness of the wafer surface due to the electrodes can be planarized by the insulating film. It has been reported that the planarization performance is improved by adding ozone to the TEOS-CVD (Non-patent Document 2).

  These are examples using ozone gas with a relatively low concentration of about 10%, but by using ozone gas with a relatively high concentration of 80% or more, there is a possibility of a new application that could not be considered by conventional ozone gas usage. Has begun to be pointed out. As an example, there is an Si semiconductor oxide film forming method disclosed in Japanese Patent Laid-Open No. 8-335576. According to this publication, it is possible to form an oxide film at a relatively low temperature, which is impossible with the conventional thermal oxidation method, and to form a high-quality oxide film with less suboxide layer and defect structure. Has been.

  By the way, a silent discharge system is generally used to generate ozone gas. This generates a mixed gas of ozone and oxygen from oxygen gas by electric discharge. Due to the limit of generation efficiency and danger of explosion, it is difficult to generate ozone gas of about 10% by volume or more under normal temperature and pressure. It was. Therefore, Patent Document 1 (Japanese Patent Publication No. 5-17164) introduces a method of generating high-concentration ozone gas of 80% or more by once liquefying the generated ozone gas and then vaporizing it. This method will be described with reference to FIGS.

  As shown in FIG. 8, the liquid ozone production apparatus includes an ozone gas generation and exhaust apparatus 1 and a liquid ozone generation apparatus 2 that liquefies the ozone generated by the apparatus. Oxygen gas is sent from the oxygen cylinder 3 to the ozonizer 5 through the pressure adjustment valve 4. In the ozonizer 5, the oxygen gas becomes an ozone-containing oxygen gas mixed with ozone gas by silent discharge, and the ozone gas is passed through a mass flow controller 6 for controlling the flow rate and a particulate removal filter 7 for removing particulates in the ozone-containing gas. The liquefied liquid ozone generator 2 is supplied.

  In the liquid ozone generator, as shown in FIG. 8 and FIG. 9, the ozone-containing oxygen gas in which the ozone gas is mixed with the oxygen gas introduced from the ozone generator and exhaust device 1 flows through the ozone-containing oxygen gas introduction pipe 25. Then, it is introduced into the ozone chamber 9 through the flow rate adjusting valve 8. The ozone chamber 9 is thermally coupled to a cold head 19 that has been cooled by a refrigerator 21 that is driven in advance by a compressor 21, and is within 0.1 K by a temperature sensor 24, a heater 23, and a temperature control device 22. The temperature can be precisely controlled with temperature accuracy, and is kept at a low temperature of 80K to 100K.

  The principle of liquefaction of ozone gas is to liquefy only ozone gas by the difference in vapor pressure between ozone and oxygen. For example, at 1 atmosphere, the boiling point of ozone is 161K, but the boiling point of oxygen is 90K. Therefore, if it is cooled to a temperature of 90K or more and less than 161K, most of ozone is in a liquid state and most of oxygen is in a gaseous state, so that only ozone can be separated as a liquid. Actually, since it is handled under reduced pressure conditions for safety against explosive properties of high-concentration ozone, the separation conditions are determined by the difference between the vapor pressures of ozone and oxygen under the temperature and pressure conditions. For example, if the temperature is 90 K and the pressure is 10 mmHg (= 13.3 hPa), the ozone vapor pressure is almost 0 mmHg (= 0 Pa) at 90 K, but oxygen is about 690 mmHg (= 918 hPa), and only ozone is under this condition. Liquefied.

  Thus, in the ozone chamber 9, only ozone gas is liquefied by the difference in vapor pressure between ozone and oxygen at the cooled temperature. When the ozone gas is liquefied, the valve 15 connected to the pipe connected to the oxidation treatment device 16 is closed, and the valve 10 connected to the pipe connected to the ozone killer 11 is opened. Non-liquefied oxygen gas flowing through the ozone exhaust pipe 26 connected to the ozone chamber 9 is introduced into the ozone killer 11 through the valve 10. The ozone killer 11 is heated to change to oxygen so that the remaining ozone gas is not discharged to the outside. The heated oxygen gas supplied from the ozone killer 11 is supplied to the gas cooler 12 and cooled. The cooled oxygen gas is discharged out of the system by a vacuum pump 14 through a liquid nitrogen trap 13. The liquid nitrogen trap 13 prevents contamination and contamination of the ozone chamber 9 by carbides from the vacuum pump 14.

  When the liquid ozone 27 liquefied in the ozone chamber 9 is supplied to the oxidation treatment device 16 for the purpose of oxidation or the like, the flow rate adjusting valve 8 and the valve 10 are set to be closed while the valve 15 is set to be open. . The liquid ozone is vaporized by raising the temperature of the ozone chamber 9 thermally coupled to the cold head 19 by the heater 23, the temperature sensor 24, and the temperature control device 22. The ozone gas generated by the vaporization flows through the ozone discharge pipe 26 and is supplied to the oxidation treatment device 16 through the valve 15. Since liquid ozone 27 or high-concentration ozone gas has explosive properties, a safety valve 18 is installed in a piping system through which ozone gas flows in case of an explosion. Further, in order to prevent the explosion of ozone gas when temperature control becomes difficult due to a failure of the refrigerator, a spare chamber is provided in the vacuum exhaust system like the ozone generator shown in Patent Document 2 (Japanese Patent Laid-Open No. 2003-20208). In addition, when the temperature control of the ozone chamber becomes difficult, the ozone-containing gas and liquefied ozone in the ozone chamber are evacuated to the preliminary chamber.

Moreover, the liquid ozone manufacturing apparatus shown by FIG.8 and FIG.9 is a batch type form which accumulate | stores liquid ozone and supplies high concentration ozone gas alternately. For this reason, when it is desired to continuously supply high-concentration ozone gas, it is necessary to provide a plurality of ozone chambers. In other words, because there is a limit to the amount of ozone that can be safely stored in a single ozone chamber due to the explosive nature of ozone gas itself, if you want to increase the supply of high-concentration ozone gas, install more ozone chambers. Become. As an ozone supply device provided with a plurality of ozone chambers, there is an ozone generation device disclosed in Patent Document 3 (Japanese Patent Laid-Open No. 2003-20209).
Electronic Materials, March 1999, pp. 13-18 Jpn. J. et al. Appl. Phys. Vol. 32 (1993), pp. L110-L112 Japanese Patent Publication No. 5-17164 JP 2003-20208 A JP 2003-20209 A

  When the number of ozone chambers to be used increases, the number of gas pipes connected to these ozone chambers also increases, and the connection form of the gas pipes becomes complicated. The ozone supply device 30 shown in FIG. 10 has a configuration in which two ozone chambers are connected in parallel. The ozone supply device 30 has two piping systems, an ozone supply system 301 and an ozone discharge system 302, connected to the ozone chambers 9a and 9b. The ozone chamber 9a is connected to an ozone supply system 301 through a filter 28a and is connected to an ozone discharge system 302 through a filter 29a. The ozone chamber 9b is connected to the ozone supply system 301 through the filter 28b and is connected to the ozone discharge system 302 through the filter 29b. As described above, the ozone supply device 30 having a plurality of ozone chambers has a plurality of piping branching points and coupling points, and has a complicated piping shape, increasing the size of the device and increasing the total extension distance of the internal gas piping. In addition, the piping is complicated and the dead space is easily generated.

  Therefore, in the ozone supply device according to the first aspect, a plurality of ozone chambers are respectively connected to a pipe in which an ozone supply system pipe and an ozone exhaust system pipe are connected via a filter.

  According to a second aspect of the present invention, there is provided the ozone supply apparatus according to the first aspect, wherein the ozone exhaust system pipe is provided with a valve that closes based on the pressure in the pipe.

  The ozone supply device according to claim 3 is the ozone supply device according to claim 1, wherein a bypass valve and a filter are provided in parallel with the ozone exhaust system pipe, and the bypass valve is connected to the ozone exhaust system pipe with a pressure in the pipe. Open operation based on.

  The ozone supply device according to claim 4 is the ozone supply device according to claim 1, wherein the ozone exhaust system pipe is provided with a check valve and a filter in parallel, and the check valve is connected to the ozone exhaust system pipe in the pipe. Open operation based on pressure.

  The ozone supply device according to claim 5 is the ozone supply device according to claim 1, further comprising a filter device having an overpressure bypass function in the piping of the ozone exhaust system.

  The ozone supply device according to claim 6 is the ozone supply device according to any one of claims 1 to 5, wherein the filter device includes an upper casing portion in which an introduction port for introducing the gas discharged from the ozone chamber is formed; The lower casing part connected to the upper casing part and formed with a discharge port for discharging the introduced gas is housed in a hollow part formed by connecting the upper casing part and the lower casing part. A filter part for filtering the introduced gas, a first gas circulation part that is provided at a lower end part of the filter part and moves the filtered gas to the cavity part, and a lower end of the first gas circulation part It is fixed to the bellows part that is fixed to the part and sealed with gas at atmospheric pressure, and the bottom part of the bellows part and the bottom part of the lower casing part. A second gas circulation part for transferring the gas staying in the hollow part to the discharge port, and the gas is introduced into the introduction port in a state where the pressure of the gas discharged from the ozone chamber is lower than the internal pressure of the bellows part. Gas is discharged from the ozone chamber while the bellows part expands and the filter part closes the inlet and the filter part filters the gas supplied to the inlet. When the pressure is equal to or higher than the internal pressure of the bellows part and the gas is supplied to the inlet, the bellows part contracts and a gap is secured between the upper casing part and the filter part.

  Since the filter installed in the ozone supply system and the filter installed in the ozone exhaust system are integrated, the piping system of the ozone supply device is simplified.

  In particular, since the ozone exhaust system pipe is provided with a valve that closes based on the pressure in the pipe as in the invention of claim 2, when the gas in the ozone chamber is evacuated to a high vacuum, the downstream side of the valve It is possible to reduce the backflow of particles from the ozone killer installed in the piping of the ozone exhaust system.

  According to a third aspect of the present invention, a bypass valve and a filter are provided in parallel in the ozone exhaust system pipe, and the bypass valve opens in the ozone exhaust system pipe based on the pressure in the pipe. When the gas in the ozone chamber is evacuated to a high vacuum, it is possible to reduce the backflow of particles from the ozone killer installed on the downstream side of the valve to the piping of the ozone exhaust system.

  Furthermore, as in the invention of claim 4, the ozone exhaust system pipe is provided with a check valve and a filter in parallel, and the check valve opens in the ozone exhaust system pipe based on the pressure in the pipe. Thereby, when the gas in the ozone chamber is evacuated to a high vacuum, the backflow of particles from the ozone killer installed on the downstream side of the valve to the piping of the ozone exhaust system can be reduced.

  Further, as the invention according to claim 5, the ozone exhaust system pipe is provided with a filter device having an overpressure bypass function, so that when the gas in the ozone chamber is evacuated to a high vacuum, The backflow of particles generated from the installed ozone killer to the piping of the ozone exhaust system can be reduced.

  Therefore, according to the above invention, even if the number of installed ozone chambers in the ozone supply device is increased, the branching and joining points of the piping are reduced, and the piping system is simplified. Thereby, an ozone supply apparatus can be reduced in size and cost. Moreover, dead space in the piping system is reduced, and corrosion in the piping due to gas accumulation is reduced. In particular, according to the inventions of claims 2 to 6, it is possible to reduce the backflow of particles from the ozone killer to the piping system when the gas in the ozone chamber is evacuated to a high vacuum.

(Embodiment 1)
FIG. 1 is a schematic configuration diagram of an ozone supply apparatus according to the first embodiment.

  The ozone supply device 31 has a simple piping system by integrating the ozone supply system 311 and the ozone exhaust system 312 filters to reduce the branching and joining points of the piping. In other words, the ozone supply device 31 has a plurality of ozone chambers connected to a pipe 313 connected to the ozone supply system 311 and the ozone exhaust system 312. Particle pipe type filters 28a and 28b are installed in pipes connecting the ozone chambers 28a and 28b and the pipe 313, respectively. The ozone supply system 311 includes a valve Vs in a pipe that supplies an oxidation processing apparatus or the like (not shown). The ozone exhaust system 312 includes a valve Ve and a backflow prevention valve V1 in series on a pipe to which the ozone killer 11 and the vacuum pump 14 are connected. The ozone exhaust system 312 is provided with a pressure gauge P for detecting the pressure in the piping of the ozone exhaust system 312 as means for monitoring the amount of gas exhaust.

  An operation example of the ozone supply device 31 will be described with reference to FIG. When ozone is supplied to a device outside the system (for example, the oxidation treatment container 16 shown in FIG. 8), the valve Ve is set to be closed while the valve Vs is set to be open. The ozone in the ozone chambers 9a and 9b is supplied to the ozone supply system 311 via the filters 28a and 29b, respectively. Next, when the ozone in the ozone chambers 9a and 9b is evacuated, the valve Ve is set to open while the valve Vs is set to open. The ozone gas in the ozone chambers 9 a and 9 b is sucked by the vacuum pump 14. The sucked ozone gas is supplied to the ozone killer 11 through the backflow prevention valve V1. Here, when the gas exhaust amount decreases, that is, when the pressure gauge P detects that the ozone chamber 9a or 9b is in a high vacuum state, the backflow prevention valve V1 is closed and the ozone killer 11 enters the pipe. Reduce the back flow of particles.

(Embodiment 2)
FIG. 2 is a schematic configuration diagram of an ozone supply device according to the second embodiment.

  The ozone supply device 32 includes a bypass valve V2 in parallel with a particle filter type filter Fk in the piping of the ozone exhaust system 312 in order to prevent particles from flowing back from the ozone killer 11. When the amount of gas exhaust increases, the bypass valve V2 is set to open to ensure the exhaust capacity and protect the filter. The ozone exhaust system 312 is provided with a pressure gauge P for detecting the pressure in the piping of the ozone exhaust system 312 as means for monitoring the amount of gas exhaust.

  An example of the operation of the ozone supply device 32 will be described with reference to FIG. When ozone is supplied to a device outside the system (for example, the oxidation treatment container 16 shown in FIG. 8), the valve Ve is set to be closed while the valve Vs is set to be open. The ozone in the ozone chambers 9a and 9b is supplied to the ozone supply system 311 via the filters 28a and 28b, respectively. Next, when the ozone in the ozone chambers 9a and 9b is evacuated, the valve Ve is set to open while the valve Vs is set to open. The ozone gas in the ozone chambers 9 a and 9 b is sucked by the vacuum pump 14. The sucked ozone gas is supplied to the ozone killers 9a and 9b through the filter Fk. When the pressure gauge P detects that the amount of gas discharged from the ozone chambers 9a and 9b has increased, the bypass valve V2 is opened. As a result, the exhaust capability of ozone is secured and the filter is protected.

(Embodiment 3)
FIG. 3 is a schematic configuration diagram of an ozone supply device according to the third embodiment.

  The ozone supply device 33 includes a check valve V3 in parallel with the filter Fk in the piping of the ozone exhaust system 312 in order to prevent particles from flowing back from the ozone killer 11. When the gas exhaust amount increases, the check valve V3 automatically opens to ensure the exhaust capability and protect the filter. The ozone exhaust system 312 is provided with a pressure gauge P for detecting the pressure in the piping of the ozone exhaust system 312 as means for monitoring the amount of gas exhaust.

  An example of the operation of the ozone supply device 33 will be described with reference to FIG. When ozone is supplied to a device outside the system (for example, the oxidation treatment container 16 shown in FIG. 8), the valve Ve is set to be closed while the valve Vs is set to be open. The ozone in the ozone chambers 9a and 9b is supplied to the ozone supply system 311 via the filters 28a and 28b, respectively. Next, when the ozone in the ozone chambers 9a and 9b is evacuated, the valve Ve is set to open while the valve Vs is set to open. The ozone gas in the ozone chambers 9 a and 9 b is sucked by the vacuum pump 14. The sucked ozone gas is supplied to the ozone killer 11 through the filter Fk. When the pressure gauge P detects that the amount of gas discharged from the ozone chambers 9a and 9b has increased, the check valve V3 is opened. As a result, the exhaust capability of ozone is secured and the filter is protected.

(Embodiment 4)
FIG. 4 is a schematic configuration diagram of an ozone supply device according to the fourth embodiment.

  In order to prevent particles from flowing back from the ozone killer 11, the ozone supply device 33 includes an overpressure bypass function built-in filter device 41 in the piping of the ozone exhaust system 312. When the gas exhaust amount increases, the function of the filter device 41 secures the exhaust capacity and protects the filter.

  FIG. 5 is a cross-sectional view showing the configuration of the filter device. FIG. 6 is an exploded sectional view showing the configuration of the filter device. FIG. 7A is a schematic diagram illustrating an operation example (at atmospheric pressure) of the filter device, and FIG. 7B is a schematic diagram illustrating an operation example of the filter device (at vacuum evacuation).

  The filter device 41 is a filter device for removing contaminants contained in the fluid to be evacuated. The filter device 41 includes an upper casing part 42, a filter part 43, a first gas circulation part 44, a bellows part 45, a second gas circulation part 46, and a lower casing part 47.

  The upper casing portion 42 has an inlet 51 for introducing gas discharged from an ozone chamber (not shown). The diameter of the introduction port 41 of the upper casing part 42 is set to be equal to the diameter of the gas discharge port 101 formed in the lower casing part 47. Both ends of the upper casing portion 42 and the lower casing portion 47 are in the form of NW flanges so that they can be easily connected to other pipes. That is, the upper casing portion 42 includes flanges 52 and 53. The lower casing portion 47 includes flanges 102 and 103. For example, the flange 52 is connected to the piping of the ozone discharge system 312 of the ozone supply device 33 illustrated in FIG. 4, while the flange 53 is connected to the flange 102 of the lower casing portion 47. A center ring 8 for the NW flange is interposed in the connecting portion between the flange 53 and the flange 102 in order to maintain airtightness. Further, the flange 103 of the lower casing portion 7 is connected to the piping of the ozone exhaust system 312 of the ozone supply device 34.

  The filter part 43 includes a filter material 61, a concave frame part 62, and a convex frame part 63. The filter material 61 is stored in the concave frame portion 62. The diameters of the opening 64 of the concave frame portion 62 and the opening 65 of the convex frame portion 63 are set substantially equal to the diameter of the introduction port 51 of the upper casing portion 42. The convex frame portion 63 is coupled to the concave frame portion 62 by a bolt 66 in a state of being fitted to the concave frame portion 62 in which the filter material 61 is accommodated. In addition, a seal 67 made of an elastic body formed in a ring shape having a diameter larger than the diameter of the opening 64 is provided concentrically with the opening 64 on the end surface of the concave frame 62.

  The first gas circulation part 44 is formed of a cylinder that moves the fluid that has passed through the filter material 61 into the upper casing 42. The inner diameter of the cylindrical body is set to be equal to or larger than the diameter of the opening 64 of the convex frame portion 63. The cylinder is formed in a cylindrical shape, and a plurality of discharge ports 71 for discharging the fluid are appropriately formed on the peripheral side surface. The first gas circulation part 44 is airtightly connected to the sealing plate 81 of the bellows part 45. This connection may be made by screwing or welding.

  The bellows portion 45 seals the air in an atmospheric pressure state by sealing the openings at both ends with the sealing plates 81 and 82, respectively. The sealing plates 81 and 82 are hermetically connected to the end surface of the bellows portion 45 by screwing or welding. As shown in FIG. 7A, the entire length of the bellows portion 45 is such that when the bellows portion 45 contracts, the bottom surface in the upper casing portion 42 and the end surface of the concave frame portion 62 are separated from each other. As shown, when the bellows portion 45 is expanded, the end surface is set to come into contact with the bottom surface.

  The second gas circulation part 46 is composed of a cylinder that transfers the fluid in the lower casing part 47 to the discharge port 101 of the lower casing part 47. The cylindrical body is formed in a cylindrical shape, and a plurality of inlets 91 for introducing the fluid are appropriately formed on the peripheral side surface. The inner diameter of the cylindrical body is set substantially equal to the inner diameter of the first gas circulation part 44. The end surface of the second gas circulation part 46 is airtightly connected to the closing plate 82 of the bellows part 45. This connection may also be made by screwing or welding. The other end face of the second gas circulation part 46 is connected to a flange 92 fixed to the bottom face in the lower casing part 47. The flange 92 is fixed to the bottom surface by a bolt 93.

  An example of the operation of the filter device 41 will be described with reference to FIG.

  The filter device 41 uses the expansion and contraction of the air confined in the bellows part 45 to bring the filter part 43 into contact with the ceiling surface of the upper casing part 42 and to remove it.

  For example, when the fluid is introduced into the filter device 41 in an atmospheric pressure state, the pressure of the introduced fluid is equal to or higher than the internal pressure of the bellows portion 45, so that the bellows portion 45 of the filter device 41 is contracted. It has become. As a result, as shown in FIG. 7A, a gap is secured between the ceiling surface of the upper casing portion 42 and the filter portion 43. The fluid introduced into the filter device 41 circulates in the upper casing portion 42 and the lower casing portion 47 via the gap without passing through the filter portion 61 and is discharged through the second gas circulation portion 46.

  On the other hand, when the fluid is introduced into the filter device 41 by the vacuum pump, the pressure of the introduced fluid is lower than the internal pressure of the bellows part 45, so that the bellows part 45 expands and the filter part 43 becomes the upper casing part. It adheres to the ceiling surface of 42. As a result, as shown in FIG. 7B, the inlet 51 of the upper casing portion 42 is closed. As a result, the filter unit 43 can filter the introduced gas. The fluid filtered by the filter unit 43 flows through the upper casing unit 2 and the lower casing unit 47 through the first gas flow passage 44 and is discharged through the second gas flow unit 46.

  Next, an operation example of the ozone supply device 34 will be described with reference to FIGS. 4 and 7.

  When supplying ozone, the valve Ve is set to be closed while the valve Ve is set to be open. The ozone in the ozone chambers 9a and 9b is supplied to the ozone supply system 311 via the filters 28a and 28b, respectively.

  Next, when exhausting ozone, the valve Vs is set to be closed while the valve Ve is set to be open. The ozone gas in the ozone chambers 9a and 9b is sucked by the vacuum pump 14 and supplied to the ozone exhaust system through the filters 28a and 28b, respectively. The ozone gas introduced into the ozone exhaust system 312 is supplied to the filter device 41. At this time, since the pressure in the bellows part 45 of the filter device 41 is higher than the pressure outside the bellows part 45, the bellows part 45 expands and the filter part 43 adheres to the ceiling surface of the upper casing part 42. To do. The ozone gas sucked by the vacuum pump 14 passes through the filter material 64 of the filter device 41 and is introduced into the first gas circulation part 44 as shown in FIG. The gas discharged from the discharge port 71 of the first gas circulation portion 44 moves into the lower casing portion 47 and is introduced into the second gas flow passage 46. The gas in the second gas flow passage 46 is immediately supplied to the ozone killer 11.

  As described above, according to the ozone supply device 34 of the fourth embodiment, by providing the ozone exhaust system pipe with the filter device 41, exhaust operation can be performed without causing pressure loss during vacuum exhaust.

1 is a schematic configuration diagram of an ozone supply device according to Embodiment 1. FIG. FIG. 4 is a schematic configuration diagram of an ozone supply device according to a second embodiment. FIG. 5 is a schematic configuration diagram of an ozone supply device according to a third embodiment. FIG. 6 is a schematic configuration diagram of an ozone supply device according to a fourth embodiment. Sectional drawing which showed the filter apparatus with which the ozone supply apparatus of Embodiment 4 was equipped. FIG. 3 is an exploded sectional view showing the filter device. (A) The schematic diagram which showed the operation example (at the time of atmospheric pressure) of the said filter apparatus, (b) The schematic diagram which showed the operation example (at the time of vacuum exhaustion) of the said filter apparatus. The schematic block diagram of an ozone manufacturing apparatus. The detailed block diagram of a liquid ozone production | generation apparatus. The schematic diagram of the configuration of a conventional ozone supply device.

Explanation of symbols

31, 32, 33, 34 ... ozone supply devices 9a, 9b ... ozone chamber, 11 ... ozone killer, 14 ... vacuum pump, 28a, 28b ... filter, 311 ... ozone supply system, 312 ... ozone discharge system, P ... pressure gauge , V1 ... backflow prevention valve, V2 ... bypass valve, Fk ... filter, V3 ... check valve 41 ... filter device 42 ... upper casing part, 51 ... introduction port, 52, 53 ... flange 43 ... filter part, 61 ... filter Material: 62 ... Concave frame part, 63 ... Convex frame part, 64, 65 ... Opening part, 66 ... Bolt, 67 ... Seal 44 ... First gas circulation part, 71 ... Discharge port 45 ... Bellows part, 81, 82 ... Sealing Plate 46 ... Second gas flow part, 91 ... Discharge port, 92 ... Flange, 93 ... Bolt 47 ... Lower casing part, 101 ... Discharge port, 102, 103 ... Flange 48 ... Center Ring

Claims (6)

  An ozone supply apparatus, wherein a plurality of ozone chambers are connected to a pipe connecting an ozone supply system pipe and an ozone exhaust system pipe through a filter. The ozone supply device according to claim 1, wherein the ozone exhaust system pipe is provided with a valve that closes based on a pressure in the pipe. The ozone exhaust system pipe is provided with a bypass valve and a filter in parallel,
The ozone supply device according to claim 1, wherein the bypass valve opens the piping of the ozone exhaust system based on a pressure in the piping. The ozone exhaust system piping is provided with a check valve and a filter in parallel,
The ozone supply device according to claim 1, wherein the check valve opens the ozone exhaust system pipe based on a pressure in the pipe.   The ozone supply device according to claim 1, wherein the ozone exhaust system pipe is provided with a filter device having an overpressure bypass function. The filter device is
An upper casing portion formed with an inlet for introducing gas discharged from the ozone chamber;
A lower casing part connected to the upper casing part and formed with a discharge port for discharging the introduced gas;
A filter part that is accommodated in a cavity formed by connecting the upper casing part and the lower casing part and filters the introduced gas, and
A first gas circulation part that is provided at a lower end part of the filter part and moves the filtered gas to the cavity part;
A bellows part that is fixed to the lower end of the first gas circulation part and seals the gas in an atmospheric pressure state;
A second gas circulation part that is fixed to the lower end part of the bellows part and the bottom part of the lower casing part and moves the gas staying in the cavity part to the discharge port;
When the gas exhausted from the ozone chamber is lower than the internal pressure of the bellows part and the gas is supplied to the inlet, the bellows part expands and the filter part closes the inlet. While the filter part filters the gas provided to the inlet, the bellows is provided when the pressure of the gas discharged from the ozone chamber is equal to or higher than the internal pressure of the bellows part and the gas is supplied to the inlet. The ozone supply device according to any one of claims 1 to 5, wherein a part is contracted and a gap is secured between the upper casing part and the filter part.

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